JP2007313694A - Method for producing embossing roll for molding antireflection film - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a method for producing an embossing roll for molding an antireflection film which is advantageous for producing an embossing roll for molding an antireflection film having no nodule defect. <P>SOLUTION: A working layer 15 is formed on an iron roll 11 having a shaft by copper electrodeposition plating. The polishing side of the working layer 15 is subjected to blast treatment for 4 h by using silicon carbide (which is) 50-150 μm in particle size to form fine unevenness in the surface of the working layer 15. A nodule defect generated on the surface of the working layer 15 is examined and removed by being irradiated with laser beams 22 from a laser beam machine 21. The surface is subjected to chromium electrodeposition plating to form a chromium layer (which is) about 10 μm in thickness to protect the surface. The surface of the protective plating layer 16 is examined. Before the chromium plating, the residual nodule defect is irradiated with laser beams 22 from the laser beam machine 21 to be removed. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention relates to a method for reducing surface defects of an embossing roll for forming an antireflection film for producing an antireflection film for preventing reflection of external light on the surface of a display device such as a liquid crystal display device used in a liquid crystal television, a personal computer, etc. And the repair of defects.

Conventionally, as a method for correcting defects generated on the mold surface, a technique of correcting by molding without deforming the mold member (refer to Patent Document 1), or finishing by welding by welding. A technique for performing is known (see Patent Document 2).
JP 2000-61960 A JP 2002-219567 A

However, if a dot-like defect (hereinafter referred to as a nodule defect) occurs when making an embossing roll (mold) for forming an antireflection film using plating, it is difficult to completely eliminate this defect number. Met.
Then, the objective of this invention is providing the manufacturing method of the embossing roll for anti-reflective film formation advantageous in manufacturing the embossing roll for anti-reflective film formation without a nodule defect.

In order to achieve the above-mentioned object, in the present invention, an underlayer is first formed by plating on a core material (metal roll) of an embossing roll for forming an antireflection film, and this surface is polished with a grinding stone and further subjected to a peeling treatment. The processed layer is formed by plating.
By this method, if the processed layer is damaged due to film production, or if it is necessary to regenerate due to other problems, this processed layer is mechanically peeled off, and the base is polished by polishing, Further, a processed layer is formed again by plating.
As the core material of the embossing roll for forming an antireflection film, a core material having no shaft can be used. This material may be either aluminum or iron.
The plating of the underlayer can be formed with a plating thickness of 50 to 200 μm by electrodeposition nickel plating, electrodeposition copper plating or the like.
For the plating of the processed layer, any one of electrodeposited nickel plating, electroless nickel plating, electrodeposited zinc plating, electrodeposited copper plating and the like is used, and plating is performed in a plating thickness range of 50 to 200 μm.

  As a method for forming irregularities on the embossing roll for forming an antireflection film, a method using a blasting technique using ceramic beads or a photolithography technique can be used. As the photolithography technology, laser plate making technology can be applied. After forming unevenness on the surface, the uneven surface is smoothed using an etching solution of any one of sulfuric acid, hydrochloric acid, nitric acid, sulfuric acid-hydrogen peroxide, ammonium persulfate solution, copper chloride solution, or iron chloride solution.

The present invention is a method of examining defects during the production of an embossing roll for forming an antireflection film, repairing with a laser beam and plating, and irradiating the finally generated nodule defect with a laser beam. Remove and repair.
ADVANTAGE OF THE INVENTION According to this invention, the nodule defect which generate | occur | produced on the embossing roll surface for anti-reflective film shaping | molding can be repaired, and the method of producing an anti-reflective film etc. continuously without a defect stably can be provided.

Invention of Claim 1 is a manufacturing method of the embossing roll for anti-reflective film formation, Comprising: The process of forming a 1st plating layer on the surface of metal rolls, and the surface of the said 1st plating layer is fine A step of forming irregularities, a step of removing the nodule defects by irradiating a laser beam to a portion where nodule defects are generated on the surface of the first plating layer on which the fine irregularities are formed, and the nodule defects Forming the second plating layer on the surface of the first plating layer from which the nodule has been removed, and irradiating the nodule defect on the surface of the second plating layer with a laser beam to irradiate the nodule defect And a step of removing the anti-reflection film forming embossing roll.
Invention of Claim 2 is a manufacturing method of the embossing roll for anti-reflective film formation of Claim 1 characterized by the removal of the said nodule defect by irradiation of the said laser beam being based on the effect | action of a laser ablation process. .
The invention of claim 3 is characterized in that the first plating layer is formed by any one of electrodeposited copper plating, electrodeposited nickel plating, electroless nickel plating, and electrodeposited zinc plating. Or it is a manufacturing method of the embossing roll for anti-reflective film shaping | molding of 2.
Invention of Claim 4 is a manufacturing method of the embossing roll for anti-reflective film formation of Claim 1, 2, or 3 characterized by the formation of said 2nd plating layer being made by electrodeposition chromium plating. .

  According to the present invention, it is possible to produce a defect-free antireflection film-forming embossing roll by correcting a nodule defect that inevitably occurs in the unevenness forming step, that is, only a very fine defect portion with a laser beam. . This has made it possible to stably emboss an antireflection film free from defects.

Hereinafter, the present invention will be described in detail with reference to FIG.
In the present invention, after plating on an embossing roll core material (metal roll) in advance, the surface is prepared by grinding stone polishing, plating is performed by peeling treatment (forming a processed layer), and the surface is prepared by grinding stone grinding. Using sandblasting technology or photolithography technology to form fine irregularities, metal plating is performed to improve the durability of the surface (protective plating layer is formed), and generated nodule defects are corrected. The present invention also relates to a method for producing a defect-free embossing roll.

In the process of producing this embossing roll, protrusions (knurls) with a diameter of several tens of microns are generated on the roll surface. When this is repaired and processed in the next process, there is no protrusion on the final embossing roll surface. It can be defective.
When a laser is used to remove the protrusions, an ablation process is used.
Laser ablation is a phenomenon in which, when a solid is irradiated with laser light, the elements constituting the solid material are released so as to explode in various forms, and the laser light irradiated portion on the solid surface is removed. In other words, it is an explosive exfoliation phenomenon of a solid surface accompanied by plasma emission and a shock wave generated when a laser beam is irradiated on a solid surface.
Depending on the energy, pulse width, and wavelength of the laser used, there are those with sublimation, those with evaporation, those with melting, and those with crushing by shock waves. Ablation with sublimation and crushing without melting without expansion of the area is suitable.
If fine irregularities on the roll surface thus produced can be appropriately applied to the film (antireflection film), the haze can be lowered and the visibility of the display panel can be improved.

Example 1
This embodiment will be described with reference to FIGS.
An iron roll 11 with a shaft (metal roll) was ground and subjected to electrodeposition nickel plating 12, and further electrodeposited copper plating 13 was applied to about 200 μm.
This surface was leveled by vertical polishing, and silver displacement plating 14 was performed to form a release layer.
Furthermore, electrodeposition copper plating was performed, and polishing was performed by vertical polishing so that the surface roughness Ra was 0.001 to 0.005 μm. In other words, the processed layer 15, that is, the first plating layer was formed on the surface of the iron roll 11 by electrodeposition copper plating.
The polished surface of the processed layer 15 is blasted with silicon carbide having a particle size of about 50 to 150 μm for about 4 hours to form fine irregularities on the surface of the processed layer 15 and then etched with an iron chloride solution. Reduced surface irregularities. That is, fine irregularities were formed on the surface of the first plating layer.
The polished surface of the processed layer 15 is dried with an air gun so that no water droplets remain, and the nodule defects generated on the surface (the polished surface of the processed layer 15) are inspected. As shown in FIG. Nodule defects were removed by irradiating laser beam 22 from 21. That is, the nodule defect was removed by irradiating a laser beam to the part where the nodule defect occurred on the surface of the first plating layer on which fine irregularities were formed.
The laser light irradiation conditions at this time are such that the beam diameter is about 10 μm, the distance between the roll surface (polishing surface 15) and the lens for laser light 22 irradiation of the laser processing machine 21 is about 25 mm, and the laser output value. Was set to 1 to 3 mW. This irradiation condition is an ablation condition in which both sublimation and crushing are mixed.
This surface was subsequently subjected to electrodeposition chromium plating to protect the surface by plating for about 10 μm. That is, the protective plating layer 16, that is, the second plating layer was formed by electrodeposition chromium plating on the surface of the first plating layer from which the nodule defects were removed.
Further, the surface of the protective plating layer 16 is inspected, and the nodule defects are removed by irradiating the laser beam 22 from the laser processing machine 21 to the nodule defects that cannot be removed before the chromium plating as shown in FIG. It was. That is, the nodule defect was removed by irradiating the part where the nodule defect occurred on the surface of the second plating layer with a laser beam.
The laser light irradiation conditions at this time were such that the beam diameter was about 10 μm, the distance between the roll surface (the surface of the protective plating layer 16) and the lens was about 25 mm, and the laser output value was 1 to 3 mW.
By using the thus obtained embossing roll 1 for forming an antireflection film, a defect-free film sheet (antireflection film) could be produced from the polyester film and the ultraviolet curable resin.

(Example 2)
An aluminum roll 11 without a shaft was ground and subjected to zinc displacement plating (zincate treatment), further subjected to electrodeposition nickel plating 12, and electrodeposition copper plating 13 was performed to about 200 μm.
This surface was leveled by vertical polishing, and silver displacement plating 14 was performed to form a release layer.
Further, electrodeposited copper plating 15 was performed, and polishing was performed by vertical polishing so that the surface roughness Ra was 0.001 to 0.005 μm. That is, the processed layer 15, that is, the first plating layer was formed on the surface of the aluminum roll 11 by electrodeposition copper plating.
The polished surface of the processed layer 15 was blasted with zirconia having a particle size of about 50 to 150 μm for about 4 hours to form fine irregularities, and then etched with a copper chloride solution to reduce the irregularities on the surface. That is, fine irregularities were formed on the surface of the first plating layer.
This surface (polishing surface of the processed layer 15) is dried with an air gun so that no water droplets remain, and the nodule defects generated on the surface (polishing surface of the processed layer 15) are inspected. As shown in FIG. The nodule defect was removed by irradiating the laser beam 22 from the laser processing machine 21. That is, the nodule defect was removed by irradiating a laser beam to the part where the nodule defect occurred on the surface of the first plating layer on which fine irregularities were formed.
The laser light irradiation conditions at this time were such that the beam diameter was about 10 μm, the distance between the roll surface (polishing surface 15) and the lens of the laser processing machine 21 was about 25 mm, and the laser output value was 1 to 3 mW. . This irradiation condition is an ablation condition in which both sublimation and crushing are mixed.
Subsequently, this surface was plated with about 8 μm of electrodeposited chromium plating 16 to protect the surface. That is, the protective plating layer 16, that is, the second plating layer was formed by electrodeposition chromium plating on the surface of the first plating layer from which the nodule defects were removed.
Further, the surface of the protective plating layer 16 is inspected, and the nodule defects are removed by irradiating the laser beam 22 from the laser processing machine 21 to the nodule defects that cannot be removed before the chromium plating as shown in FIG. It was. That is, the nodule defect was removed by irradiating the part where the nodule defect occurred on the surface of the second plating layer with a laser beam.
Further, the surface of the protective plating layer 16 is inspected, and nodule defects that cannot be removed before the chrome plating are performed by a laser processing machine (21) (beam diameter of about 10 μm, distance between roll surface and lens of about 25 mm, laser output) Value 1 to 3 mW).
By using the thus obtained embossing roll 1 for forming an antireflection film, a defect-free film sheet (antireflection film) could be produced from the polyester film and the ultraviolet curable resin.

It is a correction figure of the nodule defect by the laser beam of the copper plating etching surface performed in the Example of this invention. It is a correction figure of the nodule defect by the laser beam of the last protection plating surface performed in the Example of this invention.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 ... Embossing roll for antireflection films, 11 ... Roll core material, 12 ... Adhesion layer, 13 ... Undercoat layer, 14 ... Release layer, 15 ... Processed layer, 16 ... Protective plating layer, 21 ...... Laser machine, 22 ... Laser light.

Claims (4)

A method for producing an embossing roll for forming an antireflection film,
Forming a first plating layer on the surface of a metal roll;
Forming fine irregularities on the surface of the first plating layer;
Removing the nodule defect by irradiating a laser beam to a location where a nodule defect has occurred on the surface of the first plating layer on which the fine irregularities are formed;
Forming a second plating layer on the surface of the first plating layer from which the nodule defects have been removed;
Removing the nodule defects by irradiating a laser beam at a location where nodule defects have occurred on the surface of the second plating layer;
A method for producing an embossing roll for forming an antireflection film, comprising:   The method for producing an embossing roll for forming an antireflection film according to claim 1, wherein the removal of the nodule defect by the irradiation of the laser beam is performed by a laser ablation process.   3. The antireflection film according to claim 1, wherein the first plating layer is formed by any one of electrodeposited copper plating, electrodeposited nickel plating, electroless nickel plating, and electrodeposited zinc plating. Manufacturing method of embossing roll for forming. The method of manufacturing an embossing roll for forming an antireflection film according to claim 1, 2 or 3, wherein the second plating layer is formed by electrodeposition chromium plating.

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