ZA819020B - Developer mixture and process for developing exposed negative-working diazonium salt layers - Google Patents

Developer mixture and process for developing exposed negative-working diazonium salt layers

Info

Publication number
ZA819020B
ZA819020B ZA819020A ZA819020A ZA819020B ZA 819020 B ZA819020 B ZA 819020B ZA 819020 A ZA819020 A ZA 819020A ZA 819020 A ZA819020 A ZA 819020A ZA 819020 B ZA819020 B ZA 819020B
Authority
ZA
South Africa
Prior art keywords
percent
weight
developer mixture
diazonium salt
salt
Prior art date
Application number
ZA819020A
Other languages
English (en)
Inventor
G Sprintschnik
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of ZA819020B publication Critical patent/ZA819020B/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Developing Agents For Electrophotography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
ZA819020A 1981-01-08 1981-12-30 Developer mixture and process for developing exposed negative-working diazonium salt layers ZA819020B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19813100259 DE3100259A1 (de) 1981-01-08 1981-01-08 Verfahren und entwicklergemisch zum entwickeln von belichteten negativ arbeitenden diazoniumsalzschichten

Publications (1)

Publication Number Publication Date
ZA819020B true ZA819020B (en) 1982-11-24

Family

ID=6122275

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA819020A ZA819020B (en) 1981-01-08 1981-12-30 Developer mixture and process for developing exposed negative-working diazonium salt layers

Country Status (10)

Country Link
US (1) US4395480A (en, 2012)
EP (1) EP0056138B1 (en, 2012)
JP (1) JPS57136647A (en, 2012)
AT (1) ATE12322T1 (en, 2012)
AU (1) AU546819B2 (en, 2012)
BR (1) BR8200054A (en, 2012)
CA (1) CA1165164A (en, 2012)
DE (2) DE3100259A1 (en, 2012)
FI (1) FI71024C (en, 2012)
ZA (1) ZA819020B (en, 2012)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3439597A1 (de) * 1984-10-30 1986-04-30 Hoechst Ag, 6230 Frankfurt Entwickler fuer belichtete negativ arbeitende reproduktionsschichten sowie verfahren zur herstellung von druckformen und verwendung des entwicklers
US4786582A (en) * 1985-08-02 1988-11-22 Hoechst Celanese Corporation Organic solvent free developer for photosensitive coatings
GB8628613D0 (en) * 1986-11-29 1987-01-07 Horsell Graphic Ind Ltd Developing fluid for lithographic plates
US5081003A (en) * 1987-07-27 1992-01-14 Hoechst Celanese Corporation Developer compositions for newspaper plates
US5278030A (en) * 1988-10-24 1994-01-11 Du Pont-Howson Limited Developer solution comprising ethyl hexyl sulphate, a surfactant, an alkaline material and having a pH of not less than 12
US5122438A (en) * 1989-11-02 1992-06-16 Konica Corporation Method for developing a waterless light-sensitive lithographic plate
DE69325043T2 (de) * 1992-02-07 2000-05-25 Tadahiro Ohmi, Sendai Lithographischer Entwickler und lithographisches Verfahren
US6007970A (en) * 1992-02-07 1999-12-28 Canon Kabushiki Kaisha Lithographic developer containing surfactant
DE69321627T2 (de) * 1992-02-10 1999-04-22 Canon K.K., Tokio/Tokyo Lithographisches Verfahren
US5316892A (en) * 1992-07-23 1994-05-31 Eastman Kodak Company Method for developing lithographic printing plates
US5279927A (en) * 1992-07-23 1994-01-18 Eastman Kodak Company Aqueous developer for lithographic printing plates with improved desensitizing capability
US5380623A (en) * 1992-12-17 1995-01-10 Eastman Kodak Company Aqueous developer for lithographic printing plates which provides improved oleophilicity
EP0602736B1 (en) * 1992-12-17 1997-11-05 Eastman Kodak Company Aqueous developer for lithographic printing plates which exhibits reduced sludge formation
DE10028586C2 (de) * 2000-06-14 2002-04-11 Weforma Gmbh Stoßdämpfer
DE602005009617D1 (de) * 2004-07-29 2008-10-23 Fujifilm Corp Verfahren zur Herstellung lithographischer Druckplatten
US20110236832A1 (en) * 2010-03-26 2011-09-29 Celin Savariar-Hauck Lithographic processing solutions and methods of use
US8846299B2 (en) 2010-03-26 2014-09-30 Eastman Kodak Company Methods for preparing lithograhic printing plates
JP7656925B2 (ja) 2020-01-14 2025-04-04 株式会社小泉製作所 自転車用ベル
US20210364924A1 (en) * 2020-05-21 2021-11-25 Taiwan Semiconductor Manufacturing Company, Ltd. Photoresist developer and method of manufacturing a semiconductor device

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1047016B (de) 1956-06-26 1958-12-18 Aufa G M B H Fabrikation Von O Verfahren zur Herstellung von Flachdruckformen
NL267572A (en, 2012) * 1960-07-29
BE624160A (en, 2012) * 1961-10-30
GB1220808A (en) * 1967-05-18 1971-01-27 Howson Algraphy Ltd Processing of presensitized photolithographic printing plate
US3669660A (en) * 1970-05-21 1972-06-13 Polychrome Corp Lithographic plate developing composition and process of use thereof
GB1383679A (en) * 1971-07-31 1974-02-12 Mita Industrial Co Ltd Process for development of two-component diazotype photosensitive materials
US4147545A (en) * 1972-11-02 1979-04-03 Polychrome Corporation Photolithographic developing composition with organic lithium compound
DE2353992C2 (de) * 1972-11-02 1982-12-02 Polychrome Corp., 10702 Yonkers, N.Y. Wäßriger Eintwickler für Flachdruckplatten und dessen Verwendung
DE2530502C2 (de) * 1974-07-22 1985-07-18 American Hoechst Corp., Bridgewater, N.J. Verfahren zum gleichzeitigen Entwickeln und Konservieren von Druckplatten sowie dafür geeignete Behandlungslösung
JPS5344202A (en) * 1976-10-01 1978-04-20 Fuji Photo Film Co Ltd Developer composition and developing method
DE2809774A1 (de) 1978-03-07 1979-09-13 Hoechst Ag Verfahren und entwicklerloesung zum entwickeln von belichteten lichtempfindlichen kopierschichten
DE3162627D1 (en) * 1980-01-29 1984-07-12 Vickers Ltd Developers and methods of processing radiation sensitive plates using the same

Also Published As

Publication number Publication date
ATE12322T1 (de) 1985-04-15
AU7917882A (en) 1982-07-15
BR8200054A (pt) 1982-10-26
US4395480A (en) 1983-07-26
EP0056138B1 (de) 1985-03-20
EP0056138A1 (de) 1982-07-21
CA1165164A (en) 1984-04-10
AU546819B2 (en) 1985-09-19
FI820027L (fi) 1982-07-09
FI71024C (fi) 1986-10-27
DE3169477D1 (en) 1985-04-25
FI71024B (fi) 1986-07-18
JPS57136647A (en) 1982-08-23
JPH0141974B2 (en, 2012) 1989-09-08
DE3100259A1 (de) 1982-08-05

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