ZA872295B - - Google Patents

Info

Publication number
ZA872295B
ZA872295B ZA872295A ZA872295A ZA872295B ZA 872295 B ZA872295 B ZA 872295B ZA 872295 A ZA872295 A ZA 872295A ZA 872295 A ZA872295 A ZA 872295A ZA 872295 B ZA872295 B ZA 872295B
Authority
ZA
South Africa
Application number
ZA872295A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB868606258A external-priority patent/GB8606258D0/en
Application filed filed Critical
Publication of ZA872295B publication Critical patent/ZA872295B/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
ZA872295A 1986-03-13 1987-03-30 ZA872295B (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB868606258A GB8606258D0 (en) 1986-03-13 1986-03-13 Processing of lithographic printing plates
CA000533663A CA1309291C (fr) 1986-03-13 1987-04-02 Developpement de planches d'impression lithographique exposees

Publications (1)

Publication Number Publication Date
ZA872295B true ZA872295B (fr) 1987-09-22

Family

ID=25671294

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA872295A ZA872295B (fr) 1986-03-13 1987-03-30

Country Status (3)

Country Link
US (1) US4927741A (fr)
CA (1) CA1309291C (fr)
ZA (1) ZA872295B (fr)

Families Citing this family (32)

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Publication number Priority date Publication date Assignee Title
US5286609A (en) * 1988-11-01 1994-02-15 Yamatoya & Co., Ltd. Process for the formation of a negative resist pattern from a composition comprising a diazoquinone compound and an imidazole and having as a heat step the use of a hot water containing spray
DE3940911A1 (de) * 1989-12-12 1991-06-13 Hoechst Ag Verfahren zur herstellung negativer kopien
US5330875A (en) * 1993-05-05 1994-07-19 Sun Chemical Corporation Process for producing negative and positive original images on a bilevel printing plate utilizing non-silver halide layer and silver halide overlayer
US5372915A (en) * 1993-05-19 1994-12-13 Eastman Kodak Company Method of making a lithographic printing plate containing a resole resin and a novolac resin in the radiation sensitive layer
EP0672954B1 (fr) 1994-03-14 1999-09-15 Kodak Polychrome Graphics LLC Composition radiosensible contenant une résine résol, une résine novolaque, un absorbeur d'infrarouge et une triazine et son utilisation en planches d'impression lithographiques
US5466557A (en) * 1994-08-29 1995-11-14 Eastman Kodak Company Radiation-sensitive composition containing a resole resin, a novolac resin, a latent bronsted acid, an infrared absorber and terephthalaldehyde and use thereof in lithographic printing plates
US5491046A (en) * 1995-02-10 1996-02-13 Eastman Kodak Company Method of imaging a lithographic printing plate
ES2114521T3 (es) 1996-04-23 2000-01-16 Kodak Polychrome Graphics Co Precursor de la forma para impresion litografica y su utilizacion en la formacion de imagenes por calor.
US5858626A (en) 1996-09-30 1999-01-12 Kodak Polychrome Graphics Method of forming a positive image through infrared exposure utilizing diazonaphthoquinone imaging composition
US5705322A (en) * 1996-09-30 1998-01-06 Eastman Kodak Company Method of providing an image using a negative-working infrared photosensitive element
US6117610A (en) * 1997-08-08 2000-09-12 Kodak Polychrome Graphics Llc Infrared-sensitive diazonaphthoquinone imaging composition and element containing non-basic IR absorbing material and methods of use
US5705308A (en) * 1996-09-30 1998-01-06 Eastman Kodak Company Infrared-sensitive, negative-working diazonaphthoquinone imaging composition and element
US5919601A (en) * 1996-11-12 1999-07-06 Kodak Polychrome Graphics, Llc Radiation-sensitive compositions and printing plates
US6090532A (en) * 1997-03-21 2000-07-18 Kodak Polychrome Graphics Llc Positive-working infrared radiation sensitive composition and printing plate and imaging method
US6063544A (en) * 1997-03-21 2000-05-16 Kodak Polychrome Graphics Llc Positive-working printing plate and method of providing a positive image therefrom using laser imaging
EP0953166B1 (fr) 1997-07-05 2001-08-16 Kodak Polychrome Graphics LLC Procedes de formation de motifs
US6060217A (en) * 1997-09-02 2000-05-09 Kodak Polychrome Graphics Llc Thermal lithographic printing plates
US7264354B2 (en) * 1999-07-02 2007-09-04 E-Vision, Llc Method and apparatus for correcting vision using an electro-active phoropter
US6143479A (en) * 1999-08-31 2000-11-07 Kodak Polychrome Graphics Llc Developing system for alkaline-developable lithographic printing plates
US6255042B1 (en) 1999-11-24 2001-07-03 Kodak Polychrome Graphics, Llc Developing system for alkaline-developable lithographic printing plates with different interlayers
US6691618B2 (en) 2000-05-08 2004-02-17 Pisces-Print Imaging Sciences, Inc. Chemical imaging of a lithographic printing plate
US6315916B1 (en) 2000-05-08 2001-11-13 Pisces-Print Image Sciences, Inc. Chemical imaging of a lithographic printing plate
US20040154489A1 (en) * 2000-05-08 2004-08-12 Deutsch Albert S. Chemical imaging of a lithographic printing plate
US6677106B2 (en) 2002-01-03 2004-01-13 Kodak Polychrome Graphics Llc Method and equipment for using photo- or thermally imagable, negatively working patterning compositions
US6599676B2 (en) 2002-01-03 2003-07-29 Kodak Polychrome Graphics Llc Process for making thermal negative printing plate
US6843176B2 (en) * 2002-04-26 2005-01-18 Kodak Polychrome Graphics, Llc Method to remove unwanted, unexposed, radiation-sensitive layer in a lithographic printing plate
US7041174B2 (en) * 2003-02-19 2006-05-09 Sunmodics,Inc. Grafting apparatus and method of using
US9827401B2 (en) 2012-06-01 2017-11-28 Surmodics, Inc. Apparatus and methods for coating medical devices
MX351261B (es) 2012-06-01 2017-10-06 Surmodics Inc Aparato y método para recubrir catéteres con globo.
US11090468B2 (en) 2012-10-25 2021-08-17 Surmodics, Inc. Apparatus and methods for coating medical devices
WO2020112816A1 (fr) 2018-11-29 2020-06-04 Surmodics, Inc. Appareil et méthodes de revêtement de dispositifs médicaux
US11819590B2 (en) 2019-05-13 2023-11-21 Surmodics, Inc. Apparatus and methods for coating medical devices

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL280959A (fr) * 1961-07-28
US3723120A (en) * 1971-08-30 1973-03-27 Du Pont Process for hardening photohardenable images
SU542167A1 (ru) * 1974-11-19 1977-01-05 Украинский Научно-Исследовательский Институт Полиграфической Промышленности Способ изготовлени фотополимерных печатных форм
US4148934A (en) * 1977-12-02 1979-04-10 W. R. Grace Ltd. Secondary photocuring of photocured printing plate, apparatus and method
US4338007A (en) * 1978-12-22 1982-07-06 Howard A. Fromson Apparatus and process for making lithographic printing plate with reinforced image
DE3020976C2 (de) * 1980-06-03 1983-01-27 Du Pont de Nemours (Deutschland) GmbH, 4000 Düsseldorf Verfahren zur Erhöhung der Verarbeitungsbreite von lichthärtbaren Aufzeichnungsmaterialien
JPS5897043A (ja) * 1981-12-04 1983-06-09 Teijin Ltd 液中後露光法
JPS58100128A (ja) * 1981-12-10 1983-06-14 Teijin Ltd 液中後露光方法
US4415654A (en) * 1982-08-19 1983-11-15 Hercules Incorporated Post-exposure process
NL8203521A (nl) * 1982-09-10 1984-04-02 Philips Nv Werkwijze voor het vervaardigen van een inrichting.
DE3325022A1 (de) * 1983-07-11 1985-01-24 Hoechst Ag, 6230 Frankfurt Verfahren zur herstellung negativer kopien mittels eines materials auf basis von 1,2-chinondiaziden
DE3325023A1 (de) * 1983-07-11 1985-01-24 Hoechst Ag, 6230 Frankfurt Verfahren zur herstellung negativer kopien mittels eines materials auf basis von 1,2-chinondiaziden
GB2171530B (en) * 1985-02-27 1989-06-28 Imtec Products Inc Method of producing reversed photoresist images by vapour diffusion

Also Published As

Publication number Publication date
US4927741A (en) 1990-05-22
CA1309291C (fr) 1992-10-27

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