WO2023155788A1 - 操作装置与两个工件之间的分布式间距补偿方法 - Google Patents

操作装置与两个工件之间的分布式间距补偿方法 Download PDF

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Publication number
WO2023155788A1
WO2023155788A1 PCT/CN2023/076068 CN2023076068W WO2023155788A1 WO 2023155788 A1 WO2023155788 A1 WO 2023155788A1 CN 2023076068 W CN2023076068 W CN 2023076068W WO 2023155788 A1 WO2023155788 A1 WO 2023155788A1
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WIPO (PCT)
Prior art keywords
distance
workpiece
measured
compensation unit
sensors
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PCT/CN2023/076068
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English (en)
French (fr)
Inventor
周向前
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百及纳米科技(上海)有限公司
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Publication of WO2023155788A1 publication Critical patent/WO2023155788A1/zh

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B21/00—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant
    • G01B21/02—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant for measuring length, width, or thickness
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B21/00—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant
    • G01B21/16—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant for measuring distance of clearance between spaced objects
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10—Measuring as part of the manufacturing process
    • H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps

Definitions

  • the present application relates to the technical fields of measurement, control and precision manufacturing, and in particular to a distributed distance compensation method between an operating device and two workpieces.
  • the machining workpiece is used to process the workpiece to be processed, specifically to process the surface of the workpiece to be processed that faces the surface of the workpiece to be processed.
  • the surfaces of the workpiece to be machined and the workpiece to be machined are larger or equal to each other, the relative flatness of the two surfaces is very important.
  • the entire surface of the processed workpiece can be aligned in parallel with the processed workpiece such as a wafer on the work base for measurement, processing, etc. operate.
  • the probe array is used to measure the three-dimensional topography of the wafer surface
  • the probe array is used to expose the photoresist on the wafer surface
  • the nano-imprint template is used to perform nano-imprint processing on the wafer surface.
  • the surface of processed workpieces such as wafers is generally uneven, and there are generally surface undulations on the order of more than ten microns, while the distance between the surface of the processed workpiece and the surface of the processed workpiece is only a few tens of nanometers, which is far smaller than The surface is curved. This will cause some parts of the workpiece to be in contact with the wafer surface during the measurement or processing of the wafer, while some parts still have a large distance from the wafer surface, which will affect the measurement of the wafer surface or processing accuracy, and may even prevent the wafer from being measured or processed.
  • the surface of the workpiece to be processed is firstly flattened to cater to the flat entire surface of the workpiece to be processed.
  • processing workers The surface of the workpiece surface itself is not necessarily very smooth, so simply smoothing the surface of the processed workpiece cannot solve the problem of uneven surface of the processed workpiece.
  • the purpose of this application is to provide a distributed spacing compensation method between the operating device and two workpieces, which can divide the lower surface of the operating workpiece into multiple parts for distributed spacing compensation.
  • the shapes of the two opposite surfaces of the measured workpiece are matched so that the distance between the lower surface of the operating workpiece and the surface to be operated of the measured workpiece remains relatively consistent on the entire surface of the measured workpiece, which is convenient for operating the workpiece to measure or measure the measured workpiece Processing and other operations have improved the measurement and processing accuracy of the workpiece.
  • the present application provides an operating device, including: a control system, at least one distance compensation unit, a first support layer, an operating workpiece, and a plurality of sensors arranged on the operating workpiece and facing the measured workpiece
  • the measured workpiece is fixed on the second support layer, the control system is connected in communication with each of the distance compensation units, and the control system is connected in communication with each of the sensors;
  • the first support layer is connected with the operation
  • the workpiece is fixed together by the distance compensation unit;
  • the second support layer is fixed together with the measured workpiece; each distance compensation unit corresponds to at least one of the sensors, and each distance compensation unit is connected to A part of the operation workpiece overlaps in space, and the sensor corresponding to the distance compensation unit is arranged on the overlapping portion of the operation workpiece and the distance compensation unit; the sensor is used to measure the distance between the operation workpiece and the distance compensation unit.
  • the distance between the corresponding positions on the surface of the workpiece to be operated; the control system is used to control the distance between each of the distance compensation units on the corresponding target part on the workpiece according to the distance measured by each of the sensors.
  • the distance between the measured workpiece and the workpiece is adjusted so that the shapes of the two surfaces of the operating workpiece and the measured workpiece are matched; the target part is that the operating workpiece overlaps with the gap compensation unit part.
  • the present application also provides a distributed distance compensation method between two workpieces, which is applied to the above-mentioned operating device.
  • each distance compensation unit is controlled to adjust the distance between the corresponding target part on the workpiece and the workpiece to be measured. so that the shapes of the two opposing surfaces of the operating workpiece and the measured workpiece match; the target portion is the overlapped portion of the operating workpiece and the gap compensation unit.
  • the present application also provides an operating device, including: a control system, at least one distance compensation unit, a first support layer, and a plurality of sensors, the plurality of sensors are directed toward the workpiece to be measured fixed on the second support layer, so
  • the control system is communicatively connected with each of the distance compensation units, and the control system is communicatively connected with each of the sensors; each distance compensation unit corresponds to at least one of the sensors, and one side of the distance compensation unit is fixed on the On the first support layer, the other side of the distance compensation unit is fixed with the corresponding sensor; the sensor is used to measure the distance between the corresponding distance compensation unit and the corresponding position on the measured workpiece
  • the control system is used to control and adjust the distance between each of the distance compensation units and the measured workpiece according to the distance measured by each of the sensors, so that the surface formed by the plurality of sensors and the The shape of the surface to be operated on the measured workpiece is matched.
  • the present application also provides a distributed distance compensation method between two workpieces, which is applied to the above-mentioned operating device. According to the distance measured by each of the sensors, each of the distance compensation units is controlled to adjust the distance between the distance compensation unit and the workpiece to be measured, so that the The surface formed by the plurality of sensors matches the shape of the surface to be operated of the measured workpiece.
  • the lower surface of the operating workpiece can be divided into multiple parts for distributed distance compensation.
  • the distance between the surfaces to be operated of the measured workpiece remains relatively consistent, which facilitates the operation of the workpiece to measure or process the measured workpiece, and improves the measurement and processing accuracy of the operated workpiece.
  • each of the sensors corresponds to one distance compensation unit; the control system is used to measure The distance between the target part corresponding to each of the distance compensation units and the measured workpiece is obtained; the control system is used to control the distance between the target part and the target part corresponding to each distance compensation unit pair. The distance between the measured workpieces is adjusted, and the adjusted distances between the target parts corresponding to the distance compensation units and the measured workpieces are equal, so that the operating workpiece and the measured workpiece The shapes of the opposing faces match.
  • control system is configured to generate each of the distance compensation units based on the difference between the distance between the target portion corresponding to each of the distance compensation units and the measured workpiece and a reference target distance value.
  • the distance compensation unit corresponds to a control signal for controlling the distance equal to the reference target distance value; the distance compensation unit is used to adjust the distance between the corresponding target part and the measured workpiece according to the received control signal. The distance between is equal to the reference target distance value.
  • control system is configured to select a distance less than the preset target distance when there is a distance between the target portion corresponding to any of the distance compensation units and the workpiece to be measured that is less than a preset target distance value.
  • the first supporting layer is controlled to drive the operating workpiece to move toward the measured workpiece, so that any of the distance compensation units corresponding to the The distance between the target portion and the measured workpiece is smaller than a preset target distance value.
  • a plurality of the distance compensation units are disposed between the operation workpiece and the first support layer, and the plurality of distance compensation units are evenly distributed on the operation workpiece.
  • the operation workpiece is a probe layer
  • the plurality of sensors are a plurality of probes disposed on the probe layer.
  • each distance compensation unit corresponds to the same number of sensors.
  • the distance compensation unit is composed of any one of the following: piezoelectric elements, thermal expansion elements, and plate capacitors.
  • FIG. 1 is a schematic block diagram of an operating device according to a first embodiment of the present application
  • Fig. 2 is a schematic diagram of the operating device before distributed distance compensation according to the first embodiment of the present application, wherein the operating device includes a distance compensation unit;
  • FIG. 3 is a schematic diagram of the operating device after distributed distance compensation according to the first embodiment of the present application, wherein the operating device includes a distance compensation unit;
  • Fig. 4 is a schematic diagram of the operating device before distributed distance compensation according to the first embodiment of the present application, wherein the operating device includes a plurality of distance compensation units;
  • Fig. 5 is a schematic diagram of the operating device after distributed distance compensation according to the first embodiment of the present application Figure, wherein a plurality of spacing compensation units are included in the operating device;
  • FIG. 6 is a partial schematic diagram of a single distance compensation unit, a probe and a first support layer in the operating device according to the first embodiment of the present application;
  • FIG. 7 is a schematic diagram of the operating device according to the first embodiment of the present application, wherein the operating workpiece is a probe layer, and the plurality of sensors are a plurality of probes on the probe layer;
  • Fig. 8 is a top view of the operating device shown in Fig. 7;
  • Fig. 9 is a schematic diagram of the operating device before distributed distance compensation according to the second embodiment of the present application, wherein the operating device includes a distance compensation unit;
  • Fig. 10 is a schematic diagram of the operating device after distributed distance compensation according to the second embodiment of the present application, wherein the operating device includes a distance compensation unit;
  • Fig. 11 is a schematic diagram of the operating device before distributed distance compensation according to the second embodiment of the present application, wherein the operating device includes a plurality of distance compensation units;
  • Fig. 12 is a schematic diagram of the operating device after distributed distance compensation according to the second embodiment of the present application, wherein the operating device includes a plurality of distance compensation units;
  • Fig. 13 is a specific flowchart of a distributed distance compensation method between two workpieces according to the third embodiment of the present application.
  • Fig. 14 is a specific flow chart of a distributed distance compensation method between two workpieces according to the fourth embodiment of the present application.
  • the first embodiment of the present application relates to an operating device, which is used to measure or process samples to be operated.
  • the samples to be operated are, for example, wafers, silicon wafers, and quartz wafers.
  • the three-dimensional topography of the wafer surface is measured, the photoresist on the wafer surface is processed, and the wafer surface is nanoimprinted.
  • the operating device includes: a control system 1, at least one spacing compensation unit 2 (only one is schematically shown in FIG. 1 ), a first support layer 3, an operating workpiece 4, and an operating workpiece 4 A plurality of sensors 6 on and toward the workpiece 5 to be measured; the workpiece 5 to be measured is fixed on the second supporting layer 7 .
  • the workpiece 5 to be measured is the sample to be operated.
  • the control system 1 can be a host computer including a controller, a processor, a notebook computer, etc.
  • the sensor 6 can be a sensor with a ranging function, such as a photon sensor, a laser ranging sensor, an electronic sensor, an ion sensor or an atomic force sensor. sensors etc.
  • the operation workpiece 4 is located directly above the workpiece 5 to be measured as an example for illustration.
  • the control system 1 is communicatively connected with each distance compensation unit 2, and the control system 1 is communicatively connected with each sensor 6; the first support layer 3 and the operating workpiece 4 are fixed together through the distance compensation unit 2; the second support layer 7 is connected with the measured workpiece 5 fixed together.
  • Each spacing compensation unit 2 corresponds to at least one sensor 6,
  • Each gap compensation unit 2 spatially overlaps a part of the operation workpiece 4 , and the sensor 6 corresponding to the gap compensation unit 2 is disposed on the portion of the operation workpiece 4 overlapping the gap compensation unit 2 .
  • the distance compensation unit 2 is fixed between the first support layer 3 and the operation workpiece 4, that is, the upper surface of each distance compensation unit 2 is fixed in contact with the first support 3, and the lower surface is fixed in contact with the upper surface of the operation workpiece 4.
  • the lower surface of each gap compensation unit 2 covers a part of the upper surface of the workpiece 4 to be operated.
  • the quantity of distance compensation unit 2 is one or more, and each distance compensation unit 2 corresponds to at least one sensor 6, that is, the quantity of sensors 6 corresponding to each distance compensation unit 2 can be one or more; each sensor 6 is fixed on On the surface of the operating workpiece 4 facing the measured workpiece 5 (ie, the lower surface of the operating workpiece 4 ), the fixed positions of the sensors 6 are the parts where the corresponding distance compensation unit 2 and the operating workpiece 4 overlap in space. Thus, at least one sensor 6 is fixed directly below each distance compensation unit 2; when there is a sensor 6 that does not correspond to any distance compensation unit 2, the fixed position of the sensor 6 is the lower surface of the workpiece 4 There is no spatially overlapping portion with any distance compensation unit 2 .
  • a support auxiliary member 8 can also be provided between the operating workpiece 4 and the first support layer 3 , the thickness of the supporting auxiliary member 8 is the same as the initial thickness of the gap compensation unit 2, and can support the workpiece 4 during operation.
  • the operating workpiece 4 can be made of flexible materials, so that corresponding fluctuations can be produced as the thickness of the distance compensation unit 2 changes.
  • an elastic material can be provided on the part where the distance compensation unit 2 is in contact with the operating workpiece 4 , so that when the thickness of the gap compensation unit 2 changes, the fixation between the workpiece 4 and the gap compensation unit 2 is still maintained.
  • the quantity of spacing compensation unit 2 is 1, at this moment, spacing compensation unit 2 is set to cover the area of nearly half of the upper surface of operation workpiece 4, and a plurality of sensors 6 are equally divided into two parts (in the figure Taking the number of sensors 6 as 24 as an example), the 12 sensors 6 included in the first part correspond to the gap compensation unit 2, and the sensors 6 included in the first part are fixed on the lower surface of the operating workpiece 4 in a space with the gap compensation unit 2. In the upper overlapping part, the 12 sensors 6 included in the second part are fixed on the lower surface of the workpiece 4 and there is no spatial overlap with the gap compensation unit 2 .
  • the number of distance compensation units 2 is multiple, and a plurality of distance compensation units 2 are arranged between the operation workpiece 4 and the first support layer 3, and a plurality of distance compensation units 2 can be evenly distributed on the operating workpiece 4, that is, a plurality of spacing compensation units 2 are evenly distributed on the operating workpiece 4
  • the number of sensors 6 corresponding to each spacing compensation unit 2 can be equal or unequal, each sensor 6 corresponds to a spacing compensation unit 2, each sensor 6 is fixed On the lower surface of the operation workpiece 4, the part where the gap compensation unit 2 corresponding to the sensor 6 overlaps in space; in Fig. 4 and Fig.
  • the number of the gap compensation unit 2 is 8, and the sensor corresponding to each gap compensation unit 2
  • the number of 6 is 3 as an example; in FIG. 4 and FIG. 5 , the number of distance compensation units 2 is 8, which are respectively recorded as distance compensation units 2A to 2H.
  • the operation workpiece 4 is a probe layer 41
  • the lower surface of the probe layer 41 is provided with a plurality of probes 42
  • the plurality of probes 42 are evenly distributed on the probe layer 41
  • the sensor 6 is the probe 42 of the probe layer 41
  • a plurality of spacing compensation units 2 are evenly distributed on the probe layer 41
  • each spacing compensation unit 2 corresponds to 4 probes 42, that is, the bottom of the probe layer 41
  • four probes 42 are fixedly arranged on the part that overlaps with each spacing compensation unit 2 in space; thus, the characteristics of the distance measurement of the probes 42 can be used to realize the operation between the spacing compensation unit 2 and the workpiece 5 to be measured.
  • each spacing compensation unit 2 corresponds to only one probe 42, and each spacing compensation unit 2 can be used for the probe 42.
  • the positions of the corresponding probes 42 are fixed on the layer for vertical spacing compensation.
  • a plurality of probes 42 can scan and measure the three-dimensional topography of the surface to be operated on the workpiece 5, and the operating device can perform physical measurements on the surface to be operated of the sample (such as wafer, silicon wafer, quartz wafer, etc.).
  • the sensor 6 can measure the distance between the operation workpiece 4 and the corresponding position on the surface to be operated of the measured workpiece 5; specifically, the position on the surface to be operated of the measured workpiece 5 corresponding to each sensor 6 is Measure a surface area on the surface of the workpiece 5 to be operated, and the corresponding surface area of each sensor 6 is located directly below the sensor 6, that is, each sensor 6 is used to measure the corresponding surface area of the workpiece 4 to be operated and the surface to be operated on the workpiece 5 to be measured. The distance between the surface areas, each sensor 6 sends the measured distance to the control system 1 .
  • the surface area can be any of the following: a pixel, a line formed by multiple pixels, and a surface composed of multiple pixels; that is, the surface area on the surface to be operated can be divided by pixels, and each pixel is used as A surface area; or, the surface area on the surface to be operated is divided according to lines, and each surface area is a line formed by adjacent multiple pixel points; or, the surface area on the surface to be operated is divided according to planes, each A surface area is composed of adjacent multiple pixel point groups combined surface.
  • the control system 1 is used to control each distance compensation unit 2 to adjust the distance between the corresponding target part on the operation workpiece 4 and the measured workpiece 5 according to the distance measured by each sensor 6, so that the operation workpiece 4 and the measured workpiece 5. Match the shapes of the two opposite surfaces; the target part is the part on the workpiece 4 that overlaps with the gap compensation unit 2.
  • the distances between the surfaces to be operated of the measured workpiece 5 are consistent, which is convenient for operating the workpiece 4 to measure or process the measured workpiece 5 .
  • the distance compensation process is described in detail below, as follows:
  • the control system 1 receives the distances measured by all the sensors 6, it measures based on the 12 sensors 6 included in the first part corresponding to the spacing compensation unit 2
  • the distance between the target part corresponding to the gap compensation unit 2 on the operation workpiece 4 and the measured workpiece 5 can be obtained, for example, the average value of the distances measured by a plurality of sensors 6 corresponding to the gap compensation unit 2 can be calculated as the gap compensation
  • the distance H a between the target part corresponding to the unit 2 and the measured workpiece 5; the part on the operating workpiece 4 that has no spatial overlap with the gap compensation unit 2 is recorded as the reference part, and the 12 sensors 6 included in the second part are fixed
  • the distance Hb between the reference part and the measured workpiece 5 can be obtained based on the distances measured by the 12 sensors 6 included in the second part; the control system 1 subtracts the distance Hb from the distance Ha , the distance difference ⁇ H ab between the target part of the workpiece 4 and the reference
  • the more the number of distance compensation units 2 the better the effect of distance compensation, that is, the shape matching degree of the two surfaces of the operation workpiece 4 and the measured workpiece 5 after the distance compensation higher.
  • the control system 1 can obtain the distance between the target part corresponding to each distance compensation unit 2 and the measured workpiece 5 according to the distance measured by the sensor 6 corresponding to each distance compensation unit 2 .
  • the control system 1 is used to control each distance compensation unit 2 to adjust the distance between the corresponding target part and the measured workpiece 5, and the adjusted distance between the target part corresponding to each distance compensation unit 2 and the measured workpiece 5 equal, so that the shapes of the two opposite surfaces of the operating workpiece 4 and the measured workpiece 5 match.
  • control system 1 is configured to generate a distance corresponding to each distance compensation unit 2 based on the difference between the distance between the target portion corresponding to each distance compensation unit 2 and the measured workpiece 5 and the reference target distance value.
  • the control system 1 is used to select the distance between the target part and the measured workpiece that is smaller than the preset target distance value when the distance between the target part corresponding to any distance compensation unit 2 and the measured workpiece 5 is less than the preset target distance value.
  • the distance is used as the reference target distance value.
  • the control system 1 is used to control the first support layer 3 to drive the operating workpiece 4 towards the measured workpiece 5 when there is no distance between the target part corresponding to any distance compensation unit 2 and the measured workpiece 5 less than the preset target distance value moving so that the distance between the target part corresponding to any distance compensation unit 2 and the workpiece 5 to be measured is smaller than the preset target distance value.
  • multiple distance compensation units 2 are equivalent to dividing the operation workpiece 4 into multiple target parts.
  • the control system 1 receives the distances sent by all the sensors 6, for each distance compensation unit 2 , based on the distances measured by the three sensors corresponding to the distance compensation unit 2, the distance between the target part on the workpiece 4 corresponding to the distance compensation unit 2 and the measured workpiece is calculated.
  • the undulation of the surface to be operated and the undulation of the lower surface of the workpiece 4 are operated.
  • a target distance value is preset in the control system 1, and the preset target distance value is the effective distance for the operation workpiece 4 to measure or process the measured workpiece 5; if there is any target part and the distance between the measured workpiece 5 is less than preset target distance value, a distance smaller than the preset target distance value can be selected as the reference target distance value.
  • the control system 1 first passes the driving device built in the first supporting layer 3, or connects the driving device with the first supporting layer 3, and drives the first supporting layer 3 to drive the operating workpiece 4 Towards the measured workpiece 5, so that the operating workpiece 4 as a whole approaches the measured workpiece 5, and continuously performs distance detection during the movement until the distance between at least one target part of the operating workpiece 4 and the measured workpiece 5 is less than the preset target distance value.
  • a distance smaller than the preset target distance value can be selected as the reference target distance value.
  • control system 1 After the control system 1 selects the reference target spacing value, it subtracts the reference target spacing value from the distance between each target part and the measured workpiece 5 to obtain the distance difference value of each target part to be adjusted, and the control signal will be based on each The distance difference value of the target part to be adjusted generates the control signal corresponding to each target part, and sends the control signal corresponding to each target part to the distance compensation unit 2 corresponding to each target part, and each distance compensation unit 2 will be based on the received The control signal adjusts its own thickness, so that the distance between the corresponding target part and the workpiece 5 to be measured is equal to the reference target distance value.
  • the distance between the distance compensation unit 2H and the surface of the workpiece 5 to be measured is taken as the reference target distance value H c
  • the distance between the target part corresponding to the distance compensation unit 2A and the workpiece 5 to be measured is The distance between
  • H 1 the control system 1 calculates the difference ⁇ H 1c of the distance H 1 minus the reference target distance value H c
  • the difference ⁇ H 1c characterizes the thickness that needs to be adjusted by the distance compensation unit 2A, when ⁇
  • H 1c is greater than 0
  • it means that the distance H 1 between the target portion corresponding to the gap compensation unit 2A and the workpiece 5 to be measured is greater than the reference target gap value H c
  • the thickness reduction ⁇ for controlling the gap compensation unit 2A is generated
  • the control signal of H 1c and then the gap compensation unit 2A can adjust itself after receiving the control signal
  • the thickness of the body is reduced by ⁇ H 1c , so that the distance H 1
  • the distances between the target parts corresponding to each distance compensation unit 2 (distance compensation unit 2B to distance compensation unit 2G) and the measured workpiece 5 are equal to the reference target distance value H c , thereby realizing the
  • the distributed distance compensation of multiple target parts included in the operating workpiece 4 makes the lower surface of the operating workpiece 4 match the shape of the surface to be operated of the measured workpiece 5 , please refer to FIG. 5 .
  • the gap compensation unit 2 is composed of any one of the following: piezoelectric elements, thermal expansion elements, and plate capacitors.
  • the piezoelectric elements can be deformed in the thickness direction (that is, the vertical direction) according to the applied voltage.
  • the control system 1 can adjust the thickness change based on the distance compensation unit 2 A corresponding voltage control signal is generated, and the voltage is applied to the piezoelectric element, so that the thickness of the piezoelectric element changes, that is, the distance between the target part corresponding to the gap compensation unit 2 and the workpiece 5 to be measured can be adjusted.
  • the thermal expansion element When the spacing compensation unit 2 is composed of a thermal expansion element and a heating element arranged adjacent to the thermal expansion element, the thermal expansion element can be deformed in the thickness direction (that is, the vertical direction) according to the temperature.
  • the adjusted thickness variation generates a corresponding voltage control signal, which is applied to the heating element, thereby controlling the temperature of the heating element, and then the heating element can heat the thermal expansion element, so that the thickness of the thermal expansion element changes, that is The distance between the target portion corresponding to the gap compensation unit 2 and the workpiece 5 to be measured can be adjusted.
  • the spacing compensation unit 2 When the spacing compensation unit 2 is composed of a flat capacitor, the spacing between the two flat panels of the flat capacitor can change in the thickness direction (ie, the vertical direction) according to the applied voltage, so that the control system 1 can be based on the distance compensation unit 2.
  • the adjusted thickness variation generates a control signal of a corresponding voltage, which is applied to the plate capacitor, so that the distance between the two plates of the plate capacitor changes accordingly, so that the height of the first workpiece 32 in the vertical direction can be adjusted, namely Capable of pitch compensation unit 2 corresponding to the The distance between the target portion and the workpiece 5 to be measured is adjusted.
  • This embodiment provides an operating device, comprising: a control system, at least one distance compensation unit, a first support layer, an operating workpiece, and a plurality of sensors disposed on the operating workpiece and facing the workpiece to be measured, the control system and The distance compensation units are connected in communication, and the control system is connected in communication with each sensor; the first support layer and the operating workpiece are fixed together through the distance compensation unit; the second support layer is fixed together with the workpiece to be measured; each distance compensation unit corresponds to at least One sensor, each spacing compensation unit overlaps with a part of the operating workpiece in space, and the sensor corresponding to the spacing compensation unit is arranged on the overlapping part of the operating workpiece and the spacing compensation unit; the sensor can measure the operation workpiece and the surface to be operated of the measured workpiece
  • the control system can control the distance compensation units to adjust the distance between the corresponding target part on the operating workpiece and the measured workpiece according to the distance measured by each sensor.
  • the target part is the operating workpiece
  • the part that overlaps with the gap compensation unit, the adjusted operation workpiece matches the shape of the two opposite faces of the measured workpiece. That is, the lower surface of the operating workpiece can be divided into multiple parts for distributed distance compensation. After the distributed distance compensation, the shape of the two opposite surfaces of the operating workpiece and the measured workpiece can be matched, so that the lower surface of the operating workpiece and the measured workpiece
  • the distance between the surfaces to be operated remains relatively consistent, which is convenient for operating the workpiece to measure or process the measured workpiece, and improves the measurement and processing accuracy of the operated workpiece.
  • the second embodiment of the present application relates to an operating device for measuring or processing samples to be operated, such as wafers, silicon wafers, quartz wafers, etc. Measure the three-dimensional topography of the wafer surface, process the photoresist on the wafer surface, perform nanoimprinting operations on the wafer surface, etc.
  • the operating device includes: a control system 1 , at least one distance compensation unit 2 , a first supporting layer 3 and a plurality of sensors 6 .
  • the plurality of sensors 6 face the measured workpiece 5 fixed on the second support layer 7 , and the measured workpiece 5 is the sample to be operated.
  • the control system 1 can be a host computer including a controller, a processor, a notebook computer, etc.
  • the sensor 6 can be a sensor with a distance measuring function, such as a photon sensor, a laser distance measuring sensor, an electronic sensor, an ion sensor or an atomic force sensor, etc.
  • the operation workpiece 4 is located directly above the workpiece 5 to be measured as an example for illustration.
  • a plurality of sensors 6 form a surface Can be the surface formed by the tip of a plurality of probes; a plurality of probes can scan and measure the three-dimensional topography of the surface to be operated on the workpiece 5 to be measured, and at this time, the operating device can scan and measure the sample (for example, wafer, silicon measurement of physical and chemical quantities on the surface to be operated, scanning probe lithography (SPL), generation of electrons, generation of photons, and ion implantation of the surface to be operated by using the probe to introduce ions wait.
  • sample for example, wafer, silicon measurement of physical and chemical quantities on the surface to be operated, scanning probe lithography (SPL), generation of electrons, generation of photons, and ion implantation of the surface to be operated by using the probe to introduce ions wait.
  • SPL scanning probe lithography
  • the control system 1 is connected in communication with each distance compensation unit 2, and the control system 1 is connected in communication with each sensor 6; each distance compensation unit 2 corresponds to at least one sensor 6, that is, the number of sensors 6 corresponding to each distance compensation unit 2 can be One or more; one side of the spacing compensation unit 2 is fixed on the first support layer 3, and the other side of the spacing compensation unit 2 is fixed with a corresponding sensor 6; thus, each spacing compensation unit 2 faces the surface of the measured workpiece 5
  • Corresponding sensors 6 are fixed on the top, and when there are sensors 6 that do not correspond to any distance compensation unit 2, a supporting auxiliary part 8 can be set on the lower surface of the first supporting layer 3 of the operating device, and the supporting auxiliary part 8
  • the thickness is the same as the initial thickness of the distance compensation unit 2, and the surface of the support auxiliary member 8 facing the measured workpiece 5 is fixed with a sensor 6 that does not correspond to any distance compensation unit 2.
  • the quantity of spacing compensation unit 2 is 1, and spacing compensation unit 2 is fixed on the first supporting layer 3, and a plurality of sensors 6 are equally divided into two parts (in the figure, the number of sensors 6 24 as an example), the 12 sensors 6 included in the first part correspond to the gap compensation unit 2, the sensors 6 included in the first part are fixed on the surface of the gap compensation unit 2 facing the workpiece 5 to be measured, the 12 sensors included in the second part The 12 sensors 6 are then fixed on the surface of the support accessory 8 facing the workpiece 5 to be measured.
  • the number of distance compensation units 2 is multiple, and a plurality of distance compensation units 2 can be evenly distributed on the first support layer 3, that is, a plurality of distance compensation units 2 are evenly arranged on the first support layer
  • the number of distance compensation units 2 is taken as an example, which are respectively marked as distance compensation units 2A to 2H.
  • the sensor 6 can measure the distance between the corresponding distance compensation unit 2 and the corresponding position on the measured workpiece 5 .
  • the sensor 6 is a probe, then the sensor 6 can measure the The distance between the needle tip and the corresponding position on the measured workpiece; if the gap compensation unit 2 corresponds to only one sensor 6, the distance measured by the sensor 6 is the distance between the gap compensation unit 2 and the measured workpiece 5 ; If the distance compensation unit 2 corresponds to a plurality of sensors 6, the average distance measured by the plurality of sensors 6 can be calculated as the distance between the distance compensation unit 2 and the workpiece 5 to be measured.
  • the position on the to-be-operated surface of the measured workpiece 5 corresponding to the sensor 6 is a surface area on the to-be-operated surface of the measured workpiece 5, and the surface area corresponding to each sensor 6 is located directly below the sensor 6, that is, each sensor 6 is used to measure the distance between the corresponding distance compensation unit 2 and the corresponding surface area on the surface to be operated of the measured workpiece 5 , and each sensor 6 will send the measured distance to the control system 1 .
  • the surface area can be any of the following: a pixel point, a line formed by a plurality of pixel points, and a surface composed of a plurality of pixel points; that is, the surface area on the surface to be operated of the measured workpiece 5 can be divided according to the pixel points, Each pixel is used as a surface area; or, the surface area on the surface to be operated of the measured workpiece 5 is divided according to lines, and each surface area is a line formed by adjacent multiple pixel points; or, the measured workpiece
  • the surface area on the surface to be operated in 5 is divided according to planes, and each surface area is a plane formed by combining multiple adjacent pixels.
  • the control system 1 is used to control and adjust the distance between each distance compensation unit 2 and the workpiece 5 to be measured according to the distance measured by each sensor 6, so that the surface formed by a plurality of sensors 6 and the surface to be operated of the workpiece 5 to be measured shape matches.
  • the control system controls the first support layer 3 to adjust up and down in the vertical direction, it can still maintain the multiple sensors 6 formed.
  • the distance between the surface of the surface and the surface to be operated of the workpiece 5 to be measured is consistent, which is convenient for the operating device to use multiple sensors 6 to measure or process the workpiece 5 to be measured.
  • the distance compensation process is described in detail below, as follows:
  • the control system 1 receives the distances measured by all sensors 6, it measures based on the 12 sensors 6 included in the first part corresponding to the spacing compensation unit 2.
  • the distance between the gap compensation unit 2 and the measured workpiece 5 can be obtained, for example, the average value of the distances measured by a plurality of sensors 6 corresponding to the gap compensation unit 2 can be calculated as the distance between the gap compensation unit 2 and the measured workpiece 5
  • the 12 sensors 6 included in the second part are fixed on the surface of the support accessory 8 facing the workpiece 5 to be measured, so based on the distance measured by the 12 sensors 6 included in the second part, we can get The distance H b between the support accessory 8 and the measured workpiece 5; the control system By subtracting the distance H b from the distance H a , the distance difference ⁇ H ab between the distance compensation unit 2 and the support auxiliary part 8 relative to the surface to be operated of the workpiece 5 to be measured can be obtained.
  • This distance difference reflects the The undulation of the surface formed by 6 and the undulation of the surface to be operated of the measured workpiece 5, since the 12 sensors 6 included in the first part are fixed together with the distance compensation unit 2, the thickness of the distance compensation unit 2 can be adjusted , adjust the distance between the surface formed by the 12 sensors 6 contained in the first part and the surface to be operated of the workpiece 5 to be measured, and the distance between the surface formed by the 12 sensors 6 contained in the first part and the surface formed by the 12 sensors 6 contained in the second part
  • the distances between the surfaces formed by the 12 sensors 6 and the surface to be operated are equal; specifically, when ⁇ H ab is greater than 0, it means that the distance H a between the distance compensation unit 2 and the surface to be operated is greater than that between the support accessory 8 and the surface to be operated At this time, a control signal for controlling the thickness reduction ⁇ H ab of the gap compensation unit 2 is generated, and then the gap compensation unit 2 can adjust its own thickness reduction ⁇ H ab after receiving the control signal , so that the distance between the surface formed by
  • each sensor 6 can be arranged to correspond to a distance compensation unit 2 , in which case it is not necessary to provide a support aid 8 in the operating device.
  • the control system 1 can obtain the distance between each distance compensation unit 2 and the measured workpiece 5 according to the distance measured by the sensor 6 corresponding to each distance compensation unit 2 .
  • the control system 1 is used to control each distance compensation unit 2 to adjust to the same distance from the workpiece 5 to be measured, so that the surface formed by multiple sensors 6 matches the shape of the surface to be operated on the workpiece 5 to be measured.
  • control system 1 is used to generate a distance corresponding to each distance compensation unit 2 for controlling the distance equal to the reference distance based on the difference between the distance between each distance compensation unit 2 and the measured workpiece 5 and the reference target distance value.
  • Control signal for target pitch value is used to generate a distance corresponding to each distance compensation unit 2 for controlling the distance equal to the reference distance based on the difference between the distance between each distance compensation unit 2 and the measured workpiece 5 and the reference target distance value.
  • the distance compensation unit 2 is used to adjust the distance from the workpiece 5 to be equal to the reference target distance according to the received control signal.
  • the control system 1 is used to select the distance between the distance compensation unit 2 and the measured workpiece 5 that is smaller than the preset target distance value when the distance between any distance compensation unit 2 and the measured workpiece 5 is smaller than the preset target distance value.
  • the distance is used as the reference target distance value.
  • the control system 1 is used to control the first support layer to drive the distance compensation unit 2 to move toward the workpiece 5 to be measured when the distance between any distance compensation unit 2 and the workpiece 5 to be measured is less than the preset target distance value, so that The distance between any gap compensation unit 1 and the measured workpiece 5 is smaller than the preset target gap value.
  • the control system 1 receives the distances sent by all the sensors 6, for each distance compensation unit 2, based on the distances measured by the three sensors corresponding to the distance compensation unit 2, Calculate the distance between the distance compensation unit 2 and the measured workpiece 5, thus the distance between each distance compensation unit 2 and the measured workpiece 5 can be obtained, and the distance between each distance compensation unit 2 and the measured workpiece 5
  • the change of the value reflects the undulation of the surface to be operated of the measured workpiece 5 and the undulation of the surface formed by a plurality of sensors 6 .
  • a target distance value is preset in the control system 1, and the preset target distance value is the effective distance for the operating device to measure or process the measured workpiece 5; if there is any distance between the distance compensation unit 2 and the measured workpiece 5 is smaller than the preset target distance value, a distance smaller than the preset target distance value can be selected as the reference target distance value.
  • the control system 1 first uses the built-in drive device of the first support layer 3, or connects the drive device with the first support layer 3 , driving the first support layer 3 to drive the plurality of distance compensation units 2 toward the workpiece 5 to be measured, so that the plurality of distance compensation units 2 approach the workpiece 5 as a whole, and continuously perform distance detection during the movement until at least one distance compensation unit
  • the distance between 2 and the measured workpiece 5 is smaller than the preset target distance value.
  • a distance smaller than the preset target gap value can be selected as the reference target gap value.
  • each distance compensation unit 2 and the measured workpiece 5 minus the reference target distance value After the control system 1 selects the reference target distance value, each distance compensation unit 2 and the measured workpiece 5 minus the reference target distance value to obtain the distance difference value to be adjusted by each distance compensation unit 2, and the control signal will generate the corresponding distance value of each distance compensation unit 2 based on the distance difference value to be adjusted by each distance compensation unit 2 Control signals, and send each control signal to the corresponding distance compensation unit 2, and each distance compensation unit 2 will adjust its own thickness according to the received control signal, so that the distance between the distance compensation unit 2 and the workpiece 5 to be measured is The distance is equal to the reference target spacing value.
  • the distance between the distance compensation unit 2H and the surface of the workpiece 5 to be measured is used as the reference target distance value Hc
  • the distance between the distance compensation unit 2A and the workpiece 5 to be measured is That is H 1
  • the control system 1 calculates the difference ⁇ H 1c of the distance H 1 minus the reference target distance value H c
  • the difference ⁇ H 1c characterizes the thickness to be adjusted by the distance compensation unit 2A, when ⁇ H 1c is greater than When 0, it means that the distance H 1 between the distance compensation unit 2A and the workpiece 5 to be measured is greater than the reference target distance value H c
  • a control signal for controlling the thickness reduction ⁇ H 1c of the distance compensation unit 2A is generated, and then After receiving the control signal, the gap compensation unit 2A can adjust its own thickness to reduce ⁇ H 1c , so that the distance H 1 between the gap compensation unit 2A and the measured workpiece 5 is equal to the reference target gap value
  • each distance compensation unit 2 distance compensation unit 2B to distance compensation unit 2G
  • the sensor on each distance compensation unit 2 forms The distances to the surface to be operated of the workpiece 5 to be measured are equal, thereby realizing the distributed distance compensation of the plurality of spacing compensation units 2, so that the surface formed by the plurality of sensors 6 matches the shape of the surface to be operated of the workpiece 5 to be measured, Please refer to Figure 12.
  • the gap compensation unit 2 is composed of any one of the following: piezoelectric elements, thermal expansion elements, and plate capacitors.
  • the piezoelectric elements can be deformed in the thickness direction (that is, the vertical direction) according to the applied voltage.
  • the control system 1 can adjust the thickness change based on the distance compensation unit 2
  • the control signal of the corresponding voltage is generated by the quantity, and the voltage is applied to the piezoelectric element, so that the thickness of the piezoelectric element changes, that is, the gap between the gap compensation unit 2 and the workpiece 5 to be measured can be adjusted. Adjust the distance between them.
  • the spacing compensation unit 2 When the spacing compensation unit 2 is composed of a thermal expansion element and a heating element arranged adjacent to the thermal expansion element, the thermal expansion element can be deformed in the thickness direction (that is, the vertical direction) according to the temperature.
  • the adjusted thickness variation generates a corresponding voltage control signal, which is applied to the heating element, thereby controlling the temperature of the heating element, and then the heating element can heat the thermal expansion element, so that the thickness of the thermal expansion element changes, that is The distance between the gap compensation unit 2 and the workpiece 5 to be measured can be adjusted.
  • the spacing compensation unit 2 When the spacing compensation unit 2 is composed of a flat capacitor, the spacing between the two flat panels of the flat capacitor can change in the thickness direction (ie, the vertical direction) according to the applied voltage, so that the control system 1 can be based on the distance compensation unit 2.
  • the adjusted thickness variation generates a control signal of a corresponding voltage, which is applied to the plate capacitor, so that the distance between the two plates of the plate capacitor changes accordingly, so that the height of the first workpiece 32 in the vertical direction can be adjusted, namely The distance between the gap compensation unit 2 and the workpiece 5 to be measured can be adjusted.
  • This embodiment provides an operating device, including: a control system, at least one distance compensation unit, a first support layer, a second support layer, a workpiece to be measured, and a plurality of sensors, the control system communicates with each distance compensation unit, controls The system communicates with each sensor; each spacing compensation unit corresponds to at least one sensor, one side of the spacing compensation unit is fixed on the first support layer, and the other side of the spacing compensation unit is fixed with a corresponding sensor; the sensor is used to measure the corresponding spacing The distance between the compensation unit and the corresponding position on the measured workpiece; the control system is used to control and adjust the distance between each spacing compensation unit and the measured workpiece according to the distance measured by each sensor.
  • the formed face matches the shape of the surface to be operated on the measured workpiece.
  • the surface formed by multiple sensors can be divided into multiple parts for distributed distance compensation, and the surface formed by multiple sensors after distributed distance compensation matches the shape of the surface to be operated on the workpiece to be measured, so that the surface formed by multiple sensors
  • the distance between the surface of the measured workpiece and the surface to be operated of the measured workpiece is relatively consistent, which is convenient for the operating device to use multiple sensors to measure or process the measured workpiece, and improves the accuracy of measuring and processing the measured workpiece.
  • the third embodiment of the present application relates to a distributed distance compensation method between two workpieces, which is applied to the operating device in the first embodiment.
  • the operating device can use the distributed distance compensation method between two workpieces in this embodiment to perform vertical distance compensation.
  • FIG. 13 The specific flow of the distributed distance compensation method between two workpieces in this embodiment is shown in FIG. 13 .
  • Step 101 using multiple sensors to measure the distance between the operating workpiece and the corresponding position on the surface of the workpiece to be operated.
  • Step 102 according to the distance measured by each sensor, control each distance compensation unit to adjust the distance between the corresponding target part on the operating workpiece and the measured workpiece, so that the shapes of the two surfaces of the operating workpiece and the measured workpiece are opposite to each other.
  • Matching; the target part is the part where the operation workpiece overlaps with the gap compensation unit.
  • the first embodiment corresponds to this embodiment, this embodiment can be implemented in cooperation with the first embodiment.
  • the relevant technical details mentioned in the first embodiment are still valid in this embodiment, and the technical effects that can be achieved in the first embodiment can also be realized in this embodiment, and in order to reduce repetition, details are not repeated here.
  • the relevant technical details mentioned in this embodiment can also be applied in the first embodiment.
  • the sensor in the operating device can measure the distance between the operating workpiece and the corresponding position on the surface of the workpiece to be operated, and the control system can control each distance compensation unit to operate the workpiece according to the distance measured by each sensor. Adjust the distance between the corresponding target part and the measured workpiece.
  • the target part is the overlapping part of the operating workpiece and the gap compensation unit. After adjustment, the shapes of the two opposite surfaces of the operating workpiece and the measured workpiece are matched. That is, the lower surface of the operating workpiece can be divided into multiple parts for distributed distance compensation.
  • the shape of the two opposite surfaces of the operating workpiece and the measured workpiece can be matched, so that the lower surface of the operating workpiece and the measured workpiece
  • the distance between the surfaces to be operated remains relatively consistent, which is convenient for operating the workpiece to measure or process the measured workpiece, and improves the measurement and processing accuracy of the operated workpiece.
  • the fourth embodiment of the present application relates to a distributed distance compensation method between two workpieces, which is applied to the operating device in the second embodiment.
  • FIG. 14 The specific flow of the distributed distance compensation method between two workpieces in this embodiment is shown in FIG. 14 .
  • Step 201 measuring the distance between the corresponding distance compensation unit and the corresponding position on the surface of the workpiece to be operated by using multiple sensors.
  • Step 202 according to the distance measured by each sensor, control each distance compensation unit to adjust the distance between the distance compensation unit and the workpiece to be measured, so that the surface formed by multiple sensors is consistent with the shape of the surface to be operated of the workpiece to be measured match.
  • the present embodiment can be implemented in cooperation with the second embodiment.
  • the relevant technical details mentioned in the second embodiment are still valid in this embodiment, and the technical effects that can be achieved in the second embodiment can also be realized in this embodiment, and in order to reduce repetition, details are not repeated here.
  • the relevant technical details mentioned in this embodiment can also be applied in the second embodiment.
  • the senor in the operating device is used to measure the distance between the corresponding distance compensation unit and the corresponding position on the workpiece to be measured; the control system is used to control and adjust each distance compensation unit and The distance between the workpieces to be measured is adjusted so that the surface formed by the plurality of sensors matches the shape of the surface to be operated on the workpiece to be measured.
  • the surface formed by multiple sensors can be divided into multiple parts for distributed distance compensation, and the surface formed by multiple sensors after distributed distance compensation matches the shape of the surface to be operated on the workpiece to be measured, so that the surface formed by multiple sensors
  • the distance between the surface of the measured workpiece and the surface to be operated of the measured workpiece is relatively consistent, which is convenient for the operating device to use multiple sensors to measure or process the measured workpiece, and improves the accuracy of measuring and processing the measured workpiece.

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Abstract

本申请实施例提供了一种操作装置与两个工件之间的分布式间距补偿方法，涉及测量和控制技术以及精密制造技术领域。操作装置包括：控制系统、至少一个间距补偿单元、第一支撑层、操作工件以及多个传感器；传感器用于测量操作工件与被测工件待操作表面上的对应位置之间的距离；控制系统用于根据各传感器测量得到的距离，控制各间距补偿单元对操作工件上对应的目标部分与被测工件之间的距离进行调整，以使操作工件与被测工件相对的两个面的形状匹配；目标部分为操作工件与间距补偿单元重叠的部分。本申请中，使得操作工件的下表面与被测工件的待操作表面之间的距离保持相对一致，便于操作工件对被测工件进行测量或加工等操作，提升了操作工件的测量和加工精度。

Description

操作装置与两个工件之间的分布式间距补偿方法
相关申请交叉引用
本专利申请要求于2022年02月17日提交的、申请号为2022101461298、发明名称为“操作装置与两个工件之间的分布式间距补偿方法”的中国专利申请的优先权，上述申请的全文以引用的方式并入本文中。
技术领域
本申请涉及测量、控制以及精密制造技术领域，具体涉及一种操作装置与两个工件之间的分布式间距补偿方法。
背景技术
加工工件用于对被加工工件进行加工，具体用来对与加工工件的表面相面对的被加工工件的表面进行加工。当加工工件与被加工工件的表面均相对对方较大或者相当时，二者的表面的相对平整度就很重要。例如，在需要对如晶圆等被加工工件进行整个表面的测量、加工等操作时，可以利用加工工件整个表面平行地对准工作基台上的如晶圆等被加工工件进行测量、加工等操作。例如利用探针阵列对晶圆表面的三维形貌进行测量、利用探针阵列对晶圆表面的光刻胶进行曝光，或者利用纳米压印模板对晶圆表面进行纳米压印加工。
然而，如晶圆等被加工工件的表面一般是起伏不平的，一般都会有十几个微米数量级的曲面起伏，而加工工件表面与被加工工件表面的间距只有几十个纳米，即远远小于表面曲面得起伏。这就会导致在对晶圆进行测量或加工过程中，加工工件有的部分已经与晶圆表面接触了，而还有一部分仍然与晶圆表面有很大间距，这会影响晶圆表面的测量或加工精度，甚至可能会导致无法对晶圆进行测量或加工。
目前，为了解决被加工工件表面呈曲面状的问题，一般会先对被加工工件表面进行平整化，来迎合加工工件的平整的整个表面。但是，加工工 件表面本身的表面也不一定非常平整，因此单纯对被加工工件表面进行平整化也无法解决，也无法解决被加工工件表面不平整的问题。
针对上述亟待解决的问题，申请人提出了本申请以解决上述的技术问题。
发明内容
本申请的目的是提供了一种操作装置与两个工件之间的分布式间距补偿方法，能够将操作工件的下表面分为多个部分进行分布式间距补偿，间距补偿后的操作工件与被测工件相对的两个面的形状匹配，使得操作工件的下表面与被测工件的待操作表面之间的距离在整个被测工件表面上保持相对一致，便于操作工件对被测工件进行测量或加工等操作，提升了操作工件的测量和加工精度。
为实现上述目的，本申请提供了一种操作装置，包括：控制系统、至少一个间距补偿单元、第一支撑层、操作工件，以及设置在所述操作工件上且朝向被测工件的多个传感器；所述被测工件固定在第二支撑层上，所述控制系统与各所述间距补偿单元通信连接、所述控制系统与各所述传感器通信连接；所述第一支撑层与所述操作工件通过所述间距补偿单元固定在一起；所述第二支撑层与所述被测工件固定在一起；每个所述间距补偿单元对应于至少一个所述传感器，每个所述间距补偿单元与所述操作工件的一部分在空间上重叠，与所述间距补偿单元对应的所述传感器设置在所述操作工件与所述间距补偿单元重叠的部分上；所述传感器用于测量所述操作工件与所述被测工件待操作表面上的对应位置之间的距离；所述控制系统用于根据各所述传感器测量得到的距离，控制各所述间距补偿单元对所述操作工件上对应的目标部分与所述被测工件之间的距离进行调整，以使所述操作工件与所述被测工件相对的两个面的形状匹配；所述目标部分为所述操作工件与所述间距补偿单元重叠的部分。
本申请还提供了一种两个工件之间的分布式间距补偿方法，应用于上述的操作装置，所述方法包括：通过多个传感器测量操作工件与被测工件待操作表面上的对应位置之间的距离；根据各所述传感器测量得到的距离，控制各间距补偿单元对操作工件上对应的目标部分与所述被测工件之间的距离进行调 整，以使所述操作工件与所述被测工件相对的两个面的形状匹配；所述目标部分为所述操作工件与所述间距补偿单元重叠的部分。
本申请还提供了一种操作装置，包括：控制系统、至少一个间距补偿单元、第一支撑层、以及多个传感器，所述多个传感器朝向固定在第二支撑层上的被测工件，所述控制系统与各所述间距补偿单元通信连接、所述控制系统与各所述传感器通信连接；每个所述间距补偿单元对应于至少一个所述传感器，所述间距补偿单元的一面固定在所述第一支撑层上，所述间距补偿单元的另一面固定有对应的所述传感器；所述传感器用于测量对应的所述间距补偿单元与所述被测工件上的对应位置之间的距离；所述控制系统用于根据各所述传感器测量得到的距离，控制调整各所述间距补偿单元与所述被测工件之间的距离，以使由所述多个传感器形成的面与所述被测工件的待操作表面的形状匹配。
本申请还提供了一种两个工件之间的分布式间距补偿方法，应用于上述的操作装置，所述方法包括：通过多个传感器测量对应的间距补偿单元与所述被测工件待操作表面上的对应位置之间的距离；根据各所述传感器测量得到的距离，控制各所述间距补偿单元对所述间距补偿单元与所述被测工件之间的距离进行调整，以使由所述多个传感器形成的面与所述被测工件的待操作表面的形状匹配。
本申请实施例中，能够将操作工件的下表面分为多个部分进行分布式间距补偿，间距补偿后的操作工件与被测工件相对的两个面的形状匹配，使得操作工件的下表面与被测工件的待操作表面之间的距离保持相对一致，便于操作工件对被测工件进行测量或加工等操作，提升了操作工件的测量和加工精度。
在一个实施例中，所述间距补偿单元的数量为多个，每个所述传感器对应于一个所述间距补偿单元；所述控制系统用于根据各所述间距补偿单元对应的所述传感器测量的距离，得到各所述间距补偿单元对应的所述目标部分与所述被测工件之间的距离；所述控制系统用于控制每个所述间距补偿单元对对应的所述目标部分与所述被测工件之间的距离进行调整，调整后的各所述间距补偿单元对应的所述目标部分与所述被测工件之间的距离相等，以使所述操作工件与所述被测工件相对的两个面的形状匹配。
在一个实施例中，所述控制系统用于基于各所述间距补偿单元对应的所述目标部分与所述被测工件之间的距离与参考目标间距值之间的差值，生成各所述间距补偿单元对应的用于控制距离等于所述参考目标间距值的控制信号；所述间距补偿单元用于根据接收到的所述控制信号，调整对应的所述目标部分与所述被测工件之间的距离等于所述参考目标间距值。
在一个实施例中，所述控制系统用于在存在任一所述间距补偿单元对应的所述目标部分与所述被测工件之间的距离小于预设目标间距值时，选取小于所述预设目标间距值的所述目标部分与所述被测工件之间的距离作为所述参考目标间距值；所述控制系统用于在不存在任一所述间距补偿单元对应的所述目标部分与所述被测工件之间的距离小于预设目标间距值时，控制所述第一支撑层带动所述操作工件朝向所述被测工件运动，以使任一所述间距补偿单元对应的所述目标部分与所述被测工件之间的距离小于预设目标间距值。
在一个实施例中，多个所述间距补偿单元设置在所述操作工件与所述第一支撑层之间，多个所述间距补偿单元均匀分布在所述操作工件上。
在一个实施例中，所述操作工件为探针层，多个所述传感器为设置在所述探针层的多个探针。
在一个实施例中，各所述间距补偿单元对应于相同数量的所述传感器。
在一个实施例中，所述间距补偿单元由以下任意之一组成：压电元件、热膨胀元件以及平板电容。
附图说明
图1是根据本申请第一实施例的操作装置的方框示意图；
图2是根据本申请第一实施例的操作装置在分布式间距补偿前的示意图，其中操作装置中包括一个间距补偿单元；
图3是根据本申请第一实施例的操作装置在分布式间距补偿后的示意图，其中操作装置中包括一个间距补偿单元；
图4是根据本申请第一实施例的操作装置在分布式间距补偿前的示意图，其中操作装置中包括多个间距补偿单元；
图5是根据本申请第一实施例的操作装置在分布式间距补偿后的示意 图，其中操作装置中包括多个间距补偿单元；
图6是根据本申请第一实施例的操作装置中单个间距补偿单元、探针以及第一支撑层的部分示意图；
图7是根据本申请第一实施例的操作装置的示意图，其中操作工件为探针层、多个传感器为探针层上的多个探针；
图8是图7所示的操作装置的俯视图；
图9是根据本申请第二实施例的操作装置在分布式间距补偿前的示意图，其中操作装置中包括一个间距补偿单元；
图10是根据本申请第二实施例的操作装置在分布式间距补偿后的示意图，其中操作装置中包括一个间距补偿单元；
图11是根据本申请第二实施例的操作装置在分布式间距补偿前的示意图，其中操作装置中包括多个间距补偿单元；
图12是根据本申请第二实施例的操作装置在分布式间距补偿后的示意图，其中操作装置中包括多个间距补偿单元；
图13是根据本申请第三实施例的两个工件之间的分布式间距补偿方法的具体流程图；
图14是根据本申请第四实施例的两个工件之间的分布式间距补偿方法的具体流程图。
具体实施例
以下将结合附图对本申请的各实施例进行详细说明，以便更清楚理解本申请的目的、特点和优点。应理解的是，附图所示的实施例并不是对本申请范围的限制，而只是为了说明本申请技术方案的实质精神。
在下文的描述中，出于说明各种公开的实施例的目的阐述了某些具体细节以提供对各种公开实施例的透彻理解。但是，相关领域技术人员将认识到可在无这些具体细节中的一个或多个细节的情况来实践实施例。在其它情形下，与本申请相关联的熟知的装置、结构和技术可能并未详细地示出或描述从而避免不必要地混淆实施例的描述。
除非语境有其它需要，在整个说明书和权利要求中，词语“包括”和 其变型，诸如“包含”和“具有”应被理解为开放的、包含的含义，即应解释为“包括，但不限于”。
在整个说明书中对“一个实施例”或“一实施例”的提及表示结合实施例所描述的特定特点、结构或特征包括于至少一个实施例中。因此，在整个说明书的各个位置“在一个实施例中”或“在一实施例”中的出现无需全都指相同实施例。另外，特定特点、结构或特征可在一个或多个实施例中以任何方式组合。
如该说明书和所附权利要求中所用的单数形式“一”和“”包括复数指代物，除非文中清楚地另外规定。应当指出的是术语“或”通常以其包括“或/和”的含义使用，除非文中清楚地另外规定。
在以下描述中，为了清楚展示本申请的结构及工作方式，将借助诸多方向性词语进行描述，但是应当将“前”、“后”、“左”、“右”、“外”、“内”、“向外”、“向内”、“上”、“下”等词语理解为方便用语，而不应当理解为限定性词语。
本申请第一实施例涉及一种操作装置，用于对待操作样品进行测量或加工操作，待操作样品例如为晶圆、硅片、石英片等，以样品为晶圆为例，操作装置能够对晶圆表面的三维形貌进行测量、对晶圆表面的光刻胶进行加工、对晶圆表面进行纳米压印操作等。
请参考图1至图8，操作装置包括：控制系统1、至少一个间距补偿单元2(图1中仅示意性画出一个)、第一支撑层3、操作工件4、以及设置在操作工件4上且朝向被测工件5的多个传感器6；所述被测工件5固定在第二支撑层7上。其中，被测工件5即为待操作样品。其中，控制系统1可以为包括控制器、处理器等的电脑主机、笔记本电脑等，传感器6可以为具有测距功能的传感器，例如为光子传感器、激光测距传感器、电子传感器、离子传感器或原子力传感器等。需要说明的是，本实施例以及之后的实施例中均以操作工件4位于被测工件5的正上方为例进行说明。
控制系统1与各间距补偿单元2通信连接、控制系统1与各传感器6通信连接；第一支撑层3与操作工件4通过间距补偿单元2固定在一起；第二支撑层7与被测工件5固定在一起。每个间距补偿单元2对应于至少一个传感器6， 每个间距补偿单元2与操作工件4的一部分在空间上重叠，与间距补偿单元2对应的传感器6设置在操作工件4与间距补偿单元2重叠的部分上。
具体的，间距补偿单元2固定在第一支撑层3与操作工件4之间，即每个间距补偿单元2的上表面与第一支撑3接触固定，下表面与操作工件4的上表面接触固定，每个间距补偿单元2的下表面覆盖操作工件4上表面的一部分。间距补偿单元2的数量为一个或多个，每个间距补偿单元2对应于至少一个传感器6，即每个间距补偿单元2对应的传感器6的数量可以为一个或多个；各传感器6固定在操作工件4朝向被测工件5的面上(即操作工件4的下表面)，各传感器6固定的位置为对应的间距补偿单元2与操作工件4在空间上重叠的部分。由此，每个间距补偿单元2的正下方都固定有至少一个传感器6；当存在与任一间距补偿单元2都不对应的传感器6时，该传感器6固定的位置为操作工件4的下表面上与任一间距补偿单元2都不存在空间上重叠的部分。需要说明的是，在将传感器6固定在操作工件4的下表面上与间距补偿单元2不存在空间上重叠的部分上时，还可以在操作工件4与第一支撑层3设置支撑辅件8，支撑辅件8的厚度与间距补偿单元2的初始厚度相同，可以对操作工件4起到支撑作用。
本实施例中，操作工件4可以由柔性材料制成，从而能够随着间距补偿单元2的厚度变化而产生相应的起伏，另外，可以在间距补偿单元2与操作工件4接触的部分设置弹性材料，从而在间距补偿单元2的厚度变化时，仍然保持操作工件4与间距补偿单元2之间的固定。
如图2与图3所示，间距补偿单元2的数量为1个，此时设置间距补偿单元2覆盖操作工件4上表面接近一半的面积，将多个传感器6平均分为两部分(图中以传感器6的数量为24个为例)，第一部分所包含的12个传感器6与间距补偿单元2对应，第一部分包含的传感器6固定在操作工件4的下表面上与间距补偿单元2在空间上重叠的部分，第二部分所包含的12个传感器6则固定在操作工件4的下表面上与间距补偿单元2不存在空间上重叠的部分。
如图4与图5所示，间距补偿单元2的数量为多个，多个所述间距补偿单元2设置在所述操作工件4与所述第一支撑层3之间，多个间距补偿单元2可以均匀分布在操作工件4上，即多个间距补偿单元2均匀分布在操作工件4的 上表面上，相邻的间距补偿单元2之间存在间隙，各间距补偿单元2对应的传感器6的数量可以相等或不相等，每个传感器6均对应于一个间距补偿单元2，各传感器6固定在操作工件4的下表面上与传感器6对应的间距补偿单元2在空间上重叠的部分；图4与图5中，以间距补偿单元2的数量为8个、各间距补偿单元2对应的传感器6的数量均为3个为例；图4与图5中以间距补偿单元2的数量为8个为例，分别记为间距补偿单元2A至2H。
在一个例子中，请参考图6至图8，操作工件4为探针层41，探针层41的下表面设置有多个探针42，多个探针42均匀分布在探针层41上，传感器6即为探针层41的探针42，多个间距补偿单元2均匀分布在探针层41上，每个间距补偿单元2对应于4个探针42，即探针层41的下表面上与各间距补偿单元2在空间重叠的部分上均固定设置有4个探针42；从而可以利用探针42能够进行距离测量的特性来实现间距补偿单元2与被测工件5的待操作表面之间的距离测量；其中，最佳情况为间距补偿单元2与探针42一一对应，即每个间距补偿单元2仅对应于一个探针42，每个间距补偿单元2能够对探针层上固定了对应的探针42的位置进行垂直间距补偿。其中，多个探针42能够对被测工件5上的待操作表面的三维形貌进行扫描测量，操作装置能够对样品(例如为晶圆、硅片、石英片等)的待操作表面进行物理量和化学量的测量、扫描探针光刻(Scanning probe lithography，SPL)、产生电子、产生光子，还有利用探针引入离子对待操作表面进行离子注入等。
本实施例中，传感器6能够测量操作工件4与被测工件5待操作表面上的对应位置之间的距离；具体的，每个传感器6对应的被测工件5待操作表面上的位置为被测工件5待操作表面上的一个表面区域，每个传感器6对应的表面区域位于该传感器6的正下方，即每个传感器6用于测量操作工件4与被测工件5待操作表面上对应的表面区域之间的距离，各传感器6会将测量得到的距离发送给控制系统1。表面区域可以为以下任意一种：一个像素点、由多个像素点形成的线和由多个像素点组合的面；即待操作表面上的表面区域可以按照像素点划分，每个像素点作为一个表面区域；或者，待操作表面上的表面区域按照线进行划分，每个表面区域为由相邻的多个像素点形成的线；或者，待操作表面上的表面区域按照面进行划分，每个表面区域为由相邻的多个像素点组 合形成的面。
控制系统1用于根据各传感器6测量得到的距离，控制各间距补偿单元2对操作工件4上对应的目标部分与被测工件5之间的距离进行调整，以使操作工件4与被测工件5相对的两个面的形状匹配；目标部分为操作工件4上与间距补偿单元2重叠的部分。
由于操作工件4的下表面的形状与被测工件5的待操作表面的形状相匹配，控制系统在对操作工件4在垂直方向上进行上下调整时，仍然能够保持操作工件4的下表面相对于被测工件5的待操作表面的距离一致，便于操作工件4对被测工件5进行测量或加工等操作。下面对间距补偿过程进行详细说明，具体如下：
在间距补偿单元2的数量为1个时，请参考图2，控制系统1在接收到所有的传感器6测量的距离后，基于与间距补偿单元2对应的第一部分所包含的12个传感器6测量的距离，能够得到操作工件4上与间距补偿单元2对应的目标部分与被测工件5之间的距离，例如计算与间距补偿单元2对应的多个传感器6测量的距离的均值作为该间距补偿单元2对应的目标部分与被测工件5之间的距离Ha；将操作工件4上与间距补偿单元2无空间上重叠的部分记作参照部分，第二部分所包含的12个传感器6固定在参照部分上，由此能够基于第二部分所包含的12个传感器6测量的距离，得到参照部分与被测工件5之间的距离Hb；控制系统1将距离Ha减去距离Hb，能够得到操作工件4的目标部分与参照部分相对于待操作表面之间的距离差△Hab，这个距离差反应了被测工件5的待操作表面的起伏与操作工件4的下表面的起伏，由于操作工件4的目标部分与间距补偿单元2固定在一起，由此可以通过调整该间距补偿单元2的厚度，对操作工件4的目标部分与被测工件5的待操作表面之间的距离进行调整，以使操作工件4的目标部分与参照部分相对于待操作表面的距离相等；具体的，当△Hab大于0时，说明操作工件4的目标部分与待操作表面之间的距离Ha大于操作工件4的参照部分与待操作表面之间的距离Hb，此时生成用于控制间距补偿单元2的厚度减小△Hab的控制信号，继而间距补偿单元2在接收到该控制信号后能够调整自身的厚度减小△Hab，使得操作工件4的目标部分与参照部分相对于待操作表面的距离相等；当△Hab小于0时，说明操作 工件4的目标部分与待操作表面之间的距离Ha小于操作工件4的参照部分与待操作表面之间的距离Hb，此时生成用于控制间距补偿单元2的厚度增加△Hab的控制信号，继而间距补偿单元2在接收到该控制信号后能够调整自身的厚度增加△Hab，使得操作工件4的目标部分与参照部分相对于待操作表面的距离相等，请参考图3。
在间距补偿单元2的数量为多个时，间距补偿单元2的数量越多，间距补偿的效果越好，即间距补偿后的操作工件4与被测工件5相对的两个面的形状匹配度越高。
控制系统1能够根据各间距补偿单元2对应的传感器6测量的距离，得到各间距补偿单元2对应的目标部分与被测工件5之间的距离。
控制系统1用于控制每个间距补偿单元2对对应的目标部分与被测工件5之间的距离进行调整，调整后的各间距补偿单元2对应的目标部分与被测工件5之间的距离相等，以使操作工件4与被测工件5相对的两个面的形状匹配。
在一个例子中，控制系统1用于基于各间距补偿单元2对应的目标部分与被测工件5之间的距离与参考目标间距值之间的差值，生成各间距补偿单元2对应的用于控制距离等于参考目标间距值的控制信号；间距补偿单元2用于根据接收到的控制信号，调整对应的目标部分与被测工件5之间的距离等于参考目标间距值。
控制系统1用于在存在任一间距补偿单元2对应的目标部分与被测工件5之间的距离小于预设目标间距值时，选取小于预设目标间距值的目标部分与被测工件之间的距离作为参考目标间距值。
控制系统1用于在不存在任一间距补偿单元2对应的目标部分与被测工件5之间的距离小于预设目标间距值时，控制第一支撑层3带动操作工件4朝向被测工件5运动，以使任一间距补偿单元2对应的目标部分与被测工件5之间的距离小于预设目标间距值。
以图4的操作装置为例，多个间距补偿单元2相当于将操作工件4划分为了多个目标部分，控制系统1在接收到所有的传感器6发送的距离后，对于每个间距补偿单元2，基于与该间距补偿单元2对应的3个传感器所测量得到的距离，计算得到该间距补偿单元2所对应的操作工件4上的目标部分与被测工 件5之间的距离，由此能够得到操作工件4的各个目标部分与被测工件5之间的距离，各目标部分与被测工件之间的距离值的变化，反应了被测工件5的待操作表面的起伏变化与操作工件4的下表面的起伏变化。
控制系统1中预设了一个目标间距值，预设目标间距值为操作工件4对被测工件5进行测量或加工的有效距离；若存在任一目标部分与被测工件5之间的距离小于预设目标间距值，则可以从中选取一个小于预设目标间距值的距离作为参考目标间距值。
若不存在任一目标部分与被测工件5之间的距离小于预设目标间距值，则说明操作工件4整体距离被测工件5较远，此时仅通过间距补偿单元2无法使得操作工件4进入对被测工件5进行测量或加工的有效距离；控制系统1先通过第一支撑层3内置的驱动装置，或者与第一支撑层3连接驱动装置，驱动第一支撑层3带动操作工件4朝向被测工件5，使得操作工件4整体接近被测工件5，并在运动过程中持续进行距离检测，直至操作工件4的至少一个目标部分与被测工件5之间的距离小于预设目标间距值。当存在任一目标部分与被测工件5之间的距离小于预设目标间距值时，则可以从中选取一个小于预设目标间距值的距离作为参考目标间距值。
控制系统1在选定了参考目标间距值后，将各目标部分与被测工件5之间的距离减去该参考目标间距值，得到各目标部分待调整的距离差值，控制信号会基于各目标部分待调整的距离差值，生成各目标部分对应的控制信号，并将各目标部分对应的控制信号分别发送与各目标部分对应的间距补偿单元2，各间距补偿单元2则会根据接收到的控制信号对自身的厚度进行调整，使得对应的目标部分与被测工件5之间的距离等于参考目标间距值。
以图4中的间距补偿单元2A为例，将间距补偿单元2H与被测工件5的表面之间的距离作为参考目标间距值Hc，间距补偿单元2A对应的目标部分与被测工件5之间的距离即为H1，控制系统1计算距离H1减去参考目标间距值Hc的差值△H1c，差值△H1c表征了该间距补偿单元2A所需调整的厚度，当△H1c大于0时，说明该间距补偿单元2A对应的目标部分与被测工件5之间的距离H1大于参考目标间距值Hc，此时生成用于控制间距补偿单元2A的厚度减小△H1c的控制信号，继而间距补偿单元2A在接收到该控制信号后能够调整自 身的厚度减小△H1c，使得该间距补偿单元2A对应的目标部分与被测工件5之间的距离H1等于参考目标间距值Hc；当△H1c小于0时，说明该间距补偿单元2A对应的目标部分与被测工件5之间的距离H1小于参考目标间距值Hc，此时生成用于控制间距补偿单元2A的厚度增加△H1c的控制信号，继而间距补偿单元2A在接收到该控制信号后能够调整自身的厚度增加△H1c b，使得该间距补偿单元2A对应的目标部分与被测工件5之间的距离Ha等于参考目标间距值Hc。
重复上述过程，能够使得各个间距补偿单元2(间距补偿单元2B至间距补偿单元2G)所对应的目标部分与被测工件5之间的距离均等于参考目标间距值Hc，由此实现了对操作工件4所包含的多个目标部分的分布式距离补偿，使得操作工件4的下表面与被测工件5的待操作表面的形状匹配，请参考图5。
本实施例中，间距补偿单元2由以下任意之一组成：压电元件、热膨胀元件以及平板电容。
在间距补偿单元2由压电元件构成时，压电元件可以根据被施加的电压在厚度方向上(即垂直方向)产生形变，此时控制系统1能够基于间距补偿单元2所需调整的厚度变化量生成相应电压的控制信号，该电压被施加到压电元件上，使得压电元件的厚度发生变化，即能够对间距补偿单元2对应的目标部分与被测工件5之间的距离进行调整。
在间距补偿单元2由热膨胀元件以及与热膨胀元件相邻设置的加热元件构成时，热膨胀元件能够根据温度在厚度方向上(即垂直方向)产生形变，此时控制系统1基于间距补偿单元2所需调整的厚度变化量生成相应电压的控制信号，该控制信号被施加到加热元件上，由此可以控制加热元件的温度，继而加热元件能够将热膨胀元件进行加热，使得热膨胀元件的厚度产生变化，即能够对间距补偿单元2对应的目标部分与被测工件5之间的距离进行调整。
在间距补偿单元2由平板电容构成时，平板电容的两个平板的间距可以根据被施加的电压在厚度方向上(即垂直方向)产生变化，由此控制系统1能够基于间距补偿单元2所需调整的厚度变化量生成相应电压的控制信号，该电压被施加到平板电容上，使得平板电容的两个平板的间距产生相应的变化，从而能够调节第一工件32在垂直方向上的高度，即能够对间距补偿单元2对应的 目标部分与被测工件5之间的距离进行调整。
本实施例提供了一种操作装置，包括：控制系统、至少一个间距补偿单元、第一支撑层、操作工件，以及设置在所述操作工件上且朝向被测工件的多个传感器，控制系统与各间距补偿单元通信连接、控制系统与各传感器通信连接；第一支撑层与操作工件通过间距补偿单元固定在一起；第二支撑层与被测工件固定在一起；每个间距补偿单元对应于至少一个传感器，每个间距补偿单元与操作工件的一部分在空间上重叠，与间距补偿单元对应的传感器设置在操作工件与间距补偿单元重叠的部分上；传感器能够测量操作工件与被测工件待操作表面上的对应位置之间的距离，控制系统则能够根据各传感器测量得到的距离，控制各间距补偿单元对操作工件上对应的目标部分与被测工件之间的距离进行调整，目标部分为操作工件与间距补偿单元重叠的部分，调整后的操作工件与被测工件相对的两个面的形状匹配。即能够将操作工件的下表面分为多个部分进行分布式间距补偿，分布式间距补偿后的操作工件与被测工件相对的两个面的形状匹配，使得操作工件的下表面与被测工件的待操作表面之间的距离保持相对一致，便于操作工件对被测工件进行测量或加工等操作，提升了操作工件的测量和加工精度。
本申请的第二实施例涉及一种操作装置，用于对待操作样品进行测量或加工操作，待操作样品例如为晶圆、硅片、石英片等，以样品为晶圆为例，操作装置能够对晶圆表面的三维形貌进行测量、对晶圆表面的光刻胶进行加工、对晶圆表面进行纳米压印操作等。
请参考图1、图9至图12，操作装置包括：控制系统1、至少一个间距补偿单元2、第一支撑层3以及多个传感器6。其中，所述多个传感器6朝向固定在第二支撑层7上的被测工件5，被测工件5即为待操作样品。控制系统1可以为包括控制器、处理器等的电脑主机、笔记本电脑等，传感器6可以为具有测距功能的传感器，例如为光子传感器、激光测距传感器、电子传感器、离子传感器或原子力传感器等。需要说明的是，本实施例以及之后的实施例中均以操作工件4位于被测工件5的正上方为例进行说明。
本实施例中，以多个传感器6为多个探针为例，多个传感器6形成面 可以为多个探针的针尖所形成的面；多个探针能够对被测工件5上的待操作表面的三维形貌进行扫描测量，此时操作装置能够对样品(例如为晶圆、硅片、石英片等)的待操作表面进行物理量和化学量的测量、扫描探针光刻(Scanning probe lithography，SPL)、产生电子、产生光子，还有利用探针引入离子对待操作表面进行离子注入等。
控制系统1与各间距补偿单元2通信连接、控制系统1与各传感器6通信连接；每个间距补偿单元2对应于至少一个传感器6，即每个间距补偿单元2对应的传感器6的数量可以为一个或多个；间距补偿单元2的一面固定在第一支撑层3上，间距补偿单元2的另一面固定有对应的传感器6；由此，每个间距补偿单元2朝向被测工件5的面上均固定有对应的传感器6，当存在与任一间距补偿单元2均不对应的传感器6时，可以在操作装置的第一支撑层3的下表面上设置支撑辅件8，支撑辅件8的厚度与间距补偿单元2的初始厚度相同，支撑辅件8朝向被测工件5的面上固定有与任一间距补偿单元2均不对应的传感器6。
如图9与图10所示，间距补偿单元2的数量为1个，间距补偿单元2固定在第一支撑层3上，将多个传感器6平均分为两部分(图中以传感器6的数量为24个为例)，第一部分所包含的12个传感器6与间距补偿单元2对应，第一部分包含的传感器6固定在间距补偿单元2朝向被测工件5的面上，第二部分所包含的12个传感器6则固定在支撑辅件8朝向被测工件5的面上。
如图11与图12所示，间距补偿单元2的数量为多个，多个间距补偿单元2可以均匀分布在第一支撑层3上，即多个间距补偿单元2均匀设置在第一支撑层3的下表面上，相邻的间距补偿单元2之间存在间隙，各间距补偿单元2对应的传感器6的数量可以相等或不相等，每个传感器6均对应于一个间距补偿单元2，各传感器6固定在操作工件4的下表面上与传感器6对应的间距补偿单元2在空间上重叠的部分；图11与图12中，以各间距补偿单元2对应的传感器6的数量均为3个为例，图11与图12中以间距补偿单元2的数量为8个为例，分别记为间距补偿单元2A至2H。
本实施例中，传感器6能够测量对应的间距补偿单元2与被测工件5上的对应位置之间的距离。具体的，传感器6为探针，则传感器6能够测量探针的 针尖与被测工件上的对应位置之间的距离；若间距补偿单元2仅对应于一个传感器6，则该传感器6测量得到的距离，即为间距补偿单元2与被测工件5之间的距离；若间距补偿单元2对应于多个传感器6，则可以计算这多个传感器6测量得到的距离均值，作为该间距补偿单元2与被测工件5之间的距离。
其中，传感器6对应的被测工件5待操作表面上的位置为被测工件5待操作表面上的一个表面区域，每个传感器6对应的表面区域位于该传感器6的正下方，即每个传感器6用于测量对应的间距补偿单元2与被测工件5的待操作表面上对应的表面区域之间的距离，各传感器6会将测量得到的距离发送给控制系统1。表面区域可以为以下任意一种：一个像素点、由多个像素点形成的线和由多个像素点组合的面；即被测工件5的待操作表面上的表面区域可以按照像素点划分，每个像素点作为一个表面区域；或者，被测工件5的待操作表面上的表面区域按照线进行划分，每个表面区域为由相邻的多个像素点形成的线；或者，被测工件5的待操作表面上的表面区域按照面进行划分，每个表面区域为由相邻的多个像素点组合形成的面。
控制系统1用于根据各传感器6测量得到的距离，控制调整各间距补偿单元2与被测工件5之间的距离，以使由多个传感器6形成的面与被测工件5的待操作表面的形状匹配。
由于多个传感器6形成的面的形状与被测工件5的待操作表面的形状相匹配，控制系统在控制第一支撑层3在垂直方向上进行上下调整时，仍然能够保持多个传感器6形成的面相对于被测工件5的待操作表面的距离一致，便于操作装置利用多个传感器6对被测工件5进行测量或加工等操作。下面对间距补偿过程进行详细说明，具体如下：
在间距补偿单元2的数量为1个时，请参考图9，控制系统1在接收到所有的传感器6测量的距离后，基于与间距补偿单元2对应的第一部分所包含的12个传感器6测量的距离，能够得到间距补偿单元2与被测工件5之间的距离，例如计算与间距补偿单元2对应的多个传感器6测量的距离的均值作为该间距补偿单元2与被测工件5之间的距离Ha；第二部分所包含的12个传感器6则固定在支撑辅件8朝向被测工件5的面上，由此能够基于第二部分所包含的12个传感器6测量的距离，得到支撑辅件8与被测工件5之间的距离Hb；控制系 统1将距离Ha减去距离Hb，能够得到间距补偿单元2与支撑辅件8相对于被测工件5的待操作表面之间的距离差△Hab，这个距离差反应了多个传感器6所形成的面的起伏与被测工件5的待操作表面的起伏，由于第一部分所包含的12个传感器6与间距补偿单元2固定在一起，由此可以通过调整该间距补偿单元2的厚度，对第一部分所包含的12个传感器6形成的面与被测工件5的待操作表面之间的距离进行调整，以第一部分所包含的12个传感器6形成的面与第二部分所包含的12个传感器6形成的面相对于待操作表面的距离相等；具体的，当△Hab大于0时，说明间距补偿单元2与待操作表面之间的距离Ha大于支撑辅件8与待操作表面之间的距离Hb，此时生成用于控制间距补偿单元2的厚度减小△Hab的控制信号，继而间距补偿单元2在接收到该控制信号后能够调整自身的厚度减小△Hab，使得第一部分所包含的12个传感器6形成的面与第二部分所包含的12个传感器6形成的面相对于待操作表面的距离相等；当△Hab小于0时，说明间距补偿单元2与待操作表面之间的距离Ha小于支撑辅件8与待操作表面之间的距离Hb，此时生成用于控制间距补偿单元2的厚度增大△Hab的控制信号，继而间距补偿单元2在接收到该控制信号后能够调整自身的厚度增大△Hab，使得第一部分所包含的12个传感器6形成的面与第二部分所包含的12个传感器6形成的面相对于待操作表面的距离相等，请参考图10。
在间距补偿单元2的数量为多个时，间距补偿单元2的数量越多，间距补偿的效果越好，即间距补偿后的多个传感器6所形成的面与被测工件5的待操作表面的形状匹配度越高。其中，可以设置每个传感器6对应于一个间距补偿单元2，此时无需在操作装置中设置支撑辅件8。
控制系统1能够根据各间距补偿单元2对应的传感器6测量的距离，得到各间距补偿单元2与被测工件5之间的距离。
控制系统1用于控制各间距补偿单元2调整到与被测工件5之间的距离相等，以使由多个传感器6形成的面与被测工件5的待操作表面的形状匹配。
在一个例子中，控制系统1用于基于各间距补偿单元2与被测工件5之间的距离与参考目标间距值之间的差值，生成各间距补偿单元2对应的用于控制距离等于参考目标间距值的控制信号。
间距补偿单元2用于根据接收到的控制信号，调整与被测工件5之间的距离等于参考目标间距值。
控制系统1用于在存在任一间距补偿单元2与被测工件5之间的距离小于预设目标间距值时，选取小于预设目标间距值的间距补偿单元2与被测工件5之间的距离作为参考目标间距值。
控制系统1用于在不存在任一间距补偿单元2与被测工件5之间的距离小于预设目标间距值时，控制第一支撑层带动间距补偿单元2朝向被测工件5运动，以使任一间距补偿单元1与被测工件5之间的距离小于预设目标间距值。
以图11的操作装置为例，控制系统1在接收到所有的传感器6发送的距离后，对于每个间距补偿单元2，基于与该间距补偿单元2对应的3个传感器所测量得到的距离，计算得到该间距补偿单元2与被测工件5之间的距离，由此能够得到各间距补偿单元2与被测工件5之间的距离，各间距补偿单元2与被测工件5之间的距离值的变化，反应了被测工件5的待操作表面的起伏变化与多个传感器6形成的面的起伏变化。
控制系统1中预设了一个目标间距值，预设目标间距值为操作装置对被测工件5进行测量或加工的有效距离；若存在任一间距补偿单元2与被测工件5之间的距离小于预设目标间距值，则可以从中选取一个小于预设目标间距值的距离作为参考目标间距值。
若不存在任一间距补偿单元2与被测工件5之间的距离小于预设目标间距值，则说明第一支撑层3上的多个传感器6整体距离被测工件5较远，此时仅通过间距补偿单元2无法使得多个传感器6进入对被测工件5进行测量或加工的有效距离；控制系统1先通过第一支撑层3内置的驱动装置，或者与第一支撑层3连接驱动装置，驱动第一支撑层3带动多个间距补偿单元2朝向被测工件5，使得多个间距补偿单元2整体接近被测工件5，并在运动过程中持续进行距离检测，直至至少一个间距补偿单元2与被测工件5之间的距离小于预设目标间距值。当存在任一间距补偿单元2与被测工件5之间的距离小于预设目标间距值时，则可以从中选取一个小于预设目标间距值的距离作为参考目标间距值。
控制系统1在选定了参考目标间距值后，将各间距补偿单元2与被测工件 5之间的距离减去该参考目标间距值，得到各间距补偿单元2待调整的距离差值，控制信号会基于各间距补偿单元2待调整的距离差值，生成各间距补偿单元2对应的控制信号，并将各控制信号分别发送到对应的间距补偿单元2，各间距补偿单元2则会根据接收到的控制信号对自身的厚度进行调整，使得间距补偿单元2与被测工件5之间的距离等于参考目标间距值。
以图11中的间距补偿单元2A为例，将间距补偿单元2H与被测工件5的表面之间的距离作为参考目标间距值Hc，该间距补偿单元2A与被测工件5之间的距离即为H1，控制系统1计算距离H1减去参考目标间距值Hc的差值△H1c，差值△H1c表征了该间距补偿单元2A所需调整的厚度，当△H1c大于0时，说明该间距补偿单元2A与被测工件5之间的距离H1大于参考目标间距值Hc，此时生成用于控制间距补偿单元2A的厚度减小△H1c的控制信号，继而间距补偿单元2A在接收到该控制信号后能够调整自身的厚度减小△H1c，使得该间距补偿单元2A与被测工件5之间的距离H1等于参考目标间距值Hc；当△H1c小于0时，说明该间距补偿单元2A与被测工件5之间的距离H1小于参考目标间距值Hc，此时生成用于控制间距补偿单元2A的厚度增加△H1c的控制信号，继而间距补偿单元2A在接收到该控制信号后能够调整自身的厚度增加△H1c b，使得该间距补偿单元2A与被测工件5之间的距离Ha等于参考目标间距值Hc。
重复上述过程，能够使得各个间距补偿单元2(间距补偿单元2B至间距补偿单元2G)与被测工件5之间的距离均等于参考目标间距值Hc，各间距补偿单元2上的传感器形成的面被测工件5的待操作表面的距离相等，由此实现了多个间距补偿单元2的分布式距离补偿，使得多个传感器6形成的面与被测工件5的待操作表面的形状匹配，请参考图12。
本实施例中，间距补偿单元2由以下任意之一组成：压电元件、热膨胀元件以及平板电容。
在间距补偿单元2由压电元件构成时，压电元件可以根据被施加的电压在厚度方向上(即垂直方向)产生形变，此时控制系统1能够基于间距补偿单元2所需调整的厚度变化量生成相应电压的控制信号，该电压被施加到压电元件上，使得压电元件的厚度发生变化，即能够对间距补偿单元2与被测工件5之 间的距离进行调整。
在间距补偿单元2由热膨胀元件以及与热膨胀元件相邻设置的加热元件构成时，热膨胀元件能够根据温度在厚度方向上(即垂直方向)产生形变，此时控制系统1基于间距补偿单元2所需调整的厚度变化量生成相应电压的控制信号，该控制信号被施加到加热元件上，由此可以控制加热元件的温度，继而加热元件能够将热膨胀元件进行加热，使得热膨胀元件的厚度产生变化，即能够对间距补偿单元2与被测工件5之间的距离进行调整。
在间距补偿单元2由平板电容构成时，平板电容的两个平板的间距可以根据被施加的电压在厚度方向上(即垂直方向)产生变化，由此控制系统1能够基于间距补偿单元2所需调整的厚度变化量生成相应电压的控制信号，该电压被施加到平板电容上，使得平板电容的两个平板的间距产生相应的变化，从而能够调节第一工件32在垂直方向上的高度，即能够对间距补偿单元2与被测工件5之间的距离进行调整。
本实施例提供了一种操作装置，包括：控制系统、至少一个间距补偿单元、第一支撑层、第二支撑层、被测工件以及多个传感器，控制系统与各间距补偿单元通信连接、控制系统与各传感器通信连接；每个间距补偿单元对应于至少一个传感器，间距补偿单元的一面固定在第一支撑层上，间距补偿单元的另一面固定有对应的传感器；传感器用于测量对应的间距补偿单元与被测工件上的对应位置之间的距离；控制系统用于根据各传感器测量得到的距离，控制调整各间距补偿单元与被测工件之间的距离，经过调整后，由多个传感器形成的面与被测工件的待操作表面的形状匹配。即能够将多个传感器形成的面分为多个部分进行分布式间距补偿，分布式间距补偿后的多个传感器形成的面与被测工件的待操作表面的形状匹配，使得多个传感器所形成的面与被测工件的待操作表面之间的距离保持相对一致，便于操作装置利用多个传感器对被测工件进行测量或加工等操作，提升了对被测工件进行测量和加工的精度。
本申请第三实施例涉及一种两个工件之间的分布式间距补偿方法，应用于第一实施例中的操作装置。操作装置可以采用本实施例中的两个工件之间的分布式间距补偿方法进行垂直间距补偿。
本实施例的两个工件之间的分布式间距补偿方法的具体流程如图13所示。
步骤101，通过多个传感器测量操作工件与被测工件待操作表面上的对应位置之间的距离。
步骤102，根据各传感器测量得到的距离，控制各间距补偿单元对操作工件上对应的目标部分与被测工件之间的距离进行调整，以使操作工件与被测工件相对的两个面的形状匹配；目标部分为操作工件与间距补偿单元重叠的部分。
由于第一实施例与本实施例相互对应，因此本实施例可与第一实施例互相配合实施。第一实施例中提到的相关技术细节在本实施例中依然有效，在第一实施例中所能达到的技术效果在本实施例中也同样可以实现，为了减少重复，这里不再赘述。相应地，本实施例中提到的相关技术细节也可应用在第一实施例中。
本实施例中，操作装置中的传感器能够测量操作工件与被测工件待操作表面上的对应位置之间的距离，控制系统则能够根据各传感器测量得到的距离，控制各间距补偿单元对操作工件上对应的目标部分与被测工件之间的距离进行调整，目标部分为操作工件与间距补偿单元重叠的部分，调整后的操作工件与被测工件相对的两个面的形状匹配。即能够将操作工件的下表面分为多个部分进行分布式间距补偿，分布式间距补偿后的操作工件与被测工件相对的两个面的形状匹配，使得操作工件的下表面与被测工件的待操作表面之间的距离保持相对一致，便于操作工件对被测工件进行测量或加工等操作，提升了操作工件的测量和加工精度。
本申请第四实施例涉及一种两个工件之间的分布式间距补偿方法，应用于第二实施例中的操作装置。
本实施例的两个工件之间的分布式间距补偿方法的具体流程如图14所示。
步骤201，通过多个传感器测量对应的间距补偿单元与被测工件待操作表面上的对应位置之间的距离。
步骤202，根据各传感器测量得到的距离，控制各间距补偿单元对间距补偿单元与被测工件之间的距离进行调整，以使由多个传感器形成的面与被测工件的待操作表面的形状匹配。
由于第二实施例与本实施例相互对应，因此本实施例可与第二实施例互相配合实施。第二实施例中提到的相关技术细节在本实施例中依然有效，在第二实施例中所能达到的技术效果在本实施例中也同样可以实现，为了减少重复，这里不再赘述。相应地，本实施例中提到的相关技术细节也可应用在第二实施例中。
本实施例中，操作装置中的传感器用于测量对应的间距补偿单元与被测工件上的对应位置之间的距离；控制系统用于根据各传感器测量得到的距离，控制调整各间距补偿单元与被测工件之间的距离，经过调整后，由多个传感器形成的面与被测工件的待操作表面的形状匹配。即能够将多个传感器形成的面分为多个部分进行分布式间距补偿，分布式间距补偿后的多个传感器形成的面与被测工件的待操作表面的形状匹配，使得多个传感器所形成的面与被测工件的待操作表面之间的距离保持相对一致，便于操作装置利用多个传感器对被测工件进行测量或加工等操作，提升了对被测工件进行测量和加工的精度。
以上已详细描述了本申请的较佳实施例，但应理解到，若需要，能修改实施例的方面来采用各种专利、申请和出版物的方面、特征和构思来提供另外的实施例。
考虑到上文的详细描述，能对实施例做出这些和其它变化。一般而言，在权利要求中，所用的术语不应被认为限制在说明书和权利要求中公开的具体实施例，而是应被理解为包括所有可能的实施例连同这些权利要求所享有的全部等同范围。

Claims (18)

  1. 一种操作装置，其特征在于，包括：控制系统、至少一个间距补偿单元、第一支撑层、操作工件，以及设置在所述操作工件上且朝向被测工件的多个传感器；所述被测工件固定在第二支撑层上，所述控制系统与各所述间距补偿单元通信连接、所述控制系统与各所述传感器通信连接；所述第一支撑层与所述操作工件通过所述间距补偿单元固定在一起；
    每个所述间距补偿单元对应于至少一个所述传感器，每个所述间距补偿单元与所述操作工件的一部分在空间上重叠，与所述间距补偿单元对应的所述传感器设置在所述操作工件与所述间距补偿单元重叠的部分上；
    所述传感器用于测量所述操作工件与所述被测工件待操作表面上的对应位置之间的距离；
    所述控制系统用于根据各所述传感器测量得到的距离，控制各所述间距补偿单元对所述操作工件上对应的目标部分与所述被测工件之间的距离进行调整，以使所述操作工件与所述被测工件相对的两个面的形状匹配；所述目标部分为所述操作工件与所述间距补偿单元重叠的部分。
  2. 根据权利要求1所述的操作装置，其特征在于，所述间距补偿单元的数量为多个，每个所述传感器对应于一个所述间距补偿单元；
    所述控制系统用于根据各所述间距补偿单元对应的所述传感器测量的距离，得到各所述间距补偿单元对应的所述目标部分与所述被测工件之间的距离；
    所述控制系统用于控制每个所述间距补偿单元对对应的所述目标部分与所述被测工件之间的距离进行调整，调整后的各所述间距补偿单元对应的所述目标部分与所述被测工件之间的距离相等，以使所述操作工件与所述被测工件相对的两个面的形状匹配。
  3. 根据权利要求2所述的操作装置，其特征在于，所述控制系统用于基于各所述间距补偿单元对应的所述目标部分与所述被测工件之间的距离与参考目标间距值之间的差值，生成各所述间距补偿单元对应的用于控制距离等于所述参考目标间距值的控制信号；
    所述间距补偿单元用于根据接收到的所述控制信号，调整对应的所述目标 部分与所述被测工件之间的距离等于所述参考目标间距值。
  4. 根据权利要求3所述的操作装置，其特征在于，所述控制系统用于在存在任一所述间距补偿单元对应的所述目标部分与所述被测工件之间的距离小于预设目标间距值时，选取小于所述预设目标间距值的所述目标部分与所述被测工件之间的距离作为所述参考目标间距值；
    所述控制系统用于在不存在任一所述间距补偿单元对应的所述目标部分与所述被测工件之间的距离小于预设目标间距值时，控制所述第一支撑层带动所述操作工件朝向所述被测工件运动，以使任一所述间距补偿单元对应的所述目标部分与所述被测工件之间的距离小于预设目标间距值。
  5. 根据权利要求2所述的操作装置，其特征在于，多个所述间距补偿单元设置在所述操作工件与所述第一支撑层之间，多个所述间距补偿单元均匀分布在所述操作工件上。
  6. 根据权利要求1所述的操作装置，其特征在于，所述操作工件为探针层，多个所述传感器为设置在所述探针层的多个探针。
  7. 根据权利要求1所述的操作装置，其特征在于，各所述间距补偿单元对应于相同数量的所述传感器。
  8. 根据权利要求1至7中任一项所述的操作装置，其特征在于，所述间距补偿单元由以下任意之一组成：压电元件、热膨胀元件以及平板电容。
  9. 一种操作装置，其特征在于，包括：控制系统、至少一个间距补偿单元、第一支撑层、以及多个传感器，所述多个传感器朝向固定在第二支撑层上的被测工件；
    所述控制系统与各所述间距补偿单元通信连接、所述控制系统与各所述传感器通信连接；每个所述间距补偿单元对应于至少一个所述传感器，所述间距补偿单元的一面固定在所述第一支撑层上，所述间距补偿单元的另一面固定有对应的所述传感器；
    所述传感器用于测量对应的所述间距补偿单元与所述被测工件上的对应位置之间的距离；
    所述控制系统用于根据各所述传感器测量得到的距离，控制调整各所述间距补偿单元与所述被测工件之间的距离，以使由所述多个传感器形成的面与所 述被测工件的待操作表面的形状匹配。
  10. 根据权利要求9所述的操作装置，其特征在于，所述间距补偿单元的数量为多个，每个所述传感器对应于一个所述间距补偿单元；
    所述控制系统用于根据各所述间距补偿单元对应的所述传感器测量的距离，得到各所述间距补偿单元与所述被测工件之间的距离；
    所述控制系统用于控制各所述间距补偿单元调整到与所述被测工件之间的距离相等，以使由所述多个传感器形成的面与所述被测工件的待操作表面的形状匹配。
  11. 根据权利要求10所述的操作装置，其特征在于，所述控制系统用于基于各所述间距补偿单元与所述被测工件之间的距离与参考目标间距值之间的差值，生成各所述间距补偿单元对应的用于控制距离等于所述参考目标间距值的控制信号；
    所述间距补偿单元用于根据接收到的所述控制信号，调整与所述被测工件之间的距离等于所述参考目标间距值。
  12. 根据权利要求11所述的操作装置，其特征在于，所述控制系统用于在存在任一所述间距补偿单元与所述被测工件之间的距离小于预设目标间距值时，选取小于所述预设目标间距值的所述间距补偿单元与所述被测工件之间的距离作为所述参考目标间距值；
    所述控制系统用于在不存在任一所述间距补偿单元与所述被测工件之间的距离小于预设目标间距值时，控制所述第一支撑层带动所述间距补偿单元朝向所述被测工件运动，以使任一所述间距补偿单元与所述被测工件之间的距离小于预设目标间距值。
  13. 根据权利要求9所述的操作装置，其特征在于，多个所述间距补偿单元均匀分布在所述第一支撑层上。
  14. 根据权利要求9所述的操作装置，其特征在于，各所述间距补偿单元对应于相同数量的所述传感器。
  15. 根据权利要求9所述的操作装置，其特征在于，多个所述传感器为多个探针。
  16. 根据权利要求9至15所述的操作装置，其特征在于，所述间距补偿 单元由以下任意之一组成：压电元件、热膨胀元件以及平板电容。
  17. 一种两个工件之间的分布式间距补偿方法，其特征在于，应用于权利要求1至8中任一项所述的操作装置，所述方法包括：
    通过多个传感器测量操作工件与被测工件待操作表面上的对应位置之间的距离；
    根据各所述传感器测量得到的距离，控制各间距补偿单元对操作工件上对应的目标部分与所述被测工件之间的距离进行调整，以使所述操作工件与所述被测工件相对的两个面的形状匹配；所述目标部分为所述操作工件与所述间距补偿单元重叠的部分。
  18. 一种两个工件之间的分布式间距补偿方法，其特征在于，应用于权利要求9至16中任一项所述的操作装置，所述方法包括：
    通过多个传感器测量对应的间距补偿单元与所述被测工件待操作表面上的对应位置之间的距离；
    根据各所述传感器测量得到的距离，控制各所述间距补偿单元对所述间距补偿单元与所述被测工件之间的距离进行调整，以使由所述多个传感器形成的面与所述被测工件的待操作表面的形状匹配。
PCT/CN2023/076068 2022-02-17 2023-02-15 操作装置与两个工件之间的分布式间距补偿方法 WO2023155788A1 (zh)

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