WO2023246119A1 - 一种高熵合金粉末及其涂层和涂层的制备方法 - Google Patents
一种高熵合金粉末及其涂层和涂层的制备方法 Download PDFInfo
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- 238000000576 coating method Methods 0.000 title claims abstract description 68
- 239000000843 powder Substances 0.000 title claims abstract description 67
- 239000011248 coating agent Substances 0.000 title claims abstract description 65
- 239000000956 alloy Substances 0.000 title claims abstract description 62
- 229910045601 alloy Inorganic materials 0.000 title claims abstract description 61
- 238000002360 preparation method Methods 0.000 title claims abstract description 12
- 239000000758 substrate Substances 0.000 claims abstract description 46
- 229910001069 Ti alloy Inorganic materials 0.000 claims abstract description 45
- 238000000034 method Methods 0.000 claims abstract description 28
- 238000004372 laser cladding Methods 0.000 claims abstract description 20
- 239000010936 titanium Substances 0.000 claims abstract description 18
- 238000009689 gas atomisation Methods 0.000 claims abstract description 11
- 239000002245 particle Substances 0.000 claims abstract description 3
- 238000000227 grinding Methods 0.000 claims description 30
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 20
- 239000011812 mixed powder Substances 0.000 claims description 15
- 229910052759 nickel Inorganic materials 0.000 claims description 11
- 229910052782 aluminium Inorganic materials 0.000 claims description 10
- 229910052786 argon Inorganic materials 0.000 claims description 10
- 238000000498 ball milling Methods 0.000 claims description 10
- 239000011261 inert gas Substances 0.000 claims description 10
- 238000007670 refining Methods 0.000 claims description 10
- 238000005488 sandblasting Methods 0.000 claims description 10
- 229910052802 copper Inorganic materials 0.000 claims description 9
- 239000000463 material Substances 0.000 claims description 9
- 229910052751 metal Inorganic materials 0.000 claims description 9
- 229910052726 zirconium Inorganic materials 0.000 claims description 9
- 239000012535 impurity Substances 0.000 claims description 7
- 239000000203 mixture Substances 0.000 claims description 7
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 5
- 238000000889 atomisation Methods 0.000 claims description 5
- 239000007789 gas Substances 0.000 claims description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 5
- 239000007788 liquid Substances 0.000 claims description 3
- 239000002184 metal Substances 0.000 claims description 3
- 238000002156 mixing Methods 0.000 claims description 3
- 238000009413 insulation Methods 0.000 claims 4
- 229910052593 corundum Inorganic materials 0.000 claims 2
- 239000010431 corundum Substances 0.000 claims 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 16
- 229910052719 titanium Inorganic materials 0.000 description 6
- 239000011159 matrix material Substances 0.000 description 5
- 229910000831 Steel Inorganic materials 0.000 description 4
- 229910000808 amorphous metal alloy Inorganic materials 0.000 description 4
- 239000003921 oil Substances 0.000 description 4
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 4
- 239000010959 steel Substances 0.000 description 4
- 238000002441 X-ray diffraction Methods 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000005253 cladding Methods 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 3
- 229910001338 liquidmetal Inorganic materials 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical group [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 239000004615 ingredient Substances 0.000 description 2
- 239000002159 nanocrystal Substances 0.000 description 2
- 238000004321 preservation Methods 0.000 description 2
- 238000001878 scanning electron micrograph Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 238000001291 vacuum drying Methods 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000007750 plasma spraying Methods 0.000 description 1
- 239000010970 precious metal Substances 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
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- B22F9/00—Making metallic powder or suspensions thereof
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- B22F9/00—Making metallic powder or suspensions thereof
- B22F9/02—Making metallic powder or suspensions thereof using physical processes
- B22F9/06—Making metallic powder or suspensions thereof using physical processes starting from liquid material
- B22F9/08—Making metallic powder or suspensions thereof using physical processes starting from liquid material by casting, e.g. through sieves or in water, by atomising or spraying
- B22F9/082—Making metallic powder or suspensions thereof using physical processes starting from liquid material by casting, e.g. through sieves or in water, by atomising or spraying atomising using a fluid
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/14—Working by laser beam, e.g. welding, cutting or boring using a fluid stream, e.g. a jet of gas, in conjunction with the laser beam; Nozzles therefor
- B23K26/144—Working by laser beam, e.g. welding, cutting or boring using a fluid stream, e.g. a jet of gas, in conjunction with the laser beam; Nozzles therefor the fluid stream containing particles, e.g. powder
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y10/00—Processes of additive manufacturing
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- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
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- C22C1/00—Making non-ferrous alloys
- C22C1/04—Making non-ferrous alloys by powder metallurgy
- C22C1/045—Alloys based on refractory metals
- C22C1/0458—Alloys based on titanium, zirconium or hafnium
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- C22C16/00—Alloys based on zirconium
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C24/00—Coating starting from inorganic powder
- C23C24/08—Coating starting from inorganic powder by application of heat or pressure and heat
- C23C24/10—Coating starting from inorganic powder by application of heat or pressure and heat with intermediate formation of a liquid phase in the layer
- C23C24/103—Coating with metallic material, i.e. metals or metal alloys, optionally comprising hard particles, e.g. oxides, carbides or nitrides
- C23C24/106—Coating with metal alloys or metal elements only
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- B22F2009/043—Making metallic powder or suspensions thereof using physical processes starting from solid material, e.g. by crushing, grinding or milling by ball milling
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- B22F9/00—Making metallic powder or suspensions thereof
- B22F9/02—Making metallic powder or suspensions thereof using physical processes
- B22F9/06—Making metallic powder or suspensions thereof using physical processes starting from liquid material
- B22F9/08—Making metallic powder or suspensions thereof using physical processes starting from liquid material by casting, e.g. through sieves or in water, by atomising or spraying
- B22F9/082—Making metallic powder or suspensions thereof using physical processes starting from liquid material by casting, e.g. through sieves or in water, by atomising or spraying atomising using a fluid
- B22F2009/0824—Making metallic powder or suspensions thereof using physical processes starting from liquid material by casting, e.g. through sieves or in water, by atomising or spraying atomising using a fluid with a specific atomising fluid
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- B22F2304/00—Physical aspects of the powder
- B22F2304/10—Micron size particles, i.e. above 1 micrometer up to 500 micrometer
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- C22C2200/04—Nanocrystalline
Definitions
- the invention relates to a high-entropy alloy powder and a coating thereof and a preparation method of the coating. Specifically, it relates to a method for preparing TiZrCuNiAlCo high-entropy alloy powder and a coating and a preparation method of the coating by laser cladding on a titanium alloy substrate. Entropy alloys, amorphous alloys, and new wear-resistant coating material fields.
- Titanium alloy has the characteristics of low density, high specific strength, corrosion resistance, and high temperature resistance. It is a key material in the aerospace, shipbuilding and offshore engineering industries. However, titanium alloys also have shortcomings such as low hardness, high friction coefficient, and poor wear resistance, which affect their excellent mechanical properties and limit their applications. Preparing a high-performance coating on the surface of titanium alloys with high hardness, low friction coefficient, excellent anti-wear properties, firm bonding with the substrate, and controllable thickness and performance is an effective method to increase the surface hardness of titanium alloys and improve wear resistance.
- High-entropy amorphous alloys are the intersection of high-entropy alloys and amorphous alloys. They combine the composition characteristics of high-entropy alloys and the performance characteristics of amorphous alloys, such as high strength, high hardness, high wear resistance, high corrosion resistance, etc., in Certain specific fields have good application prospects.
- CN109439995B discloses a method for laser cladding a high-entropy amorphous alloy coating on the surface of a No. 45 steel substrate.
- the composition of the coating is: nickel 28-32%, cobalt 28-32%, silicon 2-6%, boron 2 ⁇ 6%, the balance is iron.
- the micro-Vickers hardness of the coating is above 400HV 0.1 , with a maximum of 729.5HV 0.1 and an average of 582.9HV 0.1 .
- the substrate of this system is steel, not titanium alloy; and the hardness of the coating is still not high enough.
- CN113416910B discloses a method for plasma spraying high-entropy amorphous alloy coating on the surface of Q235 steel substrate.
- the composition of the coating is: Co 25%, Ni 25%, Cr 15 ⁇ 20%, Mo 5 ⁇ 10%, Nb 2 ⁇ 4%, B 14% and Si 6%; the coating hardness is above 700HV and the thickness is about 50 ⁇ 300 ⁇ m.
- the substrate of this system is Q235 steel, not titanium alloy; and the thickness of the coating is not thick enough.
- the high-entropy alloy powder is expressed in atomic percentage. Including Ti: 20% to 21.56%, Zr: 20% to 21.56%, Cu: 20% to 21.56%, Ni: 20% to 21.56%, Al: 10% to 10.76%, Co: 3% to 10%.
- a method for preparing a high-entropy amorphous-nanocrystalline coating according to the present invention is prepared by using a titanium alloy as a substrate and coating the high-entropy alloy powder according to the present invention on the surface of the substrate through a laser cladding process.
- the gas atomization powdering process is to use high-pressure inert argon gas flow to crush the metal liquid flow into small droplets and quickly condense it into powder under the protection of inert gas argon.
- the high-entropy alloy powder prepared by the present invention can be used to prepare high-entropy amorphous-nanocrystalline coatings on the surface of titanium alloys.
- Figure 1 is the XRD pattern of the high-entropy amorphous alloy-nanocrystalline coating obtained in Example 1;
- Figure 2 is an SEM image of the high-entropy amorphous alloy-nanocrystalline coating obtained in Example 1.
- the TiZrCuNiAl 0.5 high-entropy alloy powder and Co powder materials are uniformly mixed by ball milling to obtain a mixed powder, in which Ti: 20%, Zr: 20%, Cu: 20%, Ni: 20%, Al: 10%, Co: 10%, Total atomic percentage is 100%.
- the specific parameters of the ball mill are: the ball mill jar and the grinding ball are both made of corundum (Al 2 O 3 ).
- FIG. 2 is an SEM image of the high-entropy amorphous alloy-nanocrystal coating obtained in Example 1. It can be seen from Figure 2 that nanocrystals are precipitated on the amorphous alloy matrix, and the results in Figure 1 are mutually confirmed.
- the TiZrCuNiAl 0.5 high-entropy alloy powder and Co powder materials are uniformly mixed by ball milling to obtain a mixed powder, in which Ti: 20.89%, Zr: 20.89%, Cu: 20.89%, Ni: 20.89%, Al: 10.44%, Co: 6%, Total atomic percentage is 100%.
- the specific parameters of the ball mill are: the ball mill jar and the grinding ball are both made of corundum (Al 2 O 3 ).
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Abstract
本发明公开了一种高熵合金粉末及其涂层和涂层的制备方法,高熵合金粉末按原子百分比组成如下:Ti:20%~21.56%、Zr:20%~21.56%、Cu:20%~21.56%、Ni:20%~21.56%、Al:10%~10.76%、Co:3%~10%。先采用气雾化设备制备TiZrCuNiAl0.5高熵合金粉末,再与Co粉末混合均匀,得到粒径范围在50~180μm的高熵合金粉末。对钛合金基板打磨喷砂,并进行预热,再采用激光熔覆工艺将得到的高熵合金粉末熔融后涂敷在钛合金基板表面得到高熵非晶-纳米晶涂层。所得的高熵非晶-纳米晶涂层具有硬度高,组织细小,耐磨性能好等特点,具有良好的应用前景。
Description
本发明涉及一种高熵合金粉末及其涂层和涂层的制备方法,具体涉及在钛合金基板上采用激光熔覆制备TiZrCuNiAlCo高熵合金粉末及其涂层和涂层的制备方法,属于高熵合金、非晶合金、耐磨涂层新材料领域。
钛合金具有密度低、比强度高、耐蚀、耐高温等特点,是航空航天、船舶海工行业的关键材料。然而钛合金也存在硬度低、摩擦系数高、耐磨性差等缺点,影响了其优异力学性能的发挥,限制了应用。在钛合金表面制备一层硬度高、摩擦系数低、具有优异抗磨损性能、与基板牢固结合、厚度及性能可控的高性能涂层是提高钛合金表面硬度,改善耐磨性能的有效方法。
高熵非晶合金是高熵合金和非晶合金的交叉领域,结合了高熵合金的成分特点和非晶合金的性能特点,如高强度,高硬度,高耐磨,高耐蚀等,在某些特定的领域具有良好的应用前景。
CN109439995B公开了一种在45号钢基体表面激光熔覆高熵非晶合金涂层的方法,涂层的成分为:镍28~32%、钴28~32%、硅2~6%、硼2~6%、余量为铁。涂层显微维氏硬度在400HV0.1以上,最高可达729.5HV0.1,平均可达582.9HV0.1。然而,该体系的基板是钢,不是钛合金;同时涂层的硬度仍然不够高。
CN113416910B公开了一种在Q235钢基体表面等离子喷涂高熵非晶合金涂层的方法,涂层的成分为:Co 25%,Ni 25%,Cr 15~20%,Mo 5~10%,Nb 2~4%,B 14%和Si 6%;涂层硬度在700HV以上,厚度约50~300μm。然而,该体系的基板是Q235钢,不是钛合金;同时涂层的厚度不够厚。
目前尚没有见到关于在钛合金基板上制备高熵非晶合金涂层的报道。基于此,需要开发出一种在钛合金基板制备高熵非晶合金-纳米晶涂层的方法,使得涂层硬度高,耐磨性好,能够拓展钛合金材料的应用范围。
发明内容
发明目的:本发明的第一目的是提供一种高熵合金粉末,本发明的第二目的是提供一种硬度高、耐磨性好的高熵非晶-纳米晶涂层;本发明的第三目的是提供一种该高熵非晶-纳米晶涂层的制备方法。
技术方案:本发明所述一种高熵合金粉末,所述高熵合金粉末按原子百分比
包括Ti:20%~21.56%、Zr:20%~21.56%、Cu:20%~21.56%、Ni:20%~21.56%、Al:10%~10.76%、Co:3%~10%。
其中,所述高熵合金粉末的粒径为50~180μm。
本发明还包括所述的高熵合金粉末制备的高熵非晶-纳米晶涂层。
其中,所述高熵非晶-纳米晶涂层的维氏硬度>750HV,所述高熵非晶-纳米晶涂层的厚度为100~500μm。
一种本发明所述高熵非晶-纳米晶涂层的制备方法,以钛合金为基板,通过激光熔覆工艺将本发明所述的高熵合金粉末涂覆在基板表面制得。
本发明所述的高熵非晶-纳米晶涂层的制备方法,包括以下步骤:
(1)采用气雾化制粉工艺制TiZrCuNiAl0.5高熵合金粉末;
(2)合成高熵合金粉末:将TiZrCuNiAl0.5高熵合金粉末及Co粉末材料经球磨混合均匀,用筛网进行筛分,得到混合粉末,对混合粉末进行烘干备用;
(3)钛合金基板打磨喷砂:利用喷砂去除钛合金基板表面的氧化层和杂质,利用酒精擦拭去除钛合金基板表面的油污和水渍,将钛合金基板预热;
(4)激光熔覆获得涂层:将高熵合金粉末熔融,在惰性气体保护下,利用激光熔覆工艺将其涂覆在预热的钛合金基板表面即得。
其中,步骤(1)中,所述气雾化制粉工艺是在惰性气体氩气的保护下,用高压惰性氩气气流将金属液流粉碎成小液滴并快速冷凝成粉末。
其中,步骤(1)中,气雾化制粉时,Ti、Zr、Cu、Ni、Al均为质量分数>99.99%的纯金属单质,Ti:Zr:Cu:Ni:Al=2:2:2:2:1。
其中,步骤(1)中,气雾化制粉时精炼的温度为1500~1600℃,精炼的时间为5~15min,中间保温的温度为1300~1400℃,保温的时间为20~40min,雾化压力3~5MPa。
其中,步骤(2)中,球磨混合时球磨罐和研磨球均为刚玉(Al2O3)材质,研磨球和混合粉末的质量比为1:1,速率为200~300r/min,球磨时间为2h。
其中,步骤(4)中,激光熔覆时激光光斑直径约2.4mm,激光功率800~1200W,扫描速度为360~720mm/min,惰性气体为氩气。
因钛合金容易氧化,涂层应力大,易开裂,本申请采用Ti:Zr:Cu:Ni:Al、Co六种元素制备的高熵合金粉末熔融后激光熔覆在钛合金基板表面,可以克服上述问题,得到的涂层硬度高,组织细小,耐磨性能好。
有益效果:与现有技术相比,本发明具有如下显著优点:
(1)本发明所采用的材料价格便宜,不含贵金属及昂贵的Sc等元素;制备
工艺简单,易于实现。
(2)本发明制备的高熵合金粉末可以用于在钛合金表面制备高熵非晶-纳米晶涂层。
(3)本发明所制备的高熵非晶-纳米晶涂层硬度高,组织细小,耐磨性能好。
图1为实施例1得到高熵非晶合金-纳米晶涂层XRD图;
图2为实施例1得到高熵非晶合金-纳米晶涂层的SEM图。
下面结合附图对本发明的技术方案作进一步说明。
实施例1
1、制备TiZrCuNiAl0.5高熵合金粉末:
采用气雾化方法制备TiZrCuNiAl0.5高熵合金粉末,按原子百分比进行配料,所采用Ti、Zr、Cu、Ni、Al均为质量分数>99.99%的纯金属单质,Ti:Zr:Cu:Ni:Al=2:2:2:2:1,精炼温度1500℃,精炼时间15min,中间保温温度1300℃,保温时长20min,雾化压力3MPa,通过高速气流将液态金属流粉碎为小滴并快速冷凝成TiZrCuNiAl0.5高熵合金粉末。
2、合成高熵合金粉末:
将TiZrCuNiAl0.5高熵合金粉末及Co粉末材料经球磨混合均匀得到混合粉末,其中Ti:20%、Zr:20%、Cu:20%、Ni:20%、Al:10%、Co:10%,总原子百分比为100%。球磨的具体参数为:球磨罐和研磨球均为刚玉(Al2O3)材质。将研磨球和混合粉末以质量比1:1的比例放置入球磨罐中,顺时针以200r/min的速率球磨2h,用孔径为180μm的筛网进行筛分,去掉研磨球,混合好的粉末加热至100℃,真空烘干4h,自然冷却用于后续熔覆实验。
3、钛合金基板打磨喷砂:
选用TC4钛合金基板,利用喷砂去除TC4钛合金基板表面的氧化层和杂质,利用酒精擦拭去除TC4钛合金基板表面的油污和水渍备用,将TC4钛合金基板预热至250℃,以提高基板和涂层间的结合力。
4、激光熔覆获得涂层:
将步骤2合成的高熵合金粉末熔融,利用激光熔覆工艺将熔融的高熵合金粉末涂覆在步骤3处理过的钛合金基板表面,得到涂层;激光熔覆工艺参数为:激光光斑直径约2.4mm,激光功率800W,扫描速度为720mm/min,采用氩气作为惰性气体保护,获得高熵非晶合金-纳米晶涂层。
对本实施例得到的高熵非晶合金-纳米晶涂层进行厚度测试,得到高熵非晶合金-纳米晶涂层厚度为100μm,维氏硬度为937HV,磨损量为TC4基体的45%,耐磨性能优异。
将本实施例得到高熵非晶合金-纳米晶涂层进行XRD分析,结果如图1所示。图1为实施例1得到涂层的XRD图,由图1可以看出,其显微组织为非晶基体上析出了其它晶态相。
将本实施例得到高熵非晶合金-纳米晶涂层进行电子显微镜扫描分析,结果如图2所示。图2为实施例1得到高熵非晶合金-纳米晶涂层的SEM图,由图2可以看出,在非晶合金基体上析出纳米晶,且与图1的结果互相印证。
实施例2
1、制备TiZrCuNiAl0.5高熵合金粉末:
采用气雾化方法制备TiZrCuNiAl0.5高熵合金粉末。按原子百分比进行配料,所采用Ti、Zr、Cu、Ni、Al均为质量分数>99.99%的纯金属单质,Ti:Zr:Cu:Ni:Al=2:2:2:2:1,精炼温度1600℃,精炼时间5min,中间包保温温度1400℃,保温时长40min,雾化压力5MPa,通过高速气流将液态金属流粉碎为小滴并快速冷凝成TiZrCuNiAl0.5高熵合金粉末。
2、合成高熵合金粉末:
将TiZrCuNiAl0.5高熵合金粉末及Co粉末材料经球磨混合均匀得到混合粉末,其中Ti:21.56%、Zr:21.56%、Cu:21.56%、Ni:21.56%、Al:10.76%、Co:3%,总原子百分比为100%。球磨的具体参数为:球磨罐和研磨球均为刚玉(Al2O3)材质。将研磨球和混合粉末以1:1的比例放置入球磨罐中,顺时针以250r/min的速率球磨2h,用筛网进行筛分,去掉杂质和研磨球,将混合好的粉末加热至90℃,真空烘干4h,自然冷却用于后续熔覆实验。
3、钛合金基板打磨喷砂:
选用TC4钛合金基板,利用喷砂去除TC4钛合金基板表面的氧化层和杂质,利用酒精擦拭去除TC4钛合金基板表面的油污和水渍备用,将TC4钛合金基板预热至300℃,以提高基板和涂层间的结合力。
4、激光熔覆获得涂层:
将步骤2合成的高熵合金粉末熔融,利用激光熔覆工艺将熔融的高熵合金粉末涂覆在步骤3处理过的钛合金基板表面,得到涂层;激光熔覆工艺参数为:激光光斑直径约2.4mm,激光功率1200W,扫描速度为360mm/min,采用氩气作为惰性气体保护,获得高熵非晶合金-纳米晶涂层。
对本实施例得到的高熵非晶合金-纳米晶涂层进行厚度测试,得到高熵非晶合金-纳米晶涂层厚度为500μm,维氏硬度为795HV,磨损量为TC4基体的70%,耐磨性能优异。
实施例3
1、制备TiZrCuNiAl0.5高熵合金粉末:
采用气雾化方法制备TiZrCuNiAl0.5高熵合金粉末。按原子百分比进行配料,所采用Ti、Zr、Cu、Ni、Al均为质量分数>99.99%的纯金属单质,Ti:Zr:Cu:Ni:Al=2:2:2:2:1,精炼温度1550℃,精炼时间10min,中间保温温度1360℃,保温时长30min,雾化压力4MPa,通过高速气流将液态金属流粉碎为小滴并快速冷凝成TiZrCuNiAl0.5高熵合金粉末。
2、合成高熵合金粉末:
将TiZrCuNiAl0.5高熵合金粉末及Co粉末材料经球磨混合均匀得到混合粉末,其中Ti:20.89%、Zr:20.89%、Cu:20.89%、Ni:20.89%、Al:10.44%、Co:6%,总原子百分比为100%。球磨的具体参数为:球磨罐和研磨球均为刚玉(Al2O3)材质。将研磨球和混合粉末以1:1的比例放置入球磨罐中,顺时针以300r/min的速率球磨2h,用筛网进行筛分,去掉杂质和研磨球,将混合好的粉末加热至80℃,真空烘干4h,自然冷却用于后续熔覆实验。
3、钛合金基板打磨喷砂:
选用TC4钛合金基板,利用喷砂去除TC4钛合金基板表面的氧化层和杂质,利用酒精擦拭去除TC4钛合金基板表面的油污和水渍备用,将TC4钛合金基板预热至350℃,以提高基板和涂层间的结合力。
4、激光熔覆获得涂层:
将步骤2合成的高熵合金粉末熔融,利用激光熔覆工艺将熔融的高熵合金粉末涂覆在步骤3处理过的钛合金基板表面,得到涂层;激光熔覆工艺参数为:激光光斑直径约2.4mm,激光功率1000W,扫描速度为480mm/min,采用氮气作为惰性气体保护,获得高熵非晶合金-纳米晶涂层。
对本实施例得到的高熵非晶合金-纳米晶涂层进行厚度测试,得到高熵非晶合金-纳米晶涂层厚度为260μm,维氏硬度为890HV,磨损量为TC4基体的50%,耐磨性能优异。
Claims (5)
- 一种高熵合金粉末,其特征在于,所述高熵合金粉末按原子百分比包括Ti:20%~21.56%、Zr:20%~21.56%、Cu:20%~21.56%、Ni:20%~21.56%、Al:10%~10.76%、Co:3%~10%,其中,Ti:Zr:Cu:Ni:Al=2:2:2:2:1,所述TiZrCuNiAl0.5的制备包括(1)采用气雾化制粉工艺制TiZrCuNiAl0.5高熵合金粉末,所述气雾化制粉工艺是在惰性气体氩气的保护下,用高压惰性氩气气流将金属液流粉碎成小液滴并快速冷凝成粉末,气雾化制粉时,Ti:Zr:Cu:Ni:Al均为质量分数>99.99%的纯金属单质,精炼的温度为1500~1600℃,精炼的时间为5~15min,中间保温的温度为1300~1400℃,保温的时间为20~40min,雾化压力为3~5MPa;(2)合成高熵合金粉末:将TiZrCuNiAl0.5高熵合金粉末及Co粉末材料经球磨混合均匀,用筛网进行筛分,得到混合粉末,对混合粉末进行烘干备用,球磨混合时,球磨罐和研磨球均为刚玉材质,速率为200~300r/min。
- 根据权利要求1所述的高熵合金粉末,其特征在于,所述高熵合金粉末的粒径为50~180μm。
- 权利要求1或2所述的高熵合金粉末制备的高熵非晶-纳米晶涂层。
- 根据权利要求3所述的高熵非晶-纳米晶涂层,其特征在于,所述高熵非晶-纳米晶涂层的维氏硬度>750HV,所述高熵非晶-纳米晶涂层的厚度为100~500μm。
- 一种权利要求3或4所述高熵非晶-纳米晶涂层的制备方法,其特征在于,以钛合金为基板,通过激光熔覆工艺将权利要求3或权利要求4所述的高熵合金粉末涂覆在基板表面制得,包括以下步骤:(1)采用气雾化制粉工艺制TiZrCuNiAl0.5高熵合金粉末,所述气雾化制粉工艺是在惰性气体氩气的保护下,用高压惰性氩气气流将金属液流粉碎成小液滴并快速冷凝成粉末,气雾化制粉时,Ti:Zr:Cu:Ni:Al均为质量分数>99.99%的纯金属单质,精炼的温度为1500~1600℃,精炼的时间为5~15min,中间保温的温度为1300~1400℃,保温的时间为20~40min,雾化压力为3~5MPa。;(2)合成高熵合金粉末:将TiZrCuNiAl0.5高熵合金粉末及Co粉末材料经球磨混合均匀,用筛网进行筛分,得到混合粉末,对混合粉末进行烘干备用,球磨混合时,球磨罐和研磨球均为刚玉材质,速率为200~300r/min;(3)钛合金基板打磨喷砂:利用喷砂去除钛合金基板表面的氧化层和杂质,利用酒精擦拭去除钛合金基板表面的油污和水渍,将钛合金基板预热;(4)激光熔覆获得涂层:将高熵合金粉末熔融,在惰性气体保护下,利用激光熔覆工艺将其涂覆在预热的钛合金基板表面即得,激光熔覆涂层时,激光功率800~1200W,扫描速度为360~720mm/min,惰性气体为氩气。
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