CA1035189A - Developer for photosensitive coatings - Google Patents

Developer for photosensitive coatings

Info

Publication number
CA1035189A
CA1035189A CA209,804A CA209804A CA1035189A CA 1035189 A CA1035189 A CA 1035189A CA 209804 A CA209804 A CA 209804A CA 1035189 A CA1035189 A CA 1035189A
Authority
CA
Canada
Prior art keywords
developer
photosensitive coatings
photosensitive
coatings
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA209,804A
Other languages
French (fr)
Other versions
CA209804S (en
Inventor
Richard R. Wells
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CNA Holdings LLC
Original Assignee
American Hoechst Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by American Hoechst Corp filed Critical American Hoechst Corp
Application granted granted Critical
Publication of CA1035189A publication Critical patent/CA1035189A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
CA209,804A 1974-02-26 1974-09-23 Developer for photosensitive coatings Expired CA1035189A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US44592874A 1974-02-26 1974-02-26

Publications (1)

Publication Number Publication Date
CA1035189A true CA1035189A (en) 1978-07-25

Family

ID=23770723

Family Applications (1)

Application Number Title Priority Date Filing Date
CA209,804A Expired CA1035189A (en) 1974-02-26 1974-09-23 Developer for photosensitive coatings

Country Status (6)

Country Link
JP (1) JPS50120627A (en)
BE (1) BE825902A (en)
CA (1) CA1035189A (en)
DE (1) DE2507503A1 (en)
FR (1) FR2262331A1 (en)
NL (1) NL7501968A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5246818A (en) * 1989-08-16 1993-09-21 Hoechst Celanese Corporation Developer composition for positive working color proofing films
CN112305876A (en) * 2019-07-31 2021-02-02 无锡迪思微电子有限公司 Preparation method of developing solution

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2834958A1 (en) * 1978-08-10 1980-02-21 Hoechst Ag METHOD FOR DEVELOPING EXPOSED LIGHT-SENSITIVE PRINTING PLATES
JPS60130741A (en) * 1983-12-19 1985-07-12 Nippon Seihaku Kk Photosensitive lithographic plate developer

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5246818A (en) * 1989-08-16 1993-09-21 Hoechst Celanese Corporation Developer composition for positive working color proofing films
CN112305876A (en) * 2019-07-31 2021-02-02 无锡迪思微电子有限公司 Preparation method of developing solution

Also Published As

Publication number Publication date
NL7501968A (en) 1975-08-28
DE2507503A1 (en) 1975-08-28
BE825902A (en) 1975-08-25
FR2262331A1 (en) 1975-09-19
JPS50120627A (en) 1975-09-22

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