ZA200300111B - Activation of a cathode. - Google Patents
Activation of a cathode. Download PDFInfo
- Publication number
- ZA200300111B ZA200300111B ZA200300111A ZA200300111A ZA200300111B ZA 200300111 B ZA200300111 B ZA 200300111B ZA 200300111 A ZA200300111 A ZA 200300111A ZA 200300111 A ZA200300111 A ZA 200300111A ZA 200300111 B ZA200300111 B ZA 200300111B
- Authority
- ZA
- South Africa
- Prior art keywords
- cathode
- electrocatalytic
- solution
- coating solution
- acid
- Prior art date
Links
- 230000004913 activation Effects 0.000 title claims abstract description 15
- 239000011248 coating agent Substances 0.000 claims abstract description 42
- 238000000576 coating method Methods 0.000 claims abstract description 42
- 238000000034 method Methods 0.000 claims abstract description 28
- 229910052751 metal Inorganic materials 0.000 claims abstract description 19
- 239000002184 metal Substances 0.000 claims abstract description 19
- 239000002904 solvent Substances 0.000 claims abstract description 19
- 239000000758 substrate Substances 0.000 claims abstract description 18
- 239000002253 acid Substances 0.000 claims abstract description 14
- 150000002739 metals Chemical class 0.000 claims abstract description 10
- 150000003839 salts Chemical class 0.000 claims abstract description 10
- 150000007513 acids Chemical class 0.000 claims abstract description 8
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims abstract description 6
- 150000008044 alkali metal hydroxides Chemical class 0.000 claims abstract description 6
- 239000000460 chlorine Substances 0.000 claims abstract description 6
- 229910021645 metal ion Inorganic materials 0.000 claims abstract description 6
- 239000002244 precipitate Substances 0.000 claims abstract description 5
- 238000001035 drying Methods 0.000 claims abstract description 4
- 239000000243 solution Substances 0.000 claims description 51
- 229910052703 rhodium Inorganic materials 0.000 claims description 12
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical group [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 11
- 239000000203 mixture Substances 0.000 claims description 9
- 239000008139 complexing agent Substances 0.000 claims description 7
- 229910052801 chlorine Inorganic materials 0.000 claims description 5
- 229910052759 nickel Inorganic materials 0.000 claims description 5
- -1 pB-aminopropionate Chemical compound 0.000 claims description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 5
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 claims description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 4
- 150000001298 alcohols Chemical class 0.000 claims description 4
- 229910045601 alloy Inorganic materials 0.000 claims description 4
- 239000000956 alloy Substances 0.000 claims description 4
- 229910052763 palladium Inorganic materials 0.000 claims description 3
- 229910052697 platinum Inorganic materials 0.000 claims description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 claims description 2
- DHMQDGOQFOQNFH-UHFFFAOYSA-M Aminoacetate Chemical compound NCC([O-])=O DHMQDGOQFOQNFH-UHFFFAOYSA-M 0.000 claims description 2
- KRKNYBCHXYNGOX-UHFFFAOYSA-K Citrate Chemical compound [O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O KRKNYBCHXYNGOX-UHFFFAOYSA-K 0.000 claims description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 2
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 claims description 2
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 claims description 2
- AEMRFAOFKBGASW-UHFFFAOYSA-M Glycolate Chemical compound OCC([O-])=O AEMRFAOFKBGASW-UHFFFAOYSA-M 0.000 claims description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-L Malonate Chemical compound [O-]C(=O)CC([O-])=O OFOBLEOULBTSOW-UHFFFAOYSA-L 0.000 claims description 2
- IOVCWXUNBOPUCH-UHFFFAOYSA-N Nitrous acid Chemical compound ON=O IOVCWXUNBOPUCH-UHFFFAOYSA-N 0.000 claims description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 claims description 2
- 229910000831 Steel Inorganic materials 0.000 claims description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical compound OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 claims description 2
- 150000003863 ammonium salts Chemical class 0.000 claims description 2
- 239000003637 basic solution Substances 0.000 claims description 2
- 239000010941 cobalt Substances 0.000 claims description 2
- 229910017052 cobalt Inorganic materials 0.000 claims description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 2
- 239000010949 copper Substances 0.000 claims description 2
- 229910052802 copper Inorganic materials 0.000 claims description 2
- XPPKVPWEQAFLFU-UHFFFAOYSA-J diphosphate(4-) Chemical compound [O-]P([O-])(=O)OP([O-])([O-])=O XPPKVPWEQAFLFU-UHFFFAOYSA-J 0.000 claims description 2
- 235000011180 diphosphates Nutrition 0.000 claims description 2
- 235000011187 glycerol Nutrition 0.000 claims description 2
- 229910052737 gold Inorganic materials 0.000 claims description 2
- 239000010931 gold Substances 0.000 claims description 2
- 229910052741 iridium Inorganic materials 0.000 claims description 2
- 229910052742 iron Inorganic materials 0.000 claims description 2
- 229940049920 malate Drugs 0.000 claims description 2
- BJEPYKJPYRNKOW-UHFFFAOYSA-N malic acid Chemical compound OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 claims description 2
- ACVYVLVWPXVTIT-UHFFFAOYSA-N phosphinic acid Chemical compound O[PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-N 0.000 claims description 2
- 229910052707 ruthenium Inorganic materials 0.000 claims description 2
- 239000010959 steel Substances 0.000 claims description 2
- KDYFGRWQOYBRFD-UHFFFAOYSA-L succinate(2-) Chemical compound [O-]C(=O)CCC([O-])=O KDYFGRWQOYBRFD-UHFFFAOYSA-L 0.000 claims description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-M Lactate Chemical compound CC(O)C([O-])=O JVTAAEKCZFNVCJ-UHFFFAOYSA-M 0.000 claims 1
- 229910001854 alkali hydroxide Inorganic materials 0.000 abstract 1
- 229910001902 chlorine oxide Inorganic materials 0.000 abstract 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 16
- 239000010948 rhodium Substances 0.000 description 14
- 238000004140 cleaning Methods 0.000 description 12
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 10
- 239000003638 chemical reducing agent Substances 0.000 description 7
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 239000012487 rinsing solution Substances 0.000 description 6
- 238000007254 oxidation reaction Methods 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- 238000006722 reduction reaction Methods 0.000 description 5
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000010422 painting Methods 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical group [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 238000001556 precipitation Methods 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 230000009849 deactivation Effects 0.000 description 3
- 239000003792 electrolyte Substances 0.000 description 3
- 150000007524 organic acids Chemical class 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 230000007420 reactivation Effects 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 2
- 230000003213 activating effect Effects 0.000 description 2
- 239000003518 caustics Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005868 electrolysis reaction Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 150000007522 mineralic acids Chemical class 0.000 description 2
- 229910000510 noble metal Inorganic materials 0.000 description 2
- 235000006408 oxalic acid Nutrition 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- XMIIGOLPHOKFCH-UHFFFAOYSA-N 3-phenylpropionic acid Chemical compound OC(=O)CCC1=CC=CC=C1 XMIIGOLPHOKFCH-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- KWSLGOVYXMQPPX-UHFFFAOYSA-N 5-[3-(trifluoromethyl)phenyl]-2h-tetrazole Chemical compound FC(F)(F)C1=CC=CC(C2=NNN=N2)=C1 KWSLGOVYXMQPPX-UHFFFAOYSA-N 0.000 description 1
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 1
- 235000011054 acetic acid Nutrition 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- RJTANRZEWTUVMA-UHFFFAOYSA-N boron;n-methylmethanamine Chemical compound [B].CNC RJTANRZEWTUVMA-UHFFFAOYSA-N 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 230000000536 complexating effect Effects 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000005202 decontamination Methods 0.000 description 1
- 230000003588 decontaminative effect Effects 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 150000002815 nickel Chemical class 0.000 description 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- 230000000750 progressive effect Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 150000003283 rhodium Chemical class 0.000 description 1
- SONJTKJMTWTJCT-UHFFFAOYSA-K rhodium(iii) chloride Chemical class [Cl-].[Cl-].[Cl-].[Rh+3] SONJTKJMTWTJCT-UHFFFAOYSA-K 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000010944 silver (metal) Substances 0.000 description 1
- 229910001379 sodium hypophosphite Inorganic materials 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- QFJIELFEXWAVLU-UHFFFAOYSA-H tetrachloroplatinum(2+) dichloride Chemical compound Cl[Pt](Cl)(Cl)(Cl)(Cl)Cl QFJIELFEXWAVLU-UHFFFAOYSA-H 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/42—Coating with noble metals
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
- C25B11/075—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of a single catalytic element or catalytic compound
- C25B11/081—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of a single catalytic element or catalytic compound the element being a noble metal
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electrochemistry (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Electrodes For Compound Or Non-Metal Manufacture (AREA)
- Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
- Cold Cathode And The Manufacture (AREA)
- Gas-Filled Discharge Tubes (AREA)
- Solid Thermionic Cathode (AREA)
- Chemically Coating (AREA)
- Secondary Cells (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP00850124 | 2000-07-06 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ZA200300111B true ZA200300111B (en) | 2004-01-21 |
Family
ID=27741095
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ZA200300111A ZA200300111B (en) | 2000-07-06 | 2003-01-06 | Activation of a cathode. |
Country Status (11)
| Country | Link |
|---|---|
| EP (1) | EP1297200B1 (zh) |
| JP (1) | JP3867913B2 (zh) |
| KR (1) | KR100546928B1 (zh) |
| CN (1) | CN1242099C (zh) |
| AT (1) | ATE350513T1 (zh) |
| AU (2) | AU2001266502B2 (zh) |
| BR (1) | BR0112203B1 (zh) |
| CA (1) | CA2415020C (zh) |
| DE (1) | DE60125763T2 (zh) |
| WO (1) | WO2002002847A1 (zh) |
| ZA (1) | ZA200300111B (zh) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4771467B2 (ja) * | 2005-11-17 | 2011-09-14 | 東亞合成株式会社 | 高純度水酸化アルカリ金属の製造方法 |
| EP1939182A1 (de) * | 2006-12-22 | 2008-07-02 | Speedel Experimenta AG | Verfahren zur Herstellung von (R oder S)-2-Alkyl-3-heterocyclyl-1-propanolen |
| US8349165B2 (en) | 2008-11-25 | 2013-01-08 | Tokuyama Corporation | Process for producing an active cathode for electrolysis |
| DK3417093T3 (da) * | 2016-03-31 | 2020-07-06 | Siemens Ag | Teknik til in-situ-anodeaktivering ved hjælp af en katode i en alkalisk vandelektrolysecelle |
| JP6672211B2 (ja) | 2017-03-21 | 2020-03-25 | 株式会社東芝 | 二酸化炭素電解装置および二酸化炭素電解方法 |
| US11629418B2 (en) | 2018-11-30 | 2023-04-18 | Sedo Engineering Sa | By-products (impurity) removal |
| WO2020109595A1 (en) | 2018-11-30 | 2020-06-04 | Sedo Engineering Sa | Electrochemical reactor and its cleaning or regeneration |
| WO2020109577A1 (en) | 2018-11-30 | 2020-06-04 | Sedo Engineering Sa | Leucodye (such as leucoindigo) as dispersing aid |
| CN115398039A (zh) * | 2020-03-25 | 2022-11-25 | 美铝美国公司 | 涂铜的二硼化钛制品 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2074190B (en) * | 1980-04-22 | 1984-03-14 | Johnson Matthey Co Ltd | Electrode |
| US5476688A (en) * | 1988-08-29 | 1995-12-19 | Ostolski; Marian J. | Process for the preparation of noble metal coated non-noble metal substrates, coated materials produced in accordance therewith and compositions utilizing the coated materials |
| US5035789A (en) * | 1990-05-29 | 1991-07-30 | The Dow Chemical Company | Electrocatalytic cathodes and methods of preparation |
-
2001
- 2001-06-25 EP EP01944058A patent/EP1297200B1/en not_active Expired - Lifetime
- 2001-06-25 AT AT01944058T patent/ATE350513T1/de not_active IP Right Cessation
- 2001-06-25 CA CA002415020A patent/CA2415020C/en not_active Expired - Fee Related
- 2001-06-25 BR BRPI0112203-7A patent/BR0112203B1/pt not_active IP Right Cessation
- 2001-06-25 DE DE60125763T patent/DE60125763T2/de not_active Expired - Lifetime
- 2001-06-25 KR KR1020027017509A patent/KR100546928B1/ko not_active IP Right Cessation
- 2001-06-25 CN CNB018123732A patent/CN1242099C/zh not_active Expired - Fee Related
- 2001-06-25 WO PCT/SE2001/001447 patent/WO2002002847A1/en active IP Right Grant
- 2001-06-25 JP JP2002507088A patent/JP3867913B2/ja not_active Expired - Fee Related
- 2001-06-25 AU AU2001266502A patent/AU2001266502B2/en not_active Ceased
- 2001-06-25 AU AU6650201A patent/AU6650201A/xx active Pending
-
2003
- 2003-01-06 ZA ZA200300111A patent/ZA200300111B/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| EP1297200A1 (en) | 2003-04-02 |
| AU2001266502B2 (en) | 2004-05-20 |
| ATE350513T1 (de) | 2007-01-15 |
| CN1440467A (zh) | 2003-09-03 |
| DE60125763D1 (de) | 2007-02-15 |
| CA2415020A1 (en) | 2002-01-10 |
| CN1242099C (zh) | 2006-02-15 |
| AU6650201A (en) | 2002-01-14 |
| JP2004502035A (ja) | 2004-01-22 |
| EP1297200B1 (en) | 2007-01-03 |
| CA2415020C (en) | 2008-06-10 |
| WO2002002847A1 (en) | 2002-01-10 |
| KR100546928B1 (ko) | 2006-01-26 |
| DE60125763T2 (de) | 2007-10-18 |
| BR0112203B1 (pt) | 2012-05-15 |
| JP3867913B2 (ja) | 2007-01-17 |
| BR0112203A (pt) | 2003-05-13 |
| KR20030013453A (ko) | 2003-02-14 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US5882723A (en) | Durable electrode coatings | |
| KR950011405B1 (ko) | 전해용 음극 및 이의 제조방법 | |
| CN101525755A (zh) | 生成氢气用的阴极 | |
| JP2000239882A (ja) | 活性化陰極及びその製造方法 | |
| EP1297200B1 (en) | Activation of a cathode | |
| KR870001769B1 (ko) | 전기화학 전해조용 전극 및 그 제조방법 | |
| JP4882218B2 (ja) | 水素発生用電極およびその製造方法並びにこれを用いた電解方法 | |
| US5035789A (en) | Electrocatalytic cathodes and methods of preparation | |
| US5164062A (en) | Electrocatalytic cathodes and method of preparation | |
| JP2024010240A (ja) | 水素発生用電極の製造方法及び水素発生用電極を用いた電気分解方法 | |
| US7011738B2 (en) | Activation of a cathode | |
| US5227030A (en) | Electrocatalytic cathodes and methods of preparation | |
| JP6753195B2 (ja) | 水素発生用電極の製造方法及び水素発生用電極を用いた電気分解方法 | |
| NL8004057A (nl) | Werkwijze voor de vervaardiging van kathodes met een geringe waterstofoverspanning. | |
| EP0136794B1 (en) | Treatment of cathodes for use in electrolytic cell | |
| JP4103209B2 (ja) | 低水素過電圧電極の洗浄方法 | |
| US5066380A (en) | Electrocatalytic cathodes and method of preparation | |
| JPH0699178A (ja) | 化学メッキ廃液の電解処理方法 | |
| JP6926782B2 (ja) | 水素発生用電極及びその製造方法並びに水素発生用電極を用いた電気分解方法 | |
| US4617196A (en) | Method for treating cathode | |
| JPH0244906B2 (zh) | ||
| JP2002129371A (ja) | 電解用電極及びその製造方法 | |
| EP0920544A1 (en) | Durable electrode coatings | |
| JP2003510182A (ja) | 電気触媒 | |
| JPS58185788A (ja) | 電極の製造方法 |