WO2023134355A1 - 一种闪光玻璃及其制备方法和电子设备壳体 - Google Patents

一种闪光玻璃及其制备方法和电子设备壳体 Download PDF

Info

Publication number
WO2023134355A1
WO2023134355A1 PCT/CN2022/137990 CN2022137990W WO2023134355A1 WO 2023134355 A1 WO2023134355 A1 WO 2023134355A1 CN 2022137990 W CN2022137990 W CN 2022137990W WO 2023134355 A1 WO2023134355 A1 WO 2023134355A1
Authority
WO
WIPO (PCT)
Prior art keywords
frosting
parts
area
glass
etching
Prior art date
Application number
PCT/CN2022/137990
Other languages
English (en)
French (fr)
Inventor
杨经杰
罗富华
袁涛
马兰
Original Assignee
比亚迪股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 比亚迪股份有限公司 filed Critical 比亚迪股份有限公司
Publication of WO2023134355A1 publication Critical patent/WO2023134355A1/zh

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04M—TELEPHONIC COMMUNICATION
    • H04M1/00—Substation equipment, e.g. for use by subscribers
    • H04M1/02—Constructional features of telephone sets
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K5/00—Casings, cabinets or drawers for electric apparatus
    • H05K5/02—Details
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K5/00—Casings, cabinets or drawers for electric apparatus
    • H05K5/02—Details
    • H05K5/0217—Mechanical details of casings
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00—Technologies relating to the processing of minerals
    • Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57—Improving the yield, e-g- reduction of reject rates

Definitions

  • the present application relates to the technical field of glass processing, in particular to a flash glass, a preparation method thereof, and an electronic device casing.
  • Glass is a commonly used housing material for electronic devices, for example, it can be used as a cover plate, a back plate, and the like.
  • the appearance of glass currently on the market is relatively monotonous, which cannot meet the aesthetic needs of diverse users, and the product competitiveness is weak.
  • the present application provides a kind of flashing glass, which can present various flashing effects with different flashing degrees, which can improve the appearance expressiveness of the housing of electronic equipment using the flashing glass and enhance product competitiveness.
  • the present application provides a flash glass, which includes a glass body, the glass body includes a textured first surface, and the first surface includes a plurality of first frosted areas distributed at intervals. Two adjacent first frosting areas are connected by a second frosting area, and the first frosting area and the second frosting area are straight strips, wherein the first frosting area The area has a plurality of first raised structures, the second frosted area has a plurality of second raised structures, the first raised structures and the second raised structures independently include at least one edge, and the Both the height and the length of the second protruding structure are smaller than the first protruding structure.
  • the first surface of the above-mentioned flashing glass has a frosting effect, and has two kinds of straight frosting areas arranged alternately, and the heights and lengths of the raised structures constituting the two frosting areas are different.
  • two kinds of raised structures with at least one edge can reflect light in different directions, thereby producing a shimmering appearance effect, and can present a variety of shimmering effects with different degrees of shimmering, greatly improving the appearance Effect.
  • the application provides a method for preparing flash glass, comprising the following steps:
  • the first raised structures include at least one edge;
  • the photoresist patterns are strip-shaped
  • the raised structure includes at least one edge, and the height and length of the second raised structure are smaller than the first raised structure.
  • the preparation method of the above-mentioned flashing glass is easy to operate, and the flashing glass prepared by the method has a frosting effect, and can present various flashing effects with different degrees of flashing under light, which improves the visual perception of users.
  • the present application provides an electronic device casing, comprising the flash glass described in the first aspect of the present application, or the flash glass prepared by the preparation method described in the second aspect of the present application.
  • the housing of electronic equipment containing the above-mentioned flashing glass has a cool appearance effect, and can improve the appearance performance and product competitiveness of electronic equipment.
  • Fig. 1 is a photomicrograph of a flash glass provided by an embodiment of the present application.
  • Fig. 2 is a schematic cross-sectional structure diagram of a flash glass provided in an embodiment of the present application.
  • Fig. 3 is a flow chart of a preparation of flash glass provided by an embodiment of the present application.
  • FIG. 4 is a metallographic microscope photo of the glass body after the first frost etching provided in Example 1 of the present application.
  • FIG. 5 is a photomicrograph of a metallographic microscope after forming a photoresist pattern on the surface of the glass body in FIG. 4 .
  • Fig. 6 is a metallographic microscope photo of the flash glass obtained after the glass body glass in Fig. 5 is subjected to frost etching for the second time.
  • FIG. 7 is an appearance effect diagram of the flash glass of Example 1 of the present application.
  • FIG. 8 is an appearance rendering of the glass body in FIG. 4 .
  • FIG. 9 is an appearance effect diagram of the flash glass in Example 5 of the present application.
  • Fig. 2 is a metallographic microscope photo of the flash glass provided by an embodiment of the present application.
  • Fig. 2 is a schematic cross-sectional structure diagram of a flash glass provided in an embodiment of the present application. Please refer to FIG. 1 and FIG. 2 together.
  • the flash glass 100 provided by the embodiment of the present application includes a glass body 10, the glass body 10 has a first surface 10a, and the first surface 10a includes a plurality of first frosting regions 101 distributed at intervals, Two adjacent first frosting areas 101 are connected by a second frosting area 102, and the first frosting area 101 and the second frosting area 102 are straight strips, wherein the first frosting area 101 has A plurality of first raised structures 11, the second frosted area 102 has a plurality of second raised structures 12, the first raised structures 11 and the second raised structures 12 independently include at least one edge, and the second raised structures Both the height and the length of the structure 12 are smaller than the first protruding structure 11 .
  • the first protrusion structure may be referred to as "large protrusion”
  • the second protrusion structure may be referred to as "small protrusion”.
  • the first surface 10a of the above-mentioned flashing glass has two kinds of straight frosted regions arranged alternately. The heights and lengths of the raised structures constituting the two frosted regions are different.
  • the first surface has a frosted effect, and when the light When the first surface of the flashing glass is irradiated, the two kinds of convex structures having at least one edge can reflect the light irradiated on the sides of each edge, and because the angles of the sides of each edge are different, reflected light in different directions can be generated, In this way, a sparkling appearance effect is produced, and with the help of the compound superposition of reflected light on the two raised structures, various flashing effects with different flashing degrees can be presented, which improves the multi-layeredness and agility of the flashing effect, and enriches the The visual effect of the shimmering glass enhances the aesthetics of the exterior.
  • first frosted regions 101 with multiple first raised structures 11 and the second frosted regions 102 with multiple second raised structures 12 can enhance the decorative effect of the glass , to enhance the market application prospect of the flash glass.
  • existence of multiple first protruding structures 11 and multiple second protruding structures 12 can also reduce the contact area between human fingers and the glass surface, increase the anti-fingerprint effect, and enhance the diffuse reflection effect of the glass to improve Anti-glare effect.
  • the first surface 10a forms flashing points at the first protruding structure 11 and the second protruding structure 12 under the irradiation of light, in particular, forming the flashing points on the side faces of each protruding structure.
  • the raised structure includes at least one edge
  • the raised structure includes at least two intersecting faces in different directions, and the position where the two faces intersect (or be called connected) forms a rib.
  • the raised structure With a diamond-like shape, it effectively mirrors reflections for a sparkling appearance.
  • the shape of the raised structure having at least one edge includes, but is not limited to, a prism (such as a triangular prism, a quadrangular prism, a pentagonal prism, a hexagonal prism, etc.), a prism (such as a triangular prism, a square prism, a pentagonal prism, etc.
  • the shapes of the first protruding structure 11 and the second protruding structure 12 independently include prisms, prisms, etc., and specifically may include triangular prisms, triangular prisms, and the like.
  • the morphology of the first raised structure 11 and the second raised structure 12 independently belong to the crystal morphology of the hexagonal crystal system, the crystal morphology of the cubic crystal system, the crystal morphology of the trigonal crystal system, and the tetragonal crystal system. At least one of crystal morphology and orthorhombic crystal morphology.
  • the protruding structure with the above-mentioned crystal morphology has an improved flashing effect under light conditions, which is beneficial to improving the aesthetics of the appearance.
  • the cubic crystal system is also called the equiaxed crystal system.
  • the orthorhombic system is also called "orthorhombic system”.
  • the above “morphology of the raised structure belongs to hexagonal crystal morphology, cubic crystal morphology, trigonal crystal morphology, tetragonal crystal morphology, and orthorhombic crystal morphology. "at least one of” should be understood in a broad sense, that is, the morphology of the raised structure is not necessarily completely consistent with the morphology of the hexagonal crystal system, the cubic crystal system, the trigonal crystal system and the tetragonal crystal system. , as long as the morphology of the protruding structure is roughly consistent with the crystal morphology of the above-mentioned crystal system, a certain deviation is allowed.
  • the glass body 10 has the above-mentioned first frosting area 101 and second frosting area 102 .
  • the glass body 10 has a first surface 10a and a second surface 10b oppositely arranged.
  • the second surface 10b may have the above-mentioned first frosting area 101 and the second frosting area 102, or may not have the first frosting area 101 and the second frosting area 102, which is not limited.
  • first and second in this application are only used for descriptive purposes.
  • the height of the first protruding structure 11 is greater than that of the second protruding structure 12 , and the length of the first protruding structure 11 is greater than the length of the second protruding structure 12 .
  • the length of the first raised structure 11 may be in the range of 100 ⁇ m-150 ⁇ m; the height of the first raised structure 11 may be in the range of 10 ⁇ m-16 ⁇ m.
  • the length of the second protrusion structure 12 may be in the range of 30 ⁇ m-60 ⁇ m; the height of the second protrusion structure 12 may be in the range of 3 ⁇ m-6 ⁇ m.
  • the length of the first protruding structure 11 is controlled within the above range, so that the cut surface can have a diamond-like protruding shape, which has excellent reflection and diffuse reflection effects, and the first frosting area can have a better frosting touch.
  • the height of the first protruding structure 11 is controlled within the above range, which can make the first protruding structure 11 have a suitable three-dimensional effect, improve the appearance effect of the first frosting area, and enhance the anti-fingerprint and anti-glare, while ensuring It does not affect the grip comfort.
  • the aspect ratio of the first protruding structure 11 is in the range of 6-15, and in some embodiments, the aspect ratio is in the range of 8-15.
  • the length and height of the second protruding structure 12 are controlled within the above range, and can be distinguished from the first protruding structure 11, so as to ensure that the glittering effect of the glass can be enriched by means of two different protruding structures.
  • the length of the second protruding structure 12 also ensures that the second frosting area has more closely arranged second protruding structures, the flash point brightness of the glass surface is high and the flashing effect is more delicate, and the anti-fingerprint effect can also be improved;
  • the narrower height range can ensure the high uniformity of the shape of the second protruding structure 12 and the uniformity of the flashing effect brought by the second protruding structure 12 .
  • the aspect ratio of the second protruding structure 12 is in the range of 5-20. At this time, the change in height will not affect the shape uniformity of the second protruding structure 11 too much. In some embodiments, the aspect ratio is in the range of 6-15, specifically in the range of 6-10.
  • the length of the first protruding structure 11 is the maximum value of the distance between any two points on the contour line of the orthographic projection on the second surface 10b; the height of the first protruding structure 11 is between its top and its top. distance between.
  • the length of the first protrusion structure 11 may be 105 ⁇ m, 110 ⁇ m, 115 ⁇ m, 120 ⁇ m, 130 ⁇ m, 140 ⁇ m, 145 ⁇ m, 150 ⁇ m and so on.
  • the height of the first protruding structure 11 may be 10 ⁇ m, 11 ⁇ m, 12 ⁇ m, 13 ⁇ m, 14 ⁇ m, 15 ⁇ m, 16 ⁇ m and so on.
  • the length of the second protruding structure 12 is the maximum value of the distance between any two points on the contour line of its orthographic projection on the second surface 10b; the height of the second protruding structure 12 is its top and its top the distance between.
  • the length of the second protruding structure 12 may be 32 ⁇ m, 40 ⁇ m, 45 ⁇ m, 50 ⁇ m, 55 ⁇ m, 60 ⁇ m and so on.
  • the height of the second protruding structure 12 may be 3 ⁇ m, 3.5 ⁇ m, 4 ⁇ m, 5 ⁇ m, 5.5 ⁇ m, 6 ⁇ m and so on.
  • adjacent first protruding structures 11 or adjacent second protruding structures 12 may be seamlessly connected (that is, adjacent to each other), or may have a certain distance.
  • adjacent first protrusion structures 11 are adjacent to each other, and adjacent second protrusion structures 12 are adjacent to each other. In this way, the first surface with the first frosting area 101 and the second frosting area 102 can ensure a rich flashing effect and a good grip.
  • the width of the first frosting area 101 is 100-500 ⁇ m; the width of the second frosting area 102 is 100-500 ⁇ m.
  • the first frosting regions 101 are arranged in parallel along the first direction, or in other words, the first frosting regions 101 extend along the first direction.
  • the first direction may be the lengthwise direction, the widthwise direction, or other linear directions of the glass body 10 .
  • the width of the first frosting area 101 is the size of its orthographic projection area on the second surface 10b along the direction perpendicular to the first direction.
  • the definition of the width of the second frosting area 102 is similar to this.
  • the width of the second frosting area 102 is the interval between two adjacent first frosting areas 101, and the width of the first frosting area 101 is the distance between two adjacent second frosting areas 102. interval between. Since the height and length of the aforementioned first raised structure 11 are greater than that of the second raised structure 12, relatively, the first frosted area can be called “raised area”, and the second frosted area can be called “recessed area”. ". Wherein, the width of the first frosting area 101 may be equal to or different from the width of the second frosting area 102 .
  • Controlling the widths of the first frosting area 101 and the second frosting area 102 within the above-mentioned range can separate the two frosting areas and ensure that the number of corresponding raised structures in the two areas is relatively large, thereby enabling Ensure that the flashing glass has rich flashing effects and anti-glare effects, and can provide better three-dimensional sense, grip feeling, anti-fingerprint effect, etc.
  • the widths of the first frosting region 101 and the second frosting region 102 are independently 100 ⁇ m, 110 ⁇ m, 130 ⁇ m, 140 ⁇ m, 150 ⁇ m, 200 ⁇ m, 250 ⁇ m, 300 ⁇ m, 400 ⁇ m, 450 ⁇ m or 500 ⁇ m.
  • the haze of the second frosting area is greater than the haze of the first frosting area.
  • the haze of the first frosting area 101 can be in the range of 80-90%, and the light transmittance can be in the range of 75-93%; the haze of the second frosting area 102 can be in the range of 80-90%. In the range of 90-95%, the light transmittance can be in the range of 75-93%.
  • the glass When the haze of the two frosting areas is in the above range, the glass can produce a hazy visual effect, enhance the aesthetic feeling, and can achieve better anti-glare and anti-fingerprint effects, and at the same time have a sparkling appearance effect, making the glittering glass can be Provide a strong visual impact.
  • the light transmittance of the two frosting regions When the light transmittance of the two frosting regions is in the above range, they have a matte effect, and at the same time increase their respective transmittance, improve permeability, and enhance appearance expressiveness.
  • the transmittance of the first frosting region 101 and the second frosting region 102 are independently in the range of 80%-90%; in some embodiments, the first frosting region 101, the second frosting region 101 The light transmittance of the second frosting area 102 is independently in the range of 85%-90%.
  • the roughness Ra of the first frosting area 101 is greater than the roughness Ra of the second frosting area 102 .
  • the roughness Ra of the first frosting region 101 is in the range of 1.5-4 ⁇ m; the roughness Ra of the second frosting region 102 is in the range of 0.3-1 ⁇ m.
  • the first frosting area 101 with greater roughness has an enhanced flash effect, and the anti-glare effect is increased, and at the same time, the touch is obvious, and the anti-fingerprint and anti-skid effects are enhanced; the second frosting area 102 with smaller roughness has an enhanced frosting effect. Sand effect, and the flash effect is fine and uniform.
  • the surface roughness Ra of the first frosting region 101 may be, but not limited to, 1.8 ⁇ m, 2 ⁇ m, 2.1 ⁇ m, 2.3 ⁇ m, 2.5 ⁇ m, 2.7 ⁇ m, 2.8 ⁇ m, 3 ⁇ m, 3.2 ⁇ m, 3.5 ⁇ m or 3.9 ⁇ m, etc. .
  • the surface roughness Ra of the second frosting region 102 may be, but not limited to, 0.4 ⁇ m, 0.45 ⁇ m, 0.5 ⁇ m, 0.6 ⁇ m, 0.7 ⁇ m, 0.8 ⁇ m, 0.9 ⁇ m or 0.95 ⁇ m.
  • the surface roughness Ra of the first frosting region 101 is in the range of 2-3 ⁇ m; the surface roughness Ra of the second frosting region 101 is in the range of 0.45 ⁇ m-0.8 ⁇ m; in some embodiments Among them, the surface roughness Ra of the second frosting region 101 is in the range of 0.45 ⁇ m-0.6 ⁇ m.
  • the embodiment of the present application also provides a preparation method of the flash glass, which can be used to prepare the flash glass described in any of the above embodiments.
  • the method for preparing flash glass includes the following steps S10 , S20 and S30 .
  • the first surface 10a of the flash glass includes the second frosted area 102 and the first frosted area 101 having a plurality of first raised structures 11, the first frosted area 101 and the second frosted area 102 It is straight and distributed at intervals, and the two adjacent first frosting areas 101 are connected by the second frosting area 102; the second raised structure 12 includes at least one edge, and the height of the second raised structure 12 and The lengths are all shorter than the first protruding structure 11 .
  • the first frosting etching before performing the first frosting etching, it may further include: setting a protective layer on the surface of the glass body that is not subjected to frosting etching treatment to prevent contact with the frosting solution.
  • an acid-resistant protective layer 20 may be provided on the second surface 10 b opposite to the first surface 10 a of the glass body 10 .
  • the acid-resistant protective layer 20 also needs to be removed.
  • the acid-resistant protective layer 20 can be an acid-resistant polymer film (such as polyethylene terephthalate (PET), or an ink layer, etc.
  • the thickness of the acid-resistant protective layer 20 can be 20-50 ⁇ m.
  • the removal method of layer 20 may be physical removal methods such as sanding and polishing, or chemical removal methods such as alkali etching.
  • step S10 after the first frosting etching, the first surface 10 a is frosted entirely and has a plurality of first raised structures 11 .
  • the first surface 10a includes a plurality of closely arranged first protruding structures 11 .
  • the first surface 10a at this time may be referred to as a "frosted surface”.
  • the frosting solution used in the first frosting etching includes metaaluminate, nitric acid, hydrochloric acid, sulfuric acid, ammonium bifluoride and water.
  • the first frosting solution further includes an organic acid.
  • nitric acid, hydrochloric acid, and sulfuric acid are mainly used to generate hydrogen ions to provide a strong acid environment.
  • Ammonium bifluoride can etch the glass surface in a strong acid environment and form fluorosilicate radicals with silicon in the glass.
  • Fluorosilicate can combine with metal ions in glass (such as Na + , K + , Li + , Mg 2+ , Al 3+ , Ca 2+ , etc.) to form fluorosilicate, slightly soluble or insoluble fluorosilicate It will accumulate and adhere to the glass surface to form multi-angular shield crystals in the form of microcrystalline nuclei growth, so that the etching of the glass surface with shield crystals is hindered, and the area without shield crystals will continue to be etched, and The frosting liquid will gradually etch inward along the periphery of the shield crystal, that is, the frosting liquid will etch along the outline of the shield crystal, and after the frost etching is completed, the shielding crystal attached to the glass surface can be removed by cleaning process, resulting in The etched glass with multiple convex structures on the surface makes the original smooth and transparent surface of the glass body have a frosting effect and a glittering effect.
  • metal ions in glass such as Na + , K + , Li + , M
  • the metaaluminate can be used to adjust the size and distribution of the crystals of the fluorosilicate shielding material, thereby controlling the size and distribution of the first raised structure, and adjusting the frosting and glittering effects of the glass surface.
  • Hydrochloric acid and sulfuric acid can be used to adjust the concentration of hydrogen ions to control the precipitation rate of crystals.
  • the presence of organic acid can stabilize the acidity of the frosting liquid, and can improve the dispersibility of each component in the frosting liquid in the system, ensure that the frosting liquid can be stored for a long time, and can also promote the formation of fluorosilicate crystals in the system.
  • the glass surface is evenly distributed, thereby ensuring the uniformity of the distribution of the first raised structures.
  • the first frosting liquid includes the following components in parts by weight: metaaluminate: 1-3 parts; nitric acid: 25-40 parts; hydrochloric acid: 1-3 parts; sulfuric acid: 0.5- 1.5 parts; ammonium bifluoride: 20-40 parts, organic acid: 1-3 parts, and water.
  • the first frosting liquid may contain 10-30 parts by weight of water. Appropriate water content can not only ensure the full dissolution of each component, but also enable the fluorosilicate produced in the etching process to be adsorbed on the glass body and crystallize to grow, thus playing a shielding role.
  • Controlling the content of metaaluminate in the first frosting solution in the above-mentioned lower range can make the size of the fluorosilicate crystal formed in the etching process larger, which in turn facilitates the formation of the first protrusion with a larger length and width. It can also ensure that the fluorosilicate crystals are gathered and deposited on the glass surface in an orderly manner and connected into sheets, thereby ensuring the order and tightness of the distribution of the first raised structure.
  • ammonium bifluoride is in the above range, and its mass ratio to metaaluminate is suitable, which is conducive to the orderly arrangement of fluorosilicate crystals, and can also ensure that ammonium bifluoride can be fully dissolved in the frosting solution without precipitation. So as not to affect the crystallization of fluorosilicate, resulting in a large difference in the sparkling effect at different positions on the glass surface.
  • the parts by weight of metaaluminate may be 1.1 parts, 1.2 parts, 1.5 parts, 1.8 parts, 2 parts, 2.5 parts, 2.8 parts or 3 parts, etc.
  • the parts by weight of ammonium bifluoride can be 22 parts, 25 parts, 30 parts, 32 parts, 35 parts or 38 parts etc.
  • the parts by weight of nitric acid can be 25 parts, 27 parts, 30 parts, 32 parts, 35 parts or 38 parts etc.
  • the parts by weight of sulfuric acid can be 0.8 part, 1 part, 1.2 part or 1.4 part etc.
  • the parts by weight of hydrochloric acid or organic acid can be 1.1 parts, 1.2 parts, 1.5 parts, 1.8 parts, 2 parts, 2.5 parts, 2.8 parts or 3 parts independently.
  • the parts by weight of ammonium bifluoride are 30-38 parts; the parts by weight of nitric acid are 30-38 parts.
  • the metaaluminate may include at least one of magnesium metaaluminate, sodium metaaluminate, potassium metaaluminate, and calcium metaaluminate.
  • the metaaluminate in the first frosting solution is magnesium metaaluminate.
  • the frosting solution containing magnesium metaaluminate can ensure that the crystal size of the fluorosilicate mask during the etching process is relatively large, which is conducive to the formation of a large-sized convex structure on the glass surface.
  • the organic acid may include at least one of tartaric acid, citric acid, sorbic acid, sulfamic acid and maleic acid. In some embodiments, the organic acid is tartaric acid.
  • the first frosting etching can be performed at 25-30° C. for 2-5 minutes.
  • the static condition is conducive to the uniform and stable attachment and growth of fluorosilicate crystals on the glass surface, so as to play a uniform and effective shielding effect.
  • the temperature of the first frosting etching may be 25° C., 27° C., 28° C. or 30° C. or the like.
  • the first frosting etching does not require high temperature, and the glass can be etched at room temperature, which reduces the process cost.
  • the time for the first frosting etching can be 2min, 2.5min, 3min, 4min or 4.5min, etc.
  • the photoresist patterns 30 distributed at intervals may be formed by a photolithography process, which may specifically include the following steps:
  • the photoresist layer can be formed by coating and drying, and its entire surface covers the first surface of the glass body after the first frost etching.
  • the thickness of the photoresist layer (that is, the thickness of the photoresist pattern) is 3-10 ⁇ m, specifically 4 ⁇ m, 5 ⁇ m, 6 ⁇ m, 7 ⁇ m, 8 ⁇ m or 9 ⁇ m. In some embodiments, the thickness is 6-8 ⁇ m.
  • the coating method may be brush coating, spray coating, doctor blade coating or spin coating and the like. Drying can volatilize the solvent in the photoresist used to form the photoresist layer, reducing its fluidity.
  • the temperature of the drying treatment may be 80-120°C, such as 90°C, 100°C, 110°C, etc.
  • Exposure can cause the photosensitive components in the photoresist layer to undergo a cross-linking reaction to form a cross-linked structure, so that the subsequent exposed area can be dissolved by the developer (when the photoresist is a positive resist), or the unexposed area can be dissolved by the developer (When the photoresist is a negative resist).
  • the exposure method can be traditional exposure (irradiating the photoresist layer with ultraviolet light through a predetermined mask), or LDI (Laser Direct Imaging, laser direct imaging technology). LDI does not need to use a mask for exposure, but directly forms the required image through laser scanning, and the image displayed after development is fine and diverse in shape.
  • the developer used for development is usually an alkaline solution.
  • solutions of inorganic bases such as sodium hydroxide, potassium hydroxide, sodium carbonate, sodium bicarbonate, and ammonia water can be used, and organic bases such as tetramethylammonium hydroxide (TMAH), trimethylamine, and triethanolamine can also be used.
  • TMAH tetramethylammonium hydroxide
  • the developer solution may be a KOH solution with a conductivity of 30-50 mS/cm, or a TMAH solution with a concentration of 2.38%.
  • the developer solution can be sprayed onto one side of the glass body, or the glass body can be soaked in the developer solution.
  • the developing time can be 2-10min.
  • post-baking may also be performed after developing to improve the curing of the photoresist pattern, enhance its adhesion, hardness, and the like.
  • the post-baking treatment may be performed at a temperature of 140°C-180°C (eg, 150°C or 160°C, etc.) for 20min-50min (eg, 30min, 45min, etc.).
  • the projection shape of the photoresist pattern 30 on the second surface 10 b of the glass body 10 is a strip shape.
  • the maximum cross-sectional width W 1 of the photoresist pattern 30 is 100-500 ⁇ m, and the distance W 2 between two adjacent photoresist patterns 30 is 100-500 ⁇ m.
  • the maximum cross-sectional width here refers to the maximum lateral dimension of the photoresist pattern 30, and refers to the maximum width of the cross-section perpendicular to the extending direction of the photoresist pattern 30 (that is, the width direction), specifically refers to the maximum width of the cross-section of the photoresist pattern 30 at the first position of the glass body.
  • the distance between any two points on the contour line of the orthographic projection on the two surfaces 10b refers to the distance between two adjacent photoresist patterns 30 on the glass body. The minimum value of the distance between two points on the contour line of the orthographic projection.
  • the first frosting region 101 and the second frosting region 102 with a larger width and a larger interval can be formed through the second frosting etching, and ensure that The two frosting areas have more raised structures respectively, so as to enrich the glittering effect of the glass and increase the anti-fingerprint effect and the like.
  • W 1 and W 2 of the photoresist pattern 30 are independently 100 ⁇ m, 110 ⁇ m, 130 ⁇ m, 140 ⁇ m, 150 ⁇ m, 200 ⁇ m, 300 ⁇ m, 400 ⁇ m or 500 ⁇ m.
  • the frosting solution used in the second frosting etching includes metaaluminate, nitric acid, hydrochloric acid, sulfuric acid, ammonium bifluoride and water .
  • the first frosting solution further includes an organic acid.
  • the mass percentage of metaaluminate in the second frosting solution is greater than the mass percentage of metaaluminate in the frosting solution used for the first frosting etching. This can ensure that the first raised structures formed by the first frosting can be etched during the second frosting, and transformed into more small raised structures (that is, the second raised structures).
  • the second frosting liquid includes the following components in parts by weight: metaaluminate: 5-10 parts; nitric acid: 25-40 parts; hydrochloric acid: 1-3 parts; sulfuric acid: 0.5- 1.5 parts; ammonium bifluoride: 20-40 parts, organic acid: 1-3 parts, and water.
  • the second frosting liquid may contain 10-30 parts by weight of water. Appropriate water content can not only ensure the full dissolution of each component, but also enable the fluorosilicate produced in the etching process to precipitate smoothly in the frosting solution and adsorb on the glass body to play a shielding role.
  • the action mechanism of the second frosting liquid is the same as the action mechanism of the above first frosting liquid, and will not be repeated here.
  • controlling the content of metaaluminate in the second frosting liquid to the above-mentioned higher range can make the size of the fluorosilicate crystals formed in the etching process smaller, that is, the area of the shield formed by the reaction is reduced , which in turn facilitates the formation of the second raised structure with smaller length and width, so that the flash point brightness of the glass surface is higher and the flash effect is delicate.
  • the metaaluminate in the second frosting liquid may include at least one of magnesium metaaluminate, sodium metaaluminate, potassium metaaluminate and calcium metaaluminate.
  • the metaaluminate in the second frosting solution is sodium metaaluminate or potassium metaaluminate.
  • Sodium metaaluminate or potassium metaaluminate not only has high solubility, but also can make the frosting solution have good stability, and when sodium metaaluminate is used, the particle size of the raised structure formed by the frosting solution on the glass surface is related to the partial size. Compared with potassium aluminate, it is smaller, and the sparkle of the glass surface is higher than that of potassium metaaluminate.
  • the metaaluminate in the second frosting solution is sodium metaaluminate.
  • the etching rate of the frosting solution containing sodium metaaluminate is slightly slower, which is more conducive to etching to form a raised structure with fine structure, and reduces the number of first protrusions that will not be covered by the photoresist pattern 30 The probability of structure collapse when the structure 11 is etched into the second raised structure 12 .
  • the weight fraction of metaaluminate may be 5 parts, 5.5 parts, 6 parts, 7 parts, 8 parts, 9 parts, 9.5 parts or 10 parts, etc.
  • the parts by weight of ammonium bifluoride can be 22 parts, 25 parts, 30 parts, 32 parts, 35 parts or 38 parts etc.
  • the parts by weight of nitric acid can be 25 parts, 27 parts, 30 parts, 32 parts, 35 parts or 38 parts etc.
  • the parts by weight of sulfuric acid can be 0.8 part, 1 part, 1.2 part or 1.4 part etc.
  • the parts by weight of hydrochloric acid or organic acid can be 1.1 parts, 1.2 parts, 1.5 parts, 1.8 parts, 2 parts, 2.5 parts, 2.8 parts or 3 parts independently.
  • the parts by weight of ammonium bifluoride are 30-38 parts; the parts by weight of nitric acid are 30-38 parts.
  • the second frosting etching can be performed at 25-30° C. for 2-5 minutes.
  • the static condition is conducive to the uniform and stable attachment and growth of fluorosilicate crystals on the glass surface, so as to play a uniform and effective shielding effect.
  • the temperature of the second frosting etching may be 25° C., 27° C., 28° C. or 30° C. or the like.
  • the frosting liquid does not require high temperature, and the glass can be etched at room temperature, which reduces the process cost.
  • the time for the second frosting etching can be 2 min, 2.5 min, 3 min, 4 min or 4.5 min.
  • step S30 the first frosting area is formed by first frosting etching on the glass surface, and the second frosting area is formed by sequentially first frosting etching and second frosting etching on the glass surface. And the material of the first frosting area 101 and the second frosting area 102 is the same as that of the glass body 10 .
  • the method for removing the photoresist pattern includes: using a strong alkali solution with a concentration of 8-20 wt%, and performing ultrasonic deplating at 40-90° C. for 2-8 minutes.
  • the strong base can be NaOH or KOH.
  • the glass body may also be strengthened.
  • the specific post-strengthening treatment can be carried out according to conventional techniques (such as ion exchange method, etc.), and details will not be repeated here. Thereby, the surface stress of glass can be strengthened, and its mechanical strength can be improved.
  • the preparation method of the flash glass provided by the above embodiments of the present application is relatively simple, suitable for processing glass bodies of various materials, and the overall preparation/processing time is short and the cost is low.
  • the frosted surface on one side of the flashing glass prepared by the above preparation method has two types of frosting areas distributed alternately, and each frosting area has a raised structure of two different sizes.
  • the flashing glass has a rich flashing effect. It has strong expressive power, and also has good anti-fingerprint and anti-glare effects.
  • first frosted area 101 with the first raised structure 11 and the second frosted area 102 with the second raised structure 12 are made of the same material as the glass body, that is, the final flash glass is integrally formed. , to avoid the problem that the diaphragm is easy to fall off and cannot produce a sparkling appearance effect for a long time due to the use of an additional laminated diaphragm that is made of a material different from the glass to produce a flashing effect.
  • the embodiment of the present application also provides an electronic device casing, comprising the flash glass as described above in the present application, or including the flash glass prepared by the preparation method described in the above application.
  • the housing of electronic equipment containing the above-mentioned flashing glass has a cool appearance effect, and can improve the appearance performance and product competitiveness of electronic equipment.
  • the flash glass of the present application when the flash glass of the present application is applied to the casing of an electronic device, it can also be treated with an anti-fingerprint film, for example, the anti-fingerprint film is placed on the first frosted area and the second frosted area. on the first surface of the frosted area.
  • the housing of the above-mentioned electronic device may further include a decoration layer disposed on the second surface 10b of the glass body 10, so as to meet the requirement of the appearance of the housing.
  • the decoration layer may include, but is not limited to, at least one of an optical film layer, a protective layer, and an undercoat ink layer.
  • the above electronic device casing may be a display screen cover, a back cover, a middle frame of the electronic device, or a composite case in which the back cover and the middle frame are integrally formed.
  • the electronic equipment using the above-mentioned electronic equipment casing can be various consumer electronic products, such as mobile phones, tablet computers, notebook computers, wearable devices (such as smart watches, smart bracelets), virtual reality (Virtual Reality, VR) terminal equipment , augmented reality (Augmented Reality, AR), e-readers, TVs, camcorders, projectors and other electronic products.
  • the housing of the electronic device may specifically be a display cover assembled on the front side of the electronic device, and the cover is arranged on the display module; It may be a rear cover assembled on the rear side of the electronic device.
  • the housing of the electronic device may also be a camera protection cover.
  • a preparation method of flash glass comprising the following steps:
  • the first frosting liquid includes the following components in mass percentage : Magnesium metaaluminate: 2%; Nitric acid: 36%; Hydrochloric acid: 2%; Sulfuric acid: 1%; Ammonium bifluoride: 36%, Tartaric acid: 2%, and 21% water.
  • a glass body with a thickness of 0.6mm (specifically, a lithium-aluminum-silicate glass plate, the brand is Panda-1681), and first coat a layer of acid-resistant ink with a thickness of 35 ⁇ m on one side of the surface (which can be called the “back”);
  • the glass body is soaked in the above-mentioned first frosting liquid, and left at 25°C for 2 minutes, so that the other surface (which may be referred to as "front” or "first surface”) opposite to the back of the glass body is covered.
  • the glass body After etching, the glass body is taken out and cleaned with clear water to obtain the glass body (as shown in Figure 4) after frosting etching for the first time, and a plurality of first raised structures comprising at least one edge (which can be referred to as "Sand grain-shaped large protrusion"), the front surface has changed from the original smooth surface to a frosted shape, which can be called a "frosted surface”.
  • the second frosting solution comprises the following components in mass percentage: sodium metaaluminate: 7%; nitric acid: 37%; hydrochloric acid: 2%; sulfuric acid: 1%; hydrogen fluoride Ammonium: 32%, Tartaric Acid: 2%, and 19% Water.
  • Fig. 1, Fig. 6 are the metallographic micrographs of the flash glass obtained in Example 1 at different magnifications.
  • one side surface of the flashing glass includes a first frosted area 101 with a plurality of first raised structures (large sand grain-like protrusions) and a plurality of second raised structures (sand grain-like large protrusions). grainy small protrusions) in the second frosting area 102, the first frosting area 101 and the second frosting area 102 are straight and spaced, and the two adjacent first frosting areas 101 pass through the second frosting area 102.
  • the frosting area 102 is connected; the height and length of the second raised structure are smaller than the first raised structure.
  • the width of the first frosting area 101 is about 140-165 ⁇ m
  • the width of the second frosting area 102 is about 150-180 ⁇ m.
  • the length of the large sand grain-shaped protrusions formed by the first frosting etching is about 120-140 ⁇ m, and the height is about 10-16 ⁇ m. It can be seen from FIG. 6 and FIG. 1 that the length of the sand grain-shaped small protrusions formed by the second frosting etching is about 30-60 ⁇ m, and the height is about 3-6 ⁇ m.
  • step (1) haze, transmittance and roughness tests are performed on the glass body shown in FIG. 4 after the first frosting etching, so as to obtain relevant results of the first frosting area.
  • the glass in Figure 4 is not shielded by photoresist, and the second frosting etching is directly performed to obtain a frosted glass whose surface is all sand-like small protrusions, and the haze, transmittance and roughness are tested for it.
  • the relevant results for the second frosted area can also be obtained by directly testing the glass shown in Fig. 1 or 6 .
  • the haze and transmittance are measured by the German BYK transmission haze meter BYK-4725, and the roughness is measured by the SJ411 surface roughness meter.
  • the roughness characterization parameters include R a , R z , R t , wherein, R a : arithmetic mean value; R z : average peak-to-valley depth; R t : sum of the highest profile peak value and the lowest profile valley value.
  • the flashing glass prepared by the method of the embodiment of the present application has obvious flashing effects, and has various flashing effects with different flashing degrees.
  • the area with small protrusions can be said to have a fine glitter effect because of the small size and large number of protrusion structures, and the glitter is fine and delicate.
  • a method for preparing flash glass the difference from Example 1 is that the sodium metaaluminate in the second frosting solution is replaced by magnesium metaaluminate, that is, the first frosting solution and the second frosting solution
  • the type of metaaluminate contained in the solution is the same.
  • a method for preparing flash glass the difference from Example 1 is that: 1) the first frosting liquid includes the following components in mass percentage: magnesium metaaluminate: 3%; nitric acid: 37%; hydrochloric acid: 1%; sulfuric acid: 0.5%; ammonium bifluoride: 38%, tartaric acid: 2.5%, and 18% water;
  • the second frosting solution includes the following components in mass percentage: sodium metaaluminate: 10%; nitric acid: 39%; hydrochloric acid: 2%; sulfuric acid: 1%; ammonium bifluoride: 35%, tartaric acid: 3% %, and 10% water.
  • the first frosting liquid includes the following components in mass percentage: magnesium metaaluminate: 1%; nitric acid: 32%; hydrochloric acid: 2%; sulfuric acid: 1%; ammonium bifluoride: 32%, tartaric acid: 2%, and 30% water;
  • the second frosting liquid comprises the following components in mass percentage: potassium metaaluminate: 5%; nitric acid: 35%; hydrochloric acid: 2%; sulfuric acid: 1%; ammonium bifluoride: 30%, tartaric acid: 2% %, and 25% of water.
  • a method for preparing flash glass which differs from Example 1 in that: in step (2), the maximum cross-sectional width of the photoresist pattern is about 400 ⁇ m, and the interval between adjacent photoresist patterns is about 450 ⁇ m.
  • the difference between the flash glass obtained in Example 5 and Example 1 lies in that the widths of the first frosted area and the second frosted area are different.
  • the width of the first frosted area of the flash glass obtained in Example 5 is in the range of 390-420 ⁇ m
  • the width of the second frosted area is in the range of 450-480 ⁇ m.
  • FIG. 9 is an appearance effect diagram of the flash glass according to Example 5 of the present application.
  • the width of the two frosting areas is wider than that of Example 1, it is easier to distinguish the two frosting areas than in Example 1 with the naked eye: the deeper area is the first with small protrusions.
  • the second frosting area has a finer glitter effect than the first frosting area.
  • Table 2 summarizes the dimensional parameters of the raised structures of the flash glass of Examples 2-4.
  • Table 3 summarizes the haze, transmittance and roughness test results of the flashing glasses of Examples 2-5.
  • the surface of the flash glass of the above-mentioned embodiments of the present application has two frosted regions with different roughness, and they all have relatively high haze and suitable light transmittance, which shows that the surface of the above-mentioned embodiments of the present application Flash glass has good frosting effect and good permeability, which can achieve special appearance effect.
  • the existence of two frosting regions with different roughness can also endow the flashing glass with rich and flexible flashing effects, good anti-glare effects, anti-fingerprint effects, and the like.
  • Example 2 it can be known that when the types of metaaluminate in the first frosting liquid and the second frosting liquid are different, the first frosting formed by the first frosting etching Compared with the sand area, the arrangement of the small protrusions in the second frosting area formed by the second frosting etching is tighter, the roughness Ra is smaller, and the haze is higher.

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Signal Processing (AREA)
  • Surface Treatment Of Glass (AREA)

Abstract

提供了一种闪光玻璃，包括玻璃本体(10)，玻璃本体(10)的第一表面(10a)包括间隔分布的多个第一蒙砂区(101)，相邻的两个第一蒙砂区(101)之间通过第二蒙砂区(102)连接，且第一蒙砂区(101)和第二蒙砂区(102)呈直条状，其中，第一蒙砂区(101)具有多个第一凸起结构(11)，第二蒙砂区(102)具有多个第二凸起结构(12)，第一凸起结构(11)和第二凸起结构(12)独立地包括至少一条棱，且第二凸起结构(12)的高度和长度均小于第一凸起结构(11)。还提供了闪光玻璃的制备方法及包含该闪光玻璃的电子设备壳体。

Description

一种闪光玻璃及其制备方法和电子设备壳体
本申请要求于2022年01月17日提交中国专利局的申请号为202210049208.7、申请名称为“一种闪光玻璃及其制备方法和电子设备壳体”的中国专利申请的优先权，其全部内容通过引用结合在本申请中。
技术领域
本申请涉及玻璃加工技术领域，具体涉及一种闪光玻璃及其制备方法和电子设备壳体。
背景技术
随着手机、笔记本电脑等电子设备的不断发展，用户对电子设备壳体的外观效果的要求也越来越高。玻璃是电子设备常用的壳体材料，例如可作为盖板、背板等。然而，目前市场上的玻璃外观较为单调，不能满足多样化的用户审美需求，产品竞争力较弱。
发明内容
鉴于此，本申请提供了一种闪光玻璃，可呈现闪光程度不一样的多种闪光效果，能提升采用该闪光玻璃的电子设备壳体的外观表现力、增强产品竞争力。
具体地，第一方面，本申请提供了一种闪光玻璃，包括玻璃本体，所述玻璃本体包括具有纹理的第一表面，所述第一表面包括间隔分布的多个第一蒙砂区，相邻的两个所述第一蒙砂区之间通过第二蒙砂区连接，且所述第一蒙砂区和所述第二蒙砂区呈直条状，其中，所述第一蒙砂区具有多个第一凸起结构，所述第二蒙砂区具有多个第二凸起结构，所述第一凸起结构和所述第二凸起结构独立地包括至少一条棱，且所述第二凸起结构的高度和长度均小于所述第一凸起结构。
上述闪光玻璃的第一表面具有蒙砂效果，并具有相间设置的两种直条状蒙砂区，且构成这两种蒙砂区的凸起结构的高度、长度不同，当光线照射到该闪 光玻璃的第一表面时，具有至少一个棱的两种凸起结构可以将光往不同的方向反射，从而产生闪闪发光的外观效果，且可呈现闪光程度不一样的多种闪光效果，大大提升外观效果。
第二方面，本申请提供了一种闪光玻璃的制备方法，包括以下步骤：
对所述玻璃本体的第一表面进行第一次蒙砂蚀刻，以使所述第一表面形成多个第一凸起结构；其中，所述第一凸起结构包括至少一条棱；
在所述第一次蒙砂蚀刻后的第一表面上形成平行且间隔分布的多个光阻图案，所述光阻图案呈长条状；
对带有所述光阻图案的第一表面进行第二次蒙砂蚀刻，以使未被所述光阻图案覆盖的所述第一表面转变成具有多个第二凸起结构的第二蒙砂区，之后去除所述光阻图案，在相邻的所述第二蒙砂区之间得到表面具有多个所述第一凸起结构的第一蒙砂区；其中，所述第二凸起结构包括至少一条棱，所述第二凸起结构的高度和长度均小于所述第一凸起结构。
上述闪光玻璃的制备方法操作简单，通过该方法制得的闪光玻璃具有蒙砂效果，并可在光照下呈现闪光程度不一样的多种闪光效果，改善了用户的视觉观感。
第三方面，本申请提供了一种电子设备壳体，包括本申请第一方面所述的闪光玻璃，或者通过本申请第二方面所述的制备方法制得的闪光玻璃。
含有上述闪光玻璃的电子设备壳体，具有炫酷的外观效果，能提升电子设备的外观变现力和产品竞争力。
附图说明
图1为本申请一实施例提供的闪光玻璃的金相显微镜照片。
图2为本申请实施方式提供的闪光玻璃的一种截面结构示意图。
图3为本申请一实施例提供的闪光玻璃的一种制备流程图。
图4为本申请实施例1提供的第一次蒙砂蚀刻后的玻璃本体的金相显微镜照片。
图5为在图4的玻璃本体的表面形成光阻图案后的金相显微镜照片。
图6为在图5的玻璃本体玻璃进行第二次蒙砂蚀刻后所得闪光玻璃的金相 显微镜照片。
图7为本申请实施例1的闪光玻璃的外观效果图。
图8为图4中玻璃本体的外观效果图。
图9为本申请实施例5中闪光玻璃的外观效果图。
具体实施方式
以下所述是本申请的示例性实施方式，应当指出，对于本技术领域的普通技术人员来说，在不脱离本申请原理的前提下，还可以做出若干改进和润饰，这些改进和润饰也视为本申请的保护范围。
图2为本申请一实施例提供的闪光玻璃的金相显微镜照片。图2为本申请实施方式提供的闪光玻璃的一种截面结构示意图。请一并参见图1和图2，本申请实施例提供的闪光玻璃100包括玻璃本体10，玻璃本体10具有第一表面10a，第一表面10a包括间隔分布的多个第一蒙砂区101，相邻的两个第一蒙砂区101之间通过第二蒙砂区102连接，且第一蒙砂区101和第二蒙砂区102呈直条状，其中，第一蒙砂区101具有多个第一凸起结构11，第二蒙砂区102具有多个第二凸起结构12，第一凸起结构11和第二凸起结构12独立地包括至少一条棱，且第二凸起结构12的高度和长度均小于第一凸起结构11。本申请中，可将第一凸起结构称为“大凸起”、第二凸起结构称为“小凸起”。
上述闪光玻璃的第一表面10a具有相间设置的两种直条状蒙砂区，构成这两种蒙砂区的凸起结构的高度、长度不同，该第一表面具有蒙砂效果，且当光线照射到该闪光玻璃的第一表面时，具有至少一个棱的两种凸起结构可以将照射在各棱侧面上的光进行反射，由于各棱侧面的角度不同，可以产生不同方向的反射光，从而产生闪闪发光的外观效果，且借助反射光在这两种凸起结构上的复合叠加，可呈现闪光程度不一样的多种闪光效果，提高了闪光效果的多层次性和灵动性，丰富了该闪光玻璃的视觉效果，提升了外观美感。此外，带多个第一凸起结构11的第一蒙砂区101和带多个第二凸起结构12的第二蒙砂区102的相间式直条状排布，可以增强玻璃的装饰效果，提升该闪光玻璃的市场应用前景。另外，多个第一凸起结构11和多个第二凸起结构12的存在，还可减少人手指与该玻璃表面的接触面积，增加抗指纹效果，以及增强该玻璃的漫反 射效应，提升防炫光效果。
本申请中，第一表面10a在光线照射下于第一凸起结构11处和第二凸起结构12处形成闪光点，具体是在各凸起结构的棱侧面上形成闪光点。
本申请中“凸起结构包括至少一条棱”是指凸起结构至少包括两个方向不同且相交的面，且两个面相交(或称为相连接)的位置处构成棱，该凸起结构具有类似钻石的形状，能够有效发生镜面反射，从而具有闪闪发光的外观效果。具体地，具有至少一条棱的凸起结构的形状包括但不限于棱柱(如三棱柱、四棱柱、五棱柱、六棱柱等)、棱台(如三棱台、方棱台、五棱台等)、立方体、棱锥(如三棱锥、四棱锥)或其类似结构等。本申请一些实施方式中，第一凸起结构11、第二凸起结构12的形状独立地包括棱柱、棱台等，具体地可以包括三棱柱、三棱台等。
本申请实施方式中，上述第一凸起结构11、第二凸起结构12的形貌独立地属于六方晶系晶体形貌、立方晶系晶体形貌、三方晶系晶体形貌、四方晶系晶体形貌和正交晶系晶体形貌中的至少一种。具有上述晶型形貌的凸起结构，在光照条件下具有改善的闪光效果，利于提高外观美观度。其中，立方晶系又称等轴晶系。正交晶系又称“斜方晶系”。需要说明的是，上述“凸起结构的形貌属于六方晶系晶体形貌、立方晶系晶体形貌、三方晶系晶体形貌、四方晶系晶体形貌、正交晶系晶体形貌中的至少一种”应做广义理解，即凸起结构的形貌并不一定与六方晶系晶体形貌、立方晶系晶体形貌、三方晶系晶体形貌和四方晶系晶体形貌完全一致，只要凸起结构的形貌与上述晶系晶体形貌大致一致即可，允许一定的偏差存在。
可以理解的，玻璃本体10的至少一个表面具有上述第一蒙砂区101和第二蒙砂区102。请继续参阅图1，玻璃本体10具有相对设置的第一表面10a和第二表面10b，图1中以第一表面10a具有第一蒙砂区101和第二蒙砂区102进行了示例，但可以理解的是，第二表面10b可以具有上述第一蒙砂区101和第二蒙砂区102，也可以不具有第一蒙砂区101和第二蒙砂区102，对此不作限定。此外，本申请中“第一”、“第二”仅用于描述目的。
本申请中，第一凸起结构11的高度大于第二凸起结构12的高度，第一凸起结构11的长度大于第二凸起结构12的长度。本申请实施方式中，第一凸起 结构11的长度可以在100μm-150μm的范围内；第一凸起结构11的高度可以在10μm-16μm的范围内。本申请实施方式中，第二凸起结构12的长度可以在30μm-60μm的范围内；第二凸起结构12的可以高度在3μm-6μm的范围内。
第一凸起结构11的长度控制在上述范围，可以使其切面具有类似钻石的凸起状，具有卓越的反光和漫反射效果，且第一蒙砂区能具有较好的蒙砂触感。第一凸起结构11的高度控制在上述范围，能够使第一凸起结构11具有合适的立体感、第一蒙砂区的改善的外观效果，且增强了防指纹、防眩光，同时可保证又不会影响握持舒适度。本申请实施方式中，第一凸起结构11的长高比在6-15的范围内，在一些实施方式中，该长高比在8-15的范围内。
第二凸起结构12的长度、高度控制在上述范围，可以与第一凸起结构11相区分，以保证可借助两种不同的凸起结构丰富玻璃的闪光效果。其中，第二凸起结构12的长度还保证第二蒙砂区具有较多紧密排布的第二凸起结构，玻璃表面的闪点亮度高且闪光效果较为细腻，还可以提升抗指纹效果；较窄的高度范围可保证第二凸起结构12的形貌均一性高，及由第二凸起结构12带来的闪光效果的均一性。本申请实施方式中，第二凸起结构12的长高比在5-20的范围内。此时，高度的变化不会过多影响第二凸起结构11的形貌均匀性。在一些实施方式中，该长高比在6-15的范围内，具体可以在6-10的范围内。
其中，第一凸起结构11的长度为其在第二表面10b上的正投影的轮廓线上任意两点之间的间距的最大值；第一凸起结构11的高度为其顶端与其顶部之间的距离。具体地，第一凸起结构11的长度可以为105μm、110μm、115μm、120μm、130μm、140μm、145μm、150μm等。第一凸起结构11的高度可以为10μm、11μm、12μm、13μm、14μm、15μm、16μm等。
类似地，第二凸起结构12的长度为其在第二表面10b上的正投影的轮廓线上任意两点之间的间距的最大值；第二凸起结构12的高度为其顶端与其顶部之间的距离。具体地，第二凸起结构12的长度可以为32μm、40μm、45μm、50μm、55μm、60μm等。第二凸起结构12的高度可以为3μm、3.5μm、4μm、5μm、5.5μm、6μm等。
本申请中，相邻的第一凸起结构11之间或相邻的第二凸起结构12之间可以是无缝连接(即，是邻接的)，也可以具有一定间距。本申请实施方式中， 相邻的第一凸起结构11之间是邻接的，相邻的第二凸起结构12之间是邻接的。这样能保证带第一蒙砂区101和第二蒙砂区102的第一表面的丰富闪光效果及良好握持感。
本申请实施方式中，第一蒙砂区101的宽度为100-500μm；第二蒙砂区102的宽度为100-500μm。其中，各第一蒙砂区101沿第一方向平行排布，或者说第一蒙砂区101沿第一方向延伸。该第一方向可以是玻璃本体10的长度方向、宽度方向，或者其他直线型方向。此时，第一蒙砂区101的宽度是其在第二表面10b上的正投影区域沿与第一方向垂直的方向上的尺寸。第二蒙砂区102的宽度定义与此类似。可以理解的是，第二蒙砂区102的宽度即为相邻两个第一蒙砂区101之间的间隔，第一蒙砂区101的宽度即为相邻两个第二蒙砂区102之间的间隔。由于前述第一凸起结构11的高度、长度均大于第二凸起结构12，相对地，可以把第一蒙砂区称为“凸起区”、把第二蒙砂区称为“凹陷区”。其中，第一蒙砂区101的宽度可以与第二蒙砂区102的宽度相等，或者不等。
控制第一蒙砂区101及第二蒙砂区102的宽度在上述范围，可以将这两种蒙砂区间隔开来，并保证二者所具有的对应凸起结构的数目较多，进而可保证闪光玻璃具有丰富的闪光效果及防眩光效果，并能够提供较好的立体感和握持感、抗指纹效果等。在一些实施例中，第一蒙砂区101及第二蒙砂区102的宽度独立地为100μm、110μm、130μm、140μm、150μm、200μm、250μm、300μm、400μm、450μm或500μm等。
本申请实施方式中，所述第二蒙砂区的雾度大于所述第一蒙砂区的雾度。本申请一些实施方式中，第一蒙砂区101的雾度可在80-90％的范围内，透光率可在75-93％的范围内；第二蒙砂区102的雾度可在90-95％的范围内，透光率可在75-93％的范围内。
两个蒙砂区的雾度在上述范围时，玻璃能产生朦胧的视觉效果、提升美感，并能够实现较好的防眩光、抗指纹效果，同时兼具闪闪发光的外观效果，使得闪光玻璃能够提供强烈的视觉冲击。两个蒙砂区的透光率在上述范围时，它们在具有雾面效果的同时，提高了各自的透过率，改善了通透性，增强了外观表现力。
本申请一些实施方式中，第一蒙砂区101、第二蒙砂区102的透光率独立地 在80％-90％的范围内；在一些实施方式中，第一蒙砂区101、第二蒙砂区102的透光率独立地在85％-90％的范围内。
本申请一些实施方式中，第一蒙砂区101的粗糙度Ra大于第二蒙砂区102的粗糙度Ra。在一些实施方式中，第一蒙砂区101的粗糙度Ra在1.5-4μm的范围内；第二蒙砂区102的粗糙度Ra在0.3-1μm的范围内。较大粗糙度的第一蒙砂区101具有增强的闪光效果，且防眩光效果增加，同时触感明显，增强了防指纹、防滑效果；较小粗糙度的第二蒙砂区102具有增强的蒙砂效果，且闪光效果细腻、均匀。具体地，第一蒙砂区101的表面粗糙度Ra可以但不限于为1.8μm、2μm、2.1μm、2.3μm、2.5μm、2.7μm、2.8μm、3μm、3.2μm、3.5μm或3.9μm等。第二蒙砂区102的表面粗糙度Ra可以但不限于为0.4μm、0.45μm、0.5μm、0.6μm、0.7μm、0.8μm、0.9μm或0.95μm等。在一些实施方式中，第一蒙砂区101的表面粗糙度Ra在2-3μm的范围内；第二蒙砂区101的表面粗糙度Ra在0.45μm-0.8μm的范围内；在一些实施方式中，第二蒙砂区101的表面粗糙度Ra在0.45μm-0.6μm的范围内。
本申请实施例还提供了闪光玻璃的一种制备方法，可用于制备上述任一实施方式所述的闪光玻璃。
请一并参阅图3及图4，本申请实施例提供的闪光玻璃的制备方法以包括以下步骤S10、S20和S30。
S10，对玻璃本体10的第一表面10a进行第一次蒙砂蚀刻，以使第一表面10形成多个第一凸起结构11；其中，第一凸起结构11包括至少一条棱；
S20，在第一次蒙砂蚀刻后的第一表面10a上形成平行且间隔分布的多个光阻图案30，光阻图案30呈长条状；
S30，对带有光阻图案30的第一表面10a进行第二次蒙砂蚀刻，以使未被光阻图案30覆盖的第一表面形成多个第二凸起结构12(即，转变为具有多个第二凸起结构12的第二蒙砂区102)，之后去除光阻图案30，得到闪光玻璃。其中，该闪光玻璃的第一表面10a包括所述第二蒙砂区102及具有多个第一凸起结构11的第一蒙砂区101，第一蒙砂区101和第二蒙砂区102呈直条状且间隔分布，相邻的两个第一蒙砂区101之间通过第二蒙砂区102连接；第二凸起结构12包括至少一条棱，第二凸起结构12的高度和长度均小于第一凸起结构11。
本申请一些实施方式中，在进行第一次蒙砂蚀刻之前，还可以包括：对玻璃本体不进行蒙砂蚀刻处理的表面上设置保护层，防止与蒙砂液接触。例如，如图3所示，可在与玻璃本体10的第一表面10a相对设置的第二表面10b上设置耐酸保护层20。相应地，在完成步骤S03的第二次蒙砂蚀刻后，还需要去除耐酸保护层20。其中，耐酸保护层20可以是耐酸的聚合物膜(如聚对苯二甲酸乙二酯(PET)，或者油墨层等。可选地，耐酸保护层20的厚度可以为20-50μm。耐酸保护层20的去除方式可以是砂磨、抛光等物理去除方式，或者碱蚀等化学去除方式。
步骤S10中，经第一次蒙砂蚀刻后，第一表面10a是整面蒙砂的，具有多个第一凸起结构11。在一些实施方式中，第一表面10a包括紧密排布的多个第一凸起结构11。此时的第一表面10a可称为“蒙砂面”。
其中，所述第一次蒙砂蚀刻采用的蒙砂液(以下统称“第一蒙砂液”)包括偏铝酸盐、硝酸、盐酸、硫酸、氟化氢铵和水。在一些实施方式中，第一蒙砂液还包括有机酸。
上述第一蒙砂液中，硝酸、盐酸、硫酸主要用来产生氢离子，以提供强酸环境，氟化氢铵在强酸环境下可对玻璃表面进行刻蚀，与玻璃中的硅元素形成氟硅酸根，氟硅酸根能够与玻璃中的金属离子(如Na +、K +、Li +、Mg 2+、Al 3+、Ca 2+等)结合形成氟硅酸盐，微溶或不溶的氟硅酸盐会以微晶核生长的方式堆积附着在玻璃表面上形成多棱角的遮蔽物结晶体，使得形成有遮蔽物结晶体的玻璃表面的蚀刻被阻碍，未有遮蔽物结晶体附着的区域会继续被蚀刻，且蒙砂液会沿着遮蔽物结晶体的四周逐渐向内进行蚀刻，即蒙砂液沿着遮蔽物结晶体的轮廓进行蚀刻，在蒙砂蚀刻完成后通过清洗工艺可去除玻璃表面附着的遮蔽晶体，得到表面具有多个凸起结构的蚀刻玻璃，使得玻璃本体原本光滑透明的表面具有了蒙砂效果及闪光效果。其中，偏铝酸盐可用来调节氟硅酸盐遮蔽物结晶体的尺寸和分布，进而可控制第一凸起结构的尺寸和分布，调控玻璃表面的蒙砂及闪光效果。盐酸和硫酸可用来调节氢离子浓度，从而控制结晶体的析出速度。有机酸的存在，可稳定所述蒙砂液的酸性，并可提高蒙砂液中各组分在体系中的分散性，保证蒙砂液能长时间存储，还可促进氟硅酸盐结晶体在玻璃表面均匀分布，进而保证第一凸起结构分布的均一度。
本申请一些实施方式中，第一蒙砂液包括以下重量份数的各组分：偏铝酸盐：1-3份；硝酸：25-40份；盐酸：1-3份；硫酸：0.5-1.5份；氟化氢铵：20-40份，有机酸：1-3份，以及水。在一些实施方式中，第一蒙砂液含有的水的重量份数可以为10-30份。合适的水含量既可保证各组分的充分溶解，又能使蚀刻过程中产生的氟硅酸盐能吸附在玻璃本体上、并结晶生长，起到遮蔽作用。
控制第一蒙砂液中的偏铝酸盐的含量在上述较低的范围，可以使得蚀刻过程中形成的氟硅酸盐结晶体的尺寸较大，进而利于形成长度、宽度较大的第一凸起结构；还可保证氟硅酸盐结晶体在玻璃表面有序地聚集沉积并且连接成片，进而保证第一凸起结构分布的有序性、紧密性。此外，氟化氢铵的含量在上述范围，其与偏铝酸盐的质量比合适，利于氟硅酸盐的结晶体有序排布，还可保证氟化氢铵在蒙砂液中能充分溶解而不析出，以免影响氟硅酸盐的结晶，造成玻璃表面不同位置的闪晶效果差异大。
具体地，第一蒙砂液中，偏铝酸盐的重量份数可为1.1份、1.2份、1.5份、1.8份、2份、2.5份、2.8份或3份等。氟化氢铵的重量份数可为22份、25份、30份、32份、35份或38份等。硝酸的重量份数可为25份、27份、30份、32份、35份或38份等。硫酸的重量份数可为0.8份、1份、1.2份或1.4份等。盐酸或有机酸的重量份数可独立地为1.1份、1.2份、1.5份、1.8份、2份、2.5份、2.8份或3份等。在一些实施方式中，第一蒙砂液中，氟化氢铵的重量份数为30-38份；硝酸的重量份数为30-38份。
其中，所述偏铝酸盐可以包括偏铝酸镁、偏铝酸钠、偏铝酸钾、偏铝酸钙中的至少一种。本申请一些实施方式中，所述第一蒙砂液中的偏铝酸盐为偏铝酸镁。含偏铝酸镁的蒙砂液可保证蚀刻过程中的氟硅酸盐遮蔽物结晶体的尺寸较大，利于在玻璃表面形成尺寸较大的凸起结构。其中，所述有机酸可以包括酒石酸、柠檬酸、山梨酸、氨基磺酸和马来酸中的至少一种。在一些实施方式中，有机酸为酒石酸。
本申请实施方式中，所述第一次蒙砂蚀刻可以在25-30℃下进行静置蚀刻2-5min。其中，静置条件利于氟硅酸盐结晶体在玻璃表面均匀、稳定地附着、生长，以起到均匀、有效的遮蔽作用。具体地，第一次蒙砂蚀刻的温度可以是25℃、27℃、28℃或30℃等。第一次蒙砂蚀刻对温度要求不高，在常温下即可进行玻 璃的蚀刻，降低了工艺成本。第一次蒙砂蚀刻的时间可以是2min、2.5min、3min、4min或4.5min等。
步骤S20中，间隔分布的光阻图案30可通过光刻工艺形成，具体可以包括以下步骤：
S201，在第一次蒙砂蚀刻后的第一表面上形成光阻层；
S202，对上述光阻层进行曝光、显影，以除去部分光阻层，得到平行且间隔分布的多个长条状光阻图案。
其中，光阻层可以通过涂布、干燥后形成，其整面覆盖第一次蒙砂蚀刻后的玻璃本体的第一表面。可选地，光阻层的厚度(也即光阻图案的厚度)是3-10μm，具体可以是4μm、5μm、6μm、7μm、8μm或9μm等。在一些实施方式中，该厚度为6-8μm。其中，涂布的方式可以是是刷涂、喷涂、刮涂或旋涂等。干燥可以将用来形成光阻层的光刻胶中的溶剂挥发，减少其流动性。可选地，干燥处理的温度可以为80-120℃，例如为90℃、100℃、110℃等。
曝光可以使光阻层中的感光成分发生交联反应形成交联结构，以待后续曝光区域可被显影液溶解掉(光刻胶为正性胶时)，或者未曝光区域被显影液溶解掉(光刻胶为负性胶时)。其中，曝光的方式可以是传统曝光(用紫外光隔着预定的掩模板对光阻层进行照射)，还可以是LDI(Laser Direct Imaging，激光直接成像技术)。LDI不需要采用掩模板曝光，而是通过激光扫描的方式直接形成所需图像，经显影后显示出的图像精细、形状多样。
显影所用的显影液通常为碱性溶液。具体可使用氢氧化钠、氢氧化钾、碳酸钠、碳酸氢钠、氨水等无机碱的溶液，还可以采用四甲基氢氧化铵(TMAH)、三甲基胺、三乙醇胺等有机碱。在一些具体实施例中，显影液可以是电导率为30-50mS/cm的KOH溶液，或者是浓度为2.38％的TMAH溶液。显影过程中，显影液可以喷淋到玻璃本体的一侧，或者将玻璃本体浸泡在显影液中等。显影处理的时间可以是2-10min。在一些实施方式中，在显影之后，还可以进行后烘处理，以改善光阻图案固化，提升其附着力、硬度等。其中，后烘处理可以在140℃-180℃(例如150℃或160℃等)的温度下进行20min-50min(例如30min、45min等)。
本申请中，光阻图案30在玻璃本体10的第二表面10b上的投影形状为长 条形。本申请实施方式中，光阻图案30的最大横截面宽度W 1为100-500μm，相邻两个光阻图案30之间的间隔距离W 2为100-500μm。这里的最大横截面宽度是指光阻图案30的最大横向尺寸，是指在垂直光阻图案30的延伸方向(即，宽度方向)上的截面的最大宽度，具体是指其在玻璃本体的第二表面10b上的正投影的轮廓线上任意两点之间距离的最大值；“相邻两个光阻图案30之间的间隔距离”是指相邻两个光阻图案30在玻璃本体上的正投影的轮廓线上的两点之间距离的最小值。
控制光阻图案30的最大横截面宽度、间隔控制在上述范围，可以经第二次蒙砂蚀刻形成宽度较大、间隔较大的第一蒙砂区101和第二蒙砂区102，并保证这两个蒙砂区分别具有较多的凸起结构，以便丰富玻璃的闪光效果，并增加抗指纹效果等。具体地，光阻图案30的W 1、W 2独立地为100μm、110μm、130μm、140μm、150μm、200μm、300μm、400μm或500μm等。
本申请实施方式中，步骤S30中，所述第二次蒙砂蚀刻采用的蒙砂液(以下统称“第二蒙砂液”)包括偏铝酸盐、硝酸、盐酸、硫酸、氟化氢铵和水。在一些实施方式中，第一蒙砂液还包括有机酸。本申请实施方式中，第二蒙砂液中偏铝酸盐的质量百分含量大于所述第一次蒙砂蚀刻采用的蒙砂液中的偏铝酸盐的质量百分含量。这样可保证在第二次蒙砂时可将第一次蒙砂形成的第一凸起结构进行蚀刻，转变成较多的小凸起结构(即，第二凸起结构)。
本申请一些实施方式中，第二蒙砂液包括以下重量份数的各组分：偏铝酸盐：5-10份；硝酸：25-40份；盐酸：1-3份；硫酸：0.5-1.5份；氟化氢铵：20-40份，有机酸：1-3份，以及水。在一些方式中，第二蒙砂液含有的水的重量份数可以为10-30份。合适的水含量既可保证各组分的充分溶解，又能使蚀刻过程中产生的氟硅酸盐在蒙砂液中顺利析出而吸附在玻璃本体上起到遮蔽作用。
第二蒙砂液的作用机理与上述第一蒙砂液的作用机理相同，这里不再赘述。其中，控制第二蒙砂液中的偏铝酸盐的含量在上述较高的范围，可以使得蚀刻过程中形成的氟硅酸盐结晶体的尺寸较小，即反应生成的遮蔽物的面积减小，进而利于形成长度、宽度较小的第二凸起结构，使玻璃表面的闪点亮度较高且闪光效果细腻。
其中，第二蒙砂液中的偏铝酸盐可以包括偏铝酸镁、偏铝酸钠、偏铝酸钾、 偏铝酸钙中的至少一种。本申请一些实施方式中，所述第二蒙砂液中的偏铝酸盐为偏铝酸钠或偏铝酸钾。偏铝酸钠或偏铝酸钾不仅具有较高的溶解度，可使蒙砂液具有良好的稳定性，并且采用偏铝酸钠时，蒙砂液在玻璃表面形成的凸起结构粒径与偏铝酸钾相比更小，玻璃表面的闪光度与偏铝酸钾相比更高。在一些具体实施例中，所述第二蒙砂液中的偏铝酸盐为偏铝酸钠。相较于偏铝酸钾，采用含偏铝酸钠的蒙砂液的蚀刻速率略慢，更利于蚀刻形成结构精细的凸起结构，减少在将未被光阻图案30覆盖的第一凸起结构11蚀刻成为第二凸起结构12时发生结构坍塌的概率。
具体地，第二蒙砂液中，偏铝酸盐的重量份数可为5份、5.5份、6份、7份、8份、9份、9.5份或10份等。氟化氢铵的重量份数可为22份、25份、30份、32份、35份或38份等。硝酸的重量份数可为25份、27份、30份、32份、35份或38份等。硫酸的重量份数可为0.8份、1份、1.2份或1.4份等。盐酸或有机酸的重量份数可独立地为1.1份、1.2份、1.5份、1.8份、2份、2.5份、2.8份或3份等。在一些实施方式中，第二蒙砂液中，氟化氢铵的重量份数为30-38份；硝酸的重量份数为30-38份。
与上述第一次蒙砂蚀刻类似，所述第二次蒙砂蚀刻可以在25-30℃下进行静置蚀刻2-5min。其中，静置条件利于氟硅酸盐结晶体在玻璃表面均匀、稳定地附着、生长，以起到均匀、有效的遮蔽作用。具体地，第二次蒙砂蚀刻的温度可以是25℃、27℃、28℃或30℃等。蒙砂液对温度要求不高，在常温下即可进行玻璃的刻蚀，降低了工艺成本。第二次蒙砂蚀刻的时间可以为2min、2.5min、3min、4min或4.5min。
步骤S30中，第一蒙砂区是玻璃表面经过第一次蒙砂蚀刻形成，所述第二蒙砂区是玻璃表面依次经过第一次蒙砂蚀刻和第二次蒙砂蚀刻形成。且第一蒙砂区101和第二蒙砂区102的材质与玻璃本体10相同。
步骤S30的第二次蒙砂蚀刻过程中，被光阻图案30覆盖的玻璃表面几乎不受第二次蒙砂液的刻蚀影响，说明该光阻图案30是耐酸刻蚀的。因此，该光阻图案可通过碱性溶液去除。在一些实施例中，光阻图案的去除方法包括：采用浓度为8-20wt％的强碱溶液，在40-90℃下进行超声褪镀2-8分钟。其中，强碱可以是NaOH或KOH。
本申请一些实施方式中，在完成步骤S30的第二次蒙砂蚀刻之后，还可以对玻璃本体进行强化处理。具体的强化后处理可以按照常规技术(如离子交换法等)进行，在此不再一一赘述。由此，可以增强玻璃的表面应力，改善其机械强度。
本申请上述实施例提供的闪光玻璃的制备方法较简单，适合于各种材质的玻璃本体的处理，且整体的制备/处理时间短，成本低。通过上述制备方法制得的闪光玻璃的一侧表面蒙砂面具有相间分布的两种蒙砂区，各蒙砂区具有两种不同尺寸的凸起结构，该闪光玻璃具有丰富的闪光效果，外观表现力强，还具有良好的抗指纹、防眩光效果。
此外，上述带第一凸起结构11的第一蒙砂区101和带第二凸起结构12的第二蒙砂区102是玻璃本体一样的材质，即，最终所得的闪光玻璃是一体成型的，避免了采用材质与玻璃不一样的外加叠设膜片产生闪光效果所带来的膜片易脱落、不能持久产生闪闪发光的外观效果的问题。
本申请实施例还提供了一种电子设备壳体，包括如本申请前文所述的闪光玻璃，或者包括通过本申请前文所述的制备方法制得的闪光玻璃。
含有上述闪光玻璃的电子设备壳体，具有炫酷的外观效果，能提升电子设备的外观变现力和产品竞争力。
本申请一些实施方式中，在将本申请的闪光玻璃应用到电子设备壳体时，还可以对其进行镀抗指纹膜的处理，例如将抗指纹膜设置在带第一蒙砂区和第二蒙砂区的第一表面上。
此外，上述电子设备壳体还可以包括设置在玻璃本体10的第二表面10b上的装饰层，以满足对壳体的外观效果需要。具体地，装饰层可以包括但不限于光学膜层、防护层和盖底油墨层中的至少一种。
上述电子设备壳体可以是电子设备的示屏盖板、后盖、中框、或者后盖和中框一体成型的复合壳体等。采用上述电子设备壳体的电子设备可以是各种消费类电子产品，如手机、平板电脑、笔记本电脑、可穿戴设备(如智能手表、智能手环)、虚拟现实(Virtual Reality，VR)终端设备、增强现实(Augmented Reality，AR)、电子阅读器、电视机、摄录机、投影仪等电子产品。
以电子设备是手机、平板电脑、可穿戴产品等便携式电子设备来说，该电 子设备壳体具体可以是组装在该电子设备前侧的显示屏盖板，其盖设在显示模组上；还可以是组装在该电子设备后侧的后盖。在一些实施方式中，当该电子设备是具有摄像功能的电子设备时(如手机、数码相机)，该电子设备壳体还可以是摄像头保护盖板。
下面通过具体的实施例继续说明本申请技术方案。
实施例1
一种闪光玻璃的制备方法，制备流程可参见图3，包括以下步骤：
(1)配制第一蒙砂液：将酒石酸(C 4H 6O 6)与氟化氢铵(NH 4HF 2)混合均匀，在搅拌下加入硝酸并搅拌均匀，向其中依次加入盐酸、水和偏铝酸镁(Mg(AlO 2) 2)并进行搅拌，最后加入硫酸并搅拌均匀，静置4h后，得到第一蒙砂液；该第一蒙砂液包括如下质量百分含量的各组分：偏铝酸镁：2％；硝酸：36％；盐酸：2％；硫酸：1％；氟化氢铵：36％，酒石酸：2％，及21％的水。
取厚度为0.6mm的玻璃本体(具体是锂铝硅玻璃板，牌号是熊猫-1681)，先在其一侧表面(可称为“背面”)涂布一层厚35μm的耐酸油墨层；将该玻璃本体浸泡在上述第一蒙砂液中，在25℃下静置2min，以使与该玻璃本体的背面相对设置的另一表面(可称为“正面”或“第一表面”)被蚀刻，之后取出玻璃本体，采用清水清洗干净，得到第一次蒙砂蚀刻后的玻璃本体(如图4所示)，其正面形成多个包括至少一条棱的第一凸起结构(可称为“砂粒状大凸起”)，正面由原本的光面变成了蒙砂状，可称为“蒙砂面”。
(2)在第一次蒙砂蚀刻后的表面形成光阻图案
在上述蒙砂面上涂布一层厚度约为7μm的光刻胶，并在100℃的烤箱中烘烤4min，使光刻胶干燥；之后进行LDI曝光，曝光图案为直线式长条形图案，宽度为150μm，且曝光图案是相隔分布，间隔距离约为165μm；接着采用电导率为50mS/cm的KOH溶液(质量浓度为12wt％)进行浸泡显影3min，以去除曝光区域的光刻胶；最后在150℃的烤箱中进行后烘处理30min，以继续固化光刻胶。这样，在蒙砂面上显现出多个平行且间隔分布的长条形光阻图案，如图5所示。
(3)第二次蒙砂蚀刻
配制第二蒙砂液：将氟化氢铵与硝酸混合均匀，加入酒石酸搅拌均匀，向其中依次加入盐酸、水和偏铝酸钠(NaAlO 2)并进行搅拌，最后加入硫酸并搅拌均匀，静置4h后，得到第二蒙砂液；该第二蒙砂液包括如下质量百分含量的各组分：偏铝酸钠：7％；硝酸：37％；盐酸：2％；硫酸：1％；氟化氢铵：32％，酒石酸：2％，及19％的水。
将上述玻璃本体浸泡在第二蒙砂液中，在25℃下静置2min，以使未被光阻图案覆盖的蒙砂面区域被二次蚀刻而形成多个第二凸起结构(如图6所示，可称为“砂粒状小凸起”)，之后取出玻璃本体，采用清水清洗干净，之后去除光阻图案和前述耐酸油墨层(具体去除方式是采用20wt％的NaOH溶液在80℃下超声褪镀10min，并用清水清洗干净)，得到如图6、图1所示的闪光玻璃。
图1、图6为实施例1所得闪光玻璃在不同放大倍数下的金相显微镜照片。从图1、图6可以获知，该闪光玻璃的一侧表面包括具有多个第一凸起结构(砂粒状大凸起)的第一蒙砂区101及具有多个第二凸起结构(砂粒状小凸起)的第二蒙砂区102，第一蒙砂区101和第二蒙砂区102呈直条状且间隔分布，相邻的两个第一蒙砂区101之间通过第二蒙砂区102连接；第二凸起结构的高度和长度均小于第一凸起结构。其中，第一蒙砂区101的宽度约为140-165μm，第二蒙砂区102的宽度约为150-180μm。
从图1、图4及图6还可以获知，第一次蒙砂蚀刻形成的砂粒状大凸起的长度约为120-140μm，高度约为10-16μm。从图6及图1可以获知，第二次蒙砂蚀刻形成的砂粒状小凸起的长度约为30-60μm，高度约为3-6μm。
此外，在步骤(1)之后，还对图4所示的第一次蒙砂蚀刻后的玻璃本体进行雾度、透过率和粗糙度的测试，以获得第一蒙砂区的相关结果。并对图4的玻璃不进行光阻遮蔽、直接进行第二次蒙砂蚀刻，得到表面全部是砂粒状小凸起的蒙砂玻璃，对其进行雾度、透过率和粗糙度的测试，以获得第二蒙砂区的相关结果。当然，第一蒙砂区、第二蒙砂区的粗糙度参数还可以对图1或6的玻璃直接进行测试得到。
其中，雾度、透过率采用德国BYK透射雾影仪BYK-4725测量，粗糙度采用SJ411表面粗糙度仪测量，测试结果请参阅下表1。其中，粗糙度表征参数包括R a、R z、R t，其中，R a：算术平均值；R z：平均峰谷深度；R t：轮廓峰最高值 与轮廓谷最低值之和。
表1
Figure PCTCN2022137990-appb-000001
从表1可以看出，玻璃的一侧表面具有粗糙度截然不同的两个蒙砂区，且它们均具有较高的雾度和透光率，具有朦胧的视觉效果和良好的通透性，外观表现力强。
此外，对本申请实施例1的闪光玻璃进行拍照，以获得其外观效果图，如图7所示。另外，还对制备实施例1的闪光玻璃的过程中，第一次蒙砂蚀刻后的玻璃本体(即，图4的玻璃)进行拍照，其外观效果图如图8所示。上述外观效果图具体是指玻璃在宏观上呈现的视觉效果。
从图7及图8可以看出，玻璃本体经第一次蒙砂蚀刻后，其表面虽具有一定的闪光效果，但其闪光效果单一。而经本申请实施例的方法制得的闪光玻璃具有明显的闪光效果，且具有闪光程度不一样的多种闪光效果。其中，带有小凸起的区域，因凸起结构的尺寸较小、数目较多，其闪光细腻，可称为具有细闪效果。
实施例2
一种闪光玻璃的制备方法，其与实施例1的区别在于，将所述第二蒙砂液中的偏铝酸钠替换为偏铝酸镁，即，第一蒙砂液和第二蒙砂液中含有的偏铝酸盐种类相同。
实施例3
一种闪光玻璃的制备方法，其与实施例1的区别在于：1)第一蒙砂液包括如下质量百分含量的各组分：偏铝酸镁：3％；硝酸：37％；盐酸：1％；硫酸： 0.5％；氟化氢铵：38％，酒石酸：2.5％，及18％的水；
2)第二蒙砂液包括如下质量百分含量的各组分：偏铝酸钠：10％；硝酸：39％；盐酸：2％；硫酸：1％；氟化氢铵：35％，酒石酸：3％，及10％的水。
实施例4
一种闪光玻璃的制备方法，其与实施例1的区别在于：1)第一蒙砂液包括如下质量百分含量的各组分：偏铝酸镁：1％；硝酸：32％；盐酸：2％；硫酸：1％；氟化氢铵：32％，酒石酸：2％，及30％的水；
2)第二蒙砂液包括如下质量百分含量的各组分：偏铝酸钾：5％；硝酸：35％；盐酸：2％；硫酸：1％；氟化氢铵：30％，酒石酸：2％，及25％的水。
实施例5
一种闪光玻璃的制备方法，其与实施例1的区别在于：步骤(2)中，光阻图案的最大横截面宽度约为400μm，相邻光阻图案的间隔约为450μm。
实施例5所得闪光玻璃与实施例1的区别主要在于，第一蒙砂区和第二蒙砂区的宽度不同。其中，实施例5所得闪光玻璃的第一蒙砂区的宽度在390-420μm的范围内，第二蒙砂区的宽度在450-480μm的范围内。
图9为本申请实施例5的闪光玻璃的外观效果图。从图9可以看出，由于其两个蒙砂区的宽度比实施例1宽，肉眼下比实施例1更容易区分出两个蒙砂区：深度较深的区域为具有小凸起的第二蒙砂区，其闪光效果比第一蒙砂区更细腻。
下表2汇总了实施例2-4的闪光玻璃的凸起结构的尺寸参数。下表3汇总了实施例2-5的闪光玻璃的雾度、透过率和粗糙度测试结果。
表2
Figure PCTCN2022137990-appb-000002
Figure PCTCN2022137990-appb-000003
表3
Figure PCTCN2022137990-appb-000004
从表3可以获知，本申请上述实施例的闪光玻璃的表面具有粗糙度不同的两个蒙砂区，且它们均具有较高的雾度和合适的透光率，这表明本申请实施例的闪光玻璃具有较好的蒙砂效果，及良好的通透性，能够实现特殊的外观效果。另外，粗糙度不同的两个蒙砂区的存在，还可赋予该闪光玻璃丰富灵动的闪光效果及良好的防炫光效果、抗指纹效果等。
此外，由实施例1与实施例2的比较可以获知，当第一蒙砂液和第二蒙砂液中的偏铝酸盐的种类不同时，与第一次蒙砂蚀刻形成的第一蒙砂区相比，第二次蒙砂蚀刻形成的第二蒙砂区的小凸起结构的排列更紧密、粗糙度Ra更小、雾度更高。
以上所述仅表达了本申请的几种示例性实施方式，其描述较为具体和详细，但并不能因此而理解为对本申请专利范围的限制。应当指出的是，对于本领域的普通技术人员来说，在不脱离本申请构思的前提下，还可以做出若干变形和改进，这些都应视为本申请的保护范围。
附图标记：
10：玻璃本体；
10a：第一表面；
101：第一蒙砂区；
102：第二蒙砂区；
11：第一凸起结构；
12：第二凸起结构；
10a：第一表面；
10b：第二表面。

Claims (14)

  1. 一种闪光玻璃，其特征在于，包括玻璃本体(10)，所述玻璃本体(10)具有第一表面(10a)，所述第一表面(10a)包括间隔分布的多个第一蒙砂区(101)，相邻的两个所述第一蒙砂区(101)之间通过第二蒙砂区(102)连接，且所述第一蒙砂区(101)和所述第二蒙砂区(102)呈直条状，其中，所述第一蒙砂区(101)具有多个第一凸起结构(11)，所述第二蒙砂区(102)具有多个第二凸起结构(12)，所述第一凸起结构(11)和所述第二凸起结构(12)独立地包括至少一条棱，且所述第二凸起结构(12)的高度和长度均小于所述第一凸起结构(11)。
  2. 如权利要求1所述的闪光玻璃，其特征在于，所述第一凸起结构(11)和所述第二凸起结构(12)的形状独立地包括棱柱、棱台、立方体、棱锥中的至少一种。
  3. 如权利要求1或2所述的闪光玻璃，其特征在于，所述第一凸起结构(11)的长度在100μm-150μm的范围内，所述第一凸起结构(11)的高度在10μm-16μm的范围内。
  4. 如权利要求1至3中任一项所述的闪光玻璃，其特征在于，所述第二凸起结构(12)的长度在30μm-60μm的范围内，所述第二凸起结构(12)的高度在3μm-6μm的范围内。
  5. 如权利要求1至4中任一项所述的闪光玻璃，其特征在于，所述第一蒙砂区(101)的宽度为100μm-500μm；所述第二蒙砂区(102)的宽度为100μm-500μm。
  6. 如权利要求1至5中任一项所述的闪光玻璃，其特征在于，所述第一蒙砂区(101)的雾度在80％-90％的范围内，透光率在75％-93％的范围内；所述第二蒙砂区(102)的雾度在90％-95％的范围内，透光率在75％-93％的范围内。
  7. 如权利要求1-5任一项所述的闪光玻璃，其特征在于，所述第一蒙砂区(101)的粗糙度Ra在1.5μm-4μm的范围内；所述第二蒙砂区(102)的粗糙度Ra在0.3μm-1μm的范围内。
  8. 一种闪光玻璃的制备方法，其特征在于，包括以下步骤：
    对所述玻璃本体(10)的第一表面(10a)进行第一次蒙砂蚀刻，以使所述第一表面(10a)形成多个第一凸起结构(11)；其中，所述第一凸起结构(11)包括至少一条棱；
    在所述第一次蒙砂蚀刻后的第一表面(10a)上形成平行且间隔分布的多个光阻图案，所述光阻图案呈长条状；以及
    对带有所述光阻图案的第一表面(10a)进行第二次蒙砂蚀刻，以使未被所述光阻图案覆盖的所述第一表面(10a)转变成具有多个第二凸起结构(12)的第二蒙砂区(102)，之后去除所述光阻图案，在相邻的所述第二蒙砂区(102)之间得到表面具有多个所述第一凸起结构(11)的第一蒙砂区(101)；
    其中，所述第二凸起结构(12)包括至少一条棱，所述第二凸起结构(12)的高度和长度均小于所述第一凸起结构(11)。
  9. 如权利要求8所述的制备方法，其特征在于，所述第一次蒙砂蚀刻、所述第二次蒙砂蚀刻采用的蒙砂液独立地包括偏铝酸盐、硝酸、盐酸、硫酸、氟化氢铵和水，且所述第二次蒙砂蚀刻采用的蒙砂液中的偏铝酸盐的质量百分含量大于所述第一次蒙砂蚀刻采用的蒙砂液中的偏铝酸盐的质量百分含量。
  10. 如权利要求9所述的制备方法，其特征在于，
    所述第一次蒙砂蚀刻采用的蒙砂液包括以下重量份数的各组分：偏铝酸盐：1份-3份；硝酸：25份-40份；盐酸：1份-3份；硫酸：0.5份-1.5份；氟化氢铵：20份-40份，酒石酸：1份-3份，以及水；
    所述第二次蒙砂蚀刻采用的蒙砂液包括以下重量份数的各组分：偏铝酸盐：5份-10份；硝酸：25份-40份；盐酸：1份-3份；硫酸：0.5份-1.5份；氟化氢铵：20份-40份，酒石酸：1份-3份，以及水。
  11. 如权利要求9或10所述的制备方法，其特征在于，所述偏铝酸盐包括偏铝酸镁、偏铝酸钠、偏铝酸钾、偏铝酸钙中的至少一种。
  12. 如权利要求9或10所述的制备方法，其特征在于，所述第一次蒙砂蚀刻采用的蒙砂液中的偏铝酸盐为偏铝酸镁；所述第二次蒙砂蚀刻采用的蒙砂液中的偏铝酸盐为偏铝酸钠或偏铝酸钾。
  13. 如权利要求8至12中任一项所述的制备方法，其特征在于，所述第一次蒙砂蚀刻是在25℃-30℃下进行静置蚀刻2min-5min；所述第二次蒙砂蚀刻是 在25℃-30℃下进行静置蚀刻2min-5min。
  14. 一种电子设备壳体，其特征在于，
    所述电子设备壳体包括如权利要求1至7中任一项所述的闪光玻璃，或者
    所述电子设备壳体包括通过如权利要求8至13中任一项所述的制备方法制得的闪光玻璃。
PCT/CN2022/137990 2022-01-17 2022-12-09 一种闪光玻璃及其制备方法和电子设备壳体 WO2023134355A1 (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN202210049208.7A CN116477844A (zh) 2022-01-17 2022-01-17 一种闪光玻璃及其制备方法和电子设备壳体
CN202210049208.7 2022-01-17

Publications (1)

Publication Number Publication Date
WO2023134355A1 true WO2023134355A1 (zh) 2023-07-20

Family

ID=87218282

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2022/137990 WO2023134355A1 (zh) 2022-01-17 2022-12-09 一种闪光玻璃及其制备方法和电子设备壳体

Country Status (2)

Country Link
CN (1) CN116477844A (zh)
WO (1) WO2023134355A1 (zh)

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20190062202A1 (en) * 2014-07-09 2019-02-28 Agc Glass Europe Low sparkle glass sheet and process of making it
CN110467354A (zh) * 2019-08-27 2019-11-19 Oppo广东移动通信有限公司 蒙砂玻璃及其制备方法、玻璃后盖和电子设备
CN111800527A (zh) * 2020-06-02 2020-10-20 郑州恒昊光学科技有限公司 一种具有漂浮视觉效果的新型玻璃手机后壳及其制作方法
CN113411430A (zh) * 2021-07-08 2021-09-17 Oppo广东移动通信有限公司 防眩光盖板的制作方法、防眩光盖板和电子装置
WO2021238349A1 (zh) * 2020-05-25 2021-12-02 Oppo广东移动通信有限公司 壳体组件及其制备方法和电子设备
CN114873925A (zh) * 2022-05-12 2022-08-09 维达力实业（赤壁）有限公司 多纹理蒙砂玻璃及其制备方法
CN115028370A (zh) * 2022-07-05 2022-09-09 杭州老板电器股份有限公司 带纹理的玻璃面板及其制备方法和应用

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20190062202A1 (en) * 2014-07-09 2019-02-28 Agc Glass Europe Low sparkle glass sheet and process of making it
CN110467354A (zh) * 2019-08-27 2019-11-19 Oppo广东移动通信有限公司 蒙砂玻璃及其制备方法、玻璃后盖和电子设备
WO2021238349A1 (zh) * 2020-05-25 2021-12-02 Oppo广东移动通信有限公司 壳体组件及其制备方法和电子设备
CN111800527A (zh) * 2020-06-02 2020-10-20 郑州恒昊光学科技有限公司 一种具有漂浮视觉效果的新型玻璃手机后壳及其制作方法
CN113411430A (zh) * 2021-07-08 2021-09-17 Oppo广东移动通信有限公司 防眩光盖板的制作方法、防眩光盖板和电子装置
CN114873925A (zh) * 2022-05-12 2022-08-09 维达力实业（赤壁）有限公司 多纹理蒙砂玻璃及其制备方法
CN115028370A (zh) * 2022-07-05 2022-09-09 杭州老板电器股份有限公司 带纹理的玻璃面板及其制备方法和应用

Also Published As

Publication number Publication date
CN116477844A (zh) 2023-07-25

Similar Documents

Publication Publication Date Title
KR101336935B1 (ko) 커버글라스 및 이의 제조 방법
WO2021036369A1 (zh) 壳体组件及其制备方法和电子设备
WO2021052457A1 (zh) 工件、工件的制备方法、壳体以及电子设备
US20220248552A1 (en) Shell assembly and preparation method therefor, and electronic device
CN105884202B (zh) 一种高防眩玻璃及其制备工艺
CN104297978B (zh) 一种显示基板的制备方法、显示装置的制备方法
WO2019076283A1 (zh) 组合试剂、制备曲面玻璃板材的方法以及电子设备
CN114031304B (zh) 高铝玻璃刻蚀液、防眩光高铝玻璃、壳体组件和电子设备
TW200425163A (en) Electromagnetic shielding sheet, front plate for display, and method for producing electromagnetic shielding sheet
CN101526685B (zh) 彩膜基板及其制造方法
CN113772956B (zh) 一种防眩光玻璃及其制备方法
US10761365B2 (en) Display module and manufacturing method
WO2019076284A1 (zh) 曲面玻璃板材及其制备方法、电子设备
TW201219846A (en) Light-diffusing polarization plate and liquid-crystal display device
CN116583053A (zh) 壳体、其制备方法及电子设备
CN110183113A (zh) 防眩光玻璃的制备方法
WO2023134355A1 (zh) 一种闪光玻璃及其制备方法和电子设备壳体
KR20150126317A (ko) 커버글라스 및 이의 제조 방법
TW201017228A (en) Method for making a mold and method for making an anti-glare film
WO2022121478A1 (zh) 壳体组件及其制备方法和电子设备
CN114349360A (zh) 制备玻璃基材的方法、玻璃基材、壳体组件以及电子设备
JP3483878B1 (ja) クロムエッチング液、およびそれを使用した液晶カラーフィルター用ブラックマトリックスの製造方法
KR20090110240A (ko) 포토마스크용 기판, 포토마스크 및 그의 제조방법
CN101411254A (zh) 导电薄膜及其制备方法、以及透明电磁屏蔽薄膜
JP4867262B2 (ja) 電磁波遮蔽シート

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 22919988

Country of ref document: EP

Kind code of ref document: A1