Classifications

• • C—CHEMISTRY; METALLURGY
  • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
  • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
  • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
  • C09D183/04—Polysiloxanes
  • C09D183/06—Polysiloxanes containing silicon bound to oxygen-containing groups
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B32—LAYERED PRODUCTS
  • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
  • B32B27/00—Layered products comprising a layer of synthetic resin
• • C—CHEMISTRY; METALLURGY
  • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
  • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
  • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
  • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
  • C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
  • C08G59/22—Di-epoxy compounds
  • C08G59/30—Di-epoxy compounds containing atoms other than carbon, hydrogen, oxygen and nitrogen
• • C—CHEMISTRY; METALLURGY
  • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
  • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
  • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
  • C08G77/04—Polysiloxanes
  • C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
• • C—CHEMISTRY; METALLURGY
  • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
  • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
  • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
  • C09D7/40—Additives
  • C09D7/47—Levelling agents

Definitions

• the present invention relates to a composition for forming a hard coat layer, a hard coat film, a method for producing a hard coat film, and an article provided with the hard coat film.
• CTR cathode line tubes
• PDP plasma display
• ELD electroluminescence display
• VFD fluorescent display
• FED field emission display
• LCD liquid crystal display
• Patent Document 1 describes a hard coat film having a cured product layer of a curable composition containing a polyorganosylsesquioxane containing a siloxane structural unit containing an epoxy group as a hard coat layer.
• Patent Document 2 describes a transfer film having a hard coat layer formed from a curable composition containing a polyorganosylsesquioxane containing a siloxane structural unit containing an epoxy group.
• An object of the present invention is to form a hard coat layer forming composition capable of forming a hard coat film having high surface hardness, low haze, and excellent scratch resistance, and the above hard coat layer forming composition. It is an object of the present invention to provide a hard coat film including the hard coat layer, a method for producing the hard coat film, and an article provided with the hard coat film.
• a composition for forming a hard coat layer containing a polyorganosylsesquioxane having a structural unit represented by the following general formula (1) and a leveling agent having a structural unit represented by the following general formula (1) and a leveling agent.
• the ratio of the structural unit represented by the general formula (1) to the total amount of the siloxane structural unit in the polyorganosylsesquioxane is 50 mol% or more.
• the weight average molecular weight of the polyorganosylsesquioxane is 15,000 or more and less than 3,000,000.
• the leveling agent is a nonionic fluorine-containing compound.
• Q 1 represents a group containing an epoxy group.
• composition for forming a hard coat layer according to any one of [1] to [4], wherein the molar ratio of the T3 body to the T2 body contained in the polyorganosylsesquioxane is 5.0 or more.
• the T3 body is a structural unit represented by the following general formula (I)
• the T2 body is a structural unit represented by the following general formula (II).
• Q a represents an organic group or a hydrogen atom.
• Q b represents an organic group or a hydrogen atom
• Q c represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms.
• a method for producing a hard coat film including a base material and a hard coat layer including a base material and a hard coat layer.
• (II) A method for producing a hard coat film which comprises a step of forming the hard coat layer by curing the hard coat layer coating film.
• An article comprising the hard coat film according to [8] or [9].
• a hard coat layer forming composition capable of forming a hard coat film having high surface hardness, low haze, and excellent scratch resistance, formed from the above hard coat layer forming composition. It is possible to provide a hard coat film containing the hard coat layer, a method for producing the hard coat film, and an article provided with the hard coat film.
• composition for forming a hard coat layer of the present invention A composition for forming a hard coat layer containing a polyorganosylsesquioxane having a structural unit represented by the following general formula (1) and a leveling agent.
• the ratio of the structural unit represented by the general formula (1) to the total amount of the siloxane structural unit in the polyorganosylsesquioxane is 50 mol% or more.
• the weight average molecular weight of the polyorganosylsesquioxane is 15,000 or more and less than 3,000,000.
• the leveling agent is a nonionic fluorine-containing compound.
• Q 1 represents a group containing an epoxy group.
• polyorganosylsesquioxane (a1)) contained in the composition for forming a hard coat layer of the present invention will be described.
• Polyorganosylsesquioxane (a1) has a structural unit represented by the above general formula (1).
• SiO 3/2 in the general formula (1) represents a structural portion composed of a siloxane bond (Si—O—Si) in polyorganosylsesquioxane.
• Polyorganosilsesquioxane is a network-type polymer or polyhedral cluster having a siloxane structural unit (silsesquioxane unit) derived from a hydrolyzable trifunctional silane compound, and has a random structure, a ladder structure, or a ladder structure due to siloxane bonds. It can form a cage structure or the like.
• the structural portion represented by "SiO 3/2 " may have any of the above structures, but preferably contains a large amount of a ladder structure.
• the deformation recovery of the hard coat film can be kept good.
• the formation of the rudder structure is qualitatively determined by the presence or absence of absorption derived from Si-O-Si expansion and contraction characteristic of the rudder structure appearing near 1020-1050 cm -1 when FT-IR (Fourier Transform Infrared Spectroscopy) is measured. You can check.
• the structural unit represented by the general formula (1) is described in more detail, it is represented by the following general formula (1-A).
• Each of the three oxygen atoms bonded to the silicon atom represented in the structure represented by the general formula (1-A) is bonded to another silicon atom not represented by the general formula (1-A).
• the structural unit represented by the general formula (1) is a so-called T unit.
• Q 1 has the same meaning as that in the general formula (1). * Represents the binding site with a silicon atom.
• Q 1 represents a group containing an epoxy group.
• Q 1 is not particularly limited as long as it is a group having an oxylan ring.
• Q 1 may be an epoxy group or a group containing an epoxy group and a group other than the epoxy group.
• Q 1 is preferably a group containing an alicyclic epoxy group.
• Group Q 1 is represented by the following general formula (e-1), a group represented by the following general formula (e-2), a group represented by the following general formula (e-3), or the following general formula ( It is preferably a group represented by e-4), and for the reason of rigidity, it is a group represented by the following general formula (e-1) or a group represented by the following general formula (e-2). It is more preferable, and it is further preferable that the group is represented by the following general formula (e-1).
• L 1 to L 4 independently represent a single bond or an alkylene group, and * represents a binding site with a silicon atom.
• R 1 represents an alkyl group.
• L 1 to L 4 preferably each independently represent an alkylene group, and the alkylene group may be linear or branched and has 1 to 10 carbon atoms. It is preferably an alkylene group of, and more preferably an alkylene group having 1 to 6 carbon atoms. Specific examples of the alkylene group include methylene group, methylmethylene group, dimethylmethylene group, ethylene group, i-propylene group, n-propylene group, n-butylene group, n-pentylene group, n-hexylene group and n-. A decylene group and the like can be mentioned.
• the alkyl group represented by R 1 may be linear or branched, preferably an alkyl group having 1 to 6 carbon atoms, and preferably an alkyl group having 1 to 3 carbon atoms. Is more preferable, a methyl group or an ethyl group is further preferable, and a methyl group is particularly preferable.
• the ratio of the structural unit represented by the above general formula (1) to the total amount of the siloxane structural unit in the polyorganosylsesquioxane (a1) is 50 mol% or more, the surface hardness can be increased, and the resistance is high. From the viewpoint of improving scratch resistance, it is preferably 60 mol% or more, more preferably 70 mol% or more, further preferably 80 mol% or more, and 90 mol% or more. More preferably, it is particularly preferably 95 mol% or more, and most preferably 97 mol% or more.
• the ratio of each siloxane constituent unit in the polyorganosylsesquioxane (a1) can be calculated, for example, by the composition of the raw material, NMR (Nuclear Magnetic Resonance) spectrum measurement, or the like.
• the polyorganosylsesquioxane (a1) may have other siloxane structural units in addition to the structural units represented by the above general formula (1).
• the other structural units are not particularly limited, but for example, a structural unit represented by the following general formula (2) or a structural unit represented by the following formula (3) is preferable.
• the polyorganosylsesquioxane (a1) may have, for example, a so-called M unit or D unit in addition to the above.
• Q 2 represents an organic group other than a group containing a hydrogen atom or an epoxy group.
• Q 2 is preferably represents an organic group other than a group containing an epoxy group, examples of the organic group other than a group containing an epoxy group, an alkyl group, a cycloalkyl group, or an aryl group is preferable , Alkyl group or aryl group is more preferable.
• Alkyl groups which may Q 2 represents an alkyl group may be linear or branched, preferably an alkyl group having 1 to 6 carbon atoms, more preferably an alkyl group having 1 to 3 carbon atoms, It is more preferably a methyl group or an ethyl group, and particularly preferably a methyl group.
• cycloalkyl groups which may Q 2 represents a cycloalkyl group is cycloalkyl group having 3 to 10 carbon atoms, and more preferably a cycloalkyl group having 5-8 carbon atoms.
• Q 2 is an aryl group when it represents an aryl group or an aryl group having 6 to 20 carbon atoms, more preferably an aryl group having 6 to 15 carbon atoms, more preferably a phenyl group.
• Q 2 is an alkyl group, a cycloalkyl group, or an alkyl group when it represents an aryl group, a cycloalkyl group, or aryl group may be bonded with other siloxane structural unit not shown in the general formula (2) good.
• the structural unit represented by the general formula (2) is described in more detail, it is represented by the following general formula (2-A).
• Each of the three oxygen atoms bonded to the silicon atom represented in the structure represented by the general formula (2-A) is bonded to another silicon atom not represented by the general formula (2-A).
• the structural unit represented by the general formula (2) is a so-called T unit.
• Q 2 has the same meaning as that in the general formula (2). * Represents the binding site with a silicon atom.
• the structural unit represented by the above formula (3) is described in more detail by the following formula (3-A).
• Each of the four oxygen atoms bonded to the silicon atom represented in the structure represented by the formula (3-A) is bonded to another silicon atom not represented by the general formula (3-A).
• the structural unit represented by the general formula (3) is a so-called Q unit.
• the molar ratio of the T3 body to the T2 body contained in the polyorganosylsesquioxane (a1) (hereinafter, “T3 / T2”). ”) Is preferably 5.0 or more, more preferably 8.0 or more, further preferably 10.0 or more, and even more preferably 11.0 or more. It is particularly preferably 12.0 or more, and most preferably 13.0 or more.
• the T3 body is a structural unit represented by the following general formula (I)
• the T2 body is a structural unit represented by the following general formula (II).
• Q a represents an organic group or a hydrogen atom.
• Q b represents an organic group or a hydrogen atom
• Q c represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms.
• Q a and Q b each independently represent an organic group or a hydrogen atom.
• the organic group include Q 1 in the general formula (1) and Q 2 in the general formula (2).
• Q c in the general formula (II) represents an alkyl group having 1 to 4 carbon atoms include a methyl group, an ethyl group, an n-propyl group and the like.
• Alkyl group in Q c is typically forms a polyorganosilsesquioxane alkoxy group in the hydrolyzable silane compounds used as a raw material of Sun (a1) (e.g., an alkoxy group as X 1 ⁇ X 3 below) Derived from the alkyl group.
• Sun (a1) e.g., an alkoxy group as X 1 ⁇ X 3 below
• the structural unit represented by the general formula (I) will be described in more detail by the following general formula (IA).
• Each of the three oxygen atoms bonded to the silicon atom represented in the structure represented by the general formula (IA) is bonded to another silicon atom not represented by the general formula (IA).
• the structural unit represented by the general formula (II) will be described in more detail by the following general formula (II-A).
• Formula (II-A) 2 oxygen atoms bonded to the silicon atom shown in structure represented by (Q c and unbound oxygen atom) are not shown
• Q a has the same meaning as that in the general formula (I).
• Q b and Q c have the same meanings as those in the general formula (II), respectively.
• * represents a binding site with a silicon atom.
• T3 / T2 in polyorganosylsesquioxane (a1) is determined by 29 Si-NMR spectrum measurement.
• 29 In the Si-NMR spectrum the silicon atom in the structural unit (T3 body) represented by the general formula (I) and the silicon atom in the structural unit (T2 body) represented by the general formula (II) are Since signals (peaks) are shown at different positions (chemical shifts), T3 / T2 can be obtained by calculating the integration ratio of each of these peaks.
• the 29 Si-NMR spectrum of polyorganosylsesquioxane (a1) is measured by the following equipment and conditions. Measuring device: Product name "JNM-ECA500NMR" (manufactured by JEOL Ltd.) Solvent: Deuterated chloroform Number of integrations: 1800 Measurement temperature: 25 ° C
• the weight average molecular weight (Mw) of polyorganosylsesquioxane (a1) is preferably 15,000 or more and less than 3,000,000, preferably 15,000 or more and less than 1600,000, more preferably 15,000 or more and less than 200,000, and more preferably 15,000 or more and less than 100,000. It is even more preferably 15,000 or more and less than 60,000, particularly preferably 17,000 or more and less than 60,000, and most preferably 20,000 or more and less than 60,000.
• the weight average molecular weight of the polyorganosylsesquioxane (a1) is 15,000 or more, the surface hardness and resistance of the hardcoat layer formed from the composition for forming the hardcoat layer containing the polyorganosylsesquioxane (a1). It has excellent scratch resistance.
• the polymer in the hard coat layer obtained by curing the polyorganosylsesquioxane (a1) has a very high molecular weight. It is considered that the surface hardness and scratch resistance are improved.
• the weight average molecular weight of the polyorganosylsesquioxane (a1) is less than 3,000,000, gelation is unlikely to occur, and the composition for forming a hard coat layer is excellent in storage stability and film uniformity during film formation. ..
• the molecular weight dispersion (Mw / Mn) of the polyorganosylsesquioxane (a1) is, for example, 1.0 to 20.0, preferably 1.1 to 10.0, and more preferably 1.2 to 1.2. It is 6.0, more preferably 1.3 to 5.0. Mw represents the weight average molecular weight and Mn represents the number average molecular weight.
• the weight average molecular weight and molecular weight dispersion of polyorganosylsesquioxane (a1) are converted to standard polystyrene by gel permeation chromatography (GPC). Specifically, the weight average molecular weight and the molecular weight dispersion of polyorganosylsesquioxane (a1) are measured by the following devices and conditions.
• Measuring device Product name "LC-20AD” (manufactured by Shimadzu Corporation) Columns: Shodex KF-801 x 2, KF-802, and KF-803 (manufactured by Showa Denko KK) Measurement temperature: 40 ° C Eluent: tetrahydrofuran (THF), sample concentration 0.1-0.2% by mass Flow rate: 1 mL / min Detector: UV-VIS detector (trade name "SPD-20A", manufactured by Shimadzu Corporation) Molecular weight: Standard polystyrene conversion
• composition ratio of each structural unit is a molar ratio.
• the method for producing polyorganosylsesquioxane (a1) is not particularly limited, and it can be produced using a known production method.
• it is hydrolyzable represented by the following general formula (Sd-1). It can be produced by a method of hydrolyzing and condensing a silane compound.
• X 1 to X 3 independently represent an alkoxy group or a halogen atom, and Q 1 has the same meaning as in the general formula (1).
• the preferable range of Q 1 in the general formula (Sd-1) is the same as that of Q 1 in the general formula (1).
• X 1 to X 3 independently represent an alkoxy group or a halogen atom.
• the alkoxy group include an alkoxy group having 1 to 4 carbon atoms such as a methoxy group, an ethoxy group, a propoxy group, an isopropyloxy group, a butoxy group, and an isobutyloxy group.
• the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, an iodine atom and the like.
• X 1 to X 3 an alkoxy group is preferable, and a methoxy group and an ethoxy group are more preferable. Note that X 1 to X 3 may be the same or different from each other.
• hydrolyzable silane compounds may be hydrolyzed and condensed in addition to the above-mentioned hydrolyzable silane compound.
• the amount and composition of the hydrolyzable silane compound used can be appropriately adjusted according to the desired structure of the polyorganosylsesquioxane.
• the hydrolysis and condensation reactions of the hydrolyzable silane compound can be carried out simultaneously or sequentially.
• the order in which the reactions are carried out is not particularly limited.
• the hydrolysis and condensation reaction of the hydrolyzable silane compound can be carried out in the presence or absence of a solvent, and is preferably carried out in the presence of a solvent.
• a solvent include aromatic hydrocarbons such as benzene, toluene, xylene and ethylbenzene; ethers such as diethyl ether, dimethoxyethane, tetrahydrofuran and dioxane; ketones such as acetone, methyl ethyl ketone and methyl isobutyl ketone; methyl acetate and ethyl acetate.
• Esters such as isopropyl acetate and butyl acetate; amides such as N, N-dimethylformamide and N, N-dimethylacetamide; nitriles such as acetonitrile, propionitrile and benzonitrile; alcohols such as methanol, ethanol, isopropyl alcohol and butanol. And so on.
• the solvent ketones or ethers are preferable.
• the solvent may be used alone or in combination of two or more.
• the amount of the solvent used is not particularly limited, and is usually adjusted appropriately in the range of 0 to 2000 parts by mass with respect to 100 parts by mass of the total amount of the hydrolyzable silane compound, depending on the desired reaction time and the like. Can be done.
• the hydrolysis and condensation reaction of the hydrolyzable silane compound is preferably carried out in the presence of a catalyst and water.
• the catalyst may be an acid catalyst or an alkali catalyst.
• the acid catalyst is not particularly limited, and for example, mineral acids such as hydrochloric acid, sulfuric acid, nitrate, phosphoric acid and boric acid; phosphoric acid esters; carboxylic acids such as acetic acid, formic acid and trifluoroacetic acid; methanesulfonic acid and trifluo. Examples thereof include sulfonic acids such as lomethane sulfonic acid and p-toluene sulfonic acid; solid acids such as active white clay; and Lewis acids such as iron chloride.
• the alkali catalyst is not particularly limited, and for example, hydroxides of alkali metals such as lithium hydroxide, sodium hydroxide, potassium hydroxide, and cesium hydroxide; magnesium hydroxide, calcium hydroxide, barium hydroxide, and the like.
• Alkaline earth metal hydroxides Alkaline metal carbonates such as lithium carbonate, sodium carbonate, potassium carbonate, cesium carbonate; Alkaline earth metal carbonates such as magnesium carbonate; Lithium hydrogen carbonate, sodium hydrogen carbonate, hydrogen carbonate Alkaline metal hydrogen carbonates such as potassium and cesium hydrogen carbonate; alkali metal organic acid salts such as lithium acetate, sodium acetate, potassium acetate and cesium acetate (for example, acetate); alkaline earth metals organic such as magnesium acetate Alkaline acid salts (eg, acetates); alkali metal alkoxides such as lithium methoxydo, sodium methoxydo, sodium ethoxydo, sodium isopropoxide, potassium ethoxide, potassium t-butoxide; alkali metal phenoxides such as sodium phenoxide; Minerals such as triethylamine, N-methylpiperidin, 1,8-diazabicyclo [5.4.0] undec-7-ene,
• the amount of the catalyst used is not particularly limited, and can be appropriately adjusted within the range of 0.002 to 0.200 mol with respect to 1 mol of the total amount of the hydrolyzable silane compound.
• the amount of water used in the hydrolysis and condensation reactions is not particularly limited, and is usually adjusted appropriately within the range of 0.5 to 40 mol with respect to 1 mol of the total amount of the hydrolyzable silane compound. can.
• the method of adding the above water is not particularly limited, and the total amount of water used (total amount used) may be added all at once or sequentially. When added sequentially, it may be added continuously or intermittently.
• the reaction temperature of the hydrolysis and condensation reactions is not particularly limited, and is, for example, 40 to 100 ° C, preferably 45 to 80 ° C.
• the reaction time of the hydrolysis and condensation reactions is not particularly limited, and is, for example, 0.1 to 15 hours, preferably 1.5 to 10 hours.
• the hydrolysis and condensation reactions can be carried out under normal pressure, under pressure or under reduced pressure.
• the atmosphere for carrying out the hydrolysis and condensation reactions may be, for example, an inert gas atmosphere such as a nitrogen atmosphere or an argon atmosphere, or in the presence of oxygen such as air, but the inert gas. The atmosphere is preferable.
• Polyorganosylsesquioxane (a1) can be obtained by the hydrolysis and condensation reaction of the hydrolyzable silane compound.
• the catalyst may be neutralized after the completion of the hydrolysis and condensation reactions.
• the polyorganosylsesquioxane (a1) is separated by, for example, water washing, acid washing, alkaline washing, filtration, concentration, distillation, extraction, crystallization, recrystallization, column chromatography and the like, and a combination thereof. It may be separated and purified by a separation means or the like.
• the polyorganosylsesquioxane (a1) contained in the composition for forming a hard coat layer of the present invention may be only one kind, or two or more kinds having different structures.
• the content of polyorganosylsesquioxane (a1) in the composition for forming a hard coat layer of the present invention is not particularly limited, but is 50% by mass or more with respect to the total solid content of the composition for forming a hard coat layer. It is preferably 70% by mass or more, and more preferably 80% by mass or more.
• the upper limit of the content of polyorganosylsesquioxane (a1) in the composition for forming a hard coat layer is not particularly limited, but is 99.9% by mass or less based on the total solid content of the composition for forming a hard coat layer. Is more preferable, 98% by mass or less is more preferable, and 97% by mass or less is further preferable.
• the total solid content is all components other than the solvent.
• the composition for forming a hard coat layer of the present invention contains a leveling agent.
• the leveling agent is a nonionic fluorine-containing compound (hereinafter, also referred to as “fluorine-containing compound (B)”).
• composition for forming a hard coat layer of the present invention may contain only one type of fluorine-containing compound (B) as a leveling agent, or may contain two or more types of fluorine-containing compound (B).
• the fluorine-containing compound (B) is preferably a polymer.
• the fluorine-containing compound (B) may be an oligomer or a polymer.
• the weight average molecular weight (Mw) of the fluorine-containing compound (B) is preferably 1200 or more and less than 100,000, more preferably 2000 or more and less than 75,000, and further preferably 5000 or more and less than 50,000. preferable.
• the weight average molecular weight of the fluorine-containing compound (B) is converted to standard polystyrene by gel permeation chromatography (GPC). Specifically, the weight average molecular weight of the fluorine-containing compound (B) is measured by the following devices and conditions.
• Measuring device Product name "LC-20AD” (manufactured by Shimadzu Corporation) Columns: Shodex KF-801 x 2, KF-802, and KF-803 (manufactured by Showa Denko KK) Measurement temperature: 40 ° C Eluent: tetrahydrofuran (THF), sample concentration 0.1-0.2% by mass Flow rate: 1 mL / min Detector: UV-VIS detector (trade name "SPD-20A", manufactured by Shimadzu Corporation) Molecular weight: Standard polystyrene conversion
• the fluorine-containing compound (B) is preferably a nonionic compound.
• the nonionic compound is a compound having no ionic group (for example, an anionic group such as a carboxy group, a sulfonic acid group or a sulfate ester group, or a cationic group such as a quaternary ammonium group) in the molecule.
• the composition for forming a hard coat layer of the present invention may use a commercially available product as a leveling agent.
• a commercially available product for example, Megafvck (registered trademark) F-554 manufactured by DIC Corporation and Surflon (registered trademark) S manufactured by AGC Seichemical Co., Ltd. -243 and the like, and Mega Fvck (registered trademark) F-554 manufactured by DIC Corporation is particularly preferable.
• the content of the leveling agent in the composition for forming a hard coat layer of the present invention is not particularly limited, but is 0.001% by mass or more and 5% by mass or less with respect to the total solid content of the composition for forming a hard coat layer. Is more preferable, 0.005% by mass or more and 3% by mass or less is more preferable, and 0.01% by mass or more and 1% by mass or less is further preferable.
• the composition for forming a hard coat layer of the present invention preferably contains a polymerization initiator. Since the epoxy group contained in the polyorganosylsesquioxane (a1) is a cationically polymerizable group, it is preferable to contain a cationic polymerization initiator.
• the cationic polymerization initiator may be either a photocationic polymerization initiator or a thermal cationic polymerization initiator, but a photocationic polymerization initiator is more preferable. Only one type of polymerization initiator may be used, or two or more types having different structures may be used in combination.
• the photocationic polymerization initiator may be any as long as it can generate a cation as an active species by light irradiation, and a known photocationic polymerization initiator can be used without any limitation. Specific examples include known sulfonium salts, ammonium salts, iodonium salts (for example, diaryliodonium salts), triarylsulfonium salts, diazonium salts, iminium salts and the like. More specifically, for example, a photocationic polymerization initiator represented by the formulas (25) to (28) shown in paragraphs 0050 to 0053 of JP-A-8-143806, paragraph of JP-A-8-283320.
• Examples thereof include those exemplified as a cationic polymerization catalyst in 0020.
• the photocationic polymerization initiator can be synthesized by a known method and is also available as a commercially available product.
• Commercially available products include, for example, CI-1370, CI-2064, CI-2397, CI-2624, CI-2739, CI-2734, CI-2758, CI-2823, CI-2855 and CI-5102 manufactured by Nippon Soda Co., Ltd. Etc., PHOTOINITIATOR 2047 manufactured by Rhodia, UVI-6974, UVI-6990 manufactured by Union Carbite, CPI-100P manufactured by Sun Appro, and the like.
• a diazonium salt, an iodonium salt, a sulfonium salt, and an iminium salt are preferable from the viewpoint of the sensitivity of the photopolymerization initiator to light, the stability of the compound, and the like. Moreover, from the viewpoint of weather resistance, iodonium salt is most preferable.
• iodonium salt-based photocationic polymerization initiator examples include, for example, B2380 manufactured by Tokyo Kasei Co., Ltd., BBI-102 manufactured by Midori Kagaku Co., Ltd., WPI-113 manufactured by Fujifilm Wako Pure Chemical Industries, Ltd., and Fujifilm Wako Pure Chemical Industries, Ltd. WPI-124 manufactured by Fujifilm Wako Pure Chemical Industries, Ltd., WPI-169 manufactured by Fujifilm Wako Pure Chemical Industries, Ltd., WPI-170 manufactured by Fujifilm Wako Pure Chemical Industries, Ltd., and DTBPI-PFBS manufactured by Toyo Synthetic Chemical Industries, Ltd. can be mentioned.
• the content of the polymerization initiator in the composition for forming a hard coat layer of the present invention is not particularly limited, but is, for example, 0.1 to 100 parts by mass with respect to 100 parts by mass of polyorganosylsesquioxane (a1). 20 parts by mass is preferable, and 1 to 10 parts by mass is more preferable.
• the composition for forming a hard coat layer of the present invention may contain a solvent.
• a solvent an organic solvent is preferable, and one kind or two or more kinds of organic solvents can be mixed and used at an arbitrary ratio.
• the organic solvent include alcohols such as methanol, ethanol, propanol, n-butanol and i-butanol; ketones such as acetone, methylisobutylketone, methylethylketone and cyclohexanone; cellosolves such as ethylcellosolve; toluene.
• Aromatic substances such as xylene; glycol ethers such as propylene glycol monomethyl ether; acetate esters such as methyl acetate, ethyl acetate and butyl acetate; diacetone alcohol and the like.
• the content of the solvent in the composition for forming the hard coat layer can be appropriately adjusted within a range in which the coating suitability of the composition for forming the hard coat layer can be ensured. For example, it can be 50 to 500 parts by mass, preferably 80 to 200 parts by mass with respect to 100 parts by mass of the total solid content of the composition for forming a hard coat layer.
• the composition for forming a hard coat layer usually takes the form of a liquid.
• the solid content concentration of the composition for forming a hard coat layer is usually 10 to 90% by mass, preferably 20 to 80% by mass, and particularly preferably 40 to 70% by mass.
• composition for forming a hard coat layer of the present invention may contain components other than the above, and contains, for example, inorganic fine particles, a dispersant, an antifouling agent, an antistatic agent, an ultraviolet absorber, an antioxidant and the like. You may be doing it.
• composition for forming a hard coat layer of the present invention can be prepared by simultaneously or sequentially mixing the various components described above in any order.
• the preparation method is not particularly limited, and a known stirrer or the like can be used for the preparation.
• the present invention also relates to a hard coat film having a base material and a hard coat layer formed from the above composition for forming a hard coat layer.
• the hard coat film of the present invention has the hard coat layer on the base material.
• the substrate used for the hard coat film of the present invention preferably has a transmittance in the visible light region of 70% or more, more preferably 80% or more, and further preferably 90% or more.
• the base material is preferably a plastic base material containing a polymer.
• a polymer having excellent optical transparency, mechanical strength, thermal stability and the like is preferable.
• polystyrene polymer examples include a polycarbonate polymer, a polyester polymer such as polyethylene terephthalate (PET) and polyethylene naphthalate (PEN), and a styrene polymer such as polystyrene and an acrylonitrile / styrene copolymer (AS resin).
• polyolefins such as polyethylene and polypropylene, norbornene resins, polyolefin polymers such as ethylene / propylene copolymers, (meth) acrylic polymers such as polymethylmethacrylate, vinyl chloride polymers, nylon, and amides such as aromatic polyamides.
• amide-based polymers such as aromatic polyamides and imide-based polymers have a large number of breaks and bends measured by a MIT tester in accordance with JIS (Japanese Industrial Standards) P8115 (2001) and have a relatively high hardness. It can be preferably used.
• the aromatic polyamide as described in Example 1 of Japanese Patent No. 56994454, the polyimides described in Japanese Patent Publication No. 2015-508345, Japanese Patent Publication No. 2016-521216, and WO2017 / 014287 as a base material.
• aromatic polyamide aromatic polyamide (aramid-based polymer) is preferable.
• the base material preferably contains at least one polymer selected from imide-based polymers and aramid-based polymers.
• the base material can be formed as a cured layer of an ultraviolet curable type or thermosetting type resin such as acrylic type, urethane type, acrylic urethane type, epoxy type and silicone type.
• the base material may contain a material that further softens the above polymer.
• the softening material refers to a compound that improves the number of fractures and bends, and as the softening material, a rubber elastic body, a brittleness improver, a plasticizer, a slide ring polymer, or the like can be used.
• the softening material the softening material described in paragraph numbers [0051] to [0114] in JP-A-2016-167043 can be preferably used.
• the softening material may be mixed alone with the polymer, may be mixed in combination of a plurality as appropriate, or may be used alone or in combination of a plurality of softening materials without being mixed with the polymer. It may be used as a base material.
• the amount of these softening materials to be mixed is not particularly limited, and a polymer having a sufficient number of breaks and bends by itself may be used alone as a base material for a film, or a softening material may be mixed, or all of them. May be used as a softening material (100%) to have a sufficient number of breaks and bends.
• additives for example, ultraviolet absorbers, matting agents, antioxidants, peeling accelerators, retardation (optical anisotropy) adjusting agents, etc.
• They may be solid or oily. That is, the melting point or boiling point is not particularly limited.
• the additive may be added at any time in the step of producing the base material, or the step of adding the additive and preparing may be added to the material preparation step.
• the amount of each material added is not particularly limited as long as the function is exhibited.
• the additives described in paragraph numbers [0117] to [0122] in JP-A-2016-167043 can be preferably used.
• the above additives may be used alone or in combination of two or more.
• UV absorber examples of the ultraviolet absorber include a benzotriazole compound, a triazine compound, and a benzoxazine compound.
• the benzotriazole compound is a compound having a benzotriazole ring, and specific examples thereof include various benzotriazole-based ultraviolet absorbers described in paragraph 0033 of JP2013-1111835.
• the triazine compound is a compound having a triazine ring, and specific examples thereof include various triazine-based ultraviolet absorbers described in paragraph 0033 of JP2013-1111835.
• As the benzoxazine compound for example, those described in paragraph 0031 of JP-A-2014-209162 can be used.
• the content of the ultraviolet absorber in the base material is, for example, about 0.1 to 10 parts by mass with respect to 100 parts by mass of the polymer contained in the base material, but is not particularly limited. Further, regarding the ultraviolet absorber, reference is also made to paragraph 0032 of JP2013-1111835.
• an ultraviolet absorber having high heat resistance and low volatilization is preferable. Examples of such an ultraviolet absorber include UVSORB101 (manufactured by Fujifilm Fine Chemicals Co., Ltd.), TINUVIN 360, TINUVIN 460, TINUVIN 1577 (manufactured by BASF), LA-F70, LA-31, LA-46 (manufactured by ADEKA) and the like. Can be mentioned.
• the base material has a small difference in refractive index between the flexible material and various additives used for the base material and the polymer.
• the base material a base material containing an imide-based polymer
• the imide-based polymer means a polymer containing at least one type of repeating structural unit represented by the formula (PI), the formula (a), the formula (a') and the formula (b).
• the repeating structural unit represented by the formula (PI) is the main structural unit of the imide-based polymer from the viewpoint of film strength and transparency.
• the repeating structural unit represented by the formula (PI) is preferably 40 mol% or more, more preferably 50 mol% or more, still more preferably 70 mol% or more, based on all the repeating structural units of the imide-based polymer. It is particularly preferably 90 mol% or more, and most preferably 98 mol% or more.
• G in the formula (PI) represents a tetravalent organic group, and A represents a divalent organic group.
• G 2 in the formula (a) represents a trivalent organic group, and A 2 represents a divalent organic group.
• G 3 in the formula (a') represents a tetravalent organic group, and A 3 represents a divalent organic group.
• G 4 and A 4 in the formula (b) represents each a divalent organic group.
• the organic group of the tetravalent organic group represented by G includes an acyclic aliphatic group, a cyclic aliphatic group and an aromatic group. Examples are groups selected from the group consisting of.
• the organic group of G is preferably a tetravalent cyclic aliphatic group or a tetravalent aromatic group from the viewpoint of transparency and flexibility of the base material containing the imide-based polymer.
• the aromatic group includes a monocyclic aromatic group, a condensed polycyclic aromatic group, and a non-condensed polycyclic aromatic group having two or more aromatic rings in which they are directly or linked to each other by a bonding group.
• the organic group of G is a cyclic aliphatic group, a cyclic aliphatic group having a fluorine-based substituent, a monocyclic aromatic group having a fluorine-based substituent, and the like. It is preferably a condensed polycyclic aromatic group having a fluorine-based substituent or a non-condensed polycyclic aromatic group having a fluorine-based substituent.
• the fluorine-based substituent means a group containing a fluorine atom.
• the fluorine-based substituent is preferably a fluoro group (fluorine atom, ⁇ F) and a perfluoroalkyl group, and more preferably a fluoro group and a trifluoromethyl group.
• the organic group of G is, for example, a saturated or unsaturated cycloalkyl group, a saturated or unsaturated heterocycloalkyl group, an aryl group, a heteroaryl group, an arylalkyl group, an alkylaryl group, a heteroalkylaryl. It is selected from groups that have a group and any two of these (which may be the same) and which are linked to each other either directly or by a linking group.
• Examples of the bonding group include -O-, an alkylene group having 1 to 10 carbon atoms, -SO 2- , -CO- or -CO-NR- (R is a methyl group, an ethyl group, a propyl group and the like having 1 to 1 carbon atoms. (Representing an alkyl group of 3 or a hydrogen atom).
• the tetravalent organic group represented by G usually has 2 to 32 carbon atoms, preferably 4 to 15 carbon atoms, more preferably 5 to 10 carbon atoms, and further preferably 6 to 8 carbon atoms.
• the organic group of G is a cyclic aliphatic group or an aromatic group, at least one of the carbon atoms constituting these groups may be replaced with a heteroatom.
• Heteroatoms include O, N or S.
• G examples include groups represented by the following formulas (20), formulas (21), formulas (22), formulas (23), formulas (24), formulas (25) or formulas (26). Be done. * In the formula indicates a bond.
• Z in formula (26) is a single bond, -O-, -CH 2- , -C (CH 3 ) 2- , -Ar-O-Ar-, -Ar -CH 2-Ar-, -Ar- Represents C (CH 3 ) 2- Ar- or -Ar-SO 2- Ar-.
• Ar represents an aryl group having 6 to 20 carbon atoms, and may be, for example, a phenylene group. At least one of the hydrogen atoms of these groups may be substituted with a fluorine-based substituent.
• the organic group of the divalent organic group represented by A includes an acyclic aliphatic group, a cyclic aliphatic group and an aromatic group. Examples include groups selected from the group consisting of.
• the divalent organic group represented by A is preferably selected from a divalent cyclic aliphatic group and a divalent aromatic group.
• Aromatic groups include monocyclic aromatic groups, fused polycyclic aromatic groups, and non-condensed polycyclic aromatics having two or more aromatic rings and linked to each other directly or by a bonding group. The group is mentioned. From the viewpoint of transparency of the base material and suppression of coloring, it is preferable that a fluorine-based substituent is introduced into the organic group of A.
• the organic group of A is, for example, a saturated or unsaturated cycloalkyl group, a saturated or unsaturated heterocycloalkyl group, an aryl group, a heteroaryl group, an arylalkyl group, an alkylaryl group, a heteroalkylaryl. It is selected from groups that have a group and any two of them (which may be the same) and which are linked to each other either directly or by a binding group.
• the hetero atom include O, N or S
• examples of the bonding group include -O-, an alkylene group having 1 to 10 carbon atoms, -SO 2- , -CO- or -CO-NR- (R is methyl).
• Including an alkyl group having 1 to 3 carbon atoms such as a group, an ethyl group, a propyl group, or a hydrogen atom).
• the number of carbon atoms of the divalent organic group represented by A is usually 2 to 40, preferably 5 to 32, more preferably 12 to 28, and further preferably 24 to 27.
• A examples include a group represented by the following formula (30), formula (31), formula (32), formula (33) or formula (34).
• * In the formula indicates a bond.
• Z 1 to Z 3 are independently single-bonded, -O-, -CH 2- , -C (CH 3 ) 2- , -SO 2- , -CO- or -CO-NR- (R is Represents an alkyl group having 1 to 3 carbon atoms such as a methyl group, an ethyl group, and a propyl group, or a hydrogen atom).
• Z 1 and Z 2 and Z 2 and Z 3 are preferably in the meta or para position with respect to each ring, respectively.
• the single bond between Z 1 and the terminal, the single bond between Z 2 and the terminal, and the single bond between Z 3 and the terminal are in the meta position or the para position, respectively.
• Z 1 and Z 3 are -O- and Z 2 is -CH 2- , -C (CH 3 ) 2- or -SO 2- .
• One or more of the hydrogen atoms of these groups may be substituted with fluorine-based substituents.
• At least one hydrogen atom among the hydrogen atoms constituting at least one of A and G is selected from the group consisting of a fluorine-based substituent, a hydroxyl group, a sulfone group, an alkyl group having 1 to 10 carbon atoms, and the like. It may be substituted with a functional group. Further, when the organic group of A and the organic group of G are cyclic aliphatic groups or aromatic groups, respectively, it is preferable that at least one of A and G has a fluorine-based substituent, and both A and G have a fluorine-based substituent. It is more preferable to have a fluorine-based substituent.
• G 2 in the formula (a) is a trivalent organic group.
• This organic group can be selected from the same groups as the organic group of G in the formula (PI) except that it is a trivalent group.
• G 2 a group in which any one of the four bonds of the groups represented by the formulas (20) to (26) given as a specific example of G is replaced with a hydrogen atom is mentioned. Can be done.
• a 2 in formula (a) can be selected from the same groups as A in formula (PI).
• G 3 in formula (a') can be selected from the same groups as G in formula (PI).
• a 3 in formula (a') can be selected from the same groups as A in formula (PI).
• G 4 in formula (b) is a divalent organic group.
• This organic group can be selected from the same groups as the organic group of G in the formula (PI) except that it is a divalent group.
• An example of G 4 is a group in which any two of the four bonds of the groups represented by the formulas (20) to (26) given as specific examples of G are replaced with hydrogen atoms. Can be done.
• a 4 in the formula (b) may be selected from the same groups as A in the formula (PI).
• the imide-based polymer contained in the substrate containing the imide-based polymer includes diamines and a tetracarboxylic acid compound (including a tetracarboxylic acid compound analog such as an acid chloride compound and a tetracarboxylic acid dianhydride) or a tricarboxylic acid compound (a tricarboxylic acid compound). It may be a condensed polymer obtained by polycondensing with at least one of (including an acid chloride compound and a tricarboxylic acid compound analog such as tricarboxylic acid anhydride). Further, a dicarboxylic acid compound (including an analog such as an acid chloride compound) may be polycondensed.
• the repeating structural unit represented by the formula (PI) or the formula (a') is usually derived from diamines and tetracarboxylic acid compounds.
• the repeating structural unit represented by the formula (a) is usually derived from diamines and tricarboxylic acid compounds.
• the repeating structural unit represented by the formula (b) is usually derived from diamines and dicarboxylic acid compounds.
• the tetracarboxylic acid compound examples include an aromatic tetracarboxylic acid compound, an alicyclic tetracarboxylic acid compound, and an acyclic aliphatic tetracarboxylic acid compound. These may be used in combination of two or more.
• the tetracarboxylic acid compound is preferably a tetracarboxylic dianhydride.
• Examples of the tetracarboxylic acid dianhydride include aromatic tetracarboxylic acid dianhydride, alicyclic tetracarboxylic acid dianhydride, and acyclic aliphatic tetracarboxylic acid dianhydride.
• the tetracarboxylic acid compound may be an alicyclic tetracarboxylic acid compound, an aromatic tetracarboxylic acid compound, or the like from the viewpoint of solubility of the imide-based polymer in a solvent and transparency and flexibility when a base material is formed. preferable.
• the tetracarboxylic acid compound is an alicyclic tetracarboxylic acid compound having a fluorine-based substituent and an aromatic tetracarboxylic acid compound having a fluorine-based substituent. It is preferably selected from, and more preferably an alicyclic tetracarboxylic acid compound having a fluorine-based substituent.
• the tricarboxylic acid compound examples include aromatic tricarboxylic acids, alicyclic tricarboxylic acids, acyclic aliphatic tricarboxylic acids, acid chloride compounds related thereto, acid anhydrides and the like.
• the tricarboxylic acid compound is preferably selected from aromatic tricarboxylic acids, alicyclic tricarboxylic acids, acyclic aliphatic tricarboxylic acids and related acid chloride compounds. Two or more kinds of tricarboxylic acid compounds may be used in combination.
• the tricarboxylic acid compound is an alicyclic tricarboxylic acid compound or an aromatic tricarboxylic acid compound from the viewpoint of solubility of the imide-based polymer in a solvent and transparency and flexibility when a substrate containing the imide-based polymer is formed. Is preferable. From the viewpoint of transparency of the base material containing the imide-based polymer and suppression of coloring, the tricarboxylic acid compound shall be an alicyclic tricarboxylic acid compound having a fluorine-based substituent or an aromatic tricarboxylic acid compound having a fluorine-based substituent. Is more preferable.
• dicarboxylic acid compound examples include aromatic dicarboxylic acids, alicyclic dicarboxylic acids, acyclic aliphatic dicarboxylic acids, acid chloride compounds related thereto, acid anhydrides and the like.
• the dicarboxylic acid compound is preferably selected from aromatic dicarboxylic acids, alicyclic dicarboxylic acids, acyclic aliphatic dicarboxylic acids and related acid chloride compounds thereof. Two or more kinds of dicarboxylic acid compounds may be used in combination.
• the dicarboxylic acid compound is an alicyclic dicarboxylic acid compound or an aromatic dicarboxylic acid compound from the viewpoint of solubility of the imide-based polymer in a solvent and transparency and flexibility when a substrate containing the imide-based polymer is formed. Is preferable. From the viewpoint of transparency and suppression of coloring of the base material containing the imide-based polymer, the dicarboxylic acid compound shall be an alicyclic dicarboxylic acid compound having a fluorine-based substituent or an aromatic dicarboxylic acid compound having a fluorine-based substituent. Is even more preferable.
• diamines examples include aromatic diamines, alicyclic diamines and aliphatic diamines, and two or more of these may be used in combination. From the viewpoint of the solubility of the imide polymer in the solvent and the transparency and flexibility when the base material containing the imide polymer is formed, the diamines are derived from the alicyclic diamine and the aromatic diamine having a fluorine-based substituent. It is preferable to be selected.
• an imide polymer When such an imide polymer is used, it has particularly excellent flexibility, high light transmittance (for example, 85% or more, preferably 88% or more with respect to light at 550 nm), and low yellowness (YI value). It is easy to obtain a substrate having 5, 5 or less, preferably 3 or less), and a low haze (1.5% or less, preferably 1.0% or less).
• the imide-based polymer may be a copolymer containing a plurality of different types of the above-mentioned repeating structural units.
• the weight average molecular weight of the polyimide polymer is usually 10,000 to 500,000.
• the weight average molecular weight of the imide polymer is preferably 50,000 to 500,000, more preferably 70,000 to 400,000.
• the weight average molecular weight is a standard polystyrene-equivalent molecular weight measured by gel permeation chromatography (GPC).
• the weight average molecular weight of the imide-based polymer is large, high flexibility tends to be easily obtained, but if the weight average molecular weight of the imide-based polymer is too large, the viscosity of the varnish tends to be high and the processability tends to be lowered.
• the imide-based polymer may contain a halogen atom such as a fluorine atom that can be introduced by the above-mentioned fluorine-based substituent or the like.
• a halogen atom such as a fluorine atom that can be introduced by the above-mentioned fluorine-based substituent or the like.
• the halogen atom is preferably a fluorine atom.
• the content of the halogen atom in the polyimide-based polymer is preferably 1 to 40% by mass, more preferably 1 to 30% by mass, based on the mass of the polyimide-based polymer.
• the base material containing the imide-based polymer may contain one kind or two or more kinds of ultraviolet absorbers.
• the ultraviolet absorber can be appropriately selected from those usually used as an ultraviolet absorber in the field of resin materials.
• the ultraviolet absorber may contain a compound that absorbs light having a wavelength of 400 nm or less.
• Examples of the ultraviolet absorber that can be appropriately combined with the imide-based polymer include at least one compound selected from the group consisting of benzophenone-based compounds, salicylate-based compounds, benzotriazole-based compounds, and triazine-based compounds.
• the "system compound” refers to a derivative of a compound to which the "system compound” is attached.
• the "benzophenone-based compound” refers to a compound having benzophenone as a maternal skeleton and a substituent attached to benzophenone.
• the content of the ultraviolet absorber is usually 1% by mass or more, preferably 2% by mass or more, more preferably 3% by mass or more, and usually 10% by mass or less, based on the total mass of the base material. Yes, preferably 8% by mass or less, and more preferably 6% by mass or less. By including the ultraviolet absorber in these amounts, the weather resistance of the base material can be enhanced.
• the base material containing the imide-based polymer may further contain an inorganic material such as inorganic particles.
• the inorganic material is preferably a silicon material containing a silicon atom.
• the tensile elastic modulus of the base material containing the imide-based polymer can be easily set to 4.0 GPa or more.
• the method of controlling the tensile elastic modulus of the base material containing the imide-based polymer is not limited to the blending of the inorganic material.
• Examples of the silicon material containing a silicon atom include silica particles, a quaternary alkoxysilane such as tetraethyl orthosilicate (TEOS), and a silicon compound such as a silsesquioxane derivative.
• TEOS tetraethyl orthosilicate
• silicon compound such as a silsesquioxane derivative.
• silica particles are preferable from the viewpoint of transparency and flexibility of the base material containing the imide-based polymer.
• the average primary particle size of silica particles is usually 100 nm or less. When the average primary particle size of the silica particles is 100 nm or less, the transparency tends to be improved.
• the average primary particle size of the silica particles in the substrate containing the imide-based polymer can be determined by observation with a transmission electron microscope (TEM).
• the primary particle size of the silica particles can be a directional diameter measured by a transmission electron microscope (TEM).
• the average primary particle size can be obtained by measuring 10 points of the primary particle size by TEM observation and as an average value thereof.
• the particle distribution of the silica particles before forming the substrate containing the imide polymer can be determined by a commercially available laser diffraction type particle size distribution meter.
• the blending ratio of the imide-based polymer and the inorganic material is preferably 1: 9 to 10: 0 in terms of mass ratio, with the total of both being 10 and 3: 7 to 10 : 0 is more preferable, 3: 7 to 8: 2 is more preferable, and 3: 7 to 7: 3 is even more preferable.
• the ratio of the inorganic material to the total mass of the imide-based polymer and the inorganic material is usually 20% by mass or more, preferably 30% by mass or more, usually 90% by mass or less, and preferably 70% by mass or less.
• the blending ratio of the imide-based polymer and the inorganic material is within the above range, the transparency and mechanical strength of the base material containing the imide-based polymer tend to be improved. Further, the tensile elastic modulus of the base material containing the imide-based polymer can be easily set to 4.0 GPa or more.
• the base material containing the imide-based polymer may further contain components other than the imide-based polymer and the inorganic material as long as the transparency and flexibility are not significantly impaired.
• components other than the imide polymer and the inorganic material include colorants such as antioxidants, mold release agents, stabilizers and bluing agents, flame retardants, lubricants, thickeners and leveling agents.
• the ratio of the components other than the imide polymer and the inorganic material is preferably more than 0% and 20% by mass or less, more preferably more than 0% and 10% by mass or less with respect to the mass of the base material. ..
• Si / N which is the ratio of the number of atoms of the silicon atom to the nitrogen atom on at least one surface, is 8 or more.
• the atomic number ratio Si / N is determined by evaluating the composition of the base material containing an imide-based polymer by X-ray Photoelectron Spectroscopy (XPS), and the abundance of silicon atoms and nitrogen atoms obtained thereby. It is a value calculated from the abundance of.
• the Si / N on at least one surface of the base material containing the imide polymer is 8 or more, sufficient adhesion to the hard coat layer can be obtained.
• the Si / N is more preferably 9 or more, further preferably 10 or more, preferably 50 or less, and more preferably 40 or less.
• the base material is preferably in the form of a film (the base material is particularly preferably a plastic film).
• the thickness of the base material is more preferably 100 ⁇ m or less, further preferably 80 ⁇ m or less, and most preferably 50 ⁇ m or less.
• the thickness of the base material is preferably 3 ⁇ m or more, more preferably 5 ⁇ m or more, and most preferably 15 ⁇ m or more.
• the base material may be formed by thermally melting a thermoplastic polymer to form a film, or may be formed from a solution in which the polymer is uniformly dissolved by a solution film forming (solvent casting method).
• a solution film forming solvent casting method
• the above-mentioned softening material and various additives can be added at the time of heat-melting.
• the base material is prepared by the solution film forming method
• the above-mentioned softening material and various additives can be added to the polymer solution (hereinafter, also referred to as dope) in each preparation step.
• the timing of addition may be any in the dope preparation step, but the step of adding and preparing the additive may be added to the final preparation step of the dope preparation step.
• the coating film may be heated for drying and / or baking of the coating film.
• the heating temperature of the coating film is usually 50 to 350 ° C.
• the coating film may be heated under an inert atmosphere or under reduced pressure.
• the solvent can be evaporated and removed by heating the coating film.
• the base material may be formed by a method including a step of drying the coating film at 50 to 150 ° C. and a step of baking the dried coating film at 180 to 350 ° C.
• Surface treatment may be applied to at least one surface of the base material.
• the hard coat film of the present invention has a hard coat layer formed from the above composition for forming a hard coat layer.
• the hard coat layer is preferably formed on at least one surface of the substrate.
• the hard coat film of the present invention has a scratch resistant layer described later, it is preferable to have at least one hard coat layer between the base material and the scratch resistant layer.
• the hard coat layer is preferably formed by applying the above composition for forming a hard coat layer onto a base material and subjecting a coating film obtained by subjecting a coating film to a curing treatment by at least one of light irradiation and heating. .. That is, the hard coat layer preferably contains a cured product of the composition for forming the hard coat layer.
• the hard coat layer of the hard coat film of the present invention contains the cured product of the composition for forming the hard coat layer of the present invention.
• the cured product of the composition for forming a hard coat layer preferably contains at least a cured product in which the epoxy group of polyorganosylsesquioxane (a1) is bonded by a polymerization reaction.
• the content of the cured product of the composition for forming the hard coat layer in the hard coat layer of the hard coat film of the present invention is preferably 50% by mass or more, more preferably 60% by mass or more, 70. It is more preferably mass% or more.
• the film thickness of the hard coat layer is not particularly limited, but is preferably 0.5 to 30 ⁇ m, more preferably 1 to 25 ⁇ m, and even more preferably 2 to 20 ⁇ m.
• the film thickness of the hard coat layer is calculated by observing the cross section of the hard coat film with an optical microscope.
• the cross-sectional sample can be prepared by a microtome method using a cross-section cutting device ultra-microtome, a cross-section processing method using a focused ion beam (FIB) device, or the like.
• the haze (total haze) of the hard coat film of the present invention is preferably less than 1.0%, more preferably less than 0.7%, and even more preferably less than 0.4%. Haze is measured by a haze meter in accordance with JIS K7136: 2000.
• JIS is an abbreviation for Japanese Industrial Standards (Japanese Industrial Standards).
• the hard coat film of the present invention has excellent pencil hardness.
• the hard coat film of the present invention preferably has a pencil hardness of 4H or more, more preferably 5H or more, and even more preferably 6H or more. Pencil hardness is evaluated according to JIS K5400.
• the hard coat film of the present invention has excellent scratch resistance.
• the hard coat film of the present invention is preferably not scratched even if it is rubbed 10 times (10 reciprocations) when a steel wool rubbing test is performed on the hard coat layer with a load of 200 g, and 50 times (50 reciprocations). ) It is more preferable that it is not scratched even if it is rubbed, and it is further preferable that it is not scratched even if it is rubbed 100 times (100 reciprocations).
• the scratch resistance is specifically measured as follows. The surface of the hard coat film opposite to the base material (the surface on the hard coat layer side) is rubbed with a rubbing tester under the following conditions.
• the hard coat film of the present invention may have a functional layer other than the above hard coat layer.
• the functional layer is not particularly limited, and examples thereof include a scratch resistant layer.
• the hard coat layer formed from the composition for forming a hard coat layer of the present invention has excellent scratch resistance, but by providing the scratch resistant layer on the hard coat layer, further excellent scratch resistance is obtained. Can be given.
• the hard coat film of the present invention has a scratch resistant layer, it is preferable to have at least one scratch resistant layer on the surface opposite to the base material of the hard coat layer.
• the scratch-resistant layer of the hard coat film of the present invention preferably contains a cured product of a composition for forming a scratch-resistant layer containing a radically polymerizable compound (c1).
• the radically polymerizable compound (c1) (also referred to as “compound (c1)”) will be described.
• Compound (c1) is a compound having a radically polymerizable group.
• the radically polymerizable group in the compound (c1) is not particularly limited, and a generally known radically polymerizable group can be used.
• Examples of the radically polymerizable group include a polymerizable unsaturated group, and specific examples thereof include a (meth) acryloyl group, a vinyl group, and an allyl group, and a (meth) acryloyl group is preferable.
• each group mentioned above may have a substituent.
• the compound (c1) is preferably a compound having two or more (meth) acryloyl groups in one molecule, and more preferably a compound having three or more (meth) acryloyl groups in one molecule. ..
• the molecular weight of the compound (c1) is not particularly limited, and it may be a monomer, an oligomer, or a polymer. Specific examples of the above compound (c1) are shown below, but the present invention is not limited thereto.
• Examples of the compound having two (meth) acryloyl groups in one molecule include neopentyl glycol di (meth) acrylate, 1,9-nonanediol di (meth) acrylate, dipropylene glycol di (meth) acrylate, and tripropylene.
• Glycoldi (meth) acrylate tetraethylene glycol di (meth) acrylate, neopentyl glycol di (meth) acrylate of hydroxypivalate, polyethylene glycol di (meth) acrylate, dicyclopentenyl (meth) acrylate, dicyclopentenyloxyethyl ( Preferable examples thereof include meta) acrylate and dicyclopentanyldi (meth) acrylate.
• Examples of the compound having three or more (meth) acryloyl groups in one molecule include an ester of a polyhydric alcohol and (meth) acrylic acid.
• pentaerythritol tri (meth) acrylate pentaerythritol tetra (meth) acrylate, trimethylolpropane tri (meth) acrylate, trimethylolethanetri (meth) acrylate, ditrimethylolpropane tetra (meth) acrylate, dipenta.
• pentaerythritol triacrylate pentaerythritol tetraacrylate
• dipentaerythritol Pentaacrylates, dipentaerythritol hexaacrylates, or mixtures thereof are preferred.
• the content of the compound (c1) in the scratch-resistant layer forming composition is preferably 80% by mass or more, more preferably 85% by mass or more, based on the total solid content in the scratch-resistant layer forming composition. It is preferable, and 90% by mass or more is more preferable.
• the scratch-resistant layer-forming composition in the present invention preferably contains a radical polymerization initiator. Only one type of radical polymerization initiator may be used, or two or more types having different structures may be used in combination. Further, the radical polymerization initiator may be a photopolymerization initiator or a thermal polymerization initiator.
• the content of the radical polymerization initiator in the scratch-resistant layer forming composition is not particularly limited, but is preferably 0.1 to 200 parts by mass with respect to 100 parts by mass of the compound (c1), for example. ⁇ 50 parts by mass is more preferable.
• the scratch-resistant layer-forming composition in the present invention may contain a solvent.
• the solvent is the same as the solvent that may be contained in the above-mentioned composition for forming a hard coat layer.
• the content of the solvent in the scratch-resistant layer-forming composition in the present invention can be appropriately adjusted within a range in which the coating suitability of the scratch-resistant layer-forming composition can be ensured. For example, it can be 50 to 500 parts by mass, preferably 80 to 200 parts by mass, based on 100 parts by mass of the total solid content of the scratch-resistant layer forming composition.
• the scratch-resistant layer-forming composition usually takes the form of a liquid.
• the concentration of the solid content of the scratch-resistant layer forming composition is usually about 10 to 90% by mass, preferably about 20 to 80% by mass, and particularly preferably about 40 to 70% by mass.
• the scratch-resistant layer forming composition may contain components other than the above, and may contain, for example, inorganic particles, a leveling agent, an antifouling agent, an antistatic agent, a slip agent, a solvent and the like. In particular, it is preferable to contain the following fluorine-containing compound as a slip agent.
• the fluorine-containing compound may be a monomer, an oligomer, or a polymer.
• the fluorine-containing compound preferably has a substituent that contributes to bond formation or compatibility with the compound (c1) in the scratch-resistant layer.
• the substituents may be the same or different, and it is preferable that there are a plurality of the substituents.
• the substituent is preferably a polymerizable group, and may be a polymerizable reactive group exhibiting any one of radical polymerizable, cationically polymerizable, anionic polymerizable, contractile polymerizable and addition polymerizable, as an example of a preferable substituent.
• Examples include an acryloyl group, a methacryloyl group, a vinyl group, an allyl group, a cinnamoyl group, an epoxy group, an oxetanyl group, a hydroxyl group, a polyoxyalkylene group, a carboxyl group and an amino group.
• a radically polymerizable group is preferable, and an acryloyl group and a methacryloyl group are particularly preferable.
• the fluorine-containing compound may be a polymer or an oligomer with a compound containing no fluorine atom.
• the fluorine-containing compound is preferably a fluorine-based compound represented by the following general formula (F).
• RA represents a polymerizable unsaturated group.
• the polymerizable unsaturated group is preferably a group having an unsaturated bond (that is, a radically polymerizable group) capable of causing a radical polymerization reaction by irradiating with an active energy ray such as an ultraviolet ray or an electron beam, preferably (meth).
• an active energy ray such as an ultraviolet ray or an electron beam
• examples include an acryloyl group, a (meth) acryloyloxy group, a vinyl group, an allyl group, etc., a (meth) acryloyl group, a (meth) acryloyloxy group, and a group in which any hydrogen atom in these groups is substituted with a fluorine atom. Is preferably used.
• R f represents a (per) fluoroalkyl group or a (per) fluoropolyether group.
• the (per) fluoroalkyl group represents at least one of a fluoroalkyl group and a perfluoroalkyl group
• the (per) fluoropolyether group is at least one of a fluoropolyether group and a perfluoropolyether group. Represents a species. From the viewpoint of scratch resistance, it is preferable that the fluorine content in R f is high.
• the (par) fluoroalkyl group is preferably a group having 1 to 20 carbon atoms, and more preferably a group having 1 to 10 carbon atoms.
• the (par) fluoroalkyl group has a linear structure (for example, -CF 2 CF 3 , -CH 2 (CF 2 ) 4 H, -CH 2 (CF 2 ) 8 CF 3 , -CH 2 CH 2 (CF 2 ) 4 Even if it is H), it has a branched structure (for example, -CH (CF 3 ) 2 , -CH 2 CF (CF 3 ) 2 , -CH (CH 3 ) CF 2 CF 3 , -CH (CH 3 ) (CF 2 ).
• alicyclic structure preferably a 5- or 6-membered ring, for example perfluoro hexyl group, and a perfluorocyclopentyl group to cycloalkyl and alkyl groups substituted with these groups
• alicyclic structure preferably a 5- or 6-membered ring, for example perfluoro hexyl group, and a perfluorocyclopentyl group to cycloalkyl and alkyl groups substituted with these groups
• the (per) fluoropolyether group refers to a case where the (per) fluoroalkyl group has an ether bond, and may be a monovalent group or a divalent or higher valent group.
• the fluoropolyether group include -CH 2 OCH 2 CF 2 CF 3 , -CH 2 CH 2 OCH 2 C 4 F 8 H, -CH 2 CH 2 OCH 2 CH 2 C 8 F 17 , and -CH 2 CH 2.
• Examples thereof include OCF 2 CF 2 OCF 2 CF 2 H, a fluorocycloalkyl group having 4 or more fluorine atoms and 4 to 20 carbon atoms.
• the perfluoropolyether group examples include- (CF 2 O) pf- (CF 2 CF 2 O) qf -,-[CF (CF 3 ) CF 2 O] pf- [CF (CF 3 )].
• qf ⁇ , ⁇ (CF 2 CF 2 CF 2 O) pf ⁇ , ⁇ (CF 2 CF 2 O) pf ⁇ and the like can be mentioned.
• the pf and qf independently represent an integer of 0 to 20. However, pf + qf is an integer of 1 or more.
• the total of pf and qf is preferably 1 to 83, more preferably 1 to 43, and even more preferably 5 to 23.
• the fluorine-containing compound preferably has a perfluoropolyether group represented by ⁇ (CF 2 O) pf ⁇ (CF 2 CF 2 O) qf ⁇ .
• the fluorine-containing compound preferably has a perfluoropolyether group and a plurality of polymerizable unsaturated groups in one molecule.
• W represents a single bond or a linking group.
• the linking group represented by W include an alkylene group, an arylene group and a heteroalkylene group, and a linking group in which these groups are combined. These linking groups may further have an oxy group, a carbonyl group, a carbonyloxy group, a carbonylimino group, a sulfonamide group, etc., and a functional group in which these groups are combined.
• W is preferably an ethylene group, more preferably an ethylene group bonded to a carbonylimino group.
• the fluorine atom content of the fluorine-containing compound is not particularly limited, but is preferably 20% by mass or more, more preferably 30 to 70% by mass, and even more preferably 40 to 70% by mass.
• preferable fluorine-containing compounds include R-2020, M-2020, R-3833, M-3833 and Optool DAC (trade name) manufactured by Daikin Chemical Industries, Ltd., and Megafuck F-171 manufactured by DIC Corporation. , F-172, F-179A, RS-78, RS-90, Defensa MCF-300 and MCF-323 (hereinafter referred to as trade names), but are not limited thereto.
• the product of nf and mf (nf ⁇ mf) is preferably 2 or more, and more preferably 4 or more.
• the weight average molecular weight (Mw) of a fluorine-containing compound having a polymerizable unsaturated group can be measured by using molecular exclusion chromatography, for example, gel permeation chromatography (GPC).
• Mw of the fluorine-containing compound used in the present invention is preferably 400 or more and less than 50,000, more preferably 400 or more and less than 30,000, and further preferably 400 or more and less than 25,000.
• the content of the fluorine-containing compound is preferably 0.01 to 5% by mass, more preferably 0.1 to 5% by mass, and 0.5 to 5% with respect to the total solid content in the composition for forming a scratch-resistant layer.
• the mass% is more preferable, and 0.5 to 2% by mass is particularly preferable.
• the scratch-resistant layer-forming composition used in the present invention can be prepared by simultaneously or sequentially mixing the various components described above in any order.
• the preparation method is not particularly limited, and a known stirrer or the like can be used for the preparation.
• the scratch-resistant layer of the hard coat film of the present invention preferably contains a cured product of the composition for forming a scratch-resistant layer containing the compound (c1), and more preferably contains the compound (c1) and a radical polymerization initiator. It contains a cured product of a composition for forming a scratch-resistant layer.
• the cured product of the scratch-resistant layer forming composition preferably contains at least a cured product obtained by a polymerization reaction of the radically polymerizable group of the compound (c1).
• the content of the cured product of the scratch-resistant layer-forming composition in the scratch-resistant layer of the hard coat film of the present invention is preferably 60% by mass or more, preferably 70% by mass or more, based on the total mass of the scratch-resistant layer. More preferably, 80% by mass or more is further preferable.
• the film thickness of the scratch-resistant layer is preferably less than 3.0 ⁇ m, more preferably 0.1 to 2.0 ⁇ m, and preferably 0.1 to 1.0 ⁇ m from the viewpoint of repeated bending resistance. More preferred.
• the method for producing the hard coat film of the present invention is preferably a production method including the following steps (I) and (II).
• the production method further includes the following steps (III) and (IV) in addition to the above steps (I) and (II). .. (III) A step of applying a scratch-resistant layer forming composition containing a radically polymerizable compound (c1) onto the hard coat layer to form a scratch-resistant layer coating film (IV) Curing the scratch-resistant layer coating film.
• step (I) is a step of applying the composition for forming a hard coat layer on a base material to provide a hard coat layer coating film.
• the base material and the composition for forming the hard coat layer are as described above.
• the method for applying the composition for forming a hard coat layer is not particularly limited, and a known method can be used. For example, a dip coating method, an air knife coating method, a curtain coating method, a roller coating method, a wire bar coating method, a gravure coating method, a die coating method and the like can be mentioned.
• Step (II)- Step (II) is a step of forming a hard coat layer by curing the hard coat layer coating film.
• Curing the hard coat layer coating film means polymerizing at least a part of the epoxy groups of the polyorganosylsesquioxane (a1) contained in the hard coat layer coating film.
• the hardening of the hard coat layer coating film is preferably carried out by at least one of irradiation and heating of ionizing radiation, and more preferably by both irradiation and heating of ionizing radiation.
• the type of ionizing radiation is not particularly limited, and examples thereof include X-rays, electron beams, ultraviolet rays, visible light, and infrared rays, but ultraviolet rays are preferably used.
• the hard coat layer coating film is ultraviolet curable, it is preferable to irradiate an ultraviolet lamp with an irradiation amount of 10 mJ / cm 2 to 2000 mJ / cm 2 to cure the curable compound, and the hard coat film is hard.
• the scratch-resistant layer is provided on the coat layer, it is preferable to semi-cure the curable compound. More preferably 50mJ / cm 2 ⁇ 1800mJ / cm 2, further preferably 100mJ / cm 2 ⁇ 1500mJ / cm 2.
• the ultraviolet lamp type a metal halide lamp, a high-pressure mercury lamp, or the like is preferably used.
• the temperature is not particularly limited, but is preferably 80 ° C. or higher and 200 ° C. or lower, more preferably 100 ° C. or higher and 180 ° C. or lower, and further preferably 120 ° C. or higher and 160 ° C. or lower. preferable.
• the oxygen concentration at the time of curing is preferably 0 to 1.0% by volume, more preferably 0 to 0.1% by volume, and most preferably 0 to 0.05% by volume.
• Step (III)- Step (III) is a step of applying a scratch-resistant layer forming composition containing a radically polymerizable compound (c1) onto the hard coat layer to form a scratch-resistant layer coating film.
• the radically polymerizable compound (c1) and the composition for forming a scratch-resistant layer are as described above.
• the method for applying the scratch-resistant layer forming composition is not particularly limited, and a known method can be used. For example, a dip coating method, an air knife coating method, a curtain coating method, a roller coating method, a wire bar coating method, a gravure coating method, a die coating method and the like can be mentioned.
• Step (IV) is a step of forming the scratch-resistant layer by curing the scratch-resistant layer coating film.
• the scratch-resistant layer coating film is preferably cured by at least one of irradiation with ionizing radiation and heating. Irradiation and heating of ionizing radiation are the same as those described in step (II). Curing the scratch-resistant layer coating means polymerizing at least a part of the radical-polymerizable groups of the radical-polymerizable compound (c1) contained in the scratch-resistant layer coating.
• the hard coat film when the hard coat film has a scratch resistant layer on the hard coat layer, it is preferable to semi-cure the hard coat layer coating film in the above step (II). That is, in the step (II), the hard coat layer coating film is semi-cured, and then in the step (III), the scratch resistant layer forming composition is applied onto the semi-cured hard coat layer to apply the scratch resistant layer coating film. Then, in step (IV), it is preferable to cure the scratch-resistant layer coating film and completely cure the hard coat layer.
• semi-curing the hard coat layer coating film means polymerizing only a part of the epoxy groups of the polyorganosylsesquioxane (a1) contained in the hard coat layer coating film. Semi-curing of the hard coat layer coating film can be performed by adjusting the irradiation amount of ionizing radiation and the temperature and time of heating.
• Drying treatment as needed between steps (I) and step (II), between steps (II) and step (III), between steps (III) and step (IV), or after step (IV) May be done.
• the drying process is performed by blowing warm air, arranging in a heating furnace, transporting in a heating furnace, heating with a roller from a surface (base material surface) not provided with a hard coat layer and a scratch resistant layer, and the like. be able to.
• the heating temperature may be set to a temperature at which the solvent can be dried and removed, and is not particularly limited.
• the heating temperature means the temperature of warm air or the atmospheric temperature in the heating furnace.
• the present invention also relates to an article provided with the hard coat film.
• the application of the hard coat film of the present invention is not particularly limited, but it can be used, for example, as a surface protective film for an image display device. Further, as a suitable application in which the above-mentioned characteristics of the hard coat film of the present invention can be utilized, for example, it can be used as a surface protective film of a foldable device (foldable display).
• a foldable device is a device that employs a flexible display whose display screen can be deformed, and the device body (display) can be folded by utilizing the deformability of the display screen. Examples of the foldable device include an organic electroluminescence device and the like.
• ⁇ Preparation of base material> (Manufacturing of polyimide powder) After adding 832 g of N, N-dimethylacetamide (DMAc) to a 1 L reactor equipped with a stirrer, a nitrogen injection device, a dropping funnel, a temperature controller and a cooler under a nitrogen stream, the temperature of the reactor was changed to 25. It was set to °C. To this, 64.046 g (0.2 mol) of bistrifluoromethylbenzidine (TFDB) was added and dissolved.
• DMAc N, N-dimethylacetamide
• TFDB bistrifluoromethylbenzidine
• the organic layer was washed twice with 5 mass% saline (200 g) and twice with pure water (200 g), and then concentrated under reduced pressure to obtain a 50.0 mass% methyl isobutyl ketone (MIBK) solution. 131.1 g of 1 was obtained (yield 93%).
• MIBK methyl isobutyl ketone
• SQ-1-3 was synthesized in the same manner as SQ-1-2 except that the reaction time was changed from 3.5 hours to 8.5 hours.
• SQ-2, SQ-3, and SQ-4-2 were synthesized in the same manner as SQ-1-1 except that the type and amount of the monomer used were changed.
• SQ-4-3 was synthesized in the same manner as SQ-4-1 except that the amount of monomer used was changed and the reaction time was changed from 5 hours to 2.5 hours.
• SQ-5 and SQ-6 were synthesized in the same manner as SQ-4-1 except that the type and amount of the monomer used were changed.
• SQ-1x-1 to 3 were synthesized according to Production Example 1, Production Example 4, and Production Example 2 of JP-A-2018-192704.
• SQ-8 was synthesized in the same manner as SQ-7 except that the type and amount of the monomer used were changed.
• the structural formula, weight average molecular weight (Mw), and T3 / T2 of the polyorganosylsesquioxane used in Examples and Comparative Examples are shown below.
• the ratio of each structural unit is a molar ratio.
• Mw and T3 / T2 are measured by the methods described above, respectively.
• W-1 Megafuck (registered trademark) F-554 (manufactured by DIC, fluorine-containing group / lipophilic group-containing oligomer, nonionic)
• W-2 Surflon (registered trademark) S-243 (manufactured by AGC Seichemical, perfluoroalkyl EO adduct, nonionic property)
• W-1x Megafuck® F-114 (DIC, perfluorobutane sulfonate (small molecule, anionic))
• W-2x Polyflow No.
• W-3x BYK (registered trademark) -SILCLEAN (registered trademark) 3700 (manufactured by Big Chemie, hydroxyl group-containing silicon-modified acrylic)
• W-4x BYK®-307 (manufactured by Big Chemie, polyether-modified polydimethylsiloxane)
• composition 1 for forming a hard coat layer ⁇ Preparation of composition 1 for forming a hard coat layer> CPI-100P (photocationic polymerization initiator), W-1 (leveling agent), and MIBK manufactured by San-Apro Co., Ltd. are added to the MIBK solution containing the polyorganosylsesquioxane (SQ-1-1) obtained above.
• the composition for forming a hard coat layer is added so that the content of each component with respect to the total solid content of the composition for forming a hard coat layer is adjusted to be as shown in Table 1 below, and the composition for forming a hard coat layer having a solid content concentration of 50% by mass is adjusted. I got 1.
• the composition 1 for forming a hard coat layer was bar-coated on a polyimide substrate S-1 having a thickness of 40 ⁇ m using a wire bar # 18 so that the film thickness after curing was 17 ⁇ m. After coating, the coating film was heated at 120 ° C. for 5 minutes. Next, using one high-pressure mercury lamp, ultraviolet rays were irradiated from a height of 18 cm from the surface of the coating film so that the integrated irradiation amount was 600 mJ / cm 2. Further, it was heated at 140 ° C. for 3 hours to cure the coating film. In this way, a hard coat film 1 having a hard coat layer on the base film was produced.
• Examples 2 to 11, Comparative Examples 1 to 11 Hard coats of Examples 2 to 11 and Comparative Examples 1 to 11 in the same manner as in Example 1 except that the type of polyorganosylsesquioxane or the type of leveling agent used was changed to those shown in Table 2 below. Layer-forming compositions 2-11, 1x-11x were prepared. Further, the hard coat films 2 to 11, 1x to the same as in Example 1 except that the hard coat layer forming compositions 2 to 11 and 1x to 11x were used instead of the hard coat layer forming composition 1. 11x was made.
• Haze Haze (all haze) was measured by a haze meter NDH2000 manufactured by Nippon Denshoku Kogyo Co., Ltd. in accordance with JIS K7136: 2000.
• Pencil hardness was evaluated according to JIS K5400. After adjusting the humidity of the hard coat films of each example and comparative example at a temperature of 25 ° C. and a relative humidity of 60% for 2 hours, the test of H to 9H specified in JIS S 6006 was performed at 5 different locations on the surface of the hard coat layer. It was scratched with a pencil under a load of 4.9 N. After that, among the hardnesses of the pencils in which scratches were visually observed at 0 to 2 points, the pencil hardness having the highest hardness was used as the evaluation result, and was described in the following four stages A to D. As for the pencil hardness, the higher the numerical value written before "H", the higher the hardness is preferable. A: 6H or more B: 5H or more and less than 6H C: 4H or more and less than 5H D: less than 4H
• Oil-based black ink was applied to the surface of the hard coat film of each example and comparative example after the test opposite to the hard coat layer, and visually observed with reflected light, the part in contact with the steel wool was scratched.
• the number of times of rubbing was measured and evaluated in the following four stages. The number of rubbing below is the number of round trips. A: No scratches even after rubbing 100 times. B: No scratches even after rubbing 50 times, but scratches after rubbing 100 times. C: No scratches even after rubbing 10 times, but scratches after rubbing 50 times. D: It gets scratched while rubbing 10 times.
• the “content rate (mol%) of the constituent unit (1)” is the ratio of the constituent unit represented by the general formula (1) to the total amount of the siloxane constituent unit in the polyorganosylsesquioxane. Represents (mol%).
• the hard coat films of Examples 1 to 11 had high surface hardness, low haze, and excellent scratch resistance.
• the hard coat films of Comparative Examples 1 to 4 having a weight average molecular weight (Mw) of polyorganosylsesquioxane of less than 15,000 were inferior to those of Examples in at least one of surface hardness and scratch resistance.
• the hard coat films of Comparative Examples 5 to 8 using a leveling agent that was not a nonionic fluorine-containing compound were inferior in surface hardness and scratch resistance as compared with Examples.
• the hard coat film of Comparative Example 9 in which no leveling agent was used was inferior in haze, surface hardness, and scratch resistance as compared with Examples.
• the film was inferior in surface hardness and scratch resistance as compared with the examples.
• a hard coat layer forming composition capable of forming a hard coat film having high surface hardness, low haze, and excellent scratch resistance, formed from the above hard coat layer forming composition. It is possible to provide a hard coat film containing the hard coat layer, a method for producing the hard coat film, and an article provided with the hard coat film.

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