ZA200603081B - Metallization of substrate(s) by a liquid/vapor deposition process - Google Patents
Metallization of substrate(s) by a liquid/vapor deposition process Download PDFInfo
- Publication number
- ZA200603081B ZA200603081B ZA200603081A ZA200603081A ZA200603081B ZA 200603081 B ZA200603081 B ZA 200603081B ZA 200603081 A ZA200603081 A ZA 200603081A ZA 200603081 A ZA200603081 A ZA 200603081A ZA 200603081 B ZA200603081 B ZA 200603081B
- Authority
- ZA
- South Africa
- Prior art keywords
- temperature
- substrate
- metal
- containing precursor
- precursor
- Prior art date
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- 239000000758 substrate Substances 0.000 title claims abstract description 130
- 239000007788 liquid Substances 0.000 title claims abstract description 37
- 238000001465 metallisation Methods 0.000 title description 10
- 238000005019 vapor deposition process Methods 0.000 title description 2
- 239000002243 precursor Substances 0.000 claims abstract description 143
- 238000000034 method Methods 0.000 claims abstract description 99
- 229910052751 metal Inorganic materials 0.000 claims abstract description 82
- 239000002184 metal Substances 0.000 claims abstract description 82
- 239000006163 transport media Substances 0.000 claims abstract description 70
- 238000000151 deposition Methods 0.000 claims abstract description 54
- 238000000354 decomposition reaction Methods 0.000 claims abstract description 41
- 230000008569 process Effects 0.000 claims abstract description 39
- 239000012808 vapor phase Substances 0.000 claims abstract description 17
- 239000000428 dust Substances 0.000 claims abstract description 15
- 229910052782 aluminium Inorganic materials 0.000 claims description 66
- 238000006243 chemical reaction Methods 0.000 claims description 64
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 62
- 230000008021 deposition Effects 0.000 claims description 44
- 238000000576 coating method Methods 0.000 claims description 39
- 239000011248 coating agent Substances 0.000 claims description 28
- 230000006698 induction Effects 0.000 claims description 24
- 239000011261 inert gas Substances 0.000 claims description 22
- 238000010438 heat treatment Methods 0.000 claims description 21
- 238000005260 corrosion Methods 0.000 claims description 15
- 230000007797 corrosion Effects 0.000 claims description 15
- 239000012495 reaction gas Substances 0.000 claims description 12
- 229920006395 saturated elastomer Polymers 0.000 claims description 12
- 239000007921 spray Substances 0.000 claims description 10
- 150000001875 compounds Chemical class 0.000 claims description 6
- 230000001939 inductive effect Effects 0.000 claims description 5
- 238000001816 cooling Methods 0.000 claims description 3
- 238000005259 measurement Methods 0.000 claims description 3
- 239000002245 particle Substances 0.000 claims description 3
- 239000006227 byproduct Substances 0.000 abstract description 7
- 238000004519 manufacturing process Methods 0.000 abstract description 7
- 238000005137 deposition process Methods 0.000 abstract description 5
- 239000010409 thin film Substances 0.000 abstract description 5
- 239000012298 atmosphere Substances 0.000 abstract description 3
- 239000007789 gas Substances 0.000 description 43
- 230000032258 transport Effects 0.000 description 33
- MCULRUJILOGHCJ-UHFFFAOYSA-N triisobutylaluminium Chemical compound CC(C)C[Al](CC(C)C)CC(C)C MCULRUJILOGHCJ-UHFFFAOYSA-N 0.000 description 21
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 19
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 15
- 238000000889 atomisation Methods 0.000 description 13
- 238000002347 injection Methods 0.000 description 12
- 239000007924 injection Substances 0.000 description 12
- 229910052709 silver Inorganic materials 0.000 description 12
- 239000004332 silver Substances 0.000 description 12
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 11
- 239000000203 mixture Substances 0.000 description 11
- 238000005229 chemical vapour deposition Methods 0.000 description 10
- VOITXYVAKOUIBA-UHFFFAOYSA-N triethylaluminium Chemical compound CC[Al](CC)CC VOITXYVAKOUIBA-UHFFFAOYSA-N 0.000 description 9
- 239000000243 solution Substances 0.000 description 8
- -1 e.g. Inorganic materials 0.000 description 7
- 239000010408 film Substances 0.000 description 7
- 229910052757 nitrogen Inorganic materials 0.000 description 7
- 239000000523 sample Substances 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 6
- 239000011521 glass Substances 0.000 description 6
- 239000012705 liquid precursor Substances 0.000 description 6
- 230000001965 increasing effect Effects 0.000 description 5
- 239000003595 mist Substances 0.000 description 5
- 239000012071 phase Substances 0.000 description 5
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 4
- 125000000217 alkyl group Chemical group 0.000 description 4
- SIPUZPBQZHNSDW-UHFFFAOYSA-N bis(2-methylpropyl)aluminum Chemical compound CC(C)C[Al]CC(C)C SIPUZPBQZHNSDW-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 238000007747 plating Methods 0.000 description 4
- 150000003839 salts Chemical class 0.000 description 4
- 238000012546 transfer Methods 0.000 description 4
- 229910052725 zinc Inorganic materials 0.000 description 4
- 239000011701 zinc Substances 0.000 description 4
- 238000013459 approach Methods 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 239000000470 constituent Substances 0.000 description 3
- HQWPLXHWEZZGKY-UHFFFAOYSA-N diethylzinc Chemical compound CC[Zn]CC HQWPLXHWEZZGKY-UHFFFAOYSA-N 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- SQBBHCOIQXKPHL-UHFFFAOYSA-N tributylalumane Chemical compound CCCC[Al](CCCC)CCCC SQBBHCOIQXKPHL-UHFFFAOYSA-N 0.000 description 3
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 2
- 229910000975 Carbon steel Inorganic materials 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 229910001297 Zn alloy Inorganic materials 0.000 description 2
- 230000001464 adherent effect Effects 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 238000009529 body temperature measurement Methods 0.000 description 2
- 239000010962 carbon steel Substances 0.000 description 2
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 2
- 239000012159 carrier gas Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 230000002939 deleterious effect Effects 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- HJXBDPDUCXORKZ-UHFFFAOYSA-N diethylalumane Chemical compound CC[AlH]CC HJXBDPDUCXORKZ-UHFFFAOYSA-N 0.000 description 2
- 230000005674 electromagnetic induction Effects 0.000 description 2
- 239000003446 ligand Substances 0.000 description 2
- 239000007791 liquid phase Substances 0.000 description 2
- 229910001338 liquidmetal Inorganic materials 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 238000010926 purge Methods 0.000 description 2
- 239000005297 pyrex Substances 0.000 description 2
- 239000000376 reactant Substances 0.000 description 2
- 238000005057 refrigeration Methods 0.000 description 2
- HEPBQSXQJMTVFI-UHFFFAOYSA-N zinc;butane Chemical compound [Zn+2].CCC[CH2-].CCC[CH2-] HEPBQSXQJMTVFI-UHFFFAOYSA-N 0.000 description 2
- LQIIEHBULBHJKX-UHFFFAOYSA-N 2-methylpropylalumane Chemical compound CC(C)C[AlH2] LQIIEHBULBHJKX-UHFFFAOYSA-N 0.000 description 1
- 229910001369 Brass Inorganic materials 0.000 description 1
- 229910000906 Bronze Inorganic materials 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- 241000124033 Salix Species 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 125000005595 acetylacetonate group Chemical group 0.000 description 1
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical group [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 1
- 229920003235 aromatic polyamide Polymers 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 235000021053 average weight gain Nutrition 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 230000001588 bifunctional effect Effects 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 239000010974 bronze Substances 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000012459 cleaning agent Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 230000003750 conditioning effect Effects 0.000 description 1
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- TUTOKIOKAWTABR-UHFFFAOYSA-N dimethylalumane Chemical compound C[AlH]C TUTOKIOKAWTABR-UHFFFAOYSA-N 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000000454 electroless metal deposition Methods 0.000 description 1
- 229940096118 ella Drugs 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000011552 falling film Substances 0.000 description 1
- 239000008241 heterogeneous mixture Substances 0.000 description 1
- 239000008240 homogeneous mixture Substances 0.000 description 1
- 150000004678 hydrides Chemical class 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000007373 indentation Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000002609 medium Substances 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 150000002902 organometallic compounds Chemical class 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 238000011176 pooling Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000002028 premature Effects 0.000 description 1
- 238000004886 process control Methods 0.000 description 1
- 239000011253 protective coating Substances 0.000 description 1
- 239000012713 reactive precursor Substances 0.000 description 1
- 230000003134 recirculating effect Effects 0.000 description 1
- 229930195734 saturated hydrocarbon Natural products 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000000344 soap Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 238000010408 sweeping Methods 0.000 description 1
- 238000012956 testing procedure Methods 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- JLTRXTDYQLMHGR-UHFFFAOYSA-N trimethylaluminium Chemical compound C[Al](C)C JLTRXTDYQLMHGR-UHFFFAOYSA-N 0.000 description 1
- 238000009827 uniform distribution Methods 0.000 description 1
- 229930195735 unsaturated hydrocarbon Natural products 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 239000006200 vaporizer Substances 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
- 235000019786 weight gain Nutrition 0.000 description 1
- 230000004584 weight gain Effects 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
- C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
- C23C16/18—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
- C23C16/18—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds
- C23C16/20—Deposition of aluminium only
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4486—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by producing an aerosol and subsequent evaporation of the droplets or particles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12736—Al-base component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31678—Of metal
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Dispersion Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US50464103P | 2003-09-19 | 2003-09-19 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ZA200603081B true ZA200603081B (en) | 2007-07-25 |
Family
ID=34375529
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ZA200603081A ZA200603081B (en) | 2003-09-19 | 2006-04-18 | Metallization of substrate(s) by a liquid/vapor deposition process |
Country Status (17)
| Country | Link |
|---|---|
| US (1) | US7387815B2 (ja) |
| EP (1) | EP1664379B1 (ja) |
| JP (2) | JP5193466B2 (ja) |
| KR (1) | KR101162077B1 (ja) |
| CN (1) | CN1853003B (ja) |
| AT (1) | ATE466119T1 (ja) |
| BR (1) | BRPI0414547A (ja) |
| CA (1) | CA2538897C (ja) |
| DE (1) | DE602004026889D1 (ja) |
| ES (1) | ES2345109T3 (ja) |
| HK (1) | HK1096129A1 (ja) |
| MX (1) | MXPA06003060A (ja) |
| PL (1) | PL1664379T3 (ja) |
| RU (1) | RU2330122C2 (ja) |
| TW (1) | TWI349953B (ja) |
| WO (1) | WO2005028704A1 (ja) |
| ZA (1) | ZA200603081B (ja) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
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| DE102007004570A1 (de) | 2007-01-30 | 2008-07-31 | Daimler Ag | Glänzende Beschichtungen für Aluminium- oder Stahloberflächen und deren Herstellung |
| WO2010049024A1 (en) * | 2008-10-31 | 2010-05-06 | Oerlikon Solar Ip Ag, Truebbach | Precursor recycling |
| DE102008055147A1 (de) | 2008-12-23 | 2010-07-01 | Eisenwerk Erla Gmbh | Verfahren zur Beschichtung von temperatur- und/oder heißmedienbeaufschlagten Bauteilen sowie heißmedien- und/oder temperaturbeaufschlagtes Bauteil |
| WO2010151430A1 (en) * | 2009-06-22 | 2010-12-29 | Arkema Inc. | Chemical vapor deposition using n,o polydentate ligand complexes of metals |
| US20120189868A1 (en) * | 2009-07-31 | 2012-07-26 | Akzo Nobel Chemicals International B.V. | Process for the preparation of a coated substrate, coated substrate, and use thereof |
| DE102009037116A1 (de) | 2009-07-31 | 2011-02-03 | Elringklinger Ag | Metallische Dichtungslage für eine Dichtungsplatte einer Flachdichtung |
| US20110206844A1 (en) * | 2010-02-24 | 2011-08-25 | Jacob Grant Wiles | Chromium-free passivation of vapor deposited aluminum surfaces |
| US9194039B2 (en) * | 2011-03-15 | 2015-11-24 | Directed Vapor Technologies International | Method for applying aluminum alloy coatings for corrosion protection of steel |
| WO2012160040A1 (en) | 2011-05-25 | 2012-11-29 | Akzo Nobel Chemicals International B.V. | Process for depositing metal on one or more substrates, coated substrate, and use thereof |
| US8728240B2 (en) | 2012-05-02 | 2014-05-20 | Msp Corporation | Apparatus for vapor condensation and recovery |
| KR102194821B1 (ko) * | 2013-10-17 | 2020-12-24 | 삼성디스플레이 주식회사 | 유기물 증착 장치 및 유기물 증착 방법 |
| SG11201605837TA (en) * | 2014-03-03 | 2016-08-30 | Picosun Oy | Protecting an interior of a gas container with an ald coating |
| US9797042B2 (en) | 2014-05-15 | 2017-10-24 | Lam Research Corporation | Single ALD cycle thickness control in multi-station substrate deposition systems |
| FR3045673B1 (fr) * | 2015-12-18 | 2020-02-28 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | Procede de depot d'un revetement par dli-mocvd avec recyclage du compose precurseur |
| US20170314129A1 (en) * | 2016-04-29 | 2017-11-02 | Lam Research Corporation | Variable cycle and time rf activation method for film thickness matching in a multi-station deposition system |
| RU2618278C1 (ru) * | 2016-05-04 | 2017-05-03 | Федеральное государственное бюджетное учреждение науки Институт металлоорганической химии им. Г.А. Разуваева Российской академии наук (ИМХ РАН) | Способ получения гибридного материала на основе многостенных углеродных нанотрубок, декорированных дистанционно разделенными кристаллическими наночастицами алюминия |
| US10697059B2 (en) | 2017-09-15 | 2020-06-30 | Lam Research Corporation | Thickness compensation by modulation of number of deposition cycles as a function of chamber accumulation for wafer to wafer film thickness matching |
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| US2599978A (en) * | 1949-04-15 | 1952-06-10 | Ohio Commw Eng Co | Process of plating carrier particles with a catalytic metal |
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| US2700365A (en) * | 1951-10-08 | 1955-01-25 | Ohio Commw Eng Co | Apparatus for plating surfaces with carbonyls and other volatile metal bearing compounds |
| US2824828A (en) * | 1955-05-12 | 1958-02-25 | Ohio Commw Eng Co | Colored glass fibers and method of producing the same |
| US3041197A (en) * | 1959-06-01 | 1962-06-26 | Berger Carl | Coating surfaces with aluminum |
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| US3251712A (en) * | 1962-09-21 | 1966-05-17 | Berger Carl | Metal plating with a heated hydrocarbon solution of a group via metal carbonyl |
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| US3578494A (en) * | 1969-04-09 | 1971-05-11 | Continental Oil Co | Zinc plating by chemical reduction |
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| FR2633642B1 (fr) * | 1988-07-01 | 1992-06-19 | Cepromag Ct Rech Promo Magnes | Procede de realisation d'un film protecteur sur un substrat a base de magnesium, application a la protection des alliages de magnesium, substrats obtenus |
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| US4923717A (en) * | 1989-03-17 | 1990-05-08 | Regents Of The University Of Minnesota | Process for the chemical vapor deposition of aluminum |
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| US5314727A (en) * | 1992-07-28 | 1994-05-24 | Minnesota Mining & Mfg. Co./Regents Of The University Of Minnesota | Chemical vapor deposition of iron, ruthenium, and osmium |
| US5290602A (en) * | 1992-10-19 | 1994-03-01 | Union Carbide Chemicals & Plastics Technology Corporation | Hindered-hydroxyl functional (meth) acrylate-containing copolymers particularly suitable for use in coating compositions which are sprayed with compressed fluids as viscosity reducing diluents |
| CA2152969A1 (en) * | 1994-07-26 | 1996-01-27 | Ping Chang | Method for vacuum plasma protective treatment of metal substrates |
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| US5951791A (en) * | 1997-12-01 | 1999-09-14 | Inco Limited | Method of preparing porous nickel-aluminum structures |
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| US6136725A (en) * | 1998-04-14 | 2000-10-24 | Cvd Systems, Inc. | Method for chemical vapor deposition of a material on a substrate |
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| US6451375B1 (en) * | 2001-01-05 | 2002-09-17 | International Business Machines Corporation | Process for depositing a film on a nanometer structure |
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-
2004
- 2004-09-16 MX MXPA06003060A patent/MXPA06003060A/es active IP Right Grant
- 2004-09-16 EP EP20040784286 patent/EP1664379B1/en not_active Not-in-force
- 2004-09-16 RU RU2006113115A patent/RU2330122C2/ru not_active IP Right Cessation
- 2004-09-16 DE DE200460026889 patent/DE602004026889D1/de active Active
- 2004-09-16 US US10/943,098 patent/US7387815B2/en not_active Expired - Fee Related
- 2004-09-16 BR BRPI0414547 patent/BRPI0414547A/pt not_active Application Discontinuation
- 2004-09-16 JP JP2006527027A patent/JP5193466B2/ja not_active Expired - Fee Related
- 2004-09-16 CA CA2538897A patent/CA2538897C/en not_active Expired - Fee Related
- 2004-09-16 KR KR1020067005372A patent/KR101162077B1/ko not_active IP Right Cessation
- 2004-09-16 WO PCT/US2004/030376 patent/WO2005028704A1/en active Application Filing
- 2004-09-16 PL PL04784286T patent/PL1664379T3/pl unknown
- 2004-09-16 CN CN2004800270607A patent/CN1853003B/zh not_active Expired - Fee Related
- 2004-09-16 ES ES04784286T patent/ES2345109T3/es active Active
- 2004-09-16 AT AT04784286T patent/ATE466119T1/de active
- 2004-09-17 TW TW093128290A patent/TWI349953B/zh not_active IP Right Cessation
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2006
- 2006-04-18 ZA ZA200603081A patent/ZA200603081B/en unknown
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2007
- 2007-03-26 HK HK07103191A patent/HK1096129A1/xx unknown
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- 2011-07-25 JP JP2011162303A patent/JP5548168B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| RU2330122C2 (ru) | 2008-07-27 |
| JP5548168B2 (ja) | 2014-07-16 |
| TW200514146A (en) | 2005-04-16 |
| PL1664379T3 (pl) | 2010-10-29 |
| JP5193466B2 (ja) | 2013-05-08 |
| HK1096129A1 (en) | 2007-05-25 |
| CN1853003A (zh) | 2006-10-25 |
| ATE466119T1 (de) | 2010-05-15 |
| RU2006113115A (ru) | 2007-11-20 |
| CA2538897C (en) | 2011-08-09 |
| EP1664379B1 (en) | 2010-04-28 |
| MXPA06003060A (es) | 2006-05-31 |
| DE602004026889D1 (de) | 2010-06-10 |
| JP2011236507A (ja) | 2011-11-24 |
| KR101162077B1 (ko) | 2012-07-03 |
| CN1853003B (zh) | 2010-04-28 |
| BRPI0414547A (pt) | 2006-11-07 |
| JP2007505994A (ja) | 2007-03-15 |
| WO2005028704A1 (en) | 2005-03-31 |
| US20050064211A1 (en) | 2005-03-24 |
| ES2345109T3 (es) | 2010-09-15 |
| TWI349953B (en) | 2011-10-01 |
| EP1664379A1 (en) | 2006-06-07 |
| US7387815B2 (en) | 2008-06-17 |
| KR20060090978A (ko) | 2006-08-17 |
| CA2538897A1 (en) | 2005-03-31 |
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