TW201017228A - Method for making a mold and method for making an anti-glare film - Google Patents

Abstract

This invention provides a method for making a mold, the method comprising the steps of: performing a copper plating or a nickel plating on the surface of a mold material, polishing the plated surface, forming film by spreading a photosensitive resin, exposing the photosensitive resin film in the form of a pattern, developing the photosensitive resin film, performing an etching by using the developed photosensitive resin film as a mask, forming an undulation on the polished surface, plating the undulated surface with chromium, wherein the etching is performed over the entire surface of the mold material during the etching step. This invention also provides a method for making an anti-glare film by using the abovesaid mold.

Description

201017228 VI. Description of the Invention: [Technical Field] The present invention relates to a method for producing a crucible having a fine concavo-convex shape on a surface, and a mold obtained by the method, which is a low mist Haze has an anti-glare property (anti_gia^) film manufacturing method. [Note: Anti-_, there is a case called anti-_, the same refers to the film or layer to prevent the display of light] [Prior Art] LCD monitor and electric pass. . Female ^ shoulderless panel, picture tube (cathode ray tube: (four) display organic electroluminescence (Shi coffee - new, (7) not 4 image display device, when the external light reflects its display surface, will make the visibility text In order to prevent this kind of external light, the mobile phone that pays attention to the enamel, the personal computer, the external light (4), the general purpose (v=wideera), the digital camera, and the mobile phone that uses the reflected light for display. In the past, the film layer has been reflected in the image display device. The film layer can be roughly divided into: the film-free interference caused by the non-reflective treatment of the film is formed by forming fine concavities and convexities on the surface to make the light into the light. A film that scatters and reflects the anti-glare treatment of the image hazy. 4: The anti-reflection (four) film is a multilayer film that needs to form a uniform optical film thickness, because the cost is relatively high. It is widely used in large personal computers and monitors because it can be manufactured at a lower cost because it can be manufactured at a lower cost. This anti-glare film has been used, for example, by Dispersed resin dissolved (four) material base (four) wt), and forging coating film thickness ^ 32150 6 4 201017228 r- . The filling is exposed on the surface of the coated crucible, whereby it is made by the method of convexizing on the sheet, etc. However, the anti-glare film which is dispersed by the filling thorn is subject to the tree due to the arrangement and shape of the concavities and convexities. Because of the influence of the dispersion state and the coating state of the side-filling agent, it is difficult to fill the unevenness, and there is a problem that the anti-glare film in the lower haze cannot be obtained. It is difficult to "view", which is easy to produce the phenomenon of "Glittering". It is also made by dispersing the filler. In the anti-glare film, the second:: shot: the refractive index of the binder of the binder dispersed in the filler: in the case of the anti-glare film disposed on the image display device, There is a problem that the contrast is easily lowered due to the dispersion of light at the interface between the filler and the binder resin. « In terms of the aspect, there is also a filler which does not contain a filler, and exhibits anti-glare property only by fine irregularities formed on the surface of the transparent resin crucible. Try it. For example, ^ species ^ special open 2GG2'1891 In the G6 publication (Patent Document No.), it is disclosed that the transparent Jr, the ionizing radiation curable resin is sandwiched between the embossing (emb〇SS) mold and the film, and the ionizing radiation is hardened in a state between the film. The hard resin of the resin is formed into a 10-point average roughness and the average distance between adjacent ones on the three-dimensional thickness reference surface respectively satisfies a predetermined value of fine concavities and convexities, and the shape 321506 5 201017228 is formed with the irregular ionizing radiation An anti-foam film in which the line curable resin layer is provided on the transparent resin film. Further, a film having fine concavities and convexities formed on the surface is used as a light diffusion layer disposed on the back side of the liquid day display device instead of the configuration. The anti-glare film on the display surface of the display device is disclosed in, for example, Japanese Laid-Open Patent Publication No. Hei 6-34961 (Patent Document 2), and Japanese Patent Laid-Open Publication No. 2004-45471 (Patent Document 3). No. (Patent Document 4) and the like. In Patent Documents 3 and 4, it is disclosed that the ionizing radiation curable resin liquid is filled in an embossing roll having a shape in which the unevenness is reversed and is transparent in the direction of rotation of the plate. The substrate is in contact with the true tree, and when the transparent substrate is in contact with the concave plate, the resin is hardened between the hydrophilic plate and the hardened resin, and the hardened resin is cured at the same time as the hardened resin. After the material is adhered, 'the method of forming the laminate of the cured resin and the transparent substrate from the pro-gravure plate as the concave and convex surface on the thin surface; in the method disclosed in the patent documents 3 and 4, Because:: The composition of the ionizing radiation hardening resin liquid used is limited, and there is no film: the leveling of the cloth - a 'so expected in the method, Γ again, as disclosed in Patent Documents 3 and 4. It is ensured that the embossed resin liquid is filled in the embossing roll gravure', so it is accurate, and it is required to have a higher machine for the embossing pro-gravure plate - it is difficult to make the embossing light problem. The case of the production of the rough, D, for example, in the above In Document 2, a method of forming a cylindrical body using a metal or the like and forming irregularities on the surface by electric blasting, sand blasting, etc., is disclosed. Japanese Laid-Open Patent Publication No. 2004-29240 (Patent Document 5) discloses the formation of an embossing roll by the "beads shot" method in Japan, and discloses the surface formation of a roll by the Cong-face number (Patent Document 6). The step of weaving the coating layer, the step of polishing the layer and the mirror surface, and the step of finely tapping the surface of the surface to prepare the embossing roll. 宁) Processing ❹ However, in this way, the pressure is applied. The appearance of the flower mirror _ in the state of processing, there will be a ' ^ (blast) cloth because of the less stone, and it is difficult to control the degree of the second: t cloth (four), and it is necessary to obtain the reproducible good There is still a problem in the shape of the depth of the depression. Ί, there is the convexity of the excellent (10) illusion function. In addition, the chrome surface coating (mineral chrome) is applied to the surface of the above-mentioned patent document 丨铁. ❹ Become a concave and convex surface. In addition, it is also described that in the case of using the bead blasting method or the bead blasting method, in order to improve the resistance during use, the surface of the surface is formed by embossing, etc. It is better to hunt this to achieve hard film and prevent the content of justice. On the other hand, the stencils are provided with a chrome clock (10) chrome on the surface of the shovel, and after the liquid blasting of #25〇, the chrome is read again. The treatment is performed to form a fine uneven shape on the surface. However, in the method of producing such an embossing roll, since sandblasting is performed on the harder than the chromium, it is difficult to form irregularities, and it is difficult to precisely control the shape of the formed irregularities. In addition, as described in Japanese Patent Laid-Open No. 321506 7 201017228 2004-29672 #υ公刊(Patent Document 7), since the secret itself is taken, ', the surface of the substrate and its shape are often thickened, 1 - A fine crack (Crad〇) due to chain chrome is formed on the unevenness formed by sand blasting, so it is difficult to design what kind of unevenness is to be formed. Further, because of the occurrence of chromium Fine cracks, therefore, there is also the problem that the scattering properties of the anti-foam film obtained in the end are changed in an undesired direction. In addition, due to the combination of the material of the surface of the embossing roll and the type of money covered, There are various changes in the surface of the finished roll, so there is also the need to select the appropriate surface of the wire and the appropriate type of material to be able to obtain the desired surface shape with good precision. In addition, there is a problem that the surface of the surface is inferior in use, and there is a problem in that it is insufficient in use due to the type of plating. In JP-A-2000-284106 (Patent Document 8), it is described in Substrate After the blasting process, the side step and/or the f-layer step of the film 4 are not described and suggested to provide a metal plating layer before the blasting step. Further, Japanese Patent Laid-Open Publication No. Hei 2-6-53371 (Patent Literature) (9) In the case of polishing the base material and performing the blasting process, the electroless nickel plating is applied, and the base is described in Japanese Patent Laid-Open Publication No. Hei. No. Hei. The material is subjected to copper plating or nickel plating, and is subjected to pulverization, and after blasting, chrome plating is performed to produce an embossed plate, and in Japanese Laid-Open Patent Publication No. 2007-237541 (Patent Document n), After performing the copper plating or plating, the polishing is performed, and after the sandblasting is performed, an etching step or a copper plating step is performed, and then chrome plating is performed to prepare an embossed plate. In the method of using the blasting process, it is difficult to form the surface unevenness of the surface of the 321506 8 201017228. Therefore, a large uneven shape having a period of 50/m or more is produced in the surface uneven shape. As a result, there is such a large concave-convex shape and the pixels of the image display device generate a disturbance, and a luminance distribution is generated and it is difficult to watch, and the so-called flicker is easy to cause. SUMMARY OF THE INVENTION An object of the present invention is to provide a method for manufacturing a mold which has a high anti-glare function and which has a fine concavo-convex shape on the surface, and further provides a mold for using the mold. , manufacturing method for preventing anti-glare film which exhibits excellent anti-glare function and sufficiently prevents visibility from being lowered due to white turbidity, and which does not cause flicker when disposed on the surface of a high-definition image display device, and which does not reduce contrast . Further, another object of the present invention is to use chrome plating having excellent properties such as hardness and surface gloss as plating on the surface of the mold, but the production does not cause roughening on the chrome surface, and is suitable for making a mold for preventing the glare film. And use this mold to manufacture an anti-glare film that exhibits an excellent anti-glare function. A method of manufacturing a mold according to the present invention, comprising: a first plating step of performing copper plating or nickel plating on a surface of a substrate for a mold; and a polishing step of performing a plating surface by the first plating step a polishing resin film forming step of applying a photosensitive resin to the surface to be polished to form a film; an exposure step for exposing the pattern to the photosensitive resin film; and a developing step for exposing the photosensitive resin film having a pattern Developing; etching step, using a developed photosensitive resin film as a mask, performing a surname process, and forming irregularities on the polished plated surface; and a second plating step for etching steps by etching 13 321506 201017228 The formed uneven surface is subjected to chrome plating; and, in the above step (10), the entire surface of the substrate for the mold is subjected to a dumping process. Here, the term "processing" means that the substrate for a mold is subjected to a surname treatment for a surface including a region covered by the mask. In the process of (iv) processing, the area not covered by the mask is usually first _, and the area covered by the mask is also etched as the subsequent processing proceeds.

In the method for manufacturing a mold according to the present invention, the step of the above-mentioned surname is as follows: using the sensation of the sensation of the sensation as a material, and performing the entire surface of the substrate for the mold containing the lighter area of the occlusion. The step of forming the irregularities on the polished plating surface is a preferred one (hereinafter also referred to as the manufacturing method A of the mold). In addition, when the entire surface of the substrate for the mold is subjected to the surname treatment, the surface of all the areas covered by the mask is temporarily etched, and the mask is peeled off and then closed again. It is also possible to carry out the engraving process.

/ The step of making the mold of the mold of the present invention is as follows: the first step (4) is to "make the hybrid resin film of the hybrid" mask and perform etching treatment to form irregularities on the polished plating surface; In the third resin film peeling step, after the photosensitive resin film is peeled off and the γ ==complete_photosensitive resin film, the uneven surface formed by the first etching step is passivated to be preferably 9 by the treatment. Manufacturing method B). In the method of manufacturing the mold of the present invention, the step of the step 32105 10 201017228 is preferably 2 to 100 / / in. In the first step of the manufacturing process of the mold of the month The side amount is preferably from 1 to 50. The amount of money in the second etching step in the manufacturing method B of the mold of the present invention is preferably from 1 to 50 mm. In the manufacturing method, the pattern of the beaker made on the computer is carried out by laser light emitted from a computer-controlled laser head, and is thereby performed on the photosensitive resin film in the exposure step. In the method for producing a mold according to the present invention, the photosensitive resin film remaining after the development step is not/resolved (the following is also not dissolved after development) The photosensitive resin film is referred to as a "mask". It is preferable that the area of the surface of the substrate for the mold is from 1 to 70% with respect to the area of the region in which the surface unevenness is formed on the surface of the substrate for the mold. In the manufacturing method of the mold of the present invention, the substrate for the mold is used The standard deviation of the mask in the area of „mxl〇0/zm for the projection area of the mold base surface is preferably l〇〇〇#m2 or less. ^ In the manufacturing method of the mold of the present invention, After the chrome plating is performed, it is preferable to use the chrome-plated surface as the concave-convex surface of the mold without using the chrome-plated surface. The method for manufacturing the mold of the present invention has a thickness of 1 to 10 by the chrome plating layer formed by chrome plating. Further, the present invention also provides a method for producing an anti-foam film, which comprises the steps of: transferring a convex surface to a transparent resin film by the method of manufacturing the mold of the present invention: Wu Zhishou 321506 11 201017228; a step of peeling off a transparent resin film on which a concave-convex surface of a mold is transferred from a mold. According to the method for producing a mold of the present invention, since a fine uneven shape is formed on the surface with good precision, good reproducibility can be obtained, and 'It is manufactured in a state where there is no defect, and it is a mold which contributes to the manufacture of an anti-glare film which exhibits high anti-glare function. Further, according to the manufacturing method of the anti-foam film of the present invention, It maintains low haze and displays the brightness of the image, prevents reflection and reflection, suppresses white turbidity, prevents flicker, prevents contrast reduction, etc., and industrially contributes to the manufacture of anti-glare film with excellent anti-glare properties. [Embodiment] <Manufacturing Method of Mold> Fig. 1 is a view schematically showing an example of the first half of the method for manufacturing a mold of the present invention. In Fig. 1, the mold in each step is schematically shown. The first half of the manufacturing method of the mold of the present invention basically comprises: [1] a first plating step; [2] a grinding step; [3] a photosensitive resin film forming step; _ and [4] an exposure step Hereinafter, each step of the first half of the manufacturing method of the mold of the present invention will be described in detail with reference to FIG. [1] First plating step In the method for producing a mold of the present invention, first, ore or nickel is applied to the surface of the substrate for the mold. Thus, by performing copper plating or nickel plating on the surface of the substrate for the mold, the adhesion and gloss of the chrome plating in the second plating step can be improved. That is, as described in the prior art, when chrome plating is applied to the surface of iron or the like, or when the chrome-plated surface is embossed by sandblasting or 12 321 506 201017228 . A fine crack is generated, and it is difficult to control the uneven shape of the surface of the mold. In contrast, first, the absence of such a defect can be eliminated by applying copper or nickel plating to the surface of the substrate. This is because the coating of copper plating or nickel plating is high, and it is smooth and strong, so that the surface of the mold substrate has a small unevenness and a cavity to form a flat and shiny surface. According to the characteristics of these wrought copper chains, even if the (10) layer is applied in the second chain coating step described later, the chromium 2 is present in the core due to the minute irregularities of the substrate and the holes. 'Because of the high coverage of copper or nickel, it can reduce the occurrence of fine cracks. For the purely used class or nickel, the person who can be used as the main body of the copper or the main body of the gold: 'the copper' means copper and Copper alloy system; second: nickel" means the meaning of nickel and nylon alloy. Copper plating and nickel plating φ are usually electrolytically plated. Electrolytic ore coating is carried out. However, if the plating layer is too thin, it is impossible to completely discharge the two sides: the sound is therefore better. There is no limit to the general 俜 to t, but in terms of the balance of cost, etc., it is enough to be around 〇〇am. In the method of producing a substrate, 'is suitable for formation and the like. In addition, from the point of view of cost, Lv's, for example, is referred to as: "Important:": Lightweight aluminum is preferred. In addition to the pure metal, it can be an alloy with Ming or iron 321506 13 201017228 as the main body. Further, the shape of the substrate is not particularly limited as long as it is a conventionally used shape, and may be a flat plate shape or a cylindrical or cylindrical roll. When a mold is produced using a roll-shaped base material, there is an advantage that the anti-foam film can be produced in a continuous roll shape. [2] Polishing step In the polishing step, the surface of the substrate on which copper plating or nickel plating is applied in the first plating step described above is polished. Through this step, it is preferred that the surface of the substrate be ground to a state close to the mirror surface. Since this is a gold plate or a metal roll that becomes a base material, in order to achieve the desired accuracy, machining such as cutting or grinding is often performed, so that scratches are left on the surface of the substrate, so even if it is performed In the case of copper plating or nickel plating, such processing flaws may remain, and the surface may not be completely smooth in the state of plating. In other words, even if the surface described later is subjected to deep processing of the flaws or the like, the irregularities such as the processing flaws are deeper than the irregularities formed after the respective steps are performed, and there are residual processing injuries and the like. The effect is that when the anti-glare film is manufactured using the mold, the optical characteristics may have an unpredictable influence. In Fig. 1(a), a flat substrate 1 for a mold is schematically shown, and in the first plating step, copper plating or nickel plating is applied to the surface of the substrate (as for the copper plating formed in the step or The nickel-plated layer is not shown), and the mirror-polished surface 2 is formed by the grinding step. The method of polishing the surface of the substrate to which copper plating or nickel plating is applied is not particularly limited, and any of mechanical polishing, electrolytic polishing, and chemical processing can be used. In terms of mechanical grinding, for example, ultra-precision plus laPPlng), fluid grinding method, buff grinding method '^ degree' is in accordance with the requirements of Chuan 01, preferably, and u Because the final thickness of the center line is the large thickness of MQ.lM, the influence of the surface roughness, so the lower limit of the Ο h after the grinding may not remain unrestricted; The thickness, Α ^ ^ , from the point of view of processing and processing costs. There are limits from age, so there is no need to specify. [3] Photosensitive Resin Film Forming Step In the photosensitive resin film forming step, a photosensitive resin = a solution of a solvent is applied to the surface 2 of the substrate 施 which is mirror-polished by the above-described polishing 2 Heating and drying are carried out to form a photosensitive film 2, which is a film. In Fig. 1(b), a state in which the photosensitive resin crucible 3 is formed on the surface 2 of the substrate 355 is schematically shown. ❹ In the case of a photosensitive resin, a conventionally known photosensitive resin can be used, for example, a negative photosensitive resin having a photosensitive portion hardening property. 'Used as a monomer or prepolymer of §1 with propylene fluorenyl or methacrylic acid in the molecule, a mixture of Biazazide and bis(rubber), poly(cinrylic acid) _(10)yvinyicin_te ) /, compound, etc. Further, in the case of a positive-type photosensitive resin which develops a light-dissolving portion and exhibits a property of leaving only the un-photosensitive portion, it is possible to use a resin or varnish. In addition, in the photosensitivity, various additives such as a sensitizer, a development accelerator, an adhesion modifier, and a 321506 15 201017228 cloth improver are also required. When such a photosensitive resin is applied to the surface 2 of the substrate 1, it is preferred to form a good coating film to be diluted with a suitable solvent, and a cellosolve can be used. A solvent, a propylene glycol solvent, an ester system, a solvent, an alcohol solvent, a ketone solvent, a highly polar solvent, and the like. - In the method of coating the photosensitive resin solution, a meniscus coat, a fountain coating, a dip coating, a spin coating, a roll coating, a wire can be used. A well-known method such as wire bar coating, air knife coating, blade coating, curtain coating, and the like. The thickness of the coating film is preferably in the range of i to 6 μm after drying. [4] Exposure process In the exposure step, a predetermined pattern is exposed to the photosensitive resin film 3 formed in the above-described photosensitive resin film forming step. The light source used in the exposure step can be appropriately selected in accordance with the photosensitive wavelength or sensitivity of the applied photosensitive resin film, for example, a g-line of a high-pressure mercury lamp (wavelength: 436 nm), a line of a high-pressure mercury lamp (wavelength) can be used. J〇5nm), i i-line of high-pressure mercury lamp (wavelength: 365nm), semiconductor laser (wavelength: 830 coffee, 53211111, 48811111, 4〇511111, etc.), (; laser (wavelength: 1〇6411111),

KrF excimer laser (wavelength · 248 nm), ArF excimer laser (wavelength: 193 nm), F2 excimer laser (wavelength: 157 nm), and the like. In the method for producing a mold of the present invention, in order to form the surface uneven shape with good precision, it is preferable to expose a predetermined pattern to the photosensitive resin film in a state of precise control in the exposure step. In the manufacturing method of the mold of the present invention, 321506 16 201017228, in order to expose a predetermined pattern to the photosensitive resin film with good precision, a pattern material is formed on a computer, and a laser head of '= brain= The laser light emitted by the bribe is preferred according to the pattern of the pattern. In carrying out such laser scanning, it is possible to use a printing plate as a laser drawing device. For example, there is Laser stream FX (Think_Lab Co., Ltd. ❹ ❹ in the i-th picture (〇, is a schematic display pattern exposed to 14 lipid film 3H in the case of Μ type sensitizing resin) 'The exposed area 4 borrows (4) ^ on the surface of the film to become a liquid:::, only the exposed area 4 remains in the base photosensitive resin ,, the exposed 7 ajE type photosensitive resin forms a sensible knot' The developing solution described later is increased in the amount of exposure in the bonding of the resin by exposure to the resin. Therefore, the developing step remains on the surface of the substrate to be dissolved, and only the unexposed region 5 remains therein as the photosensitive resin. The projected area of the surface is the area of the exposed area for the convex shape of the substrate for the mold. When the surface of the substrate is formed with a surface concave resin film, for example, the photosensitive film is exposed to a lighter than 0 (four) light resin. Further, in the case where the film is formed into a film by the method of G1 to G·7, it is preferred to expose the photosensitive resin to a photosensitive resin in a ratio of (1-Μ)/τ\ positive photosensitive resin. 01 to 〇.7 way to create a pattern into the b rate to create a pattern for exposure, you can use this 3215 06 17 201017228 The area of the mask to the surface of the substrate for the mold is set to 1 to 7 〇 0 / 对于 for the area of the surface of the substrate for the mold which has the surface uneven shape. Fig. 2 is a schematic display pattern The state of the photosensitive resin film observed from the upper surface of the substrate for the mold is exposed. The total area of the area of the exposed region 4 is Μ, and the total area of the exposed area 4 and the area of the unexposed area 5 is In the case where the area exposed by the photosensitive resin film in the region of the surface of the substrate for the mold is M100 on the surface of the substrate surface for the mold, the standard deviation of M100 is 1 〇〇〇/im 2 or less. Preferably, the standard deviation of the projected area of the surface of the substrate for the mold is set to 1 〇〇〇 #m2 or less in the area of 100# mxlOOem of the surface of the substrate for the mold. Here, the standard difference of Μι〇〇 can be calculated by finding the exposed area M1〇〇 in the region of 1〇〇#like l〇〇/zm for the pattern of different positions of 3 points or more. In calculating the standard deviation of 耵卯 'in order to reduce The error is obtained by finding the surface of the l〇0#mxi〇Mm2 region for the exposed surface M100 for the pattern at different positions of 5 or more points. The shape of the pattern by the exposure is not particularly limited. If there are patterns such as circles, squares, hexagons, etc., it is also possible to trace the continuous patterns. It can also be used to combine them. In addition, the strokes are arranged in different sizes of circles, squares, hexagons, etc. In addition, the pattern of the logo can be configured in a regular manner, or it can be arranged in the second, third, and fourth without a regular arrangement. The diagram of the circular display is shown in Fig. 3, which is schematically arranged in three different sizes. The circular pattern 321506 18 201017228, the fourth figure is a schematic representation of a person who is irregularly arranged with a circular pattern. In addition, FIG. 5 schematically shows a configuration in which a quadrangular pattern is arranged, FIG. 6 schematically shows a person in which a hexagonal pattern is arranged, and FIG. 7 schematically shows a configuration in which a circular pattern is overlapped to describe continuity. Patterner. * In the latter part of the manufacturing method of the mold of the present invention, a development step of developing the photosensitive resin film exposed by the pattern is performed; and the developed photosensitive resin film is used as a mask, and etching treatment is performed to The polished plating surface is formed with an etching step of forming irregularities; and the second plating step of performing chrome plating is performed on the uneven surface formed by the etching step. However, in the etching step described above, the entire surface of the substrate for the mold is subjected to an etching treatment. Here, the etching treatment of the entire surface of the substrate for a mold means that the entire surface of the region covered by the mask is etched in the substrate for the mold. During the etching process, the area not covered by the mask is first etched, and the area covered by the mask is also etched as the processing proceeds thereafter. In the production method A of the mold which is one of the manufacturing methods of the mold of the present invention, this is utilized. That is, in the method A for manufacturing a mold according to the present invention, the etching step is performed by using the developed photosensitive resin film as a mask, and the entire surface of the region covered by the mask is included in the substrate for a mold. An etching process is performed, and a step of forming irregularities on the plated surface to be polished is performed. In addition, the etching step may be configured by one etching process as in the manufacturing method A of the mold, or may be configured to be divided into two or more to perform an etching process, and the step of removing the mask between the etching processes is performed. . For example, when the entire surface of the substrate for a mold is subjected to an etching treatment, the etching is temporarily terminated before etching is performed on all the regions covered by the mask 19 321506 201017228, and the mask is removed and then etched again. The surface is etched. In the manufacturing method B of the mold which is another aspect of the manufacturing method B of the mold of the present invention, this is employed. That is, in the method B for manufacturing a mold according to the present invention, the etching step includes a first etching step of performing etching treatment using the developed photosensitive resin film as a mask and forming irregularities on the polished plating surface. A photosensitive resin film peeling step of peeling the photosensitive resin film; and a second © etching step of passivating the uneven surface formed by the first etching step by etching after the photosensitive resin film is completely removed. Hereinafter, the manufacturing methods A and B of the mold of the present invention will be further described. <<Production Method of Mold A>> [5A] Development Step In the development step, when the negative photosensitive resin is used in the photosensitive resin film 3, the unexposed region 5 is dissolved by the developer, only The exposed region 4 remains on the substrate for the mold and acts as a mask in the subsequent etching step. On the other hand, when a positive photosensitive resin is used for the photosensitive resin film 3, only the exposed region 4 is dissolved by the developer, and the unexposed region 5 remains on the substrate for the mold, and the subsequent etching is performed. The step plays a role as a mask. As the developer used in the developing step, those known in the art can be used. For example, there are inorganic tests such as sodium hydroxide, potassium hydroxide, sodium carbonate, sodium citrate, sodium metasilicate, ammonia, etc.; primary amines such as ethylamine and n-propylamine; and secondary amines such as diethylamine and di-n-butylamine. a tertiary amine such as triethylamine or decyldiethylamine 20 321506 201017228 . Classes; alcohol amines such as dimethylethanolamine and triethanolamine; hydroquinone tetramethylammonium hydroxide tetraethyl sulphate, trimethyl hydride Recorded by ethyl (Trimet屻,

Aquarium salt such as Hydroxyethyl Ammcmium Hydr〇xide); an aqueous alkaline solution such as a cyclic amine such as pyrrole or piperidine; an organic solvent such as xylene or benzene. A The development method in the developing step is not particularly limited, and a method such as *crush development, nozzle fog development, magnetic brush development, and super shadow can be used. In the method A for manufacturing a mold according to the present invention, the area of the region where the surface of the substrate for the mold is formed with the surface unevenness is set to the projection of the surface of the substrate for the mold. % is preferable. In order to satisfy this requirement, it is only necessary to expose a pattern having a ratio as described above. That is, when a negative photosensitive resin is used, it is patterned by a ratio of M/^ to 〇1 to 〇7. In addition, when a positive photosensitive resin is used, it is only necessary to form a pattern in a ratio of (1-M)/T $ 〇. 〇1 to 〇. 7 to expose the projection. When the ratio of the area to the surface of the substrate is too small, in the etching step described later, the substantially entire surface of the surface of the substrate for the mold is uniformly broken, and it is difficult to form sufficient unevenness on the surface of the substrate, and the obtained surface is obtained. The anti-foam film manufactured by the mold tends to have insufficient tendency to obtain sufficient anti-glare performance. Further, if the ratio of the projected area of the mask to the surface of the substrate is too large, the surface that is not etched after the etching step remains as many Flat surface There is a tendency that it is difficult to obtain sufficient anti-glare property in the anti-foam film manufactured by using the obtained mold. In order to form the unevenness of the pattern reflecting the mask with good precision on the surface of the substrate for the mold, and it is 321506 21 201017228 In the middle of the process, the right side of the area covered by the mask is corrected, and the area of the mask on the surface of the surface of the surface of the surface of the mold/the surface having the surface unevenness is used to 5 to the ancestral range is a better substrate. In addition, it is preferable to mark the surface of the substrate of the mold for (10) and (4) the projection surface of the surface of the molded substrate by 1000 Å or less. If the standard deviation of $ is less than 1_^2, the pattern can be exposed by using the surface of the substrate ΙΟΟαπ^ called m in the region after development, and the sensation of the film is not affected by the surface of the mold. At the time of remuneration, the surface roughness of the obtained mold has 5 〇, and the unevenness of the surface irregular shape of the above cycle will result in the use of the obtained mold and the prevention _, in the junction = image display device Time' There will be a tendency to produce flashes. From the perspective of the surface of the fine-shaped cookware, the angle of the surface of the fine-grained utensils is more uniform, and the standard of the area of the mask is measured in the area of the heart-measuring area. The deviation is 2; the surface of the soil is better than the first diagram (4). The resin film 3 is subjected to a photosensitive resin in a photosensitive region: the region 5 is dissolved by the developer, and is not exposed to the surface to form a mask. The second resin is left on the photosensitive resin film 3 The ^4 display is used to display the state in which the area 4 exposed in the picture (c) is processed by the display k. The 15th residue remains on the surface of the substrate: the dissolved 'only unexposed single 6'. Further, the region 4 of the exposure of Fig. 2, 201017228, remains on the surface of the substrate in the case of the negative photosensitive resin after the development step, and functions as a mask in the subsequent etching step. On the other hand, in the case of a positive photosensitive resin, the unexposed region 5 of Fig. 2 remains on the surface of the substrate, and functions as a mask in the subsequent etching step. [6A] Last Name In the etching step of the manufacturing method A of the mold, the mold which is left on the surface of the molded substrate after the above development step is used as a mold, and the mold which is mainly a portion without a mask is used. Etching with a substrate: Illustratively, an example of the manufacturing method A of the mold of the present invention is shown. Fig. 8(a) is a schematic representation of the difficulty of using the maskless portion. The base material i for the lower part of the main portion 6 is not used from the mold. The mask is engraved ‘but as _ proceeds, the money is taken from the unmasked ^^, and the border between the cover 6 and the unmasked area 7 is attached: the remaining moment. Because of the mold of the part of the substrate, the money _. With ^, near the boundary of the region 7 of the mask 6 under the mask, the mask 6 and the mask 6 and the uncovered layer are also referred to as the side etehing material. . The virtual side of the Fig. 9 is a schematic representation of the surface side of the molded substrate which is shown to be in accordance with the manufacturing method of the present invention. That is, the unmasked portion of the mold is paid until it passes through the root: the adjacent substrate is joined as a tangential _ processing substrate surface under the soap 6 under the mold substrate 321506 23 201017228 1 is also etched . Fig. 9 is a view schematically showing the state in which the side etching is performed and the substrate 1 for the mold at the lower portion of the mask 6 is also etched. Etching treatment in the etching step, usually using gasified iron (FeCh)

Liquid, vaporized copper (CuClO liquid, alkali etching solution (Cu (; Nh3) 4C12), etc., can be carried out by using a metal surface, but a strong acid such as hydrochloric acid or sulfuric acid can be used or an electrolytic plating can be used. In the reverse electrolytic etching of the opposite potential, the concave shape formed on the substrate for the mold during the etching treatment differs depending on the type of the base metal, the type of the photosensitive resin film, the etching method, and the like, and therefore cannot be generalized. When the etching amount is 1 〇//m or less, it is substantially equidistant from the metal surface contacting the etching liquid (4). The term "closed amount" refers to the thickness of the substrate eroded by the etching. The amount of money is 2 〇〇 _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ Hyun. In addition, it will be difficult to eat = (four) 'the entire surface of the molded substrate is treated like a ruthenium. When the amount exceeds 100,

The song (4) is large, (4) belongs to the ^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^^ The width of the mask is large _ mu#: The entire surface of the surface of the molded substrate is subjected to the surname 2 in order to tilt the surface from the portion which is not cut and the surface of the shape is not = chrome plating in the second plating step thick. However: = thickening, easy to produce agglomeration, due to the chrome-plated valley and

This is not ideal. In addition, when the thickness of the chrome-plated Z 321506 24 201017228 is thinned, the surface of the surface irregularities 9 formed by the portion to be etched and the portion which is not etched can not be sufficiently relaxed, and the desired state cannot be obtained. The mold of the surface shape, so the anti-foam film made using the mold does not exhibit excellent anti-glare properties. Fig. 10 is a view showing the surface of the substrate for the board which is not subjected to the treatment of the entire surface of the mold member. The surface unevenness g of the portion (4) and the fourth portion (4) which is not engraved has the surface inclination of (4). Further, in the method of manufacturing a mold of the present invention, it is preferred to include a step of removing the photosensitive resin film between the steps of the fresh-keeping step. Hunting is carried out in the closing step. _ The whole surface of the substrate surface for the mold is applied. Although the fresh surface will be molded from the surface of the substrate, the peeled mask may adhere to the surface of the substrate for the mold. Be the first to fall. The attached mask is removed by full rotation in the photosensitive tree = removal (four). In the sensation of the resin film, the shirt is removed (4). In order to remove the liquid, it is possible to use the photosensitive resin film of the negative-type exposure portion and the positive type by changing the pH, temperature, and immersion time. The sound of the non-exposed portion is completely turned to m = (4) The film % can be: = The peeling method in the film removing step is not particularly::: ==: development, ultrasonic development, and the like. [5B] Development step 321506 25 201017228 In the development step, the negative feeling _resin is on the photosensitive resin film day, the unexposed area is dissolved in the developing solution*5, and only the exposed area 4 remains in the holder On the substrate, in the next step, the mask function is used. In the other aspect, when the positive photosensitive substrate is used as the photosensitive resin film 3, only the exposed region 4 is dissolved by the developer, and The exposed region 5 remains on the substrate for the mold, and functions as a mask in the next first etching step. As the developer used in the developing step, a well-known person can be used. For example, there are sodium hydroxide, potassium hydroxide, sodium carbonate, sodium citrate, sodium metasilicate, gas and water special inorganic test, ethylamine, n-propylamine and other primary amines; diethylamine, di-n-butylamine and other secondary Amines; tertiary amines such as triethylamine and methyldiethylamine; alcohol amines such as dimethylethanolamine and diethanolamine; tetramethyl sulphate, tetraethyl hydroxide, trimethyl hydroxyethyl hydroxide A quaternary amine salt such as ammonium (Trimethyl Hydroxyethyl Ammonium Hydroxide); an alkaline aqueous solution such as a cyclic amine such as ruthenium or piperidine; or an organic solvent such as diphenylbenzene or hydrazine. The developing method in the developing step is not particularly limited, and a dipping development, a spray development, a brush development, and an ultrasonic wave can be used in the manufacturing method of the mold of the present invention. Mold = the projected area of the substrate surface is preferably i to 7 〇% with respect to the area of the region where the convex shape is formed on the surface of the substrate for the mold. In order to fully check /1, it is only necessary to expose a pattern of the ratio as described above. That is, when the fat is made, it is only _. Shoulder to the side. · The method of 7 can be exposed first. In addition, when a positive type four-light resin is used, 321506 26 201017228 • It is sufficient to form a pattern by exposure to (1__M)/T of 0.01 to 0.7. If the ratio of the projected area of the mask to the surface of the substrate is too small, the substantially entire surface of the surface of the substrate for the mold will be uniformly etched in the etching step described later, and it is difficult to form sufficient unevenness on the surface of the substrate. However, the anti-glare film produced by using the obtained mold has a tendency to be difficult to obtain sufficient anti-glare properties. Further, if the ratio of the projected area of the mask to the surface of the substrate is too large, the flat surface remaining after the first etching step, that is, the surface that is not etched becomes large, and remains flat after the second etching step. surface. This ® 丨 肖形# also has a tendency to prevent sufficient anti-glare properties when using the anti-foam film manufactured by the obtained mold. From the viewpoint of forming the unevenness of the pattern reflecting the mask with good precision on the surface of the substrate for the mold, the mask for the area of the region in which the surface uneven shape is formed on the surface of the substrate for the mold is used for the substrate for the mold The projected area of the surface is preferably in the range of 3 〇 to 65%. In addition, the standard deviation of the projected area of the surface of the substrate for the mold from the surface of the substrate of the substrate for the board is less than 1000 /zm2. In order to satisfy this requirement, it is sufficient to expose the pattern with a standard deviation of 叽 (8) of 1 000 /iin2 or less as described above. When the standard deviation of the photosensitive resin film remaining in the area of 100/zmx100/iin of the surface of the substrate for the mold is not more than 1000 //m2 for the projected area of the surface of the substrate for the mold, the obtained mold is The surface uneven shape produces unevenness of the surface unevenness shape having a period of 50/zm or more, and the anti-glare film produced by using the obtained mold is provided when the image display device of the high dream name is disposed. A tendency to produce flicker. The standard deviation of the projected area of the mask on the surface of the substrate for the mold in the area of 100//mxl00/zm of the surface of the substrate for the mold is obtained from the viewpoint of making the surface irregularity of the mold of the corpse 27 321506 201017228 more uniform. It is better to use 500 // m2 or less. Fig. 1(d) is a view schematically showing a state in which development processing is performed on the photosensitive resin film 3 by using a negative photosensitive resin. The region 5 which is not exposed in Fig. 1(c) is dissolved by the developer, and only the exposed region 4 remains on the surface of the substrate to form the mask 6. Fig. 1(e) is a view schematically showing a state in which development processing is performed on the photosensitive resin film 3 using a positive photosensitive resin. The exposed region 4 in Fig. 1(c) is dissolved by the developer, and only the unexposed region 5 remains as a mask 6 on the surface of the substrate. Further, the exposed region 4 of Fig. 2 remains on the surface of the substrate in the case of the negative photosensitive resin after the development step, and functions as a mask in the next first etching step. On the other hand, in the case of a positive photosensitive resin, the unexposed region 5 of Fig. 2 remains on the surface of the substrate, and functions as a mask in the next first etching step. [6A1] First etching step In the first etching step of the manufacturing method B of the mold, a photosensitive resin film remaining on the surface of the substrate for a mold after the development step is used as a mask, and the mask is mainly unmasked. The mold of the part is etched with the substrate. Fig. 14 is a view schematically showing an example of the latter half of the manufacturing method B of the mold of the present invention. Fig. 14(a) is a view schematically showing a state in which the substrate 1 for a mold having no mask portion 7 is mainly etched by the first etching step. The substrate 1 for the mold below the mask 6 is not etched from the surface of the substrate for the mold, but is etched from the unmasked region 7 to 28321506 201017228 as the etching progresses. Therefore, in the vicinity of the boundary between the mask 6 and the maskless region 7, the substrate 1 for the mold below the mask 6 is also etched. In the following, near the boundary between the mask 6 and the unmasked region 7, the mold under the mask 6 is also referred to as side etching by the substrate 1 being etched. Figure 15 is a schematic representation of the progress of the side etch. The dotted line 8 of Fig. 15 shows the surface of the substrate for a mold which changes as the etching progresses. The etching treatment in the first etching step is usually carried out by using a ferric chloride (FeCl3) liquid, a copper chloride (cuci2) liquid, a test engraving liquid (Cu(NH3)4Cl2), etc., to etch the surface of the base metal. A strong acid such as hydrochloric acid or sulfuric acid may be used, or a reverse electrolytic etching by applying a potential opposite to that at the time of electrolytic plating may be used. The concave shape formed by the base material for the mold at the time of performing the engraving treatment differs depending on the type of the base metal, the type of the photosensitive resin film, the etching method, and the like. Therefore, it cannot be generalized, but when the etching amount is 10 μm or less 'The etch is roughly equidistant from the metal surface contacting the surname engraving. The term "money" as used herein refers to the thickness of a substrate that is eroded by etching.蚀刻 The etching amount in the first step is preferably 1 to 50 / / m. When the residual amount is less than lem, the uneven shape is hardly formed on the surface of the metal, and the mold is substantially flat, so that the anti-glare property does not appear. Further, when the amount of money exceeds 50/zm, the height difference between the uneven shape formed on the metal surface becomes large, and the anti-foam film produced by using the obtained mold becomes cloudy, which is not preferable.钱1 The engraving process in the engraving step can be performed by one-time processing, and can be divided into two or more times to perform the surname processing. Here, when the surname processing is divided into two or more times, it is preferable that the total amount of silver engraving processed twice or more is 1 to 50/zm. 29 321506 201017228 [6B2] Photosensitive resin film peeling step In the photosensitive resin film peeling step of the manufacturing method B of the mold, the photosensitive resin film remaining as a mask in the first etching step is completely dissolved. Remove. In the photosensitive resin film peeling step, the photosensitive resin film is dissolved using a peeling liquid. In the same manner as the above-mentioned developing solution, the photosensitive resin film of the exposed portion can be used when the negative photosensitive resin film is used, by changing the pH, temperature, concentration, and immersion time. When the positive photosensitive resin film is used, the photosensitive resin film in the non-exposed portion is completely dissolved and removed. The 剥离 peeling method in the photosensitive resin film peeling step is not particularly limited, and methods such as dipping development, spray development, magnetic brush development, and ultrasonic development can be used. Fig. 14(b) is a view schematically showing a state in which the photosensitive resin film 6 used as a mask in the first etching step is completely dissolved and removed by the photosensitive resin film peeling step. The first surface uneven shape 9 is formed on the surface of the substrate for a mold by the mask 6 and the etching by the photosensitive resin film. [6B3] 2nd etching step

In the second etching step of the manufacturing method B of the mold, the first surface uneven shape 9 formed by the first etching step using the photosensitive resin film as a mask is etched. By the second etching treatment, the surface of the first surface uneven shape 9 formed by the first etching treatment is not steeply inclined, and the optical characteristics of the anti-foam film produced by using the obtained mold are ideal. The direction changes. In Fig. 14(c), it is shown that the first surface uneven shape 9 of the substrate 1 is gentlened by the second etching treatment, and the surface is inclined to be steep, and the surface is inclined by 30 321506. 201017228 . The state of the second surface uneven shape 1Q. ...the second partial step of the hemiplegia treatment is also the same as the first step, wrong: ferric chloride (FeC10 liquid, copper chloride (CuCl2) liquid, side liquid (6) (10) 3))) Also, a strong acid such as hydrochloric acid or sulfuric acid, or a reverse electrolysis by applying an antipotential to an electrolytic bond (4). The degree of relief of the unevenness after the execution of the money engraving is different depending on the type of the base metal, the engraving method, and the size and depth of the concavities and convexities obtained by the i-th step, because of the fact that the (four) domain money The most A's head = the general = r and the first one = engraved::: The optical characteristics of the anti-glare film obtained by transferring the transparent film - if the amount is too large, the uneven shape almost disappears, and the flatness is flat The mold, so it does not appear anti-glare. Therefore, the amount of _ is preferably in the range of 1 to 50 hearts, and more preferably in the range of 4 to 2 Å. The meal engraving process in the second engraving step is also the same as the step of the first engraving step, and the engraving process can be performed by i-times of the engraving. Here, the surname processing is divided into the above and " =,. In the case of the second side step, the steepness of the first surface uneven shape 9 formed by the borrowing step is sufficiently alleviated, and the latter will be described later. The ore chromium in the second plating step is thickened. However, 321506 31 201017228 If the thickness of the chrome plating is too thick, it is prone to granulation, which is not preferable. In addition, when the thickness of the secret is thinned, it cannot be made by the first! The surface tilt of (4) of the first surface uneven shape 9 formed by the surname step sufficiently relaxes the mold in which the desired surface shape cannot be obtained, and therefore the anti-glare produced by using the mold does not exhibit excellent anti-glare properties. <<Manufacturing method A and B> of the mold> b [7] Second plating step Next, by performing chrome plating, the uneven shape of the surface is made more gentle. Fig. 8 (8) shows that the secret layer U is formed on the surface uneven shape 1 formed by the treatment of the surname, and the surface 12 is relaxed. Fig. 14 (4) shows the state in which the chrome layer is formed after the surface of the surface is embossed by the treatment of the second step. In the present invention, the surface of the flat plate or the like is made of a plating having a high gloss, a high hardness, and a small coefficient of friction. Money The type of chrome is not __, but the money (four) is called the chrome-plated chrome or the decoration of the secret. Chromium plating is usually carried out by electrolysis in the form of an aqueous solution containing anhydrous chromic acid (Cr〇3) and less sulfur. The thickness of the chrome plating can be controlled by adjusting the current density and the electrolysis. In the above-mentioned Japanese Laid-Open Patent Publication No. 2002-189106, Japanese Laid-Open Patent Publication No. 2004-45472, and Japanese Laid-Open Patent Publication No. Hei No. Hei. No. Hei. No. Hei. Unlike the types of chrome, most of them have a rough surface after plating, or most of the tiny cracks caused by chrome plating, 321506 32 201017228. As a result, the optical properties of the reptiles developed in the direction of thinking. A mold that scrapes the surface of the raw sugar, and does not manufacture an anti-glare film. This is because the general purpose of the _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ In the present invention, copper plating or nickel plating is performed by (4) the base metal to eliminate the possibility of production by chrome plating. Further, in the second plating step, forging other than the clock chrome is performed. And Ο not ideal. This is because the hardness of the mold and the abrasion resistance are reduced when the cover is read outside the chrome. Therefore, the durability of the mold is lowered, and the unevenness is worn or the mold is damaged during use. It is very difficult to obtain sufficient anti-glare function in the money obtained from the turning device, and it is highly probable that defects will occur on the film. Further, the method of polishing the surface after the recording as disclosed in Japanese Laid-Open Patent Publication No. 2004-187 or the like is still not preferable in the present invention. This is based on the fact that the flat portion is formed on the outermost surface due to the polishing, and the optical characteristics are deteriorated or the shape control factor is increased to form a shape control which is difficult to reproducibly. In the present invention, the shovel chrome is applied to the surface uneven shape formed by the above-described side steps, whereby a mold having a more irregular shape and a higher surface hardness can be obtained. At this time, the convergence of the concavities and convexities is also different because of the type of the base metal, the size and depth of the concavities and convexities paid by the engraving step, and the type or thickness of the plating, and therefore cannot be generalized. The biggest factor in controlling the degree of relaxation is still the thickness of the bell. If the thickness of the chrome is thinner, the surface shape and the relief effect of the 321506 33 201017228 obtained before the chrome processing are insufficient, and the optical properties of the anti-foam film obtained by transferring the concave-convex shape to the transparent film are not Better. On the other hand, if the thickness of the bell is too thick, the productivity is deteriorated, and a plating defect called agglomerated protrusions is generated, which is not preferable. Therefore, the thickness of the chrome plating is preferably in the range of 1 to 10 #m, and more preferably in the range of 3 to 6 in the range of m. The chrome plating layer formed in the second plating step is preferably formed to have a Vickers hardness of 800 or more, and is preferably formed to have a thickness of 1,000 or more. This is because the Vickers hardness of the chrome layer is less than 800, the durability of the mold is reduced, and the hardness of the chrome is reduced. It is highly probable that the plating bath composition, electrolysis conditions, etc. will occur during the plating treatment. Abnormal, and most likely cause undesired effects on the condition of the defect. In this way, a mold having substantially no flat portion can be obtained. Thus, a mold having substantially no flat portion is suitable for obtaining an anti-foam film exhibiting preferable optical characteristics. Further, the average height Pa of the arbitrary profile of the surface of the embossed surface of the present invention is 0.01 to 0. 2 / / m, and the average length of the profile curve is PSm. 1至1. 0/2内。 The maximum cross-sectional height Pt of the cross-sectional curve is 0. 1 to 1. 0/2in. The average height Pa of the above-mentioned arithmetic of the mold is smaller than 0. 01 / zm, or the maximum sectional height Pt is less than 0.1 / m hours, the surface shape of the anti-fog film made by using the mold is almost flat, and it is impossible to present Fully anti-glare performance tendency. In addition, the arithmetic average height Pa is greater than 0.2 mm, or the maximum profile height Pt is 1. 0 # m, when the mold is made using the mold 34 321506 201017228 The film may be cloudy, flickering, or textured. Reduce the tendency. Further, when the above average length PSm of the mold is small, the anti-foam film produced by using the mold tends to fail to exhibit sufficient anti-glare properties. On the other hand, when the upper average length psm is larger than 5 Gum, the anti-glare film which is made by using the mold is placed on a high-definition image to show a tendency to flicker. The present invention also provides a method for producing an anti-foam film using the mold obtained by the above-described mold forming method of the present invention. The method of the present invention includes: The step of printing the mold of the present invention, the step of transferring the surface of the resin film, and the step of peeling the transparent transparent resin film from the mold. == The manufacturing method of the anti-glare film of the invention is suitable for producing an anti-glare film which exhibits better nine-study characteristics. Preferably, the transfer of the film is carried out by embossing. For example, there is a hot embossing method of a thermoplastic resin from the viewpoint of ϋν embossing using a photocurable resin, wherein, from the viewpoint of productivity (4), fine UVM is used. The brightening method is to form a photohardening, 曰s on the surface of the transparent resin film, and press the photocurable resin layer against the uneven surface of the mold and harden it to transfer the concave and convex surface of the mold to the light. The layer of the curable resin layer. Specifically, the ultraviolet curable film is coated with a UV-curable resin, and the ultraviolet curable resin is applied to the surface of the transparent resin film while the applied ultraviolet curable resin is adhered to the concave-convex surface of the mold to make the ultraviolet light 321506 35 201017228 The tree & hardened, 4 is formed from a thin resin which is formed with a hardened resin layer of a hardened resin layer, whereby the mold is cured by ultraviolet curing. When the uv embossing method is used, the transparent resin film may be a film which is substantially transparent in optical properties, for example, a cellulose triacetate film, a polyethylene terephthalate film, and a polymethyl group. A solvent-cast film (a resin film such as an east or an extruded film) which is a thermoplastic film of the acrylic acid film, a polycarbonate film, or a primary urethane-based compound, such as a monomeric amorphous cyclic hydrocarbon. The type of the ultraviolet curable resin in the case of using the UV embossing method is not particularly limited, but a commercially available one may be used. Alternatively, an appropriately selected photoinitiator may be combined with an ultraviolet curable resin to be used at a wavelength. The visible light of the outer line can also be hardened by the visible light. Specifically, the polyfunctional acrylic vinegar such as dimercaptopropyl triacrylate or pentaerythritol tetraacrylate can be used separately. Either two or more of these may be used in combination and 'applicable to IRGACURE 907 (product of Ciba Specialty Chemicals Co., Ltd.), IRGACURE 184 (product of Ciba Specialty Chemicals), LUCIRINT A photopolymerization initiator such as PO (product of BASF Co., Ltd.) is mixed. On the other hand, the hot embossing method is a method in which a transparent resin film formed of a thermoplastic resin is pressed against a mold in a heated state, and the mold is pressed. The method of transferring the surface shape to the transparent resin film. The transparent resin film used in the hot embossing method may be substantially transparent, for example, 36.

321506 201017228 , using a thermoplastic resin such as polymethyl methacrylate, polycarbonate, polyethylene terephthalate, cellulose triacetate, or a primary olefinic compound A solvent cast film or an extruded film or the like. The transparent resin film can also be suitably used as a substrate film for coating an ultraviolet curable resin in the uv embossing method as described above. [Examples] Hereinafter, the present invention will be described in further detail by way of examples, but the present invention is not limited to the examples.实施 <Example Al> A person who performs Ba 11 ard plating on the surface of an aluminum roll having a diameter of 200 mm (according to JIS Α 5056) was prepared. The copper ballard plating system is composed of a copper plating layer/thin silver plating layer/surface copper plating layer, and the overall thickness of the shovel coating layer is about 200//1 〇. The surface of the copper ore was mirror-polished, and a photosensitive resin was applied to the surface of the ground copper to be dried, and dried to form a photosensitive resin film. Next, the pattern of the pattern which is repeated and arranged in the pattern shown in Fig. 11(a) is exposed to the photosensitive resin film by laser light and developed. The laser light exposure and development were carried out using Laser Stream FX (manufactured by Think-Lab Co., Ltd.). In the photosensitive resin film, a positive photosensitive resin is used. By exposing the pattern shown in FIG. 11( a ), the projected area of the surface of the substrate for the mold is formed in the surface of the substrate for the mold. 3%。 The ratio of the area of the area of the surface has a surface roughness of 9.3%. In addition, in order to expose the pattern of the pattern shown in Fig. 11(a) by laser light, the standard of the projected area of the substrate surface for the mold in the 100#mx100/zm region of the substrate surface for the mold is exposed. The deviation system 37 321506 201017228 is 1000 #〇12 or less. Thereafter, etching treatment was carried out with a copper chloride solution. The etching amount at this time was set to 8/zm. The photosensitive resin film was removed from the roll after the etching treatment, and chrome-plated processing was performed to prepare a mold. At this time, the chrome plating thickness was set to 4/m. &lt;Comparative Example A&gt; A mold was produced in the same manner as in Example A1 except that the pattern of the pattern shown in Fig. 11(b) was repeatedly exposed by laser light on the photosensitive resin film. By exposing the pattern shown in Fig. 11(b), the ratio of the projected area of the mask to the surface of the substrate for the mold relative to the area of the surface of the surface of the substrate for the mold which has the surface unevenness is 67. 4%. &lt;Evaluation Experiment 1&gt; The surface shapes of the respective molds obtained in Example A1 and Comparative Example A1 were evaluated. Since it was difficult to directly measure the surface shape, a sample of the anti-foam film was prepared by the method described in Example A2 and Comparative Example A2 described later, and the surface shape of the sample was measured and evaluated as the surface shape of the mold. In addition, the profile curve on the anti-foam film is the same as the _ ❹ under-reversal on the profile curve on the die, but the arithmetic mean height Pa, the average length PSm, and the maximum profile height Pt are the same. In the measurement of the surface shape, a confocal microscope PL# 2300 (manufactured by Sensofar Co., Ltd.) was used, and in order to prevent the sample from being warped, it was measured by bonding an optically transparent adhesive to the glass substrate in such a manner that the uneven surface became a surface. When measuring, the magnification of the objective lens is set to 50. Based on the measurement data, the calculation is performed according to the method of JIS B 0601, thereby calculating the arithmetic average height Pa, the average length PSm, and the maximum profile height Pt. The results are shown in Table A1. 38 321506 201017228 <Example A2> * A photocurable resin composition GRANDIC 806T (manufactured by Dainippon Ink and Chemicals Co., Ltd.) was dissolved in ethyl acetate to prepare a solution of 50% by weight * concentration, and further Luciferin TPO (photochemical name: 2, 4, 6-Trimethylbenzoyl diphenylphosphine oxide) The coating liquid was prepared by adding 5 parts by weight per 1 part by weight of the curable resin component. The coating liquid was dried on a thickness of 80/m of a triacetate (TAC) film. After drying, the coating thickness was 10/m, and it was dried in a dryer set to 6 (TC) for 3 minutes. The dried film was formed into a mold side with a photocurable resin composition layer. The uneven surface of the mold obtained in each of Example Ai was pressed by a rubber roller. In this state, the light from the high-pressure mercury lamp having a strength of 20 mW/cm 2 was converted into light by the h-line from the TAC film side.光mJ /cm2 is irradiated to cure the photocurable resin composition layer. After that, the TAC film is peeled off from the mold together with the hardened resin, and a laminate of a cured resin having a concavity and convexity on the surface and a TAC film is obtained, respectively. The transparent anti-glare film of Example A2 was constructed. <Comparative Example A2> A transparent anti-glare film was obtained in the same manner as in Example A2 except that the mold obtained in Comparative Example A1 was used as the mold. Evaluation Experiment 2&gt; Each of the obtained anti-glare films of Example A2 and Comparative Example A2 was evaluated for the following optical characteristics and anti-glare properties. 321506 39 201017228 (1) Evaluation of optical characteristics i: haze Measuring anti-glare film The haze is measured by the method of JIS κ 7136 。 τ 。 。 。 。 。 。 。 § § 测量 测量 测量 测量 测量 测量 测量 测量 测量 ▲ ▲ ▲ ▲ 150 150 150 150 150 150 150 150 150 150 150 150 150 150 150 150 150 150 150 150 150 150 150 150 150 In order to vJ 1 stop the anti-glare film, it is measured by using an optically transparent adhesive and bonding to the glass substrate with A « convex surface as the surface. In general, Λ α right fog becomes larger and larger ’ when applied to an image display device, the image becomes darker, and the gentleman ^ ^ * iF 13⁄4 #1- f-l- J becomes lower. Therefore, the haze is preferably lower. (2) Evaluation of optical characteristics 2: Measurement of reflection sharpness The reflection sharpness was measured by the method specified in JIS K 7105. Specifically, the anti-foam film is measured using a developmental measuring device (3) [swelled by LATEST Co., Ltd.) according to this specification. Reflective clarity. 5 毫米,1. 0丽和2. 〇 规格 2 2 规格 规格 规格 规格 规格 规格 规格 规格 验 验 验 验 验 验 验 验 验 验 验 验 验 验 验 验 验 验 验 验 验 验 验 验 验 验 验 验 验 验 验 验 2 Mm and so on. Wherein, when the optical comb having a width of 颜. 125 is used, in the anti-foam film prescribed by the present invention, since the error of the measured value becomes large, the measurement value when using the optical comb having a width of 〇 125 mm is not added. In the sum, the sum of image sharpness measured using two optical combs having widths of 05 mm, 丨.0 mm, and 20 mm 4 is called reflection sharpness. The maximum value of the reflection sharpness according to this definition is 3〇0%. If the reflection sharpness according to this definition is too large, the image of the light source or the like is reflected, and the anti-glare property tends to be lowered. Therefore, it is preferably 1% or less and preferably 5% or less. . In the evaluation, in order to prevent the warpage of the anti-glare film and to prevent reflection from the back surface, an optically transparent adhesive is used, and the surface of the anti-glare film of the 321506 40 201017228 is bonded to the thickness of 2 mm. The black acrylic plate provides measurements. In this state, light is incident from the side of the anti-foam film to perform measurement. • (3) Evaluation of optical characteristics 3: Measurement of 60-degree glossiness '60-degree gloss is measured by the method specified in JIS Z 8741. Specifically, the glossiness of the anti-glare film was measured using a gloss meter PG-1M (manufactured by Sakamoto Denshoku Co., Ltd.) according to this specification. At this time, in order to prevent the warpage of the anti-glare film and to prevent the reflection from the back surface, the anti-glare film is adhered to the black acrylic having a thickness of 2 mm by using the optically transparent adhesive. A resin plate is used to provide the measurement. In this state, light is incident from the side of the anti-glare film to perform measurement. In general, a case where the gloss of 60 degrees is small means that the surface of the sample is flawed, and as a result, white turbidity is liable to occur. Therefore, the gloss is preferably higher, but if the gloss is too high, the reflection is caused, and the anti-glare property is lowered, so that a value of about 30 to 90% is preferable. (4) Evaluation of anti-glare performance 1: Visual evaluation of reflection _ In order to prevent reflection from the back of the anti-glare film, the anti-foam film is bonded to the black acrylic plate in such a manner that the uneven surface becomes a surface, and the fluorescent light is illuminated. The bright interior of the lamp was visually observed from the side of the uneven surface, and it was visually evaluated in three stages according to the following criteria whether or not the fluorescent lamp was reflected. 1 : No reflection was observed 2: A slight reflection was observed 3: A reflection was clearly observed (5) Evaluation of anti-glare property 2: Visual evaluation of white turbidity In order to prevent reflection from the back of the anti-fog film, an anti-foam film was used. The surface of the black and white acrylic resin plate was adhered to the surface of the illuminating neon lamp in the bright room where the fluorescent lamp was lit, and the degree of white turbidity was visually evaluated in three stages according to the following criteria. . 1 : No white turbidity was observed. 2: White turbidity was observed slightly 3: White turbidity was clearly observed (6) Evaluation of anti-glare property 3: Evaluation of flickering First, a photometric unit (unit cel 1) 31 was prepared as shown in the plan view of Fig. 12. Patterned hood. In Fig. 12, the photometric unit 31 forms a chrome-shielding pattern 32 having a line width of 10/m and having a key shape on a transparent substrate, and a portion where the chrome-shielding pattern 32 is not formed becomes the opening portion 33. Next, as shown in Fig. 13, the reticle is placed in a light box 42 having a light source 43 inside, with the chrome-shielding pattern 32 of the reticle 41 facing upward, and will be 20/m thick. The adhesive bonding anti-glare film 51 is placed on the reticle 41 in a sample of the thickness of the glass plate 44, and is visually observed from a position of about 30 cm from the sample, thereby performing the functional evaluation of the degree of flicker in seven stages. In the 7 stages of the evaluation of the functional evaluation, the level 1 corresponds to a state in which no flicker is observed at all, the level 7 is equivalent to a state in which scintillation is severely observed, and the level 3 is slightly observed in a state of scintillation. In addition, the photometric unit of the photomask uses the photometric unit length X metering unit width in Fig. 12 to be 282 /zm x 94 //m, so that the opening portion X opening width in the figure is 272# mx84 // m. This unit is equivalent to a pixel density of 90 ppi (pixel per inch). The results are shown in Table A2. Further, in Table A2, for example, the details of the reflection sharpness of Comparative Example A2 42 321506 201017228 are as follows. Reflectance sharpness 30.2% 39. 2% 43. 2% 112. 6% 0. 5mm optical comb: 1. Omm optical comb: 0. 5mm optical comb: total Table A1

Maximum cut-off height Pt 〇. 30//m 4. 23 //m Table A2 __ Optical characteristics Example A2 Fog 1. 3% Transmittance transparency 112. 6%~ Zee is reflected in a white turbidity. Comparative example A2 73 7% 239.5% Π ^0/ 2 1 1 3 3 1 From the results of Tables A1 and A2, 'in the mold produced by the manufacturing method of the present invention, the steep portion of the surface irregular shape is gentle, Therefore, a mold having no steep portion can be obtained. Further, the anti-foam film obtained by the manufacturing method of the present invention exhibits excellent anti-glare properties. On the other hand, since the mold produced by the manufacturing method which does not etch the entire surface has a steep inclined portion in the surface uneven shape, the anti-foam film produced by using the mold is white turbid, and The parts that are not steep are flat, so they are also reflected. Therefore, the anti-glare system obtained by the edge-making method of the present invention 321506 43 201017228 exhibits excellent anti-glare properties. &lt;Example B1&gt; A copper bald ore cover was prepared on the surface of an aluminum roll having a diameter of 20 (according to JIS A5056). The copper ballard plating is composed of a copper plating layer/thin y silver cladding/surface copper plating layer, and the overall thickness of the plating layer is set to be about 200 // m. The copper-plated surface was mirror-polished, and a photosensitive resin was applied to the surface of the polished copper, which was dried to form a photosensitive resin crucible. Then, the pattern in which the side-by-side pattern is repeated as shown in Fig. 16 is exposed to the photosensitive resin film by laser light for development. Laser Stream FX (Think-Lab Co., Ltd.) was used to perform exposure, exposure, and development of laser light. In the photosensitive resin film, a positive photosensitive resin is used, and the pattern shown in FIG. 16 is exposed to cover the projected area of the surface of the substrate for the mold, and surface unevenness is formed in the surface of the substrate for the mold. The ratio of the area of the shape area is 45.9%. Further, in order to expose the pattern of the pattern shown in FIG. 16 by laser light repeatedly by laser light, the standard deviation of the projected area of the surface of the substrate for the mold in the 100/zinx100/zm region of the surface of the substrate for the mold is 10 〇〇# m2 or less. After that, the second etching treatment is performed with a copper chloride solution. At this time, the amount of etching was set to be lightly removed from the first minute, and the second etching treatment was again performed with a copper chloride solution. At this time, the etching is bright. Sun set 疋 becomes 18# m. After that, the chrome processing was performed to produce a mold. At this time, the thickness of the bell is set to 4 β 〇). &lt;Comparative Example 1 &gt; A mold was produced in the same manner as in the embodiment of the phantom 321506 44 201017228 # except that the second surname processing was not performed. &lt;Evaluation Experiment The surface ‘shape of each of the dies obtained in Example B1 and Comparative Example B1 was evaluated in the same manner as in the evaluation of each of the dies obtained in the above Example A1 and Comparative Example B1. A sample of the anti-foam film was prepared by the method described in Example B2 and Comparative Example B2 described later, and the surface shape of the sample was measured and evaluated as the surface shape of the mold. The results are shown in Table B1. &lt;Example B2&gt; ® The photocurable resin composition GRANDIC 806T (manufactured by Dainippon Ink and Chemicals Co., Ltd.) was dissolved in ethyl acetate to prepare a solution having a concentration of 5 〇% by weight, and further belongs to photopolymerization. Luciferin TPO (manufactured by BASF Corporation, chemical name: 2, 4, 6-Trimethyl benzoyl diphenylphosphine oxide) The coating resin was prepared by adding 5 parts by weight per ι by weight of the resin component. The coating liquid was applied to a thickness of 8 Å of a cellulose acetate-dimensional (TAC) film, and the coating liquid was applied to a thickness of 1 〇 #m after drying, and was set in a dryer set to 6 (rc). After drying for 3 minutes, the dried film was pressed against the uneven surface of the mold obtained in Example B1 by a rubber roller so that the photocurable resin composition layer became the mold side. In this state, the TAC film was used. On the other side, the light from the high-pressure mercury lamp having a strength of 2 〇mw/cm 2 is irradiated so that the amount of light converted into h lines becomes 2 〇〇 mJ/cm 2 , and the photocurable resin composition layer is cured. Thereafter, the TAC film is cured together with hardening. The resin was peeled off from the mold, and a transparent anti-glare film of Example μ321506 45 201017228 composed of a laminate of a cured resin having irregularities on the surface and a TAC film was obtained. <Comparative Example B2 &gt; The mold obtained in B1 was obtained as a mold, and a transparent anti-foam film was obtained in the same manner as in Example B2. <Evaluation Experiment 2> Each of the obtained anti-glare films of Example A2 and Comparative Example A2 was With the above embodiment A2 and comparative example A2 The evaluation of the optical characteristics and the anti-glare property was carried out in the same manner. The results are shown in Table B2. In addition, in Table B2, for example, the details of the reflection sharpness of Example B2 are as follows. Reflective sharpness 0.5 mm Optical comb: 11.4 ° / 〇 1.0mm optical comb: 42.7% 0.5mm optical comb: 23.9% total 78. 0% Table B1 mold surface shape arithmetic mean height Pa average length PSm maximum profile height Pt Example B1 0. 16/zm 40. 84//m 0. 60/zm Comparative Example B1 1. 79/zm 41. 02 /zm 6. 51 //in Table B2 \ Optical characteristics Anti-glare performance Haze reflection Transparency 60 degree Gloss is reflected in white turbidity Example B2 0. 7 % 78. 0% 62. 3% 1 1 1 Comparative Example B2 68.1°/〇154.4% 3.6% 3 3 1 46 321506 201017228 From the results shown in Tables B1 and B2, in the method of the manufacturer 4 of the present invention In the mold to be produced, the portion in which the inclination of the surface uneven shape is steeped is smoothed by the second etching step, so that the mold having no steep portion is obtained. Further, the anti-foam film obtained by the production method of the present invention is obtained. The system shows that it has excellent anti-glare performance. On the other hand, by not performing the second Since the mold produced by the manufacturing method of the etching treatment has a steep inclined portion in the surface uneven shape, the anti-foam film produced by using the mold is white turbid, and since the portion where the tilt is not steep is flat, it also occurs. Therefore, the anti-foam film obtained by the production method of the present invention exhibits excellent anti-glare properties. The embodiments and examples disclosed herein are illustrative and not restrictive of the invention. The scope of the present invention is intended to be limited by the scope of the claims [Industrial Applicability] According to the method for producing a mold of the present invention, since a fine uneven shape is formed on the surface with good precision, it can be manufactured with good reproducibility and almost no defects. It helps to create molds that display high anti-glare features. Furthermore, according to the method for manufacturing an anti-glare film of the present invention, it is possible to maintain low haze, display image brightness, prevent reflection and reflection, suppress white turbidity, prevent flicker generation, prevent contrast reduction, etc., in the industry. It helps to create an anti-foam film with excellent anti-glare properties. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 (a) to (e) schematically show a preferred example of the first half of the method of manufacturing the mold of the present invention 47 321506 201017228. Fig. 2 is a view schematically showing a state in which a pattern is exposed to a photosensitive resin film. Fig. 3 is a view schematically showing a pattern exposed on a photosensitive resin film. Fig. 4 is a view showing a pattern exposed on a photosensitive resin film. Fig. 5 is a view schematically showing a pattern exposed on a photosensitive resin film. Fig. 6 is a view schematically showing a pattern exposed on a photosensitive resin film. Fig. 7 is a view schematically showing a pattern exposed on a photosensitive resin film. Fig. 8 (1) and (_ schematically show a preferred example of the latter half of the method for manufacturing a mold of the present invention. Fig. 9 is a schematic view showing the state of the step (4) in the step (Fig. 10) schematically showing the existence of The base material for the part to be cut and the part of the mold which is not engraved is shown in Fig. 11. (a) and (b) of the mold are diagrams showing the pattern used in the production example μ.平面图Evaluation of the plan view of the unit cell 31 used in the experiment. Fig. 13 is a view schematically showing the case where the flash evaluation experiment is performed. Fig. 14 (a) to (d) schematically show the latter half of the method.健之—A diagram of the example. ^The manufacturing of the mold ^5. The pattern used to display the mold used in the first (four) step of the mold is shown in Figure 16. The figure shows the production example μ. 321506 48 4 201017228 [Description of main component symbols] 1 Substrate for mold 2 Surface of substrate to be polished by grinding step * 3 Photosensitive resin film 4 Photosensitive resin film 5 exposed in the exposure step is not exposed in the exposure step The photosensitive resin film 6 functions as a mask The portion of the photosensitive resin film 7 that is not covered ❹ 8 The surface 9 formed by etching stepwise has the surface of the substrate to be etched and the portion of the substrate that is not etched 10 The surface of the substrate after the etching step (surface unevenness) 11 chrome layer 12 surface of ore chrome 31 light metering unit 32 light shielding pattern 33 opening part 41 light cover 42 light box 43 light source 44 glass plate 45 spectator 51 anti-glare film Pa arithmetic average height PSm average length Pt maximum profile height Ra center line Average thickness 49 321506

Claims (1)

201017228 VII. Patent application scope: 1. A method for manufacturing a mold, comprising: a first plating step of performing copper plating or nickel plating on a surface of a substrate for a mold; and a grinding step by using the first plating a step of applying a plated surface for polishing; a photosensitive resin film forming step of applying a photosensitive resin to the polished surface to form a film; an exposing step of exposing the pattern to the photosensitive resin film; and a developing step of exposing The photosensitive resin film of the pattern is developed; the etching step is performed by using the developed photosensitive resin film as a mask, performing etching treatment, and forming irregularities on the polished plating surface; and the second plating step, by etching step The formed uneven surface is subjected to chrome plating. Further, in the etching step, the entire surface of the substrate for the mold is subjected to an etching treatment. 2. The manufacturing method according to claim 1, wherein the etching step is a use of a developed photosensitive resin film as a mask, and the entire substrate for the mold includes a region covered by the mask. The surface is subjected to an etching treatment and a step of forming irregularities on the polished plating surface. 3. The manufacturing method of claim 2, wherein the photo-sensing 50 321506 201017228 ^ (4) is wrong between the etching step and the second plating step. In the manufacturing method of the second aspect, the etching step includes: 'covering and etching the photosensitive resin ^ as a photosensitive resin film, forming a concave-convex surface on the plating surface; the second remaining ^, the photosensitive resin film制 4 ❹ ❹ ❹ ❹ 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 利 利For example, Φ money is 1 to 50 (four). : The method of making any of items 1 to 6 of Liganwei is based on the computer-controlled =: the pattern of the medium on the media, the s::: Any one of the items 1 to 7 - where; the base of the mold is used to hide the residual resin film which is formed obliquely in the middle = the projection of the surface _, hiding on the surface of the molded substrate I biting the surface of the surface The area is from 1 to 70%. The manufacturing method according to any one of the items 1 to 3, wherein the photosensitive resin film remaining in the region of the surface of the substrate (10) which is not dissolved in the surface of the rain 111 is used for the mold 3215051 201017228 The standard deviation of the projected area of the substrate surface is below 100 @ m2. 10. The manufacturing method according to any one of claims 1 to 9, wherein the bond chrome layer formed by silver chrome has a thickness of from 1 to 10/im. 11. A method for producing an anti-foam film, comprising: a step of transferring a concave-convex surface of a mold manufactured by the method of any one of claims 1 to 10 to a transparent resin film; and transferring from the mold The step of peeling off the transparent resin film on which the uneven surface of the mold is printed from the mold. 52 321506