WO2023171757A1 - Polymer composition, single layer phase difference material, and liquid crystal alignment agent - Google Patents
Polymer composition, single layer phase difference material, and liquid crystal alignment agent Download PDFInfo
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- WO2023171757A1 WO2023171757A1 PCT/JP2023/009098 JP2023009098W WO2023171757A1 WO 2023171757 A1 WO2023171757 A1 WO 2023171757A1 JP 2023009098 W JP2023009098 W JP 2023009098W WO 2023171757 A1 WO2023171757 A1 WO 2023171757A1
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- carbon atoms
- atoms
- liquid crystal
- side chain
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- 229920000642 polymer Polymers 0.000 title claims abstract description 143
- 239000004973 liquid crystal related substance Substances 0.000 title claims abstract description 121
- 239000000203 mixture Substances 0.000 title claims abstract description 64
- 239000000463 material Substances 0.000 title claims abstract description 46
- 239000002356 single layer Substances 0.000 title claims abstract description 21
- 239000003795 chemical substances by application Substances 0.000 title claims abstract description 20
- 239000003960 organic solvent Substances 0.000 claims abstract description 14
- 125000004432 carbon atom Chemical group C* 0.000 claims description 131
- 239000000758 substrate Substances 0.000 claims description 83
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 43
- -1 biphenylyl group Chemical group 0.000 claims description 40
- 125000005843 halogen group Chemical group 0.000 claims description 39
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- 238000000576 coating method Methods 0.000 claims description 37
- 125000000217 alkyl group Chemical group 0.000 claims description 35
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- 238000000034 method Methods 0.000 claims description 28
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- 238000004519 manufacturing process Methods 0.000 claims description 16
- 238000010438 heat treatment Methods 0.000 claims description 15
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- 238000000354 decomposition reaction Methods 0.000 description 1
- ISAOCJYIOMOJEB-UHFFFAOYSA-N desyl alcohol Natural products C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- LSXWFXONGKSEMY-UHFFFAOYSA-N di-tert-butyl peroxide Chemical compound CC(C)(C)OOC(C)(C)C LSXWFXONGKSEMY-UHFFFAOYSA-N 0.000 description 1
- 239000012933 diacyl peroxide Substances 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 229960004132 diethyl ether Drugs 0.000 description 1
- UYAAVKFHBMJOJZ-UHFFFAOYSA-N diimidazo[1,3-b:1',3'-e]pyrazine-5,10-dione Chemical compound O=C1C2=CN=CN2C(=O)C2=CN=CN12 UYAAVKFHBMJOJZ-UHFFFAOYSA-N 0.000 description 1
- VFHVQBAGLAREND-UHFFFAOYSA-N diphenylphosphoryl-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)P(=O)(C=1C=CC=CC=1)C1=CC=CC=C1 VFHVQBAGLAREND-UHFFFAOYSA-N 0.000 description 1
- 238000012674 dispersion polymerization Methods 0.000 description 1
- JBAWUBIVHLJCMP-UHFFFAOYSA-N ditert-butyl 4-(4-tert-butylperoxycarbonylbenzoyl)benzene-1,2-dicarboperoxoate Chemical compound C1=CC(C(=O)OOC(C)(C)C)=CC=C1C(=O)C1=CC=C(C(=O)OOC(C)(C)C)C(C(=O)OOC(C)(C)C)=C1 JBAWUBIVHLJCMP-UHFFFAOYSA-N 0.000 description 1
- KGGOIDKBHYYNIC-UHFFFAOYSA-N ditert-butyl 4-[3,4-bis(tert-butylperoxycarbonyl)benzoyl]benzene-1,2-dicarboperoxoate Chemical compound C1=C(C(=O)OOC(C)(C)C)C(C(=O)OOC(C)(C)C)=CC=C1C(=O)C1=CC=C(C(=O)OOC(C)(C)C)C(C(=O)OOC(C)(C)C)=C1 KGGOIDKBHYYNIC-UHFFFAOYSA-N 0.000 description 1
- 238000005401 electroluminescence Methods 0.000 description 1
- 239000003480 eluent Substances 0.000 description 1
- 238000007720 emulsion polymerization reaction Methods 0.000 description 1
- NHOGGUYTANYCGQ-UHFFFAOYSA-N ethenoxybenzene Chemical compound C=COC1=CC=CC=C1 NHOGGUYTANYCGQ-UHFFFAOYSA-N 0.000 description 1
- AZDCYKCDXXPQIK-UHFFFAOYSA-N ethenoxymethylbenzene Chemical compound C=COCC1=CC=CC=C1 AZDCYKCDXXPQIK-UHFFFAOYSA-N 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
- LJUJMKJGPIXNAK-UHFFFAOYSA-N ethyl 4-[2-(2-chlorophenyl)-1-[2-(2-chlorophenyl)-4,5-bis(4-ethoxycarbonylphenyl)imidazol-2-yl]-5-(4-ethoxycarbonylphenyl)imidazol-4-yl]benzoate Chemical compound C1=CC(C(=O)OCC)=CC=C1C1=NC(N2C(=C(N=C2C=2C(=CC=CC=2)Cl)C=2C=CC(=CC=2)C(=O)OCC)C=2C=CC(=CC=2)C(=O)OCC)(C=2C(=CC=CC=2)Cl)N=C1C1=CC=C(C(=O)OCC)C=C1 LJUJMKJGPIXNAK-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- MVUXVDIFQSGECB-UHFFFAOYSA-N ethyl n-(3-triethoxysilylpropyl)carbamate Chemical compound CCOC(=O)NCCC[Si](OCC)(OCC)OCC MVUXVDIFQSGECB-UHFFFAOYSA-N 0.000 description 1
- MHBPZEDIFIPGSX-UHFFFAOYSA-N ethyl n-(3-trimethoxysilylpropyl)carbamate Chemical compound CCOC(=O)NCCC[Si](OC)(OC)OC MHBPZEDIFIPGSX-UHFFFAOYSA-N 0.000 description 1
- 125000004672 ethylcarbonyl group Chemical group [H]C([H])([H])C([H])([H])C(*)=O 0.000 description 1
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 238000013467 fragmentation Methods 0.000 description 1
- 238000006062 fragmentation reaction Methods 0.000 description 1
- 238000010528 free radical solution polymerization reaction Methods 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 235000019382 gum benzoic Nutrition 0.000 description 1
- GNOIPBMMFNIUFM-UHFFFAOYSA-N hexamethylphosphoric triamide Chemical compound CN(C)P(=O)(N(C)C)N(C)C GNOIPBMMFNIUFM-UHFFFAOYSA-N 0.000 description 1
- 229920006158 high molecular weight polymer Polymers 0.000 description 1
- 238000004128 high performance liquid chromatography Methods 0.000 description 1
- 150000002432 hydroperoxides Chemical class 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 229940119545 isobornyl methacrylate Drugs 0.000 description 1
- 238000006317 isomerization reaction Methods 0.000 description 1
- 125000003253 isopropoxy group Chemical group [H]C([H])([H])C([H])(O*)C([H])([H])[H] 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 125000005397 methacrylic acid ester group Chemical group 0.000 description 1
- 125000005395 methacrylic acid group Chemical group 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- NFLOWLFQCMNSRE-UHFFFAOYSA-N methyl 2-tert-butylperoxycarbonyl-4-(3-tert-butylperoxycarbonyl-4-methoxycarbonylbenzoyl)benzoate Chemical compound C1=C(C(=O)OOC(C)(C)C)C(C(=O)OC)=CC=C1C(=O)C1=CC=C(C(=O)OC)C(C(=O)OOC(C)(C)C)=C1 NFLOWLFQCMNSRE-UHFFFAOYSA-N 0.000 description 1
- ZGYTYDNWEZVHEL-UHFFFAOYSA-N methyl 2-tert-butylperoxycarbonyl-4-(4-tert-butylperoxycarbonyl-3-methoxycarbonylbenzoyl)benzoate Chemical compound C1=C(C(=O)OOC(C)(C)C)C(C(=O)OC)=CC=C1C(=O)C1=CC=C(C(=O)OOC(C)(C)C)C(C(=O)OC)=C1 ZGYTYDNWEZVHEL-UHFFFAOYSA-N 0.000 description 1
- ZNEQIOWZBXJFCG-UHFFFAOYSA-N methyl 2-tert-butylperoxycarbonyl-5-(4-tert-butylperoxycarbonyl-3-methoxycarbonylbenzoyl)benzoate Chemical compound C1=C(C(=O)OOC(C)(C)C)C(C(=O)OC)=CC(C(=O)C=2C=C(C(C(=O)OOC(C)(C)C)=CC=2)C(=O)OC)=C1 ZNEQIOWZBXJFCG-UHFFFAOYSA-N 0.000 description 1
- XJRBAMWJDBPFIM-UHFFFAOYSA-N methyl vinyl ether Chemical compound COC=C XJRBAMWJDBPFIM-UHFFFAOYSA-N 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- PHQOGHDTIVQXHL-UHFFFAOYSA-N n'-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN PHQOGHDTIVQXHL-UHFFFAOYSA-N 0.000 description 1
- VNRDAMBPFDPXSM-UHFFFAOYSA-N n'-[2-(3-triethoxysilylpropylamino)ethyl]ethane-1,2-diamine Chemical compound CCO[Si](OCC)(OCC)CCCNCCNCCN VNRDAMBPFDPXSM-UHFFFAOYSA-N 0.000 description 1
- NHBRUUFBSBSTHM-UHFFFAOYSA-N n'-[2-(3-trimethoxysilylpropylamino)ethyl]ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCNCCN NHBRUUFBSBSTHM-UHFFFAOYSA-N 0.000 description 1
- PEDQVKWUOILUIP-UHFFFAOYSA-N n'-[2-[2-(3-triethoxysilylpropylamino)ethylamino]ethyl]ethane-1,2-diamine Chemical compound CCO[Si](OCC)(OCC)CCCNCCNCCNCCN PEDQVKWUOILUIP-UHFFFAOYSA-N 0.000 description 1
- PYVZTWLMZLWKJC-UHFFFAOYSA-N n'-[2-[2-(3-trimethoxysilylpropylamino)ethylamino]ethyl]ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCNCCNCCN PYVZTWLMZLWKJC-UHFFFAOYSA-N 0.000 description 1
- MQWFLKHKWJMCEN-UHFFFAOYSA-N n'-[3-[dimethoxy(methyl)silyl]propyl]ethane-1,2-diamine Chemical compound CO[Si](C)(OC)CCCNCCN MQWFLKHKWJMCEN-UHFFFAOYSA-N 0.000 description 1
- LIBWSLLLJZULCP-UHFFFAOYSA-N n-(3-triethoxysilylpropyl)aniline Chemical compound CCO[Si](OCC)(OCC)CCCNC1=CC=CC=C1 LIBWSLLLJZULCP-UHFFFAOYSA-N 0.000 description 1
- KBJFYLLAMSZSOG-UHFFFAOYSA-N n-(3-trimethoxysilylpropyl)aniline Chemical compound CO[Si](OC)(OC)CCCNC1=CC=CC=C1 KBJFYLLAMSZSOG-UHFFFAOYSA-N 0.000 description 1
- SJPFBRJHYRBAGV-UHFFFAOYSA-N n-[[3-[[bis(oxiran-2-ylmethyl)amino]methyl]phenyl]methyl]-1-(oxiran-2-yl)-n-(oxiran-2-ylmethyl)methanamine Chemical compound C1OC1CN(CC=1C=C(CN(CC2OC2)CC2OC2)C=CC=1)CC1CO1 SJPFBRJHYRBAGV-UHFFFAOYSA-N 0.000 description 1
- ILRLVKWBBFWKTN-UHFFFAOYSA-N n-benzyl-3-triethoxysilylpropan-1-amine Chemical compound CCO[Si](OCC)(OCC)CCCNCC1=CC=CC=C1 ILRLVKWBBFWKTN-UHFFFAOYSA-N 0.000 description 1
- 125000006606 n-butoxy group Chemical group 0.000 description 1
- 125000004676 n-butylcarbonyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C(*)=O 0.000 description 1
- SEEYREPSKCQBBF-UHFFFAOYSA-N n-methylmaleimide Chemical compound CN1C(=O)C=CC1=O SEEYREPSKCQBBF-UHFFFAOYSA-N 0.000 description 1
- 125000003935 n-pentoxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- VBEGHXKAFSLLGE-UHFFFAOYSA-N n-phenylnitramide Chemical compound [O-][N+](=O)NC1=CC=CC=C1 VBEGHXKAFSLLGE-UHFFFAOYSA-N 0.000 description 1
- 125000003506 n-propoxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 1
- 125000006252 n-propylcarbonyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C(*)=O 0.000 description 1
- HVYCQBKSRWZZGX-UHFFFAOYSA-N naphthalen-1-yl 2-methylprop-2-enoate Chemical compound C1=CC=C2C(OC(=O)C(=C)C)=CC=CC2=C1 HVYCQBKSRWZZGX-UHFFFAOYSA-N 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- FZUGPQWGEGAKET-UHFFFAOYSA-N parbenate Chemical compound CCOC(=O)C1=CC=C(N(C)C)C=C1 FZUGPQWGEGAKET-UHFFFAOYSA-N 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- JRKICGRDRMAZLK-UHFFFAOYSA-L persulfate group Chemical group S(=O)(=O)([O-])OOS(=O)(=O)[O-] JRKICGRDRMAZLK-UHFFFAOYSA-L 0.000 description 1
- QIWKUEJZZCOPFV-UHFFFAOYSA-N phenyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=CC=C1 QIWKUEJZZCOPFV-UHFFFAOYSA-N 0.000 description 1
- FCJSHPDYVMKCHI-UHFFFAOYSA-N phenyl benzoate Chemical compound C=1C=CC=CC=1C(=O)OC1=CC=CC=C1 FCJSHPDYVMKCHI-UHFFFAOYSA-N 0.000 description 1
- WRAQQYDMVSCOTE-UHFFFAOYSA-N phenyl prop-2-enoate Chemical compound C=CC(=O)OC1=CC=CC=C1 WRAQQYDMVSCOTE-UHFFFAOYSA-N 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920005575 poly(amic acid) Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920000193 polymethacrylate Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- USHAGKDGDHPEEY-UHFFFAOYSA-L potassium persulfate Chemical compound [K+].[K+].[O-]S(=O)(=O)OOS([O-])(=O)=O USHAGKDGDHPEEY-UHFFFAOYSA-L 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000012673 precipitation polymerization Methods 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- BOQSSGDQNWEFSX-UHFFFAOYSA-N propan-2-yl 2-methylprop-2-enoate Chemical compound CC(C)OC(=O)C(C)=C BOQSSGDQNWEFSX-UHFFFAOYSA-N 0.000 description 1
- LYBIZMNPXTXVMV-UHFFFAOYSA-N propan-2-yl prop-2-enoate Chemical compound CC(C)OC(=O)C=C LYBIZMNPXTXVMV-UHFFFAOYSA-N 0.000 description 1
- 229940032159 propylene carbonate Drugs 0.000 description 1
- 229940116423 propylene glycol diacetate Drugs 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- CHQMHPLRPQMAMX-UHFFFAOYSA-L sodium persulfate Substances [Na+].[Na+].[O-]S(=O)(=O)OOS([O-])(=O)=O CHQMHPLRPQMAMX-UHFFFAOYSA-L 0.000 description 1
- 239000010421 standard material Substances 0.000 description 1
- 150000003440 styrenes Chemical class 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
- 238000010557 suspension polymerization reaction Methods 0.000 description 1
- MUTNCGKQJGXKEM-UHFFFAOYSA-N tamibarotene Chemical compound C=1C=C2C(C)(C)CCC(C)(C)C2=CC=1NC(=O)C1=CC=C(C(O)=O)C=C1 MUTNCGKQJGXKEM-UHFFFAOYSA-N 0.000 description 1
- DPPBKURCPGWRJU-UHFFFAOYSA-N tert-butyl 4-(4-tert-butylperoxycarbonylbenzoyl)benzenecarboperoxoate Chemical compound C1=CC(C(=O)OOC(C)(C)C)=CC=C1C(=O)C1=CC=C(C(=O)OOC(C)(C)C)C=C1 DPPBKURCPGWRJU-UHFFFAOYSA-N 0.000 description 1
- ISXSCDLOGDJUNJ-UHFFFAOYSA-N tert-butyl prop-2-enoate Chemical compound CC(C)(C)OC(=O)C=C ISXSCDLOGDJUNJ-UHFFFAOYSA-N 0.000 description 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical compound C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 description 1
- CBDKQYKMCICBOF-UHFFFAOYSA-N thiazoline Chemical compound C1CN=CS1 CBDKQYKMCICBOF-UHFFFAOYSA-N 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 125000003866 trichloromethyl group Chemical group ClC(Cl)(Cl)* 0.000 description 1
- 125000003258 trimethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
- 239000013585 weight reducing agent Substances 0.000 description 1
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L101/00—Compositions of unspecified macromolecular compounds
- C08L101/02—Compositions of unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
- C08L33/04—Homopolymers or copolymers of esters
- C08L33/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur, or oxygen atoms in addition to the carboxy oxygen
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
Definitions
- the present invention relates to a polymer composition, a single-layer retardation material, and a liquid crystal alignment agent.
- materials with optical properties suitable for uses such as display devices and recording materials, in particular optical compensation films such as polarizing plates and retardation plates for liquid crystal displays, optical alignment films for liquid crystal displays, organic electroluminescence (
- the present invention relates to a liquid crystalline polymer that can be suitably used in a circularly polarizing plate (EL), a composition containing the polymer, a single-layer retardation material and a liquid crystal alignment agent obtained from the composition.
- EL circularly polarizing plate
- the polymerizable liquid crystal compound used here generally has a polymerizable group and a liquid crystal structural site (a structural site having a spacer part and a mesogen part), and an acrylic group is widely used as this polymerizable group. ing.
- Such polymerizable liquid crystal compounds are generally made into polymers (films) by polymerizing them by irradiating them with radiation such as ultraviolet rays.
- radiation such as ultraviolet rays.
- a method of obtaining a polymer by supporting a specific polymerizable liquid crystal compound having an acrylic group on an alignment-treated support and irradiating the compound with radiation while maintaining the compound in a liquid crystal state Patent Document 1
- a method in which a photopolymerization initiator is added to a mixture of two types of polymerizable liquid crystal compounds having an acrylic group or a composition in which a chiral liquid crystal is mixed with this mixture, and a polymer is obtained by irradiating ultraviolet rays
- Patent Document 2 are known.
- the present invention was made in view of the above-mentioned problems, and provides a polymer composition that enables the production of a single-layer retardation layer having a high retardation value through thin film firing at a low temperature, and a monolayer retardation layer obtained from the composition.
- the purpose of the present invention is to provide a retardation material and a liquid crystal aligning agent.
- the present invention provides the following polymer composition and single-layer retardation material.
- each W 2 may be the same or different from each other.
- R' represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms.
- Q is an alkylene group having 1 to 10 carbon atoms. Some or all of the hydrogen atoms of the alkylene group may be substituted with halogen atoms.
- Q 1 is a single bond, a phenylene group, a naphthylene group, or a divalent alicyclic hydrocarbon group having 5 to 8 carbon atoms, and some or all of the hydrogen atoms of the phenylene group and naphthylene group are a cyano group, It may be substituted with a halogen atom, an alkyl group having 1 to 5 carbon atoms, an alkylcarbonyl group having 2 to 6 carbon atoms, or an alkoxy group having 1 to 5 carbon atoms. When the number of Q 1 is 2 or more, each Q 1 may be the same or different from each other.
- the hydrogen atom on the benzene ring is an alkyl group having 1 to 6 carbon atoms, a haloalkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a haloalkoxy group having 1 to 6 carbon atoms, a cyano group, and a nitro group. It may be substituted with a substituent selected from.
- the benzene ring may be a naphthalene ring
- the hydrogen atom on the naphthalene ring is an alkyl group having 1 to 6 carbon atoms, a haloalkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, or an alkyl group having 1 to 6 carbon atoms.
- 6 may be substituted with a substituent selected from a haloalkoxy group, a cyano group, and a nitro group.
- n 1 is 0, 1, 2 or 3.
- the dashed lines are bonds.
- T 1 is a single bond or an alkylene group having 1 to 12 carbon atoms, and some or all of the hydrogen atoms of the alkylene group may be substituted with halogen atoms.
- T 1 is a single bond
- a 2 is also a single bond.
- Y 1 and Y 2 are a phenylene group or a naphthylene group, and some or all of the hydrogen atoms of the phenylene group and naphthylene group are cyano groups, halogen atoms, alkyl groups having 1 to 5 carbon atoms, or 2 to 5 carbon atoms.
- P 1 , Q 1 and Q 2 are each independently a single bond, a phenylene group, or a divalent alicyclic hydrocarbon group having 5 to 8 carbon atoms, and some or all of the hydrogen atoms of the phenylene group are , a cyano group, a halogen atom, an alkyl group having 1 to 5 carbon atoms, an alkylcarbonyl group having 2 to 6 carbon atoms, or an alkoxy group having 1 to 5 carbon atoms.
- each Q 1 may be the same or different from each other, and when the number of Q 2 is 2 or more, each Q 2 may be the same or different from each other.
- R is a hydrogen atom, a cyano group, a halogen atom, a carboxy group, an alkyl group having 1 to 5 carbon atoms, an alkylcarbonyl group having 2 to 6 carbon atoms, a cycloalkyl group having 3 to 7 carbon atoms, or a cycloalkyl group having 1 to 5 carbon atoms. It is an alkoxy group.
- each X 1 may be the same or different from each other, and when the number of X 2 is 2 or more, each X 2 may be the same or different from each other.
- G 1 and G 2 are each independently N or CH.
- the broken lines are bonds.
- each A 4 may be the same or different from each other.
- R 1 is -NO 2 , -CN, halogen atom, phenyl group, naphthyl group, biphenylyl group, furanyl group, monovalent nitrogen-containing heterocyclic group, monovalent alicyclic hydrocarbon group having 5 to 8 carbon atoms, carbon It is an alkyl group having 1 to 12 carbon atoms or an alkoxy group having 1 to 12 carbon atoms.
- R 2 is a phenyl group, a naphthyl group, a biphenylyl group, a furanyl group, a monovalent nitrogen-containing heterocyclic group, or a monovalent alicyclic hydrocarbon group having 5 to 8 carbon atoms, and some of the hydrogen atoms of these groups Alternatively, all may be substituted with -NO 2 , -CN, a halogen atom, an alkyl group having 1 to 5 carbon atoms, or an alkoxy group having 1 to 5 carbon atoms.
- R 3 is a hydrogen atom, -NO 2 , -CN, a halogen atom, a phenyl group, a naphthyl group, a biphenylyl group, a furanyl group, a monovalent nitrogen-containing heterocyclic group, or a monovalent alicyclic hydrocarbon having 5 to 8 carbon atoms. group, an alkyl group having 1 to 12 carbon atoms, or an alkoxy group having 1 to 12 carbon atoms.
- k1 to k5 are each independently an integer of 0 to 2, but the total of k1 to k5 is 2 or more.
- k6 and k7 are each independently an integer of 0 to 2, but the sum of k6 and k7 is 1 or more.
- m1, m2 and m3 are each independently an integer of 1 to 3.
- n is 0 or 1.
- Some or all of the hydrogen atoms on the benzene ring or naphthalene ring are a cyano group, a halogen atom, an alkyl group having 1 to 5 carbon atoms, an alkylcarbonyl group having 2 to 6 carbon atoms, or an alkoxy group having 1 to 5 carbon atoms. May be replaced.
- the broken lines are bonds.
- ⁇ 5> [I] A step of applying any of the compositions of ⁇ 1> to ⁇ 4> above on a substrate to form a coating film; [II] A step of irradiating the coating film obtained in [I] with polarized ultraviolet rays; and [III] A step of heating the coating film obtained in [II] to obtain a retardation material. Method for manufacturing retardation material.
- ⁇ 6> A single-layer retardation material obtained from the polymer composition according to any one of ⁇ 1> to ⁇ 4> above.
- ⁇ 7> A liquid crystal aligning agent obtained from the polymer composition according to any one of ⁇ 1> to ⁇ 4> above.
- the present invention it is possible to provide a single-layer retardation material and a liquid crystal aligning agent that are thin and have a high retardation value even in a low-temperature firing process.
- the polymer composition of the present invention has a photosensitive side chain type polymer (hereinafter also simply referred to as a side chain type polymer) capable of exhibiting liquid crystallinity, and can be obtained using the polymer composition.
- the coating film is a film containing a photosensitive side-chain type polymer capable of exhibiting liquid crystallinity. This coating film is subjected to orientation treatment by polarized light irradiation without performing rubbing treatment. After irradiation with polarized light, the side chain type polymer film is heated to become a film imparted with optical anisotropy (hereinafter also referred to as a single-layer retardation material).
- the slight anisotropy developed by polarized light irradiation becomes a driving force, and the liquid crystal side chain polymer itself is efficiently reoriented by self-organization.
- a highly efficient alignment process can be realized as a single-layer coated horizontally oriented film, and a single-layer coated horizontally oriented film imparted with high optical anisotropy can be obtained.
- the side chain type polymer serving as the component (A) contains the side chain (a2) represented by the above formula (b) together with the side chain (a1) having a photoalignable site. ), the aggregation of the polymer is suppressed.
- the retardation material obtained from the polymer composition of the present invention exhibits high retardation even in the form of a thin film under low-temperature firing conditions of 100° C. to 120° C. Note that these include the inventor's opinion regarding the mechanism of the present invention, and do not constrain the present invention. Embodiments of the present invention will be described in detail below.
- the polymer composition of the present invention comprises (A) a photosensitive side chain type polymer that exhibits liquid crystallinity in a predetermined temperature range, comprising a side chain (a1) having a photoreactive site and the above formula (b ); and (B) an organic solvent.
- Component (A) is a photosensitive side chain type polymer that exhibits liquid crystallinity in a predetermined temperature range, and has a side chain (a1) having a photoreactive site and a site represented by the above formula (b). It is a side chain type polymer having a side chain (a2).
- the side chain type polymer preferably reacts with light in a wavelength range of 250 nm to 400 nm and exhibits liquid crystallinity in a temperature range of 80° C. to 300° C.
- the side chain type polymer preferably has a photosensitive side chain that reacts with light in the wavelength range of 250 nm to 400 nm.
- a side chain (a3) that exhibits only liquid crystallinity, other than the structure represented by the above formula (b), may be used. It is preferable to have.
- the side chain type polymer has a photosensitive side chain bonded to the main chain, and can cause a crosslinking reaction or an isomerization reaction in response to light.
- the structure of the photosensitive side chain type polymer capable of exhibiting liquid crystallinity is not particularly limited as long as it satisfies such characteristics, but it is preferable that the side chain structure has a rigid mesogenic component. In this case, stable optical anisotropy can be obtained when the side chain type polymer is used as a single layer retardation material.
- More specific examples of structures of photosensitive side-chain polymers that can exhibit liquid crystallinity include (meth)acrylate, itaconate, fumarate, maleate, ⁇ -methylene- ⁇ -butyrolactone, styrene, vinyl, maleimide, It is preferable that the structure has a main chain composed of at least one member selected from the group consisting of a radically polymerizable group such as norbornene and siloxane, and a side chain (a1) having a photoreactive site.
- the side chain (a1) is preferably one represented by any of the following formulas (a1-1) to (a1-6).
- the number of benzene rings that one side chain (a1) has is preferably three or less.
- n1 and n2 are each independently 0, 1, 2 or 3.
- T 1 is a single bond or an alkylene group having 1 to 12 carbon atoms, and some or all of the hydrogen atoms of the alkylene group may be substituted with halogen atoms.
- a 2 is also a single bond.
- Y 1 and Y 2 are a phenylene group or a naphthylene group, and some or all of the hydrogen atoms of the phenylene group and naphthylene group are cyano groups, halogen atoms, alkyl groups having 1 to 5 carbon atoms, or 2 to 5 carbon atoms. It may be substituted with an alkylcarbonyl group having 6 carbon atoms or an alkoxy group having 1 to 5 carbon atoms.
- P 1 , Q 1 and Q 2 are each independently a single bond, a phenylene group, or a divalent alicyclic hydrocarbon group having 5 to 8 carbon atoms, and some or all of the hydrogen atoms of the phenylene group are , a cyano group, a halogen atom, an alkyl group having 1 to 5 carbon atoms, an alkylcarbonyl group having 2 to 6 carbon atoms, or an alkoxy group having 1 to 5 carbon atoms.
- each Q 1 may be the same or different from each other
- each Q 2 may be the same or different from each other.
- R is a hydrogen atom, a cyano group, a halogen atom, a carboxy group, an alkyl group having 1 to 5 carbon atoms, an alkylcarbonyl group having 2 to 6 carbon atoms, a cycloalkyl group having 3 to 7 carbon atoms, or a cycloalkyl group having 1 to 5 carbon atoms. It is an alkoxy group.
- each X 1 may be the same or different from each other, and when the number of X 2 is 2 or more, each X 2 may be the same or different from each other.
- G 1 and G 2 are each independently N or CH.
- the broken lines are bonds.
- the alkylene group having 1 to 12 carbon atoms may be linear, branched, or cyclic, and specific examples include a methylene group, an ethylene group, a propane-1,3-diyl group, and a butane-1,4-diyl group.
- -diyl group pentane-1,5-diyl group, hexane-1,6-diyl group, heptane-1,7-diyl group, octane-1,8-diyl group, nonane-1,9-diyl group, decane -1,10-diyl group and the like.
- halogen atom examples include a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, and the like.
- the alkyl group having 1 to 5 carbon atoms may be linear or branched, and specific examples thereof include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, and tert-butyl group. group, n-pentyl group, etc.
- alkylcarbonyl group having 2 to 6 carbon atoms examples include methylcarbonyl (acetyl) group, ethylcarbonyl group, n-propylcarbonyl group, n-butylcarbonyl group, n-pentylcarbonyl group, and the like.
- alkoxy group having 1 to 5 carbon atoms examples include methoxy group, ethoxy group, n-propoxy group, isopropoxy group, n-butoxy group, n-pentyloxy group, and the like.
- divalent alicyclic hydrocarbon group having 5 to 8 carbon atoms examples include a cyclopentanediyl group, a cyclohexanediyl group, a cycloheptanediyl group, and a cyclooctanediyl group.
- cycloalkyl group having 3 to 7 carbon atoms include a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, and the like.
- the side chain (a1) As the side chain (a1), the following formulas (a1-1-1), (a1-1-2), (a1-2-1), (a1-3-1), (a1-4-1), Those represented by (a1-5-1) or (a1-6-1) are more preferred.
- L, A 1 , A 2 , Y 1 , Y 2 , Q 1 , T 1 , R, X 1 , Cou, E, G 1 , G 2 , n1 and the broken line are the same as above.
- the side chain represented by the formula (a1-1-1) is preferably a side chain represented by the following formula (a1-1-1-1), and a side chain represented by the formula (a1-1-2) is preferable.
- side chains represented by formulas (a1-1-2-1), (a1-1-2-2) and (a1-1-2-3) are preferred.
- Me means a methyl group
- L, R and the broken line are the same as above.
- the side chain represented by the formula (a1-2-1) is preferably a side chain represented by the following formula (a1-2-1-1). (In the formula, L, A 2 , Q 1 , T 1 , R and the broken line are the same as above.)
- the side chain represented by the formula (a1-3-1) is represented by the following formula (a1-3-1-1), (a1-3-1-2) or (a1-3-1-3).
- the side chain is (In the formula, L, Cou and the broken line are the same as above.)
- the side chain represented by formula (a1-4-1) is the following formula (a1-4-1-1), (a1-4-1-2), (a1-4-1-3) or ( The side chain represented by a1-4-1-4) is preferred. (In the formula, L, R and the broken line are the same as above.)
- the side chain represented by the formula (a1-5-1) is preferably a side chain represented by the following formula (a1-5-1-1) or (a1-5-1-2). (In the formula, L, R and the broken line are the same as above.)
- the side chain represented by the formula (a1-6-1) is represented by the following formula (a1-6-1-1), (a1-6-1-2) or (a1-6-1-3).
- the side chain is (In the formula, L, R and the broken line are the same as above.)
- the side chain type polymer (A) contains a side chain (a2) having a photoreactive site represented by the above formula (b).
- the side chain type polymer (A) exhibits liquid crystallinity in the temperature range of 80 to 300°C, it is preferable to use one of the above formulas (a3-1) to (a3-11). It is preferable to have a side chain (a3) that exhibits only liquid crystallinity.
- "expressing only liquid crystallinity” here means that the polymer having only the side chain (a3) is used during the production process of the retardation material of the present invention (i.e., steps [I] to [III] described later). This means that it does not exhibit photosensitivity and only exhibits liquid crystallinity.
- the photosensitive side chain type polymer capable of exhibiting the above-mentioned liquid crystallinity includes a monomer (MA) containing a side chain (a1) having a photoreactive site, a monomer (MA) having a site represented by formula (b) ( MB) and a monomer (MC) having a site that exhibits liquid crystallinity.
- Monomers containing a side chain (a1) having a photoreactive site include the following formulas (M1), (M2), (M3), (M4), (M5) or ( Examples include compounds represented by M6).
- PG is a polymerizable group, A 1 , A 2 , D 1 , L, T 1 , Y 1 , Y 2 , P 1 , Q 1 , Q 2 , R, Cou, E, X 1 . _ _ may be substituted with a substituent selected from an alkylcarbonyl group and an alkoxy group having 1 to 5 carbon atoms.
- PG is a polymerizable group, and groups represented by any of the following formulas (PG1) to (PG7) are preferable.
- an acrylic group or a methacrylic group represented by formula (PG1) is preferred from the viewpoint of easy control of the polymerization reaction and stability of the polymer.
- R A and R B are each independently a hydrogen atom or a methyl group, and the broken line is a bond with L.
- the compound represented by formula (M1) is preferably one represented by the following formula (M1-1), (M1-2), (M1-3) or (M1-4).
- Me means a methyl group
- PG, L, Y 1 , P 1' and R are the same as above.
- the compound represented by formula (M2) is preferably one represented by formula (M2-1) below. (In the formula, PG, A 2 , L, T 1 , Y 1 , P 1 , Q 1 and R are the same as above.)
- the compound represented by formula (M3) is preferably one represented by formula (M3-1) below. (In the formula, PG, A 1 , L, X 1 , Q 1 , Cou and n1 are the same as above.)
- the compound represented by formula (M4) is preferably one represented by formula (M4-1) below. (In the formula, PG, A 1 , L, X 1 , Y 1 , Y 2 , Q 1 , E, R and n1 are the same as above.)
- the compound represented by formula (M5) is preferably one represented by formula (M5-1) below. (In the formula, PG, A 1 , L, X 1 , Y 1 , Y 2 , Q 1 , R and n1 are the same as above.)
- the compound represented by formula (M6) is preferably one represented by formula (M6-1) below. (In the formula, PG, A 1 , L, X 1 , Y 1 , Y 2 , Q 1 , G 1 , G 2 , R and n1 are the same as above.)
- the compound represented by formula (M1-1) is preferably one represented by the following formula (M1-1-1), and the compound represented by formula (M1-2) is preferably one represented by the following formula (M1-1-1). 2-1) is preferable, and as a compound represented by formula (M1-3), a compound represented by the following formula (M1-3-1) is preferable, and a compound represented by formula (M1-4) is preferable. As the compound represented, a compound represented by the following formula (M1-4-1) is preferable. (In the formula, Me means a methyl group, and PG, L and R are the same as above.)
- the compound represented by formula (M2-1) is preferably one represented by formula (M2-2) below. (In the formula, PG, A 2 , L, T 1 , Q 1 and R are the same as above.)
- the compound represented by the formula (M3-1) is preferably one represented by the following formula (M3-2), (M3-3) or (M3-4). (In the formula, PG, L and Cou are the same as above.)
- the compound represented by the formula (M4-1) is preferably one represented by the following formula (M4-2), (M4-3), (M4-4) or (M4-5). (In the formula, PG, L and R are the same as above.)
- the compound represented by formula (M5-1) is preferably one represented by formula (M5-2) or (M5-3) below. (In the formula, PG, L and R are the same as above.)
- the compound represented by the formula (M6-1) is preferably one represented by the following formula (M6-2), (M6-3), or (M6-4). (In the formula, PG, L and R are the same as above.)
- Examples of the compound represented by formula (M1) include those represented by any of the following formulas (A-1-1-1) to (A-1-1-12).
- PG is a polymerizable group
- s1 represents the number of methylene groups and is an integer from 2 to 9.
- R 12 is -H, -CH 3 , - CN or -F.
- examples of the compound represented by formula (M1) include those represented by any of the following formulas (A-1-2-1) to (A-1-2-6).
- PG is a polymerizable group
- s1 is the same as above.
- Me means a methyl group.
- Specific examples of the compound represented by formula (M1) include 4-(6-methacryloxyhexyl-1-oxy)cinnamic acid, 4-(6-acryloxyhexyl-1-oxy)cinnamic acid, 4-(6-methacryloxyhexyl-1-oxy)cinnamic acid, -(3-methacryloxypropyl-1-oxy)cinnamic acid, 4-[4-(6-methacryloxyhexyl-1-oxy)benzoyloxy]cinnamic acid, and the like.
- Examples of the compound represented by formula (M2) include those represented by any of the following formulas (A-2-1) to (A-2-9).
- PG is a polymerizable group
- s1 and s2 represent the number of methylene groups, and are each independently an integer of 2 to 9. be.
- Examples of the compound represented by formula (M3) include those represented by any of the following formulas (A-3-1) to (A-3-5).
- PG is a polymerizable group
- s1 is the same as above.
- Examples of the compound represented by formula (M4) include those represented by any of the following formulas (A-4-1) to (A-4-4).
- PG is a polymerizable group
- s1 is the same as above.
- Examples of the compound represented by formula (M5) include those represented by any of the following formulas (A-5-1) to (A-5-3).
- PG is a polymerizable group
- s1 is the same as above.
- Examples of the compound represented by formula (M6) include those represented by any of the following formulas (A-6-1) to (A-6-3).
- PG is a polymerizable group
- s1 is the same as above.
- Examples of the monomer having a moiety represented by formula (b) include a compound represented by the following formula (bm1-1).
- formula (bm1-1) the definitions of each substituent are the same as those in formula (b) above, and PG is the same as the definition of PG above.
- Preferred examples of the monomer MB having a moiety represented by formula (b) include the following formulas MB-1 to MB-10. (In the formula, s1 represents the number of methylene groups and is an integer from 2 to 9.)
- the mesogenic group may be a group that forms a mesogenic structure by itself, such as biphenyl or phenylbenzoate, or a group that forms a mesogenic structure by hydrogen bonding between side chains, such as benzoic acid.
- the mesogenic group possessed by the side chain preferably has a structure represented by any of the following formulas (b1) to (b11).
- the monomer MC include hydrocarbons, radically polymerizable groups such as (meth)acrylate, itaconate, fumarate, maleate, ⁇ -methylene- ⁇ -butyrolactone, styrene, vinyl, maleimide, norbornene, and siloxane. It is preferable that the structure has a polymerizable group derived from at least one of the above formulas (b1) to (b11). In particular, the monomer MC preferably has a polymerizable group derived from (meth)acrylate.
- Preferred examples of monomer MC include those represented by the following formulas (MC-1) to (MC-10).
- PG is a polymerizable group
- p represents the number of methylene groups, and is an integer from 2 to 9.
- monomers include unsaturated carboxylic acids, acrylic ester compounds, methacrylic ester compounds, maleimide compounds, acrylonitrile, maleic anhydride, styrene compounds, and vinyl compounds.
- unsaturated carboxylic acids include acrylic acid, methacrylic acid, itaconic acid, maleic acid, and fumaric acid.
- acrylic ester compounds include methyl acrylate, ethyl acrylate, isopropyl acrylate, benzyl acrylate, naphthyl acrylate, anthryl acrylate, anthryl methyl acrylate, phenyl acrylate, 2,2,2-trifluoroethyl acrylate, and tert-butyl acrylate.
- methacrylic acid ester compounds include methyl methacrylate, ethyl methacrylate, isopropyl methacrylate, benzyl methacrylate, naphthyl methacrylate, anthryl methacrylate, anthryl methyl methacrylate, phenyl methacrylate, 2,2,2-trifluoroethyl methacrylate, and tert-butyl.
- Examples of the vinyl compound include vinyl ether, methyl vinyl ether, benzyl vinyl ether, 2-hydroxyethyl vinyl ether, phenyl vinyl ether, and propyl vinyl ether.
- Examples of the styrene compound include styrene, methylstyrene, chlorostyrene, and bromostyrene.
- Examples of maleimide compounds include maleimide, N-methylmaleimide, N-phenylmaleimide, and N-cyclohexylmaleimide.
- the content of the side chain (a1) in the side chain type polymer of the present invention is preferably 5 to 99.9 mol%, more preferably 5 to 50 mol%, from the viewpoint of photoreactivity, and from the viewpoint of photostability. 5 to 20 mol% is even more preferable.
- the content of the side chain (a2) in the side chain type polymer of the present invention is preferably 5 to 95 mol%, more preferably 5 to 80 mol%, and still more preferably 5 to 50 mol%, from the viewpoint of retardation value. preferable.
- the side chain type polymer used in the present invention preferably has a side chain (a3) that exhibits only liquid crystallinity. It may also contain other side chains.
- the content of side chains (a3) and other side chains is the remaining portion when the total content of side chains (a1) and side chains (a2) is less than 100 mol%.
- the method for producing the polymer that is component (A) is not particularly limited, and any industrially-used general-purpose method can be used. Specifically, it can be produced by cationic polymerization, radical polymerization, or anionic polymerization using the above-mentioned monomer MA, monomer MB, optionally monomer MC, and optionally the vinyl group of other monomers. Among these, radical polymerization is particularly preferred from the viewpoint of ease of reaction control.
- radical polymerization initiator for radical polymerization
- known compounds such as radical polymerization initiators and reversible addition-fragmentation chain transfer (RAFT) polymerization reagents can be used.
- RAFT reversible addition-fragmentation chain transfer
- a radical thermal polymerization initiator is a compound that generates radicals when heated above the decomposition temperature.
- radical thermal polymerization initiators include, for example, ketone peroxides (methyl ethyl ketone peroxide, cyclohexanone peroxide, etc.), diacyl peroxides (acetyl peroxide, benzoyl peroxide, etc.), hydroperoxides (peroxide Hydrogen, tert-butyl hydroperoxide, cumene hydroperoxide, etc.), dialkyl peroxides (di-tert-butyl peroxide, dicumyl peroxide, dilauroyl peroxide, etc.), peroxyketals (dibutyl peroxy, cyclohexane, etc.) etc.), alkyl peresters (peroxyneodecanoic acid tert-butyl ester, peroxypivalic acid tert-butyl ester, peroxy 2-eth
- the radical photopolymerization initiator is not particularly limited as long as it is a compound that initiates radical polymerization by light irradiation.
- Such radical photopolymerization initiators include benzophenone, Michler's ketone, 4,4'-bis(diethylamino)benzophenone, xanthone, thioxanthone, isopropylxanthone, 2,4-diethylthioxanthone, 2-ethylanthraquinone, acetophenone, 2-hydroxy -2-Methylpropiophenone, 2-hydroxy-2-methyl-4'-isopropylpropiophenone, 1-hydroxycyclohexylphenyl ketone, isopropylbenzoin ether, isobutylbenzoin ether, 2,2-diethoxyacetophenone, 2,2 -dimethoxy-2-phenylacetophenone, camphorquinone, benzanthrone, 2-methyl-1-[4-(
- the radical polymerization method is not particularly limited, and emulsion polymerization, suspension polymerization, dispersion polymerization, precipitation polymerization, bulk polymerization, solution polymerization, etc. can be used.
- the organic solvent used in the polymerization reaction is not particularly limited as long as it dissolves the produced polymer. Specific examples are listed below.
- organic solvents may be used alone or in combination. Furthermore, even a solvent that does not dissolve the produced polymer may be mixed with the above-mentioned organic solvent and used as long as the produced polymer does not precipitate. Further, in radical polymerization, oxygen in an organic solvent becomes a cause of inhibiting the polymerization reaction, so it is preferable to use an organic solvent that has been degassed to the extent possible.
- the polymerization temperature during radical polymerization can be any temperature in the range of 30 to 150°C, but is preferably in the range of 50 to 100°C.
- the reaction can be carried out at any concentration, but if the concentration is too low, it will be difficult to obtain a high molecular weight polymer, and if the concentration is too high, the viscosity of the reaction solution will become too high, making it difficult to stir uniformly. Therefore, the monomer concentration is preferably 1 to 50% by weight, more preferably 5 to 30% by weight.
- the initial stage of the reaction can be carried out at a high concentration, and then an organic solvent can be added.
- the molecular weight of the obtained polymer will be small, and if it is small, the molecular weight of the obtained polymer will be large.
- the amount is preferably 0.1 to 15 mol % based on the monomer to be polymerized.
- various monomer components, solvents, initiators, etc. can be added during polymerization.
- the reaction solution may be poured into a poor solvent to precipitate the polymers.
- the poor solvent used for precipitation include methanol, acetone, hexane, heptane, butyl cellosolve, heptane, methyl ethyl ketone, methyl isobutyl ketone, ethanol, toluene, benzene, diethyl ether, methyl ethyl ether, water, and the like.
- the polymer precipitated in a poor solvent can be collected by filtration and then dried under normal pressure or reduced pressure, at room temperature or by heating.
- the amount of impurities in the polymer can be reduced.
- the poor solvent in this case include alcohols, ketones, hydrocarbons, etc. It is preferable to use three or more types of poor solvents selected from these, since the efficiency of purification will further increase.
- the molecular weight of the side chain type polymer (A) of the present invention is determined by the GPC (Gel Permeation Chromatography) method, taking into consideration the strength of the resulting coating film, workability during coating film formation, and uniformity of the coating film.
- the weight average molecular weight is preferably 2,000 to 2,000,000, more preferably 5,000 to 150,000.
- the weight average molecular weight is preferably 2,000 to 1,000,000, more preferably 5,000 to 200,000.
- the organic solvent used in the polymer composition used in the present invention is not particularly limited as long as it can dissolve the resin component. Specific examples are listed below. N,N-dimethylformamide, N,N-dimethylacetamide, N-methyl-2-pyrrolidone, N-methyl- ⁇ -caprolactam, 2-pyrrolidone, N-ethyl-2-pyrrolidone, N-vinyl-2-pyrrolidone, Dimethylsulfoxide, tetramethylurea, pyridine, dimethylsulfone, hexamethylphosphoramide, ⁇ -butyrolactone, 3-methoxy-N,N-dimethylpropanamide, 3-ethoxy-N,N-dimethylpropanamide, 3-butoxy- N,N-dimethylpropanamide, 1,3-dimethyl-imidazolidinone, cyclohexanone, cyclopentanone, ethylene carbonate, propylene carbonate, diglyme,
- the polymer composition used in the present invention may contain components other than the above-mentioned components (A) and (B).
- examples include solvents and compounds that improve film thickness uniformity and surface smoothness when the polymer composition is applied, and compounds that improve the adhesion between the retardation material and the substrate. , but not limited to.
- solvent it is preferably 1 to 60% by mass of the total solvent, more preferably 1% by mass, so as not to significantly reduce the solubility of the entire solvent contained in the polymer composition. ⁇ 40% by mass.
- Examples of compounds that improve the uniformity of film thickness and surface smoothness include fluorosurfactants, silicone surfactants, and nonionic surfactants. More specifically, for example, FTOP (registered trademark) 301, EF303, EF352 (manufactured by Tochem Products), Megafac (registered trademark) F171, F173, F560, F563, R-30, R-40, R -41 (manufactured by DIC), Florado FC430, FC431 (manufactured by 3M Japan), Asahi Guard (registered trademark) AG710 (manufactured by AGC), Surflon (registered trademark) S-382, SC101, SC102, SC103, SC104, SC105 , SC106 (manufactured by AGC Seimi Chemical Co., Ltd.), and the like.
- the proportion of these surfactants used is preferably 0.01 parts by mass to 2 parts by mass, more preferably 0.01 parts by mass to 1 part by mass, based on
- compounds that improve the adhesion between the retardation material and the substrate include the following functional silane-containing compounds.
- the following additives such as phenoplast-based and epoxy group-containing compounds are used to prevent deterioration of characteristics due to backlight when forming a polarizing plate.
- the following additives such as phenoplast-based and epoxy group-containing compounds are used to prevent deterioration of characteristics due to backlight when forming a polarizing plate.
- Specific epoxy group-containing compounds include ethylene glycol diglycidyl ether, polyethylene glycol diglycidyl ether, propylene glycol diglycidyl ether, tripropylene glycol diglycidyl ether, polypropylene glycol diglycidyl ether, neopentyl glycol diglycidyl ether, 1, 6-hexanediol diglycidyl ether, glycerin diglycidyl ether, 2,2-dibromoneopentyl glycol diglycidyl ether, 1,3,5,6-tetraglycidyl-2,4-hexanediol, N,N,N', N'-tetraglycidyl-m-xylylenediamine, 1,3-bis(N,N-diglycidylaminomethyl)cyclohexane, N,N,N',N'-tetraglycidyl-4,4'-diaminodiphenylmethane,
- the amount used is preferably 0.1 parts by mass to 30 parts by mass based on 100 parts by mass of the resin component contained in the polymer composition. , more preferably 1 part by mass to 20 parts by mass. If the amount used is less than 0.1 part by mass, no effect of improving adhesion can be expected, and if it is more than 30 parts by mass, the alignment of the liquid crystal may deteriorate.
- a photosensitizer can also be used as an additive. Colorless sensitizers and triplet sensitizers are preferred. Photosensitizers include aromatic nitro compounds, coumarins (7-diethylamino-4-methylcoumarin, 7-hydroxy 4-methylcoumarin), ketocoumarins, carbonylbiscoumarins, aromatic 2-hydroxyketones, and amino-substituted , aromatic 2-hydroxyketone (2-hydroxybenzophenone, mono- or di-p-(dimethylamino)-2-hydroxybenzophenone), acetophenone, anthraquinone, xanthone, thioxanthone, benzanthrone, thiazoline (2-benzoylmethylene-3 -Methyl- ⁇ -naphthothiazoline, 2-( ⁇ -naphthoylmethylene)-3-methylbenzothiazoline, 2-( ⁇ -naphthoylmethylene)-3-methylbenzothiazoline, 2-( ⁇ -n
- aromatic 2-hydroxyketones (benzophenone), coumarins, ketocoumarins, carbonylbiscoumarins, acetophenones, anthraquinones, xanthone, thioxanthone, and acetophenone ketal.
- the polymer composition may contain dielectrics, conductive substances, Furthermore, a crosslinkable compound may be added for the purpose of increasing the hardness and density of the film when used as a retardation material.
- the polymer composition used in the present invention is preferably prepared as a coating liquid so as to be suitable for forming a retardation film. That is, the polymer composition used in the present invention includes the above-mentioned component (A), the above-mentioned solvent or compound that improves the film thickness uniformity and surface smoothness, and the compound that improves the adhesion between the liquid crystal alignment film and the substrate.
- the compound is prepared as a solution in which the compound is dissolved in an organic solvent.
- the content of component (A) is preferably 1 to 30% by weight, more preferably 3 to 25% by weight, particularly preferably 3 to 20% by weight.
- other polymers may be mixed in addition to component (A) within a range that does not impair liquid crystal expression ability and photosensitivity.
- the content of other polymers in the resin component is 0.5 to 80% by mass, preferably 1 to 50% by mass.
- examples of such other polymers include polymers made of poly(meth)acrylate, polyamic acid, polyimide, etc., which are not photosensitive side chain polymers capable of exhibiting liquid crystallinity.
- the retardation material of the present invention can be manufactured by a method including the following [I] to [III]. [I] Step of applying the composition of the present invention onto a substrate to form a coating film; [II] A step of irradiating the coating film obtained in [I] with polarized ultraviolet rays; and [III] A step of heating the coating film obtained in [II] to obtain a retardation material.
- Step [I] is a process of applying the composition of the present invention onto a substrate. More specifically, the composition of the present invention is applied to a substrate (for example, a silicon/silicon dioxide coated substrate, a silicon nitride substrate, a substrate coated with a metal such as aluminum, molybdenum, chromium, etc., a glass substrate, a quartz substrate, Bar coating, spin coating, flow coating, roll coating, Coating is performed by a method such as slit coating, slit coating followed by spin coating, an inkjet method, or a printing method. After coating, the solvent can be evaporated at 30 to 200° C., preferably 30 to 150° C., using a heating means such as a hot plate, a thermal circulation oven, or an IR (infrared) oven, to obtain a coating film.
- a heating means such as a hot plate, a thermal circulation oven, or an IR (infrared) oven
- step [II] the coating film obtained in step [I] is irradiated with polarized ultraviolet light.
- the substrate is irradiated with polarized ultraviolet rays from a fixed direction via a polarizing plate.
- the ultraviolet light to be used ultraviolet light with a wavelength in the range of 100 to 400 nm can be used.
- the optimum wavelength is selected via a filter or the like depending on the type of coating film used.
- ultraviolet light in the wavelength range of 290 to 400 nm can be selected and used so as to selectively induce a photocrosslinking reaction.
- the ultraviolet light for example, light emitted from a high-pressure mercury lamp can be used.
- the amount of polarized ultraviolet radiation depends on the coating used.
- the amount of irradiation is the polarized ultraviolet rays that achieves the maximum value of ⁇ A (hereinafter also referred to as ⁇ Amax), which is the difference between the ultraviolet absorbance in a direction parallel to the polarization direction of the polarized ultraviolet rays and the ultraviolet absorbance in a direction perpendicular to the polarization direction of the polarized ultraviolet rays.
- the amount is preferably within the range of 1 to 70%, and more preferably within the range of 1 to 50%.
- step [III] the coating film irradiated with the polarized ultraviolet rays in step [II] is heated. By heating, orientation controllability can be imparted to the coating film.
- heating means such as a hot plate, a thermal circulation oven, or an IR (infrared) oven can be used.
- the heating temperature can be determined in consideration of the temperature at which the coating film used exhibits liquid crystallinity.
- the heating temperature is preferably within the temperature range at which the specific polymer contained in the composition of the present invention develops liquid crystallinity (hereinafter referred to as liquid crystal development temperature).
- liquid crystal development temperature the temperature at which liquid crystals appear on the surface of the paint film is expected to be lower than the temperature at which liquid crystals appear when the specific polymer is observed in bulk. For this reason, the heating temperature is more preferably within the temperature range of the liquid crystal development temperature on the surface of the coating film.
- the heating temperature range after irradiation with polarized ultraviolet rays has a lower limit of 10°C lower than the lower limit of the liquid crystal development temperature range of the specific polymer used, and an upper limit of 10°C lower than the upper limit of the liquid crystal temperature range. It is preferable that the temperature is within the range. If the heating temperature is lower than the above temperature range, the effect of amplifying the anisotropy due to heat in the coating film tends to be insufficient, and if the heating temperature is too high than the above temperature range, the condition of the coating film tends to be insufficient. tends to be close to an isotropic liquid state (isotropic phase), in which case it may be difficult to reorient in one direction due to self-organization.
- isotropic liquid state isotropic phase
- the liquid crystal development temperature is the liquid crystal transition temperature at which the polymer or coating surface undergoes a phase transition from a solid phase to a liquid crystal phase, and is an isotropic phase at which a phase transition occurs from a liquid crystal phase to an isotropic phase.
- a temperature below the phase transition temperature (Tiso) For example, exhibiting liquid crystallinity at 130° C. or lower means that the liquid crystal transition temperature at which a phase transition from a solid phase to a liquid crystal phase occurs is 130° C. or lower.
- the thickness of the coating film formed after heating can be appropriately selected in consideration of the level difference and optical and electrical properties of the substrate used, and is preferably 0.5 to 10 ⁇ m, for example.
- the single-layer retardation material of the present invention thus obtained is a material having optical properties suitable for use in display devices, recording materials, etc., and is particularly suitable for use in polarizing plates and retardation plates for liquid crystal displays. It is suitable as an optical compensation film and a retardation film for circularly polarizing plates of organic EL.
- the present invention provides a liquid crystal aligning agent having the above-mentioned polymer composition, consisting essentially of the above-mentioned polymer composition, or consisting only of the above-mentioned polymer composition, particularly for use in liquid crystal display elements, more particularly A liquid crystal aligning agent for a transverse electric field driven liquid crystal display element is provided.
- the present invention provides a liquid crystal alignment film formed from the above-mentioned liquid crystal alignment agent, particularly a liquid crystal alignment film for a liquid crystal display element, and more particularly for a horizontal electric field drive type liquid crystal display element.
- the present invention also provides a substrate having a liquid crystal alignment film formed from the above-mentioned liquid crystal alignment agent, particularly for a liquid crystal display element, more particularly for a horizontal electric field drive type liquid crystal display element, particularly for a liquid crystal display element, and more particularly for a liquid crystal display element.
- a substrate for a lateral electric field driven liquid crystal display element is provided.
- the above-mentioned liquid crystal alignment film is a liquid crystal alignment film imparted with alignment control ability by having the steps [I] to [III] above, particularly for liquid crystal display elements, more particularly for transverse electric field drive type liquid crystal display elements.
- a liquid crystal alignment film or a substrate having the liquid crystal alignment film can be obtained.
- the substrate is not particularly limited, but if the liquid crystal display element to be manufactured is of a transmission type, it is preferable to use a highly transparent substrate. In that case, there are no particular limitations, and a glass substrate or a plastic substrate such as an acrylic substrate or a polycarbonate substrate can be used. Furthermore, in consideration of application to reflective liquid crystal display elements, opaque substrates such as silicon wafers can also be used.
- the substrate When used in a lateral electric field driven liquid crystal display element, the substrate has a conductive film for lateral electric field driving.
- the conductive film include, but are not limited to, ITO (Indium Tin Oxide), IZO (Indium Zinc Oxide), and the like.
- the conductive film may be made of a material that reflects light, such as aluminum, but is not limited thereto. A conventionally known method can be used to form the conductive film on the substrate.
- Steps [I] to [III] are the same as above.
- the wavelength is preferably 5 to 300 nm, more preferably 10 to 150 nm.
- the present invention provides a liquid crystal display element, particularly a transverse electric field drive type liquid crystal display element, having a substrate having the liquid crystal alignment film obtained above.
- a transverse electric field drive type liquid crystal display element can be obtained.
- the second substrate has a conductive film for transverse electric field drive, as in the first substrate.
- a substrate having the following characteristics is used.
- the second substrate has a liquid crystal alignment film, similarly to the first substrate.
- the manufacturing method of liquid crystal display elements is as follows: [IV] Obtaining a liquid crystal display element by arranging the first and second substrates obtained above to face each other so that the liquid crystal alignment films of the first and second substrates face each other via the liquid crystal; has. Thereby, a liquid crystal display element, particularly a lateral electric field drive type liquid crystal display element, can be obtained.
- Step is the substrate (first substrate) having a liquid crystal alignment film on the conductive film for transverse electric field driving obtained in [III], and the substrate obtained in [I'] to [III'] above.
- the obtained substrate with a liquid crystal alignment film (second substrate) was placed facing each other with the liquid crystal interposed therebetween so that both liquid crystal alignment films faced each other, a liquid crystal cell was produced by a known method, and a transverse electric field was applied.
- steps [I'] to [III'] can be performed in the same manner as steps [I] to [III] except for the difference in the presence or absence of a conductive film for horizontal electric field drive in step [I].
- the only difference between steps [I] to [III] and steps [I'] to [III'] is the presence or absence of the above-mentioned conductive film, so the explanation of steps [I'] to [III'] will be omitted. do.
- the above-mentioned first and second substrates are prepared, and spacers are sprinkled on the liquid crystal alignment film of one of the substrates, so that the liquid crystal alignment film surface is on the inside.
- a method of bonding the other substrate and sealing by injecting liquid crystal under reduced pressure, or a method of dripping liquid crystal onto the surface of the liquid crystal alignment film on which spacers have been sprinkled, and then bonding the substrates together and sealing. , etc. can be exemplified.
- the diameter of the spacer is preferably 1 ⁇ m to 30 ⁇ m, more preferably 2 ⁇ m to 10 ⁇ m. This spacer diameter determines the distance between the pair of substrates that sandwich the liquid crystal layer, that is, the thickness of the liquid crystal layer.
- the polymer composition or liquid crystal aligning agent of the present invention a liquid crystal aligning film formed using the composition or liquid crystal aligning agent, or a substrate having the aligning film, and a substrate having the liquid crystal aligning film or the substrate.
- the liquid crystal display element formed by this method can be suitably used for large-screen, high-definition liquid crystal televisions, etc.
- MA1 to MA2 having a photoreactive group and monomers MB1 to MB4 and MC1 to MC3 having liquid crystal properties used in Examples are shown below.
- MA1 was synthesized according to the synthesis method described in International Publication No. 2011/084546.
- MA2 was synthesized according to the synthesis method described in JP-A-2012-27354.
- MC1 was synthesized according to the synthesis method described in JP-A-9-118717.
- MB1 was synthesized according to the synthesis method described in JP-A-2016-128403.
- MB2 to MB4 are new compounds, and the synthesis method is shown below.
- MC2 and MC3 were synthesized according to the synthesis method described in International Publication No. 2017/135130.
- the side chain derived from MA1 corresponds to the side chain (a1)
- the side chain derived from MB1 to MB4 corresponds to the side chain (a2)
- the side chain derived from MC1 to MC3 corresponds to the side chain (a3). Applies to.
- reaction solution was poured into a methanol/pure water mixed solvent to precipitate the polymer, which was filtered and washed with methanol to obtain polymer powder P-1 (13.0 g).
- the number average molecular weight of P-1 was 22,000, and the weight average molecular weight was 74,000.
- reaction solution was poured into a methanol/pure water mixed solvent to precipitate the polymer, which was filtered and washed with methanol to obtain polymer powder P-2 (13.6 g).
- the number average molecular weight of P-2 was 23,000, and the weight average molecular weight was 84,000.
- reaction solution was poured into a methanol/pure water mixed solvent to precipitate the polymer, which was filtered and washed with methanol to obtain polymer powder P-3 (13.8 g).
- the number average molecular weight of P-3 was 30,000, and the weight average molecular weight was 95,000.
- P-4 had a number average molecular weight of 19,000 and a weight average molecular weight of 54,000.
- the monomer mixed solution was added dropwise to NMP (14.2 g) at 60° C. over 2 hours under a nitrogen atmosphere. After the dropwise addition was completed, the reaction was carried out at 60° C. for 12 hours.
- reaction solution was poured into a methanol/pure water mixed solvent to precipitate the polymer, which was filtered and washed with methanol to obtain polymer powder P-7 (12.1 g).
- the number average molecular weight of P-7 was 23,000 and the weight average molecular weight was 45,000.
- the monomer mixed solution was added dropwise to NMP (13.9 g) at 60° C. over 2 hours under a nitrogen atmosphere. After the dropwise addition was completed, the reaction was carried out at 60° C. for 12 hours.
- reaction solution was poured into a methanol/pure water mixed solvent to precipitate the polymer, which was filtered and washed with methanol to obtain polymer powder P-8 (12.6 g).
- the number average molecular weight of P-8 was 24,000, and the weight average molecular weight was 52,000.
- reaction solution was poured into a methanol/pure water mixed solvent to precipitate the polymer, which was filtered and washed with methanol to obtain polymer powder P-9 (6.01 g).
- the number average molecular weight of P-9 was 21,000, and the weight average molecular weight was 99,000.
- the monomer mixed solution was added dropwise to NMP (6.72 g) over 2 hours at 60° C. under a nitrogen atmosphere. After the dropwise addition was completed, the reaction was carried out at 60° C. for 12 hours.
- reaction solution was poured into a methanol/pure water mixed solvent to precipitate the polymer, which was filtered and washed with methanol to obtain polymer powder P-10 (6.12 g).
- the number average molecular weight of P-10 was 20,000, and the weight average molecular weight was 50,000.
- Polymer solution T-7 was obtained by adding and stirring CPN (16.38 g) and F560 (18.0 mg) to polymer powder P-2 (3.60 g) obtained in Synthesis Example 2. .
- This polymer solution T-7 was directly used as a material for forming a retardation film.
- Example 2 to 16 Glass substrates S-2 to S-16 with retardation films were prepared in the same manner as in Example 1, except that the polymer solution, exposure amount, and main firing temperature were changed as shown in Tables 2 and 3. did.
- Example 17 Polymer solution T-9 was filtered through a filter with a pore size of 5.0 ⁇ m, and then applied onto a COP film (ZF16-100, manufactured by Nippon Zeon) using a bar coater. This substrate was dried in a thermal circulation oven at 50° C. for 3 minutes, and then 1200 mJ/cm 2 of 365 nm polarized ultraviolet light was irradiated onto this substrate from a high-pressure mercury lamp through a 365 nm bandpass filter and a polarizing plate. It was heated in an IR oven at 120° C. for 10 minutes to produce a COP film S-17 with a retardation film. Note that the thickness of the retardation layer of S-17 was 2.0 ⁇ m.
- Example 18 Polymer solution T-10 was filtered through a filter with a pore size of 5.0 ⁇ m, and then applied onto a COP film (ZF16-100, manufactured by Nippon Zeon) using a bar coater. This substrate was dried in a thermal circulation oven at 50° C. for 3 minutes, and then 200 mJ/cm 2 of 313 nm polarized ultraviolet light was irradiated from a high-pressure mercury lamp through a 313 nm bandpass filter and a polarizing plate. It was heated in an IR oven at 120° C. for 10 minutes to produce a COP film S-18 with a retardation film. Note that the thickness of the retardation layer of S-18 was 2.0 ⁇ m.
- Polymer solution T-8 was filtered through a filter with a pore size of 5.0 ⁇ m, and then applied onto a COP film (ZF16-100, manufactured by Nippon Zeon) using a bar coater.
- This substrate was dried in a thermal circulation oven at 50° C. for 3 minutes, and then 200 mJ/cm 2 of 313 nm polarized ultraviolet light was irradiated from a high-pressure mercury lamp through a 313 nm bandpass filter and a polarizing plate. It was heated in an IR oven at 120° C. for 10 minutes to produce a COP film R-5 with a retardation film. Note that the thickness of the retardation layer of R-5 was 2.0 ⁇ m.
- the film thickness, retardation value, and ⁇ n of each of the substrates S-1 to S18 and R-1 to R-5 with retardation films were evaluated by the following method.
- the film thickness of the retardation layer of the glass substrate with a retardation film was measured using a high-precision fine shape measuring machine (ET4000M) manufactured by Kosaka Laboratory Co., Ltd.
- the film thickness of the retardation layer of the COP film with a retardation film was measured using F20 film thickness meter manufactured by Filmetrics.
- a single-layer retardation material obtained from a polymer composition using monomer MB showed a higher ⁇ n than a single-layer retardation material obtained from a polymer composition not using monomer MB. Since it shows a good ⁇ n when fired at a low temperature of 100 to 120°C, it is possible to form a retardation layer on a film base material.
- a substrate for order parameter measurement was prepared using the liquid crystal aligning agent (U-1) according to the procedure shown below.
- the substrate used was a quartz substrate measuring 40 mm x 40 mm and having a thickness of 1.0 mm. After filtering the liquid crystal aligning agent (U-1) through a 1.0 ⁇ m filter, it was spin-coated onto a quartz substrate and dried on a hot plate at 60° C. for 90 seconds to form a thin film with a thickness of 100 nm.
- the order parameter S was calculated from the absorbance of polarized light using the following formula.
- a para represents absorbance in a direction parallel to the direction of polarized ultraviolet rays irradiated
- a per represents absorbance in a direction perpendicular to the direction of polarized ultraviolet rays irradiated.
- the absolute values of the calculated order parameters (S) are shown in Table 5.
- evaluation criteria ⁇ : 0.5 or more ⁇ : 0.4 or more and less than 0.5 ⁇ : 0.3 or more and less than 0.4 ⁇ : less than 0.3
- the liquid crystal aligning agent obtained from the polymer composition using the monomer MB shows an order parameter value of about 0.4 to 0.5 under low temperature firing conditions of 120°C, and the liquid crystal alignment agent It was confirmed that it can function as a membrane.
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Abstract
Provided as a polymer composition that provides a single layer phase difference material exhibiting a high phase difference value, even with low temperature firing and even as a thin film, is a polymer composition comprising: (A) a side-chain-type polymer that has a side-chain (a1) which has a photoreactive site and a side-chain (a2) which has a site represented by formula (b); and (B) an organic solvent. Also provided are a liquid crystal alignment agent and a single layer phase difference material obtained from said polymer composition. (In the formula, L, W1, W2, W3, Q1, n1, and Q are as defined in the description.)
Description
本発明は、重合体組成物、単層位相差材及び液晶配向剤に関する。詳しくは、表示装置や記録材料等の用途に好適な光学特性を有する材料、特に、液晶ディスプレイ用の偏光板及び位相差板等の光学補償フィルム、及び液晶ディスプレイ用光配向膜、有機エレクトロルミネッセンス(EL)の円偏光板に好適に利用できる液晶性重合体、該重合体を含む組成物、該組成物から得られる単層位相差材及び液晶配向剤に関する。
The present invention relates to a polymer composition, a single-layer retardation material, and a liquid crystal alignment agent. Specifically, materials with optical properties suitable for uses such as display devices and recording materials, in particular optical compensation films such as polarizing plates and retardation plates for liquid crystal displays, optical alignment films for liquid crystal displays, organic electroluminescence ( The present invention relates to a liquid crystalline polymer that can be suitably used in a circularly polarizing plate (EL), a composition containing the polymer, a single-layer retardation material and a liquid crystal alignment agent obtained from the composition.
液晶表示装置や有機EL表示装置等の表示品位の向上や軽量化等の要求から、偏光板や位相差板等の光学補償フィルムとして、内部の分子配向構造が制御された高分子フィルムの要求が高まっている。この要求に応えるべく、重合性液晶化合物が有する光学異方性を利用したフィルムの開発がなされている。
ここで用いられる重合性液晶化合物は、一般に、重合性基と液晶構造部位(スペーサー部とメソゲン部とを有する構造部位)とを有する液晶化合物であり、この重合性基としてアクリル基が広く用いられている。 Due to the demand for improved display quality and weight reduction of liquid crystal display devices, organic EL display devices, etc., there is a demand for polymer films with controlled internal molecular orientation structures as optical compensation films such as polarizing plates and retardation plates. It's increasing. In order to meet this demand, films are being developed that utilize the optical anisotropy of polymerizable liquid crystal compounds.
The polymerizable liquid crystal compound used here generally has a polymerizable group and a liquid crystal structural site (a structural site having a spacer part and a mesogen part), and an acrylic group is widely used as this polymerizable group. ing.
ここで用いられる重合性液晶化合物は、一般に、重合性基と液晶構造部位(スペーサー部とメソゲン部とを有する構造部位)とを有する液晶化合物であり、この重合性基としてアクリル基が広く用いられている。 Due to the demand for improved display quality and weight reduction of liquid crystal display devices, organic EL display devices, etc., there is a demand for polymer films with controlled internal molecular orientation structures as optical compensation films such as polarizing plates and retardation plates. It's increasing. In order to meet this demand, films are being developed that utilize the optical anisotropy of polymerizable liquid crystal compounds.
The polymerizable liquid crystal compound used here generally has a polymerizable group and a liquid crystal structural site (a structural site having a spacer part and a mesogen part), and an acrylic group is widely used as this polymerizable group. ing.
このような重合性液晶化合物は、一般的に、紫外線等の放射線を照射して重合する方法で重合体(フィルム)とされる。
例えば、アクリル基を有する特定の重合性液晶化合物を、配向処理を施した支持体に担持し、この化合物を液晶状態に保持しつつ放射線を照射して重合体を得る方法(特許文献1)や、アクリル基を有する2種類の重合性液晶化合物の混合物又はこの混合物にカイラル液晶を混合した組成物に光重合開始剤を添加し、紫外線を照射して重合体を得る方法(特許文献2)が知られている。 Such polymerizable liquid crystal compounds are generally made into polymers (films) by polymerizing them by irradiating them with radiation such as ultraviolet rays.
For example, a method of obtaining a polymer by supporting a specific polymerizable liquid crystal compound having an acrylic group on an alignment-treated support and irradiating the compound with radiation while maintaining the compound in a liquid crystal state (Patent Document 1); , a method in which a photopolymerization initiator is added to a mixture of two types of polymerizable liquid crystal compounds having an acrylic group or a composition in which a chiral liquid crystal is mixed with this mixture, and a polymer is obtained by irradiating ultraviolet rays (Patent Document 2). Are known.
例えば、アクリル基を有する特定の重合性液晶化合物を、配向処理を施した支持体に担持し、この化合物を液晶状態に保持しつつ放射線を照射して重合体を得る方法(特許文献1)や、アクリル基を有する2種類の重合性液晶化合物の混合物又はこの混合物にカイラル液晶を混合した組成物に光重合開始剤を添加し、紫外線を照射して重合体を得る方法(特許文献2)が知られている。 Such polymerizable liquid crystal compounds are generally made into polymers (films) by polymerizing them by irradiating them with radiation such as ultraviolet rays.
For example, a method of obtaining a polymer by supporting a specific polymerizable liquid crystal compound having an acrylic group on an alignment-treated support and irradiating the compound with radiation while maintaining the compound in a liquid crystal state (Patent Document 1); , a method in which a photopolymerization initiator is added to a mixture of two types of polymerizable liquid crystal compounds having an acrylic group or a composition in which a chiral liquid crystal is mixed with this mixture, and a polymer is obtained by irradiating ultraviolet rays (Patent Document 2). Are known.
また、液晶配向膜を必要としない重合性液晶化合物や重合体を用いた配向フィルム(特許文献3、4)、又は光架橋部位を含有した重合体を用いた配向フィルム(特許文献5、6)等、様々な単層塗布型配向フィルムが報告されてきた。
位相差材料はフィルム基材に塗布して用いられることが多い。フィルム基材へのダメージ低減のため、薄膜且つ低温焼成で高い位相差値を発現することが求められている。 In addition, there are also alignment films using polymerizable liquid crystal compounds and polymers that do not require a liquid crystal alignment film (Patent Documents 3 and 4), or alignment films using polymers containing photocrosslinking sites (Patent Documents 5 and 6). Various single-layer coated oriented films have been reported.
A retardation material is often used by coating it on a film base material. In order to reduce damage to the film base material, it is required that the film be thin and exhibit a high retardation value when fired at a low temperature.
位相差材料はフィルム基材に塗布して用いられることが多い。フィルム基材へのダメージ低減のため、薄膜且つ低温焼成で高い位相差値を発現することが求められている。 In addition, there are also alignment films using polymerizable liquid crystal compounds and polymers that do not require a liquid crystal alignment film (Patent Documents 3 and 4), or alignment films using polymers containing photocrosslinking sites (Patent Documents 5 and 6). Various single-layer coated oriented films have been reported.
A retardation material is often used by coating it on a film base material. In order to reduce damage to the film base material, it is required that the film be thin and exhibit a high retardation value when fired at a low temperature.
本発明は、上記問題に鑑みなされたものであり、薄膜且つ低温焼成で位相差値の高い単層位相差層の作製を可能とする重合体組成物、及び該組成物から得られる単層位相差材、及び液晶配向剤を提供することを目的とする。
The present invention was made in view of the above-mentioned problems, and provides a polymer composition that enables the production of a single-layer retardation layer having a high retardation value through thin film firing at a low temperature, and a monolayer retardation layer obtained from the composition. The purpose of the present invention is to provide a retardation material and a liquid crystal aligning agent.
本発明者らは、上記課題を解決すべく鋭意検討を重ねた結果、特定の重合体を含有する組成物を用いることで、液晶配向膜を使用することなく、低温焼成にて高い屈折率異方性(デルタn)を有する位相差材が得られることを見出し、本発明を完成した。
As a result of extensive studies to solve the above problems, the present inventors have found that by using a composition containing a specific polymer, a high refractive index difference can be obtained by firing at a low temperature without using a liquid crystal alignment film. It was discovered that a retardation material having orientation (delta n) can be obtained, and the present invention was completed.
すなわち、本発明は、下記の重合体組成物及び単層位相差材を提供する。
<1> (A)光反応性部位を有する側鎖(a1)、及び、下記式(b)で表される部位を有する側鎖(a2)を有する側鎖型高分子;並びに
(B)有機溶媒
を含有する重合体組成物。
(式(b)中、
W1、W2及びW3は、それぞれ独立に、単結合、-O-、-C(=O)-O-、-O-C(=O)-、-C(=O)-N(R’)-又は-N(R’)-C(=O)-である。W2の数が2以上のとき、各W2は互いに同一でも異なっていてもよい。R’は水素原子又は炭素数1~6のアルキル基を表す。
Qは、炭素数1~10のアルキレン基である。該アルキレン基の水素原子の一部又は全部がハロゲン原子で置換されていてもよい。
Lは、単結合、炭素数1~12のアルキレン基、または、炭素数1~12のアルキレン基を構成する-CH2-の互いに隣合わない1個以上が-O-、-S-、-C(=O)-O-、もしくは-O-C(=O)-で置換された2価の連結基を表し、該アルキレン基の水素原子の一部又は全部がハロゲン原子で置換されていてもよい。
Q1は、単結合、フェニレン基、ナフチレン基又は炭素数5~8の2価の脂環式炭化水素基であり、該フェニレン基及びナフチレン基の水素原子の一部又は全部が、シアノ基、ハロゲン原子、炭素数1~5のアルキル基、炭素数2~6のアルキルカルボニル基又は炭素数1~5のアルコキシ基で置換されていてもよい。Q1の数が2以上のとき、各Q1は互いに同一でも異なっていてもよい。
ベンゼン環上の水素原子は炭素数1~6のアルキル基、炭素数1~6のハロアルキル基、炭素数1~6のアルコキシ基、炭素数1~6のハロアルコキシ基、シアノ基、及びニトロ基から選ばれる置換基で置換されていてもよい。また、該ベンゼン環はナフタレン環でもよく、該ナフタレン環上の水素原子は炭素数1~6のアルキル基、炭素数1~6のハロアルキル基、炭素数1~6のアルコキシ基、炭素数1~6のハロアルコキシ基、シアノ基、及びニトロ基から選ばれる置換基で置換されていてもよい。
n1は、0、1、2又は3である。
破線は結合手である。)
<2> (A)側鎖型高分子が、前記式(b)で表される構造以外の、液晶性のみを発現する側鎖(a3)をさらに有することを特徴とする上記<1>の重合体組成物。
<3> 光反応性部位を有する側鎖(a1)が、下記式(a1-1)~(a1-6)のいずれかで表される側鎖を有する上記<1>の重合体組成物。
(式中、n1及びn2は、それぞれ独立に、0、1、2又は3である。
Lは、単結合、炭素数1~12のアルキレン基、または、炭素数1~12のアルキレン基を構成する-CH2-の互いに隣合わない1個以上が-O-、-S-、-C(=O)-O-、もしくは-O-C(=O)-で置換された2価の連結基を表し、該アルキレン基の水素原子の一部又は全部がハロゲン原子で置換されていてもよい。
T1は、単結合又は炭素数1~12のアルキレン基であり、該アルキレン基の水素原子の一部又は全部がハロゲン原子で置換されていてもよい。
A1、A2及びD1は、それぞれ独立に、単結合、-O-、-CH2-、-C(=O)-O-、-O-C(=O)-、-C(=O)-NH-又は-NH-C(=O)-である。ただし、T1が単結合のときは、A2も単結合である。
Y1及びY2は、フェニレン基又はナフチレン基であり、該フェニレン基及びナフチレン基の水素原子の一部又は全部が、シアノ基、ハロゲン原子、炭素数1~5のアルキル基、炭素数2~6のアルキルカルボニル基又は炭素数1~5のアルコキシ基で置換されていてもよい。
P1、Q1及びQ2は、それぞれ独立に、単結合、フェニレン基又は炭素数5~8の2価の脂環式炭化水素基であり、該フェニレン基の水素原子の一部又は全部が、シアノ基、ハロゲン原子、炭素数1~5のアルキル基、炭素数2~6のアルキルカルボニル基又は炭素数1~5のアルコキシ基で置換されていてもよい。Q1の数が2以上のとき、各Q1は互いに同一でも異なっていてもよく、Q2の数が2以上のとき、各Q2は互いに同一でも異なっていてもよい。
Rは、水素原子、シアノ基、ハロゲン原子、カルボキシ基、炭素数1~5のアルキル基、炭素数2~6のアルキルカルボニル基、炭素数3~7のシクロアルキル基又は炭素数1~5のアルコキシ基である。
X1及びX2は、それぞれ独立に、単結合、-O-、-C(=O)-O-、-O-C(=O)-、-N=N-、-CH=CH-、-C≡C-、-CH=CH-C(=O)-O-又は-O-C(=O)-CH=CH-である。X1の数が2以上のとき、各X1は互いに同一でも異なっていてもよく、X2の数が2以上のとき、各X2は互いに同一でも異なっていてもよい。
Couは、クマリン-6-イル基又はクマリン-7-イル基であり、これらに結合する水素原子の一部が-NO2、-CN、-CH=C(CN)2、-CH=CH-CN、ハロゲン原子、炭素数1~5のアルキル基又は炭素数1~5のアルコキシ基で置換されてもよい。
Eは、-C(=O)-O-、-O-C(=O)-、-C(=O)-S-又は-S-C(=O)-である。
G1及びG2は、それぞれ独立に、N又はCHである。
上記定義におけるCH=CHの水素原子は、シアノ基、ハロゲン原子、炭素数1~5のアルキル基、炭素数2~6のアルキルカルボニル基及び炭素数1~5のアルコキシ基から選ばれる置換基で置換されていてもよい。
破線は、結合手である。) That is, the present invention provides the following polymer composition and single-layer retardation material.
<1> (A) A side chain type polymer having a side chain (a1) having a photoreactive site and a side chain (a2) having a site represented by the following formula (b); and (B) an organic Polymer composition containing a solvent.
(In formula (b),
W 1 , W 2 and W 3 each independently represent a single bond, -O-, -C(=O)-O-, -O-C(=O)-, -C(=O)-N( R')- or -N(R')-C(=O)-. When the number of W 2 is 2 or more, each W 2 may be the same or different from each other. R' represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms.
Q is an alkylene group having 1 to 10 carbon atoms. Some or all of the hydrogen atoms of the alkylene group may be substituted with halogen atoms.
L is a single bond, an alkylene group having 1 to 12 carbon atoms, or one or more non-adjacent -CH 2 - constituting the alkylene group having 1 to 12 carbon atoms is -O-, -S-, - It represents a divalent linking group substituted with C(=O)-O- or -OC(=O)-, and some or all of the hydrogen atoms of the alkylene group are substituted with halogen atoms. Good too.
Q 1 is a single bond, a phenylene group, a naphthylene group, or a divalent alicyclic hydrocarbon group having 5 to 8 carbon atoms, and some or all of the hydrogen atoms of the phenylene group and naphthylene group are a cyano group, It may be substituted with a halogen atom, an alkyl group having 1 to 5 carbon atoms, an alkylcarbonyl group having 2 to 6 carbon atoms, or an alkoxy group having 1 to 5 carbon atoms. When the number of Q 1 is 2 or more, each Q 1 may be the same or different from each other.
The hydrogen atom on the benzene ring is an alkyl group having 1 to 6 carbon atoms, a haloalkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a haloalkoxy group having 1 to 6 carbon atoms, a cyano group, and a nitro group. It may be substituted with a substituent selected from. Further, the benzene ring may be a naphthalene ring, and the hydrogen atom on the naphthalene ring is an alkyl group having 1 to 6 carbon atoms, a haloalkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, or an alkyl group having 1 to 6 carbon atoms. 6 may be substituted with a substituent selected from a haloalkoxy group, a cyano group, and a nitro group.
n 1 is 0, 1, 2 or 3.
The dashed lines are bonds. )
<2> (A) The above <1>, wherein the side chain type polymer further has a side chain (a3) that exhibits only liquid crystallinity, other than the structure represented by the formula (b). Polymer composition.
<3> The polymer composition of <1> above, wherein the side chain (a1) having a photoreactive site has a side chain represented by any of the following formulas (a1-1) to (a1-6).
(In the formula, n1 and n2 are each independently 0, 1, 2 or 3.
L is a single bond, an alkylene group having 1 to 12 carbon atoms, or one or more non-adjacent -CH 2 - constituting the alkylene group having 1 to 12 carbon atoms is -O-, -S-, - It represents a divalent linking group substituted with C(=O)-O- or -OC(=O)-, and some or all of the hydrogen atoms of the alkylene group are substituted with halogen atoms. Good too.
T 1 is a single bond or an alkylene group having 1 to 12 carbon atoms, and some or all of the hydrogen atoms of the alkylene group may be substituted with halogen atoms.
A 1 , A 2 and D 1 each independently represent a single bond, -O-, -CH 2 -, -C(=O)-O-, -O-C(=O)-, -C(= O)-NH- or -NH-C(=O)-. However, when T 1 is a single bond, A 2 is also a single bond.
Y 1 and Y 2 are a phenylene group or a naphthylene group, and some or all of the hydrogen atoms of the phenylene group and naphthylene group are cyano groups, halogen atoms, alkyl groups having 1 to 5 carbon atoms, or 2 to 5 carbon atoms. It may be substituted with an alkylcarbonyl group having 6 carbon atoms or an alkoxy group having 1 to 5 carbon atoms.
P 1 , Q 1 and Q 2 are each independently a single bond, a phenylene group, or a divalent alicyclic hydrocarbon group having 5 to 8 carbon atoms, and some or all of the hydrogen atoms of the phenylene group are , a cyano group, a halogen atom, an alkyl group having 1 to 5 carbon atoms, an alkylcarbonyl group having 2 to 6 carbon atoms, or an alkoxy group having 1 to 5 carbon atoms. When the number of Q 1 is 2 or more, each Q 1 may be the same or different from each other, and when the number of Q 2 is 2 or more, each Q 2 may be the same or different from each other.
R is a hydrogen atom, a cyano group, a halogen atom, a carboxy group, an alkyl group having 1 to 5 carbon atoms, an alkylcarbonyl group having 2 to 6 carbon atoms, a cycloalkyl group having 3 to 7 carbon atoms, or a cycloalkyl group having 1 to 5 carbon atoms. It is an alkoxy group.
X 1 and X 2 each independently represent a single bond, -O-, -C(=O)-O-, -O-C(=O)-, -N=N-, -CH=CH-, -C≡C-, -CH=CH-C(=O)-O- or -OC(=O)-CH=CH-. When the number of X 1 is 2 or more, each X 1 may be the same or different from each other, and when the number of X 2 is 2 or more, each X 2 may be the same or different from each other.
Cou is a coumarin-6-yl group or a coumarin-7-yl group, and some of the hydrogen atoms bonded to these are -NO 2 , -CN, -CH=C(CN) 2 , -CH=CH- It may be substituted with CN, a halogen atom, an alkyl group having 1 to 5 carbon atoms, or an alkoxy group having 1 to 5 carbon atoms.
E is -C(=O)-O-, -OC(=O)-, -C(=O)-S- or -S-C(=O)-.
G 1 and G 2 are each independently N or CH.
The hydrogen atom of CH=CH in the above definition is a substituent selected from a cyano group, a halogen atom, an alkyl group having 1 to 5 carbon atoms, an alkylcarbonyl group having 2 to 6 carbon atoms, and an alkoxy group having 1 to 5 carbon atoms. May be replaced.
The broken lines are bonds. )
<1> (A)光反応性部位を有する側鎖(a1)、及び、下記式(b)で表される部位を有する側鎖(a2)を有する側鎖型高分子;並びに
(B)有機溶媒
を含有する重合体組成物。
W1、W2及びW3は、それぞれ独立に、単結合、-O-、-C(=O)-O-、-O-C(=O)-、-C(=O)-N(R’)-又は-N(R’)-C(=O)-である。W2の数が2以上のとき、各W2は互いに同一でも異なっていてもよい。R’は水素原子又は炭素数1~6のアルキル基を表す。
Qは、炭素数1~10のアルキレン基である。該アルキレン基の水素原子の一部又は全部がハロゲン原子で置換されていてもよい。
Lは、単結合、炭素数1~12のアルキレン基、または、炭素数1~12のアルキレン基を構成する-CH2-の互いに隣合わない1個以上が-O-、-S-、-C(=O)-O-、もしくは-O-C(=O)-で置換された2価の連結基を表し、該アルキレン基の水素原子の一部又は全部がハロゲン原子で置換されていてもよい。
Q1は、単結合、フェニレン基、ナフチレン基又は炭素数5~8の2価の脂環式炭化水素基であり、該フェニレン基及びナフチレン基の水素原子の一部又は全部が、シアノ基、ハロゲン原子、炭素数1~5のアルキル基、炭素数2~6のアルキルカルボニル基又は炭素数1~5のアルコキシ基で置換されていてもよい。Q1の数が2以上のとき、各Q1は互いに同一でも異なっていてもよい。
ベンゼン環上の水素原子は炭素数1~6のアルキル基、炭素数1~6のハロアルキル基、炭素数1~6のアルコキシ基、炭素数1~6のハロアルコキシ基、シアノ基、及びニトロ基から選ばれる置換基で置換されていてもよい。また、該ベンゼン環はナフタレン環でもよく、該ナフタレン環上の水素原子は炭素数1~6のアルキル基、炭素数1~6のハロアルキル基、炭素数1~6のアルコキシ基、炭素数1~6のハロアルコキシ基、シアノ基、及びニトロ基から選ばれる置換基で置換されていてもよい。
n1は、0、1、2又は3である。
破線は結合手である。)
<2> (A)側鎖型高分子が、前記式(b)で表される構造以外の、液晶性のみを発現する側鎖(a3)をさらに有することを特徴とする上記<1>の重合体組成物。
<3> 光反応性部位を有する側鎖(a1)が、下記式(a1-1)~(a1-6)のいずれかで表される側鎖を有する上記<1>の重合体組成物。
Lは、単結合、炭素数1~12のアルキレン基、または、炭素数1~12のアルキレン基を構成する-CH2-の互いに隣合わない1個以上が-O-、-S-、-C(=O)-O-、もしくは-O-C(=O)-で置換された2価の連結基を表し、該アルキレン基の水素原子の一部又は全部がハロゲン原子で置換されていてもよい。
T1は、単結合又は炭素数1~12のアルキレン基であり、該アルキレン基の水素原子の一部又は全部がハロゲン原子で置換されていてもよい。
A1、A2及びD1は、それぞれ独立に、単結合、-O-、-CH2-、-C(=O)-O-、-O-C(=O)-、-C(=O)-NH-又は-NH-C(=O)-である。ただし、T1が単結合のときは、A2も単結合である。
Y1及びY2は、フェニレン基又はナフチレン基であり、該フェニレン基及びナフチレン基の水素原子の一部又は全部が、シアノ基、ハロゲン原子、炭素数1~5のアルキル基、炭素数2~6のアルキルカルボニル基又は炭素数1~5のアルコキシ基で置換されていてもよい。
P1、Q1及びQ2は、それぞれ独立に、単結合、フェニレン基又は炭素数5~8の2価の脂環式炭化水素基であり、該フェニレン基の水素原子の一部又は全部が、シアノ基、ハロゲン原子、炭素数1~5のアルキル基、炭素数2~6のアルキルカルボニル基又は炭素数1~5のアルコキシ基で置換されていてもよい。Q1の数が2以上のとき、各Q1は互いに同一でも異なっていてもよく、Q2の数が2以上のとき、各Q2は互いに同一でも異なっていてもよい。
Rは、水素原子、シアノ基、ハロゲン原子、カルボキシ基、炭素数1~5のアルキル基、炭素数2~6のアルキルカルボニル基、炭素数3~7のシクロアルキル基又は炭素数1~5のアルコキシ基である。
X1及びX2は、それぞれ独立に、単結合、-O-、-C(=O)-O-、-O-C(=O)-、-N=N-、-CH=CH-、-C≡C-、-CH=CH-C(=O)-O-又は-O-C(=O)-CH=CH-である。X1の数が2以上のとき、各X1は互いに同一でも異なっていてもよく、X2の数が2以上のとき、各X2は互いに同一でも異なっていてもよい。
Couは、クマリン-6-イル基又はクマリン-7-イル基であり、これらに結合する水素原子の一部が-NO2、-CN、-CH=C(CN)2、-CH=CH-CN、ハロゲン原子、炭素数1~5のアルキル基又は炭素数1~5のアルコキシ基で置換されてもよい。
Eは、-C(=O)-O-、-O-C(=O)-、-C(=O)-S-又は-S-C(=O)-である。
G1及びG2は、それぞれ独立に、N又はCHである。
上記定義におけるCH=CHの水素原子は、シアノ基、ハロゲン原子、炭素数1~5のアルキル基、炭素数2~6のアルキルカルボニル基及び炭素数1~5のアルコキシ基から選ばれる置換基で置換されていてもよい。
破線は、結合手である。) That is, the present invention provides the following polymer composition and single-layer retardation material.
<1> (A) A side chain type polymer having a side chain (a1) having a photoreactive site and a side chain (a2) having a site represented by the following formula (b); and (B) an organic Polymer composition containing a solvent.
W 1 , W 2 and W 3 each independently represent a single bond, -O-, -C(=O)-O-, -O-C(=O)-, -C(=O)-N( R')- or -N(R')-C(=O)-. When the number of W 2 is 2 or more, each W 2 may be the same or different from each other. R' represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms.
Q is an alkylene group having 1 to 10 carbon atoms. Some or all of the hydrogen atoms of the alkylene group may be substituted with halogen atoms.
L is a single bond, an alkylene group having 1 to 12 carbon atoms, or one or more non-adjacent -CH 2 - constituting the alkylene group having 1 to 12 carbon atoms is -O-, -S-, - It represents a divalent linking group substituted with C(=O)-O- or -OC(=O)-, and some or all of the hydrogen atoms of the alkylene group are substituted with halogen atoms. Good too.
Q 1 is a single bond, a phenylene group, a naphthylene group, or a divalent alicyclic hydrocarbon group having 5 to 8 carbon atoms, and some or all of the hydrogen atoms of the phenylene group and naphthylene group are a cyano group, It may be substituted with a halogen atom, an alkyl group having 1 to 5 carbon atoms, an alkylcarbonyl group having 2 to 6 carbon atoms, or an alkoxy group having 1 to 5 carbon atoms. When the number of Q 1 is 2 or more, each Q 1 may be the same or different from each other.
The hydrogen atom on the benzene ring is an alkyl group having 1 to 6 carbon atoms, a haloalkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a haloalkoxy group having 1 to 6 carbon atoms, a cyano group, and a nitro group. It may be substituted with a substituent selected from. Further, the benzene ring may be a naphthalene ring, and the hydrogen atom on the naphthalene ring is an alkyl group having 1 to 6 carbon atoms, a haloalkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, or an alkyl group having 1 to 6 carbon atoms. 6 may be substituted with a substituent selected from a haloalkoxy group, a cyano group, and a nitro group.
n 1 is 0, 1, 2 or 3.
The dashed lines are bonds. )
<2> (A) The above <1>, wherein the side chain type polymer further has a side chain (a3) that exhibits only liquid crystallinity, other than the structure represented by the formula (b). Polymer composition.
<3> The polymer composition of <1> above, wherein the side chain (a1) having a photoreactive site has a side chain represented by any of the following formulas (a1-1) to (a1-6).
L is a single bond, an alkylene group having 1 to 12 carbon atoms, or one or more non-adjacent -CH 2 - constituting the alkylene group having 1 to 12 carbon atoms is -O-, -S-, - It represents a divalent linking group substituted with C(=O)-O- or -OC(=O)-, and some or all of the hydrogen atoms of the alkylene group are substituted with halogen atoms. Good too.
T 1 is a single bond or an alkylene group having 1 to 12 carbon atoms, and some or all of the hydrogen atoms of the alkylene group may be substituted with halogen atoms.
A 1 , A 2 and D 1 each independently represent a single bond, -O-, -CH 2 -, -C(=O)-O-, -O-C(=O)-, -C(= O)-NH- or -NH-C(=O)-. However, when T 1 is a single bond, A 2 is also a single bond.
Y 1 and Y 2 are a phenylene group or a naphthylene group, and some or all of the hydrogen atoms of the phenylene group and naphthylene group are cyano groups, halogen atoms, alkyl groups having 1 to 5 carbon atoms, or 2 to 5 carbon atoms. It may be substituted with an alkylcarbonyl group having 6 carbon atoms or an alkoxy group having 1 to 5 carbon atoms.
P 1 , Q 1 and Q 2 are each independently a single bond, a phenylene group, or a divalent alicyclic hydrocarbon group having 5 to 8 carbon atoms, and some or all of the hydrogen atoms of the phenylene group are , a cyano group, a halogen atom, an alkyl group having 1 to 5 carbon atoms, an alkylcarbonyl group having 2 to 6 carbon atoms, or an alkoxy group having 1 to 5 carbon atoms. When the number of Q 1 is 2 or more, each Q 1 may be the same or different from each other, and when the number of Q 2 is 2 or more, each Q 2 may be the same or different from each other.
R is a hydrogen atom, a cyano group, a halogen atom, a carboxy group, an alkyl group having 1 to 5 carbon atoms, an alkylcarbonyl group having 2 to 6 carbon atoms, a cycloalkyl group having 3 to 7 carbon atoms, or a cycloalkyl group having 1 to 5 carbon atoms. It is an alkoxy group.
X 1 and X 2 each independently represent a single bond, -O-, -C(=O)-O-, -O-C(=O)-, -N=N-, -CH=CH-, -C≡C-, -CH=CH-C(=O)-O- or -OC(=O)-CH=CH-. When the number of X 1 is 2 or more, each X 1 may be the same or different from each other, and when the number of X 2 is 2 or more, each X 2 may be the same or different from each other.
Cou is a coumarin-6-yl group or a coumarin-7-yl group, and some of the hydrogen atoms bonded to these are -NO 2 , -CN, -CH=C(CN) 2 , -CH=CH- It may be substituted with CN, a halogen atom, an alkyl group having 1 to 5 carbon atoms, or an alkoxy group having 1 to 5 carbon atoms.
E is -C(=O)-O-, -OC(=O)-, -C(=O)-S- or -S-C(=O)-.
G 1 and G 2 are each independently N or CH.
The hydrogen atom of CH=CH in the above definition is a substituent selected from a cyano group, a halogen atom, an alkyl group having 1 to 5 carbon atoms, an alkylcarbonyl group having 2 to 6 carbon atoms, and an alkoxy group having 1 to 5 carbon atoms. May be replaced.
The broken lines are bonds. )
<4> 上記(a3)が、下記式(a3-1)~(a3-11)のいずれかで表されるものである上記<2>の重合体組成物。
(式中、Lは、単結合、炭素数1~12のアルキレン基、または、炭素数1~12のアルキレン基を構成する-CH2-の互いに隣合わない1個以上が-O-、-S-、-C(=O)-O-、もしくは-O-C(=O)-で置換された2価の連結基を表し、該アルキレン基の水素原子の一部又は全部がハロゲン原子で置換されていてもよい。
A3及びA4は、それぞれ独立に、単結合、-O-、-CH2-、-C(=O)-O-、-O-C(=O)-、-C(=O)-NH-、又は-NH-C(=O)-である。A4の数が2以上のとき、各A4は互いに同一でも異なっていてもよい。
R1は、-NO2、-CN、ハロゲン原子、フェニル基、ナフチル基、ビフェニリル基、フラニル基、1価窒素含有複素環基、炭素数5~8の1価脂環式炭化水素基、炭素数1~12のアルキル基又は炭素数1~12のアルコキシ基である。
R2は、フェニル基、ナフチル基、ビフェニリル基、フラニル基、1価窒素含有複素環基又は炭素数5~8の1価脂環式炭化水素基であり、これらの基の水素原子の一部又は全部が、-NO2、-CN、ハロゲン原子、炭素数1~5のアルキル基又は炭素数1~5のアルコキシ基で置換されてもよい。
R3は、水素原子、-NO2、-CN、ハロゲン原子、フェニル基、ナフチル基、ビフェニリル基、フラニル基、1価窒素含有複素環基、炭素数5~8の1価脂環式炭化水素基、炭素数1~12のアルキル基又は炭素数1~12のアルコキシ基である。
Eは、-C(=O)-O-、-O-C(=O)-、-C(=O)-S-又は-S-C(=O)-である。
k1~k5は、それぞれ独立に、0~2の整数であるが、k1~k5の合計は2以上である。
k6及びk7は、それぞれ独立に、0~2の整数であるが、k6及びk7の合計は1以上である。
m1、m2及びm3は、それぞれ独立に、1~3の整数である。
nは、0又は1である。
Z1及びZ2は、それぞれ独立に、単結合、-C(=O)-、-CH2-O-、又は-CF2-である。
ベンゼン環、ナフタレン環上の水素原子の一部又は全部が、シアノ基、ハロゲン原子、炭素数1~5のアルキル基、炭素数2~6のアルキルカルボニル基又は炭素数1~5のアルコキシ基で置換されていてもよい。
破線は、結合手である。) <4> The polymer composition of <2> above, wherein (a3) is represented by any of the following formulas (a3-1) to (a3-11).
(In the formula, L is a single bond, an alkylene group having 1 to 12 carbon atoms, or one or more non-adjacent -CH 2 - constituting the alkylene group having 1 to 12 carbon atoms is -O-, - Represents a divalent linking group substituted with S-, -C(=O)-O-, or -OC(=O)-, and some or all of the hydrogen atoms of the alkylene group are halogen atoms. May be replaced.
A 3 and A 4 each independently represent a single bond, -O-, -CH 2 -, -C(=O)-O-, -O-C(=O)-, -C(=O)- NH- or -NH-C(=O)-. When the number of A 4 is 2 or more, each A 4 may be the same or different from each other.
R 1 is -NO 2 , -CN, halogen atom, phenyl group, naphthyl group, biphenylyl group, furanyl group, monovalent nitrogen-containing heterocyclic group, monovalent alicyclic hydrocarbon group having 5 to 8 carbon atoms, carbon It is an alkyl group having 1 to 12 carbon atoms or an alkoxy group having 1 to 12 carbon atoms.
R 2 is a phenyl group, a naphthyl group, a biphenylyl group, a furanyl group, a monovalent nitrogen-containing heterocyclic group, or a monovalent alicyclic hydrocarbon group having 5 to 8 carbon atoms, and some of the hydrogen atoms of these groups Alternatively, all may be substituted with -NO 2 , -CN, a halogen atom, an alkyl group having 1 to 5 carbon atoms, or an alkoxy group having 1 to 5 carbon atoms.
R 3 is a hydrogen atom, -NO 2 , -CN, a halogen atom, a phenyl group, a naphthyl group, a biphenylyl group, a furanyl group, a monovalent nitrogen-containing heterocyclic group, or a monovalent alicyclic hydrocarbon having 5 to 8 carbon atoms. group, an alkyl group having 1 to 12 carbon atoms, or an alkoxy group having 1 to 12 carbon atoms.
E is -C(=O)-O-, -OC(=O)-, -C(=O)-S- or -S-C(=O)-.
k1 to k5 are each independently an integer of 0 to 2, but the total of k1 to k5 is 2 or more.
k6 and k7 are each independently an integer of 0 to 2, but the sum of k6 and k7 is 1 or more.
m1, m2 and m3 are each independently an integer of 1 to 3.
n is 0 or 1.
Z 1 and Z 2 are each independently a single bond, -C(=O)-, -CH 2 -O-, or -CF 2 -.
Some or all of the hydrogen atoms on the benzene ring or naphthalene ring are a cyano group, a halogen atom, an alkyl group having 1 to 5 carbon atoms, an alkylcarbonyl group having 2 to 6 carbon atoms, or an alkoxy group having 1 to 5 carbon atoms. May be replaced.
The broken lines are bonds. )
A3及びA4は、それぞれ独立に、単結合、-O-、-CH2-、-C(=O)-O-、-O-C(=O)-、-C(=O)-NH-、又は-NH-C(=O)-である。A4の数が2以上のとき、各A4は互いに同一でも異なっていてもよい。
R1は、-NO2、-CN、ハロゲン原子、フェニル基、ナフチル基、ビフェニリル基、フラニル基、1価窒素含有複素環基、炭素数5~8の1価脂環式炭化水素基、炭素数1~12のアルキル基又は炭素数1~12のアルコキシ基である。
R2は、フェニル基、ナフチル基、ビフェニリル基、フラニル基、1価窒素含有複素環基又は炭素数5~8の1価脂環式炭化水素基であり、これらの基の水素原子の一部又は全部が、-NO2、-CN、ハロゲン原子、炭素数1~5のアルキル基又は炭素数1~5のアルコキシ基で置換されてもよい。
R3は、水素原子、-NO2、-CN、ハロゲン原子、フェニル基、ナフチル基、ビフェニリル基、フラニル基、1価窒素含有複素環基、炭素数5~8の1価脂環式炭化水素基、炭素数1~12のアルキル基又は炭素数1~12のアルコキシ基である。
Eは、-C(=O)-O-、-O-C(=O)-、-C(=O)-S-又は-S-C(=O)-である。
k1~k5は、それぞれ独立に、0~2の整数であるが、k1~k5の合計は2以上である。
k6及びk7は、それぞれ独立に、0~2の整数であるが、k6及びk7の合計は1以上である。
m1、m2及びm3は、それぞれ独立に、1~3の整数である。
nは、0又は1である。
Z1及びZ2は、それぞれ独立に、単結合、-C(=O)-、-CH2-O-、又は-CF2-である。
ベンゼン環、ナフタレン環上の水素原子の一部又は全部が、シアノ基、ハロゲン原子、炭素数1~5のアルキル基、炭素数2~6のアルキルカルボニル基又は炭素数1~5のアルコキシ基で置換されていてもよい。
破線は、結合手である。) <4> The polymer composition of <2> above, wherein (a3) is represented by any of the following formulas (a3-1) to (a3-11).
A 3 and A 4 each independently represent a single bond, -O-, -CH 2 -, -C(=O)-O-, -O-C(=O)-, -C(=O)- NH- or -NH-C(=O)-. When the number of A 4 is 2 or more, each A 4 may be the same or different from each other.
R 1 is -NO 2 , -CN, halogen atom, phenyl group, naphthyl group, biphenylyl group, furanyl group, monovalent nitrogen-containing heterocyclic group, monovalent alicyclic hydrocarbon group having 5 to 8 carbon atoms, carbon It is an alkyl group having 1 to 12 carbon atoms or an alkoxy group having 1 to 12 carbon atoms.
R 2 is a phenyl group, a naphthyl group, a biphenylyl group, a furanyl group, a monovalent nitrogen-containing heterocyclic group, or a monovalent alicyclic hydrocarbon group having 5 to 8 carbon atoms, and some of the hydrogen atoms of these groups Alternatively, all may be substituted with -NO 2 , -CN, a halogen atom, an alkyl group having 1 to 5 carbon atoms, or an alkoxy group having 1 to 5 carbon atoms.
R 3 is a hydrogen atom, -NO 2 , -CN, a halogen atom, a phenyl group, a naphthyl group, a biphenylyl group, a furanyl group, a monovalent nitrogen-containing heterocyclic group, or a monovalent alicyclic hydrocarbon having 5 to 8 carbon atoms. group, an alkyl group having 1 to 12 carbon atoms, or an alkoxy group having 1 to 12 carbon atoms.
E is -C(=O)-O-, -OC(=O)-, -C(=O)-S- or -S-C(=O)-.
k1 to k5 are each independently an integer of 0 to 2, but the total of k1 to k5 is 2 or more.
k6 and k7 are each independently an integer of 0 to 2, but the sum of k6 and k7 is 1 or more.
m1, m2 and m3 are each independently an integer of 1 to 3.
n is 0 or 1.
Z 1 and Z 2 are each independently a single bond, -C(=O)-, -CH 2 -O-, or -CF 2 -.
Some or all of the hydrogen atoms on the benzene ring or naphthalene ring are a cyano group, a halogen atom, an alkyl group having 1 to 5 carbon atoms, an alkylcarbonyl group having 2 to 6 carbon atoms, or an alkoxy group having 1 to 5 carbon atoms. May be replaced.
The broken lines are bonds. )
<5> [I] 上記<1>~<4>のいずれかの組成物を、基板上に塗布して塗膜を形成する工程;
[II] [I]で得られた塗膜に偏光した紫外線を照射する工程;及び
[III] [II]で得られた塗膜を加熱して、位相差材を得る工程
を有する、単層位相差材の製造方法。
<6> 上記<1>~<4>のいずれかの重合体組成物から得られる単層位相差材。
<7> 上記<1>~<4>のいずれかの重合体組成物から得られる液晶配向剤。 <5> [I] A step of applying any of the compositions of <1> to <4> above on a substrate to form a coating film;
[II] A step of irradiating the coating film obtained in [I] with polarized ultraviolet rays; and [III] A step of heating the coating film obtained in [II] to obtain a retardation material. Method for manufacturing retardation material.
<6> A single-layer retardation material obtained from the polymer composition according to any one of <1> to <4> above.
<7> A liquid crystal aligning agent obtained from the polymer composition according to any one of <1> to <4> above.
[II] [I]で得られた塗膜に偏光した紫外線を照射する工程;及び
[III] [II]で得られた塗膜を加熱して、位相差材を得る工程
を有する、単層位相差材の製造方法。
<6> 上記<1>~<4>のいずれかの重合体組成物から得られる単層位相差材。
<7> 上記<1>~<4>のいずれかの重合体組成物から得られる液晶配向剤。 <5> [I] A step of applying any of the compositions of <1> to <4> above on a substrate to form a coating film;
[II] A step of irradiating the coating film obtained in [I] with polarized ultraviolet rays; and [III] A step of heating the coating film obtained in [II] to obtain a retardation material. Method for manufacturing retardation material.
<6> A single-layer retardation material obtained from the polymer composition according to any one of <1> to <4> above.
<7> A liquid crystal aligning agent obtained from the polymer composition according to any one of <1> to <4> above.
本発明により、低温焼成プロセスであっても薄膜で位相差値の高い単層位相差材及び液晶配向剤を提供することができる。
According to the present invention, it is possible to provide a single-layer retardation material and a liquid crystal aligning agent that are thin and have a high retardation value even in a low-temperature firing process.
本発明者らは、鋭意研究を行った結果、以下の知見を得て本発明を完成するに至った。
本発明の重合体組成物は、液晶性を発現し得る感光性の側鎖型高分子(以下、単に側鎖型高分子とも呼ぶ)を有しており、前記重合体組成物を用いて得られる塗膜は、液晶性を発現し得る感光性の側鎖型高分子を有する膜である。この塗膜にはラビング処理を行うこと無く、偏光照射によって配向処理を行う。そして、偏光照射の後、その側鎖型高分子膜を加熱する工程を経て、光学異方性が付与されたフィルム(以下、単層位相差材とも称する)となる。このとき、偏光照射によって発現した僅かな異方性がドライビングフォースとなり、液晶性の側鎖型高分子自体が自己組織化により効率的に再配向する。その結果、単層塗布型水平配向フィルムとして高効率な配向処理が実現し、高い光学異方性が付与された単層塗布型水平配向フィルムを得ることができる。 As a result of intensive research, the present inventors obtained the following knowledge and completed the present invention.
The polymer composition of the present invention has a photosensitive side chain type polymer (hereinafter also simply referred to as a side chain type polymer) capable of exhibiting liquid crystallinity, and can be obtained using the polymer composition. The coating film is a film containing a photosensitive side-chain type polymer capable of exhibiting liquid crystallinity. This coating film is subjected to orientation treatment by polarized light irradiation without performing rubbing treatment. After irradiation with polarized light, the side chain type polymer film is heated to become a film imparted with optical anisotropy (hereinafter also referred to as a single-layer retardation material). At this time, the slight anisotropy developed by polarized light irradiation becomes a driving force, and the liquid crystal side chain polymer itself is efficiently reoriented by self-organization. As a result, a highly efficient alignment process can be realized as a single-layer coated horizontally oriented film, and a single-layer coated horizontally oriented film imparted with high optical anisotropy can be obtained.
本発明の重合体組成物は、液晶性を発現し得る感光性の側鎖型高分子(以下、単に側鎖型高分子とも呼ぶ)を有しており、前記重合体組成物を用いて得られる塗膜は、液晶性を発現し得る感光性の側鎖型高分子を有する膜である。この塗膜にはラビング処理を行うこと無く、偏光照射によって配向処理を行う。そして、偏光照射の後、その側鎖型高分子膜を加熱する工程を経て、光学異方性が付与されたフィルム(以下、単層位相差材とも称する)となる。このとき、偏光照射によって発現した僅かな異方性がドライビングフォースとなり、液晶性の側鎖型高分子自体が自己組織化により効率的に再配向する。その結果、単層塗布型水平配向フィルムとして高効率な配向処理が実現し、高い光学異方性が付与された単層塗布型水平配向フィルムを得ることができる。 As a result of intensive research, the present inventors obtained the following knowledge and completed the present invention.
The polymer composition of the present invention has a photosensitive side chain type polymer (hereinafter also simply referred to as a side chain type polymer) capable of exhibiting liquid crystallinity, and can be obtained using the polymer composition. The coating film is a film containing a photosensitive side-chain type polymer capable of exhibiting liquid crystallinity. This coating film is subjected to orientation treatment by polarized light irradiation without performing rubbing treatment. After irradiation with polarized light, the side chain type polymer film is heated to become a film imparted with optical anisotropy (hereinafter also referred to as a single-layer retardation material). At this time, the slight anisotropy developed by polarized light irradiation becomes a driving force, and the liquid crystal side chain polymer itself is efficiently reoriented by self-organization. As a result, a highly efficient alignment process can be realized as a single-layer coated horizontally oriented film, and a single-layer coated horizontally oriented film imparted with high optical anisotropy can be obtained.
また、本発明における重合体組成物では、(A)成分である側鎖型高分子が、光配向性部位を有する側鎖(a1)とともに、上記式(b)で表される側鎖(a2)を含有することにより、重合体の凝集が抑制される。これにより、本発明の重合体組成物から得られる位相差材は、100℃~120℃の低温焼成条件下、薄膜であっても高いリタデーションを示す。なおこれらは本発明のメカニズムに関する発明者の見解を含むものであり、本発明を拘束するものではない。
以下、本発明の実施形態について詳しく説明する。 Furthermore, in the polymer composition of the present invention, the side chain type polymer serving as the component (A) contains the side chain (a2) represented by the above formula (b) together with the side chain (a1) having a photoalignable site. ), the aggregation of the polymer is suppressed. As a result, the retardation material obtained from the polymer composition of the present invention exhibits high retardation even in the form of a thin film under low-temperature firing conditions of 100° C. to 120° C. Note that these include the inventor's opinion regarding the mechanism of the present invention, and do not constrain the present invention.
Embodiments of the present invention will be described in detail below.
以下、本発明の実施形態について詳しく説明する。 Furthermore, in the polymer composition of the present invention, the side chain type polymer serving as the component (A) contains the side chain (a2) represented by the above formula (b) together with the side chain (a1) having a photoalignable site. ), the aggregation of the polymer is suppressed. As a result, the retardation material obtained from the polymer composition of the present invention exhibits high retardation even in the form of a thin film under low-temperature firing conditions of 100° C. to 120° C. Note that these include the inventor's opinion regarding the mechanism of the present invention, and do not constrain the present invention.
Embodiments of the present invention will be described in detail below.
<重合体組成物>
本発明の重合体組成物は、(A)所定の温度範囲で液晶性を発現する感光性の側鎖型高分子であって、光反応性部位を有する側鎖(a1)及び上記式(b)で表される部位を有する側鎖(a2)を有する側鎖型高分子;並びに(B)有機溶媒を含有することを特徴とする。 <Polymer composition>
The polymer composition of the present invention comprises (A) a photosensitive side chain type polymer that exhibits liquid crystallinity in a predetermined temperature range, comprising a side chain (a1) having a photoreactive site and the above formula (b ); and (B) an organic solvent.
本発明の重合体組成物は、(A)所定の温度範囲で液晶性を発現する感光性の側鎖型高分子であって、光反応性部位を有する側鎖(a1)及び上記式(b)で表される部位を有する側鎖(a2)を有する側鎖型高分子;並びに(B)有機溶媒を含有することを特徴とする。 <Polymer composition>
The polymer composition of the present invention comprises (A) a photosensitive side chain type polymer that exhibits liquid crystallinity in a predetermined temperature range, comprising a side chain (a1) having a photoreactive site and the above formula (b ); and (B) an organic solvent.
<<(A)側鎖型高分子>>
(A)成分は、所定の温度範囲で液晶性を発現する感光性の側鎖型高分子であって、光反応性部位を有する側鎖(a1)及び上記式(b)で表される部位を有する側鎖(a2)を有する側鎖型高分子である。
(A)側鎖型高分子は、250nm~400nmの波長範囲の光で反応し、かつ80℃~300℃の温度範囲で液晶性を示すのがよい。
(A)側鎖型高分子は、250nm~400nmの波長範囲の光に反応する感光性側鎖を有することが好ましい。
(A)側鎖型高分子は、80℃~300℃の温度範囲で液晶性を示すため、上記式(b)で表される構造以外の、液晶性のみを発現する側鎖(a3)を有することが好ましい。 <<(A) Side chain type polymer>>
Component (A) is a photosensitive side chain type polymer that exhibits liquid crystallinity in a predetermined temperature range, and has a side chain (a1) having a photoreactive site and a site represented by the above formula (b). It is a side chain type polymer having a side chain (a2).
(A) The side chain type polymer preferably reacts with light in a wavelength range of 250 nm to 400 nm and exhibits liquid crystallinity in a temperature range of 80° C. to 300° C.
(A) The side chain type polymer preferably has a photosensitive side chain that reacts with light in the wavelength range of 250 nm to 400 nm.
(A) Since the side chain type polymer exhibits liquid crystallinity in the temperature range of 80°C to 300°C, a side chain (a3) that exhibits only liquid crystallinity, other than the structure represented by the above formula (b), may be used. It is preferable to have.
(A)成分は、所定の温度範囲で液晶性を発現する感光性の側鎖型高分子であって、光反応性部位を有する側鎖(a1)及び上記式(b)で表される部位を有する側鎖(a2)を有する側鎖型高分子である。
(A)側鎖型高分子は、250nm~400nmの波長範囲の光で反応し、かつ80℃~300℃の温度範囲で液晶性を示すのがよい。
(A)側鎖型高分子は、250nm~400nmの波長範囲の光に反応する感光性側鎖を有することが好ましい。
(A)側鎖型高分子は、80℃~300℃の温度範囲で液晶性を示すため、上記式(b)で表される構造以外の、液晶性のみを発現する側鎖(a3)を有することが好ましい。 <<(A) Side chain type polymer>>
Component (A) is a photosensitive side chain type polymer that exhibits liquid crystallinity in a predetermined temperature range, and has a side chain (a1) having a photoreactive site and a site represented by the above formula (b). It is a side chain type polymer having a side chain (a2).
(A) The side chain type polymer preferably reacts with light in a wavelength range of 250 nm to 400 nm and exhibits liquid crystallinity in a temperature range of 80° C. to 300° C.
(A) The side chain type polymer preferably has a photosensitive side chain that reacts with light in the wavelength range of 250 nm to 400 nm.
(A) Since the side chain type polymer exhibits liquid crystallinity in the temperature range of 80°C to 300°C, a side chain (a3) that exhibits only liquid crystallinity, other than the structure represented by the above formula (b), may be used. It is preferable to have.
(A)側鎖型高分子は、主鎖に感光性を有する側鎖が結合しており、光に感応して架橋反応、または異性化反応を起こすことができる。液晶性を発現し得る感光性の側鎖型高分子の構造は、そうした特性を満足するものであれば特に限定されないが、側鎖構造に剛直なメソゲン成分を有することが好ましい。この場合、該側鎖型高分子を単層位相差材とした際に、安定な光学異方性を得ることができる。
(A) The side chain type polymer has a photosensitive side chain bonded to the main chain, and can cause a crosslinking reaction or an isomerization reaction in response to light. The structure of the photosensitive side chain type polymer capable of exhibiting liquid crystallinity is not particularly limited as long as it satisfies such characteristics, but it is preferable that the side chain structure has a rigid mesogenic component. In this case, stable optical anisotropy can be obtained when the side chain type polymer is used as a single layer retardation material.
液晶性を発現し得る感光性の側鎖型高分子の構造のより具体的な例としては、(メタ)アクリレート、イタコネート、フマレート、マレエート、α-メチレン-γ-ブチロラクトン、スチレン、ビニル、マレイミド、ノルボルネン等のラジカル重合性基およびシロキサンからなる群から選択される少なくとも1種から構成された主鎖と、光反応性部位を有する側鎖(a1)を有する構造であることが好ましい。
More specific examples of structures of photosensitive side-chain polymers that can exhibit liquid crystallinity include (meth)acrylate, itaconate, fumarate, maleate, α-methylene-γ-butyrolactone, styrene, vinyl, maleimide, It is preferable that the structure has a main chain composed of at least one member selected from the group consisting of a radically polymerizable group such as norbornene and siloxane, and a side chain (a1) having a photoreactive site.
側鎖(a1)としては、としては、下記式(a1-1)~(a1-6)のいずれかで表されるものが好ましい。なお、溶媒への溶解性の観点から、1つの側鎖(a1)が有するベンゼン環の数は、3つ以内が好ましい。
The side chain (a1) is preferably one represented by any of the following formulas (a1-1) to (a1-6). In addition, from the viewpoint of solubility in a solvent, the number of benzene rings that one side chain (a1) has is preferably three or less.
式(a1-1)~(a1-6)中、n1及びn2は、それぞれ独立に、0、1、2又は3である。Lは、単結合、炭素数1~12のアルキレン基、または、炭素数1~12のアルキレン基を構成する-CH2-の互いに隣合わない1個以上が-O-、-S-、-C(=O)-O-、もしくは-O-C(=O)-で置換された2価の連結基を表し、該アルキレン基の水素原子の一部又は全部がハロゲン原子で置換されていてもよい。T1は、単結合又は炭素数1~12のアルキレン基であり、該アルキレン基の水素原子の一部又は全部がハロゲン原子で置換されていてもよい。A1、A2及びD1は、それぞれ独立に、単結合、-O-、-CH2-、-C(=O)-O-、-O-C(=O)-、-C(=O)-NH-又は-NH-C(=O)-である。ただし、T1が単結合のときは、A2も単結合である。Y1及びY2は、フェニレン基又はナフチレン基であり、該フェニレン基及びナフチレン基の水素原子の一部又は全部が、シアノ基、ハロゲン原子、炭素数1~5のアルキル基、炭素数2~6のアルキルカルボニル基又は炭素数1~5のアルコキシ基で置換されていてもよい。P1、Q1及びQ2は、それぞれ独立に、単結合、フェニレン基又は炭素数5~8の2価の脂環式炭化水素基であり、該フェニレン基の水素原子の一部又は全部が、シアノ基、ハロゲン原子、炭素数1~5のアルキル基、炭素数2~6のアルキルカルボニル基又は炭素数1~5のアルコキシ基で置換されていてもよい。Q1の数が2以上のとき、各Q1は互いに同一でも異なっていてもよく、Q2の数が2以上のとき、各Q2は互いに同一でも異なっていてもよい。Rは、水素原子、シアノ基、ハロゲン原子、カルボキシ基、炭素数1~5のアルキル基、炭素数2~6のアルキルカルボニル基、炭素数3~7のシクロアルキル基又は炭素数1~5のアルコキシ基である。X1及びX2は、それぞれ独立に、単結合、-O-、-C(=O)-O-、-O-C(=O)-、-N=N-、-CH=CH-、-C≡C-、-CH=CH-C(=O)-O-又は-O-C(=O)-CH=CH-である。X1の数が2以上のとき、各X1は互いに同一でも異なっていてもよく、X2の数が2以上のとき、各X2は互いに同一でも異なっていてもよい。Couは、クマリン-6-イル基又はクマリン-7-イル基であり、これらに結合する水素原子の一部が-NO2、-CN、-CH=C(CN)2、-CH=CH-CN、ハロゲン原子、炭素数1~5のアルキル基又は炭素数1~5のアルコキシ基で置換されてもよい。Eは、-C(=O)-O-、-O-C(=O)-、-C(=O)-S-又は-S-C(=O)-である。G1及びG2は、それぞれ独立に、N又はCHである。上記定義におけるCH=CHの水素原子は、シアノ基、ハロゲン原子、炭素数1~5のアルキル基、炭素数2~6のアルキルカルボニル基及び炭素数1~5のアルコキシ基から選ばれる置換基で置換されていてもよい。破線は、結合手である。
In formulas (a1-1) to (a1-6), n1 and n2 are each independently 0, 1, 2 or 3. L is a single bond, an alkylene group having 1 to 12 carbon atoms, or one or more non-adjacent -CH 2 - constituting the alkylene group having 1 to 12 carbon atoms is -O-, -S-, - It represents a divalent linking group substituted with C(=O)-O- or -OC(=O)-, and some or all of the hydrogen atoms of the alkylene group are substituted with halogen atoms. Good too. T 1 is a single bond or an alkylene group having 1 to 12 carbon atoms, and some or all of the hydrogen atoms of the alkylene group may be substituted with halogen atoms. A 1 , A 2 and D 1 each independently represent a single bond, -O-, -CH 2 -, -C(=O)-O-, -O-C(=O)-, -C(= O)-NH- or -NH-C(=O)-. However, when T 1 is a single bond, A 2 is also a single bond. Y 1 and Y 2 are a phenylene group or a naphthylene group, and some or all of the hydrogen atoms of the phenylene group and naphthylene group are cyano groups, halogen atoms, alkyl groups having 1 to 5 carbon atoms, or 2 to 5 carbon atoms. It may be substituted with an alkylcarbonyl group having 6 carbon atoms or an alkoxy group having 1 to 5 carbon atoms. P 1 , Q 1 and Q 2 are each independently a single bond, a phenylene group, or a divalent alicyclic hydrocarbon group having 5 to 8 carbon atoms, and some or all of the hydrogen atoms of the phenylene group are , a cyano group, a halogen atom, an alkyl group having 1 to 5 carbon atoms, an alkylcarbonyl group having 2 to 6 carbon atoms, or an alkoxy group having 1 to 5 carbon atoms. When the number of Q 1 is 2 or more, each Q 1 may be the same or different from each other, and when the number of Q 2 is 2 or more, each Q 2 may be the same or different from each other. R is a hydrogen atom, a cyano group, a halogen atom, a carboxy group, an alkyl group having 1 to 5 carbon atoms, an alkylcarbonyl group having 2 to 6 carbon atoms, a cycloalkyl group having 3 to 7 carbon atoms, or a cycloalkyl group having 1 to 5 carbon atoms. It is an alkoxy group. X 1 and X 2 each independently represent a single bond, -O-, -C(=O)-O-, -O-C(=O)-, -N=N-, -CH=CH-, -C≡C-, -CH=CH-C(=O)-O- or -OC(=O)-CH=CH-. When the number of X 1 is 2 or more, each X 1 may be the same or different from each other, and when the number of X 2 is 2 or more, each X 2 may be the same or different from each other. Cou is a coumarin-6-yl group or a coumarin-7-yl group, and some of the hydrogen atoms bonded to these are -NO 2 , -CN, -CH=C(CN) 2 , -CH=CH- It may be substituted with CN, a halogen atom, an alkyl group having 1 to 5 carbon atoms, or an alkoxy group having 1 to 5 carbon atoms. E is -C(=O)-O-, -OC(=O)-, -C(=O)-S- or -S-C(=O)-. G 1 and G 2 are each independently N or CH. The hydrogen atom of CH=CH in the above definition is a substituent selected from a cyano group, a halogen atom, an alkyl group having 1 to 5 carbon atoms, an alkylcarbonyl group having 2 to 6 carbon atoms, and an alkoxy group having 1 to 5 carbon atoms. May be replaced. The broken lines are bonds.
前記炭素数1~12のアルキレン基は、直鎖状、分岐状、環状のいずれでもよく、その具体例としては、メチレン基、エチレン基、プロパン-1,3-ジイル基、ブタン-1,4-ジイル基、ペンタン-1,5-ジイル基、ヘキサン-1,6-ジイル基、ヘプタン-1,7-ジイル基、オクタン-1,8-ジイル基、ノナン-1,9-ジイル基、デカン-1,10-ジイル基等が挙げられる。
The alkylene group having 1 to 12 carbon atoms may be linear, branched, or cyclic, and specific examples include a methylene group, an ethylene group, a propane-1,3-diyl group, and a butane-1,4-diyl group. -diyl group, pentane-1,5-diyl group, hexane-1,6-diyl group, heptane-1,7-diyl group, octane-1,8-diyl group, nonane-1,9-diyl group, decane -1,10-diyl group and the like.
前記ハロゲン原子としては、フッ素原子、塩素原子、臭素原子、ヨウ素原子等が挙げられる。
Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, and the like.
前記炭素数1~5のアルキル基は、直鎖状、分岐状のいずれでもよく、その具体例としては、メチル基、エチル基、n-プロピル基、イソプロピル基、n-ブチル基、tert-ブチル基、n-ペンチル基等が挙げられる。
The alkyl group having 1 to 5 carbon atoms may be linear or branched, and specific examples thereof include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, and tert-butyl group. group, n-pentyl group, etc.
前記炭素数2~6のアルキルカルボニル基の具体例としては、メチルカルボニル(アセチル)基、エチルカルボニル基、n-プロピルカルボニル基、n-ブチルカルボニル基、n-ペンチルカルボニル基等が挙げられる。
Specific examples of the alkylcarbonyl group having 2 to 6 carbon atoms include methylcarbonyl (acetyl) group, ethylcarbonyl group, n-propylcarbonyl group, n-butylcarbonyl group, n-pentylcarbonyl group, and the like.
前記炭素数1~5のアルコキシ基の具体例としては、メトキシ基、エトキシ基、n-プロポキシ基、イソプロポキシ基、n-ブトキシ基、n-ペンチルオキシ基等が挙げられる。
Specific examples of the alkoxy group having 1 to 5 carbon atoms include methoxy group, ethoxy group, n-propoxy group, isopropoxy group, n-butoxy group, n-pentyloxy group, and the like.
前記炭素数5~8の2価の脂環式炭化水素基の具体例としては、シクロペンタンジイル基、シクロヘキサンジイル基、シクロヘプタンジイル基、シクロオクタンジイル基が挙げられる。
Specific examples of the divalent alicyclic hydrocarbon group having 5 to 8 carbon atoms include a cyclopentanediyl group, a cyclohexanediyl group, a cycloheptanediyl group, and a cyclooctanediyl group.
前記炭素数3~7のシクロアルキル基の具体例としては、シクロプロピル基、シクロブチル基、シクロペンチル基、シクロヘキシル基等が挙げられる。
Specific examples of the cycloalkyl group having 3 to 7 carbon atoms include a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, and the like.
側鎖(a1)としては、下記式(a1-1-1)、(a1-1-2)、(a1-2-1)、(a1-3-1)、(a1-4-1)、(a1-5-1)又は(a1-6-1)で表されるものがより好ましい。
(式中、L、A1、A2、Y1、Y2、Q1、T1、R、X1、Cou、E、G1、G2、n1及び破線は、前記と同じ。P1’は、フェニレン基又は炭素数5~8の2価の脂環式炭化水素基であり、該フェニレン基及びCH=CHの水素原子の一部又は全部が、シアノ基、ハロゲン原子、炭素数1~5のアルキル基、炭素数2~6のアルキルカルボニル基又は炭素数1~5のアルコキシ基で置換されていてもよい。)
As the side chain (a1), the following formulas (a1-1-1), (a1-1-2), (a1-2-1), (a1-3-1), (a1-4-1), Those represented by (a1-5-1) or (a1-6-1) are more preferred.
(In the formula, L, A 1 , A 2 , Y 1 , Y 2 , Q 1 , T 1 , R, X 1 , Cou, E, G 1 , G 2 , n1 and the broken line are the same as above. P 1 ' is a phenylene group or a divalent alicyclic hydrocarbon group having 5 to 8 carbon atoms, and part or all of the phenylene group and the hydrogen atoms of CH=CH are a cyano group, a halogen atom, a carbon number 1 (May be substituted with an alkyl group having ~5 carbon atoms, an alkylcarbonyl group having 2 to 6 carbon atoms, or an alkoxy group having 1 to 5 carbon atoms.)
式(a1-1-1)で表される側鎖としては、下記式(a1-1-1-1)で表される側鎖が好ましく、式(a1-1-2)で表される側鎖としては、式(a1-1-2-1)、(a1-1-2-2)及び(a1-1-2-3)で表される側鎖が好ましい。
(式中、Meは、メチル基を意味し、L、R及び破線は、前記と同じ。)
The side chain represented by the formula (a1-1-1) is preferably a side chain represented by the following formula (a1-1-1-1), and a side chain represented by the formula (a1-1-2) is preferable. As the chain, side chains represented by formulas (a1-1-2-1), (a1-1-2-2) and (a1-1-2-3) are preferred.
(In the formula, Me means a methyl group, and L, R and the broken line are the same as above.)
式(a1-2-1)で表される側鎖としては、下記式(a1-2-1-1)で表される側鎖が好ましい。
(式中、L、A2、Q1、T1、R及び破線は、前記と同じ。)
The side chain represented by the formula (a1-2-1) is preferably a side chain represented by the following formula (a1-2-1-1).
(In the formula, L, A 2 , Q 1 , T 1 , R and the broken line are the same as above.)
式(a1-3-1)で表される側鎖としては、下記式(a1-3-1-1)、(a1-3-1-2)又は(a1-3-1-3)で表される側鎖が好ましい。
(式中、L、Cou及び破線は、前記と同じ。)
The side chain represented by the formula (a1-3-1) is represented by the following formula (a1-3-1-1), (a1-3-1-2) or (a1-3-1-3). Preferably, the side chain is
(In the formula, L, Cou and the broken line are the same as above.)
式(a1-4-1)で表される側鎖としては、下記式(a1-4-1-1)、(a1-4-1-2)、(a1-4-1-3)又は(a1-4-1-4)で表される側鎖が好ましい。
(式中、L、R及び破線は、前記と同じ。)
The side chain represented by formula (a1-4-1) is the following formula (a1-4-1-1), (a1-4-1-2), (a1-4-1-3) or ( The side chain represented by a1-4-1-4) is preferred.
(In the formula, L, R and the broken line are the same as above.)
式(a1-5-1)で表される側鎖としては、下記式(a1-5-1-1)又は(a1-5-1-2)で表される側鎖が好ましい。
(式中、L、R及び破線は、前記と同じ。)
The side chain represented by the formula (a1-5-1) is preferably a side chain represented by the following formula (a1-5-1-1) or (a1-5-1-2).
(In the formula, L, R and the broken line are the same as above.)
式(a1-6-1)で表される側鎖としては、下記式(a1-6-1-1)、(a1-6-1-2)又は(a1-6-1-3)で表される側鎖が好ましい。
(式中、L、R及び破線は、前記と同じ。)
The side chain represented by the formula (a1-6-1) is represented by the following formula (a1-6-1-1), (a1-6-1-2) or (a1-6-1-3). Preferably, the side chain is
(In the formula, L, R and the broken line are the same as above.)
また、(A)側鎖型高分子は、上記式(b)で表される光反応性部位を有する側鎖(a2)を含有する。
Furthermore, the side chain type polymer (A) contains a side chain (a2) having a photoreactive site represented by the above formula (b).
さらに、(A)側鎖型高分子は、80~300℃の温度範囲で液晶性を示すため、上記式(a3-1)~(a3-11)からなる群から選ばれるいずれか1種の液晶性のみを発現する側鎖(a3)を有することが好ましい。なお、ここで「液晶性のみを発現する」とは、側鎖(a3)のみを有するポリマーは、本発明の位相差材の作製プロセス(すなわち、後述する工程[I]~[III])中に、感光性を示さず、液晶性のみを発現するという意味である。
Furthermore, since the side chain type polymer (A) exhibits liquid crystallinity in the temperature range of 80 to 300°C, it is preferable to use one of the above formulas (a3-1) to (a3-11). It is preferable to have a side chain (a3) that exhibits only liquid crystallinity. Note that "expressing only liquid crystallinity" here means that the polymer having only the side chain (a3) is used during the production process of the retardation material of the present invention (i.e., steps [I] to [III] described later). This means that it does not exhibit photosensitivity and only exhibits liquid crystallinity.
<<感光性の側鎖型高分子の製法>>
上記の液晶性を発現し得る感光性の側鎖型高分子は、光反応性部位を有する側鎖(a1)を含有するモノマー(MA)、式(b)で表される部位を有するモノマー(MB)、および液晶性を発現する部位を有するモノマー(MC)を重合することによって得ることができる。 <<Production method of photosensitive side chain type polymer>>
The photosensitive side chain type polymer capable of exhibiting the above-mentioned liquid crystallinity includes a monomer (MA) containing a side chain (a1) having a photoreactive site, a monomer (MA) having a site represented by formula (b) ( MB) and a monomer (MC) having a site that exhibits liquid crystallinity.
上記の液晶性を発現し得る感光性の側鎖型高分子は、光反応性部位を有する側鎖(a1)を含有するモノマー(MA)、式(b)で表される部位を有するモノマー(MB)、および液晶性を発現する部位を有するモノマー(MC)を重合することによって得ることができる。 <<Production method of photosensitive side chain type polymer>>
The photosensitive side chain type polymer capable of exhibiting the above-mentioned liquid crystallinity includes a monomer (MA) containing a side chain (a1) having a photoreactive site, a monomer (MA) having a site represented by formula (b) ( MB) and a monomer (MC) having a site that exhibits liquid crystallinity.
[光反応性部位を有する側鎖(a1)を含有するモノマー(MA)]
光反応性部位を有する側鎖(a1)を含有するモノマー(以下、モノマーMAともいう。)としては、下記式(M1)、(M2)、(M3)、(M4)、(M5)又は(M6)で表される化合物が挙げられる。
(式中、PGは、重合性基であり、A1、A2、D1、L、T1、Y1、Y2、P1、Q1、Q2、R、Cou、E、X1、X2、G1、G2、n1及びn2は、前記と同じ。上記定義におけるCH=CHの水素原子は、シアノ基、ハロゲン原子、炭素数1~5のアルキル基、炭素数2~6のアルキルカルボニル基及び炭素数1~5のアルコキシ基から選ばれる置換基で置換されていてもよい。)
[Monomer (MA) containing side chain (a1) having photoreactive site]
Monomers containing a side chain (a1) having a photoreactive site (hereinafter also referred to as monomer MA) include the following formulas (M1), (M2), (M3), (M4), (M5) or ( Examples include compounds represented by M6).
(In the formula, PG is a polymerizable group, A 1 , A 2 , D 1 , L, T 1 , Y 1 , Y 2 , P 1 , Q 1 , Q 2 , R, Cou, E, X 1 . _ _ may be substituted with a substituent selected from an alkylcarbonyl group and an alkoxy group having 1 to 5 carbon atoms.)
光反応性部位を有する側鎖(a1)を含有するモノマー(以下、モノマーMAともいう。)としては、下記式(M1)、(M2)、(M3)、(M4)、(M5)又は(M6)で表される化合物が挙げられる。
Monomers containing a side chain (a1) having a photoreactive site (hereinafter also referred to as monomer MA) include the following formulas (M1), (M2), (M3), (M4), (M5) or ( Examples include compounds represented by M6).
式(M1)~(M6)中、PGは、重合性基であり、下記式(PG1)~(PG7)のいずれかで表される基が好ましい。なかでも、重合反応の制御が容易であるという点及び重合体の安定性の観点から、式(PG1)で表されるアクリル基又はメタクリル基が好ましい。
(式中、RA及びRBは、それぞれ独立して、水素原子又はメチル基であり、破線は、Lとの結合手である。)
In formulas (M1) to (M6), PG is a polymerizable group, and groups represented by any of the following formulas (PG1) to (PG7) are preferable. Among these, an acrylic group or a methacrylic group represented by formula (PG1) is preferred from the viewpoint of easy control of the polymerization reaction and stability of the polymer.
(In the formula, R A and R B are each independently a hydrogen atom or a methyl group, and the broken line is a bond with L.)
式(M1)で表される化合物としては、下記式(M1-1)、(M1-2)、(M1-3)又は(M1-4)で表されるものが好ましい。
(式中、Meは、メチル基を意味し、PG、L、Y1、P1’及びRは、前記と同じ。)
The compound represented by formula (M1) is preferably one represented by the following formula (M1-1), (M1-2), (M1-3) or (M1-4).
(In the formula, Me means a methyl group, and PG, L, Y 1 , P 1' and R are the same as above.)
式(M2)で表される化合物としては、下記式(M2-1)で表されるものが好ましい。
(式中、PG、A2、L、T1、Y1、P1、Q1及びRは、前記と同じ。)
The compound represented by formula (M2) is preferably one represented by formula (M2-1) below.
(In the formula, PG, A 2 , L, T 1 , Y 1 , P 1 , Q 1 and R are the same as above.)
式(M3)で表される化合物としては、下記式(M3-1)で表されるものが好ましい。
(式中、PG、A1、L、X1、Q1、Cou及びn1は、前記と同じ。)
The compound represented by formula (M3) is preferably one represented by formula (M3-1) below.
(In the formula, PG, A 1 , L, X 1 , Q 1 , Cou and n1 are the same as above.)
式(M4)で表される化合物としては、下記式(M4-1)で表されるものが好ましい。
(式中、PG、A1、L、X1、Y1、Y2、Q1、E、R及びn1は、前記と同じ。)
The compound represented by formula (M4) is preferably one represented by formula (M4-1) below.
(In the formula, PG, A 1 , L, X 1 , Y 1 , Y 2 , Q 1 , E, R and n1 are the same as above.)
式(M5)で表される化合物としては、下記式(M5-1)で表されるものが好ましい。
(式中、PG、A1、L、X1、Y1、Y2、Q1、R及びn1は、前記と同じ。)
The compound represented by formula (M5) is preferably one represented by formula (M5-1) below.
(In the formula, PG, A 1 , L, X 1 , Y 1 , Y 2 , Q 1 , R and n1 are the same as above.)
式(M6)で表される化合物としては、下記式(M6-1)で表されるものが好ましい。
(式中、PG、A1、L、X1、Y1、Y2、Q1、G1、G2、R及びn1は、前記と同じ。)
The compound represented by formula (M6) is preferably one represented by formula (M6-1) below.
(In the formula, PG, A 1 , L, X 1 , Y 1 , Y 2 , Q 1 , G 1 , G 2 , R and n1 are the same as above.)
式(M1-1)で表される化合物としては、下記式(M1-1-1)で表されるものが好ましく、式(M1-2)で表される化合物としては、下記式(M1-2-1)で表されるものが好ましく、式(M1-3)で表される化合物としては、下記式(M1-3-1)で表される化合物が好ましく、式(M1-4)で表される化合物としては、下記式(M1-4-1)で表される化合物が好ましい。
(式中、Meは、メチル基を意味し、PG、L及びRは、前記と同じ。)
The compound represented by formula (M1-1) is preferably one represented by the following formula (M1-1-1), and the compound represented by formula (M1-2) is preferably one represented by the following formula (M1-1-1). 2-1) is preferable, and as a compound represented by formula (M1-3), a compound represented by the following formula (M1-3-1) is preferable, and a compound represented by formula (M1-4) is preferable. As the compound represented, a compound represented by the following formula (M1-4-1) is preferable.
(In the formula, Me means a methyl group, and PG, L and R are the same as above.)
式(M2-1)で表される化合物としては、下記式(M2-2)で表されるものが好ましい。
(式中、PG、A2、L、T1、Q1及びRは、前記と同じ。)
The compound represented by formula (M2-1) is preferably one represented by formula (M2-2) below.
(In the formula, PG, A 2 , L, T 1 , Q 1 and R are the same as above.)
式(M3-1)で表される化合物としては、下記式(M3-2)、(M3-3)又は(M3-4で表されるものが好ましい。
(式中、PG、L及びCouは、前記と同じ。)
The compound represented by the formula (M3-1) is preferably one represented by the following formula (M3-2), (M3-3) or (M3-4).
(In the formula, PG, L and Cou are the same as above.)
式(M4-1)で表される化合物としては、下記式(M4-2)、(M4-3)、(M4-4)又は(M4-5)で表されるものが好ましい。
(式中、PG、L及びRは、前記と同じ。)
The compound represented by the formula (M4-1) is preferably one represented by the following formula (M4-2), (M4-3), (M4-4) or (M4-5).
(In the formula, PG, L and R are the same as above.)
式(M5-1)で表される化合物としては、下記式(M5-2)又は(M5-3)で表されるものが好ましい。
(式中、PG、L及びRは、前記と同じ。)
The compound represented by formula (M5-1) is preferably one represented by formula (M5-2) or (M5-3) below.
(In the formula, PG, L and R are the same as above.)
式(M6-1)で表される化合物としては、下記式(M6-2)、(M6-3)、又は(M6-4)で表されるものが好ましい。
(式中、PG、L及びRは、前記と同じ。)
The compound represented by the formula (M6-1) is preferably one represented by the following formula (M6-2), (M6-3), or (M6-4).
(In the formula, PG, L and R are the same as above.)
式(M1)で表される化合物としては、例えば、下記式(A-1-1-1)~(A-1-1-12)のいずれかで表されるものが挙げられる。下記式(A-1-1-1)~(A-1-1-12)中、PGは、重合性基であり、s1は、メチレン基の数を表し、2~9の整数である。R11は、-H、-CH3、-OCH3、-C(CH3)3、-C(=O)-CH3又は-CNであり、R12は、-H、-CH3、-CN又は-Fである。
Examples of the compound represented by formula (M1) include those represented by any of the following formulas (A-1-1-1) to (A-1-1-12). In the following formulas (A-1-1-1) to (A-1-1-12), PG is a polymerizable group, and s1 represents the number of methylene groups and is an integer from 2 to 9. R 11 is -H, -CH 3 , -OCH 3 , -C(CH 3 ) 3 , -C(=O)-CH 3 or -CN, and R 12 is -H, -CH 3 , - CN or -F.
更に、式(M1)で表される化合物としては、例えば、下記式(A-1-2-1)~(A-1-2-6)のいずれかで表されるものが挙げられる。下記式中、PGは、重合性基であり、s1は、前記と同じである。
(式中、Meは、メチル基を意味する。)
Furthermore, examples of the compound represented by formula (M1) include those represented by any of the following formulas (A-1-2-1) to (A-1-2-6). In the following formula, PG is a polymerizable group, and s1 is the same as above.
(In the formula, Me means a methyl group.)
式(M1)で表される化合物の具体例としては、4-(6-メタクリルオキシヘキシル-1-オキシ)ケイ皮酸、4-(6-アクリルオキシヘキシル-1-オキシ)ケイ皮酸、4-(3-メタクリルオキシプロピル-1-オキシ)ケイ皮酸、4-[4-(6-メタクリルオキシヘキシル-1-オキシ)ベンゾイルオキシ]ケイ皮酸等が挙げられる。
Specific examples of the compound represented by formula (M1) include 4-(6-methacryloxyhexyl-1-oxy)cinnamic acid, 4-(6-acryloxyhexyl-1-oxy)cinnamic acid, 4-(6-methacryloxyhexyl-1-oxy)cinnamic acid, -(3-methacryloxypropyl-1-oxy)cinnamic acid, 4-[4-(6-methacryloxyhexyl-1-oxy)benzoyloxy]cinnamic acid, and the like.
式(M2)で表される化合物としては、例えば、下記式(A-2-1)~(A-2-9)のいずれかで表されるものが挙げられる。下記式(A-2-1)~(A-2-9)中、PGは、重合性基であり、s1及びs2は、メチレン基の数を表し、それぞれ独立に、2~9の整数である。R21は、-CH3、-OCH3、-C(CH3)3、-C(=O)-CH3、-CN又は-Fである。
Examples of the compound represented by formula (M2) include those represented by any of the following formulas (A-2-1) to (A-2-9). In the following formulas (A-2-1) to (A-2-9), PG is a polymerizable group, s1 and s2 represent the number of methylene groups, and are each independently an integer of 2 to 9. be. R 21 is -CH 3 , -OCH 3 , -C(CH 3 ) 3 , -C(=O)-CH 3 , -CN or -F.
式(M3)で表される化合物としては、例えば、下記式(A-3-1)~(A-3-5)のいずれかで表されるものが挙げられる。下記式中、PGは、重合性基であり、s1は、前記と同じである。
Examples of the compound represented by formula (M3) include those represented by any of the following formulas (A-3-1) to (A-3-5). In the following formula, PG is a polymerizable group, and s1 is the same as above.
式(M4)で表される化合物としては、例えば、下記式(A-4-1)~(A-4-4)のいずれかで表されるものが挙げられる。下記式中、PGは、重合性基であり、s1は、前記と同じである。
Examples of the compound represented by formula (M4) include those represented by any of the following formulas (A-4-1) to (A-4-4). In the following formula, PG is a polymerizable group, and s1 is the same as above.
式(M5)で表される化合物としては、例えば、下記式(A-5-1)~(A-5-3)のいずれかで表されるものが挙げられる。下記式中、PGは、重合性基であり、s1は、前記と同じである。
Examples of the compound represented by formula (M5) include those represented by any of the following formulas (A-5-1) to (A-5-3). In the following formula, PG is a polymerizable group, and s1 is the same as above.
式(M6)で表される化合物としては、例えば、下記式(A-6-1)~(A-6-3)のいずれかで表されるものが挙げられる。下記式中、PGは、重合性基であり、s1は、前記と同じである。
Examples of the compound represented by formula (M6) include those represented by any of the following formulas (A-6-1) to (A-6-3). In the following formula, PG is a polymerizable group, and s1 is the same as above.
前記各モノマーは、あるものは市販されており、あるものは、例えば国際公開第2015/002292号等に記載の方法で製造できる。
Some of the above monomers are commercially available, and some can be produced, for example, by the method described in International Publication No. 2015/002292.
[式(b)で表される部位を有するモノマー(MB)]
式(b)で表される部位を有するモノマー(以下、モノマーMBともいう。)としては、下記式(bm1-1)で表される化合物が挙げられる。
式(bm1-1)中、各置換基の定義は上記式(b)中の定義と同じであり、PGは上記PGの定義と同じである。
これらモノマーのうち、あるものは市販されており、あるものは公知物質から公知の製造方法にて製造することができる。 [Monomer (MB) having a moiety represented by formula (b)]
Examples of the monomer having a moiety represented by formula (b) (hereinafter also referred to as monomer MB) include a compound represented by the following formula (bm1-1).
In formula (bm1-1), the definitions of each substituent are the same as those in formula (b) above, and PG is the same as the definition of PG above.
Some of these monomers are commercially available, and others can be produced from known substances by known production methods.
式(b)で表される部位を有するモノマー(以下、モノマーMBともいう。)としては、下記式(bm1-1)で表される化合物が挙げられる。
これらモノマーのうち、あるものは市販されており、あるものは公知物質から公知の製造方法にて製造することができる。 [Monomer (MB) having a moiety represented by formula (b)]
Examples of the monomer having a moiety represented by formula (b) (hereinafter also referred to as monomer MB) include a compound represented by the following formula (bm1-1).
Some of these monomers are commercially available, and others can be produced from known substances by known production methods.
式(b)で表される部位を有するモノマーMBの好ましい例としては、例えば、下記式MB-1~MB-10が挙げられる。
(式中、s1はメチレン基の数を表し、2~9の整数である。)
Preferred examples of the monomer MB having a moiety represented by formula (b) include the following formulas MB-1 to MB-10.
(In the formula, s1 represents the number of methylene groups and is an integer from 2 to 9.)
[液晶性のみを発現する構造を有するモノマー(MC)]
上記式(b)で表される構造以外の、液晶性のみを発現する構造を有するモノマー(以下、モノマーMCともいう。)の一例としては、側鎖にメソゲン基を形成することができるモノマーが挙げられる。 [Monomer (MC) having a structure that exhibits only liquid crystallinity]
An example of a monomer having a structure that exhibits only liquid crystallinity (hereinafter also referred to as monomer MC) other than the structure represented by the above formula (b) is a monomer that can form a mesogenic group in its side chain. Can be mentioned.
上記式(b)で表される構造以外の、液晶性のみを発現する構造を有するモノマー(以下、モノマーMCともいう。)の一例としては、側鎖にメソゲン基を形成することができるモノマーが挙げられる。 [Monomer (MC) having a structure that exhibits only liquid crystallinity]
An example of a monomer having a structure that exhibits only liquid crystallinity (hereinafter also referred to as monomer MC) other than the structure represented by the above formula (b) is a monomer that can form a mesogenic group in its side chain. Can be mentioned.
前記メソゲン基としては、ビフェニルやフェニルベンゾエート等の単独でメソゲン構造となる基であっても、安息香酸等のように側鎖同士が水素結合することでメソゲン構造となる基であってもよい。側鎖の有するメソゲン基としては、下記式(b1)~(b11)のいずれかで表される構造が好ましい。
The mesogenic group may be a group that forms a mesogenic structure by itself, such as biphenyl or phenylbenzoate, or a group that forms a mesogenic structure by hydrogen bonding between side chains, such as benzoic acid. The mesogenic group possessed by the side chain preferably has a structure represented by any of the following formulas (b1) to (b11).
モノマーMCの具体例としては、炭化水素、(メタ)アクリレート、イタコネート、フマレート、マレエート、α-メチレン-γ-ブチロラクトン、スチレン、ビニル、マレイミド、ノルボルネン等のラジカル重合性基及びシロキサンからなる群から選択される少なくとも1種に由来する重合性基と、上記式(b1)~(b11)の少なくとも1種からなる構造を有する構造であることが好ましい。特に、モノマーMCは、(メタ)アクリレートに由来する重合性基を有するものが好ましい。
Specific examples of the monomer MC include hydrocarbons, radically polymerizable groups such as (meth)acrylate, itaconate, fumarate, maleate, α-methylene-γ-butyrolactone, styrene, vinyl, maleimide, norbornene, and siloxane. It is preferable that the structure has a polymerizable group derived from at least one of the above formulas (b1) to (b11). In particular, the monomer MC preferably has a polymerizable group derived from (meth)acrylate.
モノマーMCの好ましい例としては、下記式(MC-1)~(MC-10)で表されるものが挙げられる。なお、下記式中、PGは、重合性基であり、pは、メチレン基の数を表し、2~9の整数である。
Preferred examples of monomer MC include those represented by the following formulas (MC-1) to (MC-10). In the following formula, PG is a polymerizable group, p represents the number of methylene groups, and is an integer from 2 to 9.
また、光反応性及び/又は液晶性の発現能を損なわない範囲でその他のモノマーと共重合することができる。その他のモノマーとしては、例えば工業的に入手できるラジカル重合反応可能なモノマーが挙げられる。
In addition, it can be copolymerized with other monomers within a range that does not impair the ability to develop photoreactivity and/or liquid crystallinity. Other monomers include, for example, industrially available monomers capable of radical polymerization.
その他のモノマーの具体例としては、不飽和カルボン酸、アクリル酸エステル化合物、メタクリル酸エステル化合物、マレイミド化合物、アクリロニトリル、マレイン酸無水物、スチレン化合物及びビニル化合物等が挙げられる。
Specific examples of other monomers include unsaturated carboxylic acids, acrylic ester compounds, methacrylic ester compounds, maleimide compounds, acrylonitrile, maleic anhydride, styrene compounds, and vinyl compounds.
不飽和カルボン酸の具体例としてはアクリル酸、メタクリル酸、イタコン酸、マレイン酸、フマル酸などが挙げられる。
Specific examples of unsaturated carboxylic acids include acrylic acid, methacrylic acid, itaconic acid, maleic acid, and fumaric acid.
アクリル酸エステル化合物としては、例えば、メチルアクリレート、エチルアクリレート、イソプロピルアクリレート、ベンジルアクリレート、ナフチルアクリレート、アントリルアクリレート、アントリルメチルアクリレート、フェニルアクリレート、2,2,2-トリフルオロエチルアクリレート、tert-ブチルアクリレート、シクロヘキシルアクリレート、イソボルニルアクリレート、2-メトキシエチルアクリレート、メトキシトリエチレングリコールアクリレート、2-エトキシエチルアクリレート、テトラヒドロフルフリルアクリレート、3-メトキシブチルアクリレート、2-メチル-2-アダマンチルアクリレート、2-プロピル-2-アダマンチルアクリレート、8-メチル-8-トリシクロデシルアクリレート、及び、8-エチル-8-トリシクロデシルアクリレート等が挙げられる。
Examples of acrylic ester compounds include methyl acrylate, ethyl acrylate, isopropyl acrylate, benzyl acrylate, naphthyl acrylate, anthryl acrylate, anthryl methyl acrylate, phenyl acrylate, 2,2,2-trifluoroethyl acrylate, and tert-butyl acrylate. Acrylate, cyclohexyl acrylate, isobornyl acrylate, 2-methoxyethyl acrylate, methoxytriethylene glycol acrylate, 2-ethoxyethyl acrylate, tetrahydrofurfuryl acrylate, 3-methoxybutyl acrylate, 2-methyl-2-adamantyl acrylate, 2- Examples include propyl-2-adamantyl acrylate, 8-methyl-8-tricyclodecyl acrylate, and 8-ethyl-8-tricyclodecyl acrylate.
メタクリル酸エステル化合物としては、例えば、メチルメタクリレート、エチルメタクリレート、イソプロピルメタクリレート、ベンジルメタクリレート、ナフチルメタクリレート、アントリルメタクリレート、アントリルメチルメタクリレート、フェニルメタクリレート、2,2,2-トリフルオロエチルメタクリレート、tert-ブチルメタクリレート、シクロヘキシルメタクリレート、イソボルニルメタクリレート、2-メトキシエチルメタクリレート、メトキシトリエチレングリコールメタクリレート、2-エトキシエチルメタクリレート、テトラヒドロフルフリルメタクリレート、3-メトキシブチルメタクリレート、2-メチル-2-アダマンチルメタクリレート、2-プロピル-2-アダマンチルメタクリレート、8-メチル-8-トリシクロデシルメタクリレート、及び、8-エチル-8-トリシクロデシルメタクリレート等が挙げられる。
Examples of methacrylic acid ester compounds include methyl methacrylate, ethyl methacrylate, isopropyl methacrylate, benzyl methacrylate, naphthyl methacrylate, anthryl methacrylate, anthryl methyl methacrylate, phenyl methacrylate, 2,2,2-trifluoroethyl methacrylate, and tert-butyl. Methacrylate, cyclohexyl methacrylate, isobornyl methacrylate, 2-methoxyethyl methacrylate, methoxytriethylene glycol methacrylate, 2-ethoxyethyl methacrylate, tetrahydrofurfuryl methacrylate, 3-methoxybutyl methacrylate, 2-methyl-2-adamantyl methacrylate, 2- Examples include propyl-2-adamantyl methacrylate, 8-methyl-8-tricyclodecyl methacrylate, and 8-ethyl-8-tricyclodecyl methacrylate.
ビニル化合物としては、例えば、ビニルエーテル、メチルビニルエーテル、ベンジルビニルエーテル、2-ヒドロキシエチルビニルエーテル、フェニルビニルエーテル、及び、プロピルビニルエーテル等が挙げられる。
スチレン化合物としては、例えば、スチレン、メチルスチレン、クロロスチレン、ブロモスチレン等が挙げられる。
マレイミド化合物としては、例えば、マレイミド、N-メチルマレイミド、N-フェニルマレイミド、及びN-シクロヘキシルマレイミド等が挙げられる。 Examples of the vinyl compound include vinyl ether, methyl vinyl ether, benzyl vinyl ether, 2-hydroxyethyl vinyl ether, phenyl vinyl ether, and propyl vinyl ether.
Examples of the styrene compound include styrene, methylstyrene, chlorostyrene, and bromostyrene.
Examples of maleimide compounds include maleimide, N-methylmaleimide, N-phenylmaleimide, and N-cyclohexylmaleimide.
スチレン化合物としては、例えば、スチレン、メチルスチレン、クロロスチレン、ブロモスチレン等が挙げられる。
マレイミド化合物としては、例えば、マレイミド、N-メチルマレイミド、N-フェニルマレイミド、及びN-シクロヘキシルマレイミド等が挙げられる。 Examples of the vinyl compound include vinyl ether, methyl vinyl ether, benzyl vinyl ether, 2-hydroxyethyl vinyl ether, phenyl vinyl ether, and propyl vinyl ether.
Examples of the styrene compound include styrene, methylstyrene, chlorostyrene, and bromostyrene.
Examples of maleimide compounds include maleimide, N-methylmaleimide, N-phenylmaleimide, and N-cyclohexylmaleimide.
本発明の側鎖型高分子における側鎖(a1)の含有量は、光反応性の点から、5~99.9モル%が好ましく、5~50モル%がより好ましく、光安定性の観点から5~20モル%がより一層好ましい。
The content of the side chain (a1) in the side chain type polymer of the present invention is preferably 5 to 99.9 mol%, more preferably 5 to 50 mol%, from the viewpoint of photoreactivity, and from the viewpoint of photostability. 5 to 20 mol% is even more preferable.
本発明の側鎖型高分子における側鎖(a2)の含有量は、位相差値の観点から、5~95モル%が好ましく、5~80モル%がより好ましく、5~50モル%が更に好ましい。
The content of the side chain (a2) in the side chain type polymer of the present invention is preferably 5 to 95 mol%, more preferably 5 to 80 mol%, and still more preferably 5 to 50 mol%, from the viewpoint of retardation value. preferable.
本発明で用いる側鎖型高分子は、液晶性のみを発現する側鎖(a3)を有することが好ましい。また、その他の側鎖を含んでいてもよい。側鎖(a3)及びその他の側鎖の含有量は、側鎖(a1)及び側鎖(a2)の含有量の合計が100モル%に満たない場合に、その残りの部分である。
The side chain type polymer used in the present invention preferably has a side chain (a3) that exhibits only liquid crystallinity. It may also contain other side chains. The content of side chains (a3) and other side chains is the remaining portion when the total content of side chains (a1) and side chains (a2) is less than 100 mol%.
(A)成分である重合体の製造方法については、特に限定されるものではなく、工業的に扱われている汎用な方法が利用できる。具体的には、上述の上記モノマーMA、モノマーMB、所望によりモノマーMC、及び、所望によりその他モノマーのビニル基を利用したカチオン重合やラジカル重合、アニオン重合により製造することができる。これらの中では反応制御のしやすさなどの観点からラジカル重合が特に好ましい。
The method for producing the polymer that is component (A) is not particularly limited, and any industrially-used general-purpose method can be used. Specifically, it can be produced by cationic polymerization, radical polymerization, or anionic polymerization using the above-mentioned monomer MA, monomer MB, optionally monomer MC, and optionally the vinyl group of other monomers. Among these, radical polymerization is particularly preferred from the viewpoint of ease of reaction control.
ラジカル重合の重合開始剤としては、ラジカル重合開始剤や、可逆的付加-開裂型連鎖移動(RAFT)重合試薬等の公知の化合物を使用することができる。
As the polymerization initiator for radical polymerization, known compounds such as radical polymerization initiators and reversible addition-fragmentation chain transfer (RAFT) polymerization reagents can be used.
ラジカル熱重合開始剤は、分解温度以上に加熱することにより、ラジカルを発生させる化合物である。このようなラジカル熱重合開始剤としては、例えば、ケトンパーオキサイド類(メチルエチルケトンパーオキサイド、シクロヘキサノンパーオキサイド等)、ジアシルパーオキサイド類(アセチルパーオキサイド、ベンゾイルパーオキサイド等)、ハイドロパーオキサイド類(過酸化水素、tert-ブチルハイドパーオキサイド、クメンハイドロパーオキサイド等)、ジアルキルパーオキサイド類(ジ-tert-ブチルパーオキサイド、ジクミルパーオキサイド、ジラウロイルパーオキサイド等)、パーオキシケタール類(ジブチルパーオキシ シクロヘキサン等)、アルキルパーエステル類(パーオキシネオデカン酸-tert-ブチルエステル、パーオキシピバリン酸-tert-ブチルエステル、パーオキシ 2-エチルシクロヘキサン酸-tert-アミルエステル等)、過硫酸塩類(過硫酸カリウム、過硫酸ナトリウム、過硫酸アンモニウム等)、アゾ系化合物(アゾビスイソブチロニトリル、および2,2′-ジ(2-ヒドロキシエチル)アゾビスイソブチロニトリル等)が挙げられる。このようなラジカル熱重合開始剤は、1種を単独で使用することもできるし、あるいは2種以上を組み合わせて使用することもできる。
A radical thermal polymerization initiator is a compound that generates radicals when heated above the decomposition temperature. Such radical thermal polymerization initiators include, for example, ketone peroxides (methyl ethyl ketone peroxide, cyclohexanone peroxide, etc.), diacyl peroxides (acetyl peroxide, benzoyl peroxide, etc.), hydroperoxides (peroxide Hydrogen, tert-butyl hydroperoxide, cumene hydroperoxide, etc.), dialkyl peroxides (di-tert-butyl peroxide, dicumyl peroxide, dilauroyl peroxide, etc.), peroxyketals (dibutyl peroxy, cyclohexane, etc.) etc.), alkyl peresters (peroxyneodecanoic acid tert-butyl ester, peroxypivalic acid tert-butyl ester, peroxy 2-ethylcyclohexanoic acid tert-amyl ester, etc.), persulfates (potassium persulfate, sodium persulfate, ammonium persulfate, etc.), and azo compounds (azobisisobutyronitrile, 2,2'-di(2-hydroxyethyl)azobisisobutyronitrile, etc.). Such radical thermal polymerization initiators can be used alone or in combination of two or more.
ラジカル光重合開始剤は、ラジカル重合を光照射によって開始する化合物であれば特に限定されない。このようなラジカル光重合開始剤としては、ベンゾフェノン、ミヒラーズケトン、4,4’-ビス(ジエチルアミノ)ベンゾフェノン、キサントン、チオキサントン、イソプロピルキサントン、2,4-ジエチルチオキサントン、2-エチルアントラキノン、アセトフェノン、2-ヒドロキシ-2-メチルプロピオフェノン、2-ヒドロキシ-2-メチル-4’-イソプロピルプロピオフェノン、1-ヒドロキシシクロヘキシルフェニルケトン、イソプロピルベンゾインエーテル、イソブチルベンゾインエーテル、2,2-ジエトキシアセトフェノン、2,2-ジメトキシ-2-フェニルアセトフェノン、カンファーキノン、ベンズアントロン、2-メチル-1-[4-(メチルチオ)フェニル]-2-モルホリノプロパン-1-オン、2-ベンジル-2-ジメチルアミノ-1-(4-モルホリノフェニル)-ブタノン-1、4-ジメチルアミノ安息香酸エチル、4-ジメチルアミノ安息香酸イソアミル、4,4’-ビス(tert-ブチルペルオキシカルボニル)ベンゾフェノン、3,4,4’-トリス(tert-ブチルペルオキシカルボニル)ベンゾフェノン、2,4,6-トリメチルベンゾイルジフェニルフォスフィンオキサイド、2-(4’-メトキシスチリル)-4,6-ビス(トリクロロメチル)-s-トリアジン、2-(3’,4’-ジメトキシスチリル)-4,6-ビス(トリクロロメチル)-s-トリアジン、2-(2’,4’-ジメトキシスチリル)-4,6-ビス(トリクロロメチル)-s-トリアジン、2-(2’-メトキシスチリル)-4,6-ビス(トリクロロメチル)-s-トリアジン、2-(4’-ペンチルオキシスチリル)-4,6-ビス(トリクロロメチル)-s-トリアジン、4-[p-N,N-ビス(エトキシカルボニルメチル)]-2,6-ビス(トリクロロメチル)-s-トリアジン、1,3-ビス(トリクロロメチル)-5-(2’-クロロフェニル)-s-トリアジン、1,3-ビス(トリクロロメチル)-5-(4’-メトキシフェニル)-s-トリアジン、2-(p-ジメチルアミノスチリル)ベンズオキサゾール、2-(p-ジメチルアミノスチリル)ベンズチアゾール、2-メルカプトベンゾチアゾール、3,3’-カルボニルビス(7-ジエチルアミノクマリン)、2-(o-クロロフェニル)-4,4’,5,5’-テトラフェニル-1,2’-ビイミダゾール、2,2’-ビス(2-クロロフェニル)-4,4’,5,5’-テトラキス(4-エトキシカルボニルフェニル)-1,2’-ビイミダゾール、2,2’-ビス(2,4-ジクロロフェニル)-4,4’,5,5’-テトラフェニル-1,2’-ビイミダゾール、2,2’ビス(2,4-ジブロモフェニル)-4,4’,5,5’-テトラフェニル-1,2’-ビイミダゾール、2,2’-ビス(2,4,6-トリクロロフェニル)-4,4’,5,5’-テトラフェニル-1,2’-ビイミダゾール、3-(2-メチル-2-ジメチルアミノプロピオニル)カルバゾール、3,6-ビス(2-メチル-2-モルホリノプロピオニル)-9-n-ドデシルカルバゾール、1-ヒドロキシシクロヘキシルフェニルケトン、ビス(5-2,4-シクロペンタジエン-1-イル)-ビス(2,6-ジフルオロ-3-(1H-ピロール-1-イル)-フェニル)チタニウム、3,3’,4,4’-テトラキス(tert-ブチルペルオキシカルボニル)ベンゾフェノン、3,3’,4,4’-テトラキス(tert-ヘキシルペルオキシカルボニル)ベンゾフェノン、3,3’-ビス(メトキシカルボニル)-4,4’-ビス(tert-ブチルペルオキシカルボニル)ベンゾフェノン、3,4’-ビス(メトキシカルボニル)-4,3’-ビス(tert-ブチルペルオキシカルボニル)ベンゾフェノン、4,4’-ビス(メトキシカルボニル)-3,3’-ビス(tert-ブチルペルオキシカルボニル)ベンゾフェノン、2-(3-メチル-3H-ベンゾチアゾール-2-イリデン)-1-ナフタレン-2-イル-エタノン、又は2-(3-メチル-1,3-ベンゾチアゾール-2(3H)-イリデン)-1-(2-ベンゾイル)エタノン等を挙げることができる。これらの化合物は単独で使用してもよく、2つ以上を混合して使用することもできる。
The radical photopolymerization initiator is not particularly limited as long as it is a compound that initiates radical polymerization by light irradiation. Such radical photopolymerization initiators include benzophenone, Michler's ketone, 4,4'-bis(diethylamino)benzophenone, xanthone, thioxanthone, isopropylxanthone, 2,4-diethylthioxanthone, 2-ethylanthraquinone, acetophenone, 2-hydroxy -2-Methylpropiophenone, 2-hydroxy-2-methyl-4'-isopropylpropiophenone, 1-hydroxycyclohexylphenyl ketone, isopropylbenzoin ether, isobutylbenzoin ether, 2,2-diethoxyacetophenone, 2,2 -dimethoxy-2-phenylacetophenone, camphorquinone, benzanthrone, 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinopropan-1-one, 2-benzyl-2-dimethylamino-1-( 4-morpholinophenyl)-butanone-1, ethyl 4-dimethylaminobenzoate, isoamyl 4-dimethylaminobenzoate, 4,4'-bis(tert-butylperoxycarbonyl)benzophenone, 3,4,4'-tris( tert-butylperoxycarbonyl)benzophenone, 2,4,6-trimethylbenzoyldiphenylphosphine oxide, 2-(4'-methoxystyryl)-4,6-bis(trichloromethyl)-s-triazine, 2-(3' , 4'-dimethoxystyryl)-4,6-bis(trichloromethyl)-s-triazine, 2-(2',4'-dimethoxystyryl)-4,6-bis(trichloromethyl)-s-triazine, 2 -(2'-methoxystyryl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4'-pentyloxystyryl)-4,6-bis(trichloromethyl)-s-triazine, 4- [p-N,N-bis(ethoxycarbonylmethyl)]-2,6-bis(trichloromethyl)-s-triazine, 1,3-bis(trichloromethyl)-5-(2'-chlorophenyl)-s- Triazine, 1,3-bis(trichloromethyl)-5-(4'-methoxyphenyl)-s-triazine, 2-(p-dimethylaminostyryl)benzoxazole, 2-(p-dimethylaminostyryl)benzthiazole, 2-mercaptobenzothiazole, 3,3'-carbonylbis(7-diethylaminocoumarin), 2-(o-chlorophenyl)-4,4',5,5'-tetraphenyl-1,2'-biimidazole, 2 , 2'-bis(2-chlorophenyl)-4,4',5,5'-tetrakis(4-ethoxycarbonylphenyl)-1,2'-biimidazole, 2,2'-bis(2,4-dichlorophenyl) )-4,4',5,5'-tetraphenyl-1,2'-biimidazole, 2,2'bis(2,4-dibromophenyl)-4,4',5,5'-tetraphenyl- 1,2'-biimidazole, 2,2'-bis(2,4,6-trichlorophenyl)-4,4',5,5'-tetraphenyl-1,2'-biimidazole, 3-(2 -Methyl-2-dimethylaminopropionyl)carbazole, 3,6-bis(2-methyl-2-morpholinopropionyl)-9-n-dodecylcarbazole, 1-hydroxycyclohexyl phenylketone, bis(5-2,4-cyclo Pentadien-1-yl)-bis(2,6-difluoro-3-(1H-pyrrol-1-yl)-phenyl)titanium, 3,3',4,4'-tetrakis(tert-butylperoxycarbonyl)benzophenone , 3,3',4,4'-tetrakis(tert-hexylperoxycarbonyl)benzophenone, 3,3'-bis(methoxycarbonyl)-4,4'-bis(tert-butylperoxycarbonyl)benzophenone, 3,4 '-Bis(methoxycarbonyl)-4,3'-bis(tert-butylperoxycarbonyl)benzophenone, 4,4'-bis(methoxycarbonyl)-3,3'-bis(tert-butylperoxycarbonyl)benzophenone, 2 -(3-Methyl-3H-benzothiazol-2-ylidene)-1-naphthalen-2-yl-ethanone, or 2-(3-methyl-1,3-benzothiazol-2(3H)-ylidene)-1 -(2-benzoyl)ethanone and the like. These compounds may be used alone or in combination of two or more.
ラジカル重合法は、特に制限されるものでなく、乳化重合法、懸濁重合法、分散重合法、沈殿重合法、塊状重合法、溶液重合法等を用いることができる。
The radical polymerization method is not particularly limited, and emulsion polymerization, suspension polymerization, dispersion polymerization, precipitation polymerization, bulk polymerization, solution polymerization, etc. can be used.
重合反応に用いる有機溶媒としては、生成したポリマーが溶解するものであれば特に限定されない。その具体例を以下に挙げる。
The organic solvent used in the polymerization reaction is not particularly limited as long as it dissolves the produced polymer. Specific examples are listed below.
N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド、N-メチル-2-ピロリドン、N-エチル-2-ピロリドン、N-メチルカプロラクタム、ジメチルスルホキシド、テトラメチル尿素、ピリジン、ジメチルスルホン、ヘキサメチルスルホキシド、γ-ブチロラクトン、イソプロピルアルコール、シクロヘキサノール、シクロペンタノール、メトキシメチルペンタノール、ジペンテン、エチルアミルケトン、メチルノニルケトン、メチルエチルケトン、メチルイソアミルケトン、メチルイソプロピルケトン、メチルセルソルブ、エチルセルソルブ、メチルセロソルブアセテート、エチルセロソルブアセテート、ブチルカルビトール、エチルカルビトール、エチレングリコール、エチレングリコールモノアセテート、エチレングリコールモノイソプロピルエーテル、エチレングリコールモノブチルエーテル、プロピレングリコール、プロピレングリコールモノアセテート、プロピレングリコールモノメチルエーテル、プロピレングリコール-tert-ブチルエーテル、ジエチレングリコール、ジエチレングリコールモノアセテート、ジエチレングリコールジメチルエーテル、ジプロピレングリコールモノアセテートモノメチルエーテル、ジプロピレングリコールモノメチルエーテル、ジプロピレングリコールモノエチルエーテル、ジプロピレングリコールモノアセテートモノエチルエーテル、ジプロピレングリコールモノプロピルエーテル、ジプロピレングリコールモノアセテートモノプロピルエーテル、3-メチル-3-メトキシブチルアセテート、トリプロピレングリコールメチルエーテル、3-メチル-3-メトキシブタノール、ジイソプロピルエーテル、エチルイソブチルエーテル、ジイソブチレン、アミルアセテート、ブチルブチレート、ブチルエーテル、ジイソブチルケトン、メチルシクロへキセン、プロピルエーテル、ジヘキシルエーテル、ジオキサン、n-へキサン、n-ペンタン、n-オクタン、ジエチルエーテル、シクロヘキサノン、シクロペンタノン、エチレンカーボネート、プロピレンカーボネート、乳酸メチル、乳酸エチル、酢酸メチル、酢酸エチル、酢酸n-ブチル、酢酸プロピレングリコールモノエチルエーテル、ピルビン酸メチル、ピルビン酸エチル、3-メトキシプロピオン酸メチル、3-エトキシプロピオン酸メチルエチル、3-メトキシプロピオン酸エチル、3-エトキシプロピオン酸、3-メトキシプロピオン酸、3-メトキシプロピオン酸プロピル、3-メトキシプロピオン酸ブチル、ジグライム、4-ヒドロキシ-4-メチル-2-ペンタノン、3-メトキシ-N,N-ジメチルプロパンアミド、3-エトキシ-N,N-ジメチルプロパンアミド、3-ブトキシ-N,N-ジメチルプロパンアミド、テトラヒドロフラン等が挙げられる。
N,N-dimethylformamide, N,N-dimethylacetamide, N-methyl-2-pyrrolidone, N-ethyl-2-pyrrolidone, N-methylcaprolactam, dimethylsulfoxide, tetramethylurea, pyridine, dimethylsulfone, hexamethylsulfoxide , γ-butyrolactone, isopropyl alcohol, cyclohexanol, cyclopentanol, methoxymethylpentanol, dipentene, ethyl amyl ketone, methyl nonyl ketone, methyl ethyl ketone, methyl isoamyl ketone, methyl isopropyl ketone, methyl cellosolve, ethyl cellosolve, methyl cellosolve Acetate, ethyl cellosolve acetate, butyl carbitol, ethyl carbitol, ethylene glycol, ethylene glycol monoacetate, ethylene glycol monoisopropyl ether, ethylene glycol monobutyl ether, propylene glycol, propylene glycol monoacetate, propylene glycol monomethyl ether, propylene glycol-tert -Butyl ether, diethylene glycol, diethylene glycol monoacetate, diethylene glycol dimethyl ether, dipropylene glycol monoacetate monomethyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol monoacetate monoethyl ether, dipropylene glycol monopropyl ether, Propylene glycol monoacetate monopropyl ether, 3-methyl-3-methoxybutyl acetate, tripropylene glycol methyl ether, 3-methyl-3-methoxybutanol, diisopropyl ether, ethyl isobutyl ether, diisobutylene, amyl acetate, butyl butyrate, Butyl ether, diisobutyl ketone, methylcyclohexene, propyl ether, dihexyl ether, dioxane, n-hexane, n-pentane, n-octane, diethyl ether, cyclohexanone, cyclopentanone, ethylene carbonate, propylene carbonate, methyl lactate, ethyl lactate , methyl acetate, ethyl acetate, n-butyl acetate, propylene glycol monoethyl acetate, methyl pyruvate, ethyl pyruvate, methyl 3-methoxypropionate, methylethyl 3-ethoxypropionate, ethyl 3-methoxypropionate, 3 -Ethoxypropionic acid, 3-methoxypropionic acid, propyl 3-methoxypropionate, butyl 3-methoxypropionate, diglyme, 4-hydroxy-4-methyl-2-pentanone, 3-methoxy-N,N-dimethylpropanamide , 3-ethoxy-N,N-dimethylpropanamide, 3-butoxy-N,N-dimethylpropanamide, and tetrahydrofuran.
これら有機溶媒は単独で使用しても、混合して使用してもよい。さらに、生成するポリマーを溶解させない溶媒であっても、生成したポリマーが析出しない範囲で、上述の有機溶媒に混合して使用してもよい。
また、ラジカル重合において有機溶媒中の酸素は重合反応を阻害する原因となるので、有機溶媒は可能な程度に脱気されたものを用いることが好ましい。 These organic solvents may be used alone or in combination. Furthermore, even a solvent that does not dissolve the produced polymer may be mixed with the above-mentioned organic solvent and used as long as the produced polymer does not precipitate.
Further, in radical polymerization, oxygen in an organic solvent becomes a cause of inhibiting the polymerization reaction, so it is preferable to use an organic solvent that has been degassed to the extent possible.
また、ラジカル重合において有機溶媒中の酸素は重合反応を阻害する原因となるので、有機溶媒は可能な程度に脱気されたものを用いることが好ましい。 These organic solvents may be used alone or in combination. Furthermore, even a solvent that does not dissolve the produced polymer may be mixed with the above-mentioned organic solvent and used as long as the produced polymer does not precipitate.
Further, in radical polymerization, oxygen in an organic solvent becomes a cause of inhibiting the polymerization reaction, so it is preferable to use an organic solvent that has been degassed to the extent possible.
ラジカル重合の際の重合温度は30~150℃の任意の温度を選択することができるが、好ましくは50~100℃の範囲である。また、反応は任意の濃度で行うことができるが、濃度が低すぎると高分子量の重合体を得ることが難しくなり、濃度が高すぎると反応液の粘性が高くなり過ぎて均一な撹拌が困難となるので、モノマー濃度が、好ましくは1~50質量%、より好ましくは5~30質量%である。反応初期は高濃度で行い、その後、有機溶媒を追加することができる。
The polymerization temperature during radical polymerization can be any temperature in the range of 30 to 150°C, but is preferably in the range of 50 to 100°C. In addition, the reaction can be carried out at any concentration, but if the concentration is too low, it will be difficult to obtain a high molecular weight polymer, and if the concentration is too high, the viscosity of the reaction solution will become too high, making it difficult to stir uniformly. Therefore, the monomer concentration is preferably 1 to 50% by weight, more preferably 5 to 30% by weight. The initial stage of the reaction can be carried out at a high concentration, and then an organic solvent can be added.
上述のラジカル重合反応においては、ラジカル重合開始剤の比率がモノマーに対して多いと得られる高分子の分子量が小さくなり、少ないと得られる高分子の分子量が大きくなるので、ラジカル開始剤の比率は重合させるモノマーに対して0.1~15モル%であることが好ましい。また重合時には各種モノマー成分や溶媒、開始剤などを追加することもできる。
In the above-mentioned radical polymerization reaction, if the ratio of the radical polymerization initiator to the monomer is large, the molecular weight of the obtained polymer will be small, and if it is small, the molecular weight of the obtained polymer will be large. The amount is preferably 0.1 to 15 mol % based on the monomer to be polymerized. Furthermore, various monomer components, solvents, initiators, etc. can be added during polymerization.
[重合体の回収]
上述の反応により得られた反応溶液から、生成したポリマーを回収する場合には、反応溶液を貧溶媒に投入して、それら重合体を沈殿させれば良い。沈殿に用いる貧溶媒としては、メタノール、アセトン、ヘキサン、ヘプタン、ブチルセルソルブ、ヘプタン、メチルエチルケトン、メチルイソブチルケトン、エタノール、トルエン、ベンゼン、ジエチルエーテル、メチルエチルエーテル、水等を挙げることができる。貧溶媒に投入して沈殿させた重合体は、濾過して回収した後、常圧あるいは減圧下で、常温あるいは加熱して乾燥することができる。また、沈殿回収した重合体を、有機溶媒に再溶解させ、再沈殿回収する操作を2~10回繰り返すと、重合体中の不純物を少なくすることができる。この際の貧溶媒として、例えば、アルコール類、ケトン類、炭化水素等が挙げられ、これらの中から選ばれる3種類以上の貧溶媒を用いると、より一層精製の効率が上がるので好ましい。 [Polymer recovery]
When recovering produced polymers from the reaction solution obtained by the above-described reaction, the reaction solution may be poured into a poor solvent to precipitate the polymers. Examples of the poor solvent used for precipitation include methanol, acetone, hexane, heptane, butyl cellosolve, heptane, methyl ethyl ketone, methyl isobutyl ketone, ethanol, toluene, benzene, diethyl ether, methyl ethyl ether, water, and the like. The polymer precipitated in a poor solvent can be collected by filtration and then dried under normal pressure or reduced pressure, at room temperature or by heating. Further, by repeating the operation of redissolving the precipitated and recovered polymer in an organic solvent and reprecipitating and recovering it 2 to 10 times, the amount of impurities in the polymer can be reduced. Examples of the poor solvent in this case include alcohols, ketones, hydrocarbons, etc. It is preferable to use three or more types of poor solvents selected from these, since the efficiency of purification will further increase.
上述の反応により得られた反応溶液から、生成したポリマーを回収する場合には、反応溶液を貧溶媒に投入して、それら重合体を沈殿させれば良い。沈殿に用いる貧溶媒としては、メタノール、アセトン、ヘキサン、ヘプタン、ブチルセルソルブ、ヘプタン、メチルエチルケトン、メチルイソブチルケトン、エタノール、トルエン、ベンゼン、ジエチルエーテル、メチルエチルエーテル、水等を挙げることができる。貧溶媒に投入して沈殿させた重合体は、濾過して回収した後、常圧あるいは減圧下で、常温あるいは加熱して乾燥することができる。また、沈殿回収した重合体を、有機溶媒に再溶解させ、再沈殿回収する操作を2~10回繰り返すと、重合体中の不純物を少なくすることができる。この際の貧溶媒として、例えば、アルコール類、ケトン類、炭化水素等が挙げられ、これらの中から選ばれる3種類以上の貧溶媒を用いると、より一層精製の効率が上がるので好ましい。 [Polymer recovery]
When recovering produced polymers from the reaction solution obtained by the above-described reaction, the reaction solution may be poured into a poor solvent to precipitate the polymers. Examples of the poor solvent used for precipitation include methanol, acetone, hexane, heptane, butyl cellosolve, heptane, methyl ethyl ketone, methyl isobutyl ketone, ethanol, toluene, benzene, diethyl ether, methyl ethyl ether, water, and the like. The polymer precipitated in a poor solvent can be collected by filtration and then dried under normal pressure or reduced pressure, at room temperature or by heating. Further, by repeating the operation of redissolving the precipitated and recovered polymer in an organic solvent and reprecipitating and recovering it 2 to 10 times, the amount of impurities in the polymer can be reduced. Examples of the poor solvent in this case include alcohols, ketones, hydrocarbons, etc. It is preferable to use three or more types of poor solvents selected from these, since the efficiency of purification will further increase.
本発明の(A)側鎖型高分子の分子量は、得られる塗膜の強度、塗膜形成時の作業性、および塗膜の均一性を考慮した場合、GPC(Gel Permeation Chromatography)法で測定した重量平均分子量が、2,000~2,000,000が好ましく、より好ましくは、5,000~150,000である。あるいは、前記重量平均分子量は、2,000~1,000,000であることも好ましく、より好ましくは、5,000~200,000である。
The molecular weight of the side chain type polymer (A) of the present invention is determined by the GPC (Gel Permeation Chromatography) method, taking into consideration the strength of the resulting coating film, workability during coating film formation, and uniformity of the coating film. The weight average molecular weight is preferably 2,000 to 2,000,000, more preferably 5,000 to 150,000. Alternatively, the weight average molecular weight is preferably 2,000 to 1,000,000, more preferably 5,000 to 200,000.
<<(B)有機溶媒>>
本発明に用いられる重合体組成物に用いる有機溶媒は、樹脂成分を溶解させる有機溶媒であれば特に限定されない。その具体例を以下に挙げる。
N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド、N-メチル-2-ピロリドン、N-メチル-ε-カプロラクタム、2-ピロリドン、N-エチル-2-ピロリドン、N-ビニル-2-ピロリドン、ジメチルスルホキシド、テトラメチル尿素、ピリジン、ジメチルスルホン、ヘキサメチルホスホルアミド、γ-ブチロラクトン、3-メトキシ-N,N-ジメチルプロパンアミド、3-エトキシ-N,N-ジメチルプロパンアミド、3-ブトキシ-N,N-ジメチルプロパンアミド、1,3-ジメチル-イミダゾリジノン、シクロヘキサノン、シクロペンタノン、エチレンカーボネート、プロピレンカーボネート、ジグライム、4-ヒドロキシ-4-メチル-2-ペンタノン、プロピレングリコールモノメチルエーテル、プロピレングリコール-tert-ブチルエーテル、ジエチレングリコール、ジプロピレングリコールモノアセテートモノメチルエーテル、ジプロピレングリコールモノメチルエーテル、ジプロピレングリコールモノエチルエーテル、ジプロピレングリコールモノプロピルエーテル、トリプロピレングリコールメチルエーテル、テトラヒドロフラン等が挙げられる。これらは単独で使用しても、混合して使用してもよい。 <<(B) Organic solvent>>
The organic solvent used in the polymer composition used in the present invention is not particularly limited as long as it can dissolve the resin component. Specific examples are listed below.
N,N-dimethylformamide, N,N-dimethylacetamide, N-methyl-2-pyrrolidone, N-methyl-ε-caprolactam, 2-pyrrolidone, N-ethyl-2-pyrrolidone, N-vinyl-2-pyrrolidone, Dimethylsulfoxide, tetramethylurea, pyridine, dimethylsulfone, hexamethylphosphoramide, γ-butyrolactone, 3-methoxy-N,N-dimethylpropanamide, 3-ethoxy-N,N-dimethylpropanamide, 3-butoxy- N,N-dimethylpropanamide, 1,3-dimethyl-imidazolidinone, cyclohexanone, cyclopentanone, ethylene carbonate, propylene carbonate, diglyme, 4-hydroxy-4-methyl-2-pentanone, propylene glycol monomethyl ether, propylene Examples include glycol-tert-butyl ether, diethylene glycol, dipropylene glycol monoacetate monomethyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol monopropyl ether, tripropylene glycol methyl ether, and tetrahydrofuran. These may be used alone or in combination.
本発明に用いられる重合体組成物に用いる有機溶媒は、樹脂成分を溶解させる有機溶媒であれば特に限定されない。その具体例を以下に挙げる。
N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド、N-メチル-2-ピロリドン、N-メチル-ε-カプロラクタム、2-ピロリドン、N-エチル-2-ピロリドン、N-ビニル-2-ピロリドン、ジメチルスルホキシド、テトラメチル尿素、ピリジン、ジメチルスルホン、ヘキサメチルホスホルアミド、γ-ブチロラクトン、3-メトキシ-N,N-ジメチルプロパンアミド、3-エトキシ-N,N-ジメチルプロパンアミド、3-ブトキシ-N,N-ジメチルプロパンアミド、1,3-ジメチル-イミダゾリジノン、シクロヘキサノン、シクロペンタノン、エチレンカーボネート、プロピレンカーボネート、ジグライム、4-ヒドロキシ-4-メチル-2-ペンタノン、プロピレングリコールモノメチルエーテル、プロピレングリコール-tert-ブチルエーテル、ジエチレングリコール、ジプロピレングリコールモノアセテートモノメチルエーテル、ジプロピレングリコールモノメチルエーテル、ジプロピレングリコールモノエチルエーテル、ジプロピレングリコールモノプロピルエーテル、トリプロピレングリコールメチルエーテル、テトラヒドロフラン等が挙げられる。これらは単独で使用しても、混合して使用してもよい。 <<(B) Organic solvent>>
The organic solvent used in the polymer composition used in the present invention is not particularly limited as long as it can dissolve the resin component. Specific examples are listed below.
N,N-dimethylformamide, N,N-dimethylacetamide, N-methyl-2-pyrrolidone, N-methyl-ε-caprolactam, 2-pyrrolidone, N-ethyl-2-pyrrolidone, N-vinyl-2-pyrrolidone, Dimethylsulfoxide, tetramethylurea, pyridine, dimethylsulfone, hexamethylphosphoramide, γ-butyrolactone, 3-methoxy-N,N-dimethylpropanamide, 3-ethoxy-N,N-dimethylpropanamide, 3-butoxy- N,N-dimethylpropanamide, 1,3-dimethyl-imidazolidinone, cyclohexanone, cyclopentanone, ethylene carbonate, propylene carbonate, diglyme, 4-hydroxy-4-methyl-2-pentanone, propylene glycol monomethyl ether, propylene Examples include glycol-tert-butyl ether, diethylene glycol, dipropylene glycol monoacetate monomethyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol monopropyl ether, tripropylene glycol methyl ether, and tetrahydrofuran. These may be used alone or in combination.
本発明に用いられる重合体組成物は、上記(A)及び(B)成分以外の成分を含有してもよい。その例としては、重合体組成物を塗布した際の、膜厚均一性や表面平滑性を向上させる溶媒や化合物、位相差材と基板との密着性を向上させる化合物等を挙げることができるが、これに限定されない。
The polymer composition used in the present invention may contain components other than the above-mentioned components (A) and (B). Examples include solvents and compounds that improve film thickness uniformity and surface smoothness when the polymer composition is applied, and compounds that improve the adhesion between the retardation material and the substrate. , but not limited to.
膜厚の均一性や表面平滑性を向上させる溶媒(貧溶媒)の具体例としては、次のものが挙げられる。
例えば、イソプロピルアルコール、メトキシメチルペンタノール、シクロヘキサノール、シクロペンタノール、メチルセロソルブ、エチルセロソルブ、ブチルセロソルブ、メチルセロソルブアセテート、エチルセロソルブアセテート、ブチルカルビトール、エチルカルビトール、エチルカルビトールアセテート、エチレングリコール、エチレングリコールモノアセテート、エチレングリコールモノイソプロピルエーテル、エチレングリコールモノブチルエーテル、プロピレングリコール、プロピレングリコールモノアセテート、プロピレングリコール-tert-ブチルエーテル、ジエチレングリコール、プロピレングリコールモノメチルエーテルアセテート、ジエチレングリコールモノアセテート、ジエチレングリコールジメチルエーテル、ジプロピレングリコールモノアセテートモノメチルエーテル、ジプロピレングリコールモノメチルエーテル、ジプロピレングリコールモノエチルエーテル、ジプロピレングリコールモノアセテートモノエチルエーテル、ジプロピレングリコールモノプロピルエーテル、ジプロピレングリコールモノアセテートモノプロピルエーテル、3-メチル-3-メトキシブチルアセテート、トリプロピレングリコールメチルエーテル、3-メチル-3-メトキシブタノール、ジイソプロピルエーテル、エチルイソブチルエーテル、ジイソブチレン、アミルアセテート、ブチルブチレート、ブチルエーテル、ジイソブチルケトン、メチルシクロへキセン、プロピルエーテル、ジヘキシルエーテル、1-ヘキサノール、n-へキサン、n-ペンタン、n-オクタン、ジエチルエーテル、乳酸メチル、乳酸エチル、酢酸メチル、酢酸エチル、酢酸n-ブチル、酢酸プロピレングリコールモノエチルエーテル、ピルビン酸メチル、ピルビン酸エチル、3-メトキシプロピオン酸メチル、3-エトキシプロピオン酸メチルエチル、3-メトキシプロピオン酸エチル、3-エトキシプロピオン酸、3-メトキシプロピオン酸、3-メトキシプロピオン酸プロピル、3-メトキシプロピオン酸ブチル、1-メトキシ-2-プロパノール、1-エトキシ-2-プロパノール、1-ブトキシ-2-プロパノール、1-フェノキシ-2-プロパノール、プロピレングリコールジアセテート、プロピレングリコール-1-モノメチルエーテル-2-アセテート、プロピレングリコール-1-モノエチルエーテル-2-アセテート、ジプロピレングリコール、2-(2-エトキシプロポキシ)プロパノール、乳酸メチルエステル、乳酸エチルエステル、乳酸n-プロピルエステル、乳酸n-ブチルエステル、乳酸イソアミルエステル、エチルアミルケトン、メチルノニルケトン、メチルエチルケトン、メチルイソアミルケトン、メチルイソプロピルケトン、プロピレングリコールモノアセテート、ジエチレングリコールモノアセテート、3-メチル-3-メトキシブチルアセテート、ジエチレングリコールジメチルエーテル、ジプロピレングリコールモノアセテートモノエチルエーテル、ジプロピレングリコールモノアセテートモノプロピルエーテル等の低表面張力を有する溶媒等が挙げられる。 Specific examples of solvents (poor solvents) that improve film thickness uniformity and surface smoothness include the following.
For example, isopropyl alcohol, methoxymethylpentanol, cyclohexanol, cyclopentanol, methyl cellosolve, ethyl cellosolve, butyl cellosolve, methyl cellosolve acetate, ethyl cellosolve acetate, butyl carbitol, ethyl carbitol, ethyl carbitol acetate, ethylene glycol, ethylene Glycol monoacetate, ethylene glycol monoisopropyl ether, ethylene glycol monobutyl ether, propylene glycol, propylene glycol monoacetate, propylene glycol-tert-butyl ether, diethylene glycol, propylene glycol monomethyl ether acetate, diethylene glycol monoacetate, diethylene glycol dimethyl ether, dipropylene glycol monoacetate Monomethyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol monoacetate monoethyl ether, dipropylene glycol monopropyl ether, dipropylene glycol monoacetate monopropyl ether, 3-methyl-3-methoxybutyl acetate , tripropylene glycol methyl ether, 3-methyl-3-methoxybutanol, diisopropyl ether, ethyl isobutyl ether, diisobutylene, amyl acetate, butyl butyrate, butyl ether, diisobutyl ketone, methylcyclohexene, propyl ether, dihexyl ether, 1- Hexanol, n-hexane, n-pentane, n-octane, diethyl ether, methyl lactate, ethyl lactate, methyl acetate, ethyl acetate, n-butyl acetate, propylene glycol monoethyl acetate, methyl pyruvate, ethyl pyruvate, Methyl 3-methoxypropionate, methylethyl 3-ethoxypropionate, ethyl 3-methoxypropionate, 3-ethoxypropionic acid, 3-methoxypropionate, propyl 3-methoxypropionate, butyl 3-methoxypropionate, 1- Methoxy-2-propanol, 1-ethoxy-2-propanol, 1-butoxy-2-propanol, 1-phenoxy-2-propanol, propylene glycol diacetate, propylene glycol-1-monomethyl ether-2-acetate, propylene glycol- 1-Monoethyl ether-2-acetate, dipropylene glycol, 2-(2-ethoxypropoxy)propanol, methyl lactate, ethyl lactate, n-propyl ester, n-butyl ester, isoamyl lactate, ethyl amyl Ketone, methyl nonyl ketone, methyl ethyl ketone, methyl isoamyl ketone, methyl isopropyl ketone, propylene glycol monoacetate, diethylene glycol monoacetate, 3-methyl-3-methoxybutyl acetate, diethylene glycol dimethyl ether, dipropylene glycol monoacetate monoethyl ether, dipropylene glycol Examples include solvents having low surface tension such as monoacetate monopropyl ether.
例えば、イソプロピルアルコール、メトキシメチルペンタノール、シクロヘキサノール、シクロペンタノール、メチルセロソルブ、エチルセロソルブ、ブチルセロソルブ、メチルセロソルブアセテート、エチルセロソルブアセテート、ブチルカルビトール、エチルカルビトール、エチルカルビトールアセテート、エチレングリコール、エチレングリコールモノアセテート、エチレングリコールモノイソプロピルエーテル、エチレングリコールモノブチルエーテル、プロピレングリコール、プロピレングリコールモノアセテート、プロピレングリコール-tert-ブチルエーテル、ジエチレングリコール、プロピレングリコールモノメチルエーテルアセテート、ジエチレングリコールモノアセテート、ジエチレングリコールジメチルエーテル、ジプロピレングリコールモノアセテートモノメチルエーテル、ジプロピレングリコールモノメチルエーテル、ジプロピレングリコールモノエチルエーテル、ジプロピレングリコールモノアセテートモノエチルエーテル、ジプロピレングリコールモノプロピルエーテル、ジプロピレングリコールモノアセテートモノプロピルエーテル、3-メチル-3-メトキシブチルアセテート、トリプロピレングリコールメチルエーテル、3-メチル-3-メトキシブタノール、ジイソプロピルエーテル、エチルイソブチルエーテル、ジイソブチレン、アミルアセテート、ブチルブチレート、ブチルエーテル、ジイソブチルケトン、メチルシクロへキセン、プロピルエーテル、ジヘキシルエーテル、1-ヘキサノール、n-へキサン、n-ペンタン、n-オクタン、ジエチルエーテル、乳酸メチル、乳酸エチル、酢酸メチル、酢酸エチル、酢酸n-ブチル、酢酸プロピレングリコールモノエチルエーテル、ピルビン酸メチル、ピルビン酸エチル、3-メトキシプロピオン酸メチル、3-エトキシプロピオン酸メチルエチル、3-メトキシプロピオン酸エチル、3-エトキシプロピオン酸、3-メトキシプロピオン酸、3-メトキシプロピオン酸プロピル、3-メトキシプロピオン酸ブチル、1-メトキシ-2-プロパノール、1-エトキシ-2-プロパノール、1-ブトキシ-2-プロパノール、1-フェノキシ-2-プロパノール、プロピレングリコールジアセテート、プロピレングリコール-1-モノメチルエーテル-2-アセテート、プロピレングリコール-1-モノエチルエーテル-2-アセテート、ジプロピレングリコール、2-(2-エトキシプロポキシ)プロパノール、乳酸メチルエステル、乳酸エチルエステル、乳酸n-プロピルエステル、乳酸n-ブチルエステル、乳酸イソアミルエステル、エチルアミルケトン、メチルノニルケトン、メチルエチルケトン、メチルイソアミルケトン、メチルイソプロピルケトン、プロピレングリコールモノアセテート、ジエチレングリコールモノアセテート、3-メチル-3-メトキシブチルアセテート、ジエチレングリコールジメチルエーテル、ジプロピレングリコールモノアセテートモノエチルエーテル、ジプロピレングリコールモノアセテートモノプロピルエーテル等の低表面張力を有する溶媒等が挙げられる。 Specific examples of solvents (poor solvents) that improve film thickness uniformity and surface smoothness include the following.
For example, isopropyl alcohol, methoxymethylpentanol, cyclohexanol, cyclopentanol, methyl cellosolve, ethyl cellosolve, butyl cellosolve, methyl cellosolve acetate, ethyl cellosolve acetate, butyl carbitol, ethyl carbitol, ethyl carbitol acetate, ethylene glycol, ethylene Glycol monoacetate, ethylene glycol monoisopropyl ether, ethylene glycol monobutyl ether, propylene glycol, propylene glycol monoacetate, propylene glycol-tert-butyl ether, diethylene glycol, propylene glycol monomethyl ether acetate, diethylene glycol monoacetate, diethylene glycol dimethyl ether, dipropylene glycol monoacetate Monomethyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol monoacetate monoethyl ether, dipropylene glycol monopropyl ether, dipropylene glycol monoacetate monopropyl ether, 3-methyl-3-methoxybutyl acetate , tripropylene glycol methyl ether, 3-methyl-3-methoxybutanol, diisopropyl ether, ethyl isobutyl ether, diisobutylene, amyl acetate, butyl butyrate, butyl ether, diisobutyl ketone, methylcyclohexene, propyl ether, dihexyl ether, 1- Hexanol, n-hexane, n-pentane, n-octane, diethyl ether, methyl lactate, ethyl lactate, methyl acetate, ethyl acetate, n-butyl acetate, propylene glycol monoethyl acetate, methyl pyruvate, ethyl pyruvate, Methyl 3-methoxypropionate, methylethyl 3-ethoxypropionate, ethyl 3-methoxypropionate, 3-ethoxypropionic acid, 3-methoxypropionate, propyl 3-methoxypropionate, butyl 3-methoxypropionate, 1- Methoxy-2-propanol, 1-ethoxy-2-propanol, 1-butoxy-2-propanol, 1-phenoxy-2-propanol, propylene glycol diacetate, propylene glycol-1-monomethyl ether-2-acetate, propylene glycol- 1-Monoethyl ether-2-acetate, dipropylene glycol, 2-(2-ethoxypropoxy)propanol, methyl lactate, ethyl lactate, n-propyl ester, n-butyl ester, isoamyl lactate, ethyl amyl Ketone, methyl nonyl ketone, methyl ethyl ketone, methyl isoamyl ketone, methyl isopropyl ketone, propylene glycol monoacetate, diethylene glycol monoacetate, 3-methyl-3-methoxybutyl acetate, diethylene glycol dimethyl ether, dipropylene glycol monoacetate monoethyl ether, dipropylene glycol Examples include solvents having low surface tension such as monoacetate monopropyl ether.
これらの貧溶媒は、1種類でも複数種類を混合して用いてもよい。上述のような溶媒を用いる場合は、重合体組成物に含まれる溶媒全体の溶解性を著しく低下させることが無いように、溶媒全体の1~60質量%であることが好ましく、より好ましくは1~40質量%である。
These poor solvents may be used alone or in combination. When using the above-mentioned solvent, it is preferably 1 to 60% by mass of the total solvent, more preferably 1% by mass, so as not to significantly reduce the solubility of the entire solvent contained in the polymer composition. ~40% by mass.
膜厚の均一性や表面平滑性を向上させる化合物としては、フッ素系界面活性剤、シリコーン系界面活性剤およびノ二オン系界面活性剤等が挙げられる。
より具体的には、例えば、エフトップ(登録商標)301、EF303、EF352(トーケムプロダクツ社製)、メガファック(登録商標)F171、F173、F560、F563、R-30、R-40、R-41(DIC社製)、フロラードFC430、FC431(スリーエムジャパン社製)、アサヒガード(登録商標)AG710(AGC社製)、サーフロン(登録商標)S-382、SC101、SC102、SC103、SC104、SC105、SC106(AGCセイミケミカル社製)等が挙げられる。これらの界面活性剤の使用割合は、重合体組成物に含有される樹脂成分の100質量部に対して、好ましくは0.01質量部~2質量部、より好ましくは0.01質量部~1質量部である。 Examples of compounds that improve the uniformity of film thickness and surface smoothness include fluorosurfactants, silicone surfactants, and nonionic surfactants.
More specifically, for example, FTOP (registered trademark) 301, EF303, EF352 (manufactured by Tochem Products), Megafac (registered trademark) F171, F173, F560, F563, R-30, R-40, R -41 (manufactured by DIC), Florado FC430, FC431 (manufactured by 3M Japan), Asahi Guard (registered trademark) AG710 (manufactured by AGC), Surflon (registered trademark) S-382, SC101, SC102, SC103, SC104, SC105 , SC106 (manufactured by AGC Seimi Chemical Co., Ltd.), and the like. The proportion of these surfactants used is preferably 0.01 parts by mass to 2 parts by mass, more preferably 0.01 parts by mass to 1 part by mass, based on 100 parts by mass of the resin component contained in the polymer composition. Part by mass.
より具体的には、例えば、エフトップ(登録商標)301、EF303、EF352(トーケムプロダクツ社製)、メガファック(登録商標)F171、F173、F560、F563、R-30、R-40、R-41(DIC社製)、フロラードFC430、FC431(スリーエムジャパン社製)、アサヒガード(登録商標)AG710(AGC社製)、サーフロン(登録商標)S-382、SC101、SC102、SC103、SC104、SC105、SC106(AGCセイミケミカル社製)等が挙げられる。これらの界面活性剤の使用割合は、重合体組成物に含有される樹脂成分の100質量部に対して、好ましくは0.01質量部~2質量部、より好ましくは0.01質量部~1質量部である。 Examples of compounds that improve the uniformity of film thickness and surface smoothness include fluorosurfactants, silicone surfactants, and nonionic surfactants.
More specifically, for example, FTOP (registered trademark) 301, EF303, EF352 (manufactured by Tochem Products), Megafac (registered trademark) F171, F173, F560, F563, R-30, R-40, R -41 (manufactured by DIC), Florado FC430, FC431 (manufactured by 3M Japan), Asahi Guard (registered trademark) AG710 (manufactured by AGC), Surflon (registered trademark) S-382, SC101, SC102, SC103, SC104, SC105 , SC106 (manufactured by AGC Seimi Chemical Co., Ltd.), and the like. The proportion of these surfactants used is preferably 0.01 parts by mass to 2 parts by mass, more preferably 0.01 parts by mass to 1 part by mass, based on 100 parts by mass of the resin component contained in the polymer composition. Part by mass.
位相差材と基板との密着性を向上させる化合物の具体例としては、次に示す官能性シラン含有化合物などが挙げられる。
例えば、3-アミノプロピルトリメトキシシラン、3-アミノプロピルトリエトキシシラン、2-アミノプロピルトリメトキシシラン、2-アミノプロピルトリエトキシシラン、N-(2-アミノエチル)-3-アミノプロピルトリメトキシシラン、N-(2-アミノエチル)-3-アミノプロピルメチルジメトキシシラン、3-ウレイドプロピルトリメトキシシラン、3-ウレイドプロピルトリエトキシシラン、N-エトキシカルボニル-3-アミノプロピルトリメトキシシラン、N-エトキシカルボニル-3-アミノプロピルトリエトキシシラン、N-(3-トリエトキシシリルプロピル)トリエチレンテトラミン、N-(3-トリメトキシシリルプロピル)トリエチレンテトラミン、10-トリメトキシシリル-1,4,7-トリアザデカン、10-トリエトキシシリル-1,4,7-トリアザデカン、9-トリメトキシシリル-3,6-ジアザノニルアセテート、9-トリエトキシシリル-3,6-ジアザノニルアセテート、N-ベンジル-3-アミノプロピルトリメトキシシラン、N-ベンジル-3-アミノプロピルトリエトキシシラン、N-フェニル-3-アミノプロピルトリメトキシシラン、N-フェニル-3-アミノプロピルトリエトキシシラン等が挙げられる。 Specific examples of compounds that improve the adhesion between the retardation material and the substrate include the following functional silane-containing compounds.
For example, 3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, 2-aminopropyltrimethoxysilane, 2-aminopropyltriethoxysilane, N-(2-aminoethyl)-3-aminopropyltrimethoxysilane , N-(2-aminoethyl)-3-aminopropylmethyldimethoxysilane, 3-ureidopropyltrimethoxysilane, 3-ureidopropyltriethoxysilane, N-ethoxycarbonyl-3-aminopropyltrimethoxysilane, N-ethoxy Carbonyl-3-aminopropyltriethoxysilane, N-(3-triethoxysilylpropyl)triethylenetetramine, N-(3-trimethoxysilylpropyl)triethylenetetramine, 10-trimethoxysilyl-1,4,7- Triazadecane, 10-triethoxysilyl-1,4,7-triazadecane, 9-trimethoxysilyl-3,6-diazanonyl acetate, 9-triethoxysilyl-3,6-diazanonyl acetate, N-benzyl- Examples include 3-aminopropyltrimethoxysilane, N-benzyl-3-aminopropyltriethoxysilane, N-phenyl-3-aminopropyltrimethoxysilane, and N-phenyl-3-aminopropyltriethoxysilane.
例えば、3-アミノプロピルトリメトキシシラン、3-アミノプロピルトリエトキシシラン、2-アミノプロピルトリメトキシシラン、2-アミノプロピルトリエトキシシラン、N-(2-アミノエチル)-3-アミノプロピルトリメトキシシラン、N-(2-アミノエチル)-3-アミノプロピルメチルジメトキシシラン、3-ウレイドプロピルトリメトキシシラン、3-ウレイドプロピルトリエトキシシラン、N-エトキシカルボニル-3-アミノプロピルトリメトキシシラン、N-エトキシカルボニル-3-アミノプロピルトリエトキシシラン、N-(3-トリエトキシシリルプロピル)トリエチレンテトラミン、N-(3-トリメトキシシリルプロピル)トリエチレンテトラミン、10-トリメトキシシリル-1,4,7-トリアザデカン、10-トリエトキシシリル-1,4,7-トリアザデカン、9-トリメトキシシリル-3,6-ジアザノニルアセテート、9-トリエトキシシリル-3,6-ジアザノニルアセテート、N-ベンジル-3-アミノプロピルトリメトキシシラン、N-ベンジル-3-アミノプロピルトリエトキシシラン、N-フェニル-3-アミノプロピルトリメトキシシラン、N-フェニル-3-アミノプロピルトリエトキシシラン等が挙げられる。 Specific examples of compounds that improve the adhesion between the retardation material and the substrate include the following functional silane-containing compounds.
For example, 3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, 2-aminopropyltrimethoxysilane, 2-aminopropyltriethoxysilane, N-(2-aminoethyl)-3-aminopropyltrimethoxysilane , N-(2-aminoethyl)-3-aminopropylmethyldimethoxysilane, 3-ureidopropyltrimethoxysilane, 3-ureidopropyltriethoxysilane, N-ethoxycarbonyl-3-aminopropyltrimethoxysilane, N-ethoxy Carbonyl-3-aminopropyltriethoxysilane, N-(3-triethoxysilylpropyl)triethylenetetramine, N-(3-trimethoxysilylpropyl)triethylenetetramine, 10-trimethoxysilyl-1,4,7- Triazadecane, 10-triethoxysilyl-1,4,7-triazadecane, 9-trimethoxysilyl-3,6-diazanonyl acetate, 9-triethoxysilyl-3,6-diazanonyl acetate, N-benzyl- Examples include 3-aminopropyltrimethoxysilane, N-benzyl-3-aminopropyltriethoxysilane, N-phenyl-3-aminopropyltrimethoxysilane, and N-phenyl-3-aminopropyltriethoxysilane.
さらに、基板と位相差材の密着性の向上に加え、偏光板を構成した時のバックライトによる特性の低下等を防ぐ目的で、以下のようなフェノプラスト系やエポキシ基含有化合物の添加剤を、重合体組成物中に含有させても良い。具体的なフェノプラスト系添加剤を以下に示すが、この構造に限定されない。
Furthermore, in addition to improving the adhesion between the substrate and the retardation material, the following additives such as phenoplast-based and epoxy group-containing compounds are used to prevent deterioration of characteristics due to backlight when forming a polarizing plate. , may be included in the polymer composition. Specific phenoplast additives are shown below, but are not limited to this structure.
具体的なエポキシ基含有化合物としては、エチレングリコールジグリシジルエーテル、ポリエチレングリコールジグリシジルエーテル、プロピレングリコールジグリシジルエーテル、トリプロピレングリコールジグリシジルエーテル、ポリプロピレングリコールジグリシジルエーテル、ネオペンチルグリコールジグリシジルエーテル、1,6-ヘキサンジオールジグリシジルエーテル、グリセリンジグリシジルエーテル、2,2-ジブロモネオペンチルグリコールジグリシジルエーテル、1,3,5,6-テトラグリシジル-2,4-ヘキサンジオール、N,N,N’,N’-テトラグリシジル-m-キシリレンジアミン、1,3-ビス(N,N-ジグリシジルアミノメチル)シクロヘキサン、N,N,N’,N’-テトラグリシジル-4,4’-ジアミノジフェニルメタンなどが例示される。
Specific epoxy group-containing compounds include ethylene glycol diglycidyl ether, polyethylene glycol diglycidyl ether, propylene glycol diglycidyl ether, tripropylene glycol diglycidyl ether, polypropylene glycol diglycidyl ether, neopentyl glycol diglycidyl ether, 1, 6-hexanediol diglycidyl ether, glycerin diglycidyl ether, 2,2-dibromoneopentyl glycol diglycidyl ether, 1,3,5,6-tetraglycidyl-2,4-hexanediol, N,N,N', N'-tetraglycidyl-m-xylylenediamine, 1,3-bis(N,N-diglycidylaminomethyl)cyclohexane, N,N,N',N'-tetraglycidyl-4,4'-diaminodiphenylmethane, etc. is exemplified.
基板との密着性を向上させる化合物を使用する場合、その使用量は、重合体組成物に含有される樹脂成分の100質量部に対して0.1質量部~30質量部であることが好ましく、より好ましくは1質量部~20質量部である。使用量が0.1質量部未満であると密着性向上の効果は期待できず、30質量部よりも多くなると液晶の配向性が悪くなる場合がある。
When using a compound that improves adhesion to the substrate, the amount used is preferably 0.1 parts by mass to 30 parts by mass based on 100 parts by mass of the resin component contained in the polymer composition. , more preferably 1 part by mass to 20 parts by mass. If the amount used is less than 0.1 part by mass, no effect of improving adhesion can be expected, and if it is more than 30 parts by mass, the alignment of the liquid crystal may deteriorate.
添加剤として、光増感剤を用いることもできる。無色増感剤および三重項増感剤が好ましい。
光増感剤としては、芳香族ニトロ化合物、クマリン(7-ジエチルアミノ-4-メチルクマリン、7-ヒドロキシ4-メチルクマリン)、ケトクマリン、カルボニルビスクマリン、芳香族2-ヒドロキシケトン、およびアミノ置換された、芳香族2-ヒドロキシケトン(2-ヒドロキシベンゾフェノン、モノ-もしくはジ-p-(ジメチルアミノ)-2-ヒドロキシベンゾフェノン)、アセトフェノン、アントラキノン、キサントン、チオキサントン、ベンズアントロン、チアゾリン(2-ベンゾイルメチレン-3-メチル-β-ナフトチアゾリン、2-(β-ナフトイルメチレン)-3-メチルベンゾチアゾリン、2-(α-ナフトイルメチレン)-3-メチルベンゾチアゾリン、2-(4-ビフェノイルメチレン)-3-メチルベンゾチアゾリン、2-(β-ナフトイルメチレン)-3-メチル
-β-ナフトチアゾリン、2-(4-ビフェノイルメチレン)-3-メチル-β-ナフトチアゾリン、2-(p-フルオロベンゾイルメチレン)-3-メチル-β-ナフトチアゾリン)、オキサゾリン(2-ベンゾイルメチレン-3-メチル-β-ナフトオキサゾリン、2-(β-ナフトイルメチレン)-3-メチルベンゾオキサゾリン、2-(α-ナフトイルメチレン)-3-メチルベンゾオキサゾリン、2-(4-ビフェノイルメチレン)-3-メチルベンゾオキサゾリン、2-(β-ナフトイルメチレン)-3-メチル-β-ナフトオキサゾリン、2-(4-ビフェノイルメチレン)-3-メチル-β-ナフトオキサゾリン、2-(p-フルオロベンゾイルメチレン)-3-メチル-β-ナフトオキサゾリン)、ベンゾチアゾール、ニトロアニリン(m-もしくはp-ニトロアニリン、2,4,6-トリニトロアニリン)またはニトロアセナフテン(5-ニトロアセナフテン)、(2-[(m-ヒドロキシ-p-メトキシ)スチリル]ベンゾチアゾール、ベンゾインアルキルエーテル、N-アルキル化フタロン、アセトフェノンケタール(2,2-ジメトキシフェニルエタノン)、ナフタレン、アントラセン(2-ナフタレンメタノール、2-ナフタレンカルボン酸、9-アントラセンメタノール、および9-アントラセンカルボン酸)、ベンゾピラン、アゾインドリジン、メロクマリン等がある。
好ましくは、芳香族2-ヒドロキシケトン(ベンゾフェノン)、クマリン、ケトクマリン、カルボニルビスクマリン、アセトフェノン、アントラキノン、キサントン、チオキサントン、およびアセトフェノンケタールである。 A photosensitizer can also be used as an additive. Colorless sensitizers and triplet sensitizers are preferred.
Photosensitizers include aromatic nitro compounds, coumarins (7-diethylamino-4-methylcoumarin, 7-hydroxy 4-methylcoumarin), ketocoumarins, carbonylbiscoumarins, aromatic 2-hydroxyketones, and amino-substituted , aromatic 2-hydroxyketone (2-hydroxybenzophenone, mono- or di-p-(dimethylamino)-2-hydroxybenzophenone), acetophenone, anthraquinone, xanthone, thioxanthone, benzanthrone, thiazoline (2-benzoylmethylene-3 -Methyl-β-naphthothiazoline, 2-(β-naphthoylmethylene)-3-methylbenzothiazoline, 2-(α-naphthoylmethylene)-3-methylbenzothiazoline, 2-(4-biphenoylmethylene)- 3-Methylbenzothiazoline, 2-(β-naphthoylmethylene)-3-methyl-β-naphthothiazoline, 2-(4-biphenoylmethylene)-3-methyl-β-naphthothiazoline, 2-(p-fluoro benzoylmethylene)-3-methyl-β-naphthothiazoline), oxazoline (2-benzoylmethylene-3-methyl-β-naphthoxazoline, 2-(β-naphthoylmethylene)-3-methylbenzoxazoline, 2-(α -naphthoylmethylene)-3-methylbenzoxazoline, 2-(4-biphenoylmethylene)-3-methylbenzoxazoline, 2-(β-naphthoylmethylene)-3-methyl-β-naphthoxazoline, 2-( 4-biphenoylmethylene)-3-methyl-β-naphthoxazoline, 2-(p-fluorobenzoylmethylene)-3-methyl-β-naphthoxazoline), benzothiazole, nitroaniline (m- or p-nitroaniline, 2,4,6-trinitroaniline) or nitroacenaphthene (5-nitroacenaphthene), (2-[(m-hydroxy-p-methoxy)styryl]benzothiazole, benzoin alkyl ether, N-alkylated phthalone, Acetophenone ketal (2,2-dimethoxyphenylethanone), naphthalene, anthracene (2-naphthalenemethanol, 2-naphthalenecarboxylic acid, 9-anthracenemethanol, and 9-anthracenecarboxylic acid), benzopyran, azoindolizine, merocoumarin, etc. be.
Preferred are aromatic 2-hydroxyketones (benzophenone), coumarins, ketocoumarins, carbonylbiscoumarins, acetophenones, anthraquinones, xanthone, thioxanthone, and acetophenone ketal.
光増感剤としては、芳香族ニトロ化合物、クマリン(7-ジエチルアミノ-4-メチルクマリン、7-ヒドロキシ4-メチルクマリン)、ケトクマリン、カルボニルビスクマリン、芳香族2-ヒドロキシケトン、およびアミノ置換された、芳香族2-ヒドロキシケトン(2-ヒドロキシベンゾフェノン、モノ-もしくはジ-p-(ジメチルアミノ)-2-ヒドロキシベンゾフェノン)、アセトフェノン、アントラキノン、キサントン、チオキサントン、ベンズアントロン、チアゾリン(2-ベンゾイルメチレン-3-メチル-β-ナフトチアゾリン、2-(β-ナフトイルメチレン)-3-メチルベンゾチアゾリン、2-(α-ナフトイルメチレン)-3-メチルベンゾチアゾリン、2-(4-ビフェノイルメチレン)-3-メチルベンゾチアゾリン、2-(β-ナフトイルメチレン)-3-メチル
-β-ナフトチアゾリン、2-(4-ビフェノイルメチレン)-3-メチル-β-ナフトチアゾリン、2-(p-フルオロベンゾイルメチレン)-3-メチル-β-ナフトチアゾリン)、オキサゾリン(2-ベンゾイルメチレン-3-メチル-β-ナフトオキサゾリン、2-(β-ナフトイルメチレン)-3-メチルベンゾオキサゾリン、2-(α-ナフトイルメチレン)-3-メチルベンゾオキサゾリン、2-(4-ビフェノイルメチレン)-3-メチルベンゾオキサゾリン、2-(β-ナフトイルメチレン)-3-メチル-β-ナフトオキサゾリン、2-(4-ビフェノイルメチレン)-3-メチル-β-ナフトオキサゾリン、2-(p-フルオロベンゾイルメチレン)-3-メチル-β-ナフトオキサゾリン)、ベンゾチアゾール、ニトロアニリン(m-もしくはp-ニトロアニリン、2,4,6-トリニトロアニリン)またはニトロアセナフテン(5-ニトロアセナフテン)、(2-[(m-ヒドロキシ-p-メトキシ)スチリル]ベンゾチアゾール、ベンゾインアルキルエーテル、N-アルキル化フタロン、アセトフェノンケタール(2,2-ジメトキシフェニルエタノン)、ナフタレン、アントラセン(2-ナフタレンメタノール、2-ナフタレンカルボン酸、9-アントラセンメタノール、および9-アントラセンカルボン酸)、ベンゾピラン、アゾインドリジン、メロクマリン等がある。
好ましくは、芳香族2-ヒドロキシケトン(ベンゾフェノン)、クマリン、ケトクマリン、カルボニルビスクマリン、アセトフェノン、アントラキノン、キサントン、チオキサントン、およびアセトフェノンケタールである。 A photosensitizer can also be used as an additive. Colorless sensitizers and triplet sensitizers are preferred.
Photosensitizers include aromatic nitro compounds, coumarins (7-diethylamino-4-methylcoumarin, 7-hydroxy 4-methylcoumarin), ketocoumarins, carbonylbiscoumarins, aromatic 2-hydroxyketones, and amino-substituted , aromatic 2-hydroxyketone (2-hydroxybenzophenone, mono- or di-p-(dimethylamino)-2-hydroxybenzophenone), acetophenone, anthraquinone, xanthone, thioxanthone, benzanthrone, thiazoline (2-benzoylmethylene-3 -Methyl-β-naphthothiazoline, 2-(β-naphthoylmethylene)-3-methylbenzothiazoline, 2-(α-naphthoylmethylene)-3-methylbenzothiazoline, 2-(4-biphenoylmethylene)- 3-Methylbenzothiazoline, 2-(β-naphthoylmethylene)-3-methyl-β-naphthothiazoline, 2-(4-biphenoylmethylene)-3-methyl-β-naphthothiazoline, 2-(p-fluoro benzoylmethylene)-3-methyl-β-naphthothiazoline), oxazoline (2-benzoylmethylene-3-methyl-β-naphthoxazoline, 2-(β-naphthoylmethylene)-3-methylbenzoxazoline, 2-(α -naphthoylmethylene)-3-methylbenzoxazoline, 2-(4-biphenoylmethylene)-3-methylbenzoxazoline, 2-(β-naphthoylmethylene)-3-methyl-β-naphthoxazoline, 2-( 4-biphenoylmethylene)-3-methyl-β-naphthoxazoline, 2-(p-fluorobenzoylmethylene)-3-methyl-β-naphthoxazoline), benzothiazole, nitroaniline (m- or p-nitroaniline, 2,4,6-trinitroaniline) or nitroacenaphthene (5-nitroacenaphthene), (2-[(m-hydroxy-p-methoxy)styryl]benzothiazole, benzoin alkyl ether, N-alkylated phthalone, Acetophenone ketal (2,2-dimethoxyphenylethanone), naphthalene, anthracene (2-naphthalenemethanol, 2-naphthalenecarboxylic acid, 9-anthracenemethanol, and 9-anthracenecarboxylic acid), benzopyran, azoindolizine, merocoumarin, etc. be.
Preferred are aromatic 2-hydroxyketones (benzophenone), coumarins, ketocoumarins, carbonylbiscoumarins, acetophenones, anthraquinones, xanthone, thioxanthone, and acetophenone ketal.
重合体組成物には、上述したものの他、本発明の効果が損なわれない範囲であれば、位相差材の誘電率や導電性などの電気特性を変化させる目的で、誘電体や導電物質、さらには、位相差材にした際の膜の硬度や緻密度を高める目的で、架橋性化合物を添加してもよい。
In addition to the above-mentioned materials, the polymer composition may contain dielectrics, conductive substances, Furthermore, a crosslinkable compound may be added for the purpose of increasing the hardness and density of the film when used as a retardation material.
[重合体組成物の調製]
本発明に用いられる重合体組成物は、位相差フィルムの形成に好適となるように塗布液として調製されることが好ましい。すなわち、本発明に用いられる重合体組成物は、上述の(A)成分及び上述の膜厚均一性や表面平滑性を向上させる溶媒や化合物、液晶配向膜と基板との密着性を向上させる化合物等が有機溶媒に溶解した溶液として調製されることが好ましい。ここで、(A)成分の含有量は、1~30質量%が好ましく、より好ましくは3~25質量%、特に好ましくは3~20質量%である。 [Preparation of polymer composition]
The polymer composition used in the present invention is preferably prepared as a coating liquid so as to be suitable for forming a retardation film. That is, the polymer composition used in the present invention includes the above-mentioned component (A), the above-mentioned solvent or compound that improves the film thickness uniformity and surface smoothness, and the compound that improves the adhesion between the liquid crystal alignment film and the substrate. Preferably, the compound is prepared as a solution in which the compound is dissolved in an organic solvent. Here, the content of component (A) is preferably 1 to 30% by weight, more preferably 3 to 25% by weight, particularly preferably 3 to 20% by weight.
本発明に用いられる重合体組成物は、位相差フィルムの形成に好適となるように塗布液として調製されることが好ましい。すなわち、本発明に用いられる重合体組成物は、上述の(A)成分及び上述の膜厚均一性や表面平滑性を向上させる溶媒や化合物、液晶配向膜と基板との密着性を向上させる化合物等が有機溶媒に溶解した溶液として調製されることが好ましい。ここで、(A)成分の含有量は、1~30質量%が好ましく、より好ましくは3~25質量%、特に好ましくは3~20質量%である。 [Preparation of polymer composition]
The polymer composition used in the present invention is preferably prepared as a coating liquid so as to be suitable for forming a retardation film. That is, the polymer composition used in the present invention includes the above-mentioned component (A), the above-mentioned solvent or compound that improves the film thickness uniformity and surface smoothness, and the compound that improves the adhesion between the liquid crystal alignment film and the substrate. Preferably, the compound is prepared as a solution in which the compound is dissolved in an organic solvent. Here, the content of component (A) is preferably 1 to 30% by weight, more preferably 3 to 25% by weight, particularly preferably 3 to 20% by weight.
本実施形態の重合体組成物において、(A)成分以外に、液晶発現能および感光性能を損なわない範囲で他の重合体が混合されていてもよい。その際、樹脂成分中における他の重合体の含有量は、0.5~80質量%、好ましくは1~50質量%である。
そのような他の重合体は、例えば、ポリ(メタ)アクリレートやポリアミック酸やポリイミド等からなり、液晶性を発現し得る感光性の側鎖型高分子ではない重合体等が挙げられる。 In the polymer composition of this embodiment, other polymers may be mixed in addition to component (A) within a range that does not impair liquid crystal expression ability and photosensitivity. At this time, the content of other polymers in the resin component is 0.5 to 80% by mass, preferably 1 to 50% by mass.
Examples of such other polymers include polymers made of poly(meth)acrylate, polyamic acid, polyimide, etc., which are not photosensitive side chain polymers capable of exhibiting liquid crystallinity.
そのような他の重合体は、例えば、ポリ(メタ)アクリレートやポリアミック酸やポリイミド等からなり、液晶性を発現し得る感光性の側鎖型高分子ではない重合体等が挙げられる。 In the polymer composition of this embodiment, other polymers may be mixed in addition to component (A) within a range that does not impair liquid crystal expression ability and photosensitivity. At this time, the content of other polymers in the resin component is 0.5 to 80% by mass, preferably 1 to 50% by mass.
Examples of such other polymers include polymers made of poly(meth)acrylate, polyamic acid, polyimide, etc., which are not photosensitive side chain polymers capable of exhibiting liquid crystallinity.
[単層位相差材]
本発明の位相差材は、下記[I]~[III]を含む方法によって製造することができる。
[I] 本発明の組成物を、基板上に塗布して塗膜を形成する工程;
[II] [I]で得られた塗膜に偏光した紫外線を照射する工程;及び
[III] [II]で得られた塗膜を加熱して、位相差材を得る工程。 [Single layer retardation material]
The retardation material of the present invention can be manufactured by a method including the following [I] to [III].
[I] Step of applying the composition of the present invention onto a substrate to form a coating film;
[II] A step of irradiating the coating film obtained in [I] with polarized ultraviolet rays; and [III] A step of heating the coating film obtained in [II] to obtain a retardation material.
本発明の位相差材は、下記[I]~[III]を含む方法によって製造することができる。
[I] 本発明の組成物を、基板上に塗布して塗膜を形成する工程;
[II] [I]で得られた塗膜に偏光した紫外線を照射する工程;及び
[III] [II]で得られた塗膜を加熱して、位相差材を得る工程。 [Single layer retardation material]
The retardation material of the present invention can be manufactured by a method including the following [I] to [III].
[I] Step of applying the composition of the present invention onto a substrate to form a coating film;
[II] A step of irradiating the coating film obtained in [I] with polarized ultraviolet rays; and [III] A step of heating the coating film obtained in [II] to obtain a retardation material.
<工程[I]>
工程[I]は、基板上に本発明の組成物を塗布する過程である。より具体的には、本発明の組成物を基板(例えば、シリコン/二酸化シリコン被覆基板、シリコンナイトライド基板、金属、例えば、アルミニウム、モリブデン、クロム等が被覆された基板、ガラス基板、石英基板、ITO基板等)やフィルム(例えば、トリアセチルセルロース(TAC)フィルム、シクロオレフィンポリマーフィルム、ポリエチレンテレフタレートフィルム、アクリルフィルム等の樹脂フィルム)等の上に、バーコート、スピンコート、フローコート、ロールコート、スリットコート、スリットコートに続いたスピンコート、インクジェット法、印刷法等の方法によって塗布する。塗布した後は、ホットプレート、熱循環型オーブンまたはIR(赤外線)型オーブンなどの加熱手段により30~200℃、好ましくは30~150℃で溶媒を蒸発させて塗膜を得ることができる。 <Step [I]>
Step [I] is a process of applying the composition of the present invention onto a substrate. More specifically, the composition of the present invention is applied to a substrate (for example, a silicon/silicon dioxide coated substrate, a silicon nitride substrate, a substrate coated with a metal such as aluminum, molybdenum, chromium, etc., a glass substrate, a quartz substrate, Bar coating, spin coating, flow coating, roll coating, Coating is performed by a method such as slit coating, slit coating followed by spin coating, an inkjet method, or a printing method. After coating, the solvent can be evaporated at 30 to 200° C., preferably 30 to 150° C., using a heating means such as a hot plate, a thermal circulation oven, or an IR (infrared) oven, to obtain a coating film.
工程[I]は、基板上に本発明の組成物を塗布する過程である。より具体的には、本発明の組成物を基板(例えば、シリコン/二酸化シリコン被覆基板、シリコンナイトライド基板、金属、例えば、アルミニウム、モリブデン、クロム等が被覆された基板、ガラス基板、石英基板、ITO基板等)やフィルム(例えば、トリアセチルセルロース(TAC)フィルム、シクロオレフィンポリマーフィルム、ポリエチレンテレフタレートフィルム、アクリルフィルム等の樹脂フィルム)等の上に、バーコート、スピンコート、フローコート、ロールコート、スリットコート、スリットコートに続いたスピンコート、インクジェット法、印刷法等の方法によって塗布する。塗布した後は、ホットプレート、熱循環型オーブンまたはIR(赤外線)型オーブンなどの加熱手段により30~200℃、好ましくは30~150℃で溶媒を蒸発させて塗膜を得ることができる。 <Step [I]>
Step [I] is a process of applying the composition of the present invention onto a substrate. More specifically, the composition of the present invention is applied to a substrate (for example, a silicon/silicon dioxide coated substrate, a silicon nitride substrate, a substrate coated with a metal such as aluminum, molybdenum, chromium, etc., a glass substrate, a quartz substrate, Bar coating, spin coating, flow coating, roll coating, Coating is performed by a method such as slit coating, slit coating followed by spin coating, an inkjet method, or a printing method. After coating, the solvent can be evaporated at 30 to 200° C., preferably 30 to 150° C., using a heating means such as a hot plate, a thermal circulation oven, or an IR (infrared) oven, to obtain a coating film.
<工程[II]>
工程[II]では、工程[I]で得られた塗膜に偏光した紫外線を照射する。塗膜の膜面に偏光した紫外線を照射する場合、基板に対して一定の方向から偏光板を介して偏光された紫外線を照射する。使用する紫外線としては、波長100~400nmの範囲の紫外線を使用することができる。好ましくは、使用する塗膜の種類によりフィルター等を介して最適な波長を選択する。そして、例えば、選択的に光架橋反応を誘起できるように、波長290~400nmの範囲の紫外線を選択して使用することができる。紫外線としては、例えば、高圧水銀灯から放射される光を用いることができる。 <Step [II]>
In step [II], the coating film obtained in step [I] is irradiated with polarized ultraviolet light. When irradiating the surface of a coating film with polarized ultraviolet rays, the substrate is irradiated with polarized ultraviolet rays from a fixed direction via a polarizing plate. As the ultraviolet light to be used, ultraviolet light with a wavelength in the range of 100 to 400 nm can be used. Preferably, the optimum wavelength is selected via a filter or the like depending on the type of coating film used. For example, ultraviolet light in the wavelength range of 290 to 400 nm can be selected and used so as to selectively induce a photocrosslinking reaction. As the ultraviolet light, for example, light emitted from a high-pressure mercury lamp can be used.
工程[II]では、工程[I]で得られた塗膜に偏光した紫外線を照射する。塗膜の膜面に偏光した紫外線を照射する場合、基板に対して一定の方向から偏光板を介して偏光された紫外線を照射する。使用する紫外線としては、波長100~400nmの範囲の紫外線を使用することができる。好ましくは、使用する塗膜の種類によりフィルター等を介して最適な波長を選択する。そして、例えば、選択的に光架橋反応を誘起できるように、波長290~400nmの範囲の紫外線を選択して使用することができる。紫外線としては、例えば、高圧水銀灯から放射される光を用いることができる。 <Step [II]>
In step [II], the coating film obtained in step [I] is irradiated with polarized ultraviolet light. When irradiating the surface of a coating film with polarized ultraviolet rays, the substrate is irradiated with polarized ultraviolet rays from a fixed direction via a polarizing plate. As the ultraviolet light to be used, ultraviolet light with a wavelength in the range of 100 to 400 nm can be used. Preferably, the optimum wavelength is selected via a filter or the like depending on the type of coating film used. For example, ultraviolet light in the wavelength range of 290 to 400 nm can be selected and used so as to selectively induce a photocrosslinking reaction. As the ultraviolet light, for example, light emitted from a high-pressure mercury lamp can be used.
偏光した紫外線の照射量は、使用する塗膜に依存する。照射量は、該塗膜における、偏光した紫外線の偏光方向と平行な方向の紫外線吸光度と垂直な方向の紫外線吸光度との差であるΔAの最大値(以下、ΔAmaxとも称する)を実現する偏光紫外線の量の1~70%の範囲内とすることが好ましく、1~50%の範囲内とすることがより好ましい。
The amount of polarized ultraviolet radiation depends on the coating used. The amount of irradiation is the polarized ultraviolet rays that achieves the maximum value of ΔA (hereinafter also referred to as ΔAmax), which is the difference between the ultraviolet absorbance in a direction parallel to the polarization direction of the polarized ultraviolet rays and the ultraviolet absorbance in a direction perpendicular to the polarization direction of the polarized ultraviolet rays. The amount is preferably within the range of 1 to 70%, and more preferably within the range of 1 to 50%.
<工程[III]>
工程[III]では、工程[II]で偏光した紫外線の照射された塗膜を加熱する。加熱により、塗膜に配向制御能を付与することができる。 <Step [III]>
In step [III], the coating film irradiated with the polarized ultraviolet rays in step [II] is heated. By heating, orientation controllability can be imparted to the coating film.
工程[III]では、工程[II]で偏光した紫外線の照射された塗膜を加熱する。加熱により、塗膜に配向制御能を付与することができる。 <Step [III]>
In step [III], the coating film irradiated with the polarized ultraviolet rays in step [II] is heated. By heating, orientation controllability can be imparted to the coating film.
加熱は、ホットプレート、熱循環型オーブンまたはIR(赤外線)型オーブンなどの加熱手段を用いることができる。加熱温度は、使用する塗膜の液晶性を発現させる温度を考慮して決めることができる。
For heating, heating means such as a hot plate, a thermal circulation oven, or an IR (infrared) oven can be used. The heating temperature can be determined in consideration of the temperature at which the coating film used exhibits liquid crystallinity.
加熱温度は、本発明の組成物に含まれる特定重合体が液晶性を発現する温度(以下、液晶発現温度という)の温度範囲内であることが好ましい。塗膜のような薄膜表面の場合、塗膜表面の液晶発現温度は、特定重合体をバルクで観察した場合の液晶発現温度よりも低いことが予想される。このため、加熱温度は、塗膜表面の液晶発現温度の温度範囲内であることがより好ましい。すなわち、偏光紫外線照射後の加熱温度の温度範囲は、使用する特定重合体の液晶発現温度の温度範囲の下限より10℃低い温度を下限とし、その液晶温度範囲の上限より10℃低い温度を上限とする範囲の温度であることが好ましい。加熱温度が、上記温度範囲よりも低いと、塗膜における熱による異方性の増幅効果が不十分となる傾向があり、また加熱温度が、上記温度範囲よりも高すぎると、塗膜の状態が等方性の液体状態(等方相)に近くなる傾向があり、この場合、自己組織化によって一方向に再配向することが困難になることがある。
The heating temperature is preferably within the temperature range at which the specific polymer contained in the composition of the present invention develops liquid crystallinity (hereinafter referred to as liquid crystal development temperature). In the case of a thin film surface such as a paint film, the temperature at which liquid crystals appear on the surface of the paint film is expected to be lower than the temperature at which liquid crystals appear when the specific polymer is observed in bulk. For this reason, the heating temperature is more preferably within the temperature range of the liquid crystal development temperature on the surface of the coating film. In other words, the heating temperature range after irradiation with polarized ultraviolet rays has a lower limit of 10°C lower than the lower limit of the liquid crystal development temperature range of the specific polymer used, and an upper limit of 10°C lower than the upper limit of the liquid crystal temperature range. It is preferable that the temperature is within the range. If the heating temperature is lower than the above temperature range, the effect of amplifying the anisotropy due to heat in the coating film tends to be insufficient, and if the heating temperature is too high than the above temperature range, the condition of the coating film tends to be insufficient. tends to be close to an isotropic liquid state (isotropic phase), in which case it may be difficult to reorient in one direction due to self-organization.
なお、液晶発現温度は、重合体または塗膜表面が固体相から液晶相に相転移がおきる液晶転移温度以上であって、液晶相からアイソトロピック相(等方相)に相転移を起こすアイソトロピック相転移温度(Tiso)以下の温度をいう。例えば、130℃以下で液晶性を発現するとは、固体相から液晶相に相転移がおきる液晶転移温度が130℃以下であることを意味する。
The liquid crystal development temperature is the liquid crystal transition temperature at which the polymer or coating surface undergoes a phase transition from a solid phase to a liquid crystal phase, and is an isotropic phase at which a phase transition occurs from a liquid crystal phase to an isotropic phase. A temperature below the phase transition temperature (Tiso). For example, exhibiting liquid crystallinity at 130° C. or lower means that the liquid crystal transition temperature at which a phase transition from a solid phase to a liquid crystal phase occurs is 130° C. or lower.
加熱後に形成される塗膜の厚みは、使用する基板の段差や光学的、電気的性質を考慮し適宜選択することができ、例えば、0.5~10μmが好適である。
The thickness of the coating film formed after heating can be appropriately selected in consideration of the level difference and optical and electrical properties of the substrate used, and is preferably 0.5 to 10 μm, for example.
このようにして得られた本発明の単層位相差材は、表示装置や記録材料等の用途に好適な光学特性を有する材料であり、特に、液晶ディスプレイ用の偏光板及び位相差板等の光学補償フィルム、有機ELの円偏光板用位相差フィルムとして好適である。
The single-layer retardation material of the present invention thus obtained is a material having optical properties suitable for use in display devices, recording materials, etc., and is particularly suitable for use in polarizing plates and retardation plates for liquid crystal displays. It is suitable as an optical compensation film and a retardation film for circularly polarizing plates of organic EL.
<液晶配向剤>
本発明は、上述の重合体組成物を有するか、又は上述の重合体組成物から本質的になるか、又は上述の重合体組成物のみからなる液晶配向剤、特に液晶表示素子用、より特に横電界駆動型液晶表示素子用の液晶配向剤を提供する。 <Liquid crystal alignment agent>
The present invention provides a liquid crystal aligning agent having the above-mentioned polymer composition, consisting essentially of the above-mentioned polymer composition, or consisting only of the above-mentioned polymer composition, particularly for use in liquid crystal display elements, more particularly A liquid crystal aligning agent for a transverse electric field driven liquid crystal display element is provided.
本発明は、上述の重合体組成物を有するか、又は上述の重合体組成物から本質的になるか、又は上述の重合体組成物のみからなる液晶配向剤、特に液晶表示素子用、より特に横電界駆動型液晶表示素子用の液晶配向剤を提供する。 <Liquid crystal alignment agent>
The present invention provides a liquid crystal aligning agent having the above-mentioned polymer composition, consisting essentially of the above-mentioned polymer composition, or consisting only of the above-mentioned polymer composition, particularly for use in liquid crystal display elements, more particularly A liquid crystal aligning agent for a transverse electric field driven liquid crystal display element is provided.
<液晶配向膜>又は<液晶配向膜を有する基板>
本発明は、上述の液晶配向剤から形成される液晶配向膜、特に液晶表示素子用、より特に横電界駆動型液晶表示素子用の液晶配向膜を提供する。
また、本発明は、上述の液晶配向剤から形成される液晶配向膜、特に液晶表示素子用、より特に横電界駆動型液晶表示素子用の液晶配向膜を有する基板、特に液晶表示素子用、より特に横電界駆動型液晶表示素子用の基板を提供する。 <Liquid crystal alignment film> or <Substrate having liquid crystal alignment film>
The present invention provides a liquid crystal alignment film formed from the above-mentioned liquid crystal alignment agent, particularly a liquid crystal alignment film for a liquid crystal display element, and more particularly for a horizontal electric field drive type liquid crystal display element.
The present invention also provides a substrate having a liquid crystal alignment film formed from the above-mentioned liquid crystal alignment agent, particularly for a liquid crystal display element, more particularly for a horizontal electric field drive type liquid crystal display element, particularly for a liquid crystal display element, and more particularly for a liquid crystal display element. In particular, a substrate for a lateral electric field driven liquid crystal display element is provided.
本発明は、上述の液晶配向剤から形成される液晶配向膜、特に液晶表示素子用、より特に横電界駆動型液晶表示素子用の液晶配向膜を提供する。
また、本発明は、上述の液晶配向剤から形成される液晶配向膜、特に液晶表示素子用、より特に横電界駆動型液晶表示素子用の液晶配向膜を有する基板、特に液晶表示素子用、より特に横電界駆動型液晶表示素子用の基板を提供する。 <Liquid crystal alignment film> or <Substrate having liquid crystal alignment film>
The present invention provides a liquid crystal alignment film formed from the above-mentioned liquid crystal alignment agent, particularly a liquid crystal alignment film for a liquid crystal display element, and more particularly for a horizontal electric field drive type liquid crystal display element.
The present invention also provides a substrate having a liquid crystal alignment film formed from the above-mentioned liquid crystal alignment agent, particularly for a liquid crystal display element, more particularly for a horizontal electric field drive type liquid crystal display element, particularly for a liquid crystal display element, and more particularly for a liquid crystal display element. In particular, a substrate for a lateral electric field driven liquid crystal display element is provided.
<液晶配向膜の製造方法>又は<液晶配向膜を有する基板の製造方法>
上述の液晶配向膜は、上記[I]~[III]の工程を有することによって、配向制御能が付与された液晶配向膜、特に液晶表示素子用、より特に横電界駆動型液晶表示素子用の液晶配向膜又は該液晶配向膜を有する基板を得ることができる。 <Method for manufacturing a liquid crystal alignment film> or <Method for manufacturing a substrate having a liquid crystal alignment film>
The above-mentioned liquid crystal alignment film is a liquid crystal alignment film imparted with alignment control ability by having the steps [I] to [III] above, particularly for liquid crystal display elements, more particularly for transverse electric field drive type liquid crystal display elements. A liquid crystal alignment film or a substrate having the liquid crystal alignment film can be obtained.
上述の液晶配向膜は、上記[I]~[III]の工程を有することによって、配向制御能が付与された液晶配向膜、特に液晶表示素子用、より特に横電界駆動型液晶表示素子用の液晶配向膜又は該液晶配向膜を有する基板を得ることができる。 <Method for manufacturing a liquid crystal alignment film> or <Method for manufacturing a substrate having a liquid crystal alignment film>
The above-mentioned liquid crystal alignment film is a liquid crystal alignment film imparted with alignment control ability by having the steps [I] to [III] above, particularly for liquid crystal display elements, more particularly for transverse electric field drive type liquid crystal display elements. A liquid crystal alignment film or a substrate having the liquid crystal alignment film can be obtained.
<<基板>>
基板については、特に限定はされないが、製造される液晶表示素子が透過型である場合、透明性の高い基板が用いられることが好ましい。その場合、特に限定はされず、ガラス基板、またはアクリル基板やポリカーボネート基板等のプラスチック基板等を用いることができる。
また、反射型の液晶表示素子への適用を考慮し、シリコンウェハなどの不透明な基板も使用できる。 <<Substrate>>
The substrate is not particularly limited, but if the liquid crystal display element to be manufactured is of a transmission type, it is preferable to use a highly transparent substrate. In that case, there are no particular limitations, and a glass substrate or a plastic substrate such as an acrylic substrate or a polycarbonate substrate can be used.
Furthermore, in consideration of application to reflective liquid crystal display elements, opaque substrates such as silicon wafers can also be used.
基板については、特に限定はされないが、製造される液晶表示素子が透過型である場合、透明性の高い基板が用いられることが好ましい。その場合、特に限定はされず、ガラス基板、またはアクリル基板やポリカーボネート基板等のプラスチック基板等を用いることができる。
また、反射型の液晶表示素子への適用を考慮し、シリコンウェハなどの不透明な基板も使用できる。 <<Substrate>>
The substrate is not particularly limited, but if the liquid crystal display element to be manufactured is of a transmission type, it is preferable to use a highly transparent substrate. In that case, there are no particular limitations, and a glass substrate or a plastic substrate such as an acrylic substrate or a polycarbonate substrate can be used.
Furthermore, in consideration of application to reflective liquid crystal display elements, opaque substrates such as silicon wafers can also be used.
<<横電界駆動用の導電膜>>
基板は、横電界駆動型液晶表示素子に用いる場合、横電界駆動用の導電膜を有する。
該導電膜として、液晶表示素子が透過型である場合、ITO(Indium Tin Oxide:酸化インジウムスズ)、IZO(Indium Zinc Oxide:酸化インジウム亜鉛)などを挙げることができるが、これらに限定されない。
また、反射型の液晶表示素子の場合、導電膜として、アルミなどの光を反射する材料などを挙げることができるがこれらに限定されない。
基板に導電膜を形成する方法は、従来公知の手法を用いることができる。 <<Conductive film for horizontal electric field drive>>
When used in a lateral electric field driven liquid crystal display element, the substrate has a conductive film for lateral electric field driving.
When the liquid crystal display element is a transmissive type, examples of the conductive film include, but are not limited to, ITO (Indium Tin Oxide), IZO (Indium Zinc Oxide), and the like.
In the case of a reflective liquid crystal display element, the conductive film may be made of a material that reflects light, such as aluminum, but is not limited thereto.
A conventionally known method can be used to form the conductive film on the substrate.
基板は、横電界駆動型液晶表示素子に用いる場合、横電界駆動用の導電膜を有する。
該導電膜として、液晶表示素子が透過型である場合、ITO(Indium Tin Oxide:酸化インジウムスズ)、IZO(Indium Zinc Oxide:酸化インジウム亜鉛)などを挙げることができるが、これらに限定されない。
また、反射型の液晶表示素子の場合、導電膜として、アルミなどの光を反射する材料などを挙げることができるがこれらに限定されない。
基板に導電膜を形成する方法は、従来公知の手法を用いることができる。 <<Conductive film for horizontal electric field drive>>
When used in a lateral electric field driven liquid crystal display element, the substrate has a conductive film for lateral electric field driving.
When the liquid crystal display element is a transmissive type, examples of the conductive film include, but are not limited to, ITO (Indium Tin Oxide), IZO (Indium Zinc Oxide), and the like.
In the case of a reflective liquid crystal display element, the conductive film may be made of a material that reflects light, such as aluminum, but is not limited thereto.
A conventionally known method can be used to form the conductive film on the substrate.
工程[I]~[III]は上記と同じである。ただし、液晶配向膜を形成する際の、工程[I]における塗膜の厚みは、厚すぎると液晶表示素子の消費電力の面で不利となり、薄すぎると液晶表示素子の信頼性が低下する場合があるので、好ましくは5~300nm、より好ましくは10~150nmである。
Steps [I] to [III] are the same as above. However, if the thickness of the coating film in step [I] when forming the liquid crystal alignment film is too thick, it will be disadvantageous in terms of power consumption of the liquid crystal display element, and if it is too thin, the reliability of the liquid crystal display element will decrease. Therefore, the wavelength is preferably 5 to 300 nm, more preferably 10 to 150 nm.
<液晶表示素子>及び<液晶表示素子の製造方法>
本発明は、上記で得られた液晶配向膜を有する基板を有する液晶表示素子、特に横電界駆動型液晶表示素子を提供する。 <Liquid crystal display element> and <method for manufacturing liquid crystal display element>
The present invention provides a liquid crystal display element, particularly a transverse electric field drive type liquid crystal display element, having a substrate having the liquid crystal alignment film obtained above.
本発明は、上記で得られた液晶配向膜を有する基板を有する液晶表示素子、特に横電界駆動型液晶表示素子を提供する。 <Liquid crystal display element> and <method for manufacturing liquid crystal display element>
The present invention provides a liquid crystal display element, particularly a transverse electric field drive type liquid crystal display element, having a substrate having the liquid crystal alignment film obtained above.
具体的には、上記で得られた、液晶配向膜を有する基板(第1の基板)の他に、第2の基板を準備することにより、横電界駆動型液晶表示素子を得ることができる。
第2の基板は、横電界駆動用の導電膜を有する基板に代わって、横電界駆動用の導電膜を有しない基板を用いる場合、第1の基板と同様に、横電界駆動用の導電膜を有する基板を用いる場合がある。また、第2の基板には、第1の基板と同様に、液晶配向膜を有するのがよい。 Specifically, by preparing a second substrate in addition to the substrate (first substrate) having a liquid crystal alignment film obtained above, a transverse electric field drive type liquid crystal display element can be obtained.
When a substrate not having a conductive film for transverse electric field drive is used as the second substrate instead of a substrate having a conductive film for transverse electric field drive, the second substrate has a conductive film for transverse electric field drive, as in the first substrate. In some cases, a substrate having the following characteristics is used. Further, it is preferable that the second substrate has a liquid crystal alignment film, similarly to the first substrate.
第2の基板は、横電界駆動用の導電膜を有する基板に代わって、横電界駆動用の導電膜を有しない基板を用いる場合、第1の基板と同様に、横電界駆動用の導電膜を有する基板を用いる場合がある。また、第2の基板には、第1の基板と同様に、液晶配向膜を有するのがよい。 Specifically, by preparing a second substrate in addition to the substrate (first substrate) having a liquid crystal alignment film obtained above, a transverse electric field drive type liquid crystal display element can be obtained.
When a substrate not having a conductive film for transverse electric field drive is used as the second substrate instead of a substrate having a conductive film for transverse electric field drive, the second substrate has a conductive film for transverse electric field drive, as in the first substrate. In some cases, a substrate having the following characteristics is used. Further, it is preferable that the second substrate has a liquid crystal alignment film, similarly to the first substrate.
液晶表示素子、特に横電界駆動型液晶表示素子の製造方法は、
[IV] 上記で得られた第1及び第2の基板を、液晶を介して第1及び第2の基板の液晶配向膜が相対するように、対向配置して液晶表示素子を得る工程;
を有する。これにより、液晶表示素子、特に横電界駆動型液晶表示素子を得ることができる。 The manufacturing method of liquid crystal display elements, especially lateral electric field drive type liquid crystal display elements, is as follows:
[IV] Obtaining a liquid crystal display element by arranging the first and second substrates obtained above to face each other so that the liquid crystal alignment films of the first and second substrates face each other via the liquid crystal;
has. Thereby, a liquid crystal display element, particularly a lateral electric field drive type liquid crystal display element, can be obtained.
[IV] 上記で得られた第1及び第2の基板を、液晶を介して第1及び第2の基板の液晶配向膜が相対するように、対向配置して液晶表示素子を得る工程;
を有する。これにより、液晶表示素子、特に横電界駆動型液晶表示素子を得ることができる。 The manufacturing method of liquid crystal display elements, especially lateral electric field drive type liquid crystal display elements, is as follows:
[IV] Obtaining a liquid crystal display element by arranging the first and second substrates obtained above to face each other so that the liquid crystal alignment films of the first and second substrates face each other via the liquid crystal;
has. Thereby, a liquid crystal display element, particularly a lateral electric field drive type liquid crystal display element, can be obtained.
<工程[IV]>
[IV]工程は、[III]で得られた、横電界駆動用の導電膜上に液晶配向膜を有する基板(第1の基板)と、同様に上記[I’]~[III’]で得られた、液晶配向膜付基板(第2の基板)とを、液晶を介して、双方の液晶配向膜が相対するように対向配置して、公知の方法で液晶セルを作製し、横電界駆動型液晶表示素子を作製する工程である。なお、工程[I’]~[III’]は、工程[I]において、横電界駆動用の導電膜の有無の違い以外、工程[I]~[III]と同様に行うことができる。工程[I]~[III]と工程[I’]~[III’]との相違点は、上述した導電膜の有無だけであるため、工程[I’]~[III’]の説明を省略する。 <Step [IV]>
[IV] Step is the substrate (first substrate) having a liquid crystal alignment film on the conductive film for transverse electric field driving obtained in [III], and the substrate obtained in [I'] to [III'] above. The obtained substrate with a liquid crystal alignment film (second substrate) was placed facing each other with the liquid crystal interposed therebetween so that both liquid crystal alignment films faced each other, a liquid crystal cell was produced by a known method, and a transverse electric field was applied. This is a process of manufacturing a drive type liquid crystal display element. Note that steps [I'] to [III'] can be performed in the same manner as steps [I] to [III] except for the difference in the presence or absence of a conductive film for horizontal electric field drive in step [I]. The only difference between steps [I] to [III] and steps [I'] to [III'] is the presence or absence of the above-mentioned conductive film, so the explanation of steps [I'] to [III'] will be omitted. do.
[IV]工程は、[III]で得られた、横電界駆動用の導電膜上に液晶配向膜を有する基板(第1の基板)と、同様に上記[I’]~[III’]で得られた、液晶配向膜付基板(第2の基板)とを、液晶を介して、双方の液晶配向膜が相対するように対向配置して、公知の方法で液晶セルを作製し、横電界駆動型液晶表示素子を作製する工程である。なお、工程[I’]~[III’]は、工程[I]において、横電界駆動用の導電膜の有無の違い以外、工程[I]~[III]と同様に行うことができる。工程[I]~[III]と工程[I’]~[III’]との相違点は、上述した導電膜の有無だけであるため、工程[I’]~[III’]の説明を省略する。 <Step [IV]>
[IV] Step is the substrate (first substrate) having a liquid crystal alignment film on the conductive film for transverse electric field driving obtained in [III], and the substrate obtained in [I'] to [III'] above. The obtained substrate with a liquid crystal alignment film (second substrate) was placed facing each other with the liquid crystal interposed therebetween so that both liquid crystal alignment films faced each other, a liquid crystal cell was produced by a known method, and a transverse electric field was applied. This is a process of manufacturing a drive type liquid crystal display element. Note that steps [I'] to [III'] can be performed in the same manner as steps [I] to [III] except for the difference in the presence or absence of a conductive film for horizontal electric field drive in step [I]. The only difference between steps [I] to [III] and steps [I'] to [III'] is the presence or absence of the above-mentioned conductive film, so the explanation of steps [I'] to [III'] will be omitted. do.
液晶セル又は液晶表示素子の作製の一例を挙げるならば、上述の第1及び第2の基板を用意し、片方の基板の液晶配向膜上にスペーサを散布し、液晶配向膜面が内側になるようにして、もう片方の基板を貼り合わせ、液晶を減圧注入して封止する方法、または、スペーサを散布した液晶配向膜面に液晶を滴下した後に、基板を貼り合わせて封止を行う方法、等を例示することができる。このとき、横電界駆動型液晶表示素子を製造する場合には片側の基板には横電界駆動用の櫛歯のような構造の電極を有する基板を用いることが好ましい。
スペーサの径は、好ましくは1μm~30μm、より好ましくは2μm~10μmである。このスペーサ径が、液晶層を挟持する一対の基板間距離、すなわち、液晶層の厚みを決めることになる。 To give an example of manufacturing a liquid crystal cell or a liquid crystal display element, the above-mentioned first and second substrates are prepared, and spacers are sprinkled on the liquid crystal alignment film of one of the substrates, so that the liquid crystal alignment film surface is on the inside. A method of bonding the other substrate and sealing by injecting liquid crystal under reduced pressure, or a method of dripping liquid crystal onto the surface of the liquid crystal alignment film on which spacers have been sprinkled, and then bonding the substrates together and sealing. , etc. can be exemplified. At this time, when manufacturing a lateral electric field drive type liquid crystal display element, it is preferable to use a substrate having a comb-like structure of electrodes for lateral electric field driving as one of the substrates.
The diameter of the spacer is preferably 1 μm to 30 μm, more preferably 2 μm to 10 μm. This spacer diameter determines the distance between the pair of substrates that sandwich the liquid crystal layer, that is, the thickness of the liquid crystal layer.
スペーサの径は、好ましくは1μm~30μm、より好ましくは2μm~10μmである。このスペーサ径が、液晶層を挟持する一対の基板間距離、すなわち、液晶層の厚みを決めることになる。 To give an example of manufacturing a liquid crystal cell or a liquid crystal display element, the above-mentioned first and second substrates are prepared, and spacers are sprinkled on the liquid crystal alignment film of one of the substrates, so that the liquid crystal alignment film surface is on the inside. A method of bonding the other substrate and sealing by injecting liquid crystal under reduced pressure, or a method of dripping liquid crystal onto the surface of the liquid crystal alignment film on which spacers have been sprinkled, and then bonding the substrates together and sealing. , etc. can be exemplified. At this time, when manufacturing a lateral electric field drive type liquid crystal display element, it is preferable to use a substrate having a comb-like structure of electrodes for lateral electric field driving as one of the substrates.
The diameter of the spacer is preferably 1 μm to 30 μm, more preferably 2 μm to 10 μm. This spacer diameter determines the distance between the pair of substrates that sandwich the liquid crystal layer, that is, the thickness of the liquid crystal layer.
以上のように、本発明の重合体組成物又は液晶配向剤、該組成物又は液晶配向剤を用いて形成される液晶配向膜又は該配向膜を有する基板、及び該液晶配向膜又は基板を有して形成される液晶表示素子は、大画面で高精細の液晶テレビなどに好適に利用できる。
As described above, the polymer composition or liquid crystal aligning agent of the present invention, a liquid crystal aligning film formed using the composition or liquid crystal aligning agent, or a substrate having the aligning film, and a substrate having the liquid crystal aligning film or the substrate. The liquid crystal display element formed by this method can be suitably used for large-screen, high-definition liquid crystal televisions, etc.
以下、合成例、調製例、実施例及び比較例を挙げて、本発明をより具体的に説明するが、本発明は下記実施例に限定されない。
Hereinafter, the present invention will be explained in more detail with reference to Synthesis Examples, Preparation Examples, Examples, and Comparative Examples, but the present invention is not limited to the following Examples.
実施例で使用した光反応性基を有するモノマーMA1~MA2、並びに液晶性を有するモノマーMB1~MB4及びMC1~MC3を以下に示す。MA1は、国際公開第2011/084546号に記載された合成法に従って合成した。MA2は、特開2012-27354に記載された合成法に従って合成した。
MC1は、特開平9-118717号公報に記載された合成法に従って合成した。MB1は特開2016-128403号公報に記載された合成法に従って合成した。MB2~MB4は新規化合物であり、下記に合成法を示す。MC2およびMC3は、国際公開第2017/135130号に記載された合成法に従って合成した。なお、MA1に由来する側鎖は側鎖(a1)に該当し、MB1~MB4に由来する側鎖は側鎖(a2)に該当し、MC1~MC3に由来する側鎖は側鎖(a3)に該当する。
Monomers MA1 to MA2 having a photoreactive group and monomers MB1 to MB4 and MC1 to MC3 having liquid crystal properties used in Examples are shown below. MA1 was synthesized according to the synthesis method described in International Publication No. 2011/084546. MA2 was synthesized according to the synthesis method described in JP-A-2012-27354.
MC1 was synthesized according to the synthesis method described in JP-A-9-118717. MB1 was synthesized according to the synthesis method described in JP-A-2016-128403. MB2 to MB4 are new compounds, and the synthesis method is shown below. MC2 and MC3 were synthesized according to the synthesis method described in International Publication No. 2017/135130. In addition, the side chain derived from MA1 corresponds to the side chain (a1), the side chain derived from MB1 to MB4 corresponds to the side chain (a2), and the side chain derived from MC1 to MC3 corresponds to the side chain (a3). Applies to.
MC1は、特開平9-118717号公報に記載された合成法に従って合成した。MB1は特開2016-128403号公報に記載された合成法に従って合成した。MB2~MB4は新規化合物であり、下記に合成法を示す。MC2およびMC3は、国際公開第2017/135130号に記載された合成法に従って合成した。なお、MA1に由来する側鎖は側鎖(a1)に該当し、MB1~MB4に由来する側鎖は側鎖(a2)に該当し、MC1~MC3に由来する側鎖は側鎖(a3)に該当する。
MC1 was synthesized according to the synthesis method described in JP-A-9-118717. MB1 was synthesized according to the synthesis method described in JP-A-2016-128403. MB2 to MB4 are new compounds, and the synthesis method is shown below. MC2 and MC3 were synthesized according to the synthesis method described in International Publication No. 2017/135130. In addition, the side chain derived from MA1 corresponds to the side chain (a1), the side chain derived from MB1 to MB4 corresponds to the side chain (a2), and the side chain derived from MC1 to MC3 corresponds to the side chain (a3). Applies to.
その他、本実施例で用いた試薬の略号を以下に示す。
(有機溶媒)
DMF:N,N-ジメチルホルムアミド
THF:テトラヒドロフラン
MeCN:アセトニトリル
NMP:N-メチル-2-ピロリドン
BCS:ブチルセロソルブ
PGME:プロピレングリコールモノメチルエーテル
PGMEA:プロピレングリコールモノメチルエーテルアセテート
CPN:シクロペンタノン
(重合開始剤)
AIBN:2,2’-アゾビスイソブチロニトリル
(界面活性剤)
F560:メガファックF-560(DIC社製) In addition, the abbreviations of reagents used in this example are shown below.
(organic solvent)
DMF: N,N-dimethylformamide THF: Tetrahydrofuran MeCN: Acetonitrile NMP: N-methyl-2-pyrrolidone BCS: Butyl cellosolve PGME: Propylene glycol monomethyl ether PGMEA: Propylene glycol monomethyl ether acetate CPN: Cyclopentanone (polymerization initiator)
AIBN: 2,2'-azobisisobutyronitrile (surfactant)
F560: Megafuck F-560 (manufactured by DIC)
(有機溶媒)
DMF:N,N-ジメチルホルムアミド
THF:テトラヒドロフラン
MeCN:アセトニトリル
NMP:N-メチル-2-ピロリドン
BCS:ブチルセロソルブ
PGME:プロピレングリコールモノメチルエーテル
PGMEA:プロピレングリコールモノメチルエーテルアセテート
CPN:シクロペンタノン
(重合開始剤)
AIBN:2,2’-アゾビスイソブチロニトリル
(界面活性剤)
F560:メガファックF-560(DIC社製) In addition, the abbreviations of reagents used in this example are shown below.
(organic solvent)
DMF: N,N-dimethylformamide THF: Tetrahydrofuran MeCN: Acetonitrile NMP: N-methyl-2-pyrrolidone BCS: Butyl cellosolve PGME: Propylene glycol monomethyl ether PGMEA: Propylene glycol monomethyl ether acetate CPN: Cyclopentanone (polymerization initiator)
AIBN: 2,2'-azobisisobutyronitrile (surfactant)
F560: Megafuck F-560 (manufactured by DIC)
<1H-NMRの測定>
装置:フーリエ変換型超伝導核磁気共鳴装置(FT-NMR)「AVANCE III」(BRUKER社製)500MHz。
溶媒:重水素化ジメチルスルホキシド(DMSO-d6)。
標準物質:テトラメチルシラン(TMS)。 < 1H -NMR measurement>
Equipment: Fourier transform superconducting nuclear magnetic resonance apparatus (FT-NMR) "AVANCE III" (manufactured by BRUKER) 500 MHz.
Solvent: Deuterated dimethyl sulfoxide (DMSO-d 6 ).
Standard material: Tetramethylsilane (TMS).
装置:フーリエ変換型超伝導核磁気共鳴装置(FT-NMR)「AVANCE III」(BRUKER社製)500MHz。
溶媒:重水素化ジメチルスルホキシド(DMSO-d6)。
標準物質:テトラメチルシラン(TMS)。 < 1H -NMR measurement>
Equipment: Fourier transform superconducting nuclear magnetic resonance apparatus (FT-NMR) "AVANCE III" (manufactured by BRUKER) 500 MHz.
Solvent: Deuterated dimethyl sulfoxide (DMSO-d 6 ).
Standard material: Tetramethylsilane (TMS).
<ポリマーの分子量測定>
ポリマーの分子量測定条件は、以下の通りである。
装置:島津製作所社製 Nexera GPCシステム(Shimadzu SCL-40)
カラム:Shodex社製カラム(LF-804、KF-801)
カラム温度:40℃
溶離液:テトラヒドロフラン(HPLCグレード)
流速:1.0mL/分
検量線作成用標準サンプル:ポリスチレン(PStQuick E/PStQuick F)(東ソー社製) <Polymer molecular weight measurement>
The conditions for measuring the molecular weight of the polymer are as follows.
Equipment: Shimadzu Nexera GPC system (Shimadzu SCL-40)
Column: Shodex column (LF-804, KF-801)
Column temperature: 40℃
Eluent: Tetrahydrofuran (HPLC grade)
Flow rate: 1.0 mL/min Standard sample for creating a calibration curve: Polystyrene (PStQuick E/PStQuick F) (manufactured by Tosoh Corporation)
ポリマーの分子量測定条件は、以下の通りである。
装置:島津製作所社製 Nexera GPCシステム(Shimadzu SCL-40)
カラム:Shodex社製カラム(LF-804、KF-801)
カラム温度:40℃
溶離液:テトラヒドロフラン(HPLCグレード)
流速:1.0mL/分
検量線作成用標準サンプル:ポリスチレン(PStQuick E/PStQuick F)(東ソー社製) <Polymer molecular weight measurement>
The conditions for measuring the molecular weight of the polymer are as follows.
Equipment: Shimadzu Nexera GPC system (Shimadzu SCL-40)
Column: Shodex column (LF-804, KF-801)
Column temperature: 40℃
Eluent: Tetrahydrofuran (HPLC grade)
Flow rate: 1.0 mL/min Standard sample for creating a calibration curve: Polystyrene (PStQuick E/PStQuick F) (manufactured by Tosoh Corporation)
[1]モノマーの合成
<<MB2の合成>>
200mL四つ口フラスコに、MC1(10.0g,32.6mmol)、DMF(50mg)、及びTHF(50g)を加え、塩化オキサリル(4.56g,35.9mmol)を滴下して室温で撹拌した。反応終了後、反応液をロータリーエバポレーターにて濃縮して塩素化物(薄黄色液体)を得た。得られた塩素化物にTHF(50g)及び3-(4-ヒドロキシフェニル)プロピオン酸メトキシメチル(7.19g,34.2mmol)を加え、窒素雰囲気下で氷冷し、トリエチルアミン(Et3N,3.96g,39.1mmol)を滴下して室温で撹拌した。反応終了後、反応液をロータリーエバポレーターにて濃縮した。酢酸エチル(100g)を加え、純水(200g)を用いて抽出を行った。有機層をロータリーエバポレーターにて濃縮し溶媒留去することで、MB2-1(薄褐色液体)を得た。500mL一口フラスコに、上記で得られたMB2-1、MeCN(150g)、1規定塩酸(50g)を加え、室温で撹拌した。反応終了後、反応液を純水(200g)に注ぎ、沈殿物を濾別した。得られた粗体をエタノール(50g)から再結晶することで、MB2(白色固体)を11.2g得た(収率75.7%)。目的物の1H-NMRの結果を以下に示す。この結果から、得られた固体が、目的のMB2であることを確認した。
1H-NMR(400MHz,DMSO-d6):δ(ppm)=12.2(s,1H),8.03-8.07(d,2H),7.28-7.32(d,2H),7.13-7.17(d,2H),7.08-7.12(d,2H),6.02(s,1H),5.66(s,1H),4.06-4.13(m,4H),2.82-2.88(m,2H),2.54-2.59(t,2H),1.88(s,3H),1.72-1.80(m,2H),1.61-1.69(m,2H),1.38-1.50(m,4H). [1] Synthesis of monomer
<<Synthesis of MB2>>
MC1 (10.0 g, 32.6 mmol), DMF (50 mg), and THF (50 g) were added to a 200 mL four-necked flask, and oxalyl chloride (4.56 g, 35.9 mmol) was added dropwise and stirred at room temperature. . After the reaction was completed, the reaction solution was concentrated using a rotary evaporator to obtain a chlorinated product (pale yellow liquid). THF (50 g) and methoxymethyl 3-(4-hydroxyphenyl)propionate (7.19 g, 34.2 mmol) were added to the obtained chlorinated product, cooled on ice under a nitrogen atmosphere, and triethylamine (Et 3 N, 3 .96 g, 39.1 mmol) was added dropwise and stirred at room temperature. After the reaction was completed, the reaction solution was concentrated using a rotary evaporator. Ethyl acetate (100 g) was added, and extraction was performed using pure water (200 g). The organic layer was concentrated using a rotary evaporator and the solvent was distilled off to obtain MB2-1 (light brown liquid). MB2-1 obtained above, MeCN (150 g), and 1N hydrochloric acid (50 g) were added to a 500 mL one-neck flask, and the mixture was stirred at room temperature. After the reaction was completed, the reaction solution was poured into pure water (200 g), and the precipitate was filtered off. The obtained crude product was recrystallized from ethanol (50 g) to obtain 11.2 g of MB2 (white solid) (yield 75.7%). The results of 1 H-NMR of the target product are shown below. From this result, it was confirmed that the obtained solid was the target MB2.
1 H-NMR (400 MHz, DMSO-d 6 ): δ (ppm) = 12.2 (s, 1H), 8.03-8.07 (d, 2H), 7.28-7.32 (d, 2H), 7.13-7.17 (d, 2H), 7.08-7.12 (d, 2H), 6.02 (s, 1H), 5.66 (s, 1H), 4.06 -4.13 (m, 4H), 2.82-2.88 (m, 2H), 2.54-2.59 (t, 2H), 1.88 (s, 3H), 1.72-1 .80 (m, 2H), 1.61-1.69 (m, 2H), 1.38-1.50 (m, 4H).
200mL四つ口フラスコに、MC1(10.0g,32.6mmol)、DMF(50mg)、及びTHF(50g)を加え、塩化オキサリル(4.56g,35.9mmol)を滴下して室温で撹拌した。反応終了後、反応液をロータリーエバポレーターにて濃縮して塩素化物(薄黄色液体)を得た。得られた塩素化物にTHF(50g)及び3-(4-ヒドロキシフェニル)プロピオン酸メトキシメチル(7.19g,34.2mmol)を加え、窒素雰囲気下で氷冷し、トリエチルアミン(Et3N,3.96g,39.1mmol)を滴下して室温で撹拌した。反応終了後、反応液をロータリーエバポレーターにて濃縮した。酢酸エチル(100g)を加え、純水(200g)を用いて抽出を行った。有機層をロータリーエバポレーターにて濃縮し溶媒留去することで、MB2-1(薄褐色液体)を得た。500mL一口フラスコに、上記で得られたMB2-1、MeCN(150g)、1規定塩酸(50g)を加え、室温で撹拌した。反応終了後、反応液を純水(200g)に注ぎ、沈殿物を濾別した。得られた粗体をエタノール(50g)から再結晶することで、MB2(白色固体)を11.2g得た(収率75.7%)。目的物の1H-NMRの結果を以下に示す。この結果から、得られた固体が、目的のMB2であることを確認した。
1H-NMR(400MHz,DMSO-d6):δ(ppm)=12.2(s,1H),8.03-8.07(d,2H),7.28-7.32(d,2H),7.13-7.17(d,2H),7.08-7.12(d,2H),6.02(s,1H),5.66(s,1H),4.06-4.13(m,4H),2.82-2.88(m,2H),2.54-2.59(t,2H),1.88(s,3H),1.72-1.80(m,2H),1.61-1.69(m,2H),1.38-1.50(m,4H). [1] Synthesis of monomer
MC1 (10.0 g, 32.6 mmol), DMF (50 mg), and THF (50 g) were added to a 200 mL four-necked flask, and oxalyl chloride (4.56 g, 35.9 mmol) was added dropwise and stirred at room temperature. . After the reaction was completed, the reaction solution was concentrated using a rotary evaporator to obtain a chlorinated product (pale yellow liquid). THF (50 g) and methoxymethyl 3-(4-hydroxyphenyl)propionate (7.19 g, 34.2 mmol) were added to the obtained chlorinated product, cooled on ice under a nitrogen atmosphere, and triethylamine (Et 3 N, 3 .96 g, 39.1 mmol) was added dropwise and stirred at room temperature. After the reaction was completed, the reaction solution was concentrated using a rotary evaporator. Ethyl acetate (100 g) was added, and extraction was performed using pure water (200 g). The organic layer was concentrated using a rotary evaporator and the solvent was distilled off to obtain MB2-1 (light brown liquid). MB2-1 obtained above, MeCN (150 g), and 1N hydrochloric acid (50 g) were added to a 500 mL one-neck flask, and the mixture was stirred at room temperature. After the reaction was completed, the reaction solution was poured into pure water (200 g), and the precipitate was filtered off. The obtained crude product was recrystallized from ethanol (50 g) to obtain 11.2 g of MB2 (white solid) (yield 75.7%). The results of 1 H-NMR of the target product are shown below. From this result, it was confirmed that the obtained solid was the target MB2.
1 H-NMR (400 MHz, DMSO-d 6 ): δ (ppm) = 12.2 (s, 1H), 8.03-8.07 (d, 2H), 7.28-7.32 (d, 2H), 7.13-7.17 (d, 2H), 7.08-7.12 (d, 2H), 6.02 (s, 1H), 5.66 (s, 1H), 4.06 -4.13 (m, 4H), 2.82-2.88 (m, 2H), 2.54-2.59 (t, 2H), 1.88 (s, 3H), 1.72-1 .80 (m, 2H), 1.61-1.69 (m, 2H), 1.38-1.50 (m, 4H).
200mL四つ口フラスコに、MC2(15g,35.2mmol)、3-(4-ヒドロキシフェニル)プロピオン酸メトキシメチル(7.78g,37.0mmol)、THF(75g)、1-(3-ジメチルアミノプロピル)-3-エチルカルボジイミド塩酸塩(EDC・HCl,8.09g,42.2mmol)、及び4-ジメチルアミノピリジン(DMAP,0.43g,3.52mmol)を加えて、室温で撹拌した。反応終了後、純水(450g)に注ぎ、沈殿物を濾別することで、MB3-1(白色固体)を得た。500mL一口フラスコに、上記で得られたMB3-1、MeCN(225g)、及び1規定塩酸(75g)を加え、室温で撹拌した。反応終了後、析出した沈殿物を濾別し、MeCN(45g)でリパルプ洗浄した。得られた粗体をTHF(150g)とMeCN(150g)の混合溶媒から再結晶することで、MB3(白色固体)を12.7g得た(収率62.9%)。目的物の1H-NMRの結果を以下に示す。この結果から、得られた固体が、目的のMB3であることを確認した。
1H-NMR(400MHz,DMSO-d6):δ(ppm)=12.2(s,1H),8.20-8.24(d,2H),8.08-8.12(d,2H),7.50-7.54(d,2H),7.31-7.35(d,2H),7.19-7.23(d,2H),7.11-7.16(d,2H),6.02(s,1H),5.67(s,1H),4.08-4.14(m,4H),2.84-2.89(t,2H),2.54-2.60(t,2H),1.88(s,3H),1.73-1.81(m,2H),1.62-1.69(m,2H),1.38-1.51(m,4H).
In a 200 mL four-neck flask, MC2 (15 g, 35.2 mmol), methoxymethyl 3-(4-hydroxyphenyl)propionate (7.78 g, 37.0 mmol), THF (75 g), 1-(3-dimethylamino) Propyl)-3-ethylcarbodiimide hydrochloride (EDC·HCl, 8.09 g, 42.2 mmol) and 4-dimethylaminopyridine (DMAP, 0.43 g, 3.52 mmol) were added and stirred at room temperature. After the reaction was completed, MB3-1 (white solid) was obtained by pouring into pure water (450 g) and filtering off the precipitate. MB3-1 obtained above, MeCN (225 g), and 1N hydrochloric acid (75 g) were added to a 500 mL one-neck flask, and the mixture was stirred at room temperature. After the reaction was completed, the deposited precipitate was filtered off and repulped and washed with MeCN (45 g). The obtained crude product was recrystallized from a mixed solvent of THF (150 g) and MeCN (150 g) to obtain 12.7 g of MB3 (white solid) (yield 62.9%). The results of 1 H-NMR of the target product are shown below. From this result, it was confirmed that the obtained solid was the target MB3.
1 H-NMR (400 MHz, DMSO-d 6 ): δ (ppm) = 12.2 (s, 1H), 8.20-8.24 (d, 2H), 8.08-8.12 (d, 2H), 7.50-7.54 (d, 2H), 7.31-7.35 (d, 2H), 7.19-7.23 (d, 2H), 7.11-7.16 ( d, 2H), 6.02 (s, 1H), 5.67 (s, 1H), 4.08-4.14 (m, 4H), 2.84-2.89 (t, 2H), 2 .54-2.60 (t, 2H), 1.88 (s, 3H), 1.73-1.81 (m, 2H), 1.62-1.69 (m, 2H), 1.38 -1.51 (m, 4H).
200mL四つ口フラスコに、MC3(10.0g,26.1mmol)、DMF(50mg)、及びTHF(50g)を加え、塩化オキサリル(3.64g,28.7mmol)を滴下して室温で撹拌した。反応終了後、反応液をロータリーエバポレーターにて濃縮して塩素化物(白色固体)を得た。得られた塩素化物にTHF(50g)及び3-(4-ヒドロキシフェニル)プロピオン酸メトキシメチル(5.76g,27.4mmol)を加え、窒素雰囲気下で氷冷し、トリエチルアミン(3.17g,31.3mmol)を滴下して室温で撹拌した。反応終了後、反応液を純水(200g)に注ぎ、得られた沈殿物を濾別することで、MB4-1(白色固体)を得た。1,000mL一口フラスコに、上記で得られたMB4-1、MeCN(300g)、及び1規定塩酸(100g)を加え、室温で撹拌した。反応終了後、析出した沈殿物を濾別し、MeCN(30g)でリパルプ洗浄した。得られた粗体をTHF(10g)とMeCN(100g)の混合溶媒から再結晶することで、MB4(白色固体)を11.3g得た(収率81.9%)。目的物の1H-NMRの結果を以下に示す。この結果から、得られた固体が、目的のMB4であることを確認した。
1H-NMR(400MHz,DMSO-d6):δ(ppm)=12.2(s,1H),8.13-8.17(d,2H),7.84-7.88(d,2H),7.71-7.75(d,2H),7.30-7.34(d,2H),7.18-7.21(d,2H),7.04-7.08(d,2H),6.02(s,1H),5.66(s,1H),4.09-4.13(t,2H),4.01-4.06(t,2H),2.83-2.89(t,2H),2.55-2.60(t,2H),1.88(s,3H),1.71-1.79(m,2H),1.61-1.69(m,2H),1.38-1.51(m,4H).
MC3 (10.0 g, 26.1 mmol), DMF (50 mg), and THF (50 g) were added to a 200 mL four-necked flask, and oxalyl chloride (3.64 g, 28.7 mmol) was added dropwise and stirred at room temperature. . After the reaction was completed, the reaction solution was concentrated using a rotary evaporator to obtain a chlorinated product (white solid). THF (50 g) and methoxymethyl 3-(4-hydroxyphenyl)propionate (5.76 g, 27.4 mmol) were added to the obtained chlorinated product, cooled on ice under nitrogen atmosphere, and triethylamine (3.17 g, 31 mmol) was added to the obtained chlorinated product. .3 mmol) was added dropwise and stirred at room temperature. After the reaction was completed, the reaction solution was poured into pure water (200 g), and the resulting precipitate was filtered off to obtain MB4-1 (white solid). MB4-1 obtained above, MeCN (300 g), and 1N hydrochloric acid (100 g) were added to a 1,000 mL one-neck flask and stirred at room temperature. After the reaction was completed, the deposited precipitate was filtered off and repulped and washed with MeCN (30 g). The obtained crude product was recrystallized from a mixed solvent of THF (10 g) and MeCN (100 g) to obtain 11.3 g of MB4 (white solid) (yield: 81.9%). The results of 1 H-NMR of the target product are shown below. From this result, it was confirmed that the obtained solid was the target MB4.
1 H-NMR (400 MHz, DMSO-d 6 ): δ (ppm) = 12.2 (s, 1H), 8.13-8.17 (d, 2H), 7.84-7.88 (d, 2H), 7.71-7.75 (d, 2H), 7.30-7.34 (d, 2H), 7.18-7.21 (d, 2H), 7.04-7.08 ( d, 2H), 6.02 (s, 1H), 5.66 (s, 1H), 4.09-4.13 (t, 2H), 4.01-4.06 (t, 2H), 2 .83-2.89 (t, 2H), 2.55-2.60 (t, 2H), 1.88 (s, 3H), 1.71-1.79 (m, 2H), 1.61 -1.69 (m, 2H), 1.38-1.51 (m, 4H).
[2]重合体の合成
<合成例1>
NMP(21.4g)中に、MA1(2.24g、6.74mmol)、MC1(10.3g、33.6mmol)、MB1(1.98g、4.49mmol)及びAIBN(0.740g、4.51mmol)を溶解させ、モノマー混合溶液を調製した。窒素雰囲気下、60℃で、NMP(14.3g)中にモノマー混合溶液を2時間かけて滴下した。滴下終了後、60℃で12時間反応させた。反応終了後、メタノール/純水混合溶媒中に反応液を注ぎ込み、ポリマーを析出させ、濾別し、メタノール洗浄することでポリマー粉体P-1(13.0g)を得た。P-1の数平均分子量は22,000、重量平均分子量は74,000であった。 [2] Synthesis of polymer <Synthesis Example 1>
In NMP (21.4 g) were MA1 (2.24 g, 6.74 mmol), MC1 (10.3 g, 33.6 mmol), MB1 (1.98 g, 4.49 mmol) and AIBN (0.740 g, 4. 51 mmol) was dissolved to prepare a monomer mixed solution. The monomer mixed solution was added dropwise to NMP (14.3 g) at 60° C. over 2 hours under a nitrogen atmosphere. After the dropwise addition was completed, the reaction was carried out at 60° C. for 12 hours. After the reaction was completed, the reaction solution was poured into a methanol/pure water mixed solvent to precipitate the polymer, which was filtered and washed with methanol to obtain polymer powder P-1 (13.0 g). The number average molecular weight of P-1 was 22,000, and the weight average molecular weight was 74,000.
<合成例1>
NMP(21.4g)中に、MA1(2.24g、6.74mmol)、MC1(10.3g、33.6mmol)、MB1(1.98g、4.49mmol)及びAIBN(0.740g、4.51mmol)を溶解させ、モノマー混合溶液を調製した。窒素雰囲気下、60℃で、NMP(14.3g)中にモノマー混合溶液を2時間かけて滴下した。滴下終了後、60℃で12時間反応させた。反応終了後、メタノール/純水混合溶媒中に反応液を注ぎ込み、ポリマーを析出させ、濾別し、メタノール洗浄することでポリマー粉体P-1(13.0g)を得た。P-1の数平均分子量は22,000、重量平均分子量は74,000であった。 [2] Synthesis of polymer <Synthesis Example 1>
In NMP (21.4 g) were MA1 (2.24 g, 6.74 mmol), MC1 (10.3 g, 33.6 mmol), MB1 (1.98 g, 4.49 mmol) and AIBN (0.740 g, 4. 51 mmol) was dissolved to prepare a monomer mixed solution. The monomer mixed solution was added dropwise to NMP (14.3 g) at 60° C. over 2 hours under a nitrogen atmosphere. After the dropwise addition was completed, the reaction was carried out at 60° C. for 12 hours. After the reaction was completed, the reaction solution was poured into a methanol/pure water mixed solvent to precipitate the polymer, which was filtered and washed with methanol to obtain polymer powder P-1 (13.0 g). The number average molecular weight of P-1 was 22,000, and the weight average molecular weight was 74,000.
<合成例2>
NMP(28.6g)中に、MA1(2.24g、6.74mmol)、MC1(8.96g、29.3mmol)、MB1(3.96g、8.99mmol)及びAIBN(0.740g、4.51mmol)を溶解させ、モノマー混合溶液を調製した。窒素雰囲気下、60℃で、NMP(19.1g)中にモノマー混合溶液を2時間かけて滴下した。滴下終了後、60℃で12時間反応させた。反応終了後、メタノール/純水混合溶媒中に反応液を注ぎ込み、ポリマーを析出させ、濾別し、メタノール洗浄することでポリマー粉体P-2(13.6g)を得た。P-2の数平均分子量は23,000、重量平均分子量は84,000であった。 <Synthesis example 2>
In NMP (28.6 g) were MA1 (2.24 g, 6.74 mmol), MC1 (8.96 g, 29.3 mmol), MB1 (3.96 g, 8.99 mmol) and AIBN (0.740 g, 4. 51 mmol) was dissolved to prepare a monomer mixed solution. The monomer mixed solution was added dropwise to NMP (19.1 g) at 60° C. over 2 hours under a nitrogen atmosphere. After the dropwise addition was completed, the reaction was carried out at 60° C. for 12 hours. After the reaction was completed, the reaction solution was poured into a methanol/pure water mixed solvent to precipitate the polymer, which was filtered and washed with methanol to obtain polymer powder P-2 (13.6 g). The number average molecular weight of P-2 was 23,000, and the weight average molecular weight was 84,000.
NMP(28.6g)中に、MA1(2.24g、6.74mmol)、MC1(8.96g、29.3mmol)、MB1(3.96g、8.99mmol)及びAIBN(0.740g、4.51mmol)を溶解させ、モノマー混合溶液を調製した。窒素雰囲気下、60℃で、NMP(19.1g)中にモノマー混合溶液を2時間かけて滴下した。滴下終了後、60℃で12時間反応させた。反応終了後、メタノール/純水混合溶媒中に反応液を注ぎ込み、ポリマーを析出させ、濾別し、メタノール洗浄することでポリマー粉体P-2(13.6g)を得た。P-2の数平均分子量は23,000、重量平均分子量は84,000であった。 <Synthesis example 2>
In NMP (28.6 g) were MA1 (2.24 g, 6.74 mmol), MC1 (8.96 g, 29.3 mmol), MB1 (3.96 g, 8.99 mmol) and AIBN (0.740 g, 4. 51 mmol) was dissolved to prepare a monomer mixed solution. The monomer mixed solution was added dropwise to NMP (19.1 g) at 60° C. over 2 hours under a nitrogen atmosphere. After the dropwise addition was completed, the reaction was carried out at 60° C. for 12 hours. After the reaction was completed, the reaction solution was poured into a methanol/pure water mixed solvent to precipitate the polymer, which was filtered and washed with methanol to obtain polymer powder P-2 (13.6 g). The number average molecular weight of P-2 was 23,000, and the weight average molecular weight was 84,000.
<合成例3>
NMP(29.7g)中に、MA1(2.24g、6.74mmol)、MC1(7.59g、24.8mmol)、MB1(5.95g、13.5mmol)及びAIBN(0.740g、4.51mmol)を溶解させ、モノマー混合溶液を調製した。窒素雰囲気下、60℃で、NMP(19.8g)中にモノマー混合溶液を2時間かけて滴下した。滴下終了後、60℃で12時間反応させた。反応終了後、メタノール/純水混合溶媒中に反応液を注ぎ込み、ポリマーを析出させ、濾別し、メタノール洗浄することでポリマー粉体P-3(13.8g)を得た。P-3の数平均分子量は30,000、重量平均分子量は95,000であった。 <Synthesis example 3>
In NMP (29.7 g) were MA1 (2.24 g, 6.74 mmol), MC1 (7.59 g, 24.8 mmol), MB1 (5.95 g, 13.5 mmol) and AIBN (0.740 g, 4. 51 mmol) was dissolved to prepare a monomer mixed solution. The monomer mixed solution was added dropwise to NMP (19.8 g) at 60° C. over 2 hours under a nitrogen atmosphere. After the dropwise addition was completed, the reaction was carried out at 60° C. for 12 hours. After the reaction was completed, the reaction solution was poured into a methanol/pure water mixed solvent to precipitate the polymer, which was filtered and washed with methanol to obtain polymer powder P-3 (13.8 g). The number average molecular weight of P-3 was 30,000, and the weight average molecular weight was 95,000.
NMP(29.7g)中に、MA1(2.24g、6.74mmol)、MC1(7.59g、24.8mmol)、MB1(5.95g、13.5mmol)及びAIBN(0.740g、4.51mmol)を溶解させ、モノマー混合溶液を調製した。窒素雰囲気下、60℃で、NMP(19.8g)中にモノマー混合溶液を2時間かけて滴下した。滴下終了後、60℃で12時間反応させた。反応終了後、メタノール/純水混合溶媒中に反応液を注ぎ込み、ポリマーを析出させ、濾別し、メタノール洗浄することでポリマー粉体P-3(13.8g)を得た。P-3の数平均分子量は30,000、重量平均分子量は95,000であった。 <Synthesis example 3>
In NMP (29.7 g) were MA1 (2.24 g, 6.74 mmol), MC1 (7.59 g, 24.8 mmol), MB1 (5.95 g, 13.5 mmol) and AIBN (0.740 g, 4. 51 mmol) was dissolved to prepare a monomer mixed solution. The monomer mixed solution was added dropwise to NMP (19.8 g) at 60° C. over 2 hours under a nitrogen atmosphere. After the dropwise addition was completed, the reaction was carried out at 60° C. for 12 hours. After the reaction was completed, the reaction solution was poured into a methanol/pure water mixed solvent to precipitate the polymer, which was filtered and washed with methanol to obtain polymer powder P-3 (13.8 g). The number average molecular weight of P-3 was 30,000, and the weight average molecular weight was 95,000.
<合成例4>
NMP(22.4g)中に、MA1(1.75g、5.26mmol)、MC1(6.97g、22.8mmol)、MB2(3.18g、7.00mmol)及びAIBN(0.570g、3.47mmol)を溶解させ、モノマー混合溶液を調製した。窒素雰囲気下、60℃で、NMP(15.0g)中にモノマー混合溶液を2時間かけて滴下した。滴下終了後、60℃で12時間反応させた。反応終了後、メタノール/純水混合溶媒中に反応液を注ぎ込み、ポリマーを析出させ、濾別し、メタノール洗浄することでポリマー粉体P-4(9.98g)を得た。P-4の数平均分子量は19,000、重量平均分子量は54,000であった。 <Synthesis example 4>
In NMP (22.4 g) were MA1 (1.75 g, 5.26 mmol), MC1 (6.97 g, 22.8 mmol), MB2 (3.18 g, 7.00 mmol) and AIBN (0.570 g, 3. 47 mmol) was dissolved to prepare a monomer mixed solution. The monomer mixed solution was added dropwise to NMP (15.0 g) at 60° C. over 2 hours under a nitrogen atmosphere. After the dropwise addition was completed, the mixture was reacted at 60° C. for 12 hours. After the reaction was completed, the reaction solution was poured into a methanol/pure water mixed solvent to precipitate the polymer, which was filtered and washed with methanol to obtain polymer powder P-4 (9.98 g). P-4 had a number average molecular weight of 19,000 and a weight average molecular weight of 54,000.
NMP(22.4g)中に、MA1(1.75g、5.26mmol)、MC1(6.97g、22.8mmol)、MB2(3.18g、7.00mmol)及びAIBN(0.570g、3.47mmol)を溶解させ、モノマー混合溶液を調製した。窒素雰囲気下、60℃で、NMP(15.0g)中にモノマー混合溶液を2時間かけて滴下した。滴下終了後、60℃で12時間反応させた。反応終了後、メタノール/純水混合溶媒中に反応液を注ぎ込み、ポリマーを析出させ、濾別し、メタノール洗浄することでポリマー粉体P-4(9.98g)を得た。P-4の数平均分子量は19,000、重量平均分子量は54,000であった。 <Synthesis example 4>
In NMP (22.4 g) were MA1 (1.75 g, 5.26 mmol), MC1 (6.97 g, 22.8 mmol), MB2 (3.18 g, 7.00 mmol) and AIBN (0.570 g, 3. 47 mmol) was dissolved to prepare a monomer mixed solution. The monomer mixed solution was added dropwise to NMP (15.0 g) at 60° C. over 2 hours under a nitrogen atmosphere. After the dropwise addition was completed, the mixture was reacted at 60° C. for 12 hours. After the reaction was completed, the reaction solution was poured into a methanol/pure water mixed solvent to precipitate the polymer, which was filtered and washed with methanol to obtain polymer powder P-4 (9.98 g). P-4 had a number average molecular weight of 19,000 and a weight average molecular weight of 54,000.
<合成例5>
NMP(22.9g)中に、MA1(2.49g、7.49mmol)、MC1(13.0g、42.4mmol)及びAIBN(0.820g、5.00mmol)を溶解させ、モノマー混合溶液を調製した。窒素雰囲気下、60℃で、NMP(15.2g)中にモノマー混合溶液を2時間かけて滴下した。滴下終了後、60℃で12時間反応させた。反応終了後、メタノール/純水混合溶媒中に反応液を注ぎ込み、ポリマーを析出させ、濾別し、メタノール洗浄することでポリマー粉体P-5(12.4g)を得た。P-5の数平均分子量は34,000、重量平均分子量は98,000であった。 <Synthesis example 5>
MA1 (2.49 g, 7.49 mmol), MC1 (13.0 g, 42.4 mmol) and AIBN (0.820 g, 5.00 mmol) were dissolved in NMP (22.9 g) to prepare a monomer mixed solution. did. The monomer mixed solution was added dropwise to NMP (15.2 g) at 60° C. over 2 hours under a nitrogen atmosphere. After the dropwise addition was completed, the reaction was carried out at 60° C. for 12 hours. After the reaction was completed, the reaction solution was poured into a methanol/pure water mixed solvent to precipitate the polymer, which was filtered and washed with methanol to obtain polymer powder P-5 (12.4 g). The number average molecular weight of P-5 was 34,000, and the weight average molecular weight was 98,000.
NMP(22.9g)中に、MA1(2.49g、7.49mmol)、MC1(13.0g、42.4mmol)及びAIBN(0.820g、5.00mmol)を溶解させ、モノマー混合溶液を調製した。窒素雰囲気下、60℃で、NMP(15.2g)中にモノマー混合溶液を2時間かけて滴下した。滴下終了後、60℃で12時間反応させた。反応終了後、メタノール/純水混合溶媒中に反応液を注ぎ込み、ポリマーを析出させ、濾別し、メタノール洗浄することでポリマー粉体P-5(12.4g)を得た。P-5の数平均分子量は34,000、重量平均分子量は98,000であった。 <Synthesis example 5>
MA1 (2.49 g, 7.49 mmol), MC1 (13.0 g, 42.4 mmol) and AIBN (0.820 g, 5.00 mmol) were dissolved in NMP (22.9 g) to prepare a monomer mixed solution. did. The monomer mixed solution was added dropwise to NMP (15.2 g) at 60° C. over 2 hours under a nitrogen atmosphere. After the dropwise addition was completed, the reaction was carried out at 60° C. for 12 hours. After the reaction was completed, the reaction solution was poured into a methanol/pure water mixed solvent to precipitate the polymer, which was filtered and washed with methanol to obtain polymer powder P-5 (12.4 g). The number average molecular weight of P-5 was 34,000, and the weight average molecular weight was 98,000.
<合成例6>
NMP(22.7g)中に、MA1(1.79g、5.39mmol)、MC1(7.17g、23.4mmol)、MC2(3.07g、7.20mmol)及びAIBN(0.59g、3.59mmol)を溶解させ、モノマー混合溶液を調製した。窒素雰囲気下、60℃で、NMP(15.2g)中にモノマー混合溶液を2時間かけて滴下した。滴下終了後、60℃で12時間反応させた。反応終了後、メタノール/純水混合溶媒中に反応液を注ぎ込み、ポリマーを析出させ、濾別し、メタノール洗浄することでポリマー粉体P-6(10.1g)を得た。 <Synthesis example 6>
In NMP (22.7 g) were MA1 (1.79 g, 5.39 mmol), MC1 (7.17 g, 23.4 mmol), MC2 (3.07 g, 7.20 mmol) and AIBN (0.59 g, 3. 59 mmol) was dissolved to prepare a monomer mixed solution. The monomer mixed solution was added dropwise to NMP (15.2 g) at 60° C. over 2 hours under a nitrogen atmosphere. After the dropwise addition was completed, the reaction was carried out at 60° C. for 12 hours. After the reaction was completed, the reaction solution was poured into a methanol/pure water mixed solvent to precipitate the polymer, which was filtered and washed with methanol to obtain polymer powder P-6 (10.1 g).
NMP(22.7g)中に、MA1(1.79g、5.39mmol)、MC1(7.17g、23.4mmol)、MC2(3.07g、7.20mmol)及びAIBN(0.59g、3.59mmol)を溶解させ、モノマー混合溶液を調製した。窒素雰囲気下、60℃で、NMP(15.2g)中にモノマー混合溶液を2時間かけて滴下した。滴下終了後、60℃で12時間反応させた。反応終了後、メタノール/純水混合溶媒中に反応液を注ぎ込み、ポリマーを析出させ、濾別し、メタノール洗浄することでポリマー粉体P-6(10.1g)を得た。 <Synthesis example 6>
In NMP (22.7 g) were MA1 (1.79 g, 5.39 mmol), MC1 (7.17 g, 23.4 mmol), MC2 (3.07 g, 7.20 mmol) and AIBN (0.59 g, 3. 59 mmol) was dissolved to prepare a monomer mixed solution. The monomer mixed solution was added dropwise to NMP (15.2 g) at 60° C. over 2 hours under a nitrogen atmosphere. After the dropwise addition was completed, the reaction was carried out at 60° C. for 12 hours. After the reaction was completed, the reaction solution was poured into a methanol/pure water mixed solvent to precipitate the polymer, which was filtered and washed with methanol to obtain polymer powder P-6 (10.1 g).
<合成例7>
NMP(21.3g)中に、MA1(1.99g、6.00mmol)、MC1(7.97g、26.0mmol)、MB3(4.58g、8.00mmol)及びAIBN(0.66g、4.00mmol)を溶解させ、モノマー混合溶液を調製した。窒素雰囲気下、60℃で、NMP(14.2g)中にモノマー混合溶液を2時間かけて滴下した。滴下終了後、60℃で12時間反応させた。反応終了後、メタノール/純水混合溶媒中に反応液を注ぎ込み、ポリマーを析出させ、濾別し、メタノール洗浄することでポリマー粉体P-7(12.1g)を得た。P-7の数平均分子量は23,000、重量平均分子量は45,000であった。 <Synthesis example 7>
MA1 (1.99 g, 6.00 mmol), MC1 (7.97 g, 26.0 mmol), MB3 (4.58 g, 8.00 mmol) and AIBN (0.66 g, 4.0 mmol) in NMP (21.3 g). 00 mmol) to prepare a monomer mixed solution. The monomer mixed solution was added dropwise to NMP (14.2 g) at 60° C. over 2 hours under a nitrogen atmosphere. After the dropwise addition was completed, the reaction was carried out at 60° C. for 12 hours. After the reaction was completed, the reaction solution was poured into a methanol/pure water mixed solvent to precipitate the polymer, which was filtered and washed with methanol to obtain polymer powder P-7 (12.1 g). The number average molecular weight of P-7 was 23,000 and the weight average molecular weight was 45,000.
NMP(21.3g)中に、MA1(1.99g、6.00mmol)、MC1(7.97g、26.0mmol)、MB3(4.58g、8.00mmol)及びAIBN(0.66g、4.00mmol)を溶解させ、モノマー混合溶液を調製した。窒素雰囲気下、60℃で、NMP(14.2g)中にモノマー混合溶液を2時間かけて滴下した。滴下終了後、60℃で12時間反応させた。反応終了後、メタノール/純水混合溶媒中に反応液を注ぎ込み、ポリマーを析出させ、濾別し、メタノール洗浄することでポリマー粉体P-7(12.1g)を得た。P-7の数平均分子量は23,000、重量平均分子量は45,000であった。 <Synthesis example 7>
MA1 (1.99 g, 6.00 mmol), MC1 (7.97 g, 26.0 mmol), MB3 (4.58 g, 8.00 mmol) and AIBN (0.66 g, 4.0 mmol) in NMP (21.3 g). 00 mmol) to prepare a monomer mixed solution. The monomer mixed solution was added dropwise to NMP (14.2 g) at 60° C. over 2 hours under a nitrogen atmosphere. After the dropwise addition was completed, the reaction was carried out at 60° C. for 12 hours. After the reaction was completed, the reaction solution was poured into a methanol/pure water mixed solvent to precipitate the polymer, which was filtered and washed with methanol to obtain polymer powder P-7 (12.1 g). The number average molecular weight of P-7 was 23,000 and the weight average molecular weight was 45,000.
<合成例8>
NMP(20.8g)中に、MA1(1.99g、6.00mmol)、MC1(7.97g、26.0mmol)、MB4(4.25g、8.00mmol)及びAIBN(0.66g、4.00mmol)を溶解させ、モノマー混合溶液を調製した。窒素雰囲気下、60℃で、NMP(13.9g)中にモノマー混合溶液を2時間かけて滴下した。滴下終了後、60℃で12時間反応させた。反応終了後、メタノール/純水混合溶媒中に反応液を注ぎ込み、ポリマーを析出させ、濾別し、メタノール洗浄することでポリマー粉体P-8(12.6g)を得た。P-8の数平均分子量は24,000、重量平均分子量は52,000であった。 <Synthesis example 8>
MA1 (1.99 g, 6.00 mmol), MC1 (7.97 g, 26.0 mmol), MB4 (4.25 g, 8.00 mmol) and AIBN (0.66 g, 4.0 mmol) in NMP (20.8 g). 00 mmol) to prepare a monomer mixed solution. The monomer mixed solution was added dropwise to NMP (13.9 g) at 60° C. over 2 hours under a nitrogen atmosphere. After the dropwise addition was completed, the reaction was carried out at 60° C. for 12 hours. After the reaction was completed, the reaction solution was poured into a methanol/pure water mixed solvent to precipitate the polymer, which was filtered and washed with methanol to obtain polymer powder P-8 (12.6 g). The number average molecular weight of P-8 was 24,000, and the weight average molecular weight was 52,000.
NMP(20.8g)中に、MA1(1.99g、6.00mmol)、MC1(7.97g、26.0mmol)、MB4(4.25g、8.00mmol)及びAIBN(0.66g、4.00mmol)を溶解させ、モノマー混合溶液を調製した。窒素雰囲気下、60℃で、NMP(13.9g)中にモノマー混合溶液を2時間かけて滴下した。滴下終了後、60℃で12時間反応させた。反応終了後、メタノール/純水混合溶媒中に反応液を注ぎ込み、ポリマーを析出させ、濾別し、メタノール洗浄することでポリマー粉体P-8(12.6g)を得た。P-8の数平均分子量は24,000、重量平均分子量は52,000であった。 <Synthesis example 8>
MA1 (1.99 g, 6.00 mmol), MC1 (7.97 g, 26.0 mmol), MB4 (4.25 g, 8.00 mmol) and AIBN (0.66 g, 4.0 mmol) in NMP (20.8 g). 00 mmol) to prepare a monomer mixed solution. The monomer mixed solution was added dropwise to NMP (13.9 g) at 60° C. over 2 hours under a nitrogen atmosphere. After the dropwise addition was completed, the reaction was carried out at 60° C. for 12 hours. After the reaction was completed, the reaction solution was poured into a methanol/pure water mixed solvent to precipitate the polymer, which was filtered and washed with methanol to obtain polymer powder P-8 (12.6 g). The number average molecular weight of P-8 was 24,000, and the weight average molecular weight was 52,000.
<合成例9>
NMP(15.8g)中に、MA2(1.75g、4.00mmol)、MB1(1.76g、4.00mmol)、MC1(3.68g、12.0mmol)及びAIBN(0.33g、2.00mmol)を溶解させ、モノマー混合溶液を調製した。窒素雰囲気下、60℃で、NMP(6.76g)中にモノマー混合溶液を2時間かけて滴下した。滴下終了後、60℃で12時間反応させた。反応終了後、メタノール/純水混合溶媒中に反応液を注ぎ込み、ポリマーを析出させ、濾別し、メタノール洗浄することでポリマー粉体P-9(6.01g)を得た。P-9の数平均分子量は21,000、重量平均分子量は99,000であった。 <Synthesis example 9>
MA2 (1.75 g, 4.00 mmol), MB1 (1.76 g, 4.00 mmol), MC1 (3.68 g, 12.0 mmol) and AIBN (0.33 g, 2.0 mmol) in NMP (15.8 g). 00 mmol) to prepare a monomer mixed solution. The monomer mixed solution was added dropwise to NMP (6.76 g) at 60° C. over 2 hours under a nitrogen atmosphere. After the dropwise addition was completed, the mixture was reacted at 60° C. for 12 hours. After the reaction was completed, the reaction solution was poured into a methanol/pure water mixed solvent to precipitate the polymer, which was filtered and washed with methanol to obtain polymer powder P-9 (6.01 g). The number average molecular weight of P-9 was 21,000, and the weight average molecular weight was 99,000.
NMP(15.8g)中に、MA2(1.75g、4.00mmol)、MB1(1.76g、4.00mmol)、MC1(3.68g、12.0mmol)及びAIBN(0.33g、2.00mmol)を溶解させ、モノマー混合溶液を調製した。窒素雰囲気下、60℃で、NMP(6.76g)中にモノマー混合溶液を2時間かけて滴下した。滴下終了後、60℃で12時間反応させた。反応終了後、メタノール/純水混合溶媒中に反応液を注ぎ込み、ポリマーを析出させ、濾別し、メタノール洗浄することでポリマー粉体P-9(6.01g)を得た。P-9の数平均分子量は21,000、重量平均分子量は99,000であった。 <Synthesis example 9>
MA2 (1.75 g, 4.00 mmol), MB1 (1.76 g, 4.00 mmol), MC1 (3.68 g, 12.0 mmol) and AIBN (0.33 g, 2.0 mmol) in NMP (15.8 g). 00 mmol) to prepare a monomer mixed solution. The monomer mixed solution was added dropwise to NMP (6.76 g) at 60° C. over 2 hours under a nitrogen atmosphere. After the dropwise addition was completed, the mixture was reacted at 60° C. for 12 hours. After the reaction was completed, the reaction solution was poured into a methanol/pure water mixed solvent to precipitate the polymer, which was filtered and washed with methanol to obtain polymer powder P-9 (6.01 g). The number average molecular weight of P-9 was 21,000, and the weight average molecular weight was 99,000.
<合成例10>
NMP(15.7g)中に、MA2(1.75g、4.00mmol)、MC1(3.68g、12.0mmol)、MC2(1.71g、4.00mmol)及びAIBN(0.33g、2.00mmol)を溶解させ、モノマー混合溶液を調製した。窒素雰囲気下、60℃で、NMP(6.72g)中にモノマー混合溶液を2時間かけて滴下した。滴下終了後、60℃で12時間反応させた。反応終了後、メタノール/純水混合溶媒中に反応液を注ぎ込み、ポリマーを析出させ、濾別し、メタノール洗浄することでポリマー粉体P-10(6.12g)を得た。P-10の数平均分子量は20,000、重量平均分子量は50,000であった。 <Synthesis example 10>
MA2 (1.75 g, 4.00 mmol), MC1 (3.68 g, 12.0 mmol), MC2 (1.71 g, 4.00 mmol) and AIBN (0.33 g, 2.0 mmol) in NMP (15.7 g). 00 mmol) to prepare a monomer mixed solution. The monomer mixed solution was added dropwise to NMP (6.72 g) over 2 hours at 60° C. under a nitrogen atmosphere. After the dropwise addition was completed, the reaction was carried out at 60° C. for 12 hours. After the reaction was completed, the reaction solution was poured into a methanol/pure water mixed solvent to precipitate the polymer, which was filtered and washed with methanol to obtain polymer powder P-10 (6.12 g). The number average molecular weight of P-10 was 20,000, and the weight average molecular weight was 50,000.
NMP(15.7g)中に、MA2(1.75g、4.00mmol)、MC1(3.68g、12.0mmol)、MC2(1.71g、4.00mmol)及びAIBN(0.33g、2.00mmol)を溶解させ、モノマー混合溶液を調製した。窒素雰囲気下、60℃で、NMP(6.72g)中にモノマー混合溶液を2時間かけて滴下した。滴下終了後、60℃で12時間反応させた。反応終了後、メタノール/純水混合溶媒中に反応液を注ぎ込み、ポリマーを析出させ、濾別し、メタノール洗浄することでポリマー粉体P-10(6.12g)を得た。P-10の数平均分子量は20,000、重量平均分子量は50,000であった。 <Synthesis example 10>
MA2 (1.75 g, 4.00 mmol), MC1 (3.68 g, 12.0 mmol), MC2 (1.71 g, 4.00 mmol) and AIBN (0.33 g, 2.0 mmol) in NMP (15.7 g). 00 mmol) to prepare a monomer mixed solution. The monomer mixed solution was added dropwise to NMP (6.72 g) over 2 hours at 60° C. under a nitrogen atmosphere. After the dropwise addition was completed, the reaction was carried out at 60° C. for 12 hours. After the reaction was completed, the reaction solution was poured into a methanol/pure water mixed solvent to precipitate the polymer, which was filtered and washed with methanol to obtain polymer powder P-10 (6.12 g). The number average molecular weight of P-10 was 20,000, and the weight average molecular weight was 50,000.
[3]位相差膜形成材料の調製
<調製例1>
合成例1で得られたポリマー粉体P-1(3.60g)に、NMP(2.00g)、PGME(7.00g)、BCS(2.00g)、PGMEA(5.38g)、及びF560(18.0mg)を加えて撹拌することで、ポリマー溶液T-1を得た。このポリマー溶液T-1は、そのまま位相差膜を形成するための材料とした。 [3] Preparation of retardation film forming material <Preparation Example 1>
NMP (2.00 g), PGME (7.00 g), BCS (2.00 g), PGMEA (5.38 g), and F560 were added to the polymer powder P-1 (3.60 g) obtained in Synthesis Example 1. (18.0 mg) was added and stirred to obtain polymer solution T-1. This polymer solution T-1 was directly used as a material for forming a retardation film.
<調製例1>
合成例1で得られたポリマー粉体P-1(3.60g)に、NMP(2.00g)、PGME(7.00g)、BCS(2.00g)、PGMEA(5.38g)、及びF560(18.0mg)を加えて撹拌することで、ポリマー溶液T-1を得た。このポリマー溶液T-1は、そのまま位相差膜を形成するための材料とした。 [3] Preparation of retardation film forming material <Preparation Example 1>
NMP (2.00 g), PGME (7.00 g), BCS (2.00 g), PGMEA (5.38 g), and F560 were added to the polymer powder P-1 (3.60 g) obtained in Synthesis Example 1. (18.0 mg) was added and stirred to obtain polymer solution T-1. This polymer solution T-1 was directly used as a material for forming a retardation film.
<調製例2~8>
使用するポリマー粉体をP-1からP-2~P-8に置き換えたことを除いては調製例1と同様に実施することで、ポリマー溶液T-2~T-8を得た。このポリマー溶液T-2~T-8は、そのまま位相差膜を形成するための材料とした。以下、位相差膜形成材料を表1にまとめた。表1中、組成比の括弧内の数値は、使用したモノマーの合計100モル部に対する、各モノマーの配合量(モル部)を表す。 <Preparation Examples 2 to 8>
Polymer solutions T-2 to T-8 were obtained by carrying out the same procedure as in Preparation Example 1 except that the polymer powder used was replaced with P-2 to P-8 from P-1. These polymer solutions T-2 to T-8 were used as materials for forming a retardation film as they were. The materials for forming the retardation film are summarized in Table 1 below. In Table 1, the numerical value in parentheses for the composition ratio represents the blending amount (mol parts) of each monomer with respect to the total of 100 mole parts of the monomers used.
使用するポリマー粉体をP-1からP-2~P-8に置き換えたことを除いては調製例1と同様に実施することで、ポリマー溶液T-2~T-8を得た。このポリマー溶液T-2~T-8は、そのまま位相差膜を形成するための材料とした。以下、位相差膜形成材料を表1にまとめた。表1中、組成比の括弧内の数値は、使用したモノマーの合計100モル部に対する、各モノマーの配合量(モル部)を表す。 <Preparation Examples 2 to 8>
Polymer solutions T-2 to T-8 were obtained by carrying out the same procedure as in Preparation Example 1 except that the polymer powder used was replaced with P-2 to P-8 from P-1. These polymer solutions T-2 to T-8 were used as materials for forming a retardation film as they were. The materials for forming the retardation film are summarized in Table 1 below. In Table 1, the numerical value in parentheses for the composition ratio represents the blending amount (mol parts) of each monomer with respect to the total of 100 mole parts of the monomers used.
<調製例9>
合成例2で得られたポリマー粉体P-2(3.60g)に、CPN(16.38g)、及びF560(18.0mg)を加えて撹拌することで、ポリマー溶液T-7を得た。このポリマー溶液T-7は、そのまま位相差膜を形成するための材料とした。 <Preparation example 9>
Polymer solution T-7 was obtained by adding and stirring CPN (16.38 g) and F560 (18.0 mg) to polymer powder P-2 (3.60 g) obtained in Synthesis Example 2. . This polymer solution T-7 was directly used as a material for forming a retardation film.
合成例2で得られたポリマー粉体P-2(3.60g)に、CPN(16.38g)、及びF560(18.0mg)を加えて撹拌することで、ポリマー溶液T-7を得た。このポリマー溶液T-7は、そのまま位相差膜を形成するための材料とした。 <Preparation example 9>
Polymer solution T-7 was obtained by adding and stirring CPN (16.38 g) and F560 (18.0 mg) to polymer powder P-2 (3.60 g) obtained in Synthesis Example 2. . This polymer solution T-7 was directly used as a material for forming a retardation film.
<調製例10、11>
使用するポリマー粉体をP-2からP-9、P-10に置き換えたことを除いては調製例9と同様に実施することで、ポリマー溶液T-10、T-11を得た。このポリマー溶液T-10、T-11は、そのまま位相差膜を形成するための材料とした。以下、位相差膜形成材料を表1にまとめた。表1中、組成比の括弧内の数値は、使用したモノマーの合計100モル部に対する、各モノマーの配合量(モル部)を表す。 <Preparation Examples 10 and 11>
Polymer solutions T-10 and T-11 were obtained by carrying out the same procedure as Preparation Example 9 except that the polymer powder used was replaced with P-9 and P-10 from P-2. These polymer solutions T-10 and T-11 were used as materials for forming a retardation film as they were. The materials for forming the retardation film are summarized in Table 1 below. In Table 1, the numerical value in parentheses for the composition ratio represents the blending amount (mol parts) of each monomer with respect to the total of 100 mole parts of the monomers used.
使用するポリマー粉体をP-2からP-9、P-10に置き換えたことを除いては調製例9と同様に実施することで、ポリマー溶液T-10、T-11を得た。このポリマー溶液T-10、T-11は、そのまま位相差膜を形成するための材料とした。以下、位相差膜形成材料を表1にまとめた。表1中、組成比の括弧内の数値は、使用したモノマーの合計100モル部に対する、各モノマーの配合量(モル部)を表す。 <Preparation Examples 10 and 11>
Polymer solutions T-10 and T-11 were obtained by carrying out the same procedure as Preparation Example 9 except that the polymer powder used was replaced with P-9 and P-10 from P-2. These polymer solutions T-10 and T-11 were used as materials for forming a retardation film as they were. The materials for forming the retardation film are summarized in Table 1 below. In Table 1, the numerical value in parentheses for the composition ratio represents the blending amount (mol parts) of each monomer with respect to the total of 100 mole parts of the monomers used.
[4]単層位相差膜の製造
<実施例1>
ポリマー溶液T-1を孔径5.0μmのフィルターで濾過した後、無アルカリガラス基板上にバーコーターを用いて塗布した。この基板を80℃の熱循環オーブンで3分間乾燥させ、続いて、この基板に高圧水銀灯から365nmバンドパスフィルターおよび偏光板を介して365nmの偏光紫外線を1200mJ/cm2照射した。100℃のIR式オーブンで20分間加熱し、位相差膜付きガラス基板S-1を作製した。尚、S-1の位相差層膜厚は2.5μmであった。 [4] Production of single-layer retardation film <Example 1>
Polymer solution T-1 was filtered through a filter with a pore size of 5.0 μm, and then coated on an alkali-free glass substrate using a bar coater. This substrate was dried in a thermal circulation oven at 80° C. for 3 minutes, and then 1200 mJ/cm 2 of 365 nm polarized ultraviolet light was irradiated onto this substrate from a high-pressure mercury lamp through a 365 nm bandpass filter and a polarizing plate. It was heated in an IR oven at 100° C. for 20 minutes to produce a glass substrate S-1 with a retardation film. Note that the thickness of the retardation layer of S-1 was 2.5 μm.
<実施例1>
ポリマー溶液T-1を孔径5.0μmのフィルターで濾過した後、無アルカリガラス基板上にバーコーターを用いて塗布した。この基板を80℃の熱循環オーブンで3分間乾燥させ、続いて、この基板に高圧水銀灯から365nmバンドパスフィルターおよび偏光板を介して365nmの偏光紫外線を1200mJ/cm2照射した。100℃のIR式オーブンで20分間加熱し、位相差膜付きガラス基板S-1を作製した。尚、S-1の位相差層膜厚は2.5μmであった。 [4] Production of single-layer retardation film <Example 1>
Polymer solution T-1 was filtered through a filter with a pore size of 5.0 μm, and then coated on an alkali-free glass substrate using a bar coater. This substrate was dried in a thermal circulation oven at 80° C. for 3 minutes, and then 1200 mJ/cm 2 of 365 nm polarized ultraviolet light was irradiated onto this substrate from a high-pressure mercury lamp through a 365 nm bandpass filter and a polarizing plate. It was heated in an IR oven at 100° C. for 20 minutes to produce a glass substrate S-1 with a retardation film. Note that the thickness of the retardation layer of S-1 was 2.5 μm.
<実施例2~16>
ポリマー溶液、露光量、本焼成温度を表2~表3に示すように変更した以外は、実施例1と同様に実施することで、位相差膜付きガラス基板S-2~S-16を作製した。 <Examples 2 to 16>
Glass substrates S-2 to S-16 with retardation films were prepared in the same manner as in Example 1, except that the polymer solution, exposure amount, and main firing temperature were changed as shown in Tables 2 and 3. did.
ポリマー溶液、露光量、本焼成温度を表2~表3に示すように変更した以外は、実施例1と同様に実施することで、位相差膜付きガラス基板S-2~S-16を作製した。 <Examples 2 to 16>
Glass substrates S-2 to S-16 with retardation films were prepared in the same manner as in Example 1, except that the polymer solution, exposure amount, and main firing temperature were changed as shown in Tables 2 and 3. did.
<実施例17>
ポリマー溶液T-9を孔径5.0μmのフィルターで濾過した後、CОPフィルム(日本ゼオン製、ZF16-100)上にバーコーターを用いて塗布した。この基板を50℃の熱循環オーブンで3分間乾燥させ、続いて、この基板に高圧水銀灯から365nmバンドパスフィルターおよび偏光板を介して365nmの偏光紫外線を1200mJ/cm2照射した。120℃のIR式オーブンで10分間加熱し、位相差膜付きCОPフィルムS-17を作製した。尚、S-17の位相差層膜厚は2.0μmであった。 <Example 17>
Polymer solution T-9 was filtered through a filter with a pore size of 5.0 μm, and then applied onto a COP film (ZF16-100, manufactured by Nippon Zeon) using a bar coater. This substrate was dried in a thermal circulation oven at 50° C. for 3 minutes, and then 1200 mJ/cm 2 of 365 nm polarized ultraviolet light was irradiated onto this substrate from a high-pressure mercury lamp through a 365 nm bandpass filter and a polarizing plate. It was heated in an IR oven at 120° C. for 10 minutes to produce a COP film S-17 with a retardation film. Note that the thickness of the retardation layer of S-17 was 2.0 μm.
ポリマー溶液T-9を孔径5.0μmのフィルターで濾過した後、CОPフィルム(日本ゼオン製、ZF16-100)上にバーコーターを用いて塗布した。この基板を50℃の熱循環オーブンで3分間乾燥させ、続いて、この基板に高圧水銀灯から365nmバンドパスフィルターおよび偏光板を介して365nmの偏光紫外線を1200mJ/cm2照射した。120℃のIR式オーブンで10分間加熱し、位相差膜付きCОPフィルムS-17を作製した。尚、S-17の位相差層膜厚は2.0μmであった。 <Example 17>
Polymer solution T-9 was filtered through a filter with a pore size of 5.0 μm, and then applied onto a COP film (ZF16-100, manufactured by Nippon Zeon) using a bar coater. This substrate was dried in a thermal circulation oven at 50° C. for 3 minutes, and then 1200 mJ/cm 2 of 365 nm polarized ultraviolet light was irradiated onto this substrate from a high-pressure mercury lamp through a 365 nm bandpass filter and a polarizing plate. It was heated in an IR oven at 120° C. for 10 minutes to produce a COP film S-17 with a retardation film. Note that the thickness of the retardation layer of S-17 was 2.0 μm.
<実施例18>
ポリマー溶液T-10を孔径5.0μmのフィルターで濾過した後、CОPフィルム(日本ゼオン製、ZF16-100)上にバーコーターを用いて塗布した。この基板を50℃の熱循環オーブンで3分間乾燥させ、続いて、この基板に高圧水銀灯から313nmバンドパスフィルターおよび偏光板を介して313nmの偏光紫外線を200mJ/cm2照射した。120℃のIR式オーブンで10分間加熱し、位相差膜付きCОPフィルムS-18を作製した。尚、S-18の位相差層膜厚は2.0μmであった。 <Example 18>
Polymer solution T-10 was filtered through a filter with a pore size of 5.0 μm, and then applied onto a COP film (ZF16-100, manufactured by Nippon Zeon) using a bar coater. This substrate was dried in a thermal circulation oven at 50° C. for 3 minutes, and then 200 mJ/cm 2 of 313 nm polarized ultraviolet light was irradiated from a high-pressure mercury lamp through a 313 nm bandpass filter and a polarizing plate. It was heated in an IR oven at 120° C. for 10 minutes to produce a COP film S-18 with a retardation film. Note that the thickness of the retardation layer of S-18 was 2.0 μm.
ポリマー溶液T-10を孔径5.0μmのフィルターで濾過した後、CОPフィルム(日本ゼオン製、ZF16-100)上にバーコーターを用いて塗布した。この基板を50℃の熱循環オーブンで3分間乾燥させ、続いて、この基板に高圧水銀灯から313nmバンドパスフィルターおよび偏光板を介して313nmの偏光紫外線を200mJ/cm2照射した。120℃のIR式オーブンで10分間加熱し、位相差膜付きCОPフィルムS-18を作製した。尚、S-18の位相差層膜厚は2.0μmであった。 <Example 18>
Polymer solution T-10 was filtered through a filter with a pore size of 5.0 μm, and then applied onto a COP film (ZF16-100, manufactured by Nippon Zeon) using a bar coater. This substrate was dried in a thermal circulation oven at 50° C. for 3 minutes, and then 200 mJ/cm 2 of 313 nm polarized ultraviolet light was irradiated from a high-pressure mercury lamp through a 313 nm bandpass filter and a polarizing plate. It was heated in an IR oven at 120° C. for 10 minutes to produce a COP film S-18 with a retardation film. Note that the thickness of the retardation layer of S-18 was 2.0 μm.
<比較例1>
ポリマー溶液T-5を孔径5.0μmのフィルターで濾過した後、無アルカリガラス基板上にバーコーターを用いて塗布した。この基板を80℃の熱循環オーブンで3分間乾燥させ、続いて、この基板に高圧水銀灯から365nmバンドパスフィルターおよび偏光板を介して365nmの偏光紫外線を1200mJ/cm2照射した。100℃のIR式オーブンで20分間加熱し、位相差膜付きガラス基板R-1を作製した。尚、R-1の位相差層膜厚は2.3μmであった。 <Comparative example 1>
Polymer solution T-5 was filtered through a filter with a pore size of 5.0 μm, and then applied onto an alkali-free glass substrate using a bar coater. This substrate was dried in a thermal circulation oven at 80° C. for 3 minutes, and then 1200 mJ/cm 2 of 365 nm polarized ultraviolet light was irradiated onto this substrate from a high-pressure mercury lamp through a 365 nm bandpass filter and a polarizing plate. It was heated in an IR oven at 100° C. for 20 minutes to produce a glass substrate R-1 with a retardation film. The thickness of the retardation layer of R-1 was 2.3 μm.
ポリマー溶液T-5を孔径5.0μmのフィルターで濾過した後、無アルカリガラス基板上にバーコーターを用いて塗布した。この基板を80℃の熱循環オーブンで3分間乾燥させ、続いて、この基板に高圧水銀灯から365nmバンドパスフィルターおよび偏光板を介して365nmの偏光紫外線を1200mJ/cm2照射した。100℃のIR式オーブンで20分間加熱し、位相差膜付きガラス基板R-1を作製した。尚、R-1の位相差層膜厚は2.3μmであった。 <Comparative example 1>
Polymer solution T-5 was filtered through a filter with a pore size of 5.0 μm, and then applied onto an alkali-free glass substrate using a bar coater. This substrate was dried in a thermal circulation oven at 80° C. for 3 minutes, and then 1200 mJ/cm 2 of 365 nm polarized ultraviolet light was irradiated onto this substrate from a high-pressure mercury lamp through a 365 nm bandpass filter and a polarizing plate. It was heated in an IR oven at 100° C. for 20 minutes to produce a glass substrate R-1 with a retardation film. The thickness of the retardation layer of R-1 was 2.3 μm.
<比較例2~4>
ポリマー溶液、露光量、本焼成温度を表2~表3に示すように変更した以外は、比較例1と同様に実施することで、位相差膜付きのガラス基板R-2~R-4を作製した。 <Comparative Examples 2 to 4>
Glass substrates R-2 to R-4 with retardation films were prepared in the same manner as in Comparative Example 1, except that the polymer solution, exposure amount, and main firing temperature were changed as shown in Tables 2 and 3. Created.
ポリマー溶液、露光量、本焼成温度を表2~表3に示すように変更した以外は、比較例1と同様に実施することで、位相差膜付きのガラス基板R-2~R-4を作製した。 <Comparative Examples 2 to 4>
Glass substrates R-2 to R-4 with retardation films were prepared in the same manner as in Comparative Example 1, except that the polymer solution, exposure amount, and main firing temperature were changed as shown in Tables 2 and 3. Created.
<比較例5>
ポリマー溶液T-8を孔径5.0μmのフィルターで濾過した後、CОPフィルム(日本ゼオン製、ZF16-100)上にバーコーターを用いて塗布した。この基板を50℃の熱循環オーブンで3分間乾燥させ、続いて、この基板に高圧水銀灯から313nmバンドパスフィルターおよび偏光板を介して313nmの偏光紫外線を200mJ/cm2照射した。120℃のIR式オーブンで10分間加熱し、位相差膜付きCОPフィルムR-5を作製した。尚、R-5の位相差層膜厚は2.0μmであった。 <Comparative example 5>
Polymer solution T-8 was filtered through a filter with a pore size of 5.0 μm, and then applied onto a COP film (ZF16-100, manufactured by Nippon Zeon) using a bar coater. This substrate was dried in a thermal circulation oven at 50° C. for 3 minutes, and then 200 mJ/cm 2 of 313 nm polarized ultraviolet light was irradiated from a high-pressure mercury lamp through a 313 nm bandpass filter and a polarizing plate. It was heated in an IR oven at 120° C. for 10 minutes to produce a COP film R-5 with a retardation film. Note that the thickness of the retardation layer of R-5 was 2.0 μm.
ポリマー溶液T-8を孔径5.0μmのフィルターで濾過した後、CОPフィルム(日本ゼオン製、ZF16-100)上にバーコーターを用いて塗布した。この基板を50℃の熱循環オーブンで3分間乾燥させ、続いて、この基板に高圧水銀灯から313nmバンドパスフィルターおよび偏光板を介して313nmの偏光紫外線を200mJ/cm2照射した。120℃のIR式オーブンで10分間加熱し、位相差膜付きCОPフィルムR-5を作製した。尚、R-5の位相差層膜厚は2.0μmであった。 <Comparative example 5>
Polymer solution T-8 was filtered through a filter with a pore size of 5.0 μm, and then applied onto a COP film (ZF16-100, manufactured by Nippon Zeon) using a bar coater. This substrate was dried in a thermal circulation oven at 50° C. for 3 minutes, and then 200 mJ/cm 2 of 313 nm polarized ultraviolet light was irradiated from a high-pressure mercury lamp through a 313 nm bandpass filter and a polarizing plate. It was heated in an IR oven at 120° C. for 10 minutes to produce a COP film R-5 with a retardation film. Note that the thickness of the retardation layer of R-5 was 2.0 μm.
各位相差膜付きの基板S-1~S18、R-1~R-5について、下記方法により膜厚、位相差値及びΔnについて評価した。
The film thickness, retardation value, and Δn of each of the substrates S-1 to S18 and R-1 to R-5 with retardation films were evaluated by the following method.
〔膜厚評価〕
株式会社小坂研究所製の高精度微細形状測定機(ET4000M)を用いて、位相差膜付きガラス基板の位相差層の膜厚を測定した。
フィルメトリクス社製のF20膜厚計を用いて、位相差膜付きCОPフィルムの位相差層の膜厚を測定した。 [Film thickness evaluation]
The film thickness of the retardation layer of the glass substrate with a retardation film was measured using a high-precision fine shape measuring machine (ET4000M) manufactured by Kosaka Laboratory Co., Ltd.
The film thickness of the retardation layer of the COP film with a retardation film was measured using F20 film thickness meter manufactured by Filmetrics.
株式会社小坂研究所製の高精度微細形状測定機(ET4000M)を用いて、位相差膜付きガラス基板の位相差層の膜厚を測定した。
フィルメトリクス社製のF20膜厚計を用いて、位相差膜付きCОPフィルムの位相差層の膜厚を測定した。 [Film thickness evaluation]
The film thickness of the retardation layer of the glass substrate with a retardation film was measured using a high-precision fine shape measuring machine (ET4000M) manufactured by Kosaka Laboratory Co., Ltd.
The film thickness of the retardation layer of the COP film with a retardation film was measured using F20 film thickness meter manufactured by Filmetrics.
〔位相差値及びΔnの評価〕
Axometrics社製のAxo Scanを用いて波長550nmにおける直線位相差を評価し、直線位相差を膜厚で除することでΔn(複屈折)を算出して表2、3、4にまとめた。 [Evaluation of phase difference value and Δn]
The linear retardation at a wavelength of 550 nm was evaluated using Axo Scan manufactured by Axometrics, and Δn (birefringence) was calculated by dividing the linear retardation by the film thickness, and the results are summarized in Tables 2, 3, and 4.
Axometrics社製のAxo Scanを用いて波長550nmにおける直線位相差を評価し、直線位相差を膜厚で除することでΔn(複屈折)を算出して表2、3、4にまとめた。 [Evaluation of phase difference value and Δn]
The linear retardation at a wavelength of 550 nm was evaluated using Axo Scan manufactured by Axometrics, and Δn (birefringence) was calculated by dividing the linear retardation by the film thickness, and the results are summarized in Tables 2, 3, and 4.
モノマーMBを用いた重合体組成物から得られる単層位相差材は、モノマーMBを用いていない重合体組成物から得られる単層位相差材に比べて高いΔnを示した。100~120℃の低温焼成において良好なΔnを示していることから、フィルム基材での位相差層形成が可能である。
A single-layer retardation material obtained from a polymer composition using monomer MB showed a higher Δn than a single-layer retardation material obtained from a polymer composition not using monomer MB. Since it shows a good Δn when fired at a low temperature of 100 to 120°C, it is possible to form a retardation layer on a film base material.
[5]液晶配向膜の製造
<調製例12>
得られたポリマー粉末(P-2)0.4gにNMP(7.6g)を加え、室温で1時間撹拌して溶解させた。この溶液にBCS(2.0g)を加え撹拌することにより液晶配向剤(U-1)を得た。 [5] Production of liquid crystal alignment film <Preparation Example 12>
NMP (7.6 g) was added to 0.4 g of the obtained polymer powder (P-2) and dissolved by stirring at room temperature for 1 hour. BCS (2.0 g) was added to this solution and stirred to obtain a liquid crystal aligning agent (U-1).
<調製例12>
得られたポリマー粉末(P-2)0.4gにNMP(7.6g)を加え、室温で1時間撹拌して溶解させた。この溶液にBCS(2.0g)を加え撹拌することにより液晶配向剤(U-1)を得た。 [5] Production of liquid crystal alignment film <Preparation Example 12>
NMP (7.6 g) was added to 0.4 g of the obtained polymer powder (P-2) and dissolved by stirring at room temperature for 1 hour. BCS (2.0 g) was added to this solution and stirred to obtain a liquid crystal aligning agent (U-1).
〔オーダーパラメータ測定用基板の作成〕
<実施例19>
液晶配向剤(U-1)を用いて下記に示すような手順でオーダーパラメータ測定用基板の作製を行った。基板は、40mm×40mmの大きさで、厚さが1.0mmの石英基板を用いた。
液晶配向剤(U-1)を1.0μmのフィルターで濾過した後、石英基板上にスピンコートし、60℃のホットプレート上で90秒間乾燥後、膜厚100nmの薄膜を形成した。次いで、高圧水銀灯から313nmバンドパスフィルターおよび偏光板を介して313nmの偏光紫外線を5~50mJ/cm2照射した後に120℃のホットプレートで10分間加熱し、液晶配向膜付き基板を得た。 [Creation of board for order parameter measurement]
<Example 19>
A substrate for order parameter measurement was prepared using the liquid crystal aligning agent (U-1) according to the procedure shown below. The substrate used was a quartz substrate measuring 40 mm x 40 mm and having a thickness of 1.0 mm.
After filtering the liquid crystal aligning agent (U-1) through a 1.0 μm filter, it was spin-coated onto a quartz substrate and dried on a hot plate at 60° C. for 90 seconds to form a thin film with a thickness of 100 nm. Next, 5 to 50 mJ/cm 2 of 313 nm polarized ultraviolet light was irradiated from a high-pressure mercury lamp through a 313 nm band-pass filter and a polarizing plate, and then heated on a hot plate at 120° C. for 10 minutes to obtain a substrate with a liquid crystal alignment film.
<実施例19>
液晶配向剤(U-1)を用いて下記に示すような手順でオーダーパラメータ測定用基板の作製を行った。基板は、40mm×40mmの大きさで、厚さが1.0mmの石英基板を用いた。
液晶配向剤(U-1)を1.0μmのフィルターで濾過した後、石英基板上にスピンコートし、60℃のホットプレート上で90秒間乾燥後、膜厚100nmの薄膜を形成した。次いで、高圧水銀灯から313nmバンドパスフィルターおよび偏光板を介して313nmの偏光紫外線を5~50mJ/cm2照射した後に120℃のホットプレートで10分間加熱し、液晶配向膜付き基板を得た。 [Creation of board for order parameter measurement]
<Example 19>
A substrate for order parameter measurement was prepared using the liquid crystal aligning agent (U-1) according to the procedure shown below. The substrate used was a quartz substrate measuring 40 mm x 40 mm and having a thickness of 1.0 mm.
After filtering the liquid crystal aligning agent (U-1) through a 1.0 μm filter, it was spin-coated onto a quartz substrate and dried on a hot plate at 60° C. for 90 seconds to form a thin film with a thickness of 100 nm. Next, 5 to 50 mJ/cm 2 of 313 nm polarized ultraviolet light was irradiated from a high-pressure mercury lamp through a 313 nm band-pass filter and a polarizing plate, and then heated on a hot plate at 120° C. for 10 minutes to obtain a substrate with a liquid crystal alignment film.
〔オーダーパラメータの測定〕
上記で作製した液晶配向膜付き基板を用い、液晶配向膜の光学的異方性を測定するために、偏光の吸光度からオーダーパラメータであるSを下式より算出した。
ここで、Aparaは、照射した偏光紫外線方向に対して平行方向の吸光度、Aperは、照射した偏光紫外線方向に対して垂直方向の吸光度を表す。面内配向度の絶対値が、1に近い程より一様な配向状態となっていることを示している。オーダーパラメータは、1もしくは-1に近い程より一様な配向状態となっていることを示している。
算出したオーダーパラメータ(S)の絶対値は、表5に示した。なお、オーダーパラメータの絶対値を下記の評価基準で示した。
《評価基準》
○:0.5以上
○△:0.4以上0.5未満
△:0.3以上0.4未満
×:0.3未満
また、吸光度の測定には、島津製作所社製の紫外線可視近赤外分析光度計U-3100PCを使用した。 [Measurement of order parameters]
Using the substrate with a liquid crystal alignment film produced above, in order to measure the optical anisotropy of the liquid crystal alignment film, the order parameter S was calculated from the absorbance of polarized light using the following formula.
Here, A para represents absorbance in a direction parallel to the direction of polarized ultraviolet rays irradiated, and A per represents absorbance in a direction perpendicular to the direction of polarized ultraviolet rays irradiated. The closer the absolute value of the degree of in-plane orientation is to 1, the more uniform the orientation state is. The closer the order parameter is to 1 or -1, the more uniform the orientation state is.
The absolute values of the calculated order parameters (S) are shown in Table 5. In addition, the absolute value of the order parameter was shown according to the following evaluation criteria.
"Evaluation criteria"
○: 0.5 or more ○△: 0.4 or more and less than 0.5 △: 0.3 or more and less than 0.4 ×: less than 0.3
Further, an ultraviolet-visible-near-infrared spectrophotometer U-3100PC manufactured by Shimadzu Corporation was used to measure the absorbance.
上記で作製した液晶配向膜付き基板を用い、液晶配向膜の光学的異方性を測定するために、偏光の吸光度からオーダーパラメータであるSを下式より算出した。
算出したオーダーパラメータ(S)の絶対値は、表5に示した。なお、オーダーパラメータの絶対値を下記の評価基準で示した。
《評価基準》
○:0.5以上
○△:0.4以上0.5未満
△:0.3以上0.4未満
×:0.3未満
また、吸光度の測定には、島津製作所社製の紫外線可視近赤外分析光度計U-3100PCを使用した。 [Measurement of order parameters]
Using the substrate with a liquid crystal alignment film produced above, in order to measure the optical anisotropy of the liquid crystal alignment film, the order parameter S was calculated from the absorbance of polarized light using the following formula.
The absolute values of the calculated order parameters (S) are shown in Table 5. In addition, the absolute value of the order parameter was shown according to the following evaluation criteria.
"Evaluation criteria"
○: 0.5 or more ○△: 0.4 or more and less than 0.5 △: 0.3 or more and less than 0.4 ×: less than 0.3
Further, an ultraviolet-visible-near-infrared spectrophotometer U-3100PC manufactured by Shimadzu Corporation was used to measure the absorbance.
表5に示すように、モノマーMBを用いた重合体組成物から得られる液晶配向剤は120℃という低温焼成条件において0.4~0.5程度のオーダーパラメータの値を示しており、液晶配向膜として機能し得ることが確認された。
As shown in Table 5, the liquid crystal aligning agent obtained from the polymer composition using the monomer MB shows an order parameter value of about 0.4 to 0.5 under low temperature firing conditions of 120°C, and the liquid crystal alignment agent It was confirmed that it can function as a membrane.
Claims (7)
- (A)光反応性部位を有する側鎖(a1)、及び、下記式(b)で表される部位を有する側鎖(a2)を有する側鎖型高分子;並びに
(B)有機溶媒
を含有する重合体組成物。
W1、W2及びW3は、それぞれ独立に、単結合、-O-、-C(=O)-O-、-O-C(=O)-、-C(=O)-N(R’)-又は-N(R’)-C(=O)-である。W2の数が2以上のとき、各W2は互いに同一でも異なっていてもよい。R’は水素原子又は炭素数1~6のアルキル基を表す。
Qは、炭素数1~10のアルキレン基である。該アルキレン基の水素原子の一部又は全部がハロゲン原子で置換されていてもよい。
Lは、単結合、炭素数1~12のアルキレン基、または、炭素数1~12のアルキレン基を構成する-CH2-の互いに隣合わない1個以上が-O-、-S-、-C(=O)-O-、もしくは-O-C(=O)-で置換された2価の連結基を表し、該アルキレン基の水素原子の一部又は全部がハロゲン原子で置換されていてもよい。
Q1は、単結合、フェニレン基、ナフチレン基又は炭素数5~8の2価の脂環式炭化水素基であり、該フェニレン基及びナフチレン基の水素原子の一部又は全部が、シアノ基、ハロゲン原子、炭素数1~5のアルキル基、炭素数2~6のアルキルカルボニル基又は炭素数1~5のアルコキシ基で置換されていてもよい。Q1の数が2以上のとき、各Q1は互いに同一でも異なっていてもよい。
ベンゼン環上の水素原子は炭素数1~6のアルキル基、炭素数1~6のハロアルキル基、炭素数1~6のアルコキシ基、炭素数1~6のハロアルコキシ基、シアノ基、及びニトロ基から選ばれる置換基で置換されていてもよい。また、該ベンゼン環はナフタレン環でもよく、該ナフタレン環上の水素原子は炭素数1~6のアルキル基、炭素数1~6のハロアルキル基、炭素数1~6のアルコキシ基、炭素数1~6のハロアルコキシ基、シアノ基、及びニトロ基から選ばれる置換基で置換されていてもよい。
n1は、0、1、2又は3である。
破線は結合手である。) (A) A side chain type polymer having a side chain (a1) having a photoreactive site and a side chain (a2) having a site represented by the following formula (b); and (B) containing an organic solvent. Polymer composition.
W 1 , W 2 and W 3 each independently represent a single bond, -O-, -C(=O)-O-, -O-C(=O)-, -C(=O)-N( R')- or -N(R')-C(=O)-. When the number of W 2 is 2 or more, each W 2 may be the same or different from each other. R' represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms.
Q is an alkylene group having 1 to 10 carbon atoms. Some or all of the hydrogen atoms of the alkylene group may be substituted with halogen atoms.
L is a single bond, an alkylene group having 1 to 12 carbon atoms, or one or more non-adjacent -CH 2 - constituting the alkylene group having 1 to 12 carbon atoms is -O-, -S-, - It represents a divalent linking group substituted with C(=O)-O- or -OC(=O)-, and some or all of the hydrogen atoms of the alkylene group are substituted with halogen atoms. Good too.
Q 1 is a single bond, a phenylene group, a naphthylene group, or a divalent alicyclic hydrocarbon group having 5 to 8 carbon atoms, and some or all of the hydrogen atoms of the phenylene group and naphthylene group are a cyano group, It may be substituted with a halogen atom, an alkyl group having 1 to 5 carbon atoms, an alkylcarbonyl group having 2 to 6 carbon atoms, or an alkoxy group having 1 to 5 carbon atoms. When the number of Q 1 is 2 or more, each Q 1 may be the same or different from each other.
The hydrogen atom on the benzene ring is an alkyl group having 1 to 6 carbon atoms, a haloalkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a haloalkoxy group having 1 to 6 carbon atoms, a cyano group, and a nitro group. It may be substituted with a substituent selected from. Further, the benzene ring may be a naphthalene ring, and the hydrogen atom on the naphthalene ring is an alkyl group having 1 to 6 carbon atoms, a haloalkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, or an alkyl group having 1 to 6 carbon atoms. 6 may be substituted with a substituent selected from a haloalkoxy group, a cyano group, and a nitro group.
n 1 is 0, 1, 2 or 3.
The dashed lines are bonds. ) - (A)側鎖型高分子が、前記式(b)で表される構造以外の、液晶性のみを発現する側鎖(a3)をさらに有することを特徴とする請求項1記載の重合体組成物。 The polymer composition according to claim 1, wherein the side chain type polymer (A) further has a side chain (a3) that exhibits only liquid crystallinity, other than the structure represented by the formula (b). thing.
- 光反応性部位を有する側鎖(a1)が、下記式(a1-1)~(a1-6)のいずれかで表される側鎖を有する請求項1記載の重合体組成物。
Lは、単結合、炭素数1~12のアルキレン基、または、炭素数1~12のアルキレン基を構成する-CH2-の互いに隣合わない1個以上が-O-、-S-、-C(=O)-O-、もしくは-O-C(=O)-で置換された2価の連結基を表し、該アルキレン基の水素原子の一部又は全部がハロゲン原子で置換されていてもよい。
T1は、単結合又は炭素数1~12のアルキレン基であり、該アルキレン基の水素原子の一部又は全部がハロゲン原子で置換されていてもよい。
A1、A2及びD1は、それぞれ独立に、単結合、-O-、-CH2-、-C(=O)-O-、-O-C(=O)-、-C(=O)-NH-又は-NH-C(=O)-である。ただし、T1が単結合のときは、A2も単結合である。
Y1及びY2は、フェニレン基又はナフチレン基であり、該フェニレン基及びナフチレン基の水素原子の一部又は全部が、シアノ基、ハロゲン原子、炭素数1~5のアルキル基、炭素数2~6のアルキルカルボニル基又は炭素数1~5のアルコキシ基で置換されていてもよい。
P1、Q1及びQ2は、それぞれ独立に、単結合、フェニレン基又は炭素数5~8の2価の脂環式炭化水素基であり、該フェニレン基の水素原子の一部又は全部が、シアノ基、ハロゲン原子、炭素数1~5のアルキル基、炭素数2~6のアルキルカルボニル基又は炭素数1~5のアルコキシ基で置換されていてもよい。Q1の数が2以上のとき、各Q1は互いに同一でも異なっていてもよく、Q2の数が2以上のとき、各Q2は互いに同一でも異なっていてもよい。
Rは、水素原子、シアノ基、ハロゲン原子、カルボキシ基、炭素数1~5のアルキル基、炭素数2~6のアルキルカルボニル基、炭素数3~7のシクロアルキル基又は炭素数1~5のアルコキシ基である。
X1及びX2は、それぞれ独立に、単結合、-O-、-C(=O)-O-、-O-C(=O)-、-N=N-、-CH=CH-、-C≡C-、-CH=CH-C(=O)-O-又は-O-C(=O)-CH=CH-である。X1の数が2以上のとき、各X1は互いに同一でも異なっていてもよく、X2の数が2以上のとき、各X2は互いに同一でも異なっていてもよい。
Couは、クマリン-6-イル基又はクマリン-7-イル基であり、これらに結合する水素原子の一部が-NO2、-CN、-CH=C(CN)2、-CH=CH-CN、ハロゲン原子、炭素数1~5のアルキル基又は炭素数1~5のアルコキシ基で置換されてもよい。
Eは、-C(=O)-O-、-O-C(=O)-、-C(=O)-S-又は-S-C(=O)-である。
G1及びG2は、それぞれ独立に、N又はCHである。
上記定義におけるCH=CHの水素原子は、シアノ基、ハロゲン原子、炭素数1~5のアルキル基、炭素数2~6のアルキルカルボニル基及び炭素数1~5のアルコキシ基から選ばれる置換基で置換されていてもよい。
破線は、結合手である。) The polymer composition according to claim 1, wherein the side chain (a1) having a photoreactive site has a side chain represented by any one of the following formulas (a1-1) to (a1-6).
L is a single bond, an alkylene group having 1 to 12 carbon atoms, or one or more non-adjacent -CH 2 - constituting the alkylene group having 1 to 12 carbon atoms is -O-, -S-, - It represents a divalent linking group substituted with C(=O)-O- or -OC(=O)-, and some or all of the hydrogen atoms of the alkylene group are substituted with halogen atoms. Good too.
T 1 is a single bond or an alkylene group having 1 to 12 carbon atoms, and some or all of the hydrogen atoms of the alkylene group may be substituted with halogen atoms.
A 1 , A 2 and D 1 each independently represent a single bond, -O-, -CH 2 -, -C(=O)-O-, -O-C(=O)-, -C(= O)-NH- or -NH-C(=O)-. However, when T 1 is a single bond, A 2 is also a single bond.
Y 1 and Y 2 are a phenylene group or a naphthylene group, and some or all of the hydrogen atoms of the phenylene group and naphthylene group are cyano groups, halogen atoms, alkyl groups having 1 to 5 carbon atoms, or 2 to 5 carbon atoms. It may be substituted with an alkylcarbonyl group having 6 carbon atoms or an alkoxy group having 1 to 5 carbon atoms.
P 1 , Q 1 and Q 2 are each independently a single bond, a phenylene group, or a divalent alicyclic hydrocarbon group having 5 to 8 carbon atoms, and some or all of the hydrogen atoms of the phenylene group are , a cyano group, a halogen atom, an alkyl group having 1 to 5 carbon atoms, an alkylcarbonyl group having 2 to 6 carbon atoms, or an alkoxy group having 1 to 5 carbon atoms. When the number of Q 1 is 2 or more, each Q 1 may be the same or different from each other, and when the number of Q 2 is 2 or more, each Q 2 may be the same or different from each other.
R is a hydrogen atom, a cyano group, a halogen atom, a carboxy group, an alkyl group having 1 to 5 carbon atoms, an alkylcarbonyl group having 2 to 6 carbon atoms, a cycloalkyl group having 3 to 7 carbon atoms, or a cycloalkyl group having 1 to 5 carbon atoms. It is an alkoxy group.
X 1 and X 2 each independently represent a single bond, -O-, -C(=O)-O-, -O-C(=O)-, -N=N-, -CH=CH-, -C≡C-, -CH=CH-C(=O)-O- or -OC(=O)-CH=CH-. When the number of X 1 is 2 or more, each X 1 may be the same or different from each other, and when the number of X 2 is 2 or more, each X 2 may be the same or different from each other.
Cou is a coumarin-6-yl group or a coumarin-7-yl group, and some of the hydrogen atoms bonded to these are -NO 2 , -CN, -CH=C(CN) 2 , -CH=CH- It may be substituted with CN, a halogen atom, an alkyl group having 1 to 5 carbon atoms, or an alkoxy group having 1 to 5 carbon atoms.
E is -C(=O)-O-, -OC(=O)-, -C(=O)-S- or -S-C(=O)-.
G 1 and G 2 are each independently N or CH.
The hydrogen atom of CH=CH in the above definition is a substituent selected from a cyano group, a halogen atom, an alkyl group having 1 to 5 carbon atoms, an alkylcarbonyl group having 2 to 6 carbon atoms, and an alkoxy group having 1 to 5 carbon atoms. May be replaced.
The broken lines are bonds. ) - 上記(a3)が、下記式(a3-1)~(a3-11)のいずれかで表されるものである請求項2記載の重合体組成物。
A3及びA4は、それぞれ独立に、単結合、-O-、-CH2-、-C(=O)-O-、-O-C(=O)-、-C(=O)-NH-、又は-NH-C(=O)-である。A4の数が2以上のとき、各A4は互いに同一でも異なっていてもよい。
R1は、-NO2、-CN、ハロゲン原子、フェニル基、ナフチル基、ビフェニリル基、フラニル基、1価窒素含有複素環基、炭素数5~8の1価脂環式炭化水素基、炭素数1~12のアルキル基又は炭素数1~12のアルコキシ基である。
R2は、フェニル基、ナフチル基、ビフェニリル基、フラニル基、1価窒素含有複素環基又は炭素数5~8の1価脂環式炭化水素基であり、これらの基の水素原子の一部又は全部が、-NO2、-CN、ハロゲン原子、炭素数1~5のアルキル基又は炭素数1~5のアルコキシ基で置換されてもよい。
R3は、水素原子、-NO2、-CN、ハロゲン原子、フェニル基、ナフチル基、ビフェニリル基、フラニル基、1価窒素含有複素環基、炭素数5~8の1価脂環式炭化水素基、炭素数1~12のアルキル基又は炭素数1~12のアルコキシ基である。
Eは、-C(=O)-O-、-O-C(=O)-、-C(=O)-S-又は-S-C(=O)-である。
k1~k5は、それぞれ独立に、0~2の整数であるが、k1~k5の合計は2以上である。
k6及びk7は、それぞれ独立に、0~2の整数であるが、k6及びk7の合計は1以上である。
m1、m2及びm3は、それぞれ独立に、1~3の整数である。
nは、0又は1である。
Z1及びZ2は、それぞれ独立に、単結合、-C(=O)-、-CH2-O-、又は-CF2-である。
ベンゼン環、ナフタレン環上の水素原子の一部又は全部が、シアノ基、ハロゲン原子、炭素数1~5のアルキル基、炭素数2~6のアルキルカルボニル基又は炭素数1~5のアルコキシ基で置換されていてもよい。
破線は、結合手である。) The polymer composition according to claim 2, wherein the above (a3) is represented by any one of the following formulas (a3-1) to (a3-11).
A 3 and A 4 each independently represent a single bond, -O-, -CH 2 -, -C(=O)-O-, -O-C(=O)-, -C(=O)- NH- or -NH-C(=O)-. When the number of A 4 is 2 or more, each A 4 may be the same or different from each other.
R 1 is -NO 2 , -CN, halogen atom, phenyl group, naphthyl group, biphenylyl group, furanyl group, monovalent nitrogen-containing heterocyclic group, monovalent alicyclic hydrocarbon group having 5 to 8 carbon atoms, carbon It is an alkyl group having 1 to 12 carbon atoms or an alkoxy group having 1 to 12 carbon atoms.
R 2 is a phenyl group, a naphthyl group, a biphenylyl group, a furanyl group, a monovalent nitrogen-containing heterocyclic group, or a monovalent alicyclic hydrocarbon group having 5 to 8 carbon atoms, and some of the hydrogen atoms of these groups Alternatively, all may be substituted with -NO 2 , -CN, a halogen atom, an alkyl group having 1 to 5 carbon atoms, or an alkoxy group having 1 to 5 carbon atoms.
R 3 is a hydrogen atom, -NO 2 , -CN, a halogen atom, a phenyl group, a naphthyl group, a biphenylyl group, a furanyl group, a monovalent nitrogen-containing heterocyclic group, or a monovalent alicyclic hydrocarbon having 5 to 8 carbon atoms. group, an alkyl group having 1 to 12 carbon atoms, or an alkoxy group having 1 to 12 carbon atoms.
E is -C(=O)-O-, -OC(=O)-, -C(=O)-S- or -S-C(=O)-.
k1 to k5 are each independently an integer of 0 to 2, but the total of k1 to k5 is 2 or more.
k6 and k7 are each independently an integer of 0 to 2, but the sum of k6 and k7 is 1 or more.
m1, m2 and m3 are each independently an integer of 1 to 3.
n is 0 or 1.
Z 1 and Z 2 are each independently a single bond, -C(=O)-, -CH 2 -O-, or -CF 2 -.
Some or all of the hydrogen atoms on the benzene ring or naphthalene ring are a cyano group, a halogen atom, an alkyl group having 1 to 5 carbon atoms, an alkylcarbonyl group having 2 to 6 carbon atoms, or an alkoxy group having 1 to 5 carbon atoms. May be replaced.
The broken lines are bonds. ) - [I] 請求項1~4のいずれか1項に記載の組成物を、基板上に塗布して塗膜を形成する工程;
[II] [I]で得られた塗膜に偏光した紫外線を照射する工程;及び
[III] [II]で得られた塗膜を加熱して、位相差材を得る工程
を有する、単層位相差材の製造方法。 [I] A step of applying the composition according to any one of claims 1 to 4 onto a substrate to form a coating film;
[II] A step of irradiating the coating film obtained in [I] with polarized ultraviolet rays; and [III] A step of heating the coating film obtained in [II] to obtain a retardation material. Method for manufacturing retardation material. - 請求項1~4のいずれか1項に記載の重合体組成物から得られる単層位相差材。 A single-layer retardation material obtained from the polymer composition according to any one of claims 1 to 4.
- 請求項1~4のいずれか1項に記載の重合体組成物から得られる液晶配向剤。 A liquid crystal aligning agent obtained from the polymer composition according to any one of claims 1 to 4.
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Citations (4)
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WO2016002691A1 (en) * | 2014-06-30 | 2016-01-07 | 日産化学工業株式会社 | Liquid crystal alignment agent, liquid crystal alignment film, and liquid crystal display element |
JP2016128403A (en) * | 2014-12-02 | 2016-07-14 | Jnc株式会社 | Liquid crystalline compound, liquid crystal composition and polymer of the same |
JP2019148716A (en) * | 2018-02-27 | 2019-09-05 | 日産化学株式会社 | Liquid crystal aligning agent, liquid crystal alignment film, and liquid crystal display element |
WO2021070515A1 (en) * | 2019-10-10 | 2021-04-15 | Jsr株式会社 | Liquid crystal alignment agent, liquid crystal alignment film, and liquid crystal element |
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2023
- 2023-03-09 WO PCT/JP2023/009098 patent/WO2023171757A1/en unknown
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- 2023-03-09 CN CN202380025109.8A patent/CN118829693A/en active Pending
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WO2016002691A1 (en) * | 2014-06-30 | 2016-01-07 | 日産化学工業株式会社 | Liquid crystal alignment agent, liquid crystal alignment film, and liquid crystal display element |
JP2016128403A (en) * | 2014-12-02 | 2016-07-14 | Jnc株式会社 | Liquid crystalline compound, liquid crystal composition and polymer of the same |
JP2019148716A (en) * | 2018-02-27 | 2019-09-05 | 日産化学株式会社 | Liquid crystal aligning agent, liquid crystal alignment film, and liquid crystal display element |
WO2021070515A1 (en) * | 2019-10-10 | 2021-04-15 | Jsr株式会社 | Liquid crystal alignment agent, liquid crystal alignment film, and liquid crystal element |
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