BR8103763A - Material copiador fotossensivel e processo para o revestimento de um suporte de camada com uma camada copiadora fotossensivel - Google Patents

Material copiador fotossensivel e processo para o revestimento de um suporte de camada com uma camada copiadora fotossensivel

Info

Publication number
BR8103763A
BR8103763A BR8103763A BR8103763A BR8103763A BR 8103763 A BR8103763 A BR 8103763A BR 8103763 A BR8103763 A BR 8103763A BR 8103763 A BR8103763 A BR 8103763A BR 8103763 A BR8103763 A BR 8103763A
Authority
BR
Brazil
Prior art keywords
photosensitive
copier
layer
coating
support
Prior art date
Application number
BR8103763A
Other languages
English (en)
Inventor
K Reiss
D Mohr
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of BR8103763A publication Critical patent/BR8103763A/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Laminated Bodies (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
BR8103763A 1980-06-14 1981-06-12 Material copiador fotossensivel e processo para o revestimento de um suporte de camada com uma camada copiadora fotossensivel BR8103763A (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19803022473 DE3022473A1 (de) 1980-06-14 1980-06-14 Lichtempfindliches kopiermaterial und verfahren zu seiner herstellung

Publications (1)

Publication Number Publication Date
BR8103763A true BR8103763A (pt) 1982-03-02

Family

ID=6104709

Family Applications (1)

Application Number Title Priority Date Filing Date
BR8103763A BR8103763A (pt) 1980-06-14 1981-06-12 Material copiador fotossensivel e processo para o revestimento de um suporte de camada com uma camada copiadora fotossensivel

Country Status (9)

Country Link
US (1) US4510227A (pt)
EP (1) EP0042104B1 (pt)
JP (1) JPS5740248A (pt)
AT (1) ATE11603T1 (pt)
AU (1) AU541474B2 (pt)
BR (1) BR8103763A (pt)
CA (1) CA1174097A (pt)
DE (2) DE3022473A1 (pt)
ZA (1) ZA813969B (pt)

Families Citing this family (48)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5968735A (ja) * 1982-10-13 1984-04-18 Tokyo Ohka Kogyo Co Ltd 感光性組成物
JPS59155836A (ja) * 1983-02-24 1984-09-05 Tokyo Ohka Kogyo Co Ltd 感光性組成物
JPS59222843A (ja) * 1983-06-01 1984-12-14 Toray Ind Inc ネガ型湿し水不要平版印刷版の製法
DE3323343A1 (de) * 1983-06-29 1985-01-10 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch und daraus hergestelltes kopiermaterial
JPS6037549A (ja) * 1983-08-10 1985-02-26 Fuji Photo Film Co Ltd 光可溶化組成物
EP0130599B1 (en) * 1983-06-29 1988-08-10 Fuji Photo Film Co., Ltd. Photosolubilizable composition
JPS6024545A (ja) * 1983-07-21 1985-02-07 Japan Synthetic Rubber Co Ltd ポジ型感光性樹脂組成物
JPS6043651A (ja) * 1983-08-19 1985-03-08 Matsushita Electric Ind Co Ltd 耐プラズマ性レジスト
JPS60186837A (ja) * 1984-03-07 1985-09-24 Somar Corp 感光性組成物
EP0164083B1 (de) * 1984-06-07 1991-05-02 Hoechst Aktiengesellschaft Positiv arbeitende strahlungsempfindliche Beschichtungslösung
US4550069A (en) * 1984-06-11 1985-10-29 American Hoechst Corporation Positive photoresist compositions with o-quinone diazide, novolak, and propylene glycol alkyl ether acetate
US5066561A (en) * 1984-06-11 1991-11-19 Hoechst Celanese Corporation Method for producing and using a positive photoresist with o-quinone diazide, novolak, and propylene glycol alkyl ether acetate
US5143814A (en) * 1984-06-11 1992-09-01 Hoechst Celanese Corporation Positive photoresist compositions with o-quinone diazide, novolak and propylene glycol alkyl ether acetate
DE3430712A1 (de) * 1984-08-21 1986-03-06 Hoechst Ag, 6230 Frankfurt Verfahren zur reduzierung von unterstrahlungen bei der bestrahlung von reproduktionsschichten
US4716091A (en) * 1985-02-19 1987-12-29 Canon Kabushiki Kaisha Electrophotographic member with silicone graft copolymer in surface layer
US5264319A (en) * 1985-05-10 1993-11-23 Hitachi, Ltd. Photosensitive resin composition having high resistance to oxygen plasma, containing alkali-soluble organosilicon polymer and photosensitive dissolution inhibitor
US4691039A (en) * 1985-11-15 1987-09-01 Minnesota Mining And Manufacturing Company Ethoxylated siloxane surfactants and hydrophilic silicones prepared therewith
US4752633A (en) * 1985-11-15 1988-06-21 Minnesota Mining And Manufacturing Co. Ethoxylated siloxane surfactants and hydrophilic silicones prepared therewith
US4657959A (en) * 1985-11-15 1987-04-14 Minnesota Mining And Manufacturing Company Hydrophilic silicones
US4822716A (en) * 1985-12-27 1989-04-18 Kabushiki Kaisha Toshiba Polysilanes, Polysiloxanes and silicone resist materials containing these compounds
JPH0772799B2 (ja) * 1986-08-13 1995-08-02 ソニー株式会社 レジスト材料
US4855199A (en) * 1987-04-03 1989-08-08 General Electric Company Photopatterned product of silicone polyamic acid on a transparent substrate
US4782009A (en) * 1987-04-03 1988-11-01 General Electric Company Method of coating and imaging photopatternable silicone polyamic acid
US5284729A (en) * 1989-07-14 1994-02-08 Canon Kabushiki Kaisha Coating composition for electrophotographic photosensitive member and method for forming electrophotographic photosensitive coating film by use thereof
US5302249A (en) * 1990-01-25 1994-04-12 Xerox Corporation Treated papers
DE4126836A1 (de) * 1991-08-14 1993-02-18 Hoechst Ag Strahlungsempfindliches aufzeichnungsmaterial aus schichttraeger und positiv arbeitender, strahlungsempfindlicher schicht mit rauher oberflaeche
JP2828572B2 (ja) * 1993-02-08 1998-11-25 信越化学工業株式会社 ジフェノール酸第三級ブチルエステル誘導体及びそれを含有するポジ型レジスト材料
AU661438B1 (en) * 1994-01-25 1995-07-20 Morton International, Inc. Waterborne photoresists having polysiloxanes
GB9622657D0 (en) 1996-10-31 1997-01-08 Horsell Graphic Ind Ltd Direct positive lithographic plate
GB9722862D0 (en) * 1997-10-29 1997-12-24 Horsell Graphic Ind Ltd Pattern formation
JP3859849B2 (ja) * 1997-11-28 2006-12-20 旭化成ケミカルズ株式会社 凸版印刷用感光性樹脂版
JP2002023350A (ja) * 2000-07-07 2002-01-23 Fuji Photo Film Co Ltd ネガ型平版印刷版原版
JP4512281B2 (ja) 2001-02-22 2010-07-28 富士フイルム株式会社 ネガ型平版印刷版原版
JP4266077B2 (ja) 2001-03-26 2009-05-20 富士フイルム株式会社 平版印刷版原版及び平版印刷方法
JP4213366B2 (ja) * 2001-06-12 2009-01-21 Ａｚエレクトロニックマテリアルズ株式会社 厚膜レジストパターンの形成方法
JP4137577B2 (ja) * 2002-09-30 2008-08-20 富士フイルム株式会社 感光性組成物
JP2004126050A (ja) * 2002-09-30 2004-04-22 Fuji Photo Film Co Ltd 平版印刷版原版
DE60327141D1 (de) * 2002-09-30 2009-05-28 Fujifilm Corp Polymerisierbare Zusammensetzung und Flachdruckplattenvorläufer
US8110337B2 (en) * 2002-12-18 2012-02-07 Fujifilm Corporation Polymerizable composition and lithographic printing plate precursor
JP4150261B2 (ja) * 2003-01-14 2008-09-17 富士フイルム株式会社 平版印刷版原版の製版方法
JP2004252201A (ja) * 2003-02-20 2004-09-09 Fuji Photo Film Co Ltd 平版印刷版原版
JP4048134B2 (ja) * 2003-02-21 2008-02-13 富士フイルム株式会社 平版印刷版原版
JP4048133B2 (ja) * 2003-02-21 2008-02-13 富士フイルム株式会社 感光性組成物及びそれを用いた平版印刷版原版
JP2004252285A (ja) * 2003-02-21 2004-09-09 Fuji Photo Film Co Ltd 感光性組成物及びそれを用いた平版印刷版原版
JP4299639B2 (ja) * 2003-07-29 2009-07-22 富士フイルム株式会社 重合性組成物及びそれを用いた画像記録材料
JP2005099284A (ja) * 2003-09-24 2005-04-14 Fuji Photo Film Co Ltd 感光性組成物及び平版印刷版原版
US20070202438A1 (en) * 2006-02-24 2007-08-30 Konica Minolta Medical & Graphic, Inc. Light sensitive planographic printing plate material and its manufacturing process
GB2439734A (en) 2006-06-30 2008-01-09 Peter Andrew Reath Bennett Coating for a lithographic precursor and use thereof

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3647444A (en) * 1959-07-21 1972-03-07 Eastman Kodak Co Lithographic printing plate prepared from linear light-sensitive polymers containing the styryl ketone group
US3545970A (en) * 1968-04-29 1970-12-08 Eastman Kodak Co Photographic processes utilizing siloxane water spotting inhibitors
US3671240A (en) * 1970-06-10 1972-06-20 Eastman Kodak Co Photographic transfer elements and processes for preparing and using them
GB1345976A (en) * 1971-07-07 1974-02-06 Bieganski Z Stripping tools
SU423087A1 (ru) * 1972-01-10 1974-04-05 А. И. Пудовик, Р. А. Черкасов, Е. А. Зимкин, Л. Б. Брайнин, Фотографический материал
US3779774A (en) * 1972-05-09 1973-12-18 Xidex Corp Silicone surfactants for vesicular films
JPS4968803A (pt) * 1972-11-02 1974-07-03
GB1523762A (en) * 1975-02-25 1978-09-06 Oce Van Der Grinten Nv Photocopying materials
US4116786A (en) * 1976-06-08 1978-09-26 Union Carbide Corporation Radiation curable coating compositions containing an acrylate-capped, polyether urethane and a polysiloxane
JPS5587151A (en) * 1978-12-25 1980-07-01 Mitsubishi Chem Ind Ltd Developing solution composition for lithographic printing plate

Also Published As

Publication number Publication date
JPS6356530B2 (pt) 1988-11-08
EP0042104A1 (de) 1981-12-23
ZA813969B (en) 1982-06-30
US4510227A (en) 1985-04-09
DE3168599D1 (en) 1985-03-14
AU541474B2 (en) 1985-01-10
DE3022473A1 (de) 1981-12-24
ATE11603T1 (de) 1985-02-15
AU7162881A (en) 1982-03-04
JPS5740248A (en) 1982-03-05
CA1174097A (en) 1984-09-11
EP0042104B1 (de) 1985-01-30

Similar Documents

Publication Publication Date Title
BR8103763A (pt) Material copiador fotossensivel e processo para o revestimento de um suporte de camada com uma camada copiadora fotossensivel
DE3789780D1 (de) Durchsichtiges Folienmaterial für elektrostatische Kopiergeräte.
BR8103762A (pt) Material copiador fotossensivel e proecesso para o revestimento de um suporte de camada com uma camada copiadora fotossensivel
IT7828816A0 (it) Tamburo da stampa per processo di fotocopiatura elettrostatico.
MX5757E (es) Procedimiento para la preparacion de particulas portadoras revestidas utiles en mezclas reveladoras electrostatograficas para el revelado de imagenes electrostaticas latentes
DE3685309D1 (de) Toner zur entwicklung elektrostatischer bilder.
DE3382714T2 (de) Elektrostatisches Kopiergerät.
DE3789924T2 (de) Tonerzusammensetzung für elektrophotographie.
ES506092A0 (es) Metodo de fabricacion de papeles y cartones enlucidos
BR8006818A (pt) Processo e conjunto para a representacao de uma imagem de semitons
IT8120202A0 (it) Apparecchiatura per sviluppare immagini elettrostatiche latenti.
IT7928005A0 (it) Copiatrice elettrostatica.
ES484973A0 (es) Instalacion para la combustion de materias residuales.
IT8022680A0 (it) Toner elettrofotofrafico.
BR8108717A (pt) Processo para fixacao de um latex de um polimero formador de pelicula
DK376783A (da) Fremkaldemaskine for film
KR890007121A (ko) 현상장치
ATA851178A (de) Elektrofotografisches kopiergeraet
DE69103921D1 (de) Flüssigentwickler für elektrostatische Photographie.
DE3777988D1 (de) Toner fuer die entwicklung elektrostatischer ladungsbilder.
AT362232B (de) Einrichtung zur wiedergabe der nachtraeglichen synchronen uebersetzung der sprache von film- kopien mit lichtton
JPS5342826A (en) Image supporting material
MX149874A (es) Procedimiento mejorado para el tratamiento de un destilado de petroleo que contiene mercaptanos
IT8019812A0 (it) Composizione di emulsione eprocedimento per il trattamento difibre di vetro per rinforzo di materie plastiche e simili.
KR910003435A (ko) 현상 방법

Legal Events

Date Code Title Description
MK Patent expired

Effective date: 19960612