DE69325043T2 - Lithographischer Entwickler und lithographisches Verfahren - Google Patents

Lithographischer Entwickler und lithographisches Verfahren

Info

Publication number
DE69325043T2
DE69325043T2 DE69325043T DE69325043T DE69325043T2 DE 69325043 T2 DE69325043 T2 DE 69325043T2 DE 69325043 T DE69325043 T DE 69325043T DE 69325043 T DE69325043 T DE 69325043T DE 69325043 T2 DE69325043 T2 DE 69325043T2
Authority
DE
Germany
Prior art keywords
resist
dissolving
developer
lithographic developer
lithographic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69325043T
Other languages
English (en)
Other versions
DE69325043D1 (de
Inventor
Tadahiro Ohmi
Hisayuki Shimada
Shigeki Shimomura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
OHMI, TADAHIRO, SENDAI, MIYAGI, JP CANON K.K., TOK
Original Assignee
Tadahiro Ohmi
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP4233082A external-priority patent/JPH05303208A/ja
Application filed by Tadahiro Ohmi filed Critical Tadahiro Ohmi
Publication of DE69325043D1 publication Critical patent/DE69325043D1/de
Application granted granted Critical
Publication of DE69325043T2 publication Critical patent/DE69325043T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Dry Development In Electrophotography (AREA)
DE69325043T 1992-02-07 1993-02-05 Lithographischer Entwickler und lithographisches Verfahren Expired - Lifetime DE69325043T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP5708192 1992-02-07
JP4233082A JPH05303208A (ja) 1992-02-07 1992-08-07 リソグラフィ用現像液及びリソグラフィ工程
JP4233080A JPH05303207A (ja) 1992-02-07 1992-08-07 リソグラフィ用現像液及びリソグラフィ工程

Publications (2)

Publication Number Publication Date
DE69325043D1 DE69325043D1 (de) 1999-07-01
DE69325043T2 true DE69325043T2 (de) 2000-05-25

Family

ID=27296136

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69325043T Expired - Lifetime DE69325043T2 (de) 1992-02-07 1993-02-05 Lithographischer Entwickler und lithographisches Verfahren

Country Status (3)

Country Link
EP (1) EP0555098B1 (de)
AT (1) ATE180583T1 (de)
DE (1) DE69325043T2 (de)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1722275B1 (de) 2005-05-10 2010-10-27 Agfa Graphics N.V. Verfahren zur Verarbeitung von Flachdruckplatten

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3100259A1 (de) * 1981-01-08 1982-08-05 Hoechst Ag, 6000 Frankfurt Verfahren und entwicklergemisch zum entwickeln von belichteten negativ arbeitenden diazoniumsalzschichten
US4670372A (en) * 1984-10-15 1987-06-02 Petrarch Systems, Inc. Process of developing radiation imaged photoresist with alkaline developer solution including a carboxylated surfactant
US4749640A (en) * 1986-09-02 1988-06-07 Monsanto Company Integrated circuit manufacturing process
GB8628613D0 (en) * 1986-11-29 1987-01-07 Horsell Graphic Ind Ltd Developing fluid for lithographic plates
DE3884825D1 (de) * 1987-02-16 1993-11-18 Konishiroku Photo Ind Entwickler für lichtempfindliche lithographische Druckplatte, gemeinschaftlich verarbeitungsfähig für den Negativ-Typ und den Positiv-Typ und Entwicklerzusammensetzung für lichtempfindliches Material.

Also Published As

Publication number Publication date
ATE180583T1 (de) 1999-06-15
DE69325043D1 (de) 1999-07-01
EP0555098A1 (de) 1993-08-11
EP0555098B1 (de) 1999-05-26

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Legal Events

Date Code Title Description
8332 No legal effect for de
8370 Indication related to discontinuation of the patent is to be deleted
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: OHMI, TADAHIRO, SENDAI, MIYAGI, JP CANON K.K., TOK

R071 Expiry of right

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