WO2024066146A1 - 掩膜板框架和掩膜板组件 - Google Patents

掩膜板框架和掩膜板组件 Download PDF

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Publication number
WO2024066146A1
WO2024066146A1 PCT/CN2023/073648 CN2023073648W WO2024066146A1 WO 2024066146 A1 WO2024066146 A1 WO 2024066146A1 CN 2023073648 W CN2023073648 W CN 2023073648W WO 2024066146 A1 WO2024066146 A1 WO 2024066146A1
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WO
WIPO (PCT)
Prior art keywords
mask plate
mask
supporting block
frame according
block
Prior art date
Application number
PCT/CN2023/073648
Other languages
English (en)
French (fr)
Inventor
赵栋
赵晶晶
李静静
李金库
郑小红
王腾雨
刘明星
徐玉枫
Original Assignee
云谷（固安）科技有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 云谷（固安）科技有限公司 filed Critical 云谷（固安）科技有限公司
Publication of WO2024066146A1 publication Critical patent/WO2024066146A1/zh

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation

Definitions

  • the present application belongs to the field of display technology, and in particular relates to a mask plate frame and a mask plate assembly.
  • OLED Organic Light-Emitting Diode
  • OLED has many characteristics such as low driving voltage, active light emission, wide viewing angle, high efficiency, fast response speed, easy to realize full-color large-area wall-mounted display and flexible display, and gradually replaces Liquid Crystal Display (LCD) display.
  • LCD Liquid Crystal Display
  • the mask plate used for vacuum evaporation is a crucial component.
  • the mask plate can control the position of organic materials deposited on the substrate.
  • a mask plate has an abnormal accuracy, it needs to be torn off and re-stretched, resulting in material waste and increased production costs.
  • the embodiments of the present application provide a mask plate frame and a mask plate assembly, which can reduce the loss of the mask plate during the process of adjusting the mask plate stretching accuracy, while achieving the desired stretching accuracy.
  • An embodiment of a first aspect of the present application provides a mask frame, including:
  • a body having an evaporation opening and a solid area surrounding the evaporation opening, the solid area having a bearing surface;
  • the bearing block assembly comprises a plurality of bearing blocks, wherein the bearing blocks are arranged on the bearing surface of the body and are detachably connected to the body.
  • the embodiment of the second aspect of the present application further provides a mask plate assembly, including the mask plate assembly provided in the first aspect of the present application
  • Any type of mask plate frame also includes a mask plate and a support bar, the supporting blocks in the mask plate frame correspond to one of the mask plates or one of the support bars respectively, the two ends of the mask plate are respectively fixed to the side surface of the supporting block away from the physical area along the thickness direction of the physical area, and the two ends of the support bar are respectively fixed to the side surface of the supporting block away from the physical area along the thickness direction of the physical area.
  • the mask frame provided in the present application includes a body and a bearing block assembly, wherein the body has an evaporation opening and a solid area surrounding the evaporation opening.
  • the solid area can shield the evaporation material, and the evaporation opening allows the evaporation material to pass through and evaporate to a designated position on the substrate.
  • the solid area has a bearing surface, which is used to bear the bearing block, and the bearing block is detachably connected to the body.
  • the supporting block includes a side surface facing away from the supporting surface, which can support the support bar or the mask plate, so that the mask plate/support bar can be fixed to the main body through the supporting block to realize the stretching of the mask plate.
  • Each supporting block corresponds to a mask plate or a support bar. Therefore, when the stretching accuracy changes under external influences, the stretching accuracy of the mask plate can be adjusted by adjusting the relative position of the supporting block and the main body. Since the supporting block and the main body are detachably connected, the adjustment process does not require the mask plate/support bar to be separated from the supporting block, and only the position relationship between the supporting block and the main body needs to be adjusted, thereby preventing damage to the mask plate and the support bar, making the mask plate and the support bar reusable, reducing the loss of the mask plate, thereby saving production costs, and the adjustment process is convenient, and the stretching accuracy can achieve the expected effect.
  • FIG1 is a schematic diagram of a top view of a mask frame provided in an embodiment of the present application.
  • Fig. 2 is a schematic cross-sectional view along A-A' in Fig. 1;
  • FIG3 is a reference diagram of a mask frame in use according to an embodiment of the present application.
  • FIG4 is a schematic structural diagram of another mask frame provided in an embodiment of the present application.
  • FIG5 is a schematic structural diagram of another mask frame provided in an embodiment of the present application.
  • FIG6 is an enlarged schematic diagram of the structure of the P region in FIG1 ;
  • FIG7 is another enlarged schematic diagram of the structure of the P region in FIG1 ;
  • FIG8 is a schematic structural diagram of another mask frame provided in an embodiment of the present application.
  • FIG9 is a schematic structural diagram of another mask frame provided in an embodiment of the present application.
  • FIG10 is a schematic structural diagram of another mask frame provided in an embodiment of the present application.
  • Fig. 11 is a schematic cross-sectional view along B-B' in Fig. 10;
  • FIG12 is a schematic structural diagram of another mask frame provided in an embodiment of the present application.
  • FIG13 is a schematic structural diagram of another mask frame provided in an embodiment of the present application.
  • FIG14 is a schematic structural diagram of another mask frame provided in an embodiment of the present application.
  • 15 is a schematic structural diagram of a first stopper and a second stopper in another mask frame provided in an embodiment of the present application;
  • FIG. 16 is a schematic structural diagram of a mask plate assembly provided in an embodiment of the present application.
  • the mask plate used for vacuum evaporation is a crucial component, and the mask plate can control the position of the organic material deposited on the substrate.
  • the mask plate needs to be fixed on the mask plate frame to stretch the mask plate, but during the evaporation process, as the evaporation time and the number of evaporations increase, the mask plate and the substrate are affected by thermal radiation, and the deformation of the mask plate and the substrate become more and more different.
  • the stretching accuracy of the mask plate needs to be adjusted to match the state of the evaporation chamber during the stretching process, so that the evaporation accuracy is in a good state.
  • a mask plate frame and a mask plate assembly are provided to adjust the mask plate stretching accuracy and realize the reuse of the mask plate.
  • an embodiment of the present application provides a mask frame 1, comprising a body 10 and a carrier block assembly 11.
  • the body 10 has a vapor deposition opening 101 and a solid area 102 surrounding the vapor deposition opening 101, and the solid area 102 has a carrier surface 1021.
  • the carrier block assembly 11 includes a plurality of carrier blocks 111, which are disposed on the carrier surface 1021 of the body 10 and are detachably connected to the body 10.
  • the mask frame 1 provided in the present application includes a body 10 and a bearing block assembly 11.
  • the body 10 has an evaporation opening 101 and a solid area 102 surrounding the evaporation opening 101.
  • the solid area 102 can shield the evaporation material, and the evaporation opening 101 allows the evaporation material to pass through and evaporate to a designated position on the substrate.
  • the solid area 102 has a bearing surface 1021, and the bearing surface 1021 is used to bear a bearing block 111.
  • the bearing block 111 is detachably connected to the body 10.
  • the side surface of the supporting block 111 facing away from the supporting surface 1021 can support the support bar 22 or the mask plate 21, so that the mask plate 21/support bar 22 can be fixed to the main body 10 through the supporting block 111 to realize the stretching of the mask plate 21.
  • Each supporting block 111 corresponds to a mask plate 21 or a support bar 22.
  • the stretching accuracy of the mask plate 21 can be adjusted by adjusting the relative position of the supporting block 111 and the main body 10. Since the supporting block 111 and the main body 10 are detachably connected, the adjustment process does not require the mask plate 21/support bar 22 to be separated from the supporting block 111.
  • the mask plate 21 can be stretched, contracted, and the inclination angle of the mask plate 21 can be adjusted by adjusting the position of the supporting block 111 and the main body 10, and the position of the supporting bar 22 can be adjusted synchronously, so that the stretching accuracy of the mask plate 21 can be adjusted.
  • the mask plate 21 and the side surface of the supporting block 111 facing away from the supporting surface 1021 as well as the support bar 22 and the side surface of the supporting block 111 facing away from the supporting surface 1021 can be fixed by welding, thereby making the fixing effect more firm.
  • the solid area 102 may be a closed ring shape surrounding the evaporation opening 101 , or may be an open shape only partially surrounding the evaporation opening 101 , which is not particularly limited in the present application.
  • each carrier block 111 corresponds to a mask plate 21.
  • Each mask plate 21 may correspond to two supporting blocks 111.
  • the mask plate 21 is in a strip shape, including a first end and a second end opposite to each other along its own length direction x.
  • the mask plate 21 is stretched through both ends.
  • the first end and the second end may be fixed to a supporting block 111 respectively, and connected to the main body 10 through the supporting block 111, so as to realize the stretching of the mask plate 21.
  • the relative positions of the two supporting blocks 111 fixed to the mask plate 21 and the main body 10 may be adjusted at the same time, or only the relative position of one of the supporting blocks 111 and the main body 10 may be adjusted.
  • each supporting block 111 corresponds to a supporting bar 22, and each supporting bar 22 can correspond to two supporting blocks 111.
  • the supporting bar 22 is in a strip shape, including a first end and a second end opposite to each other along its own length direction x.
  • the supporting bar 22 is stretched through both ends, and the first end and the second end can be respectively fixed to a supporting block 111, and connected to the main body 10 through the supporting block 111, so as to support the mask plate 21.
  • the relative position of the supporting block 111 used to support the support bar 22 and the main body 10 can be adjusted at the same time, or only the relative position of one of the supporting blocks 111 and the main body 10 can be adjusted.
  • the shape and size of the bearing block 111 corresponding to the mask plate 21 may be the same as or different from the shape and size of the bearing block 111 corresponding to the support bar 22 , and this application does not specifically limit this.
  • the physical area 102 includes a through hole 1022 with an opening located on the bearing surface 1021, and a fixing column 1112 is provided on one side surface of the bearing block 111, and the bearing block 111 is plugged into and matched with the through hole 1022 of the physical area 102 through the fixing column 1112.
  • the via hole 1022 may be a blind hole extending along the thickness direction of the physical region 102 , or, as shown in FIG. 5 , the via hole 1022 may be a through hole penetrating the physical region 102 along the thickness direction of the physical region 102 .
  • the supporting block 111 and the entity area 102 are plugged into each other through the matching fixing columns 1112 and the through holes 1022, thereby realizing a detachable connection between the supporting block 111 and the entity area 102.
  • This fixing method is simple and the adjustment process is convenient.
  • the cross-sectional shape of the fixing post 1112 is the same as the cross-sectional shape of the via hole 1022 and the same size.
  • the cross-sectional shape of the via hole 1022 is a circle or a regular polygon, wherein the cross-sectional shape of the via hole 1022 is a cross-sectional shape parallel to the bearing surface 1021, and the cross-sectional shape of the fixing post 1112 is a cross-sectional shape perpendicular to the length direction of the fixing post 1112.
  • the cross-sectional shape of the via hole 1022 can also be other shapes, and no specific limitation is made here, as long as the cross-sectional shape of the via hole 1022 is the same as the cross-sectional shape of the corresponding fixing post 1112.
  • the cross-section of the via hole 1022 is a circle or a regular polygon, which can facilitate the adjustment of the position of the mask plate 21 or the support bar 22 by replacing the position of the via hole 1022 to which the fixing column 1112 is inserted.
  • the fixed post 1112 is better inserted into the via hole 1022, preventing the aperture shape of the via hole 1022 from restricting too much the plugging direction of the fixed post 1112, so that the fixed post 1112 and the via hole 1022 have more plugging angles.
  • the fixed post 1112 can be rotated 360° in the via hole 1022, that is, the fixed post 1112 can be matched with the via hole 1022 at any angle.
  • the cross-sectional shape of the via hole 1022 and the cross-sectional shape of the fixed post 1112 are both regular hexagons, the fixed post 1112 can be matched with the via hole 1022 after rotating 60°, and there are 6 angles to choose from, so that it is convenient to better adjust it when correcting the angle of the mask plate 21.
  • the shape of the cross section of the via 1022 may be different from the corresponding cross section shape of the fixing column 1112.
  • the shape of the cross section of the via 1022 may be circular
  • the shape of the cross section of the fixing column 1112 may be polygonal
  • the diameter of the cross section of the via is the same as the diameter of the circumscribed circle of the cross section of the fixing column 1112, so that the fixing column 1112 can extend into the via 1022 and match the size of the via 1022.
  • the spacing between adjacent vias 1022 is the same, so that the fixing column 1112 of each bearing block 111 cooperates with different vias 1022, and the spacing between adjacent vias 1022 can be 1.5-2.5 microns, so as to ensure the accuracy of the adjusted net.
  • the spacing between adjacent vias 1022 can be 1.5 microns, 1.8 microns, 1.9 microns, 2 microns, 2.3 microns, 2.5 microns, etc., which is not particularly limited in this application.
  • the spacing between adjacent vias 1022 is the distance between the central axes of adjacent vias.
  • the inner diameter of via 1022 may be 1.5-2.5 microns, where inner diameter 1022 is the diameter of the inscribed circle of the via. Specifically, it may be 1.5 microns, 1.8 microns, 1.9 microns, 2 microns, 2.3 microns, 2.5 microns, etc., and this application does not make any special limitation.
  • the via 1022 is a through hole that penetrates the physical area 102 along the thickness direction of the physical area 102, and the mask plate frame 1 also includes a locking block 12 for corresponding one-to-one with the fixing column 1112.
  • the locking block 12 is arranged at the end of the fixing column 1112 away from the supporting block 111 and is threadedly matched with the fixing column 1112.
  • a locking block 12 is provided at the end of the fixing column 1112, and the locking block 12 is threadedly matched with the fixing column 1112, so that after the end of the fixing column 1112 passes through the through hole 1022, the locking block 12 can be inserted into the end of the fixing column 1112 and the locking block 12 can be rotated to fix the position of the fixing column 1112 through the locking block 12 and the solid area 102, so as to prevent the fixing column 1112 from shaking in the through hole 1022.
  • the fixing column 1112 is preferably a fixing column 1112 with a circular cross section and a threaded outer ring.
  • the physical area 102 is provided with a locking block receiving portion for receiving the locking block 12, so that The locking block 12 is threadably matched with the fixing block 1112 and accommodated in the locking block accommodation portion 1022 , thereby preventing the locking block 12 from protruding from the entity area 102 and affecting the placement of the entity area 102 .
  • the supporting block 111 and the physical region 102 are fixed by electromagnetic adsorption, and at least one of the supporting block 111 and the physical region 102 is an electromagnet.
  • the supporting block 111 and the physical area 102 are fixed by electromagnetic adsorption force, so that the relative position of the supporting block 111 and the physical area 102 can be adjusted arbitrarily, so that the position adjustment precision is higher and the adjustment process is more convenient.
  • At least one of the support block 111 and the entity area 102 is an electromagnet. Specifically, both can be electromagnets, or one can be an electromagnet and the other can be a material that can be magnetically adsorbed. This application does not specifically limit this. At least one of them is set as an electromagnet, so that its magnetism can be controlled by controlling its power supply. When adjusting the position, it is powered off to facilitate the movement of the support block 111. After the position is selected, it is powered on to fix the relative position of the support block 111 and the entity area 102. The adjustment process is convenient and the position adjustment accuracy is high.
  • the supporting block 11 is used to support the mask plate 21 and/or the support bar 22, and the mask plate frame 1 also includes a first limit member 13 and a second limit member 14, and the first limit member 13 and the second limit member 14 are respectively detachably connected to the physical area 102, and along the length direction x of the mask plate 21 and/or the support bar 22, the first limit member 13 and the second limit member 14 are respectively located on both sides of the supporting block 11, and the first limit member 13 and the second limit member 14 cooperate to clamp the supporting block 111.
  • the fixing method of the first stopper 13, the second stopper 14 and the entity area 102 can be the same as the fixing method of the bearing block 111 and the entity area 102.
  • a fixing column 1311 and a fixing column 1411 can be provided on the surface of the first stopper 13 and the second stopper 14 facing the bearing surface 1021, and the fixing column 1311 and the fixing column 1411 are plugged and fixed with the through hole 1022 on the entity area 102 to achieve the fixing of the first stopper 13, the second stopper 14 and the entity area 102.
  • the first limit member 13 and the second limit member 14 are electromagnets
  • the physical area 102 is a magnetic material that can be magnetically attracted by the electromagnet
  • the physical area 102 is an electromagnet
  • the first limit member 13 and the second limit member 14 are magnetic materials that can be magnetically attracted by the electromagnet
  • the first limit member 13, the second limit member 14, and the physical area 102 are all electromagnets, thereby achieving magnetic attraction and fixation of the first limit member 13, the second limit member 14 and the physical area 102.
  • the first stopper 13 and the second stopper 14 work together to clamp the bearing block 111, and further fix the relative position of the bearing block 111 and the entity area 102, so as to further ensure the position accuracy of the bearing block 111 and the entity area 102.
  • a pulling force is applied to the bearing block 111 along the length direction of the mask plate 21 and/or the support bar 22.
  • the two limit members 14 are arranged on both sides of the supporting block 111 along the length direction x of the mask plate 21 and/or the supporting bar 22, and can provide supporting force for the supporting block 111 from both sides of the supporting block 111, thereby resisting the above-mentioned pulling force and reducing the influence of the above-mentioned pulling force on the position accuracy of the supporting block 111.
  • the display panel may also be provided with one of the first limiting member 13 and the second limiting member 14 to provide support force for the bearing block 111 from one side, which is not particularly limited in the present application.
  • the second limiting member 14 is located on the side of the supporting block 111 away from the center of the mask plate 21 or the support bar 22, and covers the side edge of the side surface of the supporting block 111 away from the supporting surface 1021 away from the center of the mask plate 21 or the support bar 22.
  • the cross section of the second stopper 14 parallel to the arrangement direction of the first stopper 13 and the second stopper 14 and parallel to the arrangement direction of the bearing block 111 and the entity area 102 is an inverted L-shape, so that it can cover the side edge of the surface of the bearing block 111 away from the bearing surface 1021 and away from the center of the mask plate 21 or the support bar 22, and provide the bearing block 111 with a force in the direction of the first stopper 13 and a force in the direction of the entity area 102, further ensuring the position accuracy of the bearing block 111 and the entity area 102.
  • the first stopper 13 and the second stopper 14 are both detachably connected to the entity area 102, so as to facilitate the synchronous position adjustment with the bearing block 111, and the damaged parts can be replaced after damage, instead of replacing the entire mask frame 1, so as to save costs.
  • the distance between the side surface of the second limiting member 14 facing away from the physical area 102 and the side surface of the supporting block 111 facing away from the physical area 102 is a, and a is less than or equal to the thickness h of the mask plate 21 or the support bar 22.
  • the substrate needs to be placed on the side of the mask plate 21 away from the mask plate frame 1, and the evaporation source is located on the side of the mask plate frame 1 away from the substrate.
  • the evaporation material in the evaporation source is sequentially evaporated onto the substrate through the evaporation opening 101 of the mask plate frame 1 and the mask plate 21, and the distance a between the side surface of the second limiting member 14 away from the physical area 102 and the side surface of the supporting block 111 away from the physical area 102 is set to be less than or equal to the thickness of the mask plate 21 or the support bar 22, so that the substrate can be closer to the mask plate 21, and the evaporation position of the evaporation material can be more accurate, which helps to improve the quality of evaporation and prevents the second limiting member 14 from interfering with the mask plate 21 and the support bar during the evaporation process to affect the evaporation quality.
  • the end of the second limiting member 14 away from the physical area 102 includes an extended end 141 protruding toward the first limiting member 13, and the end of the supporting block 111 facing the second limiting member 14 and away from the physical area 102 is formed with a receiving portion 1113 for accommodating the extended end 141, and the extended end 141 of the second limiting member 14 is matched with the receiving portion 1113 of the supporting block 111 in a concave-convex manner.
  • the protruding end 141 of the second position-limiting member 14 is matched with the accommodating portion 1113 of the carrying block 111 in a concave-convex manner, and the second position-limiting member 14 provides the carrying block 111 with a force in the direction of the first position-limiting member 13 and a force in the direction of the entity area 102, so that the position of the carrying block 111 can be limited by the second position-limiting member 14.
  • the surface of the side of the second position-limiting member 14 that is away from the entity area 102 can be flush with the surface of the side of the carrying block 111 that is away from the entity area 10, thereby avoiding interference with the fixation of the mask plate 21.
  • first limit member 13 and the second limit member 14 can also be arranged to at least partially surround the supporting block 111. As shown in Figures 14 and 15, the first limit member 13 and the second limit member 14 cooperate to form a cavity 1111 for enclosing the supporting block 111 along the circumference of the supporting block 111, and the cavity 1111 has an opening facing away from the side of the physical area.
  • the first limiting member 13 and the second limiting member 14 cooperate to form a cavity 1111 for accommodating the supporting block 111.
  • the side walls of the cavity 1111 circumferentially surround the supporting block 111 along a direction parallel to the supporting surface 1121 of the supporting block, thereby providing auxiliary support for the supporting block 111 and reducing its deflection, so as to further limit the position of the supporting block 111 and improve its positioning accuracy.
  • the present application also provides a mask plate assembly 2, as shown in Figure 16, including the mask plate frame 1 provided in the above-mentioned embodiment of the present application, and also including a mask plate 21 and a support bar 22.
  • the supporting blocks 111 in the mask plate frame 1 correspond to one mask plate 21 or one support bar 22 respectively, and the two ends of the mask plate 21 are respectively fixed to the side surface of the supporting block 111 away from the physical area 102 along the thickness direction of the physical area 102, and the two ends of the support bar 22 are respectively fixed to the side surface of the supporting block 111 away from the physical area 102 along the thickness direction of the physical area 102.
  • the mask plate 21 and the support bar 22 are respectively welded and fixed to the bearing block 111 , and the bearing block 111 is detachably connected to the body 10 in the mask plate frame 1 .
  • the mask plate 21 and the support bar 22 are detachably fixed to the main body 10 in the mask plate frame 1 through the supporting block 111, respectively, so that according to the actual situation of evaporation, the mask plate 21 can be stretched, retracted, and the placement direction can be adjusted by changing the relative position of the supporting block 111 and the main body 10 without separating the mask plate 21 from the supporting block 111 and without separating the support bar 22 from the supporting block 111.
  • the mask plate 21 includes a precision evaporation opening 101. When leaving the factory, the shape of the precision evaporation opening 101 has a certain degree of deviation. This deviation can be compensated by stretching the mask plate 21 in a specific direction.
  • the relative position of the supporting block 111 and the main body 10 can be adjusted so that the mask plate 21 is offset from the previous placement direction along a certain angle, that is, its placement direction is changed, so as to compensate for the opening shape of the mask plate 21, which helps to improve the evaporation yield.
  • the above adjustment process will not damage the mask plate 21, greatly reducing the loss of the mask plate 21 and reducing the production cost.

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroluminescent Light Sources (AREA)

Abstract

本申请公开了一种掩膜板框架和掩膜板组件，掩膜板框架包括本体和承载块组件，本体具有蒸镀开口以及围绕蒸镀开口的实体区，实体区具有承载面；承载块组件包括多个承载块，承载块设置于本体的承载面上、且与本体可拆卸连接。本申请提供的掩膜板框架中，承载块与本体可拆卸连接，因此对掩膜板精度的调节过程无需将掩膜板/支撑条与承载块分离，仅需调整承载块与本体的位置关系即可，从而可防止损伤掩膜板以及支撑条，使得掩膜板以及支撑条可重复利用，降低了掩膜板的损耗，从而节省了生产成本，且调节过程方便，并可使得张网精度达到预想的效果。

Description

掩膜板框架和掩膜板组件
相关申请的交叉引用
本申请要求享有于2022年09月26日提交的名称为“掩膜板框架和掩膜板组件”的中国专利申请202211174360.4的优先权，该申请的全部内容通过引用并入本文中。
技术领域
本申请属于显示技术领域，尤其涉及一种掩膜板框架和掩膜板组件。
背景技术
有机发光二极管(Organic Light-Emitting Diode,OLED)又称为有机电激光显示或有机发光半导体。OLED具有驱动电压低、主动发光、视角宽、效率高、响应速度快、易实现全彩色大面积壁挂式显示和柔性显示的许多特点而逐渐取代液晶显示器(Liquid Crystal Display，LCD)显示。
在OLED制造技术中，真空蒸镀用的掩膜板是至关重要的部件，掩膜板可以控制有机材料沉积在基板上的位置。在蒸镀过程中，当某张掩膜板出现精度异常时便需要撕掉后重新进行张网，造成了材料的浪费和生产成本的升高。
发明内容
本申请实施例提供了一种掩膜板框架和掩膜板组件，可在对掩膜板张网精度调节的过程中降低掩膜板的损耗，同时使得张网精度达到预想的效果。
本申请实施例第一方面的实施例提供了一种掩膜板框架，包括：
本体，所述本体具有蒸镀开口以及围绕所述蒸镀开口的实体区，所述实体区具有承载面；
承载块组件，包括多个承载块，所述承载块设置于所述本体的所述承载面上、且与所述本体可拆卸连接。
本申请第二方面的实施例还提供了一种掩膜板组件，包括本申请第一方面提供的 任意一种掩膜板框架，还包括掩膜板和支撑条，掩膜板框架中的承载块分别对应一个所述掩膜板或一个所述支撑条，所述掩膜板的两端分别固定于所述承载块沿实体区厚度方向背离所述实体区的一侧表面，所述支撑条的两端分别固定于所述承载块沿实体区厚度方向背离所述实体区的一侧表面。
本申请提供的掩膜板框架中，包括本体和承载块组件，本体具有蒸镀开口以及围绕蒸镀开口的实体区，在蒸镀过程中，实体区可对蒸镀材料进行遮挡，蒸镀开口可供蒸镀材料通过并蒸镀到基板的指定位置。实体区具有承载面，承载面用于承载承载块，承载块与本体可拆卸连接。承载块包括背离承载面的一侧表面可对支撑条或掩膜板进行支撑，从而可将掩膜板/支撑条通过承载块与本体固定，以实现对掩膜板的张网，每个承载块对应一个掩膜板或一个支撑条，因此当张网精度在外界影响下发生变化时，可通过调节承载块与本体的相对位置以对掩膜板的张网精度进行调整，由于承载块与本体可拆卸连接，因此该调节过程无需将掩膜板/支撑条与承载块分离，仅需调整承载块与本体的位置关系即可，从而可防止损伤掩膜板以及支撑条，使得掩膜板以及支撑条可重复利用，降低了掩膜板的损耗，从而节省了生产成本，且调节过程方便，并可使得张网精度达到预想的效果。
附图说明
为了更清楚地说明本申请实施例的技术方案，下面将对本申请实施例中所需要使用的附图作简单地介绍，显而易见地，下面所描述的附图仅仅是本申请的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1是本申请实施例提供的一种掩膜板框架的俯视结构示意图；
图2是图1中沿A-A’的截面示意图；
图3是本申请实施例提供的一种掩膜板框架的使用状态参考图；
图4是本申请实施例提供的另一种掩膜板框架的结构示意图；
图5是本申请实施例提供的另一种掩膜板框架的结构示意图；
图6是图1中P区域的放大结构示意图；
图7是图1中P区域的另一种放大结构示意图；
图8是本申请实施例提供的另一种掩膜板框架的结构示意图；
图9是本申请实施例提供的另一种掩膜板框架的结构示意图；
图10是本申请实施例提供的另一种掩膜板框架的结构示意图；
图11是图10中沿B-B’的截面示意图；
图12是本申请实施例提供的另一种掩膜板框架的结构示意图；
图13是本申请实施例提供的另一种掩膜板框架的结构示意图；
图14是本申请实施例提供的另一种掩膜板框架的结构示意图；
图15是本申请实施例提供的另一种掩膜板框架中第一限位件和第二限位件的结构示意图；
图16是本申请实施例提供的一种掩膜板组件的结构示意图。
具体实施方式
下面将详细描述本申请的各个方面的特征和示例性实施例。在下面的详细描述中，提出了许多具体细节，以便提供对本申请的全面理解。但是，对于本领域技术人员来说很明显的是，本申请可以在不需要这些具体细节中的一些细节的情况下实施。下面对实施例的描述仅仅是为了通过示出本申请的示例来提供对本申请的更好的理解。
在本文中，诸如第一和第二等之类的关系术语仅仅用来将一个实体或者操作与另一个实体或操作区分开来，而不一定要求或者暗示这些实体或操作之间存在任何这种实际的关系或者顺序。而且，术语“包括”、“包含”或者其任何其他变体意在涵盖非排他性的包含，从而使得包括一系列要素的过程、方法、物品或者设备不仅包括那些要素，而且还包括没有明确列出的其他要素，或者是还包括为这种过程、方法、物品或者设备所固有的要素。在没有更多限制的情况下，由语句“包括……”限定的要素，并不排除在包括要素的过程、方法、物品或者设备中还存在另外的相同要素。
发明人经研究发现，在OLED制造技术中，真空蒸镀用的掩膜板是至关重要的部件，掩膜板可以控制有机材料沉积在基板上的位置。在蒸镀过程中，掩膜板需要固定在掩膜板框架上以对掩膜板进行张网，但是在蒸镀过程中，随着蒸镀时长和蒸镀数量的增加，掩膜板和基板在热辐射的影响下，掩膜板的变形量与基板的变形量差异越来越大，则需要在张网过程中把掩膜板的张网精度调整到匹配蒸镀腔室的状态，从而使得蒸镀精度呈现好的状态。当某张掩膜板出现精度异常时便需要撕掉后重新进行张网，造成了材料的浪费和生产成本的升高。基于对上述问题的研究，发明人提供了一 种掩膜板框架和掩膜板组件，以在实现对掩膜板张网精度的调整的同时实现掩膜板的重复利用。
为了更好地理解本申请，下面结合图1至图16对本申请实施例的掩膜板框架和掩膜板组件进行详细描述。
请参阅图1和图2，本申请实施例提供了一种掩膜板框架1，包括本体10和承载块组件11。本体10具有蒸镀开口101以及围绕蒸镀开口101的实体区102，实体区102具有承载面1021。承载块组件11包括多个承载块111，承载块111设置于本体10的承载面1021上、且与本体10可拆卸连接。
本申请提供的掩膜板框架1中，包括本体10和承载块组件11，本体10具有蒸镀开口101以及围绕蒸镀开口101的实体区102，在蒸镀过程中，实体区102可对蒸镀材料进行遮挡，蒸镀开口101可供蒸镀材料通过并蒸镀到基板的指定位置。实体区102具有承载面1021，承载面1021用于承载承载块111，承载块111与本体10可拆卸连接。承载块111背离承载面1021的一侧表面可对支撑条22或掩膜板21进行支撑，从而可将掩膜板21/支撑条22通过承载块111与本体10固定，以实现对掩膜板21的张网，每个承载块111对应一个掩膜板21或一个支撑条22，当张网精度在外界影响下发生变化时，可通过调节承载块111与本体10的相对位置以对掩膜板21的张网精度进行调整，由于承载块111与本体10可拆卸连接，因此该调节过程无需将掩膜板21/支撑条22与承载块111分离，仅需调整承载块111与本体10的位置关系即可，从而可防止损伤掩膜板21以及支撑条22，使得掩膜板21以及支撑条22可重复利用，降低了掩膜板21的损耗，从而节省了生产成本，且调节过程方便，并可使得张网精度达到预想的效果。
本申请提供的掩膜板框架1中，通过调整承载块111与本体10的位置可实现对掩膜板21的拉伸、收缩、以及对掩膜板21的倾斜角度的调整等等，并配合同步调整支撑条22的位置，从而可以对掩膜板21的张网精度进行调整。
本申请提供的掩膜板框架1中，掩膜板21与承载块111背离承载面1021的一侧表面之间以及支撑条22与承载块111背离承载面1021的一侧表面之间均可通过焊接的方式固定，从而使得固定效果更为牢固。
本申请提供的掩膜板框架1中，实体区102可为围设于蒸镀开口101周围的封闭环形，也可以为仅部分围绕蒸镀开口101设置的不封闭形状，本申请不做特别限定。
在一种可行的实施方式中，如图3所示，每个承载块111对应一个掩膜板21，每 个掩膜板21可对应两个承载块111，具体地，掩膜板21呈条状，包括沿自身长度方向x相对的第一端和第二端，掩膜板21通过两端进行张网，第一端和第二端可分别与一个承载块111固定，并通过承载块111与本体10连接，从而实现对掩膜板21的张网，当对掩膜板21的张网精度进行调整时，可同时调节与掩膜板21固定的两个承载块111与本体10的相对位置，或者仅调节其中一个承载块111与本体10的相对位置即可。
在一种可行的实施方式中，如图3所示，每个承载块111对应一个支撑条22，每个支撑条22可对应两个承载块111，具体地，支撑条22呈条状，包括沿自身长度方向x相对的第一端和第二端，支撑条22通过两端进行张网，第一端和第二端可分别与一个承载块111固定，并通过承载块111与本体10连接，从而实现对掩膜板21的支撑，当对掩膜板21的张网精度进行调整时，可同时调节用于承载支撑条22的承载块111与本体10的相对位置，或者仅调节其中一个承载块111与本体10的相对位置即可。
可以理解的是，与掩膜板21对应的承载块111的形状与大小可以和与支撑条22对应的承载块111的形状与大小相同也可以不同，本申请不做特别限定。
在一种可行的实施方式中，如图4所示，实体区102包括开口位于承载面1021的过孔1022，承载块111的一侧表面设置有固定柱1112，承载块111通过固定柱1112与实体区102的过孔1022插接配合。
其中，如图4所示，过孔1022可以为沿实体区102的厚度方向延伸的盲孔，或者，如图5所示，过孔1022可以为沿实体区102的厚度方向贯穿实体区102的通孔。
上述实施方式中，承载块111与实体区102通过相互配合的固定柱1112与过孔1022插接配合，从而实现承载块111与实体区102的可拆卸连接，该固定方式简单，且调节过程方便。
在一种可行的实施方式中，如图6和图7所示，固定柱1112的横截面形状与过孔1022的横截面形状相同且尺寸相同。具体地，过孔1022的横截面的形状为圆形或正多边形，其中，过孔1022横截面即为平行于承载面1021的截面，固定柱1112的横截面即为垂直于固定住1112长度方向的截面。当然，过孔1022的横截面的形状也可以为其他形状，在此不作具体限制，只要保证过孔1022的横截面的形状与对应的固定柱1112的横截面形状相同即可。
上述实施方式中，过孔1022的横截面的形状为圆形或正多边形，可方便在调整掩膜板21或支撑条22的位置时，更换固定柱1112所插接的过孔1022的位置后，使得固 定柱1112更好的插入过孔1022内，防止过孔1022的孔径形状对固定柱1112的插接方向做过多的限制，使得固定柱1112与过孔1022的插接角度更多。例如，当过孔1022的横截面形状以及固定柱1112的横截面形状均为圆形时，固定柱1112可在过孔1022内旋转360°，即固定柱1112可以以任意角度与过孔1022配合。当过孔1022的横截面形状以及固定柱1112的横截面形状均为正六边形时，固定柱1112可每旋转60°后与过孔1022配合，有6种角度可选择，从而可便于在矫正掩膜板21的角度时更好的对其进行调节。
在一种可行的实施方式中，过孔1022的横截面的形状与对应的固定柱1112的横截面形状也可不同，具体地，过孔1022的横截面的形状可为圆形，固定柱1112的横截面的形状可为多边形，且过孔的横截面的直径关于固定柱1112的横截面的外切圆的直径相同，以使得固定柱1112可伸入过孔1022并与过孔1022的尺寸相匹配。
在一种可行的实施方式中，相邻过孔1022之间的间距相同，以便于每个承载块111的固定柱1112与不同的过孔1022配合，且相邻过孔1022的间距可为1.5-2.5微米，从而便于保证调节后的张网精度。具体地，相邻过孔1022的间距可为1.5微米、1.8微米、1.9微米、2微米、2.3微米、2.5微米等，本申请不做特别限定。其中，相邻过孔1022之间的间距为相邻过孔的中轴线之间的距离。
在一种可行的实施方式中，过孔1022内径可为1.5-2.5微米，内径1022即为过孔的内切圆的直径，具体地，可为1.5微米、1.8微米、1.9微米、2微米、2.3微米、2.5微米等，本申请不做特别限定。
在一种可行的实施方式中，如图8和图9所示，过孔1022为沿实体区102的厚度方向贯穿实体区102的通孔，掩膜板框架1还包括用于与固定柱1112一一对应的锁紧块12，锁紧块12设置于固定柱1112的远离承载块111的端部且与固定柱1112螺纹配合。
上述实施方式中，在固定柱1112的端部设置有锁紧块12，锁紧块12与固定柱1112螺纹配合，从而可在固定柱1112的端部穿过过孔1022后，通过将锁紧块12套入固定柱1112的端部并旋转锁紧块12，以通过锁紧块12与实体区102配合将固定柱1112的位置进行固定，防止其在过孔1022内发生晃动等。此时固定柱1112优选为横截面为圆形的固定柱1112且外圈设置有螺纹。
上述实施方式中，实体区102设置有用于容纳锁紧块12的锁紧块容纳部，以使得 锁紧块12与固定住1112螺纹配合后容纳于锁紧块容纳部1022内，从而可防止锁紧块12凸出于实体区102而影响实体区102的放置。
在一种可行的实施方式中，承载块111与实体区102通过电磁吸附固定，承载块111与实体区102中的至少一者为电磁铁。
在上述实施方式中，承载块111与实体区102之间通过电磁吸附力固定，从而可以任意调整承载块111与实体区102的相对位置，使得位置调整的精密度更高，且调节过程更为方便。
承载块111与实体区102中的至少一者为电磁铁，具体地，可以两者均为电磁铁，或者一者为电磁铁，另一者为可被磁性吸附的物质，本申请不作特别限定。将其中的至少一者设置为电磁铁，从而可通过控制其通电而控制其磁性，在调节位置时断电以方便承载块111的移动，在位置选择好之后控制其通电，以将承载块111与实体区102的相对位置固定，调整过程方便且位置调节的精度高。
在一种可行的实施方式中，如图10和图11所示，承载块11用于承载掩膜板21和/或支撑条22，掩膜板框架1还包括第一限位件13和第二限位件14，第一限位件13与第二限位件14分别与实体区102可拆卸连接，沿掩膜板21和/或支撑条22的长度方向x，第一限位件13与第二限位件14分别位于承载块11的两侧，第一限位件13与第二限位件14配合以夹紧承载块111。
在上述实施方式中，第一限位件13、第二限位件14与实体区102的固定方式与承载块111与实体区102的固定方式可以相同。具体地，可在第一限位件13与第二限位件14朝向承载面1021的一侧表面设置固定柱1311和固定柱1411，固定柱1311和固定柱1411与实体区102上的过孔1022插接固定以实现第一限位件13、第二限位件14与实体区102的固定。或者，第一限位件13和第二限位件14为电磁铁，实体区102为可被电磁铁磁吸的磁性材料；或者，实体区102为电磁铁，第一限位件13和第二限位件14为可被电磁铁磁吸的磁性材料；或者，第一限位件13、第二限位件14、实体区102均为电磁铁，从而可实现第一限位件13、第二限位件14与实体区102的磁吸固定。
在上述实施方式中，第一限位件13与第二限位件14共同作用以夹紧承载块111，进一步对承载块111与实体区102的相对位置进行固定，从而进一步保证承载块111与实体区102的位置精度。具体地，掩膜板21和/或支撑条22固定于承载块111之后会沿掩膜板21和/或支撑条22的自身长度方向为承载块111造成拉力，第一限位件13与第 二限位件14设置于承载块111沿掩膜板21和/或支撑条22的自身长度方向x的两侧，可为由承载块111的两侧为承载块111提供支撑力，从而可抵御上述拉力，减小上述拉力对承载块111的位置精度造成的影响。
显示面板中还可以设置有第一限位件13和第二限位件14中的一者，从单侧为承载块111提供支撑力，本申请不做特别限定。
在一种可行的实施方式中，如图12所示，第二限位件14位于承载块111远离掩膜板21或支撑条22中心的一侧，且覆盖承载块111背离承载面1021的一侧表面中远离掩膜板21或支撑条22中心的一侧边缘。
在上述实施方式中，第二限位件14沿平行于第一限位件13和第二限位件14排列方向以及平行于承载块111与实体区102排列方向的截面为倒L形，从而可覆盖承载块111背离承载面1021一侧表面中远离掩膜板21或支撑条22中心的一侧边缘，为承载块111提供朝向第一限位件13方向的作用力以及朝向实体区102方向的作用力，进一步保证承载块111与实体区102的位置精度。同时第一限位件13与第二限位件14均与实体区102可拆卸连接，从而便于跟随承载块111同步进行位置调节，且在损坏后可进行损坏部件的更换，取代更换整个掩膜板框架1，从而可节省成本。
在一种可行的实施方式中，如图12所示，沿实体区102的厚度方向，第二限位件14背离实体区102的一侧表面与承载块111背离实体区102的一侧表面之间的距离为a，a小于或等于掩膜板21或支撑条22的厚度h。
在蒸镀过程中，需要将基板置于掩膜板21背离掩膜板框架1的一侧，蒸镀源位于掩膜板框架1背离基板的一侧，蒸镀源中的蒸镀材料依次通过掩膜板框架1的蒸镀开口101、掩膜板21蒸镀到基板上，将第二限位件14背离实体区102的一侧表面与承载块111背离实体区102的一侧表面之间的距离a设置为小于或等于掩膜板21或支撑条22的厚度，从而可以使得基板更贴近掩膜板21，使得蒸镀材料的蒸镀位置更为准确，有助于提升蒸镀的质量，同时防止由于第二限位件14在蒸镀过程中对掩膜板21、支撑条产生干涉而影响蒸镀质量。
在一种可行的实施方式中，如图13所示，第二限位件14远离实体区102的一端包括向朝向第一限位件13的方向凸出的伸出端141，承载块111朝向第二限位件14的一侧且远离实体区102的一端形成有用于容纳伸出端141的容纳部1113，第二限位件14的伸出端141与承载块111的容纳部1113凹凸配合。
在上述实施方式中，第二限位件14的伸出端141与承载块111的容纳部1113凹凸配合，第二限位件14为承载块111提供朝向第一限位件13方向的作用力以及朝向实体区102方向的作用力，从而可通过第二限位件14限定承载块111的位置。同时可使得第二限位件14的背离实体区102的一侧表面与承载块111背离实体区10的一侧表面平齐，从而避免对掩膜板21的固定造成干扰。
在一种可行的实施方式中，第一限位件13、第二限位件14还可至少部分包围承载块111设置，如图14和图15所示，第一限位件13、第二限位件14配合形成用于沿承载块111的周向围合承载块111的容腔1111，容腔1111具有背离实体区一侧的开口。
在上述实施方式中，第一限位件13、第二限位件14之间配合形成用于容纳承载块111的容腔1111，该容腔1111的侧壁沿承载块平行于承载面1121方向的周向围合承载块111，从而可为承载块111提供辅助支撑，减少其偏斜，以对承载块111的位置进一步进行限定，提升其位置精度。
本申请还提供了一种掩膜板组件2，如图16所示，包括本申请上述实施方式提供的掩膜板框架1，还包括掩膜板21和支撑条22，掩膜板框架1中的承载块111分别对应一个掩膜板21或一个支撑条22，掩膜板21的两端分别固定于承载块111沿实体区102厚度方向背离实体区102的一侧表面，支撑条22的两端分别固定于承载块111沿实体区102厚度方向背离实体区102的一侧表面。
其中，掩膜板21以及支撑条22分别与承载块111焊接固定，承载块111与掩膜板框架1中的本体10可拆卸连接。
本申请提供的掩膜板组件2中，掩膜板21以及支撑条22分别通过承载块111与掩膜板框架1中的本体10可拆卸固定，从而可以根据蒸镀的实际情况，在不将掩膜板21与承载块111分离的情况下、以及在不将支撑条22与承载块111分离的情况下，通过改变承载块111与本体10的相对位置，对掩膜板21进行拉伸、内缩、以及放置方向的调节，例如，掩膜板21包括精密蒸镀开口101，在出厂时精密蒸镀开口101的形状存在一定程度的偏差，这种偏差可通过沿特定的方向拉伸掩膜板21进行补偿，此时可通过调整承载块111与本体10的相对位置，使得掩膜板21由之前的放置方向沿一定角度偏移，即改变其放置方向，从而对掩膜板21的开口形状进行补偿，从而有助于提升蒸镀良率，同时上述调整过程不会损伤掩膜板21，极大的降低了掩膜板21的损耗，降低了生产成本。
依照本申请如上文的实施例，这些实施例并没有详尽叙述所有的细节，也不限制该申请仅为的具体实施例。显然，根据以上描述，可作很多的修改和变化。本说明书选取并具体描述这些实施例，是为了更好地解释本申请的原理和实际应用，从而使所属技术领域技术人员能很好地利用本申请以及在本申请基础上的修改使用。本申请仅受权利要求书及其全部范围和等效物的限制。

Claims (20)

  1. 一种掩膜板框架，包括：
    本体，所述本体具有蒸镀开口以及围绕所述蒸镀开口的实体区，所述实体区具有承载面；
    承载块组件，包括多个承载块，所述承载块设置于所述本体的所述承载面上、且与所述本体可拆卸连接。
  2. 根据权利要求1所述的掩膜板框架，其中，所述实体区为围设于所述蒸镀开口周围的封闭环形。
  3. 根据权利要求1所述的掩膜板框架，其特征在于，所述实体区包括开口位于所述承载面的过孔，所述承载块的一侧表面设置有固定柱，所述承载块通过所述固定柱与所述实体区的所述过孔插接配合。
  4. 根据权利要求3所述的掩膜板框架，其中，所述过孔为沿所述实体区的厚度方向延伸的盲孔，或者，所述过孔为沿所述实体区的厚度方向贯穿所述实体区的通孔。
  5. 根据权利要求3所述的掩膜板框架，其中，相邻所述过孔之间的间距相同。
  6. 根据权利要求3所述的掩膜板框架，其中，所述固定柱的横截面形状与所述过孔的横截面形状相同且尺寸相同。
  7. 根据权利要求5所述的掩膜板框架，其中，，所述过孔的横截面的形状为圆形或正多边形。
  8. 根据权利要求3所述的掩膜板框架，其中，所述过孔为沿所述实体区的厚度方向贯穿所述实体区的通孔，所述掩膜板框架还包括用于与所述固定柱一一对应的锁紧块，所述锁紧块设置于所述固定柱远离所述承载块的端部。
  9. 根据权利要求8所述的掩膜板框架，其中，所述锁紧块与所述固定柱螺纹配合。
  10. 根据权利要求8所述的掩膜板框架，其中，所述实体区设置有用于容纳所述锁紧块的锁紧块容纳部。
  11. 根据权利要求1所述的掩膜板框架，其中，所述承载块与所述实体区通过电磁吸附固定。
  12. 根据权利要求11所述的掩膜板框架，其中，所述承载块与所述实体区中的至 少一者为电磁铁。
  13. 根据权利要求1所述的掩膜板框架，其中，所述承载块用于承载掩膜板和/或支撑条，所述掩膜板框架还包括第一限位件和第二限位件，所述第一限位件与所述第二限位件分别与所述实体区可拆卸连接，沿所述掩膜板和/或所述支撑条的长度方向，所述第一限位件与所述第二限位件分别位于所述承载块的两侧，所述第一限位件与所述第二限位件配合以夹紧所述承载块。
  14. 根据权利要求13所述的掩膜板框架，其中，所述第二限位件位于所述承载块远离所述掩膜板或所述支撑条中心的一侧，且覆盖所述承载块背离所述承载面的一侧表面中远离所述掩膜板或所述支撑条中心的一侧边缘。
  15. 根据权利要求14所述的掩膜板框架，其中，所述第二限位件背离所述实体区的一侧表面与所述承载块背离所述实体区的一侧表面之间的距离小于或等于所述掩膜板或所述支撑条的厚度。
  16. 根据权利要求13所述的掩膜板框架，其中，所述第二限位件远离所述实体区的一端包括向朝向所述第一限位件的方向凸出的伸出端，所述承载块朝向所述第二限位件的一侧且远离所述实体区的一端形成有用于容纳所述伸出端的容纳部，所述第二限位件的所述伸出端与所述承载块的所述容纳部凹凸配合。
  17. 根据权利要求13所述的掩膜板框架，其中，所述第一限位件、所述第二限位件至少部分包围所述承载块设置，所述第一限位件、所述第二限位件配合形成用于沿所述承载块的周向围合所述承载块的容腔，所述容腔具有背离所述实体区一侧的开口。
  18. 一种掩膜板组件，包括如权利要求1-17任一项所述的掩膜板框架。
  19. 根据权利要求18所述的掩膜板组件，还包括掩膜板和支撑条，掩膜板框架中的承载块分别对应一个所述掩膜板或一个所述支撑条，所述掩膜板的两端分别固定于所述承载块沿实体区厚度方向背离所述实体区的一侧表面，所述支撑条的两端分别固定于所述承载块沿实体区厚度方向背离所述实体区的一侧表面。
  20. 根据权利要求18所述的掩膜板组件，其中，所述掩膜板以及所述支撑条分别与所述掩膜板框架中的所述承载块焊接固定。
PCT/CN2023/073648 2022-09-26 2023-01-29 掩膜板框架和掩膜板组件 WO2024066146A1 (zh)

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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105200370A (zh) * 2015-10-27 2015-12-30 唐军 可循环使用的掩模板板框及具有它的掩模板
CN205205217U (zh) * 2015-10-27 2016-05-04 唐军 可循环使用的掩模板板框及具有它的掩模板
CN207828397U (zh) * 2018-01-02 2018-09-07 京东方科技集团股份有限公司 掩膜板框架、掩膜板及蒸镀设备
CN108611595A (zh) * 2018-05-09 2018-10-02 京东方科技集团股份有限公司 一种掩模板框架及其使用方法和掩模装置
WO2022068372A1 (zh) * 2020-09-30 2022-04-07 昆山国显光电有限公司 掩膜板框架及蒸镀掩膜板组件
CN115418605A (zh) * 2022-09-26 2022-12-02 云谷（固安）科技有限公司 掩膜板框架和掩膜板组件

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102110787B (zh) * 2010-11-05 2012-07-25 四川虹视显示技术有限公司 Oled掩膜板对位方法
JP6747054B2 (ja) * 2016-05-17 2020-08-26 大日本印刷株式会社 蒸着マスク溶接方法
CN111996487A (zh) * 2020-07-27 2020-11-27 维信诺科技股份有限公司 掩膜板框体组件和掩膜板组件
CN217224062U (zh) * 2022-01-13 2022-08-19 合肥盛鼎包装材料有限公司 一种塑料包装用打码机

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105200370A (zh) * 2015-10-27 2015-12-30 唐军 可循环使用的掩模板板框及具有它的掩模板
CN205205217U (zh) * 2015-10-27 2016-05-04 唐军 可循环使用的掩模板板框及具有它的掩模板
CN207828397U (zh) * 2018-01-02 2018-09-07 京东方科技集团股份有限公司 掩膜板框架、掩膜板及蒸镀设备
CN108611595A (zh) * 2018-05-09 2018-10-02 京东方科技集团股份有限公司 一种掩模板框架及其使用方法和掩模装置
WO2022068372A1 (zh) * 2020-09-30 2022-04-07 昆山国显光电有限公司 掩膜板框架及蒸镀掩膜板组件
CN115418605A (zh) * 2022-09-26 2022-12-02 云谷（固安）科技有限公司 掩膜板框架和掩膜板组件

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