WO2023206667A1 - 显示面板及其制备方法、显示装置 - Google Patents

显示面板及其制备方法、显示装置 Download PDF

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Publication number
WO2023206667A1
WO2023206667A1 PCT/CN2022/094186 CN2022094186W WO2023206667A1 WO 2023206667 A1 WO2023206667 A1 WO 2023206667A1 CN 2022094186 W CN2022094186 W CN 2022094186W WO 2023206667 A1 WO2023206667 A1 WO 2023206667A1
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WO
WIPO (PCT)
Prior art keywords
color resist
layer
color
light
black matrix
Prior art date
Application number
PCT/CN2022/094186
Other languages
English (en)
French (fr)
Inventor
温海龙
张玉秀
Original Assignee
广州华星光电半导体显示技术有限公司
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Publication of WO2023206667A1 publication Critical patent/WO2023206667A1/zh

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2202/00—Materials and properties

Definitions

  • the present invention relates to the field of display equipment, in particular to a display panel, a preparation method thereof, and a display device.
  • the CF Color Filter, color filter substrate
  • BM black matrix
  • RGB color resistor
  • OC OC
  • PS spacer
  • OC has a relatively low hardness.
  • PS When PS is compressed, the base OC is compressed at the same time, resulting in insufficient pressure resistance of the product.
  • OC film layer due to the soft nature of the OC film layer, it also limits the high elasticity of the PS material. Characteristics make it difficult for the highly elastic PS material to fully exert its deformation ability;
  • the flatness of the OC material itself is average, and it can only achieve about 60%-70% flatness. To achieve a higher flatness effect, you need to increase the thickness of the OC layer, or introduce high flatness OC materials, which further increases the cost.
  • the purpose of the present invention is to provide a display panel, a preparation method thereof, and a display device to solve the technical problems of high preparation cost, low production efficiency, low product surface flatness, and insufficient pressure resistance in existing color filter substrates.
  • the present invention provides a display panel, which includes a color filter substrate, which includes a base layer, a black matrix, a first color resist layer, a second color resist layer, and spacers.
  • the black matrix is provided on the substrate layer, and the black matrix is provided with openings.
  • the first color resist layer fills the opening and covers the black matrix.
  • the second color resist layer is disposed on the first color resist layer and corresponds to the black matrix.
  • the spacer is disposed on a surface of the second color resist layer away from the first color resist layer, and the projection of the spacer on the substrate layer is located on the surface of the black matrix on the substrate layer. Within the projection range on the bottom layer.
  • the color filter substrate further includes a protective layer, the protective layer is provided on a surface of the first color resist layer away from the black matrix and corresponds to the opening.
  • a vertical distance between a surface of the protective layer away from the first color resist layer and a surface of the second color resist layer away from the first color resist layer is less than 0.6 microns.
  • the material of the protective layer and the spacer is the same.
  • a plurality of color resist blocks are provided in both the first color resist layer and the second color resist layer, and the two color resist blocks arranged in a stack have different colors.
  • the color resist block in the first color resist layer includes a main body part and an extension part.
  • the main body portion is located in the opening.
  • the extension part is provided on the black matrix and is located between two adjacent main parts.
  • the thickness of the extension part and the thickness of the black matrix are both smaller than the thickness of the main body part.
  • the thickness of the main body part is less than the sum of the thicknesses of the black matrix and the extension part.
  • the spacer includes a main support column and an auxiliary support column, and the height of the auxiliary support column is smaller than the height of the main support column.
  • the display panel further includes an array substrate, and the color filter substrate is arranged opposite to the array substrate.
  • the present invention also provides a method for preparing a display panel.
  • the method for preparing a display panel includes the following steps: providing a substrate layer; preparing a black matrix on the substrate layer, and forming openings in the black matrix; A first color resist layer filling the opening and covering the black matrix is formed on the black matrix; a second color resist layer corresponding to the black matrix is formed on the first color resist layer; on the second color resist layer Spacers are formed at positions corresponding to the color resist layer and the black matrix.
  • a protective layer corresponding to the opening is formed on the first color resist layer.
  • the step of forming a protective layer corresponding to the opening on the first color resist layer includes the following steps: A transparent photocurable material layer is formed on the first color resist layer and the second color resist layer; a half-tone mask is provided, and the half-tone mask is provided with a first light-transmitting hole and a second light-transmitting hole.
  • the first light-transmitting hole and the second light-transmitting hole corresponding to the black matrix
  • the light transmittance is less than the light transmittance of the second light-transmitting hole and the third light-transmitting hole
  • the photo-curing material layer is patterned through the half-tone mask, and the photo-curing material layer is
  • a main supporting pillar is formed corresponding to the first light-transmitting hole, a auxiliary supporting pillar is formed corresponding to the second light-transmitting hole, and the protective layer is formed corresponding to the third light-transmitting hole.
  • the light transmittance of the second light-transmitting hole is equal to the light transmittance of the third light-transmitting hole.
  • the black matrix includes a first opening area, a second opening area and a third opening area, the first opening area is provided with a first opening, and the second opening area is provided with a second opening, so A third opening is provided in the third opening area.
  • the step of forming a first color resist layer that fills the opening and covers the black matrix on the black matrix includes: covering the black matrix with a first color resist material; providing a first mask, The first mask is provided with a fourth light-transmitting hole and a fifth light-transmitting hole. The fourth light-transmitting hole overlaps with the projection of the first opening area on the substrate layer.
  • the fifth light-transmitting hole Corresponding to the second opening area and the third opening area, the first color resist material is patterned through the first mask to form a first color resist block in the first opening area, A second color resist block is formed at a position corresponding to the fifth light-transmitting hole.
  • the second color resist block is located on the black matrix between the two adjacent second openings and is located on the opposite side of the black matrix. on the black matrix between the two adjacent third openings.
  • the step of forming a second color resistance layer corresponding to the black matrix on the first color resistance layer includes: covering the first color resistance layer with a second color resistance material; and providing a second color resistance layer.
  • a mask the second mask is provided with a sixth light-transmitting hole and a seventh light-transmitting hole, the sixth light-transmitting hole overlaps with the projection of the second opening area on the substrate layer, the A seventh light-transmitting hole is provided corresponding to the first opening area;
  • the second color resist material is patterned through the second mask to form a third color resist block in the second opening area,
  • a fourth color resist block is formed at a position corresponding to the seventh light-transmitting hole, wherein the projection of the fourth color resist block on the substrate layer is located between two adjacent first openings.
  • the third color resist block covers the second color resist block in the second opening area.
  • the present invention also provides a display device, which includes a display panel and a backlight unit as described above, and the display panel is connected to the backlight unit.
  • the advantage of the present invention is that in the display panel, its preparation method and the display device, the color filter substrate of the present invention improves the pressure resistance of the display device and the deformation ability of the spacer through the material properties of the second color resist layer. and resilience.
  • the second color resist layer can also improve the light-shielding effect of the color filter substrate while reducing the dark-state brightness, thereby improving the contrast of the display device.
  • Figure 1 is a schematic diagram of the layered structure of the color filter substrate in Embodiment 1 of the present invention.
  • Figure 2 is a schematic diagram of the layered structure of the color filter substrate in Embodiment 1 of the present invention.
  • FIG. 3 is a schematic flow chart of the color filter substrate preparation method in Embodiment 1 of the present invention.
  • Figure 4 is a schematic flow chart of the color filter substrate preparation method in Embodiment 2 of the present invention.
  • Figure 5 is a schematic diagram of the partitioning of the black matrix in step S212 of Embodiment 2 of the present invention.
  • Figure 6 is a schematic diagram of the layered structure of the color filter substrate after forming the fifth color resist block in step S212 of Embodiment 2 of the present invention.
  • Figure 7 is a schematic diagram of the layered structure of the color filter substrate after forming the third color resist block in step S212 of Embodiment 2 of the present invention.
  • Figure 8 is a schematic diagram of the layered structure of the color filter substrate after forming the first color resist block and the second color resist block in step S212 of Embodiment 2 of the present invention
  • Figure 9 is a schematic diagram of the layered structure of the color filter substrate after forming the fourth color resist block in step S212 of Embodiment 2 of the present invention.
  • Figure 10 is a schematic flow chart of the color filter substrate preparation method in Embodiment 3 of the present invention.
  • Figure 11 is a schematic diagram of the partitioning of the black matrix in step S312 of Embodiment 3 of the present invention.
  • Figure 12 is a schematic diagram of the layered structure of the color filter substrate after forming the first color resist block and the second color resist block in step S312 of Embodiment 3 of the present invention
  • Figure 13 is a schematic diagram of the layered structure of the color filter substrate after forming the third color resist block and the fourth color resist block in step S312 of Embodiment 3 of the present invention
  • FIG. 14 is a schematic diagram of the layered structure of the color filter substrate after forming the fifth color resist block in step S312 of Embodiment 3 of the present invention.
  • Color filter substrate 100 light-transmitting area 101;
  • first color resist layer 30 first color resist block 31;
  • second color resist layer 40 second color resist block 41;
  • the fourth color blocking block 42 is the fourth color blocking block 42.
  • first opening area 201 first opening area 201; first opening 211;
  • inventive embodiments refer to the accompanying drawings to illustrate specific inventive embodiments in which the invention may be implemented.
  • the directional terms mentioned in the present invention such as “up”, “down”, “front”, “back”, “left”, “right”, “inside”, “outside”, “side”, etc., are only Reference is made to the direction of the attached drawings. Therefore, the directional terms used are for the purpose of better and clearer description and understanding of the present invention, but do not indicate or imply that the device or component referred to must have a specific orientation, be in a specific orientation. construction and operation, and therefore should not be construed as limitations of the invention. Furthermore, the terms “first,” “second,” “third,” etc. are used for descriptive purposes only and are not to be construed as indicating or implying relative importance.
  • an element When an element is referred to as being “on” another element, it can be directly positioned on the other element; intervening elements may also be present, and the element may be positioned directly on the other element. And the middle part is placed on another part.
  • one element When one element is described as being “mounted on” or “connected to” another element, it can either be directly “mounted on” or “connected to”, or one element may be indirectly “mounted to” or “connected to” through intervening elements. to” another widget.
  • the display device may be a liquid crystal display device, which includes a stacked display panel and a backlight unit.
  • the display panel is connected to the backlight unit.
  • the backlight unit is used to provide display light for the display panel, and the display panel filters the backlight light according to the control signal to form a specific color display picture.
  • the display device can be any display device with a display function, such as a mobile phone, a notebook computer, a tablet computer, etc.
  • the display panel includes an array substrate, a liquid crystal layer and a color filter substrate 100 that are stacked in sequence.
  • the liquid crystal layer is filled with several liquid crystal molecules.
  • the array substrate is used to control the deflection of liquid crystal molecules in each pixel unit, thereby controlling the transmittance of backlight light to form a display screen.
  • the color filter substrate 100 is used to filter light and colorize the display screen.
  • the color filter substrate 100 has several light-transmitting areas 101 and light-shielding areas 102 surrounding the light-transmitting areas 101. Two adjacent light-transmitting areas 101 are connected by a light-shielding area 102. .
  • the light emitted by the display panel passes through the color filter substrate 100 through the light-transmitting area 101 and is converted into light of a specific color to achieve color display.
  • the color filter substrate 100 includes a black matrix 20 , a first color resist layer 30 , a second color resist layer 40 , spacers 50 and a protective layer 60 .
  • the black matrix 20 is disposed on a substrate layer 10 and corresponds to the light shielding area 102 .
  • the black matrix 20-bit network structure has a plurality of openings 21 , and each light-transmitting area 101 is provided with one opening 21 .
  • the black matrix 20 is made of black light-shielding material, which is used to prevent color mixing of light in adjacent light-transmitting areas 101 and prevent light leakage from the color filter substrate 100 .
  • the first color resist layer 30 fills the opening 21 and covers the surface of the black matrix 20 .
  • the first color resist layer 30 includes a plurality of first color resist blocks 31.
  • the first color resist blocks 31 include a main body part 34 and an extension part 35.
  • the main body part 34 is provided on the substrate layer in the opening 21. 10
  • the extension portion 35 is provided on a surface of the black matrix 20 away from the substrate layer 10 .
  • the thickness of the extension portion 35 is smaller than the thickness of the main body portion 34 , which is beneficial to improving the flatness of the surface of the color filter substrate 100 .
  • the thickness of the main body part 34 is greater than the thickness of the black matrix 20 , so that the surface of the main body part 34 away from the substrate layer 10 is higher than the surface of the black matrix 20 away from the substrate layer 10 , thereby making the surface of the main body part 34 away from the substrate layer 10 higher.
  • the main body part 34 can be connected to the extension part 35 .
  • the thickness of the main body part 34 is less than the sum of the thicknesses of the black matrix 20 and the extension part 35 , thereby increasing the thickness of the color filter substrate 100 in the light shielding area 102 and raising the base of the spacer 50 .
  • the second color resist layer 40 is located in the light shielding area 102 and is disposed on a surface of the first color resist layer 30 away from the black matrix 20.
  • the second color resist layer 40 is on the lining.
  • the orthographic projection on the substrate layer 10 is located within the orthographic projection range of the black matrix 20 on the substrate layer 10 .
  • the orthographic projection of the second color resist layer 40 on the display panel coincides with the orthographic projection of the gate signal line on the display panel, and the orthogonal projection of the second color resist layer 40 is
  • the arrangement direction is also the same as the routing direction of the gate signal lines.
  • the second color resistance layer 40 is also provided with a plurality of second color resistance blocks 41 , and the second color resistance blocks 41 are disposed on the extension portion 35 of the first color resistance block 31 .
  • the black matrix 20 , the extension portion 35 of the first color resistor block 31 and the second color resistor block 41 are stacked in sequence, and the second color resistor block 41
  • the width is less than or equal to the width of the extension portion 35 .
  • the first color resistor block 31 and the second color resistor block 41 both include red color resistor blocks, green color resistor blocks and blue color resistor blocks according to color distinction.
  • color resist blocks of different colors are evenly distributed in the color filter substrate 100 , and the display light passes through the filter of the color resist blocks and emits light of the same color as the color resist blocks, thereby changing the display image. Colorize.
  • the colors of the stacked first color resist block 31 and the second color resist block 41 are different.
  • the red first color resist block 31 is provided with a blue second color resist block 41, green and blue second color resist blocks 41.
  • the first color resist block 31 is provided with a red second color resist block 41 .
  • the principle of color filtering it can be known that the light filtered by the first color resist block 31 cannot pass through the second color resist block 41 with a different color. Therefore, it is possible to set the first color resist block 31 and the second color resist block 41 with different colors.
  • the light-shielding effect of the light-shielding area 102 of the color filter substrate 100 is improved, the dark-state brightness is reduced, and the contrast of the display device is improved.
  • the second color resist layer 40 can further increase the film thickness of the color filter substrate 100 in the light shielding area 102 and further increase the height of the spacer 50 .
  • the material of the second color resistance layer 40 is a color resistance material.
  • the hardness of the color resistance material is better than the hardness of the flat layer (OC) in the prior art, and has more excellent supporting capabilities.
  • the spacer 50 is set On the color resist block made of color resist material, the support ability of the spacer 50 to the panel can be improved, thereby improving the pressure resistance of the display device. It also improves the deformation ability of the spacer 50 and its deformation after being pressed. Resilience.
  • the spacer 50 is also located in the light-shielding area 102 and is disposed on a surface of the second color resist layer 40 away from the first color resist layer 30 .
  • the spacer 50 includes a plurality of main support columns 51 and a plurality of auxiliary support columns 52 .
  • the height of the auxiliary support columns 52 is lower than the height of the main support columns 51 .
  • the main support pillar 51 is used to support the cell thickness of the liquid crystal layer, thereby maintaining a uniform distribution of liquid crystal molecules in the liquid crystal layer.
  • the auxiliary support pillar 52 and the main support pillar 51 jointly maintain the cell thickness of the liquid crystal layer and share the pressure borne by the main support pillar 51 .
  • the protective layer 60 is provided on the first color resist layer 30 and located in the light-transmitting area 101 .
  • the protective layer 60 is used to planarize the surface of the color filter substrate 100 , and at the same time, it can buffer and protect the color filter substrate 100 , and prevent the pigment in the first color resist layer 30 from contaminating the internal components of the display device after precipitation.
  • Both the protective layer 60 and the spacer 50 are made of transparent photo-curing materials, thereby preventing the spacer 50 and the protective layer 60 from affecting the light transmittance of the color filter substrate 100, and also solving the problem of using heat in the prior art.
  • the problem of poor flatness of the flat layer of the cured material improves the flatness of the surface of the color filter substrate 100 .
  • the sum H1 of the thickness of the protective layer 60 and the main body portion 34 of the first color resist block 31 is less than Or equal to the sum H2 of the thicknesses of the black matrix 20 , the extension 35 of the first color resist block 31 and the second color resist block 41 (that is, the film thickness of the color filter substrate 100 in the light shielding area 102 ) , and a surface of the protective layer 60 away from the first color resistance layer 30 (ie, the upper surface of the protective layer 60 ) and a surface of the second color resistance layer 40 away from the first color resistance layer 30
  • the vertical distance H3 between the surfaces is less than 0.6 microns.
  • the vertical distance H3 between the upper surface of the protective layer 60 and the upper surface of the second color resist layer 40 is less than or equal to 0.3 microns.
  • the embodiment of the present invention also provides a method for preparing a display panel, which is used to prepare the display panel as described in Embodiment 1 of the present invention.
  • the preparation method of the display panel includes performing steps S11-S12.
  • Step S11 Preparing the color filter substrate 100, as shown in Figure 3, which includes implementing steps S111-S114.
  • Step S111) Prepare the black matrix 20: set a plurality of light-transmitting areas 101 and a light-shielding area 102 surrounding each light-transmitting area 101 on a substrate layer 10.
  • a layer of black light-shielding material is coated on one surface of the substrate layer 10 and cured.
  • the black light-shielding material layer is patterned, and an opening 21 penetrating the black light-shielding material layer is opened in each light-transmitting area 101 to form the black matrix 20 .
  • Step S112) Preparing the first color resist layer 30: forming a number of first colors filling the openings 21 and covering the black matrix 20 on a surface of the black matrix 20 away from the substrate layer 10 through a color resist process.
  • Block 31 the first color resist block 31 can be divided into red color resist block, green color resist block and blue color resist block according to color.
  • Step S113) Prepare the second color resist layer 40: again use a color resist process to form a plurality of second color resists located in the light shielding area 102 on a surface of the first color resist layer 30 away from the black matrix 20 Block 41.
  • the color of the second color resist block 41 is different from the color of the adjacent first color resist block 31 (that is, the first color resist block 31 stacked in contact with the second color resist block 41), for example, as described
  • the second color resist block 41 formed on the red color resist block in the first color resist layer 30 is blue.
  • the green color resist block and the blue color resist block in the first color resist layer 30 are formed on the second color resist block 41 .
  • the two-color resistor block 41 is red.
  • the mask used when preparing the second color resist layer 40 is different from the mask used when preparing the first color resist layer 30 , and the through holes of the mask used to prepare the first color resist layer 30 correspond to the above-mentioned
  • the light-transmitting area 101 of the substrate layer 10 and the overlap of the color resist block and the gate signal line in the second color resist layer 40 on the display panel are the masks used to prepare the second color resist layer 40
  • the through holes correspond to the light-shielding area 102 of the substrate layer 10 .
  • Step S114) Prepare the spacer 50 and the protective layer 60: form a layer of transparent photocurable material on a surface of the first color resist layer 30 and the second color resist layer 40 away from the black matrix 20,
  • the photocurable material layer is patterned through a halftone exposure process, and a plurality of main support pillars 51 and auxiliary support pillars 52 are formed on the second color resist layer 40 in the light shielding area 102 and on the transparent
  • a protective layer 60 is formed on the first color resist layer 30 in the light area 101 .
  • the half-tone mask used in the half-tone exposure process has a first light-transmitting hole, a second light-transmitting hole and a third light-transmitting hole.
  • the first light-transmitting hole and the second light-transmitting hole correspond to the black matrix 20
  • the third light-transmitting hole corresponds to the opening 21 in the black matrix 20 .
  • the first light-transmitting hole is used to form the pattern of the main support column 51
  • the second light-transmitting hole is used to form the pattern of the auxiliary support column 52
  • the third light-transmitting hole is used to form the pattern of the auxiliary support column 52.
  • the pattern of the protective layer 60 is described.
  • the light transmittance of the first light-transmitting hole is smaller than the light transmittance of the second light-transmitting hole and the third light-transmitting hole, thereby promoting the movement of the main support column 51 formed by the first light-transmitting hole.
  • the height is greater than the height of the auxiliary support column 52 formed through the second light-transmitting hole, causing a step difference between the main support column 51 and the auxiliary support column 52 .
  • the light transmittance of the second light-transmitting hole is equal to the light transmittance of the third light-transmitting hole, so that the height of the auxiliary support pillar 52 formed by the second light-transmitting hole is equal to the height of the auxiliary support pillar 52 formed by the third light-transmitting hole.
  • the protective layer 60 has the same thickness.
  • Step S12) Form a liquid crystal layer on an array substrate.
  • the color filter substrate 100 and the array substrate are aligned, and the color filter substrate 100 is fixed on the side of the liquid crystal layer away from the array substrate.
  • Embodiments of the present invention provide a display panel and a display device.
  • a second color resist layer with a color different from the first color resist layer in the light shielding area of the color filter substrate By adding a second color resist layer with a color different from the first color resist layer in the light shielding area of the color filter substrate, the light shielding effect of the color filter substrate is improved. At the same time, it reduces the dark state brightness and improves the contrast of the display device.
  • the second color resist layer can also improve the pressure resistance of the display device and the deformation and recovery capabilities of the spacer according to its material characteristics.
  • the flat layer made of thermosetting materials in the prior art is replaced with a protective layer made of the same material as the spacer, which improves the surface flatness of the color filter substrate and can be combined with the spacer.
  • Integrated molding of materials eliminates the thermal curing process in the existing technology, reduces the preparation process, saves material costs and equipment costs, and improves the production capacity and efficiency of the production line.
  • the embodiment of the present invention provides a method for preparing a display panel, which is used to prepare the display panel as described in Embodiment 1 of the present invention.
  • the preparation method of the display panel includes performing steps S21-S22.
  • Step S21 Prepare a color filter substrate, as shown in Figure 4, which includes implementing steps S211-S213.
  • Step S211) Prepare a black matrix: set several light-transmitting areas and light-shielding areas surrounding each transparent area on a substrate layer. A layer of black light-shielding material is coated on one surface of the substrate layer and cured. The black light-shielding material layer is patterned, and an opening penetrating the black light-shielding material layer is opened in each light-transmitting area to form the black matrix.
  • Step S212 Prepare the first color resistance layer and the second color resistance layer:
  • the opening 21 in the black matrix 20 is divided into a first opening 211 , a second opening 212 and a third opening 213 .
  • the first opening 211 is located in the first opening area 201
  • the second opening 211 is located in the first opening area 201 .
  • the opening 212 is provided in the second opening area 202
  • the third opening 213 is located in the third opening area 203 .
  • the first opening 211 in the first opening area 201 will be used to fill the red color resist block
  • the second opening 212 in the second opening area 202 will be used to fill the blue color resist block.
  • the third opening 213 in the third opening area 203 will be used to fill the green color resist block.
  • a surface of the black matrix 20 away from the substrate layer 10 is covered with a third color resist material, and the third color resist material layer is patterned through a third mask provided with an eighth light-transmitting hole.
  • the eighth light-transmitting hole coincides with the orthographic projection of the third opening area 203 on the substrate layer 10 , so that as shown in FIG. 6 , a plurality of holes corresponding to the third opening area 203 are formed in the third opening area 203 .
  • the fifth color resist block 33 corresponds to the eight light-transmitting holes.
  • the fifth color resist block 33 is a green color resist block in the first color resist layer 30 , which fills the third opening 213 and covers the black matrix 20 in the third opening area 203 .
  • a surface of the black matrix 20 away from the substrate layer 10 is covered with a second color resist material, and the second color resist material layer is patterned through a second mask provided with a sixth light-transmitting hole.
  • the sixth light-transmitting hole coincides with the orthographic projection of the second opening area 202 on the substrate layer 10, so that as shown in FIG.
  • the third color resist block 32 corresponds to the six light-transmitting holes.
  • the third color resist block 32 is a blue color resist block in the first color resist layer 30 , which fills the second opening 212 and covers the black matrix 20 in the second opening area 202 .
  • a surface of the black matrix 20 away from the substrate layer 10 , the third color resist block 32 and the fifth color resist block 33 are covered with a first color resist material, and a fourth light-transmitting layer is passed through a surface.
  • the first mask of the hole and the fifth light-transmitting hole patterns the first color resist material layer.
  • the fourth light-transmitting hole coincides with the orthographic projection of the first opening area 201 on the substrate layer 10
  • the fifth light-transmitting hole coincides with the second opening area 202 and the third opening area 203
  • the orthographic projections on the substrate layer 10 overlap, so as shown in FIG. 8 , a plurality of first color resist blocks 31 corresponding to the fourth light-transmitting holes are formed in the first opening area 201.
  • a plurality of second color resist blocks 41 corresponding to the fifth light-transmitting holes are formed in the second opening area 202 and the third opening area 203.
  • the first color resist block 31 is a red color resist block in the first color resist layer 30 , which fills the first opening 211 and covers the black matrix 20 in the first opening area 201 .
  • the second color resistor block 41 is a red color resistor block in the second color resistor layer 40 and is located on the second color resistor block 41 and the third color resistor block 32 .
  • the orthographic projection of the second color resist block 41 on the substrate layer 10 is located on the black matrix 20 between two adjacent second openings 212; in the In the third opening area 203 , the orthographic projection of the second color resist block 41 on the substrate layer 10 is located on the black matrix 20 between two adjacent third openings 213 .
  • the seventh light-transmitting hole coincides with the orthographic projection of the first opening area 201 on the substrate layer 10 , so that as shown in FIG. 9 , a plurality of holes corresponding to the first opening area 201 are formed in the first opening area 201 .
  • the fourth color resist block 42 corresponds to the seven light-transmitting holes.
  • the fourth color resist block 42 is a blue color resist block in the second color resist layer 40, which is located on the first color resist block 31, and its orthographic projection on the substrate layer 10 is located opposite to the first color resist block 31. on the black matrix 20 between the two first openings 211 .
  • Step S213) Prepare spacers and protective layers: form a layer of transparent photocurable material on a surface of the first color resist layer and the second color resist layer away from the black matrix, and pass halftone ( halftone) exposure process to pattern the photocurable material layer, forming several main support pillars and auxiliary support pillars on the second color resist layer in the light-shielding area and the first color resist layer in the light-transmitting area A protective layer is formed on it.
  • Step S22) Form a liquid crystal layer on an array substrate.
  • the color filter substrate and the array substrate are aligned, and the color filter substrate is fixed on the side of the liquid crystal layer away from the array substrate.
  • the first color resist block and the second color resist block of the same color are formed simultaneously through the same mask in the same process.
  • Part of the color resistance blocks in the second color resistance layer can be prepared at the same time, and only four color resistance processes can be used to complete the preparation of the first color resistance layer and the second color resistance layer.
  • the display panel preparation method provided in further reduces the preparation steps and further improves the production capacity and efficiency of the production line.
  • the embodiment of the present invention provides a method for preparing a display panel
  • An embodiment of the present invention provides a method for preparing a display panel, which is used to prepare a display panel.
  • the difference between the display panel prepared in the embodiment of the present invention and the display panel provided in Embodiment 1 is that the red color resist block in the second color resist layer is located between the first color resist layer and the black matrix.
  • the structure of the display panel prepared in the embodiment of the present invention is similar to the display panel provided in Embodiment 1, and therefore will not be described in detail here.
  • the preparation method of the display panel includes performing steps S31-S32.
  • Step S31 Prepare a color filter substrate, as shown in Figure 10, which includes implementing steps S311-S313.
  • Step S311) Prepare a black matrix: set several light-transmitting areas and light-shielding areas surrounding each transparent area on a substrate layer. A layer of black light-shielding material is coated on one surface of the substrate layer and cured. The black light-shielding material layer is patterned, and an opening penetrating the black light-shielding material layer is opened in each light-transmitting area to form the black matrix.
  • Step S312) Prepare the first color resistance layer and the second color resistance layer:
  • the opening 21 in the black matrix 20 is divided into a first opening 211 , a second opening 212 and a third opening 213 .
  • the first opening 211 is located in the first opening area 201
  • the second opening 211 is located in the first opening area 201 .
  • the opening 212 is provided in the second opening area 202
  • the third opening 213 is located in the third opening area 203 .
  • the first opening 211 in the first opening area 201 will be used to fill the red color resist block
  • the second opening 212 in the second opening area 202 will be used to fill the blue color resist block.
  • the third opening 213 in the third opening area 203 will be used to fill the green color resist block.
  • the fourth light-transmitting hole coincides with the orthographic projection of the first opening area 201 on the substrate layer 10
  • the fifth light-transmitting hole coincides with the second opening area 202 and the third opening area 203
  • the orthographic projections on the substrate layer 10 overlap, so as shown in FIG. 12 , a plurality of first color resist blocks 31 corresponding to the fourth light-transmitting holes are formed in the first opening area 201.
  • a plurality of second color resist blocks 41 corresponding to the fifth light-transmitting holes are formed in the second opening area 202 and the third opening area 203.
  • the first color resist block 31 is a red color resist block in the first color resist layer 30 , which fills the first opening 211 and covers the black matrix 20 in the first opening area 201 .
  • the second color resist block 41 is a red color resist block in the second color resist layer 40 and is located on the black matrix 20 between two adjacent second openings 212 and two adjacent third openings 213 .
  • a plurality of third color resist blocks 32 corresponding to the sixth light-transmitting holes are formed in the second opening area 202, and a plurality of third color resist blocks 32 corresponding to the sixth light-transmitting holes are formed in the first opening area 201.
  • the third color resist block 32 is a blue color resist block in the first color resist layer 30 , which fills the second opening 212 and covers the second color resist block 41 in the second opening area 202 .
  • the fourth color resist block 42 is a blue color resist block in the second color resist layer 40, which is located on the first color resist block 31, and its orthographic projection on the substrate layer 10 is located opposite to the first color resist block 31. on the black matrix 20 between the two first openings 211 .
  • a surface of the black matrix 20 away from the substrate layer 10 and the second color resist block 41 in the third opening area 203 are covered with a third color resist material, and passed through a block provided with an eighth light-transmitting hole.
  • the third mask patterns the third color resist material layer.
  • the eighth light-transmitting hole coincides with the orthographic projection of the third opening area 203 on the substrate layer 10 , so that as shown in FIG. 14 , the eighth light-transmitting hole is formed in the third opening area 203 .
  • the fifth color resist block 33 corresponds to the light-transmitting hole.
  • the fifth color resist block 33 is a green color resist block in the first color resist layer 30 , which fills the third opening 213 and covers the second color resist block 41 in the third opening area 203 .
  • Step S313) Prepare spacers and protective layers: form a layer of transparent photocurable material on a surface of the first color resist layer and the second color resist layer away from the black matrix, and pass halftone ( halftone) exposure process to pattern the photocurable material layer, form a protective layer on the first color resist layer in the light-transmitting area, and form a number of main support pillars and auxiliary support pillars in the light-shielding area.
  • the main support pillar and the auxiliary support pillar are located on the second color resistance layer; in the second opening area and the third opening area, the main support pillar The pillar and the auxiliary support pillar are located on the first color resistance layer, and the main support pillar and the auxiliary support pillar coincide with the orthographic projection of the second color resistance layer on the substrate layer.
  • Step S32) Form a liquid crystal layer on an array substrate.
  • the color filter substrate and the array substrate are aligned, and the color filter substrate is fixed on the side of the liquid crystal layer away from the array substrate.
  • the display panel preparation method provided in the embodiment of the present invention is the optimal embodiment.
  • the first color resist block, the second color resist block and the third color resist block of the same color are simultaneously formed in the same process through the same mask.
  • the color resist block and the fourth color resist block can prepare part of the color resist blocks in the second color resist layer while preparing the first color resist layer, so that the first color resist can be completed through only three color resist processes.
  • the preparation steps in the embodiment of the present invention are fewer, and the production capacity and efficiency of the production line are further improved.
  • the color matching between the stacked color resist blocks is not limited.
  • the color matching between the color resist blocks can be readjusted according to production needs. For example, a green color resist is provided on a red color resist block. blocks, setting blue color resist blocks on green color resist blocks, and other different matching methods.
  • the preparation sequence between color resist blocks of different colors is adjusted according to the color matching between the color resist blocks.
  • the layers of the color filter substrate and the display panel The structure and preparation method are similar to those provided in Examples 1-3 of the present invention, so they will not be described in detail here. Based on the embodiments in this application, all other embodiments obtained by those of ordinary skill in the art without creative efforts fall within the scope of protection of this application.

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Abstract

一种显示面板及其制备方法、显示装置。显示面板包括彩膜基板(100)，彩膜基板(100)包括衬底层(10)、黑色矩阵(20)、第一色阻层(30)、第二色阻层(40)以及隔垫物(50)。第一色阻层(20)填充黑色矩阵(20)中的开口(21)，并覆盖黑色矩阵(20)。第二色阻层(40)设于第一色阻层(30)上，并对应于黑色矩阵(20)。隔垫物(50)设于第二色阻层(40)上，并且隔垫物(50)在衬底层(10)上的投影位于黑色矩阵(20)在衬底层(10)上的投影范围内。通过增设第二色阻层(40)从而提升显示装置的抗压能力以及隔垫物(50)的形变能力和恢复能力，并且还能在提高彩膜基板(100)的遮光效果的同时降低暗态亮度，提升显示装置的对比度。

Description

显示面板及其制备方法、显示装置 技术领域
本发明涉及显示设备领域，特别是一种显示面板及其制备方法、显示装置。
 背景技术
水平电场显示模式（FFS/IPS）驱动的TFT-LCD（薄膜晶体管-液晶）显示器中，其CF（Color Filter，彩膜基板）制作流程一般为BM（黑色矩阵）→RGB（色阻）→OC（平坦层）→PS（隔垫物），以上工艺流程为现有主流设计流程，其存在以下几个问题点：
1、在CF正常的制程工艺上需增加一道OC制程，增加了设备成本以及材料成本；
2、OC作为PS的基底层，相对硬度较低，在PS受压缩时基底OC同时被压缩，导致产品抗压能力不足；并且，由于OC膜层柔软的特性，同时也限制了PS材料高弹性的特性，使得高弹性的PS材料的形变能力难以发挥到极致；
3、OC材料本身平坦性能一般，仅能做到约60%-70%的平坦性，想要实现更高的平坦效果需要增加OC层的厚度，或者引入高平坦性的OC材料，进一步增加了成本。
 技术问题
本发明的目的是提供一种显示面板及其制备方法、显示装置，以解决现有彩膜基板中制备成本高、生产效率低、产品表面平坦度低以及抗压能力不足等技术问题。
 技术解决方案
为实现上述目的，本发明提供一种显示面板，所述显示面板包括彩膜基板，所述彩膜基板包括衬底层、黑色矩阵、第一色阻层、第二色阻层以及隔垫物。所述黑色矩阵设于所述衬底层上，并且所述黑色矩阵设有开口。所述第一色阻层填充所述开口，并覆盖所述黑色矩阵。所述第二色阻层设于所述第一色阻层上，并对应于所述黑色矩阵。所述隔垫物设于所述第二色阻层远离所述第一色阻层的一表面上，并且所述隔垫物在所述衬底层上的投影位于所述黑色矩阵在所述衬底层上的投影范围内。
进一步地，所述彩膜基板还包括保护层，所述保护层设于所述第一色阻层远离所述黑色矩阵的一表面上，并对应于所述开口。
进一步地，所述保护层远离所述第一色阻层的一表面与所述第二色阻层远离所述第一色阻层的一表面之间的垂直距离小于0.6微米。
进一步地，所述保护层与所述隔垫物的材料相同。
进一步地，所述第一色阻层和所述第二色阻层中均设有若干色阻块，叠层设置的两个所述色阻块之间的颜色不同。
进一步地，所述第一色阻层中的色阻块包括主体部和延伸部。所述主体部位于所述开口中。所述延伸部设于所述黑色矩阵上，并位于相邻两个所述主体部之间。所述延伸部的厚度和所述黑色矩阵的厚度均小于所述主体部的厚度。所述主体部的厚度小于所述黑色矩阵与所述延伸部的厚度之和。
进一步地，所述隔垫物包括主支撑柱和副支撑柱，所述副支撑柱的高度小于所述主支撑柱的高度。
进一步地，所述显示面板中还包括阵列基板，所述彩膜基板与所述阵列基板相对设置。
本发明中还提供一种显示面板的制备方法，所述显示面板的制备方法包括以下步骤：提供衬底层；制备黑色矩阵于所述衬底层上，并在所述黑色矩阵中形成开口；在所述黑色矩阵上形成填充所述开口并覆盖所述黑色矩阵的第一色阻层；在所述第一色阻层上形成对应于所述黑色矩阵的第二色阻层；在所述第二色阻层与所述黑色矩阵对应的位置处形成隔垫物。
进一步地，在所述第二色阻层上形成所述隔垫物的同时，在所述第一色阻层上形成对应于所述开口的保护层。
进一步地，所述在所述第二色阻层上形成所述隔垫物的同时，在所述第一色阻层上形成对应于所述开口的保护层的步骤包括以下步骤：在所述第一色阻层和所述第二色阻层上形成一层透明的光固化材料层；提供一半色调掩模版，所述半色调掩模版上设有第一透光孔、第二透光孔以及第三透光孔，所述第一透光孔和所述第二透光孔对应于所述黑色矩阵，所述第三透光孔对应于所述开口，并且所述第一透光孔的透光率小于所述第二透光孔和所述第三透光孔的透光率；通过所述半色调掩模版将所述光固化材料层图案化，并在所述光固化材料层对应于所述第一透光孔处形成主支撑柱，在对应于所述第二透光孔处形成副支撑柱，在对应于所述第三透光孔处形成所述保护层。
进一步地，所述第二透光孔的透光率等于所述第三透光孔的透光率。
进一步地，所述黑色矩阵包括第一开口区、第二开口区和第三开口区，所述第一开口区内设有第一开口、所述第二开口区内设有第二开口，所述第三开口区内设有第三开口。所述在所述黑色矩阵上形成填充所述开口并覆盖所述黑色矩阵的第一色阻层的步骤包括：在所述黑色矩阵上覆盖第一色阻材料；提供第一掩模版，所述第一掩模版上设有第四透光孔和第五透光孔，所述第四透光孔与所述第一开口区在所述衬底层上的投影重叠，所述第五透光孔对应于所述第二开口区和第三开口区设置；通过所述第一掩模版对所述第一色阻材料进行图案化，以在所述第一开口区内形成第一色阻块，在与所述第五透光孔对应的位置处形成第二色阻块，所述第二色阻块位于相邻的两个所述第二开口之间的所述黑色矩阵上，并位于相邻的两个所述第三开口之间的所述黑色矩阵上。
进一步地，所述在所述第一色阻层上形成对应于所述黑色矩阵的第二色阻层的步骤包括：在所述第一色阻层上覆盖第二色阻材料；提供第二掩模版，所述第二掩模版上设有第六透光孔和第七透光孔，所述第六透光孔与所述第二开口区在所述衬底层上的投影重叠，所述第七透光孔对应于所述第一开口区设置；通过所述第二掩模版对所述第二色阻材料进行图案化，以在所述第二开口区内形成第三色阻块，在与所述第七透光孔对应的位置处形成第四色阻块，其中，所述第四色阻块在所述衬底层上的投影位于相邻的两个所述第一开口之间的所述黑色矩阵上，所述第三色阻块覆盖所述第二开口区内的所述第二色阻块。
本发明还提供一种显示装置，所述显示装置包括如上所述的显示面板和背光单元，所述显示面板与所述背光单元连接。
 有益效果
本发明的优点是：本发明中的一种显示面板及其制备方法、显示装置，其彩膜基板通过第二色阻层的材料特性从而提升显示装置的抗压能力以及隔垫物的形变能力和恢复能力。同时，通过所述第二色阻层还能在提高彩膜基板的遮光效果的同时降低暗态亮度，提升显示装置的对比度。
 附图说明
为了更清楚地说明本发明实施例中的技术方案，下面将对实施例描述中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本发明的一些实施例，对于本领域技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1为本发明实施例1中彩膜基板的层状结构示意图；
图2为本发明实施例1中彩膜基板的层状结构示意图；
图3为本发明实施例1中彩膜基板制备方法的流程示意图；
图4为本发明实施例2中彩膜基板制备方法的流程示意图；
图5为本发明实施例2步骤S212中黑色矩阵的分区示意图；
图6为本发明实施例2步骤S212中形成第五色阻块后彩膜基板的层状结构示意图；
图7为本发明实施例2步骤S212中形成第三色阻块后彩膜基板的层状结构示意图；
图8为本发明实施例2步骤S212中形成第一色阻块和第二色阻块后彩膜基板的层状结构示意图；
图9为本发明实施例2步骤S212中形成第四色阻块后彩膜基板的层状结构示意图；
图10为本发明实施例3中彩膜基板制备方法的流程示意图；
图11为本发明实施例3步骤S312中黑色矩阵的分区示意图；
图12为本发明实施例3步骤S312中形成第一色阻块和第二色阻块后彩膜基板的层状结构示意图；
图13为本发明实施例3步骤S312中形成第三色阻块和第四色阻块后彩膜基板的层状结构示意图；
图14为本发明实施例3步骤S312中形成第五色阻块后彩膜基板的层状结构示意图。
图中部件表示如下：
彩膜基板100；透光区101；
遮光区102；衬底层10；
黑色矩阵20；开口21；
第一色阻层30；第一色阻块31；
第三色阻块32；第五色阻块33；
主体部34；延伸部35；
第二色阻层40；第二色阻块41；
第四色阻块42；
隔垫物50；主支撑柱51；
副支撑柱52；保护层60；
第一开口区201；第一开口211；
第二开口区202；第二开口212；
第三开口区203；第三开口213。
 本发明的实施方式
以下参考说明书附图介绍本发明的优选实施例，证明本发明可以实施，所述发明实施例可以向本领域中的技术人员完整介绍本发明，使其技术内容更加清楚和便于理解。本发明可以通过许多不同形式的发明实施例来得以体现，本发明的保护范围并非仅限于文中提到的实施例。
在附图中，结构相同的部件以相同数字标号表示，各处结构或功能相似的组件以相似数字标号表示。附图所示的每一部件的尺寸和厚度是任意示出的，本发明并没有限定每个组件的尺寸和厚度。为了使图示更清晰，附图中有些地方适当夸大了部件的厚度。
此外，以下各发明实施例的说明是参考附加的图示，用以例示本发明可用以实施的特定发明实施例。本发明中所提到的方向用语，例如，“上”、“下”、“前”、“后”、“左”、“右”、“内”、“外”、“侧面”等，仅是参考附加图式的方向，因此，使用的方向用语是为了更好、更清楚地说明及理解本发明，而不是指示或暗指所指的装置或元件必须具有特定的方位、以特定的方位构造和操作，因此不能理解为对本发明的限制。此外，术语“第一”、“第二”、“第三”等仅用于描述目的，而不能理解为指示或暗示相对重要性。
当某些部件被描述为“在”另一部件“上”时，所述部件可以直接置于所述另一部件上；也可以存在一中间部件，所述部件置于所述中间部件上，且所述中间部件置于另一部件上。当一个部件被描述为“安装至”或“连接至”另一部件时，二者可以理解为直接“安装”或“连接”，或者一个部件通过一中间部件间接“安装至”、或“连接至”另一个部件。
实施例1
本发明实施例中提供了一种显示装置，所述显示装置可以为液晶显示装置，其包括叠层设置的显示面板及背光单元，所述显示面板与所述背光单元连接。其中，所述背光单元用于为所述显示面板提供显示光线，所述显示面板根据控制信号过滤背光光线从而形成特定的彩色显示画面。所述显示装置可以为任何带有显示功能的显示器件，例如手机、笔记本电脑、平板电脑等。
所述显示面板中包括依次叠层的阵列基板、液晶层和彩膜基板100。所述液晶层中填充有若干液晶分子。所述阵列基板用于控制每一像素单元中液晶分子的偏转，进而控制背光光线的透光率，形成显示画面。所述彩膜基板100用于过滤光线并将显示画面彩色化。
如图1-图2所示，所述彩膜基板100具有若干透光区101以及包围所述透光区101的遮光区102，相邻两个透光区101之间通过一遮光区102连接。显示面板所发出的光线通过所述透光区101穿过所述彩膜基板100，并转换为特定颜色的光线，实现彩色显示。
所述彩膜基板100中包括黑色矩阵20、第一色阻层30、第二色阻层40、隔垫物50以及保护层60。
所述黑色矩阵20设于一衬底层10上，并对应于所述遮光区102。所述黑色矩阵20位网状结构，其具有若干开口21，每一透光区101中都设有一所述开口21。所述黑色矩阵20通过黑色遮光材料制备而成，其用于防止相邻透光区101中的光线发生混色，并防止所述彩膜基板100出现漏光现象。
所述第一色阻层30填充所述开口21并覆盖所述黑色矩阵20的表面。所述第一色阻层30中包括若干第一色阻块31，所述第一色阻块31包括主体部34以及延伸部35，所述主体部34设于所述开口21中的衬底层10上，所述延伸部35设于所述黑色矩阵20远离所述衬底层10的一表面上。其中，所述延伸部35的厚度小于所述主体部34的厚度，有利于提高所述彩膜基板100表面的平坦度。所述主体部34的厚度大于所述黑色矩阵20的厚度，从而使所述主体部34远离所述衬底层10的表面高于所述黑色矩阵20远离所述衬底层10的表面，进而使所述主体部34能与所述延伸部35连接。同时，所述主体部34的厚度小于所述黑色矩阵20与所述延伸部35的厚度之和，从而增加所述遮光区102中彩膜基板100的厚度，将隔垫物50的基底垫高。
所述第二色阻层40位于所述遮光区102中，并设于所述第一色阻层30远离所述黑色矩阵20的一表面上，所述第二色阻层40在所述衬底层10上的正投影位于所述黑色矩阵20在所述衬底层10的正投影范围内。同时，为节约色阻材料，所述第二色阻层40在显示面板上的正投影与栅极信号线在所述显示面板的中的正投影重合，且所述第二色阻层40的排布方向也与所述栅极信号线的走线方向相同。所述第二色阻层40中也设有若干第二色阻块41，所述第二色阻块41设于所述第一色阻块31的延伸部35上。如图1-图2所示，所述黑色矩阵20、所述第一色阻块31的延伸部35和所述第二色阻块41依次叠层设置，并且所述第二色阻块41的宽度小于或者等于所述延伸部35的宽度。
具体的，所述第一色阻块31和所述第二色阻块41根据颜色区分均包括红色色阻块、绿色色阻块以及蓝色色阻块。在所述第一色阻层30中，不同颜色的色阻块均匀分布在所述彩膜基板100中，显示光线通过色阻块的过滤出射与色阻块相同颜色的光线，从而将显示画面彩色化。
叠层设置的第一色阻块31和第二色阻块41之间的颜色不同，例如红色的第一色阻块31上设有蓝色的第二色阻块41、绿色和蓝色的第一色阻块31上设有红色的第二色阻块41。根据滤色原理可知：经过第一色阻块31过滤后的光线无法穿过与其颜色不同的第二色阻块41，进而设置颜色不同的第一色阻块31和第二色阻块41可以提高所述彩膜基板100遮光区102的遮光效果，降低暗态亮度，提升显示装置的对比度。
同时，所述第二色阻层40还能进一步增加遮光区102中彩膜基板100的膜厚，进一步垫高所述隔垫物50的高度。并且，第二色阻层40的材料为色阻材料，所述色阻材料的有硬度优于现有技术中平坦层（OC）的硬度，具有更加优异的支撑能力，将隔垫物50设置在色阻材料制成的色阻块上，能够提高隔垫物50对面板的支撑能力，进而提升显示装置的抗压能力，同时也提升了隔垫物50的形变能力以及被按压后的形变恢复能力。
所述隔垫物50也位于所述遮光区102中，并设于所述第二色阻层40远离所述第一色阻层30的一表面上。所述隔垫物50包括若干主支撑柱51和若干副支撑柱52，所述副支撑柱52的高度低于所述主支撑柱51的高度。其中，所述主支撑柱51用于支撑所述液晶层的盒厚，从而维持液晶层中液晶分子的均匀分布。当显示装置受到压力时，面板向内微微变形，此时副支撑柱52便会与主支撑柱51共同维持所述液晶层的盒厚，分担主支撑柱51所承受的压力。
所述保护层60设于所述第一色阻层30上，并位于所述透光区101中。所述保护层60用于将所述彩膜基板100的表面平坦化，同时还能缓冲保护所述彩膜基板100，并防止第一色阻层30中的颜料析出后污染显示装置的内部器件。所述保护层60与所述隔垫物50都采用透明的光固化材料，从而防止隔垫物50和保护层60影响彩膜基板100的透光率，并且还解决了现有技术中采用热固化材料的平坦层平坦性能不佳的问题，提高了彩膜基板100表面的平坦度。
具体的，如图2所示，所述保护层60与所述第一色阻块31的主体部34的厚度之和H1（即所述透光区101中彩膜基板100的膜厚）小于或等于所述黑色矩阵20、所述第一色阻块31的延伸部35和所述第二色阻块41的厚度之和H2（即所述遮光区102中彩膜基板100的膜厚），并且所述保护层60远离所述第一色阻层30的一表面（即所述保护层60的上表面）与所述第二色阻层40远离所述第一色阻层30的一表面（即所述第二色阻层40的上表面）之间的垂直距离H3小于0.6微米。优选地，所述保护层60上表面与所述第二色阻层40上表面之间垂直距离H3小于或等于0.3微米。
本发明实施例中还提供了一种显示面板的制备方法，用以制备如本发明实施例1中所述的显示面板。所述显示面板的制备方法中包括实施步骤S11-S12。
步骤S11）制备彩膜基板100，如图3所示，其包括实施步骤S111-S114。
步骤S111）制备黑色矩阵20：在一衬底层10上设定若干透光区101以及围绕每一透光区101的遮光区102。在所述衬底层10的一表面上涂布一层黑色遮光材料，并将其固化。将所述黑色遮光材料层图案化，在每一个透光区101中开设一贯穿所述黑色遮光材料层的开口21，形成所述黑色矩阵20。
步骤S112）制备第一色阻层30：通过彩色色阻制程在所述黑色矩阵20远离所述衬底层10的一表面上形成若干填充所述开口21并覆盖所述黑色矩阵20的第一色阻块31。其中，所述第一色阻块31根据颜色可区分为红色色阻块、绿色色阻块和蓝色色阻块。
步骤S113）制备第二色阻层40：再次通过彩色色阻制程在所述第一色阻层30远离所述黑色矩阵20的一表面上形成若干位于所述遮光区102中的第二色阻块41。其中，所述第二色阻块41的颜色与相邻的第一色阻块31（即与该第二色阻块41叠层接触的第一色阻块31）的颜色不同，例如所述第一色阻层30中的红色色阻块上所形成的第二色阻块41为蓝色、所述第一色阻层30中的绿色色阻块和蓝色色阻块上所形成的第二色阻块41则为红色。
并且，制备第二色阻层40时所使用的掩模版与制备第一色阻层30时所使用的掩模版不同，制备第一色阻层30所使用的掩模版的通孔对应于所述衬底层10的透光区101以及所述第二色阻层40中色阻块与栅极信号线在所述显示面板上正投影的重合处，制备第二色阻层40所使用的掩模版的通孔则对应于所述衬底层10的遮光区102。
步骤S114）制备隔垫物50和保护层60：在所述第一色阻层30和所述第二色阻层40远离所述黑色矩阵20的一表面上形成一层透明的光固化材料，并通过半色调（halftone）曝光工艺将所述光固化材料层图案化，在所述遮光区102中的第二色阻层40上形成若干主支撑柱51和副支撑柱52以及在所述透光区101中的第一色阻层30上形成保护层60。
具体的，所述半色调曝光工艺中所使用的半色调掩模版上具有第一透光孔、第二透光孔以及第三透光孔。所述第一透光孔和所述第二透光孔对应于所述黑色矩阵20，所述第三透光孔对应于所述黑色矩阵20中的开口21。所述第一透光孔用于形成所述主支撑柱51的图案，所述第二透光孔用于形成所述副支撑柱52的图案，所述第三透光孔则用于形成所述保护层60的图案。其中，所述第一透光孔的透光率小于所述第二透光孔和所述第三透光孔的透光率，从而促使通过第一透光孔所形成的主支撑柱51的高度大于通过第二透光孔的所形成的副支撑柱52的高度，使所述主支撑柱51与所述副支撑柱52之间产生段差。所述第二透光孔的透光率等于所述第三透光孔的透光率，从而促使通过第二透光孔所形成的副支撑柱52的高度与通过第三透光孔所形成的保护层60的厚度相等。
步骤S12）在一阵列基板上形成液晶层。将所述彩膜基板100与所述阵列基板进行对盒操作，并将所述彩膜基板100固定在所述液晶层远离所述阵列基板的一侧。
本发明实施例中提供了一种显示面板及显示装置，通过在彩膜基板的遮光区中增添一层颜色与第一色阻层不同的第二色阻层，在提高彩膜基板的遮光效果的同时降低暗态亮度，提升显示装置的对比度。并且，所述第二色阻层还能根据其材料特性提升显示装置抗压能力以及隔垫物的形变能力和恢复能力。
同时，在本发明实施例中还将现有技术中采用热固化材料制备而成的平坦层替换为与隔垫物相同材质的保护层，在提升彩膜基板表面平坦度的同时能够与隔垫物一体化成形，省去了现有技术中的热固化制程，减少了制备流程，并节省了材料成本以及设备成本，提升了生产线的产能以及效率。
实施例2
本发明实施例中提供了一种显示面板的制备方法，用以制备如本发明实施例1中所述的显示面板。所述显示面板的制备方法中包括实施步骤S21-S22。
步骤S21）制备彩膜基板，如图4所示，其包括实施步骤S211-S213。
步骤S211）制备黑色矩阵：在一衬底层上设定若干透光区以及围绕每一透关区的遮光区。在所述衬底层的一表面上涂布一层黑色遮光材料，并将其固化。将所述黑色遮光材料层图案化，在每一个透光区中开设一贯穿所述黑色遮光材料层的开口，形成所述黑色矩阵。
步骤S212）制备第一色阻层和第二色阻层：
如图5所示，所述黑色矩阵20中的开口21分为第一开口211、第二开口212以及第三开口213，所述第一开口211位于第一开口区201中，所述第二开口212设于第二开口区202中，所述第三开口213位于所述第三开口区203中。其中，所述第一开口区201中的第一开口211中将用于填充红色色阻块，所述第二开口区202中的第二开口212中将用于填充蓝色色阻块，所述第三开口区203中的第三开口213将用于填充绿色色阻块。
在所述黑色矩阵20远离所述衬底层10的一表面上覆盖第三色阻材料，并通过一块设有第八透光孔的第三掩模版将所述第三色阻材料层图案化。所述第八透光孔与所述第三开口区203在所述衬底层10上的正投影重合，从而如图6中所示，在所述第三开口区203中形成若干与所述第八透光孔对应的第五色阻块33。所述第五色阻块33为第一色阻层30中的绿色色阻块，其填充了所述第三开口213并覆盖了所述第三开口区203中的黑色矩阵20。
在所述黑色矩阵20远离所述衬底层10的一表面上覆盖第二色阻材料，并通过一块设有第六透光孔的第二掩模版将所述第二色阻材料层图案化。所述第六透光孔与所述第二开口区202在所述衬底层10上的正投影重合，从而如图7中所示，在所述第二开口区202中形成若干与所述第六透光孔对应的第三色阻块32。所述第三色阻块32为第一色阻层30中的蓝色色阻块，其填充了所述第二开口212并覆盖了所述第二开口区202中的黑色矩阵20。
在所述黑色矩阵20远离所述衬底层10的一表面、所述第三色阻块32以及所述第五色阻块33上覆盖第一色阻材料，并通过一块带有第四透光孔和第五透光孔的第一掩模版将所述第一色阻材料层图案化。所述第四透光孔与所述第一开口区201在所述衬底层10上的正投影重合，所述第五透光孔与所述第二开口区202和所述第三开口区203在所述衬底层10上的正投影重合，从而如图8中所示，在所述第一开口区201中形成若干与所述第四透光孔对应的第一色阻块31，在所述第二开口区202和所述第三开口区203中形成若干与所述第五透光孔对应的第二色阻块41。所述第一色阻块31为所述第一色阻层30中的红色色阻块，其填充了所述第一开口211并覆盖了所述第一开口区201中的黑色矩阵20。所述第二色阻块41为所述第二色阻层40中的红色色阻块，其位于所述第二色阻块41和所述第三色阻块32上。同时，在所述第二开口区202中，所述第二色阻块41在所述衬底层10上的正投影位于相邻两个第二开口212之间的黑色矩阵20上；在所述第三开口区203中，所述第二色阻块41在所述衬底层10上的正投影位于相邻两个第三开口213之间的黑色矩阵20上。
在所述第一色阻块31远离所述黑色矩阵20的一表面上覆盖第三色阻材料，并通过一块带有第七透光孔的第四掩模版将该层第三色阻材料层图案化。所述第七透光孔与所述第一开口区201在所述衬底层10上的正投影重合，从而如图9中所示，在所述第一开口区201中形成若干与所述第七透光孔对应的第四色阻块42。所述第四色阻块42为所述第二色阻层40中的蓝色色阻块，其位于所述第一色阻块31上，同时其在所述衬底层10上的正投影位于相邻两个第一开口211之间的黑色矩阵20上。
步骤S213）制备隔垫物和保护层：在所述第一色阻层和所述第二色阻层远离所述黑色矩阵的一表面上形成一层透明的光固化材料，并通过半色调（halftone）曝光工艺将所述光固化材料层图案化，在所述遮光区中的第二色阻层上形成若干主支撑柱和副支撑柱以及在所述透光区中的第一色阻层上形成保护层。
步骤S22）在一阵列基板上形成液晶层。将所述彩膜基板与所述阵列基板进行对盒操作，并将所述彩膜基板固定在所述液晶层远离所述阵列基板的一侧。
在本发明实施例中所提供的显示面板制备方法中，通过同一块掩模版在同一道制程中同时形成了同一种颜色的第一色阻块和第二色阻块，在制备第一色阻层的同时能够制备所述第二色阻层中的部分色阻块，仅使用了4道色阻制程便可完成第一色阻层和第二色阻层的制备，相较于实施例1中所提供的显示面板的制备方法，进一步缩减了制备步骤，也进一步提高了生产线的产能以及效率。
实施例3
本发明实施例中提供了一种显示面板的制备方法，
本发明实施例中提供了一种显示面板的制备方法，用以制备一种显示面板。本发明实施例中所制备的显示面板与实施例1中所提供的显示面板的区别在于：第二色阻层中的红色色阻块位于第一色阻层与黑色矩阵之间。
除上述区别内容以外，本发明实施例中所制备的显示面板的结构与实施例1中所提供的显示面板相似，因此不在此做过多赘述。
具体的，所述显示面板的制备方法中包括实施步骤S31-S32。
步骤S31）制备彩膜基板，如图10所示，其包括实施步骤S311-S313。
步骤S311）制备黑色矩阵：在一衬底层上设定若干透光区以及围绕每一透关区的遮光区。在所述衬底层的一表面上涂布一层黑色遮光材料，并将其固化。将所述黑色遮光材料层图案化，在每一个透光区中开设一贯穿所述黑色遮光材料层的开口，形成所述黑色矩阵。
步骤S312）制备第一色阻层和第二色阻层：
如图11所示，所述黑色矩阵20中的开口21分为第一开口211、第二开口212以及第三开口213，所述第一开口211位于第一开口区201中，所述第二开口212设于第二开口区202中，所述第三开口213位于所述第三开口区203中。其中，所述第一开口区201中的第一开口211中将用于填充红色色阻块，所述第二开口区202中的第二开口212中将用于填充蓝色色阻块，所述第三开口区203中的第三开口213将用于填充绿色色阻块。
在所述黑色矩阵20远离所述衬底层10的一表面上覆盖第一色阻材料，并通过一块带有第四透光孔和第五透光孔的第一掩模版将所述第一色阻材料层图案化。所述第四透光孔与所述第一开口区201在所述衬底层10上的正投影重合，所述第五透光孔与所述第二开口区202和所述第三开口区203在所述衬底层10上的正投影重合，从而如图12中所示，在所述第一开口区201中形成若干与所述第四透光孔对应的第一色阻块31，在所述第二开口区202和所述第三开口区203中形成若干与所述第五透光孔对应的第二色阻块41。所述第一色阻块31为所述第一色阻层30中的红色色阻块，其填充了所述第一开口211并覆盖了所述第一开口区201中的黑色矩阵20。所述第二色阻块41为所述第二色阻层40中的红色色阻块，其位于相邻两个第二开口212和相邻两个第三开口213之间的黑色矩阵20上。
在所述黑色矩阵20远离所述衬底层10的一表面、所述第一色阻块31以及所述第二开口区202中的第二色阻块41上覆盖第二色阻材料，并通过一块设有第六透光孔和第七透光孔的第二掩模版将所述第二色阻材料层图案化。所述第六透光孔与所述第二开口区202在所述衬底层10上的正投影重合，所述第七透光孔与所述第一开口区201在所述衬底层10上的正投影重合，从而如图13中所示，在所述第二开口区202中形成若干与所述第六透光孔对应的第三色阻块32，在所述第一开口区201中形成若干与所述第七透光孔对应的第四色阻块42。所述第三色阻块32为第一色阻层30中的蓝色色阻块，其填充了所述第二开口212并覆盖了所述第二开口区202中的第二色阻块41。所述第四色阻块42为所述第二色阻层40中的蓝色色阻块，其位于所述第一色阻块31上，同时其在所述衬底层10上的正投影位于相邻两个第一开口211之间的黑色矩阵20上。
在所述黑色矩阵20远离所述衬底层10的一表面和所述第三开口区203中的第二色阻块41上覆盖第三色阻材料，并通过一块设有第八透光孔的第三掩模版将所述第三色阻材料层图案化。所述第八透光孔与所述第三开口区203在所述衬底层10上的正投影重合，从而如图14中所示，在所述第三开口区203中形成与所述第八透光孔对应的第五色阻块33。所述第五色阻块33为第一色阻层30中的绿色色阻块，其填充了所述第三开口213并覆盖了所述第三开口区203中的第二色阻块41。
步骤S313）制备隔垫物和保护层：在所述第一色阻层和所述第二色阻层远离所述黑色矩阵的一表面上形成一层透明的光固化材料，并通过半色调（halftone）曝光工艺将所述光固化材料层图案化，在所述透光区中的第一色阻层上形成保护层以及在所述遮光区中形成若干主支撑柱和副支撑柱。在所述第一开口区中，所述主支撑柱和所述副支撑柱位于所述第二色阻层上；在所述第二开口区和所述第三开口区中，所述主支撑柱和所述副支撑柱位于所述第一色阻层上，并且所述主支撑柱和所述副支撑柱与所述第二色阻层在衬底层上的正投影重合。
步骤S32）在一阵列基板上形成液晶层。将所述彩膜基板与所述阵列基板进行对盒操作，并将所述彩膜基板固定在所述液晶层远离所述阵列基板的一侧。
在本发明实施例中所提供的显示面板制备方法为最优实施例，通过同一块掩模版在同一道制程中同时形成了同一种颜色的第一色阻块和第二色阻块以及第三色阻块和第四色阻块，在制备第一色阻层的同时能够制备所述第二色阻层中的部分色阻块，从而仅通过3道色阻制程便可完成第一色阻层和第二色阻层的制备，相较于实施例2中所提供的显示面板的制备方法，本发明实施例中的制备步骤更少，也进一步提高了生产线的产能以及效率。
在本发明的其他实施例中并不限定层叠设置的色阻块之间的颜色搭配，其可根据生产需求重新调整色阻块之间的颜色搭配，例如在红色色阻块上设置绿色色阻块、在绿色色阻块上设置蓝色色阻块等不同的搭配方法，同时根据色阻块之间的颜色搭配调整不同颜色色阻块之间的制备顺序，但彩膜基板和显示面板的层状结构以及制备方法与本发明实施例1-3中所提供的内容相似，因此不在此做过多赘述。基于本申请中的实施例，本领域普通技术人员在没有做出创造性劳动的前提下所获得的所有其它实施例，都属于本申请保护的范围。
虽然在本文中参照了特定的实施方式来描述本发明，但是应该理解的是，这些实施例仅仅是本发明的原理和应用的示例。因此应该理解的是，可以对示例性的实施例进行许多修改，并且可以设计出其他的布置，只要不偏离所附权利要求所限定的本发明的精神和范围。应该理解的是，可以通过不同于原始权利要求所描述的方式来结合不同的从属权利要求和本文中所述的特征。还可以理解的是，结合单独实施例所描述的特征可以使用在其他所述实施例中。

Claims (20)

  1. 一种显示面板，其包括彩膜基板，所述彩膜基板包括：
    衬底层；
    黑色矩阵，设于所述衬底层上，所述黑色矩阵设有开口；
    第一色阻层，填充所述开口，并覆盖所述黑色矩阵；以及
    第二色阻层，设于所述第一色阻层上，并对应于所述黑色矩阵；
    隔垫物，设于所述第二色阻层远离所述第一色阻层的一表面上，并且所述隔垫物在所述衬底层上的投影位于所述黑色矩阵在所述衬底层上的投影范围内。
  2. 如权利要求1所述的显示面板，其中，所述彩膜基板还包括：
    保护层，设于所述第一色阻层远离所述黑色矩阵的一表面上，并对应于所述开口。
  3. 如权利要求2所述的显示面板，其中，所述保护层远离所述第一色阻层的一表面与所述第二色阻层远离所述第一色阻层的一表面之间的垂直距离小于0.6微米。
  4. 如权利要求2所述的显示面板，其中，所述保护层与所述隔垫物的材料相同。
  5. 如权利要求1所述的显示面板，其中，所述第一色阻层和所述第二色阻层中均设有若干色阻块，叠层设置的两个所述色阻块之间的颜色不同。
  6. 如权利要求5所述的显示面板，其中，所述第一色阻层中的色阻块包括：
    主体部，位于所述开口中；
    延伸部，设于所述黑色矩阵上，并位于相邻两个所述主体部之间；
    所述延伸部的厚度和所述黑色矩阵的厚度均小于所述主体部的厚度；
    所述主体部的厚度小于所述黑色矩阵与所述延伸部的厚度之和。
  7. 如权利要求1所述的显示面板，其中，所述隔垫物包括主支撑柱和副支撑柱，所述副支撑柱的高度小于所述主支撑柱的高度。
  8. 一种显示面板的制备方法，其包括以下步骤：
    提供衬底层；
    制备黑色矩阵于所述衬底层上，并在所述黑色矩阵中形成开口；
    在所述黑色矩阵上形成填充所述开口并覆盖所述黑色矩阵的第一色阻层；
    在所述第一色阻层上形成对应于所述黑色矩阵的第二色阻层；
    在所述第二色阻层与所述黑色矩阵对应的位置处形成隔垫物。
  9. 如权利要求8所述的显示面板的制备方法，其中，在所述第二色阻层上形成所述隔垫物的同时，在所述第一色阻层上形成对应于所述开口的保护层。
  10. 如权利要求9中所述的显示面板的制备方法，其中，所述在所述第二色阻层上形成所述隔垫物的同时，在所述第一色阻层上形成对应于所述开口的保护层的步骤包括以下步骤：
    在所述第一色阻层和所述第二色阻层上形成一层透明的光固化材料层；
    提供一半色调掩模版，所述半色调掩模版上设有第一透光孔、第二透光孔以及第三透光孔，所述第一透光孔和所述第二透光孔对应于所述黑色矩阵，所述第三透光孔对应于所述开口，并且所述第一透光孔的透光率小于所述第二透光孔和所述第三透光孔的透光率；
    通过所述半色调掩模版将所述光固化材料层图案化，并在所述光固化材料层对应于所述第一透光孔处形成主支撑柱，在对应于所述第二透光孔处形成副支撑柱，在对应于所述第三透光孔处形成所述保护层。
  11. 如权利要求10所述的显示面板的制备方法，其中，所述第二透光孔的透光率等于所述第三透光孔的透光率。
  12. 如权利要求8所述的显示面板的制备方法，其中，所述黑色矩阵包括第一开口区、第二开口区和第三开口区，所述第一开口区内设有第一开口、所述第二开口区内设有第二开口，所述第三开口区内设有第三开口，所述在所述黑色矩阵上形成填充所述开口并覆盖所述黑色矩阵的第一色阻层的步骤包括：
    在所述黑色矩阵上覆盖第一色阻材料；
    提供第一掩模版，所述第一掩模版上设有第四透光孔和第五透光孔，所述第四透光孔与所述第一开口区在所述衬底层上的投影重叠，所述第五透光孔对应于所述第二开口区和第三开口区设置；
    通过所述第一掩模版对所述第一色阻材料进行图案化，以在所述第一开口区内形成第一色阻块，在与所述第五透光孔对应的位置处形成第二色阻块，所述第二色阻块位于相邻的两个所述第二开口之间的所述黑色矩阵上，并位于相邻的两个所述第三开口之间的所述黑色矩阵上。
  13. 如权利要求12所述的显示面板的制备方法，其中，所述在所述第一色阻层上形成对应于所述黑色矩阵的第二色阻层的步骤包括：
    在所述第一色阻层上覆盖第二色阻材料；
    提供第二掩模版，所述第二掩模版上设有第六透光孔和第七透光孔，所述第六透光孔与所述第二开口区在所述衬底层上的投影重叠，所述第七透光孔对应于所述第一开口区设置；
    通过所述第二掩模版对所述第二色阻材料进行图案化，以在所述第二开口区内形成第三色阻块，在与所述第七透光孔对应的位置处形成第四色阻块，其中，所述第四色阻块在所述衬底层上的投影位于相邻的两个所述第一开口之间的所述黑色矩阵上，所述第三色阻块覆盖所述第二开口区内的所述第二色阻块。
  14. 一种显示装置，其中包括如权利要求1中所述的显示面板和背光单元，所述显示面板与所述背光单元连接；
    所述显示面板包括彩膜基板，所述彩膜基板包括：
    衬底层；
    黑色矩阵，设于所述衬底层上，所述黑色矩阵设有开口；
    第一色阻层，填充所述开口，并覆盖所述黑色矩阵；以及
    第二色阻层，设于所述第一色阻层上，并对应于所述黑色矩阵；
    隔垫物，设于所述第二色阻层远离所述第一色阻层的一表面上，并且所述隔垫物在所述衬底层上的投影位于所述黑色矩阵在所述衬底层上的投影范围内。
  15. 如权利要求14所述的显示装置，其中，所述彩膜基板还包括：
    保护层，设于所述第一色阻层远离所述黑色矩阵的一表面上，并对应于所述开口。
  16. 如权利要求15所述的显示装置，其中，所述保护层远离所述第一色阻层的一表面与所述第二色阻层远离所述第一色阻层的一表面之间的垂直距离小于0.6微米。
  17. 如权利要求15所述的显示装置，其中，所述保护层与所述隔垫物的材料相同。
  18. 如权利要求14所述的显示装置，其中，所述第一色阻层和所述第二色阻层中均设有若干色阻块，叠层设置的两个所述色阻块之间的颜色不同。
  19. 如权利要求18所述的显示装置，其中，所述第一色阻层中的色阻块包括：
    主体部，位于所述开口中；
    延伸部，设于所述黑色矩阵上，并位于相邻两个所述主体部之间；
    所述延伸部的厚度和所述黑色矩阵的厚度均小于所述主体部的厚度；
    所述主体部的厚度小于所述黑色矩阵与所述延伸部的厚度之和。
  20. 如权利要求14所述的显示装置，其中，所述隔垫物包括主支撑柱和副支撑柱，所述副支撑柱的高度小于所述主支撑柱的高度。
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