WO2022206038A1 - Dispositif de cellule solaire semi-transparente cuivre-zinc-étain-soufre-sélénium et procédé de préparation associé - Google Patents
Dispositif de cellule solaire semi-transparente cuivre-zinc-étain-soufre-sélénium et procédé de préparation associé Download PDFInfo
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- WO2022206038A1 WO2022206038A1 PCT/CN2021/138795 CN2021138795W WO2022206038A1 WO 2022206038 A1 WO2022206038 A1 WO 2022206038A1 CN 2021138795 W CN2021138795 W CN 2021138795W WO 2022206038 A1 WO2022206038 A1 WO 2022206038A1
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- zinc
- fto
- tin
- copper
- sulfur
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- SEUJAMVVGAETFN-UHFFFAOYSA-N [Cu].[Zn].S=[Sn]=[Se] Chemical compound [Cu].[Zn].S=[Sn]=[Se] SEUJAMVVGAETFN-UHFFFAOYSA-N 0.000 title claims abstract description 55
- 238000002360 preparation method Methods 0.000 title claims abstract description 41
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims abstract description 28
- JKQOBWVOAYFWKG-UHFFFAOYSA-N molybdenum trioxide Inorganic materials O=[Mo](=O)=O JKQOBWVOAYFWKG-UHFFFAOYSA-N 0.000 claims abstract description 26
- 239000010409 thin film Substances 0.000 claims abstract description 26
- 239000011521 glass Substances 0.000 claims abstract description 19
- 229910052980 cadmium sulfide Inorganic materials 0.000 claims abstract description 17
- WUPHOULIZUERAE-UHFFFAOYSA-N 3-(oxolan-2-yl)propanoic acid Chemical compound OC(=O)CCC1CCCO1 WUPHOULIZUERAE-UHFFFAOYSA-N 0.000 claims abstract description 14
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 claims abstract description 14
- 239000011787 zinc oxide Substances 0.000 claims abstract description 14
- 238000010521 absorption reaction Methods 0.000 claims abstract description 13
- 229910052709 silver Inorganic materials 0.000 claims abstract description 10
- 238000004140 cleaning Methods 0.000 claims abstract description 9
- NPXOKRUENSOPAO-UHFFFAOYSA-N Raney nickel Chemical compound [Al].[Ni] NPXOKRUENSOPAO-UHFFFAOYSA-N 0.000 claims abstract description 8
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims abstract description 8
- 239000004332 silver Substances 0.000 claims abstract description 8
- 239000005361 soda-lime glass Substances 0.000 claims abstract description 6
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims abstract description 4
- 229910001887 tin oxide Inorganic materials 0.000 claims abstract description 4
- 238000000151 deposition Methods 0.000 claims abstract description 3
- 239000000243 solution Substances 0.000 claims description 47
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 claims description 39
- 239000002243 precursor Substances 0.000 claims description 36
- 238000000034 method Methods 0.000 claims description 35
- 239000010408 film Substances 0.000 claims description 31
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 claims description 28
- 239000000758 substrate Substances 0.000 claims description 20
- 239000006096 absorbing agent Substances 0.000 claims description 18
- WILFBXOGIULNAF-UHFFFAOYSA-N copper sulfanylidenetin zinc Chemical compound [Sn]=S.[Zn].[Cu] WILFBXOGIULNAF-UHFFFAOYSA-N 0.000 claims description 16
- 239000000463 material Substances 0.000 claims description 16
- 238000001704 evaporation Methods 0.000 claims description 15
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 claims description 14
- 230000008020 evaporation Effects 0.000 claims description 13
- 239000000126 substance Substances 0.000 claims description 13
- 239000010949 copper Substances 0.000 claims description 11
- 150000004699 copper complex Chemical group 0.000 claims description 10
- 239000002184 metal Chemical class 0.000 claims description 10
- 229910052751 metal Inorganic materials 0.000 claims description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 10
- 159000000000 sodium salts Chemical class 0.000 claims description 9
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 8
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims description 8
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 8
- 150000001875 compounds Chemical class 0.000 claims description 8
- 239000011701 zinc Substances 0.000 claims description 8
- 239000011669 selenium Substances 0.000 claims description 7
- 238000004544 sputter deposition Methods 0.000 claims description 7
- 238000002834 transmittance Methods 0.000 claims description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 6
- 238000000137 annealing Methods 0.000 claims description 6
- 239000007864 aqueous solution Substances 0.000 claims description 6
- 229910002804 graphite Inorganic materials 0.000 claims description 6
- 239000010439 graphite Substances 0.000 claims description 6
- 230000008569 process Effects 0.000 claims description 6
- 150000003839 salts Chemical class 0.000 claims description 6
- 229910052708 sodium Inorganic materials 0.000 claims description 6
- 239000011734 sodium Substances 0.000 claims description 6
- 238000003756 stirring Methods 0.000 claims description 6
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims description 5
- 239000002904 solvent Substances 0.000 claims description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 4
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 4
- 238000000224 chemical solution deposition Methods 0.000 claims description 4
- 150000004696 coordination complex Chemical class 0.000 claims description 4
- 229910052802 copper Inorganic materials 0.000 claims description 4
- 239000007789 gas Substances 0.000 claims description 4
- 150000002736 metal compounds Chemical class 0.000 claims description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 4
- 239000002245 particle Substances 0.000 claims description 4
- VWDWKYIASSYTQR-UHFFFAOYSA-N sodium nitrate Chemical compound [Na+].[O-][N+]([O-])=O VWDWKYIASSYTQR-UHFFFAOYSA-N 0.000 claims description 4
- -1 that is Chemical compound 0.000 claims description 4
- 229910021642 ultra pure water Inorganic materials 0.000 claims description 4
- 239000012498 ultrapure water Substances 0.000 claims description 4
- 229910052725 zinc Inorganic materials 0.000 claims description 4
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 claims description 3
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 claims description 3
- 235000011114 ammonium hydroxide Nutrition 0.000 claims description 3
- 229910052786 argon Inorganic materials 0.000 claims description 3
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 3
- 229910052711 selenium Inorganic materials 0.000 claims description 3
- 238000002207 thermal evaporation Methods 0.000 claims description 3
- 238000007740 vapor deposition Methods 0.000 claims description 3
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 claims description 2
- VMHLLURERBWHNL-UHFFFAOYSA-M Sodium acetate Chemical compound [Na+].CC([O-])=O VMHLLURERBWHNL-UHFFFAOYSA-M 0.000 claims description 2
- 229910052782 aluminium Inorganic materials 0.000 claims description 2
- UXGNZZKBCMGWAZ-UHFFFAOYSA-N dimethylformamide dmf Chemical compound CN(C)C=O.CN(C)C=O UXGNZZKBCMGWAZ-UHFFFAOYSA-N 0.000 claims description 2
- 229910003002 lithium salt Inorganic materials 0.000 claims description 2
- 159000000002 lithium salts Chemical class 0.000 claims description 2
- 239000011259 mixed solution Substances 0.000 claims description 2
- 150000003378 silver Chemical class 0.000 claims description 2
- 239000001632 sodium acetate Substances 0.000 claims description 2
- 235000017281 sodium acetate Nutrition 0.000 claims description 2
- 239000004317 sodium nitrate Substances 0.000 claims description 2
- 235000010344 sodium nitrate Nutrition 0.000 claims description 2
- 229910052938 sodium sulfate Inorganic materials 0.000 claims description 2
- 235000011152 sodium sulphate Nutrition 0.000 claims description 2
- 229910052736 halogen Inorganic materials 0.000 claims 1
- XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 claims 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 abstract 1
- 229910052731 fluorine Inorganic materials 0.000 abstract 1
- 239000011737 fluorine Substances 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 59
- 238000006243 chemical reaction Methods 0.000 description 9
- 239000013078 crystal Substances 0.000 description 9
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 8
- 229910052750 molybdenum Inorganic materials 0.000 description 8
- 239000011733 molybdenum Substances 0.000 description 8
- 150000001879 copper Chemical class 0.000 description 7
- 238000004528 spin coating Methods 0.000 description 7
- 239000003153 chemical reaction reagent Substances 0.000 description 6
- 238000002441 X-ray diffraction Methods 0.000 description 5
- 239000002994 raw material Substances 0.000 description 5
- 230000008901 benefit Effects 0.000 description 4
- 239000008367 deionised water Substances 0.000 description 4
- 229910021641 deionized water Inorganic materials 0.000 description 4
- 238000011161 development Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 239000012535 impurity Substances 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 150000003751 zinc Chemical class 0.000 description 4
- 229910004613 CdTe Inorganic materials 0.000 description 3
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 3
- 239000012300 argon atmosphere Substances 0.000 description 3
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 3
- 229940045803 cuprous chloride Drugs 0.000 description 3
- 229910052733 gallium Inorganic materials 0.000 description 3
- 239000011229 interlayer Substances 0.000 description 3
- HLBBKKJFGFRGMU-UHFFFAOYSA-M sodium formate Chemical compound [Na+].[O-]C=O HLBBKKJFGFRGMU-UHFFFAOYSA-M 0.000 description 3
- 235000019254 sodium formate Nutrition 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000004280 Sodium formate Substances 0.000 description 2
- 229910021627 Tin(IV) chloride Inorganic materials 0.000 description 2
- 239000011358 absorbing material Substances 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 238000005265 energy consumption Methods 0.000 description 2
- 239000000706 filtrate Substances 0.000 description 2
- 238000001000 micrograph Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000005693 optoelectronics Effects 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 238000001878 scanning electron micrograph Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 2
- 229910016001 MoSe Inorganic materials 0.000 description 1
- 229910006404 SnO 2 Inorganic materials 0.000 description 1
- 229910021626 Tin(II) chloride Inorganic materials 0.000 description 1
- NKSXAYFZXLTLDA-UHFFFAOYSA-N [S].[Se].[Sn].[Zn] Chemical compound [S].[Se].[Sn].[Zn] NKSXAYFZXLTLDA-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- QCUOBSQYDGUHHT-UHFFFAOYSA-L cadmium sulfate Chemical compound [Cd+2].[O-]S([O-])(=O)=O QCUOBSQYDGUHHT-UHFFFAOYSA-L 0.000 description 1
- 229910000369 cadmium(II) sulfate Inorganic materials 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 231100000053 low toxicity Toxicity 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 159000000001 potassium salts Chemical class 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 150000003346 selenoethers Chemical class 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers
- H01L31/072—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PN heterojunction type
- H01L31/0749—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PN heterojunction type including a AIBIIICVI compound, e.g. CdS/CulnSe2 [CIS] heterojunction solar cells
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02568—Chalcogenide semiconducting materials not being oxides, e.g. ternary compounds
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02623—Liquid deposition
- H01L21/02628—Liquid deposition using solutions
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
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- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022408—Electrodes for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/022425—Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
- H01L31/022441—Electrode arrangements specially adapted for back-contact solar cells
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
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- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022466—Electrodes made of transparent conductive layers, e.g. TCO, ITO layers
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- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0256—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
- H01L31/0264—Inorganic materials
- H01L31/032—Inorganic materials including, apart from doping materials or other impurities, only compounds not provided for in groups H01L31/0272 - H01L31/0312
- H01L31/0322—Inorganic materials including, apart from doping materials or other impurities, only compounds not provided for in groups H01L31/0272 - H01L31/0312 comprising only AIBIIICVI chalcopyrite compounds, e.g. Cu In Se2, Cu Ga Se2, Cu In Ga Se2
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- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1884—Manufacture of transparent electrodes, e.g. TCO, ITO
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/541—CuInSe2 material PV cells
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Definitions
- the invention belongs to the technical field of solar energy, and in particular relates to a copper-zinc-tin-sulfur-selenium translucent solar cell device and a preparation method thereof, in particular to an efficient copper-zinc-tin-sulfur-selenium translucent solar cell device prepared by using FTO or FTO - MoO3 as a back electrode method of solar cells.
- CZTS Cu 2 ZnSnS 4
- CZTSe Cu 2 ZnSnSe 4
- a CuZnSinS2 solar cell with tunable band gap in the range of 1.0-1.5 eV can also be fabricated.
- the biggest advantage of copper-zinc-tin-sulfur solar cells is that they have a wide source of elements, high abundance and low toxicity. They are ideal green photovoltaic materials.
- the preparation methods of copper-zinc-tin-sulfur film materials are mainly divided into two categories: vacuum method and solution method.
- the traditional vacuum preparation method is based on a high vacuum environment, and the material preparation process has high energy consumption and low material utilization rate.
- the solution method is based on a chemical solution, does not require a vacuum environment, has low energy consumption, can be used for large-area film formation, and has the advantages of improving material utilization and low-temperature processing.
- conventional CZTSSe-based solar cells usually use a metallic Mo back electrode, so that light cannot pass through the back electrode.
- a transparent conductive oxide is used as the back electrode of CZTSSe instead of Mo to achieve substrate transparency.
- TCO transparent conductive oxide
- the high thermal stability compared to other TCOs such as AZO and ITO
- high light transmittance of fluorine-doped tin oxide FTO
- the efficiency is much lower than the value of CZTSSe devices fabricated on standard opaque SLG/Mo substrates.
- MoO3 can enhance the ohmicity of the interface and improve the device performance by reducing the valence band offset.
- the present invention will disclose a simple and novel translucent FTO or FTO-MoO 3 as the back electrode, and a high-efficiency copper-zinc-tin-sulfur-selenium semitransparent solar cell with an efficiency of over 11% is prepared by the precursor solution method.
- the present invention provides a copper-zinc-tin-sulfur-selenium translucent solar cell device and a preparation method thereof, based on the use of translucent FTO/FTO-MoO 3 as the back electrode, and at the same time, based on The FTO/FTO-MoO 3 back electrode prepared by solution method doping with monovalent sodium salt has good crystallinity, few defects, no secondary phase, and high optoelectronic performance.
- one purpose of the present invention is to provide a copper-zinc-tin-sulfur-selenium translucent solar cell device, which is made of translucent fluorine-doped tin oxide FTO or plated with MoO 3
- the FTO is FTO-MoO 3 as the back electrode, which is sequentially composed of soda-lime glass, FTO/FTO-MoO 3 back electrode, copper-zinc-tin-sulfur-selenium absorber layer, cadmium sulfide buffer layer, high resistance intrinsic zinc oxide window layer, low resistance Indium tin oxide window layer and nickel aluminum or silver electrodes.
- the soda lime glass, FTO, MoO 3 copper zinc tin sulfur selenium absorption layer, cadmium sulfide buffer layer, high resistance intrinsic zinc oxide window layer, low resistance indium tin oxide window layer, nickel aluminum or silver electrode
- the thicknesses are 2.2mm, 500nm, 0-100nm, 1-2 ⁇ m, 10-50nm, 10-50nm, 100-250nm, 10-500nm, respectively.
- the conductivity type of the MoO 3 , the cadmium sulfide buffer layer, the high-resistance intrinsic zinc oxide window layer and the low-resistance indium tin oxide window layer is n-type, and the conductivity type of the copper-zinc-tin-sulfur-selenium absorption layer is p type; the square resistance of the FTO is less than or equal to 7 ⁇ /sq, and the light transmittance is more than or equal to 80%.
- Another object of the present invention is to provide a method for preparing a copper-zinc-tin-sulfur - selenium translucent solar cell device, which uses FTO conductive glass or FTO conductive glass plated with MoO3 as a substrate, and after cleaning, sequentially Prepare copper-zinc-tin-sulfur-selenium absorber layer, cadmium sulfide buffer layer, high-resistance intrinsic zinc oxide window layer, low-resistance indium-tin oxide window layer, nickel-aluminum or silver electrodes to obtain a translucent backside with FTO/FTO - MoO3 Electrodes for copper-zinc-tin-sulfur-selenium semitransparent solar cell devices.
- the preparation method of the translucent back electrode the steps are as follows:
- FTO back electrode Clean the surface of the FTO back electrode.
- the cleaning method is as follows: Cut the commercial 10cm ⁇ 10cm FTO conductive glass into 2cm ⁇ 2cm with a laboratory glass cutter, and cut the cut SLG-FTO The substrates were cleaned in an ultrasonic bath at 25°C for 10-25 minutes in the order of acetone and isopropanol, and dried under a stream of N 2 .
- the number to be displayed is stable at Open the main baffle (that is, the large baffle below the SLG-FTO substrate), the film thickness meter is cleared to zero, and the evaporation material begins to be deposited on the SLG-FTO substrate.
- the main baffle that is, the large baffle below the SLG-FTO substrate
- the film thickness meter is cleared to zero
- the evaporation material begins to be deposited on the SLG-FTO substrate.
- FTO-MoO 3 Another back electrode was obtained: FTO-MoO 3 . Since the properties of MoO 3 may be affected by air exposure, it needs to be put into the glove box immediately after preparation.
- the thickness of MoO 3 can be 0, 5, 10, 20...100nm.
- the preparation method of the copper-zinc-tin-sulfur-selenium absorption layer is to directly spin-coat the precursor solution on the substrate formed by FTO/FTO-MoO 3 , anneal, and selenide to prepare the copper-zinc-tin-sulfur-selenium absorption layer.
- the specific steps are as follows:
- the precursor solution is prepared by using dimethyl sulfoxide DMSO or N,N-dimethylformamide DMF as a solvent, and the precursor compound as a solute mixed solution;
- the precursor compound is composed of It is composed of metal complex, metal salt and thiourea, wherein the metal complex is copper complex, and the metal salt is Zn(CH 3 COO) 2 and SnCl 4 ; wherein, the amount of copper element substance: zinc element and tin element
- the sum of the amount of substances is (0.5 ⁇ 1.0): 1; the amount of zinc element substances: the amount of tin element substances is (0.9 ⁇ 1.5): 1;
- the preparation method of the copper complex is: dissolving thiourea in deionized water, adding copper salt to the solution after the thiourea is completely dissolved, and the ratio of the amount of the added thiourea to the copper salt is 3. : 1, the reaction process solution temperature is 70 degrees Celsius; After dissolving, the solution is filtered, left standing, slowly cooled, and the target product copper complex crystal is separated out from the solution, and the above-mentioned crystal product is taken out and dried.
- the preparation of the precursor solution method as required, a certain amount of sodium salt or other metal compounds can be added to the solution for doping and stirred at room temperature until it is completely dissolved.
- the sodium salt is monovalent sodium.
- the metal compound includes, but is not limited to, a combination of one or more of sodium salts, potassium salts, lithium salts, and silver salts.
- the preparation method of the cadmium sulfide buffer layer is to adopt a chemical bath deposition process: add 150 mL of ultrapure water to a water-jacketed beaker, immerse the substrate prepared with the copper-zinc-tin-sulfur-selenium absorption layer in the ultrapure water, A good amount of 20ml of 1.65mmol/L CdSO 4 aqueous solution and 28ml of ammonia water were successively added to the water-jacketed beaker, stirred, and the water pump was turned on.
- the preparation method of the high-resistance intrinsic zinc oxide window layer and the low-resistance indium tin oxide window layer sputtering a layer of intrinsic zinc oxide (i-ZnO) with a thickness of 10-50 nm on the surface of the sample by a magnetron sputtering method And 100-250nm indium tin oxide (ITO) window layer: vacuum degree is below 4 ⁇ 10 ⁇ -2Torr, under argon atmosphere, pressure 0.2-1Pa, sputtering power 60-100W, Ar gas flow 50-100sccm.
- i-ZnO intrinsic zinc oxide
- ITO indium tin oxide
- a layer of Ni:Al or Ag top electrode was thermally evaporated on the surface of the sample by thermal evaporation method.
- Another object of the present invention is to provide an application of a copper-zinc-tin-sulfur-selenium translucent solar cell device, including application to the exterior walls of modern buildings, which include windows, facades, skylights, and the like.
- the technical scheme adopted in the present invention is to use translucent FTO/FTO-MoO 3 as the back electrode, and is composed of soda lime glass SLG, FTO/FTO-MoO 3 , copper-zinc-tin-sulfur-selenium absorption layer, cadmium sulfide buffer layer, high A resistive intrinsic zinc oxide window layer, a low-resistance indium tin oxide window layer, and nickel-aluminum or silver electrodes form a copper-zinc-tin-sulfur semitransparent solar cell device.
- the method has the following advantages:
- the present invention discloses the use of translucent back electrodes instead of molybdenum back electrodes to prepare high-efficiency copper-zinc-tin-sulfur-selenium translucent solar cells. Especially, on the FTO-MoO 3 back electrode, the efficiency of CuZnSnSSe semitransparent solar cells prepared with the precursor solution has been greatly improved.
- the use of semi-transparent back electrodes adds many possibilities for thin-film solar cell applications, including generating electricity from the back side, thus becoming bifacial devices with great potential for industrial applications.
- the metal sodium salt-doped precursor solution disclosed in the present invention can prepare high-quality, impurity-free, and precise element ratio copper-zinc-tin-sulfur - selenium absorbing layer materials.
- the efficiency of zinc-tin-sulfur-selenium semitransparent solar cells is comparable to that on molybdenum glass.
- Fig. 1 is a schematic structural diagram of the copper-zinc-tin-sulfur-selenium semitransparent solar cells prepared by using FTO or FTO-20nm MoO 3 as the back electrode in Examples 1 and 2.
- FIG. 2 is a physical diagram of the FTO back electrode in the first embodiment.
- FIG. 4 is a physical diagram of the copper complex Cu(Tu) 3 Cl formed by cuprous chloride and thiourea in Example 1.
- FIG. 4 is a physical diagram of the copper complex Cu(Tu) 3 Cl formed by cuprous chloride and thiourea in Example 1.
- FIG. 7 is the X-ray diffraction pattern of the absorber layer film of the FTO back electrode in Example 1.
- FIG. 8 is the X-ray diffraction pattern of the FTO-20nm MoO 3 back electrode absorber layer film in Example 2.
- FIG. 9 is a scanning electron microscope image (film layer cross-section) of the absorber layer thin film with FTO as the back electrode in Example 1.
- FIG. 9 is a scanning electron microscope image (film layer cross-section) of the absorber layer thin film with FTO as the back electrode in Example 1.
- FIG. 10 is a scanning electron microscope image (film layer cross section) of the absorber thin film with FTO-20nm MoO 3 as the back electrode in Example 2.
- FIG. 10 is a scanning electron microscope image (film layer cross section) of the absorber thin film with FTO-20nm MoO 3 as the back electrode in Example 2.
- FIG. 11 the voltage-current characteristic curve of the copper-zinc-tin-sulfur-selenium translucent solar cell device in Example 1 under the AM1.5G standard sunlight intensity.
- Fig. 12 is the voltage-current characteristic curve of the copper-zinc-tin-sulfur-selenium translucent solar cell device in Example 2 under the AM1.5G standard sunlight intensity.
- Figure 13 shows the voltage-current characteristic curves of the copper-zinc-tin-sulfur-selenium semitransparent solar cell device in Example 3 and the copper-zinc-tin-sulfur-selenium solar cell device in Example 4 under AM1.5G standard sunlight intensity.
- the invention discloses a high-efficiency copper-zinc-tin-sulfur semitransparent solar cell device and a preparation method thereof.
- the invention discloses two types of translucent back electrodes, which can achieve good stability and repeatability by using the solution method at the same time, and can be used to prepare copper-zinc-tin-sulfur thin-film light-absorbing materials with high crystal quality, good film morphology and no impurity phase.
- the prepared copper-zinc-tin-sulfur semitransparent thin film solar cell has high photoelectric conversion efficiency.
- the precursor solution is prepared and the copper-zinc-tin-sulfur-selenium translucent thin film solar cell is prepared.
- the surface of the FTO back electrode was cleaned, and the cleaning method was as follows: the commercial 10cm ⁇ 10cm FTO conductive glass was cut into 2cm ⁇ 2cm with a laboratory glass cutter, and the cut SLG-FTO substrate was in the order of acetone and isopropanol. Ultrasonic bath cleaning treatment at 25 °C was performed for 15 min, and dried under N 2 flow.
- the absorber layer film that has been selenized in step 5 is taken out and soaked in deionized water for 3 minutes.
- the CdS buffer layer is deposited by chemical bath deposition (CBD).
- CBD chemical bath deposition
- Step 7 Preparation of Window Layer (i-ZnO/ITO)
- i-ZnO intrinsic zinc oxide
- ITO indium tin oxide
- Metal 50nm Ni and 500nm Al were evaporated on the sample obtained in step 7 by thermal evaporation method.
- the precursor solution was prepared and prepared copper-zinc-tin-sulfur-selenium translucent thin films Solar battery.
- Step 1 Preparation of FTO-20nm MoO 3 back electrode:
- Place the cleaned SLG/FTO substrate in the designated position of the vapor deposition chamber use the mechanical pump and the molecular pump to pump the air pressure in the chamber to 4 ⁇ 10 ⁇ -4 Torr, turn on the evaporation power switch corresponding to the evaporation boat, and click the screen Open the corresponding boat baffle, adjust the current knob, slowly increase the working current of the power supply to 39A, and the working voltage to 2.7V, and observe the rate indication of the film thickness meter at all times.
- the number to be displayed is stable at Open the main baffle (that is, the large baffle below the SLG-FTO substrate), the film thickness meter is cleared to zero, and the evaporation material begins to be deposited on the SLG-FTO substrate.
- Steps 2-8 The operator is the same as Steps 2-8 in Example 1.
- back electrodes with different thicknesses of MoO 3 can be prepared, such as FTO-10nm MoO 3 back electrodes and FTO-30nm MoO 3 back electrodes.
- the precursor solutions were prepared and sodium-doped Copper-zinc-tin-sulfur semitransparent thin-film solar cells.
- the specific operation steps are as follows:
- Step 1 The operator is the same as Step 1 in the second implementation example.
- Step 2 The operator is the same as that of Step 2 in Example 1.
- Step 3 Preparation of the precursor solution.
- Steps 4-8 The operator is the same as Steps 4-8 in Example 1.
- Step 1 Clean the surface of the molybdenum glass.
- the cleaning method is as follows: Cut the commercial 10cm ⁇ 10cm molybdenum glass into 2cm ⁇ 2cm with a laboratory glass cutter, and cut the cut molybdenum glass in the order of acetone and isopropanol. Ultrasonic bath cleaning treatment at 25 °C for 15 min and drying under N2 flow.
- Steps 2-8 The operator is the same as Steps 2-8 in Example 1.
- the embodiment of the present invention provides two translucent back electrodes, FTO and FTO-MoO 3 , and a method for preparing high-efficiency copper-zinc-tin-sulfur-selenium semitransparent thin-film solar cells by a solution method, that is, by using metal complexes and metal salts as precursors
- the precursor solution prepared by the compound can prepare copper-zinc-tin-sulfur thin film light-absorbing materials with high crystal quality, good film morphology and no impurity phase, and can prepare high-efficiency copper-zinc-tin-sulfur semitransparent solar cells by further doping with metal salts .
- FIG. 1 is a schematic structural diagram of the copper-zinc-tin-sulfur-selenium semitransparent solar cells prepared by using FTO/FTO-MoO 3 as the back electrode in Examples 1 and 2.
- FIG. 2 and FIG. 3 are actual photos of the translucent back electrode FTO and FTO-MoO 3 in Example 1, respectively.
- FIG. 4 is a real photo of the copper complex in Example 1, and its chemical composition is Cu(Tu) 3 Cl as analyzed by an elemental analyzer.
- FIG. 5 shows the light transmittance of the FTO back electrode and the FTO-MoO 3 back electrode with different thicknesses (10, 20 and 30 nm) of MoO 3 deposited in Examples 1 and 2.
- the transmittances of these two back electrodes are basically the same, indicating that the transmittance of MoO3 is very high.
- FIG. 6 is the X-ray diffraction pattern of the semi-transparent FTO back electrode in Example 1, and all the diffraction peaks correspond to the SnO 2 peaks of the FTO back electrode.
- FIG. 7 and FIG. 8 are respectively the X-ray diffraction patterns of the copper-zinc-tin-sulfur-selenium absorption layer films formed by the selenization reaction of two different substrates FTO and FTO-MoO precursor films in Examples 1 and 2, respectively.
- FIG. 9 and FIG. 10 are scanning electron microscope (SEM) images of cross-sections of CuZnSnS thin films prepared with different back electrodes in Example 1 and Example 2, respectively.
- the SEM image in Fig. 9 shows that the upper layer of the CZTSSe absorber layer is formed by a dense and uniform large-grain layer, and the middle and bottom of the absorber layer are small-grain layers with poor crystallinity.
- the absorber layer exhibits a clear double-layer structure, both of which are composed of well-packed large grains, but with a layer of small grains in the middle.
- the presence of the MoSe interfacial layer induces a high-quality CZTSSe absorber layer to a large extent.
- the two groups of light-absorbing films were prepared into solar cell devices and their photovoltaic performance was tested. Their voltage-current characteristic curves are shown in Figures 11 and 12.
- the photoelectric conversion efficiency of the device with FTO as the back electrode was 4.72%, while The photoelectric conversion efficiency of the device with FTO - MoO3 as the back electrode is 9.70%.
- the device with FTO - MoO3 as the back electrode has higher optoelectronic performance, which is mainly due to the generation of the MoSe2 interface layer between the FTO and the absorber layer, which improves the ohmic contact and prevents the diffusion of Sn element.
- Figure 13 shows the photoelectric conversion efficiency of the device prepared by using FTO-MoO 3 as the back electrode and doped with sodium formate in the precursor solution in Example 3 and the device prepared on molybdenum glass in Example 4, with FTO-MoO 3 as the back electrode.
- the electrode PCE is as high as 11.17%, exceeding 11%, reaching the international advanced level, which is comparable to that of molybdenum glass.
- the technical solution of the present invention prepares translucent FTO and FTO-MoO 3 back electrodes, and prepares copper-zinc-tin-sulfur-selenium translucent thin film materials and photovoltaic devices by doping by solution method, and finally obtains high crystal quality, Good morphology, no impurity phase copper-zinc-tin-sulfur-selenium translucent thin film material and photovoltaic device with energy conversion efficiency over 11%, indicating the remarkable advancement of the invention.
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Abstract
Sont divulgués dans la présente invention, un dispositif de cellule solaire semi-transparente cuivre-zinc-étain-soufre-sélénium et un procédé de préparation associé. Le dispositif de cellule solaire semi-transparente cuivre-zinc-étain-soufre-sélénium utilise de l'oxyde d'étain dopé au fluor semi-transparent (FTO) ou FTO-MoO3 en tant qu'électrode arrière et est constitué de verre sodocalcique, de l'électrode arrière FTO/FTO-MoO3, d'une couche d'absorption cuivre-zinc-étain-soufre-sélénium, d'une couche tampon de sulfure de cadmium, d'une couche de fenêtre d'oxyde de zinc intrinsèque à haute résistance, d'une couche de fenêtre d'oxyde d'étain d'indium à faible résistance et d'une électrode de nickel-aluminium ou d'argent. Le procédé de préparation consiste à nettoyer le verre conducteur FTO commercial, à déposer le MoO3 de différentes épaisseurs sur le verre conducteur FTO et à préparer de manière séquentielle des couches de film mince pour obtenir un dispositif de cellule solaire semi-transparent cuivre-zinc-étain-soufre-sélénium qui utilise du FTO/FTO-MoO3 en tant qu'électrode arrière. L'utilisation d'une électrode arrière semi-transparente ajoute une pluralité de possibilités pour l'application d'une cellule solaire à film mince, consistant à générer de l'énergie électrique à partir d'une surface arrière. Par conséquent, la cellule solaire à film mince devient un dispositif à double-face et présente ainsi des potentiels d'application industriels importants.
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TWI777786B (zh) * | 2021-09-27 | 2022-09-11 | 凌巨科技股份有限公司 | 穿透型太陽能電池 |
CN114005903B (zh) * | 2021-11-01 | 2023-11-17 | 中国科学院物理研究所 | 具有背界面电场的铜锌锡硫硒太阳能电池及其制备方法 |
CN114899280B (zh) * | 2022-05-11 | 2024-07-12 | 中南大学 | 一种镉掺杂的铜锌锡硫硒薄膜制备方法及其在太阳能电池中的应用 |
CN115557868A (zh) * | 2022-09-23 | 2023-01-03 | 南京邮电大学 | 一种基于硫脲和醋酸铜的金属硫脲配合物及其衍生物与应用 |
CN115458616B (zh) * | 2022-11-14 | 2023-03-10 | 成都中建材光电材料有限公司 | 双面发电玻璃及其制作方法 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104120467A (zh) * | 2014-07-23 | 2014-10-29 | 陕西师范大学 | 一种组成可控的铜锌锡薄膜材料和铜锌锡硫基太阳能电池及其两者的制备方法 |
US20160126376A1 (en) * | 2014-10-31 | 2016-05-05 | Korea Institute Of Science And Technology | Method for manufacturing thin film solar cell and module structure of thin film solar cell |
US20160141434A1 (en) * | 2014-11-13 | 2016-05-19 | International Business Machines Corporation | Hybrid Vapor Phase-Solution Phase Growth Techniques for Improved CZT(S,Se) Photovoltaic Device Performance |
CN107681009A (zh) * | 2017-08-25 | 2018-02-09 | 广东工业大学 | 一种铜锌锡硫硒半导体薄膜的制备方法及其应用 |
CN113078225A (zh) * | 2021-03-29 | 2021-07-06 | 南京邮电大学 | 一种铜锌锡硫硒半透明太阳能电池器件及其制备方法 |
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Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104120467A (zh) * | 2014-07-23 | 2014-10-29 | 陕西师范大学 | 一种组成可控的铜锌锡薄膜材料和铜锌锡硫基太阳能电池及其两者的制备方法 |
US20160126376A1 (en) * | 2014-10-31 | 2016-05-05 | Korea Institute Of Science And Technology | Method for manufacturing thin film solar cell and module structure of thin film solar cell |
US20160141434A1 (en) * | 2014-11-13 | 2016-05-19 | International Business Machines Corporation | Hybrid Vapor Phase-Solution Phase Growth Techniques for Improved CZT(S,Se) Photovoltaic Device Performance |
CN107681009A (zh) * | 2017-08-25 | 2018-02-09 | 广东工业大学 | 一种铜锌锡硫硒半导体薄膜的制备方法及其应用 |
CN113078225A (zh) * | 2021-03-29 | 2021-07-06 | 南京邮电大学 | 一种铜锌锡硫硒半透明太阳能电池器件及其制备方法 |
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Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN115261827A (zh) * | 2022-06-29 | 2022-11-01 | 安徽工程大学 | 一种硫化铟锌复合普鲁士蓝薄膜的制备方法 |
CN115261827B (zh) * | 2022-06-29 | 2023-08-11 | 安徽工程大学 | 一种硫化铟锌复合普鲁士蓝薄膜的制备方法 |
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