FI820027L - Foerfarande och framkallningsblandning foer framstaellning av exponerande negativt arbetande diaxoniumsaltskikt - Google Patents

Foerfarande och framkallningsblandning foer framstaellning av exponerande negativt arbetande diaxoniumsaltskikt

Info

Publication number
FI820027L
FI820027L FI820027A FI820027A FI820027L FI 820027 L FI820027 L FI 820027L FI 820027 A FI820027 A FI 820027A FI 820027 A FI820027 A FI 820027A FI 820027 L FI820027 L FI 820027L
Authority
FI
Finland
Prior art keywords
percent
weight
exposure
negative
diaxonium
Prior art date
Application number
FI820027A
Other languages
English (en)
Other versions
FI71024B (fi
FI71024C (fi
Inventor
Gerhard Sprintschnik
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of FI820027L publication Critical patent/FI820027L/fi
Publication of FI71024B publication Critical patent/FI71024B/fi
Application granted granted Critical
Publication of FI71024C publication Critical patent/FI71024C/fi

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Developing Agents For Electrophotography (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
FI820027A 1981-01-08 1982-01-06 Foerfarande och framkallningsblandning foer framstaellning av exponerande negativt arbetande diaxoniumsaltskikt FI71024C (fi)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE3100259 1981-01-08
DE19813100259 DE3100259A1 (de) 1981-01-08 1981-01-08 Verfahren und entwicklergemisch zum entwickeln von belichteten negativ arbeitenden diazoniumsalzschichten

Publications (3)

Publication Number Publication Date
FI820027L true FI820027L (fi) 1982-07-09
FI71024B FI71024B (fi) 1986-07-18
FI71024C FI71024C (fi) 1986-10-27

Family

ID=6122275

Family Applications (1)

Application Number Title Priority Date Filing Date
FI820027A FI71024C (fi) 1981-01-08 1982-01-06 Foerfarande och framkallningsblandning foer framstaellning av exponerande negativt arbetande diaxoniumsaltskikt

Country Status (10)

Country Link
US (1) US4395480A (fi)
EP (1) EP0056138B1 (fi)
JP (1) JPS57136647A (fi)
AT (1) ATE12322T1 (fi)
AU (1) AU546819B2 (fi)
BR (1) BR8200054A (fi)
CA (1) CA1165164A (fi)
DE (2) DE3100259A1 (fi)
FI (1) FI71024C (fi)
ZA (1) ZA819020B (fi)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3439597A1 (de) * 1984-10-30 1986-04-30 Hoechst Ag, 6230 Frankfurt Entwickler fuer belichtete negativ arbeitende reproduktionsschichten sowie verfahren zur herstellung von druckformen und verwendung des entwicklers
US4786582A (en) * 1985-08-02 1988-11-22 Hoechst Celanese Corporation Organic solvent free developer for photosensitive coatings
GB8628613D0 (en) * 1986-11-29 1987-01-07 Horsell Graphic Ind Ltd Developing fluid for lithographic plates
US5081003A (en) * 1987-07-27 1992-01-14 Hoechst Celanese Corporation Developer compositions for newspaper plates
US5278030A (en) * 1988-10-24 1994-01-11 Du Pont-Howson Limited Developer solution comprising ethyl hexyl sulphate, a surfactant, an alkaline material and having a pH of not less than 12
US5122438A (en) * 1989-11-02 1992-06-16 Konica Corporation Method for developing a waterless light-sensitive lithographic plate
EP0555098B1 (en) * 1992-02-07 1999-05-26 Tadahiro Ohmi Lithographic developer and lithographic process
US6007970A (en) * 1992-02-07 1999-12-28 Canon Kabushiki Kaisha Lithographic developer containing surfactant
DE69321627T2 (de) * 1992-02-10 1999-04-22 Canon K.K., Tokio/Tokyo Lithographisches Verfahren
US5316892A (en) * 1992-07-23 1994-05-31 Eastman Kodak Company Method for developing lithographic printing plates
US5279927A (en) * 1992-07-23 1994-01-18 Eastman Kodak Company Aqueous developer for lithographic printing plates with improved desensitizing capability
EP0602736B1 (en) * 1992-12-17 1997-11-05 Eastman Kodak Company Aqueous developer for lithographic printing plates which exhibits reduced sludge formation
US5380623A (en) * 1992-12-17 1995-01-10 Eastman Kodak Company Aqueous developer for lithographic printing plates which provides improved oleophilicity
DE10028586C2 (de) * 2000-06-14 2002-04-11 Weforma Gmbh Stoßdämpfer
EP1621339B1 (en) * 2004-07-29 2008-09-10 FUJIFILM Corporation Plate-making method of lithographic printing plate
US8846299B2 (en) 2010-03-26 2014-09-30 Eastman Kodak Company Methods for preparing lithograhic printing plates
US20110236832A1 (en) * 2010-03-26 2011-09-29 Celin Savariar-Hauck Lithographic processing solutions and methods of use
CN114981155A (zh) 2020-01-14 2022-08-30 株式会社小泉制作所 自行车用铃

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE606642A (fi) * 1960-07-29
BE624160A (fi) * 1961-10-30
GB1220808A (en) * 1967-05-18 1971-01-27 Howson Algraphy Ltd Processing of presensitized photolithographic printing plate
US3669660A (en) * 1970-05-21 1972-06-13 Polychrome Corp Lithographic plate developing composition and process of use thereof
GB1383679A (en) * 1971-07-31 1974-02-12 Mita Industrial Co Ltd Process for development of two-component diazotype photosensitive materials
US4147545A (en) * 1972-11-02 1979-04-03 Polychrome Corporation Photolithographic developing composition with organic lithium compound
DE2353992C2 (de) * 1972-11-02 1982-12-02 Polychrome Corp., 10702 Yonkers, N.Y. Wäßriger Eintwickler für Flachdruckplatten und dessen Verwendung
DE2530502C2 (de) * 1974-07-22 1985-07-18 American Hoechst Corp., Bridgewater, N.J. Verfahren zum gleichzeitigen Entwickeln und Konservieren von Druckplatten sowie dafür geeignete Behandlungslösung
JPS5344202A (en) * 1976-10-01 1978-04-20 Fuji Photo Film Co Ltd Developer composition and developing method
GB2068136B (en) * 1980-01-29 1984-09-05 Vickers Ltd Developers for lithographic printing plates

Also Published As

Publication number Publication date
DE3169477D1 (en) 1985-04-25
EP0056138A1 (de) 1982-07-21
US4395480A (en) 1983-07-26
FI71024B (fi) 1986-07-18
DE3100259A1 (de) 1982-08-05
JPH0141974B2 (fi) 1989-09-08
ZA819020B (en) 1982-11-24
JPS57136647A (en) 1982-08-23
ATE12322T1 (de) 1985-04-15
BR8200054A (pt) 1982-10-26
FI71024C (fi) 1986-10-27
AU546819B2 (en) 1985-09-19
AU7917882A (en) 1982-07-15
CA1165164A (en) 1984-04-10
EP0056138B1 (de) 1985-03-20

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Legal Events

Date Code Title Description
MM Patent lapsed
MM Patent lapsed

Owner name: HOECHST AKTIENGESELLSCHAFT