WO2022071409A1 - Method for producing single-layer phase difference material - Google Patents
Method for producing single-layer phase difference material Download PDFInfo
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- WO2022071409A1 WO2022071409A1 PCT/JP2021/035905 JP2021035905W WO2022071409A1 WO 2022071409 A1 WO2022071409 A1 WO 2022071409A1 JP 2021035905 W JP2021035905 W JP 2021035905W WO 2022071409 A1 WO2022071409 A1 WO 2022071409A1
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3083—Birefringent or phase retarding elements
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F120/00—Homopolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F120/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F120/10—Esters
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
- C08F220/302—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety and two or more oxygen atoms in the alcohol moiety
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K19/00—Liquid crystal materials
- C09K19/04—Liquid crystal materials characterised by the chemical structure of the liquid crystal components, e.g. by a specific unit
- C09K19/38—Polymers
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
Definitions
- the present invention relates to a method for producing a single-layer retardation material, and more specifically, a material having optical properties suitable for applications such as a display device and a recording material, particularly an organic electroluminescence (EL) display device and a liquid crystal display.
- the present invention relates to a method for producing a single-layer retardation material which can be suitably used for an optical compensation film such as a polarizing plate for a display and a retardation plate.
- the polymerizable liquid crystal compound used here is generally a liquid crystal compound having a polymerizable group and a liquid crystal structural portion (a structural portion having a spacer portion and a mesogen portion), and an acrylic group is widely used as the polymerizable group. ing.
- Such a polymerizable liquid crystal compound is generally made into a polymer (film) by a method of irradiating with radiation such as ultraviolet rays to polymerize.
- a method of supporting a specific polymerizable liquid crystal compound having an acrylic group between supports and irradiating with radiation while holding this compound in a liquid crystal state to obtain a polymer (Patent Document 1), or having an acrylic group.
- a method of adding a photopolymerization initiator to a mixture of two types of polymerizable liquid crystal compounds or a composition obtained by mixing a chiral liquid crystal with the mixture and irradiating the mixture with ultraviolet rays to obtain a polymer is known (Patent Document 2).
- Patent Documents 3 and 4 an alignment film using a polymerizable liquid crystal compound or a polymer that does not require a liquid crystal alignment film
- Patent Documents 5 and 6 an alignment film using a polymer containing a photocrosslinking site
- Patent Documents 5 and 6 an alignment film using a polymer containing a photocrosslinking site
- the wavelength of ultraviolet rays and other radiation required for formation differs depending on the structure of the organic compound, so in order to maximize optical anisotropy, ultraviolet rays derived from the structure of the organic compound are used.
- the exposure process has been performed at a wavelength in the region where the absorption peak of ultraviolet rays is maximum.
- the short wavelength light may not be able to impart sufficient exposure energy to the inside of the film, resulting in a phase difference or a phase difference. There was a problem that the amount of birefringence was insufficient.
- the present invention has been made in view of the above problems, and an object of the present invention is to provide a method for manufacturing a single-layer retardation material capable of producing a single-layer retardation material having a high retardation value and birefringence.
- the present inventors have a composition containing a polymer having a photoreactive moiety that is photodimerized or photoisomerized with light having a wavelength of 365 nm.
- a composition containing a polymer having a photoreactive moiety that is photodimerized or photoisomerized with light having a wavelength of 365 nm.
- the present invention 1.
- the step of applying the polymer composition on the substrate and drying to form a coating film, and (II) the step of irradiating the coating film with polarized ultraviolet rays are included.
- the polymer composition comprises a polymer having a photoreactive moiety in the side chain that is photodimerized or photoisomerized with light having a wavelength of 365 nm.
- a method for producing a single-layer retardation material wherein the amount of light having a wavelength of 313 nm in the total amount of light having a wavelength of 365 nm and light having a wavelength of 313 nm is 5% or less. 3.
- L represents an alkylene group having 1 to 12 carbon atoms, and the hydrogen atom of this alkylene group may be independently replaced with a halogen atom.
- T represents a single bond or an alkylene group having 1 to 12 carbon atoms, and the hydrogen atom of this alkylene group may be replaced with a halogen atom.
- a 2 also represents a single bond
- Y 1 represents a divalent benzene ring and represents P 1 , Q 1 and Q 2 each independently represent a group selected from the group consisting of a benzene ring and an alicyclic hydrocarbon ring having 5 to 8 carbon atoms.
- R is a hydrogen atom, a cyano group, a halogen atom, an alkyl group having 1 to 5 carbon atoms, an alkylcarbonyl group having 1 to 5 carbon atoms, a cycloalkyl group having 3 to 7 carbon atoms, or an alkyloxy having 1 to 5 carbon atoms.
- the hydrogen atom bonded to the benzene ring is independently a cyano group, a halogen atom, an alkyl group having 1 to 5 carbon atoms, and an alkylcarbonyl group having 1 to 5 carbon atoms.
- X 1 and X 2 independently represent single bonds, -O-, -COO- or -OCO-, respectively.
- n1 and n2 are 0, 1 or 2, respectively, respectively.
- X 1 may be the same or different, and when the number of X 2 is 2, X 2 may be the same or different.
- Q 1 When the number of Q 1 is 2, Q 1 may be the same or different, and when the number of Q 2 is 2, Q 2 may be the same or different. Represent a hand.
- the method for producing a single-layer retardation material of 7, wherein the side chain that does not exhibit photoalignment is any one of the side chains selected from the group consisting of the following formulas (1) to (12).
- R 11 is -NO 2 , -CN, a halogen atom, a phenyl group, a naphthyl group, a biphenylyl group, a furanyl group, 1 A valent nitrogen-containing heterocyclic group, a monovalent alicyclic hydrocarbon group having 5 to 8 carbon atoms, an alkyl group having 1 to 12 carbon atoms, or an alkoxy group having 1 to 12 carbon atoms, where R 12 is a phenyl group.
- the hydrogen atom bonded to these may be substituted with -NO 2 , -CN, a halogen atom, an alkyl group having 1 to 5 carbon atoms, or an alkoxy group having 1 to 5 carbon atoms, and R 13 is a hydrogen atom.
- D represents an integer of 1 to 12
- k1 to k5 are independently integers of 0 to 2
- k6 and k7 are.
- Each independently is an integer of 0 to 2, but the sum of k6 and k7 is 1 or more
- m1, m2 and m3 are independently integers of 1 to 3, and n is 0.
- polarized ultraviolet light having a wavelength of 365 nm which has not been generally used for exposure treatment of organic compounds having a photoreactive group, occupies a larger proportion than light having a wavelength of 313 nm.
- a single-layer retardation material having a high retardation value and birefringence can be obtained.
- the method for producing a single-layer retardation material of the present invention is a step of (I) applying a polymer composition on a substrate and drying to form a coating film, and (II) polarized ultraviolet light on the obtained coating film.
- the polymer composition comprises a polymer having a photoreactive moiety that is photodimerized or photoisomerized with light at a wavelength of 365 nm, comprising light at a wavelength of 365 nm and light at a wavelength of 313 nm in polarized ultraviolet light.
- the amount of light having a wavelength of 313 nm in the total amount of light is 10% or less.
- Step (I) is a step of applying the polymer composition on the substrate to form a coating film. More specifically, the polymer composition is coated on a substrate (for example, silicon / silicon dioxide coated substrate, silicon nitride substrate, metal (for example, aluminum, molybdenum, chromium, etc.)), a glass substrate, a quartz substrate, and the like. Bar coat, spin coat, flow coat, roll coat, etc. on ITO substrate, etc.) or film (for example, resin film such as triacetyl cellulose (TAC) film, cycloolefin polymer film, polyethylene terephthalate film, acrylic film, etc.).
- TAC triacetyl cellulose
- the coating is applied by a method such as a slit coat, a spin coat following the slit coat, an inkjet method, and a printing method.
- a heating means such as a hot plate, a heat circulation type oven, or an IR (infrared) type oven to evaporate the solvent to obtain a coating film.
- the temperature is not particularly limited, but is preferably 50 to 200 ° C, more preferably 50 to 150 ° C.
- the polymer composition used in the present invention is a photosensitive side chain polymer capable of exhibiting liquidity, or a mixed side chain polymer having a liquid crystal side chain polymer and a photosensitive side chain polymer individually.
- a side-chain type polymer a photosensitive side chain polymer capable of exhibiting liquidity
- the obtained coating film is also a film having a side-chain type polymer including liquidity and photosensitivity.
- This coating film is not subjected to a rubbing treatment, but is subjected to an orientation treatment by polarization irradiation.
- the film is subjected to a step of heating the side chain polymer film to obtain a film to which optical anisotropy is imparted (hereinafter, also referred to as a single-layer retardation material).
- a single-layer retardation material a film to which optical anisotropy is imparted
- the slight anisotropy developed by the polarization irradiation becomes the driving force, and the side chain polymer itself is efficiently reoriented by self-assembly.
- highly efficient orientation processing can be realized as a single-layer retardation material, and a single-layer retardation material with high optical anisotropy can be obtained.
- the side chain type polymer a polymer having a photoreactive moiety that is photodimerized or photoisomerized with light having a wavelength of 365 nm is used.
- the polymer is not particularly limited as long as it is a side chain type polymer having the above properties, but a side chain having any of the photoreactive sites represented by the following formulas (a1) to (a3) (hereinafter referred to as “side chain”). , Also referred to as side chain a), and more preferably having a side chain having any of the photoreactive sites represented by the following formulas (a1-1) to (a3-1).
- the number of benzene rings in the side chain having one photoreactive moiety is preferably 3 or less.
- a 1 , A 2 and D independently represent a single bond, -O-, -CH 2- , -COO-, -OCO-, -CONH-, or -NH-CO-. .. L represents an alkylene group having 1 to 12 carbon atoms, and the hydrogen atom of this alkylene group may be independently replaced with a halogen atom.
- T represents a single bond or an alkylene group having 1 to 12 carbon atoms, and the hydrogen atom of this alkylene group may be replaced with a halogen atom.
- a 2 also represents a single bond.
- Y 1 represents a divalent benzene ring.
- P 1 , Q 1 and Q 2 each independently represent a group selected from the group consisting of a benzene ring and an alicyclic hydrocarbon ring having 5 to 8 carbon atoms.
- R is a hydrogen atom, a cyano group, a halogen atom, an alkyl group having 1 to 5 carbon atoms, an alkylcarbonyl group having 1 to 5 carbon atoms, a cycloalkyl group having 3 to 7 carbon atoms, or an alkyloxy having 1 to 5 carbon atoms. Represents a group.
- the hydrogen atom bonded to the benzene ring is independently a cyano group, a halogen atom, an alkyl group having 1 to 5 carbon atoms, and an alkylcarbonyl group having 1 to 5 carbon atoms. , Or may be substituted with an alkyloxy group having 1 to 5 carbon atoms.
- X 1 and X 2 independently represent a single bond, -O-, -COO- or -OCO-, respectively.
- n1 and n2 are 0, 1 or 2, respectively.
- X 1 When the number of X 1 is 2, X 1 may be the same or different, and when the number of X 2 is 2, X 2 may be the same or different, and the number of Q 1 When is 2, Q 1s may be the same or different, and when the number of Q 2s is 2 , Q 2s may be the same or different.
- the alkylene group having 1 to 12 carbon atoms may be linear, branched or cyclic, and specific examples thereof include methylene, ethylene, propane-1,3-diyl, butane-1,4-diyl and pentane. -1,5-diyl, hexane-1,6-diyl, heptane-1,7-diyl, octane-1,8-diyl, nonane-1,9-diyl, decane-1,10-diyl group, etc. Be done.
- alicyclic hydrocarbon ring having 5 to 8 carbon atoms examples include a cyclopentane ring, a cyclohexane ring, a cycloheptane ring, and a cyclooctane ring.
- halogen atom examples include a fluorine atom, a chlorine atom, a bromine atom, an iodine atom and the like.
- the alkyl group having 1 to 5 carbon atoms may be linear or branched, and specific examples thereof include methyl, ethyl, n-propyl, i-propyl, n-butyl, t-butyl and n-pentyl. Group etc. can be mentioned.
- alkylcarbonyl group having 1 to 5 carbon atoms include methylcarbonyl (acetyl), ethylcarbonyl, n-propylcarbonyl, n-butylcarbonyl, n-pentylcarbonyl group and the like.
- Specific examples of the cycloalkyl group having 3 to 7 carbon atoms include cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl group and the like.
- alkyloxy group having 1 to 5 carbon atoms include methoxy, ethoxy, n-propoxy, i-propoxy, n-butoxy, n-pentyloxy group and the like.
- a polymer having a side chain having a photoreactive site represented by any of the following formulas (a1-1-1) to (a3-1-1) is more preferable.
- the side chain polymer used in the present invention has a photosensitive side chain bonded to the main chain, and can cause a crosslinking reaction or an isomerization reaction in response to light having a wavelength of 365 nm.
- the structure of the photosensitive side chain polymer is not particularly limited as long as it satisfies such characteristics, but it is preferable that the side chain structure has a rigid mesogen component. Stable optical anisotropy can be obtained when the side chain polymer is used as a single-layer retardation material.
- More specific examples of the structure of the photosensitive side chain polymer include radical polymerizable properties such as (meth) acrylate, itaconate, fumarate, maleate, ⁇ -methylene- ⁇ -butyrolactone, styrene, vinyl, maleimide and norbornene.
- a structure having a main chain composed of at least one selected from the group consisting of radicals and siloxane and a side chain a is preferable.
- the side chain type polymer may further have a side chain (hereinafter, also referred to as side chain b) that does not exhibit photoalignment.
- a side chain b any one of the side chains selected from the group consisting of the following formulas (1) to (12) is preferable, but the side chain b is not limited thereto.
- R 12 is a phenyl group or naphthyl.
- the hydrogen atom bonded to may be substituted with -NO 2 , -CN, a halogen atom, an alkyl group having 1 to 5 carbon atoms, or an alkoxy group having 1 to 5 carbon atoms, and R 13 is a hydrogen atom,-.
- d represents an integer of 1 to 12
- k1 to k5 are independently integers of 0 to 2, but the total of k1 to k5 is 2 or more
- k6 and k7 are.
- Each independently is an integer of 0 to 2, but the sum of k6 and k7 is 1 or more
- m1, m2 and m3 are independently integers of 1 to 3
- n is 0 or 1
- the dashed line represents the bond.
- the monovalent nitrogen-containing heterocyclic group examples include pyrrolidinyl, piperidinyl, piperazinyl, pyrrolyl, and pyridyl group, and specific examples of the monovalent alicyclic hydrocarbon group having 5 to 8 carbon atoms are cyclopentyl. , Cyclohexyl group and the like.
- the alkyl group and the alkoxy group include the same groups as those exemplified in R5 above.
- the side chain b preferably represented by any of the formulas (1) to (11).
- the side chain type polymer used in the present invention can be obtained by polymerizing a monomer having a structure represented by any of the formulas (a1) to (a3) and, if necessary, a monomer giving a side chain b.
- monomer M1 As the monomer having the structure represented by any of the formulas (a1) to (a3) (hereinafter, also referred to as monomer M1), the compounds represented by the following formulas (M1-1) to (M1-3) are used. Can be mentioned.
- any compound represented by the following formulas (M1-1-1) to (M1-3-1) is preferable.
- any compound represented by the following formulas (M1-1-1-1) to (M1-3-1-1) is more preferable.
- PG is a polymerizable group, and a group selected from the groups represented by the following formulas PG1 to PG8 is preferable. Among them, an acrylic group or a methacrylic group represented by PG1 is preferable from the viewpoint of easy control of the polymerization reaction and the stability of the polymer.
- M 1 represents a hydrogen atom or a methyl group, and the broken line represents a bond with L.
- Examples of the monomer (M1-1) include monomers selected from the following formulas A-1-1 to A-1-12.
- PG represents any polymerizable group selected from the groups represented by the above formulas PG1 to PG8, and s1 represents the number of methylene groups and is an integer of 2 to 9. Is.
- Examples of the monomer (M1-2) include monomers selected from the following formulas A-2-1 to A-2-8.
- PG represents a polymerizable group selected from the groups represented by the above formulas PG1 to PG8, and s1 and s2 each independently represent the number of methylene groups of 2 to 9. It is an integer.
- Examples of the monomer (M1-3) include monomers selected from the following formulas A-3-1 to A-3-3.
- PG represents a polymerizable group selected from the groups represented by the above formulas PG1 to PG8, and s1 represents the number of methylene groups, which is an integer of 2 to 9.
- Specific examples of the above-mentioned monomer (M1-3) include 4- (6-methacryloxyhexyl-1-oxy) cinnamic acid, 4- (6-acrylicoxyhexyl-1-oxy) cinnamic acid, and 4- (6-(6-methacrylicoxyhexyl-1-oxy) cinnamic acid. Examples thereof include 3-methacryloxypropyl-1-oxy) cinnamic acid and 4- (4- (6-methacryloxyhexyl-1-oxy) benzoyloxy) cinnamic acid.
- the monomer that gives the side chain b that does not show photo-orientation (hereinafter, also referred to as monomer M2) is a monomer that can form a mesogen group at the side chain site.
- the mesogen group having a side chain even if it is a group having a mesogen structure by itself such as biphenyl or phenylbenzoate, it is a group having a mesogen structure by hydrogen bonding between side chains such as benzoic acid. May be good.
- the following structure is preferable as the mesogen group contained in the side chain.
- the monomer M2 include hydrocarbons, (meth) acrylates, itaconates, fumarate, maleate, ⁇ -methylene- ⁇ -butyrolactone, styrene, vinyl, maleimide, norbornene and other radically polymerizable groups and siloxanes. It is preferable that the structure has a structure consisting of a polymerizable group derived from at least one selected from the group and at least one of the formulas (1) to (12).
- the monomer M2 preferably has a (meth) acrylate as a polymerizable group, and preferably has a -COOH end in the side chain.
- Preferred examples of the monomer M2 include those represented by the following formulas (M2-1) to (M2-9).
- other monomers can be copolymerized as long as the photoreactiveness and / or liquid crystallinity development ability is not impaired.
- examples of other monomers include industrially available radical polymerization-reactive monomers.
- Specific examples of other monomers include unsaturated carboxylic acids, acrylic acid ester compounds, methacrylic acid ester compounds, maleimide compounds, acrylonitrile, maleic acid anhydrides, styrene compounds, vinyl compounds and the like.
- unsaturated carboxylic acids include acrylic acid, methacrylic acid, itaconic acid, maleic acid, fumaric acid and the like.
- acrylic acid ester compound examples include methyl acrylate, ethyl acrylate, isopropyl acrylate, benzyl acrylate, naphthyl acrylate, anthryl acrylate, anthryl methyl acrylate, phenyl acrylate, 2,2,2-trifluoroethyl acrylate, and tert-.
- methacrylic acid ester compound examples include methyl methacrylate, ethyl methacrylate, isopropyl methacrylate, benzyl methacrylate, naphthyl methacrylate, anthryl methacrylate, anthryl methyl methacrylate, phenyl methacrylate, 2,2,2-trifluoroethyl methacrylate and tert-.
- vinyl compound examples include vinyl ether, methyl vinyl ether, benzyl vinyl ether, 2-hydroxyethyl vinyl ether, phenyl vinyl ether, propyl vinyl ether and the like.
- styrene compound examples include styrene, 4-methylstyrene, 4-chlorostyrene, 4-bromostyrene and the like.
- maleimide compound examples include maleimide, N-methylmaleimide, N-phenylmaleimide, N-cyclohexylmaleimide and the like.
- the contents of the side chain a and the side chain b are not particularly limited, but the side chain a is preferably 5 to 99.9 mol% from the viewpoint of photoreactivity. 10-95 mol% is more preferred. From the viewpoint of photoreactivity, the side chain b is preferably 95 mol% or less.
- the side chain type polymer used in the present invention may contain other side chains.
- the content of the other side chains is the rest when the total content of the side chains a and b is less than 100 mol%.
- the method for producing the side chain polymer is not particularly limited, and a general-purpose method that is industrially handled can be used. Specifically, it can be produced by radical polymerization, cationic polymerization or anionic polymerization using the vinyl group of the above-mentioned monomer M1, the monomer M2 and other monomers as needed. Among these, radical polymerization is particularly preferable from the viewpoint of ease of reaction control and the like.
- a known compound such as a radical polymerization initiator (radical thermal polymerization initiator, radical photopolymerization initiator) or a reversible addition-cleaving chain transfer (RAFT) polymerization reagent shall be used. Can be done.
- a radical polymerization initiator radiation thermal polymerization initiator, radical photopolymerization initiator
- RAFT reversible addition-cleaving chain transfer
- the radical thermal polymerization initiator is a compound that generates radicals by heating to a temperature higher than the decomposition temperature.
- examples of such radical thermal polymerization initiators include ketone peroxides (methyl ethyl ketone peroxide, cyclohexanone peroxide, etc.), diacyl peroxides (acetyl peroxide, benzoyl peroxide, etc.), and hydroperoxides (peroxidation).
- the radical photopolymerization initiator is not particularly limited as long as it is a compound that initiates radical polymerization by light irradiation.
- examples of such radical photopolymerization initiators include benzophenone, Michler's ketone, 4,4'-bis (diethylamino) benzophenone, xanthone, thioxanthone, isopropylxanthone, 2,4-diethylthioxanthone, 2-ethylanthraquinone, acetophenone and 2-hydroxy.
- the radical polymerization method is not particularly limited, and an emulsion polymerization method, a suspension polymerization method, a dispersion polymerization method, a precipitation polymerization method, a bulk polymerization method, a solution polymerization method and the like can be used.
- the organic solvent used in the polymerization reaction is not particularly limited as long as the produced polymer can be dissolved. Specific examples thereof include N, N-dimethylformamide, N, N-dimethylacetamide, N-methyl-2-pyrrolidone, N-ethyl-2-pyrrolidone, N-methyl- ⁇ -caprolactam, dimethylsulfoxide, and tetramethylurea.
- Ppyridine dimethyl sulfone, hexamethylphosphoramide, ⁇ -butyrolactone, isopropyl alcohol, methoxymethylpentanol, dipentene, ethylamyl ketone, methyl nonyl ketone, methyl ethyl ketone, methyl isoamyl ketone, methyl isopropyl ketone, methyl cellosolve, ethyl cellosolve, Methyl cellosolve acetate, ethyl cellosolve acetate, butyl carbitol, ethyl carbitol, ethylene glycol, ethylene glycol monoacetate, ethylene glycol monoisopropyl ether, ethylene glycol monobutyl ether, propylene glycol, propylene glycol monoacetate, propylene glycol monomethyl ether, propylene glycol.
- dipropylene glycol monomethyl ether diethylene glycol, diethylene glycol monoacetate, diethylene glycol dimethyl ether, dipropylene glycol monoacetate monomethyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol monoacetate monoethyl ether, Dipropylene glycol monopropyl ether, dipropylene glycol monoacetate monopropyl ether, 3-methyl-3-methoxybutyl acetate, tripropylene glycol methyl ether, 3-methyl-3-methoxybutanol, diisopropyl ether, ethylisobutyl ether, diisobutylene , Amilacetate, butylbutyrate, butyl ether, diisobutylketone, methylcyclohexene, propyl ether, dihexyl ether, 1,4-dioxane
- the solvent may be mixed with the above-mentioned organic solvent and used as long as the produced polymer does not precipitate.
- oxygen in the organic solvent causes the polymerization reaction to be inhibited, so it is preferable to use an organic solvent that has been degassed to the extent possible.
- the polymerization temperature at the time of radical polymerization can be selected from any temperature of 30 to 150 ° C, but is preferably in the range of 50 to 100 ° C.
- the reaction can be carried out at any concentration, but if the concentration is too low, it becomes difficult to obtain a polymer having a high molecular weight, and if the concentration is too high, the viscosity of the reaction solution becomes too high and uniform stirring is difficult. Therefore, the monomer concentration is preferably 1 to 50% by mass, more preferably 5 to 30% by mass.
- the initial reaction can be carried out at a high concentration and then an organic solvent can be added.
- the ratio of the radical polymerization initiator when the ratio of the radical polymerization initiator is large with respect to the monomer, the molecular weight of the obtained polymer is small, and when the ratio is small, the molecular weight of the obtained polymer is large. It is preferably 0.1 to 20 mol% with respect to the monomer to be polymerized. Further, various monomer components, solvents, initiators and the like can be added at the time of polymerization.
- the polymer produced from the reaction solution obtained by the above reaction can be recovered by pouring the reaction solution into a poor solvent and precipitating it, but this reprecipitation treatment is not essential.
- the poor solvent used for precipitation include methanol, acetone, hexane, heptane, butyl cellosolve, heptane, methyl ethyl ketone, methyl isobutyl ketone, ethanol, toluene, benzene, diethyl ether, methyl ethyl ether, water and the like.
- the polymer put into a poor solvent and precipitated can be collected by filtration and then dried at room temperature or by heating under normal pressure or reduced pressure.
- impurities in the polymer can be reduced.
- the poor solvent at this time include alcohols, ketones, hydrocarbons and the like, and it is preferable to use three or more kinds of poor solvents selected from these because the efficiency of purification is further improved.
- the side chain polymer used in the present invention has a weight average molecular weight measured by a GPC (Gel Permeation Chromatography) method in consideration of the strength of the obtained coating film, workability at the time of forming the coating film, and uniformity of the coating film. It is preferably 2,000 to 2,000,000, more preferably 2,000 to 1,000,000, and even more preferably 5,000 to 200,000.
- GPC Gel Permeation Chromatography
- the polymerizable composition used in the present invention contains the side chain type polymer as described above and an organic solvent (good solvent).
- the organic solvent is not particularly limited as long as it is an organic solvent that dissolves the polymer component. Specific examples thereof include N, N-dimethylformamide, N, N-dimethylacetamide, N-methyl-2-pyrrolidone, N-methyl- ⁇ -caprolactam, 2-pyrrolidone, N-ethyl-2-pyrrolidone, N-.
- Vinyl-2-pyrrolidone dimethylsulfoxide, tetramethylurea, pyridine, dimethylsulfone, hexamethylsulfoxide, ⁇ -butyrolactone, 3-methoxy-N, N-dimethylpropanamide, 3-ethoxy-N, N-dimethylpropanamide, 3-Butoxy-N, N-dimethylpropanamide, 1,3-dimethyl-2-imidazolidinone, ethylamylketone, methylnonylketone, methylethylketone, methylisoamylketone, methylisopropylketone, cyclohexanone, cyclopentanone, ethylene carbonate , Propylene carbonate, diglyme, 4-hydroxy-4-methyl-2-pentanone, propylene glycol monoacetate, propylene glycol monomethyl ether, propylene glycol-tert-butyl ether, dipropylene glycol monomethyl ether, diethylene glyco
- the polymer composition may contain components other than the side chain type polymer and the organic solvent (good solvent).
- examples thereof include a solvent (poor solvent) that improves the film thickness uniformity and surface smoothness when the polymer composition is applied, a compound, and a compound that improves the adhesion between the retardation material and the substrate.
- a solvent poor solvent
- the adhesion between the retardation material and the substrate it is not limited to these.
- These poor solvents may be used alone or in combination of two or more.
- the content thereof is preferably 5 to 80% by mass, more preferably 20 to 60% by mass in the solvent so as not to significantly reduce the solubility of the polymer.
- Examples of the compound that improves the film thickness uniformity and the surface smoothness include a fluorine-based surfactant, a silicone-based surfactant, and a nonion-based surfactant. Specific examples of these include Ftop (registered trademark) 301, EF303, EF352 (manufactured by Tochem Products Co., Ltd.), Megafuck (registered trademark) F171, F173, F560, F563, R-30, R-40 (registered trademark).
- the content of these surfactants is preferably 0.01 to 2 parts by mass, more preferably 0.01 to 1 part by mass with respect to 100 parts by mass of the side chain polymer.
- the compound that improves the adhesion between the retardation material and the substrate include functional silane-containing compounds, and specific examples thereof include 3-aminopropyltrimethoxysilane and 3-aminopropyltriethoxysilane.
- a phenoplast-based compound or an epoxy group-containing compound is added to the polymer composition for the purpose of preventing deterioration of the characteristics due to the backlight when the polarizing plate is formed. It may be added.
- epoxy group-containing compound examples include ethylene glycol diglycidyl ether, polyethylene glycol diglycidyl ether, propylene glycol diglycidyl ether, tripropylene glycol diglycidyl ether, polypropylene glycol diglycidyl ether, neopentyl glycol diglycidyl ether, 1, 6-Hexanediol Diglycidyl Ether, Glycerin Diglycidyl Ether, Dibromoneopentyl Glycol Diglycidyl Ether, 1,3,5,6-Tetraglycidyl-2,4-Hexanediol, N, N, N', N'-Tetra
- examples thereof include glycidyl-m-xylylene diamine, 1,3-bis (N, N-diglycidylaminomethyl) cyclohexane, N, N, N', N'-tetraglycidyl-4,4'-diaminodiphenyl
- the content thereof is preferably 0.1 to 30 parts by mass with respect to 100 parts by mass of the side chain type polymer contained in the polymer composition, and 1 to 20 parts by mass. Parts by mass are more preferred. If the content is less than 0.1 parts by mass, the effect of improving the adhesion cannot be expected, and if it is more than 30 parts by mass, the orientation of the liquid crystal display may deteriorate.
- a photosensitizer can also be used as an additive.
- a colorless sensitizer and a triplet sensitizer are preferable.
- photosensitizer examples include aromatic nitro compounds, coumarin (7-diethylamino-4-methylcoumarin, 7-hydroxy4-methylcoumarin), ketocoumarin, carbonylbiscmarin, aromatic 2-hydroxyketone, and aromatic 2-hydroxy.
- Ketone (2-hydroxybenzophenone, mono- or di-p- (dimethylamino) -2-hydroxybenzophenone, etc.), acetophenone, anthraquinone, xanthone, thioxanthone, benzanthron, thiazolin (2-benzoylmethylene-3-methyl- ⁇ - Naftthiazolin, 2- ( ⁇ -naphthoylmethylene) -3-methylbenzothiazolin, 2- ( ⁇ -naphthoylmethylene) -3-methylbenzothiazolin, 2- (4-biphenoylmethylene) -3-methylbenzothiazolin , 2- ( ⁇ -naphthoyl methylene) -3
- aromatic 2-hydroxyketone (benzophenone), coumarin, ketokumarin, carbonylbisquemarin, acetophenone, anthraquinone, xanthone, thioxanthone and acetophenone ketal are preferred.
- the polymer composition includes a dielectric or a conductive substance for the purpose of changing the electrical properties such as the dielectric constant and the conductivity of the retardation material as long as the effect of the present invention is not impaired.
- a crosslinkable compound may be added for the purpose of increasing the hardness and the density of the film when it is used as a retardation material.
- the polymer composition is preferably prepared as a coating liquid so as to be suitable for forming a single-layer retardation material.
- the polymer composition used in the present invention includes a side chain type polymer, a solvent or compound that improves the film thickness uniformity and surface smoothness described above, a compound that improves the adhesion between the liquid crystal alignment film and the substrate, and the like.
- the solution is prepared as a solution dissolved in an organic solvent (good solvent).
- the content of the side chain type polymer is preferably 1 to 20% by mass, more preferably 3 to 20% by mass in the composition.
- the polymer composition may contain other polymers as long as the liquid crystal display ability and photosensitive performance are not impaired.
- other polymers include polymers such as poly (meth) acrylate, polyamic acid, and polyimide, which are not photosensitive side chain polymers capable of exhibiting liquid crystallinity.
- the content of the other polymer in the total polymer component is preferably 0.5 to 80% by mass, more preferably 1 to 50% by mass.
- the coating film obtained in the step (I) is irradiated with polarized ultraviolet rays.
- the substrate is irradiated with polarized ultraviolet rays from a certain direction via a polarizing plate.
- the ultraviolet rays as described above, the amount of light having a wavelength of 313 nm in the total amount of light having a wavelength of 365 nm and light having a wavelength of 313 nm is 10% or less.
- the amount of light having a wavelength of 313 nm in the total amount of light having a wavelength of 365 nm and light having a wavelength of 313 nm in the polarized ultraviolet rays used is not particularly limited as long as it is 10% or less, but the phase difference value of the obtained retardation material is not particularly limited. And from the viewpoint of further enhancing birefringence, 5% or less is preferable, 3% or less is more preferable, 1% or less is even more preferable, and it is further preferable that light having a wavelength of 313 nm is substantially not contained.
- substantially free means polarized ultraviolet rays obtained by cutting light having a wavelength of 313 nm with a cut filter or the like.
- the ultraviolet light for example, light emitted from a high-pressure mercury lamp can be used.
- the wavelength ratio of the polarized ultraviolet rays can be adjusted by selecting the optimum wavelength ratio via a filter or the like.
- light having a wavelength of 313 nm may be reduced by using a bandpass filter (BPF) having a center wavelength of 365 nm, a long wavepass filter (LWPF) that transmits a wavelength longer than 313 nm, or the like.
- BPF bandpass filter
- LWPF long wavepass filter
- the irradiation amount of polarized ultraviolet rays depends on the coating film used. That is, the irradiation amount is 1 to 70 of the amount of polarized ultraviolet rays that realizes the maximum value of ⁇ A, which is the difference between the ultraviolet absorptance in the direction parallel to the polarization direction of the polarized ultraviolet rays and the ultraviolet absorptivity in the vertical direction in the coating film. It is preferably in the range of%, and more preferably in the range of 1 to 50%.
- the production method of the present invention may include a step (III) of heating the coating film irradiated with polarized ultraviolet rays in the step (II). Orientation control ability can be imparted to the coating film by heating.
- a heating means a hot plate, a heat circulation type oven, an IR (infrared) type oven or the like can be used.
- the heating temperature can be determined in consideration of the temperature at which the liquid crystal property of the coating film to be used is developed, and the temperature at which the side chain type polymer contained in the polymerizable composition to be used develops liquid crystal color (hereinafter, liquid crystal expression). It is preferably within the temperature range of). In the case of a thin film surface such as a coating film, the liquid crystal development temperature on the coating film surface is expected to be lower than the liquid crystal development temperature when the side chain polymer is observed in bulk. Therefore, the heating temperature is more preferably within the temperature range of the liquid crystal display temperature on the surface of the coating film.
- the temperature range of the heating temperature after irradiation with polarized ultraviolet rays has a lower limit of 10 ° C lower than the lower limit of the temperature range of the liquid crystal development temperature of the side chain polymer, and an upper limit of a temperature 10 ° C lower than the upper limit of the liquid crystal temperature range.
- the temperature in the range is preferable. If the heating temperature is lower than the above temperature range, the effect of amplifying anisotropy due to heat in the coating film tends to be insufficient, and if the heating temperature is too high above the above temperature range, the state of the coating film is in a state. Tends to be close to an isotropic liquid state (isotropic phase), in which case self-assembly can make it difficult to reorient in one direction.
- the liquid crystal development temperature is equal to or higher than the liquid crystal transition temperature at which the surface of the polymer or the coating film undergoes a phase transition from the solid phase to the liquid crystal phase, and the isotropic phase undergoes a phase transition from the liquid crystal phase to the isotropic phase.
- the temperature below the phase transition temperature (Tiso).
- exhibiting liquid crystallinity at 130 ° C. or lower means that the liquid crystal transition temperature at which a phase transition occurs from the solid phase to the liquid crystal phase is 130 ° C. or lower.
- the thickness of the single-layer retardation material produced by the production method of the present invention can be appropriately selected in consideration of the step of the substrate to be used and the optical and electrical properties, and is preferably 0.5 to 10 ⁇ m, for example.
- the coating film thickness at the time of irradiation with the polarized ultraviolet rays in the step (II) reaches a deep part even if the film thickness is 0.5 ⁇ m or more, particularly 3.0 ⁇ m or more.
- the single-layer retardation material obtained by the above-described manufacturing method is a material having optical characteristics suitable for applications such as display devices and recording materials, and in particular, optical compensation for polarizing plates and retardation plates for liquid crystal displays. Suitable as a film.
- M1, m3, m4, m5, and m6 are shown below as the monomers having photoreactive groups used in the examples, and m2 is shown below as the monomers having liquidity groups.
- m1 was synthesized according to the synthetic method described in International Publication No. 2011/0854546.
- m2 and m3 were synthesized according to the synthesis method described in JP-A-9-118717.
- m4 was synthesized by the synthetic method described in Polymer, 52 (25), 5788-5794; 2011.
- m5 was synthesized by the synthetic method described in Macromolecules 2007, 40, 6355-6360.
- m6 was synthesized by the synthetic method described in the non-patent document (Macromolecules 2002, 35, 706-713).
- Methacrylate polymer powder P5 (3 g) was added to NMP (7.5 g), and the mixture was dissolved by stirring at room temperature for 1 hour. To this solution, PB (1.5 g), PGME (1.5 g), BC (1.5 g), R40 (0.0015 g) and S-1 (0.03 g) are added, and the mixture is stirred to obtain a polymer solution. I got T5. This polymer solution T5 was used as a retardation material for forming a retardation film as it was.
- Example 1-1 Manufacture of single-layer retardation material
- the polymer solution T1 was filtered through a filter having a pore size of 5.0 ⁇ m, spin-coated on a non-alkali glass substrate, and dried on a hot plate at 60 ° C. for 4 minutes to form a retardation film having a film thickness of 2.0 ⁇ m.
- the coating film surface was irradiated with ultraviolet rays of 365 nm through the polarizing plate at 50, 100, 200, 400, 600, 800, 1000 mJ / cm 2 , and then heat circulation at 140 ° C.
- the substrate S1 with a retardation film was prepared by heating in a formula oven for 20 minutes.
- Example 1-2 A substrate S2 with a retardation film was produced in the same manner as in Example 1-1 except that a 325 nm long wave pass filter (325 LWPF) was used when irradiating with ultraviolet rays of 365 nm.
- 325 LWPF 325 nm long wave pass filter
- Example 1-3 A substrate S3 with a retardation film was prepared in the same manner as in Example 1-2 except that T2 was used as the polymer solution.
- Example 1-4 A substrate S4 with a retardation film was prepared in the same manner as in Example 1-2 except that T3 was used as the polymer solution.
- Example 1-5 A substrate S5 with a retardation film was produced in the same manner as in Example 1-1 except that a 365 nm bandpass filter (365BPF) was used when irradiating with ultraviolet rays of 365 nm.
- 365BPF 365 nm bandpass filter
- Example 1-6 The polymer solution was filtered using T4 with a filter having a pore size of 5.0 ⁇ m, spin-coated on the substrate, and dried on a hot plate at 60 ° C. for 4 minutes to form a retardation film having a film thickness of 1.5 ⁇ m.
- ultraviolet rays having a wavelength of 365 nm are irradiated to the coating film surface through a polarizing plate at 50, 100, 200, 400, 800, 1500 mJ / cm 2 , and then a heat circulation method at 130 ° C. is performed.
- the substrate S9 with a retardation film was prepared by heating in an oven for 20 minutes.
- Example 1-7 The polymer solution was filtered using T5 with a filter having a pore size of 5.0 ⁇ m, spin-coated on the substrate, and dried on a hot plate at 60 ° C. for 4 minutes to form a retardation film having a film thickness of 2.0 ⁇ m. Then, after irradiating the coating film surface with ultraviolet rays having a wavelength of 365 nm via a polarizing plate at 250,500,1000,2000,4000,8000,10000 mJ / cm 2 as shown in Table 5, using 325 LWPF. , The substrate S11 with a retardation film was prepared by heating in a heat circulation type oven at 160 ° C. for 20 minutes.
- Example 1-1 A substrate S6 with a retardation film was produced in the same manner as in Example 1-1 except that the coating film surface was irradiated with ultraviolet rays having a wavelength of 313 nm via a polarizing plate.
- Comparative Example 1-2 A substrate S7 with a retardation film was produced in the same manner as in Comparative Example 1-1 except that the polymer solution T2 was used.
- Comparative Example 1-3 A substrate S8 with a retardation film was produced in the same manner as in Comparative Example 1-1 except that the polymer solution T3 was used.
- Example 1-4 A substrate S10 with a retardation film was produced in the same manner as in Example 1-6 except that the coating film surface was irradiated with ultraviolet rays having a wavelength of 313 nm via a polarizing plate.
- Example 1-5 A substrate S12 with a retardation film was produced in the same manner as in Example 1-7 except that the coating film surface was irradiated with ultraviolet rays having a wavelength of 313 nm via a polarizing plate without a cut filter.
- Table 2 shows a summary of each of the above examples and comparative examples.
- phase difference value and ⁇ n value of the substrates S1 to S12 produced in each of the above Examples and Comparative Examples were evaluated by the following methods.
- phase difference evaluation The phase difference value at a wavelength of 550 nm was evaluated using AxoScan manufactured by Axometrics. The results are shown in Tables 3-5.
Abstract
Description
1. (I)重合体組成物を基板上に塗布し、乾燥して塗膜を形成する工程、および
(II)前記塗膜に、偏光紫外線を照射する工程、を含み、
前記重合体組成物が、波長365nmの光で光二量化または光異性化する光反応性部位を側鎖に有する重合体を含み、
前記偏光紫外線における、波長365nmの光と波長313nmの光との合計量に占める波長313nmの光の量が、10%以下であることを特徴とする単層位相差材の製造方法、
2. 前記波長365nmの光と波長313nmの光との合計量に占める波長313nmの光の量が、5%以下である1の単層位相差材の製造方法、
3. 前記偏光紫外線が、波長313nmの光を含まない1または2の単層位相差材の製造方法、
4. (III)前記偏光紫外線を照射した塗膜を加熱する工程を含む1~3のいずれかの単層位相差材の製造方法、
5. 前記偏光紫外線を照射する塗膜の膜厚が、0.5μm以上である1~3のいずれかの単層位相差材の製造方法、
6. 前記重合体が、下記式(a1)~(a3)で表されるいずれかの光反応性部位を有する側鎖を有する1~5のいずれかの単層位相差材の製造方法、
Lは、炭素数1~12のアルキレン基を表し、このアルキレン基の水素原子はそれぞれ独立にハロゲン原子に置き換えられていてもよく、
Tは、単結合または炭素数1~12のアルキレン基を表し、このアルキレン基の水素原子はハロゲン原子に置き換えられていてもよく、
Tが単結合であるときはA2も単結合を表し、
Y1は、2価のベンゼン環を表し、
P1、Q1およびQ2は、それぞれ独立に、ベンゼン環および炭素数5~8の脂環式炭化水素環からなる群から選ばれる基を表し、
Rは、水素原子、シアノ基、ハロゲン原子、炭素数1~5のアルキル基、炭素数1~5のアルキルカルボニル基、炭素数3~7のシクロアルキル基、または炭素数1~5のアルキルオキシ基を表し、
Y1、P1、Q1およびQ2において、ベンゼン環に結合する水素原子は、それぞれ独立に、シアノ基、ハロゲン原子、炭素数1~5のアルキル基、炭素数1~5のアルキルカルボニル基、または炭素数1~5のアルキルオキシ基で置換されていてもよく、
X1およびX2は、それぞれ独立に、単結合、-O-、-COO-または-OCO-を表し、
n1およびn2は、それぞれ独立に0、1または2であり、
X1の数が2となるときは、X1同士は同一でも異なっていてもよく、X2の数が2となるときは、X2同士は同一でも異なっていてもよく、
Q1の数が2となるときは、Q1同士は同一でも異なっていてもよく、Q2の数が2となるときは、Q2同士は同一でも異なっていてもよく、破線は、結合手を表す。)
7. 前記重合体が、さらに光配向性を示さない側鎖を有する6の単層位相差材の製造方法、
8. 前記光配向性を示さない側鎖が下記式(1)~(12)からなる群から選ばれるいずれか1種の側鎖である7の単層位相差材の製造方法、
9. 前記光反応性部位を有する側鎖が、下記式(a1-1)~(a3-1)で表されるいずれかの基である6~8のいずれかの単層位相差材の製造方法、
を提供する。 That is, the present invention
1. 1. (I) The step of applying the polymer composition on the substrate and drying to form a coating film, and (II) the step of irradiating the coating film with polarized ultraviolet rays are included.
The polymer composition comprises a polymer having a photoreactive moiety in the side chain that is photodimerized or photoisomerized with light having a wavelength of 365 nm.
A method for producing a single-layer retardation material, wherein the amount of light having a wavelength of 313 nm in the total amount of light having a wavelength of 365 nm and light having a wavelength of 313 nm in the polarized ultraviolet rays is 10% or less.
2. 2. 1. A method for producing a single-layer retardation material, wherein the amount of light having a wavelength of 313 nm in the total amount of light having a wavelength of 365 nm and light having a wavelength of 313 nm is 5% or less.
3. 3. A method for producing a single-layer retardation material in which the polarized ultraviolet rays do not contain light having a wavelength of 313 nm.
4. (III) The method for producing a single-layer retardation material according to any one of 1 to 3, which comprises a step of heating a coating film irradiated with polarized ultraviolet rays.
5. The method for producing a single-layer retardation material according to any one of 1 to 3, wherein the film thickness of the coating film irradiated with the polarized ultraviolet rays is 0.5 μm or more.
6. The method for producing a single-layer retardation material according to any one of 1 to 5, wherein the polymer has a side chain having any of the photoreactive sites represented by the following formulas (a1) to (a3).
L represents an alkylene group having 1 to 12 carbon atoms, and the hydrogen atom of this alkylene group may be independently replaced with a halogen atom.
T represents a single bond or an alkylene group having 1 to 12 carbon atoms, and the hydrogen atom of this alkylene group may be replaced with a halogen atom.
When T is a single bond, A 2 also represents a single bond,
Y 1 represents a divalent benzene ring and represents
P 1 , Q 1 and Q 2 each independently represent a group selected from the group consisting of a benzene ring and an alicyclic hydrocarbon ring having 5 to 8 carbon atoms.
R is a hydrogen atom, a cyano group, a halogen atom, an alkyl group having 1 to 5 carbon atoms, an alkylcarbonyl group having 1 to 5 carbon atoms, a cycloalkyl group having 3 to 7 carbon atoms, or an alkyloxy having 1 to 5 carbon atoms. Represents the group
In Y 1 , P 1 , Q 1 and Q 2 , the hydrogen atom bonded to the benzene ring is independently a cyano group, a halogen atom, an alkyl group having 1 to 5 carbon atoms, and an alkylcarbonyl group having 1 to 5 carbon atoms. , Or may be substituted with an alkyloxy group having 1 to 5 carbon atoms.
X 1 and X 2 independently represent single bonds, -O-, -COO- or -OCO-, respectively.
n1 and n2 are 0, 1 or 2, respectively, respectively.
When the number of X 1 is 2, X 1 may be the same or different, and when the number of X 2 is 2, X 2 may be the same or different.
When the number of Q 1 is 2, Q 1 may be the same or different, and when the number of Q 2 is 2, Q 2 may be the same or different. Represent a hand. )
7. 6. A method for producing a single-layer retardation material in which the polymer has a side chain that does not further exhibit photoorientity.
8. The method for producing a single-layer retardation material of 7, wherein the side chain that does not exhibit photoalignment is any one of the side chains selected from the group consisting of the following formulas (1) to (12).
9. The method for producing a single-layer retardation material according to any one of 6 to 8, wherein the side chain having the photoreactive site is any group represented by the following formulas (a1-1) to (a3-1).
I will provide a.
本発明の単層位相差材の製造方法は、(I)重合体組成物を基板上に塗布し、乾燥して塗膜を形成する工程、および(II)得られた塗膜に、偏光紫外線を照射する工程、を含み、重合体組成物が、波長365nmの光で光二量化または光異性化する光反応性部位を有する重合体を含み、偏光紫外線における、波長365nmの光と波長313nmの光との合計量に占める波長313nmの光の量が、10%以下であることを特徴とする。 Hereinafter, the present invention will be specifically described.
The method for producing a single-layer retardation material of the present invention is a step of (I) applying a polymer composition on a substrate and drying to form a coating film, and (II) polarized ultraviolet light on the obtained coating film. The polymer composition comprises a polymer having a photoreactive moiety that is photodimerized or photoisomerized with light at a wavelength of 365 nm, comprising light at a wavelength of 365 nm and light at a wavelength of 313 nm in polarized ultraviolet light. The amount of light having a wavelength of 313 nm in the total amount of light is 10% or less.
工程(I)は、重合体組成物を基板上に塗布して塗膜を形成する工程である。より具体的には、重合体組成物を基板(例えば、シリコン/二酸化シリコン被覆基板、シリコンナイトライド基板、金属(例えば、アルミニウム、モリブデン、クロム等)が被覆された基板、ガラス基板、石英基板、ITO基板等)やフィルム(例えば、トリアセチルセルロース(TAC)フィルム、シクロオレフィンポリマーフィルム、ポリエチレンテレフタレートフィルム、アクリルフィルム等の樹脂フィルム)等の上に、バーコート、スピンコート、フローコート、ロールコート、スリットコート、スリットコートに続いたスピンコート、インクジェット法、印刷法等の方法によって塗布する。塗布した後、自然乾燥したり、ホットプレート、熱循環型オーブン、IR(赤外線)型オーブン等の加熱手段により加熱したりして、溶媒を蒸発させて塗膜を得ることができる。加熱手段により加熱する場合、その温度は特に限定されるものではないが、50~200℃が好ましく、50~150℃がより好ましい。 [Step (I)]
Step (I) is a step of applying the polymer composition on the substrate to form a coating film. More specifically, the polymer composition is coated on a substrate (for example, silicon / silicon dioxide coated substrate, silicon nitride substrate, metal (for example, aluminum, molybdenum, chromium, etc.)), a glass substrate, a quartz substrate, and the like. Bar coat, spin coat, flow coat, roll coat, etc. on ITO substrate, etc.) or film (for example, resin film such as triacetyl cellulose (TAC) film, cycloolefin polymer film, polyethylene terephthalate film, acrylic film, etc.). It is applied by a method such as a slit coat, a spin coat following the slit coat, an inkjet method, and a printing method. After the coating, it can be naturally dried or heated by a heating means such as a hot plate, a heat circulation type oven, or an IR (infrared) type oven to evaporate the solvent to obtain a coating film. When heating by a heating means, the temperature is not particularly limited, but is preferably 50 to 200 ° C, more preferably 50 to 150 ° C.
重合体としては、上記の性質を有する側鎖型重合体であれば特に制限はないが、下記式(a1)~(a3)で表されるいずれかの光反応性部位を有する側鎖(以下、側鎖aともいう。)を有するものが好ましく、下記式(a1-1)~(a3-1)で表されるいずれかの光反応性部位を有する側鎖を有するものがより好ましい。
なお、溶媒への溶解性の観点から、一つの光反応性部位を有する側鎖が有するベンゼン環の数は3つ以内が好ましい。 As the side chain type polymer, a polymer having a photoreactive moiety that is photodimerized or photoisomerized with light having a wavelength of 365 nm is used.
The polymer is not particularly limited as long as it is a side chain type polymer having the above properties, but a side chain having any of the photoreactive sites represented by the following formulas (a1) to (a3) (hereinafter referred to as “side chain”). , Also referred to as side chain a), and more preferably having a side chain having any of the photoreactive sites represented by the following formulas (a1-1) to (a3-1).
From the viewpoint of solubility in a solvent, the number of benzene rings in the side chain having one photoreactive moiety is preferably 3 or less.
Lは、炭素数1~12のアルキレン基を表し、このアルキレン基の水素原子はそれぞれ独立にハロゲン原子に置き換えられていてもよい。
Tは、単結合または炭素数1~12のアルキレン基を表し、このアルキレン基の水素原子はハロゲン原子に置き換えられていてもよい。なお、Tが単結合であるときはA2も単結合を表す。
Y1は、2価のベンゼン環を表す。
P1、Q1およびQ2は、それぞれ独立に、ベンゼン環および炭素数5~8の脂環式炭化水素環からなる群から選ばれる基を表す。
Rは、水素原子、シアノ基、ハロゲン原子、炭素数1~5のアルキル基、炭素数1~5のアルキルカルボニル基、炭素数3~7のシクロアルキル基、または炭素数1~5のアルキルオキシ基を表す。
Y1、P1、Q1およびQ2において、ベンゼン環に結合する水素原子は、それぞれ独立に、シアノ基、ハロゲン原子、炭素数1~5のアルキル基、炭素数1~5のアルキルカルボニル基、または炭素数1~5のアルキルオキシ基で置換されていてもよい。
X1およびX2は、それぞれ独立に、単結合、-O-、-COO-または-OCO-を表す。
n1およびn2は、それぞれ独立に0、1または2である。
X1の数が2となるときは、X1同士は同一でも異なっていてもよく、X2の数が2となるときは、X2同士は同一でも異なっていてもよく、Q1の数が2となるときは、Q1同士は同一でも異なっていてもよく、Q2の数が2となるときは、Q2同士は同一でも異なっていてもよい。 In each of the above equations, A 1 , A 2 and D independently represent a single bond, -O-, -CH 2- , -COO-, -OCO-, -CONH-, or -NH-CO-. ..
L represents an alkylene group having 1 to 12 carbon atoms, and the hydrogen atom of this alkylene group may be independently replaced with a halogen atom.
T represents a single bond or an alkylene group having 1 to 12 carbon atoms, and the hydrogen atom of this alkylene group may be replaced with a halogen atom. When T is a single bond, A 2 also represents a single bond.
Y 1 represents a divalent benzene ring.
P 1 , Q 1 and Q 2 each independently represent a group selected from the group consisting of a benzene ring and an alicyclic hydrocarbon ring having 5 to 8 carbon atoms.
R is a hydrogen atom, a cyano group, a halogen atom, an alkyl group having 1 to 5 carbon atoms, an alkylcarbonyl group having 1 to 5 carbon atoms, a cycloalkyl group having 3 to 7 carbon atoms, or an alkyloxy having 1 to 5 carbon atoms. Represents a group.
In Y 1 , P 1 , Q 1 and Q 2 , the hydrogen atom bonded to the benzene ring is independently a cyano group, a halogen atom, an alkyl group having 1 to 5 carbon atoms, and an alkylcarbonyl group having 1 to 5 carbon atoms. , Or may be substituted with an alkyloxy group having 1 to 5 carbon atoms.
X 1 and X 2 independently represent a single bond, -O-, -COO- or -OCO-, respectively.
n1 and n2 are 0, 1 or 2, respectively.
When the number of X 1 is 2, X 1 may be the same or different, and when the number of X 2 is 2, X 2 may be the same or different, and the number of Q 1 When is 2, Q 1s may be the same or different, and when the number of Q 2s is 2 , Q 2s may be the same or different.
炭素数5~8の脂環式炭化水素環の具体例としては、シクロペンタン環、シクロヘキサン環、シクロヘプタン環、シクロオクタン環が挙げられる。 The alkylene group having 1 to 12 carbon atoms may be linear, branched or cyclic, and specific examples thereof include methylene, ethylene, propane-1,3-diyl, butane-1,4-diyl and pentane. -1,5-diyl, hexane-1,6-diyl, heptane-1,7-diyl, octane-1,8-diyl, nonane-1,9-diyl, decane-1,10-diyl group, etc. Be done.
Specific examples of the alicyclic hydrocarbon ring having 5 to 8 carbon atoms include a cyclopentane ring, a cyclohexane ring, a cycloheptane ring, and a cyclooctane ring.
炭素数1~5のアルキル基は、直鎖状、分岐状のいずれでもよく、その具体例としては、メチル、エチル、n-プロピル、i-プロピル、n-ブチル、t-ブチル、n-ペンチル基等が挙げられる。
炭素数1~5のアルキルカルボニル基の具体例としては、メチルカルボニル(アセチル)、エチルカルボニル、n-プロピルカルボニル、n-ブチルカルボニル、n-ペンチルカルボニル基等が挙げられる。
炭素数3~7のシクロアルキル基の具体例としては、シクロプロピル、シクロブチル、シクロペンチル、シクロヘキシル基等が挙げられる。
炭素数1~5のアルキルオキシ基の具体例としては、メトキシ、エトキシ、n-プロポキシ、i-プロポキシ、n-ブトキシ、n-ペンチルオキシ基等が挙げられる。 Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, an iodine atom and the like.
The alkyl group having 1 to 5 carbon atoms may be linear or branched, and specific examples thereof include methyl, ethyl, n-propyl, i-propyl, n-butyl, t-butyl and n-pentyl. Group etc. can be mentioned.
Specific examples of the alkylcarbonyl group having 1 to 5 carbon atoms include methylcarbonyl (acetyl), ethylcarbonyl, n-propylcarbonyl, n-butylcarbonyl, n-pentylcarbonyl group and the like.
Specific examples of the cycloalkyl group having 3 to 7 carbon atoms include cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl group and the like.
Specific examples of the alkyloxy group having 1 to 5 carbon atoms include methoxy, ethoxy, n-propoxy, i-propoxy, n-butoxy, n-pentyloxy group and the like.
このような側鎖bとしては、下記式(1)~(12)からなる群から選ばれるいずれか1種の側鎖が好ましいが、これらに限定されるものではない。 Further, the side chain type polymer may further have a side chain (hereinafter, also referred to as side chain b) that does not exhibit photoalignment.
As such a side chain b, any one of the side chains selected from the group consisting of the following formulas (1) to (12) is preferable, but the side chain b is not limited thereto.
また、アルキル基、アルコキシ基としては、上記R5で例示した基と同様のものが挙げられる。 Specific examples of the monovalent nitrogen-containing heterocyclic group include pyrrolidinyl, piperidinyl, piperazinyl, pyrrolyl, and pyridyl group, and specific examples of the monovalent alicyclic hydrocarbon group having 5 to 8 carbon atoms are cyclopentyl. , Cyclohexyl group and the like.
Examples of the alkyl group and the alkoxy group include the same groups as those exemplified in R5 above.
スチレン化合物の具体例としては、スチレン、4-メチルスチレン、4-クロロスチレン、4-ブロモスチレン等が挙げられる。
マレイミド化合物の具体例としては、マレイミド、N-メチルマレイミド、N-フェニルマレイミド、N-シクロヘキシルマレイミド等が挙げられる。 Specific examples of the vinyl compound include vinyl ether, methyl vinyl ether, benzyl vinyl ether, 2-hydroxyethyl vinyl ether, phenyl vinyl ether, propyl vinyl ether and the like.
Specific examples of the styrene compound include styrene, 4-methylstyrene, 4-chlorostyrene, 4-bromostyrene and the like.
Specific examples of the maleimide compound include maleimide, N-methylmaleimide, N-phenylmaleimide, N-cyclohexylmaleimide and the like.
なお、ラジカル重合において有機溶媒中の酸素は重合反応を阻害する原因となるので、有機溶媒は可能な程度に脱気されたものを用いることが好ましい。 Further, even if the solvent does not dissolve the produced polymer, it may be mixed with the above-mentioned organic solvent and used as long as the produced polymer does not precipitate.
In radical polymerization, oxygen in the organic solvent causes the polymerization reaction to be inhibited, so it is preferable to use an organic solvent that has been degassed to the extent possible.
有機溶媒は、重合体成分を溶解させる有機溶媒であれば特に限定されない。その具体例としては、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド、N-メチル-2-ピロリドン、N-メチル-ε-カプロラクタム、2-ピロリドン、N-エチル-2-ピロリドン、N-ビニル-2-ピロリドン、ジメチルスルホキシド、テトラメチル尿素、ピリジン、ジメチルスルホン、ヘキサメチルスルホキシド、γ-ブチロラクトン、3-メトキシ-N,N-ジメチルプロパンアミド、3-エトキシ-N,N-ジメチルプロパンアミド、3-ブトキシ-N,N-ジメチルプロパンアミド、1,3-ジメチル-2-イミダゾリジノン、エチルアミルケトン、メチルノニルケトン、メチルエチルケトン、メチルイソアミルケトン、メチルイソプロピルケトン、シクロヘキサノン、シクロペンタノン、エチレンカーボネート、プロピレンカーボネート、ジグライム、4-ヒドロキシ-4-メチル-2-ペンタノン、プロピレングリコールモノアセテート、プロピレングリコールモノメチルエーテル、プロピレングリコール-tert-ブチルエーテル、ジプロピレングリコールモノメチルエーテル、ジエチレングリコール、ジエチレングリコールモノアセテート、ジエチレングリコールジメチルエーテル、ジプロピレングリコールモノアセテートモノメチルエーテル、ジプロピレングリコールモノメチルエーテル、ジプロピレングリコールモノエチルエーテル、ジプロピレングリコールモノアセテートモノエチルエーテル、ジプロピレングリコールモノプロピルエーテル、ジプロピレングリコールモノアセテートモノプロピルエーテル、3-メチル-3-メトキシブチルアセテート、トリプロピレングリコールメチルエーテル、テトラヒドロフラン、テトラヒドロフルフリルアルコール等が挙げられる。これらは1種単独で使用してもよく、2種以上を混合して使用してもよい。 The polymerizable composition used in the present invention contains the side chain type polymer as described above and an organic solvent (good solvent).
The organic solvent is not particularly limited as long as it is an organic solvent that dissolves the polymer component. Specific examples thereof include N, N-dimethylformamide, N, N-dimethylacetamide, N-methyl-2-pyrrolidone, N-methyl-ε-caprolactam, 2-pyrrolidone, N-ethyl-2-pyrrolidone, N-. Vinyl-2-pyrrolidone, dimethylsulfoxide, tetramethylurea, pyridine, dimethylsulfone, hexamethylsulfoxide, γ-butyrolactone, 3-methoxy-N, N-dimethylpropanamide, 3-ethoxy-N, N-dimethylpropanamide, 3-Butoxy-N, N-dimethylpropanamide, 1,3-dimethyl-2-imidazolidinone, ethylamylketone, methylnonylketone, methylethylketone, methylisoamylketone, methylisopropylketone, cyclohexanone, cyclopentanone, ethylene carbonate , Propylene carbonate, diglyme, 4-hydroxy-4-methyl-2-pentanone, propylene glycol monoacetate, propylene glycol monomethyl ether, propylene glycol-tert-butyl ether, dipropylene glycol monomethyl ether, diethylene glycol, diethylene glycol monoacetate, diethylene glycol dimethyl ether, Dipropylene Glycol Monoacetate Monomethyl Ether, Dipropylene Glycol Monomethyl Ether, Dipropylene Glycol Monoethyl Ether, Dipropylene Glycol Monoacetate Monoethyl Ether, Dipropylene Glycol Monopropyl Ether, Dipropylene Glycol Monoacetate Monopropyl Ether, 3-Methyl- Examples thereof include 3-methoxybutyl acetate, tripropylene glycol methyl ether, tetrahydrofuran, tetrahydrofurfuryl alcohol and the like. These may be used alone or in combination of two or more.
貧溶媒を用いる場合、その含有量は、重合体の溶解性を著しく低下させることがないように、溶媒中5~80質量%が好ましく、20~60質量%がより好ましい。 These poor solvents may be used alone or in combination of two or more.
When a poor solvent is used, the content thereof is preferably 5 to 80% by mass, more preferably 20 to 60% by mass in the solvent so as not to significantly reduce the solubility of the polymer.
ここで、側鎖型重合体の含有量は、組成物中1~20質量%が好ましく、3~20質量%がより好ましい。 The polymer composition is preferably prepared as a coating liquid so as to be suitable for forming a single-layer retardation material. That is, the polymer composition used in the present invention includes a side chain type polymer, a solvent or compound that improves the film thickness uniformity and surface smoothness described above, a compound that improves the adhesion between the liquid crystal alignment film and the substrate, and the like. However, it is preferable that the solution is prepared as a solution dissolved in an organic solvent (good solvent).
Here, the content of the side chain type polymer is preferably 1 to 20% by mass, more preferably 3 to 20% by mass in the composition.
その他の重合体としては、例えば、ポリ(メタ)アクリレートやポリアミック酸やポリイミド等の、液晶性を発現し得る感光性の側鎖型重合体ではない重合体等が挙げられる。
全重合体成分中におけるその他の重合体の含有量は、0.5~80質量%が好ましく、1~50質量%がより好ましい。 In addition to the side chain type polymer described above, the polymer composition may contain other polymers as long as the liquid crystal display ability and photosensitive performance are not impaired.
Examples of other polymers include polymers such as poly (meth) acrylate, polyamic acid, and polyimide, which are not photosensitive side chain polymers capable of exhibiting liquid crystallinity.
The content of the other polymer in the total polymer component is preferably 0.5 to 80% by mass, more preferably 1 to 50% by mass.
工程(II)では、工程(I)で得られた塗膜に偏光紫外線を照射する。塗膜の膜面に偏光した紫外線を照射する場合、基板に対して一定の方向から偏光板を介して偏光紫外線を照射する。
本発明では、上記紫外線として、上述のとおり、波長365nmの光と波長313nmの光との合計量に占める波長313nmの光の量が10%以下のものを用いる。
使用する偏光紫外線における、波長365nmの光と波長313nmの光との合計量に占める波長313nmの光の量は、10%以下であれば特に制限はないが、得られる位相差材の位相差値および複屈折をより高めるという点から、5%以下が好ましく、3%以下がより好ましく、1%以下がより一層好ましく、波長313nmの光を実質的に含まないことがさらに好ましい。なお、実質的に含まないとは、カットフィルター等で波長313nmの光をカットした偏光紫外線を意味する。 [Step (II)]
In the step (II), the coating film obtained in the step (I) is irradiated with polarized ultraviolet rays. When irradiating the film surface of the coating film with polarized ultraviolet rays, the substrate is irradiated with polarized ultraviolet rays from a certain direction via a polarizing plate.
In the present invention, as the ultraviolet rays, as described above, the amount of light having a wavelength of 313 nm in the total amount of light having a wavelength of 365 nm and light having a wavelength of 313 nm is 10% or less.
The amount of light having a wavelength of 313 nm in the total amount of light having a wavelength of 365 nm and light having a wavelength of 313 nm in the polarized ultraviolet rays used is not particularly limited as long as it is 10% or less, but the phase difference value of the obtained retardation material is not particularly limited. And from the viewpoint of further enhancing birefringence, 5% or less is preferable, 3% or less is more preferable, 1% or less is even more preferable, and it is further preferable that light having a wavelength of 313 nm is substantially not contained. The term "substantially free" means polarized ultraviolet rays obtained by cutting light having a wavelength of 313 nm with a cut filter or the like.
偏光紫外線の波長の割合の調整は、フィルター等を介して最適な波長割合を選択して行うことができる。例えば、365nmを中心波長とするバンドパスフィルタ(BPF)を用いたり、313nmよりも長波長を透過させるロングウェーブパスフィルタ(LWPF)等を用いて、波長313nmの光を減少させればよい。 As the ultraviolet light, for example, light emitted from a high-pressure mercury lamp can be used.
The wavelength ratio of the polarized ultraviolet rays can be adjusted by selecting the optimum wavelength ratio via a filter or the like. For example, light having a wavelength of 313 nm may be reduced by using a bandpass filter (BPF) having a center wavelength of 365 nm, a long wavepass filter (LWPF) that transmits a wavelength longer than 313 nm, or the like.
本発明の製造方法では、工程(II)で偏光紫外線を照射された塗膜を加熱する工程(III)を備えていてもよい。加熱により、塗膜に配向制御能を付与することができる。
加熱手段としては、ホットプレート、熱循環型オーブン、IR(赤外線)型オーブン等のを用いることができる。 [Step (III)]
The production method of the present invention may include a step (III) of heating the coating film irradiated with polarized ultraviolet rays in the step (II). Orientation control ability can be imparted to the coating film by heating.
As the heating means, a hot plate, a heat circulation type oven, an IR (infrared) type oven or the like can be used.
塗膜のような薄膜表面の場合、塗膜表面の液晶発現温度は、側鎖型重合体をバルクで観察した場合の液晶発現温度よりも低いことが予想される。このため、加熱温度は、塗膜表面の液晶発現温度の温度範囲内がより好ましい。すなわち、偏光紫外線照射後の加熱温度の温度範囲は、側鎖型重合体の液晶発現温度の温度範囲の下限より10℃低い温度を下限とし、その液晶温度範囲の上限より10℃低い温度を上限とする範囲の温度が好ましい。加熱温度が、上記温度範囲よりも低いと、塗膜における熱による異方性の増幅効果が不十分となる傾向があり、また加熱温度が、上記温度範囲よりも高すぎると、塗膜の状態が等方性の液体状態(等方相)に近くなる傾向があり、この場合、自己組織化によって一方向に再配向することが困難になることがある。 The heating temperature can be determined in consideration of the temperature at which the liquid crystal property of the coating film to be used is developed, and the temperature at which the side chain type polymer contained in the polymerizable composition to be used develops liquid crystal color (hereinafter, liquid crystal expression). It is preferably within the temperature range of).
In the case of a thin film surface such as a coating film, the liquid crystal development temperature on the coating film surface is expected to be lower than the liquid crystal development temperature when the side chain polymer is observed in bulk. Therefore, the heating temperature is more preferably within the temperature range of the liquid crystal display temperature on the surface of the coating film. That is, the temperature range of the heating temperature after irradiation with polarized ultraviolet rays has a lower limit of 10 ° C lower than the lower limit of the temperature range of the liquid crystal development temperature of the side chain polymer, and an upper limit of a temperature 10 ° C lower than the upper limit of the liquid crystal temperature range. The temperature in the range is preferable. If the heating temperature is lower than the above temperature range, the effect of amplifying anisotropy due to heat in the coating film tends to be insufficient, and if the heating temperature is too high above the above temperature range, the state of the coating film is in a state. Tends to be close to an isotropic liquid state (isotropic phase), in which case self-assembly can make it difficult to reorient in one direction.
m1は、国際公開第2011/084546号に記載された合成法に従って合成した。m2およびm3は、特開平9-118717号公報に記載された合成法に従って合成した。m4は、Polymer, 52(25), 5788-5794; 2011に記載の合成法にて合成した。m5は、Macromolecules 2007, 40, 6355-6360に記載の合成法にて合成した。m6は、非特許文献(Macromolecules 2002, 35, 706-713)に記載の合成法にて合成した。 M1, m3, m4, m5, and m6 are shown below as the monomers having photoreactive groups used in the examples, and m2 is shown below as the monomers having liquidity groups.
m1 was synthesized according to the synthetic method described in International Publication No. 2011/0854546. m2 and m3 were synthesized according to the synthesis method described in JP-A-9-118717. m4 was synthesized by the synthetic method described in Polymer, 52 (25), 5788-5794; 2011. m5 was synthesized by the synthetic method described in Macromolecules 2007, 40, 6355-6360. m6 was synthesized by the synthetic method described in the non-patent document (Macromolecules 2002, 35, 706-713).
(有機溶媒)
THF:テトラヒドロフラン
NMP:N-メチル-2-ピロリドン
BC:ブチルセロソルブ
PGME:プロピレングリコールモノメチルエーテル
PB:プロピレングリコールモノブチルエーテル
(重合開始剤)
AIBN:2,2’-アゾビスイソブチロニトリル
(界面活性剤)
R40:メガファックR-40(DIC(株)製)
(シランカップリング剤)
S-1:3-グリシドキシプロピルトリエトキシシラン(LS-4668、信越化学工業(株)製) In addition, the abbreviations of the reagents used in this example are shown below.
(Organic solvent)
THF: Tetrahydrofuran NMP: N-Methyl-2-pyrrolidone BC: Butyl cellosolve PGME: Propylene glycol monomethyl ether PB: Propylene glycol monobutyl ether (polymerization initiator)
AIBN: 2,2'-azobisisobutyronitrile (surfactant)
R40: Megafuck R-40 (manufactured by DIC Corporation)
(Silane coupling agent)
S-1: 3-glycidoxypropyltriethoxysilane (LS-4668, manufactured by Shin-Etsu Chemical Co., Ltd.)
[合成例1]
m1(13.3g,0.04mol)およびm2(18.4g,0.06mol)をTHF(131.2g)中に溶解させ、ダイアフラムポンプで脱気を行った後、AIBN(0.49g,0.003mol)を加え、再び脱気を行った。この後、60℃で8時間反応させ、メタクリレートポリマー溶液を得た。このポリマー溶液をメタノール(1,000mL)に滴下し、得られた沈殿物をろ過した。この沈澱物をメタノールで洗浄し、減圧乾燥することで、メタクリレートポリマー粉末P1を得た。 [1] Synthesis of methacrylate polymer powder [Synthesis Example 1]
After dissolving m1 (13.3 g, 0.04 mol) and m2 (18.4 g, 0.06 mol) in THF (131.2 g) and degassing with a diaphragm pump, AIBN (0.49 g, 0) .003 mol) was added, and degassing was performed again. Then, the reaction was carried out at 60 ° C. for 8 hours to obtain a methacrylate polymer solution. This polymer solution was added dropwise to methanol (1,000 mL) and the resulting precipitate was filtered. The precipitate was washed with methanol and dried under reduced pressure to obtain a methacrylate polymer powder P1.
使用したモノマーと重合溶剤を下記表1のように変更した以外は、合成例1と同様の手順により、メタクリレートポリマー粉末P2~P5を得た。 [Synthesis Examples 2 to 5]
Methacrylate polymer powders P2 to P5 were obtained by the same procedure as in Synthesis Example 1 except that the monomers and polymerization solvents used were changed as shown in Table 1 below.
[製造例1-1]
NMP(7.5g)にメタクリレートポリマー粉末P1(3g)を加え、室温で1時間撹拌して溶解させた。この溶液に、PB(1.5g)、PGME(1.5g)、BC(1.5g)、R40(0.0015g)およびS-1(0.03g)を加え、撹拌することにより、ポリマー溶液T1を得た。このポリマー溶液T1は、そのまま位相差膜を形成するための位相差材とした。 [2] Preparation of polymer solution [Production Example 1-1]
Methacrylate polymer powder P1 (3 g) was added to NMP (7.5 g), and the mixture was dissolved by stirring at room temperature for 1 hour. To this solution, PB (1.5 g), PGME (1.5 g), BC (1.5 g), R40 (0.0015 g) and S-1 (0.03 g) are added, and the mixture is stirred to obtain a polymer solution. I got T1. This polymer solution T1 was used as a retardation material for forming a retardation film as it was.
NMP(7.5g)にメタクリレートポリマー粉末P2(3g)を加え、室温で1時間撹拌して溶解させた。この溶液に、PB(1.5g)、PGME(1.5g)、BC(1.5g)、R40(0.0015g)およびS-1(0.03g)を加え、撹拌することにより、ポリマー溶液T2を得た。このポリマー溶液T2は、そのまま位相差膜を形成するための位相差材とした。 [Manufacturing Example 1-2]
Methacrylate polymer powder P2 (3 g) was added to NMP (7.5 g), and the mixture was dissolved by stirring at room temperature for 1 hour. To this solution, PB (1.5 g), PGME (1.5 g), BC (1.5 g), R40 (0.0015 g) and S-1 (0.03 g) are added, and the mixture is stirred to obtain a polymer solution. I got T2. This polymer solution T2 was used as a retardation material for forming a retardation film as it was.
NMP(7.5g)にメタクリレートポリマー粉末P3(3g)を加え、室温で1時間撹拌して溶解させた。この溶液に、PB(1.5g)、PGME(1.5g)、BC(1.5g)、R40(0.0015g)およびS-1(0.03g)を加え、撹拌することにより、ポリマー溶液T3を得た。このポリマー溶液T3は、そのまま位相差膜を形成するための位相差材とした。 [Manufacturing Example 1-3]
Methacrylate polymer powder P3 (3 g) was added to NMP (7.5 g), and the mixture was dissolved by stirring at room temperature for 1 hour. To this solution, PB (1.5 g), PGME (1.5 g), BC (1.5 g), R40 (0.0015 g) and S-1 (0.03 g) are added, and the mixture is stirred to obtain a polymer solution. I got T3. This polymer solution T3 was used as a retardation material for forming a retardation film as it was.
NMP(18.1g)にメタクリレートポリマー粉末P4(5.0g)を加え、室温で1時間撹拌して溶解させた。この溶液に、PB(3.3g)、PGME(3.3g)、BC(3.3g)およびR40(0.0025g)を加え、撹拌することにより、ポリマー溶液T4を得た。このポリマー溶液T4は、そのまま位相差膜を形成するための位相差材とした。 [Manufacturing Example 1-4]
Methacrylate polymer powder P4 (5.0 g) was added to NMP (18.1 g), and the mixture was dissolved by stirring at room temperature for 1 hour. PB (3.3 g), PGME (3.3 g), BC (3.3 g) and R40 (0.0025 g) were added to this solution and stirred to obtain a polymer solution T4. This polymer solution T4 was used as a retardation material for forming a retardation film as it was.
NMP(7.5g)にメタクリレートポリマー粉末P5(3g)を加え、室温で1時間撹拌して溶解させた。この溶液に、PB(1.5g)、PGME(1.5g)、BC(1.5g)、R40(0.0015g)およびS-1(0.03g)を加え、撹拌することにより、ポリマー溶液T5を得た。このポリマー溶液T5は、そのまま位相差膜を形成するための位相差材とした。 [Manufacturing Example 1-5]
Methacrylate polymer powder P5 (3 g) was added to NMP (7.5 g), and the mixture was dissolved by stirring at room temperature for 1 hour. To this solution, PB (1.5 g), PGME (1.5 g), BC (1.5 g), R40 (0.0015 g) and S-1 (0.03 g) are added, and the mixture is stirred to obtain a polymer solution. I got T5. This polymer solution T5 was used as a retardation material for forming a retardation film as it was.
[実施例1-1]
ポリマー溶液T1を孔径5.0μmのフィルターで濾過した後、無アルカリガラス基板上にスピンコートし、60℃のホットプレート上で4分間乾燥し、膜厚2.0μmの位相差膜を形成した。次いで、偏光板を介して365nmの紫外線を、表3に示されるように、50、100、200、400、600、800、1000mJ/cm2で塗膜面に照射した後に、140℃の熱循環式オーブンで20分間加熱し、位相差膜付きの基板S1を作製した。 [3] Manufacture of single-layer retardation material [Example 1-1]
The polymer solution T1 was filtered through a filter having a pore size of 5.0 μm, spin-coated on a non-alkali glass substrate, and dried on a hot plate at 60 ° C. for 4 minutes to form a retardation film having a film thickness of 2.0 μm. Then, as shown in Table 3, the coating film surface was irradiated with ultraviolet rays of 365 nm through the polarizing plate at 50, 100, 200, 400, 600, 800, 1000 mJ / cm 2 , and then heat circulation at 140 ° C. The substrate S1 with a retardation film was prepared by heating in a formula oven for 20 minutes.
365nmの紫外線を照射する際に、325nmロングウェーブパスフィルタ(325LWPF)を用いた以外は、実施例1-1と同様にして、位相差膜付きの基板S2を作製した。 [Example 1-2]
A substrate S2 with a retardation film was produced in the same manner as in Example 1-1 except that a 325 nm long wave pass filter (325 LWPF) was used when irradiating with ultraviolet rays of 365 nm.
ポリマー溶液にT2を用いた以外は、実施例1-2と同様にして、位相差膜付きの基板S3を作製した。 [Example 1-3]
A substrate S3 with a retardation film was prepared in the same manner as in Example 1-2 except that T2 was used as the polymer solution.
ポリマー溶液にT3を用いた以外は、実施例1-2と同様にして、位相差膜付きの基板S4を作製した。 [Example 1-4]
A substrate S4 with a retardation film was prepared in the same manner as in Example 1-2 except that T3 was used as the polymer solution.
365nmの紫外線を照射する際に、365nmバンドパスフィルタ(365BPF)を用いた以外は、実施例1-1と同様にして、位相差膜付きの基板S5を作製した。 [Example 1-5]
A substrate S5 with a retardation film was produced in the same manner as in Example 1-1 except that a 365 nm bandpass filter (365BPF) was used when irradiating with ultraviolet rays of 365 nm.
ポリマー溶液にT4を用いて孔径5.0μmのフィルターで濾過した後、基板上にスピンコートし、60℃のホットプレート上で4分間乾燥し、膜厚1.5μmの位相差膜を形成した。次いで、偏光板を介して波長365nmの紫外線を、表4に示されるように、50、100、200、400、800、1500mJ/cm2で塗膜面に照射した後に、130℃の熱循環式オーブンで20分間加熱し、位相差膜付きの基板S9を作製した。 [Example 1-6]
The polymer solution was filtered using T4 with a filter having a pore size of 5.0 μm, spin-coated on the substrate, and dried on a hot plate at 60 ° C. for 4 minutes to form a retardation film having a film thickness of 1.5 μm. Next, as shown in Table 4, ultraviolet rays having a wavelength of 365 nm are irradiated to the coating film surface through a polarizing plate at 50, 100, 200, 400, 800, 1500 mJ / cm 2 , and then a heat circulation method at 130 ° C. is performed. The substrate S9 with a retardation film was prepared by heating in an oven for 20 minutes.
ポリマー溶液にT5を用いて孔径5.0μmのフィルターで濾過した後、基板上にスピンコートし、60℃のホットプレート上で4分間乾燥し、膜厚2.0μmの位相差膜を形成した。次いで、偏光板を介して波長365nmの紫外線を、325LWPFを用いて、表5に示されるように、250,500,1000,2000,4000,8000,10000mJ/cm2で塗膜面に照射した後に、160℃の熱循環式オーブンで20分間加熱し、位相差膜付きの基板S11を作製した。 [Example 1-7]
The polymer solution was filtered using T5 with a filter having a pore size of 5.0 μm, spin-coated on the substrate, and dried on a hot plate at 60 ° C. for 4 minutes to form a retardation film having a film thickness of 2.0 μm. Then, after irradiating the coating film surface with ultraviolet rays having a wavelength of 365 nm via a polarizing plate at 250,500,1000,2000,4000,8000,10000 mJ / cm 2 as shown in Table 5, using 325 LWPF. , The substrate S11 with a retardation film was prepared by heating in a heat circulation type oven at 160 ° C. for 20 minutes.
塗膜面に偏光板を介して波長313nmの紫外線を照射した以外は、実施例1-1と同様にして、位相差膜付き基板S6を作製した。 [Comparative Example 1-1]
A substrate S6 with a retardation film was produced in the same manner as in Example 1-1 except that the coating film surface was irradiated with ultraviolet rays having a wavelength of 313 nm via a polarizing plate.
ポリマー溶液T2を用いた以外は、比較例1-1と同様にして、位相差膜付きの基板S7を作製した。 [Comparative Example 1-2]
A substrate S7 with a retardation film was produced in the same manner as in Comparative Example 1-1 except that the polymer solution T2 was used.
ポリマー溶液T3を用いた以外は、比較例1-1と同様にして、位相差膜付きの基板S8を作製した。 [Comparative Example 1-3]
A substrate S8 with a retardation film was produced in the same manner as in Comparative Example 1-1 except that the polymer solution T3 was used.
塗膜面に偏光板を介して波長313nmの紫外線を照射した以外は、実施例1-6と同様にして、位相差膜付きの基板S10を作製した。 [Comparative Example 1-4]
A substrate S10 with a retardation film was produced in the same manner as in Example 1-6 except that the coating film surface was irradiated with ultraviolet rays having a wavelength of 313 nm via a polarizing plate.
塗膜面に偏光板を介して波長313nmの紫外線をカットフィルターなしで照射した以外は、実施例1-7と同様にして、位相差膜付きの基板S12を作製した。
上記各実施例および比較例のまとめを表2に示す。
なお、全照射量における波長313nmの光の占める割合は、下記式により求めた。
波長313nm光の占める割合(%)=波長313nmの放射強度/(波長313nmの放射強度+波長365nmの放射強度)*100 [Comparative Example 1-5]
A substrate S12 with a retardation film was produced in the same manner as in Example 1-7 except that the coating film surface was irradiated with ultraviolet rays having a wavelength of 313 nm via a polarizing plate without a cut filter.
Table 2 shows a summary of each of the above examples and comparative examples.
The ratio of light having a wavelength of 313 nm to the total irradiation amount was calculated by the following formula.
Ratio (%) of light with wavelength 313 nm = Radiant intensity at wavelength 313 nm / (Radiation intensity at wavelength 313 nm + Radiant intensity at wavelength 365 nm) * 100
Axometrics社製のAxoScanを用いて波長550nmにおける位相差値を評価した。結果を表3~5に示す。 (1) Phase difference evaluation The phase difference value at a wavelength of 550 nm was evaluated using AxoScan manufactured by Axometrics. The results are shown in Tables 3-5.
(1)の値を膜厚で割ることにより、波長550nmにおける配向度(Δn)を算出した。結果を表6~8に示す。 (2) Evaluation of Δn value The degree of orientation (Δn) at a wavelength of 550 nm was calculated by dividing the value of (1) by the film thickness. The results are shown in Tables 6-8.
Claims (9)
- (I)重合体組成物を基板上に塗布し、乾燥して塗膜を形成する工程、および
(II)前記塗膜に、偏光紫外線を照射する工程、を含み、
前記重合体組成物が、波長365nmの光で光二量化または光異性化する光反応性部位を側鎖に有する重合体を含み、
前記偏光紫外線における、波長365nmの光と波長313nmの光との合計量に占める波長313nmの光の量が、10%以下であることを特徴とする単層位相差材の製造方法。 (I) The step of applying the polymer composition on the substrate and drying to form a coating film, and (II) the step of irradiating the coating film with polarized ultraviolet rays are included.
The polymer composition comprises a polymer having a photoreactive moiety in the side chain that is photodimerized or photoisomerized with light having a wavelength of 365 nm.
A method for producing a single-layer retardation material, wherein the amount of light having a wavelength of 313 nm in the total amount of light having a wavelength of 365 nm and light having a wavelength of 313 nm in the polarized ultraviolet rays is 10% or less. - 前記波長365nmの光と波長313nmの光との合計量に占める波長313nmの光の量が、5%以下である請求項1記載の単層位相差材の製造方法。 The method for producing a single-layer retardation material according to claim 1, wherein the amount of light having a wavelength of 313 nm in the total amount of light having a wavelength of 365 nm and light having a wavelength of 313 nm is 5% or less.
- 前記偏光紫外線が、波長313nmの光を含まない請求項1または2記載の単層位相差材の製造方法。 The method for producing a single-layer retardation material according to claim 1 or 2, wherein the polarized ultraviolet rays do not contain light having a wavelength of 313 nm.
- (III)前記偏光紫外線を照射した塗膜を加熱する工程を含む請求項1~3のいずれか1項記載の単層位相差材の製造方法。 (III) The method for producing a single-layer retardation material according to any one of claims 1 to 3, which comprises a step of heating the coating film irradiated with the polarized ultraviolet rays.
- 前記偏光紫外線を照射する塗膜の膜厚が、0.5μm以上である請求項1~3のいずれか1項記載の単層位相差材の製造方法。 The method for producing a single-layer retardation material according to any one of claims 1 to 3, wherein the film thickness of the coating film irradiated with the polarized ultraviolet rays is 0.5 μm or more.
- 前記重合体が、下記式(a1)~(a3)で表されるいずれかの光反応性部位を有する側鎖を有する請求項1~5のいずれか1項記載の単層位相差材の製造方法。
Lは、炭素数1~12のアルキレン基を表し、このアルキレン基の水素原子はそれぞれ独立にハロゲン原子に置き換えられていてもよく、
Tは、単結合または炭素数1~12のアルキレン基を表し、このアルキレン基の水素原子はハロゲン原子に置き換えられていてもよく、
Tが単結合であるときはA2も単結合を表し、
Y1は、2価のベンゼン環を表し、
P1、Q1およびQ2は、それぞれ独立に、ベンゼン環および炭素数5~8の脂環式炭化水素環からなる群から選ばれる基を表し、
Rは、水素原子、シアノ基、ハロゲン原子、炭素数1~5のアルキル基、炭素数1~5のアルキルカルボニル基、炭素数3~7のシクロアルキル基、または炭素数1~5のアルキルオキシ基を表し、
Y1、P1、Q1およびQ2において、ベンゼン環に結合する水素原子は、それぞれ独立に、シアノ基、ハロゲン原子、炭素数1~5のアルキル基、炭素数1~5のアルキルカルボニル基、または炭素数1~5のアルキルオキシ基で置換されていてもよく、
X1およびX2は、それぞれ独立に、単結合、-O-、-COO-または-OCO-を表し、
n1およびn2は、それぞれ独立に0、1または2であり、
X1の数が2となるときは、X1同士は同一でも異なっていてもよく、X2の数が2となるときは、X2同士は同一でも異なっていてもよく、
Q1の数が2となるときは、Q1同士は同一でも異なっていてもよく、Q2の数が2となるときは、Q2同士は同一でも異なっていてもよく、破線は、結合手を表す。) The production of the single-layer retardation material according to any one of claims 1 to 5, wherein the polymer has a side chain having any of the photoreactive sites represented by the following formulas (a1) to (a3). Method.
L represents an alkylene group having 1 to 12 carbon atoms, and the hydrogen atom of this alkylene group may be independently replaced with a halogen atom.
T represents a single bond or an alkylene group having 1 to 12 carbon atoms, and the hydrogen atom of this alkylene group may be replaced with a halogen atom.
When T is a single bond, A 2 also represents a single bond,
Y 1 represents a divalent benzene ring and represents
P 1 , Q 1 and Q 2 each independently represent a group selected from the group consisting of a benzene ring and an alicyclic hydrocarbon ring having 5 to 8 carbon atoms.
R is a hydrogen atom, a cyano group, a halogen atom, an alkyl group having 1 to 5 carbon atoms, an alkylcarbonyl group having 1 to 5 carbon atoms, a cycloalkyl group having 3 to 7 carbon atoms, or an alkyloxy having 1 to 5 carbon atoms. Represents the group
In Y 1 , P 1 , Q 1 and Q 2 , the hydrogen atom bonded to the benzene ring is independently a cyano group, a halogen atom, an alkyl group having 1 to 5 carbon atoms, and an alkylcarbonyl group having 1 to 5 carbon atoms. , Or may be substituted with an alkyloxy group having 1 to 5 carbon atoms.
X 1 and X 2 independently represent a single bond, -O-, -COO- or -OCO-, respectively.
n1 and n2 are 0, 1 or 2, respectively, respectively.
When the number of X 1 is 2, X 1 may be the same or different, and when the number of X 2 is 2, X 2 may be the same or different.
When the number of Q 1 is 2, Q 1 may be the same or different, and when the number of Q 2 is 2, Q 2 may be the same or different. Represent a hand. ) - 前記重合体が、さらに光配向性を示さない側鎖を有する請求項6記載の単層位相差材の製造方法。 The method for producing a single-layer retardation material according to claim 6, wherein the polymer further has a side chain that does not exhibit photoalignment.
- 前記光配向性を示さない側鎖が下記式(1)~(12)からなる群から選ばれるいずれか1種の側鎖である請求項7記載の単層位相差材の製造方法。
- 前記光反応性部位を有する側鎖が、下記式(a1-1)~(a3-1)で表されるいずれかの基である請求項6~8のいずれか1項記載の単層位相差材の製造方法。
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