WO2022199119A1 - 基站 - Google Patents

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Publication number
WO2022199119A1
WO2022199119A1 PCT/CN2021/135581 CN2021135581W WO2022199119A1 WO 2022199119 A1 WO2022199119 A1 WO 2022199119A1 CN 2021135581 W CN2021135581 W CN 2021135581W WO 2022199119 A1 WO2022199119 A1 WO 2022199119A1
Authority
WO
WIPO (PCT)
Prior art keywords
baffles
base station
baffle
cleaning robot
entrance
Prior art date
Application number
PCT/CN2021/135581
Other languages
English (en)
French (fr)
Inventor
郑连荣
Original Assignee
深圳市银星智能科技股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 深圳市银星智能科技股份有限公司 filed Critical 深圳市银星智能科技股份有限公司
Publication of WO2022199119A1 publication Critical patent/WO2022199119A1/zh

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Classifications

    • AHUMAN NECESSITIES
    • A47FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47LDOMESTIC WASHING OR CLEANING; SUCTION CLEANERS IN GENERAL
    • A47L11/00Machines for cleaning floors, carpets, furniture, walls, or wall coverings
    • A47L11/24Floor-sweeping machines, motor-driven
    • AHUMAN NECESSITIES
    • A47FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47LDOMESTIC WASHING OR CLEANING; SUCTION CLEANERS IN GENERAL
    • A47L11/00Machines for cleaning floors, carpets, furniture, walls, or wall coverings
    • A47L11/28Floor-scrubbing machines, motor-driven
    • A47L11/284Floor-scrubbing machines, motor-driven having reciprocating tools
    • AHUMAN NECESSITIES
    • A47FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47LDOMESTIC WASHING OR CLEANING; SUCTION CLEANERS IN GENERAL
    • A47L11/00Machines for cleaning floors, carpets, furniture, walls, or wall coverings
    • A47L11/40Parts or details of machines not provided for in groups A47L11/02 - A47L11/38, or not restricted to one of these groups, e.g. handles, arrangements of switches, skirts, buffers, levers
    • AHUMAN NECESSITIES
    • A47FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47LDOMESTIC WASHING OR CLEANING; SUCTION CLEANERS IN GENERAL
    • A47L11/00Machines for cleaning floors, carpets, furniture, walls, or wall coverings
    • A47L11/40Parts or details of machines not provided for in groups A47L11/02 - A47L11/38, or not restricted to one of these groups, e.g. handles, arrangements of switches, skirts, buffers, levers
    • A47L11/4002Installations of electric equipment
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61LMETHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
    • A61L2/00Methods or apparatus for disinfecting or sterilising materials or objects other than foodstuffs or contact lenses; Accessories therefor
    • A61L2/02Methods or apparatus for disinfecting or sterilising materials or objects other than foodstuffs or contact lenses; Accessories therefor using physical phenomena
    • A61L2/08Radiation
    • A61L2/10Ultraviolet radiation
    • AHUMAN NECESSITIES
    • A47FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47LDOMESTIC WASHING OR CLEANING; SUCTION CLEANERS IN GENERAL
    • A47L2201/00Robotic cleaning machines, i.e. with automatic control of the travelling movement or the cleaning operation
    • AHUMAN NECESSITIES
    • A47FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47LDOMESTIC WASHING OR CLEANING; SUCTION CLEANERS IN GENERAL
    • A47L2201/00Robotic cleaning machines, i.e. with automatic control of the travelling movement or the cleaning operation
    • A47L2201/02Docking stations; Docking operations
    • AHUMAN NECESSITIES
    • A47FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47LDOMESTIC WASHING OR CLEANING; SUCTION CLEANERS IN GENERAL
    • A47L2201/00Robotic cleaning machines, i.e. with automatic control of the travelling movement or the cleaning operation
    • A47L2201/02Docking stations; Docking operations
    • A47L2201/022Recharging of batteries
    • AHUMAN NECESSITIES
    • A47FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47LDOMESTIC WASHING OR CLEANING; SUCTION CLEANERS IN GENERAL
    • A47L2201/00Robotic cleaning machines, i.e. with automatic control of the travelling movement or the cleaning operation
    • A47L2201/02Docking stations; Docking operations
    • A47L2201/028Refurbishing floor engaging tools, e.g. cleaning of beating brushes

Definitions

  • the present application relates to the field of cleaning equipment, and in particular, to a base station.
  • the cleaning robot is a kind of intelligent cleaning equipment, which plays a great role in the home and office environment, so that people do not have to worry about cleaning.
  • Cleaning robots usually include battery components and charging poles. When feeding power, the cleaning robot can be charged for battery life through the base station.
  • the traditional base station usually includes a charging terminal, which is connected with the power supply terminal and can be used to charge the cleaning robot.
  • a charging terminal which is connected with the power supply terminal and can be used to charge the cleaning robot.
  • the purpose of the present application is to provide a base station capable of opening and closing the entrance.
  • a base station comprising:
  • a base has: a workbench, the workbench is for the cleaning robot to stop; an entrance for the cleaning robot to enter;
  • a baffle assembly the baffle assembly includes at least one baffle, all the baffles can be opened and closed at the entrance, and at least partially block the entrance when closed.
  • a workbench for the cleaning robot to park on and an entrance for the cleaning robot to enter are arranged on the base, and by setting a baffle assembly, the baffle assembly includes at least one baffle, and all the baffles can be opened and closed It is arranged at the entrance, and at least partially blocks the entrance when closed. Since the entry of the cleaning robot needs to be provided with an opening, there is a problem that the size of the opening cannot be smaller than the size of the cleaning robot. Part of the entrance is covered.
  • the size of the opening becomes smaller, which can at least partially isolate the workbench from the outside world at the entrance, reducing the probability of possible sewage splashing, and the obstruction of sound waves increases, reducing the possible noise transmission, which solves the problem that the open base station cannot connect the workbench to the outside.
  • the problem of isolation from the outside world, especially when the entrance is completely shielded, can greatly reduce noise and completely isolate sewage from splashing out.
  • all the baffles are rotatably connected with the base at the position of the inlet, and the rotatable connection realizes opening and closing.
  • the baffle assembly includes a baffle, and the baffle is arranged at the upper or lower part of the entrance.
  • the baffle is first pushed inward, and after entering completely, the baffle is blocked.
  • the plate swings back to its original position; in the process of exiting, the cleaning robot first pushes the baffle to turn outwards, and after completely exiting, the baffle returns to its original position, and the structure is simple.
  • the base station further includes:
  • the lever assembly includes an action end and an action end, the action end is arranged on the driving path of the cleaning robot in the base, the baffle assembly includes a baffle, the baffle Located on the action path of the action end, when the action end moves, the action end drives the baffle to move to at least partially block the entrance.
  • the baffle is closed by the gravity of the cleaning robot, and the cleaning robot is reset from the rear baffle.
  • the base station further includes:
  • a first guide piece extends to the surface to be cleaned, and is used to guide the cleaning robot to drive into the base
  • the baffle plate is rotatably connected with the first guide piece, and is in the unused position at the action end.
  • the baffle rotates to fit with the first guide, and when the working end is in the pressing state under the gravity of the cleaning robot, the baffle rotates to at least partially block the entrance.
  • the baffle is attached to the first guide member, and can be used as a guide plate for guiding the cleaning robot in a natural state, and can be used as a blocking structure for blocking ultraviolet leakage and sewage splashing in a gravity state.
  • the baffle assembly includes two baffles arranged opposite to each other; the two baffles are respectively arranged on the upper part and the lower part of the inlet, or, the two baffles are respectively arranged on the left side and the lower part of the inlet. Right.
  • the two oppositely arranged baffles can reduce the length of a single baffle and save the occupied volume.
  • the baffle assembly includes four baffles arranged opposite to each other, the four baffles are respectively arranged around the entrance, and when closed, the four baffles enclose the entrance at least partially. occlusion structure.
  • the two oppositely arranged baffles can reduce the length of a single baffle and save the occupied volume.
  • the baffle assembly includes at least four baffles, and when all the baffles are closed, all the baffles enclose a middle gap, and the middle gap cooperates with the cleaning robot to form a device capable of generating ultraviolet rays.
  • a shielding structure that blocks all direct ultraviolet rays.
  • the leakage of direct UV rays can be prevented by cleaning the robot and the central notch.
  • the baffle assembly includes at least one baffle, all the baffles are square, and all the baffles are enclosed to a shielding structure that at least partially shields the entrance.
  • the baffle can be square.
  • the baffle assembly includes at least four baffles, all of the baffles are trapezoidal, and all the baffles enclose a shielding structure that at least partially shields the entrance.
  • the baffle may be trapezoidal.
  • the base station further includes:
  • the ultraviolet generating device is arranged in the base, and the coverage of the ultraviolet rays emitted by the ultraviolet generating device covers the mopping member of the cleaning robot;
  • the baffles are UV-impermeable baffles, and when all the baffles are closed, all the baffles move to at least partially block the entrance.
  • UV-opaque baffles block UV rays.
  • the base station further includes:
  • the sewage tank is arranged in the base;
  • the coverage of the ultraviolet rays emitted by the ultraviolet generating device covers the sewage tank or/and the mopping member of the cleaning robot.
  • the coverage of the ultraviolet rays emitted by the ultraviolet generating device can cover the recovery tank or the wiper individually, or can cover the recovery tank and the wiper.
  • the base station of the present application by setting a base, a workbench for the cleaning robot to rest on and an entrance for the cleaning robot to enter are arranged on the base, and a baffle assembly is provided, and the baffle assembly includes at least one baffles, all the baffles can be opened and closed at the entrance, and at least partially block the entrance when closed, since the entry of the cleaning robot needs to be provided with an opening, the size of the opening cannot be smaller than the cleaning robot
  • the size of the problem, the part of the entrance is shielded, and the size of the opening becomes smaller, which can at least partially isolate the workbench from the outside world at the entrance, reducing the probability of possible splashing of sewage, and increasing the obstruction of sound waves, reducing possible noise transmission.
  • the base station of the present application has the characteristics of low noise, anti-splash of sewage and good user experience.
  • Fig. 1 is the structural representation of cleaning robot
  • FIG. 2 is a three-dimensional exploded view of a base station of the present application
  • FIG. 3 is a schematic diagram of the base station of the present application in a working state
  • FIG. 4 is a schematic diagram of the base station of the present application in a working state
  • FIG. 5 is a schematic structural diagram of a base station according to another embodiment
  • Fig. 6 is the positional relationship diagram of cleaning robot and base station
  • FIG. 7 is a schematic structural diagram of a workbench according to another embodiment
  • Fig. 8 is the structural representation of ultraviolet generating device
  • Fig. 9 is the structural representation of the ultraviolet generating device of another embodiment.
  • FIG. 10 is a schematic structural diagram of an ultraviolet generating device according to another embodiment
  • Figure 11 is a schematic diagram of the connection relationship between the mounting plate and the base
  • 12a to 12h are schematic diagrams of another eight embodiments of the ultraviolet generating device.
  • Figure 13 is a schematic diagram of the connection relationship between a strip-shaped ultraviolet lamp tube and a clapboard
  • FIG. 14 is a schematic diagram of another connection relationship between a strip-shaped ultraviolet lamp tube and a partition
  • FIGS 15a-15h are schematic views of eight embodiments of baffle assemblies and inlets
  • Figure 16 is a schematic view of the lever assembly in a working state
  • Figure 17 is a schematic view of the lever assembly in an idle state
  • 19 is a schematic structural diagram of a first elastic seal
  • Figure 20 is a schematic diagram of the connection relationship between the second elastic seal and the second opening
  • 21a to 21c are schematic structural diagrams of three embodiments of the second opening
  • Fig. 22 is the working state schematic diagram of another connection mode of the baffle plate and the base;
  • Fig. 23 is the idle state schematic diagram of another connection mode of the baffle plate and the base;
  • Figure 24a and Figure 24b are schematic views of two embodiments of rail-type connection
  • Figure 25 is a schematic diagram of the connection relationship between the elastic sealing ring and the baffle
  • Figure 26 is a diagram of the connection relationship between the elastic sealing strip and the concave portion
  • Figure 27 is a schematic diagram of the connection relationship between the third elastic seal and the inlet
  • Figure 28 is a schematic diagram of the connection relationship between the third elastic seal and the inlet according to another embodiment
  • Figure 29 is a schematic diagram of the connection relationship between the drive unit and the baffle
  • Figure 30 is a schematic structural diagram of a drive unit
  • 31 is a schematic diagram of the connection relationship between the drive unit and the baffle plate according to the modified embodiment
  • FIG. 32 is a schematic diagram of the positional relationship between the first sensing unit, the second sensing unit and the base.
  • the surface to be cleaned may be a surface to be cleaned that needs to be cleaned, such as a carpet and a floor.
  • FIG. 1 is a schematic structural diagram of a cleaning robot.
  • the base station of the present application can be applied to the cleaning robot 1, and the base station can be used for charging the cleaning robot 1 or/and cleaning the mopping member 11 of the cleaning robot 1, as follows:
  • the cleaning robot 1 can be classified into commercial cleaning robots and household cleaning robots by use, and can be automatic cleaning robots such as sweepers, sweeping and mopping all-in-one machines, mopping machines, mopping machines, and floor washing machines.
  • the cleaning robot 1 can be in the shape of an ellipse, a circle, a D shape, etc., and is optionally provided with a cleaning module, a water tank for supplying water to the cleaning module, and a walking component for walking.
  • the assembly includes a middle travel wheel 13, a left travel wheel and a right travel wheel.
  • the mopping member 11, the mopping member 11 can be a flat mopping member 11, such as a flat mop, or a roller-shaped mopping member 11, such as a sponge roller brush or other rollers wrapped with mopping materials such as cloth strips. axis.
  • the mopping member 11 can be arranged on the front half or the rear half of the bottom of the main body of the cleaning robot 1. When the mopping member 11 is arranged in the front half, the cleaning robot 1 directly drives into the base station. Halfway through, the cleaning robot 1 retreats into the base station.
  • the drive wheel group 12 includes a left travel wheel and a right travel wheel.
  • the left travel wheel can be provided with a drive motor, and a transmission assembly is provided between the drive motor and the left travel wheel, and the left travel wheel can be rotated and arranged on the cleaning robot.
  • the bottom of the main body of 1; the right walking wheel can be arranged at the bottom of the main body of the cleaning robot 1, and is arranged symmetrically with the left walking wheel, that is, a driving motor is provided, and a transmission component is arranged between the driving motor and the right walking wheel, and the right walking wheel is arranged. It can be rotatably arranged on the main body of the cleaning robot 1;
  • the middle walking wheel 13 is arranged at the bottom of the cleaning robot 1 to cooperate with the left and right walking wheels of the cleaning robot 1 on both sides to form a three-point support to support the cleaning robot 1 to run on the surface to be cleaned .
  • the front collision component is a component disposed on the main body of the cleaning robot 1 to sense the front collision, and the front part is the side of the main body that is close to the traveling direction of the cleaning robot 1 .
  • the front collision assembly includes a semi-circular frame body and switches arranged on the left and right sides of the front of the main body.
  • the frame body is horizontally connected to the front of the main body.
  • the switch on the side makes the cleaning robot 1 make corresponding actions such as avoidance.
  • the cleaning robot 1 can also choose to set various components such as control components, distance sensing components, and cliff sensors as required.
  • the cleaning method of the base station for the cleaning robot 1 may be water washing or dry cleaning, specifically, mechanical friction type water washing, or ultrasonic water washing.
  • FIG. 2 is a three-dimensional exploded view of the base station of the present application
  • FIG. 3 is a schematic diagram of the base station of the present application in a working state
  • FIG. 4 is a schematic diagram of the base station of the present application in a working state.
  • the base station of the present application may be a base station used to implement one or more of the tasks of charging the cleaning robot 1, cleaning the mopping member 11, drying the mopping member 11, collecting dust, etc.
  • the base station includes:
  • the base 2 can have an entrance 21 for the cleaning robot 1 to enter and exit, the entrance 21 can be a semi-open entrance 21, which can form an opening, and the open entrance 21 is convenient for sealing or blocking the entrance 21,
  • the opening may be an opening in the form of a groove, or an opening through which the top is penetrated on the basis of the groove, or may be an opening of other shapes.
  • the inlet 21 may also be a fully open inlet 21 , and the fully open inlet 21 can be seen in FIG. 7 .
  • the base 2 also has:
  • the workbench 3 is for the cleaning robot 1 to stop, and the workbench 3 extends to the surface to be cleaned; the workbench 3 can be used for cleaning the mopping member 11 of the cleaning robot 1 or charging the cleaning robot 1, Alternatively, the mopping member 11 is sterilized by ultraviolet rays or the like, or other operations are performed on the cleaning robot 1 to maintain or replace parts.
  • the workbench 3 can be detachably connected with the base 2 .
  • the cleaning robot 1 can be docked on the workbench 3 to perform the above-mentioned work.
  • the cleaning robot 1 can directly climb on the worktable 3.
  • a docking board that can move up and down can be set up, and the cleaning robot 1 can be parked at the entrance 21.
  • the cleaning robot 1 will be lifted to the height of the working surface by lifting the docking plate to work.
  • the workbench 3 can be used for cleaning the mopping member 11 and charging the cleaning robot 1 at the same time.
  • the base station further includes:
  • a cleaning mechanism 5, the cleaning mechanism 5 is used for cleaning the mopping member 11 of the cleaning robot 1, and the cleaning mechanism 5 has a cleaning groove 51 for cleaning the mopping member 11 of the cleaning robot 1; the base 2 also has A first guide 6 extending from the cleaning slot 51 to the surface to be cleaned, the first guide 6 and the cleaning slot 51 form the work for cleaning the mop 11 Desk 3.
  • the cleaning mechanism 5 also includes a cleaning member.
  • the cleaning member is inactive.
  • the cleaning member may include a raised portion 52 and a connecting plate. The connecting plate is fixedly connected to the upper portion of the cleaning tank 51.
  • the raised portion 52 Set on the connection board. Mechanical friction decontamination is achieved through the movement of the mopping member 11 on the cleaning robot 1 and the relative movement of the raised portion 52 .
  • the cleaning member may also be movable, such as driven by electricity.
  • the cleaning member can be driven to rotate relative to the plate-shaped mopping member 11, or move relative to the plate-shaped mopping member 11.
  • the roller-shaped wiping element 11 moves relative to each other to achieve mechanical friction decontamination.
  • the mopping member 11 may also be cleaned by means of dry cleaning, ultrasonic cleaning, or the like.
  • the worktable 3 can also clean the mopping member 11 alone, or charge the cleaning robot 1 alone, as shown in FIG. 7 .
  • the base station is provided with:
  • the ultraviolet generating device 4 is arranged in the base 2 , and the ultraviolet rays emitted by the ultraviolet generating device 4 cover the mopping member 11 of the cleaning robot 1 .
  • the ultraviolet generating device 4 can be sterilized by the ultraviolet lamp 41 alone, or can be combined with titanium dioxide for strong sterilization.
  • the ultraviolet generating device 4 may include at least one ultraviolet lamp 41 .
  • the disinfection and sterilization is performed by the ultraviolet lamp 41, and the number of the ultraviolet lamp 41 can be single, two or more.
  • the location, coverage, and quantity of the ultraviolet lamps 41 can be in various forms, as shown in FIG. 8 to FIG. 18 .
  • the sewage tank 54, the sewage tank 54 is arranged in the base 2, the ultraviolet generating device 4 is arranged in the base 2, and the coverage of the ultraviolet rays emitted by it can cover the sewage tank 54 or/and the cleaning robot 1, the sewage tank 54 can be a part of the cleaning tank 51, for example, by disposing a partition 53 in the cleaning tank 51 to form an upper cleaning space and a lower sewage tank 54, see FIG. 5 for details.
  • the sewage tank 54 can also be a separate box, which is arranged at the lower part or the upper part of the cleaning tank 51 .
  • FIGS 2 to 3 show the process of the cleaning robot 1 entering the base station from the surface to be cleaned, and its working principle is as follows:
  • the cleaning robot 1 When the cleaning robot 1 enters the workbench 3 , the cleaning robot 1 climbs along the slope of the first guide member 6 and places its mopping member 11 in the cleaning groove 51 , where the mopping member 11 is in the cleaning groove 51 While cleaning, the ultraviolet generating device 4 can emit ultraviolet light to perform ultraviolet sterilization and disinfection on the mopping member 11, or after the mopping member 11 is cleaned, the ultraviolet generating device 4 can sterilize and disinfect the mopping member 11.
  • the seat 2 solves the problem that the mopping member 11 is not disinfected and there are bacteria and may cause mildew and odor, and compared with the structure of sterilizing sewage, it directly irradiates the mopping member 11, and after the mopping member 11 is disinfected, it can continue to go to be cleaned Clean the surface, always keep the mopping member 11 in a sterilized state, and prevent the bacteria on the cleaned area from being carried by the mopping member 11 to the uncleaned area for further contamination.
  • FIG. 5 is a schematic structural diagram of a base station according to another embodiment
  • FIG. 6 is a positional relationship diagram between a cleaning robot and the base station
  • FIG. 7 is a structural schematic diagram of a workbench according to another embodiment.
  • FIG. 5 shows that the entrance 21 of the base station can be extended, and its length can be preset according to the size of the cleaning robot 1, and a partition 53 is also provided in the cleaning tank 51, and the partition 53 separates the cleaning tank 51 into upper
  • the cleaning area and the lower water storage area, the lower water storage area is the sewage tank 54
  • the baffle 53 forms an opening in the cleaning tank 51
  • the sewage can flow into the sewage tank 54 through the opening, and there is no need to set a sewage pipeline, and there is no need to worry about clogging question.
  • the sewage tank 54 may not be integrated with the cleaning tank 51 , but may be configured to be extracted separately, and it may be located at the lower part or the rear of the cleaning tank 51 .
  • the ultraviolet generating device 4 is provided on the upper part of the partition plate 53 .
  • the ultraviolet generating device 4 may have various installation positions, as shown in FIGS. 12 a to 12 f for details.
  • the base station can clean the mopping member 11 and charge the cleaning robot 1. At this time, the base station has:
  • the charging pole piece can be arranged on the upper part of the cleaning tank 51 to prevent the cleaning liquid and sewage from contaminating the charging pole piece or causing the base station to be disconnected to a certain extent.
  • the mopping member 11 of the cleaning robot 1 enters the cleaning tank 51 , the base station cleans the mopping member 11 of the cleaning robot 1 , and the charging pole piece of the base station abuts the charging end on the cleaning robot 1 .
  • the table 3 may be formed by a first guide 6, a cleaning slot 51 and a second guide 7, and the base 2 also has a first guide 6 extending from the cleaning slot 51 to For the surface to be cleaned, the first guide member 6 , the cleaning groove 51 and the second guide member 7 form the worktable 3 for cleaning the mopping member 11 .
  • the second guide member 7 is disposed on the cleaning tank 51 and located in the middle of the cleaning tank 51 to guide the middle traveling wheel 13 of the cleaning robot 1 into the cleaning tank 51 .
  • the workbench 3 can also be the table top of the charging stand.
  • the ultraviolet light generating lamp is set at the lower part of the workbench 3, and the top of the workbench 3 is set as a top that can transmit ultraviolet rays, such as quartz glass and other materials, or directly
  • the ultraviolet lamp 41 is arranged on the surface of the worktable 3 , and the ultraviolet lamp 41 is covered by the bottom of the cleaning robot 1 .
  • the workbench 3 may also be other workbenches 3 used for maintenance or cleaning of the cleaning robot.
  • FIG. 8 is a schematic structural diagram of an ultraviolet generating device.
  • the ultraviolet generating device 4 further includes: an annular cover 42 , the annular cover 42 surrounds the outer periphery of at least one of the ultraviolet lamps 41 .
  • the UV-impermeable annular cover 42 can limit the emission range of the UV lamp 41 and has a certain effect of gathering the UV rays.
  • the ultraviolet-transmitting annular cover 42 can be used as a mounting seat for the ultraviolet lamp 41 .
  • the annular cover 42 is a condensing cover in the shape of a truncated cone.
  • the annular cover 42 corresponds to the ultraviolet lamp 41 one-to-one.
  • Two ultraviolet lamps 41 are included, and the two annular cover bodies 42 face two positions of the two mopping members 11 of the cleaning robot 1 or a single mopping member 11 respectively.
  • the truncated condensing cover body can gather the ultraviolet rays to enhance the disinfection and sterilization effect, and when the mopping members 11 are two rotating mopping members 11 that are roughly circular in shape, each ultraviolet lamp 41 can correspond to one mopping member individually. 11, the irradiation is targeted, reducing the leakage of ultraviolet rays and irradiating the human body, which affects human health, and the sterilization and disinfection effect on the mopping member 11 is stronger.
  • FIG. 9 is a schematic structural diagram of an ultraviolet generating device according to another embodiment.
  • the difference from the previous embodiment is that firstly, the ultraviolet generating device 4 also includes an annular cover body 42, and the annular cover body 42 is specifically a square cover body, and the shape is different from that of a truncated cone; Second, the ultraviolet generating device 4 in this embodiment is an elongated ultraviolet lamp 41 , which can cover a wide range in the horizontal direction, and is more suitable for a flat-type mopping member 11 .
  • FIG. 10 is a schematic structural diagram of an ultraviolet generating device according to another embodiment
  • FIG. 11 is a schematic diagram of the connection relationship between the mounting plate and the base.
  • the ultraviolet lamp 41 is independently set up, which can be extracted outside the base station.
  • the ultraviolet lamp 41 is set on the annular cover 42 and is provided with a mounting plate 43 and a handle 44 at the end.
  • the handle 44 Set on the mounting plate 43, the mounting plate 43 can be detachably connected with the base 2, the annular cover 42 penetrates the cleaning slot 51 at both ends of the width direction of the cleaning slot 51 and protrudes to the base 2, and passes through the mounting plate 43.
  • the ultraviolet lamp 41 and the power cord are covered to facilitate lamp replacement and maintenance of the ultraviolet lamp 41 . It is worth noting that in this embodiment, the length of the ultraviolet lamp 41 and the length of the annular cover 42 are too long, and a sectional view is taken to show the details.
  • FIGS. 12 a to 12 h are schematic diagrams of another eight embodiments of the ultraviolet generating device.
  • the ultraviolet generating device 4 may have different forms in terms of the number, installation position and structural form of the ultraviolet lamps 41 .
  • the ultraviolet generating device 4 may have different forms in terms of the number of ultraviolet lamps 41.
  • the ultraviolet generating device 4 includes two ultraviolet lamps 41, and the two ultraviolet lamps 41 are respectively located on the two sides of the workbench 3 along the entry direction of the cleaning robot 1. , because the space between the cleaning robot 1 and the cleaning tank 51 is limited, the ultraviolet rays irradiated on the side are limited, the ultraviolet rays on both sides can be more comprehensive, and are more suitable for the cleaning robot 1 with two mopping members 11 on the left and right sides.
  • the ultraviolet generating device 4 includes a plurality of ultraviolet lamps 41, which are arranged in a certain shape, so as to clean the mopping member 11 to a greater extent.
  • the ultraviolet generating device 4 includes a single ultraviolet lamp 41, which can be arranged along the entry direction of the cleaning robot 1, or horizontally and vertically to this direction.
  • the ultraviolet generating device 4 can have different forms in the setting position of the ultraviolet lamp 41.
  • In the vertical direction for example, it can be arranged on the side of the connecting plate, or between the connecting plate and the partition plate 53, or can be arranged on the partition plate.
  • the lower part of 53 for example, can be arranged at the lower part of the workbench 3 , such as the lower part of the cleaning tank 51 .
  • In the horizontal direction more than two ultraviolet lamps 41 can be arranged on both sides of the entering square along the cleaning robot 1, or arranged in a certain shape, and a single ultraviolet lamp 41 can be arranged along the entering direction of the cleaning robot 1, or horizontally and vertically with this direction. .
  • the ultraviolet generating device 4 can have different forms in structure, for example, a ring-shaped cover 42 is provided, and the annular cover 42 can be opaque to ultraviolet rays, or can be transparent to ultraviolet rays, or can be driven to rotate by a motor, or can be Fixed angle.
  • Fig. 12a shows one embodiment of the ultraviolet generating device 4, all the ultraviolet lamps 41 are arranged on the worktable 3, and are located at the lower part of the parking position of the cleaning robot 1 on the worktable 3, and the ultraviolet lamps 41 41 can be arranged between the cleaning robot 1 and the bottom of the workbench 3, and directly irradiate the mopping member 11.
  • the cleaning tank 51 is provided with a connecting plate provided with a raised portion 52, and a partition plate 53 for separating the sewage tank 54.
  • the ultraviolet generating device 4 is arranged between the connecting plate and the partition plate 53.
  • UV-transmitting materials such as quartz glass, other UV-transmitting glass, or UV-transmitting plastics.
  • the orientation of the ultraviolet lamp 41 can be controlled by motor driving.
  • the base station further includes a sewage tank 54 located at the lower part of the cleaning mechanism 5 .
  • Fig. 12b shows another embodiment of the ultraviolet generating device 4.
  • the cleaning mechanism 5 includes a partition plate 53 and a cleaning tank 51.
  • the ultraviolet generating device 4 is arranged at the lower part of the partition plate 53 and is located on both sides of the entering direction of the cleaning robot 1.
  • the partition plate 53 is made of ultraviolet-transmitting material, and the ultraviolet generating device 4 in this position can irradiate both the sewage in the sewage tank 54 and the mopping member 11 .
  • Fig. 12c shows yet another embodiment of the ultraviolet generating device 4, the cleaning mechanism 5 includes a partition 53, the ultraviolet generating device 4 includes a long strip ultraviolet lamp 41, and the length direction of the ultraviolet lamp 41 is arranged along the width of the cleaning tank 51, That is, it is arranged along the lateral direction of the cleaning robot 1, and the ultraviolet generating device 4 with this structure can irradiate the mopping member 11 in a maximum range.
  • both the annular cover 42 and the partition plate 53 can be made of UV-transparent materials, which not only irradiate the sewage in the sewage tank 54 but also irradiate the mopping member 11 .
  • the coverage of the ultraviolet rays emitted by the ultraviolet generating device 4 can optionally cover the sewage tank 54, and the ultraviolet generating device 4 can also clean the sewage tank 54, and the coverage is wide.
  • the annular cover 42 is made of a material such as a metal material that is impermeable to ultraviolet rays, it may not irradiate the sewage tank 54 .
  • the coverage range of the ultraviolet rays emitted by the ultraviolet generating device 4 can also be set to cover the sewage tank 54 independently.
  • Fig. 12d shows yet another embodiment of the ultraviolet generating device 4, and the ultraviolet generating device 4 may be a combination of various manners, such as a combination of the embodiment shown in Fig. 12a and the embodiment shown in Fig. 12c.
  • Fig. 12e shows a variant embodiment of the ultraviolet generating device 4, the ultraviolet generating device 4 can be in the shape of a bulb, and the irradiation angle thereof can be adjusted by a motor.
  • the wiper 11 needs to be irradiated toward the wiper 11
  • the waste tank 54 needs to be irradiated, it is rotated to irradiate the sewage in the waste tank 54 .
  • Fig. 12f shows another modified embodiment of the ultraviolet generating device 4, which is different from the embodiment shown in Fig. 12a in that the partition plate 53 is not provided, and the annular cover 42 has a lower notch, so there is no need to control the rotation of the annular cover 42 , the sewage in the sewage tank 54 and the mopping member 11 of the cleaning robot 1 can be irradiated at the same time.
  • Figure 12g shows another variant embodiment of the ultraviolet generating device 4, and the base station further includes:
  • the second guide member 7 is arranged on the cleaning tank 51 and located in the middle of the cleaning tank 51 to guide the middle traveling wheel 13 of the cleaning robot 1 into the cleaning tank 51; the ultraviolet generating device 4 is arranged on the second guide 7 .
  • the ultraviolet generating device 4 may be installed in the middle of the cleaning tank 51 .
  • the second guide member 7 is made of ultraviolet-transmitting material.
  • Fig. 12h shows yet another variant embodiment of the ultraviolet generating device 4, the second guide member 7 is a second guide member 7 having a central cavity, and the ultraviolet lamp 41 is arranged in the central cavity, which can The ultraviolet generating device 4 is installed inside the second guide 7 .
  • the second guide member 7 is made of ultraviolet-transmitting material.
  • the second guide member 7 can cooperate with the fan assembly 55 , the central cavity is actually a wind cavity, and the air flow generated by the fan assembly 55 is sprayed from the middle cavity of the second guide member 7 to both sides in the width direction of the second guide member 7 .
  • the ultraviolet lamp 41 can not only sterilize the sewage in or at the lower part of the cleaning tank 51 , but also can sterilize the airflow of the fan assembly 55 , and can also sterilize the mopping member 11 .
  • the installation positions of the fan assembly 55 are also diversified. Considering the integrated installation, the fan assembly 55 can also be disposed in the central cavity of the second guide member 7 .
  • the fan assembly 55 can be used to dry the mopping member 11 or/and the cleaning tank 51 of the cleaning robot 1.
  • the output end of the fan assembly 55 faces the mopping member 11 or/and the cleaning tank 51.
  • the ultraviolet generating devices 4 of the above-mentioned various embodiments may be combined.
  • the position of the ultraviolet generating device 4 shown in FIG. 12e can also be changed, for example, the height of the ultraviolet generating device 4 can be reduced, or the partition plate 53 can be arranged in the cleaning tank 51, and the ultraviolet generating device 4 can be arranged in the The lower part of the partition 53 .
  • the ultraviolet generating device 4 may be irradiated vertically upward, or may be irradiated obliquely upward.
  • the bottom of the workbench 3 is a bottom that can transmit ultraviolet rays, and all the ultraviolet lamps 41 are arranged at the lower part of the workbench 3.
  • the ultraviolet lamps 41 are arranged at the lower part of the workbench 3.
  • FIG. 13 is a schematic diagram of the connection relationship between the strip-shaped ultraviolet lamp tube and the separator.
  • FIG. 14 is a schematic diagram of another connection relationship between the strip-shaped ultraviolet lamp tube and the separator.
  • the annular cover 42 may be integrally or fixedly connected with the partition 53, as shown in FIG. 13 .
  • the connection mode of the annular cover 42 and the partition 53 can be optimized.
  • the annular cover 42 is connected with the partition 53 in a rail-type connection.
  • the partition plate 53 is provided with a guide groove, and the guide rail-type connection is realized through the cooperation of the guide bar and the guide groove, and the annular cover 42 can be directly pulled away from the partition plate 53, as shown in FIG. 14 .
  • 15a-15h are schematic diagrams of eight embodiments of baffle assemblies and inlets.
  • the base station also includes:
  • the baffle assembly 8, the base 2 also has an entrance 21 for the cleaning robot 1 to enter, the baffle assembly 8 includes at least one baffle 81, and all the baffles 81 can be opened and closed at the entrance 21 , and form an ultraviolet blocking structure with the entrance 21 when it is closed, which can block ultraviolet rays from being emitted from the entrance 21 .
  • the baffle assembly 8 has at least one baffle 81
  • the base 2 has an inlet 21 for the cleaning robot 1 to enter
  • the baffle 81 is provided in the inlet 21 so as to be openable and closable.
  • the inlet 21 can be at least partially shielded to prevent direct ultraviolet rays from leaking out, or to reduce noise or reduce sewage and stains from splashing out.
  • the baffle assembly 8 includes at least one baffle 81 , and all the baffles 81 are openably and closably disposed at the inlet 21 , and at least partially block the inlet 21 when closed. Since the entry of the cleaning robot 1 needs to be provided with an opening, there is a problem that the size of the opening cannot be smaller than the size of the cleaning robot 1. By shielding at least a part of the entrance 21, the opening size becomes smaller, and the probability of sewage splashing is reduced, and The obstruction of sound waves is increased, and the external transmission of noise is reduced, which solves the problem that the open base station is easy to transmit noise during the cleaning process, and the sewage or stains generated by cleaning are easy to splash out.
  • all the baffles 81 can be opened and closed at the inlet 21 and form a seal with the inlet 21 when closed, because the baffles 81 are located at the inlet 21 when the baffle 81 is closed.
  • the entrance 21 is sealed, and the base station with this structure can isolate the base station and the outside world at the entrance 21 compared to the base station without the baffle 81, and will not cause the entrance 21 of the cleaning robot 1 to be set on the base 2.
  • 21 leaks of possible liquid or gas can also reduce possible noise transmission. It has sealing characteristics and a good user experience.
  • the specific structure and number of baffles 81 can be seen in Figures 15a to 15e, and the specific sealing connection method can be seen in Figures 18 to Figure 19.
  • all the baffles 81 are rotatably connected to the base 2 at the position of the inlet 21 , and the rotation connection realizes opening and closing.
  • the shutter 81 is in an open state, and is in a closed state when the shutter 81 is perpendicular to the horizontal plane.
  • FIG. 15a shows that in one of the embodiments in which the baffle assembly 8 is connected to the inlet 21, the baffle assembly 8 includes two baffles 81 arranged opposite to each other; the two baffles 81 are respectively arranged at the inlet The upper and lower parts of the 21, the baffles 81 arranged opposite to each other can reduce the length of a single baffle 81 and save the occupied volume.
  • Fig. 15b shows another embodiment in which the baffle assembly 8 is connected to the inlet 21, the baffle assembly 8 includes a baffle 81, and the baffle 81 is arranged on the upper part of the inlet 21 to clean
  • the baffle 81 is arranged on the upper part of the inlet 21 to clean
  • the cleaning robot 1 first pushes the baffle 81 to turn out, and after completely exiting, the baffle 81 swings back to its original position.
  • the baffle 81 is restored to its original position, and the structure is simple.
  • the baffle 81 is also arranged at the lower part of the inlet 21 .
  • FIG. 15c The difference between FIG. 15c and the embodiment shown in FIG. 15a is that the two baffles 81 are respectively disposed on the left and right sides of the inlet 21 .
  • FIG. 15d shows another embodiment in which the baffle assembly 8 is connected to the inlet 21.
  • the baffle assembly 8 includes at least one baffle 81, and the specific number may be four, and all the baffles 81 are in the form of at least one baffle plate 81. In a square shape, all the baffles 81 form a shielding structure that at least partially shields the entrance 21 .
  • the baffle 81 may be square, and specifically encloses a shielding structure that completely shields the entrance 21 .
  • FIG. 15e shows yet another embodiment of the baffle assembly 8 being connected to the inlet 21.
  • the baffle assembly 8 includes at least one baffle 81, the specific number may be four, and some of the baffles 81 are in the form of at least one baffle 81. Triangular, the other baffles 81 are trapezoidal, for example, the two baffles 81 facing up and down are trapezoidal, the two baffles 81 facing left and right are triangular, and the four baffles 81 are enclosed to completely block the entrance 21. structure.
  • the shielding structure that completely shields the entrance 21 is convenient to block direct and scattered ultraviolet rays, and can block the airflow blown by the fan assembly 55 of the base station for drying the mopping member 11 from the entrance 21, and the air with bacteria, germs or dust and other substances is blown out.
  • the airflow will not blow directly to the working environment, improving the user experience.
  • FIG. 15f shows a modified embodiment in which the baffle assembly 8 is connected to the inlet 21.
  • the baffle assembly 8 includes at least one of the baffles 81, and the specific number may be four, and all the baffles 81 are closed when the baffles 81 are closed.
  • the shielding structure at least partially shields the entrance 21.
  • the four baffles 81 are arranged opposite to each other, and the four baffles 81 are respectively arranged around the entrance 21. When closed, the four baffles 81 surround the entrance 21.
  • a shielding structure for at least partially shielding the entrance 21 is formed.
  • the two oppositely arranged baffles 81 can reduce the length of a single baffle 81 and save the occupied volume.
  • all the baffles 81 are square, and when all the baffles 81 are closed, all the baffles 81 enclose a central gap 82 , and the central gap 82 cooperates with the cleaning robot 1 to form the ultraviolet generating device 4 .
  • the central gap 82 can cooperate with the main body of the cleaning robot 1 to prevent the ultraviolet rays in the base station from being directly emitted from the entrance 21 and causing damage to the human body.
  • FIG. 15g shows another variant embodiment in which the baffle assembly 8 is connected to the inlet 21.
  • the baffle assembly 8 includes at least four of the baffles 81, all the baffles 81 are trapezoidal, and all the baffles 81 are trapezoidal.
  • the baffle 81 forms a shielding structure that at least partially shields the entrance 21 when closed.
  • the baffle 81 may be trapezoidal.
  • a shielding structure with a central gap 82 is formed. Although the shielding structure with the central gap 82 cannot block the heat dissipation of ultraviolet rays, the width of the baffle 81 is small, which is convenient to reduce the depth that the cleaning robot 1 needs to enter.
  • FIG 15h shows a further variant embodiment in which the baffle assembly 8 is connected to the inlet 21.
  • the baffle assembly 8 may include a baffle 81, and it may partially block the inlet 21.
  • the baffle The plate 81 is rotatably connected to the bottom of the inlet 21, which can block direct ultraviolet rays and prevent sewage from splashing out.
  • the baffle 81 may be set as a baffle 81 that is not transparent to ultraviolet light.
  • the UV-impermeable baffle 81 can block UV rays.
  • the number of baffles 81 may be three, five or more, and it may be formed to at least partially block the entrance 21 .
  • All the baffles 81 of the baffle assembly 8 in the above embodiment are openable and closable baffles 81.
  • at least one non-closable matching plate can also be provided at the inlet 21.
  • the actual inlet 21 is a smaller inlet 21 formed by the base 2 and the matching plate.
  • the inlet 21 can be at least partially blocked by the cooperation of the matching plate and all the openable and closable baffles 81 in the baffle assembly 8 .
  • the matching plate is fixed on the upper part of the entrance 21 and partially blocks the entrance 21 . When the shutter 81 is closed, the entrance 21 is partially or completely blocked together with the matching plate.
  • the baffle assembly 8 includes three baffles 81 at the lower left and right, and the three baffles 81 are openable and closable baffles 81. All the openable and closable baffles 81 in the baffle assembly 8 can be fixed with the inlet 21 At this time, due to the existence of the matching plate, the actual inlet 21 is the smaller inlet 21 formed by the base 2 and the matching plate. Similarly, the baffles 81 in other parts of FIG.
  • the baffles in the baffle assembly 8 can be matched in other embodiments where there may be matching plates.
  • the openable and closable baffle 81 shields the entrance 21 , that is, the baffle assembly 8 actually shields the smaller entrance 21 .
  • the inlet 21 can also be completely blocked or completely sealed or ultraviolet rays can be blocked.
  • FIGS. 15 a to 15 e It can be seen from the above-mentioned FIGS. 15 a to 15 e that all the baffles 81 can be opened and closed at the inlet 21 , and form a seal with the inlet 21 when closed.
  • the number of the baffles 81 included in the baffle assembly 8 can be single, two or more, and have different combinations.
  • the baffle assembly 8 includes a baffle 81, the baffle 81 is arranged at the upper or lower part of the inlet 21, and the baffle 81 is located at the upper or lower part
  • the baffle 81 is more suitable for the size of the cleaning robot 1.
  • the height of the cleaning robot 1 is obviously smaller than the length, and the width of the baffle 81 located at the upper or lower part is also relatively small, which is easy to fold, as shown in Figure 15b.
  • the baffle assembly 8 may further include at least two baffle plates 81 arranged opposite to each other, and the two opposite baffle plates 81 are rotated to abut against each other. In the closed state of the connection, the two baffles 81 form a seal with the inlet 21, as shown in FIG. 15a and FIG. 15c to FIG. 15e.
  • the baffle assembly 8 includes at least three baffles 81 , and the three baffles 81 can be rotatably connected to the inlet 21 by one of the baffles 81 .
  • the upper or lower part of the inlet 21, the other two baffles 81 are hinged on the left part and the right part of the inlet 21 respectively.
  • FIGS. 18 to 19 The specific sealing manner between the baffle 81 and the baffle 81 can be seen in FIGS. 18 to 19 .
  • Figure 16 is a schematic view of the lever assembly in a working state
  • Figure 17 is a schematic view of the lever assembly in an idle state
  • the base station further includes:
  • the lever assembly includes an action end and an action end, the action end is arranged on the driving path of the cleaning robot 1 in the base 2, the baffle assembly 8 includes a baffle 81, The baffle 81 is located on the action path of the action end, and when the action end moves, the action end drives the baffle 81 to move to at least partially block the inlet 21 .
  • the baffle plate 81 is driven to close by the gravity of the cleaning robot 1 , and the cleaning robot 1 is separated from the rear baffle plate 81 and reset.
  • the lever assembly includes:
  • a swing rod 85 the swing rod 85 is rotatably connected with the base, the swing rod 85 has a first rod 851 and a second rod 852, and the first rod 851 and the second rod 852 have a fixed included angle;
  • the pressing plate 86 is connected with the first rod 851 of the swing rod 85 to form an action end, and the pressing plate 86 is arranged on the driving path of the cleaning robot 1 in the base 2;
  • the baffle 81 is located on the swing path of the second rod 852 , and the free end of the second rod 852 is the action end. When the action end moves, the action end pushes the baffle 81 to move to at least part of the action. The entrance 21 is blocked.
  • the second rod 852 can push the baffle 81 to block the entrance 21 .
  • the baffle 81 is rotatably connected to the first guide member 6 .
  • the baffle 81 rotates to the first guide member 6 .
  • the baffle 81 rotates to at least partially block the inlet 21 .
  • the baffle 81 is attached to the first guide member 6 , and can be used as a guide plate for guiding the cleaning robot 1 in a natural state, and can be used as a blocking structure for blocking ultraviolet leakage and sewage splashing in a gravity state.
  • FIG. 18 is a schematic view of the structure of the stepped first opening
  • FIG. 19 is a schematic view of the structure of the first elastic seal.
  • all the baffles 81 are rotatably arranged on the base 2
  • all the baffles 81 are in a closed state, they form a seal with the inlet 21 to prevent the base station from drying the mopping member 11, and the airflow with bacteria is communicated with the clean environment through the inlet 21 to prevent bacteria from being carried.
  • the airflow will affect the susceptible population, and the user experience will be strong.
  • the clean environment may be a home environment, an office environment, and the like.
  • the base station further includes a fan assembly 55, which is used to dry the mopping member 11 of the cleaning robot 1; when all the baffles 81 are in a closed state, all the baffles 81 are formed with the inlet 21 seal. Through the sealing arrangement, the leakage of airflow can be blocked, the leakage of airflow with bacteria can be reduced, and the user experience is good.
  • the fan assembly 55 can be seen in Fig. 12h.
  • baffles 81 are rotatably connected to the base 2 , and the baffles 81 that are rotatably connected to the base 2 can be openably and closably disposed at the entrance 21 .
  • all the rotational connections between the baffles 81 and the base 2 are resettable rotational connections, and the resettable rotational connections do not require electricity or manually to open and close the baffles 81 each time they are used.
  • the baffle 81 can seal the entrance 21.
  • the cleaning robot 1 enters the baffle 81 is pushed away. At this time, the baffle 81 is in the open state, and the rear baffle 81 is reset to the entrance 21. Sealed closed state, easy to use, no electric drive or manual operation, energy saving.
  • a seal can be formed at the joints of adjacent or opposite baffles 81 .
  • FIG. 18 shows one of the sealing methods.
  • the baffle assembly 8 includes at least two baffles 81 arranged opposite to each other; at least one of the baffles 81 arranged opposite to each other has on the opposite side
  • For the stepped first opening 84 when two opposing baffles 81 are connected, one of the baffles 81 is inserted into the stepped first opening 84 of the other baffle 81 .
  • An obstruction is formed by the stepped first opening 84 to prevent the airflow from leaking out from the inlet 21 .
  • the two opposing baffles 81 are rotated to a closed state in which they are in contact with each other, the two baffles 81 and the inlet 21 form a seal.
  • step-shaped first openings 84 are provided on the connecting sides of the adjacent or opposite baffles 81 , and the stepped first openings pass between the adjacent or opposite baffles 81 .
  • 84 forms a seal, which can well block ultraviolet rays, sewage and air with bacteria from flowing out of the inlet 21.
  • the connecting sides of the adjacent or opposite baffles 81 may also be one of the two connected baffles 81 having the stepped first opening 84, and sealing can also be formed at this time.
  • FIG. 19 shows another sealing method
  • the baffle assembly 8 includes at least two baffles 81 disposed opposite to each other, and at least one of the two opposing baffles 81 has on the opposite side
  • the first elastic sealing member 83 when the two opposing baffles 81 are rotated to a closed state in contact with each other, the two baffles 81 form a seal with the inlet 21 , and the first elastic sealing member 83 forms a seal , which can prevent the airflow from leaking out from the inlet 21 .
  • sealing connectors are provided on the connecting sides of the adjacent or opposite baffles 81, and the sealing connectors are used to form seals between the adjacent or opposite baffles 81.
  • connection side of the adjacent or opposite baffles 81 may also be one of the two connected baffles 81 having the first elastic sealing member 83, and sealing can also be formed at this time.
  • the first elastic sealing member 83 can be fastened to the baffle plate 81 through a socket, or can be fixedly connected to the baffle plate 81 by other means.
  • the plurality of baffles 81 are disposed opposite to each other to form a seal with the inlet 21 when closed, and at least one of the two opposing baffles 81
  • the plate 81 has a first elastic seal 83 on the opposite side.
  • the first elastic seals of the two opposite baffles 81 can be sealed when all the baffles 81 are closed.
  • the member 83 is in contact with another baffle 81.
  • baffles 81 there are more than three baffles 81 , and on the basis of forming a seal between the opposing baffles 81 , at least one of the two adjacent baffles 81 is adjacent to the baffles 81 .
  • the side has a first elastic seal 83, or, at least one of the two adjacent baffles 81 has a stepped first opening 84 on the adjacent side; three or more baffles 81 , the adjacent sides of at least one of the two adjacent baffles 81 may be sealed by the first elastic sealing member 83 or the stepped first opening 84 .
  • the baffle 81 can be matched with the ultraviolet generating device 4, on the basis of the above-mentioned embodiment, the baffle 81 can be set to use a material that does not transmit ultraviolet rays.
  • the baffle 81 can also be used when the base station is not provided with the ultraviolet lamp 41.
  • the baffle plate 81 can still play the role of blocking air flow and sewage at this time.
  • the base station further includes a cleaning mechanism 5 , a sewage tank 54 and an ultraviolet generating device 4 .
  • a cleaning mechanism 5 for cleaning the mopping member 11 of the cleaning robot 1, and setting the ultraviolet generating device 4 to sterilize the sewage tank 54 or/and the mopping member 11 of the cleaning robot 1, the base station can clean the mopping member 11.
  • the first aspect can reduce the noise generated by the cleaning mechanism 5, and the second aspect can be used for cleaning such as clean water, sewage and other liquids are blocked
  • the baffle 81 when the baffle 81 is made of an anti-ultraviolet material, it can also block the ultraviolet rays to prevent the leakage of ultraviolet rays from causing damage to the human body, and the user experience is good.
  • FIG. 20 is a schematic diagram of the connection relationship between the second elastic seal and the second opening.
  • the inlet 21 has a stepped second opening 22 .
  • the baffle 81 When the baffle 81 is closed, the baffle 81 abuts against the stepped second opening 22 to form a gap with the inlet 21 .
  • a stepped second opening 22 is provided at the inlet 21, and the sealing can also be achieved by cooperating with the baffle 81.
  • the step-shaped second opening 22 is provided with a second elastic sealing member 27, and the second elastic sealing member 27 can be provided to enhance the sealing effect.
  • the second elastic sealing member 27 may be a ring-shaped second elastic sealing member 27 , and may also be in the shape of a “ ⁇ ” to prevent the cleaning robot 1 from entering the inlet 21 .
  • the connection method of the second elastic sealing member 27 and the second opening 22 can be fixedly connected to the second opening 22 by bonding or the like, or can be detachably connected to the second opening through the cooperation of grooves and protrusions or other methods. 22 on.
  • a drive unit 87 may be provided, and the output end of the drive unit 87 is connected to the shutter 81 to drive the shutter 81 to open or close, as shown in FIGS. 29 to 31 .
  • the action of opening and closing the shutters 81 may be rotation, all the shutters 81 are connected to the base 2 in rotation at the position of the inlet 21, and the driving unit 87 is capable of driving the The drive unit 87 by which the shutter 81 rotates.
  • the opening and closing of the baffle plate 81 can be realized by means of rotational connection.
  • the inlet 21 has a stepped second opening 22 , and when the baffle 81 is closed, the baffle 81 abuts on the stepped second opening 22 .
  • the shutter 81 is driven by the driving unit 87 to rotate to abut against the second opening 22, and the closing effect is better.
  • a second elastic sealing member 27 is provided on the step-shaped second opening 22 .
  • the driving unit 87 drives the baffle 81 to rotate to fit the second elastic sealing member 27 on the second opening 22, and the second elastic sealing member 27 can not only play the role of The function of buffering can also play the role of sealing, and the sealing effect is good.
  • opening and closing the shutter 81 can also be moved up and down, as shown in FIGS. 22 to 27 for details.
  • FIGS. 21 a to 21 c are schematic structural diagrams of three embodiments of the second opening.
  • Fig. 21a shows the second opening 22 that cooperates with the second elastic seal 27 of Fig. 20, the lower edge of the second opening 22 will not block the entry of the cleaning robot 1;
  • Fig. 21b shows the annular second opening 22, which can Using the climbing ability of the cleaning robot 1 to go over the lower edge of the second opening 22, the lower edge can play the role of blocking the leaked sewage from leaving the base station, and the second elastic seal 27 in FIG. 21a can also play the role of To the same effect;
  • Figure 21c shows another second opening 22, the shape of the opening is " ⁇ " shape, the setting of the second opening 22 will not increase the climbing burden of the cleaning robot 1.
  • FIG. 22 is a schematic diagram of the working state of another connection mode of the baffle and the base
  • FIG. 23 is a schematic diagram of the idle state of another connection mode of the baffle and the base.
  • the openable and closable setting of the baffles 81 can be achieved not only by rotating connections, but also by rail-type connections such as sliding connections or rolling connections. All the baffles 81 can be connected with the base 2 rail-type connections The rail-type connection can also make the baffle plate 81 move to be able to open and close. All the baffles 81 are connected with the base 2 in a rail-like manner at the position of the inlet 21 , and the driving unit 87 is a driving unit 87 capable of driving the baffles 81 to move up and down.
  • the baffle plate 81 can be opened and closed by means of up and down translation.
  • FIGS. 22 to 23 show the rail-type connection of the baffle 81 , and the drive unit 87 can be seen in FIGS. 29 to 31 .
  • the baffle 81 When the baffle 81 is switched from the open state to the closed state, the baffle 81 slides down in the vertical direction, closing the entrance 21 to form a seal; after the work of the base station is completed, the baffle 81 slides vertically upward, and the baffle 81 is in the built-in The open state in the base station.
  • the base 2 has strip-shaped or plate-shaped double guide rails 23 , and the baffle plate 81 is disposed between the double guide rails 23 to slide.
  • Figure 24a can be seen when the double guide rails 23 are strip-shaped
  • Figure 24b can be seen when the double guide rails 23 are plate-shaped.
  • the number of the baffle plate 81 is one.
  • the number of baffles 81 can also be two or more.
  • another identical baffle 81 is arranged in parallel, and double guide rails 23 are also arranged for guiding, and the double baffles 81 are more tightly sealed.
  • a concave portion 24 is provided at the bottom of the inlet 21 , and the concave portion 24 may be a strip-shaped concave portion 24 formed by two strip-shaped protrusions, or a concave portion formed by direct depression on the bottom plate of the base 2 . twenty four.
  • Figures 24a and 24b are schematic views of two embodiments of rail-type connections.
  • FIG. 24 a shows that the double guide rails 23 are respectively arranged on the left and right sides of the base 2 , and are located at the upper part of the inlet 21 .
  • the baffle 81 is arranged between the double guide rails 23 and can move up and down in the vertical direction relative to the double guide rails 23;
  • Fig. 24b shows that the double guide rails 23 are arranged on the base 2 and are located at the upper part of the entrance 21.
  • the double guide rails 23 are two plate-like structures arranged in parallel with a gap. The upper part of the inlet 21 still slides down to close the inlet 21 during operation.
  • a depression 24 is provided at the inlet 21 , and the lower edge and the left and right edges of the baffle 81 can be embedded in the depression 24 .
  • the baffle 81 can move up and down, it can be further deformed.
  • a roller can be provided on the guide rail 23 so that the connection between the baffle 81 and the guide rail 23 is a rolling connection, and the baffle 81 is opened and closed. More convenient.
  • the guiding direction of the double guide rails 23 is the vertical direction.
  • the oblique direction of the horizontal plane can also be used as the guide direction, so that the baffle 81 is inclined to open and close the inlet 21 .
  • the double guide rails 23 can also be arranged on the left, right or lower part of the inlet 21.
  • the double guide rails 23 are accommodated, that is, the lower part of the inlet 21 has a vertical height difference with the surface to be cleaned.
  • FIG. 25 is a schematic diagram of the connection relationship between the elastic sealing ring and the baffle.
  • an elastic sealing ring 26 can be arranged around the baffle 81 , and the elastic sealing ring 26 can be sleeved around the baffle 81 , or be bonded to the circumference of the baffle 81 . , so as to form a seal with the inlet 21 when the baffle 81 is closed.
  • the rail-type connection of the baffle 81 corresponds to the sliding or rolling connection of the baffle 81
  • the elastic sealing ring 26 can be arranged around the baffle 81 to cooperate with the inlet 21 to form a seal of the inlet 21 .
  • the baffle 81 has a groove
  • the elastic sealing ring 26 has a protrusion
  • the elastic sealing ring 26 is detachably sleeved around the baffle 81 through the cooperation of the protrusion and the groove.
  • the thickness of the elastic sealing ring 26 is smaller than the thickness of the baffle 81 to prevent the elastic sealing ring 26 from interfering with the movement of the baffle 81 .
  • the baffle 81 moves downward, and finally has a gap with the lower edge of the inlet 21 or with the opening of the recess 24 , which can be filled by the elastic sealing ring 26 for sealing.
  • FIG. 26 is a diagram showing the connection relationship between the elastic sealing strip and the concave portion.
  • an elastic sealing strip 25 is arranged at the bottom of the inlet 21, and the rail-type connection of the baffle 81 can realize the sliding or rolling of the baffle 81.
  • an elastic sealing strip 25 can be arranged at the bottom to cooperate with the inlet 21 to form a seal for the inlet 21 .
  • Figure 27 is a schematic diagram of the connection relationship between the third elastic seal and the inlet
  • the base station also includes:
  • the third elastic sealing member 28, the third elastic sealing member 28 is disposed on at least one side in the circumferential direction of the inlet 21, the third elastic sealing member 28 is disposed obliquely toward the baffle 81 in the closed state, At least part of the third elastic sealing member 28 is located on the movement path of the baffle 81 from the open state to the closed state; when the baffle 81 is in the closed state, the baffle 81 and the third elastic The seal 28 abuts to form a seal.
  • the third elastic sealing member 28 By arranging the third elastic sealing member 28 on at least one side in the circumferential direction of the inlet 21, since at least part of the third elastic sealing member 28 is located on the movement path of the baffle 81 from the open state to the closed state, the When the baffle 81 moves downward to the closed state, the third elastic sealing member 28 will press against the baffle 81 to form a seal.
  • the third elastic sealing members 28 are provided on the upper and lower sides of the inlet 21 of the third elastic sealing member 28 in the circumferential direction. together to form a seal.
  • FIG. 28 is a schematic diagram of the connection relationship between the third elastic seal and the inlet according to another embodiment.
  • the third elastic seals 28 are provided on the upper, lower, left, and right sides of the inlet 21 of the third elastic sealing member 28 in the circumferential direction.
  • the sealing member 28 is in contact with the four circumferential sides of the baffle 81 to form a seal.
  • the four third elastic sealing members 28 may be four strip-shaped third elastic sealing members 28 connected separately, or may be ring-shaped sealing members connected integrally.
  • the third elastic sealing member 28 may also be provided only on one side of the inlet 21 in the circumferential direction, or the third elastic sealing member 28 may be provided on three sides of the inlet 21 in the circumferential direction.
  • the third elastic sealing member 28 is disposed on the side of the baffle 81 close to the inside of the base 2, and of course the baffle 81 can also be disposed on the side close to the outside of the base.
  • the elastic sealing strip 25 , the elastic sealing ring 26 , the first elastic sealing member 83 , the second elastic sealing member 27 or the third elastic sealing member 28 in all the above embodiments can be made of elastic sealing materials, such as rubber, silicone, etc. Material.
  • FIG. 29 is a schematic diagram of the connection relationship between the driving unit and the baffle
  • FIG. 30 is a schematic structural diagram of the driving unit.
  • the drive unit 87 may be a drive unit 87 for driving the baffle 81 to rotate.
  • the drive unit 87 includes a motor and a gear reduction transmission assembly.
  • the end of the gear reduction transmission assembly connected to the motor is the input end of the drive unit 87.
  • the connecting end of the baffle 81 is the output end of the driving unit 87 .
  • One end of the baffle 81 is hinged at the inlet 21 of the base 2, and the other end is connected with the drive unit 87.
  • the end of the baffle 81 connected with the drive unit 87 can be a matching connection of a polygonal protrusion and a polygonal groove to transmit torque.
  • the motor drives the baffle plate 81 to rotate through the gear reduction transmission assembly.
  • the motor is preferably a stepper motor, which can precisely control the rotation angle.
  • the gear reduction transmission assembly can also be removed, the baffle 81 can be directly connected to the output shaft of the motor, or the gear reduction transmission assembly can be replaced with a belt reduction transmission assembly or other transmission components such as a rack and pinion.
  • the figure shows the cooperation of a drive unit 87 and a baffle 81 to realize the opening and closing of the baffle 81 at the entrance 21.
  • a corresponding number of drive units 87 can be used, or A small number of drive units 87 drive most baffles 81 to open and close, such as the double-opening baffle 81 shown in Figure 15c, a crank-rocker mechanism can be used, a single motor is arranged on the upper part of the inlet 21, and a At different positions, two sets of crank-rocker mechanisms are connected to connect the cranks, and the two sets of crank-rocker mechanisms correspond to the opening and closing of the two baffles 81 respectively.
  • the motor can also be connected to the gear reduction transmission assembly and then connected to the output shaft of the gear reduction transmission assembly.
  • Two sets of crank-rocker mechanisms are connected to the top.
  • the four-opening baffles 81 can be driven by two sets of driving units 87 for the double-opening baffles 81, which can save half the number of motors.
  • FIG. 31 is a schematic diagram of the connection relationship between the drive unit and the baffle plate according to the modified embodiment.
  • the driving unit 87 may be a driving unit 87 for driving the baffle plate 81 to move up and down, and the driving unit 87 includes a motor, and meshing gears and racks.
  • the rack is fixedly arranged on the back of the baffle plate 81
  • the gear is fixedly arranged on the output shaft of the motor
  • the motor is fixedly arranged on the base 2 .
  • the output end of the drive unit 87 is the end of the gear that meshes with the rack.
  • the reduction transmission component can also be used for transmission between the motor and the gear.
  • a rack can be arranged in the middle of the baffle 81, or a rack can be arranged on the left and right sides of the length direction of the baffle 81, wherein the rack on one side is connected with the motor drive, and the rack on the other side is connected to the motor. It can be meshed with the driven gear rotatably connected with the base 2, and the up and down movement is more stable.
  • the drive unit 87 may also adopt a belt transmission mechanism or a transmission mechanism such as a worm gear and a worm.
  • the figure shows the cooperation of a drive unit 87 and a baffle 81 to realize the opening and closing of the baffle 81 at the entrance 21.
  • a corresponding number of drive units 87 can be used, or A small number of drive units 87 drive a large number of shutters 81 to open and close.
  • another rack is symmetrically arranged on the other side where the gear rack is arranged, the two racks are arranged in parallel and symmetrically, and the two baffle plates 81 are arranged in parallel, and a driving unit 87 can drive the two baffle plates 81 to move up and down .
  • the above-mentioned up-and-down movement may be vertical movement in the vertical direction, or may be up-down movement inclined to the horizontal plane.
  • FIG. 32 is a schematic diagram of the positional relationship between the first sensing unit, the second sensing unit and the base.
  • the baffle assembly 8 can be automatically opened and closed.
  • the base station can automatically sense the cleaning robot 1, open the shutter 81 before the cleaning robot 1 enters the base station, and close the shutter 81 after entering the base station.
  • automatic control can be performed by setting the first sensing unit 91 and the control unit.
  • the first sensing unit 91, the sensing range of the first sensing unit 91 covers the path of the cleaning robot 1 entering the entrance 21, so as to sense whether the cleaning robot 1 is at the entrance 21 or close to the entrance 21; a control part, the control part is electrically connected to the driving unit 87 and the first induction unit 91 respectively, and the control part is used for receiving the first signal that the first induction unit 91 senses that the cleaning robot 1 enters the sensing range, and output a first control signal according to the first signal to control the drive unit 87 to drive the shutter 81 to open, and the control unit is also used to output a second control signal to control the drive unit 87 to drive the shutter 81 closed.
  • the control unit can also output a second control signal, and the drive unit 87 receives the second control signal to drive the shutter 81 to close; when the cleaning robot 1 enters the base station, the shutter 81 can be automatically opened and closed.
  • the cleaning robot 1 When the cleaning robot 1 is traveling to the base station, when the cleaning robot 1 enters the sensing range of the first induction unit 91, the first induction unit 91 outputs the first signal, and the control part receives the first signal and outputs the first control signal , the drive unit 87 receives the first control signal and drives the drive unit 87 to control the shutter 81 to open, which can automatically open the shutter 81; the control part can also output a second control signal to control the shutter 81 to close, and the control part can be in various forms A second control signal is output.
  • the second induction unit 92 and the first induction unit 91 can be combined to form the induction assembly 9 to control the automatic opening and closing of the baffle 81 during the entire process before the cleaning robot 1 enters the base station and leaves the base station.
  • the second sensing unit 92 can be set to output a second signal to the control part to sense that the cleaning robot 1 is in place, and the control part can control the shutter 81 to close according to the second signal.
  • the base station further includes a second sensing unit 92, the second sensing unit 92 is electrically connected to the control unit, and the sensing range of the second sensing unit 92 covers the work of the cleaning robot 1 parked on the workbench 3 position to sense whether the cleaning robot 1 is located at or close to the working position;
  • the control part is further configured to receive a second signal from the second sensing unit 92 sensing that the cleaning robot 1 is located at or close to the working position, and according to The second signal outputs the second control signal to control the shutter 81 to close.
  • the cleaning robot 1 when the cleaning robot 1 reaches or approaches the working position on the worktable 3, the second sensing unit 92 outputs the second signal, the control unit receives the second signal and outputs the second control signal, and the drive unit 87 receives the second control signal to control
  • the driving unit 87 controls the shutter 81 to close.
  • the cooperation of the first induction unit 91 and the second induction unit 92 can realize the automatic closing and automatic opening of the cleaning robot 1 during the process of entering the base station.
  • the base station needs to automatically open the shutter 81 after the work of the cleaning robot 1 is completed, and after the cleaning robot 1 exits the base station, automatically closing the shutter 81 can prevent foreign objects from entering the base station, and the second sensing unit 92 can also output the induction cleaning robot. 1.
  • the third signal out of the sensing range of the second sensing unit 92 is used to control the shutter 81 to open, and a timer is set so that the shutter 81 can be closed after the cleaning robot 1 exits the base station.
  • the base station further includes a timer, and the timer is electrically connected to the control unit;
  • the control unit is further configured to receive the second sensing unit 92 to sense that the cleaning robot 1 is out of the sensing range of the second sensing unit 92 and output the third control signal according to the third signal to control the opening of the baffle 81 and control the timing of the timer;
  • the control part is further configured to receive the end of the timing of the timer signal, and output a fourth control signal according to the timing end signal to control the driving unit 87 to drive the shutter 81 to close.
  • the cleaning robot 1 leaves the sensing range of the second sensing unit 92 and outputs a third signal
  • the control unit receives the third signal and outputs the third control signal
  • the driving unit 87 receives the third control signal
  • the signal control shutter 81 is opened, the timer receives the third control signal and starts timing, the cleaning robot 1 exits the base station normally, the timer reserves a period of time for the cleaning robot 1 to exit the base station, and sends a timing end signal to the control unit after the timer expires,
  • the control part receives the timing end signal and outputs a fourth control signal to control the shutter 81 to close, which can realize the automatic opening and closing of the cleaning robot 1 in the whole process from before entering the base station to after exiting the base station.
  • the above-mentioned first sensing unit 91 and second sensing unit 92 may be sensors capable of sensing whether there is an object existing or moving within its sensing range, such as a displacement sensor. Sensors such as the position sensor of the position switch; it can also be an infrared receiving tube, at this time the infrared receiving tube can be set on the base station, and the infrared transmitting tube matched with the infrared receiving tube is set on the cleaning robot 1; or it can be a Hall sensor, this At this time, the magnet matched with the Hall sensor is arranged on the cleaning robot 1; or it can be a camera that can perceive environmental information such as line features and contour information, such as a monocular camera, a binocular camera, a structured light or a tof sensor and other sensing units. Alternatively, it may be an ultrasonic sensor or the like that recognizes material and contour information.
  • the first sensing unit 91 can be used to sense that the cleaning robot 1 leaves the sensing range to output a second signal, instead of the second sensing unit 92 that senses the cleaning robot 1 arriving at or approaching the working position.
  • the sensing range of the first sensing unit 91 covers the first sensing range where the entrance 21 faces the inside of the base station, and the second sensing range where the entrance 21 faces the cleaning robot 1 before entering the base station.
  • This method can be applied to the situation where the cleaning robot 1 is provided with a magnetic body or an infrared emitting tube.
  • the first sensing unit 91 on the base station is a Hall sensor to detect the magnetic body, or the first sensing unit 91 is an infrared receiving tube.
  • the cooperation of the Hall sensor and the magnetic body, or the cooperation of the infrared emitting tube and the infrared receiving tube, can prevent the signal induction interference caused by the movement of the baffle 81 .
  • the first sensing unit 91 can be arranged at the bottom of the inlet 21.
  • the first sensing unit 91 can cover a part of the sensing range of the entrance 21 facing the outside world, and the other part can sense
  • the range coverage entrance 21 faces the inner side of the base station, and can be embedded in the bottom of the base 2 without affecting the sealing effect.
  • the working process is as follows: when the cleaning robot 1 is traveling to the base station, when the cleaning robot 1 enters the sensing range of the first sensing unit 91, the first sensing unit 91 outputs the first signal, and the control part receives the first signal and outputs the first signal.
  • Control signal the drive unit 87 receives the first control signal and drives the drive unit 87 to control the shutter 81 to open, which can automatically open the shutter 81;
  • the cleaning robot 1 leaves the sensing range of the first sensing unit 91 after entering the base station, and the The sensing unit 91 outputs the second signal, the control unit receives the second signal and outputs the second control signal, and the driving unit 87 receives the second control signal and drives the driving unit 87 to control the shutter 81 to close.
  • the first sensing unit 91 outputs the first signal
  • the control unit receives the first signal and outputs the first control signal
  • drives the The unit 87 receives the first control signal and drives the drive unit 87 to control the shutter 81 to open.
  • the first sensing unit 91 outputs the second signal, which the control unit receives.
  • the second signal outputs a second control signal
  • the driving unit 87 receives the second control signal and drives the driving unit 87 to control the shutter 81 to close.
  • the base station of the present application by setting the base 2 with the worktable 3, the worktable 3 can be used for the cleaning robot 1 to stop, and an ultraviolet generating device 4 is also arranged in the base 2, and the ultraviolet rays emitted by the base 2 are covered.
  • the scope covers the mopping member 11 of the cleaning robot 1.
  • the cleaning robot 1 enters the workbench 3, the mopping member 11 can be sterilized by ultraviolet rays.
  • the base 2 of this structure solves the problem that the mopping member 11 is not sterilized and there are bacteria. And it may lead to the problem of mildew and odor, and compared with the structure of sterilizing sewage, it directly irradiates the mopping member 11.
  • the base station of the present application has the characteristics of being able to directly disinfect and sterilize the mopping member 11 , wide disinfection coverage and strong user experience;
  • the baffle assembly 8 includes at least one baffle 81, all the baffles 81 are openably and closably disposed at the entrance 21, and at least partially block the entrance 21 when closed, because The entry of the cleaning robot 1 needs to be provided with an opening. There is a problem that the size of the opening cannot be smaller than the size of the cleaning robot 1. The part of the entrance 21 is shielded, and the size of the opening becomes smaller.
  • the workbench 3 can be placed at the entrance 21.
  • the base station of the present application has the characteristics of low noise, anti-splash of sewage and good user experience.
  • the baffle assembly 8 includes at least one baffle 81, all the baffles 81 can be opened and closed at the inlet 21, and form a seal with the inlet 21 when closed, Since the entrance 21 is sealed at the entrance 21 when the baffle 81 is closed, the base station with this structure can isolate the workbench 3 from the outside at the entrance 21 compared to the base station without the baffle 81, and will not Setting the inlet 21 of the cleaning robot 1 on the seat 2 results in leakage of possible liquid or gas at the inlet 21, which can also reduce possible noise transmission, and has the characteristics of sealing and good user experience.
  • the base station of the present application has the characteristics of good sealing and good user experience.
  • the shutter assembly 8 further includes a driving unit 87, the output end of the driving unit 87 is connected with the shutter 81 to drive the shutter 81 to open or close, and the shutter 81 is driven to move by the driving unit 87, which is more
  • the baffle assembly 8 of the drive unit 87 is provided, which can be more stable when opening and closing, and it is not necessary for the cleaning robot 1 to hit the baffle 81 to open the baffle 81, which solves the problem that the front collision assembly of the cleaning robot 1 collides with the baffle 81 and retreats from the baffle 81.
  • the base station of the present application has the feature that the entrance 21 can be opened and closed.

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  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Animal Behavior & Ethology (AREA)
  • General Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Veterinary Medicine (AREA)
  • Cleaning In General (AREA)
  • Apparatus For Disinfection Or Sterilisation (AREA)

Abstract

一种基站,包括基座(2)和挡板组件(8),基座(2)具有供清洁机器人(1)停靠的工作台(3)以及供清洁机器人(1)进入的入口(21),挡板组件(8)包括至少一挡板(81),所有挡板(81)均能够开合地设置在入口(21)处,并在闭合时至少部分遮挡入口(21)。由于清洁机器人(1)的进入需要设置开口,存在开口的大小不能小于清洁机器人(1)的大小的问题,通过将入口(21)的部分进行遮蔽,使得开口大小变小,可以在入口(21)处将工作台(3)和外界至少部分隔离,减少可能的污水外溅概率,并且声波的阻碍增加,减少可能的噪音外传,解决了敞开式的基站无法将工作台(3)与外界隔绝的问题,尤其其在完全遮蔽入口(21)时,能够极大地减少噪音,并且完全隔绝污水外溅。

Description

基站
本申请要求2021年3月23日向中国国家知识产权局递交的申请号为202110309267.9,申请名称为“基站”的在先申请的优先权,上述在先申请的内容以引入的方式并入本文本中。
技术领域
本申请涉及清洁设备领域,特别是涉及一种基站。
背景技术
清洁机器人是一种智能清洁设备,其在家居,办公环境中起到极大的作用,让人们不在为清洁而烦恼。清洁机器人通常包括电池组件和充电极,在馈电时,可以通过基站对清洁机器人进行充电续航。
传统的基站通常包括充电端子,其与供电端相连接,可以用来给清洁机器人进行充电。现逐步出现可以实现对清洁机器人的拖擦件进行清洗的基站,但这种基站为半敞开式或全敞开式的基站,在清洗过程中,噪音容易外传,并且清洁产生的污水或者污渍容易外溅。
申请内容
基于此,本申请的目的在于,提供一种能将入口开合的基站。
一种基站,包括:
基座,所述基座具有:工作台,所述工作台供清洁机器人停靠;供清洁机器人进入的入口;
挡板组件,所述挡板组件包括至少一挡板,所有所述挡板均能够开合地设置在该入口处,并在闭合时至少部分遮挡所述入口。
通过设置基座,在基座上设置供清洁机器人停靠的工作台以及供清洁机器人进入的入口,通过设置挡板组件,所述挡板组件包括至少一挡板,所有所述挡板能够开合地设置在该入口处,并在闭合时至少部分遮挡所述入口,由于清洁机器人的进入需要设置开口,存在所述开口的大小不能小于所述清洁机器人的大小的问题,将入口的部分进行遮蔽,其开口大小变小,可以在入口处将工作台和外界至少部分隔离,减少可能的污水外溅概率,并且声波的阻碍增加,减少可能的噪音外传,解决了敞开式的基站无法将工作台与外界隔绝的问题,尤其其在完全遮蔽入口时,能够极大的减少噪音,并且完全隔绝污水外溅。
进一步优选地,所有所述挡板在所述入口的位置与所述基座转动连接,转动连接实现开合。
进一步优选地,所述挡板组件包括一所述挡板,所述挡板设置在所述入口的上部或下部,清洁机器人进入的过程中,首先推动挡板往内翻,完全进入后,挡板摆动回原位;清洁机器人在退出的过程中,首先推动挡板往外翻,在完全退出后,挡板恢复原位,结构简单。
进一步优选地,所述基站还包括:
杠杆组件,所述杠杆组件包括一作用端和一动作端,该作用端设置在所述基座内的清洁机器人驶入路径上,所述挡板组件包括一所述挡板,所述挡板位于所述动作端的动作路径上,所述作用端动作时,所述动作端带动所述挡板动 作至至少部分遮挡所述入口。
通过设置杠杆组件,利用清洁机器人的重力带动挡板合上,清洁机器人脱离后挡板复位。
进一步优选地,所述基站还包括:
第一引导件,所述第一引导件延伸至待清洁面,用于引导清洁机器人驶入所述基座,所述挡板与所述第一引导件转动连接,在所述作用端处于未受清洁机器人重力的自然状态时,所述挡板转动至与所述第一引导件贴合,在所述作用端处于受清洁机器人重力的压合状态时,所述挡板转动至至少部分遮挡所述入口。挡板与第一引导件贴合,自然状态可以当成引导清洁机器人的引导板,重力状态下可以当成阻挡紫外线外泄和污水外溅的阻挡结构。
进一步优选地,所述挡板组件包括两相向设置的所述挡板;两所述挡板分别设置在所述入口上部和下部,或,两所述挡板分别设置在所述入口左侧和右侧。两相向设置的所述挡板可以减少单个挡板的长度,节约占用体积。
进一步优选地,所述挡板组件包括四个相向设置的所述挡板,四个所述挡板分别设置在入口的四周,闭合时,四个所述挡板围成至少部分遮挡所述入口的遮挡结构。两相向设置的所述挡板可以减少单个挡板的长度,节约占用体积。
进一步优选地,所述挡板组件包括至少四个所述挡板,所有所述挡板闭合时,所有所述挡板围成中部缺口,所述中部缺口与清洁机器人配合形成能够将紫外线发生装置直射的紫外线全部遮挡的遮挡结构。
通过清洁机器人和中部缺口可以阻止直射的紫外线的外泄。
进一步优选地,所述挡板组件包括至少一所述挡板,所有所述挡板均呈方形,所有所述挡板围成至至少部分遮挡所述入口的遮挡结构。挡板可以是方形。
进一步优选地,所述挡板组件包括至少四个所述挡板,所有所述挡板均呈梯形,所有所述挡板围成至少部分遮挡所述入口的遮挡结构。挡板可以是梯形。
进一步优选地,所述基站还包括:
紫外线发生装置,所述紫外线发生装置设置在所述基座内,并且其发射的紫外线覆盖范围覆盖清洁机器人的拖擦件;
所述挡板为不可透紫外线的挡板,所有所述挡板闭合时,所有所述挡板动作至至少部分遮挡所述入口。
不可透紫外线的挡板可以对紫外线进行遮挡。
进一步优选地,所述基站还包括:
污水箱,所述污水箱设置在所述基座内;
所述紫外线发生装置发射的紫外线覆盖范围覆盖污水箱或/和清洁机器人的拖擦件。
紫外线发生装置发射的紫外线覆盖范围可以单独的覆盖污水箱或拖擦件,也可以覆盖污水箱和拖擦件。
相对于现有技术,本申请的基站,通过设置基座,在基座上设置供清洁机器人停靠的工作台以及供清洁机器人进入的入口,通过设置挡板组件,所述挡板组件包括至少一挡板,所有所述挡板能够开合地设置在该入口处,并在闭合时至少部分遮挡所述入口,由于清洁机器人的进入需要设置开口,存在所述开口的大小不能小于所述清洁机器人的大小的问题,将入口的部分进行遮蔽,其开口大小变小,可以在入口处将工作台和外界至少部分隔离,减少可能的污水外溅概率,并且声波的阻碍增加,减少可能的噪音外传,解决了敞开式的基站无法将工作台与外界隔绝的问题,尤其其在完全遮蔽入口时,能够极大的减少 噪音,并且完全隔绝污水外溅。本申请的基站具有噪音小,防污水外溅和用户体验感好的特点。
为了更好地理解和实施,下面结合附图详细说明本申请。
附图说明
图1是清洁机器人的结构示意图;
图2是本申请的基站的三维爆炸图;
图3是本申请的基站处于工作状态的示意图;
图4是本申请的基站处于工作状态的示意图;
图5是另一实施方式的基站的结构示意图;
图6是清洁机器人和基站的位置关系图;
图7是另一实施方式的工作台的结构示意图;
图8是紫外线发生装置的结构示意图;
图9是另一实施方式的紫外线发生装置的结构示意图;
图10是又一实施方式的紫外线发生装置的结构示意图;
图11是安装板与基座的连接关系示意图;
图12a至图12h是紫外线发生装置的另八种实施方式的示意图;
图13是条形的紫外线灯管与隔板的连接关系示意图;
图14是条形的紫外线灯管与隔板的另一连接关系的示意图;
图15a至图15h是挡板组件与入口的八种实施方式的示意图;
图16是杠杆组件处于工作状态的示意图;
图17是杠杆组件处于闲置状态的示意图;
图18是台阶形的第一开口的结构示意图;
图19是第一弹性密封件的结构示意图;
图20是第二弹性密封件和第二开口的连接关系示意图;
图21a至图21c是第二开口的三种实施方式的结构示意图
图22是挡板与基座的另一连接方式的工作状态示意图;
图23是挡板与基座的另一连接方式的闲置状态示意图;
图24a和图24b是导轨式连接的两种实施方式的示意图;
图25是弹性密封圈与挡板的连接关系示意图;
图26是弹性密封条与凹陷部的连接关系图;
图27是第三弹性密封件与入口的连接关系示意图;
图28是另一实施方式的第三弹性密封件与入口的连接关系示意图;
图29是驱动单元与挡板的连接关系示意图;
图30是驱动单元的结构示意图;
图31是变形实施方式的驱动单元与挡板的连接关系示意图;
图32是第一感应单元、第二感应单元和基座的位置关系示意图。
具体实施方式
在本说明书中提到或者可能提到的上、下、左、右、前、后、正面、背面、顶部、底部等方位用语是相对于其构造进行定义的,它们是相对的概念。因此,有可能会根据其所处不同位置、不同使用状态而进行相应地变化。所以,也不应当将这些或者其他的方位用语解释为限制性用语。
以下示例性实施例中所描述的实施方式并不代表与本公开相一致的所有实施方式。相反,它们仅是与如所附权利要求书中所详述的、本公开的一些方面 相一致的方法的例子。
在本公开使用的术语是仅仅出于描述特定实施例的目的,而非旨在限制本公开。在本公开和所附权利要求书中所使用的单数形式的“一种”、“所述”和“该”也旨在包括多数形式,除非上下文清楚地表示其他含义。还应当理解,本文中使用的术语“和/或”是指并包含一个或多个相关联的列出项目的任何或所有可能组合。
待清洁面,可以是地毯、地板等需要被清洁的待清洁面。
实施例
如图1所示,图1是清洁机器人的结构示意图。
本申请的基站可以适用清洁机器人1,该基站可以用于清洁机器人1充电或/和清洁清洁机器人1的拖擦件11,具体如下:
清洁机器人1,按用途分类可以是商用清洁机器人和家用清洁机器人,按种类分可以是扫地机、扫拖一体机、拖地机、擦地机和洗地机等自动清洁机器人。清洁机器人1可以呈椭圆形、圆形、D字形等形状,并可选设置有清洁模块和用于给清洁模块供水的水箱,以及用于行走的行走组件,清洁模块包括拖擦件11,行走组件包括中部行走轮13、左行走轮和右行走轮。
拖擦件11,拖擦件11可以平板状的拖擦件11,比如平板拖布,也可以是滚轴状的拖擦件11,比如海绵滚刷或其他包裹有布条等拖擦材料的滚轴。拖擦件11可以设置在清洁机器人1的主体的底部的前半部或后半部,在拖擦件11设置在前半部时,清洁机器人1直接行驶进基站内,在拖擦件11设置在后半部时,清洁机器人1后退进入基站内。
驱动轮组12,包括左行走轮和右行走轮,具体的,左行走轮,可以设置有驱动电机,并在驱动电机和左行走轮之间设置传动组件,左行走轮可以转动设置在清洁机器人1的主体底部;右行走轮,可以设置在清洁机器人1的主体底部,并与左行走轮对称设置,即设置有驱动电机,并在驱动电机和右行走轮之间设置传动组件,右行走轮可以转动设置在清洁机器人1的主体上;
中部行走轮13,中部行走轮13设置在清洁机器人1的底部与清洁机器人1位于两侧的左行走轮和右行走轮进行配合,形成三点支撑,以支撑清洁机器人1在待清洁面上运行。
前撞组件,前撞组件为设置在清洁机器人1的主体上用来感知前部碰撞的组件,前部即主体上靠近清洁机器人1行进方向的一侧。前撞组件包括半圆环状的框体,以及设置在主体前部左右两侧的开关,该框体水平活动连接在主体的前部,清洁机器人1受到来自前部的撞击时,对应按压撞击一侧的开关,使得清洁机器人1对应做出避让等动作。
清洁机器人1还可以根据需要选择设置控制组件、距离感知组件、悬崖传感器等各种部件。
基站对于清洁机器人1的清洁方式可以是水洗或干洗,具体的,可以是机械摩擦式的水洗,也可以是超声波水洗。
如图2至图4所示,图2是本申请的基站的三维爆炸图,图3是本申请的基站处于工作状态的示意图,图4是本申请的基站处于工作状态的示意图。
本申请的基站,可以是用来实现对清洁机器人1充电、清洁拖擦件11、烘干拖擦件11、集尘等工作中的其中一种或多种的基站,该基站包括:
基座2,所述基座2可以具有供清洁机器人1进出的入口21,该入口21可以是半敞开式的入口21,其可以形成开口,开口式的入口21便于将入口21密 封或遮挡,该开口可以是凹槽形式的开口,也可以是在凹槽的基础上将顶部贯通的开口,或者可以是其他形状的开口。当然,入口21也可以是全敞开式的入口21,全敞开式的入口21可见图7。所述基座2还具有:
工作台3,所述工作台3供清洁机器人1停靠,所述工作台3延伸至待清洁面;该工作台3可以用于清洁清洁机器人1的拖擦件11或者对清洁机器人1进行充电,或者对拖擦件11进行紫外线等消毒灭菌,或者其他对清洁机器人1进行维护或更换部件的操作。该工作台3可以与基座2可拆卸连接。工作时,清洁机器人1可以停靠在工作台3上进行上述工作。在工作台3延伸至待清洁面时,清洁机器人1可以直接爬上工作台3,在工作台3采用抬升机构时,可以设置可以上下活动的停靠板,可以在清洁机器人1停靠在入口21处的停靠板上时,抬升停靠板将清洁机器人1抬升至工作面的高度进行工作。
在本实施例中,该工作台3可以同时用于给拖擦件11进行清洁和对清洁机器人1充电,具体的,所述基站还包括:
清洁机构5,所述清洁机构5用于清洁清洁机器人1的拖擦件11,所述清洁机构5具有用于清洁清洁机器人1的拖擦件11的清洁槽51;所述基座2还具有第一引导件6,所述第一引导件6从所述清洁槽51延伸至待清洁面,所述第一引导件6和所述清洁槽51形成用于清洁拖擦件11的所述工作台3。所述清洁机构5还包括清理件,在本实施例中,清理件是不可活动的,该清理件可以包括凸起部52和连接板,连接板固定连接在清洁槽51上部,凸起部52设置在连接板上。通过清洁机器人1上的拖擦件11活动与凸起部52相对运动实现机械摩擦去污。在又一实施方式中,该清理件也可以是可活动的,比如通过电力驱动的,在清理件可以活动时,可以通过驱动清理件转动与平板状的拖擦件11发生相对运动,或与滚轴状的拖擦件11发生相对运动,实现机械摩擦去污。在再一实施方式中,也可以采用干洗,超声波清洁等方式对拖擦件11进行清洁。
在变形例中,该工作台3也可以单独对拖擦件11进行清洁,或者单独对清洁机器人1进行充电,具体可见图7。
考虑到拖擦件11对待清洁面清洁后,会携带大量的细菌和灰尘,为了对拖擦件11进行直接杀菌消毒,在基站内设置有:
紫外线发生装置4,所述紫外线发生装置4设置在所述基座2内,并且其发射的紫外线覆盖范围覆盖清洁机器人1的拖擦件11。该紫外线发生装置4可以是单独的紫外线灯41杀菌,也可以和二氧化钛进行配合进行强力杀菌。所述紫外线发生装置4可以包括至少一紫外线灯41。通过紫外线灯41进行消毒杀菌,并且紫外线灯41的数量可以是单个,两个或者多个。紫外线灯41的设置位置,覆盖范围,数量均可以有多种形式,具体可见图8至图18。
污水箱54,所述污水箱54设置在所述基座2内,所述紫外线发生装置4设置在所述基座2内,并且其发射的紫外线覆盖范围可以覆盖污水箱54或/和清洁机器人1的拖擦件11,污水箱54可以是在清洁槽51的一部分,比如通过在清洁槽51内设置隔板53,形成上部的清洁空间和下部的污水箱54,具体可见图5。当然,污水箱54也可以是单独的一个箱体,设置在清洁槽51下部或上部。
图2至图3示出了清洁机器人1从待清洁面进入基站的过程,其工作原理如下:
在清洁机器人1进入工作台3时,清洁机器人1顺着第一引导件6的坡面进行爬升,并将其拖擦件11置于清洁槽51内,在拖擦件11在清洁槽51内清洁的同时,紫外线发生装置4可以发射紫外线光对拖擦件11进行紫外线杀菌消 毒,或者在拖擦件11清洁完毕后,紫外线发生装置4对拖擦件11进行杀菌消毒,这种结构的基座2,解决了拖擦件11未消毒存在细菌并可能导致发霉发臭的问题,并且比起对污水消毒的结构,其直接照射拖擦件11,拖擦件11消毒之后可以继续前往待清洁面清洁,始终保持拖擦件11已消毒状态,防止将已清洁区域上的细菌由拖擦件11带往未清洁区域加深污染。
如图5至图7所示,图5是另一实施方式的基站的结构示意图,图6是清洁机器人和基站的位置关系图,图7是另一实施方式的工作台的结构示意图。
图5示出了基站的入口21可以进行延长,其长度可以根据清洁机器人1的大小进行预先设置,并且清洁槽51内还设置有隔板53,该隔板53将清洁槽51隔成上部的清洁区域和下部的储水区域,下部的储水区域即污水箱54,该隔板53在清洁槽51内形成开口,污水可以通过开口流入污水箱54,无需设置污水管路,不需要担心堵塞问题。当然污水箱54也可以不和清洁槽51集成设置,可以设置成可以单独抽取,其可以位于清洁槽51下部或后方。
在该实施例中,紫外线发生装置4设置在隔板53的上部。在其他实施例中,紫外线发生装置4可以有多种设置位置,具体可见图12a至图12f。
在该实施例中,基站可以对拖擦件11进行清洁,并且对清洁机器人1进行充电,此时,基站具有:
充电极片,充电极片可以设置在清洁槽51的上部,一定程度防止清洁液和污水污染充电极片或者导致基站断路。
在基站处于工作状态时,清洁机器人1的拖擦件11进入清洁槽51,基站对清洁机器人1的拖擦件11进行清洁,并且基站的充电极片与清洁机器人1上的充电端抵接。
工作台3可以由第一引导件6、清洁槽51和第二引导件7形成,所述基座2还具有第一引导件6,所述第一引导件6从所述清洁槽51延伸至待清洁面,所述第一引导件6、所述清洁槽51和第二引导件7形成用于清洁拖擦件11的所述工作台3。
第二引导件7,所述第二引导件7设置在清洁槽51上,并位于清洁槽51中部,以引导清洁机器人1的中部行走轮13进入所述清洁槽51内。
工作台3还可以是充电座的台面,此时,紫外线发生灯设置在工作台3的下部,并且将工作台3的顶部设置为可透紫外线的顶部,比如采用石英玻璃等材料,或者直接将紫外线灯41设置在工作台3的表面,通过清洁机器人1的底部对紫外线灯41进行遮盖。
工作台3还可以是用来对清洁机器人进行维护或清洁的其他用于的工作台3。
如图8所示,图8是紫外线发生装置的结构示意图。
考虑到紫外线灯41的安装问题,在本实施例中,所述紫外线发生装置4还包括:环形罩体42,所述环形罩体42围在至少一所述紫外线灯41的外周。不可透紫外线的环形罩体42可以限制紫外线灯41的发射范围,并对紫外线起到一定的聚拢效果。可透紫外线的环形罩体42可以作为紫外线灯41的安装座。
为了加强紫外线灯41的照射以及更有针对性的限制范围,所述环形罩体42为圆台形聚光罩体,所述环形罩体42和紫外线灯41一一对应,所述紫外线发生装置4包括两紫外线灯41,两个所述环形罩体42分别朝向清洁机器人1的两个拖擦件11或单个拖擦件11的两个位置。圆台形聚光罩体可以对紫外线进行聚拢,加强消毒杀菌效果,并且在拖擦件11为两个转动的大致呈圆形的拖擦件 11时,每个紫外线灯41可以单独对应一个拖擦件11,照射具有针对性,减少紫外线外泄照射人体,影响人体健康,并且其在拖擦件11上的杀菌消毒效果更强。
如图9所示,图9是另一实施方式的紫外线发生装置的结构示意图。
在另一实施例中,与上一实施例不同之处在于,一是紫外线发生装置4也包括环形罩体42,该环形罩体42具体为方形的罩体,形状与圆台形有所区别;二是该实施例的紫外线发生装置4为长条形的紫外线灯41,其可以水平方向覆盖范围广,更适合平板式的拖擦件11。
如图10和图11所示,图10是又一实施方式的紫外线发生装置的结构示意图,图11是安装板与基座的连接关系示意图。
在又一实施例中,采用紫外线灯41独立设置,其可以在基站外进行抽取,具体的,紫外线灯41设置在环形罩体42上并在端部设置有安装板43和拉手44,拉手44设置在安装板43上,安装板43可以与基座2可拆卸连接,环形罩体42在清洁槽51宽度方向的两端穿透清洁槽51并伸出至基座2,并通过安装板43对紫外线灯41和电源线进行遮盖,方便更换灯管和维护紫外线灯41。值得注意的是,在该实施例中的紫外线灯41长度和环形罩体42长度过长,为了显示细节进行了截取剖视。
如图12a至图12h结合图5和图8所示,图12a至图12h是紫外线发生装置的另八种实施方式的示意图。
紫外线发生装置4在紫外线灯41数量、设置位置、结构形态上可以有不同形式。
紫外线发生装置4在紫外线灯41数量上可以有不同形式,比如所述紫外线发生装置4包括两紫外线灯41,两紫外线灯41分别位于在所述工作台3上沿清洁机器人1进入方向的两侧,由于清洁机器人1与清洁槽51之间的空间有限,在侧面照射的紫外线有限,两侧的紫外线可以更全面,并且更适用于左右两侧两个拖擦件11的清洁机器人1。又如所述紫外线发生装置4包括多个紫外线灯41,并且呈一定形状设置,以更大程度的对拖擦件11进行清洁。再如所示紫外线发生装置4包括单个紫外线灯41,其可以沿清洁机器人1进入方向,或者水平垂直与该方向设置。
紫外线发生装置4在紫外线灯41设置位置上可以有不同形式,在竖直方向上,比如可以设置在连接板侧方,或者设置在连接板和隔板53之间,又如可以设置在隔板53下部,再如可以设置在工作台3的下部,比如清洁槽51的下部。在水平方向上,两个以上的紫外线灯41可以设置在沿清洁机器人1进入方形的两侧,或者呈一定形状设置,单个紫外线灯41可以沿清洁机器人1进入方向,或者水平垂直与该方向设置。
紫外线发生装置4在结构上可以有不同形式,比如设置环形罩体42,该环形罩体42可以是不透紫外线的,也可以是透紫外线的,也可以是能够通过电机驱动旋转,也可以是固定夹角。
具体如下:
图12a示出了紫外线发生装置4的其中一实施方式,所有所述紫外线灯41均设置在所述工作台3上,并位于清洁机器人1在所述工作台3上停靠位置的下部,紫外线灯41可以设置在清洁机器人1与工作台3的底部之间,直接对拖擦件11进行照射。具体的,清洁槽51上设置有设置凸起部52的连接板,以及用于隔成污水箱54的隔板53,紫外线发生装置4设置在连接板和隔板53之间, 连接板采用可透紫外线材料,比如石英玻璃、其他可透紫外线的玻璃或者可透紫外线的塑料。并且,紫外线灯41的朝向可以通过电机驱动控制。此时,所述基站还包括位于清洁机构5下部的污水箱54。
图12b示出了紫外线发生装置4的另一实施方式,清洁机构5包括隔板53和清洁槽51,紫外线发生装置4设置在隔板53下部,并位于清洁机器人1进入方向的两侧,该隔板53采用可透紫外线材料,这种位置的紫外线发生装置4既可照射污水箱54内的污水,也可以照射拖擦件11。
图12c示出了紫外线发生装置4的又一实施方式,清洁机构5包括隔板53,紫外线发生装置4包括长条状的紫外线灯41,紫外线灯41的长度方向沿清洁槽51的宽度设置,即沿清洁机器人1的横向设置,这种结构的紫外线发生装置4可以最大范围的照射拖擦件11。此时环形罩体42和隔板53可以均采用可透紫外线材料,不仅照射污水箱54的污水,也可以照射拖擦件11。所述紫外线发生装置4发射的紫外线覆盖范围可选的覆盖所述污水箱54,紫外线发生装置4还可以对污水箱54进行清洁,覆盖范围广。在环形罩体42采用如不可透紫外线的金属材料等材料时,其可以不照射污水箱54。当然,紫外线发生装置4发射的紫外线覆盖范围也可以设置成可以单独的覆盖污水箱54。
图12d示出了紫外线发生装置4的再一实施方式,紫外线发生装置4可以是多种方式的组合,比如图12a示出的实施方式和图12c示出的实施方式的组合。
图12e示出了紫外线发生装置4的变形实施方式,紫外线发生装置4可以呈灯泡状,并且其照射角度可以通过电机进行调整。需要照射拖擦件11时朝向拖擦件11,需要照射污水箱54时,旋转朝向照射污水箱54的污水。
图12f示出了紫外线发生装置4的另一变形实施方式,其与图12a示出的实施方式区别在于,未设置隔板53,并且环形罩体42具有下部缺口,无需控制环形罩体42旋转,即可同时照射污水箱54的污水和清洁机器人1的拖擦件11。
图12g示出了紫外线发生装置4的又一变形实施方式,基站还包括:
第二引导件7,所述第二引导件7设置在清洁槽51上,并位于清洁槽51中部,以引导清洁机器人1的中部行走轮13进入所述清洁槽51内;所述紫外线发生装置4设置在所述第二引导件7上。可以在清洁槽51的中部安装紫外线发生装置4。此时,第二引导件7为可透紫外线材料制成。
图12h示出了紫外线发生装置4的再一变形实施方式,所述第二引导件7为具有中部空腔的第二引导件7,所述紫外线灯41设置在所述中部空腔中,可以在第二引导件7的内部安装紫外线发生装置4。此时,第二引导件7为可透紫外线材料制成。并且第二引导件7可以与风机组件55配合,中部空腔实际为风腔,风机组件55产生的气流从第二引导件7的中部空腔往第二引导件7的宽度方向的两侧喷射,此时,紫外线灯41即可以消毒清洁槽51内或下部的污水,也可以消毒风机组件55的气流,也可以对拖擦件11进行消毒。当然,风机组件55的设置位置也有多样化,考虑到集成化设置,也可以将风机组件55设置到第二引导件7的中部空腔内。所述风机组件55可以用于吹干清洁机器人1的拖擦件11或/和清洁槽51,比如风机组件55的输出端朝向拖擦件11或/和清洁槽51,在入口21密封时,用于吹干的气流可以通过其他途径输送至外界,不会直接将风从入口21吹出至已清洁环境,避免带有细菌的气流流入已清洁环境。
除了上述的八种实施方式外,在其他变形实施方式中,也可以采用上述的多种实施方式的紫外线发生装置4进行组合。在又一其他变形实施方式中,也可以将图12e示出的紫外线发生装置4的位置进行改变,比如降低其高度,或 者在清洁槽51内设置隔板53,并将紫外线发生装置4设置在隔板53下部。此时,紫外线发生装置4可以是竖向朝上照射,也可以是倾斜向上照射。在其他的变形实施方式中,进所述工作台3的底部为可透紫外线的底部,所有所述紫外线灯41设置在所述工作台3下部,通过在工作台3下部设置紫外线灯41,可以通过工作台3底部透射紫外线。
如图13和图14所示,图13是条形的紫外线灯管与隔板的连接关系示意图。图14是条形的紫外线灯管与隔板的另一连接关系的示意图。
考虑到集成化设置,环形罩体42可以和隔板53一体连接或者固定连接,可见图13。
考虑到便于更换紫外线灯41,可以将环形罩体42与隔板53的连接方式进行优化,具体的,环形罩体42与隔板53导轨式连接,具体的,环形罩体42上设置有导条,隔板53上设置有导槽,通过导条和导槽的配合实现导轨式连接,可以直接将环形罩体42抽离隔板53,可见图14。
如图15a至图15h所示,图15a至图15h是挡板组件与入口的八种实施方式的示意图。
考虑到紫外线照射对人体可能造成损伤,清洁拖擦件11噪声大导致用户体验感差,以及清洁拖擦件11过程污水容易外溅多种问题,所述基站还包括:
挡板组件8,所述基座2还具有供清洁机器人1进入的入口21,所述挡板组件8包括至少一挡板81,所有所述挡板81均能够开合地设置在该入口21处,并在闭合时与所述入口21形成能够阻挡紫外线从所述入口21射出的紫外线阻挡结构。通过设置挡板组件8,所述挡板组件8具有至少一挡板81,所述基座2上具有供清洁机器人1进入的入口21,通过将挡板81可开合地设置在该入口21处,可以在闭合时,至少部分遮挡所述入口21防止,紫外线直射外泄,或者减少噪音或者减少污水污渍外溅。
具体的,所述挡板组件8包括至少一挡板81,所有所述挡板81可开合地设置在该入口21处,并在闭合时至少部分遮挡所述入口21。由于清洁机器人1的进入需要设置开口,存在所述开口的大小不能小于所述清洁机器人1的大小的问题,将入口21的至少一部分进行遮蔽,其开口大小变小,污水外溅概率减少,并且声波的阻碍增加,噪音外传减少,解决了敞开式的基站在清洗过程中,噪音容易外传,并且清洁产生的污水或者污渍容易外溅的问题。
在进一步的改进实施方式中,挡板81在完全遮蔽入口21时,能够极大的减少噪音,并且完全隔绝污水外溅,具体可见图15a至图15e。
该更进一步的改进实施方式中,所有所述挡板81均能够开合地设置在该入口21处,并在闭合时与所述入口21形成密封,由于挡板81闭合时在该入口21处将该入口21密封,这种结构的基站相对于未设置挡板81的基站能够在入口21处隔绝基站和外界,不会因为需要在基座2上设置清洁机器人1的入口21导致在该入口21处泄露可能存在的液体或气体,也能够减少可能存在的噪音外传,具有密封特点,用户体验感好,具体挡板81的结构和数量可见图15a至图15e,具体密封的连接方式可见图18至图19。
在本实施例中,所有所述挡板81在所述入口21的位置与所述基座2转动连接,转动连接实现开合,比如,在挡板81从竖直方向转动至水平设置时,挡板81处于打开状态,在挡板81处于与水平面垂直时为闭合状态。挡板81的设置方式有多种,挡板81的形成也有多种方式。
图15a示出了在挡板组件8与入口21连接的其中一实施方式中,所述挡板 组件8包括两相向设置的所述挡板81;两所述挡板81分别设置在所述入口21上部和下部,两相向设置的所述挡板81可以减少单个挡板81的长度,节约占用体积。
图15b示出了在挡板组件8与入口21连接的另外一实施方式中,所述挡板组件8包括一所述挡板81,所述挡板81设置在所述入口21的上部,清洁机器人1进入的过程中,首先推动挡板81往内翻,完全进入后,挡板81摆动回原位;清洁机器人1在退出的过程中,首先推动挡板81往外翻,在完全退出后,挡板81恢复原位,结构简单。当然,所述挡板81也设置在所述入口21的下部。
图15c与图15a示出的实施方式区别在于,两所述挡板81分别设置在所述入口21左侧和右侧。
图15d示出了在挡板组件8与入口21连接的又一实施方式,所述挡板组件8包括至少一所述挡板81,具体数量可以为4个,所有所述挡板81均呈方形,所有所述挡板81围成至少部分遮挡所述入口21的遮挡结构。挡板81可以是方形,且具体围成了全部遮挡所述入口21的遮挡结构。
图15e示出了在挡板组件8与入口21连接的再一实施方式,所述挡板组件8包括至少一所述挡板81,具体数量可以为4个,部分的所述挡板81呈三角形,另外的所述挡板81呈梯形,比如上下相向的两个挡板81呈梯形,左右相向的两个挡板81呈三角形,四个所述挡板81围成全部遮挡入口21的遮挡结构。全部遮挡入口21的遮挡结构便于阻挡紫外线的直射和散射,并且能够阻挡基站的用于吹干拖擦件11的风机组件55吹出的气流从入口21吹出,带有细菌、病菌或灰尘等物质的气流不会直接吹往工作环境,提高用户体验感。
图15f示出了在挡板组件8与入口21连接的变形的实施方式,所述挡板组件8包括至少一所述挡板81,具体数量可以为4个,所有所述挡板81在闭合时围成至少部分遮挡所述入口21的遮挡结构,四个所述挡板81相向设置,四个所述挡板81分别设置在入口21的四周,闭合时,四个所述挡板81围成至少部分遮挡所述入口21的遮挡结构。两相向设置的所述挡板81可以减少单个挡板81的长度,节约占用体积。此时所有所述挡板81均为方形,所有所述挡板81闭合时,所有所述挡板81围成中部缺口82,所述中部缺口82与清洁机器人1配合形成能够将紫外线发生装置4直射的紫外线全部遮挡的遮挡结构。该中部缺口82可以与清洁机器人1的主体配合,阻止基站内的紫外线从入口21直射出,并对人体造成损伤。
图15g示出了在挡板组件8与入口21连接的另一变形的实施方式,所述挡板组件8包括至少四个所述挡板81,所有所述挡板81均呈梯形,所有所述挡板81在闭合时围成至少部分遮挡所述入口21的遮挡结构。挡板81可以是梯形。且具体围成了具有中部缺口82的遮挡结构,具有中部缺口82的遮挡结构虽然无法阻挡紫外线的散热,但是挡板81的宽度较小,便于减少清洁机器人1需要进入的深度。
图15h示出了在挡板组件8与入口21连接的又一变形的实施方式,所述挡板组件8可以包括一挡板81,并且其可以部分遮挡入口21,在该实施方式中,挡板81转动连接在入口21底部,可以起到阻挡紫外线直射,以及防止污水外溅的效果。
上述八种实施方式中,所述挡板81可以设置为不可透紫外线的挡板81。不可透紫外线的挡板81可以对紫外线进行遮挡。除此之外,挡板81的数量还可以是三个,五个或者更多个,可以形成至少部分遮挡入口21即可。
上述实施方式中的挡板组件8的所有挡板81均为可开合的挡板81,当然,该入口21处还可以设置不可开合的至少一个配合板,此时由于配合板的存在,实际的入口21为基座2与配合板形成的较小的入口21,通过配合板和挡板组件8中所有可开合的挡板81配合可以共同对入口21进行至少部分遮挡。比如配合板固定设置在入口21上部,并部分遮挡入口21,挡板81闭合时与配合板共同完成部分遮挡或完全遮挡入口21。此处,为了方便理解,可以以图15g为原型,将图15g中四个挡板81中,将连接在入口21上部的挡板81替换成固定设置在基座2上的配合板,此时,挡板组件8包括左右下部的三个挡板81,三个挡板81均为可开合的挡板81,挡板组件8中的所有可开合的挡板81可以与固定在入口21上的配合板配合,将入口21部分遮挡或全部遮挡,此时,由于配合板的存在,实际的入口21为基座2与配合板形成的较小的入口21。同理,也可以将图15g其它部分的挡板81替换成配合板并与可开合的挡板81进行配合,或可以在其它的可能存在配合板的实施方式中配合挡板组件8中的可开合的挡板81对入口21进行遮挡,即挡板组件8实际是在对较小的入口21进行遮挡。同理,通过这种配合板和挡板81的配合也可以将入口21全部遮挡或全部密封或进行紫外线遮挡。
由上述图15a至图15e可知,所有所述挡板81均能够开合地设置在该入口21处,并在闭合时与所述入口21形成密封。
密封时,所述挡板组件8包括的挡板81的数量可以是单个,两个或多个,并且具有不同的组合方式。
在挡板组件8与入口21密封的一实施方式中,所述挡板组件8包括一所述挡板81,所述挡板81设置在所述入口21的上部或下部,位于上部或下部的挡板81,其更适配清洁机器人1的尺寸,清洁机器人1的高度明显小于长度,位于上部或下部的挡板81的宽度也相对较小,便于翻折,可见图15b。
在挡板组件8与入口21密封的另一的实施方式中,所述挡板组件8还可以包括至少两相向设置的所述挡板81,相向的两个所述挡板81转动至互相抵接的闭合状态时,两个所述挡板81与所述入口21形成密封,可见图15a以及图15c至图15e。
在挡板组件8与入口21密封的又一实施方式中,所述挡板组件8包括至少三个所述挡板81,三个所述挡板81可以其中一挡板81转动连接在入口21的上部或下部,其他两所述挡板81分别铰接在入口21的左部和右部。
挡板81和挡板81之间的具体的密封方式可见图18至图19。
如图16和17所示,图16是杠杆组件处于工作状态的示意图,图17是杠杆组件处于闲置状态的示意图;
在上述八种实施方式之外,还存在其他可以无需电机驱动的遮挡机构。具体如下,在挡板组件8与入口21连接的再一变形的实施方式中,所述基站还包括:
杠杆组件,所述杠杆组件包括一作用端和一动作端,该作用端设置在所述基座2内的清洁机器人1驶入路径上,所述挡板组件8包括一所述挡板81,所述挡板81位于所述动作端的动作路径上,所述作用端动作时,所述动作端带动所述挡板81动作至至少部分遮挡所述入口21。通过设置杠杆组件,利用清洁机器人1的重力带动挡板81合上,清洁机器人1脱离后挡板81复位。
具体的,所述杠杆组件包括:
摆杆85,所述摆杆85与所述底座转动连接,所述摆杆85具有第一杆851 和第二杆852,所述第一杆851和第二杆852具有固定夹角;
压板86,所述压板86与所述摆杆85的第一杆851连接,形成作用端,所述压板86设置在所述基座2内的清洁机器人1驶入路径上;
所述挡板81位于所述第二杆852的摆动路径上,该第二杆852的自由端为动作端,所述作用端动作时,所述动作端推动所述挡板81动作至至少部分遮挡所述入口21。
清洁机器人1压动压板86,可以让第二杆852推动挡板81遮挡该入口21。
同时,所述挡板81与所述第一引导件6转动连接,当所述作用端处于未受清洁机器人1重力的自然状态时,所述挡板81转动至与所述第一引导件6贴合,当所述作用端处于受清洁机器人1重力的压合状态时,所述挡板81转动至至少部分遮挡所述入口21。挡板81与第一引导件6贴合,自然状态可以当成引导清洁机器人1的引导板,重力状态下可以当成阻挡紫外线外泄和污水外溅的阻挡结构。
如图18和图19所示,图18是台阶形的第一开口的结构示意图,图19是第一弹性密封件的结构示意图。
值得注意的是,为了进一步将该入口21密封,避免风机组件55吹干拖擦件11时将带有细菌的气流带往清洁环境中,所有所述挡板81转动设置在所述基座2上,所有所述挡板81处于闭合状态时与所述入口21形成密封,防止基站对拖擦件11进行吹干时,将带有细菌的气流通过入口21与清洁环境相通,防止带有细菌的气流对易感人群造成影响,用户体验感强。该清洁环境可以是家居环境,办公环境等。所述基站还包括风机组件55,所述风机组件55用于吹干清洁机器人1的拖擦件11;所有所述挡板81处于闭合状态时,所有所述挡板81与所述入口21形成密封。通过密封设置,可以阻挡气流外泄,减少带细菌的气流外泄,用户体验感好,风机组件55可见图12h。
具体的,所有所述挡板81均与所述基座2转动连接,转动连接在所述基座2的挡板81可以实现可开合地设置在该入口21处。
进一步优选地,所有所述挡板81与所述基座2的转动连接均为能够复位的转动连接,可复位的转动连接,无需电力或手动在每次使用时将挡板81开合,在机器人未进入工作台3时,挡板81可以将该入口21密封,清洁机器人1进入时将挡板81推开,此时挡板81处于打开状态,进入后挡板81复位成与该入口21密封的闭合状态,使用方便,无需电力驱动或手动,节能。
具体的,在图15a、图15c至图15g的六种实施方式中,可以在相邻的或相向的各挡板81的连接处形成密封。
图18示出了其中一种密封方式,所述挡板组件8包括至少两相向设置的所述挡板81;相向设置的所述挡板81中的至少一所述挡板81在相向侧具有台阶形的第一开口84,相向的两个所述挡板81连接时,其中一所述挡板81嵌入另外一所述挡板81的所述台阶形的第一开口84。通过台阶形的第一开口84形成阻碍,阻止气流从入口21外泄。在相向的两个所述挡板81转动至互相抵接的闭合状态时,两个所述挡板81与所述入口21形成密封。具体的,即在相邻的或相向的各挡板81的连接侧上均设置台阶形的第一开口84,相邻的或相向的各挡板81之间均通过该台阶形的第一开口84形成密封,能够很好的阻隔紫外线、污水和带有细菌的气流从入口21流出。当然,相邻的或相向的各挡板81的连接侧,也可以是连接的两个挡板81之一具有该台阶形的第一开口84,此时也可以形成密封。
图19示出了另外一种密封方式,所述挡板组件8包括至少两相向设置的所述挡板81,相向的两个所述挡板81中至少一所述挡板81在相向侧具有第一弹性密封件83,相向的两个所述挡板81转动至互相抵接的闭合状态时,两个所述挡板81与所述入口21形成密封,通过第一弹性密封件83形成密封,可以阻止气流从入口21外泄。具体的,即在相邻的或相向的各挡板81的连接侧上均设置密封连接件,相邻的或相向的各挡板81之间均通过该密封连接件形成密封,能够很好的阻隔紫外线、污水和带有细菌的气流从入口21流出。当然,相邻的或相向的各挡板81的连接侧,也可以是连接的两个挡板81之一具有该第一弹性密封件83,此时也可以形成密封。第一弹性密封件83可以通过套接卡紧连接在挡板81上,也可以通过其他方式固定连接在挡板81上。
在上述实施方式中,在挡板81包括有两个以上时,多个挡板81相向设置可以在闭合时与入口21形成密封,并且相向的两个所述挡板81中至少一所述挡板81在相向侧具有第一弹性密封件83,在其中一个挡板81具有第一弹性密封件83时,可以在所有挡板81闭合时将相向的两个挡板81中的第一弹性密封件83与另外一个挡板81抵接,在两个挡板81相向侧均具有第一弹性密封件83时,所有所述挡板81闭合时所有所述挡板81在相向侧相抵接,形成密封;或者相向的两个所述挡板81中至少一所述挡板81在相向侧具有台阶形的第一开口84,在只有一个挡板81具有第一开口84时,其中一个挡板81嵌入另一个挡板81的第一开口84中形成密封,在两个挡板81均具有第一开口84时,两个第一开口84互相嵌合,形成密封。
在上述实施方式中,在挡板81包括有三个以上,在相向的挡板81之间形成密封的基础上,相邻的两个所述挡板81中至少一所述挡板81在相邻侧具有第一弹性密封件83,或,相邻的两个所述挡板81中至少一所述挡板81在相邻侧具有台阶形的第一开口84;三个或以上的挡板81,相邻的两个挡板81中至少一个所述挡板81的相邻侧可以通过第一弹性密封件83或台阶形的第一开口84形成密封。所有所述挡板81转动至互相抵接的闭合状态时,所有挡板81之间的连接处可以形成密封,以形成所有所述挡板81与所述入口21形成密封。
考虑到挡板81可以和紫外线发生装置4配合,在上述实施方式的基础上,可以将挡板81设置为采用不透紫外线的材料,当然该挡板81也可以在基站未设置紫外线灯41时设置为可透紫外线的材料,此时,挡板81依然可以起到阻挡气流、污水的作用。
由图18、图19结合图5可见,此时,基站还包括清洁机构5,污水箱54和紫外线发生装置4。通过设置用于清洁清洁机器人1的拖擦件11的清洁机构5,并设置紫外线发生装置4将污水箱54或/和清洁机器人1的拖擦件11消毒杀菌,基站即可以清洁拖擦件11,也可以进行消毒,功能多样,与能够密封入口21的挡板81配合,第一方面可以减少清洁机构5清洁产生的噪音,第二方面可以对清洁用的如清水、污水等液体进行阻挡,第三方面,当挡板81采用防紫外线材料时,还可以对紫外线进行阻挡,防止紫外线外泄对人体造成损害,用户体验感好。
如图20所示,图20是第二弹性密封件和第二开口的连接关系示意图。
为了实现密封,所述入口21具有台阶形的第二开口22,所述挡板81闭合时,所述挡板81与所述台阶形的第二开口22抵接,形成与所述入口21的密封,在入口21处设置台阶形的第二开口22,也可以和挡板81配合实现密封。所述台阶形的第二开口22上设置有第二弹性密封件27,可以设置第二弹性密封件 27加强密封效果。第二弹性密封件27可以是环状的第二弹性密封件27,也可以是“冂”字形以防止阻碍清洁机器人1进入入口21。第二弹性密封件27和第二开口22的连接方式,可以通过粘接等方式固定连接在第二开口22上,也可以通过凹槽和凸起的配合或其他方式可拆卸连接在第二开口22上。
考虑到基站内设置有风机组件55时,密封要求较高,并且考虑到某些清洁机器人1撞击可复位的挡板81时,会出现清洁机器人1无法进入基站的问题。也即,清洁机器人1虽然能将挡板81打开且在清洁机器人1脱离挡板81时可以自动让挡板81复位,但是在清洁机器人1朝向运动一侧的头部设置有前撞组件时,撞击时清洁机器人1会直接避让,而不是进入基站内,或者识别到挡板81为障碍物而不进行撞击时,会出现清洁机器人1无法进入基站的问题。在某一改进的实施方式中,可以设置驱动单元87,所述驱动单元87的输出端与所述挡板81连接,以驱动所述挡板81打开或闭合,可见图29至图31。
在本实施例中,挡板81打开和闭合的动作可以是转动,所有所述挡板81在所述入口21的位置与所述基座2转动连接,所述驱动单元87为能够驱动所述挡板81转动的驱动单元87。转动连接的方式可以实现挡板81的开合。此时,所述入口21具有台阶形的第二开口22,所述挡板81闭合时,所述挡板81抵接在所述台阶形的第二开口22上。通过驱动单元87驱动挡板81转动至与第二开口22抵接,闭合效果更好。为了密封性能更好,所述台阶形的第二开口22上设置有第二弹性密封件27。通过在第二开口22上设置第二弹性密封件27,驱动单元87驱动挡板81转动至与第二开口22上的第二弹性密封件27贴合,第二弹性密封件27不仅能够起到缓冲的作用,也能起到密封的作用,密封效果好。
当然,挡板81打开和闭合的动作也可以是上下移动,具体可见图22至图27。
如图21a至图21c所示,图21a至图21c是第二开口的三种实施方式的结构示意图。
图21a示出了与图20的第二弹性密封件27配合的第二开口22,其第二开口22下边缘不会阻挡清洁机器人1进入;图21b示出了环形的第二开口22,可以利用清洁机器人1的攀爬能力越过第二开口22的下边缘,该下边缘可以起到阻挡泄露的污水留到基站外的作用,并且,图21a中设置第二弹性密封件27后也可以起到同样的作用;图21c示出了另一种第二开口22,开口形状为“冂”字形,第二开口22的设置不会增加清洁机器人1的攀爬负担。
如图22和图23所示,图22是挡板与基座的另一连接方式的工作状态示意图,图23是挡板与基座的另一连接方式的闲置状态示意图。
值得注意的是,挡板81的可开合设置,不仅可以通过转动连接实现,也可以通过滑动连接或滚动连接等导轨式连接实现,所有所述挡板81可以与所述基座2导轨式连接,导轨式连接也可以使挡板81活动至可开合。所有所述挡板81在所述入口21的位置与所述基座2导轨式连接,所述驱动单元87为能够驱动所述挡板81上下移动的驱动单元87。上下平动的方式可以实现挡板81的开合。图22至图23示出了挡板81的导轨式连接方式,驱动单元87可见图29至图31。
挡板81从打开状态切换至闭合状态时,挡板81沿竖直方向向下滑动,闭合入口21形成密封;在基站的工作结束后,挡板81竖向向上滑动,挡板81处于内藏在基站内的打开状态。
具体的,基座2上具有条状或板状的双导轨23,挡板81设置在双导轨23之间进行滑动。双导轨23为条状时可见图24a,双导轨23为板状时可见图24b。 在该变形成挡板81可上下移动的实施方式中,挡板81的数量为一个。当然,挡板81的数量也可以是两个或多个,比如在该实施方式中平行设置另一个相同的挡板81,并同样设置双导轨23进行导向,双重挡板81密封更严实。
优选的,在入口21的底部设置有凹陷部24,该凹陷部24可以是两条条形凸起形成的条形的凹陷部24,也可以是基座2的底板上直接凹陷形成的凹陷部24。
如图24a至24b所示,图24a和图24b是导轨式连接的两种实施方式的示意图。
图24a示出了双导轨23分别设置在基座2的左右两侧,并位于入口21的上部。挡板81设置在双导轨23之间并可相对于双导轨23往竖直方向上下移动;闲置时挡板81内藏在入口21上部,工作时向下滑动封闭入口21。图24b示出了双导轨23设置在基座2上,并位于入口21的上部,此时双导轨23为两块平行设置且具有间隙的板状结构,挡板81闲置时依旧可以内藏在入口21上部,工作时依然向下滑动封闭入口21。
为了增强挡板81遮盖入口21时的密封效果,在入口21处设置有凹陷部24,挡板81的下边缘和左右边缘可以内藏在凹陷部24内。
在变形成挡板81可上下移动的实施方式中,还可以进一步进行变形,比如可以通过在导轨23上设置滚轮,使得挡板81与导轨23之间的连接为滚动连接,挡板81开合更加方便。
上述的变形成挡板81可上下移动的实施方式中,双导轨23的引导方向为竖直方向。当然,也可以用于水平面倾斜的倾斜方向作为引导方向,使得挡板81倾斜着开合入口21。
上述的变形成挡板81可上下移动的实施方式中,双导轨23也可以设置在入口21的左部,右部或下部,在设置为下部时入口21的下部与待清洁面具有容纳空间以容纳双导轨23,也即入口21的下部与待清洁面具有竖向的高度差。
如图25所示,图25是弹性密封圈与挡板的连接关系示意图。
为了进一步增强挡板81遮盖入口21时的密封效果,在挡板81的四周可以设置弹性密封圈26,弹性密封圈26可以套设在挡板81的四周,或者粘接在挡板81的四周,以在所述挡板81闭合时与所述入口21形成密封。挡板81导轨式的连接对应可以实现挡板81的滑动或滚动连接,可以在挡板81的四周设置弹性密封圈26与入口21配合形成入口21的密封。
具体的,挡板81具有凹槽,弹性密封圈26具有凸起,通过凸起和凹槽的配合将弹性密封圈26可拆卸套接在挡板81的四周。
优选的,弹性密封圈26的厚度小于挡板81的厚度,防止弹性密封圈26干涉挡板81的运动。在挡板81从打开状态切换至闭合状态时,挡板81向下移动,并最终与入口21的下边缘或与凹陷部24的开口具有空隙,可以通过弹性密封圈26弥补该间隙进行密封。
如图26所示,图26是弹性密封条与凹陷部的连接关系图。
考虑到在入口21的底部设置密封条不会影响挡板81的移动,在所述入口21的底部设置有弹性密封条25,挡板81导轨式的连接对应可以实现挡板81的滑动或滚动连接,可以在底部设置弹性密封条25与入口21配合形成入口21的密封。
如图27所示,图27是第三弹性密封件与入口的连接关系示意图;
为了进一步增强上下移动式的挡板81与入口21连接的密封性能,所述基 站还包括:
第三弹性密封件28,所述第三弹性密封件28设置在所述入口21的周向上的至少一侧,所述第三弹性密封件28朝向处于闭合状态的所述挡板81倾斜设置,至少部分的所述第三弹性密封件28位于所述挡板81从打开状态动作至闭合状态的运动路径上;所述挡板81处于闭合状态时,所述挡板81与所述第三弹性密封件28抵接形成密封。
通过在入口21的周向的至少一侧设置第三弹性密封件28,由于至少部分的所述第三弹性密封件28位于所述挡板81从打开状态动作至闭合状态的运动路径上,在挡板81向下移动至闭合状态时,第三弹性密封件28会压合在挡板81上,形成密封。
具体的,第三弹性密封件28入口21周向上的上下两侧设置有所述第三弹性密封件28,通过倾斜设置,可以让挡板81闭合时第三弹性密封件28与挡板81贴合,形成密封。
如图28所示,图28是另一实施方式的第三弹性密封件与入口的连接关系示意图。
第三弹性密封件28入口21周向上的上下左右四侧均设置有所述第三弹性密封件28,通过四个第三弹性密封件28分别倾斜设置,可以让挡板81闭合时第三弹性密封件28与挡板81的周向四侧均贴合,形成密封。
四个第三弹性密封件28可以是分体连接的四个条状的第三弹性密封件28,也可以是一体连接的圈状的密封件。当然,也可以仅在入口21周向上的一侧设置第三弹性密封件28,或者在入口21周向上的三侧设置第三弹性密封件28。
此时,第三弹性密封件28设置在挡板81靠近基座2内的一侧,当然也可以将挡板81设置在靠近基站外的一侧。
上述所有实施方式中的弹性密封条25、弹性密封圈26、第一弹性密封件83、第二弹性密封件27或第三弹性密封件28均可以采用弹性密封材料制成,比如橡胶、硅胶等材料。
如图29和图30所示,图29是驱动单元与挡板的连接关系示意图,图30是驱动单元的结构示意图。
驱动单元87可以是用于驱动挡板81转动的驱动单元87,驱动单元87包括电机,齿轮减速传动组件,齿轮减速传动组件与电机连接的一端为驱动单元87的输入端,齿轮减速传动组件与挡板81连接的一端为驱动单元87的输出端。挡板81的其中一端铰接在基座2的入口21处,另一端与驱动单元87通过连接,挡板81与驱动单元87连接的一端可以是多边形凸起和多边形凹槽的配合连接,以传递扭矩。工作时,电机通过齿轮减速传动组件带动挡板81转动。电机优选为步进电机,可以精准的控制转角。当然,也可以去除齿轮减速传动组件,将挡板81直接与电机的输出轴连接,或者将齿轮减速传动组件更换为皮带减速传动组件或者其他齿轮齿条等传动组件。
图示为一驱动单元87与一挡板81的配合实现挡板81在入口21处开闭,在采用两挡板81或多挡板81时,可以采用对应数量的驱动单元87,也可以采用少数的驱动单元87驱动多数的挡板81进行开闭,比如图15c所示的双开式挡板81,可以采用曲柄摇杆机构,单一的电机设置在入口21的上部,电机的输出轴上的不同位置,连接有两组曲柄摇杆机构连接曲柄,两组曲柄摇杆机构分别对应两个挡板81的开闭,其中,电机也可以连接齿轮减速传动组件再在齿轮减速传动组件的输出轴上连接两组曲柄摇杆机构。又如图15d至图15g的四开 式挡板81,可以采用两组双开式挡板81用的驱动单元87进行驱动,可以节省一半数量的电机。
如图31所示,图31是变形实施方式的驱动单元与挡板的连接关系示意图。
驱动单元87可以是用于驱动挡板81上下移动的驱动单元87,驱动单元87包括电机,以及相啮合的齿轮和齿条。齿条固定设置在挡板81的背面,齿轮固定设置在电机的输出轴上,电机固定设置在基座2上。此时,驱动单元87的输出端为与齿条啮合的齿轮一端。
工作时,通过控制电机转动,电机的输出轴带动齿轮转动,齿轮与齿条相啮合,齿轮带动固定有齿条的挡板81进行上下移动。其中,电机与齿轮之间也可以采用减速传动组件传动。
其中,可以在挡板81的中部设置一齿条,也可以在挡板81的长度方向的左右两侧均设置一齿条,其中一侧的齿条与电机传动连接,另一侧的齿条可以和与基座2转动连接的从动齿轮啮合,上下移动更加稳定。当然,驱动单元87也可以采用皮带传动机构或者蜗轮蜗杆等传动机构。
图示为一驱动单元87与一挡板81的配合实现挡板81在入口21处开闭,在采用两挡板81或多挡板81时,可以采用对应数量的驱动单元87,也可以采用少数的驱动单元87驱动多数的挡板81进行开闭。比如在齿轮设置有齿条的另一侧对称设置有另一齿条,两个齿条平行且对称设置,两个挡板81平行设置,通过一驱动单元87可以驱动两个挡板81上下移动。
上述的上下移动可以是竖直方向上的竖向移动,也可以是与水平面倾斜的上下部向的移动。
如图32所示,图32是第一感应单元、第二感应单元和基座的位置关系示意图。
为了进一步实现智能化,可以让挡板组件8自动开合。
其中,可以基站自动感应清洁机器人1,在清洁机器人1进入基站前打开挡板81,在进入基站后关闭挡板81。
具体的,可以通过设置第一感应单元91和控制部进行自动控制。其中,第一感应单元91,所述第一感应单元91的感应范围覆盖清洁机器人1进入所述入口21的路径上,以感应是否有清洁机器人1处于所述入口21或靠近所述入口21;控制部,所述控制部分别与所述驱动单元87、第一感应单元91电连接,所述控制部用于接收所述第一感应单元91感应到清洁机器人1进入感应范围的第一信号,并根据所述第一信号输出第一控制信号以控制所述驱动单元87驱动所述挡板81打开,所述控制部还用于输出第二控制信号控制所述驱动单元87驱动所述挡板81闭合。控制部还可以输出第二控制信号,驱动单元87接收第二控制信号驱动挡板81闭合;清洁机器人1在进入基站内的过程中,挡板81可以自动开闭。
工作过程:清洁机器人1在向基站行进的过程中,在清洁机器人1进入第一感应单元91的感应范围时,第一感应单元91输出第一信号,控制部接收第一信号输出第一控制信号,驱动单元87接收第一控制信号驱动所述驱动单元87控制挡板81打开,可以自动打开挡板81;控制部还可以输出第二控制信号控制挡板81关闭,控制部可以以多种形式输出第二控制信号。
在某一实施方式中,可以设置第二感应单元92和第一感应单元91组合形成感应组件9,以在清洁机器人1进入基站前至离开基站后的整个过程控制挡板81自动开关。具体的,可以通过设置第二感应单元92向控制部输出感应清洁机 器人1到位的第二信号,控制部根据第二信号控制挡板81关闭。此时,所述基站还包括第二感应单元92,所述第二感应单元92与控制部电连接,所述第二感应单元92的感应范围覆盖所述工作台3上停靠清洁机器人1的工作位置,以感应是否有清洁机器人1位于或靠近所述工作位置;所述控制部还用于接收所述第二感应单元92感应清洁机器人1位于或靠近所述工作位置的第二信号,并根据所述第二信号输出所述第二控制信号以控制所述挡板81闭合。
工作过程:在清洁机器人1到达或靠近工作台3上的工作位置时,第二感应单元92输出第二信号,控制部接收第二信号输出第二控制信号,驱动单元87接收第二控制信号控制驱动单元87控制挡板81闭合。由第一感应单元91和第二感应单元92配合可以实现清洁机器人1进入基站过程中的自动闭合和自动打开。
考虑到基站对清洁机器人1的工作结束后,需要自动打开挡板81,并且清洁机器人1退出基站后,自动关闭挡板81可以防止异物进入基站内,第二感应单元92还可以输出感应清洁机器人1脱离所述第二感应单元92感应范围的第三信号以控制挡板81打开,并且设置了计时器,在清洁机器人1退出基站后可以让挡板81闭合。具体的,基站还包括计时器,所述计时器与所述控制部电连接;所述控制部还用于接收所述第二感应单元92感应清洁机器人1脱离所述第二感应单元92感应范围的第三信号,并根据所述第三信号输出所述第三控制信号以控制所述挡板81打开并控制所述计时器计时;所述控制部还用于接收所述计时器的计时结束信号,并根据所述计时结束信号输出第四控制信号以控制所述驱动单元87驱动所述挡板81闭合。
在基站对清洁机器人1的工作结束后,清洁机器人1脱离第二感应单元92的感应范围,并输出第三信号,控制部接收第三信号并输出第三控制信号,驱动单元87接收第三控制信号控制挡板81打开,计时器接收第三控制信号开始计时,清洁机器人1正常退出基站,计时器预留一段时间供清洁机器人1退出基站,计时器计时完毕后向控制部发送计时结束信号,控制部接收计时结束信号输出第四控制信号以控制挡板81闭合,可以实现清洁机器人1从进入基站前到退出基站后的全过程的自动开合。
上述第一感应单元91和第二感应单元92可以是能够感知在其感知范围内是否有物体存在或活动的传感器,比如位移传感器,在有物体经过感知范围时,感知距离变短,又如限位开关的位置传感器等传感器;还可以是红外接收管,此时红外接收管可以设置在基站上,和红外接收管配套的红外发射管设置在清洁机器人1上;或者可以是霍尔传感器,此时与霍尔传感器配套的磁体设置在清洁机器人1上;或者可以是能够感知如线条特征、轮廓信息等环境信息的摄像头,比如单目摄像头、双目摄像头、结构光或者tof传感器等感知单元,又或者可以是识别材质、轮廓信息的超声波传感器等。
在某一改进的实施方式中,可以用第一感应单元91感应清洁机器人1脱离感应范围以输出第二信号,来替换第二感应单元92感应清洁机器人1到达或靠近工作位置输出的第二信号。其中,第一感应单元91的感应范围覆盖入口21朝向基站内部的第一感应范围,以及覆盖入口21朝向清洁机器人1进入基站前的第二感应范围。这种方式可以适用于清洁机器人1上设置有磁性体或红外发射管的情景,此时基站上的第一感应单元91为霍尔传感器以检测磁性体,或者第一感应单元91为红外接收管以检测红外发射管发射的信号,霍尔传感器和磁性体的配合,或红外发射管和红外接收管的配合,可以防止挡板81动作带来的 信号感应干扰。在挡板81为转动式挡板81时,第一感应单元91可以设置在入口21的底部,挡板81关闭时第一感应单元91可以一部分感应范围覆盖入口21朝向外界一侧,另一部分感应范围覆盖入口21朝向基站内一侧,并且可以内嵌在基座2底部,不影响密封效果。
该工作过程为:清洁机器人1在向基站行进的过程中,在清洁机器人1进入第一感应单元91的感应范围时,第一感应单元91输出第一信号,控制部接收第一信号输出第一控制信号,驱动单元87接收第一控制信号驱动所述驱动单元87控制挡板81打开,可以自动打开挡板81;清洁机器人1在进入基站内后脱离第一感应单元91的感应范围,第一感应单元91输出第二信号,控制部接收第二信号输出第二控制信号,驱动单元87接收第二控制信号驱动所述驱动单元87控制挡板81关闭。同理,在清洁机器人1退出基站的过程中,清洁机器人1进入第一感应单元91的感应范围时,第一感应单元91输出第一信号,控制部接收第一信号输出第一控制信号,驱动单元87接收第一控制信号驱动所述驱动单元87控制挡板81打开,在清洁机器人1退出基站并脱离第一感应单元91的感应范围时,第一感应单元91输出第二信号,控制部接收第二信号输出第二控制信号,驱动单元87接收第二控制信号驱动所述驱动单元87控制挡板81关闭。
相对于现有技术,本申请的基站,通过设置具有工作台3的基座2,工作台3可以供清洁机器人1停靠,在基座2内还设置有紫外线发生装置4,其发射的紫外线覆盖范围覆盖清洁机器人1的拖擦件11,在清洁机器人1进入工作台3时,可以对拖擦件11进行紫外线杀菌消毒,这种结构的基座2,解决了拖擦件11未消毒存在细菌并可能导致发霉发臭的问题,并且比起对污水消毒的结构,其直接照射拖擦件11,拖擦件11消毒之后可以继续前往待清洁面清洁,始终保持拖擦件11已消毒状态,防止将已清洁区域上的细菌由拖擦件11带往未清洁区域加深污染。本申请的基站具有能够直接对拖擦件11进行消毒杀菌、消毒覆盖范围广和用户体验感强的特点;
通过设置挡板组件8,所述挡板组件8包括至少一挡板81,所有所述挡板81可开合地设置在该入口21处,并在闭合时至少部分遮挡所述入口21,由于清洁机器人1的进入需要设置开口,存在所述开口的大小不能小于所述清洁机器人1的大小的问题,将入口21的部分进行遮蔽,其开口大小变小,可以在入口21处将工作台3和外界至少部分隔离,减少可能的污水外溅概率,并且声波的阻碍增加,减少可能的噪音外传,解决了敞开式的基站无法将工作台3与外界隔绝的问题,尤其其在完全遮蔽入口21时,能够极大的减少噪音,并且完全隔绝污水外溅。本申请的基站具有噪音小,防污水外溅和用户体验感好的特点。
通过设置挡板组件8,所述挡板组件8包括至少一挡板81,所有所述挡板81均可开合地设置在该入口21处,并在闭合时与所述入口21形成密封,由于挡板81闭合时在该入口21处将该入口21密封,这种结构的基站相对于未设置挡板81的基站能够在入口21处将工作台3和外界隔离,不会因为需要在基座2上设置清洁机器人1的入口21导致在该入口21处泄露可能存在的液体或气体,也能够减少可能存在的噪音外传,具有密封特点,用户体验感好。本申请的基站具有密封性好和用户体验感好的特点。
挡板组件8还包括驱动单元87,所述驱动单元87的输出端与所述挡板81连接,以驱动所述挡板81打开或闭合,通过驱动单元87驱动挡板81动作,比起未设置驱动单元87的挡板组件8,打开和闭合时能够更加稳定,并且无需清 洁机器人1撞击挡板81打开挡板81,解决了清洁机器人1的前撞组件碰撞挡板81后退避挡板81的问题。本申请的基站具有入口21可开闭的特点。
以上所述实施例仅表达了本申请的几种实施方式,其描述较为具体和详细,但并不能因此而理解为对申请专利范围的限制。应当指出的是,对于本领域的普通技术人员来说,在不脱离本申请构思的前提下,还可以做出若干变形和改进,这些都属于本申请的保护范围。

Claims (20)

  1. 一种基站,其中,包括:
    基座,所述基座具有:
    工作台,所述工作台供清洁机器人停靠;
    供清洁机器人进入的入口;
    挡板组件,所述挡板组件包括至少一挡板,所有所述挡板均能够开合地设置在该入口处,并在闭合时至少部分遮挡所述入口。
  2. 根据权利要求1所述的基站,其中,所有所述挡板在所述入口的位置与所述基座转动连接。
  3. 根据权利要求2所述的基站,其中,所述挡板组件包括一所述挡板,所述挡板设置在所述入口的上部或下部。
  4. 根据权利要求3所述的基站,其中,还包括:
    杠杆组件,所述杠杆组件包括一作用端和一动作端,该作用端设置在所述基座内的清洁机器人驶入路径上,所述挡板组件包括一所述挡板,所述挡板位于所述动作端的动作路径上,所述作用端动作时,所述动作端带动所述挡板动作至至少部分遮挡所述入口。
  5. 根据权利要求4所述的基站,其中,还包括:
    第一引导件,所述第一引导件延伸至待清洁面,用于引导清洁机器人驶入所述基座,所述挡板与所述第一引导件转动连接;
    在所述作用端处于未受清洁机器人重力的自然状态时,所述挡板转动至与所述第一引导件贴合;
    在所述作用端处于受清洁机器人重力的压合状态时,所述挡板转动至至少部分遮挡所述入口。
  6. 根据权利要求1所述的基站,其中,所述挡板组件包括两相向设置的所述挡板;
    两所述挡板分别设置在所述入口上部和下部,或,两所述挡板分别设置在所述入口左侧和右侧。
  7. 根据权利要求1所述的基站,其中,所述挡板组件包括四个相向设置的所述挡板,四个所述挡板分别设置在入口的四周,闭合时,四个所述挡板围成至少部分遮挡所述入口的遮挡结构。
  8. 根据权利要求1所述的基站,其中,所述挡板组件包括至少四个所述挡板,所有所述挡板闭合时,所有所述挡板围成中部缺口,所述中部缺口与清洁机器人配合形成能够将紫外线发生装置直射的紫外线全部遮挡的遮挡结构。
  9. 根据权利要求1所述的基站,其中,所述挡板组件包括至少一所述挡板,所有所述挡板均呈方形,所有所述挡板围成至至少部分遮挡所述入口的遮挡结构。
  10. 根据权利要求1所述的基站,其中,所述挡板组件包括至少四个所述挡板,所有所述挡板均呈梯形,所有所述挡板围成至少部分遮挡所述入口的遮挡结构。
  11. 根据权利要求1所述的基站,其中,所述基站还包括:
    紫外线发生装置,所述紫外线发生装置设置在所述基座内,并且其发射的紫外线覆盖范围覆盖清洁机器人的拖擦件;
    所述挡板为不可透紫外线的挡板,所有所述挡板闭合时,所有所述挡板动作至至少部分遮挡所述入口。
  12. 根据权利要求2所述的基站,其中,所述基站还包括:
    紫外线发生装置,所述紫外线发生装置设置在所述基座内,并且其发射的紫外线覆盖范围覆盖清洁机器人的拖擦件;
    所述挡板为不可透紫外线的挡板,所有所述挡板闭合时,所有所述挡板动作至至少部分遮挡所述入口。
  13. 根据权利要求3所述的基站,其中,所述基站还包括:
    紫外线发生装置,所述紫外线发生装置设置在所述基座内,并且其发射的紫外线覆盖范围覆盖清洁机器人的拖擦件;
    所述挡板为不可透紫外线的挡板,所有所述挡板闭合时,所有所述挡板动作至至少部分遮挡所述入口。
  14. 根据权利要求4所述的基站,其中,所述基站还包括:
    紫外线发生装置,所述紫外线发生装置设置在所述基座内,并且其发射的紫外线覆盖范围覆盖清洁机器人的拖擦件;
    所述挡板为不可透紫外线的挡板,所有所述挡板闭合时,所有所述挡板动作至至少部分遮挡所述入口。
  15. 根据权利要求5所述的基站,其中,所述基站还包括:
    紫外线发生装置,所述紫外线发生装置设置在所述基座内,并且其发射的紫外线覆盖范围覆盖清洁机器人的拖擦件;
    所述挡板为不可透紫外线的挡板,所有所述挡板闭合时,所有所述挡板动作至至少部分遮挡所述入口。
  16. 根据权利要求11所述的基站,其中,所述基站还包括:
    污水箱,所述污水箱设置在所述基座内;
    所述紫外线发生装置发射的紫外线覆盖范围覆盖污水箱或/和清洁机器人的拖擦件。
  17. 根据权利要求12所述的基站,其中,所述基站还包括:
    污水箱,所述污水箱设置在所述基座内;
    所述紫外线发生装置发射的紫外线覆盖范围覆盖污水箱或/和清洁机器人的拖擦件。
  18. 根据权利要求13所述的基站,其中,所述基站还包括:
    污水箱,所述污水箱设置在所述基座内;
    所述紫外线发生装置发射的紫外线覆盖范围覆盖污水箱或/和清洁机器人的拖擦件。
  19. 根据权利要求14所述的基站,其中,所述基站还包括:
    污水箱,所述污水箱设置在所述基座内;
    所述紫外线发生装置发射的紫外线覆盖范围覆盖污水箱或/和清洁机器人的拖擦件。
  20. 根据权利要求15所述的基站,其中,所述基站还包括:
    污水箱,所述污水箱设置在所述基座内;
    所述紫外线发生装置发射的紫外线覆盖范围覆盖污水箱或/和清洁机器人的拖擦件。
PCT/CN2021/135581 2021-03-23 2021-12-05 基站 WO2022199119A1 (zh)

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CN114504283B (zh) * 2022-01-14 2023-12-08 科沃斯机器人股份有限公司 清洁基站、清洁设备及清洁系统

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