WO2022242030A1 - 显示基板及显示装置 - Google Patents

显示基板及显示装置 Download PDF

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Publication number
WO2022242030A1
WO2022242030A1 PCT/CN2021/126058 CN2021126058W WO2022242030A1 WO 2022242030 A1 WO2022242030 A1 WO 2022242030A1 CN 2021126058 W CN2021126058 W CN 2021126058W WO 2022242030 A1 WO2022242030 A1 WO 2022242030A1
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Prior art keywords
base substrate
layer
opening
orthographic projection
black matrix
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PCT/CN2021/126058
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English (en)
French (fr)
Inventor
侯鹏
何源
王云浩
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京东方科技集团股份有限公司
成都京东方光电科技有限公司
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Publication of WO2022242030A1 publication Critical patent/WO2022242030A1/zh

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/86—Arrangements for improving contrast, e.g. preventing reflection of ambient light
    • H10K50/865—Arrangements for improving contrast, e.g. preventing reflection of ambient light comprising light absorbing layers, e.g. light-blocking layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/122—Pixel-defining structures or layers, e.g. banks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/30—Devices specially adapted for multicolour light emission
    • H10K59/38—Devices specially adapted for multicolour light emission comprising colour filters or colour changing media [CCM]

Definitions

  • the present disclosure relates to the field of display technology, and in particular, to a display substrate and a display device.
  • Organic light-emitting diode Organic Light-Emitting Diode, OLED
  • OLED Organic Light-Emitting Diode
  • Embodiments of the present disclosure provide a display substrate and a display device, and the specific solutions are as follows:
  • a display substrate provided by an embodiment of the present disclosure includes:
  • the black matrix located on the base substrate, the black matrix includes a plurality of first openings, the first openings include a first part and a second part, and the first part is wound around the second part;
  • the pixel defining layer is located between the layer where the black matrix is located and the base substrate, the pixel defining layer includes a plurality of second openings, and the orthographic projection of the second openings on the base substrate is the same as that of the base substrate
  • the orthographic projections of the second part on the base substrate overlap each other, and the orthographic projections of the second opening on the base substrate are different from the orthographic projections of the first part on the base substrate. overlap;
  • a plurality of light-emitting devices located between the layer where the black matrix is located and the base substrate, the light-emitting devices include reflective electrodes, and the reflective electrodes are arranged at the second opening;
  • a shielding layer located between the pixel defining layer and the base substrate, the orthographic projection of the shielding layer on the base substrate at least covers the orthographic projection of the first portion on the base substrate.
  • the shielding layer includes a plurality of shielding structures, and the orthographic projection of the shielding structures on the base substrate is outside the area where the reflective electrodes are located.
  • the orthographic projection of the first opening on the base substrate and the orthographic projection of the part of the black matrix adjacent to the first opening on the base substrate overlap each other.
  • the shielding layer includes a plurality of shielding structures, and the orthographic projection of the shielding structures on the base substrate covers the first opening in the The orthographic projection on the base substrate, and the orthographic projection of the part of the black matrix adjacent to the first opening on the base substrate.
  • the shielding structure and the black matrix satisfy the following relationship:
  • a is the distance between the boundary of the orthographic projection of the shielding structure on the base substrate away from the boundary of the first opening and the boundary of the orthographic projection of the first opening on the base substrate
  • b is The distance between parallel sides of the first opening
  • h is the distance between the layer where the black matrix is located and the layer where the shielding structure is located
  • ⁇ is the wavelength of incident light.
  • the shielding structure is in the same layer as the reflective electrode, and a material of the shielding structure is a black material.
  • the shielding structure and the reflective electrode are integrally structured.
  • the above display substrate provided by the embodiments of the present disclosure further includes: a planar layer located between the layer where the reflective electrode is located and the base substrate;
  • the shielding structure is located between the base substrate and the planar layer.
  • the above display substrate provided by the embodiments of the present disclosure further includes: a planar layer located between the layer where the reflective electrode is located and the base substrate;
  • the shielding structure is located between the base substrate and the layer where the reflective electrode is located.
  • the light emitting device further includes: a light emitting functional layer and a transmissive electrode;
  • the light-emitting functional layer is located between the layer where the reflective electrode is located and the layer where the transmissive electrode is located;
  • the transmissive electrode is located between the layer where the black matrix is located and the layer where the reflective electrode is located.
  • the transmissive electrodes of the plurality of light emitting devices are integrated.
  • the above-mentioned display substrate provided by the embodiment of the present disclosure further includes: a plurality of color resistors located on the side of the black matrix away from the base substrate, the color resistors are arranged at the first opening .
  • the orthographic projection of the color resist on the base substrate and the orthographic projection of the first opening on the base substrate, and the Orthographic projections of edges of the black matrix adjacent to the first opening on the base substrate overlap each other.
  • an embodiment of the present disclosure further provides a display device, including the above-mentioned display substrate provided by the embodiment of the present disclosure.
  • FIG. 1 is a schematic structural view of a display substrate in the related art
  • FIG. 2 is a schematic structural diagram of a display substrate provided by an embodiment of the present disclosure
  • Fig. 3 is a kind of sectional structure schematic diagram along I-II line in Fig. 2;
  • Fig. 4 is another kind of sectional structure schematic diagram along I-II line in Fig. 2;
  • Fig. 5 is another kind of sectional structure schematic diagram along I-II line in Fig. 2;
  • Fig. 6 is another kind of sectional structure schematic diagram along I-II line in Fig. 2;
  • Fig. 7 is a schematic diagram of another cross-sectional structure along line I-II in Fig. 2 .
  • the color filter includes a black matrix and a plurality of color resists, the black matrix has a plurality of openings, and the color resists are arranged at the openings, and the color resists may include red color resists R, green color resists G, and blue color resists B, etc.
  • a light-emitting device EL is arranged below each color resistance, and the light-emitting device EL is located at the opening of the pixel defining layer PDL;
  • the opening of the defining layer PDL that is, the opening of the black matrix BM is designed to be expanded relative to the opening of the pixel defining layer PDL.
  • the problem caused by this is that after the opening of the black matrix BM is expanded by a certain distance relative to the opening of the pixel defining layer PDL, metal lines not covered by the anode of the light emitting device EL will leak out under the opening of the black matrix BM. In this way, the ambient light passing through the opening of the black matrix BM will be directly incident on the exposed metal wires to form reflected light with irregular propagation directions, and the chaotic reflected light will be emitted from the opening of the black matrix BM, resulting in diffuse color spots. Also known as color separation.
  • a display substrate provided by an embodiment of the present disclosure may include:
  • the black matrix 102 is located on the base substrate 101, the black matrix 102 includes a plurality of first openings K1, the first opening K1 includes a first part K11 and a second part K12, and the first part K11 is wound around the second part K12;
  • the pixel defining layer 103 is located between the layer where the black matrix 102 is located and the base substrate 101.
  • the pixel defining layer 103 includes a plurality of second openings K2, and the orthographic projection of the second openings K2 on the base substrate 101 and the second part K12
  • the orthographic projections on the base substrate 101 overlap each other, and the orthographic projections of the second opening K2 on the base substrate 101 and the orthographic projections of the first part K11 on the base substrate 101 do not overlap each other;
  • a plurality of light emitting devices 104 are located between the layer where the black matrix 102 is located and the base substrate 101, the light emitting devices 104 include reflective electrodes 1041, and the reflective electrodes 1041 are arranged at the second opening K2;
  • the shielding layer 105 is located between the pixel defining layer 103 and the base substrate 101 , and the orthographic projection of the shielding layer 105 on the base substrate 101 at least covers the orthographic projection of the first portion K11 on the base substrate 101 .
  • the first part K11 (that is, the area where the first opening K1 is larger than the second opening K2) is blocked by the shielding layer 105, so that the diffracted light passing through the first opening K1 is prevented from being irradiated to the reflective Irregular reflection occurs on the exposed metal wires under the electrode 1041, so the color separation phenomenon can be effectively weakened.
  • the shielding layer 105 may include a plurality of shielding structures 105 ′, and the shielding structures 105 ′ on the base substrate 101
  • the orthographic projection may overlap with the orthographic projection of the first opening K1 on the base substrate 101 outside the region where the reflective electrode 1041 is located, and the orthographic projection of the part of the black matrix 102 adjacent to the first opening K1 on the base substrate 101 .
  • the shielding structure 105 ′ on the base substrate 101 overlaps with the orthographic projection of the first opening K1 on the substrate 101 outside the area where the reflective electrode 1041 is located, the shielding structure 105 ′ can be shielded from the first
  • the diffracted light is vertically incident on the opening K1, and the shielding structure 105' overlaps with the reflective electrode 1041, so there will be no light leakage;
  • the orthographic projection of the shielding structure 105' on the base substrate 101 is adjacent to the first opening K1
  • the orthographic projections of parts of the black matrix 102 on the base substrate 101 overlap with each other, it can block the diffracted light obliquely incident from the first opening K1. Based on this, the diffracted light can be avoided to the greatest extent from incident on the metal lines exposed by the first opening K1 and not covered by the reflective electrode 1041 , so that the color separation phenomenon can be greatly reduced.
  • the shielding layer 105 may include a plurality of shielding structures 105 ′, and
  • the orthographic projection covers the orthographic projection of the first opening K1 on the base substrate 101 and the orthographic projection of the part of the black matrix 102 adjacent to the first opening K1 on the base substrate 101 .
  • the blocking structure 105' in this embodiment can simultaneously block the diffracted light that is vertically incident and obliquely incident from the first opening K1, thereby greatly weakening or even eliminating the color separation phenomenon.
  • the reflective electrode 1041 is disposed in the second opening K2, and the second opening K2 is smaller than the first opening K1, so that the orthographic projection of the shielding structure 105' on the base substrate 101 covers the area of the first opening K1 on the base substrate 101.
  • the shielding structure 105 ′ can improve the flatness of the reflective electrode 1041 , which is beneficial to improve the poor color cast.
  • I 0 is the light intensity of the diffracted light passing through the first opening K1 of the black matrix 102 reaching the outer boundary of the shielding structure 105′ (that is, the boundary far away from the first opening K1)
  • I is the light intensity incident on the first opening K1.
  • the light intensity of the external ambient light incident on the first opening K1 is 2000 nit, and the light intensity diffracted to this position is only 2 nit, and its color light intensity can be regarded as weak. It is also very weak and can be regarded as having no effect on color separation. Therefore, the 10th level bright stripe can be defined as the outer boundary of the shielding structure 105'.
  • the blocking structure 105' and the black matrix 102 can satisfy The following relationship:
  • a is the distance between the boundary of the orthographic projection of the shielding structure 105' on the base substrate 101 away from the boundary of the first opening K and the boundary of the orthographic projection of the first opening K on the base substrate 101
  • b is the first opening K1
  • h is the distance between the layer where the black matrix 102 is located and the layer where the shielding structure 105' is located
  • ⁇ is the wavelength of the incident light.
  • the parallel sides of the first opening K1 may be parallel, or there may be some deviation (for example, the included angle is ⁇ 10°), so the first The "parallel" relationship between the parallel sides of the opening K1 falls within the protection scope of the present disclosure as long as the error tolerance is met.
  • the extension part of the shielding structure 105' relative to the black matrix 102 can be flexibly set according to the intensity of the ambient light incident on the first opening K1, as long as the black matrix 102 can be transmitted through the black matrix.
  • the intensity should be relatively small (for example, less than 10 nit).
  • the shielding structure 105' can be in the same layer as the reflective electrode 1041, and the material of the shielding structure 105' can be a black material.
  • the shielding structure 105' is on the same layer as the reflective electrode 1041, which can reduce the number of film layers and facilitate the realization of a light and thin product design.
  • the black material of the shielding structure 105' can greatly absorb the diffracted light, reduce the light incident on the metal wire, and weaken the dispersion phenomenon.
  • the black material may include inorganic metal oxides, organic black glue, etc., which are not specifically limited.
  • the shielding structure 105' and the reflective electrode 1041 may be integrally structured.
  • the expanded part can be used as the shielding structure 105'.
  • the diffracted light is mirror-reflected on the reflective electrode 1041, and the propagation direction of the reflected light is relatively regular. Therefore, the expansion of the reflective electrode 1041 can take into account the function of the shielding structure 105' and achieve the technical effect of weakening the color separation phenomenon.
  • the above-mentioned display substrate provided by the embodiments of the present disclosure may be located between the base substrate 101 and the planarization layer 106 .
  • the shielding structure 105' can improve the flatness of the reflective electrode 1041 and improve the problem of color shift while improving the color separation phenomenon.
  • the above-mentioned display substrate provided by the embodiments of the present disclosure may be located between the base substrate 101 and the layer where the reflective electrode 1041 is located.
  • the shielding structure 105' can improve the flatness of the reflective electrode 1041 and improve the problem of color shift while improving the color separation phenomenon.
  • the reflective electrode 1041 can be an anode
  • the transmissive electrode 1043 can be a cathode
  • the luminescent functional layer 1042 can include but not limited to a hole injection layer, a hole transport layer, an electron blocking layer, a luminescent material layer, a hole hole blocking layer, electron transport layer and electron injection layer.
  • the transmissive electrodes 1043 of the multiple light emitting devices 104 can be integrated, so as to uniformly load the driving signals to the transmissive electrodes 1043 of each light emitting device 104 .
  • the above-mentioned display substrate provided by the embodiments of the present disclosure as shown in FIG. 2 to FIG.
  • the resistor 107 can be disposed at the first opening K1.
  • the color resistance 107 may include red color resistance R, green color resistance G, blue color resistance B, etc., which are not specifically limited here.
  • the orthographic projection of the color resist 107 on the base substrate 101 may be located within the orthographic projection of the first opening K1 .
  • the orthographic projection of the color resist 107 on the base substrate 101 may be the same as the orthographic projection of the first opening K1 on the base substrate 101, and the black matrix 102 is adjacent to the first opening K1 The orthographic projections of the edges of on the base substrate 101 overlap each other.
  • the transistor 108 may be an amorphous silicon transistor, an oxide transistor, a low temperature polysilicon transistor, etc., which is not limited herein.
  • the thin film encapsulation layer 113 is located between the transmissive electrode 1043 and the layer where the black matrix 102 is located, and the thin film encapsulation layer 113 may include two inorganic thin film encapsulation layers, and an organic encapsulation layer located between the two inorganic thin film encapsulation layers.
  • the essential components of the display substrate are those that should be understood by those skilled in the art, and will not be repeated here, nor should they be used as limitations on the present disclosure.
  • an embodiment of the present disclosure further provides a display device, including the above-mentioned display substrate provided by the embodiment of the present disclosure. Since the problem-solving principle of the display device is similar to the problem-solving principle of the above-mentioned display substrate, the implementation of the display device provided by the embodiments of the present disclosure may refer to the above-mentioned implementation of the display substrate, and repeated descriptions will not be repeated.
  • the display device can be applied in the field of organic electroluminescent display technology, the field of quantum dot light-emitting display technology, and the like.
  • the display device may be any product or component with a display function such as a mobile phone, a tablet computer, a television, a monitor, a notebook computer, a digital photo frame, a navigator, a smart watch, a fitness wristband, a personal digital assistant, and the like.
  • the display device includes but not limited to: a radio frequency unit, a network module, an audio output & input unit, a sensor, a display unit, a user input unit, an interface unit, a memory, a processor, and a power supply.
  • the above-mentioned structure does not constitute a limitation on the above-mentioned display device provided by the embodiment of the present disclosure.
  • the above-mentioned display device provided by the embodiment of the present disclosure may include more or less of the above components, or combinations of certain components, or different arrangements of components.

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Abstract

本公开提供的显示基板及显示装置，包括：衬底基板；黑矩阵，位于衬底基板之上，黑矩阵包括多个第一开口，该第一开口包括第一部分和第二部分，第一部分绕设于第二部分；像素界定层，位于黑矩阵所在层与衬底基板之间，像素界定层包括多个第二开口，第二开口在衬底基板上的正投影与第二部分在衬底基板上的正投影相互交叠，且第二开口在衬底基板上的正投影与第一部分在衬底基板上的正投影互不交叠；多个发光器件，位于黑矩阵所在层与衬底基板之间，发光器件包括反射型电极，反射型电极设置在第二开口处；遮挡层，位于像素界定层与衬底基板之间，遮挡层在衬底基板上的正投影至少覆盖第一部分在衬底基板上的正投影。

Description

显示基板及显示装置
相关申请的交叉引用
本申请要求在2021年05月19日提交中国专利局、申请号为202110543907.2、申请名称为“显示基板及显示装置”的中国专利申请的优先权，其全部内容通过引用结合在本申请中。
技术领域
本公开涉及显示技术领域，尤其涉及一种显示基板及显示装置。
背景技术
有机发光二极管(Organic Light-Emitting Diode，OLED)显示面板具有自发光、超薄、反应速度快、对比度高、视角广以及可制作于柔性产品等诸多优点，被广泛应用于高性能显示领域等优点。
发明内容
本公开实施例提供了一种显示基板及显示装置，具体方案如下：
一方面，本公开实施例提供的一种显示基板，包括：
衬底基板；
黑矩阵，位于所述衬底基板之上，所述黑矩阵包括多个第一开口，所述第一开口包括第一部分和第二部分，所述第一部分绕设于所述第二部分；
像素界定层，位于所述黑矩阵所在层与所述衬底基板之间，所述像素界定层包括多个第二开口，所述第二开口在所述衬底基板上的正投影与所述第二部分在所述衬底基板上的正投影相互交叠，且所述第二开口在所述衬底基板上的正投影与所述第一部分在所述衬底基板上的正投影互不交叠；
多个发光器件，位于所述黑矩阵所在层与所述衬底基板之间，所述发光 器件包括反射型电极，所述反射型电极设置在所述第二开口处；
遮挡层，位于所述像素界定层与所述衬底基板之间，所述遮挡层在所述衬底基板上的正投影至少覆盖所述第一部分在所述衬底基板上的正投影。
可选地，在本公开实施例提供的上述显示基板中，所述遮挡层包括多个遮挡结构，所述遮挡结构在所述衬底基板上的正投影与所述反射型电极所在区域之外的所述第一开口在所述衬底基板上的正投影、以及邻接所述第一开口的部分所述黑矩阵在所述衬底基板上的正投影相互重叠。
可选地，在本公开实施例提供的上述显示基板中，所述遮挡层包括多个遮挡结构，所述遮挡结构在所述衬底基板上的正投影，覆盖所述第一开口在所述衬底基板上的正投影、以及邻接所述第一开口的部分所述黑矩阵在所述衬底基板上的正投影。
可选地，在本公开实施例提供的上述显示基板中，所述遮挡结构和所述黑矩阵满足以下关系式：
Figure PCTCN2021126058-appb-000001
其中，a为所述遮挡结构在所述衬底基板上的正投影远离所述第一开口的边界与所述第一开口在所述衬底基板上的正投影边界之间的距离，b为所述第一开口的平行边之间的距离，h为所述黑矩阵所在层与所述遮挡结构所在层之间的距离，λ为入射光的波长。
可选地，在本公开实施例提供的上述显示基板中，所述遮挡结构与所述反射型电极同层，且所述遮挡结构的材料为黑色材料。
可选地，在本公开实施例提供的上述显示基板中，所述遮挡结构与所述反射型电极为一体结构。
可选地，在本公开实施例提供的上述显示基板中，还包括：位于所述反射型电极所在层与所述衬底基板之间的平坦层；
所述遮挡结构位于所述衬底基板与所述平坦层之间。
可选地，在本公开实施例提供的上述显示基板中，还包括：位于所述反 射型电极所在层与所述衬底基板之间的平坦层；
所述遮挡结构位于所述衬底基板与所述反射型电极所在层之间。
可选地，在本公开实施例提供的上述显示基板中，所述发光器件还包括：发光功能层和透射型电极；
所述发光功能层位于所述反射型电极所在层与所述透射型电极所在层之间；
所述透射型电极位于所述黑矩阵所在层与所述反射型电极所在层之间。
可选地，在本公开实施例提供的上述显示基板中，所述多个发光器件的所述透射型电极为一体结构。
可选地，在本公开实施例提供的上述显示基板中，还包括：位于所述黑矩阵背离所述衬底基板一侧的多个色阻，所述色阻设置于所述第一开口处。
可选地，在本公开实施例提供的上述显示基板中，所述色阻在所述衬底基板上的正投影与所述第一开口在所述衬底基板上的正投影、以及所述黑矩阵与所述第一开口邻接的边缘在所述衬底基板上的正投影相互交叠。
另一方面，本公开实施例还提供了一种显示装置，包括本公开实施例提供的上述显示基板。
附图说明
图1为相关技术中显示基板的结构示意图；
图2为本公开实施例提供的显示基板的结构示意图；
图3为沿图2中I-II线的一种剖面结构示意图；
图4为沿图2中I-II线的又一种剖面结构示意图；
图5为沿图2中I-II线的又一种剖面结构示意图；
图6为沿图2中I-II线的又一种剖面结构示意图；
图7为沿图2中I-II线的又一种剖面结构示意图。
具体实施方式
为使本公开实施例的目的、技术方案和优点更加清楚，下面将结合本公开实施例的附图，对本公开实施例的技术方案进行清楚、完整地描述。附图中各膜层的厚度和形状不反映真实比例，目的只是示意说明本公开内容。显然，所描述的实施例是本公开的一部分实施例，而不是全部的实施例。基于所描述的本公开实施例，本领域普通技术人员在无需创造性劳动的前提下所获得的所有其它实施例，都属于本公开保护的范围。
除非另作定义，此处使用的技术术语或者科学术语应当为本公开所属领域内具有一般技能的人士所理解的通常意义。本公开说明书以及权利要求书中使用的“第一”、“第二”以及类似的词语并不表示任何顺序、数量或者重要性，而只是用来区分不同的组成部分。“包括”或者“包含”等类似的词语意指出现该词前面的元件或者物件涵盖出现在该词后面列举的元件或者物件及其等同，而不排除其他元件或者物件。“内”、“外”、“上”、“下”等仅用于表示相对位置关系，当被描述对象的绝对位置改变后，则该相对位置关系也可能相应地改变。
在自发光彩色显示领域，通过将彩膜(Color Filter，CF)整合在封装层(CF on Encapsulation，COE)上取代圆偏光片，可以具有大幅降低自发光显示面板厚度、降低自发光显示面板的反射率、提高色纯度等效果。
彩膜包括黑矩阵和多个色阻，该黑矩阵具有多个开口，色阻设置在开口处，且色阻可以包括红光色阻R、绿光色阻G和蓝光色阻B等。通常每个色阻的下方设置一个发光器件EL，该发光器件EL位于像素界定层PDL的开口处；相关技术中为了增大发光器件EL的出光率，会将黑矩阵BM的开口设置为大于像素界定层PDL的开口，即黑矩阵BM的开口相对于像素界定层PDL的开口为外扩设计。
这样导致的问题在于：黑矩阵BM的开口相对像素界定层PDL的开口外扩一定的距离后，黑矩阵BM的开口下方会有未被发光器件EL的阳极覆盖的金属线漏出。这样，外界环境光经过黑矩阵BM的开口会直接入射在裸露的 金属线上形成传播方向不规则的反射光，而杂乱的反射光又会从黑矩阵BM的开口射出，造成弥散的色斑，也称之为色分离。
在这其中还有一个值得注意的问题是：外界环境光经过黑矩阵BM的开口后，会发生衍射(如图1所示)，在微观结构中，衍射光的弥散范围更大。这样，衍射光的波及范围若存在金属线，将进一步加重不规则光线的出射，导致透过红光色阻R、绿光色阻G和蓝光色阻B出射的衍射光堆叠，表现出明显的色分离现象。
为了至少解决相关技术中的上述技术问题，本公开实施例提供的一种显示基板，如图2和图3所示，可以包括：
衬底基板101；
黑矩阵102，位于衬底基板101之上，黑矩阵102包括多个第一开口K1，第一开口K1包括第一部分K11和第二部分K12，第一部分K11绕设于第二部分K12；
像素界定层103，位于黑矩阵102所在层与衬底基板101之间，像素界定层103包括多个第二开口K2，第二开口K2在衬底基板101上的正投影与第二部分K12在衬底基板101上的正投影相互交叠，且第二开口K2在衬底基板101上的正投影与第一部分K11在衬底基板101上的正投影互不交叠；
多个发光器件104，位于黑矩阵102所在层与衬底基板101之间，发光器件104包括反射型电极1041，反射型电极1041设置在第二开口K2处；
遮挡层105，位于像素界定层103与衬底基板101之间，遮挡层105在衬底基板101上的正投影至少覆盖第一部分K11在衬底基板101上的正投影。
在本公开实施例提供的上述显示基板中，通过遮挡层105遮挡第一部分K11(即第一开口K1大于第二开口K2的区域)，避免了透过第一开口K1的衍射光照射至反射型电极1041下方裸露的金属线上后发生不规则反射，因此，可以有效弱化色分离现象。
在一些实施例中，在本公开实施例提供的上述显示基板中，如图3和图4所示，遮挡层105可以包括多个遮挡结构105’，遮挡结构105’在衬底基板101 上的正投影可以与反射型电极1041所在区域之外的第一开口K1在衬底基板101上的正投影、以及邻接第一开口K1的部分黑矩阵102在衬底基板101上的正投影相互重叠。
在遮挡结构105’在衬底基板101上的正投影与反射型电极1041所在区域之外的第一开口K1在衬底基板101上的正投影相互重叠时，遮挡结构105’可遮挡自第一开口K1垂直入射的衍射光，并且，遮挡结构105’与反射型电极1041之间搭接，不会有漏光现象；在遮挡结构105’在衬底基板101上的正投影与邻接第一开口K1的部分黑矩阵102在衬底基板101上的正投影相互重叠时，可以遮挡自第一开口K1倾斜入射的衍射光。基于此，可以在最大限度上避免衍射光入射至被第一开口K1暴露且未被反射型电极1041遮盖的金属线上，从而可以极大减弱色分离现象。
在一些实施例中，在本公开实施例提供的上述显示基板中，如图5和图6所示，遮挡层105可以包括多个遮挡结构105’，遮挡结构105’在衬底基板101上的正投影，覆盖第一开口K1在衬底基板101上的正投影、以及邻接第一开口K1的部分黑矩阵102在衬底基板101上的正投影。基于上述相同的原理，本实施例中的遮挡结构105’可以同时遮挡自第一开口K1垂直入射和倾斜入射的衍射光，从而极大弱化甚至消除色分离现象。并且，反射型电极1041设置在第二开口K2内，第二开口K2小于第一开口K1，使得遮挡结构105’在衬底基板101上的正投影覆盖第一开口K1在衬底基板101上的正投影时，遮挡结构105’可以提高反射型电极1041的平坦性，利于改善色偏不良。
外界环境光经第一开口K1小孔后会有明暗相间的衍射条纹(相当于小孔衍射)，各级衍射条纹的强度会逐级递减，各级间发光强度与主发光强度的比值有以下关系：
Figure PCTCN2021126058-appb-000002
(β为各级亮条纹中心位置)；
其中，I 0为透过黑矩阵102的第一开口K1的衍射光到达遮挡结构105’外边界(即远离第一开口K1的边界)处的光强，I为入射至第一开口K1处 的外界环境光的光强，第10级亮条纹的I 0/I＝0.00092，即第10亮条纹的衍射光强度不到主发光强度的1/1000，已基本规避小孔衍射光的范围。例如入射至第一开口K1处的外界环境光的光强为2000nit，衍射到该位置的光强仅为2nit，其颜色光强可视为微弱，即使有不规则金属线的反射，其光强也极微弱，可视为对色分离无影响。因此可以定义第10级亮条纹为遮挡结构105’的外边界。
具体地，10级主峰的宽度：a＝2*h*λ/b(即主衍射峰)+10*h*λ/b(即10个次级衍射峰)＝12*h*λ/b。假定：h＝11μm，λ＝550nm，b＝20μm，则a＝3.63μm。
基于此，在本公开实施例提供的上述显示基板中，为了遮挡黑矩阵102的第一开口K1的大部分衍射光，如图2至图6所示，遮挡结构105’和黑矩阵102可以满足以下关系式：
Figure PCTCN2021126058-appb-000003
其中，a为遮挡结构105’在衬底基板101上的正投影远离第一开口K的边界与第一开口K在衬底基板101上的正投影边界之间的距离，b为第一开口K1的平行边之间的距离，h为黑矩阵102所在层与遮挡结构105’所在层之间的距离，λ为入射光的波长。
值得注意的是，由于工艺条件的限制或测量等其他因素的影响，第一开口K1的平行边之间可能会平行，也可能会有一些偏差(例如夹角为±10°)，因此第一开口K1的平行边之间的“平行”关系只要满足误差允许，均属于本公开的保护范围。
需要说明的是，在一些实施例中，可根据入射至第一开口K1处的外界环境光的光强的大小灵活设置遮挡结构105’相对于黑矩阵102的外延部分，只要可以使得透过黑矩阵102的衍射光，到达遮挡结构105’远离第一开口K1的外边界时的强度较小(例如小于10nit)即可。
在一些实施例中，在本公开实施例提供的上述显示基板中，如图3所示， 遮挡结构105’可以与反射型电极1041同层，且遮挡结构105’的材料可以为黑色材料。遮挡结构105’与反射型电极1041同层，可以减少膜层数量，利于实现产品轻薄化设计。遮挡结构105’的黑色材料可以极大吸收衍射光，减少入射到金属线上的光线，弱化色散现象。在一些实施例中，黑色材料可以包括无机金属氧化物、有机黑色胶材等，具体不做限定。
在一些实施例中，在本公开实施例提供的上述显示基板中，如图4所示，遮挡结构105’与反射型电极1041可以为一体结构。换言之，可以将反射型电极1041外扩后，将外扩的部分作为遮挡结构105’。衍射光在反射型电极1041上发生镜面反射，反射光的传播方向比较规则，因此，将反射型电极1041扩大后可以兼顾遮挡结构105’的作用，实现弱化色分离现象的技术效果。
在一些实施例中，在本公开实施例提供的上述显示基板中，如图5所示，还可以包括：位于反射型电极1041所在层与衬底基板101之间的平坦层106，遮挡结构105’可以位于衬底基板101与平坦层106之间。在这种情况下，遮挡结构105’在改善色分离现象的同时，还可以提高反射型电极1041的平坦性，改善色偏问题。
在一些实施例中，在本公开实施例提供的上述显示基板中，如图6所示，还可以包括：位于反射型电极1041所在层与衬底基板101之间的平坦层106，遮挡结构105’可以位于衬底基板101与反射型电极1041所在层之间。在这种情况下，遮挡结构105’在改善色分离现象的同时，还可以提高反射型电极1041的平坦性，改善色偏问题。
在一些实施例中，在本公开实施例提供的上述显示基板中，如图3至图6所示，发光器件104还可以包括：发光功能层1042和透射型电极1043，发光功能层1042位于反射型电极1041所在层与透射型电极1043所在层之间，透射型电极1043位于黑矩阵102所在层与反射型电极1041所在层之间。在一些实施例中，反射型电极1041可以为阳极，透射型电极1043可以为阴极，发光功能层1042可以包括但不限于空穴注入层、空穴传输层、电子阻挡层、发光材料层、空穴阻挡层、电子传输层和电子注入层。
在一些实施例中，在本公开实施例提供的上述显示基板中，多个发光器件104的透射型电极1043可以为一体结构，以便于为各发光器件104的透射型电极1043统一加载驱动信号。
在一些实施例中，在本公开实施例提供的上述显示基板中，如图2至图6所示，还可以包括：位于黑矩阵102背离衬底基板101一侧的多个色阻107，色阻107可以设置于第一开口K1处。在一些实施例中，色阻107可以包括红光色阻R、绿光色阻G和蓝光色阻B等，在此不做具体限定。
在一些实施例中，如图2至图6所示，色阻107在衬底基板101上的正投影可以位于第一开口K1的正投影内。在一些实施例中，如图7所示，色阻107在衬底基板101上的正投影可以与第一开口K1在衬底基板101上的正投影、以及黑矩阵102与第一开口K1邻接的边缘在衬底基板101上的正投影相互交叠。
一般地，在本公开实施例提供的上述显示基板中，如图3至图7所示，还可以包括晶体管108、栅线109、数据线(图中未示出)、栅绝缘层110、第一层间介电层111、第二层间介电层112、薄膜封装层113等。晶体管108可以为非晶硅晶体管、氧化物晶体管、低温多晶硅晶体管等，在此不做限定。薄膜封装层113位于透射型电极1043与黑矩阵102所在层之间，且薄膜封装层113可以包括两个无机薄膜封装层，以及位于两个无机薄膜封装层之间的有机封装层。对于显示基板中必不可少的组成部分均为本领域的普通技术人员应该理解具有的，在此不做赘述，也不应作为对本公开的限制。
基于同一发明构思，本公开实施例还提供了一种显示装置，包括本公开实施例提供的上述显示基板。由于该显示装置解决问题的原理与上述显示基板解决问题的原理相似，因此，本公开实施例提供的该显示装置的实施可以参见上述显示基板的实施，重复之处不再赘述。
在一些实施例中，该显示装置可应用于有机电致发光显示技术领域、量子点发光显示技术领域等。可选地，该显示装置可以为：手机、平板电脑、电视机、显示器、笔记本电脑、数码相框、导航仪、智能手表、健身腕带、 个人数字助理等任何具有显示功能的产品或部件。该显示装置包括但不限于：射频单元、网络模块、音频输出&输入单元、传感器、显示单元、用户输入单元、接口单元、存储器、处理器、以及电源等部件。另外，本领域技术人员可以理解的是，上述结构并不构成对本公开实施例提供的上述显示装置的限定，换言之，在本公开实施例提供的上述显示装置中可以包括上述更多或更少的部件，或者组合某些部件，或者不同的部件布置。
显然，本领域的技术人员可以对本发明实施例进行各种改动和变型而不脱离本发明实施例的精神和范围。这样，倘若本发明实施例的这些修改和变型属于本发明权利要求及其等同技术的范围之内，则本发明也意图包含这些改动和变型在内。

Claims (13)

  1. 一种显示基板，其中，包括：
    衬底基板；
    黑矩阵，位于所述衬底基板之上，所述黑矩阵包括多个第一开口，所述第一开口包括第一部分和第二部分，所述第一部分绕设于所述第二部分；
    像素界定层，位于所述黑矩阵所在层与所述衬底基板之间，所述像素界定层包括多个第二开口，所述第二开口在所述衬底基板上的正投影与所述第二部分在所述衬底基板上的正投影相互交叠，且所述第二开口在所述衬底基板上的正投影与所述第一部分在所述衬底基板上的正投影互不交叠；
    多个发光器件，位于所述黑矩阵所在层与所述衬底基板之间，所述发光器件包括反射型电极，所述反射型电极设置在所述第二开口处；
    遮挡层，位于所述像素界定层与所述衬底基板之间，所述遮挡层在所述衬底基板上的正投影至少覆盖所述第一部分在所述衬底基板上的正投影。
  2. 如权利要求1所述的显示基板，其中，所述遮挡层包括多个遮挡结构，所述遮挡结构在所述衬底基板上的正投影与所述反射型电极所在区域之外的所述第一开口在所述衬底基板上的正投影、以及邻接所述第一开口的部分所述黑矩阵在所述衬底基板上的正投影相互重叠。
  3. 如权利要求1所述的显示基板，其中，所述遮挡层包括多个遮挡结构，所述遮挡结构在所述衬底基板上的正投影，覆盖所述第一开口在所述衬底基板上的正投影、以及邻接所述第一开口的部分所述黑矩阵在所述衬底基板上的正投影。
  4. 如权利要求2或3所述的显示基板，其中，所述遮挡结构和所述黑矩阵满足以下关系式：
    Figure PCTCN2021126058-appb-100001
    其中，a为所述遮挡结构在所述衬底基板上的正投影远离所述第一开口的边界与所述第一开口在所述衬底基板上的正投影边界之间的距离，b为所述第 一开口的平行边之间的距离，h为所述黑矩阵所在层与所述遮挡结构所在层之间的距离，λ为入射光的波长。
  5. 如权利要求2所述的显示基板，其中，所述遮挡结构与所述反射型电极同层，且所述遮挡结构的材料为黑色材料。
  6. 如权利要求2所述的显示基板，其中，所述遮挡结构与所述反射型电极为一体结构。
  7. 如权利要求3所述的显示基板，其中，还包括：位于所述反射型电极所在层与所述衬底基板之间的平坦层；
    所述遮挡结构位于所述衬底基板与所述平坦层之间。
  8. 如权利要求3所述的显示基板，其中，还包括：位于所述反射型电极所在层与所述衬底基板之间的平坦层；
    所述遮挡结构位于所述衬底基板与所述反射型电极所在层之间。
  9. 如权利要求1-3、5-8任一项所述的显示基板，其中，所述发光器件还包括：发光功能层和透射型电极；
    所述发光功能层位于所述反射型电极所在层与所述透射型电极所在层之间；
    所述透射型电极位于所述黑矩阵所在层与所述反射型电极所在层之间。
  10. 如权利要求9所述的显示基板，其中，所述多个发光器件的所述透射型电极为一体结构。
  11. 如权利要求1-3、5-8任一项所述的显示基板，其中，还包括：位于所述黑矩阵背离所述衬底基板一侧的多个色阻，所述色阻设置于所述第一开口处。
  12. 如权利要求11所述的显示基板，其中，所述色阻在所述衬底基板上的正投影与所述第一开口在所述衬底基板上的正投影、以及所述黑矩阵与所述第一开口邻接的边缘在所述衬底基板上的正投影相互交叠。
  13. 一种显示装置，其中，包括如权利要求1-12任一项所述的显示基板。
PCT/CN2021/126058 2021-05-19 2021-10-25 显示基板及显示装置 WO2022242030A1 (zh)

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