BR8505087A - Processo para preparar copias em relevo negativas - Google Patents

Processo para preparar copias em relevo negativas

Info

Publication number
BR8505087A
BR8505087A BR8505087A BR8505087A BR8505087A BR 8505087 A BR8505087 A BR 8505087A BR 8505087 A BR8505087 A BR 8505087A BR 8505087 A BR8505087 A BR 8505087A BR 8505087 A BR8505087 A BR 8505087A
Authority
BR
Brazil
Prior art keywords
copies
embroidered
prepare negative
exposed
photosensitive
Prior art date
Application number
BR8505087A
Other languages
English (en)
Inventor
Hansjoerg Vollmann
Paul Stahlhofen
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of BR8505087A publication Critical patent/BR8505087A/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Preparation Of Compounds By Using Micro-Organisms (AREA)
  • Manufacturing Of Micro-Capsules (AREA)
  • Paper (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
BR8505087A 1984-10-15 1985-10-14 Processo para preparar copias em relevo negativas BR8505087A (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE3437687A DE3437687A1 (de) 1984-10-15 1984-10-15 Verfahren zum herstellen negativer kopien mittels eines materials auf basis von 1,2-chinondiaziden

Publications (1)

Publication Number Publication Date
BR8505087A true BR8505087A (pt) 1986-07-29

Family

ID=6247891

Family Applications (1)

Application Number Title Priority Date Filing Date
BR8505087A BR8505087A (pt) 1984-10-15 1985-10-14 Processo para preparar copias em relevo negativas

Country Status (7)

Country Link
EP (1) EP0178594B1 (pt)
JP (1) JPS6197647A (pt)
AT (1) ATE64662T1 (pt)
BR (1) BR8505087A (pt)
CA (1) CA1298510C (pt)
DE (2) DE3437687A1 (pt)
ZA (1) ZA857887B (pt)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ATE47631T1 (de) * 1985-03-11 1989-11-15 Hoechst Celanese Corp Verfahren zum herstellen von photoresiststrukturen.
JPS61241745A (ja) * 1985-04-18 1986-10-28 Oki Electric Ind Co Ltd ネガ型フオトレジスト組成物及びレジストパタ−ン形成方法
DE3662952D1 (en) * 1985-08-12 1989-05-24 Hoechst Celanese Corp Process for obtaining negative images from positive photoresists
DE3664824D1 (en) * 1985-10-25 1989-09-07 Hoechst Celanese Corp Process for producing a positive photoresist
EP0220645B1 (de) * 1985-10-28 1990-09-12 Hoechst Celanese Corporation Strahlungsempfindliches, positiv-arbeitendes Gemisch und hieraus hergestelltes Photoresistmaterial
NL8601096A (nl) * 1986-04-29 1987-11-16 Philips Nv Werkwijze voor het vervaardigen van een halfgeleiderinrichting waarbij op een halfgeleidersubstraat een negatief beeld wordt gevormd in een positieve fotolak.
US4873176A (en) * 1987-08-28 1989-10-10 Shipley Company Inc. Reticulation resistant photoresist coating
JPH03142918A (ja) * 1989-10-30 1991-06-18 Matsushita Electron Corp レジストパターン形成方法
DE3940911A1 (de) * 1989-12-12 1991-06-13 Hoechst Ag Verfahren zur herstellung negativer kopien

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT1169682B (it) * 1983-11-08 1987-06-03 I M G Ind Materiali Grafici Sp Composizione per fotoriproduzioni

Also Published As

Publication number Publication date
EP0178594A2 (de) 1986-04-23
EP0178594A3 (en) 1988-03-23
JPS6197647A (ja) 1986-05-16
CA1298510C (en) 1992-04-07
DE3437687A1 (de) 1986-04-17
ZA857887B (en) 1986-05-28
DE3583277D1 (de) 1991-07-25
ATE64662T1 (de) 1991-07-15
EP0178594B1 (de) 1991-06-19

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Legal Events

Date Code Title Description
MM Lapse due to non-payment of fees (art. 50)