WO2024084863A1 - Film de base pour bande de fabrication de semi-conducteur - Google Patents

Film de base pour bande de fabrication de semi-conducteur Download PDF

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Publication number
WO2024084863A1
WO2024084863A1 PCT/JP2023/033227 JP2023033227W WO2024084863A1 WO 2024084863 A1 WO2024084863 A1 WO 2024084863A1 JP 2023033227 W JP2023033227 W JP 2023033227W WO 2024084863 A1 WO2024084863 A1 WO 2024084863A1
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stress
elongation
mass
base film
functional layer
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PCT/JP2023/033227
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English (en)
Japanese (ja)
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享之 石本
千亜希 津守
滉主 大島
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タキロンシーアイ株式会社
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Publication of WO2024084863A1 publication Critical patent/WO2024084863A1/fr

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00—Layered products comprising a layer of synthetic resin
    • B32B27/32—Layered products comprising a layer of synthetic resin comprising polyolefins
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Definitions

  • the present invention relates to a substrate film for semiconductor manufacturing tape (hereinafter sometimes simply referred to as "substrate film”).
  • a widely used method for manufacturing semiconductor devices such as IC chips is, for example, to divide a wafer circuit, in which circuits are formed on a roughly disk-shaped semiconductor wafer, by dicing on a semiconductor manufacturing tape (dicing tape) for wafers to obtain individual semiconductor devices. After dicing, the dicing tape is stretched, for example, to form gaps between the semiconductor devices (i.e., expanded), and then each semiconductor device is picked up by a robot or the like.
  • dicing tape semiconductor manufacturing tape
  • a dicing die attach film in which an adhesive layer is laminated onto the adhesive layer of the above-mentioned dicing tape is used as a semiconductor manufacturing tape for wafers.
  • the dicing die attach film is stretched to form gaps between the semiconductor devices, and then the adhesive layer is photocured, and the semiconductor devices are peeled off from the adhesive layer with the adhesive layer still attached and picked up.
  • Dicing tapes and dicing die attach films are generally composed of an adhesive layer for fixing a wafer and a base film containing polyolefin or the like.
  • a base film has been proposed that is composed of a laminate of an intermediate layer composed mainly of a propylene-based random copolymer ( ⁇ ) which is a random copolymer of propylene and ethylene and/or an ⁇ -olefin having 4 to 8 carbon atoms, and which has an ethylene and/or ⁇ -olefin having 4 to 8 carbon atoms content of 6% by weight or more and a density measured in accordance with ASTM D1505 of 885 kg/ m3 or less, and surface layers laminated on both sides of the intermediate layer and composed mainly of a propylene-based random copolymer ( ⁇ ) which has a lower content of ethylene and/or an ⁇ -olefin having 4 to 8 carbon atoms and a higher density than the propylene-based random copolymer ( ⁇ )
  • a substrate film that contains crystalline polypropylene and a polyolefin-based elastomer such as a copolymer of 4-methyl-1-pentene and propylene, has an internal haze of 20% or less, a gloss of at least one side of 40% or less, a melting point of 150°C or more, and a melting enthalpy of 30 to 90 J/g (see, for example, Patent Document 2).
  • thermoplastic resin A which is a copolymer containing 70 mol% to 90 mol% of structural units derived from 4-methyl-1-pentene and 10 mol% to 30 mol% of structural units derived from an ⁇ -olefin having 2 or 3 carbon atoms, and in which the ratio of structural units derived from an ⁇ -olefin having 4 to 20 carbon atoms other than 4-methyl-1-pentene is 10 mol% or less
  • thermoplastic resin B other than thermoplastic resin A which is at least one polymer selected from the group consisting of ethylene-based polymers, propylene-based polymers, butene-based polymers, and 4-methyl-1-pentene-based polymers, in which the content of thermoplastic resin A is 50 mass% to 98 mass% of the total mass and the content of thermoplastic resin B is 2 mass% to 50 mass% of the total mass (see, for example, Patent Document 3).
  • the base film described in Patent Document 1 uses a semi-crystalline resin rather than an amorphous resin, which causes necking when the base film is stretched to form gaps between the semiconductor devices, resulting in insufficient uniform stretchability of the base film.
  • the base film lacks rigidity, which causes problems in the base film manufacturing process, such as unstable unwinding of the base and tape formation, including application of adhesive.
  • the base film described in Patent Document 2 has sufficient flexibility and transparency and is excellent in blocking resistance, but has problems with necking and poor uniform elongation due to the presence of a yield point.
  • the base film described in Patent Document 3 has excellent stress relaxation properties and impact resistance, but has a yield point, which means it has poor uniform elongation.
  • the present invention was made in consideration of the above problems, and aims to provide a substrate film for semiconductor manufacturing tape that has excellent uniform elongation, rigidity, and stress relaxation properties.
  • the substrate film for semiconductor manufacturing tape of the present invention has at least a functional layer, the functional layer containing a 1-butene homopolymer, a pentene copolymer, and an olefin-based elastomer, the content of the pentene copolymer in the entire functional layer being more than 0% by mass and less than 50% by mass, and the content of the olefin-based elastomer in the entire functional layer being more than 0% by mass and less than 50% by mass.
  • the present invention makes it possible to provide a substrate film for semiconductor manufacturing tape that has excellent uniform elongation, rigidity, and stress relaxation properties.
  • 1 is a cross-sectional view showing a substrate film for a semiconductor manufacturing tape according to an embodiment of the present invention.
  • 1 shows an SS curve (stress-strain curve) for the base film of Example 9.
  • 1 shows an SS curve (stress-strain curve) for the base film of Example 8.
  • 1 shows an SS curve (stress-strain curve) for the base film of Comparative Example 3.
  • the substrate film for semiconductor manufacturing tape of the present invention will be specifically described below. Note that the present invention is not limited to the following embodiments, and can be modified as appropriate within the scope of the present invention.
  • the substrate film of the present invention is a substrate film that is composed of a laminate of a functional layer (intermediate layer) and a surface layer provided on at least one side of the functional layer.
  • FIG. 1 As an example of a substrate film having this multilayer structure, as shown in FIG. 1, there is a substrate film 1 having a three-layer structure composed of a laminate of a functional layer 2 and a surface layer 3 laminated on both sides of the functional layer 2, with the surface layer/functional layer/surface layer laminated in that order.
  • Functional layers include those containing 1-butene homopolymer, pentene copolymer, and olefin-based elastomer.
  • ⁇ 1-Butene homopolymer> a homopolymer obtained by polymerizing 1-butene alone is used as the polybutene.
  • This 1-butene homopolymer has a high molecular weight and bulky side chains, and the strong intermolecular forces due to these bulky side chains can improve the uniform stretchability of the substrate film, in the same way as in the case of amorphous polymers, despite being a crystalline polymer.
  • the 1-butene homopolymer used in the present invention can have a weight average molecular weight (Mw) of approximately 500,000 to 1.5 million.
  • the "weight average molecular weight” mentioned above is calculated in accordance with JIS K 7252-1:2016.
  • the 1-butene homopolymer used in the present invention has a high molecular weight, so it has low surface adhesion and is also more rigid than amorphous polyolefins. This means that the substrate film manufacturing process can provide a substrate film with high rigidity that can be unwound and turned into a tape, including coating with an adhesive.
  • the uniform stretchability and rigidity of the base film can be improved.
  • the content of 1-butene homopolymer in the entire functional layer 2 is preferably 30% by mass or more and 85% by mass or less, and more preferably 30% by mass or more and 60% by mass or less, out of 100% by mass of the functional layer.
  • the functional layer 2 contains a pentene copolymer as polypentene.
  • the use of such a pentene copolymer improves the stress relaxation property of the base film 1, making it possible to hold the semiconductor manufacturing tape with a grip ring and to maintain the spacing between each semiconductor device (semiconductor chip).
  • this pentene copolymer a copolymer of 4-methyl-1-pentene and an ⁇ -olefin is preferred, which has a glass transition temperature near room temperature, excellent stress relaxation properties, and good flexibility due to the ⁇ -olefin copolymer component.
  • Examples include "Absortomer (registered trademark) EP-1013” (manufactured by Mitsui Chemicals), a copolymer of 4-methyl-1-pentene and polypropylene, and "Absortomer (registered trademark) EP-1001” (manufactured by Mitsui Chemicals).
  • the content of polypropylene in the entire copolymer of 4-methyl-1-pentene and polypropylene is preferably 10 mol % or more and 30 mol % or less out of 100 mol % of the copolymer of 4-methyl-1-pentene and polypropylene.
  • the content of pentene copolymer in the entire functional layer 2 is more than 0% by mass and less than 50% by mass, out of 100% by mass of the functional layer. Note that if the content of pentene copolymer is 50% by mass or more, the content of 1-butene homopolymer, which contributes to uniform elongation, decreases, and uniform elongation may decrease.
  • the content of pentene copolymer in the entire functional layer 2 is preferably 10% by mass or more and 40% by mass or less, out of 100% by mass of the functional layer.
  • the functional layer 2 contains an olefin-based elastomer.
  • the olefin-based elastomer is composed of an olefin-based material that conforms to the definition of the term elastomer in JIS K 6200. More specifically, a material composed of a copolymer of amorphous or low crystalline ⁇ -olefin corresponds to the olefin-based elastomer, one mainly made of polyethylene is called an ethylene-based elastomer, and one mainly made of polypropylene is called a propylene-based elastomer.
  • an example of an ethylene-based elastomer is the product name "Tafmer (registered trademark)” manufactured by Mitsui Chemicals
  • an example of a propylene-based elastomer is the product name "Vistamax (registered trademark)” manufactured by ExxonMobil.
  • the polyethylene content in the entire propylene-based elastomer is preferably 9% or more and 30% or less out of 100% propylene-based elastomer.
  • olefin-based elastomers reduces the degree of crystallinity and suppresses the occurrence of yield points, improving the uniform extensibility of the base film.
  • the content of the olefin-based elastomer in the entire functional layer 2 is more than 0% by mass and less than 50% by mass, out of 100% by mass of the functional layer. If the content of the olefin-based elastomer is 50% by mass or more, the olefin-based elastomer component with low crystallinity will be excessive, which may reduce rigidity and make it difficult to unwind the substrate and form it into a tape, including applying an adhesive.
  • the content of the olefin-based elastomer in the entire functional layer 2 is preferably 5% by mass or more and 40% by mass or less, out of 100% by mass of the functional layer.
  • the density of the olefin-based elastomer is preferably 0.850 to 0.900 g/cm 3 , and more preferably 0.860 to 0.890 g/cm 3 .
  • the functional layer 2 may contain a polyolefin resin such as polyethylene or polypropylene.
  • polypropylene examples include homopolymers and copolymers of polypropylene.
  • homopolymers of polypropylene are homopolypropylenes formed by polymerizing propylene alone. These homopolymers of polypropylene have high stereoregularity and a high degree of crystallinity that contributes to the melting point, and therefore have excellent heat resistance.
  • they because of their high degree of crystallinity, they are highly rigid, but by mixing with linear low-density polyethylene (described below), it is possible to obtain flexibility that contributes to the expandability of the base film.
  • the functional layer 2 preferably contains low-density polyethylene (LDPE) having a density of 0.930 g/cm 3 or less among polyolefin resins.
  • LDPE low-density polyethylene
  • the density of the low-density polyethylene is 0.930 g/cm 3 or less, the crystallinity is prevented from increasing excessively, improving flexibility, and improving the isotropy of the base film.
  • the density of the low-density polyethylene is greater than 0.930 g/cm 3 , the crystallinity increases excessively, which may reduce isotropy, and the rigidity may become too large, which may reduce the pickup ability of the semiconductor device and damage the semiconductor device.
  • the density of the low-density polyethylene is preferably 0.860 g/cm 3 or more, and more preferably 0.880 g/cm 3 or more.
  • linear low-density polyethylene (LLDPE) has side-chain branches in the linear structure of high-density polyethylene, so compared to high-density polyethylene, the crystallinity is not too high and it has excellent flexibility.
  • linear low-density polyethylene produced using a metallocene catalyst or Ziegler catalyst may also be used.
  • the melt mass flow rate (MFR) of the linear low density polyethylene is preferably 0.5 to 7.5 g/10 min, more preferably 1.0 to 6.0 g/10 min, and even more preferably 2.0 to 5.0 g/10 min.
  • MFR melt mass flow rate
  • the above melt mass flow rate is obtained by measuring in accordance with the provisions of JIS K7210:1999.
  • the content of linear low-density polyethylene in the entire functional layer 2 is preferably 20% by mass or more and 25% by mass or less, out of 100% by mass of the functional layer.
  • the surface layer 3 in the base film 1 of the present invention will be described.
  • the surface layer 3 include those containing the above-mentioned 1-butene homopolymer, or polyolefin-based resins such as polyethylene and polypropylene.
  • the polyolefin-based resin may be the same as the polyolefin-based resin in the above-mentioned functional layer 2.
  • 1-butene homopolymer can be molded using a general-purpose extruder, and because the high molecular weight components give the film low surface adhesion, when used in the surface layer it can suppress adhesion to the transport roll when transporting the base film, as well as suppress blocking when winding the base film and draw resonance when molding the base film, improving the processing stability of the base film.
  • low-density polyethylene having a density of 0.860 g/ cm3 or more and 0.93 g/ cm3 or less has low surface adhesion, and therefore, when used in the surface layer, it is possible to suppress adhesion to the transport roll when the base film is transported and to suppress blocking when the base film is wound up, thereby improving the processing stability of the base film.
  • the stress (at 20% elongation) in the mechanical axis (longitudinal) direction (hereinafter referred to as "MD") of the substrate film and the direction perpendicular thereto (hereinafter referred to as "TD") is preferably 6.5 MPa to 20 MPa, more preferably 7.5 MPa to 15 MPa, and even more preferably 8 MPa to 13 MPa. If the stress (at 20% elongation) in the MD and TD is greater than 20 MPa, the rigidity becomes too large, so that the pickup property of the semiconductor device decreases and the semiconductor device may be damaged. If the stress is less than 6.5 MPa, the rigidity becomes low, so that in the manufacturing process of the substrate film, it becomes difficult to unwind the substrate and to form a tape, including coating with an adhesive.
  • MD mechanical axis (longitudinal) direction
  • TD direction perpendicular thereto
  • the ratio of stress (at 40% elongation) to stress (at 20% elongation) in the MD and TD i.e., the elongation rate of the base film
  • the elongation rate of the base film is 0.95 or more and 2 or less. If the elongation rate of the base film is greater than 2, the excessive increase in stress may make it difficult to hold the expand ring, and if the elongation rate of the base film is less than 0.95, necking may occur, making uniform expansion difficult.
  • the elongation rate of the base film is 0.95 or more and 2 or less, necking will not occur and uniform expansion will be possible.
  • the elongation rate of the base film is 1.05 or more and 1.8 or less, and from the viewpoint of preventing necking and ensuring uniform expansion, it is even more preferable that the elongation rate of the base film is 1.1 or more and 1.7 or less.
  • the ratio of stress (at 5% elongation) to stress (at 40% elongation) is less than 1.05 in the MD and TD. If the ratio of stress (at 5% elongation) to stress (at 40% elongation) is less than 1.05, the occurrence of the yield point described below (the yield point when the elongation rate elongates from 0% to 100% under conditions of a tensile speed of 300 mm/min) can be suppressed, thereby suppressing the occurrence of necking and enabling uniform expansion.
  • the ratio of stress (at 5% elongation) to stress (at 40% elongation) is 0.40 or more and less than 1.05, and from the viewpoint of preventing the occurrence of necking and ensuring uniform expansion, it is even more preferable that the ratio of stress (at 5% elongation) to stress (at 40% elongation) is 0.50 or more and less than 0.90.
  • the stress relaxation rate is preferably 25% or more, more preferably 30% or more, and even more preferably 35% or more. If the stress relaxation rate of the base film is less than 25%, it may be difficult to maintain the dimensions of the semiconductor manufacturing tape due to poor stress absorption performance.
  • the stress relaxation rate of the substrate film is 25% or more, the dimensions of the semiconductor manufacturing tape can be maintained, and a substrate film for semiconductor manufacturing tape with excellent stress relaxation properties can be provided.
  • stress relaxation rate referred to here can be determined by the method described in the examples below.
  • the ratio of the stress in the MD (at 20% elongation) to the stress in the TD (at 20% elongation) is preferably 0.8 or more and 1.2 or less, more preferably 0.85 or more and 1.15 or less, and even more preferably 0.9 or more and 1.1 or less.
  • the thickness of the base film 1 of the present invention is preferably 50 to 300 ⁇ m, and more preferably 80 to 150 ⁇ m. If the thickness of the base film is 50 ⁇ m or more, the handling properties are improved, and if the thickness is 300 ⁇ m or less, the flexibility (expandability) can be improved. In the case of a base film for wafers, the thickness of the base film is preferably 50 to 150 ⁇ m, and more preferably 70 to 110 ⁇ m.
  • the thickness of the surface layer is not particularly limited, but is preferably 2 to 60 ⁇ m, and more preferably 4 to 40 ⁇ m.
  • the thickness of the functional layer is not particularly limited, but is preferably 40 to 120 ⁇ m, and more preferably 50 to 80 ⁇ m.
  • the ratio of the functional layer to the entire substrate film is preferably 40 to 95%, and more preferably 50 to 90%, from the standpoint of processability and low cost.
  • a resin material for forming the surface layer and a resin material for forming the functional layer are prepared.
  • a three-kind, three-layer co-extruder equipped with a T-die is used to simultaneously extrude and mold the resin material for forming the surface layer and the resin material for forming the functional layer at a predetermined temperature, thereby producing the base film 1 having the multilayer structure of the present invention, which is composed of a laminate of the functional layer 2 and the surface layers 3 laminated on both sides of the functional layer 2.
  • the base film of the present invention may also be produced by the well-known calendar method or inflation method.
  • the substrate film 1 of the present invention may contain various additives.
  • additives known additives that are usually used in semiconductor manufacturing tapes can be used, such as crosslinking assistants, antistatic agents, heat stabilizers, antioxidants, ultraviolet absorbers, lubricants, antiblocking agents, colorants, crystal nucleating agents, processing assistants, etc. These additives may be used alone or in combination of two or more.
  • the cross-linking aid can be, for example, triallyl isocyanurate.
  • the content of the cross-linking aid in the base film is preferably 0.05 to 5 parts by mass, and more preferably 1 to 3 parts by mass, per 100 parts by mass of the resin that forms the base film.
  • the substrate film having a multi-layer structure of the present invention is not limited to a three-layer structure as long as it has the above-mentioned functional layer, and may be, for example, a substrate film having a five-layer structure in which surface layer/functional layer/functional layer/functional layer/surface layer is laminated in that order.
  • the substrate film 1 has been described as having a three-layer structure in which a surface layer/functional layer/surface layer is laminated in that order, but the substrate film of the present invention may also be a substrate film having a single-layer structure consisting of only the functional layer 2 described above.
  • a resin material for forming the functional layer is prepared, and then, using a three-kind, three-layer co-extruder equipped with a T-die, the resin material for forming the functional layer is extruded at a predetermined temperature and molded to produce a base film having a single-layer structure consisting of only the functional layer 2.
  • the base film may also be produced by the well-known calendar method or inflation method.
  • LLDPE-1 Linear low density polyethylene, melting point: 121°C, density: 0.922g/ cm3 , MFR: 1.6g/10min
  • LLDPE-2 Linear low density polyethylene, melting point: 119°C, density: 0.923g/ cm3 , MFR: 3.8g/10min (manufactured by Prim Polymer Co., Ltd., product name: Evolue (registered trademark) SP2540)
  • 1-Bu homopolymer of 1-butene, melting point: 128°C, density: 0.920 g/cm 3 , MFR: 0.5 g/10 min
  • PP elastomer 1 propylene-based elastomer, density: 0.862 g/cm 3 , MFR: 3.0 g/10 min (230°C), polyethylene content: 16% (manufactured by ExxonMobil Corporation, product name: Vistamax (registered trademark) 6102FL) (5)
  • Example 1 Preparation of Base Film> First, the materials shown in Table 1 were blended to prepare a resin material for forming a surface layer and a resin material for forming a functional layer, each having the composition (parts by mass) shown in Table 1. Next, these resin materials were simultaneously extruded through a T-die using a three-kind, three-layer co-extruder under conditions of a die temperature of 180 to 230° C. and a chill roll temperature of 30° C., to obtain a substrate film having the thickness shown in Table 1 and a three-layer structure in which the surface layer/functional layer/surface layer were laminated in this order.
  • a measurement sample was obtained in accordance with JIS K7161-2: 2014.
  • the obtained measurement sample was set in a tensile tester (manufactured by Shimadzu Corporation, product name: AG-5000A) so that the distance between the grippers was 40 mm, and a tensile test was performed at a tensile speed of 300 mm/min in an environment of a temperature of 23° C. and a relative humidity of 40% in accordance with JIS K7161-2: 2014.
  • a measurement sample was obtained in accordance with JIS K7161-2: 2014.
  • the obtained measurement sample was set in a tensile tester (manufactured by Shimadzu Corporation, product name: AG-5000A) so that the distance between the grippers was 40 mm, and a tensile test was performed in accordance with JIS K7161-2: 2014 at a temperature of 23°C and a relative humidity of 40% at a tensile speed of 300 mm/min.
  • the stress at 40% elongation (40% stress) was measured in the MD and TD of the base film, and the ratio of the stress (at 40% elongation) to the stress (at 20% elongation) in the MD (i.e., the elongation rate of the base film in the MD) and the ratio of the stress (at 40% elongation) to the stress (at 20% elongation) in the TD (i.e., the elongation rate of the base film in the TD) were calculated.
  • the results are shown in Table 1.
  • a measurement sample having a No. 1 dumbbell shape (width 10 mm, length 120 mm) was obtained.
  • the obtained measurement sample was set in a tensile tester (manufactured by Shimadzu Corporation, product name: AG-5000A) so that the distance between the grippers was 80 mm, and the sample was stretched by 25% in the MD (or TD) at a tensile speed of 300 mm/min in an environment of a temperature of 23° C. and a relative humidity of 40%.
  • the stress (initial stress S0 ) when stretched by 25% was measured, and the stretched specimen was maintained for 60 seconds, after which the stress (post-relaxation stress S1 ) was measured.
  • the stress relaxation rates [%] of the substrate film in the MD and TD were calculated from the difference between the initial stress S0 and the post-relaxation stress S1 using the following formula (1). The results are shown in Table 1.
  • Examples 2 to 11, Comparative Examples 1 to 6 Except for changing the composition of the resin component to the composition (parts by mass) shown in Tables 1 and 2, a substrate film having the thickness shown in Tables 1 and 2 and a three-layer structure in which the surface layer/functional layer/surface layer were laminated in this order was obtained in the same manner as in Example 1 described above.
  • the S-S curves (stress-strain curves) in the MD and TD of the substrate film of Example 9 are shown in Figure 2.
  • the ratio of stress (at 5% elongation) to stress (at 40% elongation) in the MD and TD is 0.50 or more and less than 0.90, and therefore, as shown in Figure 2, the S-S curves (stress-strain curves) in the MD and TD show no yield point between 0% and 100% elongation.
  • the S-S curves (stress-strain curves) in the MD and TD of the base film of Example 8 are shown in Figure 3.
  • the ratio of stress (at 5% elongation) to stress (at 40% elongation) in the MD and TD is 0.40 or more and less than 1.05, and therefore, as shown in Figure 3, the S-S curves (stress-strain curves) in the MD and TD show almost no yield point between the elongation rate of 0% and 100%.
  • the S-S curves (stress-strain curves) in the MD and TD of the base film of Comparative Example 3 are shown in Figure 4.
  • the ratio of stress (at 5% elongation) to stress (at 40% elongation) is 1.05 or more in the MD and TD, and therefore, as shown in Figure 4, the S-S curves (stress-strain curves) in the MD and TD have a yield point between the elongation rate of 0% and 100%.
  • Example 12 First, the materials shown in Table 3 were blended to prepare a resin material for forming a functional layer having the composition (parts by mass) shown in Table 3. Next, this resin material was extruded using a three-kind, three-layer co-extruder through a T-die under conditions of a die temperature of 180 to 230° C. and a chill roll temperature of 30° C., to obtain a substrate film having the thickness shown in Table 3 and a single-layer structure consisting of only the functional layer.
  • Example 13 to 16 Except for changing the composition of the resin component to the composition (parts by mass) shown in Table 3, a substrate film having the thickness shown in Table 3 and a single-layer structure consisting of only the functional layer was obtained in the same manner as in Example 12 described above.
  • the content of the pentene copolymer in the entire functional layer is more than 0% by mass but less than 50% by mass (10% by mass or more and 40% by mass or less), and the content of the propylene-based elastomer in the entire functional layer is more than 0% by mass but less than 50% by mass (5% by mass or more and 40% by mass or less), the ratio of stress (at 5% elongation) to stress (at 40% elongation) in MD and TD is less than 1.05, so that the occurrence of a yield point can be suppressed, and the ratio of stress (at 40% elongation) to stress (at 20% elongation) (i.e., the elongation rate of the base film in MD and TD) is 0.95 or more, so that necking does not occur, uniform expansion is
  • the stress in the MD and TD (at 20% elongation) is 6.5 MPa or more and 20 MPa or less, which indicates that the material has excellent rigidity.
  • the stress relaxation rate is 25% or more, which indicates that the material has excellent stress relaxation properties.
  • the functional layer is formed only from a propylene-based elastomer, so the ratio of stress (at 40% elongation) to stress (at 20% elongation) in MD and TD (i.e., the elongation rate of the substrate film in MD and TD) is less than 0.95, indicating poor uniform elongation.
  • the stress (at 20% elongation) in MD and TD is less than 6.5 MPa, indicating poor rigidity.
  • the functional layer does not contain a 1-butene homopolymer or a propylene-based elastomer, so in MD and TD, the ratio of stress (at 5% elongation) to stress (at 40% elongation) is 1.05 or more, a yield point is confirmed, and the ratio of stress (at 40% elongation) to stress (at 20% elongation) (i.e., the elongation rate of the substrate film in MD and TD) is less than 0.95, which indicates that necking occurs and that uniform elongation is poor.
  • the functional layer does not contain a 1-butene homopolymer or a propylene-based elastomer, so in both MD and TD, the ratio of stress (at 5% elongation) to stress (at 40% elongation) is 1.05 or more, a yield point is confirmed, and it is clear that the film has poor uniform elongation.
  • the content of pentene copolymer in the entire functional layer is 50 mass% or more, so in the MD, the ratio of stress (at 5% elongation) to stress (at 40% elongation) is 1.05 or more, a yield point is confirmed, and it is clear that the film has poor uniform elongation.
  • the functional layer does not contain a pentene copolymer, so the stress relaxation rate is less than 25%, indicating poor stress relaxation properties.
  • the content of the propylene-based elastomer in the entire functional layer is 50 mass% or more, so the stress in the TD (at 20% elongation) is less than 6.5 MPa, indicating poor rigidity.
  • the ratio of stress (at 5% elongation) to stress (at 40% elongation) in MD and TD is less than 1.05, so that the occurrence of a yield point can be suppressed, and the ratio of stress (at 40% elongation) to stress (at 20% elongation) (i.e., the elongation rate of the substrate film in MD and
  • the stress in the MD and TD (at 20% elongation) is 6.5 MPa or more and 20 MPa or less, which indicates that the material has excellent rigidity.
  • the stress relaxation rate is 25% or more, which indicates that the material has excellent stress relaxation properties.
  • the present invention is suitable for use as a base film for semiconductor manufacturing tapes.

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  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Laminated Bodies (AREA)

Abstract

Un film de matériau de base (1) pour une bande de fabrication de semi-conducteur comporte au moins une couche fonctionnelle (2). La couche fonctionnelle contient un homopolymère de 1-butène, un copolymère de pentène et un élastomère à base d'oléfine. La teneur en copolymère de pentène par rapport à la totalité de la couche fonctionnelle est supérieure à 0 % en masse et inférieure à 50 % en masse, et la teneur en élastomère à base d'oléfine par rapport à la totalité de la couche fonctionnelle est supérieure à 0 % en masse et inférieure à 50 % en masse.
PCT/JP2023/033227 2022-10-21 2023-09-12 Film de base pour bande de fabrication de semi-conducteur WO2024084863A1 (fr)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2022-169199 2022-10-21
JP2022169199 2022-10-21
JP2023069336 2023-04-20
JP2023-069336 2023-04-20

Publications (1)

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WO2024084863A1 true WO2024084863A1 (fr) 2024-04-25

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07233354A (ja) * 1993-12-28 1995-09-05 Mitsui Petrochem Ind Ltd 表面保護フィルム
JP2009094127A (ja) * 2007-10-04 2009-04-30 Furukawa Electric Co Ltd:The 半導体ウエハ加工用フィルム
JP2017036353A (ja) * 2015-08-06 2017-02-16 藤森工業株式会社 接着性樹脂組成物、接着剤の製造方法、接着剤、接着性積層体、及び積層体
WO2022091714A1 (fr) * 2020-10-30 2022-05-05 日東電工株式会社 Film de protection de surface

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07233354A (ja) * 1993-12-28 1995-09-05 Mitsui Petrochem Ind Ltd 表面保護フィルム
JP2009094127A (ja) * 2007-10-04 2009-04-30 Furukawa Electric Co Ltd:The 半導体ウエハ加工用フィルム
JP2017036353A (ja) * 2015-08-06 2017-02-16 藤森工業株式会社 接着性樹脂組成物、接着剤の製造方法、接着剤、接着性積層体、及び積層体
WO2022091714A1 (fr) * 2020-10-30 2022-05-05 日東電工株式会社 Film de protection de surface

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