WO2023171226A1 - 撥水ガラス - Google Patents
撥水ガラス Download PDFInfo
- Publication number
- WO2023171226A1 WO2023171226A1 PCT/JP2023/004427 JP2023004427W WO2023171226A1 WO 2023171226 A1 WO2023171226 A1 WO 2023171226A1 JP 2023004427 W JP2023004427 W JP 2023004427W WO 2023171226 A1 WO2023171226 A1 WO 2023171226A1
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- WO
- WIPO (PCT)
- Prior art keywords
- water
- glass
- glass substrate
- repellent
- region
- Prior art date
Links
- 239000011521 glass Substances 0.000 title claims abstract description 192
- 239000005871 repellent Substances 0.000 title claims abstract description 120
- 239000002245 particle Substances 0.000 claims abstract description 7
- 239000000758 substrate Substances 0.000 claims description 106
- 239000011737 fluorine Substances 0.000 claims description 16
- 229910052731 fluorine Inorganic materials 0.000 claims description 16
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 13
- 230000007423 decrease Effects 0.000 claims description 6
- 238000011156 evaluation Methods 0.000 description 38
- 239000007789 gas Substances 0.000 description 27
- 238000000034 method Methods 0.000 description 22
- 238000005299 abrasion Methods 0.000 description 11
- 238000012545 processing Methods 0.000 description 10
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 8
- 238000005530 etching Methods 0.000 description 8
- 238000005259 measurement Methods 0.000 description 8
- 238000004140 cleaning Methods 0.000 description 7
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 6
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 6
- 239000000919 ceramic Substances 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- 238000002834 transmittance Methods 0.000 description 5
- 229910052786 argon Inorganic materials 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000005361 soda-lime glass Substances 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000003599 detergent Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000004744 fabric Substances 0.000 description 3
- 239000005357 flat glass Substances 0.000 description 3
- 150000002222 fluorine compounds Chemical class 0.000 description 3
- 238000001020 plasma etching Methods 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- 239000006018 Li-aluminosilicate Substances 0.000 description 2
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000005354 aluminosilicate glass Substances 0.000 description 2
- 239000005385 borate glass Substances 0.000 description 2
- 239000005388 borosilicate glass Substances 0.000 description 2
- 239000012159 carrier gas Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- -1 silane compound Chemical class 0.000 description 2
- 239000005368 silicate glass Substances 0.000 description 2
- HUAUNKAZQWMVFY-UHFFFAOYSA-M sodium;oxocalcium;hydroxide Chemical compound [OH-].[Na+].[Ca]=O HUAUNKAZQWMVFY-UHFFFAOYSA-M 0.000 description 2
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 description 2
- 229910021642 ultra pure water Inorganic materials 0.000 description 2
- 239000012498 ultrapure water Substances 0.000 description 2
- 238000004506 ultrasonic cleaning Methods 0.000 description 2
- 239000011800 void material Substances 0.000 description 2
- 238000012935 Averaging Methods 0.000 description 1
- MXRIRQGCELJRSN-UHFFFAOYSA-N O.O.O.[Al] Chemical compound O.O.O.[Al] MXRIRQGCELJRSN-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 230000002940 repellent Effects 0.000 description 1
- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B17/00—Layered products essentially comprising sheet glass, or glass, slag, or like fibres
- B32B17/06—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
Definitions
- the present invention relates to water-repellent glass.
- water-repellent glass can be manufactured by forming a base film having irregularities on the surface of a glass substrate, and further forming a water-repellent film on the base film.
- Patent Document 1 discloses that a member formed by forming an amorphous alumina film containing voids on a glass substrate can be applied as a base structure of a water-repellent member.
- Conventional water-repellent glass has the problem of being susceptible to abrasion and scratches. For example, with conventional water-repellent glass, after continued use for a certain period of time, it is often observed that the water-repellent film disappears as the underlying film falls off. Therefore, water-repellent glass with better abrasion resistance is desired.
- the present invention was made in view of this background, and an object of the present invention is to provide water-repellent glass that has significantly higher abrasion resistance than conventional glass.
- the water-repellent glass comprises: a glass substrate having a first surface; a water-repellent film installed on the first surface of the glass substrate; has The first surface of the glass substrate has a feature region in which a part of the glass substrate is aggregated in the form of particles, and the feature region has particulate features that integrally extend from the glass substrate.
- the dimension of the characteristic region in the first direction is in the range of 50 nm to 2000 nm
- the straight line LA is a line that is connected to a plurality of particulate features included in the feature region. has an intersection that intersects with, and the average size of the intersection is in the range of 20 nm to 5000 nm
- a water-repellent glass is provided, wherein at least a portion of the particulate features have a constriction that decreases in size toward the interior of the glass substrate.
- the present invention can provide water-repellent glass that has significantly higher abrasion resistance than conventional glass.
- FIG. 1 is a diagram schematically showing an example of a cross-sectional structure of water-repellent glass according to an embodiment of the present invention.
- FIG. 2 is an enlarged view of a portion A surrounded by a circle in FIG. 1.
- FIG. 3 is a cross-sectional view schematically showing another configuration of the characteristic region of the water-repellent glass according to an embodiment of the present invention.
- FIG. 7 is a cross-sectional view schematically showing still another configuration of the characteristic region of the water-repellent glass according to an embodiment of the present invention.
- 1 is a diagram showing a schematic flow of a method for manufacturing water-repellent glass according to an embodiment of the present invention.
- 3 is a photograph showing an example of the surface morphology of the evaluation area in Sample 1.
- 7 is a photograph showing an example of the surface morphology of the evaluation area in Sample 2.
- 3 is a photograph showing an example of the surface morphology of the evaluation area in Sample 3.
- 3 is a photograph showing an example of the surface morphology of the evaluation area in Sample 4. It is a photograph showing an example of the surface form of the evaluation area in sample 11.
- 3 is a photograph showing an example of the surface morphology of the evaluation region in sample 12.
- 3 is a photograph showing an example of the cross-sectional form of the evaluation region in Sample 1.
- 7 is a photograph showing an example of the cross-sectional form of the evaluation region in Sample 2.
- 3 is a photograph showing an example of the cross-sectional form of the evaluation region in Sample 3.
- 7 is a photograph showing an example of the cross-sectional form of the evaluation region in sample 4.
- 7 is a photograph showing an example of the cross-sectional form of the evaluation region in sample 11.
- 7 is a photograph showing an example of the cross-sectional form of the evaluation region in sample 12. It is a photograph showing an example of the surface form of the evaluation area in sample 21. It is a photograph showing an example of the cross-sectional form of the evaluation region in sample 21.
- the water-repellent glass comprises: a glass substrate having a first surface; a water-repellent film installed on the first surface of the glass substrate; has The first surface of the glass substrate has a feature region in which a part of the glass substrate is aggregated in the form of particles, and the feature region has particulate features that integrally extend from the glass substrate.
- the dimension of the characteristic region in the first direction is in the range of 50 nm to 2000 nm
- the straight line LA is a line that is connected to a plurality of particulate features included in the feature region. has an intersection that intersects with, and the average size of the intersection is in the range of 20 nm to 5000 nm
- a water-repellent glass is provided, wherein at least a portion of the particulate features have a constriction that decreases in size toward the interior of the glass substrate.
- a water-repellent glass according to an embodiment of the present invention has a water-repellent film on the first surface of a glass substrate. Therefore, the water-repellent glass according to an embodiment of the present invention can exhibit water repellency.
- the surface of the glass substrate on the water-repellent side that is, the first surface
- the first surface has a characteristic shape.
- the first surface has a feature region in which components contained in the glass substrate are aggregated in the form of "particles", and the feature region includes particulate features that integrally extend from the glass substrate. It has the characteristic of having.
- the “particulate features” formed in the feature region have their root parts integrated with the glass substrate, and therefore It is important to note that this is fixed. More specifically, a “particulate feature” is a part that starts from the glass substrate and protrudes seamlessly from the glass substrate.
- the average size of the "particulate features” ranges from 20 nm to 5000 nm. Note that since “particulate features" are different from general “particles", the average size is determined by the method described below.
- the "particulate features” have a so-called “narrowing part”, which is a part whose diameter decreases toward the inside of the glass substrate.
- the characteristic region of the first surface of the glass substrate has such a characteristic form.
- conventional water-repellent glass has the problem of being susceptible to wear and scratches, such as the water-repellent film disappearing as the base film falls off after a certain amount of use.
- a base layer for forming unevenness is not provided on the glass substrate. That is, the first surface of the glass substrate itself forms a characteristic region, and the water-repellent film is placed on the characteristic region.
- the characteristic region is formed integrally with the glass substrate, so unlike a configuration in which a base film is added separately on the glass substrate, the water-repellent glass exhibits relatively high robustness. Can be done.
- the thickness direction of the glass substrate is referred to as the first direction
- the dimension of the characteristic region along the first direction is referred to as the "thickness of the characteristic region.”
- the first surface may not be provided with a sufficiently effective feature region. Furthermore, if a water-repellent film is placed on such a characteristic region, sufficient water-repellency may not be achieved. On the other hand, if the thickness of the characteristic region exceeds 2000 nm, the robustness of the characteristic region may decrease, and the abrasion resistance of the water-repellent glass may decrease.
- the thickness of the characteristic region is controlled within a range of 50 nm to 2000 nm. Therefore, the water-repellent glass according to an embodiment of the present invention can exhibit sufficient water repellency and can also provide significantly high robustness.
- one embodiment of the present invention can provide water-repellent glass that has significantly higher abrasion resistance than conventional glass.
- FIG. 1 schematically shows an example of a cross-sectional structure of water-repellent glass (hereinafter referred to as "first water-repellent glass”) according to an embodiment of the present invention.
- the first water-repellent glass 100 includes a glass substrate 110 and a water-repellent film 140.
- Glass substrate 110 has a first surface 112, and water-repellent film 140 is placed on the first surface 112 side of glass substrate 110.
- FIG. 2 shows an enlarged schematic diagram of the circled section A in FIG. 1.
- the first surface 112 of the glass substrate 110 has a feature region 120 that includes a number of particulate features 125.
- the particulate features 125 have the form of protrusions that protrude outward from the glass substrate 110.
- the particulate features 125 are seamlessly connected to the glass substrate 110, that is, they are integrated with the glass substrate 110. In other words, in the glass substrate 110, a portion of the first surface 112 protrudes to form particulate features 125.
- a space where the glass substrate 110 does not exist that is, a void 130 is formed between adjacent particulate features 125.
- At least a portion of the particulate features 125 have a substantially mushroom-shaped cross section, rather than a simple cylindrical or conical cross section. That is, some particulate features 125 have a portion whose diameter becomes narrower toward the depth direction of the glass substrate 110 (Z direction in FIG. 2), that is, a narrow portion 129.
- all particulate features 125 have a mushroom-shaped cross-section and therefore have a constriction 129.
- the particulate features 125 have an average size ranging from 20 nm to 5000 nm. Note that the average size of the particulate features 125 is determined by the following method.
- a straight line LA is drawn in a 1 ⁇ m ⁇ 1 ⁇ m section of the characteristic region 120.
- particulate features 125 that intersect with the straight line LA are determined and these are selected as selected features. Further, in each selected feature, the length of the portion (line segment) that intersects with the straight line LA is determined. The lengths of the line segments obtained for each selected feature are averaged to determine the average size of the particulate feature 125.
- the average size of the particulate features 125 thus obtained is preferably in the range of 20 nm to 1000 nm, more preferably in the range of 20 nm to 500 nm.
- the water-repellent film 140 is arranged to cover at least the tips of the particulate features 125 in the feature region 120. For example, in the example shown in FIG. It is installed to cover areas that do not exist.
- 3 and 4 show another configuration of the feature region 120 of the water-repellent glass according to an embodiment of the present invention.
- the water-repellent glass feature region 120 has the same arrangement of particulate features 125 as in FIG. 3. However, the water-repellent film 140 is also filled in the narrowed portion 129 of the particulate feature 125 and even in the void 130 .
- the characteristic region 120 of the water-repellent glass may have various forms. However, it should be noted that in both configurations, the thickness of the feature region ranges from 50 nm to 2000 nm, and the average size of the particulate features ranges from 20 nm to 5000 nm.
- each member included in the water-repellent glass according to an embodiment of the present invention will be explained in more detail.
- the characteristics of each member will be explained using the first water-repellent glass 100 having the configuration shown in FIGS. 1 and 2 as an example of the water-repellent glass according to an embodiment of the present invention. . Therefore, when representing each member, the reference numerals used in FIGS. 1 and 2 will be used.
- the composition of the glass substrate 110 is not particularly limited.
- the glass substrate 110 may be, for example, soda lime glass, soda lime silicate glass, aluminosilicate glass, borate glass, lithium aluminosilicate glass, quartz glass, borosilicate glass, or alkali-free glass.
- the shape and dimensions of the glass substrate 110 are not particularly limited.
- the glass substrate 110 may have a flat plate shape, a curved shape, or the like. Further, the glass substrate 110 may have various sizes, from large dimensions such as a building window glass to small dimensions such as a camera lens member.
- Water repellent film 140 The type of water-repellent film 140 is not particularly limited as long as water repellency can be obtained.
- water repellency means a property in which the contact angle ⁇ of water droplets is 90° or more.
- the water-repellent film 140 may be made of, for example, a fluorine-containing silane compound.
- the thickness of the water-repellent film 140 is, for example, in the range of 0.5 nm to 50 nm.
- the thickness of the water-repellent film 140 is the thickness excluding the water-repellent film portion that fills the voids 130 of the feature region 120
- the thickness of the water-repellent film 140 is the thickness excluding the water-repellent film portion that fills the voids 130 of the feature region 120. It is determined by averaging the thickness of the water-repellent film 140 installed at the top.
- the contact angle ⁇ of water droplets on the water-repellent film 140 side is, for example, 120° or more.
- the contact angle ⁇ is preferably 125° or more, more preferably 130° or more, and even more preferably 135° or more.
- the fluorine concentration on the first surface 112 of the glass substrate 110 is F 1 (at%)
- the bulk fluorine concentration of the glass substrate 110 is F 2 (at%).
- (F 1 -F 2 ) may be 3 at% or more.
- the refractive index can be significantly lowered. Moreover, this makes it possible to provide water-repellent glass having an antireflection function.
- the first water-repellent glass 100 is manufactured through a gas etching process using a fluorine-containing compound, as described below. Therefore, in one embodiment of the present invention, water-repellent glass in which (F 1 -F 2 ) is 3 at% or more can be obtained relatively easily.
- the water-repellent glass according to an embodiment of the present invention can be applied to a wide range of uses, such as window glass for buildings, glass members for vehicles, camera parts, and sensor parts.
- FIG. 5 shows a schematic flow of a method for manufacturing water-repellent glass (hereinafter referred to as the "first method") according to an embodiment of the present invention.
- the first method is (1) A step of preparing a glass substrate having a surface to be treated (step S110); (2) a step of etching the surface to be treated of the glass substrate using a processing gas containing fluorine or a fluorine compound (step S120); (3) a step of installing a water-repellent film on the surface to be treated (step S130) and has.
- Step S110 First, a glass substrate having a surface to be treated is prepared.
- the composition of the glass substrate is not particularly limited.
- the glass substrate may be, for example, soda lime glass, soda lime silicate glass, aluminosilicate glass, borate glass, lithium aluminosilicate glass, quartz glass, borosilicate glass, or alkali-free glass.
- the surface to be treated of the glass substrate is subjected to a cleaning treatment before the next step (step S120).
- the cleaning process is performed to remove contaminants and/or oil adhering to the surface of the glass substrate to be treated, thereby cleaning the surface to be treated.
- the conditions for the cleaning treatment are not particularly limited as long as the surface to be treated is cleaned.
- the cleaning treatment may be performed, for example, in the order of (i) ultrasonic cleaning with a solution containing an alkaline detergent, (ii) ultrasonic cleaning with ultrapure water, and (iii) ozone cleaning.
- an alkaline detergent sodium hydroxide or the like may be used.
- the surface to be treated of the glass substrate does not necessarily have to be the entire surface (for example, the first surface) of the glass substrate, and may be a part of the first surface.
- subsequent step S120 may be performed after masking the portion of the glass substrate excluding the surface to be treated.
- Step S120 Next, the cleaned surface of the glass substrate to be processed is etched using a processing gas.
- the processing gas contains fluorine or a fluorine compound.
- the processing gas may include hydrogen fluoride gas or fluorine gas.
- the processing gas may further include a carrier gas.
- the carrier gas include, but are not limited to, nitrogen and/or argon.
- the concentration of the fluorine compound in the processing gas is, for example, in the range of 0.1 vol% to 10 vol%, preferably in the range of 0.5 vol% to 8 vol%, and preferably in the range of 1 vol% to 5 vol%. More preferred.
- the etching process is usually performed in an atmospheric atmosphere at normal pressure.
- the temperature of the etching process is not particularly limited.
- the treatment temperature is, for example, in the range of 250°C to 650°C, preferably in the range of 275°C to 600°C, and more preferably in the range of 300°C to 600°C.
- the surface of the glass substrate to be processed is etched by exposure to the processing gas.
- a characteristic region having the characteristics described above is formed on the surface to be treated. That is, a feature region is formed having a plurality of particulate features integrated with and extending from the glass substrate.
- Step S130 Next, a water-repellent film is formed on the characteristic region of the glass substrate.
- the type of water-repellent film is not particularly limited as long as it exhibits water-repellency in the characteristic areas of the glass substrate.
- the water-repellent film may be made of, for example, a fluorine-containing silane compound.
- the method for forming the water-repellent film is not particularly limited.
- the water-repellent film may be placed on the characteristic region of the glass substrate by, for example, a vapor deposition method, a coating method (including brushing and spraying), a dipping method, or the like.
- the glass substrate may be subjected to a drying treatment after forming the water-repellent film.
- water-repellent glass having a water-repellent film on the characteristic region of the glass substrate can be manufactured.
- Examples 1 to 4 are examples, and Examples 11 to 12 are comparative examples. Moreover, Example 21 is an example.
- Example 1 Water-repellent glass was produced according to the first method described above.
- a flat soda lime glass measuring 50 mm long x 50 mm wide x 1 mm thick was used as the glass substrate.
- This glass substrate was cleaned using the following steps: (i) First, the glass substrate was ultrasonically cleaned for 15 minutes using an aqueous solution containing PK-LCG23 manufactured by Parker Corporation as an alkaline detergent. (ii) Next, the glass substrate was ultrasonically cleaned for 15 minutes using ultrapure water. Sonically Clean (iii) Finally, the glass substrate is cleaned with ozone for 15 minutes.
- a surface (first surface) measuring 50 mm in length and 50 mm in width of the cleaned glass substrate was etched with a processing gas.
- a mixed gas of nitrogen gas and hydrogen fluoride gas was used as the processing gas.
- the hydrogen fluoride gas concentration in the mixed gas was 3 vol%.
- the flow rate of the processing gas was 70 SLM (Standard Little per Minutes).
- the treatment temperature was 675°C, and the treatment time was 3 seconds.
- a water-repellent film (SurfClear 300; manufactured by Canon Optron Co., Ltd.) was placed on the surface of the glass substrate to be treated by a vapor deposition method.
- the thickness of the water-repellent film was targeted to be 10 nm.
- Example 1 water-repellent glass
- Example 2 to Example 4 Water-repellent glass was produced in the same manner as in Example 1. However, in these Examples 2 to 4, the conditions for etching the glass substrate with hydrogen fluoride gas were changed from those in Example 1. Other conditions are the same as in Example 1.
- Example 2 The water-repellent glasses obtained in Examples 2 to 4 are referred to as “Sample 2" to “Sample 4", respectively.
- Example 11 A water-repellent film was placed on the surface of the glass substrate to be treated in the same manner as in Example 1. However, in this Example 11, the etching process using hydrogen fluoride gas was not performed on the glass substrate. That is, a water-repellent film was placed on the first surface of the glass substrate that had only been cleaned.
- Example 11 The water-repellent glass obtained in Example 11 is referred to as "Sample 11.”
- Example 12 Water-repellent glass was produced in the same manner as in Example 1. However, in this Example 12, the conditions for etching the glass substrate with hydrogen fluoride gas were changed from those in Example 1. Other conditions are the same as in Example 1.
- Example 12 The water-repellent glass obtained in Example 12 is referred to as "Sample 12.”
- Table 1 summarizes the gas etching conditions for each example.
- evaluation area the morphology of the water-repellent film side (hereinafter referred to as “evaluation area”) of each sample was observed.
- FIGS. 6 to 11 show examples of the surface forms of the evaluation regions in samples 1 to 4 and samples 11 to 12, respectively.
- the straight line LA seen in FIGS. 6 to 9 and FIG. 11 is a straight line drawn when determining the average size of particulate features.
- the average size of the particulate features was in the range of 20 nm to 800 nm in all samples.
- FIGS. 12 to 17 show examples of cross-sectional forms of evaluation regions in samples 1 to 4 and samples 11 to 12, respectively.
- the thickness of the characteristic region in each sample was measured from FIGS. 12 to 15 and 17.
- the thickness of the characteristic region was in the range of 100 nm to 1600 nm.
- the thickness of the characteristic region was approximately 45 nm, indicating that a characteristic region of sufficient size was not formed.
- the contact angle ⁇ was 90° or more for all samples, and it was found that all samples had water repellency.
- sample 2 had a contact angle ⁇ of over 155° and exhibited high water repellency.
- Total light transmittance was measured for each sample. The measurement was carried out in accordance with JIS K 7361, and the transmittance of light incident from the water-repellent film side and emitted from the glass substrate side was measured.
- the test was conducted as follows. On the water-repellent side of each sample, a cloth measuring 1 cm x 1 cm is brought into contact with the surface. With a load of 500 g applied to the cloth, the cloth is moved horizontally by cm, and then moved the same distance in the opposite direction. Repeat this 5000 times. Thereafter, the contact angle ⁇ of the sample is measured.
- the contact angle ⁇ after the test is 120° or more and the difference from the contact angle ⁇ before the test is 10° or less, it is determined that the wear resistance is good. Otherwise, the abrasion resistance of the sample is determined to be poor.
- the fluorine concentration (F 1 ) at the first surface was measured for each sample.
- an X-ray photoelectron spectrometer (XPS) PHI Quantera II manufactured by ULVAC-PHI Co., Ltd. was used.
- Example 21 Water-repellent glass was produced by the following method.
- a flat soda lime glass measuring 50 mm long x 50 mm wide x 1 mm thick was used as the glass substrate.
- the glass substrate was used after being cleaned in the same manner as in Example 1 above.
- atmospheric pressure plasma etching treatment was performed on the 50 mm long x 50 mm wide surface (first surface) of the glass substrate as described below.
- a microwave plasma type device equipped with a high frequency power source was used as the plasma device.
- This plasma device has a ceramic tube having electrodes connected to a high frequency power source, and argon (Ar) gas is supplied into the ceramic tube. Further, a raw material gas is supplied around the ceramic tube.
- a microwave voltage of 2.45 GHz is applied to the electrodes from a high frequency power source.
- the argon gas flowing inside the ceramic tube is turned into plasma.
- this plasma decomposes CF 4 contained in the mixed gas at the outlet (plasma head) of the ceramic tube.
- Fluorine radicals (F * ) generated by decomposition of CF4 react with components contained in the glass substrate as shown in the following reaction formula: nAr * +2CF 4 ⁇ 8F * +C 2 * +nAr (1 formula) SiO 2 +4F * ⁇ SiF 4 +O 2 (2 formulas)
- a low melting point compound such as silicon tetrafluoride produced by the reaction is volatilized by heat.
- the first surface of the glass substrate can be etched.
- the distance between the plasma head and the first surface of the glass substrate during the atmospheric pressure plasma etching process was 18 mm.
- the scanning speed of the plasma head was 8 mm/s.
- the temperature of the glass substrate during the treatment was 500°C.
- a water-repellent film (SurfClear 300; manufactured by Canon Optron Co., Ltd.) was placed on the surface of the glass substrate to be treated by vapor deposition.
- the thickness of the water-repellent film was targeted to be 10 nm.
- Example 21 water-repellent glass
- FIG. 18 shows an example of the surface form of the evaluation area in sample 21.
- the straight line LA seen in FIG. 18 is the straight line drawn when determining the average size of the particulate features.
- the average size of the particulate features in Sample 21 was 118 nm.
- FIG. 19 shows an example of the cross-sectional form of the evaluation region in sample 21.
- the thickness of the characteristic region in sample 21 was measured. As a result, the thickness of the characteristic region of sample 21 was 66 nm.
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Abstract
Description
第1の表面を有するガラス基板と、
前記ガラス基板の前記第1の表面に設置された撥水膜と、
を有し、
前記ガラス基板の前記第1の表面は、前記ガラス基板の一部が粒子状に集合した特徴領域を有し、該特徴領域は、前記ガラス基板から一体的に延在する粒子状特徴物を有し、
前記ガラス基板の厚さ方向を第1の方向と称したとき、前記特徴領域の前記第1の方向の寸法は、50nm~2000nmの範囲であり、
前記特徴領域の上面視、前記特徴領域の1μm×1μmの区画において、前記第1の方向と垂直な直線LAを引いたとき、該直線LAは、前記特徴領域に含まれる複数の粒子状特徴物と交差する交差部を有し、該交差部の平均寸法は、20nmから5000nmの範囲であり、
前記粒子状特徴物の少なくとも一部は、前記ガラス基板の内部に向かって寸法が小さくなる狭窄部を有する、撥水ガラスが提供される。
第1の表面を有するガラス基板と、
前記ガラス基板の前記第1の表面に設置された撥水膜と、
を有し、
前記ガラス基板の前記第1の表面は、前記ガラス基板の一部が粒子状に集合した特徴領域を有し、該特徴領域は、前記ガラス基板から一体的に延在する粒子状特徴物を有し、
前記ガラス基板の厚さ方向を第1の方向と称したとき、前記特徴領域の前記第1の方向の寸法は、50nm~2000nmの範囲であり、
前記特徴領域の上面視、前記特徴領域の1μm×1μmの区画において、前記第1の方向と垂直な直線LAを引いたとき、該直線LAは、前記特徴領域に含まれる複数の粒子状特徴物と交差する交差部を有し、該交差部の平均寸法は、20nmから5000nmの範囲であり、
前記粒子状特徴物の少なくとも一部は、前記ガラス基板の内部に向かって寸法が小さくなる狭窄部を有する、撥水ガラスが提供される。
次に、図面を参照して、本発明の一実施形態による撥水ガラスの特徴について、より詳しく説明する。
次に、本発明の一実施形態による撥水ガラスに含まれる各部材について、より詳しく説明する。なお、ここでは、本発明の一実施形態による撥水ガラスとして、前述の図1および図2に示したような構成を有する第1の撥水ガラス100を例に、各部材の特徴について説明する。従って、各部材を表す際には、図1および図2に使用した参照符号を使用する。
ガラス基板110の組成は、特に限られない。ガラス基板110は、例えば、ソーダライムガラス、ソーダライムシリケートガラス、アルミノシリケートガラス、ボレートガラス、リチウムアルミノシリケートガラス、石英ガラス、ホウケイ酸ガラス、または無アルカリガラス等であってもよい。
撥水膜140は、撥水性が得られる限り、その種類は特に限られない。
第1の撥水ガラス100において、撥水膜140の側の水滴の接触角θは、例えば、120゜以上である。接触角θは、125゜以上であることが好ましく、130゜以上であることがより好ましく、135゜以上であることがさらに好ましい。
次に、図5を参照して、本発明の一実施形態による撥水ガラスの製造方法の一例について説明する。
(1)被処理表面を有するガラス基板を準備する工程(工程S110)と、
(2)フッ素またはフッ素化合物を含む処理ガスを用いて、前記ガラス基板の被処理表面をエッチングする工程(工程S120)と、(3)前記被処理表面に、撥水膜を設置する工程(工程S130)と、
を有する。
まず、被処理表面を有するガラス基板が準備される。
次に、ガラス基板の清浄化された被処理表面が処理ガスによりエッチング処理される。
次に、ガラス基板の特徴領域に、撥水膜が形成される。
前述の第1の方法に従って、撥水ガラスを作製した。
(i)まず、アルカリ洗剤として、パーカーコーポレーション社製のPK-LCG23を含む水溶液で、15分間ガラス基板を超音波洗浄する(ii)次に、超純水を用いて、15分間ガラス基板を超音波洗浄する(iii)最後に、15分間ガラス基板をオゾン洗浄する。
例1と同様の方法により、撥水ガラスを作製した。ただし、これらの例2~例4では、フッ化水素ガスによるガラス基板のエッチング条件を、例1の場合とは変化させた。その他の条件は、例1の場合と同様である。
例1と同様の方法により、ガラス基板の被処理表面に撥水膜を設置した。ただし、この例11では、ガラス基板に対して、フッ化水素ガスによるエッチング処理を実施しなかった。すなわち、洗浄のみを実施したガラス基板の第1の表面に、撥水膜を設置した。
例1と同様の方法により、撥水ガラスを作製した。ただし、この例12では、フッ化水素ガスによるガラス基板のエッチング条件を、例1の場合とは変化させた。その他の条件は、例1の場合と同様である。
走査型電子顕微鏡(SEM)を用いて、各サンプルにおける撥水膜の側(以下、「評価領域」と称する)の形態を観察した。
各サンプルにおいて、撥水膜の側に水滴を滴下し、接触角θ測定した。
各サンプルに対して全光線透過率を測定した。測定は、JIS K 7361に準拠して実施し、撥水膜の側から入射され、ガラス基板の側から放射される光の透過率を測定した。
各サンプルに対して耐摩耗性評価試験を実施した。
各サンプルに対して、第1の表面におけるフッ素濃度(F1)を測定した。測定には、X線光電子分光分析装置(XPS)PHI Quantera II(アルバック・ファイ株式会社製)を使用した。
以下の方法により、撥水ガラスを作製した。
nAr*+2CF4 → 8F*+C2 *+nAr (1式)
SiO2+4F* → SiF4+O2 (2式)
反応により生じる四フッ化ケイ素のような低融点化合物は、熱により揮発する。
サンプル21を用いて、前述の評価を実施した。
110 ガラス基板
112 第1の表面
120 特徴領域
125 粒子状特徴物
129 狭窄部
130 空隙
140 撥水膜
Claims (3)
- 撥水ガラスであって、
第1の表面を有するガラス基板と、
前記ガラス基板の前記第1の表面に設置された撥水膜と、
を有し、
前記ガラス基板の前記第1の表面は、前記ガラス基板の一部が粒子状に集合した特徴領域を有し、該特徴領域は、前記ガラス基板から一体的に延在する粒子状特徴物を有し、
前記ガラス基板の厚さ方向を第1の方向と称したとき、前記特徴領域の前記第1の方向の寸法は、50nm~2000nmの範囲であり、
前記特徴領域の上面視、前記特徴領域の1μm×1μmの区画において、前記第1の方向と垂直な直線LAを引いたとき、該直線LAは、前記特徴領域に含まれる複数の粒子状特徴物と交差する交差部を有し、該交差部の平均寸法は、20nmから5000nmの範囲であり、
前記粒子状特徴物の少なくとも一部は、前記ガラス基板の内部に向かって寸法が小さくなる狭窄部を有する、撥水ガラス。 - 前記第1の表面におけるフッ素濃度F1と、前記ガラス基板のバルクのフッ素濃度F2の差(F1-F2)は、3at%以上である、請求項1に記載の撥水ガラス。
- 当該撥水ガラスにおいて、前記撥水膜の側で測定される水滴の接触角は、120゜以上である、請求項1または2に記載の撥水ガラス。
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JPH09202649A (ja) | 1996-01-24 | 1997-08-05 | Central Glass Co Ltd | 花弁状透明アルミナ膜及びその形成法 |
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JP2022038418A (ja) | 2020-08-26 | 2022-03-10 | 東京応化工業株式会社 | ネガ型感光性組成物、積層フィルム及びパターン形成方法 |
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JPH09202649A (ja) | 1996-01-24 | 1997-08-05 | Central Glass Co Ltd | 花弁状透明アルミナ膜及びその形成法 |
JP2011509192A (ja) * | 2007-11-23 | 2011-03-24 | ゾルテッヒ アーゲー | 機能性複合材料 |
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