WO2024021810A1 - 发热体及电子雾化装置 - Google Patents

发热体及电子雾化装置 Download PDF

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Publication number
WO2024021810A1
WO2024021810A1 PCT/CN2023/095929 CN2023095929W WO2024021810A1 WO 2024021810 A1 WO2024021810 A1 WO 2024021810A1 CN 2023095929 W CN2023095929 W CN 2023095929W WO 2024021810 A1 WO2024021810 A1 WO 2024021810A1
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WO
WIPO (PCT)
Prior art keywords
base body
heating
heating element
layer
film layer
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PCT/CN2023/095929
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English (en)
French (fr)
Inventor
金鹤
周宏明
邓金兴
杜贤武
李日红
Original Assignee
深圳麦克韦尔科技有限公司
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Publication of WO2024021810A1 publication Critical patent/WO2024021810A1/zh

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Classifications

    • A—HUMAN NECESSITIES
    • A24—TOBACCO; CIGARS; CIGARETTES; SIMULATED SMOKING DEVICES; SMOKERS' REQUISITES
    • A24F—SMOKERS' REQUISITES; MATCH BOXES; SIMULATED SMOKING DEVICES
    • A24F40/00—Electrically operated smoking devices; Component parts thereof; Manufacture thereof; Maintenance or testing thereof; Charging means specially adapted therefor
    • A24F40/40—Constructional details, e.g. connection of cartridges and battery parts
    • A24F40/46—Shape or structure of electric heating means
    • A—HUMAN NECESSITIES
    • A24—TOBACCO; CIGARS; CIGARETTES; SIMULATED SMOKING DEVICES; SMOKERS' REQUISITES
    • A24F—SMOKERS' REQUISITES; MATCH BOXES; SIMULATED SMOKING DEVICES
    • A24F40/00—Electrically operated smoking devices; Component parts thereof; Manufacture thereof; Maintenance or testing thereof; Charging means specially adapted therefor
    • A24F40/40—Constructional details, e.g. connection of cartridges and battery parts

Definitions

  • the present application relates to the field of atomization technology, and in particular to a heating element and an electronic atomization device.
  • Aerosol is a colloidal dispersion system formed by small solid or liquid particles dispersed and suspended in a gas medium. Aerosol can be absorbed by the human body through the respiratory system, providing users with a new alternative absorption method. For example, electronic atomization devices that can bake and heat herbal or ointment aerosol-generating substrates to generate aerosols are used in different fields to deliver inhalable aerosols to users, replacing conventional product forms and absorption Way.
  • the electronic atomization device uses a heating element to heat the aerosol-generating substrate to generate aerosol for the user to inhale.
  • the heating element includes a base body, and in order to avoid fragmentation or cracking of the heating element, more and more heating elements are currently using metal materials to form their base bodies.
  • metal materials forming the base of the heating element contain heavy metal elements such as nickel and chromium, the precipitation of heavy metal elements will affect the safety of the aerosol, thus posing safety risks to personal health.
  • a heating element and an electronic atomization device are provided.
  • a heating element, the heating element includes:
  • a base body which is prepared and formed from a metal material
  • the protective layer directly and completely covers the surface of the matrix to prevent the precipitation of heavy metal elements in the matrix.
  • the heating element further includes a functional film layer, and the protective layer is provided between the functional film layer and the base body;
  • the functional film layer includes one or more of a uniform heat layer, a heating film layer, an infrared radiation film layer and a temperature measurement layer.
  • the heating film layer includes a first film tape and a heating circuit provided on the first film tape.
  • the temperature measurement film layer includes a second film tape and a temperature measurement circuit provided on the second film tape.
  • the base body is a cylindrical heating structure, the base body has a receiving position for accommodating the aerosol-generating substrate, and the protective layer is provided on the inner and outer surfaces of the base body; the function
  • the film layer includes the heat equalizing layer and the heating film layer.
  • the heat equalizing layer and the heating film layer are both located outside the base.
  • the heat equalizing layer is located on the heating film layer. between the film layer and at least part of the protective layer.
  • the functional film layer further includes an infrared radiation film layer, and the infrared radiation film layer is provided in the base.
  • the base body is a cylindrical heating structure, the base body has a receiving position for accommodating the aerosol-generating substrate, and the protective layer is provided on the inner and outer surfaces of the base body; the function The film layer includes the temperature measurement layer, and the temperature measurement layer is located outside the base.
  • the protective layer is prepared and formed using a dip coating process.
  • the thickness of the protective layer is 5 ⁇ m-200 ⁇ m.
  • the base body is made of 430 stainless steel, 316L stainless steel or 304 stainless steel.
  • the base is a central heating structure, and the protective layer is provided on the outer surface of the base; or
  • the base body is a peripheral heating structure
  • the protective layer is provided on the inner and outer surfaces of the base body
  • the base body has an accommodation position for accommodating the aerosol-generating substrate.
  • the base body is a pin-like structure or a sheet-like structure
  • the base body is a circular tube structure with both ends open, or a cylindrical structure with an open top and a closed bottom end.
  • the base body is a hollow central heating structure with one end open and the other end closed.
  • a vent hole is provided on the base body. The vent hole is close to the closed end of the base body. The vent holes are connected to each other.
  • the hollow part of the base body forms an air flow channel with the external space.
  • the base body includes a top and a body.
  • the body is a hollow structure with openings at both ends.
  • the top is sealingly connected to one end of the body and covers the opening at that end of the body.
  • the ventilation hole Set on the body and close to the top.
  • the body is a cylindrical structure, and the top gradually becomes smaller in a direction away from the body.
  • the substrate is capable of inductively generating heat under a magnetic field.
  • An electronic atomization device includes a heating chamber and a heating element as described in any one of the above.
  • the heating element is arranged in the heating chamber, and the heating chamber is used to accommodate an aerosol-generating substrate.
  • the above-mentioned heating element and electronic atomization device on the one hand, because the protective layer is directly provided on the surface of the substrate and completely wraps the surface of the substrate, it can prevent the precipitation of heavy metal elements in the substrate in an all-round way, because heavy metal elements will not precipitate from the substrate. , the safety of the aerosol formed by heating is ensured, thus protecting personal health.
  • the setting of the protective layer will not affect the performance of other functional film layers and can continue to be coated.
  • the protective layer is directly located on the surface of the substrate, other functional film layers of the heating element will have to be placed outside the protective layer.
  • Figure 1 is a schematic structural diagram of a heating element provided by an embodiment of the present application.
  • FIG. 2 is a schematic diagram of the partial structure of the heating element shown in Figure 1;
  • Figure 3 is a schematic structural diagram of a heating element provided by another embodiment of the present application.
  • Figure 4 is a schematic structural diagram of a heating element provided by another embodiment of the present application.
  • Figure 5 is a partial structural schematic diagram of a heating element provided by yet another embodiment of the present application.
  • Figure 6 is a partial structural schematic diagram of a heating element provided by another embodiment of the present application.
  • Figure 7 is a partial structural schematic diagram of a heating element provided by yet another embodiment of the present application.
  • Figure 8 is a partial structural schematic diagram of a heating element provided by yet another embodiment of the present application.
  • Figure 9 is the BaO-A12O3-SiO2 ternary phase diagram.
  • Heating element 100. Heating element; 10. Base body; 11. Ventilation hole; 12. Top; 13. Body; 20. Protective layer; 30. Heating film layer; 31. First film tape; 32. Heating circuit; 40. Uniform heat layer ; 50. Infrared radiation film layer; 60. Temperature measurement layer; 61. Second film tape; 62. Temperature measurement line.
  • first and second are used for descriptive purposes only and cannot be understood as indicating or implying relative importance or implicitly indicating the quantity of indicated technical features. Therefore, features defined as “first” and “second” may explicitly or implicitly include at least one of these features.
  • “plurality” means at least two, such as two, three, etc., unless otherwise expressly and specifically limited.
  • connection In this application, unless otherwise clearly stated and limited, the terms “installation”, “connection”, “connection”, “fixing” and other terms should be understood in a broad sense. For example, it can be a fixed connection or a detachable connection. , or integrated into one; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium; it can be an internal connection between two elements or an interactive relationship between two elements, unless otherwise specified limitations. For those of ordinary skill in the art, the specific meanings of the above terms in this application can be understood according to specific circumstances.
  • a first feature being “on” or “below” a second feature may mean that the first and second features are in direct contact, or the first and second features are in indirect contact through an intermediary. touch.
  • the terms “above”, “above” and “above” the first feature is above the second feature may mean that the first feature is directly above or diagonally above the second feature, or simply means that the first feature is higher in level than the second feature.
  • "Below”, “below” and “beneath” the first feature to the second feature may mean that the first feature is directly below or diagonally below the second feature, or simply means that the first feature has a smaller horizontal height than the second feature.
  • An embodiment of the present application provides an electronic atomization device.
  • the electronic atomization device includes a heating element 100.
  • the heating element 100 is used to heat an aerosol-generating substrate so that the aerosol-generating substrate is heated and baked to volatilize corresponding components to form Aerosol.
  • a suction airflow is generated, and the generated aerosol follows the suction airflow and enters the user's mouth, where it is inhaled by the user.
  • the heating element 100 includes a base 10 and a protective layer 20 .
  • the base 10 is made of metal material to avoid fragmentation or cracking of the base 10 when made of other materials (such as ceramics).
  • the base body 10 is made of 430 stainless steel, 316L stainless steel or 304 stainless steel.
  • stainless steel is a general steel type with good corrosion resistance. It has better thermal conductivity than austenite, smaller thermal expansion coefficient than austenite, is resistant to thermal fatigue, has added stabilizing element titanium, and has good mechanical properties at the weld.
  • 316L is widely used in the chemical industry because of its excellent corrosion resistance. 316L is also a derivative of 18-8 austenitic stainless steel, with added There are 2 to 3% Mo element.
  • 304 stainless steel is a common material in stainless steel. It is also called 18/8 stainless steel in the industry, which means it contains more than 18% chromium and more than 8% nickel. It can withstand high temperatures of 800°C and has the characteristics of good processing performance and high toughness.
  • the type of metal material used for the base 10 is not limited.
  • the protective layer 20 directly and completely covers the surface of the substrate 10 to prevent the precipitation of heavy metal elements in the substrate 10 . That is, there is no other layer structure between the protective layer 20 and the base 10 , but the protective layer 20 is directly wrapped on the surface of the base 10 to prevent the precipitation of heavy metal elements in the base 10 .
  • complete wrapping means that the protective layer 20 completely wraps the surface of the base body 10 exposed to the outside world (including the inner surface and the outer surface).
  • the protective layer 20 is directly provided on the surface of the substrate 10 and completely wraps the surface of the substrate 10, can prevent the precipitation of heavy metal elements in the substrate 10 in all directions. Since the heavy metal elements will not precipitate from the substrate 10, Then the safety of the aerosol formed by heating can be ensured, thereby protecting personal health. On the other hand, the installation of the protective layer 20 will not affect the performance of other functional film layers, and the coating can continue. However, since the protective layer 20 is directly provided on the surface of the base 10, other functional film layers of the heating element 100 will have to be provided on the surface.
  • the protective layer 20 avoid directly covering the functional film layer on the surface of the base 10 through high-temperature sintering, which will greatly weaken the salt spray resistance of the heating element 100 (high-temperature sintering is required when coating the surface of the base 10, but high-temperature heat treatment will destroy it.
  • the protective layer on the surface of the substrate 10 produces an oxide layer, which will accelerate corrosion in a salt spray environment).
  • the base 10 is a peripheral heating structure
  • the protective layer 20 is provided on the inner and outer surfaces of the base 10 to wrap the entire surface of the base 10
  • the base 10 has an aerosol-generating matrix inside. accommodation space.
  • the aerosol-generating substrate is heated, the aerosol-generating substrate is inserted into the accommodation position, and the heating element 100 generates heat to bake the aerosol-generating substrate located at the accommodation position.
  • the base body 10 is a circular tube structure with both ends open, that is, the base body 10 has a hollow cavity, and the hollow cavity penetrates the base body 10 in the axial direction and forms the above-mentioned accommodation position.
  • the base body 10 can also be configured as a cylindrical structure with an open top and a closed bottom end, that is, one end of the hollow cavity is closed, and the other end is formed for aerosol generation. The opening for matrix insertion.
  • the base 10 is a central heating structure, and the protective layer 20 is provided on the outer surface of the base 10 .
  • the heating element 100 is inserted into the aerosol-generating matrix, and the heating element 100 generates heat to bake the aerosol-generating matrix into which it is inserted.
  • the base 10 has a pin-like structure, so that when the aerosol-generating matrix is heated, the tip of the pin-like structure can be inserted into the aerosol-generating matrix, making it convenient for the heating element 100 to be inserted into the aerosol-generating matrix. It can be understood that in other embodiments, the base 10 can also be provided with a sheet-like structure, and the specific shape of the base 10 is not limited.
  • the base 10 is a hollow central heating structure with one end open and the other end closed.
  • the body 10 is provided with a vent hole 11 , which is close to the closed end of the base body 10 .
  • the vent hole 11 connects the hollow part of the base body 10 with the external space to form an air flow channel.
  • the base 10 includes a top 12 and a body 13.
  • the body 13 is a hollow structure with openings at both ends.
  • the top 12 is sealingly connected to one end of the body 13 and covers the opening at that end of the body 13.
  • the ventilation hole 11 is provided on the body 13 and close to the top. 12.
  • an electronic atomization device includes a shell, a heating cavity is formed in the shell, the heating element 100 is partially or completely accommodated in the heating cavity, and the aerosol generating substrate is partially or completely accommodated in the heating cavity.
  • the base body 10 is provided with a vent hole 11 in the area of the body 13 near the top 12, so that external air flows in from the hollow part of the body 13 and flows into the heating cavity through the vent hole 11 near the top 12. This changes the flow path of the air flow and reduces the risk of air leakage.
  • the amount of burnt smelling substances produced by over-baking in the high-temperature area is carried out by the airflow, and at the same time, the aerosol-generating matrix near the bottom of the shell is given an oxygen-deficient environment, so that this part of the aerosol-generating matrix can produce a rich aroma. Thereby reducing the burnt smell and increasing the aroma, and improving the taste of the aerosol-generating matrix after heating.
  • the top 12 gradually becomes smaller in the direction away from the body 13 , that is, the cross section of the top 12 gradually decreases from the end close to the body 13 to the end far away from the body 13 .
  • the body 13 has a cylindrical structure with openings at both ends, and the top 12 has a tapered shape.
  • the ventilation hole 11 is close to the top 12 means that the ventilation hole 11 is provided in a section of the body 13 close to the top 12 , and this area is closer to the top 12 than the bottom end of the body 13 close to the housing.
  • the ventilation hole 11 is provided in an area of 0 mm to 6 mm of the body 13 near the top 12 .
  • the ventilation hole 11 is provided in the 0 mm to 4 mm area of the body 13 near the top 12 .
  • a plurality of ventilation holes 11 are provided at intervals on the body 13 . In other embodiments, only one through hole 11 may be provided on the body 13, which is not limited here.
  • each vent hole 11 is a tapered hole, and the aperture of the section of each vent hole 11 close to the inner surface of the body 13 is larger than the aperture of its section close to the outer surface of the body 13 . In this way, the flow path when the airflow flows out from the hollow part of the body 13 through the vent hole 11 is narrowed, so that the airflow flowing out of the body 13 has a greater impact force, and further makes the outer surface of the body 13 less likely to adhere or Adhesive dirt and reduce dirt residue.
  • the functional film layer is one of the uniform heat layer 40 , the heating film layer 30 , the infrared radiation film layer 50 and the temperature measurement layer 60
  • the heating film layer 30 generates heat when energized to heat the aerosol generating substrate.
  • the infrared radiation film layer 50 is heated and then radiated infrared to radiatively heat the aerosol generating substrate.
  • the heat equalizing layer 40 is used to make the temperature uniform throughout the heating element 100 .
  • the heat equalizing layer 40 is used to make the temperature uniform everywhere along the axial and circumferential directions of the heating element 100 .
  • the temperature measuring layer 60 is used to test the temperature of the heating element 100 to control the temperature of the heating element 100 .
  • the base body 10 is a cylindrical heating structure.
  • the base body 10 has a receiving position for accommodating the aerosol-generating substrate.
  • the protective layer 20 is provided on the inner and outer surfaces of the base body 10 .
  • the functional film layer includes a uniform heat layer 40 and a heating film layer 30 . Both the heat uniform layer 40 and the heating film layer 30 are arranged outside the base 10 .
  • the heat uniform layer 40 is located between at least part of the protective layer 20 and the heating film layer 30 .
  • a heat equalizing layer 40 is provided between the protective layer 20 and part of the heating film layer 30 .
  • the heating film layer 30 is energized to generate heat, and the heat is transferred to the base 10 through the protective layer 20 and the heat is transferred to the aerosol-generating matrix accommodated in the accommodation position.
  • the uniform heat layer 40 makes the temperature of the heating element 100 uniform in the circumferential direction and the axial direction, so that the aerosol generating substrate is heated evenly.
  • the functional film layer also includes an infrared radiation film layer 50 , and the infrared radiation film layer 50 is provided in the base body 10 .
  • the heating film layer 30 generates heat and transfers heat to the base body 10
  • the base body 10 transfers heat to the infrared radiation film layer 50
  • the infrared radiation film layer 50 performs infrared radiation to radiate infrared radiation to the aerosol generating matrix located therein. heating.
  • the heating film layer 30 is provided to include a first film strip 31 and a heating circuit 32 provided on the first film strip 31 .
  • the heating circuit 32 is first printed on the first film tape 31, and then the first film tape 31 with the heating circuit 32 printed on it is made. into a matching shape.
  • the base body 10 is a cylindrical heating structure, the base body 10 has a receiving position for accommodating the aerosol-generating substrate, and the protective layer 20 is provided on the inner and outer surfaces of the base body 10 .
  • the functional film layer includes a temperature measurement layer 60 , which is provided outside the base 10 .
  • the temperature measurement layer 60 can test the temperature of the heating element 100 so as to control its temperature.
  • the base 10 can induce heat under a magnetic field.
  • a coil can be set outside the heating element 100. The coil is energized to generate a magnetic field, and the heating element 100 is placed in the magnetic field to generate heat.
  • the temperature measurement film layer includes a second film tape 61 and a temperature measurement circuit 62 provided on the second film tape 61 .
  • the temperature measurement circuit 62 is first printed on the second film tape 61, and then the second film tape with the temperature measurement circuit 62 printed on it is printed. 61 is made into a matching shape.
  • the base body 10 or the heating element 100 is configured in other shapes, the selection of its functional film layers can also be configured with reference to the above-mentioned specific embodiments, or other arrangements can be adopted. This is not specifically limited.
  • the protective layer 20 is prepared and formed by a dip coating process.
  • the object to be coated is completely immersed in a tank containing paint. After a short period of time, it is taken out of the tank and the excess coating liquid is returned to the tank.
  • This method is called dip coating. Dip coating is characterized by high production efficiency, simple operation, and low coating loss. It is suitable for small hardware parts, steel pipe racks, sheets, and equipment with relatively complex structures or electrical insulator materials.
  • the protective layer 20 directly covers the surface of the substrate 10 through a dip coating process, and can fully cover the internal and external surfaces of the metal substrate 10 with different structures (especially special-shaped structures), that is, it can achieve 360° full coverage protection.
  • the protective layer 20 can also be formed on the surface of the base 10 using other processes, which is not limited here.
  • the thickness of the protective layer 20 is 5 ⁇ m-200 ⁇ m.
  • the protective layer 20 can fully isolate harsh environments such as external air and salt spray, so that the heating element 100 can withstand the salt spray test, and can prevent the precipitation of heavy metal elements in the metal matrix 10 to ensure the safety of the aerosol.
  • the thickness of the protective layer 20 is set to 5 ⁇ m-200 ⁇ m, which facilitates the coating on the surface of the protective layer 20 by various methods such as silk printing, roll film, and coating. It is also possible to add functional films such as a leveling layer and an infrared radiation layer outside the protective layer 20 layer and has no impact on the performance of the functional film layer.
  • the protective layer 20 can also be selected according to needs, and is not limited here.
  • the protective layer 20 is formed by low-temperature sintering on the surface of the substrate 10 .
  • the protective layer 20 is prepared by adding oxides of iron, cobalt, and nickel to the glass forming system.
  • the glass-forming system is the skeleton component that forms the glass.
  • the thermal expansion coefficient of the glass-forming system matches that of the stainless steel matrix 10, and adding oxides of iron, cobalt, and nickel to the glass-forming system can improve the wettability of the protective layer 20 and the stainless steel matrix 10.
  • these elements can It forms a chemical bond with the stainless steel base 10 to improve the bonding strength between the protective layer 20 and the base 10 .
  • the protective layer 20 is prepared by adding iron, cobalt, and nickel oxides to the glass forming system, which can not only make the thermal expansion matching between the protective layer 20 and the substrate 10 higher, but also improve the thermal expansion of the protective layer 20 and the substrate 10 .
  • the combined strength improves the resistance of the heating element 100 to mechanical impact and thermal shock.
  • the optional glass forming system is the BaO-A12O3-SiO2 system, or a system in which CaO is selected to replace part of the BaO in the above-mentioned BaO-A12O3-SiO2 system.
  • Co2O3 can be added to the oxides of iron, cobalt and nickel.
  • the BaO-A12O3-SiO2 system includes BaO-A12O3-SiO2 base material, crystal nucleating agent, alkali metal oxides, alkaline earth metal oxides and B2O3.
  • the crystal nucleating agent is one or more of TiO2, ZrO2, CaF2, etc.
  • Alkali metal oxides and alkaline earth metal oxides play a role in adjusting the properties of glass.
  • Alkali metal oxides and alkaline earth metal oxides include Na2O, K2O, CaO, MgO, BaO, Al2O3 and ZnO.
  • B2O3 plays the role of lowering the melting temperature of glass and adjusting the softening temperature of glass.
  • the main composition ratio of the BaO-A12O3-SiO2 base material can be selected near the barium feldspar region.
  • the BaO-A12O3-SiO2 base material contains: 30%-60 %BaO, 10%-30%A12O3, 15%-50%SiO2.
  • the thermal expansion of the protective layer 20 and the base body 10 is ensured to match, and at the same time, the bonding strength of the protective layer 20 and the base body 10 can be improved, and the resistance to mechanical impact and thermal shock of the heating element 100 is improved.
  • its low-temperature sintering temperature with the substrate 10 is 800°C-900°C, which can ensure the bonding strength of the formed protective layer 20 and the substrate 10 and can withstand the 350°C room temperature water quenching test, and can withstand a 20s temperature rise 8,000 times of long-term cycle testing to 350°C and then cooling for 1 minute.
  • the proportion of materials selected to prepare the protective layer 20 is specifically: 50% BaO, 15% A12O3, 22% SiO2, 3.5% ZrO2, 1.5% TiO2, 1.3% Na2O, 1.3% CaO, 1% MgO. , 3% B2O3, 1.4% Co2O3.
  • the crystallization peak temperature is about 850°C
  • the thermal expansion coefficient is about 10.1ppm/°C
  • the protective layer 20 can be well matched with the 430 stainless steel substrate 10.
  • the proportion of materials selected to prepare the protective layer 20 is specifically: 53% BaO, 14% A12O3, 24% SiO2, 1.8% ZrO2, 2% TiO2, 1.3% K2O, 1.0% Na2O, 0.5% CaO, 1% MgO, 1.4% Co2O3.
  • the crystallization peak temperature is about 860°C
  • the thermal expansion coefficient is about 10.6ppm/°C
  • the protective layer 20 can be well matched with the 430 stainless steel substrate 10.
  • the type of material selected for the protective layer 20 can be set according to needs, and is not limited here.
  • the heating element 100 includes a base 10 and a protective layer 20.
  • the base 10 is made of metal material, and the protective layer 20 directly and completely covers the surface of the base 10 to prevent the precipitation of heavy metal elements in the base 10 .
  • the heating element 100 and electronic atomization device provided by this application have the following beneficial effects:
  • the protective layer 20 is directly disposed on the surface of the substrate 10 and completely wraps the surface of the substrate 10, thereby fully preventing the precipitation of heavy metal elements in the substrate 10. Since heavy metal elements will not precipitate from the substrate 10, they will be formed by heating. The safety of aerosols is ensured, thereby protecting personal health.
  • the setting of the protective layer 20 will not affect the performance of other functional film layers, and the coating can continue. However, since the protective layer 20 is directly provided on the surface of the base 10, other functional film layers of the heating element 100 will have to be provided on the protective layer. 20+, avoid After high-temperature sintering, the functional film layer is directly covered on the surface of the base body 10, which greatly weakens the salt spray resistance of the heating element 100 (high-temperature sintering is required when coating the surface of the base body 10, but high-temperature heat treatment will destroy the protective layer on the surface of the base body 10 , producing an oxide layer, which will accelerate corrosion in a salt spray environment).
  • the functional film layer of the heating element 100 includes the heating film layer 30. When the heating film layer 30 is energized, it generates heat to heat the aerosol-generating substrate to achieve resistance heating.
  • the functional film layer also includes an infrared radiation film layer 50.
  • the infrared radiation film layer 50 is heated and then radiates infrared radiation to radiatively heat the aerosol-generating substrate to achieve infrared radiation heating. Heating by electromagnetic heating can also be achieved by arranging a coil outside the heating element 100 . That is, the heating element 100 can selectively select a variety of heating methods to heat the aerosol-generating substrate by changing the implementation of the functional film layer.
  • the protective layer 20 is prepared by adding oxides of iron, cobalt, and nickel to the glass forming system, which not only makes the thermal expansion matching between the protective layer 20 and the substrate 10 higher, but also improves the thermal expansion resistance between the protective layer 20 and the substrate 10 .
  • the bonding strength prevents the protective layer 20 from falling off from the base 10 easily, and improves the resistance of the heating element 100 to mechanical impact and thermal shock.

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  • Resistance Heating (AREA)

Abstract

一种发热体(100)及电子雾化装置，发热体(100)包括：基体(10)，基体(10)通过金属材料制备形成；防护层(20)，直接且完全包裹基体(10)的表面，用于防止基体(10)中重金属元素的析出。由于防护层(20)直接设于基体(10)的表面且将基体(10)的表面完全包裹，从而能够全方位的防止基体(10)中重金属元素的析出，加热形成的气溶胶的安全性得以保；防护层(20)直接设于基体(10)的表面，发热体(100)的其他功能膜层将必须设置于防护层(20)外，避免经过高温烧结而使得发热体(100)的耐盐雾能力大大减弱。

Description

发热体及电子雾化装置 技术领域
本申请涉及雾化技术领域，特别是涉及一种发热体及电子雾化装置。
背景技术
气溶胶是一种由固体或液体小质点分散并悬浮在气体介质中形成的胶体分散体系，气溶胶可通过呼吸系统被人体吸收，为用户提供一种新型的替代吸收方式。例如，可对草本类或膏类的气溶胶生成基质烘烤加热而产生气溶胶的电子雾化装置，应用于不同领域中，为用户递送可供吸入的气溶胶，替代常规的产品形态及吸收方式。
电子雾化装置利用发热体对气溶胶生成基质加热，以产生供用户吸食的气溶胶。发热体包括基体，而为了避免发热体断片或开裂，目前越来越多的发热体开始采用金属材料形成其基体。但是由于上述形成发热体的基体的金属材料大多含有如镍及铬等重金属元素，重金属元素析出，会对气溶胶的安全性产生影响，从而给人身健康带来安全隐患。
发明内容
根据本申请的各种实施例，提供一种发热体及电子雾化装置。
一种发热体，所述发热体包括：
基体，所述基体通过金属材料制备形成；
防护层，直接且完全包裹所述基体的表面，用于防止所述基体中重金属元素的析出。
在其中一个实施例中，所述发热体还包括功能膜层，所述防护层设于所述功能膜层与所述基体之间；
所述功能膜层包括均热层、加热膜层、红外辐射膜层及测温层中的一种或多种。
在其中一个实施例中，所述加热膜层包括第一膜带及设于所述第一膜带上的加热线路。
在其中一个实施例中，所述测温膜层包括第二膜带及设于所述第二膜带上的测温线路。
在其中一个实施例中，所述基体为圆筒状发热结构，所述基体具有用于容置气溶胶生成基质的容置位，所述防护层设于所述基体的内外表面；所述功能膜层包括所述均热层及所述加热膜层，所述均热层及所述加热膜层均设于所述基体外，所述均热层位于所述加热 膜层与所述防护层的至少部分之间。
在其中一个实施例中，所述功能膜层还包括红外辐射膜层，所述红外辐射膜层设于所述基体内。
在其中一个实施例中，所述基体为圆筒状发热结构，所述基体具有用于容置气溶胶生成基质的容置位，所述防护层设于所述基体的内外表面；所述功能膜层包括所述测温层，所述测温层设于所述基体外。
在其中一个实施例中，所述防护层采用浸涂工艺制备形成。
在其中一个实施例中，所述防护层的层厚为5μm-200μm。
在其中一个实施例中，所述基体采用430不锈钢、316L不锈钢或304不锈钢制备形成。
在其中一个实施例中，所述基体为中心发热结构，所述防护层设于所述基体的外表面；或者
所述基体为外周发热结构，所述防护层设于所述基体的内外表面，所述基体具有用于容置气溶胶生成基质的容置位。
在其中一个实施例中，所述基体为销钉状结构或片状结构；或
所述基体为两端开口的圆管结构，或顶端开口及底端封闭的圆筒状结构。
在其中一个实施例中，所述基体为中空的中心发热结构且一端开口另一端封闭，所述基体上设置有通气孔，所述通气孔靠近所述基体的封闭的一端，所述通气孔连通所述基体的中空部分与外界空间而形成气流通道。
在其中一个实施例中，所述基体包括顶部和本体，所述本体为两端开口的中空结构，所述顶部与所述本体的一端密封连接并遮蔽所述本体该端的开口，所述通气孔设置于本体上并靠近所述顶部。
在其中一个实施例中，所述本体为圆柱结构，所述顶部向远离所述本体的方向逐渐变小。
在其中一个实施例中，所述基体能够在磁场下感应发热。
一种电子雾化装置，包括加热腔及如上述任一项所述的发热体，所述发热体设置于所述加热腔内，所述加热腔用于收容气溶胶生成基质。
上述发热体及电子雾化装置，一方面，由于防护层直接设于基体的表面且将基体的表面完全包裹，从而能够全方位的防止基体中重金属元素的析出，由于重金属元素不会从基体析出，则其加热形成的气溶胶的安全性得以保证，从而保护了人身健康。另一方面，防护层的设置不会影响其他功能膜层的性能，可以继续覆膜，而由于防护层直接设于基体的表面，则发热体的其他功能膜层将必须设置于防护层外，避免经过高温烧结将功能膜层直 接覆盖在基体的表面而使得发热体的耐盐雾能力大大减弱(在基体的表面覆膜时需要高温烧结，但是高温热处理会破坏基体表面的保护层，产生氧化层，在盐雾环境下会加速腐蚀)。
附图说明
为了更清楚地说明本申请实施例或现有技术中的技术方案，下面将对实施例或现有技术描述中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本申请的实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据公开的附图获得其他的附图。
图1为本申请一实施例提供的发热体的结构示意图；
图2为图1中所示的发热体的局部结构示意图；
图3本申请另一实施例提供的发热体的结构示意图；
图4为本申请又一实施例提供的发热体的结构示意图；
图5为本申请再一实施例提供的发热体的局部结构示意图；
图6为本申请又一实施例提供的发热体的局部结构示意图；
图7为本申请再一实施例提供的发热体的局部结构示意图；
图8为本申请再一实施例提供的发热体的局部结构示意图；
图9为BaO-A12O3-SiO2三元相图。
100、发热体；10、基体；11、通气孔；12、顶部；13、本体；20、防护层；30、加热膜层；31、第一膜带；32、加热线路；40、均热层；50、红外辐射膜层；60、测温层；61、第二膜带；62、测温线路。
具体实施方式
为使本申请的上述目的、特征和优点能够更加明显易懂，下面结合附图对本申请的具体实施方式做详细的说明。在下面的描述中阐述了很多具体细节以便于充分理解本申请。但是本申请能够以很多不同于在此描述的其它方式来实施，本领域技术人员可以在不违背本申请内涵的情况下做类似改进，因此本申请不受下面公开的具体实施例的限制。
在本申请的描述中，需要理解的是，术语“中心”、“纵向”、“横向”、“长度”、“宽度”、“厚度”、“上”、“下”、“前”、“后”、“左”、“右”、“竖直”、“水平”、“顶”、“底”、“内”、“外”、“顺时针”、“逆时针”、“轴向”、“径向”、“周向”等指示的方位或位置关系为基于附图所示的方位或位置关系，仅是为了便于描述本申请和简化描述，而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作，因此不能理解为对本申 请的限制。
此外，术语“第一”、“第二”仅用于描述目的，而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量。由此，限定有“第一”、“第二”的特征可以明示或者隐含地包括至少一个该特征。在本申请的描述中，“多个”的含义是至少两个，例如两个，三个等，除非另有明确具体的限定。
在本申请中，除非另有明确的规定和限定，术语“安装”、“相连”、“连接”、“固定”等术语应做广义理解，例如，可以是固定连接，也可以是可拆卸连接，或成一体；可以是机械连接，也可以是电连接；可以是直接相连，也可以通过中间媒介间接相连，可以是两个元件内部的连通或两个元件的相互作用关系，除非另有明确的限定。对于本领域的普通技术人员而言，可以根据具体情况理解上述术语在本申请中的具体含义。
在本申请中，除非另有明确的规定和限定，第一特征在第二特征“上”或“下”可以是第一和第二特征直接接触，或第一和第二特征通过中间媒介间接接触。而且，第一特征在第二特征“之上”、“上方”和“上面”可是第一特征在第二特征正上方或斜上方，或仅仅表示第一特征水平高度高于第二特征。第一特征在第二特征“之下”、“下方”和“下面”可以是第一特征在第二特征正下方或斜下方，或仅仅表示第一特征水平高度小于第二特征。
需要说明的是，当元件被称为“固定于”或“设置于”另一个元件，它可以直接在另一个元件上或者也可以存在居中的元件。当一个元件被认为是“连接”另一个元件，它可以是直接连接到另一个元件或者可能同时存在居中元件。本文所使用的术语“垂直的”、“水平的”、“上”、“下”、“左”、“右”以及类似的表述只是为了说明的目的，并不表示是唯一的实施方式。
本申请一实施例提供了一种电子雾化装置，该电子雾化装置包括发热体100，利用发热体100对气溶胶生成基质进行加热使得气溶胶生成基质受热烘烤而挥发相应的成分从而形成气溶胶。用户对电子雾化装置或气溶胶生成基质进行抽吸时产生抽吸气流，产生的气溶胶跟随抽吸气流进入用户口腔中，即被用户吸食。
参阅图1及图2，发热体100包括基体10及防护层20。基体10通过金属材料制备形成，以避免采用其他材质(如陶瓷)制备时基体10的断片或开裂。具体地，基体10通过430不锈钢、316L不锈钢或304不锈钢制备形成。
430不锈钢是具有良好的耐腐蚀性能的通用钢种，导热性能比奥氏体好，热膨胀系数比奥氏体小，耐热疲劳，添加稳定化元素钛，焊缝部位机械性能好。316L因其优异的耐腐蚀性在化工行业有着广泛的应用，316L也是属于18-8型奥氏体不锈钢的衍生钢种，添加 有2～3％的Mo元素。304不锈钢是不锈钢中常见的一种材质，业内也叫做18/8不锈钢，意思为含有18％以上的铬和8％以上的镍，耐高温800℃，具有加工性能好及韧性高的特点。
应当理解的是，在另一些实施例中，对于基体10所采用的金属材料的种类不作限定。
防护层20直接且将基体10的表面完全包裹，以用于防止基体10中重金属元素的析出。即为，防护层20与基体10之间不存在其他的层结构，而是防护层20直接包裹于基体10的表面，以防止基体10中重金属元素的析出。其中，完全包裹的意思是：防护层20将基体10裸露于外界的表面(包括内表面和外表面)完全包裹。
上述设置，一方面，由于防护层20直接设于基体10的表面且将基体10的表面完全包裹，从而能够全方位的防止基体10中重金属元素的析出，由于重金属元素不会从基体10析出，则其加热形成的气溶胶的安全性得以保证，从而保护了人身健康。另一方面，防护层20的设置不会影响其他功能膜层的性能，可以继续覆膜，而由于防护层20直接设于基体10的表面，则发热体100的其他功能膜层将必须设置于防护层20外，避免经过高温烧结将功能膜层直接覆盖在基体10的表面而使得发热体100的耐盐雾能力大大减弱(在基体10的表面覆膜时需要高温烧结，但是高温热处理会破坏基体10表面的保护层，产生氧化层，在盐雾环境下会加速腐蚀)。
一些实施例中，参阅图3-图5，基体10为外周发热结构，防护层20设于基体10的内外表面，以将整个基体10的表面包裹，基体10内具有用于容纳气溶胶生成基质的容纳位。当对气溶胶生成基质进行加热时，气溶胶生成基质插入容置位内，发热体100发热，以烘烤位于容置位的气溶胶生成基质。
基体10为两端开口的圆管结构，即为，基体10具有中空腔，中空腔在轴向上贯穿基体10并形成上述容置位。参阅图5，可以想到的是，在另一些具体实施方式中，也可以设置基体10为顶端开口及底端封闭的圆筒状结构，即为中空腔的一端封闭，另一端形成供气溶胶生成基质插入的开口。
另一实施例中，参阅图6及图7，基体10为中心发热结构，防护层20设于基体10的外表面。当加热气溶胶生成基质时，发热体100插入气溶胶生成基质内，发热体100产生热量，以烘烤供其插入的气溶胶生成基质。
基体10为销钉状结构，这样，当加热气溶胶生成基质时，能够通过销钉状结构的尖端插入气溶胶生成基质内，方便发热体100插入气溶胶生成基质中。可以理解的是，在另一些实施例中，还可以设置基体10为片状结构，对于基体10的具体形状不作限定。
一个实施例中，参阅图8，基体10为中空的中心发热结构且一端开口另一端封闭，基 体10上设置有通气孔11，通气孔11靠近基体10的封闭的一端，通气孔11连通基体10的中空部分与外界空间而形成气流通道。
具体地，基体10包括顶部12和本体13，本体13为两端开口的中空结构，顶部12与本体13的一端密封连接并遮蔽本体13该端的开口，通气孔11设置于本体13上并靠近顶部12。
一般地，电子雾化装置包括壳体，壳体内形成加热腔，发热体100部分或者全部收容于加热腔内，气溶胶生成基质部分或者全部收容于加热腔中。经研究发现，传统的低温电子雾化装置的发热体与壳体配合加热气溶胶生成基质时，外界空气只能从壳体的底部或者侧壁进入加热腔中，然后被吸走，然而气溶胶生成基质在插入发热体后，其靠近发热体的部分的致密度提高且更靠近发热体而容易出现过度烘烤，过度烘烤而产生的焦味物质随气流很容易被吸食。并且，气溶胶生成基质在缺氧条件下受热而产生的香气更浓郁。因此，基体10通过在本体13靠近顶部12的区域设置通气孔11，使得外界空气从本体13的中空部分流入，经靠近顶部12的通气孔11流入加热腔，改变了气流的流动路径，减少靠近高温区被高温过度烘烤而产生的焦味物质被气流带出的量，同时给予靠近壳体的底部的气溶胶生成基质缺氧的环境而使得这部分气溶胶生成基质能够产生浓郁的香气，从而减少焦味并增加香气，改善气溶胶生成基质受热后的口感。
进一步，顶部12向远离本体13的方向逐渐变小，即为，顶部12的横截面自靠近本体13的一端到远离本体13的一端逐渐减小。通过将顶部12如此设置可以便于将发热体100插入气溶胶生成基质中。
可选地，本体13呈两端开口的圆柱状结构，顶部12呈锥形。
具体地，通气孔11靠近顶部12是指通气孔11设置在本体13上的靠近顶部12的一段区域内，该区域相对于本体13的靠近壳体的底端而言更靠近于顶部12。可选地，通气孔11设置于本体13的靠近顶部12的0mm～6mm区域内。进一步地，通气孔11设置于本体13的靠近顶部12的0mm～4mm区域内。
一实施例中，本体13上间隔设置有多个通气孔11。另一些实施例中，也可以在本体13上只设置一个通孔孔11，在此不作限定。
在一些实施例中，设置各通气孔11均为锥形孔，各通气孔11靠近本体13的内表面的区段的孔径大于其靠近本体13的外表面的区段的孔径。如此，使得气流从本体13的中空部分经通气孔11流出时的流通道路变窄，从而使得从本体13中流出的气流有较大的冲击力，进而使得本体13的外表面更不容易附着或粘连污垢，减少污垢残留。
一实施例中，功能膜层为均热层40、加热膜层30、红外辐射膜层50及测温层60中 的一种或层叠而设的多种。其中，加热膜层30通电时产生热量，以对气溶胶生成基质进行加热。红外辐射膜层50被加热后进行红外辐射，以对气溶胶生成基质进行辐射加热。均热层40用于使得发热体100各处的温度均匀，具体地，均热层40用于使得发热体100沿轴向及周向上各处的温度均匀。测温层60用于测试发热体100的温度，以对发热体100进行温度控制。
一具体实施方式中，参阅图1，基体10为圆筒状发热结构，基体10具有容置气溶胶生成基质的容置位，防护层20设于基体10的内外表面。功能膜层包括均热层40及加热膜层30，均热层40及加热膜层30均设于基体10外，均热层40位于防护层20与加热膜层30的至少部分之间。具体地，防护层20与加热膜层30的局部之间设有均热层40。本实施方式中，加热膜层30通电发热，将热量通过防护层20传递至基体10，并将热量传递至容置于容置位内的气溶胶生成基质。均热层40使得发热体100在周向及轴向上各处的温度均匀，从而使得气溶胶生成基质受热均匀。
另一具体实施方式中，参阅图3，与上一具体实施方式的区别在于：功能膜层还包括红外辐射膜层50，红外辐射膜层50设于基体10内。这样，当加热膜层30发热将热量传递至基体10时，基体10将热量传递至红外辐射膜层50，红外辐射膜层50进行红外辐射，以对位于其内的气溶胶生成基质进行红外辐射加热。
进一步，参阅图3，为了便于上述加热膜层30中加热线路32的制备，设置加热膜层30包括第一膜带31及设于第一膜带31上的加热线路32。如此，在形成圆筒状的发热体100或者其他形状的发热体100时，首先将加热线路32印制于第一膜带31上，而后将印制有加热线路32的第一膜带31做成相适配的形状。
又一具体实施方式中，参阅图4，基体10为圆筒状发热结构，基体10具有容置气溶胶生成基质的容置位，防护层20设于基体10的内外表面。功能膜层包括测温层60，测温层60设于基体10外，测温层60能够测试发热体100的温度，以便于对其温度进行控制。在本具体实施方式中，基体10能够在磁场下感应发热，可以将发热体100外设置线圈，线圈通电产生磁场，发热体100置于磁场中以发热。
进一步，为了便于上述测温层60中测温线路62的制备，测温膜层包括第二膜带61及设于第二膜带61上的测温线路62。如此，在形成圆筒状的发热体100或者其他形状的发热体100时，首先将测温线路62印制于第二膜带61上，而后将印制有测温线路62的第二膜带61做成相适配的形状。
在此需要说明的是，在另一些实施例中，基体10或者发热体100设置为其他形状时，其功能膜层的选择也可以参照上述具体实施方式设置，或者也可以采用其他设置方式，在 此不作具体限定。
一实施例中，防护层20采用浸涂工艺制备形成。将被涂物体全部浸没在盛有涂料的槽中，经过很短的时间，再从槽中取出，并将多余的涂液重新流回槽内，这种方法称为浸涂法。浸涂的特点是生产效率高，操作简单，涂料损失少，适用于小型的五金零件、钢质管架、薄片以及结构比较复杂的器材或电气绝缘体材料等。
防护层20通过浸涂工艺直接覆盖于基体10表面，可对不同结构(特别是异形结构)的金属基体10内外表面进行全包裹，即为能够实现360°全覆盖保护。
当然，在另一些实施例中，防护层20也可以采用其他工艺形成于基体10表面，在此亦不作限定。
一实施例中，防护层20的层厚为5μm-200μm。如此，防护层20能够充分隔绝外界空气及盐雾等恶劣环境，使得发热体100可以耐受盐雾测试，且可以防止金属基体10中重金属元素的析出，保证气溶胶的安全性。同时，防护层20厚度设为5μm-200μm，方便在防护层20表面进行丝印、卷膜及镀膜等多种方式覆膜，亦可在防护层20外附加均层层、红外辐射层等功能膜层，对功能膜层的性能无影响。
可以理解的是，在另一些实施例中，防护层20还可以依据需要进行选择，在此亦不作限定。
一实施例中，防护层20为通过在基体10表面低温烧结形成。具体地，防护层20为通过向玻璃形成体系中添加铁、钴、镍的氧化物制备形成。其中，玻璃形成体系是形成玻璃的骨架成分。
以430不锈钢为例进行说明，但是该说明，并不会限制本申请的保护范围。
玻璃形成体系的热膨胀系数与不锈钢基体10相匹配，而在玻璃形成体系中添加铁、钴、镍的氧化物，能改善防护层20与不锈钢基体10的润湿性，在烧结过程中这些元素能与不锈钢基体10形成化学键的结合从而提高防护层20与基体10的结合强度。因此，防护层20通过向玻璃形成体系中添加铁、钴、镍的氧化物制备形成，不但能够使得防护层20与基体10的热膨胀的匹配性较高，且能够提高防护层20与基体10的结合强度，提高了发热体100的抗机械冲击及热冲击的性能。
基于防护层20与基体10的热膨胀匹配性要求，可选择的玻璃形成体系为BaO-A12O3-SiO2体系，或者选择CaO取代上述BaO-A12O3-SiO2体系中部分BaO的体系。铁、钴、镍的氧化物可添加Co2O3。
进一步，BaO-A12O3-SiO2体系包括BaO-A12O3-SiO2基材、晶核剂、碱金属氧化物和碱土金属氧化物及B2O3。具体地，晶核剂为TiO2、ZrO2、CaF2等中的一种或多种。 碱金属氧化物和碱土金属氧化物起到调节玻璃性能的作用，碱金属氧化物和碱土金属氧化物包括Na2O、K2O、CaO、MgO、BaO、Al2O3及ZnO等。B2O3起到了降低玻璃的熔炼温度并调整玻璃的软化温度的作用。
一具体实施例中，75％-95％的BaO-A12O3-SiO2基材、1％-5％的晶核剂，0.5％-5％的铁、钴、镍的氧化物，3％-10％碱金属氧化物和碱土金属氧化物、0％-10％的B2O3。具体地，参阅图9，根据BaO-A12O3-SiO2三元相图，BaO-A12O3-SiO2基材主要组成比例可选择在钡长石区域附近，BaO-A12O3-SiO2基材包含：30％-60％BaO、10％-30％A12O3、15％-50％SiO2。这样，保证了防护层20与基体10的热膨胀相匹配，同时，能够提高防护层20与基体10的结合强度，提高了发热体100的抗机械冲击及热冲击的性能。
选用上述材质时，其与基体10的低温烧结温度为800℃-900℃，其能够保证形成的防护层20与基体10结合强度且能够耐受350℃室温水骤冷测试，且可经受20s升温至350℃再降温1min的长时循环测试8000次。
一个具体实施方式中，制备防护层20所选择的材质的比例具体为：50％BaO、15％A12O3、22％SiO2、3.5％ZrO2、1.5％TiO2、1.3％Na2O、1.3％CaO、1％MgO、3％B2O3、1.4％Co2O3。析晶峰值温度约850℃，热膨胀系数约10.1ppm/℃，防护层20能够与430不锈钢基体10良好匹配。
另一个具体实施方式中，制备防护层20所选择的材质的比例具体为：53％BaO、14％A12O3、24％SiO2、1.8％ZrO2、2％TiO2、1.3％K2O、1.0％Na2O、0.5％CaO,1％MgO、1.4％Co2O3。析晶峰值温度约860℃，热膨胀系数约10.6ppm/℃，防护层20能够与430不锈钢基体10良好匹配。
可以想到的是，在另一些实施例中，防护层20所选择的材料种类可以依据需要而设定，在此亦不作限定。
本申请另一实施例还提供一种发热体100，发热体100包括基体10及防护层20。基体10通过金属材料制备形成，防护层20直接且将基体10的表面完全包裹，以用于防止基体10中重金属元素的析出。
本申请提供的发热体100及电子雾化装置，具有如下有益效果：
1、防护层20直接设于基体10的表面且将基体10的表面完全包裹，从而能够全方位的防止基体10中重金属元素的析出，由于重金属元素不会从基体10析出，则其加热形成的气溶胶的安全性得以保证，从而保护了人身健康。
2、防护层20的设置不会影响其他功能膜层的性能，可以继续覆膜，而由于防护层20直接设于基体10的表面，则发热体100的其他功能膜层将必须设置于防护层20外，避免 经过高温烧结将功能膜层直接覆盖在基体10的表面而使得发热体100的耐盐雾能力大大减弱(在基体10的表面覆膜时需要高温烧结，但是高温热处理会破坏基体10表面的保护层，产生氧化层，在盐雾环境下会加速腐蚀)。
3、发热体100的功能膜层包括加热膜层30，加热膜层30通电时产生热量，以对气溶胶生成基质进行加热，以实现电阻加热方式的加热。功能膜层还包括红外辐射膜层50，红外辐射膜层50被加热后进行红外辐射，以对气溶胶生成基质进行辐射加热，以实现红外辐射方式加热。还可以通过在发热体100外设置线圈，以实现电磁加热方式加热。即为，发热体100通过改变功能膜层的实现，可选择地选择多种加热方式对气溶胶生成基质进行加热。
4、防护层20通过向玻璃形成体系中添加铁、钴、镍的氧化物制备形成，不但能够使得防护层20与基体10的热膨胀的匹配性较高，且能够提高防护层20与基体10的结合强度，防护层20不易从基体10上脱落，且提高了发热体100的抗机械冲击及热冲击的性能。
以上所述实施例的各技术特征可以进行任意的组合，为使描述简洁，未对上述实施例中的各个技术特征所有可能的组合都进行描述，然而，只要这些技术特征的组合不存在矛盾，都应当认为是本说明书记载的范围。
以上所述实施例仅表达了本申请的几种实施方式，其描述较为具体和详细，但并不能因此而理解为对发明专利范围的限制。应当指出的是，对于本领域的普通技术人员来说，在不脱离本申请构思的前提下，还可以做出若干变形和改进，这些都属于本申请的保护范围。因此，本申请专利的保护范围应以所附权利要求为准。

Claims (17)

  1. 一种发热体，其特征在于，所述发热体包括：
    基体(10)，所述基体(10)通过金属材料制备形成；
    防护层(20)，直接且完全包裹所述基体(10)的表面，用于防止所述基体(10)中重金属元素的析出。
  2. 根据权利要求1所述的发热体，其特征在于，所述发热体还包括功能膜层，所述防护层(20)设于所述功能膜层与所述基体(10)之间；
    所述功能膜层包括均热层(40)、加热膜层(30)、红外辐射膜层(50)及测温层(60)中的一种或多种。
  3. 根据权利要求2所述的发热体，其特征在于，所述加热膜层(30)包括第一膜带(31)及设于所述第一膜带(31)上的加热线路(32)。
  4. 根据权利要求2所述的发热体，其特征在于，所述测温膜层包括第二膜带(61)及设于所述第二膜带(61)上的测温线路(62)。
  5. 根据权利要求2所述的发热体，其特征在于，所述基体(10)为圆筒状发热结构，所述基体(10)具有用于容置气溶胶生成基质的容置位，所述防护层(20)设于所述基体(10)的内外表面；所述功能膜层包括所述均热层(40)及所述加热膜层(30)，所述均热层(40)及所述加热膜层(30)均设于所述基体(10)外，所述均热层(40)位于所述加热膜层(30)与所述防护层(20)的至少部分之间。
  6. 根据权利要求5所述的发热体，其特征在于，所述功能膜层还包括红外辐射膜层(50)，所述红外辐射膜层(50)设于所述基体(10)内。
  7. 根据权利要求2所述的发热体，其特征在于，所述基体(10)为圆筒状发热结构，所述基体(10)具有用于容置气溶胶生成基质的容置位，所述防护层(20)设于所述基体(10)的内外表面；所述功能膜层包括所述测温层(60)，所述测温层(60)设于所述基体(10)外。
  8. 根据权利要求1所述的发热体，其特征在于，所述防护层(20)采用浸涂工艺制备形成。
  9. 根据权利要求8所述的发热体，其特征在于，所述防护层(20)的层厚为5μm-200μm。
  10. 根据权利要求1所述的发热体，其特征在于，所述基体(10)采用430不锈钢、316L不锈钢或304不锈钢制备形成。
  11. 根据权利要求1所述的发热体，其特征在于，所述基体(10)为中心发热结构，所述防护层(20)设于所述基体(10)的外表面；或者
    所述基体(10)为外周发热结构，所述防护层(20)设于所述基体(10)的内外表面，所述基体(10)具有用于容置气溶胶生成基质的容置位。
  12. 根据权利要求11所述的发热体，其特征在于，所述基体(10)为销钉状结构或片状结构；或
    所述基体(10)为两端开口的圆管结构，或顶端开口及底端封闭的圆筒状结构。
  13. 根据权利要求11所述的发热体，其特征在于，所述基体(10)为中空的中心发热结构且一端开口另一端封闭，所述基体(10)上设置有通气孔(11)，所述通气孔(11)靠近所述基体(10)的封闭的一端，所述通气孔(11)连通所述基体(10)的中空部分与外界空间而形成气流通道。
  14. 根据权利要求13所述的发热体，其特征在于，所述基体(10)包括顶部(12)和本体(13)，所述本体(13)为两端开口的中空结构，所述顶部(12)与所述本体(13)的一端密封连接并遮蔽所述本体(13)该端的开口，所述通气孔(11)设置于本体(13)上并靠近所述顶部(12)。
  15. 根据权利要求14所述的发热体，其特征在于，所述本体(13)为圆柱结构，所述顶部(12)向远离所述本体(13)的方向逐渐变小。
  16. 根据权利要求1所述的发热体，其特征在于，所述基体(10)能够在磁场下感应发热。
  17. 一种电子雾化装置，其特征在于，包括加热腔及如权利要求1-16任一项所述的发热体，所述发热体设置于所述加热腔内，所述加热腔用于收容气溶胶生成基质。
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