WO2022068372A1 - 掩膜板框架及蒸镀掩膜板组件 - Google Patents

掩膜板框架及蒸镀掩膜板组件 Download PDF

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Publication number
WO2022068372A1
WO2022068372A1 PCT/CN2021/109906 CN2021109906W WO2022068372A1 WO 2022068372 A1 WO2022068372 A1 WO 2022068372A1 CN 2021109906 W CN2021109906 W CN 2021109906W WO 2022068372 A1 WO2022068372 A1 WO 2022068372A1
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WO
WIPO (PCT)
Prior art keywords
mask
evaporation
support
frame
vapor
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Application number
PCT/CN2021/109906
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English (en)
French (fr)
Inventor
李伟丽
邱岳
Original Assignee
昆山国显光电有限公司
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Publication date
Application filed by 昆山国显光电有限公司 filed Critical 昆山国显光电有限公司
Publication of WO2022068372A1 publication Critical patent/WO2022068372A1/zh
Priority to US17/989,089 priority Critical patent/US20230079712A1/en

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask

Definitions

  • the application relates to the technical field of evaporation equipment, and in particular to a mask frame and an evaporation mask assembly.
  • OLED Organic Light-Emitting Diode, organic electroluminescent diode
  • the device used for vapor deposition especially the mask frame and the mask, are crucial components that affect the production cost and product quality of the OLED display panel.
  • the FMM When the FMM is set on the mask frame, due to the misalignment between the effective evaporation area of the FMM and the to-be-evaporated area of the substrate or the increase of shadows, the evaporation accuracy is poor, causing undesirable phenomena such as color mixing in the OLED display panel, reducing the Product yield.
  • the embodiments of the present application provide a mask frame, the mask frame having opposite first surfaces and second surfaces.
  • the mask frame includes a frame body and a support body.
  • the frame body has an open frame structure.
  • the support body is arranged in the opening and connected to the frame body.
  • the support body includes evaporation openings distributed in an array and support units distributed around each evaporation opening.
  • the supporting unit includes a supporting portion and a bonding portion, and the portion is formed by extending the portion of the supporting portion close to the second surface in the direction of the vapor deposition opening.
  • the support part has a support surface, and the support surface is located on the first surface.
  • the bonding portion has a bonding surface, and the bonding surface is concave relative to the supporting surface in a first direction from the first surface to the second surface, and the supporting surface is distributed in steps.
  • the use of the mask frame in the evaporation process saves the steps of a plurality of supporting strips, blocking strips, alignment and welding and fixing in the process of manufacturing the mask frame, shortens the mask frame manufacturing time, further shortens the evaporation process time, and improves the efficiency of the process.
  • the overall production efficiency of the OLED display panel saves the steps of a plurality of supporting strips, blocking strips, alignment and welding and fixing in the process of manufacturing the mask frame, shortens the mask frame manufacturing time, further shortens the evaporation process time, and improves the efficiency of the process.
  • the overall production efficiency of the OLED display panel saves the steps of a plurality of supporting strips, blocking strips, alignment and welding and fixing in the process of manufacturing the mask frame, shortens the mask frame manufacturing time, further shortens the evaporation process time, and improves the efficiency of the process.
  • the overall production efficiency of the OLED display panel saves the steps of a plurality of supporting strips, blocking strips, alignment and welding and fixing in the process of
  • the mask frame may form the frame body and the support body by etching a plate, and the material of the plate may be a metal material.
  • the mask frame forms the support portion and the bonding portion on the support unit by electroforming on a plate provided with a plurality of vapor deposition openings arranged in an array.
  • the mask frame in the embodiment of the present application does not need to be formed by a plurality of supporting strips and shielding strips, which are aligned and welded to the frame body, and the supporting portion can simultaneously realize the supporting function of the mask strip and the non-destructive effect on the substrate.
  • the shielding effect of the evaporation area shortens the time required for the evaporation process, improves the production efficiency of the display panel, and reduces the production cost.
  • the bonding portion in the mask frame has a bonding surface, and the bonding surface is concave with respect to the supporting surface in the first direction from the first surface to the second surface, and the supporting surface is distributed in steps.
  • the outer periphery of the effective evaporation area where the mask strip has a plurality of evaporation holes is located at the fitting portion, so that the mask strip can better fit the mask frame in the first aspect of the embodiments of the present application.
  • the positioning accuracy of the effective evaporation area on the mask strip and the corresponding evaporation opening on the mask frame is improved, thereby improving the evaporation precision, which is beneficial to improve the display quality of the display panel.
  • the vapor deposition opening on the mask frame in the embodiment of the present application does not need to be formed by a plurality of barrier bars and support bars arranged in a criss-cross pattern, it avoids the misalignment of the barrier bars and the support bars due to the deviation of the alignment during the meshing process.
  • the position of the vapor deposition opening on the mask frame and the deviation of the opening accuracy When the mask strip is fixed on the mask plate frame, the alignment accuracy between the effective evaporation area of the mask strip and the evaporation opening on the mask plate frame is improved.
  • an embodiment of the present application also provides an evaporation mask assembly, including:
  • a mask frame which is the mask frame according to any embodiment of one aspect of the present application.
  • a mask strip a plurality of mask strips are arranged on the mask plate frame, the mask strip includes fixed structures respectively arranged at both ends in the length direction of the mask strip, and an evaporated mesh film located between the fixed structures, and the evaporated mesh film includes A plurality of evaporation holes arranged in an array,
  • the mask strip is fixed on the frame body through the fixing structure, the vapor-deposited mesh film covers the first surface, and the two sides of the vapor-deposited mesh film in the length direction are arranged in contact with the support surface of the support portion.
  • Another aspect of the mask frame supports the vapor-deposited mesh film through the support portion, and the support portion can simultaneously support the mask strip and shield the non-evaporated area on the substrate; the mask
  • the plate frame attaches the vapor-deposited mesh film to the mask frame through the attaching portion, and the vapor-deposited mesh film forms an effective vapor-deposition area corresponding to each vapor-deposition opening.
  • the mask strip provided with the evaporated mesh film changes the previous structure of setting multiple effective evaporation areas and surrounding other functional areas other than the effective evaporation area, so as to avoid the existence of boundaries between different areas on the mask strip and avoid masking.
  • an auxiliary structure is formed on the bonding portion by extending from the bonding surface to the first surface, a plurality of auxiliary structures are distributed at intervals around the vapor deposition opening on the bonding surface, and are bonded in the first direction
  • the sum of the thickness of the part and the extension height of the auxiliary structure is equal to the thickness of the support part
  • the vapor-deposited mesh film covers the first surface, and both sides of the vapor-deposited mesh film in the length direction are arranged in contact with the support surface of the support portion and the auxiliary support surface of the auxiliary structure on the first surface.
  • a plurality of auxiliary structures distributed at intervals around the vapor deposition openings are arranged in the bonding part, so that the mask strip, especially the mask strip including the vapor deposition mesh film, is unfolded due to the wrinkles generated by the tensile stress during the process of opening the mesh, reducing the mask strip.
  • the number of upper wrinkles can improve the alignment accuracy and accuracy of the effective evaporation area formed by the corresponding evaporation opening and the to-be-evaporated area on the substrate, improve the evaporation precision of the evaporation process, and avoid the OLED display panel display color mixing and other undesirable phenomena , optimize the display effect of the display panel and improve the product yield of the display panel.
  • FIG. 1 is a schematic structural diagram of a mask frame provided in an embodiment of the first aspect of the present application.
  • Fig. 2 is the sectional view along M-M direction of Fig. 1;
  • FIG. 3 is a schematic structural diagram of an example of a first mask strip in an embodiment of the second aspect of the present application.
  • FIG. 4 is a schematic structural diagram of an evaporation mask assembly provided by an embodiment of the second aspect of the present application.
  • FIG. 5 is a schematic structural diagram of an example of a second mask strip in an embodiment of the second aspect of the present application.
  • FIG. 6 is a schematic structural diagram of an evaporation mask assembly provided by another embodiment of the second aspect of the present application.
  • FIG. 7 is a schematic structural diagram of a mask frame provided by another embodiment of the first aspect of the present application.
  • Fig. 8 is the partial enlarged view of A area in 7;
  • FIG. 9 is a cross-sectional view of FIG. 7 along the N-N direction;
  • FIG. 10 is a schematic structural diagram of an evaporation mask assembly provided by still another embodiment of the second aspect of the present application.
  • the mask used in the process of forming the luminescent material layer by evaporation mainly includes a long strip-shaped fine metal mask (FMM, Fine Metal Mask), which can also be called a mask strip.
  • FMM fine Metal Mask
  • the FMM is fixed on the mask frame during the evaporation process, and the mask frame is provided with a plurality of support bars and a plurality of shield bars vertically and horizontally on the side of the FMM facing away from the substrate, which are used to support the FMM and shield the substrates on the substrate.
  • the evaporation material is evaporated on the to-be-evaporated area of the substrate through FMM to form a luminescent material layer.
  • the inventor found that, in the process of generally manufacturing the mask frame, a plurality of supporting strips and a plurality of shielding strips need to be aligned and welded to the frame body with the opening respectively, so that the manufacturing process takes a long time.
  • the production efficiency of the OLED display panel is low, and the time cost in the production process is large.
  • a plurality of support strips and shielding strips are prone to inaccurate alignment during the fixing process of the net, which affects the positional accuracy of the vapor deposition ports formed by the crisscross arrangement of the supporting strips and the shielding strips.
  • each evaporation opening corresponds to each effective evaporation area on the mask strip
  • the inaccurate position of the evaporation opening affects the effective evaporation area of the evaporation material from the evaporation opening to the mask strip, and then to the substrate.
  • the evaporation accuracy of the entire evaporation process in the to-be-evaporated area will ultimately affect the display quality of the OLED display panel.
  • the accuracy of the medium evaporation is low, causing problems such as color mixing and shadowing, which affects the display effect of the display panel.
  • the mask frame 1 provided in the first aspect of the embodiment of the present application has a first surface 13 and a second surface 14 opposite to each other, and the mask frame 1 includes a frame body 11 and a support body 12 .
  • the frame body 11 has an open frame structure.
  • the support body 12 is connected to the frame body 11 in the opening.
  • the support body 12 includes evaporation openings 121 distributed in an array and supporting units 122 distributed around each evaporation opening 121 .
  • the supporting unit 122 includes a supporting portion 1221 and a fitting portion 1222 . The portion of the supporting portion 1221 close to the second surface 14 extends toward the vapor deposition opening 121 to form the above-mentioned fitting portion 1222 .
  • the supporting portion 1221 has a supporting surface 1221a, the supporting surface 1221a is located on the first surface 13, and the fitting portion 1222 has a fitting surface 1222a.
  • the bonding surface 1222a is concave relative to the supporting surface 1221a and the supporting surface 1221a is distributed in steps.
  • the support portion 1221 in the mask frame 1 of the embodiment of the first aspect of the present application can simultaneously support the mask strip and shield the non-evaporation area on the substrate, saving multiple support strips and shielding
  • the alignment of the strips and the net and the welding and fixing process shorten the time required for the evaporation process, improve the production efficiency of the display panel, and reduce the production cost.
  • the first mask strip 2 includes first fixing structures 21 respectively disposed at both ends in the length direction of the mask strip 2 and an evaporation deposition located between the first fixing structures 21
  • the mesh film 22, the evaporated mesh film 22 includes a plurality of first evaporation holes 221 arranged in an array.
  • the evaporation material is evaporated onto the evaporation substrate through the above-mentioned first evaporation hole 221 .
  • the vapor-deposited mesh film 22 in the first mask strip 2 has a full through-hole structure.
  • the first vapor deposition mask assembly 31 includes a mask frame 1 and a first mask strip 2 .
  • a plurality of first mask strips 2 are arranged on the mask frame 1 .
  • the first mask strip 2 is fixed to the frame body 11 by the first fixing structure 21 .
  • the vapor-deposited mesh film 22 covers the first surface 13 , and the two sides of the vapor-deposited mesh film 22 in the longitudinal direction are disposed in contact with the support surface 1221 a of the support portion 1221 .
  • the mask frame 1 shown in FIG. 1 and FIG. 2 supports the vapor-deposited mesh film 22 in the first mask strip 2 shown in FIG. 3 through the supporting portion 1221 , and the supporting portion 1221 can simultaneously realize the The supporting function of the film strip 2 and the shielding function of the non-evaporation area on the evaporation substrate.
  • the mask frame 1 attaches the vapor deposition mesh film 22 to the mask frame 1 through the attaching portion 1222 , and the vapor deposition mesh film 22 forms an effective evaporation area corresponding to each evaporation opening 121 .
  • the first mask strip 2 provided with the vapor deposition mesh film 22 has changed the previous structure of setting multiple effective vapor deposition areas and surrounding other functional areas other than the effective vapor deposition areas, so as to avoid the existence of gaps between different areas on the mask strip. To avoid wrinkles on different areas of the mask, especially at the boundaries between different areas, during the process of fixing the mask strip to the mask frame.
  • the first mask strip 2 provided with the evaporated mesh film 22 increases the fit between the mask strip and the mask plate frame, and improves the evaporation precision of the evaporation material evaporated to the to-be-evaporated area of the substrate through the mask strip , improve the quality of substrate evaporation, and improve the display effect of the display panel.
  • FIG. 5 is a schematic structural diagram of the second mask strip 4 in the embodiment of the present application.
  • the second mask strip includes second fixing structures 41 respectively disposed at both ends in the length direction thereof.
  • the second mask strip 4 includes a plurality of effective evaporation regions 42 arranged at intervals along its length direction, and a non-evaporation deposition region 43 of the effective evaporation region 42 .
  • a plurality of second evaporation holes 421 are arranged in the pattern evaporation area 42, and the evaporation material is evaporated onto the evaporation substrate through the plurality of second evaporation holes 421 during the evaporation process.
  • FIG. 6 is a second evaporation mask assembly 32 provided by still another embodiment of the second aspect of the present application.
  • the evaporation mask assembly 32 includes: the mask frame 1 shown in FIG. 1 and FIG. 2 and the second mask strip 4 shown in FIG. 5 .
  • a plurality of second mask strips 4 are arranged on the mask frame 1 .
  • the second mask strip 4 is fixed to the frame body 11 by the second fixing structure 41 .
  • the second mask strip 4 has a plurality of second evaporation holes 421, and the outer periphery of the effective evaporation area 42 is located at the bonding portion 1222, so that the second mask strip 4 is better compatible with the mask frame in the embodiment of the present application 1, to improve the alignment accuracy of the effective vapor deposition area 42 on the second mask strip 4 and the corresponding vapor deposition opening 121 on the mask frame 1.
  • the bonding portion 1222 can stretch the wrinkles formed between the effective evaporation area 42 and the non-evaporation area 43, further improve the alignment and bonding accuracy of the effective evaporation area 42 and the evaporation opening, and improve the evaporation accuracy, which is beneficial to Improve the display quality of the display panel.
  • the thickness of the frame body 11 in the first direction Y is the same as the thickness of the support portion 1221 , and the thickness of the fitting portion 1222 is smaller than that of the support portion 1221 .
  • an auxiliary structure 1223 is formed on the bonding portion 1222 of the mask frame 1 by extending from the bonding surface 1222 a to the first surface 13 .
  • a plurality of auxiliary structures 1223 are distributed at intervals around the vapor deposition opening 121 on the bonding surface 1222a.
  • the auxiliary structure 1223 is arranged in a horizontal direction parallel to the first surface 13 and is spaced apart from the support portion 1221 .
  • the value range of the separation distance is greater than or equal to 2mm.
  • auxiliary structure 1223 and the support part 1221 are arranged at intervals, and the space between the auxiliary structure 1223 and the support part 1221 has the function of accommodating the sinking wrinkle area, and provides enough stretching space for the wrinkle between the auxiliary structure 1223 and the support part 1221, Helps the pleats on the mask strip 2 to stretch.
  • the sum of the thickness of the fitting portion 1222 and the extension height of the auxiliary structure 1223 in the first direction Y is equal to the thickness of the support portion 1221 .
  • the auxiliary structure 1223 has an auxiliary support surface 1223a on the first surface 13 and the support surface 1221a of the support portion 1221 is located at the same level.
  • the auxiliary support surface 1223a not only expands the wrinkles of the mask strips (such as the first mask strip 2 and the second mask strip 4), but also supports the mask strips on the same level as the support surface 1221a of the support part 1221. support.
  • the mask strip and the evaporation substrate have better bonding effect during the evaporation process, and the gap between the evaporation substrate and the mask strip is narrowed.
  • the distance between the effective evaporation area and the to-be-evaporated area on the mask strip is further shortened, and the alignment accuracy between the effective evaporation area and the to-be-evaporated area is improved, while the shadow effect is weakened, and a smaller amount of sublimated organic material molecules will be in the waiting area. Deposition outside the evaporation area.
  • the bonding surface 1222a has a first edge L1 adjacent to the vapor deposition opening 121 , and the auxiliary structure 1223 and the first edge L1 are arranged at a predetermined distance in the horizontal direction. Preset distance settings ensure the availability of the coverage area for material evaporation. The preset distance is greater than or equal to 2mm.
  • the auxiliary structure 1223 is a columnar body, and the cross-section of the columnar body is a circle or a polygon.
  • the thickness of the frame body 11 in the first direction Y is equal to the minimum distance between the first surface 13 and the second surface 14 .
  • FIG. 10 shows a third evaporation mask assembly 33 provided by still another embodiment of the second aspect of the present application.
  • the third evaporation mask assembly 33 includes: the mask frame 1 shown in FIG. 7 to FIG. 9 and the first mask strip 2 shown in FIG. 3 .
  • a plurality of first mask strips 2 are arranged on the mask frame 1 .
  • the first mask strip 2 is fixed to the frame body 11 by the second fixing structure 41 .
  • the evaporation mesh film 22 in the first mask strip 2 shown in FIG. 3 covers the first surface 13 of the mask frame 1 shown in FIG. 7 to FIG. 9 superior.
  • both sides of the vapor-deposited mesh film 22 in the longitudinal direction are in contact with the supporting surface 1221 a of the supporting portion 1221 and the auxiliary supporting surface 1223 a of the auxiliary structure 1223 located on the first surface 13 .
  • the support portion 1221 and the auxiliary structure 1223 both have a supporting effect on the mask strip.
  • a plurality of auxiliary structures 1223 are arranged at intervals around the vapor deposition opening 121 , and are distributed around the vapor deposition opening 121 in a point-breaking manner.
  • the plurality of auxiliary structures 1223 provide a plurality of supporting points for the first mask strip 2 covering itself, and each supporting point not only supports the first mask strip 2, but can also be supported by the plurality of supporting points.
  • the action and the accommodating action of the space between the support points unfold the folds on the first mask strip 2 .
  • the setting of the auxiliary structure 1223 facilitates the unfolding of the wrinkles formed by the first mask strip 2 due to the process of opening the net and the like during the process of fixing the first mask strip 2 to the mask frame 1, thereby improving the relationship between the first mask strip 2 and the mask. the fit of frame 1.
  • the arrangement of the auxiliary structure 1223 reduces the gap between the first mask strip 2 and the evaporation substrate during the evaporation process, avoids the shadow effect of evaporation, and improves the quality of evaporation, thereby improving the preparation quality of the display panel and optimizing the display effect of the display panel. .
  • the vapor-deposited mesh film 22 in the first mask strip 2 has a full through-hole structure. Compared with the second mask strip 4, it does not have the area boundary between the effective evaporation area 42 and the non-evaporation area 43.
  • the actual evaporation area of the mask strip 2 is constituted by the area of the evaporation mesh film 22 corresponding to the evaporation opening 121 . Therefore, since the first mask strip 2 does not have the regional boundary stress between different functional areas on the mask strip during the process of opening the mesh, the probability of wrinkles and the number of wrinkles generated during the process of opening the mesh by the first mask strip 2 are different.
  • the alignment precision and accuracy of the third evaporation mask plate assembly 33 and the to-be-evaporated area of the evaporation substrate are further improved. Improve the evaporation precision of the evaporation process, avoid undesirable phenomena such as display color mixing of the OLED display panel, optimize the display effect of the display panel, and improve the product yield of the display panel.
  • the support unit 122 in the mask frame 1 as shown in FIG. 7 to FIG. 9 also realizes the restriction and control of the sagging amount of the evaporated reticle 22 when the first mask strip 2 is arranged on the mask frame 1, so as to avoid
  • the vapor deposition mesh film 22 is attached to the mask frame 1 , the vapor deposition hole 221 and the vapor deposition mesh film 22 are deformed due to its own gravity and/or the pressure of the vapor deposition substrate.
  • the evaporation accuracy is further ensured, the yield rate of the display panel product during the evaporation process is improved, the problems such as color mixing of the display panel are avoided, and the display effect of the display panel is improved.

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  • Manufacturing & Machinery (AREA)
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Abstract

本申请实施例提供一种掩膜板框架及蒸镀掩膜板组件。本申请实施例中掩膜板框架具有相背的第一表面和第二表面，且包括: 框架本体，具有开口的框式结构体; 支撑体，在开口内连接于框架本体设置，支撑体包括呈阵列分布的蒸镀开口及围绕各蒸镀开口分布的支撑单元，支撑单元包括支撑部和贴合部，支撑部靠近第二表面的部分向蒸镀开口方向延伸形成贴合部，支撑部具有支撑面，支撑面位于第一表面，贴合部具有贴合面，在第一表面至第二表面的第一方向上贴合面相对于支撑面更靠近第二表面，所述贴合面与支撑面呈台阶分布。

Description

掩膜板框架及蒸镀掩膜板组件
相关申请的交叉引用
本申请要求享有于2020年09月30日提交的名称为“掩膜板框架及蒸镀掩膜板组件”的中国专利申请第202011061713.0号的优先权，该申请的全部内容通过引用并入本文中。
技术领域
本申请涉及蒸镀设备技术领域，具体涉及一种掩膜板框架及蒸镀掩膜板组件。
背景技术
现在，OLED(Organic Light-Emitting Diode,有机电致发光二极管)显示面板成为显示领域中重点研究产品。在OLED显示面板的制备过程中用于蒸镀的装置尤其是掩膜板框架以及掩膜板是影响OLED显示面板生产制造成本和产品质量的至关重要的部件。
FMM设置在掩膜板框架上时因FMM的有效蒸镀区与基板的待蒸镀区对位偏差或阴影增大等问题，蒸镀精度较差，引起OLED显示面板显示混色等不良现象，降低产品良率。
因此，急需一种新型的掩膜板框架及蒸镀掩膜板组件。
发明内容
一方面，本申请实施例供一种掩膜板框架，该掩膜板框架具有相背对的第一表面和第二表面。掩膜板框架包括框架本体以及支撑体。框架本体具有开口的框式结构体。支撑体设置在开口内并连接于框架本体设置。支撑体包括呈阵列分布的蒸镀开口及围绕各蒸镀开口分布的支撑单元。支撑单元包括支撑部和贴合部，由支撑部靠近第二表面的部分向蒸镀开口方向 延伸形成上述部。支撑部具有支撑面，支撑面位于第一表面。贴合部具有贴合面，在第一表面至第二表面的第一方向上贴合面相对于支撑面下凹与支撑面呈台阶分布。
蒸镀过程使用该掩膜板框架节省掩膜板框架制作过程中多个支撑条、遮挡条张网对位以及焊接固定的步骤，缩短掩膜板框架制作时间，进一步缩短蒸镀过程时间，提高OLED显示面板整体制备效率。
在一示例中，掩膜板框架可以通过刻蚀板材形成框架本体以及支撑体，板材所用材料可以为金属材质。在另一示例中，掩膜板框架通过在一设置有多个阵列排布的蒸镀开口的板材上通过电铸形成支撑单元上的支撑部和贴合部。
本申请实施例中的掩膜板框架不必通过多条支撑条以及遮挡条张网对位以及焊接固定到框架本体上形成，支撑部可同时实现对掩膜条的支撑作用以及对基板上的非蒸镀区的遮挡作用，缩短蒸镀过程所需时间，提高显示面板生产效率，降低了生产成本。掩膜板框架中的贴合部具有贴合面，在第一表面至第二表面的第一方向上贴合面相对于支撑面下凹与支撑面呈台阶分布。
在一些示例中，掩膜条具有多个蒸镀孔的有效蒸镀区的外周边沿位于贴合部，使掩膜条更好与本申请实施例第一方面中的掩膜板框架贴合，使掩膜条上的有效蒸镀区与掩膜板框架上对应的蒸镀开口对位准确度提高，从而提高蒸镀精度，有利于提高显示面板显示质量。
由于本申请实施例中掩膜板框架上的蒸镀开口不需要通过多个纵横交错设置的遮挡条以及支撑条形成，避免了因为遮挡条以及支撑条张网过程中因为对位的偏差造成的掩膜板框架上蒸镀开口的位置以及开口精度的偏差。提高了掩膜条固定在掩膜板框架时，掩膜条有效蒸镀区与掩膜板框架上的蒸镀开口的对位精确度。
另一方面，本申请实施例还提供一种蒸镀掩膜板组件，包括：
掩膜板框架，为本申请一方面任一实施例的掩膜板框架；
掩膜条，多个掩膜条排列设置于掩膜板框架，掩膜条包括在自身长度方向上分别设置于两端的固定结构以及位于固定结构之间的蒸镀网膜，蒸 镀网膜包括阵列排布的多个蒸镀孔，
掩膜条通过固定结构固定于框架本体，蒸镀网膜覆盖在第一表面上且蒸镀网膜自身长度方向上的两侧边与支撑部的支撑面接触设置。
本申请实施例另一方面提供的掩膜板框架通过支撑部支撑蒸镀网膜，且支撑部可同时实现对掩膜条的支撑作用以及对基板上的非蒸镀区的遮挡作用；掩膜板框架通过贴合部使蒸镀网膜贴合在掩膜板框架上且蒸镀网膜对应每一蒸镀开口形成有效蒸镀区。设置有蒸镀网膜的掩膜条改变了以往设置多个有效蒸镀区以及环绕有效蒸镀区以外的其他功能区域的结构形式，从而避免掩膜条上存在不同区域间的边界，避免掩膜条张网固定到掩膜板框架过程中掩膜条不同区域上尤其是不同区域间的边界处产生褶皱，增大掩膜条与掩膜板框架的贴合度，提高蒸镀材料通过掩膜条蒸镀到基板的待蒸镀区的蒸镀精度，提高基板蒸镀质量，提高显示面板显示效果。
在本申请另一方面一些实施方式中，贴合部上由贴合面向第一表面延伸形成的辅助结构，多个辅助结构在贴合面上环绕蒸镀开口间隔分布，第一方向上贴合部的厚度与辅助结构的延伸高度之和等于支撑部的厚度，
蒸镀网膜覆盖在第一表面上且蒸镀网膜自身长度方向上的两侧边与支撑部的支撑面以及辅助结构位于第一表面的辅助支撑面均接触设置。
在贴合部设置多个环绕蒸镀开口间隔分布的辅助结构，使掩膜条尤其是包括蒸镀网膜的掩膜条在张网过程中因拉应力产生的褶皱进行展开，减少掩膜条上褶皱的数量，提高对应蒸镀开口形成的有效蒸镀区与基板上的待蒸镀区的对位精度和准度，提高蒸镀过程的蒸镀精度，避免OLED显示面板显示混色等不良现象，优化显示面板的显示效果，提高显示面板产品良率。
附图说明
下面将参考附图来描述本申请示例性实施例的特征、优点和技术效果，其中的附图并未按照实际的比例绘制。
图1是本申请第一方面一实施例提供的掩膜板框架结构示意图；
图2是图1沿M-M方向的剖视图；
图3是本申请第二方面的实施例中的第一掩膜条的示例的结构示意图；
图4是本申请第二方面的实施例提供的蒸镀掩膜板组件的结构示意图；
图5是本申请第二方面的实施例中的第二掩膜条的示例的结构示意图；
图6是本申请第二方面的又一实施例提供的蒸镀掩膜板组件的结构示意图；
图7是本申请第一方面的另一实施例提供的掩膜板框架结构示意图；
图8是7中A区域的局部放大图；
图9是图7沿N-N方向的剖视图；
图10是本申请第二方面的再一实施例提供的蒸镀掩膜板组件的结构示意图；
具体实施方式
下面将详细描述本申请的各个方面的特征和示例性实施例。在下面的详细描述中，提出了许多具体细节，以便提供对本申请的全面理解。但是，对于本领域技术人员来说很明显的是，本申请可以在不需要这些具体细节中的一些细节的情况下实施。下面对实施例的描述仅仅是为了通过示出本申请的示例来提供对本申请的更好的理解。在附图和下面的描述中，至少部分的公知结构和技术没有被示出，以便避免对本申请造成不必要的模糊；并且，为了清晰，可能夸大了部分结构的尺寸。此外，下文中所描述的特征、结构或特性可以以任何合适的方式结合在一个或更多实施例中。
为了更好地理解本申请，下面结合附图对本申请实施方式提供的显示面板以及显示装置进行详细描述。
制造OLED显示面板时，在蒸镀形成发光材料层过程中所使用的掩膜板主要包括长条状精细金属掩膜板(FMM，Fine Metal Mask)，也可称掩膜条。通常，蒸镀过程中将FMM固定在掩膜板框架上，掩膜板框架在FMM 背向基板的一侧纵横设置有多个支撑条以及多个遮挡条，用于支撑FMM以及遮挡基板上的非蒸镀区，使蒸镀材料通过FMM蒸镀到基板的待蒸镀区上，形成发光材料层。发明人在研究过程中发现，由于一般制作掩膜板框架过程中需要将多条支撑条以及多条遮挡条分别张网对位并焊接固定到具有开口的框体上，使制作过程时间长，OLED显示面板生产效率低，生产过程中时间成本大。且多条支撑条以及遮挡条容易在张网固定过程中出现对位不准现象，影响由支撑条以及遮挡条纵横交错设置形成阵列排布的蒸镀口的位置准确度。又因为每个蒸镀口与掩膜条上的每一有效蒸镀区对应，蒸镀口的位置不准确影响蒸镀材料经蒸镀口到掩膜条的有效蒸镀区、再到基板的待蒸镀区整个蒸镀过程的蒸镀精度，最终影响OLED显示面板显示质量。
通常掩膜条上环绕在有效蒸镀区以外的其他功能区域与有效蒸镀区的结构不同，使得掩膜条上不同区域之间存在区域边界。掩膜条在张网拉伸过程中因具有拉应力产生褶皱，进一步的由于掩膜条受拉力作用产生的应力在上述区域边界以及区域边界附近会产生应力突变，使得在掩膜条的区域边界以及边界附近更容易产生褶皱。掩膜条上产生褶皱尤其是有效蒸镀区的边界产生褶皱使有效蒸镀区与基板的待蒸镀区对位的准确性较低，影响有效蒸镀区的形状结构，进一步导致蒸镀过程中蒸镀精度低，造成混色、阴影等问题，影响显示面板显示效果。
请参见图1以及图2，本申请实施例第一方面提供的掩膜板框架1，具有相背的第一表面13和第二表面14，掩膜板框架1包括框架本体11和支撑体12。框架本体11具有开口的框式结构体。支撑体12在开口内连接于框架本体11设置。支撑体12包括呈阵列分布的蒸镀开口121及围绕各蒸镀开口121分布的支撑单元122。支撑单元122包括支撑部1221和贴合部1222，支撑部1221靠近第二表面14的部分向蒸镀开口121方向延伸形成上述贴合部1222。支撑部1221具有支撑面1221a，支撑面1221a位于第一表面13，贴合部1222具有贴合面1222a。在第一表面13至第二表面14的第一方向Y上贴合面1222a相对于支撑面1221a下凹与支撑面1221a呈台阶分布。
本申请第一方面的实施例的掩膜板框架1中的支撑部1221可同时实现对掩膜条的支撑作用以及对基板上的非蒸镀区的遮挡作用，节省了多条支撑条以及遮挡条张网对位以及焊接固定过程，缩短蒸镀过程所需时间，提高显示面板生产效率，降低了生产成本。
请参见图3，在本申请第二方面的实施例中，第一掩膜条2包括在自身长度方向上分别设置于两端的第一固定结构21以及位于第一固定结构21之间的蒸镀网膜22，蒸镀网膜22包括阵列排布的多个第一蒸镀孔221。蒸镀过程中蒸镀材料通过上述第一蒸镀孔221蒸镀到蒸镀基板上。如图3所示，第一掩膜条2中的蒸镀网膜22为全通孔结构。
请一并参见图1至图4，本申请实施例第二方面的第一蒸镀掩膜板组件31，包括掩膜板框架1以及第一掩膜条2。多个第一掩膜条2排列设置于掩膜板框架1。如图3所示的第一掩膜条2通过第一固定结构21固定于框架本体11。蒸镀网膜22覆盖在第一表面13上且蒸镀网膜22自身长度方向上的两侧边与支撑部1221的支撑面1221a接触设置。
如图1以及图2所示的掩膜板框架1通过支撑部1221支撑如图3所示的第一掩膜条2中的蒸镀网膜22，且支撑部1221可同时实现对第一掩膜条2的支撑作用以及对蒸镀基板上的非蒸镀区的遮挡作用。掩膜板框架1通过贴合部1222使蒸镀网膜22贴合在掩膜板框架1上且蒸镀网膜22对应每一蒸镀开口121形成有效蒸镀区。设置有蒸镀网膜22的第一掩膜条2改变了以往设置多个有效蒸镀区以及环绕有效蒸镀区以外的其他功能区域的结构形式，从而避免掩膜条上存在不同区域间的边界，避免掩膜条张网固定到掩膜板框架过程中掩膜板不同区域上尤其是不同区域间的边界处产生褶皱。设置有蒸镀网膜22的第一掩膜条2增大掩膜条与掩膜板框架的贴合度，提高蒸镀材料通过掩膜条蒸镀到基板的待蒸镀区的蒸镀精度，提高基板蒸镀质量，提高显示面板显示效果。
请参见图5，图5是本申请实施例中第二掩膜条4的结构示意图。如图5所示，第二掩膜条包括分别设置在其长度方向的两端的第二固定结构41。第二掩膜条4包括多个沿其长度方向间隔排布的有效蒸镀区42，以及有效蒸镀区42的非蒸镀区43。图案蒸镀区42中设置多个第二蒸镀孔 421，蒸镀过程中蒸镀材料通过上述多个第二蒸镀孔421蒸镀到蒸镀基板上。
请参见图6，图6是本申请第二方面的又一实施例提供的第二蒸镀掩膜板组件32。如图6所示，蒸镀掩膜板组件32包括：如图1以及图2所示的掩膜板框架1以及如图5所示的第二掩膜条4。多个第二掩膜条4排列设置于掩膜板框架1。第二掩膜条4通过第二固定结构41固定于框架本体11。第二掩膜条4具有多个第二蒸镀孔421的有效蒸镀区42的外周边沿位于贴合部1222，使第二掩膜条4更好与本申请实施例中的掩膜板框架1贴合，使第二掩膜条4上的有效蒸镀区42与掩膜板框架1上对应的蒸镀开口121对位准确度提高。且贴合部1222可舒展形成在有效蒸镀区42与非蒸镀区43之间的褶皱，进一步提高有效蒸镀区42与蒸镀开口的对位贴合精度，提高蒸镀精度，有利于提高显示面板显示质量。
在一些可选的实施例中，第一方向Y上框架本体11的厚度与支撑部1221的厚度相同，贴合部1222的厚度小于支撑部1221的厚度。
请参照图7至图9，在一些可选的实施例中，掩膜板框架1中的贴合部1222上由贴合面1222a向第一表面13延伸形成的辅助结构1223，多个辅助结构1223在贴合面1222a上环绕蒸镀开口121间隔分布。
在一些可选的实施例中，辅助结构1223在与第一表面13平行的水平方向上、与支撑部1221间隔设置。间隔距离的取值范围大于等于2mm。当掩膜条(如第一掩膜条2或者第二掩膜条4)上具有褶皱的区域覆盖在多个辅助结构1223上时，多个支撑点对褶皱上的不同区域具有支撑作用。辅助结构1223对褶皱具有与第一方向Y反向的支撑力，褶皱位于两相邻的辅助结构1223之间的区域因受重力作用朝向第一方向Y下沉。又辅助结构1223与支撑部1221间隔设置，辅助结构1223与支撑部1221间的间隔空间具有对下沉的褶皱区域容纳作用，为褶皱在辅助结构1223与支撑部1221之间提供足够的舒展空间，有助于掩膜条2上的褶皱舒展。
在一些可选的实施例中，请参照图9，第一方向Y上贴合部1222的厚度与辅助结构1223的延伸高度之和等于支撑部1221的厚度。则辅助结构1223在第一表面13上具有与支撑部1221的支撑面1221a位于同一水平面 的辅助支撑面1223a。该辅助支撑面1223a除了使掩膜条(如第一掩膜条2以及第二掩膜条4)的褶皱进行展开外，还与支撑部1221的支撑面1221a在同一水平面上对掩膜条进行支撑。使得蒸镀过程中掩膜条与蒸镀基板贴合效果更佳，缩小了蒸镀基板与掩膜条之间的间隙。掩膜条上的有效蒸镀区与待蒸镀区距离进一步缩短，有效蒸镀区与待蒸镀区对位精确度提高的同时，阴影效应减弱，更少量的升华的有机材料分子会在待蒸镀区域之外沉积。
在一些可选的实施例中，贴合面1222a具有与蒸镀开口121相邻的第一边缘L1，水平方向上辅助结构1223与第一边缘L1预设距离设置。预设距离设置可以保证材料蒸镀的可覆盖区域有效性。预设距离大于等于2mm。
在一些可选的实施例中，辅助结构1223为柱状体，柱状体的横截面为圆形或多边形。
在一些可选的实施例中，第一方向Y上框架本体11的厚度等于第一表面13和第二表面14之间的最小距离。
图10示出了本申请第二方面的再一实施例提供的第三蒸镀掩膜板组件33。如图10所示，第三蒸镀掩膜板组件33包括：如图7至图9所示的掩膜板框架1以及如图3所示的第一掩膜条2。多个第一掩膜条2排列设置于掩膜板框架1。第一掩膜条2通过第二固定结构41固定于框架本体11。
第三蒸镀掩膜板组件33中如图3所示的第一掩膜条2中的蒸镀网膜22覆盖在如图7至图9所示的掩膜板框架1的第一表面13上。且蒸镀网膜22自身长度方向上的两侧边与支撑部1221的支撑面1221a以及辅助结构1223位于第一表面13的辅助支撑面1223a均接触设置。使得支撑部1221与辅助结构1223对掩膜条均具有支撑作用。多个辅助结构1223环绕蒸镀开口121设置间隔设置，以点断式环绕蒸镀开口121分布。多个辅助结构1223对覆盖在其自身上的第一掩膜条2提供多个支撑点，每一支撑点不仅对第一掩膜条2起到支撑作用，还能通过多个支撑点的支撑作用以及支撑点间的间隔空间的容纳作用展开第一掩膜条2上的褶皱。辅助结构 1223的设置利于第一掩膜条2因张网等过程形成的褶皱在第一掩膜条2固定到掩膜板框架1的过程中进行展开，提高第一掩膜条2与掩膜版框架1的贴合度。辅助结构1223的设置减少第一掩膜条2在蒸镀过程中与蒸镀基板的间隙，避免产生蒸镀的阴影效应，提高蒸镀质量，从而提高显示面板的制备质量，优化显示面板显示效果。
又第一掩膜条2中的蒸镀网膜22为全通孔结构，相较于第二掩膜条4不具有有效蒸镀区域42以及非蒸镀区43之间的区域边界，第一掩膜条2的实际蒸镀区由蒸镀开口121对应的蒸镀网膜22的区域构成。因此，第一掩膜条2在张网的过程中由于不具有掩膜条上不同功能区域之间的区域边界应力，第一掩膜条2张网过程中产生的褶皱概率以及褶皱的数量相较于第二掩膜条4均较少，进一步提高了第三蒸镀掩膜板组件33与蒸镀基板的待蒸镀区的对位精度和准度。提高蒸镀过程的蒸镀精度，避免OLED显示面板显示混色等不良现象，优化显示面板的显示效果，提高显示面板产品良率。
如图7至图9所示的掩膜板框架1中的支撑单元122还实现对第一掩膜条2设置在掩膜板框架1时蒸镀网膜22的下垂量的限制与管控，避免蒸镀网膜22贴合在掩膜板框架1上时，因受自身重力和/或蒸镀基板的压力而发生蒸镀孔221以及蒸镀网膜22的变形。从而进一步保证蒸镀精度以及提升蒸镀过程中的显示面板产品良率，避免显示面板出现混色等问题，提升显示面板显示效果。
本领域技术人员应能理解，上述实施例均是示例性而非限制性的。在不同实施例中出现的不同技术特征可以进行组合，以取得有益效果。本领域技术人员在研究附图、说明书及权利要求书的基础上，应能理解并实现所揭示的实施例的其他变化的实施例。在权利要求书中，术语“包括”并不排除其他装置或步骤；物品没有使用数量词修饰时旨在包括一个/种或多个/种物品，并可以与“一个/种或多个/种物品”互换使用”；术语“第一”、“第二”用于标示名称而非用于表示任何特定的顺序。权利要求中的任何附图标记均不应被理解为对保护范围的限制。权利要求中出现的多个部分的功能可以由一个单独的硬件或软件模块来实现。某些技术特征出 现在不同的从属权利要求中并不意味着不能将这些技术特征进行组合以取得有益效果。

Claims (12)

  1. 一种掩膜板框架，具有相对的第一表面和第二表面，所述掩膜板框架包括：
    框架本体，具有开口的框式结构体；
    支撑体，设置在所述开口内并连接于所述框架本体，所述支撑体包括呈阵列分布的蒸镀开口及围绕各所述蒸镀开口分布的支撑单元，所述支撑单元包括支撑部和贴合部，所述支撑部靠近所述第二表面的部分向所述蒸镀开口方向延伸形成所述贴合部，所述支撑部具有支撑面，所述支撑面位于所述第一表面，所述贴合部具有贴合面，在所述第一表面至所述第二表面的第一方向上所述贴合面相对于所述支撑面更靠近第二表面，所述贴合面与所述支撑面呈台阶分布。
  2. 根据权利要求1所述的掩膜板框架，其中，所述第一方向上所述框架本体的厚度与所述支撑部的厚度相同，所述贴合部的厚度小于所述支撑部的厚度。
  3. 根据权利要求1或2所述的掩膜板框架，其中，所述贴合部上由所述贴合面向所述第一表面延伸形成的辅助结构，多个所述辅助结构在所述贴合面上环绕所述蒸镀开口间隔分布。
  4. 根据权利要求3所述的掩膜板框架，其中，所述第一方向上所述贴合部的厚度与所述辅助结构的延伸高度之和等于所述支撑部的厚度。
  5. 根据权利要求3所述的掩膜板框架，其中，在与所述第一表面平行的水平方向上，所述辅助结构与所述支撑部间隔设置。
  6. 根据权利要求3所述的掩膜板框架，其中，所述贴合面具有与所述蒸镀开口相邻的第一边缘，所述水平方向上所述辅助结构与所述第一边缘预设距离设置。
  7. 根据权利要求3所述的掩膜板框架，其中，所述预设距离大于或等于2mm。
  8. 根据权利要求3所述的掩模版框架，其中，所述辅助结构为柱状体，所述柱状体的横截面为圆形或多边形。
  9. 根据权利要求1至8任一项所述的掩膜板框架，其中，所述第一方向上所述框架本体的厚度等于所述第一表面和第二表面之间的最小距离。
  10. 一种蒸镀掩膜板组件，包括，
    掩膜板框架，为如权利要求1所述的掩膜板框架；
    掩膜条，多个掩膜条排列设置于所述掩膜板框架，所述掩膜条包括在自身长度方向上分别设置于两端的固定结构以及位于所述固定结构之间的蒸镀网膜，所述蒸镀网膜包括阵列排布的多个蒸镀孔，
    所述掩膜条通过所述固定结构固定于所述框架本体，所述蒸镀网膜覆盖在所述第一表面上且所述蒸镀网膜自身长度方向上的两侧边与所述支撑部的所述支撑面接触设置。
  11. 根据权利要求10所述的蒸镀掩膜板组件，其中，所述贴合部上由所述贴合面向所述第一表面延伸形成的辅助结构，多个所述辅助结构在所述贴合面上环绕所述蒸镀开口间隔分布，所述第一方向上所述贴合部的厚度与所述辅助结构的延伸高度之和等于所述支撑部的厚度。
  12. 根据权利要求11所述的蒸镀掩膜板组件，其中，
    所述蒸镀网膜覆盖在所述第一表面上且所述蒸镀网膜自身长度方向上的两侧边与所述支撑部的所述支撑面以及所述辅助结构位于所述第一表面的辅助支撑面均接触设置。
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