WO2022210920A1 - Powder, production method therefor, and resin composition production method - Google Patents

Powder, production method therefor, and resin composition production method Download PDF

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Publication number
WO2022210920A1
WO2022210920A1 PCT/JP2022/016129 JP2022016129W WO2022210920A1 WO 2022210920 A1 WO2022210920 A1 WO 2022210920A1 JP 2022016129 W JP2022016129 W JP 2022016129W WO 2022210920 A1 WO2022210920 A1 WO 2022210920A1
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particles
powder
less
mass
particle size
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PCT/JP2022/016129
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French (fr)
Japanese (ja)
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美紀 江上
正展 谷口
宏忠 荒金
良 村口
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日揮触媒化成株式会社
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Priority to CN202280016384.9A priority Critical patent/CN116917233A/en
Priority to KR1020237028419A priority patent/KR20230164008A/en
Priority to JP2023511500A priority patent/JPWO2022210920A1/ja
Publication of WO2022210920A1 publication Critical patent/WO2022210920A1/en

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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K7/00Use of ingredients characterised by shape
    • C08K7/22Expanded, porous or hollow particles
    • C08K7/24Expanded, porous or hollow particles inorganic
    • C08K7/26Silicon- containing compounds
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/113Silicon oxides; Hydrates thereof
    • C01B33/12Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C01B33/187Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by acidic treatment of silicates
    • C01B33/193Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by acidic treatment of silicates of aqueous solutions of silicates
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/34Silicon-containing compounds
    • C08K3/36Silica
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L101/00Compositions of unspecified macromolecular compounds

Definitions

  • the present invention relates to a powder suitable as a filler for semiconductor insulating materials.
  • it relates to powders comprising hollow particles having cavities inside non-porous shells.
  • materials used in communication devices are required to have a low dielectric constant (low Dk) and a low dielectric loss tangent (low Df).
  • low Dk dielectric constant
  • low Df low dielectric loss tangent
  • an insulating material having a low dielectric constant and a low dielectric loss tangent is required for printed wiring boards on which semiconductor elements are mounted. If the dielectric constant of the insulating material is high, dielectric loss will occur, and if the dielectric loss tangent of the insulating material is high, not only the dielectric loss but also the amount of heat generated may increase.
  • resin materials which are the main insulating materials, are being developed.
  • Epoxy-based resins, polyphenylene ether-based resins, fluorine-based resins, and the like have been proposed as such resin materials (see Patent Documents 1 to 5, for example).
  • Fillers are added to such resin materials in terms of durability (rigidity) and heat resistance. It is known to use metal oxides such as silica, boron nitride, talc, kaolin, clay, mica, alumina, zirconia, and titania as fillers (see, for example, Patent Document 3).
  • silica is superior in terms of low dielectric constant and low dielectric loss tangent.
  • the filler is also required not to interfere with the filterability and injectability of the insulating material forming liquid in the manufacturing process of the insulating material.
  • the inventors of the present invention have found that hollow particles that do not contain fine particles and coarse particles and satisfy predetermined conditions can realize a low dielectric constant and a low dielectric loss tangent of the insulating material, and that the liquid for forming the insulating material in the manufacturing process thereof can be realized. was found not to interfere with the filterability and injectability of
  • the powder according to the present invention contains hollow particles having a cavity inside a nonporous outer shell, and has an average particle diameter (D50) of 1.0 to 10.0 ⁇ m and a particle diameter of less than 1.0 ⁇ m.
  • the content of fine particles is 10% by volume or less, and the content of coarse particles having a particle diameter of more than 8.0 ⁇ m is 20% by volume or less.
  • the suspended particles are 0.5 to 15.0% by mass, the suspended particles are 0 to 4.0% by mass, and the sedimented particles are 81.0 to 99.5% by mass. .
  • the method for producing a powder according to the present invention includes a first step of preparing particles by spray-drying an aqueous alkali silicate solution in a hot air stream, a second step of removing alkali contained in the particles, and a second step of removing alkali.
  • a third step of firing the particles, and a classification step of removing fine particles with a particle size of less than 1.0 ⁇ m and coarse particles with a particle size of more than 8.0 ⁇ m is provided between the first step and the third step. ing.
  • the powder of the present invention makes it possible to reduce the dielectric constant and dielectric loss tangent of the insulating material, thereby increasing the transmission speed of semiconductors and reducing transmission loss. In addition, it does not interfere with the filterability and injectability of the insulating material forming liquid in the semiconductor manufacturing process, and an excellent insulating material can be stably manufactured.
  • the powder of the present invention contains hollow particles having cavities inside nonporous outer shells, and has an average particle size of 1.0 to 10.0 ⁇ m. Furthermore, the content of particles with a particle size of less than 1.0 ⁇ m (hereinafter referred to as fine particles) is 10% by volume or less, and the content of particles with a particle size of more than 8.0 ⁇ m (hereinafter referred to as coarse particles) is 20% by volume or less. be.
  • the suspended particles are 0.5 to 15.0% by mass, the suspended particles are 0 to 4.0% by mass, and the sedimented particles are 81.0 to 99.5% by mass. be.
  • the powders of the present invention may also contain small amounts of solid particles.
  • solid particles are also produced unexpectedly during the production of hollow particles. Since solid particles without internal cavities have a high specific gravity, they are basically thought to be latent in sedimented particles. It is preferable that 90 mass % or more of the particles contained in the powder are hollow particles.
  • suspended particles particles that disperse in water when suspended in water are called suspended particles, and particles with a low specific gravity floating in the upper layer (near the water surface) are called suspended particles.
  • suspended particles usually have a high porosity. Therefore, the dielectric constant and dielectric loss tangent of the resin product decrease as the number of floating particles mixed in the resin material increases.
  • the content of microparticles (10% by volume or less), the total surface area of all particles is reduced. As a result, the amount of SiOH groups is reduced, and the dielectric constant and dielectric loss tangent can be lowered. It should be noted that a powder containing few microparticles has low adhesiveness and improved fluidity. Therefore, handleability and dispersibility are also improved.
  • the content of fine particles is preferably 8% by volume or less, more preferably 5% by volume or less, even more preferably 3% by volume or less, and most preferably 1% by volume or less.
  • the resin composition containing the powder has good filterability and injectability. Therefore, a resin molding (resin product) molded from this resin composition has good surface smoothness. Furthermore, the amount of suspended particles is controlled to 0.5 to 15.0% by mass. Suspended particles usually have a high porosity, and hollow particles with a high porosity generally have a large particle size. Therefore, controlling (reducing) the amount of suspended particles results in controlling (reducing) the amount of coarse particles.
  • the content of coarse particles is preferably 15% by volume or less, more preferably 10% by volume or less, even more preferably 5% by volume or less, and most preferably 1% by volume or less.
  • Suspended particles tend to have low particle strength because the ratio (t/d) of the particle diameter (d) to the shell thickness (t) is small. Therefore, there is a risk that the particles will break during the process of mixing the resin material and the particles until the resin product is molded (that is, during the manufacturing process). Cracked particles hinder low dielectric constant and low dielectric loss tangent, and deteriorate the fluidity of the resin composition, reduce the uniformity of the resin product (molded product), It becomes a factor that causes voids. However, by controlling the amount of suspended particles, cracking of the particles can be suppressed.
  • the content of suspended particles is preferably 0.5 to 14.0% by mass, more preferably 0.5 to 13.0% by mass, even more preferably 0.5 to 12.0% by mass.
  • the content of sedimented particles is preferably 82.0 to 99.5% by mass, more preferably 83.0 to 99.5% by mass, even more preferably 84.0 to 99.5% by mass.
  • the average particle size (D50) of the powder is in the range of 1.0 to 10.0 ⁇ m. If the average particle size is less than 1.0 ⁇ m, a large number of fine particles are contained, resulting in a high specific surface area (high SiOH group content), making it difficult to obtain excellent dielectric properties. Also, powders with an average particle size exceeding 10 ⁇ m are unsuitable for use in semiconductors. For semiconductor applications, the average particle size is preferably 1.5 to 10.0 ⁇ m, more preferably 2.0 to 5.0 ⁇ m.
  • the maximum particle diameter (D100) is preferably 50 ⁇ m or less, more preferably 40 ⁇ m or less, and even more preferably 30 ⁇ m or less.
  • the maximum particle size (D100) is preferably 10 times or less, more preferably 8 times or less, the average particle size (D50). Usually, it is 2 times or more, and may exceed 5 times as long as the requirements of the present invention are satisfied.
  • the particle size variation coefficient (CV value) of the powder is suitable for the particle size variation coefficient (CV value) of the powder to be 60% or less.
  • CV value the particle size variation coefficient
  • the particle size variation coefficient is more preferably 55% or less, more preferably 50% or less.
  • the porosity of the powder is preferably 10% by volume or more, more preferably 20% by volume or more, and even more preferably 30% by volume or more. Also, it is preferably 70% by volume or less, more preferably 60% by volume or less, even more preferably 50% by volume or less, and most preferably 40% by volume or less. With such a porosity, it is possible to achieve a low dielectric constant and a low dielectric loss tangent, and at the same time, it is possible to effectively suppress cracking of the particles by maintaining the particle strength above a predetermined level.
  • silica-based particles containing silica as a main component are suitable for the particles that make up the powder. Therefore, the hollow particles (outer shell) contained in the powder may contain inorganic oxides such as alumina, zirconia, and titania in addition to silica.
  • the content of silica in the particles is preferably 70% by mass or more, more preferably 90% by mass or more, still more preferably 95% by mass or more, and particularly preferably consisting essentially of silica.
  • a resin composition is prepared by blending the powder and the resin material described above.
  • Such resin compositions are used as insulating materials for electronic materials such as semiconductors, and more specifically, copper-clad laminates, prepregs, and build-up films for forming printed wiring boards (including rigid boards and flexible boards). etc. can be used. It can also be used for semiconductor package-related materials such as mold resins, mold underfills, and underfills, adhesives for flexible substrates, and the like.
  • curable resins that are generally used in electronic materials such as semiconductors can be used.
  • a photocurable resin may be used, but a thermosetting resin is preferred.
  • curable resins include epoxy-based resins, polyphenylene ether-based resins, fluorine-based resins, polyimide-based resins, bismaleimide-based resins, acrylic-based resins, methacrylic-based resins, silicone-based resins, BT resins, and cyanate-based resins. can.
  • epoxy resins bisphenol-type epoxy resins, novolak-type epoxy resins, triphenolalkane-type epoxy resins, epoxy resins having a biphenyl skeleton, epoxy resins having a naphthalene skeleton, dicyclopentadiene phenol novolak resins, and phenol aralkyl-type epoxy resins.
  • epoxy resins bisphenol-type epoxy resins, novolak-type epoxy resins, triphenolalkane-type epoxy resins, epoxy resins having a biphenyl skeleton, epoxy resins having a naphthalene skeleton, dicyclopentadiene phenol novolak resins, and phenol aralkyl-type epoxy resins.
  • glycidyl ester type epoxy resins alicyclic epoxy resins, heterocyclic epoxy resins, and halogenated epoxy resins. These resins may be used alone or in combination of two or more.
  • the resin composition preferably contains the powder A and the curable resin B at a mass ratio (A/B) of 10/100 to 95/100. Thereby, the function as a filler can be sufficiently exhibited while maintaining the characteristics of the resin composition such as fluidity.
  • the mass ratio (A/B) is more preferably 30/100 to 80/100.
  • the resin composition preferably contains a curing agent such as a phenol compound, an amine compound, or an acid anhydride.
  • a curing agent such as a phenol compound, an amine compound, or an acid anhydride.
  • a resin having two or more phenolic hydroxyl groups in one molecule bisphenol type resin, novolak resin, triphenol alkane type resin, resol type phenol resin, phenol aralkyl resin, phenolic resins such as biphenyl-type phenolic resins, naphthalene-type phenolic resins, and cyclopentadiene-type phenolic resins
  • acid anhydrides such as methylhexahydrophthalic acid, methyltetrahydrophthalic acid, and methylnadic anhydride.
  • additives colorants, stress relaxation agents, antifoaming agents, leveling agents, coupling agents, flame retardants, curing accelerators, etc.
  • a curable resin, powder, a curing agent, additives, etc. are mixed and kneaded by a roll mill or the like.
  • the obtained resin composition is applied to a substrate and cured by heat, ultraviolet rays, or the like.
  • the method for producing a powder of the present invention includes a first step of spray-drying an aqueous alkali silicate solution in a hot air stream to prepare particles, a second step of removing the alkali contained in the prepared particles, and a second step of removing the alkali. Between the first step and the third step, the particles are classified to obtain fine particles with a particle size of less than 1.0 ⁇ m and coarse particles with a particle size of more than 8.0 ⁇ m. is provided (classification step). In addition, other processes such as a drying process may be provided between each process. Through such a process, the powder described above can be obtained.
  • the classification treatment is intentionally performed before firing. If the sintering process is performed without classifying, the particles are sintered while the fine particles to be removed are present, and the fine particles are sintered with other particles. Therefore, the fine particles cannot be removed even if the classification treatment is performed afterward. Also, there are coarse particles with a high porosity that should be removed. Coarse particles having a high porosity are likely to break due to shrinkage stress or the like due to heating. Fragments generated by the cracks are dense silica without voids, and thus hinder the reduction of the dielectric constant and the dielectric loss tangent.
  • Step 1 the alkali silicate aqueous solution is spray-dried in a hot air stream to granulate silica-based particles.
  • this step is performed to obtain hollow particles, it is difficult to make all the particles into hollow particles, and the granulated silica-based particles eventually contain solid particles. there may be.
  • solid particles are also contained in the powder obtained through the steps described below. However, if the powder has the properties described above, the expected effect can be obtained even if the powder contains solid particles.
  • the molar ratio (SiO 2 /M 2 O) of SiO 2 and M 2 O (M is an alkali metal) in the alkali silicate is preferably 1-5, more preferably 2-4. If this molar ratio is less than 1, the amount of alkali is too large, and it is difficult to sufficiently remove it even if acid washing is carried out in the alkali removing step. Furthermore, the deliquescence of the spray-dried product increases, making it difficult to obtain desired hollow particles. If this molar ratio exceeds 5, the alkali silicate becomes less soluble, making it difficult to prepare an aqueous solution. Even if an aqueous solution can be prepared, it may not be possible to form hollow particles by spray drying.
  • the concentration of SiO 2 in the alkali silicate aqueous solution is preferably 1 to 30% by mass, more preferably 5 to 28% by mass. Production is possible even if the content is less than 1% by mass, but the productivity is remarkably lowered. If it exceeds 30% by mass, the stability of the alkali silicate aqueous solution is remarkably lowered and the viscosity becomes high, and spray drying may not be possible. Even if the particles can be spray-dried, the particle size distribution, outer shell thickness, etc. become extremely non-uniform, and the applications of the obtained particles may be limited.
  • As the alkali silicate water-soluble sodium silicate and potassium silicate can be used. Sodium silicate is preferred.
  • spray-drying method for example, conventionally known methods such as a rotating disk method, a pressurized nozzle method, and a two-fluid nozzle method can be adopted.
  • a two-fluid nozzle method is preferred here.
  • the inlet temperature of the spray dryer is preferably 300-600°C, more preferably 350-550°C.
  • the outlet temperature is preferably 120-300°C, more preferably 130-250°C. Hollow particles can be stably obtained by such temperature setting.
  • the alkali contained in the particles granulated in the first step is removed.
  • a method of removing by adding an acid for neutralization is suitable.
  • a treatment in which the particles are immersed in an acid solution is preferred.
  • the molar ratio (Ma/Msp) between the number of moles of M 2 O (Msp) and the number of moles of acid (Ma) in the particles is preferably 0.6 to 4.7, more preferably 1 to 4.5. preferable. If this molar ratio is less than 0.6, the amount of acid relative to M2O is too low.
  • the particles are immersed in an acid aqueous solution so that the concentration of the particles is 1 to 30% by mass as SiO 2 . If the amount is less than 1% by mass, there is no problem in alkali removal and cleaning properties, but the production efficiency is lowered. If it exceeds 30% by mass, the concentration may be too high and the alkali removal and cleaning efficiency may be lowered. 5 to 25% by mass is more preferable.
  • the conditions for immersion in the acid aqueous solution are not particularly limited as long as the desired amount of alkali can be removed, and the treatment temperature is usually 5 to 100° C. and the treatment time is 0.5 to 24 hours.
  • the immersion treatment it is preferable to wash by a conventionally known method. For example, it is filtered and washed with pure water. The acid treatment and washing may be repeated as necessary.
  • the residual amount (mass ratio) of alkali (M) after alkali removal is preferably 300 ppm or less, more preferably 200 ppm or less, and even more preferably 100 ppm or less.
  • the alkali content of the final product is also preferably within the range described above, and is usually equivalent to the alkali content after the alkali removal step.
  • the amount of residual alkali can be measured using an atomic absorption photometer, using a sample of powder dissolved in acid. Na is measured when sodium silicate is used, and K is measured when potassium silicate is used. Specifically, it will be described in Examples.
  • acids used in this step mineral acids (hydrochloric acid, nitric acid, sulfuric acid, etc.) and organic acids (acetic acid, tartaric acid, malic acid, etc.) can be used.
  • Mineral acids are preferably used, and sulfuric acid having a high valence is particularly preferred.
  • the firing temperature is preferably 600-1200°C, more preferably 900-1100°C.
  • the firing temperature is lower than 600° C.
  • the amount of remaining SiOH groups is large and the dielectric loss tangent of the particles is high. Therefore, it is difficult to obtain the effect of reducing the dielectric loss tangent even if it is added to the resin.
  • the firing temperature exceeds 1200° C., the particles are likely to be sintered together, so irregularly shaped particles and coarse particles are likely to be generated. This causes deterioration in filterability and injectability of the resin composition.
  • classification process By performing a classification treatment between the first step and the third step, fine particles and coarse particles are removed.
  • the classification treatment is performed before removing the alkali, it is necessary to perform the classification treatment immediately after granulation in order to prevent the hollow particles from absorbing moisture (deliquescence) and aggregating and coalescing. Further, when the classification treatment is performed before firing, the classification treatment may be performed after the alkali removal treatment.
  • the amount of fine particles is reduced to 10% by volume or less through the classification process.
  • the content is preferably 8% by volume or less, more preferably 5% by volume or less, even more preferably 3% by volume or less, and most preferably 1% by volume or less.
  • the amount of coarse particles is reduced to 20% by volume or less.
  • the content is preferably 15% by volume or less, more preferably 10% by volume or less, even more preferably 5% by volume or less, and most preferably 1% by volume or less.
  • the classification process in this classification process means particle size classification that separates powders by particle size with the aim of aligning the particle size of the powder.
  • Fluid classification can be mentioned as an operation of this particle size classification, and the fluid classification can be classified into dry classification and wet classification.
  • classifiers used for dry classification can be broadly classified into gravity classifiers, inertial classifiers, and centrifugal classifiers. More precise classification is possible by using an inertial classifier or a centrifugal classifier.
  • Nittetsu Mining Elbow Jet, Japan 3M SG Separator, Nisshin Engineering Aerofine Classifier, and Nippon Pneumatic Microspin are classifiers that can accurately classify even light particles that are difficult to apply centrifugal force. can be mentioned.
  • an elbow jet and an aerofine classifier are preferable.
  • classifiers used for wet classification can be roughly divided into gravity classifiers and centrifugal classifiers.
  • Using a centrifugal classifier enables more precise classification.
  • Examples of classifiers that can accurately classify even particles that are light and resistant to centrifugal force include Hydro Cyclone manufactured by Nippon Chemical Machinery Industries Co., Ltd., Super Chron manufactured by Murata Industries, Ltd., and Eye Classifier manufactured by Satake Chemical Machinery Mfg. Co., Ltd. Among these, an eye classifier is preferable.
  • an eye classifier is preferable.
  • the wet classification when removing fine particles, coarse particles having a small specific gravity can be removed together, and the efficiency of classification can be improved.
  • the removal of fine particles and coarse particles can be done at the same time or separately. When they are carried out separately, either the removal of fine particles or the removal of coarse particles may be carried out first. Further, each process of removing fine particles and removing coarse particles may be performed in multiple steps.
  • a drying treatment step may be provided as appropriate during the manufacturing process.
  • the drying treatment can be provided between the alkali removal treatment and the classification treatment, between the classification treatment and the firing, or both, or between the alkali removal treatment and the firing. It may be provided multiple times as required.
  • the drying treatment may be performed before firing, and the classification treatment may be performed between the drying treatment and firing.
  • Heat drying is suitable as the drying treatment.
  • the drying temperature is preferably 50 to 400°C, more preferably 50 to 200°C. Specific examples include a method of drying at a low temperature of about 50 to 200°C over a long period of time, a method of gradually increasing the temperature, and a method of changing the temperature in several stages for drying. can.
  • particle agglomerate refers to, for example, particles having a particle size exceeding 50 ⁇ m, and a sieve having an opening (mesh number) capable of removing such a particle agglomerate is appropriately used.
  • Example 1 Using 30000 g of water glass aqueous solution (SiO 2 /Na 2 O molar ratio 3.2, SiO 2 concentration 24% by mass), one of the two-fluid nozzles is supplied with a flow rate of 0.62 kg / hr, and the other nozzle is supplied with air at 31800 L / Hollow particles were granulated by spraying with hot air having an inlet temperature of 400° C. at a flow rate of hr (empty/liquid volume ratio of 63,600). Here, the outlet temperature was 150° C. (first step). A small amount of solid particles may also be granulated in the first step, but it is not necessary to remove the solid particles to proceed to the next step.
  • the hollow particles that is, the particles granulated in the first step
  • the solid content (SiO 2 ) concentration is 10.2% by mass.
  • sulfuric acid is a divalent acid
  • the ratio (Ma/Msp) of the number of moles (Ma) of acid and the number of moles (Msp) of alkali (Na 2 O) is 3.3.
  • the temperature of the dispersion was 35° C. and the pH was 3.0. After the immersion treatment, it was filtered and washed with pure water (second step).
  • a dry centrifugal classification process was performed using a cyclone manufactured in-house at a flow rate of 5 m/s in the powder transportation line (first classification step). Particles that passed through the cyclone without being collected, ie, particles from which coarse particles had been removed, were collected with a bag filter. Thereafter, dry inertial classification processing was performed using an elbow jet (EJ-15) manufactured by Nittetsu Mining Co., Ltd. (second classification step). When classified using this device, it can be divided into three types of particles: F powder (fine powder), M powder (fine powder), and G powder (coarse powder). At this time, the F edge distance was adjusted so that the fine particles contained in the F powder (fine powder) were 1% by volume or less. F powder was collected and used in subsequent steps.
  • a powder containing hollow particles was obtained by heat-treating the collected particles at 1000°C for 10 hours (third step). After firing, the particle agglomerates were removed using a sieve with an opening of 150 ⁇ m.
  • the resulting powder was mixed with a liquid acid anhydride "Likacid MH700 manufactured by Shin Nippon Rika Co., Ltd.”, an imidazole-based epoxy resin curing agent “2PHZ-PW manufactured by Shikoku Kasei Co., Ltd.”, and a liquid epoxy resin "ZX manufactured by Nippon Steel Chemical & Materials Co., Ltd.” -1059".
  • ZX-1059 is 100 parts by mass
  • Likacid MH700 is 86 parts by mass
  • 2PHZ-PW is 1 part by mass.
  • This compound was preliminarily kneaded in a planetary mill and then kneaded in a triple roll to obtain a paste (resin composition). This paste was cured by heating at 170° C. for 2 hours to obtain a 50 mm ⁇ 50 mm A plate-shaped resin molding (resin product) of 1 mm was obtained.
  • the particle size variation coefficient (CV value) was obtained from the following formula.
  • the particle diameter (Di) of each particle was measured by a dry laser diffraction/scattering method.
  • Evaluation criteria are as follows. ⁇ : ⁇ 1 g/cm 2 ⁇ : 0.5 g/cm 2 or more and less than 1.0 g/cm 2 ⁇ : 0.3 g/cm 2 or more and less than 0.5 g/cm 2 ⁇ : ⁇ 0.3 g/cm 2
  • Evaluation criteria are as follows. ⁇ : within 200 seconds ⁇ : Over 200 seconds and within 400 seconds ⁇ : Over 400 seconds and within 600 seconds ⁇ : Over 600 seconds
  • Dielectric constant (Dk) and dielectric loss tangent (Df) of resin molding Dielectric constant (Dk) and dielectric loss tangent (Df) of a plate-shaped molding (resin molding) of 50 mm ⁇ 50 mm ⁇ 1 mm were measured at 9.4 GHz using a network analyzer (manufactured by Anritsu, MS46122B) and a coaxial resonator. It was measured. It was compared with a resin molding containing no powder (filler) using the following formula and evaluated according to the following criteria.
  • Dielectric constant (Dk) reduction rate (%) (dielectric constant without powder blending - dielectric constant with powder blending)/dielectric constant without powder blending x 100
  • Dielectric loss tangent (Df) reduction rate (%) (Dielectric loss tangent without powder blending - Dielectric loss tangent with powder blended) / Dielectric loss tangent without powder blended x 100
  • Reduction rate of 50% or more
  • Reduction rate of 30% or more and less than 50%
  • Reduction rate of 20% or more and less than 30%
  • Reduction rate of less than 20%
  • Example 2 In the second classification step, a dry centrifugal (semi-free vortex) classification treatment was performed using an Aerofine Classifier manufactured by Nisshin Engineering. The angles of the blades and the like were adjusted so that the fine particles contained in the particles collected by the classification were 1% by volume or less. Other than this, the procedure was the same as in Example 1.
  • Example 3 In the second classification step, a wet centrifugal classification process was performed using an eye classifier manufactured by Satake Chemical Machinery Co., Ltd. The collected particles were classified so that the fine particles contained in them were 1% by volume or less and the coarse particles were 1% by volume or less. Other than this, the procedure was the same as in Example 1.
  • Example 4 In both the first classification process and the second classification process, a dry centrifugal (semi-free vortex) classification process was performed using an Aerofine classifier manufactured by Nisshin Engineering Co., Ltd. First, classify by adjusting the blade angle etc. so that the fine particles contained in the collected particles are 10% by volume or less, and then adjust so that the coarse particles are 1% by volume or less. classified. Other than this, the procedure was the same as in Example 1.
  • Example 5 In both the first classification process and the second classification process, a wet centrifugal classification process was performed using an eye classifier manufactured by Satake Chemical Machinery Industry Co., Ltd. First, the collected particles were classified so that the fine particles contained in them were 5% by volume or less, and then the particles were classified so that the coarse particles were 1% by volume or less. Other than this, the procedure was the same as in Example 1.
  • Example 2 In the first step, the inlet temperature of the spray dryer was set to 250° C., the immersion stirring time in the alkali removal treatment was set to 1.5 hours, and no classification step was provided. Other than this, the procedure was the same as in Example 1.
  • Example 3 In the classification process, a cyclone manufactured in-house was used, and the flow velocity of the powder transport line was set to 5 m/s, and the particles collected by the cyclone were collected. Other than this, it was set as Example 1.
  • the powders according to the examples and the resin moldings containing the powders have low dielectric constants and low dielectric loss tangents. Moreover, the resin compositions containing the powders according to the examples are excellent in filterability and injectability.

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Abstract

The present invention relates to a powder including hollow particles, each having a cavity inside a non-porous outer shell. The powder has an average particle size (D50) of 1.0-10.0 μm, and contains fine particles of a particle size under 1.0 μm in the amount of 10 vol% or less and coarse particles of a particle size over 8.0 μm in the amount of 20 vol% or less. When the powder is suspended in water, the proportions of floating particles, suspended particles, and settled particles are 0.5-15.0 mass%, 0-4.0 mass%, and 81.0-99.5 mass%, respectively.

Description

粉体及びその製造方法、並びに樹脂組成物の製造方法Powder, method for producing the same, and method for producing resin composition
 本発明は、半導体の絶縁材料のフィラーとして好適な粉体に関する。特に、無孔質の外殻の内部に空洞を有する中空粒子を含む粉体に関する。 The present invention relates to a powder suitable as a filler for semiconductor insulating materials. In particular, it relates to powders comprising hollow particles having cavities inside non-porous shells.
 近年、情報通信において高速・大容量化が進んでいる。そのため、通信機器に使用される資材には、低い誘電率(低Dk)、及び低い誘電正接(低Df)が求められている。例えば、半導体素子が実装されるプリント配線板には、低い誘電率及び低い誘電正接を持つ絶縁材料が求められている。絶縁材料の誘電率が高いと誘電損失が生じ、また、絶縁材料の誘電正接が高いと、誘電損失だけでなく、発熱量が増大するおそれがある。 In recent years, the speed and capacity of information communication have been increasing. Therefore, materials used in communication devices are required to have a low dielectric constant (low Dk) and a low dielectric loss tangent (low Df). For example, an insulating material having a low dielectric constant and a low dielectric loss tangent is required for printed wiring boards on which semiconductor elements are mounted. If the dielectric constant of the insulating material is high, dielectric loss will occur, and if the dielectric loss tangent of the insulating material is high, not only the dielectric loss but also the amount of heat generated may increase.
 絶縁材料の低誘電率化、及び低誘電正接化を実現するために、絶縁材料の主体である樹脂材料の開発が行われている。このような樹脂材料として、エポキシ系樹脂、ポリフェニレンエーテル系樹脂、フッ素系樹脂等が提案されている(例えば、特許文献1~5を参照)。 In order to achieve a low dielectric constant and a low dielectric loss tangent of insulating materials, resin materials, which are the main insulating materials, are being developed. Epoxy-based resins, polyphenylene ether-based resins, fluorine-based resins, and the like have been proposed as such resin materials (see Patent Documents 1 to 5, for example).
 このような樹脂材料には、耐久性(剛性)や耐熱性等の点から、フィラーが配合される。フィラーとして、シリカ、窒化ホウ素、タルク、カオリン、クレー、マイカ、アルミナ、ジルコニア、チタニア等の金属酸化物を用いることが知られている(例えば、特許文献3参照)。 Fillers are added to such resin materials in terms of durability (rigidity) and heat resistance. It is known to use metal oxides such as silica, boron nitride, talc, kaolin, clay, mica, alumina, zirconia, and titania as fillers (see, for example, Patent Document 3).
WO2009/041137号WO2009/041137 特表2006-516297号公報Japanese Patent Publication No. 2006-516297 特開2017-057352号公報JP 2017-057352 A 特開2001-288227号公報Japanese Patent Application Laid-Open No. 2001-288227 特開2019-172962号公報JP 2019-172962 A
 フィラーとして用いられる材料のうち、シリカは、低誘電率及び低誘電正接の点で優れている。しかしながら、データ通信の大容量化及び高速処理化が急速に進んでいるため、さらなる低誘電率化、及び低誘電正接化が求められている。また、フィラーには、絶縁材料の製造プロセスでの絶縁材料形成用液の濾過性及び注入性を妨げないことも求められている。 Among the materials used as fillers, silica is superior in terms of low dielectric constant and low dielectric loss tangent. However, as the capacity and speed of data communication are rapidly increasing, further reductions in dielectric constant and dielectric loss tangent are required. The filler is also required not to interfere with the filterability and injectability of the insulating material forming liquid in the manufacturing process of the insulating material.
 本発明者らは、微小粒子及び粗大粒子を含まない所定条件を満たす中空粒子が、絶縁材料の低誘電率化及び低誘電正接化を実現でき、また、その製造プロセスでの絶縁材料形成用液の濾過性及び注入性を妨げないことを見いだした。 The inventors of the present invention have found that hollow particles that do not contain fine particles and coarse particles and satisfy predetermined conditions can realize a low dielectric constant and a low dielectric loss tangent of the insulating material, and that the liquid for forming the insulating material in the manufacturing process thereof can be realized. was found not to interfere with the filterability and injectability of
 すなわち、本発明による粉体は、無孔質の外殻の内部に空洞を有する中空粒子を含んでおり、平均粒子径(D50)が1.0~10.0μm、粒子径1.0μm未満の微小粒子の含有量が10体積%以下であり、粒子径8.0μmを超える粗大粒子の含有量が20体積%以下である。この粉体を水に懸濁した際、浮遊粒子が0.5~15.0質量%、懸濁粒子が0~4.0質量%、沈降粒子が81.0~99.5質量%である。 That is, the powder according to the present invention contains hollow particles having a cavity inside a nonporous outer shell, and has an average particle diameter (D50) of 1.0 to 10.0 μm and a particle diameter of less than 1.0 μm. The content of fine particles is 10% by volume or less, and the content of coarse particles having a particle diameter of more than 8.0 μm is 20% by volume or less. When this powder is suspended in water, the suspended particles are 0.5 to 15.0% by mass, the suspended particles are 0 to 4.0% by mass, and the sedimented particles are 81.0 to 99.5% by mass. .
 また、本発明による粉体の製造方法は、珪酸アルカリ水溶液を熱風気流中で噴霧乾燥して粒子を調製する第一工程と、粒子に含まれるアルカリを除去する第二工程と、アルカリ除去された粒子を焼成する第三工程とを有し、第一工程と第三工程の間に、粒子径1.0μm未満の微小粒子及び粒子径8.0μmを超える粗大粒子を除去する分級工程が設けられている。 Further, the method for producing a powder according to the present invention includes a first step of preparing particles by spray-drying an aqueous alkali silicate solution in a hot air stream, a second step of removing alkali contained in the particles, and a second step of removing alkali. A third step of firing the particles, and a classification step of removing fine particles with a particle size of less than 1.0 μm and coarse particles with a particle size of more than 8.0 μm is provided between the first step and the third step. ing.
 本発明の粉体は、絶縁材料の低誘電率化及び低誘電正接化を可能とし、ひいては、半導体の伝送速度の高速化や伝送損失の低減を図ることができる。また、半導体の製造プロセスにおける絶縁材料形成用液の濾過性及び注入性を妨げないものであり、優れた絶縁材料を安定して製造することができる。 The powder of the present invention makes it possible to reduce the dielectric constant and dielectric loss tangent of the insulating material, thereby increasing the transmission speed of semiconductors and reducing transmission loss. In addition, it does not interfere with the filterability and injectability of the insulating material forming liquid in the semiconductor manufacturing process, and an excellent insulating material can be stably manufactured.
 本発明の粉体は、無孔質の外殻の内部に空洞を有する中空粒子を含んでおり、平均粒子径が1.0~10.0μmである。さらに、粒子径1.0μm未満の粒子(以下、微小粒子)の含有量が10体積%以下であり、粒子径8.0μmを超える粒子(以下、粗大粒子)の含有量が20体積%以下である。この粉体を水に懸濁させたとき、浮遊粒子が0.5~15.0質量%、懸濁粒子が0~4.0質量%、沈降粒子が81.0~99.5質量%である。本発明の粉体には、中空粒子の他に少量の中実粒子も含まれている可能性がある。中空粒子の製造時に、期せずして中実粒子も作製される可能性があるためである。内部に空洞のない中実粒子は、比重が大きいので、基本的に沈降粒子の中に潜在していると考えられる。粉体に含まれる粒子の90質量%以上が中空粒子であることが好ましい。 The powder of the present invention contains hollow particles having cavities inside nonporous outer shells, and has an average particle size of 1.0 to 10.0 μm. Furthermore, the content of particles with a particle size of less than 1.0 μm (hereinafter referred to as fine particles) is 10% by volume or less, and the content of particles with a particle size of more than 8.0 μm (hereinafter referred to as coarse particles) is 20% by volume or less. be. When this powder is suspended in water, the suspended particles are 0.5 to 15.0% by mass, the suspended particles are 0 to 4.0% by mass, and the sedimented particles are 81.0 to 99.5% by mass. be. In addition to hollow particles, the powders of the present invention may also contain small amounts of solid particles. This is because there is a possibility that solid particles are also produced unexpectedly during the production of hollow particles. Since solid particles without internal cavities have a high specific gravity, they are basically thought to be latent in sedimented particles. It is preferable that 90 mass % or more of the particles contained in the powder are hollow particles.
 ここで、水に懸濁した際に水中に分散する粒子を懸濁粒子と、上層(水面付近)に浮遊して存在する比重の軽い粒子を浮遊粒子とした。このような浮遊粒子は通常は空隙率が高い。したがって、樹脂材料に配合される浮遊粒子が増えると、樹脂製品の誘電率及び誘電正接が低下する。 Here, particles that disperse in water when suspended in water are called suspended particles, and particles with a low specific gravity floating in the upper layer (near the water surface) are called suspended particles. Such suspended particles usually have a high porosity. Therefore, the dielectric constant and dielectric loss tangent of the resin product decrease as the number of floating particles mixed in the resin material increases.
 また、微小粒子の含有量を少なく(10体積%以下)することにより、全粒子の総表面積が小さくなる。結果的に、SiOH基量が少なくなり、誘電率、誘電正接化を低くすることができる。なお、微小粒子が少ない粉体は、付着性が低くなり、流動性が向上する。そのため、取り扱い性や分散性も向上する。微小粒子の含有量は、8体積%以下が好ましく、5体積%以下がより好ましく、3体積%以下がさらに好ましく、1体積%以下が最も好ましい。 Also, by reducing the content of microparticles (10% by volume or less), the total surface area of all particles is reduced. As a result, the amount of SiOH groups is reduced, and the dielectric constant and dielectric loss tangent can be lowered. It should be noted that a powder containing few microparticles has low adhesiveness and improved fluidity. Therefore, handleability and dispersibility are also improved. The content of fine particles is preferably 8% by volume or less, more preferably 5% by volume or less, even more preferably 3% by volume or less, and most preferably 1% by volume or less.
 また、粉体に含まれる粗大粒子を少なく(20体積%以下)することにより、粉体が配合された樹脂組成物は、良好な濾過性や注入性を持つ。そのため、この樹脂組成物で成型された樹脂成型物(樹脂製品)は、良好な表面平滑性を備えている。さらに、浮遊粒子の量を0.5~15.0質量%に制御している。浮遊粒子は通常は空隙率が高く、空隙率の高い中空粒子は、一般的に粒子径が大きい。したがって、浮遊粒子の量を制御(低減)することは、粗大粒子の量を制御(低減)することになる。粗大粒子の含有量は、15体積%以下が好ましく、10体積以下がより好ましく、5体積%以下がさらに好ましく、1体積%以下が最も好ましい。 In addition, by reducing the coarse particles contained in the powder (20% by volume or less), the resin composition containing the powder has good filterability and injectability. Therefore, a resin molding (resin product) molded from this resin composition has good surface smoothness. Furthermore, the amount of suspended particles is controlled to 0.5 to 15.0% by mass. Suspended particles usually have a high porosity, and hollow particles with a high porosity generally have a large particle size. Therefore, controlling (reducing) the amount of suspended particles results in controlling (reducing) the amount of coarse particles. The content of coarse particles is preferably 15% by volume or less, more preferably 10% by volume or less, even more preferably 5% by volume or less, and most preferably 1% by volume or less.
 浮遊粒子は、粒子径(d)と外殻の厚さ(t)の比(t/d)が小さいため、粒子強度が低い傾向にある。そのため、樹脂材料と粒子を混ぜる工程から樹脂製品を成型するまでの間(すなわち、製造プロセス中)に、粒子が割れる恐れがある。割れた粒子は、低誘電率化及び低誘電正接化の妨げとなると共に、樹脂組成物の流動性を悪化させて、樹脂製品(成型物)の均一性を低下させたり、樹脂製品の内部にボイドを生じさせたりする要因となる。しかしながら、浮遊粒子の量を制御することにより、粒子の割れを抑制できる。 Suspended particles tend to have low particle strength because the ratio (t/d) of the particle diameter (d) to the shell thickness (t) is small. Therefore, there is a risk that the particles will break during the process of mixing the resin material and the particles until the resin product is molded (that is, during the manufacturing process). Cracked particles hinder low dielectric constant and low dielectric loss tangent, and deteriorate the fluidity of the resin composition, reduce the uniformity of the resin product (molded product), It becomes a factor that causes voids. However, by controlling the amount of suspended particles, cracking of the particles can be suppressed.
 また、浮遊粒子の量を制御することにより、空隙率が高い粒子のもつ好ましい特性(例えば低誘電率化及び低誘電正接化)を確保しつつ、空隙率の高い粒子のもつ好ましくない特性(例えば割れの発生)が問題のない程度に抑制することができる。浮遊粒子には、小径でも空隙率の高い粒子が存在しており、このような粒子は、製造プロセスにおいて、大径粒子に比べて割れが生じにくく、全体として、空隙率の高い粒子のもつ好ましくない特性を極力抑えることができる。浮遊粒子の含有量は、0.5~14.0質量%が好ましく、0.5~13.0質量%がより好ましく、0.5~12.0質量%がさらに好ましい。また、沈降粒子の含有量は、82.0~99.5質量%が好ましく、83.0~99.5質量%がより好ましく、84.0~99.5質量%がさらに好ましい。 In addition, by controlling the amount of suspended particles, while ensuring the favorable properties of particles with high porosity (e.g., low dielectric constant and low dielectric loss tangent), unfavorable properties of high porosity particles (e.g., occurrence of cracks) can be suppressed to the extent that there is no problem. Among the suspended particles, there are particles with a high porosity even if they have a small diameter. Such particles are less likely to crack than large-diameter particles in the manufacturing process. characteristics can be suppressed as much as possible. The content of suspended particles is preferably 0.5 to 14.0% by mass, more preferably 0.5 to 13.0% by mass, even more preferably 0.5 to 12.0% by mass. The content of sedimented particles is preferably 82.0 to 99.5% by mass, more preferably 83.0 to 99.5% by mass, even more preferably 84.0 to 99.5% by mass.
 また、粉体の平均粒子径(D50)は、1.0~10.0μmの範囲にある。平均粒子径が1.0μm未満の場合、微小粒子が多く含まれているため、高比表面積(高SiOH基含有量)となり、優れた誘電特性が得られにくい。また、平均粒子径が10μmを超える粉体は、半導体用途としては不向きである。半導体用途の場合、平均粒子径は、1.5~10.0μmが好ましく、2.0~5.0μmがより好ましい。 Also, the average particle size (D50) of the powder is in the range of 1.0 to 10.0 μm. If the average particle size is less than 1.0 μm, a large number of fine particles are contained, resulting in a high specific surface area (high SiOH group content), making it difficult to obtain excellent dielectric properties. Also, powders with an average particle size exceeding 10 μm are unsuitable for use in semiconductors. For semiconductor applications, the average particle size is preferably 1.5 to 10.0 μm, more preferably 2.0 to 5.0 μm.
 また、最大粒子径(D100)は、50μm以下が好ましく、40μm以下がより好ましく、30μm以下がさらに好ましい。最大粒子径(D100)は、平均粒子径(D50)の10倍以下が好ましく、8倍以下がより好ましい。通常は、2倍以上であり、本発明の要件を満たしていれば、5倍を超えてもよい。 Also, the maximum particle diameter (D100) is preferably 50 μm or less, more preferably 40 μm or less, and even more preferably 30 μm or less. The maximum particle size (D100) is preferably 10 times or less, more preferably 8 times or less, the average particle size (D50). Usually, it is 2 times or more, and may exceed 5 times as long as the requirements of the present invention are satisfied.
 さらに、粉体の粒度変動係数(CV値)は、60%以下が適している。これにより、樹脂材料に配合した場合に、低誘電率化及び低誘電正接化を安定して実現することができる。また、樹脂製品の表面平滑性の向上を図ることができる。粒度変動係数は55%以下がより好ましく、50%以下がさらに好ましい。 Furthermore, it is suitable for the particle size variation coefficient (CV value) of the powder to be 60% or less. As a result, a low dielectric constant and a low dielectric loss tangent can be stably achieved when blended in a resin material. Moreover, the improvement of the surface smoothness of a resin product can be aimed at. The particle size variation coefficient is more preferably 55% or less, more preferably 50% or less.
 粉体の空隙率は、10体積%以上が好ましく、20体積%以上がより好ましく、30体積%以上がさらに好ましい。また、70体積%以下が好ましく、60体積%以下がより好ましく、50体積%以下がさらに好ましく、40体積%以下が最も好ましい。このような空隙率により、低誘電率化及び低誘電正接化を図ることができると共に、粒子強度を所定以上に保持して粒子の割れを効果的に抑制することができる。 The porosity of the powder is preferably 10% by volume or more, more preferably 20% by volume or more, and even more preferably 30% by volume or more. Also, it is preferably 70% by volume or less, more preferably 60% by volume or less, even more preferably 50% by volume or less, and most preferably 40% by volume or less. With such a porosity, it is possible to achieve a low dielectric constant and a low dielectric loss tangent, and at the same time, it is possible to effectively suppress cracking of the particles by maintaining the particle strength above a predetermined level.
 ここで、粉体を構成する粒子は、シリカを主成分とするシリカ系粒子が適している。したがって粉体に含まれる中空粒子(外殻)は、シリカの他、アルミナ、ジルコニア、チタニア等の無機酸化物を含んでいてもよい。粒子中のシリカの含有量は、70質量%以上が好ましく、90質量%以上がより好ましく、95質量%以上がさらに好ましく、実質的にシリカのみからなることが特に好ましい。 Here, silica-based particles containing silica as a main component are suitable for the particles that make up the powder. Therefore, the hollow particles (outer shell) contained in the powder may contain inorganic oxides such as alumina, zirconia, and titania in addition to silica. The content of silica in the particles is preferably 70% by mass or more, more preferably 90% by mass or more, still more preferably 95% by mass or more, and particularly preferably consisting essentially of silica.
[樹脂組成物]
 上述した粉体と樹脂材料を配合することにより、樹脂組成物が調製される。このような樹脂組成物は、半導体等の電子材料の絶縁材料等、具体的には、プリント配線板(リジッド基板及びフレキシブル基板を含む)を形成するための銅張積層板、プリプレグ、ビルドアップフィルム等に用いることができる。また、モールド樹脂、モールドアンダーフィル、アンダーフィル等の半導体パッケージ関連材料や、フレキシブル基板用接着剤等に用いることができる。
[Resin composition]
A resin composition is prepared by blending the powder and the resin material described above. Such resin compositions are used as insulating materials for electronic materials such as semiconductors, and more specifically, copper-clad laminates, prepregs, and build-up films for forming printed wiring boards (including rigid boards and flexible boards). etc. can be used. It can also be used for semiconductor package-related materials such as mold resins, mold underfills, and underfills, adhesives for flexible substrates, and the like.
 樹脂として、一般に半導体等の電子材料に使用されている硬化性樹脂を使用することができる。光硬化樹脂でもよいが、熱硬化樹脂が好ましい。硬化性樹脂として、エポキシ系樹脂、ポリフェニレンエーテル系樹脂、フッ素系樹脂、ポリイミド系樹脂、ビスマレイミド系樹脂、アクリル系樹脂、メタクリル系樹脂、シリコーン系樹脂、BTレジン、シアネート系樹脂等を挙げることができる。さらに、エポキシ系樹脂として、ビスフェノール型エポキシ樹脂、ノボラック型エポキシ樹脂、トリフェノールアルカン型エポキシ樹脂、ビフェニル骨格を有するエポキシ樹脂、ナフタレン骨格を有するエポキシ樹脂、ジシクロペンタジエンフェノールノボラック樹脂、フェノールアラルキル型エポキシ樹脂、グリシジルエステル型エポキシ樹脂、脂環式エポキシ樹脂、複素環型エポキシ樹脂、ハロゲン化エポキシ樹脂等を例示することができる。これらの樹脂は、単独で使用されても、2種以上混合して使用されてもよい。 As the resin, curable resins that are generally used in electronic materials such as semiconductors can be used. A photocurable resin may be used, but a thermosetting resin is preferred. Examples of curable resins include epoxy-based resins, polyphenylene ether-based resins, fluorine-based resins, polyimide-based resins, bismaleimide-based resins, acrylic-based resins, methacrylic-based resins, silicone-based resins, BT resins, and cyanate-based resins. can. Furthermore, as epoxy resins, bisphenol-type epoxy resins, novolak-type epoxy resins, triphenolalkane-type epoxy resins, epoxy resins having a biphenyl skeleton, epoxy resins having a naphthalene skeleton, dicyclopentadiene phenol novolak resins, and phenol aralkyl-type epoxy resins. , glycidyl ester type epoxy resins, alicyclic epoxy resins, heterocyclic epoxy resins, and halogenated epoxy resins. These resins may be used alone or in combination of two or more.
 樹脂組成物には、粉体Aと硬化性樹脂Bが、10/100~95/100の質量比(A/B)で含まれることが好ましい。これにより、流動性等の樹脂組成物の特性を維持しつつ、フィラーとしての機能を十分に発揮することができる。質量比(A/B)は、30/100~80/100がより好ましい。 The resin composition preferably contains the powder A and the curable resin B at a mass ratio (A/B) of 10/100 to 95/100. Thereby, the function as a filler can be sufficiently exhibited while maintaining the characteristics of the resin composition such as fluidity. The mass ratio (A/B) is more preferably 30/100 to 80/100.
 さらに、樹脂組成物は、フェノール化合物、アミン化合物、酸無水物等の硬化剤を含むことが好ましい。硬化性樹脂にエポキシ樹脂を用いる場合、硬化剤として、1分子中にフェノール性水酸基を2個以上有する樹脂(ビスフェノール型樹脂、ノボラック樹脂、トリフェノールアルカン型樹脂、レゾール型フェノール樹脂、フェノールアラルキル樹脂、ビフェニル型フェノール樹脂、ナフタレン型フェノール樹脂、シクロペンタジエン型フェノール樹脂等のフェノール樹脂)、及び、メチルヘキサヒドロフタル酸、メチルテトラヒドロフタル酸、無水メチルナジック酸等の酸無水物を挙げることができる。樹脂組成物には、必要に応じて、各種添加剤(着色剤、応力緩和剤、消泡剤、レベリング剤、カップリング剤、難燃剤、硬化促進剤等)を添加してもよい。 Furthermore, the resin composition preferably contains a curing agent such as a phenol compound, an amine compound, or an acid anhydride. When an epoxy resin is used as the curable resin, a resin having two or more phenolic hydroxyl groups in one molecule (bisphenol type resin, novolak resin, triphenol alkane type resin, resol type phenol resin, phenol aralkyl resin, phenolic resins such as biphenyl-type phenolic resins, naphthalene-type phenolic resins, and cyclopentadiene-type phenolic resins), and acid anhydrides such as methylhexahydrophthalic acid, methyltetrahydrophthalic acid, and methylnadic anhydride. Various additives (colorants, stress relaxation agents, antifoaming agents, leveling agents, coupling agents, flame retardants, curing accelerators, etc.) may be added to the resin composition as necessary.
 樹脂組成物の製造方法は、従来公知の方法を適用できる。例えば、硬化性樹脂、粉体、硬化剤、添加剤等を混合し、ロールミルなどで混練する。得られた樹脂組成物を基体に塗布し、熱、紫外線等により硬化させる。 Conventionally known methods can be applied to the method of manufacturing the resin composition. For example, a curable resin, powder, a curing agent, additives, etc. are mixed and kneaded by a roll mill or the like. The obtained resin composition is applied to a substrate and cured by heat, ultraviolet rays, or the like.
[粉体の製造方法]
 本発明の粉体の製造方法は、珪酸アルカリ水溶液を熱風気流中で噴霧乾燥して粒子を調製する第一工程と、調製された粒子に含まれるアルカリを除去する第二工程と、アルカリ除去された粒子を焼成する第三工程とを有し、第一工程と第三工程の間に、粒子を分級して、粒子径1.0μm未満の微小粒子、及び粒子径8.0μmを超える粗大粒子を除去する工程(分級工程)が設けられている。なお、各工程の間に、乾燥工程等の他の工程を設けてもよい。このような工程により、上述の粉体を得ることができる。
[Method for producing powder]
The method for producing a powder of the present invention includes a first step of spray-drying an aqueous alkali silicate solution in a hot air stream to prepare particles, a second step of removing the alkali contained in the prepared particles, and a second step of removing the alkali. Between the first step and the third step, the particles are classified to obtain fine particles with a particle size of less than 1.0 μm and coarse particles with a particle size of more than 8.0 μm. is provided (classification step). In addition, other processes such as a drying process may be provided between each process. Through such a process, the powder described above can be obtained.
 一般的に、焼成により粒子を製造する場合には、粒子径を整えるために、焼成後に分級処理を行うことが好ましいと考えられている。しかし、ここでは、あえて焼成前に分級処理を行う。分級処理を行わずに焼成工程を行う場合、取り除かれるべき微小粒子が存在したまま焼成され、微小粒子が他の粒子と焼結してしまう。そのため、その後で分級処理を行っても微小粒子を取り除くことができない。また、取り除かれるべき高空隙率の粗大粒子も存在してしまう。この高空隙率の粗大粒子は割れやすいため、加熱による収縮のストレス等で割れるおそれがある。割れにより生じた破片は、空隙のない緻密なシリカであるため、低誘電率化・低誘電正接化の妨げとなる。分級処理を焼成前に行えば、これらの不都合を避けることができる。そのため、粒子の低誘電率化・低誘電正接化がより確実に実現され、データ通信の高速化に対応した粒子が得られる。なお、焼成後に、再度分級処理を行ってもよい。以下、各工程を詳細に説明する。 Generally, when producing particles by sintering, it is considered preferable to perform a classification treatment after sintering in order to adjust the particle size. However, in this case, the classification treatment is intentionally performed before firing. If the sintering process is performed without classifying, the particles are sintered while the fine particles to be removed are present, and the fine particles are sintered with other particles. Therefore, the fine particles cannot be removed even if the classification treatment is performed afterward. Also, there are coarse particles with a high porosity that should be removed. Coarse particles having a high porosity are likely to break due to shrinkage stress or the like due to heating. Fragments generated by the cracks are dense silica without voids, and thus hinder the reduction of the dielectric constant and the dielectric loss tangent. These inconveniences can be avoided if the classification treatment is performed before firing. Therefore, the low dielectric constant and low dielectric loss tangent of the particles can be achieved more reliably, and particles suitable for high-speed data communication can be obtained. In addition, you may perform a classification process again after baking. Each step will be described in detail below.
 (第一工程)
 本工程では、珪酸アルカリ水溶液を熱風気流中で噴霧乾燥してシリカ系粒子を造粒する。なお、本工程は、中空粒子を得るために行われるが、全ての粒子を中空粒子にすることは困難であり、造粒されたシリカ系粒子には、結果的に中実粒子も含まれている可能性がある。この場合、後述の工程を経て得られる粉体に中実粒子も含まれている。しかし、粉体が上述の特性を備えていれば、中実粒子が含まれていても、期待する効果が得られる。
(First step)
In this step, the alkali silicate aqueous solution is spray-dried in a hot air stream to granulate silica-based particles. Although this step is performed to obtain hollow particles, it is difficult to make all the particles into hollow particles, and the granulated silica-based particles eventually contain solid particles. there may be. In this case, solid particles are also contained in the powder obtained through the steps described below. However, if the powder has the properties described above, the expected effect can be obtained even if the powder contains solid particles.
 珪酸アルカリのSiOとMO(Mはアルカリ金属)のモル比(SiO/MO)は、1~5が好ましく、2~4がより好ましい。このモル比が1未満の場合は、アルカリ量が多すぎるので、アルカリ除去工程で酸洗浄を行っても十分に除去することが困難である。さらに、噴霧乾燥品の潮解性が大きくなるため、所望の中空粒子が得られ難い。このモル比が5を超えると、珪酸アルカリの可溶性が低下し、水溶液の調製が困難である。水溶液を調製できたとしても、噴霧乾燥により中空粒子を形成することができない場合がある。 The molar ratio (SiO 2 /M 2 O) of SiO 2 and M 2 O (M is an alkali metal) in the alkali silicate is preferably 1-5, more preferably 2-4. If this molar ratio is less than 1, the amount of alkali is too large, and it is difficult to sufficiently remove it even if acid washing is carried out in the alkali removing step. Furthermore, the deliquescence of the spray-dried product increases, making it difficult to obtain desired hollow particles. If this molar ratio exceeds 5, the alkali silicate becomes less soluble, making it difficult to prepare an aqueous solution. Even if an aqueous solution can be prepared, it may not be possible to form hollow particles by spray drying.
 珪酸アルカリ水溶液のSiOとしての濃度は、1~30質量%が好ましく、5~28質量%が好ましい。1質量%未満でも製造は可能であるが、生産性が著しく低下する。30質量%を超えると、珪酸アルカリ水溶液としての安定性が著しく低下して高粘性になり、噴霧乾燥できない場合がある。噴霧乾燥できたとしても、粒子径分布、外殻の厚さ等が極めて不均一になり、得られた粒子の用途が制限されることがある。珪酸アルカリとして、水に可溶の珪酸ナトリウム、珪酸カリウムを用いることができる。珪酸ナトリウムが好ましい。 The concentration of SiO 2 in the alkali silicate aqueous solution is preferably 1 to 30% by mass, more preferably 5 to 28% by mass. Production is possible even if the content is less than 1% by mass, but the productivity is remarkably lowered. If it exceeds 30% by mass, the stability of the alkali silicate aqueous solution is remarkably lowered and the viscosity becomes high, and spray drying may not be possible. Even if the particles can be spray-dried, the particle size distribution, outer shell thickness, etc. become extremely non-uniform, and the applications of the obtained particles may be limited. As the alkali silicate, water-soluble sodium silicate and potassium silicate can be used. Sodium silicate is preferred.
 噴霧乾燥方法としては、例えば、回転ディスク法、加圧ノズル法、2流体ノズル法等の従来公知の方法を採用することができる。ここでは、2流体ノズル法が好適である。 As the spray-drying method, for example, conventionally known methods such as a rotating disk method, a pressurized nozzle method, and a two-fluid nozzle method can be adopted. A two-fluid nozzle method is preferred here.
 噴霧乾燥において、噴霧乾燥器における入口温度は、300~600℃が好ましく、350~550℃がより好ましい。また、出口温度は、120~300℃が好ましく、130~250℃がより好ましい。このような温度設定により、中空粒子を安定して得ることができる。 In the spray drying, the inlet temperature of the spray dryer is preferably 300-600°C, more preferably 350-550°C. The outlet temperature is preferably 120-300°C, more preferably 130-250°C. Hollow particles can be stably obtained by such temperature setting.
 (第二工程)
 次に、第一工程で造粒された粒子に含まれるアルカリを除去する。酸を加えて中和することにより除去する方法が適している。粒子を酸の溶液に浸漬する処理が好ましい。このとき、粒子中のMOモル数(Msp)と酸のモル数(Ma)とのモル比(Ma/Msp)は、0.6~4.7が好ましく、1~4.5がさらに好ましい。このモル比が0.6未満の場合は、MOに対して酸の量が少なすぎる。そのため、アルカリの除去とともに起きると考えられるケイ酸のシリカ骨格化が進行せず、粒子が部分的に溶解したり、溶解した珪酸アルカリがゲル化する場合がある。モル比が4.7を超えてもさらにシリカ骨格化が進むことはなく、酸が過剰であり経済的でない。
(Second step)
Next, the alkali contained in the particles granulated in the first step is removed. A method of removing by adding an acid for neutralization is suitable. A treatment in which the particles are immersed in an acid solution is preferred. At this time, the molar ratio (Ma/Msp) between the number of moles of M 2 O (Msp) and the number of moles of acid (Ma) in the particles is preferably 0.6 to 4.7, more preferably 1 to 4.5. preferable. If this molar ratio is less than 0.6, the amount of acid relative to M2O is too low. Therefore, the formation of a silica skeleton of silicic acid, which is thought to occur with the removal of alkali, does not proceed, and the particles may partially dissolve or the dissolved alkali silicate may gel. Even if the molar ratio exceeds 4.7, the formation of the silica skeleton does not proceed further, and the acid is excessive, which is not economical.
 また、粒子の濃度が、SiOとして1~30質量%になるように酸水溶液に浸漬することが好ましい。1質量%未満の場合は、アルカリ除去や洗浄性に問題はないが、製造効率が低下する。30質量%を超えると、濃度が濃すぎてアルカリ除去、洗浄効率が低下する場合がある。5~25質量%がさらに好ましい。 Further, it is preferable that the particles are immersed in an acid aqueous solution so that the concentration of the particles is 1 to 30% by mass as SiO 2 . If the amount is less than 1% by mass, there is no problem in alkali removal and cleaning properties, but the production efficiency is lowered. If it exceeds 30% by mass, the concentration may be too high and the alkali removal and cleaning efficiency may be lowered. 5 to 25% by mass is more preferable.
 酸水溶液へ浸漬する条件は、アルカリを所望の量まで除去できれば特に制限はなく、通常、処理温度は5~100℃であり、処理時間は0.5~24時間である。浸漬処理の後、従来公知の方法で洗浄することが好ましい。例えば、純水にて濾過洗浄する。なお、必要に応じて、上記酸処理及び洗浄を繰り返し行ってもよい。 The conditions for immersion in the acid aqueous solution are not particularly limited as long as the desired amount of alkali can be removed, and the treatment temperature is usually 5 to 100° C. and the treatment time is 0.5 to 24 hours. After the immersion treatment, it is preferable to wash by a conventionally known method. For example, it is filtered and washed with pure water. The acid treatment and washing may be repeated as necessary.
 アルカリ除去後のアルカリ(M)の残存量(質量割合)は、300ppm以下が好ましく、200ppm以下がより好ましく、100ppm以下がさらに好ましい。本工程で十分にアルカリを除去することにより、後の工程で粒子が合着することが防止され、焼成工程で焼結粒子が発生することを防ぐことができる。また、アルカリの残存量(含有量)は、誘電特性に影響を及ぼすことが知られている。本工程で十分にアルカリを除去することにより、原料に珪酸アルカリ水溶液を用いた場合でも、低誘電率化及び低誘電正接化を可能とする粒子を得ることができる。 The residual amount (mass ratio) of alkali (M) after alkali removal is preferably 300 ppm or less, more preferably 200 ppm or less, and even more preferably 100 ppm or less. By sufficiently removing the alkali in this step, it is possible to prevent the particles from coalescing in the subsequent steps and to prevent the generation of sintered particles in the firing step. In addition, it is known that the residual amount (content) of alkali affects the dielectric properties. By sufficiently removing the alkali in this step, it is possible to obtain particles capable of achieving a low dielectric constant and a low dielectric loss tangent even when an aqueous alkali silicate solution is used as a raw material.
 なお、最終製品(粉体を構成する粒子)のアルカリ量も上述の範囲が好ましく、通常、アルカリ除去工程後のアルカリ量と同等になる。 The alkali content of the final product (particles that make up the powder) is also preferably within the range described above, and is usually equivalent to the alkali content after the alkali removal step.
 アルカリ残存量は、粉体を酸で溶解させたものを試料とし、原子吸光光度計を用いて測定できる。珪酸ナトリウムを用いた場合はNaを測定し、珪酸カリウムを用いた場合はKを測定する。具体的には、実施例で説明する。 The amount of residual alkali can be measured using an atomic absorption photometer, using a sample of powder dissolved in acid. Na is measured when sodium silicate is used, and K is measured when potassium silicate is used. Specifically, it will be described in Examples.
 本工程で用いる酸として、鉱酸(塩酸、硝酸、硫酸等)、及び、有機酸(酢酸、酒石酸、リンゴ酸等)を用いることができる。鉱酸が好適に用いられ、特に、価数の大きい硫酸が好ましい。 As acids used in this step, mineral acids (hydrochloric acid, nitric acid, sulfuric acid, etc.) and organic acids (acetic acid, tartaric acid, malic acid, etc.) can be used. Mineral acids are preferably used, and sulfuric acid having a high valence is particularly preferred.
 (第三工程)
 次に、アルカリ除去処理後の粒子を焼成する。焼成温度は、600~1200℃が好ましく、900~1100℃がより好ましい。焼成温度が600℃未満の場合は、SiOH基の残存量が多く、粒子の誘電正接が高くなる。そのため、樹脂に配合しても、誘電正接低減効果が得られにくい。焼成温度が1200℃を超える場合は、粒子同士が焼結しやすいので、異形状の粒子や、粗大粒子が生成しやすい。これは、樹脂組成物の濾過性や、注入性が低下する原因となる。
(Third step)
Next, the particles after the alkali removal treatment are calcined. The firing temperature is preferably 600-1200°C, more preferably 900-1100°C. When the firing temperature is lower than 600° C., the amount of remaining SiOH groups is large and the dielectric loss tangent of the particles is high. Therefore, it is difficult to obtain the effect of reducing the dielectric loss tangent even if it is added to the resin. When the firing temperature exceeds 1200° C., the particles are likely to be sintered together, so irregularly shaped particles and coarse particles are likely to be generated. This causes deterioration in filterability and injectability of the resin composition.
(分級工程)
 第一工程と第三工程の間に分級処理を行うことにより、微小粒子と粗大粒子を除去する。アルカリ除去の前に分級処理を行う場合には、中空粒子が吸湿(潮解)して凝集・合着することを防止するために、造粒後直ちに分級処理をする必要がある。また、焼成前に分級処理を行う場合、分級処理をアルカリ除去処理に続けて行ってもよい。
(Classification process)
By performing a classification treatment between the first step and the third step, fine particles and coarse particles are removed. When the classification treatment is performed before removing the alkali, it is necessary to perform the classification treatment immediately after granulation in order to prevent the hollow particles from absorbing moisture (deliquescence) and aggregating and coalescing. Further, when the classification treatment is performed before firing, the classification treatment may be performed after the alkali removal treatment.
 分級工程により、微小粒子の量を10体積%以下まで減少させる。8体積%以下とすることが好ましく、5体積%以下とすることがより好ましく、3体積%以下とすることがさらに好ましく、1体積%以下とすることが最も好ましい。また、粗大粒子の量を20体積%以下まで減少させる。15体積%以下とすることが好ましく、10体積%以下とすることがより好ましく、5体積%以下とすることがさらに好ましく、1体積%以下とすることが最も好ましい。この分級工程により、粉体に存在する浮遊粒子割合を所定範囲に制御することができる。なお、通常、最終製品の微小粒子や粗大粒子の含有量は、分級工程後の含有量と大きな変化はない。 The amount of fine particles is reduced to 10% by volume or less through the classification process. The content is preferably 8% by volume or less, more preferably 5% by volume or less, even more preferably 3% by volume or less, and most preferably 1% by volume or less. Also, the amount of coarse particles is reduced to 20% by volume or less. The content is preferably 15% by volume or less, more preferably 10% by volume or less, even more preferably 5% by volume or less, and most preferably 1% by volume or less. Through this classification process, the proportion of suspended particles present in the powder can be controlled within a predetermined range. Generally, the content of fine particles and coarse particles in the final product does not change significantly from the content after the classification step.
 この分級工程での分級処理とは、粉体の粒度を揃えることを目的に、粒子径によって粉体を分ける粒度分級を意味する。この粒度分級の操作として、流体分級を挙げることができ、流体分級は乾式分級と湿式分級に分類することができる。 The classification process in this classification process means particle size classification that separates powders by particle size with the aim of aligning the particle size of the powder. Fluid classification can be mentioned as an operation of this particle size classification, and the fluid classification can be classified into dry classification and wet classification.
 乾式分級に用いられる分級機は、原理的に、重力分級機、慣性分級機、遠心分級機に大別できる。慣性分級機や、遠心分級機を用いることにより、より精密な分級が可能になる。軽く、遠心力が掛かりにくい粒子でも精密に分級できる分級機として、日鉄鉱業社製エルボージェット、日本スリーエム社製SGセパレーター、日清エンジニアリング社製エアロファインクラシファイア、日本ニューマチック工業社製マイクロスピンを挙げることができる。これらの中でも、エルボージェット、エアロファインクラシファイアが好ましい。 In principle, classifiers used for dry classification can be broadly classified into gravity classifiers, inertial classifiers, and centrifugal classifiers. More precise classification is possible by using an inertial classifier or a centrifugal classifier. Nittetsu Mining Elbow Jet, Japan 3M SG Separator, Nisshin Engineering Aerofine Classifier, and Nippon Pneumatic Microspin are classifiers that can accurately classify even light particles that are difficult to apply centrifugal force. can be mentioned. Among these, an elbow jet and an aerofine classifier are preferable.
 湿式分級に用いられる分級機は、原理的に、重力分級機、遠心分級機に大別できる。遠心分級機を用いることにより、より精密な分級が可能になる。軽く、遠心力が掛かりにくい粒子でも精密に分級できる分級機として、日本化学機械工業社製ハイドロサイクロン、村田工業社製スーパークロン、佐竹化学機械工業社製アイクラシファイアを挙げることができる。これらの中でも、アイクラシファイアが好ましい。湿式分級によれば、微小粒子の除去を行う際に、比重の小さい粗大粒子を一緒に除去することができ、分級効率を高めることができる。 In principle, classifiers used for wet classification can be roughly divided into gravity classifiers and centrifugal classifiers. Using a centrifugal classifier enables more precise classification. Examples of classifiers that can accurately classify even particles that are light and resistant to centrifugal force include Hydro Cyclone manufactured by Nippon Chemical Machinery Industries Co., Ltd., Super Chron manufactured by Murata Industries, Ltd., and Eye Classifier manufactured by Satake Chemical Machinery Mfg. Co., Ltd. Among these, an eye classifier is preferable. According to the wet classification, when removing fine particles, coarse particles having a small specific gravity can be removed together, and the efficiency of classification can be improved.
 微小粒子と粗大粒子の除去は、同時に行ってもよく、別々に分けて行ってもよい。別々に分けて行う際には、微小粒子の除去と、粗大粒子の除去のどちらを先に行ってもよい。また、微小粒子の除去及び粗大粒子の除去の各処理は、それぞれ複数回に分けて行ってもよい。 The removal of fine particles and coarse particles can be done at the same time or separately. When they are carried out separately, either the removal of fine particles or the removal of coarse particles may be carried out first. Further, each process of removing fine particles and removing coarse particles may be performed in multiple steps.
 また、製造工程中に、適宜、乾燥処理工程を設けてもよい。乾燥処理は、アルカリ除去処理と分級処理の間、分級処理と焼成の間、その両方、あるいは、アルカリ除去処理と焼成の間に設けることができる。必要に応じて複数回設けてもよい。また、焼成前に乾燥処理を行い、分級処理を乾燥処理と焼成の間で行ってもよい。本発明の効果をより享受するには、乾燥処理の後に分級処理を行い、焼成することが好ましい。乾燥処理として、加熱乾燥が適している。乾燥温度は、50~400℃が好ましく、50~200℃がより好ましい。具体的には、50~200℃程度の低温で時間をかけて乾燥させる方法や、温度を徐々に上昇させて乾燥させる方法や、温度を何段階かに分けて変更して乾燥させる方法を例示できる。 In addition, a drying treatment step may be provided as appropriate during the manufacturing process. The drying treatment can be provided between the alkali removal treatment and the classification treatment, between the classification treatment and the firing, or both, or between the alkali removal treatment and the firing. It may be provided multiple times as required. Alternatively, the drying treatment may be performed before firing, and the classification treatment may be performed between the drying treatment and firing. In order to enjoy the effect of the present invention more, it is preferable to carry out a classification treatment after the drying treatment and then perform the firing. Heat drying is suitable as the drying treatment. The drying temperature is preferably 50 to 400°C, more preferably 50 to 200°C. Specific examples include a method of drying at a low temperature of about 50 to 200°C over a long period of time, a method of gradually increasing the temperature, and a method of changing the temperature in several stages for drying. can.
 さらに、粒子塊を篩分けする篩分け処理を、乾燥後と焼成後の少なくとも一方に設けることが好ましい。なお、粒子塊とは、例えば、粒径が50μmを超えるようなものを指し、このような粒子塊を取り除けるような目開き(メッシュ数)の篩を適宜用いる。 Furthermore, it is preferable to provide a sieving process for sieving the particle lumps at least after drying and after firing. The term "particle agglomerate" refers to, for example, particles having a particle size exceeding 50 μm, and a sieve having an opening (mesh number) capable of removing such a particle agglomerate is appropriately used.
 以下、本発明の実施例を具体的に説明する。 Examples of the present invention will be specifically described below.
[実施例1]
 水ガラス水溶液(SiO/NaOモル比3.2、SiO濃度24質量%)30000gを用い、2流体ノズルの一方に0.62kg/hrの流量で、他方のノズルに空気を31800L/hr(空/液体積比63600)の流量で、入口温度400℃の熱風に噴霧して中空粒子を造粒した。ここで、出口温度は150℃であった(第一工程)。第一工程では、少量の中実粒子も造粒される可能性があるが、中実粒子を除去して次工程に進む必要はない。
[Example 1]
Using 30000 g of water glass aqueous solution (SiO 2 /Na 2 O molar ratio 3.2, SiO 2 concentration 24% by mass), one of the two-fluid nozzles is supplied with a flow rate of 0.62 kg / hr, and the other nozzle is supplied with air at 31800 L / Hollow particles were granulated by spraying with hot air having an inlet temperature of 400° C. at a flow rate of hr (empty/liquid volume ratio of 63,600). Here, the outlet temperature was 150° C. (first step). A small amount of solid particles may also be granulated in the first step, but it is not necessary to remove the solid particles to proceed to the next step.
 ついで、この中空粒子(すなわち、第一工程で造粒された粒子)5000gを濃度10質量%の硫酸水溶液32000gに浸漬して、15時間撹拌した。固形分(SiO)濃度は10.2質量%である。また、硫酸は2価の酸なので、酸のモル数(Ma)とアルカリ(NaO)のモル数(Msp)の比(Ma/Msp)は3.3となる。分散液の温度は35℃、pHは3.0であった。浸漬処理の後、純水にて濾過洗浄を行った(第二工程)。 Next, 5000 g of the hollow particles (that is, the particles granulated in the first step) were immersed in 32000 g of an aqueous sulfuric acid solution having a concentration of 10% by mass and stirred for 15 hours. The solid content (SiO 2 ) concentration is 10.2% by mass. Further, since sulfuric acid is a divalent acid, the ratio (Ma/Msp) of the number of moles (Ma) of acid and the number of moles (Msp) of alkali (Na 2 O) is 3.3. The temperature of the dispersion was 35° C. and the pH was 3.0. After the immersion treatment, it was filtered and washed with pure water (second step).
 ついで、乾燥機にて、120℃で24時間乾燥処理した。乾燥後、解砕して目開き75μmの篩にかけて粒子塊を除去した。 Then, it was dried in a dryer at 120°C for 24 hours. After drying, it was pulverized and passed through a sieve with an opening of 75 μm to remove particle lumps.
 ついで、自社製サイクロンを用いて、粉体輸送ラインの流速を5m/sとして、乾式遠心分級処理を行った(第一分級工程)。サイクロンに捕集されずに通過した粒子、すなわち粗大粒子が取り除かれた粒子をバグフィルターで回収した。その後、日鉄鉱業社製エルボージェット(EJ-15)を用いて乾式慣性分級処理を行った(第二分級工程)。この装置を用いて分級すると、F粉(微粉)、M粉(細粉)、G粉(粗粉)の3種類の粒子に分けることができる。このとき、F粉(微粉)に含まれる微小粒子が1体積%以下となるようにFエッジ距離を調整した。F粉を回収し、以降の工程で用いた。 Next, a dry centrifugal classification process was performed using a cyclone manufactured in-house at a flow rate of 5 m/s in the powder transportation line (first classification step). Particles that passed through the cyclone without being collected, ie, particles from which coarse particles had been removed, were collected with a bag filter. Thereafter, dry inertial classification processing was performed using an elbow jet (EJ-15) manufactured by Nittetsu Mining Co., Ltd. (second classification step). When classified using this device, it can be divided into three types of particles: F powder (fine powder), M powder (fine powder), and G powder (coarse powder). At this time, the F edge distance was adjusted so that the fine particles contained in the F powder (fine powder) were 1% by volume or less. F powder was collected and used in subsequent steps.
 回収した粒子を1000℃で10時間加熱処理することにより、中空粒子を含む粉体を得た(第三工程)。なお、焼成後、目開き150μmの篩で粒子塊を取り除いた。 A powder containing hollow particles was obtained by heat-treating the collected particles at 1000°C for 10 hours (third step). After firing, the particle agglomerates were removed using a sieve with an opening of 150 μm.
 得られた粉体を、液状酸無水物「新日本理化社製リカシッドMH700」、イミダゾール系エポキシ樹脂硬化剤「四国化成社製2PHZ-PW」と共に、液状エポキシ樹脂「日鉄ケミカル&マテリアル社製ZX-1059」に配合した。ここで、「ZX-1059」が100質量部、「リカシッドMH700」が86質量部、「2PHZ-PWが1質量部の割合とし、配合物の粉体の割合が35体積%になるように配合した。この配合物を、遊星ミルで予備混錬した後、三本ロールで混練し、ペースト(樹脂組成物)を得た。このペーストを170℃で2時間加熱して硬化させ、50mm×50mm×1mmの板状の樹脂成型物(樹脂製品)を得た。 The resulting powder was mixed with a liquid acid anhydride "Likacid MH700 manufactured by Shin Nippon Rika Co., Ltd.", an imidazole-based epoxy resin curing agent "2PHZ-PW manufactured by Shikoku Kasei Co., Ltd.", and a liquid epoxy resin "ZX manufactured by Nippon Steel Chemical & Materials Co., Ltd." -1059". Here, "ZX-1059" is 100 parts by mass, "Likacid MH700" is 86 parts by mass, and "2PHZ-PW" is 1 part by mass. This compound was preliminarily kneaded in a planetary mill and then kneaded in a triple roll to obtain a paste (resin composition).This paste was cured by heating at 170° C. for 2 hours to obtain a 50 mm×50 mm A plate-shaped resin molding (resin product) of 1 mm was obtained.
 上述のようにして得られた粉体及び樹脂成型物の物性を以下のように測定・評価した。その結果を調製条件とともに表1に示す。他の実施例や比較例でも同様に行った。 The physical properties of the powder and resin molding obtained as described above were measured and evaluated as follows. The results are shown in Table 1 together with the preparation conditions. Other examples and comparative examples were also carried out in the same manner.
(1)粒子径、粒子量、及び粒度変動係数(CV値)
 粒度分析計(セイシン企業社製レーザーマイクロンサイザーLMS-3000)を用いて、乾式で粉体の粒度分布を測定した。測定結果から、体積平均粒子径(D43)、平均粒子径(D50)、最大粒子径(D100)が得られた。さらに、この粒度分布を分析して、8.0μmを超える粗大粒子と1.0μm未満の微小粒子の体積比率をそれぞれ算出し、粗大粒子量、及び微小粒子量とした。
(1) Particle size, particle amount, and particle size variation coefficient (CV value)
Using a particle size analyzer (Laser Micron Sizer LMS-3000 manufactured by Seishin Enterprise Co., Ltd.), the particle size distribution of the powder was measured in a dry manner. From the measurement results, volume average particle size (D43), average particle size (D50) and maximum particle size (D100) were obtained. Further, by analyzing the particle size distribution, the volume ratios of coarse particles exceeding 8.0 μm and fine particles smaller than 1.0 μm were calculated, respectively, as the amount of coarse particles and the amount of fine particles.
 粒度変動係数(CV値)は、下記式より求めた。個々の粒子の粒子径(Di)は、乾式レーザー回折・散乱法で測定した。 The particle size variation coefficient (CV value) was obtained from the following formula. The particle diameter (Di) of each particle was measured by a dry laser diffraction/scattering method.
CV値(%)=(標準偏差(τ)/体積平均粒子径(D43))×100
 標準偏差(τ)=(ΣXi(Di-D43)^2/ΣXi)^(1/2)
CV value (%) = (standard deviation (τ) / volume average particle size (D43)) × 100
Standard deviation (τ) = (ΣXi (Di-D43)^2/ΣXi)^(1/2)
(2)アルカリ残存量
 粉体を硫酸・弗化水素酸で前処理した後、塩酸に溶解させ、原子吸光光度計(日立製Z-2310)を用いて原子吸光分析法によりアルカリ量を測定した。実施例1では、Na量を測定した。
(2) Amount of residual alkali The powder was pretreated with sulfuric acid/hydrofluoric acid, dissolved in hydrochloric acid, and the amount of alkali was measured by atomic absorption spectrometry using an atomic absorption spectrophotometer (Z-2310 manufactured by Hitachi). . In Example 1, the amount of Na was measured.
(3)粒子密度と空隙率
 Quantachrome Instruments社製Ultrapyc1200eを用いて、ガスピクノメーター法により粉体に含まれる粒子の密度の平均(粒子密度)を測定した。ガスは窒素ガスを用いた。
 この粒子密度から、式「[2.2-(粒子密度)]/2.2×100」により空隙率(%)を算出した。粉体がシリカ粒子で構成されているとして、この式では、シリカの密度2.2g/cmを用いた。
(3) Particle Density and Porosity Using Ultrapyc1200e manufactured by Quantachrome Instruments, the average density of particles contained in the powder (particle density) was measured by the gas pycnometer method. Nitrogen gas was used as the gas.
From this particle density, the porosity (%) was calculated by the formula “[2.2-(particle density)]/2.2×100”. Assuming that the powder is composed of silica particles, this formula used a silica density of 2.2 g/cm 3 .
(4)粉体の誘電率(Dk)及び誘電正接(Df)
 ネットワークアナライザー(アンリツ社製、MS46122B)と空洞共振器(1GHz)を用いて空洞共振器摂動法により、誘電率(Dk)及び誘電正接(Df)を測定した。ASTMD2520(JIS C2565)に準拠して測定した。
(4) Permittivity (Dk) and dielectric loss tangent (Df) of powder
A dielectric constant (Dk) and a dielectric loss tangent (Df) were measured by a cavity resonator perturbation method using a network analyzer (manufactured by Anritsu, MS46122B) and a cavity resonator (1 GHz). It was measured according to ASTM D2520 (JIS C2565).
(5)水に懸濁した際の浮遊粒子、懸濁粒子及び沈降粒子の割合
 まず、5質量%となるように粉体と水を混合し、10分間の超音波処理を行った。得られた分散液を25℃にて24時間静置した後、浮遊粒子、懸濁粒子及び沈降粒子をそれぞれ回収した。続いて、各粒子を105℃で24時間乾燥した後に計量し、その割合を算出した。
(5) Percentage of Floating Particles, Suspended Particles, and Sedimented Particles When Suspended in Water First, powder and water were mixed so as to make 5% by mass, and ultrasonic treatment was performed for 10 minutes. After the resulting dispersion was allowed to stand at 25° C. for 24 hours, suspended particles, suspended particles and settled particles were collected. Subsequently, each particle was dried at 105° C. for 24 hours and then weighed to calculate the ratio.
(6)樹脂組成物の濾過性
 ロキテクノ社製フィルター(SHPタイプ:30μm)を用い、フィルターが目詰まりするまでの単位面積あたりの通液量で評価した。
(6) Filterability of resin composition A filter (SHP type: 30 µm) manufactured by Roki Techno was used, and the amount of liquid per unit area until the filter clogged was evaluated.
 評価基準は、以下の通りである。
   ◎:≧1g/cm 
   〇:0.5g/cm以上1.0g/cm未満
   △:0.3g/cm以上0.5g/cm未満
   ×:<0.3g/cm 
Evaluation criteria are as follows.
◎: ≧1 g/cm 2
○: 0.5 g/cm 2 or more and less than 1.0 g/cm 2 △: 0.3 g/cm 2 or more and less than 0.5 g/cm 2 ×: <0.3 g/cm 2
(7)樹脂組成物の注入性
 20μmのギャップを有するガラス板間に樹脂組成物を注入し、25mm充填するのに要する時間で評価した。
(7) Injectability of Resin Composition A resin composition was injected between glass plates having a gap of 20 μm, and the time required to fill 25 mm was evaluated.
 評価基準は、以下の通りである。
   ◎:200秒以内  
   〇:200秒を超えて400秒以内
   △:400秒を超えて600秒以内
   ×:600秒超え
Evaluation criteria are as follows.
◎: within 200 seconds
○: Over 200 seconds and within 400 seconds △: Over 400 seconds and within 600 seconds ×: Over 600 seconds
(8)樹脂成型物の誘電率(Dk)及び誘電正接(Df)
 50mm×50mm×1mmの板状成型体(樹脂成型物)の誘電率(Dk)及び誘電正接(Df)を、ネットワークアナライザー(アンリツ社製、MS46122B)と同軸共振器を用いて、9.4GHzで測定した。粉体(フィラー)を配合していない樹脂成型物と次式を用いて比較し、以下の基準で評価した。
(8) Dielectric constant (Dk) and dielectric loss tangent (Df) of resin molding
Dielectric constant (Dk) and dielectric loss tangent (Df) of a plate-shaped molding (resin molding) of 50 mm × 50 mm × 1 mm were measured at 9.4 GHz using a network analyzer (manufactured by Anritsu, MS46122B) and a coaxial resonator. It was measured. It was compared with a resin molding containing no powder (filler) using the following formula and evaluated according to the following criteria.
誘電率(Dk)の低減率(%)=(粉体配合なしの誘電率-粉体配合ありの誘電率)/粉体配合なしの誘電率×100 Dielectric constant (Dk) reduction rate (%) = (dielectric constant without powder blending - dielectric constant with powder blending)/dielectric constant without powder blending x 100
   〇:低減率>0
   △:低減率=0
   ×:低減率<0
○: Reduction rate > 0
△: reduction rate = 0
×: reduction rate < 0
誘電正接(Df)の低減率(%)=(粉体配合なしの誘電正接-粉体配合ありの誘電正接)/粉体配合なしの誘電正接×100 Dielectric loss tangent (Df) reduction rate (%) = (Dielectric loss tangent without powder blending - Dielectric loss tangent with powder blended) / Dielectric loss tangent without powder blended x 100
   ◎:低減率50%以上
   〇:低減率30%以上50%未満
   △:低減率20%以上30%未満
   ×:低減率20%未満
◎: Reduction rate of 50% or more ○: Reduction rate of 30% or more and less than 50% △: Reduction rate of 20% or more and less than 30% ×: Reduction rate of less than 20%
[実施例2]
 第二分級工程で、日清エンジニアリング社製エアロファインクラシファイアを用いて乾式遠心(半自由渦)分級処理を行った。分級により回収された粒子に含まれる微小粒子が1体積%以下となるように、羽根の角度等を調整した。これ以外は実施例1と同様とした。
[Example 2]
In the second classification step, a dry centrifugal (semi-free vortex) classification treatment was performed using an Aerofine Classifier manufactured by Nisshin Engineering. The angles of the blades and the like were adjusted so that the fine particles contained in the particles collected by the classification were 1% by volume or less. Other than this, the procedure was the same as in Example 1.
[実施例3]
 第二分級工程で、佐竹化学機械工業社製アイクラシファイアを用いて湿式遠心分級処理を行った。回収された粒子に含まれる微小粒子が1体積%以下、粗大粒子が1体積%以下となるように分級した。これ以外は実施例1と同様とした。
[Example 3]
In the second classification step, a wet centrifugal classification process was performed using an eye classifier manufactured by Satake Chemical Machinery Co., Ltd. The collected particles were classified so that the fine particles contained in them were 1% by volume or less and the coarse particles were 1% by volume or less. Other than this, the procedure was the same as in Example 1.
[実施例4]
 第一分級工程、第二分級工程とも、日清エンジニアリング社製エアロファインクラシファイアを用いて乾式遠心(半自由渦)分級処理を行った。最初に、回収された粒子に含まれる微小粒子が10体積%以下となるように、羽根の角度等を調整して分級し、その後に、粗大粒子が1体積%以下になるように調整して分級した。これ以外は実施例1と同様とした。
[Example 4]
In both the first classification process and the second classification process, a dry centrifugal (semi-free vortex) classification process was performed using an Aerofine classifier manufactured by Nisshin Engineering Co., Ltd. First, classify by adjusting the blade angle etc. so that the fine particles contained in the collected particles are 10% by volume or less, and then adjust so that the coarse particles are 1% by volume or less. classified. Other than this, the procedure was the same as in Example 1.
[実施例5]
 第一分級工程、第二分級工程とも、佐竹化学機械工業社製アイクラシファイアを用いて湿式遠心分級処理を行った。最初に、回収された粒子に含まれる微小粒子が5体積%以下となるように分級し、その後に、粗大粒子が1体積%以下になるように分級した。これ以外は実施例1と同様に行った。
[Example 5]
In both the first classification process and the second classification process, a wet centrifugal classification process was performed using an eye classifier manufactured by Satake Chemical Machinery Industry Co., Ltd. First, the collected particles were classified so that the fine particles contained in them were 5% by volume or less, and then the particles were classified so that the coarse particles were 1% by volume or less. Other than this, the procedure was the same as in Example 1.
[比較例1]
 アルカリ除去処理の浸漬撹拌時間を1.5時間に変更し、分級工程を設けなかった。これ以外は実施例1と同様とした。
[Comparative Example 1]
The immersion stirring time in the alkali removal treatment was changed to 1.5 hours, and no classification step was provided. Other than this, the procedure was the same as in Example 1.
[比較例2]
 第一工程で噴霧乾燥器の入口温度を250℃とし、アルカリ除去処理の浸漬撹拌時間を1.5時間とし、分級工程を設けなかった。これ以外は実施例1と同様とした。
[Comparative Example 2]
In the first step, the inlet temperature of the spray dryer was set to 250° C., the immersion stirring time in the alkali removal treatment was set to 1.5 hours, and no classification step was provided. Other than this, the procedure was the same as in Example 1.
[比較例3]
 分級工程にて、自社製サイクロンを用いて、粉体輸送ラインの流速を5m/sとして行い、サイクロンに捕集された粒子を回収した。これ以外は実施例1とした。
[Comparative Example 3]
In the classification process, a cyclone manufactured in-house was used, and the flow velocity of the powder transport line was set to 5 m/s, and the particles collected by the cyclone were collected. Other than this, it was set as Example 1.
Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000001
 表1に示すように、実施例に係る粉体及びこの粉体が配合された樹脂成型物は、誘電率及び誘電正接が低い。また、実施例に係る粉体を配合した樹脂組成物は、濾過性及び注入性に優れている。

 
As shown in Table 1, the powders according to the examples and the resin moldings containing the powders have low dielectric constants and low dielectric loss tangents. Moreover, the resin compositions containing the powders according to the examples are excellent in filterability and injectability.

Claims (7)

  1.  無孔質の外殻の内部に空洞を有する中空粒子を含む粉体であって、
     前記粉体の平均粒子径(D50)が1.0~10.0μmであり、粒子径1.0μm未満の微小粒子の含有量が10体積%以下であり、粒子径8.0μmを超える粗大粒子の含有量が20体積%以下であり、
     前記粉体を水に懸濁した際、浮遊粒子が0.5~15.0質量%、懸濁粒子が0~4.0質量%、沈降粒子が81.0~99.5質量%であることを特徴とする粉体。
    A powder comprising hollow particles having a cavity inside a nonporous outer shell,
    The average particle diameter (D50) of the powder is 1.0 to 10.0 μm, the content of fine particles having a particle diameter of less than 1.0 μm is 10% by volume or less, and the coarse particles having a particle diameter of more than 8.0 μm The content of is 20% by volume or less,
    When the powder is suspended in water, the suspended particles are 0.5 to 15.0% by mass, the suspended particles are 0 to 4.0% by mass, and the sedimented particles are 81.0 to 99.5% by mass. A powder characterized by:
  2.  粒度変動係数(CV値)が、60%以下である請求項1に記載の粉体。 The powder according to claim 1, which has a particle size variation coefficient (CV value) of 60% or less.
  3.  請求項1又は2に記載の粉体を樹脂材料に配合することを特徴とする樹脂組成物の製造方法。 A method for producing a resin composition, which comprises blending the powder according to claim 1 or 2 with a resin material.
  4.  珪酸アルカリ水溶液を熱風気流中で噴霧乾燥して粒子を調製する第一工程と、
     前記粒子に含まれるアルカリを除去する第二工程と、
     前記アルカリ除去された粒子を焼成する第三工程と、
    を有し、
     前記第一工程と前記第三工程の間に、粒子径1.0μm未満の微小粒子及び粒子径8.0μmを超える粗大粒子を除去する分級工程が設けられたことを特徴とする粉体の製造方法。
    a first step of preparing particles by spray-drying an aqueous alkali silicate solution in a hot air stream;
    a second step of removing the alkali contained in the particles;
    a third step of firing the alkali-removed particles;
    has
    Production of powder characterized in that a classification step for removing fine particles with a particle size of less than 1.0 μm and coarse particles with a particle size of more than 8.0 μm is provided between the first step and the third step. Method.
  5.  前記第二工程において、粒子に含まれるアルカリ量を300ppm以下に低減することを特徴とする請求項4記載の粉体の製造方法。 The method for producing powder according to claim 4, wherein in the second step, the amount of alkali contained in the particles is reduced to 300 ppm or less.
  6.  前記第三工程の前に、前記中空粒子を乾燥する乾燥工程が設けられるとともに、
     前記乾燥工程と前記第三工程の間に、前記分級工程が設けられたことを特徴とする請求項4又は5に記載の粉体の製造方法。
    A drying step for drying the hollow particles is provided before the third step,
    6. The method for producing powder according to claim 4, wherein the classifying step is provided between the drying step and the third step.
  7.  前記分級工程において、前記微小粒子と前記粗大粒子が湿式分級処理により除去されることを特徴とする請求項4~6のいずれか一項に記載の粉体の製造方法。

     
    7. The method for producing powder according to any one of claims 4 to 6, wherein in the classifying step, the fine particles and the coarse particles are removed by a wet classification treatment.

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