ZA794131B - Process for the development of exposed light-sensitive printing plates based on o-naphthoquinone-diazides - Google Patents

Process for the development of exposed light-sensitive printing plates based on o-naphthoquinone-diazides

Info

Publication number
ZA794131B
ZA794131B ZA00794131A ZA794131A ZA794131B ZA 794131 B ZA794131 B ZA 794131B ZA 00794131 A ZA00794131 A ZA 00794131A ZA 794131 A ZA794131 A ZA 794131A ZA 794131 B ZA794131 B ZA 794131B
Authority
ZA
South Africa
Prior art keywords
development
naphthoquinone
printing plates
diazides
sensitive printing
Prior art date
Application number
ZA00794131A
Other languages
English (en)
Inventor
E Hackmann
G Berghaeuser
P Stahlhofen
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of ZA794131B publication Critical patent/ZA794131B/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Materials For Photolithography (AREA)
  • Eye Examination Apparatus (AREA)
  • Measurement Of The Respiration, Hearing Ability, Form, And Blood Characteristics Of Living Organisms (AREA)
ZA00794131A 1978-08-10 1979-08-08 Process for the development of exposed light-sensitive printing plates based on o-naphthoquinone-diazides ZA794131B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19782834958 DE2834958A1 (de) 1978-08-10 1978-08-10 Verfahren zum entwickeln von belichteten lichtempfindlichen druckplatten

Publications (1)

Publication Number Publication Date
ZA794131B true ZA794131B (en) 1980-08-27

Family

ID=6046629

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA00794131A ZA794131B (en) 1978-08-10 1979-08-08 Process for the development of exposed light-sensitive printing plates based on o-naphthoquinone-diazides

Country Status (10)

Country Link
EP (1) EP0008394B1 (es)
JP (1) JPS5525100A (es)
AT (1) ATE2637T1 (es)
AU (1) AU531673B2 (es)
BR (2) BR7905131A (es)
CA (1) CA1145190A (es)
DE (2) DE2834958A1 (es)
ES (1) ES483328A1 (es)
FI (1) FI69716C (es)
ZA (1) ZA794131B (es)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5752053A (en) * 1980-09-12 1982-03-27 Asahi Chem Ind Co Ltd Manufacture of photosensitive resin plate
US4330614A (en) * 1980-10-14 1982-05-18 International Business Machines Corporation Process for forming a patterned resist mask
DE3126636A1 (de) 1981-07-06 1983-01-27 Hoechst Ag, 6000 Frankfurt Hydrophilierte traegermaterialien fuer offsetdruckplatten, ein verfahren zu ihrer herstellung und ihre verwendung
DE3126626A1 (de) 1981-07-06 1983-01-20 Hoechst Ag, 6000 Frankfurt Hydrophilierte traegermaterialien fuer offsetdruckplatten, ein verfahren zu ihrer herstellung und ihre verwendung
JPS5854341A (ja) * 1981-09-28 1983-03-31 Fuji Photo Film Co Ltd 現像方法および現像液
JPS58190952A (ja) * 1982-04-30 1983-11-08 Fuji Photo Film Co Ltd 感光性印刷版の現像液
DE3230171A1 (de) * 1982-08-13 1984-02-16 Hoechst Ag, 6230 Frankfurt Waessrig-alkalische loesung und verfahren zum entwickeln von positiv-arbeitenden reproduktionsschichten
JPS5955438A (ja) * 1982-09-24 1984-03-30 Konishiroku Photo Ind Co Ltd 製版方法
JPS5984241A (ja) * 1982-11-05 1984-05-15 Fuji Photo Film Co Ltd 感光性平版印刷版の現像液
JPS59121336A (ja) * 1982-12-28 1984-07-13 Fuji Photo Film Co Ltd 感光性平版印刷版の現像液
JPS6088945A (ja) * 1983-10-20 1985-05-18 Toyobo Co Ltd 画像複製材料用水性処理液
JPS61203456A (ja) * 1985-03-06 1986-09-09 Fuotopori Ouka Kk パタ−ン形成方法
US4931103A (en) * 1988-08-11 1990-06-05 E. I. Du Pont De Nemours And Company Tricholine phosphate surface treating agent
EP0732628A1 (en) 1995-03-07 1996-09-18 Minnesota Mining And Manufacturing Company Aqueous alkaline solution for developing offset printing plate

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB772112A (en) * 1955-07-04 1957-04-10 Warren S D Co Coated paper product for planographic printing masters
BE581434A (es) * 1958-08-08
BE606642A (es) * 1960-07-29
ZA6807938B (es) * 1967-12-04
CA1001473A (en) * 1972-12-22 1976-12-14 Eastman Kodak Company Lithographic printing plate
JPS50108005A (es) * 1974-01-31 1975-08-26
CA1035189A (en) * 1974-02-26 1978-07-25 Richard R. Wells Developer for photosensitive coatings

Also Published As

Publication number Publication date
AU531673B2 (en) 1983-09-01
ATE2637T1 (de) 1983-03-15
BR7905131A (pt) 1980-05-06
FI69716C (fi) 1986-03-10
ES483328A1 (es) 1980-04-16
DE2964899D1 (en) 1983-03-31
CA1145190A (en) 1983-04-26
BR7905153A (pt) 1980-05-06
FI69716B (fi) 1985-11-29
JPH0258618B2 (es) 1990-12-10
FI792465A (fi) 1980-02-11
AU4975779A (en) 1980-02-14
EP0008394A1 (de) 1980-03-05
EP0008394B1 (de) 1983-02-23
JPS5525100A (en) 1980-02-22
DE2834958A1 (de) 1980-02-21

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