WO2023032861A1 - 硬化性樹脂組成物及び電子部品装置 - Google Patents
硬化性樹脂組成物及び電子部品装置 Download PDFInfo
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- WO2023032861A1 WO2023032861A1 PCT/JP2022/032272 JP2022032272W WO2023032861A1 WO 2023032861 A1 WO2023032861 A1 WO 2023032861A1 JP 2022032272 W JP2022032272 W JP 2022032272W WO 2023032861 A1 WO2023032861 A1 WO 2023032861A1
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- resin composition
- curable resin
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- epoxy resin
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- 125000003754 ethoxycarbonyl group Chemical group C(=O)(OCC)* 0.000 description 1
- WUOIAOOSKMHJOV-UHFFFAOYSA-N ethyl(diphenyl)phosphane Chemical compound C=1C=CC=CC=1P(CC)C1=CC=CC=C1 WUOIAOOSKMHJOV-UHFFFAOYSA-N 0.000 description 1
- 125000004672 ethylcarbonyl group Chemical group [H]C([H])([H])C([H])([H])C(*)=O 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 125000002485 formyl group Chemical group [H]C(*)=O 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 230000026030 halogenation Effects 0.000 description 1
- 238000005658 halogenation reaction Methods 0.000 description 1
- ARRNBPCNZJXHRJ-UHFFFAOYSA-M hydron;tetrabutylazanium;phosphate Chemical compound OP(O)([O-])=O.CCCC[N+](CCCC)(CCCC)CCCC ARRNBPCNZJXHRJ-UHFFFAOYSA-M 0.000 description 1
- 229910001701 hydrotalcite Inorganic materials 0.000 description 1
- 229960001545 hydrotalcite Drugs 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 125000003253 isopropoxy group Chemical group [H]C([H])([H])C([H])(O*)C([H])([H])[H] 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- 229910000464 lead oxide Inorganic materials 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 125000000040 m-tolyl group Chemical group [H]C1=C([H])C(*)=C([H])C(=C1[H])C([H])([H])[H] 0.000 description 1
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 1
- 239000000347 magnesium hydroxide Substances 0.000 description 1
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- 125000001160 methoxycarbonyl group Chemical group [H]C([H])([H])OC(*)=O 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 239000004206 montan acid ester Substances 0.000 description 1
- 235000013872 montan acid ester Nutrition 0.000 description 1
- 229910052863 mullite Inorganic materials 0.000 description 1
- INJVFBCDVXYHGQ-UHFFFAOYSA-N n'-(3-triethoxysilylpropyl)ethane-1,2-diamine Chemical compound CCO[Si](OCC)(OCC)CCCNCCN INJVFBCDVXYHGQ-UHFFFAOYSA-N 0.000 description 1
- PHQOGHDTIVQXHL-UHFFFAOYSA-N n'-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN PHQOGHDTIVQXHL-UHFFFAOYSA-N 0.000 description 1
- KBJFYLLAMSZSOG-UHFFFAOYSA-N n-(3-trimethoxysilylpropyl)aniline Chemical compound CO[Si](OC)(OC)CCCNC1=CC=CC=C1 KBJFYLLAMSZSOG-UHFFFAOYSA-N 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 125000003261 o-tolyl group Chemical group [H]C1=C([H])C(*)=C(C([H])=C1[H])C([H])([H])[H] 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000012860 organic pigment Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 150000004965 peroxy acids Chemical class 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- 125000006678 phenoxycarbonyl group Chemical group 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 238000011417 postcuring Methods 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 150000004053 quinones Chemical class 0.000 description 1
- 229920005604 random copolymer Polymers 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000000790 scattering method Methods 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 229910052596 spinel Inorganic materials 0.000 description 1
- 239000011029 spinel Substances 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 235000021286 stilbenes Nutrition 0.000 description 1
- 238000012916 structural analysis Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000003826 tablet Substances 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- MCZDHTKJGDCTAE-UHFFFAOYSA-M tetrabutylazanium;acetate Chemical compound CC([O-])=O.CCCC[N+](CCCC)(CCCC)CCCC MCZDHTKJGDCTAE-UHFFFAOYSA-M 0.000 description 1
- GTCDARUMAMVCRO-UHFFFAOYSA-M tetraethylazanium;acetate Chemical compound CC([O-])=O.CC[N+](CC)(CC)CC GTCDARUMAMVCRO-UHFFFAOYSA-M 0.000 description 1
- PSEQWFPWQRZBOO-UHFFFAOYSA-M tetrahexylazanium;benzoate Chemical compound [O-]C(=O)C1=CC=CC=C1.CCCCCC[N+](CCCCCC)(CCCCCC)CCCCCC PSEQWFPWQRZBOO-UHFFFAOYSA-M 0.000 description 1
- UFDHBDMSHIXOKF-UHFFFAOYSA-N tetrahydrophthalic acid Natural products OC(=O)C1=C(C(O)=O)CCCC1 UFDHBDMSHIXOKF-UHFFFAOYSA-N 0.000 description 1
- USFPINLPPFWTJW-UHFFFAOYSA-N tetraphenylphosphonium Chemical compound C1=CC=CC=C1[P+](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 USFPINLPPFWTJW-UHFFFAOYSA-N 0.000 description 1
- LPSKDVINWQNWFE-UHFFFAOYSA-M tetrapropylazanium;hydroxide Chemical compound [OH-].CCC[N+](CCC)(CCC)CCC LPSKDVINWQNWFE-UHFFFAOYSA-M 0.000 description 1
- 229920002725 thermoplastic elastomer Polymers 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 150000003573 thiols Chemical class 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- WLPUWLXVBWGYMZ-UHFFFAOYSA-N tricyclohexylphosphine Chemical compound C1CCCCC1P(C1CCCCC1)C1CCCCC1 WLPUWLXVBWGYMZ-UHFFFAOYSA-N 0.000 description 1
- DHWBYAACHDUFAT-UHFFFAOYSA-N tricyclopentylphosphane Chemical compound C1CCCC1P(C1CCCC1)C1CCCC1 DHWBYAACHDUFAT-UHFFFAOYSA-N 0.000 description 1
- ZYMHKOVQDOFPHH-UHFFFAOYSA-N trimethoxy(oct-1-enyl)silane Chemical compound CCCCCCC=C[Si](OC)(OC)OC ZYMHKOVQDOFPHH-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- QYJYJTDXBIYRHH-UHFFFAOYSA-N trimethoxy-[8-(oxiran-2-ylmethoxy)octyl]silane Chemical compound C(C1CO1)OCCCCCCCC[Si](OC)(OC)OC QYJYJTDXBIYRHH-UHFFFAOYSA-N 0.000 description 1
- IDXDWPWXHTXJMZ-UHFFFAOYSA-N tris(2,4,6-trimethylphenyl)phosphane Chemical compound CC1=CC(C)=CC(C)=C1P(C=1C(=CC(C)=CC=1C)C)C1=C(C)C=C(C)C=C1C IDXDWPWXHTXJMZ-UHFFFAOYSA-N 0.000 description 1
- XDHRVAHAGMMFMC-UHFFFAOYSA-N tris(2,4-dimethylphenyl)phosphane Chemical compound CC1=CC(C)=CC=C1P(C=1C(=CC(C)=CC=1)C)C1=CC=C(C)C=C1C XDHRVAHAGMMFMC-UHFFFAOYSA-N 0.000 description 1
- RERMPCBBVZEPBS-UHFFFAOYSA-N tris(2,6-dimethylphenyl)phosphane Chemical compound CC1=CC=CC(C)=C1P(C=1C(=CC=CC=1C)C)C1=C(C)C=CC=C1C RERMPCBBVZEPBS-UHFFFAOYSA-N 0.000 description 1
- DAGQYUCAQQEEJD-UHFFFAOYSA-N tris(2-methylpropyl)phosphane Chemical compound CC(C)CP(CC(C)C)CC(C)C DAGQYUCAQQEEJD-UHFFFAOYSA-N 0.000 description 1
- CKKFLUXMIUUGAW-UHFFFAOYSA-N tris(2-propan-2-ylphenyl)phosphane Chemical compound CC(C)C1=CC=CC=C1P(C=1C(=CC=CC=1)C(C)C)C1=CC=CC=C1C(C)C CKKFLUXMIUUGAW-UHFFFAOYSA-N 0.000 description 1
- GDKAFTKCUOBEDW-UHFFFAOYSA-N tris(2-tert-butylphenyl)phosphane Chemical compound CC(C)(C)C1=CC=CC=C1P(C=1C(=CC=CC=1)C(C)(C)C)C1=CC=CC=C1C(C)(C)C GDKAFTKCUOBEDW-UHFFFAOYSA-N 0.000 description 1
- RYXYUARTMQUYKV-UHFFFAOYSA-N tris(4-butylphenyl)phosphane Chemical compound C1=CC(CCCC)=CC=C1P(C=1C=CC(CCCC)=CC=1)C1=CC=C(CCCC)C=C1 RYXYUARTMQUYKV-UHFFFAOYSA-N 0.000 description 1
- SPNVODOGUAUMCA-UHFFFAOYSA-N tris(4-ethoxy-2,6-dimethylphenyl)phosphane Chemical compound CC1=CC(OCC)=CC(C)=C1P(C=1C(=CC(OCC)=CC=1C)C)C1=C(C)C=C(OCC)C=C1C SPNVODOGUAUMCA-UHFFFAOYSA-N 0.000 description 1
- LQEKTSMTEYLBLJ-UHFFFAOYSA-N tris(4-ethoxyphenyl)phosphane Chemical compound C1=CC(OCC)=CC=C1P(C=1C=CC(OCC)=CC=1)C1=CC=C(OCC)C=C1 LQEKTSMTEYLBLJ-UHFFFAOYSA-N 0.000 description 1
- PCCAGZSOGFNURV-UHFFFAOYSA-N tris(4-ethylphenyl)phosphane Chemical compound C1=CC(CC)=CC=C1P(C=1C=CC(CC)=CC=1)C1=CC=C(CC)C=C1 PCCAGZSOGFNURV-UHFFFAOYSA-N 0.000 description 1
- UYUUAUOYLFIRJG-UHFFFAOYSA-N tris(4-methoxyphenyl)phosphane Chemical compound C1=CC(OC)=CC=C1P(C=1C=CC(OC)=CC=1)C1=CC=C(OC)C=C1 UYUUAUOYLFIRJG-UHFFFAOYSA-N 0.000 description 1
- WXAZIUYTQHYBFW-UHFFFAOYSA-N tris(4-methylphenyl)phosphane Chemical compound C1=CC(C)=CC=C1P(C=1C=CC(C)=CC=1)C1=CC=C(C)C=C1 WXAZIUYTQHYBFW-UHFFFAOYSA-N 0.000 description 1
- JTOQWGJGVSYTTN-UHFFFAOYSA-N tris(4-propylphenyl)phosphane Chemical compound C1=CC(CCC)=CC=C1P(C=1C=CC(CCC)=CC=1)C1=CC=C(CCC)C=C1 JTOQWGJGVSYTTN-UHFFFAOYSA-N 0.000 description 1
- BIKXLKXABVUSMH-UHFFFAOYSA-N trizinc;diborate Chemical compound [Zn+2].[Zn+2].[Zn+2].[O-]B([O-])[O-].[O-]B([O-])[O-] BIKXLKXABVUSMH-UHFFFAOYSA-N 0.000 description 1
- UIXPTCZPFCVOQF-UHFFFAOYSA-N ubiquinone-0 Chemical compound COC1=C(OC)C(=O)C(C)=CC1=O UIXPTCZPFCVOQF-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/62—Alcohols or phenols
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
Definitions
- the present disclosure relates to curable resin compositions and electronic component devices.
- these packages are mounted differently than pin insertion packages. That is, in the pin-insertion type package, the pins are inserted into the wiring board and then soldered from the rear surface of the wiring board, so the package is not directly exposed to high temperatures.
- surface-mounted ICs are temporarily fixed to the surface of the wiring board and processed by a solder bath, a reflow device, or the like, so the package is directly exposed to the soldering temperature (reflow temperature).
- reflow temperature soldering temperature
- the package absorbs moisture
- the absorbed moisture evaporates during reflow, and the generated vapor pressure acts as peeling stress, causing peeling between the sealing material and the supporting member such as the element or lead frame.
- the occurrence of package cracks, poor electrical characteristics, and the like Therefore, there is a demand for the development of a sealing material that is excellent in adhesion to a supporting member and, in turn, excellent in solder heat resistance (reflow resistance).
- a curable resin composition containing an epoxy resin and a phenol-based curing agent is known as a sealing material.
- Patent Document 1 There is room for further improvement in the reflow resistance of the curable resin composition proposed in Patent Document 1.
- the present disclosure has been made in view of the above situation, and the problem to be solved is to provide a curable resin composition having excellent reflow resistance and an element sealed with this curable resin composition.
- An object of the present invention is to provide an electronic component device.
- the epoxy resin comprises a copolymerized epoxy resin having an alkylphenol-derived structural unit and an alkoxynaphthalene-derived structural unit.
- the content of the copolymer type epoxy resin relative to the total mass of the epoxy resin is 50% by mass to 90% by mass.
- ⁇ 4> The curable resin composition according to any one of ⁇ 1> to ⁇ 3>, wherein the epoxy resin contains a biphenyl-type epoxy resin.
- the phenolic curing agent contains one or more phenolic curing agents selected from the group consisting of aralkyl-type phenolic resins and novolac-type phenolic resins.
- the curable resin composition according to . ⁇ 6> The above ⁇ 1, wherein the phenol-based curing agent contains an aralkyl-type phenol resin, and the content of the aralkyl-type phenol resin with respect to the total mass of the phenol-based curing agent is 60% by mass to 95% by mass.
- An electronic component device comprising an element and a resin cured product of the curable resin composition according to any one of ⁇ 1> to ⁇ 7> for sealing the element.
- an electronic component device including a curable resin composition having excellent reflow resistance and an element sealed with this curable resin composition.
- the numerical range indicated using “-" includes the numerical values before and after "-" as the minimum and maximum values, respectively.
- the upper limit or lower limit of one numerical range may be replaced with the upper or lower limit of another numerical range described step by step.
- the upper or lower limits of the numerical ranges may be replaced with the values shown in Synthetic Examples.
- each component may contain multiple types of applicable compounds. When there are multiple types of substances corresponding to each component in the composition, the content rate or content of each component is the total content rate or content of the multiple types of substances present in the composition unless otherwise specified. means quantity.
- Plural types of particles corresponding to each component in the present disclosure may be contained.
- the particle size of each component means a value for a mixture of the multiple types of particles present in the composition, unless otherwise specified.
- the term "laminate" refers to stacking layers, and two or more layers may be bonded or two or more layers may be detachable.
- the notation without describing substitution and unsubstitution includes not only those not having substituents but also those having substituents.
- the number of structural units represents an integer value for a single molecule, but represents a rational number which is an average value for an aggregate of multiple types of molecules.
- the number of carbon atoms means the total number of carbon atoms contained in a group as a whole, and when the group does not have a substituent, it represents the number of carbon atoms forming the skeleton of the group. When has a substituent, it represents the total sum of the number of carbon atoms forming the skeleton of the group plus the number of carbon atoms in the substituent.
- the equivalent ratio of the phenolic hydroxyl group (active hydrogen) of the phenolic curing agent to the epoxy group of the epoxy resin is the curability 1 H-NMR of the resin composition is measured, and it can be determined from the integral ratio of the protons of the epoxy group and the protons of the phenolic hydroxyl group. 1 H-NMR of the curable resin composition is measured under the following conditions.
- the dynamic viscoelasticity measurement of the resin cured product of the curable resin composition can be performed using a dynamic viscoelasticity measuring device (for example, DMA8000 manufactured by PerkinElmer).
- a dynamic viscoelasticity measuring device for example, DMA8000 manufactured by PerkinElmer.
- test mode 3-point bending mode
- measurement temperature 25 ° C. to 330 ° C.
- temperature increase rate 10 ° C./min
- Test frequency Perform dynamic viscoelasticity measurement under the condition of 1 Hz, and specify the value of storage viscoelasticity, the peak value of tan ⁇ , the glass transition temperature, etc. from the obtained chart (vertical axis: tan ⁇ , horizontal axis: temperature) be able to.
- the resin cured product was produced by molding the curable resin composition using a transfer molding machine under the conditions of a mold temperature of 175°C, a molding pressure of 8.3 MPa, and a curing time of 120 seconds. By carrying out curing.
- the coefficient of thermal expansion (CTE) of the cured resin of the curable resin composition is measured using a thermomechanical analyzer, for example, on a cured resin of ⁇ 4 mm ⁇ 20 mm. .
- the production of the resin cured product is as described above.
- the measurement conditions are a load of 15 g, a measurement temperature of ⁇ 50° C. to 220° C., and a heating rate of 5° C./min.
- TMA/SS6100 manufactured by Seiko Instruments Inc. can be used.
- the weight average molecular weight (Mw) and number average molecular weight (Mn) are measured using the following GPC measurement device under the following measurement conditions, and converted using a standard polystyrene calibration curve.
- a calibration curve was prepared using a set of 5 samples (“PStQuick MP-H” and “PStQuick B”, manufactured by Tosoh Corporation) as standard polystyrene.
- PStQuick MP-H and “PStQuick B”, manufactured by Tosoh Corporation
- the molecular weight determined from the chemical structure of the compound is adopted as the Mw or Mn of the compound.
- GPC measuring device GPC device: High-speed GPC device "HCL-8320GPC", detector is differential refractometer or UV, column manufactured by Tosoh Corporation: column TSKgel SuperMultipore HZ-H (column length: 15 cm, column inner diameter: 4.6 mm), Tosoh stock Company made (measurement conditions) Solvent: Tetrahydrofuran (THF) Measurement temperature: 40°C Flow rate: 0.35 mL/min Sample concentration: 10 mg/THF5 mL Injection volume: 20 ⁇ L
- the curable resin composition of the present disclosure contains an epoxy resin and a phenolic curing agent at an equivalent ratio of the phenolic hydroxyl group of the phenolic curing agent to the epoxy group of the epoxy resin of 0.5 or more and less than 1.0. .
- the curable resin composition of the present disclosure has excellent reflow resistance.
- the curable resin composition of the present disclosure achieves the above effects is not clear, but is presumed as follows.
- the curable resin composition of the present disclosure contains an epoxy resin and a phenolic curing agent at an equivalent ratio of the phenolic hydroxyl group of the phenolic curing agent to the epoxy group of the epoxy resin of 0.5 or more and less than 1.0.
- the tan ⁇ value near the reflow temperature can be increased, and the internal stress of the cured resin tends to be relaxed during reflow.
- the adhesiveness between the cured resin of the curable resin composition and the supporting member is improved, so that it is presumed to have excellent reflow resistance.
- MSL Moisture Sensitive Level
- JEDEC Joint Electron Device Engineers Council
- the temperature at which tan ⁇ becomes maximum is preferably less than 120°C, more preferably less than 110°C.
- a glass transition temperature of less than 120° C. tends to improve the reflow resistance of the curable resin composition of the present disclosure.
- the lower limit of the glass transition temperature is not particularly limited, it can be, for example, 50° C. or higher.
- tan ⁇ at the glass transition temperature is preferably over 0.400, more preferably over 0.410.
- the upper limit of tan ⁇ at the glass transition temperature is not particularly limited, it can be, for example, 1.0 or less.
- the value of tan ⁇ at the glass transition temperature is 100
- the value of tan ⁇ at at least one temperature of -10 ° C. is more than 60. more preferably greater than 63, and even more preferably greater than 65.
- the sum of tan ⁇ values at each temperature of 220°C, 230°C, 240°C and 250°C is preferably more than 0.400.
- the upper limit of the sum of tan ⁇ values at temperatures of 220° C., 230° C., 240° C. and 250° C. is not particularly limited, but can be, for example, 2.0 or less.
- the total value of tan ⁇ at each temperature of 70 ° C., 80 ° C. and 90 ° C. is preferably more than 0.600, and more than 0.700 It is more preferable to have
- the upper limit of the sum of tan ⁇ values at temperatures of 70° C., 80° C. and 90° C. is not particularly limited, but can be, for example, 2.0 or less.
- the storage viscoelasticity at 260 ° C. obtained by performing dynamic viscoelasticity measurement on the resin cured product of the curable resin composition is preferably 450 MPa or less, and is 435 MPa or less. is more preferably 420 MPa or less.
- the lower limit of the storage modulus is not particularly limited, it can be, for example, 150 MPa or more.
- the thermal expansion coefficient (CTE1) below the glass transition temperature of the resin cured product of the curable resin composition of the present disclosure obtained by thermomechanical analysis is preferably 15 ppm / ° C. or less from the viewpoint of followability to the support member. 13 ppm/°C or less is more preferable, and 10 ppm/°C or less is even more preferable.
- the lower limit of the coefficient of thermal expansion is not particularly limited, it can be set to 3 ppm/°C, for example.
- the coefficient of thermal expansion (CTE2) above the glass transition temperature is preferably 10 ppm/° C. to 45 ppm/° C., more preferably 12 ppm/° C. to 40 ppm/° C., more preferably 15 ppm/° C. to 38 ppm/° C. °C is more preferred.
- epoxy resin The curable resin composition of the present disclosure contains an epoxy resin.
- the type of epoxy resin is not particularly limited as long as it has two or more epoxy groups in one molecule.
- the linear polysiloxane compound is not included in the epoxy resin. Specific examples of epoxy resins are described below, but are not limited thereto.
- At least one phenol selected from the group consisting of phenol compounds such as phenol, cresol, xylenol, resorcinol, catechol, bisphenol A and bisphenol F, and naphthol compounds such as ⁇ -naphthol, ⁇ -naphthol and dihydroxynaphthalene.
- a novolak type epoxy resin phenol novolac type epoxy resin, ortho-cresol novolak-type epoxy resins, etc.
- epoxidized triphenylmethane-type phenolic resins obtained by condensation or co-condensation of the above phenolic compounds and aromatic aldehyde compounds such as benzaldehyde and salicylaldehyde in the presence of an acidic catalyst.
- a triphenylmethane type epoxy resin a copolymer type epoxy resin obtained by epoxidizing a novolak resin obtained by co-condensing the above phenol compound and naphthol compound with an aldehyde compound in the presence of an acidic catalyst; bisphenol A, bisphenol diphenylmethane-type epoxy resins that are diglycidyl ethers such as F; biphenyl-type epoxy resins that are diglycidyl ethers of alkyl-substituted or unsubstituted biphenols; stilbene-type epoxy resins that are diglycidyl ethers of stilbene-based phenol compounds; Sulfur atom-containing epoxy resins that are diglycidyl ethers; Epoxy resins that are glycidyl ethers of alcohols such as butanediol, polyethylene glycol and polypropylene glycol; Glycidyl polyvalent carboxylic acid compounds such as phthalic acid, isophthalic acid and
- co-condensation resins of dicyclopentadiene and phenol compounds Dicyclopentadiene type epoxy resin which is obtained by epoxidizing the; vinylcyclohexene diepoxide obtained by epoxidizing the olefin bond in the molecule, 3,4-epoxycyclohexylmethyl-3,4-epoxycyclohexane carboxylate, 2- (3,4-epoxy)cyclohexyl-5,5-spiro(3 ,4-epoxy)cyclohexane-m-dioxane and other alicyclic epoxy resins; para-xylylene-modified epoxy resins that are glycidyl ethers of para-xylylene-modified phenol resins; meta-xylylene-modified epoxy resins that are glycidyl ethers of meta-xylylene-modified phenol resins; terpene-modified phenol
- the biphenyl-type epoxy resin is not particularly limited as long as it is an epoxy resin having a biphenyl skeleton.
- an epoxy resin represented by the following general formula (II) is preferred.
- R 8 represents a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, or an aromatic group having 4 to 18 carbon atoms, all of which may be the same or different.
- n is an average value and represents an integer of 0-10.
- the stilbene-type epoxy resin is not particularly limited as long as it is an epoxy resin having a stilbene skeleton.
- an epoxy resin represented by the following general formula (III) is preferred.
- R 9 and R 10 each represent a hydrogen atom or a monovalent organic group having 1 to 18 carbon atoms, and may be the same or different.
- n is an average value and represents an integer of 0-10.
- the diphenylmethane-type epoxy resin is not particularly limited as long as it is an epoxy resin having a diphenylmethane skeleton.
- an epoxy resin represented by the following general formula (IV) is preferred.
- R 11 and R 12 each represent a hydrogen atom or a monovalent organic group having 1 to 18 carbon atoms, and may be the same or different.
- n is an average value and represents an integer of 0-10.
- the sulfur atom-containing type epoxy resin is not particularly limited as long as it is an epoxy resin containing sulfur atoms.
- examples thereof include epoxy resins represented by the following general formula (V).
- R 13 represents a hydrogen atom or a monovalent organic group having 1 to 18 carbon atoms, and all of them may be the same or different.
- n is an average value and represents an integer of 0-10.
- the novolak type epoxy resin is not particularly limited as long as it is an epoxy resin obtained by epoxidizing a novolak type phenol resin.
- R 14 represents a hydrogen atom or a monovalent organic group having 1 to 18 carbon atoms, and all of them may be the same or different.
- R 15 represents a monovalent organic group having 1 to 18 carbon atoms, all of which may be the same or different.
- i each independently represents an integer of 0 to 3;
- n is an average value and represents an integer of 0-10.
- the dicyclopentadiene type epoxy resin is not particularly limited as long as it is an epoxy resin obtained by epoxidizing a compound having a dicyclopentadiene skeleton as a raw material.
- R 16 represents a monovalent organic group having 1 to 18 carbon atoms, and all of them may be the same or different.
- i each independently represents an integer of 0 to 3;
- n is an average value and represents an integer of 0-10.
- the triphenylmethane-type epoxy resin is not particularly limited as long as it is an epoxy resin made from a compound having a triphenylmethane skeleton.
- R 17 and R 18 each represent a monovalent organic group having 1 to 18 carbon atoms, and may be the same or different.
- Each i independently represents an integer of 0 to 3
- each k independently represents an integer of 0 to 4.
- n is an average value and represents an integer of 0-10.
- the copolymer type epoxy resin obtained by epoxidizing a novolac resin obtained from a naphthol compound, a phenolic compound, and an aldehyde compound is not particularly limited as long as it is an epoxy resin made from a compound having a naphthol skeleton and a compound having a phenolic skeleton.
- an epoxy resin obtained by glycidyl-etherifying a novolac-type phenol resin using a compound having a naphthol skeleton and a compound having a phenol skeleton is preferable, and an epoxy resin represented by the following general formula (IX) is more preferable.
- R 19 to R 21 represent monovalent organic groups having 1 to 18 carbon atoms, and may be the same or different.
- Each i independently represents an integer of 0 to 3
- each j independently represents an integer of 0 to 2
- each k independently represents an integer of 0 to 4.
- l and m are average values, numbers from 0 to 10, and (l+m) shows numbers from 0 to 10.
- the terminal of the epoxy resin represented by formula (IX) is either one of formula (IX-1) or (IX-2) below.
- Definitions of R 19 to R 21 , i, j and k in formulas (IX-1) and (IX-2) are the same as definitions of R 19 to R 21 , i, j and k in formula (IX).
- n is 1 (when linked via a methylene group) or 0 (when not linked via a methylene group).
- the epoxy resin represented by the general formula (IX) includes a random copolymer having l structural units and m structural units at random, an alternating copolymer having alternating structural units, and a copolymer having regularly , a block copolymer having a block shape, and the like. Any one of these may be used alone, or two or more may be used in combination.
- the aralkyl-type epoxy resin is composed of at least one selected from the group consisting of phenol compounds such as phenol and cresol, and naphthol compounds such as naphthol and dimethylnaphthol, and dimethoxyparaxylene, bis(methoxymethyl)biphenyl or derivatives thereof.
- phenol compounds such as phenol and cresol
- naphthol compounds such as naphthol and dimethylnaphthol
- dimethoxyparaxylene bis(methoxymethyl)biphenyl or derivatives thereof.
- a phenolic resin synthesized from at least one selected from the group consisting of phenol compounds such as phenol and cresol and naphthol compounds such as naphthol and dimethylnaphthol, and dimethoxyparaxylene, bis(methoxymethyl)biphenyl or derivatives thereof is preferably an epoxy resin obtained by glycidyl etherification, and more preferably an epoxy resin represented by the following general formulas (X) and (XI).
- R 38 represents a hydrogen atom or a monovalent organic group having 1 to 18 carbon atoms, all of which may be the same or different.
- R 37 , R 39 to R 41 each represent a monovalent organic group having 1 to 18 carbon atoms, and all of them may be the same or different.
- i is each independently an integer of 0 to 3
- j is each independently an integer of 0 to 2
- k is each independently an integer of 0 to 4
- l is each independently an integer of 0 to 4 show.
- n is an average value, each independently an integer of 0 to 10;
- R 8 to R 21 and R 37 to R 41 in general formulas (II) to (XI) above “all of which may be the same or different” means, for example, 8 to R 41 in formula (II). It means that all 88 R 8 may be the same or different.
- Other R 9 to R 21 and R 37 to R 41 also mean that the respective numbers contained in the formula may all be the same or different.
- R 8 to R 21 and R 37 to R 41 may be the same or different.
- all of R 9 and R 10 may be the same or different.
- the monovalent organic group having 1 to 18 carbon atoms in general formulas (III) to (XI) is preferably an alkyl group or an aryl group.
- n in the above general formulas (II) to (XI) is an average value, and each independently preferably ranges from 0 to 10. If n is 10 or less, the melt viscosity of the resin component does not become too high, and the viscosity of the curable resin composition during melt molding decreases, resulting in insufficient filling and deformation of the bonding wire (gold wire that connects the element and the lead). etc. tend to be suppressed. More preferably, n is set in the range of 0-4.
- the epoxy resin is a copolymerized epoxy resin having a structural unit derived from alkylphenol and a structural unit derived from alkoxynaphthalene (hereinafter referred to as a specific copolymerized epoxy resin). is preferably included.
- Structural units derived from alkylphenols include structural units (a) below.
- each R 1 A independently represents a monovalent alkyl group having 1 to 18 carbon atoms, preferably a monovalent alkyl group having 1 to 6 carbon atoms.
- X represents an integer of 1-3.
- Structural units derived from alkoxynaphthalene include the following structural units (b).
- each R 2 B independently represents a monovalent alkoxy group having 1 to 18 carbon atoms, preferably a monovalent alkoxy group having 1 to 6 carbon atoms.
- y represents an integer of 1-6.
- the two bonding sites in the structural unit (b) may exist in the same naphthalene ring or may exist in each of the two naphthalene rings.
- the specific copolymerization type epoxy resin can have the following structural unit (c).
- n is an integer of 1-10, preferably an integer of 2-8.
- the two bonding sites of the naphthalene ring in the structural unit (c) may exist in the same naphthalene ring or may exist in each of the two naphthalene rings.
- Structural units satisfying the above structural unit (c) include, for example, the following structural unit (d).
- the epoxy resin preferably contains a specific copolymerization type epoxy resin. Moreover, from the viewpoint of reflow resistance, the epoxy resin preferably contains a biphenyl-type epoxy resin.
- the epoxy equivalent of the epoxy resin is not particularly limited. From the viewpoint of the balance of various properties such as moldability, heat resistance and electrical reliability, the epoxy equivalent of the epoxy resin is preferably 40 g/eq to 1000 g/eq, more preferably 45 g/eq to 500 g/eq, and 50 g/eq. eq to 350 g/eq is more preferred. Let the epoxy equivalent of an epoxy resin be the value measured by the method according to JISK7236:2009.
- the epoxy resin may be solid or liquid at 25°C. If the epoxy resin is solid at 25°C, the softening point or melting point of the epoxy resin is not particularly limited. From the viewpoint of the balance between moldability and heat resistance, the softening point or melting point of the epoxy resin is preferably 40°C to 180°C. Also, from the viewpoint of handleability during production of the curable resin composition, the softening point or melting point of the epoxy resin is preferably 50°C to 130°C. In the present disclosure, softening point refers to a value measured by the ring and ball method of JIS K 7234:1986. In the present disclosure, melting point refers to a value measured according to the visual observation method of JIS K 0064:1992.
- the Mw of the epoxy resin is preferably 550-1050, more preferably 650-950.
- the Mn of the epoxy resin is preferably 250 to 800, more preferably 350 to 600.
- the content of the epoxy resin with respect to the total mass of the curable resin composition is preferably 0.5% by mass to 60% by mass, and 2% by mass. It is more preferably 50% by mass, and even more preferably 3% by mass to 45% by mass.
- the epoxy resin contains a specific copolymerization type epoxy resin
- the content of the specific copolymerization type epoxy resin with respect to the total weight of the epoxy resin is 50% by mass or more. It is preferably 90% by mass, more preferably 55% to 80% by mass, even more preferably 60% to 75% by mass.
- the content of the biphenyl-type epoxy resin with respect to the total weight of the epoxy resin is 5% to 40% by weight. preferably 7% by mass to 35% by mass, and even more preferably 10% by mass to 30% by mass.
- the curable resin composition of the present disclosure contains a phenolic curing agent.
- the type of phenol-based curing agent is not particularly limited, and can be selected from those commonly used as components of curable resin compositions.
- the phenol-based curing agents may be used singly or in combination of two or more.
- Phenolic curing agents include, for example, phenol resins and polyhydric phenol compounds having two or more phenolic hydroxyl groups in one molecule. Specific examples of the phenol-based curing agent are described below, but are not limited to these. Phenolic curing agents include polyhydric phenol compounds such as resorcin, catechol, bisphenol A, bisphenol F, substituted or unsubstituted biphenol; phenol, cresol, xylenol, resorcin, catechol, bisphenol A, bisphenol F, phenylphenol, amino At least one phenolic compound selected from the group consisting of phenol compounds such as phenol and naphthol compounds such as ⁇ -naphthol, ⁇ -naphthol and dihydroxynaphthalene, and aldehyde compounds such as formaldehyde, acetaldehyde and propionaldehyde under an acidic catalyst.
- phenol-based curing agent include polyhydric phenol compounds
- Novolac-type phenolic resins obtained by condensation or co-condensation Phenolic aralkyl resins synthesized from the above phenolic compounds and dimethoxyparaxylene, bis(methoxymethyl)biphenyl, etc., aralkyl-type phenolic resins such as naphthol aralkyl resins; Para-xylylene and / or metaxylylene-modified phenolic resin; melamine-modified phenolic resin; terpene-modified phenolic resin; Pentadiene-modified phenolic resin; Polycyclic aromatic ring-modified phenolic resin; Biphenyl-type phenolic resin; Triphenyl obtained by condensation or co-condensation of the above phenolic compound with an aromatic aldehyde compound such as benzaldehyde and salicylaldehyde in the presence of an acidic catalyst.
- Methane-type phenolic resin 2-[4-[(2-hydroxy-3-(2'-ethyl)hexyl)oxy]-2-hydroxyphenyl]-4,6-bis(2,4-dimethylphenyl)-1 triazine-type phenolic resins such as , 3,5-triazine; and phenolic resins obtained by copolymerizing two or more of these.
- the phenolic curing agent may contain one or more phenolic curing agents selected from the group consisting of aralkyl-type phenolic resins and novolac-type phenolic resins. Preferably, both are included.
- the phenol-based curing agent will be described in more detail below, but it is not limited to these.
- the aralkyl-type phenolic resin is not particularly limited, and a phenol synthesized from at least one selected from the group consisting of phenolic compounds and naphthol compounds and dimethoxyparaxylene, bis(methoxymethyl)biphenyl or derivatives thereof. resin.
- aralkyl-type phenol resins include phenol resins represented by the following general formulas (XII) to (XIV).
- R 23 represents a hydrogen atom or a monovalent organic group having 1 to 18 carbon atoms, all of which may be the same or different.
- R 22 , R 24 , R 25 and R 28 each represent a monovalent organic group having 1 to 18 carbon atoms, and all of them may be the same or different.
- R 26 and R 27 each represent a hydroxyl group or a monovalent organic group having 1 to 18 carbon atoms, and may be the same or different.
- i is each independently an integer of 0 to 3
- j is each independently an integer of 0 to 2
- k is each independently an integer of 0 to 4
- p is each independently an integer of 0 to 4 be.
- n is an average value, each independently an integer of 0 to 10; “All may be the same or different" described for R 22 etc. in the above general formula means, for example, all i R 22 in general formula (XII) may be the same or different means that Further, R 22 to R 37 may be the same or different. For example, all of R 22 and R 23 may be the same or different.
- the aralkyl-type phenol resin is preferably a phenol resin represented by general formula (XIII).
- i and k are preferably 0 in general formula (XIII).
- the aralkyl-type phenolic resin may be a copolymerized phenolic resin with other phenolic resins.
- Copolymerized phenolic resins include copolymerized phenolic resins of triphenylmethane-type phenolic resin and aralkyl-type phenolic resin, copolymerized phenolic resins of salicylaldehyde-type phenolic resin and aralkyl-type phenolic resin, and novolac-type phenolic resin.
- a copolymer type phenol resin with an aralkyl type phenol resin and the like can be mentioned.
- the dicyclopentadiene-type phenolic resin is not particularly limited as long as it is a phenolic resin obtained using a compound having a dicyclopentadiene skeleton as a raw material.
- a phenol resin represented by the following general formula (XV) is preferred.
- R 29 represents a monovalent organic group having 1 to 18 carbon atoms, and all of them may be the same or different.
- i each independently represents an integer of 0 to 3;
- n is an average value and represents an integer of 0-10.
- the triphenylmethane-type phenolic resin is not particularly limited as long as it is a phenolic resin obtained using an aromatic aldehyde compound as a raw material.
- a phenol resin represented by the following general formula (XVI) is preferred.
- R 30 and R 31 each represent a monovalent organic group having 1 to 18 carbon atoms and may be the same or different.
- Each i is independently an integer of 0 to 3
- each k is independently an integer of 0 to 4.
- n is an average value and is an integer from 0 to 10;
- the copolymerized phenolic resin of triphenylmethane-type phenolic resin and aralkyl-type phenolic resin is not particularly limited as long as it is a copolymerized-type phenolic resin of phenolic resin obtained using a compound having a benzaldehyde skeleton as a raw material and aralkyl-type phenolic resin. .
- a phenol resin represented by the following general formula (XVII) is preferred.
- R 32 to R 34 each represent a monovalent organic group having 1 to 18 carbon atoms, and all of them may be the same or different.
- Each i is independently an integer of 0 to 3
- each k is independently an integer of 0 to 4
- each q is independently an integer of 0 to 5.
- l and m are average values and independently integers from 0 to 11. However, the sum of l and m is an integer of 1-11.
- the novolak-type phenolic resin is not particularly limited as long as it is a phenolic resin obtained by condensation or co-condensation of at least one phenolic compound selected from the group consisting of phenolic compounds and naphthol compounds and an aldehyde compound in the presence of an acidic catalyst.
- a phenol resin represented by the following general formula (XVIII) is preferred.
- R 35 represents a hydrogen atom or a monovalent organic group having 1 to 18 carbon atoms, all of which may be the same or different.
- R 36 represents a monovalent organic group having 1 to 18 carbon atoms, all of which may be the same or different.
- i each independently represents an integer of 0 to 3;
- n is an average value and represents an integer of 0-10.
- R 22 to R 36 in the general formulas (XII) to (XVIII) means, for example, that all i R 22 in formula (XII) are the same However, it means that they may be different from each other.
- Other R 23 to R 36 also mean that the respective numbers contained in the formula may all be the same or different from each other.
- R 22 to R 36 may be the same or different.
- all of R 22 and R 23 may be the same or different
- all of R 30 and R 31 may be the same or different.
- n in the above general formulas (XII) to (XVIII) is preferably an integer of 0 to 10. If it is 10 or less, the melt viscosity of the resin component does not become too high, and the viscosity of the curable resin during melt molding becomes low, resulting in defective filling and deformation of the bonding wire (gold wire that connects the element and the lead). it gets harder.
- the average n in one molecule is preferably set in the range of 0-4.
- the hydroxyl equivalent of the phenolic curing agent is not particularly limited. From the viewpoint of the balance of various properties such as reflow resistance, moldability, and electrical reliability, it is preferably 10 g/eq to 1000 g/eq, more preferably 30 g/eq to 500 g/eq.
- the hydroxyl equivalent refers to a value calculated based on the hydroxyl value measured according to JIS K 0070:1992.
- the softening point or melting point of the phenolic curing agent is not particularly limited. From the viewpoint of moldability and heat resistance, the softening point or melting point of the phenolic curing agent is preferably 40°C to 180°C. Also, from the viewpoint of handleability during production of the curable resin composition, the softening point or melting point of the phenolic curing agent is preferably 50°C to 130°C.
- the content of the phenolic curing agent with respect to the total mass of the curable resin composition is preferably 0.5% by mass to 40% by mass. It is more preferably from 2% by mass to 30% by mass, and even more preferably from 2% by mass to 20% by mass.
- the content of the aralkyl-type phenol resin with respect to the total mass of the phenol-based curing agent is 60% by mass to It is preferably 95% by mass, more preferably 65% to 90% by mass.
- the content of the novolac-type phenolic resin with respect to the total mass of the phenolic curing agent is 5% by mass to It is preferably 40% by mass, more preferably 10% to 30% by mass.
- the curable resin composition of the present disclosure includes a curing accelerator, an inorganic filler, a coupling agent, a stress relaxation agent, a mold release agent, a coloring agent, a flame retardant, an ion exchanger, other than an epoxy resin. It may also contain various additives such as a resin and a curing agent other than a phenol-based curing agent.
- the curable resin composition may contain various additives known in the art as necessary, in addition to the additives exemplified below.
- the curable resin composition of the present disclosure may contain a curing accelerator.
- the type of curing accelerator is not particularly limited, and can be selected according to the type of epoxy resin, desired properties of the curable resin composition, and the like.
- the curing accelerator preferably contains a phosphonium compound.
- phosphonium compounds include triphenylphosphine, diphenyl(p-tolyl)phosphine, tris(alkylphenyl)phosphine, tris(alkoxyphenyl)phosphine, tris(alkyl/alkoxyphenyl)phosphine, tris(dialkylphenyl)phosphine, tris(trialkylphenyl)phosphine, tris(tetraalkylphenyl)phosphine, tris(dialkoxyphenyl)phosphine, tris(trialkoxyphenyl)phosphine, tris(tetraalkoxyphenyl)phosphine, trialkylphosphine, dialkylarylphosphine, alkyldiaryl Tertiary phosphines such as phosphine, maleic anhydride, 1,
- the phosphonium compound preferably contains a compound represented by the following general formula (I-1) (hereinafter also referred to as a specific curing accelerator).
- R 1 to R 3 are each independently a hydrocarbon group having 1 to 18 carbon atoms, and two or more of R 1 to R 3 are bonded to each other to form a cyclic structure.
- R 4 to R 7 each independently represent a hydrogen atom, a hydroxyl group or an organic group having 1 to 18 carbon atoms, and two or more of R 4 to R 7 are bonded to each other to form a cyclic structure. may be formed.
- the “hydrocarbon group having 1 to 18 carbon atoms” described as R 1 to R 3 in general formula (I-1) includes an aliphatic hydrocarbon group having 1 to 18 carbon atoms and an aliphatic hydrocarbon group having 6 to 18 carbon atoms. Contains some aromatic hydrocarbon groups.
- the aliphatic hydrocarbon group having 1 to 18 carbon atoms preferably has 1 to 8 carbon atoms, more preferably 2 to 6 carbon atoms, and even more preferably 4 to 6 carbon atoms.
- the aliphatic hydrocarbon group having 1 to 18 carbon atoms may be a linear or branched aliphatic hydrocarbon group having 1 to 18 carbon atoms, or an alicyclic hydrocarbon group having 3 to 18 carbon atoms. good too. From the viewpoint of ease of production, it is preferably a straight-chain or branched aliphatic hydrocarbon group.
- linear or branched aliphatic hydrocarbon groups having 1 to 18 carbon atoms include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, sec-butyl group, Alkyl groups such as t-butyl group, pentyl group, hexyl group, octyl group, decyl group and dodecyl group, allyl group, vinyl group and the like can be mentioned.
- a linear or branched aliphatic hydrocarbon group may or may not have a substituent.
- substituents include alkoxy groups such as methoxy group, ethoxy group, n-butoxy group and t-butoxy group, aryl groups such as phenyl group and naphthyl group, hydroxyl group, amino group and halogen atom.
- a straight-chain or branched aliphatic hydrocarbon group may have two or more substituents, which may be the same or different. When the linear or branched aliphatic hydrocarbon group has a substituent, the total number of carbon atoms contained in the aliphatic hydrocarbon group and the substituent is preferably 1-18.
- unsubstituted alkyl groups are preferred, and unsubstituted alkyl groups having 1 to 8 carbon atoms are more preferred, such as n-butyl, isobutyl, n-pentyl, n-hexyl and n-octyl. groups are more preferred.
- alicyclic hydrocarbon groups having 3 to 18 carbon atoms include cycloalkyl groups such as cyclopentyl group, cyclohexyl group and cycloheptyl group, and cycloalkenyl groups such as cyclopentenyl group and cyclohexenyl group.
- the alicyclic hydrocarbon group may or may not have a substituent.
- substituents include alkyl groups such as methyl group, ethyl group, n-butyl group and t-butyl group, alkoxy groups such as methoxy group, ethoxy group, n-butoxy group and t-butoxy group, phenyl group and naphthyl group.
- An alicyclic hydrocarbon group may have two or more substituents, in which case the substituents may be the same or different.
- the total number of carbon atoms contained in the alicyclic hydrocarbon group and the substituent is preferably 3-18.
- the position of the substituent is not particularly limited.
- an unsubstituted cycloalkyl group is preferable, an unsubstituted cycloalkyl group having 4 to 10 carbon atoms is more preferable, and a cyclohexyl group, a cyclopentyl group and a cycloheptyl group are more preferable.
- the aromatic hydrocarbon group having 6 to 18 carbon atoms preferably has 6 to 14 carbon atoms, more preferably 6 to 10 carbon atoms.
- the aromatic hydrocarbon group may or may not have a substituent.
- substituents include alkyl groups such as methyl group, ethyl group, n-butyl group and t-butyl group, alkoxy groups such as methoxy group, ethoxy group, n-butoxy group and t-butoxy group, phenyl group and naphthyl group. aryl groups, hydroxyl groups, amino groups, halogen atoms, and the like.
- the aromatic hydrocarbon group may have two or more substituents, in which case the substituents may be the same or different.
- the total number of carbon atoms contained in the aromatic hydrocarbon group and the substituent is preferably 6-18.
- the position of the substituent is not particularly limited.
- aromatic hydrocarbon groups having 6 to 18 carbon atoms include phenyl, 1-naphthyl, 2-naphthyl, tolyl, dimethylphenyl, ethylphenyl, butylphenyl and t-butyl. phenyl group, methoxyphenyl group, ethoxyphenyl group, n-butoxyphenyl group, t-butoxyphenyl group and the like.
- the position of the substituent in these aromatic hydrocarbon groups may be any of the ortho position, meta position and para position.
- an unsubstituted aryl group having 6 to 12 carbon atoms or 6 to 12 carbon atoms including substituents is preferable, and an unsubstituted aryl group having 6 to 10 carbon atoms or carbon atoms including substituents
- An aryl group of numbers 6 to 10 is more preferred, and a phenyl group, p-tolyl group and p-methoxyphenyl group are even more preferred.
- R 1 to R 3 may combine with each other to form a cyclic structure” described as R 1 to R 3 in general formula (I-1) means that R 1 to R 3 It means that two or three of them are combined to form one divalent or trivalent hydrocarbon group as a whole.
- R 1 to R 3 examples include alkylene groups such as ethylene, propylene, butylene, pentylene and hexylene which can form a cyclic structure by bonding with a phosphorus atom; alkenylene groups such as ethylene, propylene and butylenylene groups; Substituents capable of forming a cyclic structure by bonding with a phosphorus atom, such as aralkylene groups such as methylenephenylene groups, and arylene groups such as phenylene, naphthylene and anthracenylene groups, can be mentioned. These substituents may be further substituted with alkyl groups, alkoxy groups, aryl groups, aryloxy groups, amino groups, hydroxyl groups, halogen atoms and the like.
- alkylene groups such as ethylene, propylene, butylene, pentylene and hexylene which can form a cyclic structure by bonding with a phosphorus atom
- the “organic group having 1 to 18 carbon atoms” described as R 4 to R 7 in general formula (I-1) above is an aliphatic group having 1 to 18 carbon atoms which may or may not be substituted. It is meant to include aromatic hydrocarbon groups, aromatic hydrocarbon groups, aliphatic hydrocarbon oxy groups, aromatic hydrocarbon oxy groups, acyl groups, hydrocarbon oxycarbonyl groups, and acyloxy groups.
- Examples of the aliphatic hydrocarbon group and aromatic hydrocarbon group include those mentioned above as examples of the aliphatic hydrocarbon group and aromatic hydrocarbon group represented by R 1 to R 3 .
- Examples of the aliphatic hydrocarbonoxy group include a methoxy group, an ethoxy group, a propoxy group, an isopropoxy group, an n-butoxy group, a 2-butoxy group, a t-butoxy group, a cyclopropyloxy group, a cyclohexyloxy group, and a cyclopentyloxy group.
- an allyloxy group an oxy group having a structure in which an oxygen atom is bonded to the above-mentioned aliphatic hydrocarbon groups such as a vinyloxy group, and these aliphatic hydrocarbon oxy groups are further alkyl groups, alkoxy groups, aryl groups, aryloxy groups, amino and those substituted with groups, hydroxyl groups, halogen atoms, and the like.
- aromatic hydrocarbon oxy group examples include a phenoxy group, a methylphenoxy group, an ethylphenoxy group, a methoxyphenoxy group, a butoxyphenoxy group, a phenoxyphenoxy group having a structure in which an oxygen atom is bonded to the above aromatic hydrocarbon group, such as a phenoxyphenoxy group.
- acyl group examples include aliphatic hydrocarbon carbonyl groups such as formyl group, acetyl group, ethylcarbonyl group, butyryl group, cyclohexylcarbonyl group and allylcarbonyl group, and aromatic hydrocarbon carbonyl groups such as phenylcarbonyl group and methylphenylcarbonyl group. and the like, in which these aliphatic hydrocarbon carbonyl groups or aromatic hydrocarbon carbonyl groups are further substituted with an alkyl group, an alkoxy group, an aryl group, an aryloxy group, an amino group, a halogen atom, or the like.
- hydrocarbon oxycarbonyl group examples include aliphatic hydrocarbon oxycarbonyl groups such as methoxycarbonyl group, ethoxycarbonyl group, butoxycarbonyl group, allyloxycarbonyl group and cyclohexyloxycarbonyl group, phenoxycarbonyl group, methylphenoxycarbonyl group and the like.
- aromatic hydrocarbon oxycarbonyl groups these aliphatic hydrocarbon carbonyloxy groups or aromatic hydrocarbon carbonyloxy groups further substituted with alkyl groups, alkoxy groups, aryl groups, aryloxy groups, amino groups, halogen atoms, etc. things, etc.
- acyloxy group examples include aliphatic hydrocarbon carbonyloxy groups such as a methylcarbonyloxy group, an ethylcarbonyloxy group, a butylcarbonyloxy group, an allylcarbonyloxy group and a cyclohexylcarbonyloxy group, a phenylcarbonyloxy group and a methylphenylcarbonyloxy group. etc., these aliphatic hydrocarbon carbonyloxy groups or aromatic hydrocarbon carbonyloxy groups are further substituted with alkyl groups, alkoxy groups, aryl groups, aryloxy groups, amino groups, halogen atoms, etc. and the like.
- R 4 to R 7 may combine with each other to form a cyclic structure” described as R 4 to R 7 in the general formula (I-1) means that two to four may be combined to form one divalent to tetravalent organic group as a whole.
- R 4 to R 7 include alkylene groups such as ethylene, propylene, butylene, pentylene and hexylene; alkenylene groups such as ethylene, propylene, butyleneylene; aralkylene groups such as methylenephenylene; and arylene groups such as phenylene, naphthylene and anthracenylene.
- Substituents capable of forming a cyclic structure such as groups, their oxy groups or dioxy groups are included. These substituents may be further substituted with alkyl groups, alkoxy groups, aryl groups, aryloxy groups, amino groups, hydroxyl groups, halogen atoms and the like.
- R 4 to R 7 in general formula (I-1) are not particularly limited.
- a hydrogen atom, a hydroxyl group, an aryl group substituted with at least one selected from the group consisting of an unsubstituted or alkyl group and an alkoxy group, or a chain or cyclic alkyl group preferable.
- Aryl groups that are unsubstituted or substituted with at least one selected from the group consisting of an alkyl group and an alkoxy group include a phenyl group, p-tolyl group, m-tolyl group, o-tolyl group, p-methoxyphenyl group, and the like. is mentioned.
- Chain or cyclic alkyl groups include methyl, ethyl, n-propyl, isopropyl, n-butyl, 2-butyl, t-butyl, octyl and cyclohexyl groups. From the viewpoint of curability, it is preferred that all of R 4 to R 7 are hydrogen atoms, or that at least one of R 4 to R 7 is a hydroxyl group and the rest are all hydrogen atoms.
- R 1 to R 3 in general formula (I-1) are alkyl groups having 1 to 18 carbon atoms or cycloalkyl groups having 3 to 18 carbon atoms
- R 4 to R 7 are All are hydrogen atoms, or at least one is a hydroxyl group and the rest are all hydrogen atoms.
- all of R 1 to R 3 are alkyl groups having 1 to 18 carbon atoms or cycloalkyl groups having 3 to 18 carbon atoms
- all of R 4 to R 7 are hydrogen atoms, or at least one is a hydroxyl group. and the rest are all hydrogen atoms.
- the specific curing accelerator preferably contains a compound represented by the following general formula (I-2).
- R 1 to R 3 are each independently a hydrocarbon group having 1 to 18 carbon atoms, and two or more of R 1 to R 3 are bonded to each other to form a cyclic structure.
- R 4 to R 6 each independently represent a hydrogen atom or an organic group having 1 to 18 carbon atoms, and two or more of R 4 to R 6 are bonded to each other to form a cyclic structure.
- R 1 to R 6 in general formula (I-2) are the same as specific examples of R 1 to R 6 in general formula (I-1), and preferred ranges are also the same.
- a specific curing accelerator can be obtained, for example, as an adduct of a tertiary phosphine compound and a quinone compound.
- the third phosphine compound include triphenylphosphine, tributylphosphine, dibutylphenylphosphine, butyldiphenylphosphine, ethyldiphenylphosphine, triphenylphosphine, tris(4-methylphenyl)phosphine, and tris(4-ethylphenyl)phosphine.
- tris(4-n-propylphenyl)phosphine tris(4-n-butylphenyl)phosphine, tris(isopropylphenyl)phosphine, tris(t-butylphenyl)phosphine, tris(2,4-dimethylphenyl)phosphine, tris(2,6-dimethylphenyl)phosphine, tris(2,4,6-trimethylphenyl)phosphine, tris(2,6-dimethyl-4-ethoxyphenyl)phosphine, tris(4-methoxyphenyl)phosphine, tris( 4-ethoxyphenyl)phosphine and the like. From the viewpoint of moldability, triphenylphosphine and tributylphosphine are preferred.
- quinone compounds include 1,2-benzoquinone, 1,4-benzoquinone, diphenoquinone, 1,4-naphthoquinone, and anthraquinone. From the viewpoint of moisture resistance and storage stability, 1,4-benzoquinone is preferred.
- the specific curing accelerator include an addition reaction product of triphenylphosphine and 1,4-benzoquinone, an addition reaction product of tri-n-butylphosphine and 1,4-benzoquinone, and tricyclohexylphosphine and 1,4-benzoquinone.
- addition reaction product of dicyclohexylphenylphosphine and 1,4-benzoquinone addition reaction product of cyclohexyldiphenylphosphine and 1,4-benzoquinone
- addition reaction product of triisobutylphosphine and 1,4-benzoquinone tricyclopentylphosphine and an addition reaction product of 1,4-benzoquinone.
- the curable resin composition may contain a curing accelerator other than the phosphonium compound.
- curing accelerators other than phosphonium compounds include 1,5-diazabicyclo[4.3.0]nonene-5 (DBN) and 1,8-diazabicyclo[5.4.0]undecene-7 (DBU).
- Cyclic amidine compounds such as diazabicycloalkenes such as diazabicycloalkene, 2-methylimidazole, 2-phenylimidazole, 2-phenyl-4-methylimidazole, 2-heptadecylimidazole; derivatives of the cyclic amidine compounds; the cyclic amidine compounds or the Phenol novolak salts of derivatives; These compounds include maleic anhydride, 1,4-benzoquinone, 2,5-toluquinone, 1,4-naphthoquinone, 2,3-dimethylbenzoquinone, 2,6-dimethylbenzoquinone, 2,3- quinone compounds such as dimethoxy-5-methyl-1,4-benzoquinone, 2,3-dimethoxy-1,4-benzoquinone, and phenyl-1,4-benzoquinone; and compounds with ⁇ bonds such as diazophenylmethane.
- diazabicycloalkenes such
- Cyclic amidiniums such as tetraphenylborate salt of DBU, tetraphenylborate salt of DBN, tetraphenylborate salt of 2-ethyl-4-methylimidazole, tetraphenylborate salt of N-methylmorpholine, etc.
- tertiary amine compounds such as pyridine, triethylamine, triethylenediamine, benzyldimethylamine, triethanolamine, dimethylaminoethanol, tris(dimethylaminomethyl)phenol; derivatives of the tertiary amine compounds; tetra-n-butylammonium acetate , tetra-n-butylammonium phosphate, tetraethylammonium acetate, tetra-n-hexylammonium benzoate, and ammonium salt compounds such as tetrapropylammonium hydroxide.
- the content of the specific curing accelerator with respect to the total mass of the curing accelerator is preferably 30% by mass or more, and is 50% by mass or more. is more preferable, and 70% by mass or more is even more preferable.
- the content of the curing accelerator with respect to the total mass of the resin component is It is preferably 0.1% by mass to 30% by mass, more preferably 1% by mass to 15% by mass.
- the content of the curing accelerator with respect to the total mass of the resin component is 0.1% by mass or more, the curable resin composition tends to cure satisfactorily in a short time.
- the content of the curing accelerator with respect to the total mass of the resin component is 30% by mass or less, the curing rate of the curable resin composition is not too fast, and good molded articles tend to be obtained.
- the curable resin composition of the present disclosure may contain inorganic fillers.
- the curable resin composition contains an inorganic filler, the hygroscopicity of the curable resin composition tends to decrease, and the strength in the cured state tends to improve.
- the curable resin composition is used as a sealing material for semiconductor packages, it preferably contains an inorganic filler.
- inorganic filler is not particularly limited. Specifically, silica such as spherical silica and crystalline silica, glass, alumina, calcium carbonate, zirconium silicate, calcium silicate, silicon nitride, aluminum nitride, boron nitride, beryllia, zirconia, zircon, fosterite, steatite, Inorganic materials such as spinel, mullite, titania, talc, clay, and mica. Inorganic fillers having a flame retardant effect may also be used. Inorganic fillers having a flame retardant effect include aluminum hydroxide, magnesium hydroxide, composite metal hydroxides such as composite hydroxides of magnesium and zinc, and zinc borate.
- an inorganic filler may be used individually by 1 type, or may be used in combination of 2 or more types.
- Examples of the state of the inorganic filler include powders, beads obtained by spheroidizing powders, fibers, and the like.
- An inorganic filler may be used individually by 1 type, or may be used in combination of 2 or more types.
- the shape of the inorganic filler is not particularly limited, and examples include powdery, spherical, and fibrous shapes. From the viewpoints of fluidity during molding of the curable resin composition and resistance to mold wear, it is preferably spherical.
- the average particle size of the inorganic filler is not particularly limited. From the viewpoint of the balance between the viscosity of the curable resin composition and the filling property, etc., the volume average particle size of the inorganic filler is preferably 0.1 ⁇ m to 50 ⁇ m, more preferably 0.3 ⁇ m to 30 ⁇ m. , 0.5 ⁇ m to 25 ⁇ m.
- the average particle size of the inorganic filler can be measured as the volume average particle size (D50) with a laser diffraction scattering method particle size distribution analyzer. A volume average particle diameter can be measured by a known method.
- an inorganic filler is extracted from a curable resin composition or cured resin using an organic solvent, nitric acid, aqua regia, etc., and sufficiently dispersed using an ultrasonic disperser or the like to prepare a dispersion.
- the volume average particle diameter of the inorganic filler can be measured from the volume-based particle size distribution measured by a laser diffraction scattering particle size distribution analyzer.
- the volume-average particle size of the inorganic filler is measured from the volume-based particle size distribution obtained by embedding the cured resin in a transparent epoxy resin or the like and polishing the resulting cross-section with a scanning electron microscope. be able to.
- FIB device focused ion beam SEM
- the curable resin composition contains an inorganic filler
- its content is not particularly limited.
- the content of the inorganic filler with respect to the total mass of the curable resin composition is preferably 30% by mass to 90% by mass, more preferably 35% by mass to 80% by mass, and 40% by mass to 70% by mass. % is more preferred.
- the properties of the cured resin such as coefficient of thermal expansion, thermal conductivity and elastic modulus, tend to be further improved.
- the content of the inorganic filler with respect to the total mass of the curable resin composition is 90% by mass or less, the increase in viscosity of the curable resin composition is suppressed, the fluidity is further improved, and the moldability is better. tend to become
- the curable resin composition of the present disclosure may contain a coupling agent.
- the type of coupling agent is not particularly limited, and known coupling agents can be used. Examples of coupling agents include silane coupling agents and titanium coupling agents.
- a coupling agent may be used individually by 1 type, or may use 2 or more types together.
- the silane coupling agent is not particularly limited as long as it is a compound other than the linear polysiloxane compound described above. sidoxypropylmethyldiethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane, 3-aminopropyltriethoxysilane, 3-(2-aminoethyl)amino propyltrimethoxysilane, 3-(2-aminoethyl)aminopropyltriethoxysilane, 3-aminopropyltrimethoxysilane, N-phenyl-3-aminopropyltrimethoxysilane, 3-mercaptopropyltrimethoxysilane, 3-mercapto propyltriethoxysilane, 3-ureidopropyltriethoxysilane, octenyltrimethoxysilane, gly
- Titanium coupling agents include isopropyl triisostearoyl titanate, isopropyl tris(dioctylpyrophosphate) titanate, isopropyl tri(N-aminoethyl-aminoethyl) titanate, tetraoctylbis(ditridecylphosphite) titanate, tetra(2, 2-diallyloxymethyl-1-butyl)bis(ditridecylphosphite)titanate, bis(dioctylpyrophosphate)oxyacetate titanate, bis(dioctylpyrophosphate)ethylene titanate, isopropyltrioctanoyltitanate, isopropyldimethacrylisostearoyltitanate , isopropyltridodecylbenzenesulfonyltitanate, isopropylisostearoyldiacryl
- the curable resin composition of the present disclosure may contain at least one of 3-aminopropyltrimethoxysilane and 3-glycidoxypropyltrimethoxysilane. preferable.
- the ratio of the coupling agent to the total mass of the inorganic filler contained in the curable resin composition is The content is preferably 0.001% by mass to 10% by mass, more preferably 0.01% by mass to 8% by mass, and even more preferably 0.05% by mass to 5% by mass. .
- the curable resin composition of the present disclosure may contain stress relaxation agents such as silicone oil and silicone rubber particles.
- stress relaxation agents such as silicone oil and silicone rubber particles.
- the stress relaxation agent include commonly used known stress relaxation agents (flexible agents).
- stress relaxation agents include thermoplastic elastomers such as silicone, styrene, olefin, urethane, polyester, polyether, polyamide, and polybutadiene, natural rubber (NR), and acrylonitrile-butadiene.
- NBR Non-acrylate-styrene-butadiene copolymer
- MVS methyl methacrylate-silicone copolymer
- methacrylate-butyl acrylate examples include rubber particles having a core-shell structure such as copolymers.
- a stress relaxation agent may be used individually by 1 type, or may be used in combination of 2 or more types. Among them, a silicone-based stress relieving agent is preferable. Examples of silicone-based stress relieving agents include those having epoxy groups, those having amino groups, and those modified with polyethers.
- the content of the stress relaxation agent with respect to the total weight of the epoxy resin contained in the curable resin composition is 0.1% by mass to 30% by mass. It is preferably 1% by mass to 5% by mass.
- the curable resin composition of the present disclosure may contain a mold release agent from the viewpoint of releasability from the mold when using a mold for molding.
- the release agent is not particularly limited, and conventionally known agents can be used. Examples of release agents include carnauba wax, higher fatty acids such as montanic acid and stearic acid, higher fatty acid metal salts, ester waxes such as montanic acid esters, and polyolefin waxes such as oxidized polyethylene and non-oxidized polyethylene.
- the release agent may be used singly or in combination of two or more.
- the content of the release agent with respect to the total mass of the epoxy resin contained in the curable resin composition is 0.01% by mass to 15% by mass. preferably 0.1% by mass to 10% by mass.
- the content of the release agent with respect to the total mass of the epoxy resin contained in the curable resin composition is 0.01% by mass or more, the release property tends to be sufficiently obtained.
- the content of the release agent with respect to the total mass of the epoxy resin contained in the curable resin composition is 15% by mass or less, better releasability tends to be obtained.
- the curable resin composition of the present disclosure may contain a colorant.
- coloring agents include known coloring agents such as carbon black, organic dyes, organic pigments, titanium oxide, red lead, and red iron oxide.
- the content of the coloring agent can be appropriately selected according to the purpose and the like.
- the colorants may be used singly or in combination of two or more.
- the content of the coloring agent with respect to the total weight of the curable resin composition is preferably 0.01% by mass to 5% by mass, and 0.05% by mass to It is more preferably 3% by mass, and even more preferably 0.01% by mass to 1% by mass.
- the curable resin composition of the present disclosure may contain flame retardants.
- the flame retardant is not particularly limited, and conventionally known ones can be used. Flame retardants include organic or inorganic compounds containing halogen atoms, antimony atoms, nitrogen atoms or phosphorus atoms, metal hydroxides, and the like. A flame retardant may be used individually by 1 type, or may be used in combination of 2 or more types.
- the curable resin composition of the present disclosure contains a flame retardant
- its content is not particularly limited as long as it is sufficient to obtain the desired flame retardant effect.
- the content of the flame retardant with respect to the total mass of the epoxy resin contained in the curable resin composition is preferably 1% by mass to 300% by mass, more preferably 2% by mass to 150% by mass.
- the curable resin composition of the present disclosure may contain an ion exchanger.
- an ion exchanger When the curable resin composition is used as a sealing material for a semiconductor package, it preferably contains an ion exchanger from the viewpoint of improving the moisture resistance and high-temperature storage characteristics of the electronic component device including the element to be sealed.
- the ion exchanger is not particularly limited, and conventionally known ones can be used. Specific examples include hydrotalcite compounds and hydrous oxides of at least one element selected from the group consisting of magnesium, aluminum, titanium, zirconium and bismuth.
- the ion exchangers may be used singly or in combination of two or more.
- the ion exchanger includes hydrotalcite represented by the following general formula (A).
- the curable resin composition of the present disclosure contains an ion exchanger
- its content is not particularly limited as long as it is sufficient to capture ions such as halogen ions.
- the content of the ion exchanger relative to the total weight of the epoxy resin contained in the curable resin composition is preferably 0.1% by mass to 30% by mass, more preferably 1% by mass to 5% by mass. preferable.
- the curable resin composition of the present disclosure may contain resins other than epoxy resins.
- the type of resin other than the epoxy resin is not particularly limited, and can be selected from those commonly used as components of curable resin compositions. Resins other than epoxy resins may be used singly or in combination of two or more.
- Resins other than epoxy resins include thiol resins, urea resins, melamine resins, urethane resins, silicone resins, maleimide resins, Saturated polyester resin and the like can be mentioned.
- the curable resin composition of the present disclosure may contain curing agents other than phenolic curing agents.
- the type of curing agent other than the phenol-based curing agent is not particularly limited, and can be selected from those commonly used as components of curable resin compositions. Curing agents other than phenol-based curing agents may be used alone or in combination of two or more.
- Curing agents other than phenolic curing agents include amine curing agents, acid anhydride curing agents, poly Mercaptan-based curing agents, polyaminoamide-based curing agents, isocyanate-based curing agents, blocked isocyanate-based curing agents, and the like are included.
- the active hydrogen equivalent of the amine-based curing agent is not particularly limited. From the viewpoint of the balance of various properties such as reflow resistance, moldability, and electrical reliability, it is preferably 10 g/eq to 1000 g/eq, more preferably 30 g/eq to 500 g/eq.
- the active hydrogen equivalent of the amine curing agent is a value calculated based on the amine value measured according to JIS K 7237:1995.
- the content of the curing agent other than the phenolic curing agent with respect to the total mass of the curable resin composition is not particularly limited. It is preferably 2% by mass to 35% by mass, more preferably 5% by mass to 30% by mass.
- the method for producing the curable resin composition is not particularly limited.
- a general method there can be mentioned a method of thoroughly mixing components in predetermined amounts with a mixer or the like, melt-kneading the mixture with a mixing roll, an extruder or the like, cooling, and pulverizing. More specifically, for example, predetermined amounts of the components described above are uniformly stirred and mixed, kneaded with a kneader, roll, extruder, or the like preheated to 70° C. to 140° C., cooled, and pulverized. can be mentioned.
- the curable resin composition is preferably solid at 25°C.
- the shape of the curable resin composition is not particularly limited, and examples thereof include powder, granules, tablets, and the like.
- the curable resin composition is in the form of a tablet, it is preferable from the standpoint of handleability that the dimensions and mass are such that they meet the molding conditions of the package.
- curable resin composition of the present disclosure is not particularly limited, and it can be used in various mounting techniques, for example, as a sealing material for electronic component devices.
- the curable resin composition of the present disclosure is used for resin moldings for various modules, resin moldings for motors, vehicle-mounted resin moldings, sealing materials for protective materials for electronic circuits, etc.
- the resin composition has good fluidity. And it can be used for various applications where it is desirable to have curability.
- An electronic component device of the present disclosure includes an element and a cured product of the curable resin composition that seals the element.
- the electronic component device can further include a support member on which the element is mounted.
- supporting members include lead frames, pre-wired tape carriers, wiring boards, glass, silicon wafers, organic substrates, and the like.
- a lead frame is preferable from the viewpoint of adhesion to the cured product of the curable resin composition.
- the lead frame may or may not have a roughened surface, but from the viewpoint of manufacturing cost, a non-roughened lead frame is preferable, and from the viewpoint of adhesiveness, a roughened lead frame is preferred. Planarized leadframes are preferred.
- the roughening method is not particularly limited, and includes alkali treatment, silane coupling treatment, sand mat treatment, plasma treatment, corona discharge treatment and the like.
- the lead frame can have a plated layer containing at least one of Au, Pd and Ni on at least part of the surface. Further, the plated layer may be a single layer or multiple layers.
- the multi-layer plating layer a plating layer having a three-layer configuration in which a Ni plating layer, a Pd plating layer, and an Au plating layer are laminated from the lead frame side, or the like can be used.
- the three-layer lead frame include a lead frame called PPF (Pre Plating Lead Frame), which is a copper lead frame plated with Ni--Pd--Au.
- the thickness of the plating layer is not particularly limited, and is preferably 5 ⁇ m or less, more preferably 4 ⁇ m or less, and even more preferably 3 ⁇ m or less.
- elements included in electronic component devices include active elements such as silicon chips, transistors, diodes, and thyristors, and passive elements such as capacitors, resistors, and coils.
- Specific configurations of the electronic component device include, but are not limited to, the following configurations.
- TCP Tape Carrier Package having a structure in which an element connected to a tape carrier using bumps is sealed with a curable resin composition
- a COB (Chip On Board) module having a structure in which an element connected to wiring formed on a support member by wire bonding, flip chip bonding, soldering, or the like is sealed with
- a curable resin composition is formed.
- BGA Bit Grid Array
- CSP Chip Size Package
- MCP Multi Chip Package
- SiP System in a Package
- the method of sealing the element using the curable resin composition is not particularly limited, and known methods can be applied.
- a sealing method for example, low-pressure transfer molding is generally used, but injection molding, compression molding, cast molding, or the like may also be used.
- Examples 1 to 7 and Comparative Examples 1 to 3 After pre-mixing (dry blending) the materials of the formulation shown in Table 1, they are kneaded for about 15 minutes with a biaxial roll (roll surface temperature: about 80 ° C.), cooled, and pulverized to obtain a powdery curable resin composition. manufactured.
- Epoxy resin A copolymer type epoxy resin having the following structural units, epoxy equivalent of 250 g/eq, melt viscosity at 150° C. of 0.7 dPa s, Mn of 350 to 600
- Epoxy resin B biphenyl type epoxy resin, epoxy equivalent 196 g / eq, softening point 106 ° C., manufactured by Mitsubishi Chemical Corporation, trade name "YX-4000H", Mn350 ⁇ Epoxy resin C: biphenyl aralkyl type epoxy resin, epoxy equivalent 284 g / eq
- Phenol-based curing agent A aralkyl-type phenolic resin, hydroxyl equivalent of 106 g/eq ⁇ Phenolic curing agent B: triphenylmethane type phenol resin, hydroxyl equivalent 95 g / eq - Phenol-based curing agent C: aralkyl-type phenolic resin, hydroxyl equivalent 203 g/eq - Phenol-based curing agent D: melamine-modified phenolic resin, hydroxyl equivalent 120 g/eq, softening point: 90°C Phenolic curing agent E: triazine-type phenolic resin, 2-[4-[(2-hydroxy-3-(2'-ethyl)hexyl)oxy]-2-hydroxyphenyl]-4,6-bis(2, 4-dimethylphenyl)-1,3,5-triazine, BASF, trade name "Tinuvin (registered trademark) 405" - Phenolic curing
- Coupling agent A 3-aminopropyltrimethoxysilane ⁇
- Coupling agent B 3-glycidoxypropyltrimethoxysilane ⁇
- Coupling agent C linear polysiloxane, melting point: -70 ° C., epoxy equivalent 120 g / eq ⁇ 150g/eq
- Coupling agent D tetrasulfide ditriethoxysilane
- ⁇ Stress relaxation agent A Epoxy-modified silicone resin
- ⁇ Stress relaxation agent B Indene-containing copolymer
- ⁇ Stress relaxation agent C Phenyl group-containing silicone resin
- ⁇ Inorganic filler A silica filler with an average particle size of 19.4 ⁇ m
- ⁇ Inorganic filler B silica filler with an average particle size of 0.6 ⁇ m
- ⁇ Inorganic filler C silica filler with an average particle size of 50 nm or less
- ⁇ Inorganic filler D Metal hydroxide containing magnesium and zinc with an average particle size of 1.2 ⁇ m
- the temperature at which tan ⁇ becomes maximum glass transition temperature
- the value of tan ⁇ at the glass transition temperature is set to 100, the glass transition
- the tan ⁇ value at a temperature 10 degrees lower than the temperature described as tan ⁇ ratio in Table 1
- the resin cured product was a cured product having a rectangular shape with a short side of 5.1 mm, a long side of 20 mm and a thickness of 2 mm. Then, the cured resin was allowed to stand for 168 hours under conditions of a temperature of 85° C. and a relative humidity of 85%. The mass (g) of the cured resin material after standing was measured, and the rate of increase (%) from the mass (g) of the cured resin material before standing was determined. The results are summarized in Table 1.
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