WO2024005014A1 - Élément de prévention de glissement - Google Patents

Élément de prévention de glissement Download PDF

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Publication number
WO2024005014A1
WO2024005014A1 PCT/JP2023/023805 JP2023023805W WO2024005014A1 WO 2024005014 A1 WO2024005014 A1 WO 2024005014A1 JP 2023023805 W JP2023023805 W JP 2023023805W WO 2024005014 A1 WO2024005014 A1 WO 2024005014A1
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WIPO (PCT)
Prior art keywords
protrusions
slip member
base material
member according
less
Prior art date
Application number
PCT/JP2023/023805
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English (en)
Japanese (ja)
Inventor
洋平 前野
伸康 二田
Original Assignee
三菱マテリアル株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Priority claimed from JP2022104578A external-priority patent/JP2024004765A/ja
Priority claimed from JP2022104569A external-priority patent/JP2024004760A/ja
Application filed by 三菱マテリアル株式会社 filed Critical 三菱マテリアル株式会社
Publication of WO2024005014A1 publication Critical patent/WO2024005014A1/fr

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
    • B25J15/00—Gripping heads and other end effectors
    • B25J15/08—Gripping heads and other end effectors having finger members
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00—Electrolytic etching or polishing
    • C25F3/02—Etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping

Definitions

  • the present invention relates to an anti-slip member.
  • This application claims priority based on Japanese Patent Application No. 2022-104569 filed in Japan on June 29, 2022 and Japanese Patent Application No. 2022-104578 filed in Japan on June 29, 2022. The contents are incorporated herein.
  • Patent Documents 1 and 2 for example, in a gripping member that grips an object and a conveyance member that transports an object, a portion that comes into contact with the object is provided with a sliding surface in order to stably fix the object. A stop member is provided. Furthermore, when handling an object, an anti-slip member is used to temporarily fix the object and prevent it from shifting, as shown in Patent Document 3, for example.
  • the anti-slip member since the anti-slip member is required to have sufficient frictional force with the object, it is usually made of an organic material such as a viscoelastic material such as rubber.
  • organic materials such as rubber have a problem in that they cannot be stably used in high-temperature environments due to insufficient heat resistance. Additionally, there is a problem that it cannot be used in a clean environment due to the risk of contamination with organic materials. Therefore, for example, anti-slip members made of organic materials cannot be used in semiconductor manufacturing process applications, aerospace applications, and robot applications.
  • the industrial materials constituting various members are broadly classified into organic materials such as resins and rubbers, and inorganic materials such as ceramics and metals.
  • organic materials have excellent flexibility but poor heat resistance.
  • inorganic materials have excellent heat resistance but poor flexibility. In this way, in industrial materials, a trade-off in properties occurs depending on the material selected.
  • the anti-slip member is made of inorganic material, it will have excellent heat resistance and reduce the problem of contamination, but it will not be able to obtain sufficient frictional force and will not be able to secure the object sufficiently. There was a risk.
  • the present invention has been made in view of the above-mentioned circumstances, and provides an anti-slip member that can be used stably even in high-temperature environments and clean environments, and that can sufficiently fix objects.
  • the purpose is to
  • the inventors conducted extensive research and found that by forming fine irregularities on the surface of a base material made of inorganic materials such as ceramics and metals, sufficient frictional force can be imparted to the surface. It was found that the material can be used as a non-slip member.
  • the anti-slip member according to aspect 1 of the present invention has a plurality of protrusions erected on at least a part of the surface of a base material made of an inorganic material.
  • the projection region has a first direction and a second direction intersecting the first direction, and the plurality of projections are arranged in the first direction and the second direction. are arranged periodically in at least one direction, and the average pitch of the plurality of protrusions in the first direction and/or the second direction is within a range of 20 nm or more and 1000 nm or less, It is characterized in that the coefficient of static friction on the surface is 0.20 or more.
  • the anti-slip member is made of an inorganic material such as ceramics or metal, so it has excellent heat resistance and can sufficiently suppress the problem of contamination.
  • At least a part of the surface of the base material has a protrusion area in which a plurality of protrusions are erected, and the protrusion area is arranged in a first direction and in a second direction intersecting the first direction.
  • the plurality of protrusions are arranged periodically in at least one direction of the first direction and the second direction, and the plurality of protrusions are arranged in the first direction and/or in the second direction.
  • the object can be sufficiently fixed by the frictional force of this surface. Therefore, it can be stably used even in high-temperature environments and clean environments, and it is also possible to sufficiently fix objects.
  • Aspect 2 of the present invention is the anti-slip member of aspect 1, wherein the plurality of protrusions form a striped structure consisting of a plurality of protrusions extending in the first direction or the second direction, It is characterized in that the average pitch of the protrusions is within a range of 20 nm or more and 1000 nm or less.
  • a stripe structure consisting of a plurality of protrusions extending in the first direction or the second direction is formed on at least a part of the surface of the base material, and Since the average pitch of the protrusions is within the range of 20 nm or more and 1000 nm or less, and the static friction coefficient on the surface is 0.20 or more, the object can be sufficiently fixed by the frictional force of this surface. can. Therefore, it can be stably used even in high-temperature environments and clean environments, and it is also possible to sufficiently fix objects.
  • a third aspect of the present invention is characterized in that, in the anti-slip member of the first aspect, an area ratio occupied by the stripe structure on the surface is 30% or more. According to the anti-slip member according to aspect 3 of the present invention, since the area ratio occupied by the stripe structure on the surface is 30% or more, a sufficient frictional force is applied to the surface by the stripe structure, Furthermore, it becomes possible to securely fix the object.
  • Aspect 4 of the present invention is characterized in that in the anti-slip member of Aspect 1 or Aspect 2, the average pitch of the protrusions is 500 nm or less. According to the anti-slip member according to aspect 4 of the present invention, since the protrusions have a finer structure with an average pitch of 500 nm or less, it is possible to apply even more sufficient frictional force to the surface. It becomes possible to securely fix the object.
  • a fifth aspect of the present invention is characterized in that, in the anti-slip member according to any one of aspects 2 to 4, the average height of the protrusions is within a range of 20 nm or more and 1000 nm or less. According to the anti-slip member according to aspect 5 of the present invention, since the average height of the protrusions is within the range of 20 nm or more and 1000 nm or less, it is possible to apply a further sufficient frictional force to the surface, Furthermore, it becomes possible to securely fix the object.
  • a sixth aspect of the present invention is characterized in that, in the anti-slip member according to any one of aspects 2 to 5, a cross section perpendicular to the extending direction of the protruding portion has a triangular shape.
  • the tip of the protrusion deforms along the outer shape of the object. This makes it easier to fix the object more reliably.
  • the plurality of protrusions are composed of protrusions periodically arranged in the first direction and the second direction.
  • the average pitch of the protrusions in the first direction and the average pitch in the second direction are within a range of 20 nm or more and 1000 nm or less.
  • the plurality of protrusions provided on at least a portion of the surface of the base material are arranged periodically in the first direction and the second direction.
  • the average pitch of the projections in the first direction and the average pitch in the second direction are in the range of 20 nm or more and 1000 nm or less, and the coefficient of static friction on the surface is is set to be 0.20 or more, so the object can be sufficiently fixed by the frictional force of this surface. Therefore, it can be stably used even in high-temperature environments and clean environments, and it is also possible to sufficiently fix objects.
  • Aspect 8 of the present invention is characterized in that, in the anti-slip member of aspect 7, an area ratio occupied by the protrusions on the surface is 30% or more. According to the anti-slip member according to aspect 8 of the present invention, since the occupied area ratio of the protrusions on the surface is 30% or more, a sufficient frictional force is applied to the surface by the protrusions. , it becomes possible to fix the object more reliably.
  • a ninth aspect of the present invention is characterized in that in the eighth aspect or the anti-slip member of the eighth aspect, an average pitch of the projections in the first direction and an average pitch in the second direction are 500 nm or less.
  • the average pitch of the protrusions in the first direction and the average pitch in the second direction are each 500 nm or less, which is a finer structure. Further, sufficient frictional force can be applied, and the object can be fixed more reliably.
  • Aspect 10 of the present invention is characterized in that in the anti-slip member according to any one of aspects 7 to 9, the average height of the projections is within a range of 20 nm or more and 1000 nm or less. According to the anti-slip member according to aspect 10 of the present invention, since the average height of the protrusions is within the range of 20 nm or more and 1000 nm or less, it is possible to apply more sufficient frictional force to the surface, and It becomes possible to securely fix the object.
  • Aspect 11 of the present invention is the anti-slip member according to any one of aspects 7 to 10, characterized in that the protrusion has a pointed tip.
  • the tip (point) of the protrusion deforms along the outer shape of the object. This makes it easier to fix the object, and it becomes possible to fix the object more reliably.
  • a twelfth aspect of the present invention is the anti-slip member of the eleventh aspect, characterized in that the tip portion has an inclined surface inclined in opposite directions through the top portion.
  • the tip portion has an inclined surface inclined in opposite directions through the top portion, a contact area between the surface and the object is ensured, and the object is can be fixed even more securely.
  • a thirteenth aspect of the present invention is the anti-slip member of the eleventh aspect, characterized in that the tip portion has a quadrangular pyramid shape. According to the anti-slip member according to aspect 13 of the present invention, since the pointed end has a quadrangular pyramid shape, a contact area between the surface and the object is ensured, and the object can be more securely fixed. It becomes possible.
  • Aspect 14 of the present invention is the anti-slip member according to any one of aspects 1 to 13, in which the surface of the base material is made of aluminum, aluminum alloy, nickel, nickel alloy, copper, copper alloy, titanium, titanium alloy, tungsten. , tungsten alloy, magnesium, magnesium alloy, quartz, glass, silicon, aluminum oxide, and titanium oxide.
  • the surface of the base material is aluminum, aluminum alloy, nickel, nickel alloy, copper, copper alloy, titanium, titanium alloy, tungsten, tungsten alloy, magnesium, magnesium alloy, Since it is composed of at least one of quartz, glass, silicon, aluminum oxide, and titanium oxide, it has particularly excellent heat resistance and can be used stably even in high-temperature environments and clean environments. .
  • an anti-slip member that can be used stably even in high-temperature environments and clean environments, and that can sufficiently fix objects.
  • FIG. 2 is a plan view of the anti-slip member according to the first embodiment of the present invention. It is a perspective view of the protrusion area (stripe structure) in the anti-slip member of the first embodiment of the present invention.
  • FIG. 3 is an explanatory cross-sectional view taken along line AA in FIG. 2;
  • FIG. 3 is an explanatory diagram showing a method of calculating a static friction coefficient. It is a flow diagram showing the manufacturing method of the anti-slip member of the first embodiment of the present invention.
  • FIG. 7 is a plan view of a non-slip member according to a second embodiment of the present invention. 7 is a perspective view of a protrusion region (protrusion) of the anti-slip member shown in FIG. 6.
  • FIG. 6 is a plan view of the anti-slip member according to the first embodiment of the present invention. It is a perspective view of the protrusion area (stripe structure) in the anti-slip member of the first embodiment of the present invention.
  • FIG. 8 is an explanatory diagram of the AA cross section (ZY plane) in FIG. 7.
  • FIG. 8 is an explanatory diagram of the BB cross section (ZX plane) in FIG. 7.
  • FIG. 7 is a perspective view of a protrusion in the anti-slip member shown in FIG. 6.
  • FIG. It is a flowchart which shows the manufacturing method of the anti-slip member of 2nd embodiment of this invention. It is a top view which shows the modification of the anti-slip member of 2nd embodiment of this invention.
  • 13 is a perspective view of a protrusion in the anti-slip member shown in FIG. 12.
  • FIG. 14 is an explanatory diagram of the AA cross section (ZX plane) in FIG. 13.
  • FIG. 13 is a perspective view of a protrusion in the anti-slip member shown in FIG. 12.
  • FIG. 13 is a perspective view of a protrusion in the anti-slip member shown in FIG. 12.
  • FIG. FIG. 2 is an explanatory diagram showing a method of measuring a static friction coefficient in an example. Specifically, it is a plan view showing that three anti-slip members 10 (110 or 210) are arranged at 120° intervals in the circumferential direction of the silicon wafer S and placed on the fixing plate Q.
  • FIG. 16B is a side view of FIG. 16A.
  • FIG. 6 is a side view illustrating that in an example, the fixing plate Q is tilted to measure the angle ⁇ at which the silicon wafer S slides.
  • the anti-slip member of this embodiment can be used, for example, in gripping devices, conveyance devices, manufacturing devices, etc. used in high-temperature environments or clean environments such as in the aerospace field, semiconductor manufacturing process field, and medical field. It is used for fixing.
  • the anti-slip member 10 of the first embodiment has a base material 11 made of an inorganic material such as ceramics or metal, and a plurality of protrusions are provided on at least a part of the surface of the base material 11. It has a region 20.
  • the protrusion region 20 has a first direction and a second direction intersecting the first direction.
  • the plurality of protrusions form a plurality of protrusions 21 extending in one of the first direction and the second direction, and protrude in the protrusion region 20.
  • a striped structure consisting of the striped portions 21 is formed. Note that there is no particular restriction on the shape or size of the base material 11, but in the first embodiment, as shown in FIG. has been done.
  • examples of the inorganic material constituting the base material 11 include metals, ceramics, silicon, and glass.
  • the inorganic material constituting the base material 11 preferably has a melting point of 100°C or higher and a decomposition temperature of 100°C or higher, preferably has a melting point of 300°C or higher and a decomposition temperature of 300°C or higher, and has a melting point of 500°C or higher.
  • the decomposition temperature is preferably 500°C or higher.
  • the metal constituting the base material 11 may be a single metal or an alloy. Alloys include those made of a plurality of metal elements and those made of a metal element and a non-metal element. Examples of simple metals include aluminum, nickel, iron, copper, titanium, tungsten, and magnesium. Examples of alloys include aluminum alloys, NiP, stainless steel, and copper alloys. As the ceramics constituting the base material 11, oxides, nitrides, and carbides can be used. Examples of ceramics include aluminum oxide (alumina), titanium oxide, and quartz.
  • the inorganic material constituting the base material 11 is preferably a metal, and more preferably contains any one of copper, copper alloy, aluminum, aluminum alloy, and NiP alloy.
  • the stripe structure formed on the surface of the base material 11 is composed of a plurality of protrusions 21 extending in one direction, as shown in FIGS. 2 and 3. That is, for example, a plurality of protrusions 21 extending in the first direction are arranged in a second direction intersecting the first direction, forming a striped structure in which the plurality of protrusions 21 are arranged in parallel.
  • the average pitch P of the parallel protrusions 21, 21 is within the range of 20 nm or more and 1000 nm or less.
  • the average pitch P of the protrusions 21 is the average value of the distance between the tops 21a, 21a of the adjacent protrusions 21, 21.
  • the average pitch P of the protrusions 21 can be measured from a cross-sectional SEM photograph of the stripe structure taken with a SEM (scanning electron microscope). In addition, it is preferable that the average pitch P of the protrusion part 21 is 1000 nm or less, and it is preferable that it is 500 nm or less. Moreover, it is preferable that the average pitch P of the protrusion part 21 is 20 nm or more, and it is preferable that it is 50 nm or more.
  • the average pitch P of the protrusions 21 is defined as the distance between the tops 21a, 21a of the adjacent protrusions 21, 21 in a planar photograph of a striped structure taken with an SEM (scanning electron microscope). Measurements were taken at different locations and the average value was calculated.
  • the average height H of the protruding stripes 21 is within a range of 20 nm or more and 1000 nm or less.
  • the average height H of the protrusions 21 can be measured from a cross-sectional SEM photograph of the striped structure taken with a SEM (scanning electron microscope).
  • the average height H of the protrusion part 21 is 800 nm or less, and it is preferable that it is 500 nm or less.
  • the average height H of the protrusion part 21 is 20 nm or more, and it is preferable that it is 50 nm or more.
  • the average height H of the protrusion 21 is determined by measuring the height from the top 21a of the protrusion 21 at 10 locations in a cross-sectional photograph of the striped structure taken with an SEM (scanning electron microscope). The average value is calculated.
  • the cross section of the protrusion 21 perpendicular to the extending direction has a triangular shape.
  • the cross-sectional shape of the protrusion portion 21 is an isosceles triangle.
  • the base angle ( ⁇ in FIG. 3) of the protruding portion 21 is preferably 60 degrees or more, and preferably within the range of 60 degrees or more and 80 degrees or less.
  • the base angle ( ⁇ in FIG. 3) of the protrusion 21 is measured using a cross-sectional photograph of the striped structure taken with a SEM (scanning electron microscope).
  • the ratio of the average height H to the average pitch P of the protrusion portions 21 is within the range of 0.8 or more and 2.0 or less. is preferable, and more preferably within the range of 1.0 or more and 1.5 or less.
  • the average height H/average pitch P is 0.8 or more, the protrusions 21 are easily deformed along the outer shape of the object, and the object can be fixed more reliably.
  • the average height H/average pitch P is 2.0 or less, the restoring force of the shape of the protrusion portion 21 becomes high, and it becomes possible to use it repeatedly.
  • the area ratio (occupied area ratio) occupied by the stripe structure (projection region 20) on the surface of the base material 11 that contacts the object is 30% or more. is preferred.
  • a stripe structure is formed on about 70% of the surface of the base material 11. Note that the area ratio occupied by the stripe structure on the surface of the base material 11 is preferably 50% or more, and preferably 70% or more. Further, the area ratio occupied by the stripe structure on the surface of the base material 11 is 100% or less.
  • the "occupied area ratio of the stripe structure” means that in a plurality of protrusions 21 extending in a certain direction, the pitch from protrusion 21 to protrusion 21 is -10% to +10% from the average pitch. %, and is the value obtained by dividing the area of the range in which three or more protrusions 21 are repeated in succession by the area of the surface of the base material.
  • the static friction coefficient ⁇ on the surface of the base material 11 on which the striped structure is formed is 0.20 or more.
  • the static friction coefficient ⁇ on the surface of the base material 11 is preferably 0.30 or more, and preferably 0.40 or more.
  • the static friction coefficient ⁇ is 10 or less.
  • the static friction coefficient ⁇ on the surface of the base material 11 can be calculated using the formula shown in FIG. The equations in FIG. 4 are shown below as equations (1) to (4).
  • the anti-slip member 10 of the first embodiment has a polishing step S01 and a cutting step S02, as shown in the flowchart of FIG.
  • the polishing step S01 the surface of the base material 11 made of an inorganic material is polished.
  • the base material 11 can be polished by, for example, grinding with a grinder, polishing with waterproof paper, or buffing.
  • the surface of the base material 11 after polishing preferably has a surface roughness Ra of 0.02 ⁇ m or less, for example.
  • the surface roughness Ra refers to the arithmetic mean roughness (Ra) shown in JISB0601.
  • the surface of the base material 11 polished in the polishing step S01 is cut to form the protrusions 21.
  • the cutting method is not particularly limited, and various methods can be selected. Cutting methods include, for example, a method in which a groove is formed by periodically moving the cutting tool up and down while moving the cutting tool in a direction perpendicular to the blade surface (NP method: nanopecking method); A method (conventional method) in which grooves are formed by linear movement without movement can be used.
  • a processing device that includes a cutting tool and an ultrasonic vibration device that causes the cutting tool to vibrate ultrasonically can be used as the processing device.
  • the shape of the blade surface of the cutting tool is not particularly limited, and may be triangular or square, for example.
  • a cutting tool is pushed diagonally into the surface of the base material 11 while being ultrasonically vibrated, and then the cutting tool is moved in a direction perpendicular to the blade surface while periodically moving up and down.
  • a protrusion 21 is formed on the surface of the base material 11, extending in a direction perpendicular to the moving direction of the cutting tool.
  • a processing device having a cutting tool and an ultrasonic vibrating device that causes the cutting tool to vibrate ultrasonically can be used as the processing device.
  • the shape of the blade surface of the cutting tool shall be triangular.
  • the cutting tool is pushed perpendicularly into the surface of the base material 11 while being vibrated ultrasonically, and then the cutting tool is moved in a direction perpendicular to the blade surface while being fixed so that it does not move up and down. let As a result, protrusions 21 extending parallel to the direction of movement of the cutting tool are formed on the surface of the base material 11.
  • the anti-slip member 10 of the first embodiment is manufactured through the steps described above.
  • the anti-slip member 10 of the first embodiment since it is made of inorganic material such as ceramics and metal, it has excellent heat resistance and can sufficiently suppress the problem of contamination. Can be done.
  • a stripe structure consisting of a plurality of protrusions 21 extending in either the first direction or the second direction is formed on at least a part of the surface of the base material 11, and the average of the protrusions 21 is Since the pitch P is within the range of 20 nm or more and 1000 nm or less, and the static friction coefficient ⁇ on the surface of the base material 11 is 0.20 or more, the object can be sufficiently fixed. Therefore, it can be stably used even in high-temperature environments and clean environments, and it is also possible to sufficiently fix objects.
  • the stripe structure when the area ratio occupied by the stripe structure on the surface of the base material 11 is 30% or more, the stripe structure provides a further sufficient frictional force to the surface of the base material 11 in contact with the object. It is possible to fix the object even more reliably.
  • the average pitch P of the protrusions 21 is 500 nm or less, it is possible to apply a more sufficient frictional force to the surface of the base material 11 that comes into contact with the object, and it is possible to provide more reliable It becomes possible to fix the object.
  • the average height H of the protrusions 21 when the average height H of the protrusions 21 is within the range of 20 nm or more and 1000 nm or less, more sufficient frictional force is applied to the surface of the base material 11 that comes into contact with the object. This makes it possible to securely fix the object.
  • the tip of the protrusion 21 when the cross section perpendicular to the extending direction of the protrusion 21 has a triangular shape, the tip of the protrusion 21 easily deforms along the outer shape of the object. can be fixed even more securely.
  • the present invention is not limited thereto and can be modified as appropriate without departing from the technical idea of the invention.
  • the stripe structure is formed by cutting, but the invention is not limited to this, and the stripe structure may be formed by other methods.
  • the cross-sectional shape of the protruding portion is described as having a triangular shape, but the cross-sectional shape is not limited to this, and may be other cross-sectional shapes such as a trapezoidal shape.
  • the anti-slip member 110 of the second embodiment has a base material 111 made of an inorganic material such as ceramics or metal, and has a protrusion portion having a plurality of protrusions erected on at least a part of the surface of the base material 111. It has a region 120. As shown in FIG. 6, the plurality of protrusions are each composed of a plurality of protrusions 121 arranged periodically in a first direction and a second direction intersecting the first direction. Note that there is no particular restriction on the shape or size of the base material 111, but in the second embodiment, as shown in FIG. has been done.
  • examples of the inorganic material constituting the base material 111 include metals, ceramics, silicon, and glass, as in the first embodiment.
  • the protrusion region 120 formed on the surface of the base material 111 is arranged in a first direction (the X direction in FIGS. 7 to 9) and a second direction that intersects with the first direction. It is composed of a plurality of protrusions 121 arranged periodically in the Y direction (in FIGS. 7 to 9).
  • the first direction (X direction) and the second direction (Y direction) are orthogonal.
  • the average pitch P1 in the first direction (X direction) and the average pitch P2 in the second direction (Y direction) of the projections 121 are each within a range of 20 nm or more and 1000 nm or less. Note that the average pitch P1 in the first direction (X direction) and the average pitch P2 in the second direction (Y direction) of the protrusions 121 are the average values of the distances between the tops 125, 125 of the adjacent protrusions 121, 121. It is.
  • the top portion 125 of the protrusion 121 is configured to extend along the second direction (Y direction), so that the average in the second direction (Y direction)
  • the pitch P2 is the distance between the centers of the tops 125 of adjacent projections 121.
  • the average pitch P1 in the first direction and the average pitch P2 in the second direction can be measured, for example, from a cross-sectional SEM photograph of the protrusion region 120 taken with an SSEM (scanning electron microscope).
  • the average pitch P1 of the protrusions 121 is the top portion 125 of the adjacent protrusions 121, 121 in the first direction (X direction) in a planar photograph of the protrusion region 120 taken with an SEM (scanning electron microscope). , 125 distances were measured at 10 locations, and the average value was calculated.
  • the average pitch P2 of the protrusions 121 is the average pitch P2 of the tops 125, 125 of the adjacent protrusions 121, 121 in the second direction (Y direction) in a planar photograph of the protrusion region 120 taken with an SEM (scanning electron microscope). The distance between the centers was measured at 10 locations and the average value was calculated.
  • the average pitch P1 in the first direction (X direction) and the average pitch P2 in the second direction (Y direction) of the projections 121 are preferably 1000 nm or less, and preferably 500 nm or less. Further, the average pitch P1 in the first direction (X direction) and the average pitch P2 in the second direction (Y direction) of the projections 121 are preferably 20 nm or more, and preferably 50 nm or more.
  • the projection 121 has a pointed end 122 and a body 123 that connects the pointed end 122 and the base material 111.
  • the pointed end portion 122 has an apex portion 125 extending along a second direction D (Y direction) at the center in the first direction (X direction), and an inclined portion that is inclined in opposite directions in the first direction via the apex portion 125. It has surfaces 126a and 126b, and inclined surfaces 126c and 126d that are inclined in opposite directions in the second direction through the top portion 125.
  • the body portion 123 has a quadrangular column shape.
  • the tip portion 122 has a trapezoidal cross section (YZ plane) perpendicular to the first direction (X direction), and a trapezoidal cross section (XZ plane) perpendicular to the second direction (Y direction). is said to be triangular.
  • the triangular shape of the pointed end 122 is preferably an isosceles triangle.
  • the base angle of the isosceles triangle ( ⁇ in FIG. 9) is preferably 60 degrees or more.
  • the base angle ( ⁇ in FIG. 9) of the isosceles triangle of the tip 122 is measured from a cross-sectional photograph of the tip 122 taken with an SEM (scanning electron microscope).
  • the length L1 in the first direction (X direction) of the protrusion 121 is within the range of 20 nm or more and 1500 nm or less. is preferred. Further, it is preferable that the length L2 in the second direction (Y direction) of the protrusion 121 (the bottom surface 128 of the tip portion 122 and the body portion 123) is in the range of 20 nm or more and 1500 nm or less. Furthermore, it is preferable that the length L3 of the top portion 125 of the tip portion 122 in the Y direction is within a range of 10 nm or more and 1000 nm or less.
  • the length L1 in the first direction (X direction) of the protrusion 121, the length L2 in the second direction (Y direction), and the length L3 in the Y direction of the top 125 of the tip 122 are This figure was obtained by measuring a cross-sectional photograph (ZY plane and ZX plane) of the protrusion 121 taken with an electron microscope.
  • the average height H of the protrusions 121 is within a range of 20 nm or more and 1000 nm or less.
  • the average height H of the protrusions 121 can be measured from a cross-sectional SEM photograph of the protrusion region 120 taken with a SEM (scanning electron microscope).
  • the average height H of the protrusions 121 is preferably 1500 nm or less, and preferably 500 nm or less.
  • the average height H of the protrusions 121 is preferably 20 nm or more, and preferably 100 nm or more.
  • the protrusion 121 has a body portion 123 and a tip portion 122, and the average height H1 of the tip portion 122 is within a range of 20 nm or more and 1500 nm or less. It is preferable that the average height H2 of the body portion 123 is within a range of 0 nm or more and 1400 nm or less.
  • the average height H of the protrusion 121, the average height H1 of the tip portion 122, and the average height H2 of the body portion 123 are the cross-sectional photograph of the protrusion 121 taken with a SEM (scanning electron microscope) The height of the protrusion 121 from the top 125 in the ZY plane was measured at 10 locations, and the average value was calculated.
  • the ratios H/L1 and H/L2 of the length L2 and the height H of the protrusion 121 are preferably in the range of 0.7 or more and 10 or less, more preferably 0.85 or more, and 1 It is particularly preferable that it is .00 or more.
  • the ratio L3/L2 of the length L2 in the second direction (Y direction) of the bottom surface 128 and body part 123 of the pointed end 122 to the Y direction length L3 of the top 125 of the pointed end 122 is 0.4 or more and 0.9 It is preferably within the following range.
  • the area ratio (occupied area ratio) occupied by the protrusions 121 (projection region 120) on the surface of the base material 111 that contacts the object is 30% or more. It is preferable.
  • protrusions 121 are formed on about 70% of the surface of the base material 111.
  • the area ratio occupied by the projections 121 on the surface of the base material 111 is preferably 33% or more, and preferably 50% or more. Further, the area ratio occupied by the projections 121 on the surface of the base material 111 is 100% or less.
  • the static friction coefficient ⁇ on the surface of the base material 111 on which the protrusions 121 are formed is 0.20 or more.
  • the static friction coefficient ⁇ on the surface of the base material 111 is preferably 0.30 or more, and preferably 0.40 or more.
  • the static friction coefficient ⁇ is 10 or less.
  • the static friction coefficient ⁇ on the surface of the base material 111 can be calculated using equations (1) to (4) with reference to FIG. 4, similarly to the first embodiment.
  • the anti-slip member 110 of the second embodiment has a polishing process S11, a cutting process S12, and an etching process S13, as shown in the flowchart of FIG.
  • the polishing step S11 the surface of the base material 111 made of an inorganic material is polished.
  • the base material 111 can be polished by, for example, grinding with a grinder, polishing with waterproof paper, or buffing.
  • the surface of the base material 111 after polishing preferably has a surface roughness Ra of 0.02 ⁇ m or less, for example.
  • the protrusion 121 is formed by cutting the surface of the base material 111 polished in the polishing step S11.
  • the cutting method is not particularly limited, and various methods can be selected. Cutting methods include, for example, a method in which a groove is formed by periodically moving the cutting tool up and down while moving the cutting tool in a direction perpendicular to the blade surface (NP method: nanopecking method); A method (conventional method) in which grooves are formed by linear movement without movement can be used.
  • a processing device that includes a cutting tool and an ultrasonic vibration device that causes the cutting tool to vibrate ultrasonically can be used as the processing device.
  • the shape of the blade surface of the cutting tool is not particularly limited, and may be triangular or square, for example.
  • the cutting tool is pushed diagonally into the surface of the base material 111 while being vibrated ultrasonically, and then the cutting tool is moved in a direction perpendicular to the cutting surface (first direction) while periodically moving up and down. ).
  • the cutting tool is moved in a direction (second direction) perpendicular to the blade surface.
  • a pointed end 122 is formed on the surface of the base material 111.
  • a processing device having a cutting tool and an ultrasonic vibrating device that causes the cutting tool to vibrate ultrasonically can be used as the processing device.
  • the shape of the blade surface of the cutting tool shall be triangular.
  • the cutting tool is pushed perpendicularly into the surface of the base material 111 while being vibrated ultrasonically, and then, while the cutting tool is fixed so as not to move up and down, the cutting tool is moved in a direction perpendicular to the cutting surface (in the direction perpendicular to the cutting surface). 1 direction).
  • the cutting tool is moved in a direction perpendicular to the blade surface (second direction) while fixing the cutting tool so that it does not move up and down.
  • a pointed end 122 is formed on the surface of the base material 111.
  • the tip portion 122 may be formed on the surface of the base material 111 by using a combination of the NP method and the conventional method.
  • the body portion 123 is formed by etching the peripheral edge of the tip portion 122 formed in the cutting step S12. Note that if the body portion 123 is not formed, the etching step S13 may be omitted.
  • the etching treatment method various methods used as etching treatment methods for inorganic materials can be used.
  • an electrolytic etching method can be used as the etching method.
  • Etching by electrolytic etching can be performed as follows. First, a polycarbonate film is attached to the pointed end 122 after being heated at 150° C., and a protective layer is installed on the pointed end 122. Next, the base material 111 is immersed in, for example, a 1N HCl aqueous solution (manufactured by Kanto Kagaku) to perform electrolytic etching (immersion at 100 nm/min). After etching, the polycarbonate film is washed with pure water and dissolved and removed using methylene chloride.
  • a 1N HCl aqueous solution manufactured by Kanto Kagaku
  • an iron salt method can be used as the etching method.
  • a PVA film (Poval, manufactured by Kuraray, 10 ⁇ m thick) is attached to the tip 122, and a protective layer is placed on the tip 122.
  • the base material 11 is immersed in a ferric chloride solution (manufactured by Toagosei Co., Ltd.) with a concentration of 40° Be′ to perform etching.
  • the PVA film is dissolved and removed by washing with pure water.
  • the anti-slip member 110 of the second embodiment is manufactured through the above-mentioned steps.
  • the anti-slip member 110 since it is made of an inorganic material such as ceramics or metal, it has excellent heat resistance and sufficiently suppresses the problem of contamination. be able to.
  • At least a portion of the surface of the base material 111 has a protrusion region 120 in which a plurality of protrusions are erected.
  • the plurality of protrusions are each composed of a plurality of protrusions 121 arranged periodically in a first direction and a second direction intersecting the first direction.
  • the average pitch P1 in the second direction and the average pitch P2 in the second direction are within the range of 20 nm or more and 1000 nm or less, and the static friction coefficient ⁇ on the surface is 0.20 or more. Can be fixed sufficiently. Therefore, it can be stably used even in high-temperature environments and clean environments, and it is also possible to sufficiently fix objects.
  • the base material 111 that contacts the target object by the protrusions 121 Sufficient frictional force is applied to the surface of the holder, making it possible to securely fix the object.
  • the average pitch P1 in the first direction and the average pitch P2 in the second direction of the protrusions 121 are 500 nm or less, fine irregularities are formed on the surface and contact with the object. A more sufficient frictional force can be applied to the surface of the base material 11, and the object can be more securely fixed.
  • the average height of the protrusions 121 is within the range of 20 nm or more and 1000 nm or less, it is possible to apply a more sufficient frictional force to the surface of the base material 111 that comes into contact with the object. This makes it possible to securely fix the object.
  • the tip of the protrusion 121 (the tip 122) easily deforms along the outer shape of the object, It becomes possible to fix the object more reliably.
  • the pointed end 122 has trapezoidal inclined surfaces 126a, 126b of the same shape and isosceles triangular inclined surfaces 126c, 126d of the same shape, which are inclined in opposite directions through the apex 125.
  • the contact area between the surface of the anti-slip member 110 and the object is ensured, and the object can be fixed even more reliably.
  • FIGS. 12 to 15 modifications of the second embodiment are shown in FIGS. 12 to 15.
  • a protrusion region 220 in which a plurality of protrusions 221 are erected is formed on the surface of a base material 211, and each protrusion 221 has a pointed end 222.
  • this tip 222 may have a quadrangular pyramid shape.
  • the average pitch P1 in the first direction and the average pitch P2 in the second direction of the protrusions 221 are within a range of 20 nm or more and 1000 nm or less.
  • the average pitches P1 and P2 are the distances between the vertices 225 of the projections 221.
  • the inclined surfaces 226a, 226b, 226c, and 226d forming the tip portion 222 have the same isosceles triangle shape.
  • the bottom surface 228 is square. It is preferable that the base angle ( ⁇ in FIG. 14) of the isosceles triangle in the cross section of the tip portion 222 in the first direction or the second direction is 60 degrees or more.
  • the protrusion 221 has been described as having the tip portion 222 and the body portion 223, but is not limited to this, and may not have the body portion 223. Further, in the second embodiment, the projections 221 are formed by cutting and etching processes, but the invention is not limited to this, and the projections 221 may be formed by other methods. good.
  • a base material (length: 10 mm, width: 10 mm, plate thickness: 1 mm) made of an inorganic material shown in Table 1 was prepared.
  • the surface of the prepared base material was polished to provide a smooth surface with a surface roughness Ra of 0.02 ⁇ m or less.
  • the surface of the polished base material was cut using the NP method to form a striped structure consisting of a plurality of protrusions extending in one direction.
  • the average pitch P, average height H, P/H of the protrusions constituting the stripe structure, and the area ratio occupied by the stripe structure on the surface are shown in Table 1.
  • the average pitch P of the protrusions constituting the stripe structure is determined by taking a planar photograph of the stripe structure using a SEM (scanning electron microscope), measuring the distance between the tops of adjacent protrusions at 10 points, and The average values are shown in Table 1.
  • the average height H of the protrusions constituting the stripe structure is determined by taking a cross-sectional photograph of the stripe structure using an SEM (scanning electron microscope), measuring the height from the top of the protrusion at 10 points, and calculating the average height H. The values are shown in Table 1.
  • the area ratio occupied by the stripe structure is determined by taking a planar photograph of a base material having a stripe structure using an SEM (scanning electron microscope), and determining that the distance (pitch) between the tops of adjacent protrusions is -10 from the average pitch P. % to +10% and the area in which three or more protrusions 21 are continuously repeated was determined and divided by the area of the surface of the base material.
  • the processing device used included a cutting tool and an ultrasonic vibration device that causes the cutting tool to undergo ultrasonic elliptical vibration.
  • the cutting edge is moved in a period in which it moves vertically.
  • a protrusion extending in a direction perpendicular to the moving direction of the cutting tool was formed on the surface of the base material to produce a non-slip member having a striped structure on the surface.
  • the static friction coefficient of the surface on which the stripe structure was formed was measured.
  • a 300 mm disk-shaped silicon wafer S was prepared. Note that the surface roughness Ra of the silicon wafer S was 0.14 nm.
  • three anti-slip members 10 were arranged at 120° intervals in the circumferential direction at radial positions 140 mm from the center of the silicon wafer S, and placed on the fixing plate Q. Note that the anti-slip member 10 was arranged so that the surface on which the striped structure was formed faced the silicon wafer S side. Furthermore, by using a silicon wafer with a mass of 128 g, the load in the stacking direction was set to 43 g/cm 2 .
  • Comparative Example 1 the average pitch P of the protrusions of the stripe structure was 1500 nm, and the static friction coefficient was 0.14 (parallel) and 0.15 (perpendicular), resulting in insufficient surface friction. Ta.
  • Comparative Example 2 the average pitch P of the protrusions in the stripe structure was 10 nm, and the static friction coefficients were 0.17 (parallel) and 0.17 (perpendicular), resulting in insufficient surface friction. Ta.
  • the average pitch P of the protrusions of the stripe structure is within the range of 20 nm or more and 1000 nm or less, and the static friction coefficient is 0.28 (parallel) or more and 0.28 (parallel) or more. 27 (perpendicular) or more, and it was confirmed that the surface friction force was sufficiently high and that the object could be sufficiently fixed.
  • the base material was made of quartz, but a stripe structure with an average pitch P of protrusions of 20 nm or more and 1000 nm or less can be formed on the surface. The occupied area ratio was secured at 30% or more, and the static friction coefficient was 0.99 (parallel) or more and 0.76 (orthogonal) or more.
  • a base material (length: 10 mm, width: 10 mm, plate thickness: 1 mm) made of an inorganic material shown in Table 2 was prepared.
  • the surface of the prepared base material was polished to provide a smooth surface with a surface roughness Ra of 0.02 ⁇ m or less.
  • the surface of the polished base material was cut using the NP method to form a plurality of protrusions, thereby forming a protrusion region according to the second embodiment shown in FIGS. 6 to 10.
  • the average pitch P1 of the protrusions constituting the protrusion area in the first direction, the average height H of the protrusions, the height H1 of the tip, the average pitch P1 of the protrusions in the first direction, and the average of the protrusions The ratio H/P1 to the height H, the ratio H/P2 between the average pitch P2 of the protrusions in the second direction and the average height H of the protrusions, the length L1 of the bottom surface of the protrusions in the first direction, The length L2 of the bottom in the second direction, the length L3 of the top in the second direction, the ratio L3/L2 of the length L2 of the bottom of the protrusion in the second direction and the length L3 of the top in the second direction, the protrusion on the surface is The
  • the average pitch P1 is determined by taking a planar photograph of the protrusion region using a SEM (scanning electron microscope), measuring the distance between the tops of adjacent protrusions in the first direction (X direction) at 10 points, and displaying the average value. 2, and the average pitch P2 was determined by measuring the distance between the tops of adjacent projections in the second direction (Y direction) at 10 locations, and the average value is shown in Table 2.
  • the average height H of the protrusion and the height H1 of the tip are determined by taking a cross-sectional photograph (ZY plane) of the protrusion using an SEM (scanning electron microscope), and calculating the height from the top of the protrusion by 10 Measurements were taken at different locations, and the average values are shown in Table 2.
  • Photographs of the cross sections (ZY plane and ZX plane) of the protrusions were taken using a SEM (scanning electron microscope), measurements were taken at 10 locations, and the average values are shown in Table 2.
  • the area ratio occupied by the protrusions is determined by taking a planar photograph of the base material having the protrusions using an SEM (scanning electron microscope), determining the area of the range in which the protrusions satisfying the structure of the present invention are observed, and using this as a basis. It was obtained by dividing by the area of the material surface.
  • the processing device used was a processing device having a cutting tool and an ultrasonic vibrating device that causes the cutting tool to undergo ultrasonic elliptical vibration.
  • the cutting tool is pushed in diagonally while being ultrasonically vibrated, and then the cutting tool is moved in a direction perpendicular to the blade surface while being subjected to ultrasonic elliptical vibration, while the cutting edge is moved in a vertical direction.
  • a plurality of protrusions were formed on the surface of the base material, and an anti-slip member having a protrusion region (protrusion region) on the surface was produced.
  • the static friction coefficient of the surface on which the protrusion region was formed was measured.
  • a 300 mm disk-shaped silicon wafer S was prepared.
  • three anti-slip members 10 were arranged at 120° intervals in the circumferential direction at radial positions 140 mm from the center of the silicon wafer S, and placed on the fixing plate Q. Note that the anti-slip member 10 was arranged so that the surface on which the protrusion region was formed faced the silicon wafer S side. Furthermore, by using a silicon wafer with a mass of 128 g, the load in the stacking direction was set to 43 g/cm 2 .
  • the average pitch P1 of the protrusions in the first direction and the average pitch P2 of the protrusions in the second direction are each in the range of 20 nm or more and 1000 nm or less, and the static friction The coefficient was 0.21 or more, and it was confirmed that the surface frictional force was sufficiently high and the object could be sufficiently fixed.

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Abstract

Cet élément de prévention de glissement possède, sur au moins une partie d'une surface d'un matériau de base composé d'un matériau inorganique, une zone de saillie dans laquelle une pluralité de saillies sont érigées, la zone de saillie possédant une première direction et une seconde direction croisant la première direction ; la pluralité de saillies étant disposées périodiquement dans au moins une direction parmi la première direction et la seconde direction ; le pas moyen de la pluralité de saillies dans la première direction et/ou la seconde direction se trouvant dans la plage de 20 à 1 000 nm ; et le coefficient de frottement dynamique de la surface équivalant à 0,20 ou plus.
PCT/JP2023/023805 2022-06-29 2023-06-27 Élément de prévention de glissement WO2024005014A1 (fr)

Applications Claiming Priority (4)

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JP2022-104569 2022-06-29
JP2022104578A JP2024004765A (ja) 2022-06-29 2022-06-29 滑り止め部材
JP2022-104578 2022-06-29
JP2022104569A JP2024004760A (ja) 2022-06-29 2022-06-29 滑り止め部材

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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004200436A (ja) * 2002-12-19 2004-07-15 Toshiba Ceramics Co Ltd サセプタ及びその製造方法
JP2005015110A (ja) * 2003-06-24 2005-01-20 Kyocera Corp セラミックス滑り止め具およびその製造方法
JP2019155457A (ja) * 2018-03-16 2019-09-19 キヤノンマシナリー株式会社 撥水性物品の製造方法およびレーザ加工装置
EP3561193A1 (fr) * 2018-04-24 2019-10-30 Juan Vicente Martinez Sola Pièce en céramique réversible présentant deux côtés ayant une finition différente pour le pavage
WO2020051217A1 (fr) * 2018-09-06 2020-03-12 Heraeus Gmsi Llc Suscepteur et son procédé de fabrication
JP2021077033A (ja) * 2019-11-07 2021-05-20 日本電気硝子株式会社 入力装置用ガラスフィルム

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004200436A (ja) * 2002-12-19 2004-07-15 Toshiba Ceramics Co Ltd サセプタ及びその製造方法
JP2005015110A (ja) * 2003-06-24 2005-01-20 Kyocera Corp セラミックス滑り止め具およびその製造方法
JP2019155457A (ja) * 2018-03-16 2019-09-19 キヤノンマシナリー株式会社 撥水性物品の製造方法およびレーザ加工装置
EP3561193A1 (fr) * 2018-04-24 2019-10-30 Juan Vicente Martinez Sola Pièce en céramique réversible présentant deux côtés ayant une finition différente pour le pavage
WO2020051217A1 (fr) * 2018-09-06 2020-03-12 Heraeus Gmsi Llc Suscepteur et son procédé de fabrication
JP2021077033A (ja) * 2019-11-07 2021-05-20 日本電気硝子株式会社 入力装置用ガラスフィルム

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