ZA813969B - Light-sensitive copying material and process for the manufacture thereof - Google Patents
Light-sensitive copying material and process for the manufacture thereofInfo
- Publication number
- ZA813969B ZA813969B ZA813969A ZA813969A ZA813969B ZA 813969 B ZA813969 B ZA 813969B ZA 813969 A ZA813969 A ZA 813969A ZA 813969 A ZA813969 A ZA 813969A ZA 813969 B ZA813969 B ZA 813969B
- Authority
- ZA
- South Africa
- Prior art keywords
- light
- copying material
- manufacture
- sensitive copying
- polysiloxane
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
- G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19803022473 DE3022473A1 (de) | 1980-06-14 | 1980-06-14 | Lichtempfindliches kopiermaterial und verfahren zu seiner herstellung |
Publications (1)
Publication Number | Publication Date |
---|---|
ZA813969B true ZA813969B (en) | 1982-06-30 |
Family
ID=6104709
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ZA813969A ZA813969B (en) | 1980-06-14 | 1981-06-12 | Light-sensitive copying material and process for the manufacture thereof |
Country Status (9)
Country | Link |
---|---|
US (1) | US4510227A (xx) |
EP (1) | EP0042104B1 (xx) |
JP (1) | JPS5740248A (xx) |
AT (1) | ATE11603T1 (xx) |
AU (1) | AU541474B2 (xx) |
BR (1) | BR8103763A (xx) |
CA (1) | CA1174097A (xx) |
DE (2) | DE3022473A1 (xx) |
ZA (1) | ZA813969B (xx) |
Families Citing this family (48)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5968735A (ja) * | 1982-10-13 | 1984-04-18 | Tokyo Ohka Kogyo Co Ltd | 感光性組成物 |
JPS59155836A (ja) * | 1983-02-24 | 1984-09-05 | Tokyo Ohka Kogyo Co Ltd | 感光性組成物 |
JPS59222843A (ja) * | 1983-06-01 | 1984-12-14 | Toray Ind Inc | ネガ型湿し水不要平版印刷版の製法 |
JPS6037549A (ja) * | 1983-08-10 | 1985-02-26 | Fuji Photo Film Co Ltd | 光可溶化組成物 |
DE3473359D1 (de) * | 1983-06-29 | 1988-09-15 | Fuji Photo Film Co Ltd | Photosolubilizable composition |
DE3323343A1 (de) * | 1983-06-29 | 1985-01-10 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches gemisch und daraus hergestelltes kopiermaterial |
JPS6024545A (ja) * | 1983-07-21 | 1985-02-07 | Japan Synthetic Rubber Co Ltd | ポジ型感光性樹脂組成物 |
JPS6043651A (ja) * | 1983-08-19 | 1985-03-08 | Matsushita Electric Ind Co Ltd | 耐プラズマ性レジスト |
JPS60186837A (ja) * | 1984-03-07 | 1985-09-24 | Somar Corp | 感光性組成物 |
EP0164083B1 (de) * | 1984-06-07 | 1991-05-02 | Hoechst Aktiengesellschaft | Positiv arbeitende strahlungsempfindliche Beschichtungslösung |
US5066561A (en) * | 1984-06-11 | 1991-11-19 | Hoechst Celanese Corporation | Method for producing and using a positive photoresist with o-quinone diazide, novolak, and propylene glycol alkyl ether acetate |
US4550069A (en) * | 1984-06-11 | 1985-10-29 | American Hoechst Corporation | Positive photoresist compositions with o-quinone diazide, novolak, and propylene glycol alkyl ether acetate |
US5143814A (en) * | 1984-06-11 | 1992-09-01 | Hoechst Celanese Corporation | Positive photoresist compositions with o-quinone diazide, novolak and propylene glycol alkyl ether acetate |
DE3430712A1 (de) * | 1984-08-21 | 1986-03-06 | Hoechst Ag, 6230 Frankfurt | Verfahren zur reduzierung von unterstrahlungen bei der bestrahlung von reproduktionsschichten |
DE3605144A1 (de) * | 1985-02-19 | 1986-08-21 | Canon K.K., Tokio/Tokyo | Bildtraegermaterial |
US5264319A (en) * | 1985-05-10 | 1993-11-23 | Hitachi, Ltd. | Photosensitive resin composition having high resistance to oxygen plasma, containing alkali-soluble organosilicon polymer and photosensitive dissolution inhibitor |
US4691039A (en) * | 1985-11-15 | 1987-09-01 | Minnesota Mining And Manufacturing Company | Ethoxylated siloxane surfactants and hydrophilic silicones prepared therewith |
US4657959A (en) * | 1985-11-15 | 1987-04-14 | Minnesota Mining And Manufacturing Company | Hydrophilic silicones |
US4752633A (en) * | 1985-11-15 | 1988-06-21 | Minnesota Mining And Manufacturing Co. | Ethoxylated siloxane surfactants and hydrophilic silicones prepared therewith |
US4822716A (en) * | 1985-12-27 | 1989-04-18 | Kabushiki Kaisha Toshiba | Polysilanes, Polysiloxanes and silicone resist materials containing these compounds |
JPH0772799B2 (ja) * | 1986-08-13 | 1995-08-02 | ソニー株式会社 | レジスト材料 |
US4782009A (en) * | 1987-04-03 | 1988-11-01 | General Electric Company | Method of coating and imaging photopatternable silicone polyamic acid |
US4855199A (en) * | 1987-04-03 | 1989-08-08 | General Electric Company | Photopatterned product of silicone polyamic acid on a transparent substrate |
US5284729A (en) * | 1989-07-14 | 1994-02-08 | Canon Kabushiki Kaisha | Coating composition for electrophotographic photosensitive member and method for forming electrophotographic photosensitive coating film by use thereof |
US5302249A (en) * | 1990-01-25 | 1994-04-12 | Xerox Corporation | Treated papers |
DE4126836A1 (de) * | 1991-08-14 | 1993-02-18 | Hoechst Ag | Strahlungsempfindliches aufzeichnungsmaterial aus schichttraeger und positiv arbeitender, strahlungsempfindlicher schicht mit rauher oberflaeche |
JP2828572B2 (ja) * | 1993-02-08 | 1998-11-25 | 信越化学工業株式会社 | ジフェノール酸第三級ブチルエステル誘導体及びそれを含有するポジ型レジスト材料 |
AU661438B1 (en) * | 1994-01-25 | 1995-07-20 | Morton International, Inc. | Waterborne photoresists having polysiloxanes |
GB9622657D0 (en) | 1996-10-31 | 1997-01-08 | Horsell Graphic Ind Ltd | Direct positive lithographic plate |
GB9722862D0 (en) * | 1997-10-29 | 1997-12-24 | Horsell Graphic Ind Ltd | Pattern formation |
JP3859849B2 (ja) * | 1997-11-28 | 2006-12-20 | 旭化成ケミカルズ株式会社 | 凸版印刷用感光性樹脂版 |
JP2002023350A (ja) | 2000-07-07 | 2002-01-23 | Fuji Photo Film Co Ltd | ネガ型平版印刷版原版 |
JP4512281B2 (ja) | 2001-02-22 | 2010-07-28 | 富士フイルム株式会社 | ネガ型平版印刷版原版 |
JP4266077B2 (ja) | 2001-03-26 | 2009-05-20 | 富士フイルム株式会社 | 平版印刷版原版及び平版印刷方法 |
JP4213366B2 (ja) | 2001-06-12 | 2009-01-21 | Azエレクトロニックマテリアルズ株式会社 | 厚膜レジストパターンの形成方法 |
EP1403043B1 (en) * | 2002-09-30 | 2009-04-15 | FUJIFILM Corporation | Polymerizable composition and planographic printing plate precursor |
JP2004126050A (ja) * | 2002-09-30 | 2004-04-22 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
JP4137577B2 (ja) * | 2002-09-30 | 2008-08-20 | 富士フイルム株式会社 | 感光性組成物 |
CN100590525C (zh) * | 2002-12-18 | 2010-02-17 | 富士胶片株式会社 | 可聚合组合物和平版印刷版前体 |
JP4150261B2 (ja) * | 2003-01-14 | 2008-09-17 | 富士フイルム株式会社 | 平版印刷版原版の製版方法 |
JP2004252201A (ja) * | 2003-02-20 | 2004-09-09 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
JP4048134B2 (ja) * | 2003-02-21 | 2008-02-13 | 富士フイルム株式会社 | 平版印刷版原版 |
JP2004252285A (ja) * | 2003-02-21 | 2004-09-09 | Fuji Photo Film Co Ltd | 感光性組成物及びそれを用いた平版印刷版原版 |
JP4048133B2 (ja) * | 2003-02-21 | 2008-02-13 | 富士フイルム株式会社 | 感光性組成物及びそれを用いた平版印刷版原版 |
JP4299639B2 (ja) * | 2003-07-29 | 2009-07-22 | 富士フイルム株式会社 | 重合性組成物及びそれを用いた画像記録材料 |
JP2005099284A (ja) * | 2003-09-24 | 2005-04-14 | Fuji Photo Film Co Ltd | 感光性組成物及び平版印刷版原版 |
US20070202438A1 (en) * | 2006-02-24 | 2007-08-30 | Konica Minolta Medical & Graphic, Inc. | Light sensitive planographic printing plate material and its manufacturing process |
GB2439734A (en) | 2006-06-30 | 2008-01-09 | Peter Andrew Reath Bennett | Coating for a lithographic precursor and use thereof |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3647444A (en) * | 1959-07-21 | 1972-03-07 | Eastman Kodak Co | Lithographic printing plate prepared from linear light-sensitive polymers containing the styryl ketone group |
US3545970A (en) * | 1968-04-29 | 1970-12-08 | Eastman Kodak Co | Photographic processes utilizing siloxane water spotting inhibitors |
US3671240A (en) * | 1970-06-10 | 1972-06-20 | Eastman Kodak Co | Photographic transfer elements and processes for preparing and using them |
GB1345976A (en) * | 1971-07-07 | 1974-02-06 | Bieganski Z | Stripping tools |
SU423087A1 (ru) * | 1972-01-10 | 1974-04-05 | А. И. Пудовик, Р. А. Черкасов, Е. А. Зимкин, Л. Б. Брайнин, | Фотографический материал |
US3779774A (en) * | 1972-05-09 | 1973-12-18 | Xidex Corp | Silicone surfactants for vesicular films |
JPS4968803A (xx) * | 1972-11-02 | 1974-07-03 | ||
GB1523762A (en) * | 1975-02-25 | 1978-09-06 | Oce Van Der Grinten Nv | Photocopying materials |
US4116786A (en) * | 1976-06-08 | 1978-09-26 | Union Carbide Corporation | Radiation curable coating compositions containing an acrylate-capped, polyether urethane and a polysiloxane |
JPS5587151A (en) * | 1978-12-25 | 1980-07-01 | Mitsubishi Chem Ind Ltd | Developing solution composition for lithographic printing plate |
-
1980
- 1980-06-14 DE DE19803022473 patent/DE3022473A1/de not_active Withdrawn
-
1981
- 1981-06-03 CA CA000378953A patent/CA1174097A/en not_active Expired
- 1981-06-03 DE DE8181104259T patent/DE3168599D1/de not_active Expired
- 1981-06-03 EP EP81104259A patent/EP0042104B1/de not_active Expired
- 1981-06-03 AT AT81104259T patent/ATE11603T1/de not_active IP Right Cessation
- 1981-06-11 AU AU71628/81A patent/AU541474B2/en not_active Ceased
- 1981-06-11 JP JP56088945A patent/JPS5740248A/ja active Granted
- 1981-06-12 ZA ZA813969A patent/ZA813969B/xx unknown
- 1981-06-12 BR BR8103763A patent/BR8103763A/pt not_active IP Right Cessation
-
1983
- 1983-08-15 US US06/523,358 patent/US4510227A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
AU7162881A (en) | 1982-03-04 |
EP0042104B1 (de) | 1985-01-30 |
BR8103763A (pt) | 1982-03-02 |
CA1174097A (en) | 1984-09-11 |
US4510227A (en) | 1985-04-09 |
ATE11603T1 (de) | 1985-02-15 |
JPS6356530B2 (xx) | 1988-11-08 |
EP0042104A1 (de) | 1981-12-23 |
DE3168599D1 (en) | 1985-03-14 |
AU541474B2 (en) | 1985-01-10 |
JPS5740248A (en) | 1982-03-05 |
DE3022473A1 (de) | 1981-12-24 |
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