WO2022057021A1 - 一种显示基板及液晶显示装置 - Google Patents

一种显示基板及液晶显示装置 Download PDF

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Publication number
WO2022057021A1
WO2022057021A1 PCT/CN2020/125023 CN2020125023W WO2022057021A1 WO 2022057021 A1 WO2022057021 A1 WO 2022057021A1 CN 2020125023 W CN2020125023 W CN 2020125023W WO 2022057021 A1 WO2022057021 A1 WO 2022057021A1
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layer
pixel electrode
display substrate
liquid crystal
protective layer
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PCT/CN2020/125023
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English (en)
French (fr)
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林建伟
杨鹏
李林
庄崇营
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信利半导体有限公司
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Publication of WO2022057021A1 publication Critical patent/WO2022057021A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1343—Electrodes
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells

Definitions

  • the utility model relates to the technical field of liquid crystal display, in particular to a display substrate and a liquid crystal display device.
  • contrast ratio CR (full white brightness-full black brightness)/full black brightness
  • a simple definition is the ratio of full white brightness to full black brightness.
  • the higher the contrast the sharper the image layering.
  • the thin film transistor liquid crystal displays must be required to be designed with corresponding high contrast ratios.
  • the reflection layer at the via hole is not removed, and the reflective layer will be certain when the screen is in a black state, resulting in a high brightness in the black state and a low contrast ratio.
  • the utility model discloses a display substrate and a liquid crystal display device, which are used to solve the problem of low contrast between a semi-transparent and semi-reflective screen and a fully-reflective screen in the prior art.
  • the utility model adopts the following technical solutions:
  • a display substrate including a substrate
  • the substrate includes a gate layer, a source and drain layer, an active layer and a flat layer;
  • a pixel electrode at least partially covering the flat layer; the pixel electrode is connected to the source and drain layers through a hole;
  • the reflective layer at least partially covers the pixel electrode, and no reflective layer is provided on the pixel electrode at the via hole.
  • the substrate further includes a first protective layer and a second protective layer, the first protective layer covers the gate layer, and the second protective layer covers the source and drain layers and the active layer .
  • the flat layer covers the second protective layer.
  • the via hole covers the second protective layer.
  • the first protective layer and the second protective layer are silicon nitride layers.
  • the reflective layer is an aluminum layer.
  • the pixel electrode is made of transparent ITO material.
  • the utility model also provides a liquid crystal display device, comprising the display substrate described in any one of the above solutions.
  • the reflective layer at the via hole is removed to reduce the area of the reflective layer, thereby reducing the black-state reflectivity and improving the contrast ratio. It is suitable for liquid crystal display panels in transflective or total-reflection mode, and a flat layer is provided to make the overall smoother.
  • FIG. 1 is a schematic diagram of an overall structure below a liquid crystal layer in a liquid crystal display panel in the prior art
  • FIG. 2 is a schematic diagram of the overall structure below the liquid crystal layer in the liquid crystal display panel disclosed in the embodiment of the present invention.
  • Pixel electrode layer-10' in prior art via hole-11' in prior art; reflective layer-20' in prior art; lower glass plate-10; gate layer-20; first protective layer -30; flat layer-40; pixel electrode-50; reflective layer-60; source and drain layer-70; active layer-80; second protective layer-31; via hole-51.
  • FIG. 1 The film structure of the transflective or total reflection mode is shown in FIG. 1 , the pixel electrode layer 10 ′ is provided with a via hole 11 ′, one side of the via hole 11 ′ is covered with a reflective layer 20 ′, and the reflective layer
  • the 20' coverage area accounts for a large proportion, and there will be a certain amount of reflection when the screen is in the black state, resulting in high brightness in the black state and low contrast.
  • the display substrate provided by the present invention includes a substrate; the substrate includes a gate layer 20, a source and drain layer 70, an active layer 80 and a flat layer 40; the pixel electrode 50 at least partially covers the flat layer 40; The pixel electrode 50 is connected to the source-drain layer 70 through the hole 51 , and the through hole 51 covers the second protective layer 31 ; the reflective layer 60 at least partially covers the pixel electrode 50 , and no reflection is provided on the pixel electrode 50 at the through hole 51 Layer 60.
  • the reflective layer 60 at the via hole 51 is dug out to reduce the area of the reflective layer 60 , thereby reducing the black state reflectivity and improving the contrast ratio, which is suitable for liquid crystal display panels in transflective or total-reflection mode.
  • the substrate further includes a first protective layer 30 and a second protective layer 31 .
  • the first protective layer 30 covers the gate layer 20 ;
  • the second protective layer 31 covers the source and drain layers 70 and the active layer 80 .
  • the flat layer 40 covers the second protective layer 31 to make the substrate smoother.
  • the display substrate also includes a lower glass plate 10 .
  • the first protective layer 30 and the second protective layer 31 are silicon nitride layers, which are used for insulation protection.
  • the reflective layer 60 is an aluminum layer.
  • the pixel electrode 50 is made of transparent ITO material.
  • the present invention also provides a liquid crystal display device, which includes the display substrate in Embodiment 1.
  • the utility model digs out the reflective layer at the via hole, reduces the area of the reflective layer, thereby reduces the black state reflectivity and improves the contrast, and is suitable for liquid crystal display panels in semi-transflective or total-reflection mode. smoother.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Liquid Crystal (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)

Abstract

本实用新型公开了一种显示基板及液晶显示装置，其中，显示基板包括基板，基板包括栅极层、源漏极层、有源层和平坦层；像素电极，至少部分覆盖平坦层；像素电极经过孔与源漏极层连接；反射层，至少部分覆盖像素电极，并且，过孔处的像素电极上不设置反射层。本实用新型挖掉过孔处的反射层，减小了反射层的面积，从而降低黑态反射率，提高对比度，适用于半透半反或全反模式的液晶显示面板，设置平坦层，使整体更加平滑。

Description

一种显示基板及液晶显示装置 技术领域
本实用新型涉及液晶显示技术领域，尤其涉及一种显示基板及液晶显示装置。
背景技术
在光学上，对比度CR＝(全白亮度-全黑亮度)/全黑亮度，简单的定义就是全白亮度与全黑亮度的比值。对比度越高，画面层次感越鲜明。随着薄膜晶体管液晶显示器的高品质发展趋势，必定要求薄膜晶体管液晶显示器要进行相应的高对比度设计。现有的半透半反或全反模式的膜层结构在过孔处的反射层未挖去，在屏幕黑态时会有一定的，导致黑态的亮度偏高，从而导致对比度偏低。
有鉴于此，急需对现有的显示基板进行改进，以提高对比度。
实用新型内容
本实用新型公开了一种显示基板及液晶显示装置，用于解决现有技术中，半透半反屏幕和全反屏幕对比度低的问题。
为了解决上述问题，本实用新型采用下述技术方案：
提供一种显示基板，包括基板；
所述基板包括栅极层、源漏极层、有源层和平坦层；
像素电极，至少部分覆盖所述平坦层；所述像素电极经过孔与所述源漏极层连接；
反射层，至少部分覆盖所述像素电极，并且，所述过孔处的所述像素电极上不设置反射层。
在上述方案中，所述基板还包括第一保护层和第二保护层，所述第一保护层覆盖所述栅极层，所述第二保护层覆盖所述源漏极层和有源层。
在上述方案中，所述平坦层覆盖所述第二保护层。
在上述方案中，所述过孔覆盖所述第二保护层。
在上述方案中，所述第一保护层和第二保护层为氮化硅层。
在上述方案中，所述反射层为铝层。
在上述方案中，所述像素电极采用透明的ITO材料制成。
本实用新型还提供了一种液晶显示装置，包括上述方案中任一项所述的显示基板。
本实用新型采用的技术方案能够达到以下有益效果：
挖掉过孔处的反射层，减小了反射层的面积，从而降低黑态反射率，提高对比度，适用于半透半反或全反模式的液晶显示面板，设置平坦层，使整体更加平滑。
附图说明
为了更清楚地说明本实用新型实施例的技术方案，下面将对实施例描述中所需要使用的附图作简 单地介绍，构成本实用新型的一部分，本实用新型的示意性实施例及其说明解释本实用新型，并不构成对本实用新型的不当限定。在附图中：
图1为现有技术中液晶显示面板中液晶层以下的整体结构示意图；
图2为本实用新型实施例公开的液晶显示面板中液晶层以下的整体结构示意图。
具体包括下述附图标记：
现有技术中的像素电极层-10’；现有技术中的过孔-11’；现有技术中的反射层-20’；下层玻璃板-10；栅极层-20；第一保护层-30；平坦层-40；像素电极-50；反射层-60；源漏极层-70；有源层-80；第二保护层-31；过孔-51。
具体实施方式
为使本实用新型的目的、技术方案和优点更加清楚，下面将结合本实用新型具体实施例及相应的附图对本实用新型技术方案进行清楚、完整地描述。显然，所描述的实施例仅是本实用新型一部分实施例，而不是全部的实施例。基于本实用新型中的实施例，本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例，都属于本实用新型保护的范围。
现有技术：半透半反或全反模式的膜层结构如图1所示，像素电极层10’处设有过孔11’，过孔11’的一侧覆盖反射层20’，反射层20’的覆盖面积占比大，在屏幕黑态时会有一定的反射，导致黑态的亮度偏高，从而导致对比度偏低。
实施例1
如图2所示，本实用新型提供的显示基板，包括基板；基板包括栅极层20、源漏极层70、有源层80和平坦层40；像素电极50，至少部分覆盖平坦层40；像素电极50经过孔51与源漏极层70连接，并且过孔51覆盖第二保护层31；反射层60，至少部分覆盖像素电极50，并且，过孔51处的像素电极50上不设置反射层60。将过孔51处的反射层60挖掉，减小了反射层60的面积，从而降低黑态反射率，提高对比度，适用于半透半反或全反模式的液晶显示面板。
基板还包括第一保护层30和第二保护层31，第一保护层30覆盖栅极层20；第二保护层31覆盖源漏极层70和有源层80。平坦层40，覆盖第二保护层31使基板更加平滑。
显示基板还包括下层玻璃板10。
本实施例优选的，第一保护层30和第二保护层31为氮化硅层，用于绝缘保护。
本实施例优选的，反射层60为铝层。
本实施例优选的，像素电极50采用透明的ITO材料制成。
实施例2
本实用新型还提供了一种液晶显示装置，包括实施例1中的显示基板。
本实用新型挖掉过孔处的反射层，减小了反射层的面积，从而降低黑态反射率，提高对比度，适用于半透半反或全反模式的液晶显示面板，设置平坦层，使整体更加平滑。
上面结合附图对本实用新型的实施例进行了描述，但是本实用新型并不局限于上述的具体实施方式，上述的具体实施方式仅仅是示意性的，而不是限制性的，本领域的普通技术人员在本实用新型的启示下，在不脱离本实用新型宗旨和权利要求所保护的范围情况下，还可做出很多形式，均属于本实用新型的保护之内。

Claims (8)

  1. 一种显示基板，包括基板，其特征在于，
    所述基板包括栅极层、源漏极层、有源层和平坦层；
    像素电极，至少部分覆盖所述平坦层；所述像素电极经过孔与所述源漏极层连接；
    反射层，至少部分覆盖所述像素电极，并且，所述过孔处的所述像素电极上不设置反射层。
  2. 根据权利要求1所述的显示基板，其特征在于，所述基板还包括第一保护层和第二保护层，所述第一保护层覆盖所述栅极层，所述第二保护层覆盖所述源漏极层和有源层。
  3. 根据权利要求2所述的显示基板，其特征在于，所述平坦层覆盖所述第二保护层。
  4. 根据权利要求2所述的显示基板，其特征在于，所述过孔覆盖所述第二保护层。
  5. 根据权利要求2所述的显示基板，其特征在于，所述第一保护层和第二保护层为氮化硅层。
  6. 根据权利要求1所述的显示基板，其特征在于，所述反射层为铝层。
  7. 根据权利要求1所述的显示基板，其特征在于，所述像素电极采用透明的ITO材料制成。
  8. 一种液晶显示装置，其特征在于，包括权利要求1-7任一项所述的显示基板。
PCT/CN2020/125023 2020-09-15 2020-10-30 一种显示基板及液晶显示装置 WO2022057021A1 (zh)

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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003057676A (ja) * 2001-08-09 2003-02-26 Matsushita Electric Ind Co Ltd 反射型液晶表示装置
CN1828871A (zh) * 2006-02-08 2006-09-06 广辉电子股份有限公司 像素结构的制造方法
CN107515498A (zh) * 2017-09-18 2017-12-26 上海天马微电子有限公司 阵列基板和显示面板
CN210691003U (zh) * 2019-11-11 2020-06-05 凌巨科技股份有限公司 显示面板及其主动元件阵列基板
CN112015016A (zh) * 2020-09-07 2020-12-01 厦门天马微电子有限公司 阵列基板、阵列基板的制造方法及显示面板

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003057676A (ja) * 2001-08-09 2003-02-26 Matsushita Electric Ind Co Ltd 反射型液晶表示装置
CN1828871A (zh) * 2006-02-08 2006-09-06 广辉电子股份有限公司 像素结构的制造方法
CN107515498A (zh) * 2017-09-18 2017-12-26 上海天马微电子有限公司 阵列基板和显示面板
CN210691003U (zh) * 2019-11-11 2020-06-05 凌巨科技股份有限公司 显示面板及其主动元件阵列基板
CN112015016A (zh) * 2020-09-07 2020-12-01 厦门天马微电子有限公司 阵列基板、阵列基板的制造方法及显示面板

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