JP2009107284A - Manufacturing method for die, and manufacturing method for antiglare film using die which is obtained by the method - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a manufacturing method for a die having a fine uneven shape on the surface which is useful for the manufacture of an antiglare film indicating a high antiglare function, and to provide a manufacturing method for the antiglare film by which the falling of visibility by whitening is sufficiently prevented from occurring while indicating the excellent antiglare function, and glare is not generated when the antiglare film is arranged on the surface of a highly precise image displaying apparatus. <P>SOLUTION: This manufacturing method for the die includes a first plating process, a polishing process, an unevenness forming process, an unevenness adjusting process, a dulling process, and a second plating process. In this case, in the first plating process, a copper plating or a nickel plating is applied on the surface of a base material for the die. In the polishing process, the surface on which the plating has been applied in the first plating process is polished. In the unevenness forming process, an unevenness is formed on the polished surface by throwing a first particle to the polished surface. In the unevenness adjusting process, an uneven shape which has been formed before is adjusted by throwing a second particle having a different size from the first particle to the uneven shape. In the dulling process, a process for dulling the uneven shape after having been adjusted by the second particle is applied. In the second plating process, a chromium plating is applied on the dulled uneven surface. Also, this manufacturing method for the antiglare film using the die is provided. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to a method for producing a mold having a fine uneven shape on the surface, and an antiglare film having excellent antiglare properties while having low haze, using the mold obtained by the method. It relates to a method of manufacturing.

  In an image display device such as a liquid crystal display, a plasma display panel, a cathode ray tube (CRT) display, an organic electroluminescence (EL) display, and the like, when external light is reflected on the display surface, visibility is significantly impaired. In order to prevent such reflection of external light, TVs and personal computers that emphasize image quality, video cameras and digital cameras used outdoors with strong external light, mobile phones that display using reflected light, etc. In the conventional art, a film layer for preventing external light from being reflected is provided on the surface of the image display device. This film layer consists of a film that has been subjected to anti-reflection treatment using interference by the optical multilayer film, and anti-glare treatment that scatters incident light by blurring the incident light by forming fine irregularities on the surface. It is divided roughly into the thing which consists of the film which was given. Among these, the former non-reflective film needs to form a multilayer film having a uniform optical film thickness, and thus increases the cost. On the other hand, since the latter anti-glare film can be produced at a relatively low cost, it is widely used in applications such as large personal computers and monitors.

  Conventionally, such an antiglare film has a random unevenness on the sheet by, for example, applying a resin solution in which a filler is dispersed on a base sheet, adjusting the coating thickness, and exposing the filler to the coating film surface. It is manufactured by the method to form in. However, the antiglare film produced by dispersing such fillers has irregularities as intended because the arrangement and shape of the irregularities depend on the dispersion state and application state of the filler in the resin solution. There is a problem that it is difficult to obtain and a sufficient anti-glare effect cannot be obtained if the haze is low. Furthermore, when such a conventional anti-glare film is disposed on the surface of the image display device, the entire display surface becomes whitish due to scattered light, and the display becomes cloudy, so-called “whiteness” is likely to occur. There was a problem. Also, with the recent high definition of image display devices, the pixels of the image display device interfere with the surface uneven shape of the anti-glare film, resulting in a so-called “glare” phenomenon in which a luminance distribution is generated and becomes difficult to see. There was also a problem that was likely to occur.

  On the other hand, there is also an attempt to develop anti-glare properties only by fine irregularities formed on the surface of the transparent resin layer without containing a filler. For example, in Japanese Patent Laid-Open No. 2002-189106 (Patent Document 1), the ionizing radiation curable resin is cured in a state where the ionizing radiation curable resin is sandwiched between an embossing mold and a transparent resin film. An ionizing radiation curable resin layer in which fine irregularities are formed in which the average distance between adjacent convex portions on the original 10-point average roughness and the three-dimensional roughness reference surface each satisfy a predetermined value, and the irregularities are formed. Is disclosed on the transparent resin film.

  It is also possible to use a film having fine irregularities on the surface as a light diffusion layer disposed on the back side of the liquid crystal display device, instead of an antiglare film disposed on the display surface of the display device. No. 6-34961 (Patent Document 2), Japanese Unexamined Patent Application Publication No. 2004-45471 (Patent Document 3), Japanese Unexamined Patent Application Publication No. 2004-45472 (Patent Document 4), and the like. Among these, in Patent Documents 3 and 4, as a method of forming irregularities on the surface of the film, an embossing roll having a shape in which the irregularities are inverted is filled with an ionizing radiation curable resin liquid, and the filled resin is made of a roll intaglio. A transparent base material running in synchronization with the rotation direction is brought into contact, and when the transparent base material is in contact with the roll intaglio, the resin between the roll intaglio and the transparent base is cured, and at the same time as cured, a cured resin is cured. A method is disclosed in which a laminate of a cured resin and a transparent substrate is peeled off from a roll intaglio after the substrate and the transparent substrate are brought into close contact with each other.

  However, in the methods disclosed in Patent Documents 3 and 4, the composition of the ionizing radiation curable resin liquid that can be used is limited, and leveling as when applied by diluting with a solvent cannot be expected. It is expected that there is a problem in the uniformity of the film thickness. Furthermore, in the methods disclosed in Patent Documents 3 and 4, since it is necessary to directly fill the embossing roll intaglio with a resin liquid, in order to ensure the uniformity of the uneven surface, the embossing roll intaglio has high mechanical accuracy. There was a problem that it was required and it was difficult to produce an embossing roll.

  Next, as a method for producing a roll used for producing a film having irregularities on the surface, for example, in Patent Document 2 described above, a cylindrical body is made using metal or the like, and electronic engraving, etching, sandblasting is performed on the surface. A method of forming irregularities by such a method is disclosed. Japanese Unexamined Patent Application Publication No. 2004-29240 (Patent Document 5) discloses a method for producing an embossing roll by a bead shot method, and Japanese Unexamined Patent Application Publication No. 2004-90187 (Patent Document 6). A method of producing an embossing roll is disclosed through a step of forming a metal plating layer on the surface, a step of mirror polishing the surface of the metal plating layer, and a step of peening treatment as necessary.

  However, in such a state that the surface of the embossing roll is subjected to blasting treatment, the uneven diameter distribution caused by the particle size distribution of the blast particles is generated, and the depth of the dent obtained by blasting can be controlled. It was difficult to obtain an uneven shape excellent in antiglare function with good reproducibility.

  Further, Patent Document 1 described above describes that a concavo-convex surface is formed by a sandblasting method or a bead shot method, preferably using a roller having a chromium plating on the surface of iron. Furthermore, it is preferable to use the mold surface with such irregularities after applying chrome plating for the purpose of improving durability during use, thereby making it harder and preventing corrosion. There is also a statement that it is possible. On the other hand, in each of the examples of Patent Documents 3 and 4 described above, the surface of the iron core is chrome-plated and subjected to # 250 liquid sand blasting, and then chrome-plating again to form a fine uneven shape on the surface. It is described to do.

  However, in such an embossing roll manufacturing method, since blasting or shot is performed on chromium plating with high hardness, it is difficult to form irregularities, and it is difficult to precisely control the shape of the formed irregularities. It was. In addition, as described in Japanese Patent Application Laid-Open No. 2004-29672 (Patent Document 7), the chrome plating often has a rough surface depending on the material and the shape of the base, and is on the unevenness formed by blasting. Since fine cracks generated by chrome plating are formed on the surface, there is a problem that it is difficult to design what kind of irregularities can be formed. Furthermore, since there are fine cracks generated by chrome plating, there is also a problem that the scattering characteristics of the finally obtained antiglare film change in an unfavorable direction. Furthermore, since the finished roll surface varies in various ways depending on the combination of the embossing roll base material surface and plating type, in order to obtain the required surface irregularities accurately, the appropriate roll surface material and There was also a problem that an appropriate plating type had to be selected. Furthermore, even if the desired surface irregularity shape is obtained, the durability during use may be insufficient depending on the type of plating.

Japanese Patent Laid-Open No. 2000-284106 (Patent Document 8) describes performing a sandblasting process on a base material and then performing an etching process and / or a thin film laminating process. However, metal plating is performed before the sandblasting process. There is no description or suggestion of providing a layer. On the other hand, in Japanese Patent Application Laid-Open No. 2007-237541 (Patent Document 9), copper plating or nickel plating is applied to the surface of a substrate, the plating surface is polished, and fine particles are applied to the polished surface to form irregularities, It has been disclosed to manufacture a mold for an antiglare film by performing a process of dulling the uneven shape and then performing chromium plating on the uneven surface.
JP 2002-189106 A JP-A-6-34961 JP 2004-45471 A JP 2004-45472 A JP 2004-29240 A JP 2004-90187 A JP 2004-29672 A JP 2000-284106 A JP 2007-237541 A

  The present invention provides a method for producing a mold having a fine concavo-convex shape on the surface, which is useful for production of an antiglare film exhibiting a high antiglare function, and further, an excellent antiglare function using the mold. The object of the present invention is to provide a method for producing an antiglare film that is sufficiently prevented from lowering visibility due to whitishness and that does not cause glare when placed on the surface of a high-definition image display device. .

  The present invention also provides a mold suitable for the production of an antiglare film without causing roughness on the chrome plated surface while adopting chromium plating having excellent hardness and surface gloss as the plating on the mold surface. Another object is to produce an antiglare film that is produced and exhibits an excellent antiglare function.

  As a result of intensive studies to achieve the above object, the present inventors applied copper plating or nickel plating as a base plating to the surface of the base material to be a mold, and hit the first fine particles on the plating surface. After forming the irregularities, fine adjustment of the irregular shape of the plating surface was performed by hitting the irregular shape with the second fine particles having a size different from that of the first fine particles, and then a process of dulling the irregular shape was performed. Later, it was found that if the concavo-convex surface was subjected to chromium plating to form a mold, a mold having a desired fine concavo-convex shape on the surface could be obtained with good reproducibility. In addition, the anti-glare film with uneven surface obtained by transferring the uneven surface of the mold to the transparent resin film has sufficient anti-glare performance while being low haze, and when applied to an image display device, It has been found that a performance not exhibited in conventional products, such as whiteness and glare, and good visibility is exhibited. That is, the present invention is as follows.

  The method for producing a mold of the present invention includes a first plating process for performing copper plating or nickel plating on a surface of a mold base, a polishing process for polishing a surface plated by the first plating process, Concavity and convexity forming step by bumping the first fine particles on the surface, and concavity and convexity adjusting the concave and convex shape formed in the concave and convex formation step by hitting the second fine particles having a different size from the first fine particles An adjustment step, a blunting step for dulling the uneven shape after being adjusted by the second fine particles, and a second plating step for applying chromium plating to the blunted uneven surface.

  The first fine particles and the second fine particles in the method for producing a mold of the present invention are preferably true spheres having an average particle size of 10 to 200 μm.

  In the mold manufacturing method of the present invention, the average particle diameter of the first fine particles is preferably larger than the average particle diameter of the second fine particles.

  The process for dulling the uneven shape in the method for producing a mold of the present invention is preferably an etching process, and in this case, the etching amount is more preferably 1 to 6 μm.

  Copper plating may be sufficient as the process which blunts the uneven | corrugated shape in the manufacturing method of the metal mold | die of this invention, and it is more preferable that the copper plating layer formed by copper plating has a thickness of 1-6 micrometers in this case.

  In the mold manufacturing method of the present invention, it is preferable to use the chrome-plated surface as the concavo-convex surface of the mold as it is without polishing the surface after chromium plating.

  In the method for producing a mold of the present invention, it is also preferable that the chromium plating layer formed by chromium plating has a thickness of 1 to 10 μm.

  The present invention also includes a step of transferring an uneven surface of a mold produced by the above-described method for producing a mold of the present invention to a transparent resin film, and a transparent resin film having the uneven surface of the mold transferred from the mold. It also provides about the manufacturing method of an anti-glare film including the process of peeling.

  According to the method for producing a mold of the present invention, since a fine uneven shape is formed on the surface, a mold that is useful for the production of an antiglare film exhibiting a high antiglare function with good reproducibility, It can be produced with almost no defects. Furthermore, according to the manufacturing method of the anti-glare film of the present invention, anti-glare performance such as anti-reflection, anti-reflection, suppression of whitish and prevention of glare generation while keeping the brightness of the display image with low haze. An excellent antiglare film can be produced industrially advantageously.

<Manufacturing method of mold>
FIG. 1 is a diagram schematically showing a preferred example of the first half of the mold manufacturing method of the present invention. The mold manufacturing method of the present invention includes: [1] a first plating step, [2] a polishing step, [3] an unevenness forming step, [4] an unevenness adjusting step, [5] a blunting step, [ 6] Basically includes a second plating step. Hereafter, each process of the manufacturing method of the metal mold | die of this invention is demonstrated in detail, referring FIG.

[1] First Plating Step In the mold manufacturing method of the present invention, first, copper plating or nickel plating is applied to the surface of the substrate used for the mold. Thus, by performing copper plating or nickel plating on the surface of the mold base, it is possible to improve the adhesion and gloss of chromium plating in the subsequent second plating step. In other words, as described above as the background art, when chrome plating is applied to the surface of iron, etc., or when chrome plating is applied again after forming irregularities on the chrome plating surface by the sandblast method or bead shot method, etc. The surface tends to be rough and fine cracks occur, making it difficult to control the uneven shape of the mold surface. On the other hand, such inconvenience can be eliminated by first performing copper plating or nickel plating on the substrate surface. This is because copper plating or nickel plating has a high covering property and a strong smoothing action, so that a flat and glossy surface is formed by filling minute irregularities and nests of the metal substrate. Due to these copper plating or nickel plating characteristics, even if chromium plating is applied in the second plating process described later, the rough surface of the chromium plating that appears to be due to minute irregularities and nests existing on the base material is eliminated. In addition, the occurrence of fine cracks is reduced due to the high coverage of copper plating or nickel plating.

  The copper or nickel used in the first plating step may be a pure metal, or may be an alloy mainly composed of copper or an alloy mainly composed of nickel. The term “copper” is meant to include copper and a copper alloy, and the term “nickel” is meant to include nickel and a nickel alloy. Copper plating and nickel plating may be performed by electrolytic plating or electroless plating, respectively, but electrolytic plating is usually employed.

  When copper plating or nickel plating is performed, if the plating layer is too thin, the influence of the underlying surface cannot be completely eliminated. Therefore, the thickness is preferably 10 μm or more. Although the upper limit of the plating layer thickness is not critical, generally about 500 μm is sufficient from the viewpoint of cost and the like.

  In the metal mold manufacturing method of the present invention, examples of the metal material suitably used for forming the base material include aluminum and iron from the viewpoint of cost. Furthermore, lightweight aluminum is more preferable from the convenience of handling. The aluminum and iron here may be pure metals, respectively, or may be an alloy mainly composed of aluminum or iron.

  The shape of the substrate is not particularly limited as long as it is an appropriate shape that has been conventionally employed in this field, and may be a flat plate shape, or a columnar or cylindrical roll. If a mold is produced using a roll-shaped substrate, there is an advantage that the antiglare film can be produced in a continuous roll shape.

[2] Polishing Step In the subsequent polishing step, the surface of the substrate that has been subjected to copper plating or nickel plating in the first plating step described above is polished. It is preferable that the base material surface is grind | polished in the state close | similar to a mirror surface through the said process. This is because metal plates and metal rolls that serve as base materials are often subjected to machining such as cutting and grinding in order to achieve the desired accuracy, and as a result, machine marks remain on the base material surface. This is because even if copper plating or nickel plating is applied, those processed marks may remain, and the surface may not be completely smooth in the plated state. That is, even if the unevenness forming step and the unevenness adjusting step described later are performed on the surface where such deeply processed eyes remain, the unevenness such as the processed eyes may be deeper than the unevenness formed by the fine particles, There is a possibility that effects such as processing eyes remain, and when an antiglare film is produced using such a mold, the optical characteristics may be unexpectedly affected. In FIG. 1 (a), a plate-shaped mold substrate 1 is subjected to copper plating or nickel plating on its surface in the first plating step (for the copper plating or nickel plating layer formed in this step). In addition, a state in which the surface 2 is further mirror-polished by a polishing process is schematically shown.

  There is no particular limitation on the method for polishing the surface of the substrate on which copper plating or nickel plating has been applied, and any of mechanical polishing, electrolytic polishing, and chemical polishing can be used. Examples of the mechanical polishing method include super finishing, lapping, fluid polishing, and buff polishing. The surface roughness after polishing is preferably 0.5 μm or less, more preferably 0.1 μm or less, as the centerline average roughness Ra in accordance with the provisions of JIS B 0601. If the center line average roughness Ra after polishing is larger than 0.5 μm, even if the surface of the metal is deformed by hitting fine particles, the influence of the surface roughness before deformation may remain, which is not preferable. In addition, the lower limit of the center line average roughness Ra is not particularly limited, and there is no limit in particular because there is a natural limit from the viewpoint of processing time and processing cost.

[3] Concavity and convexity formation step In the subsequent concavity and convexity formation step, the first fine particles are hit against the surface 2 of the base material 1 that has been mirror-polished by the polishing step described above to form concavities and convexities. FIG. 1B shows a state in which the fine concave surface 3 having a partial spherical shape is formed by the first fine particles being hit in the process. The method for hitting the first fine particles against the surface 2 of the substrate 1 is not particularly limited, but an injection processing method is preferably used. Examples of the injection processing method include a sand blast method, a shot blast method, and a liquid honing method. As the fine particles used in these processes, a shape close to a sphere is preferable rather than a shape having sharp corners, and fine particles of a hard material that is crushed during processing and does not produce sharp corners are used. preferable. As fine particles satisfying these conditions, spherical zirconia beads and alumina beads are preferably used for ceramic fine particles. For metal-based fine particles, beads made of steel or stainless steel are preferable. Furthermore, fine particles in which ceramic or metal particles are supported on a resin binder may be used.

  The first fine particles used in the step are preferably those having an average particle size in the range of 10 to 200 μm, and more preferably in the range of 50 to 150 μm. When the average particle size of the first fine particles is smaller than 10 μm, it becomes difficult to form sufficient irregularities on the surface of the substrate, and sufficient anti-glare performance in the anti-glare film produced using the obtained mold. Tends to be difficult to obtain. On the other hand, if the average particle size of the first fine particles is larger than 200 μm, the surface unevenness may become rough, resulting in glare and texture deterioration. When an average particle diameter within such a range is used, particularly when spherical fine particles are used, an antiglare film exhibiting excellent antiglare performance can be produced by using the obtained mold. it can. Here, when the first fine particles having an average particle diameter of 15 μm or less are used, it is preferable to employ a wet blast method in which the fine particles are processed by being dispersed in a suitable dispersion medium so that the fine particles are not aggregated due to static electricity or the like. The average particle diameter of the first fine particles described above refers to a weight average particle diameter obtained from a particle size distribution measured by, for example, a Coulter method, a laser diffraction scattering method, a dynamic light scattering method, or the like.

In addition, the pressure at the time of hitting the first fine particles and the use amount of the fine particles also affect the uneven shape after processing, and consequently the surface shape of the antiglare film, but in general, the gauge pressure is about 0.01 to 0.5 MPa. The amount of fine particles of about ^{2 to} 30 g per 1 cm ² of the surface area of the metal to be treated may be appropriately selected according to the type of fine particles used, the particle size, the type of metal, the desired uneven shape, and the like.

  The concavo-convex shape formed in this step has an arithmetic average height Pa of an arbitrary cross-sectional curve of 0.02 to 0.5 μm, and a ratio Pa / PSm between the arithmetic average height Pa and the average length PSm in the cross-sectional curve. Is preferably 0.005 to 0.03. When the arithmetic average height Pa after hitting the first fine particles is smaller than 0.02 μm or the ratio Pa / PSm is smaller than 0.005, a process of dulling the uneven shape in the blunting step described later was performed. At this time, the uneven surface becomes a substantially flat surface, and a mold having a desired surface shape may not be obtained. In addition, when the arithmetic average height Pa after hitting the first fine particles is larger than 0.5 μm or the ratio Pa / PSm is larger than 0.03, a process of dulling the uneven shape in the blunting process described later. It must be performed under strong conditions, and it may be difficult to control the surface shape.

[4] Concavity and convexity adjustment step In the subsequent concavity and convexity adjustment step, the concave and convex shape formed in the concavity and convexity formation step is adjusted by hitting second fine particles having a size different from that of the first fine particles. FIG. 1C schematically shows a state in which the surface 4 is formed by removing the sharp portions of the irregular shape formed by the first fine particles by the second fine particles being hit in the process. It is shown. As a method of hitting the second fine particles against the surface of the substrate on which the irregular shape is formed, a jet blasting method such as a sand blast method, a shot blast method, a liquid honing method, etc. is suitable as described above for the first fine particles. Used for. Also, as the second fine particles, fine particles of a hard material are used as in the case of the first fine particles described above. Among the first fine particles described above, even if fine particles of the same material as the first fine particles are used, Fine particles of different materials may be used.

  As the second fine particles used in the step, those having a size different from that of the first fine particles described above are used. When the size of the first fine particles and the second fine particles are equal, as a result, it is the same as creating a surface uneven shape by hitting only one type of fine particles, and is formed by hitting the first fine particles. Further, the effect of removing the sharp surface irregularities is not exhibited when the second fine particles are applied, which is not preferable.

  The average particle diameter of the second fine particles is preferably in the range of 10 to 200 μm for the same reason as in the case of the first fine particles described above, but even within the range of the average particle diameter, Use different sizes. The second fine particles may be larger than the first fine particles or smaller than the first fine particles as long as they are different in size from the first fine particles. It is more preferable to use those having a small average particle diameter, and it is preferable to use those having an average particle diameter in the range of 20 to 50 μm. Here, FIG. 2 is a diagram schematically showing the surface shape of the base material when second fine particles having an average particle size larger than the first fine particles used in the unevenness forming step are used in the unevenness adjusting step. It is. As shown in FIG. 2, when the unevenness adjusting step is performed using the second fine particles having an average particle size larger than that of the first fine particles, the first fine particles are formed on the surface of the base material 21. In addition to the removal of the sharp point 22 (indicated by the dotted line in the figure), a surface shape governed by the size of the second fine particles is formed, and a sharp point 23 is also formed. It is not preferable because it may be done. The average particle size of the second fine particles refers to a value measured by the same method as the average particle size of the first fine particles described above.

As for the second fine particles, it is preferable to use spherical fine particles because the anti-glare film exhibiting excellent anti-glare performance can be produced using the obtained mold, and the average particle size is 15 μm or less. When the second fine particles are used, it is preferable to employ a wet blast method. Further, the pressure at the time of hitting the second fine particles and the use amount of the fine particles are the same as in the case of the first fine particles described above, the gauge pressure is about 0.01 to 0.5 MPa, and the surface area of the metal to be processed. What is necessary is just to select suitably from the amount of microparticles | fine-particles of about 2-30g per cm < ² > according to the kind of fine particle to be used, a particle size, the kind of metal, desired uneven | corrugated shape, etc.

  In the said process, the uneven | corrugated shape of the base-material surface after fine-tuning by hitting 2nd microparticles | fine-particles has arithmetic mean height Pa in arbitrary cross-sectional curves of 0.02-0.5 micrometer, The cross-sectional curve It is preferable that ratio Pa / PSm of arithmetic average height Pa and average length PSm in is 0.005-0.03. Here, the concavo-convex shape formed by the first fine particles and the concavo-convex shape after the second fine particles having a different size from the first fine particles are hit against the concavo-convex shape, the arithmetic average height Pa and the ratio There is no change in Pa / PSm. This is a slight change that the fine adjustment of the surface irregularity shape by hitting the second fine particles removes the sharp spot of the surface irregularity shape formed by hitting the first fine particles, and the arithmetic average height This shows that no significant difference appears in the length Pa or the average length PSm. When the arithmetic average height Pa after hitting the second fine particles is smaller than 0.02 μm or the ratio Pa / PSm is smaller than 0.005, a process of dulling the uneven shape in the blunting step described later was performed. At this time, the uneven surface becomes a substantially flat surface, and a mold having a desired surface shape may not be obtained. In addition, when the arithmetic average height Pa after hitting the second fine particles is larger than 0.5 μm or the ratio Pa / PSm is larger than 0.03, a process of dulling the uneven shape in the blunting step described later. It must be performed under strong conditions, and it may be difficult to control the surface shape.

  In addition, in the case where such an unevenness adjusting step is not performed, in order to obtain a surface unevenness shape necessary as a final mold, a sharp portion existing in the unevenness shape formed by the first fine particles is also described later. It will be necessary to dull by etching or copper plating, and this will increase the defects of the mold obtained.

[5] Blunting Step Here, FIG. 3 is a diagram schematically showing a preferred example of the latter half of the mold manufacturing method of the present invention, and FIG. 4 is the latter half of the mold manufacturing method of the present invention. It is a figure which shows typically other preferable examples of. In the subsequent blunting process, the process which blunts the uneven | corrugated shape after adjusting with the 2nd fine particle is given. Etching or copper plating is preferable as the process for dulling the uneven shape in the step. When performing the etching process, since the sharp part of the uneven shape formed by hitting the first fine particles disappears, the optical characteristics of the antiglare film produced using the obtained mold are changed in a preferable direction. There is an advantage of doing. In addition, when copper plating is performed, the anti-glare produced using the obtained mold is also effective because copper plating is more effective in dulling the uneven shape than chromium plating described later due to its strong smoothing action. There is an advantage that the optical properties of the film change in a preferred direction. In FIG. 3 (a), the concave surface 3 (FIG. 1 (b)) on the surface of the base material 1 and the acute protrusion are shaved by the etching process, and the partially spherical acute protrusion is blunted. 4A shows a state in which a surface 5 having a surface is formed, and FIG. 4A shows a copper plating layer 6 on the concave surface 3 (FIG. 1B) of the surface of the substrate 1 by copper plating. This shows a state in which the surface 7 having a shape in which the sharp projections of the partial spherical shape are blunted is formed.

When an etching process is adopted as the dulling process, usually, a ferric chloride (FeCl ₃ ) liquid, a cupric chloride (CuCl ₂ ) liquid, an alkaline etching liquid (Cu (NH ₃ ) ₄ Cl ₂ ), etc. are used. Although it is performed by corroding the surface, a strong acid such as hydrochloric acid or sulfuric acid can be used, or reverse electrolytic etching by applying a potential opposite to that at the time of electrolytic plating can also be used. The degree of unevenness after etching is different depending on the type of base metal and the size and depth of the unevenness obtained by blasting techniques. The largest factor is the etching amount. The etching amount here is the thickness of the base material to be cut by etching. If the etching amount is small, the effect of dulling the surface shape of the unevenness obtained by a technique such as blasting is insufficient, and the optical characteristics of the antiglare film obtained by transferring the uneven shape to a transparent film are not so good. . On the other hand, when the etching amount is too large, the uneven shape is almost lost, and the die is almost flat, so that the antiglare property is not exhibited. Furthermore, when the etching amount is large, a portion where the etching is performed more than the predetermined etching amount and a portion where the etching amount is performed only below the predetermined etching occur, resulting in defects on the mold. Therefore, it is not preferable. Therefore, the etching amount is preferably in the range of 1 to 6 μm.

  When copper plating is adopted as the dulling process, the process may be performed in the same manner as in the case of performing copper plating in the first plating step described above. The degree of unevenness after copper plating varies depending on the type of base metal, the size and depth of the unevenness obtained by techniques such as blasting, and the type and thickness of the plating. The greatest factor in controlling the degree of rounding is the plating thickness. If the thickness of the copper plating layer is thin, the effect of dulling the surface shape of the unevenness obtained by techniques such as blasting is insufficient, and the optical properties of the antiglare film obtained by transferring the uneven shape to a transparent film are insufficient. It doesn't get much better. On the other hand, when the plating thickness is too thick, the productivity is deteriorated and the uneven shape is almost lost, so that the antiglare property is not exhibited. Furthermore, if the copper plating layer is too thick, projection-like plating defects called nodules are generated, which is not preferable. Therefore, the thickness of the copper plating layer is preferably in the range of 1 to 6 μm.

  In addition, when not passing through such a blunting process, in order to dull enough the sharp part of the uneven | corrugated shape produced by hitting microparticles | fine-particles, you have to thicken the chromium plating in the 2nd plating process mentioned later. . However, if the thickness of the chrome plating is too thick, nodules are likely to be generated, which is not preferable. In addition, when the thickness of the chrome plating is reduced, the uneven shape produced by hitting the fine particles cannot be sufficiently dulled, and a mold having the desired surface shape cannot be obtained. The produced anti-glare film does not exhibit excellent anti-glare performance.

  As described above in the background art, Patent Document 1 describes that an uneven surface is formed by sandblasting or a bead shot method on a chrome-plated roller on an iron surface, and then chrome plating is performed. Describes forming irregularities on a metal surface by a technique such as etching or sand blasting, and Patent Documents 5 and 6 describe performing a bead shot method or a blasting process on a roll surface. However, after forming a concavo-convex shape by hitting fine particles as in the method shown in the present invention, after applying a process of actively dulling the surface shape, a method of applying a chrome plating process to dull the surface concavo-convex shape There is nothing to mention about.

[6] Second plating step Subsequently, the concavo-convex shape of the surface is further blunted by applying chromium plating. FIG. 3B shows a state in which the chrome plating layer 11 is formed after performing the dulling process by the etching process as described above, and the surface 12 is further dulled. FIG. Shows a state in which the chromium plating layer 11 is formed after the processing of dulling by forming the copper plating layer 6 as described above, and the surface 12 is further blunted.

  As shown in FIG. 3B, when an etching process is employed as a process in the blunting process, a chromium plating layer 11 is formed on the surface 5 that has been blunted by the etching process. Compared with the surface 5 in the state shown in (a), the surface is further dulled by chrome plating, in other words, the uneven shape is relaxed.

  Moreover, as shown in FIG.4 (b), when copper plating is employ | adopted as a process in a blunting process, the copper plating layer 6 is formed on the surface of the base material 1, and also the chromium plating layer 11 is formed on it. The surface 12 is further dulled by chrome plating as compared with the surface 7 in the state shown in FIG. 4A, in other words, the uneven shape is relaxed.

In the present invention, chrome plating is employed which has a glossy surface, a high hardness, a low coefficient of friction, and good release properties on the surface of a flat plate or a roll. The type of chrome plating is not particularly limited, but it is preferable to use a chrome plating that expresses a good gloss, so-called gloss chrome plating or decorative chrome plating. Chromium plating is usually performed by electrolysis, and an aqueous solution containing chromic anhydride (CrO ₃ ) and a small amount of sulfuric acid is used as the plating bath. By adjusting the current density and electrolysis time, the thickness of the chromium plating can be controlled.

  Patent Documents 1, 4, 6 and the like described above disclose the use of chrome plating. However, depending on the type of base and chrome plating before plating of the mold, the surface may be roughened after plating or chrome plating. In many cases, a lot of fine cracks are generated due to the above, and as a result, the optical characteristics of the produced antiglare film proceed in an unfavorable direction. A mold having a rough plated surface is not suitable for producing an antiglare film. This is because the plating surface is generally polished after chromium plating in order to eliminate roughness, but as described later, polishing of the surface after plating is not preferable in the present invention. In the present invention, by applying copper plating or nickel plating to the base metal, such an inconvenience easily caused by chromium plating is solved.

  In the second plating step, it is not preferable to perform plating other than chromium plating. This is because plating other than chromium has low hardness and wear resistance, so that the durability as a mold is lowered, and unevenness is worn away during use or the mold is damaged. In an antiglare film obtained from such a mold, there is a high possibility that a sufficient antiglare function cannot be obtained, and there is a high possibility that defects will occur on the film.

  Also, it is not preferable in the present invention to polish the surface after plating as disclosed in Patent Document 6 described above. By polishing, a flat part is generated on the outermost surface, which may lead to deterioration of optical characteristics, and since shape control factors increase, shape control with good reproducibility becomes difficult. Depending on the reason.

  As described above, in the present invention, the mold having the uneven surface further dulled and the surface hardness increased by applying chrome plating to the surface subjected to the process of dulling the uneven shape by the blunting step described above. Is obtained. The bluntness of the unevenness at this time also varies depending on the type of base metal, the size and depth of the unevenness obtained by techniques such as blasting, and the type and thickness of the plating. The greatest factor in controlling is the plating thickness. If the thickness of the chrome plating is thin, the effect of dulling the surface shape of the unevenness obtained before the chrome plating process is insufficient, and the optical properties of the antiglare film obtained by transferring the uneven shape to a transparent film are not sufficient. It doesn't get better. On the other hand, when the plating thickness is too thick, productivity is deteriorated and a projection-like plating defect called a nodule is generated, which is not preferable. Therefore, the thickness of the chrome plating is preferably in the range of 1 to 10 μm, and more preferably in the range of 3 to 6 μm.

  The chromium plating layer formed in the second plating step is preferably formed to have a Vickers hardness of 800 or more, and more preferably 1000 or more. When the Vickers hardness of the chrome plating layer is less than 800, the durability when using the mold is lowered and the hardening is reduced by the chrome plating. This is because the possibility of occurrence is high, and the possibility of undesirably affecting the occurrence of defects is also high.

  In this way, a mold having substantially no flat portion can be obtained. Thus, the metal mold | die which does not have a substantially flat part is used suitably for obtaining the glare-proof film which shows a preferable optical characteristic. In addition, the metal mold | die obtained with the manufacturing method of this invention is 0.01-0.2 micrometer in arithmetic mean height Pa in the arbitrary cross-section curves of an uneven surface, and arithmetic mean height Pa in the cross-section curves. The ratio Pa / PSm of the average length PSm is preferably 0.002 to 0.01. When the arithmetic average height Pa of the mold is smaller than 0.01 μm or the ratio Pa / PSm is smaller than 0.002, the surface shape of the antiglare film produced using this mold is It tends to be almost flat and not exhibit sufficient antiglare performance. In addition, when the arithmetic average height Pa is larger than 0.2 μm or the ratio Pa / PSm is larger than 0.01, the antiglare film produced using this mold is whitened. , There is a tendency for glare to occur or the texture to deteriorate.

<Method for producing antiglare film>
The present invention also provides a method for producing an antiglare film using the mold obtained by the above-described mold production method of the present invention. That is, the manufacturing method of the antiglare film of the present invention includes a step of transferring the uneven surface of the mold manufactured by the manufacturing method of the mold of the present invention to a transparent resin film, and a transparent surface on which the uneven surface of the mold is transferred. And a step of peeling the resin film from the mold. By such a method for producing an antiglare film of the present invention, an antiglare film exhibiting preferable optical properties is suitably produced.

  The transfer to the mold-shaped film is preferably performed by embossing. Examples of the embossing include a UV embossing method using a photocurable resin and a hot embossing method using a thermoplastic resin. Among these, the UV embossing method is preferable from the viewpoint of productivity.

  The UV embossing method forms a photocurable resin layer on the surface of a transparent resin film, and cures the photocurable resin layer while pressing the photocurable resin layer against the uneven surface of the mold. It is a method of transferring to a layer. Specifically, an ultraviolet curable resin is applied onto the transparent resin film, and the ultraviolet curable resin is irradiated with ultraviolet rays from the transparent resin film side in a state where the applied ultraviolet curable resin is in close contact with the uneven surface of the mold. The mold resin is cured, and then the transparent resin film on which the cured ultraviolet curable resin layer is formed is peeled from the mold, thereby transferring the shape of the mold to the ultraviolet curable resin.

  When the UV embossing method is used, the transparent resin film may be a substantially optically transparent film, and examples thereof include resin films such as a triacetyl cellulose film and a polyethylene terephthalate film.

  Further, the type of the ultraviolet curable resin in the case of using the UV embossing method is not particularly limited, but a commercially available appropriate one can be used. It is also possible to use a resin that can be cured by visible light having a wavelength longer than that of ultraviolet rays by combining an ultraviolet curable resin with an appropriately selected photoinitiator. Specifically, polyfunctional acrylates such as trimethylolpropane triacrylate and pentaerythritol tetraacrylate are used alone or in admixture of two or more thereof, and Irgacure 907 (manufactured by Ciba Specialty Chemicals) ), Irgacure 184 (manufactured by Ciba Specialty Chemicals), and a photopolymerization initiator such as Lucillin TPO (manufactured by BASF) can be suitably used.

  On the other hand, the hot embossing method is a method in which a transparent resin film formed of a thermoplastic resin is pressed against a mold in a heated state, and the surface shape of the mold is transferred to the transparent resin film. The transparent resin film used in the hot embossing method may be any material as long as it is substantially transparent. For example, polymethyl methacrylate, polycarbonate, polyethylene terephthalate, triacetyl cellulose, norbornene compounds are used as monomers. A solvent cast film or an extruded film of a thermoplastic resin such as amorphous cyclic polyolefin can be used. These transparent resin films can also be suitably used as a base film for applying the ultraviolet curable resin in the UV embossing method described above.

  EXAMPLES Hereinafter, the present invention will be described in more detail with reference to examples. However, the present invention is not limited to these examples.

<Example 1>
The surface of a 200 mm diameter iron roll (STKM13A by JIS) was prepared by applying copper ballad plating. Copper ballad plating consists of a copper plating layer / thin silver plating layer / surface copper plating layer, and the thickness of the entire plating layer was about 200 μm. The copper-plated surface is mirror-polished, and on the polished surface, a blast device (manufactured by Fuji Seisakusho) is used, and zirconia beads TZ-B125 (manufactured by Tosoh Corp., average particle diameter) are used as the first fine particles. : 125 μm) was blasted at a blast pressure of 0.05 MPa (gauge pressure, the same applies hereinafter) and a bead usage of 6 g / cm ² (a used amount per 1 cm ² of surface area of the roll, the same applies hereinafter) to form irregularities on the surface. A blasting device (manufactured by Fuji Seisakusho Co., Ltd.) is used on the uneven surface, and zirconia beads TZ-SX-17 (manufactured by Tosoh Corp., average particle size: 20 μm) are used as the second fine particles, with a blast pressure of 0. Blasting was performed at 0.05 MPa and a use amount of beads of 3 g / cm ² to finely adjust the surface unevenness. The resulting copper-plated iron roll with unevenness was etched with a cupric chloride solution. The etching amount at that time was set to 3 μm. Thereafter, chromium plating was performed to produce a mold. At this time, the chromium plating thickness was set to 4 μm. The Vickers hardness of the chrome plating surface of the obtained mold was 1000. The Vickers hardness was measured according to JIS Z 2244 using an ultrasonic hardness tester MIC10 (manufactured by Krautkramer) (the measurement method of Vickers hardness is the same in the following examples).

<Example 2>
A mold was prepared in the same manner as in Example 1 except that blasting with the first fine particles was performed at a blasting amount of 4 g / cm ² and blasting with the second fine particles was performed at a blasting amount of 4 g / cm ² . The Vickers hardness of the chromium plating surface of the obtained mold was 1000.

<Example 3>
Mold as in Example 1, except that blasting with the first fine particles was performed at a blasting amount of 4 g / cm ² and blasting with the second fine particles was performed at a blasting amount of 4 g / cm ² and a blasting pressure of 0.01 MPa. Was made. The Vickers hardness of the chromium plating surface of the obtained mold was 1000.

<Example 4>
Using zirconia beads TZ-SX-17 (manufactured by Tosoh Corporation, average particle size: 20 μm) as the first fine particles, blasting was performed at a blasting amount of 3 g / cm ² and a blast pressure of 0.10 MPa. Mold as in Example 1, except that zirconia beads TZ-B125 (manufactured by Tosoh Corporation, average particle size: 125 μm) was used and blasting was performed at a blasting amount of 4 g / cm ² and a blasting pressure of 0.05 MPa. Was made. The Vickers hardness of the chromium plating surface of the obtained mold was 1000.

<Example 5>
Zirconia beads TZ-SX-17 (manufactured by Tosoh Corporation, average particle size: 20 μm) was used as the first fine particles, and blasting was performed at a blasting amount of 3 g / cm ² and a blast pressure of 0.05 MPa. Mold as in Example 1, except that zirconia beads TZ-B125 (manufactured by Tosoh Corporation, average particle size: 125 μm) was used and blasting was performed at a blasting amount of 4 g / cm ² and a blasting pressure of 0.05 MPa. Was made. The Vickers hardness of the chromium plating surface of the obtained mold was 1000.

<Comparative Examples 1 and 2>
The copper plating surface of an iron roll having a diameter of 200 mm subjected to the same copper ballad plating as used in Example 1 is mirror-polished, and a blasting device (manufactured by Fuji Seisakusho Co., Ltd.) is used on the polished surface. Zirconia beads TZ-B125 (manufactured by Tosoh Corporation, average particle size: 125 μm) were blasted at a blast pressure of 0.05 MPa and a bead consumption of 8 g / cm ² to give irregularities to the surface. The resulting copper-plated iron roll with unevenness was etched with a cupric chloride solution. In this case, the etching amount was set to 10 μm in Comparative Example 1, and was set to 6 μm in Comparative Example 2. Thereafter, chromium plating was performed to produce a mold. At this time, the chromium plating thickness was set to 4 μm. The Vickers hardness of the chromium plating surface of the obtained mold was 1000 for both Comparative Example 1 and Comparative Example 2.

<Evaluation test 1>
About each metal mold | die obtained in Examples 1-5 and Comparative Examples 1 and 2, when the uneven | corrugated shape was formed with the 1st microparticles, when the uneven | corrugated shape was adjusted with the 2nd microparticles (only an Example), the last The surface shape of the roll-shaped mold obtained was evaluated. Since it is difficult to directly measure each surface shape, an anti-glare film sample is prepared in the same manner as in Examples 6 to 10 and Comparative Examples 3 and 4 described later using a mold at each time point. The surface shape of this sample was measured and evaluated as the surface shape of the mold. In addition, although the cross-sectional curve on an anti-glare film turns into the upper and lower sides of the cross-sectional curve on a metal mold | die, arithmetic mean height Pa and average length PSm become the same by both. When measuring the surface shape, use a confocal microscope PLμ2300 (manufactured by Sensofar) and paste it onto the glass substrate using an optically transparent adhesive to prevent the sample from warping. Then, it used for the measurement. At the time of measurement, the magnification of the objective lens was 50 times. Based on the measurement data, the arithmetic average height Pa and average length PSm are calculated by calculating in accordance with JIS B 0601, and the arithmetic average height Pa and average length PSm in the cross-sectional curve are calculated. The ratio Pa / PSm was calculated. The results are shown in Table 1.

<Evaluation Test 2>
About each metal mold | die obtained in Examples 1-5 and Comparative Examples 1 and 2, it illuminated using high-intensity illumination, and the defect on a metal mold | die was evaluated by observing reflected light visually. Defects on the mold mainly exist as fine protrusion defects or concave defects, and are therefore observed as bright spots when reflected light is observed with high-luminance illumination. The size of the defect was evaluated by observing the bright spot discovered visually using a digital microscope VHX-500 (manufactured by Keyence Corporation), and those having a size exceeding 150 μm were counted as defects. Here, video light VL-501 (manufactured by LP Corporation) was used as the high-intensity illumination.

<Examples 6 to 10, Comparative Examples 3 and 4>
A photocurable resin composition GRANDIC 806T (manufactured by Dainippon Ink & Chemicals, Inc.) is dissolved in ethyl acetate to obtain a 50% strength by weight solution. Further, a photopolymerization initiator, luciferin TPO (manufactured by BASF). Chemical name: 2,4,6-trimethylbenzoyldiphenylphosphine oxide) was added in an amount of 5 parts by weight per 100 parts by weight of the curable resin component to prepare a coating solution. This coating solution was applied onto a 80 μm thick triacetylcellulose (TAC) film so that the coating thickness after drying was 5 μm, and dried for 3 minutes in a drier set at 60 ° C. The dried film was adhered to the uneven surface of the mold obtained in each of Examples 1 to 5 and Comparative Examples 1 and 2 with a rubber roll so that the photocurable resin composition layer was on the mold side. It was. In this state, light from a high-pressure mercury lamp with an intensity of 20 mW / cm ² was irradiated from the TAC film side so that the amount of light in terms of h-line was 200 mJ / cm ² to cure the photocurable resin composition layer. Then, the transparent anti-glare films of Examples 6 to 10 and Comparative Examples 3 and 4 comprising a laminate of a cured resin and a TAC film having a concavo-convex surface on the surface by peeling the TAC film together with the cured resin. Respectively.

<Evaluation Test 3>
About each obtained anti-glare film of Examples 6-10 and Comparative Examples 3 and 4, the following optical characteristics and anti-glare performance were evaluated.

(1) Evaluation of optical properties 1: Measurement of haze The haze of the antiglare film was measured by a method defined in JIS K7136. Specifically, haze was measured using a haze meter HM-150 type (manufactured by Murakami Color Research Laboratory) compliant with this standard. In order to prevent the anti-glare film from warping, it was subjected to measurement after being bonded to a glass substrate using an optically transparent pressure-sensitive adhesive so that the uneven surface becomes the surface. In general, when haze increases, an image becomes dark when applied to an image display device, and as a result, front contrast tends to decrease. Therefore, a lower haze is preferable.

(2) Evaluation of optical characteristics 2: Measurement of reflection sharpness The reflection sharpness was measured by a method defined in JIS K 7105. Specifically, the reflection clarity of the antiglare film was measured using an image clarity measuring device ICM-IDP (Suga Test Instruments Co., Ltd.) compliant with this standard. In this standard, four types of optical combs are used for measuring the image definition: the ratio of the width of the dark part to the bright part is 1: 1 and the widths are 0.125 mm, 0.5 mm, 1.0 mm and 2.0 mm. Is stipulated. Among these, when an optical comb with a width of 0.125 mm is used, the measurement error when using an optical comb with a width of 0.125 mm is caused in the antiglare film specified in the present invention because the error of the measured value becomes large. The value was not added to the sum, and the sum of image sharpness measured using three types of optical combs having widths of 0.5 mm, 1.0 mm, and 2.0 mm was referred to as reflection sharpness. In this definition, the maximum value of the reflection definition is 300%. If the definition of reflection definition is too large, an image of a light source or the like is reflected and the antiglare property tends to decrease. Therefore, it is preferably 100% or less, and more preferably 50% or less. . In the evaluation, in order to prevent warping of the antiglare film and to prevent reflection from the back surface, an uneven surface of the antiglare film becomes the surface using an optically transparent adhesive. After bonding to a 2 mm thick black acrylic resin plate, it was subjected to measurement. In this state, light was incident from the antiglare film side and measurement was performed.

(3) Evaluation of optical characteristics 3: Measurement of 60 degree glossiness The 60 degree glossiness was measured by a method defined in JIS Z 8741. Specifically, the glossiness of the antiglare film was measured using a gloss meter PG-1M (manufactured by Nippon Denshoku Industries Co., Ltd.) compliant with this standard. Also in this case, in order to prevent warping of the antiglare film and to prevent reflection from the back surface, an optically transparent adhesive is used, and the antiglare film has a thickness of 2 mm so that the uneven surface becomes the surface. After being pasted on the black acrylic resin plate, it was subjected to measurement. In this state, light was incident from the antiglare film side and measurement was performed. Generally, when the glossiness at 60 degrees is small, it means that the sample surface is cloudy, and as a result, whitening is likely to occur. Therefore, it is preferable that the glossiness is high. However, if the glossiness is too high, reflection occurs and the antiglare property is lowered. Therefore, a value of about 30 to 90% is preferable.

(4) Evaluation of anti-glare performance 1: Visual evaluation of reflection In order to prevent reflection from the back surface of the anti-glare film, the anti-glare film is bonded to the black acrylic resin plate so that the uneven surface becomes the surface, Visual observation was performed from the uneven surface side in a bright room with a fluorescent lamp, and the presence or absence of reflection of the fluorescent lamp was visually evaluated in three stages according to the following criteria.

1: Reflection is not observed 2: Reflection is slightly observed 3: Reflection is clearly observed (5) Evaluation of anti-glare performance 2: Visual evaluation of whitish reflection from the back of the anti-glare film In order to prevent this, the antiglare film is bonded to the black acrylic resin plate so that the uneven surface becomes the surface, and visually observed from the uneven surface side in a bright room with a fluorescent lamp, the degree of whiteness is observed. Visually, it was evaluated in three stages according to the following criteria.

1: No whitening is observed 2: Whiteness is slightly observed 3: Whiteness is clearly observed (6) Evaluation of anti-glare performance 3: Evaluation of glare First, as shown in a plan view in FIG. A photomask having a pattern of unit cells 31 was prepared. In FIG. 5, a unit cell 31 has a key-shaped chrome light shielding pattern 32 with a line width of 10 μm formed on a transparent substrate, and a portion where the chrome light shielding pattern 32 is not formed is an opening 33. Next, as shown in FIG. 6, this photomask is placed in a light box 42 with a light source 43 provided inside with a chrome light-shielding pattern 32 of the photomask 41 on top, and a 1.1 mm thick glass plate 44 is placed on the photomask 41. A sensory evaluation was performed by sensory evaluation of the degree of glare in seven stages by placing a sample on which an antiglare film 51 was bonded with a 20 μm-thick adhesive on a photomask 41 and visually observing it from a location about 30 cm away from the sample. Among the seven stages, level 1 corresponds to a state where no glare is recognized, level 7 corresponds to a state where severe glare is observed, and level 3 refers to a state where only slight glare is observed. Note that the unit cell of the photomask has a unit cell length × unit cell width in FIG. 5 of 282 μm × 94 μm, and accordingly, an opening portion length × opening portion width in FIG. 5 is 272 μm × 84 μm. This cell corresponds to a pixel density of 90 ppi (pixel per inch).

  The results are shown in Table 2. In Table 2, for example, the breakdown of the reflection definition of Example 6 is as follows.

Reflection sharpness 0.5mm optical comb: 9.7%
1.0mm optical comb: 9.9%
0.5mm optical comb: 14.5%
Total 34.1%

  From the results shown in Tables 1 and 2, it was possible to produce a mold with good reproducibility by the manufacturing method of the present invention in a state where defects were not substantially present as in Examples 1 to 5. Moreover, it turned out that the metal mold | die obtained with the manufacturing method of this invention of Examples 1-5 can manufacture the anti-glare film which shows the outstanding anti-glare performance. Incidentally, as in Comparative Examples 1 and 2, in the method of producing a mold by hitting only one kind of fine particles, the process of dulling is not strengthened in order to obtain an antiglare film exhibiting excellent antiglare performance. Therefore, the number of defects became 10 times or more compared with Examples 1-5.

  Further, when the average particle size of the first fine particles is smaller than the average particle size of the second fine particles as in Examples 4 and 5, the anti-glare film produced using those molds has a sharp reflection. The degree exceeded 50%, and the antiglare performance also fell. Thus, when the average particle size of the first fine particles is smaller than the average particle size of the second fine particles, it is difficult to fine-tune the surface shape, and sufficient anti-glare performance and defects are substantially absent. It turns out that it may be difficult to achieve both.

It is a figure which shows typically a preferable example of the first half part of the manufacturing method of the metal mold | die of this invention. In an unevenness | corrugation adjustment process, it is a figure which shows typically the surface shape of a base material at the time of using the 2nd microparticles | fine-particles larger than the 1st microparticles | fine-particles used at the uneven | corrugated formation process. It is a figure which shows typically a preferable example of the second half part of the manufacturing method of the metal mold | die of this invention. It is a figure which shows typically the other preferable example of the latter half part of the manufacturing method of the metal mold | die of this invention. It is a top view which shows typically the unit cell 31 in the photomask used for a glare evaluation test. It is a figure which shows typically a mode that the glare evaluation test is performed.

Explanation of symbols

  DESCRIPTION OF SYMBOLS 1 Base material, 2, 4, 5, 7, 12 Base material surface, 3 Concave surface, 6 Copper plating layer, 11 Chrome plating layer.

Claims (10)

A first plating step of performing copper plating or nickel plating on the surface of the mold base;
A polishing step of polishing the surface plated by the first plating step;
Concavity and convexity forming step of forming concavities and convexities by hitting the first fine particles on the polished surface,
Concave and convex adjustment step of adjusting the concave and convex shape formed in the concave and convex formation step by hitting the second fine particles of a size different from the first fine particles,
A blunting step for performing a process of blunting the uneven shape after being adjusted by the second fine particles;
A mold manufacturing method including a second plating step of performing chromium plating on the blunted uneven surface.   The manufacturing method of Claim 1 whose 1st microparticles | fine-particles and 2nd microparticles | fine-particles are true spheres with an average particle diameter of 10-200 micrometers.   The production method according to claim 1 or 2, wherein the average particle size of the first fine particles is larger than the average particle size of the second fine particles.   The manufacturing method in any one of Claims 1-3 whose process which blunts an uneven | corrugated shape is an etching process.   The manufacturing method of Claim 4 whose etching amount is 1-6 micrometers.   The manufacturing method in any one of Claims 1-3 whose process which blunts an uneven | corrugated shape is copper plating.   The manufacturing method according to claim 6, wherein the copper plating layer formed by copper plating has a thickness of 1 to 6 μm.   The manufacturing method according to any one of claims 1 to 6, wherein after the chromium plating is performed, the surface is not polished, and the chromium plating surface is used as an uneven surface of the mold as it is.   The manufacturing method in any one of Claims 1-8 in which the chromium plating layer formed by chromium plating has a thickness of 1-10 micrometers. Transferring the uneven surface of the mold produced by the method according to claim 1 to a transparent resin film;
A method for producing an antiglare film, comprising a step of peeling the transparent resin film having the concavo-convex surface of the mold transferred from the mold.

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