WO2021220696A1 - 選択成膜方法 - Google Patents
選択成膜方法 Download PDFInfo
- Publication number
- WO2021220696A1 WO2021220696A1 PCT/JP2021/013295 JP2021013295W WO2021220696A1 WO 2021220696 A1 WO2021220696 A1 WO 2021220696A1 JP 2021013295 W JP2021013295 W JP 2021013295W WO 2021220696 A1 WO2021220696 A1 WO 2021220696A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- film
- selective
- gas
- forming method
- selectively
- Prior art date
Links
- 230000015572 biosynthetic process Effects 0.000 title claims abstract description 40
- 238000000034 method Methods 0.000 claims abstract description 64
- 150000003333 secondary alcohols Chemical class 0.000 claims abstract description 31
- 150000003509 tertiary alcohols Chemical class 0.000 claims abstract description 30
- 239000000758 substrate Substances 0.000 claims abstract description 20
- 238000001179 sorption measurement Methods 0.000 claims abstract description 18
- 239000007789 gas Substances 0.000 claims description 78
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims description 51
- 229910052751 metal Inorganic materials 0.000 claims description 33
- 239000002184 metal Substances 0.000 claims description 33
- 239000002994 raw material Substances 0.000 claims description 20
- 229910052739 hydrogen Inorganic materials 0.000 claims description 19
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 17
- 239000001257 hydrogen Substances 0.000 claims description 16
- 239000012044 organic layer Substances 0.000 claims description 15
- 239000000463 material Substances 0.000 claims description 13
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 claims description 11
- 230000000903 blocking effect Effects 0.000 claims description 11
- MSXVEPNJUHWQHW-UHFFFAOYSA-N 2-methylbutan-2-ol Chemical compound CCC(C)(C)O MSXVEPNJUHWQHW-UHFFFAOYSA-N 0.000 claims description 9
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 9
- BTANRVKWQNVYAZ-UHFFFAOYSA-N butan-2-ol Chemical compound CCC(C)O BTANRVKWQNVYAZ-UHFFFAOYSA-N 0.000 claims description 9
- 239000012495 reaction gas Substances 0.000 claims description 9
- 238000000137 annealing Methods 0.000 claims description 8
- 229910052802 copper Inorganic materials 0.000 claims description 8
- 238000009832 plasma treatment Methods 0.000 claims description 7
- 229910052707 ruthenium Inorganic materials 0.000 claims description 6
- 239000012528 membrane Substances 0.000 claims description 4
- 230000009467 reduction Effects 0.000 claims description 3
- 239000007858 starting material Substances 0.000 abstract 1
- 239000010408 film Substances 0.000 description 155
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 19
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 19
- 239000002243 precursor Substances 0.000 description 18
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 17
- 230000008569 process Effects 0.000 description 14
- 238000006356 dehydrogenation reaction Methods 0.000 description 10
- 238000000354 decomposition reaction Methods 0.000 description 8
- 239000000376 reactant Substances 0.000 description 8
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- 150000002894 organic compounds Chemical class 0.000 description 6
- 125000004432 carbon atom Chemical group C* 0.000 description 5
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- 230000002411 adverse Effects 0.000 description 3
- 150000001298 alcohols Chemical class 0.000 description 3
- 150000001299 aldehydes Chemical class 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- 150000002576 ketones Chemical class 0.000 description 3
- 150000003138 primary alcohols Chemical class 0.000 description 3
- IKHGUXGNUITLKF-UHFFFAOYSA-N Acetaldehyde Chemical compound CC=O IKHGUXGNUITLKF-UHFFFAOYSA-N 0.000 description 2
- NBBJYMSMWIIQGU-UHFFFAOYSA-N Propionic aldehyde Chemical compound CCC=O NBBJYMSMWIIQGU-UHFFFAOYSA-N 0.000 description 2
- IKHGUXGNUITLKF-XPULMUKRSA-N acetaldehyde Chemical compound [14CH]([14CH3])=O IKHGUXGNUITLKF-XPULMUKRSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 230000005012 migration Effects 0.000 description 2
- 238000013508 migration Methods 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 238000006557 surface reaction Methods 0.000 description 2
- -1 that is Substances 0.000 description 2
- 238000005979 thermal decomposition reaction Methods 0.000 description 2
- JLTRXTDYQLMHGR-UHFFFAOYSA-N trimethylaluminium Chemical compound C[Al](C)C JLTRXTDYQLMHGR-UHFFFAOYSA-N 0.000 description 2
- 229910010282 TiON Inorganic materials 0.000 description 1
- 125000003158 alcohol group Chemical group 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- BXCQGSQPWPGFIV-UHFFFAOYSA-N carbon monoxide;cobalt;cobalt(2+);methanone Chemical compound [Co].[Co+2].O=[CH-].O=[CH-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-] BXCQGSQPWPGFIV-UHFFFAOYSA-N 0.000 description 1
- NQZFAUXPNWSLBI-UHFFFAOYSA-N carbon monoxide;ruthenium Chemical group [Ru].[Ru].[Ru].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-] NQZFAUXPNWSLBI-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000002329 infrared spectrum Methods 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
- H01L21/283—Deposition of conductive or insulating materials for electrodes conducting electric current
- H01L21/285—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation
- H01L21/28506—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers
- H01L21/28512—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers on semiconductor bodies comprising elements of Group IV of the Periodic Table
- H01L21/28556—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers on semiconductor bodies comprising elements of Group IV of the Periodic Table by chemical means, e.g. CVD, LPCVD, PECVD, laser CVD
- H01L21/28562—Selective deposition
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0209—Pretreatment of the material to be coated by heating
- C23C16/0218—Pretreatment of the material to be coated by heating in a reactive atmosphere
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
- C23C16/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
- C23C16/18—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/34—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/34—Nitrides
- C23C16/345—Silicon nitride
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/36—Carbonitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
- C23C16/402—Silicon dioxide
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/403—Oxides of aluminium, magnesium or beryllium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/405—Oxides of refractory metals or yttrium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
- C23C16/45525—Atomic layer deposition [ALD]
- C23C16/45527—Atomic layer deposition [ALD] characterized by the ALD cycle, e.g. different flows or temperatures during half-reactions, unusual pulsing sequence, use of precursor mixtures or auxiliary reactants or activations
- C23C16/45534—Use of auxiliary reactants other than used for contributing to the composition of the main film, e.g. catalysts, activators or scavengers
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
- C23C16/45525—Atomic layer deposition [ALD]
- C23C16/45553—Atomic layer deposition [ALD] characterized by the use of precursors specially adapted for ALD
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02057—Cleaning during device manufacture
- H01L21/0206—Cleaning during device manufacture during, before or after processing of insulating layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02057—Cleaning during device manufacture
- H01L21/02068—Cleaning during device manufacture during, before or after processing of conductive layers, e.g. polysilicon or amorphous silicon layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
- H01L21/02123—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon
- H01L21/02164—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon the material being a silicon oxide, e.g. SiO2
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
- H01L21/02172—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing at least one metal element, e.g. metal oxides, metal nitrides, metal oxynitrides or metal carbides
- H01L21/02175—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing at least one metal element, e.g. metal oxides, metal nitrides, metal oxynitrides or metal carbides characterised by the metal
- H01L21/02178—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing at least one metal element, e.g. metal oxides, metal nitrides, metal oxynitrides or metal carbides characterised by the metal the material containing aluminium, e.g. Al2O3
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
- H01L21/02172—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing at least one metal element, e.g. metal oxides, metal nitrides, metal oxynitrides or metal carbides
- H01L21/02175—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing at least one metal element, e.g. metal oxides, metal nitrides, metal oxynitrides or metal carbides characterised by the metal
- H01L21/02181—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing at least one metal element, e.g. metal oxides, metal nitrides, metal oxynitrides or metal carbides characterised by the metal the material containing hafnium, e.g. HfO2
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
- H01L21/02172—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing at least one metal element, e.g. metal oxides, metal nitrides, metal oxynitrides or metal carbides
- H01L21/02175—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing at least one metal element, e.g. metal oxides, metal nitrides, metal oxynitrides or metal carbides characterised by the metal
- H01L21/02186—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing at least one metal element, e.g. metal oxides, metal nitrides, metal oxynitrides or metal carbides characterised by the metal the material containing titanium, e.g. TiO2
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02205—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02205—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition
- H01L21/02208—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition the precursor containing a compound comprising Si
- H01L21/02219—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition the precursor containing a compound comprising Si the compound comprising silicon and nitrogen
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02296—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer
- H01L21/02299—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer pre-treatment
- H01L21/02312—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer pre-treatment treatment by exposure to a gas or vapour
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
- H01L21/283—Deposition of conductive or insulating materials for electrodes conducting electric current
- H01L21/285—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation
- H01L21/28506—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers
- H01L21/28512—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers on semiconductor bodies comprising elements of Group IV of the Periodic Table
- H01L21/28568—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers on semiconductor bodies comprising elements of Group IV of the Periodic Table the conductive layers comprising transition metals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
- H01L21/311—Etching the insulating layers by chemical or physical means
- H01L21/31105—Etching inorganic layers
- H01L21/31111—Etching inorganic layers by chemical means
- H01L21/31116—Etching inorganic layers by chemical means by dry-etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/32—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers using masks
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
- H01L21/321—After treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76801—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing
- H01L21/76822—Modification of the material of dielectric layers, e.g. grading, after-treatment to improve the stability of the layers, to increase their density etc.
- H01L21/76826—Modification of the material of dielectric layers, e.g. grading, after-treatment to improve the stability of the layers, to increase their density etc. by contacting the layer with gases, liquids or plasmas
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76801—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing
- H01L21/76829—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing characterised by the formation of thin functional dielectric layers, e.g. dielectric etch-stop, barrier, capping or liner layers
- H01L21/76834—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing characterised by the formation of thin functional dielectric layers, e.g. dielectric etch-stop, barrier, capping or liner layers formation of thin insulating films on the sidewalls or on top of conductors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
- H01L21/76841—Barrier, adhesion or liner layers
- H01L21/76843—Barrier, adhesion or liner layers formed in openings in a dielectric
- H01L21/76849—Barrier, adhesion or liner layers formed in openings in a dielectric the layer being positioned on top of the main fill metal
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
- H01L21/76877—Filling of holes, grooves or trenches, e.g. vias, with conductive material
- H01L21/76883—Post-treatment or after-treatment of the conductive material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
- H01L21/02263—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase
- H01L21/02271—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
- H01L21/02263—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase
- H01L21/02271—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition
- H01L21/0228—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition deposition by cyclic CVD, e.g. ALD, ALE, pulsed CVD
Definitions
- This disclosure relates to a selective film formation method.
- Patent Document 1 as a method of selectively forming a thin film on a substrate to be treated in a state where the conductive film and the insulating film are exposed on the surface, the first surface which is the exposed surface of the conductive film is Ru, RuO 2. , Pt, Pd, CuO and CuO 2 , and a method of selectively forming a Ru film only on the first surface using Ru (EtCp) 2 gas and O 2 gas has been proposed. ..
- the present disclosure provides a highly versatile selective film formation method using a simple method.
- the selective film forming method comprises a substrate including a first film having a first surface and a second film having a second surface different from the first film. Preparing, selectively adsorbing a secondary alcohol gas and / or a tertiary alcohol gas on the second surface, and supplying at least a raw material gas to selectively film the first surface. To form and have.
- a substrate having a metal film having a natural oxide film formed on its surface and an insulating film is prepared, and the natural oxide film is reduced and removed to obtain the above.
- FIG. 1 is a flowchart showing a selective film forming method according to the first embodiment
- FIGS. 2A to 2C are process cross-sectional views showing each step shown in FIG.
- a substrate 1 in which a first film 11 and a second film 12 made of a material different from the first film 11 are formed on a semiconductor substrate (for example, Si) 10 as shown in FIG. 2A is prepared.
- the first film 11 has a first surface 21 and the second film 12 has a second surface 22.
- the substrate 1 is placed on a stage provided in the processing chamber.
- a metal film can be mentioned as the first film 11, and any one of Cu, Ru, Co, Ti, and TiN, or a combination thereof (at least one of Cu, Ru, Co, Ti, and TiN) can be mentioned as a preferable example. Is exemplified.
- an insulating film can be mentioned, and as a preferable example , any one of SiO x , SiOC, SiOCN, SiN, or a combination thereof ( at least one of SiO x , SiOC, SiOCN, SiN). Is exemplified.
- step 2 is performed by introducing a secondary alcohol gas and / or a tertiary alcohol gas into the chamber in which the substrate 1 is housed.
- the organic layer 31 formed by adsorption need only be adsorbed on the entire surface of the second surface 22, and does not need to be a film.
- the organic layer 31 functions as a blocking material that blocks the film formation on the second surface 22 at the time of the next film formation.
- a secondary alcohol is an alcohol in which a carbon atom having a hydroxy group (-OH group) is bonded to two other carbon atoms
- a tertiary alcohol is an alcohol in which a carbon atom having a hydroxy group is another. It is an alcohol bonded to 3 carbon atoms.
- Examples of the secondary alcohol include isopropyl alcohol (IPA) and 2-butanol.
- Examples of the tertiary alcohol include tert-butyl alcohol (2-methyl-2-propanol) and 2-methyl-2-butanol. However, these are only examples and are not limited to these.
- Secondary alcohols and tertiary alcohols are dehydrogenated as compared to normal type alcohols such as ethanol, 1-propanol and 1-butanol (primary alcohols (alcohols with hydroxy groups attached to terminal carbon atoms)).
- the starting temperature is low, and the adsorption temperature can be lowered by about 50 ° C.
- IPA gas has a large tendency. This is because in primary alcohols, dehydrogenation produces aldehydes, whereas in secondary and tertiary alcohols, dehydrogenation produces ketones.
- aldehydes acetaldehyde, propanal, etc.
- ketones acetone, methyl ethyl ketone, etc.
- secondary alcohols and tertiary alcohols are colder. Dehydrogenation reaction occurs and adsorbs.
- the adsorption of the secondary alcohol gas and / or the tertiary alcohol gas can be carried out in the temperature range of 100 to 350 ° C. More preferably, it is in the range of 100 to 250 ° C. Depending on the alcohol used, the temperature range can be 100 to 150 ° C., and in particular, when IPA gas is used, this temperature range of 100 to 150 ° C. is preferable.
- the time of step 2 is preferably set to such a time that the organic layer 31 can be adsorbed on the entire surface of the second surface 22.
- the secondary alcohol gas and the tertiary alcohol gas are relatively easy to adsorb, and can be adsorbed in a relatively short time of 1 to 60 sec.
- Alcohol gas is easily adsorbed on the surface of the insulating film, but has the property of being difficult to be adsorbed on the surface of a metal film such as Cu. Therefore, when the first film 11 is a metal film and the second film 12 is an insulating film, the alcohol gas can be selectively adsorbed on the second surface 22.
- the organic layer 31 is selectively adsorbed on the second surface 22 in the relatively low temperature range as described above to form the organic layer 31. Can be formed.
- the temperature of the process after the metal film is formed is low.
- the metal film, that is, Cu is exposed, so that the temperature is particularly required to be lowered.
- the temperature of step 2 can be lowered by using a secondary alcohol gas and / or a tertiary alcohol gas as the adsorbed gas in step 2, so that adverse effects such as Cu migration are adversely affected. It can be suppressed.
- step 3 If the film formation process of step 3 performed after that, which will be described below, can be lowered in temperature, it is expected that the migration of the metal film and the like can be suppressed more effectively and the selectivity of film formation is further enhanced.
- NS If the adsorption process in step 2 is performed at a high temperature, the metal film is adversely affected as described above, and when the next film formation is performed at a low temperature, the temperature of the chamber is changed or another chamber is used. Will be required and productivity will decrease.
- step 3 At least the raw material gas (precursor) is supplied to selectively form the film 41 on the first surface 21 (step 3, FIG. 2C).
- the selective film forming property of step 3 is realized by the blocking function of the organic layer 31.
- the film formation at this time may be carried out by the reaction of the raw material gas (precursor) and the reaction gas (reactant), or by the thermal decomposition of the raw material gas (precursor).
- the film When the film is formed by the reaction between the precursor and the reactor, it can be formed by ALD or CVD. Of these, ALD in which a precursor and a reactor are alternately adsorbed to form a film by a surface reaction is preferable. In the case of ALD, the organic layer 31 inhibits the adsorption of the precursor to the second surface 22 to block the surface reaction. Therefore, the selective film forming property of the film 41 can be maintained high.
- the temperature at this time is preferably 450 ° C. or lower.
- the film When the film is formed by the decomposition reaction of the precursor, it can be carried out by CVD.
- CVD As an example of forming a film by the decomposition reaction of the precursor, when a Co film is formed using cobalt carbonyl (Co 2 (CO) 8 ) as the raw material gas, ruthenium carbonyl (Ru 3 (CO) 12 ) is used as the raw material gas. The case of forming a Ru film can be mentioned.
- the film 41 is not particularly limited, and may be a metal film or an insulating film. Further, the combination of the precursor and the reactor is not particularly limited as long as the blocking function of the organic layer 31 can be maintained for a necessary period in the film forming process.
- any one of Ru, Cu, Co, Ti, and TiN, or a combination thereof is exemplified as a suitable example.
- the film 41 is an insulating film, SiO x Suitable examples, SiOC, SiOCN, SiN, Al x O y, HfO x, ZrO x, TiO x, TiON , or a combination thereof, (SiO x, SiOC, SiOCN , SiN, Al x Oy , HfO x , ZrO x , TiO x , at least one of TION).
- the precursor for forming the film various ones can be used depending on the film to be formed, and it may be an organic compound or an inorganic compound, but an organic compound is more preferable.
- the reactor at the time of film formation one corresponding to the film to be formed may be used, but H 2 O and H 2 are preferably used from the viewpoint of exerting the blocking function of the organic layer 31. be able to.
- H 2 O As the reactor, an oxide film is formed as the film 41, and by using H 2 , a metal film is formed.
- the film formation temperature is preferably 450 ° C. or lower, more preferably 350 ° C. or lower.
- O 2 is also preferable as the reactor, and an oxide film or a metal film is formed by using O 2.
- the film formation temperature is preferably 300 ° C. or lower, more preferably 250 ° C. or lower.
- a nitride film may be formed by using a nitride such as NH 3 as the reactor, and another film may be formed by using another reactor.
- Preferable examples of the material of the film 41, the precursor and the reactor, and the temperature at that time are exemplified as follows.
- steps 2 and 3 are preferably performed in a vacuum atmosphere, and can be performed in the range of 13 to 1333 Pa, for example. Further, steps 2 and 3 can be continuously performed in the same chamber. When steps 2 and 3 are performed in the same chamber, it is preferable to perform both steps at the same temperature.
- steps 2 and 3 may be repeated alternately two or more times.
- the organic layer 31 may be eroded during the film formation depending on the type of reactor in step 3, but by repeating steps 2 and 3, the film 41 is desired.
- the blocking function of the organic layer 31 can be maintained until the film thickness is reached, and selective film formation can be performed.
- the selective film forming technique shown in Patent Document 1 focuses on forming a conductive film on a conductive film and forming an insulating film on an insulating film, and forms a base film and a film for selective film formation. Membrane materials, precursors and reactors are limited.
- a simple method of selectively adsorbing a general organic compound such as a secondary alcohol gas such as IPA or a tertiary alcohol gas to function as a blocking material for blocking film formation It is possible to realize a highly versatile selective film formation with few restrictions by a simple method.
- a secondary alcohol gas such as IPA or a tertiary alcohol gas can lower the adsorption temperature, which is advantageous when a metal film such as Cu is present. Further, since these are easy to handle and have relatively high adsorptivity, they do not require much labor and the processing time is short. It also has the advantage of having a wide applicable temperature range.
- FIG. 3 is a flowchart showing the selective film forming method according to the second embodiment
- FIG. 4 is a process cross-sectional view showing each step shown in FIG.
- a substrate 1'in which the metal film 51 and the insulating film 52 are formed on the semiconductor substrate (for example, Si) 10 and the natural oxide film 51a is formed on the surface of the metal film 51 is prepared.
- the insulating film 52 has a second surface 62. In this step 11, specifically, the substrate 1'is placed on a stage provided in the processing chamber.
- any one of Cu, Ru, Co, Ti and TiN, or a combination thereof (at least one of Ru, Cu, CoTi and TiN) is exemplified.
- the insulating film 52 any one of SiO x , SiOC, SiOCN, SiN, or a combination thereof ( at least one of SiO x , SiOC, SiOCN, SiN) is exemplified.
- the natural oxide film 51a is an oxide film formed on the surface of the metal film 51, and at least one kind of oxide film of Cu, Ru, Co, and Ti is exemplified.
- a reduction treatment is performed on the entire surface to reduce and remove the natural oxide film 51a to expose the first surface 61 of the metal film 51 (step 12, FIG. 4B).
- a reduction treatment is performed on the entire surface to reduce and remove the natural oxide film 51a to expose the first surface 61 of the metal film 51 (step 12, FIG. 4B).
- the natural oxide film 51a is removed while the second surface 62 of the insulating film 52 remains as it is.
- the reason why the natural oxide film 51a is removed is that an organic compound containing an ⁇ OH group is easily adsorbed on the metal oxide film, and it is difficult to obtain selective adsorption property.
- This step 12 can be performed by hydrogen annealing or hydrogen plasma treatment.
- the temperature at this time is preferably 500 ° C. or lower, more preferably 400 ° C. or lower, more preferably 250 to 400 ° C. for hydrogen annealing, and more preferably a temperature lower than hydrogen annealing, for example, 400 ° C. or lower for hydrogen plasma treatment.
- the substrate 1' is annealed while introducing hydrogen gas (H 2 gas) into the chamber containing the substrate 1'.
- hydrogen plasma treatment hydrogen plasma is applied to the substrate 1'in the chamber.
- the reduction treatment in step 12 can also be carried out using an organic compound containing an ⁇ OH group. In this case, the same treatment as the adsorption step of the next step 13 can be performed.
- hydrogen annealing and hydrogen plasma treatment are preferable.
- the secondary alcohol gas and / or the tertiary alcohol gas is selectively adsorbed on the second surface 62 of the insulating film 52 (step 13, FIG. 4C).
- This step 13 can be performed in the same manner as step 2 of the first embodiment.
- the organic layer 31 formed by adsorption has selective adsorptivity and blocking function as in the first embodiment, is selectively adsorbed on the second surface 62, and is second surface during film formation. Blocks film formation on 62.
- isopropyl alcohol (IPA) and 2-butanol can be used as the secondary alcohol, and for example, tert-butyl alcohol (2-methyl-2-propanol) can be used as the tertiary alcohol.
- 2-Methyl-2-butanol can be used.
- the processing temperature is the same as in step 2 of the first embodiment.
- step 14 At least the raw material gas (precursor) is supplied to selectively form the film 41 on the first surface 61 (step 14, FIG. 4D).
- the selective film forming property of step 14 is realized by the blocking function of the organic layer 31.
- the film formation at this time may be carried out by the reaction between the raw material gas (precursor) and the reaction gas (reactant), or by thermal decomposition of the raw material gas (precursor), as in step 3 of the first embodiment.
- the film When the film is formed by the reaction of the precursor and the reactor, it can be formed by ALD or CVD, but ALD is preferable.
- the film is formed by the decomposition reaction of the precursor, it can be carried out by CVD.
- the precursor, the reactor, the combination thereof, the temperature, and the like when carrying out this step 14 are the same as those in step 3 of the first embodiment.
- steps 12 to 14 are preferably performed in a vacuum atmosphere, and can be performed in the range of 13 to 1333 Pa, for example. Further, steps 12 to 14 can be continuously performed in the same chamber. When steps 12 to 14 are performed in the same chamber, it is preferable to perform these steps at the same temperature. Similar to steps 2 and 3 of the first embodiment, steps 13 and 14 may be repeated alternately two or more times.
- a blocking material that selectively adsorbs a general organic compound such as a secondary alcohol gas such as IPA or a tertiary alcohol gas to block the film formation.
- a secondary alcohol gas such as IPA or a tertiary alcohol gas can lower the adsorption temperature, which is advantageous when a metal film such as Cu is present.
- FIGS. 5 to 8 The analysis results based on the IR spectrum at that time are shown in FIGS. 5 to 8.
- ethanol as shown in FIG. 5, it was confirmed that dehydrogenation was started at around 150 ° C. to generate acetaldehyde, and the amount of acetaldehyde increased as the temperature increased.
- 1-propanol as shown in FIG. 6, it was confirmed that dehydrogenation was similarly started at around 150 ° C. to produce propanol, and the amount of propanol increased as the temperature increased.
- 1-butanol as shown in FIG. 8, it was confirmed that dehydrogenation was similarly started at around 150 ° C. to produce butanol, and the amount of butanol increased as the temperature increased.
- the dehydrogenation start temperature is around 150 ° C., and aldehydes may be produced by dehydrogenation. confirmed.
- IPA which is a secondary alcohol
- acetone which is a ketone
- the dehydrogenation start temperature is about 100 ° C., which is lower than that of other gases. It was confirmed that. That is, in the case of IPA, it was confirmed that IPA was decomposed at a low temperature of 100 ° C. to produce acetone, which was adsorbed on the surface to form an organic layer.
- a substrate on which a first film (metal film) and a second film (insulating film) are formed is schematically described (FIGS. 2A to 2C, FIGS. 4A to 4D).
- first film and the second film can take various forms depending on the device to be applied.
- the present invention is not limited to this, and it can be applied to the selective film formation on three or more films.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Plasma & Fusion (AREA)
- Chemical Vapour Deposition (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Electrodes Of Semiconductors (AREA)
- Formation Of Insulating Films (AREA)
Abstract
選択成膜方法は、第1の表面を有する第1の膜と、第2の表面を有する第1の膜とは異なる第2の膜とを含む基板を準備することと、第2級アルコールガスおよび/または第3級アルコールガスを第2の表面に選択的に吸着させることと、少なくとも原料ガスを供給して第1の表面に選択的に膜を形成することとを有する。
Description
本開示は、選択成膜方法に関する。
半導体装置の製造工程においては、一般的に、フォトリソグラフィおよびエッチングによりパターン形成が行われている。しかし、近時、半導体デバイスの微細化が益々進んでおり、フォトリソグラフィ精度の限界に達している。
このため、配線等の金属膜と絶縁膜とが混在する表面に対して、例えば金属膜に選択的かつ自己整合的に所望の膜を成膜する技術が求められている。
特許文献1には、表面に導電膜および絶縁膜が露出した状態の被処理基板上に薄膜を選択的に成膜させる方法として、導電膜の露出表面である第1の表面がRu、RuO2、Pt、Pd、CuOおよびCuO2のいずれかであり、Ru(EtCp)2ガスとO2ガスとを用いて第1の表面のみに選択的にRu膜を成膜する方法が提案されている。
本開示は、簡易な手法で汎用性が高い選択成膜方法を提供する。
本開示の第1の態様に係る選択成膜方法は、第1の表面を有する第1の膜と、第2の表面を有する前記第1の膜とは異なる第2の膜とを含む基板を準備することと、第2級アルコールガスおよび/または第3級アルコールガスを前記第2の表面に選択的に吸着させることと、少なくとも原料ガスを供給して前記第1の表面に選択的に膜を形成することと、を有する。
本開示の第2の態様に係る選択成膜方法は、表面に自然酸化膜が形成された金属膜と、絶縁膜とを有する基板を準備することと、前記自然酸化膜を還元除去し、前記金属膜の第1の表面を露出させることと、第2級アルコールガスおよび/または第3級アルコールガスを前記絶縁膜の第2の表面に選択的に吸着させることと、少なくとも原料ガスを供給して前記第1の表面に選択的に膜を形成することと、を有する。
本発明によれば、簡易で汎用性が高い選択成膜方法が提供される。
以下、添付図面を参照して本発明の実施の形態について説明する。
<第1の実施形態>
図1は第1の実施形態に係る選択成膜方法を示すフローチャート、図2A~図2Cは図1に示す各工程を示す工程断面図である。
<第1の実施形態>
図1は第1の実施形態に係る選択成膜方法を示すフローチャート、図2A~図2Cは図1に示す各工程を示す工程断面図である。
最初に、図2Aに示すような、半導体基体(例えばSi)10上に、第1の膜11と第1の膜11とは異なる材料の第2の膜12が形成された基板1を準備する(ステップ1)。第1の膜11は第1の表面21を有しており、第2の膜12は第2の表面22を有している。このステップ1では、具体的には、処理チャンバー内に設けられたステージ上に基板1が載置された状態とされる。
第1の膜11としては金属膜を挙げることができ、好適な例としてCu、Ru、Co、Ti、TiNのいずれか、またはこれらの組み合わせ(Cu、Ru、Co、Ti、TiNの少なくとも一種)が例示される。また、第2の膜12としては絶縁膜を挙げることができ、好適な例としてSiOx、SiOC、SiOCN、SiNのいずれか、またはこれらの組み合わせ(SiOx、SiOC、SiOCN、SiNの少なくとも一種)が例示される。
次に、第2級アルコールガスおよび/または第3級アルコールガスを第2の膜12の第2の表面22に選択的に吸着させる(ステップ2、図2B)。このステップ2は、基板1が収容されたチャンバー内に、第2級アルコールガスおよび/または第3級アルコールガスを導入することにより行われる。吸着により形成された有機層31は第2の表面22の全面に吸着されていればよく、膜になっている必要はない。有機層31は、次の成膜の際に、第2の表面22への成膜をブロックするブロッキング材として機能する。
第2級アルコールは、ヒドロキシ基(-OH基)がついた炭素原子が他の炭素原子2個と結合しているアルコールであり、第3級アルコールは、ヒドロキシ基がついた炭素原子が他の炭素原子3個と結合しているアルコールである。
第2級アルコールとしては、例えば、イソプロピルアルコール(IPA)、2-ブタノールを挙げることができる。また、第3級アルコールとしては、例えばターシャリブチルアルコール(2-メチル-2-プロパノール)、2-メチル-2-ブタノールを挙げることができる。ただし、これらは一例にすぎずこれらに限るものではない。
第2級アルコールおよび第3級アルコールは、エタノール、1-プロパノール、1-ブタノール等のノルマルタイプのアルコール(第1級アルコール(ヒドロキシ基が末端の炭素原子についたアルコール))に比較して脱水素開始温度が低く、吸着温度を50℃程度低くすることができる。特に、IPAガスはその傾向が大きい。これは、第1級アルコールでは、脱水素により生成されるのはアルデヒドであるのに対し、第2級アルコールおよび第3級アルコールでは、脱水素によりケトンが生成されるからである。すなわち、アルデヒド(アセトアルデヒド、プロパナール等)は生成温度が比較的高いのに対し、ケトン(アセトン、メチルエチルケトン等)はそれよりも生成温度が低いため、第2級アルコールおよび第3級アルコールのほうが低温で脱水素反応が生じて吸着する。
ステップ2において第2級アルコールガスおよび/または第3級アルコールガスの吸着は100~350℃の温度範囲で実施することができる。より好ましくは100~250℃の範囲である。用いるアルコールによっては100~150℃の温度範囲で実施することができ、特に、IPAガスを用いる場合はこの100~150℃の温度範囲が好適である。ステップ2の時間は、有機層31が第2の表面22の全面に吸着できる程度の時間に設定することが好ましい。第2級アルコールガスおよび第3級アルコールガスは比較的吸着しやすく、1~60secと比較的短時間で吸着させることができる。
アルコールガスは絶縁膜表面には吸着しやすいが、Cu等の金属膜表面には吸着し難い性質を有する。このため、第1の膜11が金属膜で第2の膜12が絶縁膜の場合に、アルコールガスを第2の表面22に選択的に吸着させることができる。本実施形態ではアルコールガスとして第2級アルコールガスおよび/または第3級アルコールガスを用いるため、上述のような比較的低い温度範囲で第2の表面22に選択的に吸着させて有機層31を形成することができる。
金属膜がCuの場合、Cuは温度に対して非常にセンシティブで非常にマイグレーションしやすいことから、金属膜が成膜された後のプロセスの温度は低温であることが好ましい。特に、ステップ2の吸着させる処理を行う際には、金属膜すなわちCuが露出した状態となっているので、特に低温化が要求される。これに対して、本実施形態では、ステップ2の吸着ガスとして第2級アルコールガスおよび/または第3級アルコールガスを用いてステップ2を低温化することができるので、Cuのマイグレーション等の悪影響を抑制することができる。そして、以下に説明する、その後に行われるステップ3の成膜処理が低温化できるものであれば、金属膜のマイグレーション等をより有効に抑制でき、成膜の選択性をより高めることが期待される。ステップ2の吸着させる処理が高温で行われる場合には、上述のように金属膜に悪影響が及ぼされる他、次の成膜を低温で行う際に、チャンバーの温度を変更すること、または別チャンバーを用いることが必要となり、生産性が低下する。
次に、少なくとも原料ガス(プリカーサ)を供給して、第1の表面21に選択的に膜41を形成する(ステップ3、図2C)。このステップ3の選択成膜性は、有機層31のブロッキング機能により実現される。このときの成膜は、原料ガス(プリカーサ)と反応ガス(リアクタント)との反応によってもよいし、原料ガス(プリカーサ)の熱分解によってもよい。
プリカーサとリアクタントとの反応により成膜する場合は、ALDまたはCVDにより行うことができる。これらのうち、プリカーサとリアクタントを交互に吸着させて表面反応により成膜するALDのほうが好ましい。ALDの場合、有機層31がプリカーサの第2の表面22への吸着を阻害して表面反応をブロックする。このため、膜41の選択成膜性を高く維持することができる。この際の温度は、450℃以下であることが好ましい。
プリカーサの分解反応により成膜する場合は、CVDにより行うことができる。プリカーサの分解反応により成膜する例としては、原料ガスとしてコバルトカルボニル(Co2(CO)8)を用いてCo膜を形成する場合、原料ガスとしてルテニウムカルボニル(Ru3(CO)12)を用いてRu膜を形成する場合を挙げることができる。
膜41は特に限定されず、金属膜でも絶縁膜でもよい。また、プリカーサとリアクタントの組み合わせも、成膜過程で有機層31のブロッキング機能を必要な期間維持できれば特に限定されない。
膜41が金属膜の場合、好適な例としてRu、Cu、Co、Ti、TiNのいずれか、またはこれらの組み合わせ(Ru、Cu、Co、Ti、TiNの少なくとも一種)が例示される。また、膜41が絶縁膜の場合、好適な例としてSiOx、SiOC、SiOCN、SiN、AlxOy、HfOx、ZrOx、TiOx、TiON、またはこれらの組み合わせ(SiOx、SiOC、SiOCN、SiN、AlxOy、HfOx、ZrOx、TiOx、TiONの少なくとも一種)が例示される。
膜形成の際のプリカーサとしては成膜しようとする膜に応じて種々のものを用いることができ、有機化合物であっても無機化合物であってもよいが、有機化合物がより好ましい。また、膜形成の際のリアクタントとしては、成膜しようとする膜に応じたものを使用すればよいが、有機層31のブロッキング機能を発揮させる観点から、H2O、H2を好適に用いることができる。リアクタントとしてH2Oを用いることにより膜41として酸化膜が形成され、H2を用いることにより金属膜が形成される。リアクタントとしてH2OまたはH2を用いた場合は、成膜温度は450℃以下が好ましく、350℃以下がより好ましい。また、リアクタントとしてはO2も好ましく、O2を用いることにより酸化膜または金属膜が形成される。リアクタントとしてO2を用いた場合は、成膜温度は300℃以下が好ましく、250℃以下がより好ましい。もちろん、リアクタントとしてNH3等の窒化剤を用いて窒化膜を形成してもよく、さらに他のリアクタントを用いて他の膜を形成してもよい。
膜41の材料と、プリカーサおよびリアクタントの好適な例、その際の温度としては以下のようなものが例示される。
(1)膜41の材料:Ru
プリカーサ:Ru(EtCp)2
リアクタント:O2
温度:300℃以下
(2)膜41の材料:AlO
プリカーサ:TMA(トリメチルアルミニウム)
リアクタント:H2O
温度:450℃以下
(3)膜41の材料:Co
プリカーサ:Co2(CO)8
リアクタント:なし
温度:300℃以下
(4)膜41の材料:TiOx
プリカーサ:Ti(NMe2)4
リアクタント:H2O
温度:50~250℃
(5)膜41の材料:HfOx
プリカーサ:Hf(NMe2)4
リアクタント:H2O
温度:50~400℃
(6)膜41の材料:SiOx
プリカーサ:SiH(NMe2)4
リアクタント:H2O
温度:~400℃
(1)膜41の材料:Ru
プリカーサ:Ru(EtCp)2
リアクタント:O2
温度:300℃以下
(2)膜41の材料:AlO
プリカーサ:TMA(トリメチルアルミニウム)
リアクタント:H2O
温度:450℃以下
(3)膜41の材料:Co
プリカーサ:Co2(CO)8
リアクタント:なし
温度:300℃以下
(4)膜41の材料:TiOx
プリカーサ:Ti(NMe2)4
リアクタント:H2O
温度:50~250℃
(5)膜41の材料:HfOx
プリカーサ:Hf(NMe2)4
リアクタント:H2O
温度:50~400℃
(6)膜41の材料:SiOx
プリカーサ:SiH(NMe2)4
リアクタント:H2O
温度:~400℃
上記ステップ2およびステップ3は、真空雰囲気で行うことが好ましく、例えば、13~1333Paの範囲で行うことができる。また、ステップ2およびステップ3は同一のチャンバーで連続して行うことができる。ステップ2およびステップ3を同一のチャンバーで行う場合は、両ステップを同じ温度で行うことが好ましい。
上記ステップ2およびステップ3は、2回以上交互に繰り返してもよい。膜41の成膜の際に、ステップ3のリアクタントの種類によっては、成膜の際に有機層31が侵食される場合があるが、ステップ2とステップ3を繰り返すことにより、膜41が所望の膜厚に達するまで有機層31のブロッキング機能を維持して選択成膜を行うことができる。
特許文献1に示された選択成膜技術は、導電膜上に導電膜を形成し、絶縁膜上に絶縁膜を形成することを主眼としており、選択成膜のための下地膜および成膜する膜の材料、プリカーサおよびリアクタントが限定される。これに対して、本実施形態では、IPAのような第2級アルコールガスや第3級アルコールガスといった一般的な有機化合物を選択的に吸着させて成膜をブロックするブロッキング材として機能させるという簡易な手法で、制約が少なく汎用性の高い選択成膜を実現できる。また、IPAのような第2級アルコールガスや第3級アルコールガスは吸着温度を低くすることができるのでCu等の金属膜が存在する場合に有利である。また、これらは取り扱いが容易であり、比較的高い吸着性を有するので、手間がかからず処理時間も短い。また、適用温度範囲が広いというメリットもある。
<第2の実施形態>
図3は第2の実施形態に係る選択成膜方法を示すフローチャート、図4は図3に示す各工程を示す工程断面図である。
図3は第2の実施形態に係る選択成膜方法を示すフローチャート、図4は図3に示す各工程を示す工程断面図である。
金属は大気中に保持されることにより、その表面に不可避的に自然酸化膜が形成されるため、本実施形態では自然酸化膜を有する基板に対する選択成膜について説明する。
最初に、図4Aに示すような、半導体基体(例えばSi)10上に、金属膜51と絶縁膜52が形成され、金属膜51の表面に自然酸化膜51aが形成された基板1´を準備する(ステップ11)。絶縁膜52は第2の表面62を有している。このステップ11では、具体的には、処理チャンバー内に設けられたステージ上に基板1´を載置する。
金属膜51の好適な例として、Cu、Ru、Co、Ti、TiNのいずれか、またはこれらの組み合わせ(Ru、Cu、CoTi、TiNの少なくとも一種)が例示される。また、絶縁膜52の好適な例としてSiOx、SiOC、SiOCN、SiNのいずれか、またはこれらの組み合わせ(SiOx、SiOC、SiOCN、SiNの少なくとも一種)が例示される。自然酸化膜51aは、金属膜51の表面に形成される酸化膜であり、Cu、Ru、Co、Tiの少なくとも一種の酸化膜が例示される。
次に、前処理として全面に還元処理を行い、自然酸化膜51aを還元除去し、金属膜51の第1の表面61を露出させる(ステップ12、図4B)。このとき、絶縁膜52の第2の表面62はそのままの状態で、自然酸化膜51aのみ除去される。自然酸化膜51aを除去するのは、金属酸化膜には-OH基を含む有機化合物が吸着しやすく、選択吸着性が得難いからである。
このステップ12は、水素アニールまたは水素プラズマ処理により行うことができる。このときの温度は500℃以下、さらには400℃以下が好ましく、水素アニールでは250~400℃がより好ましく、水素プラズマ処理では水素アニールより低い温度、例えば400℃以下がより好ましい。水素アニールの場合は、基板1´が収容されたチャンバー内に水素ガス(H2ガス)を導入しつつ基板1´をアニールする。水素プラズマ処理の場合は、チャンバー内の基板1´に対して水素プラズマを作用させることにより行われる。ステップ12の還元処理は、-OH基を含む有機化合物を用いて行うこともできる。この場合は、次のステップ13の吸着工程と同時処理とすることができる。ただし、自然酸化膜が厚く形成されている場合には、水素アニール、水素プラズマ処理が好ましい。
次に、第2級アルコールガスおよび/または第3級アルコールガスを絶縁膜52の第2の表面62に選択的に吸着させる(ステップ13、図4C)。このステップ13は、第1の実施形態のステップ2と同様に行うことができる。吸着により形成された有機層31は第1の実施形態と同様、選択的吸着性とブロッキング機能を有し、第2の表面62に選択的に吸着され、成膜の際に、第2の表面62への成膜をブロックする。本実施形態においても、第2級アルコールとして、例えば、イソプロピルアルコール(IPA)、2-ブタノールを用いることができ、第3級アルコールとしては、例えばターシャリブチルアルコール(2-メチル-2-プロパノール)、2-メチル-2-ブタノールを用いることができる。処理温度についても、第1の実施形態のステップ2と同様である。
次に、少なくとも原料ガス(プリカーサ)を供給して、第1の表面61に選択的に膜41を形成する(ステップ14、図4D)。このステップ14の選択成膜性は、有機層31のブロッキング機能により実現される。このときの成膜は、第1の実施形態のステップ3と同様、原料ガス(プリカーサ)と反応ガス(リアクタント)との反応によってもよいし、原料ガス(プリカーサ)の熱分解によってもよい。プリカーサとリアクタントとの反応により成膜する場合は、ALDまたはCVDにより行うことができるが、ALDのほうが好ましい。プリカーサの分解反応により成膜する場合は、CVDにより行うことができる。このステップ14を実施する際のプリカーサ、リアクタント、およびこれらの組み合わせ、ならびに温度等は、第1の実施形態のステップ3と同様である。
上記ステップ12~ステップ14は、真空雰囲気で行うことが好ましく、例えば、13~1333Paの範囲で行うことができる。また、ステップ12~ステップ14は同一のチャンバーで連続して行うことができる。ステップ12~ステップ14を同一のチャンバーで行う場合は、これらステップを同じ温度で行うことが好ましい。第1の実施形態のステップ2およびステップ3と同様、ステップ13およびステップ14は、2回以上交互に繰り返してもよい。
本実施形態においても、第1の実施形態と同様、IPAのような第2級アルコールガスや第3級アルコールガスといった一般的な有機化合物を選択的に吸着させて成膜をブロックするブロッキング材として機能させるという簡易な手法で、制約が少なく汎用性の高い選択成膜を実現できる。また、IPAのような第2級アルコールガスや第3級アルコールガスは吸着温度を低くすることができるのでCu等の金属膜が存在する場合に有利である。
<実験例>
次に、実験例について説明する。
ここでは、エタノール、1-プロパノール、IPA、1-ブタノールのSiO配管上での分解特性を調査した。SiO配管を450℃で2時間のArガスベーキングを行った後、温度を上昇させながら各ガスを供給した。
次に、実験例について説明する。
ここでは、エタノール、1-プロパノール、IPA、1-ブタノールのSiO配管上での分解特性を調査した。SiO配管を450℃で2時間のArガスベーキングを行った後、温度を上昇させながら各ガスを供給した。
その際のIRスペクトルによる分析結果を図5~8に示す。エタノールの場合は、図5に示すように、150℃付近で脱水素が開始されてアセトアルデヒドが生成され、温度が上昇するに従いアセトアルデヒドの量が増加することが確認された。1-プロパノールの場合は、図6に示すように、同様に150℃付近で脱水素が開始されてプロパナールが生成され、温度が上昇するに従いプロパナールの量が増加することが確認された。1-ブタノールの場合は、図8に示すように、同様に150℃付近で脱水素が開始されてブタナールが生成され、温度が上昇するに従いブタナールの量が増加することが確認された。すなわち、ノルマルタイプのアルコール(第1級アルコール)であるエタノール、1-プロパノール、1-ブタノールの場合は、脱水素開始温度がいずれも150℃付近であり、脱水素によりアルデヒドが生成されることが確認された。
これに対し、第2級アルコールであるIPAの場合は、図7に示すように、脱水素によりケトンであるアセトンが生成され、脱水素開始温度が100℃程度と他のガスと比較して低いことが確認された。すなわち、IPAの場合は、100℃という低温でIPAが分解してアセトンが生成され、表面に吸着して有機層が形成されることが確認された。
<他の適用>
以上、実施形態について説明したが、今回開示された実施形態は、全ての点で例示であって制限的なものではないと考えられるべきである。上記の実施形態は、添付の特許請求の範囲およびその主旨を逸脱することなく、様々な形態で省略、置換、変更されてもよい。
以上、実施形態について説明したが、今回開示された実施形態は、全ての点で例示であって制限的なものではないと考えられるべきである。上記の実施形態は、添付の特許請求の範囲およびその主旨を逸脱することなく、様々な形態で省略、置換、変更されてもよい。
例えば、上記実施の形態では、基体上に第1の膜(金属膜)および第2の膜(絶縁膜)を形成した基板を模式的に記載し(図2A~図2C、図4A~図4D)、一般的な例について説明した。しかし、これに限らず種々のデバイスに適用することができ、第1の膜および第2の膜は、適用されるデバイスに応じて種々の形態をとることができる。また、上記実施形態では、2つの膜の表面の一方に選択的に膜形成する場合について説明したが、これに限らず、3つ以上の膜に対する選択成膜に適用することも可能である。
1,1´;基板、10;基体、11;第1の膜、12;第2の膜、21,61;第1の表面、22,62;第2の表面、31;吸着層、41;膜、51;金属膜、52;絶縁膜
Claims (30)
- 第1の表面を有する第1の膜と、第2の表面を有する前記第1の膜とは異なる第2の膜とを含む基板を準備することと、
第2級アルコールガスおよび/または第3級アルコールガスを前記第2の表面に選択的に吸着させることと、
少なくとも原料ガスを供給して前記第1の表面に選択的に膜を形成することと、
を有する選択成膜方法。 - 前記第1の膜は金属膜であり、前記第2の膜は絶縁膜である、請求項1に記載の選択成膜方法。
- 前記第1の膜を構成する前記金属膜は、Cu、Ru、Co、Ti、TiNの少なくとも一種であり、前記第2の膜を構成する前記絶縁膜は、SiOx、SiOC、SiOCN、SiNの少なくとも一種である、請求項2に記載の選択成膜方法。
- 表面に自然酸化膜が形成された金属膜と、絶縁膜とを有する基板を準備することと、
前記自然酸化膜を還元除去し、前記金属膜の第1の表面を露出させることと、
第2級アルコールガスおよび/または第3級アルコールガスを前記絶縁膜の第2の表面に選択的に吸着させることと、
少なくとも原料ガスを供給して前記第1の表面に選択的に膜を形成することと、
を有する選択成膜方法。 - 前記自然酸化膜を還元除去することは、水素アニール処理または水素プラズマ処理により行われる、請求項4に記載の選択成膜方法。
- 前記水素アニール処理または前記水素プラズマ処理は、500℃以下の温度で行われる、請求項5に記載の選択成膜方法。
- 前記水素アニール処理は250~400℃の温度で行われ、前記水素プラズマ処理は400℃以下の温度で行われる、請求項6に記載の選択成膜方法。
- 前記自然酸化膜を還元除去することは、前記第2級アルコールガスおよび/または第3級アルコールガスを前記第2の表面に選択的に吸着させることを実施する際に同時に実施する、請求項4に記載の選択成膜方法。
- 前記金属膜は、Cu、Ru、Co、Ti、TiNの少なくとも一種であり、前記絶縁膜は、SiOx、SiOC、SiOCN、SiNの少なくとも一種である、請求項4から請求項8のいずれか一項に記載の選択成膜方法。
- 前記第2級アルコールガスおよび/または第3級アルコールガスを前記第2の表面に選択的に吸着させることにより吸着された有機層は、前記少なくとも原料ガスによる前記第2の表面への膜形成をブロックする機能を有する、請求項1から請求項9のいずれか一項に記載の選択成膜方法。
- 前記第2級アルコールガスおよび/または第3級アルコールガスを前記第2の表面に選択的に吸着させることは、100~350℃の範囲の温度で行われる、請求項10に記載の選択成膜方法。
- 前記第2級アルコールガスおよび/または第3級アルコールガスを前記第2の表面に選択的に吸着させることは、100~250℃の範囲の温度で行われる、請求項11に記載の選択成膜方法。
- 前記第2級アルコールは、イソプロピルアルコールおよび/または2-ブタノールである、請求項1から請求項12のいずれか一項に記載の選択成膜方法。
- 前記第2級アルコールガスおよび/または第3級アルコールガスを前記第2の表面に選択的に吸着させることは、前記第2級アルコールガスおよび/または第3級アルコールガスとしてイソプロピルアルコールを用いる場合に、100~150℃の範囲の温度で行う、請求項13に記載の選択成膜方法。
- 前記第3級アルコールは、ターシャリブチルアルコールおよび/または2-メチル-2-ブタノールである、請求項1から請求項14のいずれか一項に記載の選択成膜方法。
- 前記第2級アルコールガスおよび/または第3級アルコールガスを前記第2の表面に選択的に吸着させることと、前記第1の表面に選択的に膜を形成することは、2回以上交互に繰り返す、請求項1から請求項15のいずれか一項に記載の選択成膜方法。
- 前記第1の表面に選択的に膜を形成する工程により形成された膜は、金属膜または絶縁膜である、請求項1から請求項16のいずれか一項に記載の選択成膜方法。
- 前記第1の表面の前記金属膜は、Ru、Cu、Co、Ti、TiNの少なくとも一種であり、前記第1の表面の前記絶縁膜は、SiOx、SiOC、SiOCN、SiN、AlxOy、HfOx、ZrOx、TiOx、TiONの少なくとも一種である、請求項17に記載の選択成膜方法。
- 前記第1の表面に選択的に膜を形成することは、原料ガスおよび反応ガスを供給することにより行われる、請求項1から請求項18のいずれか一項に記載の選択成膜方法。
- 前記第1の表面に選択的に膜を形成することは、ALDまたはCVDにより行われる、請求項19に記載の選択成膜方法。
- 前記第1の表面に選択的に膜を形成することは、450℃以下の温度で行われる、請求項19または請求項20に記載の選択成膜方法。
- 前記反応ガスとしてH2O、H2、O2のいずれかを用いる、請求項19から請求項21のいずれか一項に記載の選択成膜方法。
- 前記第1の表面に選択的に膜を形成することは、原料ガスとしてRu(EtCp)2を用い、反応ガスとしてO2ガスを用いて、Ru膜を形成する、請求項22に記載の選択成膜方法。
- 前記第1の表面に選択的に膜を形成することは、原料ガスとしてTMAを用い、反応ガスとしてH2Oを用いて、AlxOy膜を形成する、請求項22に記載の選択成膜方法。
- 前記第1の表面に選択的に膜を形成することは、原料ガスとしてTi(NMe2)4を用い、反応ガスとしてH2Oを用いて、TiOx膜を形成する、請求項22に記載の選択成膜方法。
- 前記第1の表面に選択的に膜を形成することは、原料ガスとしてHf(NMe2)4を用い、反応ガスとしてH2Oを用いて、HfOx膜を形成する、請求項22に記載の選択成膜方法。
- 前記第1の表面に選択的に膜を形成することは、原料ガスとしてSiH(NMe2)4を用い、反応ガスとしてH2Oを用いて、SiOx膜を形成する、請求項22に記載の選択成膜方法。
- 前記第1の表面に選択的に膜を形成することは、原料ガスを供給し、熱分解させることにより行われる、請求項1から請求項18のいずれか一項に記載の選択成膜方法。
- 前記第1の表面に選択的に膜を形成することは、CVDにより行われる、請求項28に記載の選択成膜方法。
- 前記第1の表面に選択的に膜を形成することは、原料ガスとしてCo2(CO)8を用い、熱分解させることによりCo膜を形成する、請求項29に記載の選択成膜方法。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020227040209A KR20230005231A (ko) | 2020-04-30 | 2021-03-29 | 선택 성막 방법 |
US17/922,255 US20230175115A1 (en) | 2020-04-30 | 2021-03-29 | Selective film formation method |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2020-080178 | 2020-04-30 | ||
JP2020080178A JP7345787B2 (ja) | 2020-04-30 | 2020-04-30 | 選択成膜方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2021220696A1 true WO2021220696A1 (ja) | 2021-11-04 |
Family
ID=78281911
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2021/013295 WO2021220696A1 (ja) | 2020-04-30 | 2021-03-29 | 選択成膜方法 |
Country Status (4)
Country | Link |
---|---|
US (1) | US20230175115A1 (ja) |
JP (1) | JP7345787B2 (ja) |
KR (1) | KR20230005231A (ja) |
WO (1) | WO2021220696A1 (ja) |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0722320A (ja) * | 1993-06-30 | 1995-01-24 | Kawasaki Steel Corp | 半導体装置の製造方法 |
JP2009239283A (ja) * | 2008-03-24 | 2009-10-15 | Air Products & Chemicals Inc | 銅への改善された接着性および銅エレクトロマイグレーション耐性 |
JP2011029554A (ja) * | 2009-07-29 | 2011-02-10 | Fujitsu Semiconductor Ltd | 半導体装置の製造方法 |
JP2012172250A (ja) * | 2011-02-24 | 2012-09-10 | Tokyo Electron Ltd | 成膜方法および記憶媒体 |
WO2014203892A1 (ja) * | 2013-06-20 | 2014-12-24 | コニカミノルタ株式会社 | ガスバリア性フィルム、およびその製造方法 |
JP2015188028A (ja) * | 2014-03-27 | 2015-10-29 | 東京エレクトロン株式会社 | 薄膜形成方法、及び、薄膜形成装置 |
JP2017528597A (ja) * | 2014-08-27 | 2017-09-28 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | アルコールの選択的還元および保護による選択的堆積 |
JP2019062142A (ja) * | 2017-09-28 | 2019-04-18 | 東京エレクトロン株式会社 | 選択成膜方法および半導体装置の製造方法 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10612137B2 (en) | 2016-07-08 | 2020-04-07 | Asm Ip Holdings B.V. | Organic reactants for atomic layer deposition |
-
2020
- 2020-04-30 JP JP2020080178A patent/JP7345787B2/ja active Active
-
2021
- 2021-03-29 WO PCT/JP2021/013295 patent/WO2021220696A1/ja active Application Filing
- 2021-03-29 US US17/922,255 patent/US20230175115A1/en active Pending
- 2021-03-29 KR KR1020227040209A patent/KR20230005231A/ko unknown
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0722320A (ja) * | 1993-06-30 | 1995-01-24 | Kawasaki Steel Corp | 半導体装置の製造方法 |
JP2009239283A (ja) * | 2008-03-24 | 2009-10-15 | Air Products & Chemicals Inc | 銅への改善された接着性および銅エレクトロマイグレーション耐性 |
JP2011029554A (ja) * | 2009-07-29 | 2011-02-10 | Fujitsu Semiconductor Ltd | 半導体装置の製造方法 |
JP2012172250A (ja) * | 2011-02-24 | 2012-09-10 | Tokyo Electron Ltd | 成膜方法および記憶媒体 |
WO2014203892A1 (ja) * | 2013-06-20 | 2014-12-24 | コニカミノルタ株式会社 | ガスバリア性フィルム、およびその製造方法 |
JP2015188028A (ja) * | 2014-03-27 | 2015-10-29 | 東京エレクトロン株式会社 | 薄膜形成方法、及び、薄膜形成装置 |
JP2017528597A (ja) * | 2014-08-27 | 2017-09-28 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | アルコールの選択的還元および保護による選択的堆積 |
JP2019062142A (ja) * | 2017-09-28 | 2019-04-18 | 東京エレクトロン株式会社 | 選択成膜方法および半導体装置の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
JP2021174960A (ja) | 2021-11-01 |
JP7345787B2 (ja) | 2023-09-19 |
KR20230005231A (ko) | 2023-01-09 |
US20230175115A1 (en) | 2023-06-08 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR102662636B1 (ko) | 유전체 표면들에 대하여 금속 또는 금속성 표면들 상에서의 선택적 퇴적 | |
TWI666336B (zh) | 選擇性地在基板上沈積材料的方法 | |
US9469899B2 (en) | Selective deposition of noble metal thin films | |
US20170323776A1 (en) | Selective deposition using hydrophobic precursors | |
JP7242837B2 (ja) | 選択的な酸化アルミニウム膜の堆積 | |
US20130011557A1 (en) | Microcontact printed films as an activation layer for selective atomic layer deposition | |
TWI737612B (zh) | 用於均勻且共形之混成氧化鈦薄膜的沉積方法 | |
TWI729285B (zh) | 金屬薄膜的選擇性沈積 | |
JP2010530129A (ja) | Cmp後のウェーハを洗浄するための熱的方法 | |
US20110312148A1 (en) | Chemical vapor deposition of ruthenium films containing oxygen or carbon | |
KR102004046B1 (ko) | 산화티타늄 막의 성막 방법 및 하드 마스크의 형성 방법 | |
TW202104635A (zh) | 整合型原位乾式表面製備及區域選擇性膜沉積 | |
WO2021220696A1 (ja) | 選択成膜方法 | |
KR101932588B1 (ko) | 반도체 메모리 소자의 커패시터 및 그 제조 방법 | |
KR102564112B1 (ko) | 루테늄 박막의 선택적 증착 방법 | |
KR20240003450A (ko) | 전도성 표면들 상에 블로킹 층들을 증착하기 위한 방법들 | |
KR20220162106A (ko) | 알루미늄 및 질소 함유 재료의 선택적 증착 | |
TW202317799A (zh) | 含釕層之形成方法及積層體 | |
CN117248191A (zh) | 包含贵金属的材料的选择性沉积 | |
JP2021040159A (ja) | 選択成長方法 | |
KR20020050520A (ko) | 반도체 소자의 캐패시터 및 그의 제조 방법 | |
KR20040058905A (ko) | 반도체 소자의 확산 방지막 형성 방법 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 21797236 Country of ref document: EP Kind code of ref document: A1 |
|
ENP | Entry into the national phase |
Ref document number: 20227040209 Country of ref document: KR Kind code of ref document: A |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
122 | Ep: pct application non-entry in european phase |
Ref document number: 21797236 Country of ref document: EP Kind code of ref document: A1 |