WO2022120909A1 - 一种树脂组合物及包含其的树脂胶液、预浸料、层压板、覆铜板和印刷电路板 - Google Patents

一种树脂组合物及包含其的树脂胶液、预浸料、层压板、覆铜板和印刷电路板 Download PDF

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Publication number
WO2022120909A1
WO2022120909A1 PCT/CN2020/136755 CN2020136755W WO2022120909A1 WO 2022120909 A1 WO2022120909 A1 WO 2022120909A1 CN 2020136755 W CN2020136755 W CN 2020136755W WO 2022120909 A1 WO2022120909 A1 WO 2022120909A1
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Prior art keywords
resin
resin composition
styrene
prepreg
titanate
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PCT/CN2020/136755
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English (en)
French (fr)
Inventor
殷卫峰
霍翠
刘锐
许永静
颜善银
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广东生益科技股份有限公司
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Publication of WO2022120909A1 publication Critical patent/WO2022120909A1/zh

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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L47/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds; Compositions of derivatives of such polymers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00—Layered products comprising a layer of metal
    • B32B15/14—Layered products comprising a layer of metal next to a fibrous or filamentary layer
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00—Layered products comprising a layer of metal
    • B32B15/20—Layered products comprising a layer of metal comprising aluminium or copper
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B5/00—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts
    • B32B5/02—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts characterised by structural features of a fibrous or filamentary layer
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B5/00—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts
    • B32B5/22—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts characterised by the presence of two or more layers which are next to each other and are fibrous, filamentary, formed of particles or foamed
    • B32B5/24—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts characterised by the presence of two or more layers which are next to each other and are fibrous, filamentary, formed of particles or foamed one layer being a fibrous or filamentary layer
    • B32B5/26—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts characterised by the presence of two or more layers which are next to each other and are fibrous, filamentary, formed of particles or foamed one layer being a fibrous or filamentary layer another layer next to it also being fibrous or filamentary
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/24—Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L71/00—Compositions of polyethers obtained by reactions forming an ether link in the main chain; Compositions of derivatives of such polymers
    • C08L71/08—Polyethers derived from hydroxy compounds or from their metallic derivatives
    • C08L71/10—Polyethers derived from hydroxy compounds or from their metallic derivatives from phenols
    • C08L71/12—Polyphenylene oxides
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/03—Use of materials for the substrate
    • H05K1/05—Insulated conductive substrates, e.g. insulated metal substrate
    • H05K1/056—Insulated conductive substrates, e.g. insulated metal substrate the metal substrate being covered by an organic insulating layer
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2250/00—Layers arrangement
    • B32B2250/20—All layers being fibrous or filamentary
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2250/00—Layers arrangement
    • B32B2250/40—Symmetrical or sandwich layers, e.g. ABA, ABCBA, ABCCBA
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2260/00—Layered product comprising an impregnated, embedded, or bonded layer wherein the layer comprises an impregnation, embedding, or binder material
    • B32B2260/02—Composition of the impregnated, bonded or embedded layer
    • B32B2260/021—Fibrous or filamentary layer
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2260/00—Layered product comprising an impregnated, embedded, or bonded layer wherein the layer comprises an impregnation, embedding, or binder material
    • B32B2260/04—Impregnation, embedding, or binder material
    • B32B2260/046—Synthetic resin
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2262/00—Composition or structural features of fibres which form a fibrous or filamentary layer or are present as additives
    • B32B2262/10—Inorganic fibres
    • B32B2262/101—Glass fibres
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00—Properties of the layers or laminate
    • B32B2307/20—Properties of the layers or laminate having particular electrical or magnetic properties, e.g. piezoelectric
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00—Properties of the layers or laminate
    • B32B2307/30—Properties of the layers or laminate having particular thermal properties
    • B32B2307/302—Conductive
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2457/00—Electrical equipment
    • B32B2457/08—PCBs, i.e. printed circuit boards
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2347/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds; Derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2371/00—Characterised by the use of polyethers obtained by reactions forming an ether link in the main chain; Derivatives of such polymers
    • C08J2371/08—Polyethers derived from hydroxy compounds or from their metallic derivatives
    • C08J2371/10—Polyethers derived from hydroxy compounds or from their metallic derivatives from phenols
    • C08J2371/12—Polyphenylene oxides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2447/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds; Derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2453/00—Characterised by the use of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Derivatives of such polymers
    • C08J2453/02—Characterised by the use of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Derivatives of such polymers of vinyl aromatic monomers and conjugated dienes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2471/00—Characterised by the use of polyethers obtained by reactions forming an ether link in the main chain; Derivatives of such polymers
    • C08J2471/08—Polyethers derived from hydroxy compounds or from their metallic derivatives
    • C08J2471/10—Polyethers derived from hydroxy compounds or from their metallic derivatives from phenols
    • C08J2471/12—Polyphenylene oxides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/38—Boron-containing compounds
    • C08K2003/382—Boron-containing compounds and nitrogen
    • C08K2003/385—Binary compounds of nitrogen with boron
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K7/00—Use of ingredients characterised by shape
    • C08K7/02—Fibres or whiskers
    • C08K7/04—Fibres or whiskers inorganic
    • C08K7/14—Glass
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K9/00—Use of pretreated ingredients
    • C08K9/04—Ingredients treated with organic substances
    • C08K9/06—Ingredients treated with organic substances with silicon-containing compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2205/00—Polymer mixtures characterised by other features
    • C08L2205/02—Polymer mixtures characterised by other features containing two or more polymers of the same C08L -group
    • C08L2205/025—Polymer mixtures characterised by other features containing two or more polymers of the same C08L -group containing two or more polymers of the same hierarchy C08L, and differing only in parameters such as density, comonomer content, molecular weight, structure
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2205/00—Polymer mixtures characterised by other features
    • C08L2205/03—Polymer mixtures characterised by other features containing three or more polymers in a blend
    • C08L2205/035—Polymer mixtures characterised by other features containing three or more polymers in a blend containing four or more polymers in a blend
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/01—Dielectrics
    • H05K2201/0137—Materials

Definitions

  • the present invention relates to the technical field of high-frequency materials, in particular to a resin composition and resin glue, prepreg, laminate, copper clad laminate and printed circuit board containing the same, and in particular to a high-frequency resin composition and containing the same resin glues, prepregs, laminates, copper clad laminates and printed circuit boards.
  • Patent applications CN101328277A, JP53145891A and JP57105347A all disclose a high-frequency resin composition and a copper clad laminate prepared therefrom, which have dielectric loss but relatively poor thermal conductivity.
  • Patent application WO2010141432A1 discloses a high-frequency heat-conducting substrate material, but the heat-conducting filler in the system needs special treatment, the process is complicated, and the cost is high.
  • the metal substrate has a strong heat dissipation capability and can meet the heat dissipation requirements of electronic products.
  • Patent applications CN102746615A, CN103722805A, CN103773266A all disclose a high thermal conductivity aluminum-based copper clad laminate, but the dielectric loss of the plate is high, and it is difficult to meet the requirements of high-frequency plates.
  • One of the objects of the present invention is to provide a resin composition, especially to provide a high-frequency resin composition, the resin composition has excellent comprehensive properties such as high thermal conductivity, high peel strength, low dielectric loss, etc. Meet the performance requirements of high frequency sheet.
  • the present invention provides a resin composition comprising the following components: polyolefin resin 10wt%-50wt% (eg 15wt%, 20wt%, 25wt%, 30wt%, 35wt%, 40wt%, 45wt%, etc.
  • boron nitride filler 5wt% ⁇ 40wt% eg 6wt%, 8wt%, 10wt%, 12wt%, 14wt%, 16wt%, 18wt%, 20wt%, 22wt%, 24wt%, 26wt%, 28wt%, 30wt% %, 32wt%, 34wt%, 36wt%, 38wt%, etc.
  • ceramic fillers 5wt% to 40wt% eg 6wt%, 8wt%, 10wt%, 12wt%, 14wt%, 16wt%, 18wt%, 20wt%, 22wt% %, 24wt%, 26wt%, 28wt%, 30wt%, 32wt%, 34wt%, 36wt%, 38wt%, etc.
  • silica 30wt% to 70wt% such as 32wt%, 34wt%, 36wt%, 38wt%, 40
  • the ceramic filler includes any one or a combination of at least two of calcium titanate, lithium titanate, potassium sodium titanate, calcium strontium titanate, calcium zirconate or magnesium zirconate.
  • ceramic fillers are added to the resin composition system based on polyolefin resin. Compared with titanium dioxide, barium titanate, etc., these ceramic fillers selected in the present invention are matched with boron nitride and silicon dioxide. Using the resin composition can make the board prepared by the resin composition have lower dielectric loss, good thermal conductivity and peel strength at the same time.
  • titanium dioxide or barium titanate has better dielectric properties or is more widely used in ceramic fillers, or it is generally considered that titanium dioxide, barium titanate, calcium titanate, lithium titanate, potassium sodium titanate , calcium strontium titanate, calcium zirconate or magnesium zirconate are ceramic fillers, which have the same dielectric properties and can be used as substitutes for each other to prepare dielectric sheets.
  • the present invention unexpectedly found that adding a specific type of ceramic filler, including calcium titanate, lithium titanate, potassium sodium titanate, strontium calcium titanate, calcium zirconate or magnesium zirconate, any one or a combination of at least two , used in combination with boron nitride and silicon dioxide, compared with titanium dioxide, barium titanate, boron nitride and silicon dioxide, which are also ceramic fillers, have lower dielectric loss, and have good thermal conductivity and peel strength.
  • a specific type of ceramic filler including calcium titanate, lithium titanate, potassium sodium titanate, strontium calcium titanate, calcium zirconate or magnesium zirconate, any one or a combination of at least two , used in combination with boron nitride and silicon dioxide, compared with titanium dioxide, barium titanate, boron nitride and silicon dioxide, which are also ceramic fillers, have lower dielectric loss, and have good thermal conductivity and peel strength.
  • the present invention adds a specific content of boron nitride filler, ceramic filler and silica, so that the board made of the resin composition can have both high thermal conductivity, high peel strength and low dielectric properties. If the addition amount of boron is less than 5wt%, the thermal conductivity will be reduced; if the addition amount of boron nitride is higher than 40wt%, the peel strength will be reduced; if the addition amount of the ceramic filler is outside the range, the dielectric properties will be deteriorated; two The addition amount of silicon oxide is less than 30wt%, which will lead to high dielectric loss, and the addition amount of silicon dioxide is higher than 70wt%, which will lead to low peel strength and low thermal conductivity of the sheet.
  • plates with different dielectric constants can be obtained by adjusting the proportions of three kinds of fillers: boron nitride filler, ceramic filler and silica filler.
  • the polyolefin resin includes unsaturated polybutadiene resin, styrene-butadiene-styrene triblock copolymer (SBS), hydrogenated styrene-butadiene-styrene triblock copolymer (SEBS) or styrene-butadiene resin or a combination of at least two.
  • SBS unsaturated polybutadiene resin
  • SEBS hydrogenated styrene-butadiene-styrene triblock copolymer
  • SEBS hydrogenated styrene-butadiene-styrene triblock copolymer
  • the molecular weight of the unsaturated polybutadiene resin is 1,000-50,000, such as 2,000, 5,000, 10,000, 15,000, 20,000, 25,000, 30,000, 35,000, 40,000, 45,000, etc., preferably 2,000-40,000, more preferably 3,000- 30000.
  • the molecular weight refers to the number-average molecular weight
  • the testing method of the molecular weight is GB/T21863-2008, as measured by gel permeation chromatography on the basis of polystyrene calibration.
  • the content of vinyl groups in the unsaturated polybutadiene resin is 60%-99%, such as 65%, 70%, 75%, 80%, 85%, 90%, 95%, etc., preferably 70% -95%, more preferably 75%-93%.
  • the vinyl content of the polybutadiene resin in the present invention refers to the percentage of the molar amount of vinyl-containing units to the molar amount of all units of the polybutadiene resin.
  • the unsaturated polybutadiene resin includes polar group-modified unsaturated polybutadiene resin, preferably epoxy-modified polybutadiene resin, maleic anhydride-modified polybutadiene resin, Any one or a combination of at least two of acrylic modified polybutadiene resin, hydroxyl terminated polybutadiene resin, carboxyl terminated polybutadiene resin or amine modified polybutadiene resin.
  • polar group-modified unsaturated polybutadiene resin preferably epoxy-modified polybutadiene resin, maleic anhydride-modified polybutadiene resin, Any one or a combination of at least two of acrylic modified polybutadiene resin, hydroxyl terminated polybutadiene resin, carboxyl terminated polybutadiene resin or amine modified polybutadiene resin.
  • the graft ratio of polar groups on the molecular chain of the polar group-modified unsaturated polybutadiene resin is between 5 wt % and 10 wt %.
  • grafting rate refers to the mass percentage of the mass of the grafted group in the total mass.
  • the weight percentage of the polar group-modified unsaturated polybutadiene resin in the resin composition is 10wt%-40wt%, such as 12wt%, 14wt%, 15wt%, 18wt%, 20wt% , 22wt%, 25wt%, 28wt%, 30wt%, 33wt%, 35wt%, 38wt%, etc., preferably 15wt%-35wt%, more preferably 20wt%-30wt%.
  • the molecular weight of the styrene-butadiene resin is 5,000-50,000, such as 10,000, 15,000, 20,000, 25,000, 30,000, 35,000, 40,000, 45,000, etc., preferably 8,000-40,000, more preferably 15,000-30,000.
  • the content of ethylene units in the styrene-butadiene resin is 60%-99%, such as 65%, 70%, 75%, 80%, 85%, 90%, 95%, etc., preferably 70%-95%, further Preferably 75%-93%.
  • the content of styrene units in the styrene-butadiene resin is 30%-60%, such as 35%, 40%, 45%, 50%, 55%, 58%, etc., preferably 35%-55%, more preferably 40% %-50%.
  • ethylene unit content and styrene unit content refer to the molar ratio of the two kinds of structural units in the total structural units respectively in the styrene-butadiene resin.
  • the weight percentage of the styrene-butadiene resin in the resin composition is 40wt%-50wt%, such as 41wt%, 42wt%, 43wt%, 44wt%, 45wt%, 46wt%, 47wt%, 48wt%, 49wt%, etc., preferably 42wt%-50wt%, more preferably 45wt%-50wt%.
  • the weight percentage of the boron nitride filler in the resin composition is 6-30 wt %, preferably 8-20 wt %.
  • the median particle size D50 of the boron nitride filler is 2-50uM, such as 5uM, 10uM, 15uM, 2uM, 25uM, 30uM, 35uM, 40uM, 45uM, etc., preferably 5-40uM, more preferably 6- 20uM.
  • the particle size of the fillers in this paper was tested by laser diffraction method, and the testing instrument was a Malvern laser particle sizer, model MS2000.
  • the boron nitride fillers include any one or a combination of at least two of boron nitride fibers, boron nitride tubes, spherical boron nitride fillers, oval boron nitride fillers or irregular-shaped boron nitride fillers .
  • the boron nitride fibers and boron nitride tubes may have an average outer diameter of 10 nm to 10 microns and one of a length greater than or equal to 1 micron, or 10 microns to 10 centimeters (cm), or 500 microns to 1 mm or both.
  • the boron nitride fiber or boron nitride tube may have an aspect ratio calculated as length/cross-sectional dimension of 10 to 1,000,000, or 20 to 500,000, or 40 to 250,000.
  • the boron nitride fillers of the present invention may be crystalline, polycrystalline, amorphous, or combinations thereof. Filler shapes include flakes, spheres, and layer cakes.
  • the boron nitride fillers of the present invention may form agglomerates in the dielectric layer.
  • the agglomerates may have an average agglomerate size distribution (ASD) or diameter of 1 to 200 microns, or 2 to 125 microns, or 3 to 40 microns.
  • the boron nitride may be present as a mixture of agglomerated and/or non-agglomerated boron nitride fillers. In particular, 50 volume percent or less, 30 volume percent or less, or 10 volume percent or less boron nitride may agglomerate in the dielectric layer.
  • the weight percentage of the ceramic filler in the resin composition is 10wt%-35wt%, preferably 15wt%-20wt%.
  • the median particle size D50 of the ceramic filler is 0.1-40uM, such as 1uM, 5uM, 10uM, 15uM, 20uM, 25uM, 30uM, 35uM, etc., preferably 1-30uM, more preferably 2-20uM.
  • the weight percentage of the silica in the resin composition is 35wt%-60wt%, preferably 40wt%-50wt%.
  • the silica comprises microcrystalline silica and/or amorphous silica.
  • the amorphous silica comprises fused amorphous silica.
  • the silica is spherical or irregular in shape.
  • the median particle size D50 of the silica is 1-40uM, such as 2uM, 5uM, 10uM, 15uM, 20uM, 25uM, 30uM, 35uM, 40uM, etc., preferably 3-30uM, more preferably 5-20uM .
  • the resin composition further includes unsaturated polyphenylene ether resin.
  • the unsaturated polyphenylene ether resin includes a polyphenylene ether resin with an unsaturated double bond at the molecular end.
  • the number average molecular weight of the unsaturated polyphenylene ether resin is 500-5000, such as 1000, 1500, 2000, 2500, 3000, 3500, 4000, 4500 and the like.
  • the weight percentage of the unsaturated polyphenylene ether resin in the resin composition is 40wt%-50wt%, such as 41wt%, 42wt%, 43wt%, 44wt%, 45wt%, 46wt%, 47wt%, 48wt% %, 49wt%, etc., preferably 42wt%-50wt%, more preferably 45wt%-50wt%.
  • the structure of the unsaturated polyphenylene ether resin is shown in formula (1):
  • the a and b are each independently an integer of 1-30;
  • the Z has the structure shown in formula (2) or formula (3):
  • described A is selected from any one of C6-C20 arylene, C1-C10 alkylene or carbonyl, and described R 1 , R 2 and R 3 are each independently selected from hydrogen atoms or C1-C10 alkyl, the m is selected from an integer of 0-10, such as 1, 2, 3, 6, 8, 9, etc.;
  • the wavy line mark represents the connection key
  • the R 4 and R 6 are each independently selected from any one of a hydrogen atom, a halogen atom, a C1-C8 alkyl group or a phenyl group, and the R 5 and R 7 are each independently selected from any one of halogen atom, C1-C8 alkyl group or phenyl group;
  • the R 8 -R 15 are each independently selected from any one of a hydrogen atom, a halogen atom, a C1-C8 alkyl group or a phenyl group, the B is selected from a C1-C20 hydrocarbylene group, and the Said n is 0 or 1.
  • the resin composition further includes a bismaleimide compound.
  • the bismaleimide compound has the structure shown in formula (6):
  • R is selected from p-valent C1-C10 alkane or C6-C20 aryl
  • Xa and Xb are each independently selected from hydrogen atom, halogen atom or C1-C10 alkane Any one of , the p is an integer greater than or equal to 1.
  • the bismaleimide compound includes N-phenylmaleimide, N-(2-methylphenyl)maleimide, N-(4-methylphenyl)maleimide Laminide, N-(2,6-dimethylphenyl)maleimide, N-(2,6-diethylphenyl)maleimide, N-(2-methoxy phenyl)maleimide, N-benzylmaleimide, N-dodecylmaleimide, N-isopropylmaleimide or N-cyclohexylmaleimide Any one or a combination of at least two of the imines.
  • the bismaleimide compound includes 2,2-bis(4-(4-maleimidephenoxy)phenyl)propane and/or bis(3-ethyl-5-methyl) yl-4-maleimidophenyl)methane.
  • an initiator is also included in the resin composition.
  • the weight percentage of the initiator in the resin composition is 0.1wt%-7wt%, such as 0.5wt%, 1wt%, 2wt%, 3wt%, 4wt%, 5wt%, 6wt%, etc.
  • the 1-min half-life temperature of the initiator is between 50 and 160°C, or the 1-min half-life temperature of the initiator is between 160°C and 300°C.
  • the initiator includes a,a'-bis(tert-butyl-m-cumyl peroxide)benzene, dicumyl peroxide, tert-butyl cumyl peroxide, 1,1-bis(tert-butylperoxide) Hexylperoxy)-3,3,5-trimethylcyclohexane, 2,5-dimethyl-2,5-di(tert-butylperoxy)hex-3-yne, tert-butyl octanoate, Tert-butyl peroxybenzoate, triethylamine and its salts, quaternary amine salt compounds, 2,4,6-tris(dimethylaminomethylamine)phenol, benzyldimethylamine, imidazoles, tris Any one or a combination of at least two of amylphenolic amine, mono- or polyphenolic compound, boron trifluoride and its organic complex, phosphoric acid or triphenyl pho
  • the resin composition further includes a flame retardant.
  • the flame retardant includes decabromodiphenyl ether, ethyl-bis(tetrabromophthalimide), decabromodiphenylethane, tris(2,6-dimethylphenyl) ) phosphine, 10-(2,5-dihydroxyphenyl)-9,10-dihydro-9-oxy-10-phosphine-10-oxide, 2,6-bis(2,6-dimethylbenzene) yl) phosphinobenzene or 10-phenyl-9,10-dihydro-9-oxy-10-phosphinophenanthrene-10-oxide or a combination of at least two.
  • the resin composition further includes a crosslinking agent.
  • the crosslinking agent includes triallyl isocyanurate, triallyl polyisocyanurate, triallyl cyanurate, trimethacrylic acid, diallyl phthalate Any one or a combination of at least two of esters, divinylbenzenes or multifunctional acrylates. "Multifunctional" means containing at least two functional groups.
  • a curing accelerator is also included in the resin composition.
  • the curing accelerator includes 2-methylimidazole, 2-ethyl-4-methylimidazole, 2-phenylimidazole, 2-undecylimidazole, 1-benzyl-2-methylimidazole, Any one of 2-heptadecyl imidazole, 2-isopropyl imidazole, 2-phenyl-4-methyl imidazole, 2-dodecyl imidazole or 1-cyanoethyl-2-methyl imidazole or a combination of at least two.
  • auxiliary agents are also included in the resin composition.
  • the other adjuvants include any one or a combination of at least two of antioxidants, heat stabilizers, antistatic agents, ultraviolet absorbers, pigments, colorants or lubricants.
  • one or more of the fillers may be surface treated with surfactants, silanes, organic polymers or other inorganic materials to facilitate dispersion into the polymer.
  • the particles can be coated with surfactants such as oleylamine oleic acid and the like.
  • Silane may include N- ⁇ (aminoethyl)- ⁇ -aminopropyltriethoxysilane, N- ⁇ (aminoethyl)- ⁇ -aminopropyltrimethoxysilane, ⁇ -aminopropyltriethoxysilane Silane, ⁇ -aminopropyltrimethoxysilane, 3-chloropropyl-methoxysilane, ⁇ -glycidoxypropyltriethoxysilane, ⁇ -glycidoxypropyltrimethoxysilane Silane, ⁇ -Mercaptopropyltriethoxysilane, ⁇ -Mercaptopropyltrimethoxysilane, ⁇ -Methacryloxypropyltriethoxysilane, ⁇ -Methacryloxypropyl Trimethoxysilane, N-phenyl- ⁇ -aminopropyltriethoxysilane, N-phenyl- ⁇ -amino
  • the second object of the present invention is to provide a resin glue, which is obtained by dissolving or dispersing the resin composition described in the first object in a solvent.
  • the conventional preparation method of the resin glue solution of the present invention is as follows: firstly put the solid matter, then add the liquid solvent, stir until the solid matter is completely dissolved, then add the liquid resin and the accelerator, and continue to stir evenly.
  • the solvent in the present invention is not particularly limited, and alcohols such as methanol, ethanol, butanol, ethyl cellosolve, butyl cellosolve, ethylene glycol methyl ether, carbitol, butyl carbitol, etc. can be selected. , acetone, methyl ethyl ketone, methyl ethyl ketone, cyclohexanone and other ketones, toluene, xylene and other aromatic hydrocarbons, ethyl acetate, ethoxyethyl acetate and other esters, N,N-diol Nitrogen-containing solvents such as methylformamide and N,N-dimethylacetamide.
  • alcohols such as methanol, ethanol, butanol, ethyl cellosolve, butyl cellosolve, ethylene glycol methyl ether, carbitol, butyl carbitol, etc.
  • acetone
  • the above solvents may be used alone or in combination of two or more. Ketones such as acetone, butanone, methyl ethyl ketone, and cyclohexanone are preferred.
  • the addition amount of the solvent can be selected by those skilled in the art according to their own experience, so that the resin glue can reach a suitable viscosity for use.
  • a third object of the present invention is to provide a prepreg comprising a reinforcing material and the resin composition described in one of the objects attached to it after being impregnated and dried.
  • the reinforcing material can be organic fiber cloth, inorganic fiber woven cloth or non-woven fabric; wherein, the organic fiber is aramid non-woven fabric; the inorganic fiber woven cloth is E-glass fiber cloth, D-glass cloth, S-glass cloth, T-glass cloth, NE-glass cloth or quartz cloth.
  • the thickness of the reinforcing material is 0.01-0.2mm, such as 0.02mm, 0.05mm, 0.08mm, 0.1mm, 0.12mm, 0.15mm, 0.18mm, and the like.
  • the reinforcing material preferably undergoes fiber opening treatment and silane coupling agent surface treatment; the silane coupling agent is any one of epoxy silane coupling agent, amino silane coupling agent or vinyl silane coupling agent or a mixture of at least two.
  • the preparation method of the prepreg is as follows: impregnating the reinforcing material with the above-mentioned resin composition, and then baking at 100-250° C. for 1-15 minutes to obtain the prepreg.
  • the fourth object of the present invention is to provide a laminate comprising at least one prepreg according to the third object.
  • the preparation method of the laminate is a laminate made by bonding one or more than two prepregs together by heating and pressing.
  • the laminate is prepared by curing in a hot press, the curing temperature is 150-250° C., and the curing pressure is 10-60 Kg/cm 2 .
  • the fifth object of the present invention is to provide a copper clad laminate comprising at least one of the prepregs described in the third object and metal foils covered on one or both sides of the laminated prepregs.
  • the metal foil is copper foil, nickel foil, aluminum foil, SUS foil, or the like.
  • the sixth object of the present invention is to provide a printed circuit board, which includes the laminate described in the fourth object or the copper clad laminate described in the fifth object.
  • the printed circuit board is a high frequency printed circuit board.
  • "high frequency” is defined as a frequency of 1 GHz or more.
  • the present invention has the following beneficial effects:
  • the resin composition system based on polyolefin resin
  • the contents of boron nitride fillers, ceramic fillers and silica are controlled within a specific range, so that the resin composition can be prepared.
  • the obtained sheet has the properties of high thermal conductivity, high peel strength and low dielectric, and can meet the requirements of high frequency printed circuit boards.
  • Cross-linking agent TAIC cross-linking agent, purchased from Liuyang Organic Chemical Co., Ltd.
  • Lithium titanate Li 4 Ti 5 O 12 , Nantong Huazhong Electronic Materials Co., Ltd.;
  • Potassium sodium titanate Nantong Huazhong Electronic Materials Co., Ltd.;
  • Titanium dioxide TR81, Huntsman Chemical Trading Co., Ltd.;
  • Barium titanate BT300, Shandong Guoci Functional Materials Co., Ltd.
  • the resin composition is prepared according to the components shown in Table 1, and the copper clad laminate samples are made according to the following manufacturing method of the copper clad laminate:
  • each component of the formula amount in the resin composition is uniformly mixed in xylene, and uniformly dispersed at room temperature to obtain a resin glue with a solid content of 80%;
  • step (2) Impregnating the resin glue obtained in step (1) with a reinforcing material (glass fiber cloth), placing it in an oven at 155° C. for 5 minutes to achieve curing, and obtaining a prepreg; placing the prepreg on two copper Between the foils, the copper clad laminates were obtained by laminating and curing for 2 hours in a hot press at 210° C. and 5 MPa pressure.
  • a reinforcing material glass fiber cloth
  • the resin composition is prepared according to the components shown in Table 2, and the copper clad laminate samples are made according to the following manufacturing method of the copper clad laminate:
  • each component of the formula amount in the lipid composition is uniformly mixed in xylene, and uniformly dispersed at room temperature to obtain a resin glue with a solid content of 80%;
  • step (2) Impregnating the resin glue obtained in step (1) with a reinforcing material (glass fiber cloth), placing it in an oven at 155° C. for 5 minutes to achieve curing, and obtaining a prepreg; placing the prepreg on two copper Between the foils, the copper clad laminates are obtained by laminating and curing for 2 hours in a hot press at 210° C. and 5 MPa pressure.
  • a reinforcing material glass fiber cloth
  • Dielectric constant (Dk) and dielectric loss factor (Df) Using SPDR method, at 10GHz frequency, test the dielectric constant Dk and dielectric loss Df of the plate;
  • the addition amount of each component is a weight percentage (wt.%), which means that the corresponding substance is not added.
  • the copper clad laminate prepared by the resin composition provided by the present invention has the characteristics of low dielectric loss, high thermal conductivity and high peel strength, which can meet the requirements of high performance and miniaturization of the copper clad laminate. applications in electronic products.
  • the dielectric loss can reach 0.0023
  • the thermal conductivity can reach 2.07W/mK
  • the peel strength can reach 1.25N/mm.
  • Example 1 By comparing Example 1 with Comparative Example 1, Example 4 and Comparative Example 2, it can be seen that the addition amount of boron nitride filler is not within the range of 5wt% to 40wt%, and the obtained copper clad laminate cannot have both low dielectric loss and thermal conductivity.
  • Example 4 By comparing Example 4 and Comparative Examples 3-4, it can be seen that the addition amount of the ceramic filler is not in the range of 5wt% to 40wt%, and the obtained copper clad laminate cannot have the characteristics of low dielectric loss and high thermal conductivity. Among them, the addition amount Too low (comparative example 3) will lead to an increase in the value of dielectric loss, and too high an addition amount (comparative example 4) will lead to a decrease in thermal conductivity and an increase in dielectric loss.
  • Example 1 By comparing Example 1 and Comparative Examples 5-6, it can be seen that in the polyolefin resin system of the present invention, the selection of specific types of ceramic fillers can effectively reduce the intercalation of copper clad laminates compared to other ceramic fillers (titanium dioxide and barium titanate). electrical losses without affecting thermal conductivity and peel strength.
  • Example 3 By comparing Example 3 and Comparative Examples 7-8, it can be seen that the added amount of silica is not in the range of 30wt% to 70wt%, and the obtained copper clad laminate cannot have the characteristics of low dielectric loss, high thermal conductivity and high peel strength. , where the addition amount is too low (Comparative Example 7), which will lead to poor dielectric constant, dielectric loss and peel strength, and the addition amount is too high (Comparative Example 8), which will lead to a decrease in thermal conductivity.
  • Example 1 By comparing Example 1 and Comparative Example 9, it can be seen that the proportion of polyolefin resin is too high, which will lead to deterioration of thermal conductivity and dielectric loss.
  • the present invention illustrates the detailed method of the present invention through the above-mentioned embodiments, but the present invention is not limited to the above-mentioned detailed method, that is, it does not mean that the present invention must rely on the above-mentioned detailed method to be implemented.
  • Those skilled in the art should understand that any improvement to the present invention, the equivalent replacement of each raw material of the product of the present invention, the addition of auxiliary components, the selection of specific methods, etc., all fall within the protection scope and disclosure scope of the present invention.

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Abstract

一种树脂组合物及包含其的树脂胶液、预浸料、层压板、覆铜板和印刷电路板，所述树脂组合物包括如下组分：聚烯烃树脂10wt％-50wt％，氮化硼填料5wt％～40wt％，陶瓷填料5wt％～40wt％，二氧化硅30wt％～70wt％；所述陶瓷填料包括钛酸钙、钛酸锂、钛酸钾钠、钛酸锶钙、锆酸钙或锆酸镁中的任意一种或至少两种组合。该树脂组合物具有热导率高、剥离强度高、介电损耗小等优良综合性能，可以满足高频板材的性能要求。

Description

一种树脂组合物及包含其的树脂胶液、预浸料、层压板、覆铜板和印刷电路板 技术领域
本发明涉及高频材料技术领域，尤其涉及一种树脂组合物及包含其的树脂胶液、预浸料、层压板、覆铜板和印刷电路板，特别涉及一种高频树脂组合物及包含其的树脂胶液、预浸料、层压板、覆铜板和印刷电路板。
背景技术
近年来，随着计算机、手机登通讯设备高性能化、高功能化以及网络化的发展，为了高速传输及处理大容量信息，操作信号正在进行高频化，需要一种适用于高频信号传输特性的高性能电绝缘材料。
在高频电路中，电信号传输损失可能造成电子设备故障，必须减小介电信号传输损失。众所周知，电信号的介电损耗与形成电路的绝缘体的介质损耗角正切及所使用的电信号频率的乘积成正比。因此，作为绝缘体，可以通过选择介质损耗角正切小的绝缘材料，抑制介电损耗的增大。专利申请CN101328277A、JP53145891A、JP57105347A均公开了一种高频树脂组合物及其制备的覆铜板，具有介电损耗，但是导热性能相对较差。专利申请WO2010141432A1公开了一种高频导热基板材料，但是体系中的导热填料需要特殊处理，工艺复杂、成本高。
同时，随着电子产品的不断发展，器件的功率消耗越来越大，工作时间单位面积的热量越来越多，为了保证电子元器件的工作稳定性，对板材的散热性要求越来越高，板材的散热性不佳，使整机可靠性下降，甚至导致产品失效，缩短产品的使用寿命。而金属基板的散热能力强，能够满足电子产品的散热要求。专利申请CN102746615A、CN103722805A、CN103773266A均公开了一种 高导热铝基覆铜板，但是板材的介电损耗高，难以符合高频板材的要求。
因此，本领域亟待开发一种兼具优异的介电性能、导热性能和剥离强度的树脂组合物。
发明内容
本发明的目的之一在于提供一种树脂组合物，尤其在于提供一种高频树脂组合物，所述树脂组合物具有热导率高、剥离强度高、介电损耗小等优良综合性能，可以满足高频板材的性能要求。
为达此目的，本发明采用以下技术方案：
本发明提供一种树脂组合物，所述树脂组合物包括如下组分：聚烯烃树脂10wt％-50wt％(例如15wt％、20wt％、25wt％、30wt％、35wt％、40wt％、45wt％等)，氮化硼填料5wt％～40wt％(例如6wt％、8wt％、10wt％、12wt％、14wt％、16wt％、18wt％、20wt％、22wt％、24wt％、26wt％、28wt％、30wt％、32wt％、34wt％、36wt％、38wt％等)，陶瓷填料5wt％～40wt％(例如6wt％、8wt％、10wt％、12wt％、14wt％、16wt％、18wt％、20wt％、22wt％、24wt％、26wt％、28wt％、30wt％、32wt％、34wt％、36wt％、38wt％等)，二氧化硅30wt％～70wt％(例如32wt％、34wt％、36wt％、38wt％、40wt％、42wt％、44wt％、46wt％、48wt％、50wt％、52wt％、54wt％、56wt％、58wt％、60wt％、62wt％、64wt％、66wt％、68wt％等)；
所述陶瓷填料包括钛酸钙、钛酸锂、钛酸钾钠、钛酸锶钙、锆酸钙或锆酸镁中的任意一种或至少两种组合。
本发明在以聚烯烃树脂为基体的树脂组合物体系中，添加特定种类的陶瓷填料，相较于二氧化钛、钛酸钡等，本发明所选用的这些陶瓷填料与氮化硼、二氧化硅搭配使用，能够使树脂组合物制备的板材具有更低的介电损耗，同时 具有良好的热导率和剥离强度。
本领域在制备介电板材时，通常认为二氧化钛或钛酸钡在陶瓷填料中介电性能更优或应用更广泛，或者一般认为二氧化钛、钛酸钡、钛酸钙、钛酸锂、钛酸钾钠、钛酸锶钙、锆酸钙或锆酸镁等同属于陶瓷填料，在介电性能上一致，可互相替代用于制备介电板材。而本发明意外的发现，添加特定种类的陶瓷填料，包括钛酸钙、钛酸锂、钛酸钾钠、钛酸锶钙、锆酸钙或锆酸镁中的任意一种或至少两种组合，与氮化硼、二氧化硅搭配使用，比同属于陶瓷填料的二氧化钛、钛酸钡与氮化硼、二氧化硅搭配使用，具备更低的介电损耗，同时具有良好的热导率和剥离强度。因为预期用钛酸钙、钛酸锂、钛酸钾钠、钛酸锶钙、锆酸钙或锆酸镁中的任意一种或至少两种组合等陶瓷填料替代二氧化钛或钛酸钡，去与氮化硼、二氧化硅搭配使用，会获得等同或更差的介电损耗，因此本发明的填料组合物实现这样的低介电损耗的能力是出乎意料的。
此外，本发明添加特定含量的氮化硼填料、陶瓷填料和二氧化硅搭配，能够使树脂组合物制成的板材兼具高热导率、高剥离强度和低介电的性能，其中，氮化硼的添加量少于5wt％，会导致热导率降低，氮化硼的添加量高于40wt％，会导致剥离强度降低；陶瓷填料的添加量在范围以外，介电性能都会变差；二氧化硅的添加量少于30wt％，会导致介电损耗高，二氧化硅的添加量高于70wt％，会导致板材的剥离强度小、热导率偏低。
另外，本发明可以通过调节氮化硼填料、陶瓷填料和二氧化硅填料三种填料比例，从而得到不同介电常数的板材。
优选地，所述聚烯烃树脂包括不饱和聚丁二烯树脂、苯乙烯-丁二烯-苯乙烯三嵌段共聚物(SBS)、氢化苯乙烯-丁二烯-苯乙烯三嵌段共聚物(SEBS)或丁苯树脂中的任意一种或至少两种组合。
优选地，所述不饱和聚丁二烯树脂的分子量为1000-50000，例如2000、5000、10000、15000、20000、25000、30000、35000、40000、45000等，优选2000-40000，进一步优选3000-30000。
本发明中，分子量指的是数均分子量，分子量的测试方法为GB/T21863-2008，如以聚苯乙烯校准为基础通过凝胶渗透色谱法所测定。
优选地，所述不饱和聚丁二烯树脂中乙烯基的含量为60％-99％，例如65％、70％、75％、80％、85％、90％、95％等，优选70％-95％，进一步优选75％-93％。
本发明中所述聚丁二烯树脂的乙烯基含量是指含乙烯基的单元的摩尔量占聚丁二烯树脂所有单元摩尔量的百分比。
优选地，所述不饱和聚丁二烯树脂包括极性基团改性的不饱和聚丁二烯树脂，优选环氧改性聚丁二烯树脂、马来酸酐改性聚丁二烯树脂、丙烯酸改性聚丁二烯树脂、羟基封端的聚丁二烯树脂、羧基封端的聚丁二烯树脂或胺改性的聚丁二烯树脂中的任意一种或至少两种组合。
优选地，所述极性基团改性的不饱和聚丁二烯树脂分子链上的极性基团接枝率介于5wt％到10wt％之间。
本发明中，“接枝率”指的是是指接枝基团的质量占总质量的质量百分数。
优选地，所述极性基团改性的不饱和聚丁二烯树脂占所述树脂组合物的重量百分比为10wt％-40wt％，例如12wt％、14wt％、15wt％、18wt％、20wt％、22wt％、25wt％、28wt％、30wt％、33wt％、35wt％、38wt％等，优选15wt％-35wt％，进一步优选20wt％-30wt％。
优选地，所述丁苯树脂的分子量为5000-50000，例如10000、15000、20000、25000、30000、35000、40000、45000等，优选8000-40000，进一步优选15000-30000。
优选地，所述丁苯树脂中乙烯单元含量为60％-99％，例如65％、70％、75％、80％、85％、90％、95％等，优选70％-95％，进一步优选75％-93％。
优选地，所述丁苯树脂中苯乙烯单元含量为30％-60％，例如35％、40％、45％、50％、55％、58％等，优选35％-55％，进一步优选40％-50％。
上述乙烯单元含量和苯乙烯单元含量指的是丁苯树脂中两种结构单元分别占总结构单元的摩尔比。
优选地，所述的丁苯树脂占所述树脂组合物的重量百分比为40wt％-50wt％，例如41wt％、42wt％、43wt％、44wt％、45wt％、46wt％、47wt％、48wt％、49wt％等，优选42wt％-50wt％，进一步优选45wt％-50wt％。
优选地，所述氮化硼填料占所述树脂组合物的重量百分比为6-30wt％，优选8-20wt％。
优选地，所述氮化硼填料的粒径中度值D50为2-50uM，例如5uM、10uM、15uM、2uM、25uM、30uM、35uM、40uM、45uM等，优选5-40uM，进一步优选6-20uM。本文填料粒径都采用激光衍射法测试，测试仪器马尔文激光粒度仪，型号MS2000。
优选地，所氮化硼填料包括氮化硼纤维、氮化硼管、球形氮化硼填料、卵形氮化硼填料或不规则形状的氮化硼填料中的任意一种或至少两种组合。
优选地，氮化硼纤维和氮化硼管可以具有10nm至10微米的平均外径和大于或等于1微米、或10微米至10厘米(cm)、或500微米至1mm的长度中的一者或两者。氮化硼纤维或氮化硼管的计算为长度/截面尺寸的纵横比可以为10至1000000、或20至500000、或40至250000。
本发明氮化硼填料可以是结晶的、多晶的、无定形的或其组合。填料形状包括片状、球状、层糕状。
本发明氮化硼填料可能在介电层中形成团聚体。团聚体的平均团聚体尺寸分布(ASD)或直径可以为1微米至200微米、或2微米至125微米、或3微米至40微米。氮化硼可以作为团聚体和/或非团聚的氮化硼填料的混合物存在。特别地，50体积百分比或更小、30体积百分比或更小、或10体积百分比或更小的氮化硼可能在介电层中团聚。
优选地，所述陶瓷填料占所述树脂组合物的重量百分比为10wt％-35wt％，优选15wt％-20wt％。
优选地，所述陶瓷填料的粒径中度值D50为0.1-40uM，例如1uM、5uM、10uM、15uM、20uM、25uM、30uM、35uM等，优选1-30uM，进一步优选2-20uM。
优选地，所述二氧化硅占所述树脂组合物的重量百分比为35wt％-60wt％，优选40wt％-50wt％。
优选地，所述二氧化硅包括微晶二氧化硅和/或无定形二氧化硅。
优选地，所述无定形二氧化硅包括熔凝无定形二氧化硅。
优选地，所述二氧化硅的形状为球形或不规则形状。
优选地，所述二氧化硅的粒径中度值D50为1～40uM，例如2uM、5uM、10uM、15uM、20uM、25uM、30uM、35uM、40uM等，优选3～30uM，进一步优选5～20uM。
优选地，所述树脂组合物中还包括不饱和聚苯醚树脂。
优选地，所述不饱和聚苯醚树脂包括分子末端带有不饱和双键的聚苯醚树脂。
优选地，所述不饱和聚苯醚树脂的数均分子量为500-5000，例如1000、1500、2000、2500、3000、3500、4000、4500等。
优选地，所述不饱和聚苯醚树脂占所述树脂组合物的重量百分比为40wt％-50wt％，例如41wt％、42wt％、43wt％、44wt％、45wt％、46wt％、47wt％、48wt％、49wt％等，优选42wt％-50wt％，进一步优选45wt％-50wt％。
优选地，所述不饱和聚苯醚树脂的结构如式(1)所示：
Figure PCTCN2020136755-appb-000001
式(1)中，所述a和b各自独立地为1-30的整数；
式(1)中，所述Z具有式(2)或式(3)所示的结构：
Figure PCTCN2020136755-appb-000002
式(3)中，所述A选自C6-C20亚芳基、C1-C10亚烷基或羰基中的任意一种，所述R 1、R 2和R 3选各自独立地选自氢原子或C1-C10烷基，所述m选自0-10的整数，例如1、2、3、6、8、9等；
其中，波浪线标记处代表连接键；
式(1)中，所述-(-O-Y-)-具有式(4)所示的结构；
Figure PCTCN2020136755-appb-000003
式(4)中，所述R 4和R 6各自独立地选自氢原子、卤素原子、C1-C8烷基或苯基中的任意一种，所述R 5和R 7各自独立地选自卤素原子、C1-C8烷基或苯基中的任意一种；
式(1)中，所述-(-O-X-O-)-具有式(5)所示的结构；
Figure PCTCN2020136755-appb-000004
式(5)中，所述R 8-R 15各自独立地选自氢原子、卤素原子、C1-C8烷基或苯基中的任意一种，所述B选自C1-C20亚烃基，所述n为0或1。
优选地，所述树脂组合物中还包括双马来酰亚胺化合物。
优选地，所述双马来酰亚胺化合物具有式(6)所示的结构：
Figure PCTCN2020136755-appb-000005
式(6)中，所述R选自p价的C1-C10链烷基或C6-C20芳基，所述Xa和Xb各自独立地选自氢原子、卤素原子或C1-C10链烷基中的任意一种，所述p为大于等于1的整数。
优选地，所述双马来酰亚胺化合物包括N-苯基马来酰亚胺、N-(2-甲基苯基)马来酰亚胺、N-(4-甲基苯基)马来酰亚胺、N-(2，6-二甲基苯基)马来酰亚胺、N-(2，6-二乙基苯基)马来酰亚胺、N-(2-甲氧基苯基)马来酰亚胺、N-苄基马来酰亚胺、N-十二烷基马来酰亚胺、N-异丙基马来酰亚胺或N-环己基 马来酰亚胺中的任意一种或至少两种组合。
优选地，所述双马来酰亚胺化合物包括2，2-双(4-(4-马来酰亚胺苯氧基)苯基)丙烷和/或双(3-乙基-5-甲基-4-马来酰亚胺苯基)甲烷。
优选地，所述树脂组合物中还包括引发剂。
优选地，所述引发剂占所述树脂组合物的重量百分比为0.1wt％-7wt％，例如0.5wt％、1wt％、2wt％、3wt％、4wt％、5wt％、6wt％等。
优选地，所述引发剂的1min半衰期温度在50到160℃，或者所述引发剂的1min半衰期温度在160℃到300℃之间。
优选地，所述引发剂包括a,a'-二(叔丁基过氧化间异丙苯)苯、过氧化二异丙苯、叔丁基过氧化异丙苯、1,1-双(叔己基过氧化)-3,3,5-三甲基环己烷、2,5-二甲基-2,5-二(叔丁基过氧基)己-3-炔、辛酸叔丁酯、过氧化苯甲酸叔丁酯，三乙级胺及其盐类、四级胺盐化合物、2,4,6-三(二甲胺基甲胺)苯酚、苄基二甲胺、咪唑类、三戊基酚酸胺、单或多酚化合物、三氟化硼及其有机物的配合物、磷酸或亚磷酸三苯酯中的任意一种或至少两种组合。
优选地，所述树脂组合物中还包括阻燃剂。
优选地，所述阻燃剂包括十溴二苯醚、乙基-双(四溴苯邻二甲酰亚胺)、十溴二苯基乙烷、三(2,6-二甲基苯基)膦、10-(2,5-二羟基苯基)-9,10-二氢-9-氧化-10膦菲-10-氧化物、2,6-二(2,6-二甲基苯基)膦基苯或10-苯基-9,10-二氢-9-氧化-10-膦菲-10-氧化物中的任意一种或至少两种组合。
优选地，所述树脂组合物中还包括交联剂。
优选地，所述交联剂包括异氰脲酸三烯丙酯、聚异氰脲酸三烯丙酯、三烯丙酯三聚氰酸酯、三甲基丙烯酸、邻苯二甲酸二烯丙酯、二乙烯基苯或多官能的丙烯酸酯中的任意一种或至少两种组合。“多官能团”指的是含有至少两个官 能团。
优选地，所述树脂组合物中还包括固化促进剂。
优选地，所述固化促进剂包括2-甲基咪唑、2-乙基-4甲基咪唑、2-苯基咪唑、2-十一烷基咪唑、1-苄基-2-甲基咪唑、2-十七烷基咪唑、2-异丙基咪唑、2-苯基-4-甲基咪唑、2-十二烷基咪唑或1-氰乙基-2-甲基咪唑中的任意一种或至少两种组合。
优选地，所述树脂组合物中还包括其他助剂。
优选地，所述其他助剂包括抗氧剂、热稳定剂、抗静电剂、紫外线吸收剂、颜料、着色剂或润滑剂中的任意一种或至少两种组合。
在本发明的一个优选技术方案中，可以用表面活性剂、硅烷、有机聚合物或其他无机材料对填料中的一者或更多者进行表面处理，以有助于分散到聚合物中。例如，可以用诸如油胺油酸等的表面活性剂对颗粒进行涂覆。硅烷可以包括N-β(氨基乙基)-γ-氨基丙基三乙氧基硅烷、N-β(氨基乙基)-γ-氨基丙基三甲氧基硅烷、γ-氨基丙基三乙氧基硅烷、γ-氨基丙基三甲氧基硅烷、3-氯丙基-甲氧基硅烷、γ-环氧丙氧基丙基三乙氧基硅烷、γ-环氧丙氧基丙基三甲氧基硅烷、γ-巯基丙基三乙氧基硅烷、γ-巯基丙基三甲氧基硅烷、γ-甲基丙烯酰氧基丙基三乙氧基硅烷、γ-甲基丙烯酰氧基丙基三甲氧基硅烷、N-苯基-γ-氨基丙基三乙氧基硅烷、N-苯基-γ-氨基丙基三甲氧基硅烷、苯基硅烷、三氯(苯基)硅烷、3-(三乙氧基甲硅烷基)丙基琥珀酸酐、三(三甲基甲硅烷氧基)苯基硅烷、乙烯基苄基氨基乙基氨基丙基三甲氧基硅烷、乙烯基-三氯硅烷、乙烯基三乙氧基硅烷、乙烯基三甲氧基硅烷、乙烯基三(β甲氧基乙氧基)硅烷中的任意一种或至少两种组合。硅烷可以包括苯基硅烷。硅烷可以包括经取代的苯基硅烷。
本发明的目的之二在于提供一种树脂胶液，所述树脂胶液是将如目的之一 所述的树脂组合物溶解或分散在溶剂中得到。
本发明的树脂胶液常规制备方法为：先将固形物放入，然后加入液态溶剂，搅拌至固形物完全溶解后，再加入液态树脂和促进剂，继续搅拌均匀即可。
作为本发明中的溶剂，没有特别的限定，可以选用甲醇、乙醇、丁醇等醇类，乙基溶纤剂、丁基溶纤剂、乙二醇甲醚、卡必醇、丁基卡必醇等，丙酮、丁酮、甲基乙基甲酮、环己酮等酮类，甲苯、二甲苯等芳香烃类，醋酸乙酯、乙氧基乙基乙酸酯等酯类，N,N-二甲基甲酰胺、N,N-二甲基乙酰胺等含氮类溶剂。以上溶剂可单独使用，也可两种或两种以上混合使用。优选丙酮、丁酮、甲基乙基甲酮、环己酮等酮类。所述溶剂的添加量由本领域技术人员根据自己经验来选择，使得树脂胶液达到适合使用的粘度即可。
本发明的目的之三在于提供一种预浸料，所述预浸料包括增强材料以及通过浸渍干燥后附着其上的目的之一所述的树脂组合物。
在本发明中，所述增强材料可以为有机纤维布、无机纤维编织布或无纺布；其中，所述有机纤维为芳纶无纺布；所述无机纤维编织布为E-玻纤布、D-玻纤布、S-玻纤布、T玻纤布、NE-玻纤布或石英布。所述增强材料的厚度为0.01-0.2mm，例如0.02mm、0.05mm、0.08mm、0.1mm、0.12mm、0.15mm、0.18mm等。且所述增强材料最好经过开纤处理及硅烷偶联剂表面处理；所述硅烷偶联剂为环氧硅烷偶联剂、氨基硅烷偶联剂或乙烯基硅烷偶联剂中的任意一种或至少两种的混合物。
优选地，所述预浸料的制备方法为：将增强材料含浸上述的树脂组合物，然后在100-250℃条件下，烘烤1-15min得到所述预浸料。
本发明的目的之四在于提供一种层压板，所述层压板包括至少一张目的之三所述的预浸料。
优选地，所述层压板的制备方法为通过加热和加压，使一片或两片以上的预浸料粘合在一起而制成的层压板。
优选地，所述的层压板是在热压机中固化制得，固化温度为150-250℃，固化压力为10-60Kg/cm 2。
本发明的目的之五在于提供一种覆铜板，所述覆铜板含有至少一张目的之三所述的预浸料以及覆于叠合后的预浸料一侧或两侧的金属箔。
优选地，所述金属箔为铜箔、镍箔、铝箔或SUS箔等。
本发明的目的之六在于提供一种印刷电路板，所述印刷电路板包括目的之四所述的层压板或目的之五所述的覆铜板。
优选地，所述印刷电路板为高频印刷电路板。本发明中，“高频”定义为频率在1GHz以上。
相对于现有技术，本发明具有以下有益效果：
本发明在以聚烯烃树脂为基体的树脂组合物体系中，添加特定种类的陶瓷填料，并将氮化硼填料、陶瓷填料和二氧化硅的含量控制在特定范围内，能够使树脂组合物制备得到的板材兼具高热导率、高剥离强度和低介电的性能，可以满足高频印刷电路板的要求。
具体实施方式
下面通过具体实施方式来进一步说明本发明的技术方案。本领域技术人员应该明了，所述实施例仅仅是帮助理解本发明，不应视为对本发明的具体限制。
以下实施例和对比例中所使用的实验材料包括：
(1)不饱和聚苯醚树脂：
聚苯醚树脂MMA-PPE(SA9000，SABIC公司)；
聚苯醚树脂St-PPE-2(三菱化学公司制)；
聚苯醚树脂St-PPE-1(三菱化学公司制)。
(2)聚烯烃树脂：
B1000：日本曹达株式会社；
B3000：日本曹达株式会社；
R810：日本JSR株式会社；
SBS树脂：D1118：科腾高性能聚合物公司。
(3)交联剂：TAIC交联剂，购自浏阳市有机化工有限公司。
(4)引发剂：过氧化二异丙苯(DCP)，上海高桥石油化工公司。
(5)增强材料：玻纤布，中国巨石股份有限公司。
(6)填料：
二氧化硅：L900，锦艺新材料有限公司；
钛酸钙：CT411，南通华众电子材料有限公司；
锆酸钙：CZ-3，南通华众电子材料有限公司；
钛酸锂：Li 4Ti 5O 12，南通华众电子材料有限公司；
钛酸钾钠：南通华众电子材料有限公司；
钛酸锶钙：南通华众电子材料有限公司；
锆酸镁：南通华众电子材料有限公司；
氮化硼：CF0012，3M公司；
二氧化钛：TR81，亨斯迈化工贸易有限公司；
钛酸钡：BT300，山东国瓷功能材料股份有限公司。
实施例1-10
按表1所示组分配制树脂组合物，并按照如下覆铜板的制作方法制作覆铜板样品：
(1)将树脂组合物中配方量的各组分在二甲苯中混合均匀，室温下分散均匀，得到固含量为80％的树脂胶液；
(2)使用增强材料(玻纤布)浸渍步骤(1)得到的树脂胶液，置于155℃烘箱中烘烤5min实现固化，得到预浸料；将所述预浸料置于两个铜箔之间，在热压机中210℃、5MPa压力层压并固化2h，得到所述覆铜板。
对比例1-9
按表2所示组分配制树脂组合物，并按照如下覆铜板的制作方法制作覆铜板样品：
(1)将脂组合物中配方量的各组分在二甲苯中混合均匀，室温下分散均匀，得到固含量为80％的树脂胶液；
(2)使用增强材料(玻纤布)浸渍步骤(1)得到的树脂胶液，置于155℃烘箱中烘烤5min实现固化，得到预浸料；将所述预浸料置于两个铜箔之间，在热压机中210℃、5MPa压力层压并固化2h，得到所述覆铜板。
性能测试
针对上述实施例和对比例得到的覆铜板进行如下测试：
(1)介电常数(Dk)和介电损耗因子(Df)：采用SPDR法，在10GHz频率下，测试板材的介电常数Dk和介电损耗Df；
(2)热导率：采用导热系数测试仪，按照ASTMD5470方法进行测试；
(3)剥离强度：按照IPC-650方法进行测试。
上述测试结果如表1和表2所示。
表1
Figure PCTCN2020136755-appb-000006
Figure PCTCN2020136755-appb-000007
表2
Figure PCTCN2020136755-appb-000008
Figure PCTCN2020136755-appb-000009
表1和表2中，各组分添加量为重量百分比(wt.％)，代表不添加对应物质。
由表1和表2数据可知，本发明提供的树脂组合物制备得到的覆铜板兼具介电损耗小、热导率高、剥离强度高的特性，能够满足覆铜板在制备高性能和小型化的电子产品中的应用需求。其中，介电损耗可达0.0023，热导率可达2.07W/mK，剥离强度可达1.25N/mm。
通过对比实施例1与对比例1、实施例4与对比例2可知，氮化硼填料的添加量不在5wt％～40wt％范围内，得到的覆铜板无法兼具介电损耗小、热导率高、剥离强度高的特性，其中，添加量过低(对比例1)，会导致热导率降低，添加量过高(对比例2)，会导致剥离强度降低。
通过对比实施例4、对比例3-4可知，陶瓷填料的添加量不在5wt％～40wt％范围内，得到的覆铜板无法兼具介电损耗小、热导率高的特性，其中，添加量 过低(对比例3)，会导致介电损耗值增加，添加量过高(对比例4)，会导致热导率降低、介电损耗增加。
通过对比实施例1、对比例5-6可知，在本发明的聚烯烃树脂体系中，选用特定种类的陶瓷填料相较于其他陶瓷填料(二氧化钛和钛酸钡)，能够有效降低覆铜板的介电损耗，同时不会影响热导率和剥离强度。
通过对比实施例3、对比例7-8可知，二氧化硅的添加量不在30wt％～70wt％范围内，得到的覆铜板无法兼具介电损耗小、热导率高、剥离强度高的特性，其中，添加量过低(对比例7)会导致介电常数、介电损耗以及剥离强度变差，添加量过高(对比例8)，会导致热导率降低。
通过对比实施例1、对比例9可知，聚烯烃树脂比例太高，会导致热导率、介电损耗变差。
本发明通过上述实施例来说明本发明的详细方法，但本发明并不局限于上述详细方法，即不意味着本发明必须依赖上述详细方法才能实施。所属技术领域的技术人员应该明了，对本发明的任何改进，对本发明产品各原料的等效替换及辅助成分的添加、具体方式的选择等，均落在本发明的保护范围和公开范围之内。

Claims (10)

  1. 一种树脂组合物，其特征在于，所述树脂组合物包括如下组分：聚烯烃树脂10wt％-50wt％，氮化硼填料5wt％～40wt％，陶瓷填料5wt％～40wt％，二氧化硅30wt％～70wt％；
    所述陶瓷填料包括钛酸钙、钛酸锂、钛酸钾钠、钛酸锶钙、锆酸钙或锆酸镁中的任意一种或至少两种组合。
  2. 根据权利要求1所述的树脂组合物，其特征在于，所述聚烯烃树脂包括不饱和聚丁二烯树脂、苯乙烯-丁二烯-苯乙烯三嵌段共聚物、氢化苯乙烯-丁二烯-苯乙烯三嵌段共聚物或丁苯树脂中的任意一种或至少两种组合；
    优选地，所述不饱和聚丁二烯树脂中乙烯基的含量为60％-99％，优选70％-95％，进一步优选75％-93％；
    优选地，所述丁苯树脂的分子量为5000-50000，优选8000-40000，进一步优选15000-30000；
    优选地，所述丁苯树脂中乙烯单元含量为60％-99％，优选70％-95％，进一步优选75％-93％；
    优选地，所述丁苯树脂中苯乙烯单元含量为30％-60％，优选35％-55％，进一步优选40％-50％。
  3. 根据权利要求1或2所述的树脂组合物，其特征在于，所述氮化硼填料占所述树脂组合物的重量百分比为6-30wt％，优选8-20wt％；
    优选地，所述氮化硼填料的粒径中度值D50为2-50uM，优选5-40uM，进一步优选6-20uM；
    优选地，所述陶瓷填料占所述树脂组合物的重量百分比为10wt％-35wt％，优选15wt％-20wt％；
    优选地，所述陶瓷填料的粒径中度值D50为0.1-40uM，优选1-30uM，进 一步优选2-20uM；
    优选地，所述二氧化硅占所述树脂组合物的重量百分比为35wt％-60wt％，优选40wt％-50wt％；
    优选地，所述二氧化硅的粒径中度值D50为1～40uM，优选3～30uM，进一步优选5～20uM；
    优选地，所述二氧化硅包括微晶二氧化硅和/或无定形二氧化硅。
  4. 根据权利要求1-3中任一项所述的树脂组合物，其特征在于，所述树脂组合物中还包括不饱和聚苯醚树脂；
    优选地，所述不饱和聚苯醚树脂包括分子末端带有不饱和双键的聚苯醚树脂；
    优选地，所述不饱和聚苯醚树脂的数均分子量为500-5000；
    优选地，所述不饱和聚苯醚树脂占所述树脂组合物的重量百分比为40wt％-50wt％，优选42wt％-50wt％，进一步优选45wt％-50wt％。
  5. 根据权利要求1-4中任一项所述的树脂组合物，其特征在于，所述树脂组合物中还包括引发剂；
    优选地，所述引发剂占所述树脂组合物的重量百分比为0.1wt％-7wt％；
    优选地，所述引发剂包括a,a'-二(叔丁基过氧化间异丙苯)苯、过氧化二异丙苯、叔丁基过氧化异丙苯、1,1-双(叔己基过氧化)-3,3,5-三甲基环己烷、2,5-二甲基-2,5-二(叔丁基过氧基)己-3-炔、辛酸叔丁酯、过氧化苯甲酸叔丁酯，三乙级胺及其盐类、四级胺盐化合物、2,4,6-三(二甲胺基甲胺)苯酚、苄基二甲胺、咪唑类、三戊基酚酸胺、单或多酚化合物、三氟化硼及其有机物的配合物、磷酸或亚磷酸三苯酯中的任意一种或至少两种组合；
    优选地，所述树脂组合物中还包括交联剂；
    优选地，所述交联剂包括异氰脲酸三烯丙酯、聚异氰脲酸三烯丙酯、三烯丙酯三聚氰酸酯、三甲基丙烯酸、邻苯二甲酸二烯丙酯、二乙烯基苯或多官能的丙烯酸酯中的任意一种或至少两种组合。
  6. 一种树脂胶液，其特征在于，所述树脂胶液是将如权利要求1-5中任一项所述的树脂组合物溶解或分散在溶剂中得到。
  7. 一种预浸料，其特征在于，所述预浸料包括增强材料以及通过浸渍干燥后附着其上的权利要求1-5中任一项所述的树脂组合物。
  8. 一种层压板，其特征在于，所述层压板包括至少一张权利要求7所述的预浸料。
  9. 一种覆铜板，其特征在于，所述覆铜板含有至少一张权利要求7所述的预浸料以及覆于叠合后的预浸料一侧或两侧的金属箔。
  10. 一种印刷电路板，其特征在于，所述印刷电路板包括权利要求8所述的层压板或权利要求9所述的覆铜板。
PCT/CN2020/136755 2020-12-10 2020-12-16 一种树脂组合物及包含其的树脂胶液、预浸料、层压板、覆铜板和印刷电路板 WO2022120909A1 (zh)

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