WO2021162736A1 - Compositions, kits, methods and uses for cleaning, disinfecting, sterilizing and/or treating - Google Patents

Compositions, kits, methods and uses for cleaning, disinfecting, sterilizing and/or treating Download PDF

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Publication number
WO2021162736A1
WO2021162736A1 PCT/US2020/037666 US2020037666W WO2021162736A1 WO 2021162736 A1 WO2021162736 A1 WO 2021162736A1 US 2020037666 W US2020037666 W US 2020037666W WO 2021162736 A1 WO2021162736 A1 WO 2021162736A1
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WO
WIPO (PCT)
Prior art keywords
ppm
salt
composition disclosed
hypochlorous acid
available chlorine
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/US2020/037666
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English (en)
French (fr)
Inventor
Hojabr Alimi
Sridhar Govinda PRASAD
Santosh C. Sinha
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Collidion Inc
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Collidion Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to IL295553A priority Critical patent/IL295553A/en
Priority to CA3167941A priority patent/CA3167941A1/en
Priority to KR1020227031498A priority patent/KR20220154113A/ko
Priority to MX2022009895A priority patent/MX2022009895A/es
Priority to JP2022548972A priority patent/JP7676421B2/ja
Priority to AU2020428560A priority patent/AU2020428560A1/en
Priority to CN202080099686.8A priority patent/CN115397241B/zh
Priority to BR112022016156A priority patent/BR112022016156A2/pt
Application filed by Collidion Inc filed Critical Collidion Inc
Priority to EP20918286.4A priority patent/EP4102968A4/en
Priority to US17/904,140 priority patent/US12582123B2/en
Publication of WO2021162736A1 publication Critical patent/WO2021162736A1/en
Anticipated expiration legal-status Critical
Priority to ZA2022/10154A priority patent/ZA202210154B/en
Ceased legal-status Critical Current

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Classifications

    • A—HUMAN NECESSITIES
    • A01—AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
    • A01N—PRESERVATION OF BODIES OF HUMANS OR ANIMALS OR PLANTS OR PARTS THEREOF; BIOCIDES, e.g. AS DISINFECTANTS, AS PESTICIDES OR AS HERBICIDES; PEST REPELLANTS OR ATTRACTANTS; PLANT GROWTH REGULATORS
    • A01N25/00—Biocides, pest repellants or attractants, or plant growth regulators, characterised by their forms, or by their non-active ingredients or by their methods of application, e.g. seed treatment or sequential application; Substances for reducing the noxious effect of the active ingredients to organisms other than pests
    • A01N25/22—Biocides, pest repellants or attractants, or plant growth regulators, characterised by their forms, or by their non-active ingredients or by their methods of application, e.g. seed treatment or sequential application; Substances for reducing the noxious effect of the active ingredients to organisms other than pests containing ingredients stabilising the active ingredients
    • A—HUMAN NECESSITIES
    • A01—AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
    • A01N—PRESERVATION OF BODIES OF HUMANS OR ANIMALS OR PLANTS OR PARTS THEREOF; BIOCIDES, e.g. AS DISINFECTANTS, AS PESTICIDES OR AS HERBICIDES; PEST REPELLANTS OR ATTRACTANTS; PLANT GROWTH REGULATORS
    • A01N59/00—Biocides, pest repellants or attractants, or plant growth regulators containing elements or inorganic compounds
    • A—HUMAN NECESSITIES
    • A01—AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
    • A01N—PRESERVATION OF BODIES OF HUMANS OR ANIMALS OR PLANTS OR PARTS THEREOF; BIOCIDES, e.g. AS DISINFECTANTS, AS PESTICIDES OR AS HERBICIDES; PEST REPELLANTS OR ATTRACTANTS; PLANT GROWTH REGULATORS
    • A01N59/00—Biocides, pest repellants or attractants, or plant growth regulators containing elements or inorganic compounds
    • A01N59/06—Aluminium; Calcium; Magnesium; Compounds thereof
    • A—HUMAN NECESSITIES
    • A01—AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
    • A01N—PRESERVATION OF BODIES OF HUMANS OR ANIMALS OR PLANTS OR PARTS THEREOF; BIOCIDES, e.g. AS DISINFECTANTS, AS PESTICIDES OR AS HERBICIDES; PEST REPELLANTS OR ATTRACTANTS; PLANT GROWTH REGULATORS
    • A01N59/00—Biocides, pest repellants or attractants, or plant growth regulators containing elements or inorganic compounds
    • A01N59/16—Heavy metals; Compounds thereof
    • A—HUMAN NECESSITIES
    • A01—AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
    • A01N—PRESERVATION OF BODIES OF HUMANS OR ANIMALS OR PLANTS OR PARTS THEREOF; BIOCIDES, e.g. AS DISINFECTANTS, AS PESTICIDES OR AS HERBICIDES; PEST REPELLANTS OR ATTRACTANTS; PLANT GROWTH REGULATORS
    • A01N59/00—Biocides, pest repellants or attractants, or plant growth regulators containing elements or inorganic compounds
    • A01N59/16—Heavy metals; Compounds thereof
    • A01N59/20—Copper
    • A—HUMAN NECESSITIES
    • A01—AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
    • A01P—BIOCIDAL, PEST REPELLANT, PEST ATTRACTANT OR PLANT GROWTH REGULATORY ACTIVITY OF CHEMICAL COMPOUNDS OR PREPARATIONS
    • A01P1/00—Disinfectants; Antimicrobial compounds or mixtures thereof
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61L—METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
    • A61L2/00—Disinfection or sterilisation of materials or objects, in general; Accessories therefor
    • A61L2/16—Disinfection or sterilisation of materials or objects, in general; Accessories therefor using chemical substances
    • A61L2/18—Liquid substances
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61L—METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
    • A61L2101/00—Chemical composition of materials used in disinfecting, sterilising or deodorising
    • A61L2101/02—Inorganic materials
    • A61L2101/26—Inorganic materials containing copper
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61L—METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
    • A61L2101/00—Chemical composition of materials used in disinfecting, sterilising or deodorising
    • A61L2101/02—Inorganic materials
    • A61L2101/30—Inorganic materials containing zinc

Definitions

  • compositions Kits, Methods and Uses for Cleaninq, Disinfectinq, Sterilizinq and/or Treatinq
  • Sterilization of a medical device is preferred because this process destroys or eliminates all forms of microbial life.
  • the high temperature and pressures used in sterilization processes are not suitable for heat-sensitive medical device.
  • Such heat-sensitive devices must be cleaned using a disinfection process.
  • one problem associated with currently used disinfection processes is that the type and amounts of disinfectants used are destructive to the medical device. This reduces the overall life-time use of a medical device, ultimately resulting in increased medical costs due to the need to replace the medical device sooner with a new one.
  • a better disinfection method better than currently available methods is needed.
  • the present specification discloses disinfection compositions, methods and uses that provide superior cleaning and disinfection of a hard surfaces of contamination/biofilm and/or a medical device including a heat-sensitive medical device and a device classified as a critical, semi-critical or noncritical item.
  • the disclosed disinfection compositions, methods and uses are less harsh than conventional compositions, methods and uses resulting in a longer lifetime use of a hard surface and/or medical device.
  • the present specification further discloses disinfection compositions, methods and uses that provide superior cleaning and disinfection of tissue and body cavities, such as, e.g., in wound care, pre-operative preparation and surgery, to a skin surface in dermatological applications, to an internal or external body cavity including the peritoneum, respiratory airways, vaginal, bladder and nasal cavity cleaning and disinfection applications, and to an eye in ophthalmological applications.
  • the present specification also discloses compositions, methods and uses to treat an individual.
  • compositions comprising hypochlorous acid or free available chlorine and one or more metallic particles.
  • a composition disclosed herein can further comprise one or more metal salts and/or a phosphate buffer like calcium phosphate or sodium phosphate.
  • compositions comprising hypochlorous acid or free available chlorine and one or more metal salts.
  • a composition disclosed herein can further comprise one or more metallic particles and/or a phosphate buffer like calcium phosphate or sodium phosphate.
  • kits comprising one or more containers including a composition disclosed herein and/or one or more containers including components of a composition disclosed herein.
  • a disclosed kit further comprises one or more delivery or application systems, and/or instructions, and/or a container.
  • composition disclosed herein for use in cleaning, disinfecting and/or sterilizing a device.
  • use of a disclosed composition clean, disinfect and/or sterilize a device for use in cleaning, disinfecting and/or sterilizing a device.
  • composition disclosed herein for use in cleaning, disinfecting and/or sterilizing a surface area.
  • use of a disclosed composition clean, disinfect and/or sterilize a surface area.
  • composition disclosed herein for use in cleaning, disinfecting and/or sterilizing of a wound in an individual.
  • a use of a disclosed composition clean, disinfect and/or sterilize of a wound in an individual disclose a use of a disclosed composition in the manufacture of a medicament to clean, disinfect and/or sterilize of a wound in an individual.
  • composition disclosed herein for use in cleaning, disinfecting and/or sterilizing of an infection in an individual.
  • a use of a disclosed composition clean, disinfect and/or sterilize of an infection in an individual disclose a use of a disclosed composition in the manufacture of a medicament to clean, disinfect and/or sterilize of an infection in an individual.
  • An infection can be a microbial infection.
  • composition disclosed herein for use in treating a wound in an individual.
  • use of a disclosed composition to treat a wound in an individual disclose a use of a disclosed composition in the manufacture of a medicament to treat a wound in an individual.
  • a composition disclosed herein has increased stability and efficacy due to the protection of hypochlorous acid.
  • the composition may protect hypochlorous acid from exposure to harmful agents, including, e.g., organic compounds, reactive compounds, positively charged molecules, or other compounds that promote or facilitate degradation of hypochlorous acid.
  • harmful agents including, e.g., organic compounds, reactive compounds, positively charged molecules, or other compounds that promote or facilitate degradation of hypochlorous acid.
  • the disclosed compositions are stable in blood serum and in plastic packaging material.
  • a synergistic effect in efficacy is observed when hypochlorous acid is protected against this exposure. This significantly improved efficacy allows for lower amounts of hypochlorous acid to be used in the disclosed compositions.
  • hypochlorous acid As concentrations of hypochlorous acid above 350 ppm, particularly above 500 ppm produces instability, the lower amounts of hypochlorous acid used in the disclosed compositions increases stability of the composition even further.
  • a composition disclosed herein is seen as a replacement to any and all prior hypochlorous acid compositions currently in the market or being developed. Uses include cleaning/disinfecting tissue in wound care and surgery, cleaning/disinfecting skin in dermatological applications, cleaning/disinfecting the eye in ophthalmological applications, cleaning/disinfecting hard surfaces of contamination/biofilm, cleaning/disinfecting medical devices of contamination.
  • the stability of a composition disclosed herein may be due to the positively charged atoms of a metallic particle, a metal salt and/or a phosphate buffer like calcium phosphate or sodium phosphate disclosed herein. Such compounds appear to form a strong ionic interaction with the negatively charged (OCI-), and the complex thus formed retains its stability over period of time compared to hypochlorous acid alone, which is a weaker complex in solution relative to a composition disclosed herein. For example, in the presence of copper chloride hypochlorous acid forms copper hypochlorite and HCI and in the presence of zinc chloride hypochlorous acid forms zinc hypochlorite and HCI.
  • hypochlorous acid By replacing sodium hydroxide with calcium oxide, a less basic solution is formed because in the presence of hypochlorous acid calcium oxide forms calcium hypochlorite and water.
  • the reduced levels of base enhances the stability of copper hypochlorite and zinc hypochlorite because there is less base to react with zinc and copper ions, thereby maintaining the stability of copper hypochlorite and zinc hypochlorite.
  • the use of 500 ppm or lower, an in particular 350 ppm or lower of hypochlorous acid further increases the stability of a composition disclosed herein.
  • the improved efficacy of a composition disclosed herein may in part be a result of chemical bond formation of a metallic particle, a metal salt and/or a phosphate buffer like calcium phosphate or sodium phosphate disclosed herein with the substrates thereby providing a long-lasting activity combined with the free OCI(-), which has its own antimicrobial activity.
  • a composition disclosed herein may comprise hypochlorous acid.
  • a weak acid the chemical formula of hypochlorous acid is HOCI, while its molecular formula is written as HCIO.
  • hypochlorous acid is a simple molecule with the central oxygen connected to chlorine and hydrogen atoms through single bonds and has molar mass is 52.46 g/mol.
  • Hypochlorous acid is a colorless solution, and its exact physical properties are variable, depending on the concentration of hypochlorous in solution. Hypochlorous acid reacts with bases to form salts called hypochlorites. For example, sodium hypochlorite (NaOCI), the active ingredient in bleach, is formed by reacting hypochlorous acid with sodium hydroxide. Hypochlorous acid also readily reacts with a variety of organic molecules and biomolecules.
  • NaOCI sodium hypochlorite
  • Hypochlorous acid also readily reacts with a variety of organic molecules and biomolecules.
  • the hypochlorous acid solution can be produced, e.g., by dissolving chlorine in water, hydrolysis of chlorine gas, electrolysis of a salt solution or acidification of hypochloride.
  • stable hypochlorous salts such as, e.g., alkali metal hypochlorites like sodium hypochlorite, calcium hypochlorite, potassium hypochlorite, lithium hypochlorite and magnesium hypochlorite, can be obtained by dissolving chlorine gas into an aqueous alkali metal hydroxide solution, like a sodium hydroxide solution, a calcium hydroxide solution, a potassium hydroxide solution, a lithium hydroxide solution, or a magnesium hydroxide solution.
  • Hypochlorous acid can also be prepared by dissolving dichlorine monoxide in water.
  • hypochlorous acid can also be produced by electrolytically treating a saline solution.
  • an electrical current is applied to a one-, two-, or three-compartment cell comprising a cathode chamber, an anode chamber, and a central saline solution chamber interposed between the other two chambers where each chamber is separated by a semi-permeable membrane.
  • sodium chloride (NaCI) dissociates into negatively charged chloride (Cl-) and positively charged sodium (Na + ).
  • water dissociates into hydroxide (OH-) and hydrogen (H + ) ions are formed.
  • hypochlorous acid HOCI
  • hypochlorite ions O2
  • chlorine CI2 gases
  • HOCI hypochlorous acid
  • O2 hypochlorite ions
  • CI2 chlorine
  • Methods to produce hypochlorous acid are described in, e.g., U.S. Patent Nos 3,914,397, 4,190,638, 4,908,215, 5,322,677, 6,426,066, 7,323,118, 8,062,500, 8,945,630, 9,168,318, and 9,486,479, each of which is hereby incorporated by reference in its entirety.
  • a composition disclosed herein comprises an amount of hypochlorous acid that provides a desired beneficial effect to a composition disclosed herein.
  • a composition disclosed herein comprises hypochlorous acid in an amount of, e.g., 0.05 ppm, 0.10 ppm, 0.15 ppm, 0.20 ppm, 0.25 ppm, 0.30 ppm, 0.35 ppm, 0.40 ppm, 0.45 ppm, 0.50 ppm, 0.55 ppm, 0.60 ppm, 0.65 ppm, 0.70 ppm, 0.75 ppm, 0.80 ppm, 0.85 ppm, 0.90 ppm, 0.95 ppm, 1 ppm, 5 ppm, 10 ppm, 15 ppm, 20 ppm, 25 ppm, 30 ppm, 35 ppm, 40 ppm, 45 ppm, 50 ppm, 55 ppm, 60 ppm, 65 ppm, 70 ppm
  • a composition disclosed herein comprises hypochlorous acid in an amount of, e.g., at least 0.05 ppm, at least 0.10 ppm, at least 0.20 ppm, at least 0.30 ppm, at least 0.40 ppm, at least 0.50 ppm, at least 0.60 ppm, at least 0.70 ppm, at least 0.80 ppm, at least 0.90 ppm, at least 1 ppm, at least 10 ppm, at least 20 ppm, at least 30 ppm, at least 40 ppm, at least 50 ppm, at least 60 ppm, at least 70 ppm, at least 80 ppm, at least 90 ppm, at least 100 ppm, at least 125 ppm, at least 150 ppm, at least 175 ppm, at least 200 ppm, at least 225 ppm, at least 250 ppm, at least 275 ppm, at least 300 ppm, at least 325 ppm,
  • a composition disclosed herein comprises hypochlorous acid in an amount of, e.g., at most 0.05 ppm, at most 0.10 ppm, at most 0.20 ppm, at most 0.30 ppm, at most 0.40 ppm, at most 0.50 ppm, at most 0.60 ppm, at most 0.70 ppm, at most 0.80 ppm, at most 0.90 ppm, at most 1 ppm, at most 10 ppm, at most 20 ppm, at most 30 ppm, at most 40 ppm, at most 50 ppm, at most 60 ppm, at most 70 ppm, at most 80 ppm, at most 90 ppm, at most 100 ppm, at most 125 ppm, at most 150 ppm, at most 175 ppm, at most 200 ppm, at most 225 ppm, at most 250 ppm, at most 275 ppm, at most 300 ppm, at most 325 ppm
  • a composition disclosed herein comprises hypochlorous acid in an amount of from, e.g., about 0.5 ppm to about 20 ppm, about 0.5 ppm to about 25 ppm, about 0.5 ppm to about 30 ppm, about 0.5 ppm to about 35 ppm, about 0.5 ppm to about 40 ppm, about 0.5 ppm to about 45 ppm, about 0.5 ppm to about 50 ppm, about 0.5 ppm to about 55 ppm, about 0.5 ppm to about 60 ppm, about 0.5 ppm to about 65 ppm, about 0.5 ppm to about 70 ppm, about 0.5 ppm to about 75 ppm, about 0.5 ppm to about 80 ppm, about 0.5 ppm to about 85 ppm, about 0.5 ppm to about 90 ppm, about 0.5 ppm to about 95 ppm, about 0.5 ppm to about 100 ppm
  • a composition disclosed herein comprises hypochlorous acid in an amount of from, e.g., about 1 ppm to about 25 ppm, about 1 ppm to about 50 ppm, about 1 ppm to about 75 ppm, about 1 ppm to about 100 ppm, about 1 ppm to about 125 ppm, about 1 ppm to about 150 ppm, about 1 ppm to about 175 ppm, about 1 ppm to about 200 ppm, about 1 ppm to about 225 ppm, about 1 ppm to about 250 ppm, about 1 ppm to about 275 ppm, about 1 ppm to about 300 ppm, about 1 ppm to about 325 ppm, about 1 ppm to about 350 ppm, about 1 ppm to about 375 ppm, about 1 ppm to about 400 ppm, about 10 ppm to about 25 ppm, about 10 ppm to about 50 ppm, about 1 ppm to about 75
  • a composition disclosed herein comprises hypochlorous acid in an amount of, e.g., about 400 ppm to about 500 ppm, about 400 ppm to about 600 ppm, about 400 ppm to about 700 ppm, about 400 ppm to about 800 ppm, about 400 ppm to about 900 ppm, about 400 ppm to about 1 ,000 ppm, about 400 ppm to about 1 ,100 ppm, about 400 ppm to about 1 ,200 ppm, about 400 ppm to about 1 ,300 ppm, about 400 ppm to about 1 ,400 ppm, about 400 ppm to about 1 ,500 ppm, about 400 ppm to about 1 ,600 ppm, about 400 ppm to about 1 ,700 ppm, about 400 ppm to about 1 ,800 ppm, about 400 ppm to about 1 ,900 ppm, about 400 ppm to about 2,000
  • a composition disclosed herein comprises hypochlorous acid in an amount of, e.g., about 0.10%, about 0.11%, about 0.12%, about 0.13%, about 0.14%, about 0.15%, about 0.16%, about 0.17%, about 0.18%, about 0.19%, about 0.2%, about 0.25%, about 0.3%, about 0.35%, about 0.4%, about 0.45%, or about 0.5% by weight of the composition.
  • a composition disclosed herein comprises hypochlorous acid in an amount of, e.g., at least 0.10%, at least 0.11%, at least 0.12%, at least 0.13%, at least 0.14%, at least 0.15%, at least 0.16%, at least 0.17%, at least 0.18%, at least 0.19%, at least 0.2%, at least 0.25%, at least 0.3%, at least 0.35%, at least 0.4%, at least 0.45%, or at least 0.5% by weight of the composition.
  • a composition disclosed herein comprises hypochlorous acid in an amount of, e.g., at most 0.10%, at most 0.11%, at most 0.12%, at most 0.13%, at most 0.14%, at most 0.15%, at most 0.16%, at most 0.17%, at most 0.18%, at most 0.19%, at most 0.2%, at most 0.25%, at most 0.3%, at most 0.35%, at most 0.4%, at most 0.45%, or at most 0.5% by weight of the composition.
  • a composition disclosed herein comprises hypochlorous acid in an amount of, e.g., about 0.10% to about 0.15%, about 0.10% to about 0.20%, about 0.10% to about 0.25%, about 0.10% to about 0.30%, about 0.10% to about 0.35%, about 0.10% to about 0.40%, about 0.10% to about 0.45%, about 0.10% to about 0.50%, about 0.20% to about 0.25%, about 0.20% to about 0.30%, about 0.20% to about 0.35%, about 0.20% to about 0.40%, about 0.20% to about 0.45%, about 0.20% to about 0.50%, about 0.30% to about 0.35%, about 0.30% to about 0.40%, about 0.30% to about 0.45%, about 0.30% to about 0.50%, about 0.40% to about 0.45%, about 0.40% to about 0.50%, or about 0.40% to about 0.50% by weight of the composition.
  • hypochlorous acid in solution may be described as free available chlorine in parts per million.
  • Hypochlorous acid is in equilibrium with hypochlorite ions (GCf) and dissolved chlorine gas (C ).
  • GCf hypochlorite ions
  • C dissolved chlorine gas
  • the extent of the equilibrium is determined predominately by the salt concentration and pH of the solution. Temperature also impacts the ratio of the free chlorine component. Therefore, both FAC and pH need to be known to understand the amount of chlorine present as hypochlorous acid.
  • the pH range is about 4.0 to about 5.6
  • approximately 100% of the available chlorine is present as HOCI.
  • As the pH is lowered below about 4 there is an increase in dissolved chlorine gas (Cb).
  • hypochlorous acid at a pH of about 3, about 90% of the available chlorine is present as hypochlorous acid, at a pH of about 2, about 75% of the available chlorine is present as hypochlorous acid, at a pH of about 1.5, about 50% of the available chlorine is present as hypochlorous acid, while at a pH of about 1 , about 25% of the available chlorine is present as hypochlorous acid.
  • OCf hypochlorite ions
  • hypochlorous acid at a pH a pH of about 6.5, about 90% of the available chlorine is present as hypochlorous acid, at a pH of about 7, about 75% of the available chlorine is present as hypochlorous acid, at a pH of about 7.5, about 50% of the available chlorine is present as hypochlorous acid, while at a pH of about 8, about 25% of the available chlorine is present as hypochlorous acid.
  • the chlorine amount may be measured by methods known in the art, such as a DPD colorimeter method (Lamotte Company, Chestertown, Md.), a UV spectrophotometry method, or other known methods established by the Environmental Protection Agency.
  • a yellow color is formed by the reaction of free chlorine With N,N-diethyl-p-phenylenediamine (DPD) and the intensity is measured With a calibrated calorimeter that provides the output in parts per million. Further addition of potassium iodide turns the solution a pink color to provide the total chlorine value.
  • DPD N,N-diethyl-p-phenylenediamine
  • a composition disclosed herein comprises an amount of free available chlorine that provides a desired beneficial effect to a composition disclosed herein.
  • a composition disclosed herein comprises free available chlorine in an amount of, e.g., 0.05 ppm, 0.10 ppm, 0.15 ppm, 0.20 ppm, 0.25 ppm, 0.30 ppm, 0.35 ppm, 0.40 ppm, 0.45 ppm, 0.50 ppm, 0.55 ppm, 0.60 ppm, 0.65 ppm, 0.70 ppm, 0.75 ppm, 0.80 ppm, 0.85 ppm, 0.90 ppm, 0.95 ppm, 1 ppm, 5 ppm, 10 ppm, 15 ppm, 20 ppm, 25 ppm, 30 ppm, 35 ppm, 40 ppm, 45 ppm, 50 ppm, 55 ppm, 60 ppm, 65 ppm, 70 ppm, 75 pp
  • a composition disclosed herein comprises free available chlorine in an amount of, e.g., at least 0.05 ppm, at least 0.10 ppm, at least 0.20 ppm, at least 0.30 ppm, at least 0.40 ppm, at least 0.50 ppm, at least 0.60 ppm, at least 0.70 ppm, at least 0.80 ppm, at least 0.90 ppm, at least 1 ppm, at least 10 ppm, at least 20 ppm, at least 30 ppm, at least 40 ppm, at least 50 ppm, at least 60 ppm, at least 70 ppm, at least 80 ppm, at least 90 ppm, at least 100 ppm, at least 125 ppm, at least 150 ppm, at least 175 ppm, at least 200 ppm, at least 225 ppm, at least 250 ppm, at least 275 ppm, at least 300 ppm, at least 325 ppm, at least
  • a composition disclosed herein comprises free available chlorine in an amount of, e.g., at most 0.05 ppm, at most 0.10 ppm, at most 0.20 ppm, at most 0.30 ppm, at most 0.40 ppm, at most 0.50 ppm, at most 0.60 ppm, at most 0.70 ppm, at most 0.80 ppm, at most 0.90 ppm, at most 1 ppm, at most 10 ppm, at most 20 ppm, at most 30 ppm, at most 40 ppm, at most 50 ppm, at most 60 ppm, at most 70 ppm, at most 80 ppm, at most 90 ppm, at most 100 ppm, at most 125 ppm, at most 150 ppm, at most 175 ppm, at most 200 ppm, at most 225 ppm, at most 250 ppm, at most 275 ppm, at most 300 ppm, at most 325 ppm, at most
  • a composition disclosed herein comprises free available chlorine in an amount of from, e.g., about 0.5 ppm to about 20 ppm, about 0.5 ppm to about 25 ppm, about 0.5 ppm to about 30 ppm, about 0.5 ppm to about 35 ppm, about 0.5 ppm to about 40 ppm, about 0.5 ppm to about 45 ppm, about 0.5 ppm to about 50 ppm, about 0.5 ppm to about 55 ppm, about 0.5 ppm to about 60 ppm, about 0.5 ppm to about 65 ppm, about 0.5 ppm to about 70 ppm, about 0.5 ppm to about 75 ppm, about 0.5 ppm to about 80 ppm, about 0.5 ppm to about 85 ppm, about 0.5 ppm to about 90 ppm, about 0.5 ppm to about 95 ppm, about 0.5 ppm to about 100 ppm,
  • a composition disclosed herein comprises free available chlorine in an amount of from, e.g., about 1 ppm to about 25 ppm, about 1 ppm to about 50 ppm, about 1 ppm to about 75 ppm, about 1 ppm to about 100 ppm, about 1 ppm to about 125 ppm, about 1 ppm to about 150 ppm, about 1 ppm to about 175 ppm, about 1 ppm to about 200 ppm, about 1 ppm to about 225 ppm, about 1 ppm to about 250 ppm, about 1 ppm to about 275 ppm, about 1 ppm to about 300 ppm, about 1 ppm to about 325 ppm, about 1 ppm to about 350 ppm, about 1 ppm to about 375 ppm, about 1 ppm to about 400 ppm, about 10 ppm to about 25 ppm, about 10 ppm to about 50 ppm, about 1 ppm to about 75 pp
  • a composition disclosed herein comprises free available chlorine in an amount of, e.g., about 400 ppm to about 500 ppm, about 400 ppm to about 600 ppm, about 400 ppm to about 700 ppm, about 400 ppm to about 800 ppm, about 400 ppm to about 900 ppm, about 400 ppm to about 1 ,000 ppm, about 400 ppm to about 1 ,100 ppm, about 400 ppm to about 1 ,200 ppm, about 400 ppm to about 1 ,300 ppm, about 400 ppm to about 1 ,400 ppm, about 400 ppm to about 1 ,500 ppm, about 400 ppm to about 1 ,600 ppm, about 400 ppm to about 1 ,700 ppm, about 400 ppm to about 1 ,800 ppm, about 400 ppm to about 1 ,900 ppm, about 400 ppm to about 2,000 ppm
  • a composition disclosed herein comprises free available chlorine in an amount of, e.g., about 0.10%, about 0.11%, about 0.12%, about 0.13%, about 0.14%, about 0.15%, about 0.16%, about 0.17%, about 0.18%, about 0.19%, about 0.2%, about 0.25%, about 0.3%, about 0.35%, about 0.4%, about 0.45%, or about 0.5% by weight of the composition.
  • a composition disclosed herein comprises free available chlorine in an amount of, e.g., at least 0.10%, at least 0.11%, at least 0.12%, at least 0.13%, at least 0.14%, at least 0.15%, at least 0.16%, at least 0.17%, at least 0.18%, at least 0.19%, at least 0.2%, at least 0.25%, at least 0.3%, at least 0.35%, at least 0.4%, at least 0.45%, or at least 0.5% by weight of the composition.
  • a composition disclosed herein comprises free available chlorine in an amount of, e.g., at most 0.10%, at most 0.11%, at most 0.12%, at most 0.13%, at most 0.14%, at most 0.15%, at most 0.16%, at most 0.17%, at most 0.18%, at most 0.19%, at most 0.2%, at most 0.25%, at most 0.3%, at most 0.35%, at most 0.4%, at most 0.45%, or at most 0.5% by weight of the composition.
  • a composition disclosed herein comprises free available chlorine in an amount of, e.g., about 0.10% to about 0.15%, about 0.10% to about 0.20%, about 0.10% to about 0.25%, about 0.10% to about 0.30%, about 0.10% to about 0.35%, about 0.10% to about 0.40%, about 0.10% to about 0.45%, about 0.10% to about 0.50%, about 0.20% to about 0.25%, about 0.20% to about 0.30%, about 0.20% to about 0.35%, about 0.20% to about 0.40%, about 0.20% to about 0.45%, about 0.20% to about 0.50%, about 0.30% to about 0.35%, about 0.30% to about 0.40%, about 0.30% to about 0.45%, about 0.30% to about 0.50%, about 0.40% to about 0.45%, about 0.40% to about 0.50%, or about 0.40% to about 0.50% by weight of the composition.
  • a composition disclosed herein may comprise metallic particles.
  • a metallic particle can be composed of a single element, such as, e.g., copper, iron, silver, titanium or zinc or be a mixed metallic particle composed of various combinations of different elements, such as, e.g., various combinations of two or more of the following: copper, iron, silver, titanium or zinc.
  • Non-limiting examples of a metallic particle includes a copper particle, an iron particle, a potassium particle, a silver particle, a titanium particle, and a zinc particle.
  • Other non-limiting examples of a metallic particle include a metal acetate particle, a metal chloride particle, a metal nitrate particle, or a metal oxide particle.
  • a metal acetate particle includes, without limitation, copper acetate, iron acetate, e.g. iron (II) acetate and iron (III) acetate, silver acetate, titanium acetate, zinc acetate, or any combination thereof.
  • a metal nitrate particle includes, without limitation, copper nitrate, iron nitrate, e.g., iron (II) nitrate, iron (III) nitrate, silver nitrate, titanium nitrate, zinc nitrate, or any combination thereof.
  • a metal chloride particle includes, without limitation, copper chloride, iron chloride, e.g., iron (II) chloride or iron (III) chloride, silver chloride, titanium chloride, zinc chloride, or any combination thereof.
  • a metal oxide particle includes, without limitation, copper oxide particle, iron oxide particle, e.g., iron (II) oxide particle, iron (III) oxide particle, silver oxide particle, titanium dioxide particle, zinc oxide particle, copper-zinc-calcium oxide particle, or any combination thereof.
  • a metallic particle includes nanoparticles and microparticles.
  • a nanoparticle has an average diameter of about 1 nm to about 1 ,000 nm.
  • a microparticle has an average diameter of about 1 pm to about 1 ,000 pm.
  • a composition disclosed herein comprises an amount of metallic particles that provides a desired beneficial effect to a composition disclosed herein.
  • a composition disclosed herein comprises metallic particles in an amount of, e.g., 0.05 ppm, 0.10 ppm, 0.15 ppm, 0.20 ppm, 0.25 ppm, 0.30 ppm, 0.35 ppm, 0.40 ppm, 0.45 ppm, 0.50 ppm, 0.55 ppm, 0.60 ppm, 0.65 ppm, 0.70 ppm, 0.75 ppm, 0.80 ppm, 0.85 ppm, 0.90 ppm, 0.95 ppm, 1 ppm, 5 ppm, 10 ppm, 15 ppm, 20 ppm, 25 ppm, 30 ppm, 35 ppm, 40 ppm, 45 ppm, 50 ppm, 55 ppm, 60 ppm, 65 ppm, 70 ppm, 75 ppm,
  • a composition disclosed herein comprises metallic particles in an amount of, e.g., at least 0.05 ppm, at least 0.10 ppm, at least 0.20 ppm, at least 0.30 ppm, at least 0.40 ppm, at least 0.50 ppm, at least 0.60 ppm, at least 0.70 ppm, at least 0.80 ppm, at least 0.90 ppm, at least 1 ppm, at least 10 ppm, at least 20 ppm, at least 30 ppm, at least 40 ppm, at least 50 ppm, at least 60 ppm, at least 70 ppm, at least 80 ppm, at least 90 ppm, at least 100 ppm, at least 125 ppm, at least 150 ppm, at least 175 ppm, at least 200 ppm, at least 225 ppm, at least 250 ppm, at least 275 ppm, at least 300 ppm, at least 325 ppm, at least 350
  • a composition disclosed herein comprises metallic particles in an amount of, e.g., at most 0.05 ppm, at most 0.10 ppm, at most 0.20 ppm, at most 0.30 ppm, at most 0.40 ppm, at most 0.50 ppm, at most 0.60 ppm, at most 0.70 ppm, at most 0.80 ppm, at most 0.90 ppm, at most 1 ppm, at most 10 ppm, at most 20 ppm, at most 30 ppm, at most 40 ppm, at most 50 ppm, at most 60 ppm, at most 70 ppm, at most 80 ppm, at most 90 ppm, at most 100 ppm, at most 125 ppm, at most 150 ppm, at most 175 ppm, at most 200 ppm, at most 225 ppm, at most 250 ppm, at most 275 ppm, at most 300 ppm, at most 325 ppm, at most
  • a composition disclosed herein comprises metallic particles in an amount of from, e.g., about 0.5 ppm to about 20 ppm, about 0.5 ppm to about 25 ppm, about 0.5 ppm to about 30 ppm, about 0.5 ppm to about 35 ppm, about 0.5 ppm to about 40 ppm, about 0.5 ppm to about 45 ppm, about 0.5 ppm to about 50 ppm, about 0.5 ppm to about 55 ppm, about 0.5 ppm to about 60 ppm, about 0.5 ppm to about 65 ppm, about 0.5 ppm to about 70 ppm, about 0.5 ppm to about 75 ppm, about 0.5 ppm to about 80 ppm, about 0.5 ppm to about 85 ppm, about 0.5 ppm to about 90 ppm, about 0.5 ppm to about 95 ppm, about 0.5 ppm to about 100 ppm, about
  • a composition disclosed herein comprises metallic particles in an amount of from, e.g., about 1 ppm to about 25 ppm, about 1 ppm to about 50 ppm, about 1 ppm to about 75 ppm, about 1 ppm to about 100 ppm, about 1 ppm to about 125 ppm, about 1 ppm to about 150 ppm, about 1 ppm to about 175 ppm, about 1 ppm to about 200 ppm, about 1 ppm to about 225 ppm, about 1 ppm to about 250 ppm, about 1 ppm to about 275 ppm, about 1 ppm to about 300 ppm, about 1 ppm to about 325 ppm, about 1 ppm to about 350 ppm, about 1 ppm to about 375 ppm, about 1 ppm to about 400 ppm, about 1 ppm to about 425 ppm, about 1 ppm to about 450 ppm
  • a composition disclosed herein comprises metallic particles in an amount of, e.g., about 400 ppm to about 500 ppm, about 400 ppm to about 600 ppm, about 400 ppm to about 700 ppm, about 400 ppm to about 800 ppm, about 400 ppm to about 900 ppm, about 400 ppm to about 1 ,000 ppm, about 400 ppm to about 1 ,100 ppm, about 400 ppm to about 1 ,200 ppm, about 400 ppm to about 1 ,300 ppm, about 400 ppm to about 1 ,400 ppm, about 400 ppm to about 1 ,500 ppm, about 400 ppm to about 1 ,600 ppm, about 400 ppm to about 1 ,700 ppm, about 400 ppm to about 1 ,800 ppm, about 400 ppm to about 1 ,900 ppm, about 400 ppm to about 2,000 ppm,
  • a composition disclosed herein comprises metallic particles in an amount of, e.g., 0.05 mg/L, 0.10 mg/L, 0.15 mg/L, 0.20 mg/L, 0.25 mg/L, 0.30 mg/L, 0.35 mg/L, 0.40 mg/L, 0.45 mg/L, 0.50 mg/L, 0.55 mg/L, 0.60 mg/L, 0.65 mg/L, 0.70 mg/L, 0.75 mg/L, 0.80 mg/L, 0.85 mg/L, 0.90 mg/L, 0.95 mg/L, 1 mg/L, 5 mg/L, 10 mg/L, 15 mg/L, 20 mg/L, 25 mg/L, 30 mg/L, 35 mg/L, 40 mg/L, 45 mg/L, 50 mg/L, 55 mg/L, 60 mg/L, 65 mg/L, 70 mg/L, 75 mg/L, 80 mg/L, 85 mg/L, 90 mg/L, 95 mg/L, 100 mg/L, 125 mg/L,
  • a composition disclosed herein comprises metallic particles in an amount of, e.g., at least 0.05 mg/L, at least 0.10 mg/L, at least 0.20 mg/L, at least 0.30 mg/L, at least 0.40 mg/L, at least 0.50 mg/L, at least 0.60 mg/L, at least 0.70 mg/L, at least 0.80 mg/L, at least 0.90 mg/L, at least 1 mg/L, at least 10 mg/L, at least 20 mg/L, at least 30 mg/L, at least 40 mg/L, at least 50 mg/L, at least 60 mg/L, at least 70 mg/L, at least 80 mg/L, at least 90 mg/L, at least 100 mg/L, at least 125 mg/L, at least 150 mg/L, at least 175 mg/L, at least 200 mg/L, at least 225 mg/L, at least 250 mg/L, at least 275 mg/L, at least 300 mg/L, at least 325 mg/L, at least 350
  • a composition disclosed herein comprises metallic particles in an amount of, e.g., at most 0.05 mg/L, at most 0.10 mg/L, at most 0.20 mg/L, at most 0.30 mg/L, at most 0.40 mg/L, at most 0.50 mg/L, at most 0.60 mg/L, at most 0.70 mg/L, at most 0.80 mg/L, at most 0.90 mg/L, at most 1 mg/L, at most 10 mg/L, at most 20 mg/L, at most 30 mg/L, at most 40 mg/L, at most 50 mg/L, at most 60 mg/L, at most 70 mg/L, at most 80 mg/L, at most 90 mg/L, at most 100 mg/L, at most 125 mg/L, at most 150 mg/L, at most 175 mg/L,
  • a composition disclosed herein comprises metallic particles in an amount of from, e.g., about 0.5 mg/L to about 20 mg/L, about 0.5 mg/L to about 25 mg/L, about 0.5 mg/L to about 30 mg/L, about 0.5 mg/L to about 35 mg/L, about 0.5 mg/L to about 40 mg/L, about 0.5 mg/L to about 45 mg/L, about 0.5 mg/L to about 50 mg/L, about 0.5 mg/L to about 55 mg/L, about 0.5 mg/L to about 60 mg/L, about 0.5 mg/L to about 65 mg/L, about 0.5 mg/L to about 70 mg/L, about 0.5 mg/L to about 75 mg/L, about 0.5 mg/L to about 80 mg/L, about 0.5 mg/L to about 85 mg/L, about 0.5 mg/L to about 90 mg/L, about 0.5 mg/L to about 95 mg/L, about 0.5 mg/L to about 100 mg/L, about
  • a composition disclosed herein comprises metallic particles in an amount of from, e.g., about 1 mg/L to about 25 mg/L, about 1 mg/L to about 50 mg/L, about 1 mg/L to about 75 mg/L, about 1 mg/L to about 100 mg/L, about 1 mg/L to about 125 mg/L, about 1 mg/L to about 150 mg/L, about 1 mg/L to about 175 mg/L, about 1 mg/L to about 200 mg/L, about 1 mg/L to about 225 mg/L, about 1 mg/L to about 250 mg/L, about 1 mg/L to about 275 mg/L, about 1 mg/L to about 300 mg/L, about 1 mg/L to about 325 mg/L, about 1 mg/L to about 350 mg/L, about 1 mg/L to about 375 mg/L, about 1 mg/L to about 400 mg/L, about 10 mg/L to about 25 mg/L, about 10 mg/L to about 50 mg/L, about 1 mg/L to about 75 mg/L
  • a composition disclosed herein comprises metallic particles in an amount of, e.g., about 400 mg/L to about 500 mg/L, about 400 mg/L to about 600 mg/L, about 400 mg/L to about 700 mg/L, about 400 mg/L to about 800 mg/L, about 400 mg/L to about 900 mg/L, about 400 mg/L to about 1 ,000 mg/L, about 400 mg/L to about 1 ,100 mg/L, about 400 mg/L to about 1 ,200 mg/L, about 400 mg/L to about 1 ,300 mg/L, about 400 mg/L to about 1 ,400 mg/L, about 400 mg/L to about 1 ,500 mg/L, about 400 mg/L to about 1 ,600 mg/L, about 400 mg/L to about 1 ,700 mg/L, about 400 mg/L to about 1 ,800 mg/L, about 400 mg/L to about 1 ,900 mg/L, about 400 mg/L to about 2,000 mg/L,
  • a composition disclosed herein comprises metallic particles in an amount of, e.g., about 0.10%, about 0.11%, about 0.12%, about 0.13%, about 0.14%, about 0.15%, about 0.16%, about 0.17%, about 0.18%, about 0.19%, about 0.2%, about 0.25%, about 0.3%, about 0.35%, about 0.4%, about 0.45%, or about 0.5% by weight of the composition.
  • a composition disclosed herein comprises metallic particles in an amount of, e.g., at least 0.10%, at least 0.11%, at least 0.12%, at least 0.13%, at least 0.14%, at least 0.15%, at least 0.16%, at least 0.17%, at least 0.18%, at least 0.19%, at least 0.2%, at least 0.25%, at least 0.3%, at least 0.35%, at least 0.4%, at least 0.45%, or at least 0.5% by weight of the composition.
  • a composition disclosed herein comprises metallic particles in an amount of, e.g., at most 0.10%, at most 0.11%, at most 0.12%, at most 0.13%, at most 0.14%, at most 0.15%, at most 0.16%, at most 0.17%, at most 0.18%, at most 0.19%, at most 0.2%, at most 0.25%, at most 0.3%, at most 0.35%, at most 0.4%, at most 0.45%, or at most 0.5% by weight of the composition.
  • a composition disclosed herein comprises metallic particles in an amount of, e.g., about 0.10% to about 0.15%, about 0.10% to about 0.20%, about 0.10% to about 0.25%, about 0.10% to about 0.30%, about 0.10% to about 0.35%, about 0.10% to about 0.40%, about 0.10% to about 0.45%, about 0.10% to about 0.50%, about 0.20% to about 0.25%, about 0.20% to about 0.30%, about 0.20% to about 0.35%, about 0.20% to about 0.40%, about 0.20% to about 0.45%, about 0.20% to about 0.50%, about 0.30% to about 0.35%, about 0.30% to about 0.40%, about 0.30% to about 0.45%, about 0.30% to about 0.50%, about 0.40% to about 0.45%, about 0.40% to about 0.50%, or about 0.40% to about 0.50% by weight of the composition.
  • metallic particles can be of any size that provides a desired beneficial effect to a composition disclosed herein.
  • metallic particles disclosed herein have a mean diameter of, e.g., about 10 nm, about 20 nm, about 30 nm, about 40 nm, about 50 nm, about 60 nm, about 70 nm, about 80 nm, about 90 nm, about 100 nm.
  • metallic particles disclosed herein have a mean diameter of, e.g., at least 10 nm, at least 20 nm, at least 30 nm, at least 40 nm, at least 50 nm, at least 60 nm, at least 70 nm, at least 80 nm, at least 90 nm, at least 100 nm.
  • metallic particles disclosed herein have a mean diameter of, e.g., at most 10 nm, at most 20 nm, at most 30 nm, at most 40 nm, at most 50 nm, at most 60 nm, at most 70 nm, at most 80 nm, at most 90 nm, at most 100 nm.
  • metallic particles disclosed herein have a mean diameter of, e.g., about 10 nm to about 20 nm, about 10 nm to about 30 nm, about 10 nm to about 40 nm, about 10 nm to about 50 nm, about 10 nm to about 60 nm, about 10 nm to about 70 nm, about 10 nm to about 80 nm, about 10 nm to about 90 nm, about 10 nm to about 100 nm, about 20 nm to about 30 nm, about 20 nm to about 40 nm, about 20 nm to about 50 nm, about 20 nm to about 60 nm, about 20 nm to about 70 nm, about 20 nm to about 80 nm, about 20 nm to about 90 nm, about 20 nm to about 100 nm, about 30 nm to about 40 nm, about 30 nm to about 50 nm, about
  • composition disclosed herein does not comprise metallic particles.
  • a composition disclosed herein may comprise a metal salt.
  • a metal salt disclosed herein can be an alkali metal salt, an alkaline earth metal salt, a base metal salt, or a transition metal salt.
  • An alkali metal salt includes a lithium salt, a sodium salt, a potassium salt, a rubidium salt, a cesium salt, and a francium salt.
  • An alkaline earth metal salt includes a beryllium salt, a magnesium salt, a calcium salt, a strontium salt, a barium salt, and a radium salt.
  • a basic metal salt includes an aluminum salt, a gallium salt, an indium salt, a tin salt, a thallium salt, a lead salt, and a bismuth salt.
  • a transition metal salt includes a scandium salt, a titanium salt, a vanadium salt, a chromium salt, a manganese salt, an iron salt, a cobalt salt, a palladium salt, a silver salt, m a nickel salt, a copper salt, a zinc salt, a yttrium salt,
  • a metal salt includes a calcium salt, a copper salt, iron salt, a potassium salt, silver salt, titanium salt, and zinc salt.
  • a metal salt includes a metal acetate salt, a metal chloride salt, a metal nitrate salt, a metal oxide salt, and a metal sulfate salt.
  • a metal acetate salt includes, without limitation, calcium acetate, copper acetate, iron acetate, e.g., iron (II) acetate and iron (III) acetate, potassium acetate, silver acetate, titanium acetate, and zinc acetate.
  • a metal chloride salt includes, without limitation, calcium chloride, copper chloride, iron chloride, e.g., iron (II) chloride or iron (III) chloride, potassium chloride, silver chloride, titanium chloride, and zinc chloride.
  • a metal nitrate salt includes, without limitation, calcium oxide salt, copper nitrate, iron nitrate, e.g., iron (II) nitrate, iron (III) nitrate, potassium nitrate, silver nitrate, titanium nitrate, and zinc nitrate.
  • a metal oxide salt includes, without limitation, calcium oxide salt, copper oxide salt, iron oxide salt, e.g., iron (II) oxide salt, iron (III) oxide salt, potassium oxide salt, silver oxide salt, titanium oxide salt, and zinc oxide salt.
  • a metal sulfate salt includes, without limitation, calcium sulfate, copper sulfate, iron sulfate, e.g., iron (II) sulfate, iron (III) sulfate, potassium sulfate, silver sulfate, titanium sulfate, and zinc sulfate.
  • a composition may include calcium oxide obtained from an organic source like shells from oceanic organisms.
  • a composition may include calcium oxide obtain from an inorganic source like by a synthetic chemical process.
  • a composition disclosed herein comprises an amount of a metal salt that provides a desired beneficial effect to a composition disclosed herein.
  • a composition disclosed herein comprises a metal salt in an amount of, e.g., 0.05 ppm, 0.10 ppm, 0.15 ppm, 0.20 ppm, 0.25 ppm, 0.30 ppm, 0.35 ppm, 0.40 ppm, 0.45 ppm, 0.50 ppm, 0.55 ppm, 0.60 ppm, 0.65 ppm, 0.70 ppm, 0.75 ppm, 0.80 ppm, 0.85 ppm, 0.90 ppm, 0.95 ppm, 1 ppm, 5 ppm, 10 ppm, 15 ppm, 20 ppm, 25 ppm, 30 ppm, 35 ppm, 40 ppm, 45 ppm, 50 ppm, 55 ppm, 60 ppm, 65 ppm, 70 ppm, 75
  • a composition disclosed herein comprises a metal salt in an amount of, e.g., at least 0.05 ppm, at least 0.10 ppm, at least 0.20 ppm, at least 0.30 ppm, at least 0.40 ppm, at least 0.50 ppm, at least 0.60 ppm, at least 0.70 ppm, at least 0.80 ppm, at least 0.90 ppm, at least 1 ppm, at least 10 ppm, at least 20 ppm, at least 30 ppm, at least 40 ppm, at least 50 ppm, at least 60 ppm, at least 70 ppm, at least 80 ppm, at least 90 ppm, at least 100 ppm, at least 125 ppm, at least 150 ppm, at least 175 ppm, at least 200 ppm, at least 225 ppm, at least 250 ppm, at least 275 ppm, at least 300 ppm, at least 325 ppm, at
  • a composition disclosed herein comprises a metal salt in an amount of, e.g., at most 0.05 ppm, at most 0.10 ppm, at most 0.20 ppm, at most 0.30 ppm, at most 0.40 ppm, at most 0.50 ppm, at most 0.60 ppm, at most 0.70 ppm, at most 0.80 ppm, at most 0.90 ppm, at most 1 ppm, at most 10 ppm, at most 20 ppm, at most 30 ppm, at most 40 ppm, at most 50 ppm, at most 60 ppm, at most 70 ppm, at most 80 ppm, at most 90 ppm, at most 100 ppm, at most 125 ppm, at most 150 ppm, at most 175 ppm, at most 200 ppm, at most 225 ppm, at most 250 ppm, at most 275 ppm, at most 300 ppm, at most 325 ppm,
  • a composition disclosed herein comprises a metal salt in an amount of from, e.g., about 0.5 ppm to about 20 ppm, about 0.5 ppm to about 25 ppm, about 0.5 ppm to about 30 ppm, about 0.5 ppm to about 35 ppm, about 0.5 ppm to about 40 ppm, about 0.5 ppm to about 45 ppm, about 0.5 ppm to about 50 ppm, about 0.5 ppm to about 55 ppm, about 0.5 ppm to about 60 ppm, about 0.5 ppm to about 65 ppm, about 0.5 ppm to about 70 ppm, about 0.5 ppm to about 75 ppm, about 0.5 ppm to about 80 ppm, about 0.5 ppm to about 85 ppm, about 0.5 ppm to about 90 ppm, about 0.5 ppm to about 95 ppm, about 0.5 ppm to about 100 ppm
  • a composition disclosed herein comprises a metal salt in an amount of from, e.g., about 1 ppm to about 25 ppm, about 1 ppm to about 50 ppm, about 1 ppm to about 75 ppm, about 1 ppm to about 100 ppm, about 1 ppm to about 125 ppm, about 1 ppm to about 150 ppm, about 1 ppm to about 175 ppm, about 1 ppm to about 200 ppm, about 1 ppm to about 225 ppm, about 1 ppm to about 250 ppm, about 1 ppm to about 275 ppm, about 1 ppm to about 300 ppm, about 1 ppm to about 325 ppm, about 1 ppm to about 350 ppm, about 1 ppm to about 375 ppm, about 1 ppm to about 400 ppm, about 1 ppm to about 425 ppm, about 1 ppm to about 450 ppm, about 1 ppm to about
  • a composition disclosed herein comprises a metal salt in an amount of, e.g., about 400 ppm to about 500 ppm, about 400 ppm to about 600 ppm, about 400 ppm to about 700 ppm, about 400 ppm to about 800 ppm, about 400 ppm to about 900 ppm, about 400 ppm to about 1 ,000 ppm, about 400 ppm to about 1 ,100 ppm, about 400 ppm to about 1 ,200 ppm, about 400 ppm to about 1 ,300 ppm, about 400 ppm to about 1 ,400 ppm, about 400 ppm to about 1 ,500 ppm, about 400 ppm to about 1 ,600 ppm, about 400 ppm to about 1 ,700 ppm, about 400 ppm to about 1 ,800 ppm, about 400 ppm to about 1 ,900 ppm, about 400 ppm to about 2,000 ppm
  • a composition disclosed herein comprises a metal salt in an amount of, e.g., about 0.10%, about 0.11%, about 0.12%, about 0.13%, about 0.14%, about 0.15%, about 0.16%, about 0.17%, about 0.18%, about 0.19%, about 0.2%, about 0.25%, about 0.3%, about 0.35%, about 0.4%, about 0.45%, or about 0.5% by weight of the composition.
  • a composition disclosed herein comprises a metal salt in an amount of, e.g., at least 0.10%, at least 0.11%, at least 0.12%, at least 0.13%, at least 0.14%, at least 0.15%, at least 0.16%, at least 0.17%, at least 0.18%, at least 0.19%, at least 0.2%, at least 0.25%, at least 0.3%, at least 0.35%, at least 0.4%, at least 0.45%, or at least 0.5% by weight of the composition.
  • a composition disclosed herein comprises a metal salt in an amount of, e.g., at most 0.10%, at most 0.11%, at most 0.12%, at most 0.13%, at most 0.14%, at most 0.15%, at most 0.16%, at most 0.17%, at most 0.18%, at most 0.19%, at most 0.2%, at most 0.25%, at most 0.3%, at most 0.35%, at most 0.4%, at most 0.45%, or at most 0.5% by weight of the composition.
  • a composition disclosed herein comprises a metal salt in an amount of, e.g., about 0.10% to about 0.15%, about 0.10% to about 0.20%, about 0.10% to about 0.25%, about 0.10% to about 0.30%, about 0.10% to about 0.35%, about 0.10% to about 0.40%, about 0.10% to about 0.45%, about 0.10% to about 0.50%, about 0.20% to about 0.25%, about 0.20% to about 0.30%, about 0.20% to about 0.35%, about 0.20% to about 0.40%, about 0.20% to about 0.45%, about 0.20% to about 0.50%, about 0.30% to about 0.35%, about 0.30% to about 0.40%, about 0.30% to about 0.45%, about 0.30% to about 0.50%, about 0.40% to about 0.45%, about 0.40% to about 0.50%, or about 0.40% to about 0.50% by weight of the composition.
  • composition disclosed herein does not comprise metal salts.
  • a composition disclosed herein may comprise a phosphate buffer.
  • a phosphate buffer or phosphate buffer solution is especially sensitive to pH changes, and thus is useful for biological applications.
  • a phosphate buffer can be adapted to a variety of pH levels, including isotonic. This wide range is due to phosphoric acid having 3 dissociation constants (pKa) allowing for formulation of buffers near each of the pH levels of 2.15, 7.21 , or 12.32.
  • Monosodium phosphate and its conjugate base, disodium phosphate are usually used to generate buffers of pH values around 7.
  • Non-limiting examples of a phosphate buffer include a calcium phosphate buffer and a sodium phosphate buffer.
  • a composition disclosed herein comprises an amount of a phosphate buffer that provides a desired beneficial effect to a composition disclosed herein.
  • a composition disclosed herein comprises a phosphate buffer in an amount of, e.g., 0.05 ppm, 0.10 ppm, 0.15 ppm, 0.20 ppm, 0.25 ppm, 0.30 ppm, 0.35 ppm, 0.40 ppm, 0.45 ppm, 0.50 ppm, 0.55 ppm, 0.60 ppm, 0.65 ppm, 0.70 ppm, 0.75 ppm, 0.80 ppm, 0.85 ppm, 0.90 ppm, 0.95 ppm, 1 ppm, 5 ppm, 10 ppm, 15 ppm, 20 ppm, 25 ppm, 30 ppm, 35 ppm, 40 ppm, 45 ppm, 50 ppm, 55 ppm, 60 ppm, 65 ppm, 70
  • a composition disclosed herein comprises a phosphate buffer in an amount of, e.g., at least 0.05 ppm, at least 0.10 ppm, at least 0.20 ppm, at least 0.30 ppm, at least 0.40 ppm, at least 0.50 ppm, at least 0.60 ppm, at least 0.70 ppm, at least 0.80 ppm, at least 0.90 ppm, at least 1 ppm, at least 10 ppm, at least 20 ppm, at least 30 ppm, at least 40 ppm, at least 50 ppm, at least 60 ppm, at least 70 ppm, at least 80 ppm, at least 90 ppm, at least 100 ppm, at least 125 ppm, at least 150 ppm, at least 175 ppm, at least 200 ppm, at least 225 ppm, at least 250 ppm, at least 275 ppm, at least 300 ppm, at least 325 ppm
  • a composition disclosed herein comprises a phosphate buffer in an amount of, e.g., at most 0.05 ppm, at most 0.10 ppm, at most 0.20 ppm, at most 0.30 ppm, at most 0.40 ppm, at most 0.50 ppm, at most 0.60 ppm, at most 0.70 ppm, at most 0.80 ppm, at most 0.90 ppm, at most 1 ppm, at most 10 ppm, at most 20 ppm, at most 30 ppm, at most 40 ppm, at most 50 ppm, at most 60 ppm, at most 70 ppm, at most 80 ppm, at most 90 ppm, at most 100 ppm, at most 125 ppm, at most 150 ppm, at most 175 ppm, at most 200 ppm, at most 225 ppm, at most 250 ppm, at most 275 ppm, at most 300 ppm, at most 325 ppm, at most 0.05
  • a composition disclosed herein comprises a phosphate buffer in an amount of from, e.g., about 0.5 ppm to about 20 ppm, about 0.5 ppm to about 25 ppm, about 0.5 ppm to about 30 ppm, about 0.5 ppm to about 35 ppm, about 0.5 ppm to about 40 ppm, about 0.5 ppm to about 45 ppm, about 0.5 ppm to about 50 ppm, about 0.5 ppm to about 55 ppm, about 0.5 ppm to about 60 ppm, about 0.5 ppm to about 65 ppm, about 0.5 ppm to about 70 ppm, about 0.5 ppm to about 75 ppm, about 0.5 ppm to about 80 ppm, about 0.5 ppm to about 85 ppm, about 0.5 ppm to about 90 ppm, about 0.5 ppm to about 95 ppm, about 0.5 ppm to about 100
  • a composition disclosed herein comprises a phosphate buffer in an amount of from, e.g., about 1 ppm to about 25 ppm, about 1 ppm to about 50 ppm, about 1 ppm to about 75 ppm, about 1 ppm to about 100 ppm, about 1 ppm to about 125 ppm, about 1 ppm to about 150 ppm, about 1 ppm to about 175 ppm, about 1 ppm to about 200 ppm, about 1 ppm to about 225 ppm, about 1 ppm to about 250 ppm, about 1 ppm to about 275 ppm, about 1 ppm to about 300 ppm, about 1 ppm to about 325 ppm, about 1 ppm to about 350 ppm, about 1 ppm to about 375 ppm, about 1 ppm to about 400 ppm, about 10 ppm to about 25 ppm, about 10 ppm to about 50 ppm, about 1 ppm to about
  • a composition disclosed herein does not comprise a phosphate buffer. In an embodiment, a composition disclosed herein does not comprise a calcium phosphate buffer. In an embodiment, a composition disclosed herein does not comprise a sodium phosphate buffer.
  • a composition disclosed herein does not comprise ozone. In another embodiment, a composition disclosed herein can comprise ozone. [060] In one embodiment, a composition disclosed herein does not comprise hydrogen peroxide. In another embodiment, a composition disclosed herein can comprise hydrogen peroxide.
  • a composition disclosed herein does not comprise a quaternary compound. In an embodiment, a composition disclosed herein does not comprise a silicon quaternary compound. In an embodiment, a composition disclosed herein does not comprise a quaternary compound or a silicon quaternary compound.
  • a composition disclosed herein does not comprise a guanide-containing compound. In another embodiment, a composition disclosed herein does not comprise biguanide. In another embodiment, a composition disclosed herein does not comprise a biguanide-containing compound. In another embodiment, a composition disclosed herein does not comprise biguanidine. In another embodiment, a composition disclosed herein does not comprise a biguanidine-containing compound. In another embodiment, a composition disclosed herein does not comprise triguanide. In another embodiment, a composition disclosed herein does not comprise a triguanide-containing compound.
  • composition disclosed herein does not comprise an alcohol.
  • a composition disclosed herein may comprise a carrier.
  • a carrier also known as a vehicle, can be any material typically known in the skin care, cosmetic and medical arts that is used as a base to formulate a composition disclosed herein.
  • a carrier may be an aqueous carrier, a semi-solid carrier or a solid carrier.
  • a carrier can also provide a skin care benefit as disclosed herein.
  • a carrier includes, without limitation, water, a vegetable oil, a mineral oil, an ester oil, an ether, an alcohol, a fatty alcohol, an isoparaffin, a hydrocarbon oil, a polyol, and a wax.
  • Non-limiting examples of an ester oil include octal palmitate, isopropyl myristate and isopropyl palmitate.
  • Non-limiting examples of an ether includes dicapryl ether and dimethyl isosorbide.
  • Non-limiting examples of an alcohol includes ethanol and isopropanol.
  • Non-limiting examples of a fatty alcohol include cetyl alcohol, cetearyl alcohol, stearyl alcohol and behenyl alcohol.
  • Non-limiting examples of an isoparaffin include isooctane, isododecane (IDD) and isohexadecane.
  • Non-limiting examples of a hydrocarbon oil include mineral oil, petrolatum, isoeicosane and a polyolefin, including (hydrogenated) polyisobutene.
  • Non-limiting examples of a polyol include propylene glycol, glycerin, butylene glycol, pentylene glycol, hexylene glycol, caprylyl glycol.
  • Non-limiting examples of a wax include beeswax, carnauba, ozokerite, microcrystalline wax, polyethylene wax, and a botanical wax.
  • a single carrier is present in a composition disclosed herein.
  • a plurality of carriers is present in a composition disclosed herein.
  • a composition disclosed herein comprises, e.g., one or more carriers, two or more carriers, three or more carriers, four or more carriers or five or more carriers.
  • a composition disclosed herein comprises, e.g., only one carrier, at most two carriers, at most three carriers, at most four carriers, or at most five carriers.
  • a composition disclosed herein comprises from, e.g., 1 to 2 carriers, 1 to 3 carriers, 1 to 4 carriers, 1 to 5 carriers, 2 to 3 carriers, 2 to 4 carriers, 2 to 5 carriers, 3 to 4 carriers, 3 to 5 carriers or 4 to 5 carriers.
  • a composition disclosed herein comprises an amount of carrier that provides a desired formulative or beneficial effect to a composition disclosed herein.
  • a composition disclosed herein comprises a carrier in an amount of, e.g., at least 5%, at least 10%, at least 15%, at least 20%, at least 25%, at least 30%, at least 35%, at least 40%, at least 45%, at least 50%, at least 55%, at least 60%, at least 65%, at least 70%, at least 75%, at least 80%, at least 85%, at least 90%, at least 95%, at least 96%, at least 97%, at least 98% or at least 99% by weight of the composition.
  • a composition disclosed herein comprises a carrier in an amount of, e.g., at most 5%, at most 10%, at most 15%, at most 20%, at most 25%, at most 30%, at most 35%, at most 40%, at most 45%, at most 50%, at most 55%, at most 60%, at most 65%, at most 70%, at most 75%, at most 80%, at most 85%, at most 90%, at most 95%, at most 96%, at most 97%, at most 98% or at most 99% by weight of the composition.
  • a composition disclosed herein comprises a carrier in an amount of from, e.g., about 5% to about 25%, about 5% to about 50%, about 5% to about 75%, about 5% to about 90%, about 5% to about 95%, about 5% to about 96%, about 5% to about 97%, about 5% to about 98%, about 5% to about 99%, about 25% to about 50%, about 25% to about 75%, about 25% to about 90%, about 25% to about 95%, about 25% to about 96%, about
  • a composition disclosed herein comprises a carrier which is not an alcohol.
  • a composition disclosed herein comprises hypochlorous acid or free available chlorine, then the composition may comprise a carrier where the carrier is not an alcohol.
  • a composition disclosed herein may further optionally include additional ingredients.
  • An additional ingredient is one known to be useful in finishing a composition disclosed herein.
  • An additional ingredient includes, without limitation, a hydrophilic clay, a disinfectant, an antiseptic, a surfactant, a preservative, or a chelating agent.
  • An additional ingredient disclosed herein is known in the art.
  • a hydrophilic clay is a synthetic or naturally occurring smectic clay that forms three-dimensional collodal structures when hydrated leading to increased viscosity and improved suspension control components in a composition.
  • a hydrophilic clay includes hydrous phyllosilicate clays.
  • a hydrophilic clay can have thixotrophic properties.
  • Non-limiting examples of a hydrophilic clay include a bentonite clay, a hectorite clay, a kaolinite clay, and a silicate clay.
  • a bentonite clay is a phyllosilicate clay and includes, without limitation, a potassium bentonite clay, a sodium bentonite clay, a calcium bentonite clay, and an aluminum bentonite clay.
  • a hectorite clay is a phyllosilicate clay and includes those commercially sold as the BENTONE ® product line, including hectorite clay (BENTONE ® EW), hectorite clay (BENTONE ® MA), and hectorite clay and hydroxy ethyl cellulose (BENTONE ® LT).
  • BENTONE ® EW hectorite clay
  • BENTONE ® MA hectorite clay
  • BENTONE ® LT hectorite clay and hydroxy ethyl cellulose
  • a kaolinite clay is a phyllosilicate clay.
  • a silicate clay is a synthetic layered silicate clay and includes those commercially sold as the LAPONITE ® product line, including lithium magnesium sodium silicate (LAPONITE ® XLG), lithium magnesium sodium silicate and tetrasodium pyrophosphate (LAPONITE ® XLS), sodium magnesium fluorosilicate (LAPONITE ® XL), and sodium magnesium fluorosilicate (LAPONITE ® XL21).
  • a single hydrophilic clay is present in a composition disclosed herein.
  • a plurality of hydrophilic clays is present in a composition disclosed herein.
  • a composition disclosed herein comprises, e.g., one or more hydrophilic clays, two or more hydrophilic clays, three or more hydrophilic clays, four or more hydrophilic clays or five or more hydrophilic clays.
  • a composition disclosed herein comprises, e.g., only one hydrophilic clay, at most two hydrophilic clays, at most three hydrophilic clays, at most four hydrophilic clays, or at most five hydrophilic clays.
  • a composition disclosed herein comprises from, e.g., 1 to 2 hydrophilic clays, 1 to 3 hydrophilic clays, 1 to 4 hydrophilic clays, 1 to 5 hydrophilic clays, 2 to 3 hydrophilic clays, 2 to 4 hydrophilic clays, 2 to 5 hydrophilic clays, 3 to 4 hydrophilic clays, 3 to 5 hydrophilic clays or 4 to 5 hydrophilic clays.
  • a composition disclosed herein comprises an amount of a hydrophilic clay that provides a desired beneficial effect to a composition disclosed herein.
  • a composition disclosed herein comprises a hydrophilic clay in an amount of, e.g., 0.01%, 0.025%, 0.05%, 0.075%, 0.1%, 0.2%, 0.25%, 0.3%, 0.4%, 0.5%, 0.6%, 0.7%, 0.75%, 0.8%, 0.9%, 1%, 2%, 3%, 4%, 5%, 6%, 7%, 8%. 9%, or 10% by weight of the composition.
  • a composition disclosed herein comprises a hydrophilic clay in an amount of, e.g., at least 0.01%, at least 0.025%, at least 0.05%, at least 0.075%, at least 0.1%, at least 0.25%, at least 0.5%, at least 0.75%, at least 1%, at least 2%, at least 3%, at least 4%, at least 5%, at least 6%, at least 7%, at least 8%, at least 9%, or at least 10% by weight of the composition.
  • a composition disclosed herein comprises a hydrophilic clay in an amount of, e.g., at most 0.01%, at most 0.025%, at most 0.05%, at most 0.075%, at most 0.1%, at most 0.25%, at most 0.5%, at most 0.75%, at most 1%, at most 2%, at most 3%, at most 4%, at most 5%, at most 6%, at most 7%, at most 8%, at most 9%, or at most 10% by weight of the composition.
  • a composition disclosed herein comprises a hydrophilic clay in an amount of from, e.g., about 0.01% to about 0.05%, 0.01% to about 0.075%, about 0.01% to about 0.1%, about 0.1% to about 0.5%, about 0.1% to about 0.75%, about 0.1% to about 1%, about 0.1% to about 2%, about 0.1% to about 3%, about 0.1% to about 4%, about 0.1% to about 5%, about 0.1% to about 6%, about 0.1% to about 7%, about 0.1% to about 8%, about 0.1% to about 9%, about 0.1% to about 10%, about 0.25% to about 0.5%, about 0.25% to about 0.75%, about 0.25% to about 1%, about 0.25% to about 2%, about 0.25% to about 3%, about 0.25% to about 4%, about 0.25% to about 5%, about 0.25% to about 6%, about 0.25% to about 7%, about 0.25% to about 8%, about 0.2
  • a composition disclosed herein comprises an amount of a silicate clay that provides a desired beneficial effect to a composition disclosed herein.
  • a composition disclosed herein comprises a silicate clay in an amount of, e.g., 0.001%, 0.0025%, 0.005%, 0.0075%, 0.01%, 0.025%, 0.05%, 0.075%, 0.1%, 0.2%, 0.25%, 0.3%, 0.4%, 0.5%, 0.6%, 0.7%, 0.75%, 0.8%, 0.9%, 1 %, 2%, 3%, 4%, 5%, 6%, 7%, 8%. 9%, or 10% by weight of the composition.
  • a composition disclosed herein comprises a silicate clay in an amount of, e.g., at least 0.001%, at least 0.0025%, at least 0.005%, at least 0.0075%, at least 0.01%, at least 0.025%, at least 0.05%, at least 0.075%, at least 0.1%, at least 0.25%, at least 0.5%, at least 0.75%, at least 1%, at least 2%, at least 3%, at least 4%, at least 5%, at least 6%, at least 7%, at least 8%, at least 9%, or at least 10% by weight of the composition.
  • a composition disclosed herein comprises a silicate clay in an amount of, e.g., at most 0.001%, at most 0.0025%, at most 0.005%, at most 0.0075%, at most 0.01%, at most 0.025%, at most 0.05%, at most 0.075%, at most 0.1%, at most 0.25%, at most 0.5%, at most 0.75%, at most 1%, at most 2%, at most 3%, at most 4%, at most 5%, at most 6%, at most 7%, at most 8%, at most 9%, or at most 10% by weight of the composition.
  • a composition disclosed herein comprises a silicate clay in an amount of from, e.g., about 0.001% to about 0.005%, 0.001% to about 0.0075%, about 0.001% to about 0.01%, about 0.001% to about 0.05%, about 0.001% to about 0.075%, about 0.001% to about 0.1%, about 0.001% to about 0.25%, about 0.001% to about 0.5%, about 0.001% to about 0.75%, about 0.005% to about 0.0075%, about 0.005% to about 0.01%, about 0.005% to about 0.05%, about 0.005% to about 0.075%, about 0.005% to about 0.1%, about 0.005% to about 0.25%, about 0.005% to about 0.5%, about 0.005% to about 0.75%, about 0.01% to about 0.05%, 0.01% to about 0.075%, about 0.01% to about 0.5%, about 0.01% to about 0.05%, 0.01% to about 0.075%, about 0.01% to about 0.1%, about 0.1% to about 0.5%
  • a preservative preserves the stability of a composition disclosed herein.
  • a preservative can also prevent the growth of microbial organisms in a composition disclosed herein.
  • Non-limiting examples of a preservative include methylparaben, phenoxyethanol, capryl glycol, glyceryl caprylate, benzoic acid, sorbic acid, gallic acid, and propylparaben.
  • a composition disclosed herein may be adjusted to any pH that enables a composition disclosed herein to achieve a desired beneficial effect.
  • the pH of a composition disclosed herein is, e.g., at least 2, at least 3, at least 4, at least 5, at least 6, at least 7, at least 8, at least 9, at least 10, or at least 11 .
  • the pH of a composition disclosed herein is, e.g., at most 2, at most 3, at most 4, at most 5, at most 6, at most 7, at most 8, at most 9, at most 10, or at most 11.
  • the pH of a composition disclosed herein is between, e.g., about 2 to about 5, about 2 to about 5.5, about 2 to about 6, about 2 to about 6.5, about 2 to about 7, about 2 to about 7.5, about 2 to about 8, about 2 to about 8.5, about 2 to about 9, about 2.5 to about 5, about 2.5 to about 5.5, about 2.5 to about 6, about 2.5 to about 6.5, about 2.5 to about 7, about 2.5 to about 7.5, about 2.5 to about 8, about 2.5 to about 8.5, about 2.5 to about 9, about 3 to about 5, about 3 to about 5.5, about 3 to about 6, about 3 to about 6.5, about 3 to about 7, about 3 to about 7.5, about 3 to about 8, about 3 to about 8.5, about 3 to about 9, about 3.5 to about 5, about 3.5 to about 5.5, about 3.5 to about 6, about
  • a calcium oxide powder is used to pH a composition disclosed herein.
  • a calcium oxide powder obtained from an organic source like shells from oceanic organisms.
  • a calcium oxide powder obtain from an inorganic source like by a synthetic chemical process.
  • about 160 ppm of a calcium oxide powder results in a composition having a pH of about 5.0 to about 5.2.
  • about 240 ppm of a calcium oxide powder results in a composition having a pH of about 7.5 to about 7,8.
  • a calcium oxide powder is used to pH a composition disclosed herein to, e.g., at least 2, at least 3, at least
  • a calcium oxide powder is used to pH a composition disclosed herein to, e.g., at most 2, at most 3, at most 4, at most 5, at most 6, at most 7, at most 8, at most 9, at most 10, or at most 11 .
  • a calcium oxide powder is used to pH a composition disclosed herein to, e.g., about 2 to about 5, about 2 to about 5.5, about 2 to about 6, about 2 to about 6.5, about 2 to about 7, about 2 to about 7.5, about 2 to about 8, about 2 to about 8.5, about 2 to about 9, about
  • a composition disclosed herein is resistant to inactivation when exposed to a bodily fluid.
  • a bodily fluid is one containing charged molecules and includes, without limitation, blood, and a blood byproduct like plasma and serum.
  • a composition disclosed herein is resistant to inactivation when it shows, e.g., at most 1% inactivation, at most 2% inactivation, at most 3% inactivation, at most 4% inactivation, at most 5% inactivation, at most 6% inactivation, at most 7% inactivation, at most 8% inactivation, at most 9% inactivation, or at most 10% inactivation upon exposure to a bodily fluid.
  • a composition disclosed herein is resistant to inactivation when it shows, e.g., at most 10% inactivation, at most 15% inactivation, at most 20% inactivation, at most 25% inactivation, at most 30% inactivation, at most 35% inactivation, at most 40% inactivation, at most 45% inactivation, at most 50% inactivation upon exposure to a bodily fluid.
  • a composition disclosed herein is resistant to inactivation when it shows, e.g., about 1% to about 10% inactivation, about 1% to about 20% inactivation, about 1% to about 30% inactivation, about 1% to about 40% inactivation, about 1% to about 50% inactivation, about 5% to about 10% inactivation, about 5% to about 20% inactivation, about 5% to about 30% inactivation, about 5% to about 40% inactivation, about 5% to about 50% inactivation, about 10% to about 20% inactivation, about 10% to about 30% inactivation, about 10% to about 40% inactivation, about 10% to about 50% inactivation, 20% to about 30% inactivation, about 20% to about 40% inactivation, about 20% to about 50% inactivation, about 30% to about 40% inactivation, about 30% to about 50% inactivation, or about 40% to about 50% inactivation upon exposure to a bodily fluid.
  • a composition disclosed herein is resistant to inactivation when it shows, e.g., at most 1% degradation, at most 2% degradation, at most 3% degradation, at most 4% degradation, at most 5% degradation, at most 6% degradation, at most 7% degradation, at most 8% degradation, at most 9% degradation, or at most 10% degradation of hypochlorous acid upon exposure to a bodily fluid.
  • a composition disclosed herein is resistant to inactivation when it shows, e.g., at most 10% degradation, at most 15% degradation, at most 20% degradation, at most 25% degradation, at most 30% degradation, at most 35% degradation, at most 40% degradation, at most 45% degradation, at most 50% degradation of hypochlorous acid upon exposure to a bodily fluid.
  • a composition disclosed herein is resistant to inactivation when it shows, e.g., about 1% to about 10% degradation, about 1% to about 20% degradation, about 1% to about 30% degradation, about 1% to about 40% degradation, about 1% to about 50% degradation, about 5% to about 10% degradation, about 5% to about 20% degradation, about 5% to about 30% degradation, about 5% to about 40% degradation, about 5% to about 50% degradation, about 10% to about 20% degradation, about 10% to about 30% degradation, about 10% to about 40% degradation, about 10% to about 50% degradation, 20% to about 30% degradation, about 20% to about 40% degradation, about 20% to about 50% degradation, about 30% to about 40% degradation, about 30% to about 50% degradation, or about 40% to about 50% degradation of hypochlorous acid upon exposure to a bodily fluid.
  • a composition disclosed herein is stable.
  • a composition disclosed herein is stable when it shows, e.g., at most 1% degradation, at most 2% degradation, at most 3% degradation, at most 4% degradation, at most 5% degradation, at most 6% degradation, at most 7% degradation, at most 8% degradation, at most 9% degradation, or at most 10% degradation of hypochlorous acid.
  • a composition disclosed herein is stable when it shows, e.g., at most 10% degradation, at most 15% degradation, at most 20% degradation, at most 25% degradation, at most 30% degradation, at most 35% degradation, at most 40% degradation, at most 45% degradation, at most 50% degradation, at most 55% degradation, at most 60% degradation, at most 65% degradation, at most 70% degradation, at most 75% degradation, at most 80% degradation, at most 85% degradation, at most 90% degradation, or at most 95% degradation of hypochlorous acid.
  • a composition disclosed herein is stable when it shows, e.g., about 1% to about 10% degradation, about 1% to about 20% degradation, about 1% to about 30% degradation, about 1% to about 40% degradation, about 1% to about 50% degradation, about 1% to about 60% degradation, about 1% to about 70% degradation, about 1% to about 80% degradation, about 1% to about 90% degradation, about 1% to about 95% degradation, about 5% to about 10% degradation, about 5% to about 20% degradation, about 5% to about 30% degradation, about 5% to about 40% degradation, about 5% to about 50% degradation, about 5% to about 60% degradation, about 5% to about 70% degradation, about 5% to about 80% degradation, about 5% to about 90% degradation, about 5% to about 95% degradation, about 10% to about 20% degradation, about 10% to about 30% degradation, about 10% to about 40% degradation, about 10% to about 50% degradation, about 10% to about 60% degradation, about 10% to about 70% degradation, about 10% to about 80% degradation, about 10% to about 90% degradation, about 10% to about 95% degradation, 20% to about 30% degradation, about
  • a composition disclosed herein is stable when it shows, e.g., at most 1% degradation, at most 2% degradation, at most 3% degradation, at most 4% degradation, at most 5% degradation, at most 6% degradation, at most 7% degradation, at most 8% degradation, at most 9% degradation, or at most 10% degradation of free available chlorine.
  • a composition disclosed herein is stable when it shows, e.g., at most 10% degradation, at most 15% degradation, at most 20% degradation, at most 25% degradation, at most 30% degradation, at most 35% degradation, at most
  • a composition disclosed herein is stable when it shows, e.g., about 1% to about 10% degradation, about 1% to about 20% degradation, about 1% to about 30% degradation, about 1% to about 40% degradation, about 1% to about 50% degradation, about 1% to about 60% degradation, about 1% to about 70% degradation, about 1% to about 80% degradation, about 1% to about 90% degradation, about 1% to about 95% degradation, about 5% to about 10% degradation, about 5% to about 20% degradation, about 5% to about 30% degradation, about 5% to about 40% degradation, about 5% to about 50% degradation, about 5% to about 60% degradation, about 5% to about 70% degradation, about 5% to about 80% degradation, about 5% to about 90% degradation, about 5% to about 95% degradation, about 10% to about 20% degradation, about 10% to about 30% degradation, about 10% to about 40% degradation, about 10% to about 50% degradation, about 10% to about 60% degradation, about 5% to about 70% degradation, about 5% to about 80% degradation, about 5% to about 90% degradation, about 5% to about 95% degradation, about 10% to
  • a composition disclosed herein is stable for, e.g., about 1 day, about 2 days, 3 days, 4 days, 5 days, 6, days, 7 days, 8 days, 9 days, 10 days, 11 days, 12 days, 13 days, 14 days or 15 days.
  • a composition disclosed herein is stable for, e.g., at least 1 day, at least 2 days, at least 3 days, at least 4 days, at least 5 days, at least 6, days, at least 7 days, at least 8 days, at least 9 days, at least 10 days, at least 11 days, at least 12 days, at least 13 days, at least 14 days or at least 15 days.
  • a composition disclosed herein is stable for, e.g., at most 1 day, at most 2 days, at most 3 days, at most 4 days, at most 5 days, at most 6, days, at most 7 days, at most 8 days, at most 9 days, at most 10 days, at most 11 days, at most 12 days, at most 13 days, at most 14 days or at most 15 days.
  • a composition disclosed herein is stable for, e.g., about 1 day to about 2 days, about 1 day to about 3 days, about 1 day to about 4 days, about 1 day to about 5 days, about 1 day to about 6 days, about 1 day to about 7 days, about 1 day to about 8 days, about 1 day to about 9 days, about 1 day to about 10 days, about 1 day to about 11 days, about 1 day to about 12 days, about 1 day to about 13 days, about 1 day to about 14 days, about 1 day to about 15 days, about 2 days to about 3 days, about 2 days to about 4 days, about 2 days to about 5 days, about 2 days to about 6 days, about 2 days to about 7 days, about 2 days to about 8 days, about 2 days to about 9 days, about 2 days to about 10 days, about 2 days to about 11 days, about 2 days to about 12 days, about 2 days to about 13 days, about 2 days to about 14 days, about 2 days to about 15 days, about 3 days to about 4 days, about 2 days to about 5 days, about 2 days to about 6
  • a composition disclosed herein is stable for, e.g., about 1 week, about 2 weeks, 3 weeks, 4 weeks, 5 weeks, 6, weeks, 7 weeks, 8 weeks, 9 weeks, 10 weeks, 11 weeks, 12 weeks, 13 weeks, 14 weeks or 15 weeks.
  • a composition disclosed herein is stable for, e.g., at least 1 week, at least 2 weeks, at least 3 weeks, at least 4 weeks, at least 5 weeks, at least 6, weeks, at least 7 weeks, at least 8 weeks, at least 9 weeks, at least 10 weeks, at least 11 weeks, at least 12 weeks, at least 13 weeks, at least 14 weeks or at least 15 weeks.
  • a composition disclosed herein is stable for, e.g., at most 1 week, at most 2 weeks, at most 3 weeks, at most 4 weeks, at most 5 weeks, at most 6, weeks, at most 7 weeks, at most 8 weeks, at most 9 weeks, at most 10 weeks, at most 11 weeks, at most 12 weeks, at most 13 weeks, at most 14 weeks or at most 15 weeks.
  • a composition disclosed herein is stable for, e.g., about 1 week to about 2 weeks, about 1 week to about 3 weeks, about 1 week to about 4 weeks, about 1 week to about 5 weeks, about 1 week to about 6 weeks, about 1 week to about 7 weeks, about 1 week to about 8 weeks, about 1 week to about 9 weeks, about 1 week to about 10 weeks, about 1 week to about 11 weeks, about
  • I I weeks about 2 weeks to about 12 weeks, about 2 weeks to about 13 weeks, about 2 weeks to about
  • a composition disclosed herein is stable for, e.g., about 1 month, about 2 months, 3 months, 4 months, 5 months, 6, months, 7 months, 8 months, 9 months, 10 months, 11 months, 12 months, 13 months, 14 months, 15 months, 16 months, 17 months, or 18 months.
  • a composition disclosed herein is stable for, e.g., at least 1 month, at least 2 months, at least 3 months, at least 4 months, at least 5 months, at least 6, months, at least 7 months, at least 8 months, at least 9 months, at least 10 months, at least 11 months, at least 12 months, at least 13 months, at least 14 months, at least 15 months, at least 16 months, at least 17 months, or at least 18 months.
  • a composition disclosed herein is stable for, e.g., at most 1 month, at most 2 months, at most 3 months, at most 4 months, at most 5 months, at most 6, months, at most 7 months, at most 8 months, at most 9 months, at most 10 months, at most 11 months, at most 12 months, at most 13 months, at most 14 months, at most 15 months, at le most ast 16 months, at most 17 months, or at most 18 months.
  • a composition disclosed herein is stable for, e.g., about 1 month to about 2 months, about 1 month to about 3 months, about 1 month to about 4 months, about 1 month to about 5 months, about 1 month to about 6 months, about 1 month to about 7 months, about 1 month to about 8 months, about 1 month to about 9 months, about 1 month to about 10 months, about 1 month to about 11 months, about 1 month to about 12 months, about 1 month to about 13 months, about 1 month to about 14 months, about 1 month to about 15 months, about 1 month to about 16 months, about 1 month to about 17 months, about 1 month to about 18 months, about 2 months to about 3 months, about 2 months to about 4 months, about 2 months to about 5 months, about 2 months to about 6 months, about 2 months to about 7 months, about 2 months to about 8 months, about 2 months to about 9 months, about 2 months to about 10 months, about 2 months to about 11 months, about 2 months to about 12 months, about 2 months to about 13 months, about 2 months to about
  • a composition disclosed herein is stable for, e.g., about 1 year, about 2 years, about 3 years, about 4 years, or about 5 years. In yet other aspects of this embodiment, a composition disclosed herein is stable for, e.g., at least 1 year, at least 2 years, at least 3 years, at least 4 years, or at least 5 years. In still other aspects of this embodiment, a composition disclosed herein is stable for, e.g., at most 1 year, at most 2 years, at most 3 years, at most 4 years, or at most 5 years.
  • a composition disclosed herein is stable for, e.g., about 1 year to about 2 years, about 1 year to about 3 years, about 1 year to about 4 years, about 1 year to about 5 years, about 2 years to about 3 years, about 2 years to about 4 years, about 2 years to about 5 years, about 3 years to about 4 years, about 3 years to about 5 years, or about 4 years to about 5 years.
  • a composition disclosed herein can be formulated into any form that enables application of a composition disclosed herein in a manner that achieves a desired beneficial effect.
  • a composition disclosed herein can be formulated into, e.g., a single-phase formulation or a biphasic formulation comprising a medium phase and a dispersed phase.
  • a composition disclosed herein can be formulated into, e.g., a liquid composition, a colloidal composition, a semi-solid composition, or a solid composition.
  • a composition disclosed herein can be formulated into, e.g., a liquid aerosol, a foam, an emulsion, a gel, a sol, or a solid sol.
  • a composition disclosed herein can be formulated into, e.g., a spray, a liquid aerosol, a soap, or a suspension.
  • a composition disclosed herein comprises hypochlorous acid or free available chlorine, and metal particles and/or metal salts. In an embodiment, a composition disclosed herein comprises 200 ppm to 1 ,000 ppm hypochlorous acid or free available chlorine, and 50 ppm to 500 ppm metal particles and/or metal salts.
  • a composition disclosed herein comprises hypochlorous acid or free available chlorine, and a copper particle, a zinc particle, a calcium particle or any combination thereof.
  • a composition disclosed herein comprises hypochlorous acid or free available chlorine, and a copper oxide particle, a zinc oxide particle, an calcium oxide particle, or any combination thereof.
  • a composition disclosed herein comprises hypochlorous acid or free available chlorine, and a copper-zinc-calcium oxide particle.
  • a composition disclosed herein comprises 200 ppm to 1 ,000 ppm hypochlorous acid or free available chlorine, and 50 ppm to 500 ppm of a copper particle, 50 ppm to 500 ppm of a zinc particle, 50 ppm to 500 ppm of a calcium particle or any combination thereof.
  • a composition disclosed herein comprises 200 ppm to 1 ,000 ppm hypochlorous acid or free available chlorine, and 50 ppm to 500 ppm of a copper oxide particle, 50 ppm to 500 ppm of a zinc oxide particle, 50 ppm to 500 ppm of a calcium oxide particle, or any combination thereof.
  • a composition disclosed herein comprises 200 ppm to 1 ,000 ppm hypochlorous acid or free available chlorine, and 50 ppm to 500 ppm of a copper-zinc-calcium oxide particle.
  • a composition disclosed herein comprises 5 ppm to 200 ppm hypochlorous acid or free available chlorine, and 50 ppm to 500 ppm of a copper particle, 50 ppm to 500 ppm of a zinc particle, 50 ppm to 500 ppm of a calcium particle or any combination thereof.
  • a composition disclosed herein comprises 5 ppm to 200 ppm hypochlorous acid or free available chlorine, and 50 ppm to 500 ppm of a copper oxide particle, 50 ppm to 500 ppm of a zinc oxide particle, 50 ppm to 500 ppm of a calcium oxide particle, or any combination thereof.
  • a composition disclosed herein comprises 5 ppm to 200 ppm hypochlorous acid or free available chlorine, and 50 ppm to 500 ppm of a copper-zinc-calcium oxide particle.
  • a composition disclosed herein comprises 400 ppm to 600 ppm hypochlorous acid or free available chlorine and 1 ppm to 400 ppm copper-zinc-calcium oxide particles.
  • a composition disclosed herein comprises 400 ppm to 600 ppm hypochlorous acid or free available chlorine and 25 ppm to 300 ppm copper-zinc-calcium oxide particles.
  • a composition disclosed herein comprises 400 ppm to 600 ppm hypochlorous acid or free available chlorine, and 1 ppm to 50 ppm copper-zinc-calcium oxide particles.
  • a composition disclosed herein comprises 420 ppm to 580 ppm hypochlorous acid or free available chlorine, and 5 ppm to 45 ppm copper-zinc-calcium oxide particles.
  • a composition disclosed herein comprises 440 ppm to 560 ppm hypochlorous acid or free available chlorine, and 10 ppm to 40 ppm copper-zinc-calcium oxide particles.
  • a composition disclosed herein comprises 460 ppm to 540 ppm hypochlorous acid or free available chlorine, and 15 ppm to 35 ppm copper-zinc-calcium oxide particles. In an aspect of this embodiment, a composition disclosed herein comprises 480 ppm to 520 ppm hypochlorous acid or free available chlorine, and 20 ppm to 30 ppm copper-zinc-calcium oxide particles. In an aspect of this embodiment, a composition disclosed herein comprises 500 ppm hypochlorous acid or free available chlorine, and 25 ppm copper-zinc-calcium oxide particles.
  • a composition disclosed herein comprises 400 ppm to 600 ppm hypochlorous acid or free available chlorine, and 1 ppm to 100 ppm copper-zinc-calcium oxide particles.
  • a composition disclosed herein comprises 420 ppm to 580 ppm hypochlorous acid or free available chlorine, and 10 ppm to 90 ppm copper-zinc-calcium oxide particles.
  • a composition disclosed herein comprises 440 ppm to 560 ppm hypochlorous acid or free available chlorine, and 20 ppm to 80 ppm copper-zinc-calcium oxide particles.
  • a composition disclosed herein comprises 460 ppm to 540 ppm hypochlorous acid or free available chlorine, and 30 ppm to 70 ppm copper-zinc-calcium oxide particles.
  • a composition disclosed herein comprises 480 ppm to 520 ppm hypochlorous acid or free available chlorine, and 40 ppm to 60 ppm copper-zinc-calcium oxide particles.
  • a composition disclosed herein comprises 500 ppm hypochlorous acid or free available chlorine, and 50 ppm copper-zinc-calcium oxide particles.
  • a composition disclosed herein comprises 400 ppm to 600 ppm hypochlorous acid or free available chlorine, and 50 ppm to 150 ppm copper-zinc-calcium oxide particles.
  • a composition disclosed herein comprises 420 ppm to 580 ppm hypochlorous acid or free available chlorine, and 60 ppm to 140 ppm copper-zinc-calcium oxide particles.
  • a composition disclosed herein comprises 440 ppm to 560 ppm hypochlorous acid or free available chlorine, and 70 ppm to 130 ppm copper-zinc-calcium oxide particles.
  • a composition disclosed herein comprises 460 ppm to 540 ppm hypochlorous acid or free available chlorine, and 80 ppm to 120 ppm copper-zinc-calcium oxide particles.
  • a composition disclosed herein comprises 480 ppm to 520 ppm hypochlorous acid or free available chlorine, and 90 ppm to 110 ppm copper-zinc-calcium oxide particles.
  • a composition disclosed herein comprises 500 ppm hypochlorous acid or free available chlorine, and 100 ppm copper-zinc-calcium oxide particles.
  • a composition disclosed herein comprises 400 ppm to 600 ppm hypochlorous acid or free available chlorine, and 100 ppm to 200 ppm copper-zinc-calcium oxide particles.
  • a composition disclosed herein comprises 420 ppm to 580 ppm hypochlorous acid or free available chlorine, and 110 ppm to 190 ppm copper-zinc-calcium oxide particles.
  • a composition disclosed herein comprises 440 ppm to 560 ppm hypochlorous acid or free available chlorine, and 120 ppm to 180 ppm copper-zinc-calcium oxide particles.
  • a composition disclosed herein comprises 460 ppm to 540 ppm hypochlorous acid or free available chlorine, and 130 ppm to 170 ppm copper-zinc-calcium oxide particles.
  • a composition disclosed herein comprises 480 ppm to 520 ppm hypochlorous acid or free available chlorine, and 140 ppm to 160 ppm copper-zinc-calcium oxide particles.
  • a composition disclosed herein comprises 500 ppm hypochlorous acid or free available chlorine, and 150 ppm copper-zinc-calcium oxide particles.
  • a composition disclosed herein comprises 400 ppm to 600 ppm hypochlorous acid or free available chlorine, and 150 ppm to 250 ppm copper-zinc-calcium oxide particles.
  • a composition disclosed herein comprises 420 ppm to 580 ppm hypochlorous acid or free available chlorine, and 160 ppm to 240 ppm copper-zinc-calcium oxide particles.
  • a composition disclosed herein comprises 440 ppm to 560 ppm hypochlorous acid or free available chlorine, and 170 ppm to 230 ppm copper-zinc-calcium oxide particles.
  • a composition disclosed herein comprises 460 ppm to 540 ppm hypochlorous acid or free available chlorine, and 180 ppm to 220 ppm copper-zinc-calcium oxide particles.
  • a composition disclosed herein comprises 480 ppm to 520 ppm hypochlorous acid or free available chlorine, and 190 ppm to 210 ppm copper-zinc-calcium oxide particles.
  • a composition disclosed herein comprises 500 ppm hypochlorous acid or free available chlorine, and 200 ppm copper-zinc-calcium oxide particles.
  • a composition disclosed herein comprises 400 ppm to 600 ppm hypochlorous acid or free available chlorine, and 200 ppm to 300 ppm copper-zinc-calcium oxide particles.
  • a composition disclosed herein comprises 420 ppm to 580 ppm hypochlorous acid or free available chlorine, and 210 ppm to 290 ppm copper-zinc-calcium oxide particles.
  • a composition disclosed herein comprises 440 ppm to 560 ppm hypochlorous acid or free available chlorine, and 220 ppm to 280 ppm copper-zinc-calcium oxide particles.
  • a composition disclosed herein comprises 460 ppm to 540 ppm hypochlorous acid or free available chlorine, and 230 ppm to 270 ppm copper-zinc-calcium oxide particles.
  • a composition disclosed herein comprises 480 ppm to 520 ppm hypochlorous acid or free available chlorine, and 240 ppm to 260 ppm copper-zinc-calcium oxide particles.
  • a composition disclosed herein comprises 500 ppm hypochlorous acid or free available chlorine, and 250 ppm copper-zinc-calcium oxide particles.
  • a composition disclosed herein comprises 400 ppm to 600 ppm hypochlorous acid or free available chlorine, and 250 ppm to 350 ppm copper-zinc-calcium oxide particles.
  • a composition disclosed herein comprises 420 ppm to 580 ppm hypochlorous acid or free available chlorine, and 260 ppm to 340 ppm copper-zinc-calcium oxide particles.
  • a composition disclosed herein comprises 440 ppm to 560 ppm hypochlorous acid or free available chlorine, and 270 ppm to 330 ppm copper-zinc-calcium oxide particles.
  • a composition disclosed herein comprises 460 ppm to 540 ppm hypochlorous acid or free available chlorine, and 280 ppm to 320 ppm copper-zinc-calcium oxide particles. In an aspect of this embodiment, a composition disclosed herein comprises 480 ppm to 520 ppm hypochlorous acid or free available chlorine, and 290 ppm to 310 ppm copper-zinc-calcium oxide particles. In an aspect of this embodiment, a composition disclosed herein comprises 500 ppm hypochlorous acid or free available chlorine, and 300 ppm copper-zinc-calcium oxide particles.
  • a composition disclosed herein comprises 5 ppm to 200 ppm hypochlorous acid or free available chlorine and 1 ppm to 400 ppm copper-zinc-calcium oxide particles. In another aspect of this embodiment, a composition disclosed herein comprises 5 ppm to 200 ppm hypochlorous acid or free available chlorine and 25 ppm to 300 ppm copper-zinc-calcium oxide particles.
  • a composition disclosed herein comprises 5 ppm to 150 ppm hypochlorous acid or free available chlorine and 1 ppm to 400 ppm copper-zinc-calcium oxide particles. In another aspect of this embodiment, a composition disclosed herein comprises 5 ppm to 150 ppm hypochlorous acid or free available chlorine and 25 ppm to 300 ppm copper-zinc-calcium oxide particles.
  • a composition disclosed herein comprises 5 ppm to 100 ppm hypochlorous acid or free available chlorine and 1 ppm to 400 ppm copper-zinc-calcium oxide particles. In another aspect of this embodiment, a composition disclosed herein comprises 5 ppm to 100 ppm hypochlorous acid or free available chlorine and 25 ppm to 300 ppm copper-zinc-calcium oxide particles.
  • a composition disclosed herein comprises 5 ppm to 75 ppm hypochlorous acid or free available chlorine and 1 ppm to 400 ppm copper-zinc-calcium oxide particles. In another aspect of this embodiment, a composition disclosed herein comprises 5 ppm to 75 ppm hypochlorous acid or free available chlorine and 25 ppm to 300 ppm copper-zinc-calcium oxide particles.
  • a composition disclosed herein comprises 5 ppm to 50 ppm hypochlorous acid or free available chlorine and 1 ppm to 400 ppm copper-zinc-calcium oxide particles. In another aspect of this embodiment, a composition disclosed herein comprises 5 ppm to 50 ppm hypochlorous acid or free available chlorine and 25 ppm to 300 ppm copper-zinc-calcium oxide particles.
  • a composition disclosed herein comprises 1 ppm to 50 ppm hypochlorous acid or free available chlorine, and 1 ppm to 50 ppm copper-zinc-calcium oxide particles. In an aspect of this embodiment, a composition disclosed herein comprises 5 ppm to 45 ppm hypochlorous acid or free available chlorine, and 5 ppm to 45 ppm copper-zinc-calcium oxide particles. In an aspect of this embodiment, a composition disclosed herein comprises 10 ppm to 40 ppm hypochlorous acid or free available chlorine, and 10 ppm to 40 ppm copper-zinc-calcium oxide particles.
  • a composition disclosed herein comprises 15 ppm to 35 ppm hypochlorous acid or free available chlorine, and 15 ppm to 35 ppm copper-zinc-calcium oxide particles. In an aspect of this embodiment, a composition disclosed herein comprises 20 ppm to 30 ppm hypochlorous acid or free available chlorine, and 20 ppm to 30 ppm copper-zinc-calcium oxide particles. In an aspect of this embodiment, a composition disclosed herein comprises 25 ppm hypochlorous acid or free available chlorine, and 25 ppm copper-zinc-calcium oxide particles.
  • a composition disclosed herein comprises 1 ppm to 50 ppm hypochlorous acid or free available chlorine, and 1 ppm to 100 ppm copper-zinc-calcium oxide particles. In an aspect of this embodiment, a composition disclosed herein comprises 5 ppm to 45 ppm hypochlorous acid or free available chlorine, and 10 ppm to 90 ppm copper-zinc-calcium oxide particles. In an aspect of this embodiment, a composition disclosed herein comprises 10 ppm to 40 ppm hypochlorous acid or free available chlorine, and 20 ppm to 80 ppm copper-zinc-calcium oxide particles.
  • a composition disclosed herein comprises 15 ppm to 35 ppm hypochlorous acid or free available chlorine, and 30 ppm to 70 ppm copper-zinc-calcium oxide particles. In an aspect of this embodiment, a composition disclosed herein comprises 20 ppm to 30 ppm hypochlorous acid or free available chlorine, and 40 ppm to 60 ppm copper-zinc-calcium oxide particles. In an aspect of this embodiment, a composition disclosed herein comprises 25 ppm hypochlorous acid or free available chlorine, and 50 ppm copper-zinc-calcium oxide particles.
  • a composition disclosed herein comprises 1 ppm to 50 ppm hypochlorous acid or free available chlorine, and 50 ppm to 150 ppm copper-zinc-calcium oxide particles. In an aspect of this embodiment, a composition disclosed herein comprises 5 ppm to 45 ppm hypochlorous acid or free available chlorine, and 60 ppm to 140 ppm copper-zinc-calcium oxide particles. In an aspect of this embodiment, a composition disclosed herein comprises 10 ppm to 40 ppm hypochlorous acid or free available chlorine, and 70 ppm to 130 ppm copper-zinc-calcium oxide particles.
  • a composition disclosed herein comprises 15 ppm to 35 ppm hypochlorous acid or free available chlorine, and 80 ppm to 120 ppm copper-zinc-calcium oxide particles. In an aspect of this embodiment, a composition disclosed herein comprises 20 ppm to 30 ppm hypochlorous acid or free available chlorine, and 90 ppm to 110 ppm copper-zinc-calcium oxide particles. In an aspect of this embodiment, a composition disclosed herein comprises 25 ppm hypochlorous acid or free available chlorine, and 100 ppm copper-zinc-calcium oxide particles.
  • a composition disclosed herein comprises 1 ppm to 50 ppm hypochlorous acid or free available chlorine, and 100 ppm to 200 ppm copper-zinc-calcium oxide particles. In an aspect of this embodiment, a composition disclosed herein comprises 5 ppm to 45 ppm hypochlorous acid or free available chlorine, and 110 ppm to 190 ppm copper-zinc-calcium oxide particles. In an aspect of this embodiment, a composition disclosed herein comprises 10 ppm to 40 ppm hypochlorous acid or free available chlorine, and 120 ppm to 180 ppm copper-zinc-calcium oxide particles.
  • a composition disclosed herein comprises 15 ppm to 35 ppm hypochlorous acid or free available chlorine, and 130 ppm to 170 ppm copper-zinc-calcium oxide particles. In an aspect of this embodiment, a composition disclosed herein comprises 20 ppm to 30 ppm hypochlorous acid or free available chlorine, and 140 ppm to 160 ppm copper-zinc-calcium oxide particles. In an aspect of this embodiment, a composition disclosed herein comprises 25 ppm hypochlorous acid or free available chlorine, and 150 ppm copper-zinc-calcium oxide particles.
  • a composition disclosed herein comprises 1 ppm to 50 ppm hypochlorous acid or free available chlorine, and 150 ppm to 250 ppm copper-zinc-calcium oxide particles. In an aspect of this embodiment, a composition disclosed herein comprises 5 ppm to 45 ppm hypochlorous acid or free available chlorine, and 160 ppm to 240 ppm copper-zinc-calcium oxide particles. In an aspect of this embodiment, a composition disclosed herein comprises 10 ppm to 40 ppm hypochlorous acid or free available chlorine, and 170 ppm to 230 ppm copper-zinc-calcium oxide particles.
  • a composition disclosed herein comprises 15 ppm to 35 ppm hypochlorous acid or free available chlorine, and 180 ppm to 220 ppm copper-zinc-calcium oxide particles. In an aspect of this embodiment, a composition disclosed herein comprises 20 ppm to 30 ppm hypochlorous acid or free available chlorine, and 190 ppm to 210 ppm copper-zinc-calcium oxide particles. In an aspect of this embodiment, a composition disclosed herein comprises 25 ppm hypochlorous acid or free available chlorine, and 200 ppm copper-zinc-calcium oxide particles.
  • a composition disclosed herein comprises 1 ppm to 50 ppm hypochlorous acid or free available chlorine, and 200 ppm to 300 ppm copper-zinc-calcium oxide particles. In an aspect of this embodiment, a composition disclosed herein comprises 5 ppm to 45 ppm hypochlorous acid or free available chlorine, and 210 ppm to 290 ppm copper-zinc-calcium oxide particles. In an aspect of this embodiment, a composition disclosed herein comprises 10 ppm to 40 ppm hypochlorous acid or free available chlorine, and 220 ppm to 280 ppm copper-zinc-calcium oxide particles.
  • a composition disclosed herein comprises 15 ppm to 35 ppm hypochlorous acid or free available chlorine, and 230 ppm to 270 ppm copper-zinc-calcium oxide particles. In an aspect of this embodiment, a composition disclosed herein comprises 20 ppm to 30 ppm hypochlorous acid or free available chlorine, and 240 ppm to 260 ppm copper-zinc-calcium oxide particles. In an aspect of this embodiment, a composition disclosed herein comprises 25 ppm hypochlorous acid or free available chlorine, and 250 ppm copper-zinc-calcium oxide particles.
  • a composition disclosed herein comprises 1 ppm to 50 ppm hypochlorous acid or free available chlorine, and 250 ppm to 350 ppm copper-zinc-calcium oxide particles. In an aspect of this embodiment, a composition disclosed herein comprises 5 ppm to 45 ppm hypochlorous acid or free available chlorine, and 260 ppm to 340 ppm copper-zinc-calcium oxide particles. In an aspect of this embodiment, a composition disclosed herein comprises 10 ppm to 40 ppm hypochlorous acid or free available chlorine, and 270 ppm to 330 ppm copper-zinc-calcium oxide particles.
  • a composition disclosed herein comprises 15 ppm to 35 ppm hypochlorous acid or free available chlorine, and 280 ppm to 320 ppm copper-zinc-calcium oxide particles. In an aspect of this embodiment, a composition disclosed herein comprises 20 ppm to 30 ppm hypochlorous acid or free available chlorine, and 290 ppm to 310 ppm copper-zinc-calcium oxide particles. In an aspect of this embodiment, a composition disclosed herein comprises 25 ppm hypochlorous acid or free available chlorine, and 300 ppm copper-zinc-calcium oxide particles.
  • a composition disclosed herein comprises hypochlorous acid or free available chlorine, and one or more metal salts.
  • a composition disclosed herein comprises hypochlorous acid or free available chlorine, and a copper salt, a zinc salt, a calcium salt or any combination thereof.
  • a composition disclosed herein comprises hypochlorous acid or free available chlorine, and a copper salt, a zinc salt and a calcium salt.
  • a composition disclosed herein comprises hypochlorous acid or free available chlorine, and a copper chloride, a zinc chloride, a calcium oxide salt or any combination thereof.
  • a composition disclosed herein comprises hypochlorous acid or free available chlorine, and a copper chloride, a zinc chloride and a calcium oxide salt.
  • a composition disclosed herein comprises 200 ppm to 1 ,000 ppm hypochlorous acid or free available chlorine, and 50 ppm to 500 ppm one or more metal salts.
  • a composition disclosed herein comprises 200 ppm to 1 ,000 ppm hypochlorous acid or free available chlorine, and 50 ppm to 500 ppm of a copper salt, 50 ppm to 500 ppm of a zinc salt, 50 ppm to 500 ppm of a calcium salt, or any combination thereof.
  • a composition disclosed herein comprises 200 ppm to 1 ,000 ppm hypochlorous acid or free available chlorine, and 50 ppm to 500 ppm of a copper salt, 50 ppm to 500 ppm of a zinc salt and 50 ppm to 500 ppm of a calcium salt.
  • a composition disclosed herein comprises 200 ppm to 1 ,000 ppm hypochlorous acid or free available chlorine, and 50 ppm to 500 ppm of a copper chloride, 50 ppm to 500 ppm of a zinc chloride, 50 ppm to 500 ppm of a calcium oxide salt, or any combination thereof.
  • a composition disclosed herein comprises 200 ppm to 1 ,000 ppm hypochlorous acid or free available chlorine, and 50 ppm to 500 ppm of a copper chloride, 50 ppm to 500 ppm of a zinc chloride and 50 ppm to 500 ppm of a calcium oxide salt.
  • a composition disclosed herein comprises 50 ppm to 500 ppm hypochlorous acid or free available chlorine, and 10 ppm to 250 ppm one or more metal salts.
  • a composition disclosed herein comprises 50 ppm to 500 ppm hypochlorous acid or free available chlorine, and 10 ppm to 250 ppm of a copper salt, 10 ppm to 250 ppm of zinc salt, 10 ppm to 250 ppm of a calcium salt, or any combination thereof.
  • a composition disclosed herein comprises 50 ppm to 500 ppm hypochlorous acid or free available chlorine, and 10 ppm to 250 ppm of a copper salt, 10 ppm to 250 ppm of zinc salt and 10 ppm to 250 ppm of a calcium salt.
  • a composition disclosed herein comprises 50 ppm to 500 ppm hypochlorous acid or free available chlorine, and 10 ppm to 250 ppm of a copper chloride, 10 ppm to 250 ppm of a zinc chloride, 10 ppm to 250 ppm of a calcium oxide salt, or any combination thereof.
  • a composition disclosed herein comprises 50 ppm to 500 ppm hypochlorous acid or free available chlorine, and 10 ppm to 250 ppm of a copper chloride, 10 ppm to 250 ppm of a zinc chloride and 10 ppm to 250 ppm of a calcium oxide salt.
  • a composition disclosed herein comprises 75 ppm to 400 ppm hypochlorous acid or free available chlorine, and 20 ppm to 200 ppm one or more metal salts.
  • a composition disclosed herein comprises 75 ppm to 400 ppm hypochlorous acid or free available chlorine, and 20 ppm to 200 ppm of a copper salt, 20 ppm to 200 ppm of zinc salt, 20 ppm to 200 ppm of a calcium salt, or any combination thereof.
  • a composition disclosed herein comprises 75 ppm to 400 ppm hypochlorous acid or free available chlorine, and 20 ppm to 200 ppm of a copper salt, 20 ppm to 200 ppm of zinc salt and 20 ppm to 200 ppm of a calcium salt.
  • a composition disclosed herein comprises 75 ppm to 400 ppm hypochlorous acid or free available chlorine, and 20 ppm to 200 ppm of a copper chloride, 20 ppm to 200 ppm of a zinc chloride, 20 ppm to 200 ppm of a calcium oxide salt, or any combination thereof.
  • a composition disclosed herein comprises 75 ppm to 400 ppm hypochlorous acid or free available chlorine, and 20 ppm to 200 ppm of a copper chloride, 20 ppm to 200 ppm of a zinc chloride and 20 ppm to 200 ppm of a calcium oxide salt.
  • a composition disclosed herein comprises 100 ppm to 350 ppm hypochlorous acid or free available chlorine, and 40 ppm to 160 ppm one or more metal salts.
  • a composition disclosed herein comprises 100 ppm to 350 ppm hypochlorous acid or free available chlorine, and 40 ppm to 160 ppm of a copper salt, 40 ppm to 160 ppm of zinc salt, 40 ppm to 160 ppm of a calcium salt, or any combination thereof.
  • a composition disclosed herein comprises 100 ppm to 350 ppm hypochlorous acid or free available chlorine, and 40 ppm to 160 ppm of a copper salt, 40 ppm to 160 ppm of zinc salt and 40 ppm to 160 ppm of a calcium salt.
  • a composition disclosed herein comprises 100 ppm to 350 ppm hypochlorous acid or free available chlorine, and 40 ppm to 160 ppm of a copper chloride, 40 ppm to 160 ppm of a zinc chloride, 40 ppm to 160 ppm of a calcium oxide salt, or any combination thereof.
  • a composition disclosed herein comprises 100 ppm to 350 ppm hypochlorous acid or free available chlorine, and 40 ppm to 160 ppm of a copper chloride, 40 ppm to 160 ppm of a zinc chloride and 40 ppm to 160 ppm of a calcium oxide salt.
  • a composition disclosed herein comprises 200 ppm to 400 ppm hypochlorous acid or free available chlorine, and 10 ppm to 500 ppm one or more metal salts.
  • a composition disclosed herein comprises 200 ppm to 400 ppm hypochlorous acid or free available chlorine, and 10 ppm to 500 ppm of a copper salt, 10 ppm to 500 ppm of zinc salt, 10 ppm to 500 ppm of a calcium salt, or any combination thereof.
  • a composition disclosed herein comprises 200 ppm to 400 ppm hypochlorous acid or free available chlorine, and 10 ppm to 500 ppm of a copper salt, 10 ppm to 500 ppm of zinc salt and 10 ppm to 500 ppm of a calcium salt.
  • a composition disclosed herein comprises 200 ppm to 400 ppm hypochlorous acid or free available chlorine, and 10 ppm to 500 ppm of a copper chloride, 10 ppm to 500 ppm of a zinc chloride, 10 ppm to 500 ppm of a calcium oxide salt, or any combination thereof.
  • a composition disclosed herein comprises 200 ppm to 400 ppm hypochlorous acid or free available chlorine, and 10 ppm to 500 ppm of a copper chloride, 10 ppm to 500 ppm of a zinc chloride and 10 ppm to 500 ppm of a calcium oxide salt.
  • a composition disclosed herein comprises 200 ppm to 400 ppm hypochlorous acid or free available chlorine, and 20 ppm to 240 ppm one or more metal salts.
  • a composition disclosed herein comprises 200 ppm to 400 ppm hypochlorous acid or free available chlorine, and 20 ppm to 240 ppm of a copper salt, 20 ppm to 240 ppm of zinc salt, 20 ppm to 240 ppm of a calcium salt, or any combination thereof.
  • a composition disclosed herein comprises 200 ppm to 400 ppm hypochlorous acid or free available chlorine, and 20 ppm to 240 ppm of a copper salt, 20 ppm to 240 ppm of zinc salt and 20 ppm to 240 ppm of a calcium salt.
  • a composition disclosed herein comprises 200 ppm to 400 ppm hypochlorous acid or free available chlorine, and 20 ppm to 240 ppm of a copper chloride, 20 ppm to 240 ppm of a zinc chloride, 20 ppm to 240 ppm of a calcium oxide salt, or any combination thereof.
  • a composition disclosed herein comprises 200 ppm to 400 ppm hypochlorous acid or free available chlorine, and 20 ppm to 240 ppm of a copper chloride, 20 ppm to 240 ppm of a zinc chloride and 20 ppm to 240 ppm of a calcium oxide salt.
  • a composition disclosed herein comprises 150 ppm to 450 ppm hypochlorous acid or free available chlorine, 20 ppm to 220 ppm copper salt, 20 ppm to 220 ppm zinc salt and 10 ppm to 160 ppm calcium salt.
  • a composition disclosed herein comprises 200 ppm to 400 ppm hypochlorous acid or free available chlorine, 60 ppm to 180 ppm copper salt, 60 ppm to 180 ppm zinc salt, and 20 ppm to 140 ppm calcium salt.
  • a composition disclosed herein comprises 260 ppm to 360 ppm hypochlorous acid or free available chlorine, 80 ppm to 160 ppm copper salt, 80 ppm to 160 ppm zinc salt, and 40 ppm to 120 ppm calcium salt.
  • a composition disclosed herein comprises 280 ppm to 340 ppm hypochlorous acid or free available chlorine, 100 ppm to 140 ppm copper salt, 100 ppm to 140 ppm zinc salt, and 60 ppm to 100 ppm calcium salt.
  • a composition disclosed herein comprises 300 ppm to 320 ppm hypochlorous acid or free available chlorine, 110 ppm to 130 ppm copper salt, 110 ppm to 130 ppm, zinc salt, and 70 ppm to 90 ppm calcium salt.
  • a composition disclosed herein comprises 310 ppm hypochlorous acid or free available chlorine, 120 ppm copper salt, 120 ppm zinc salt, and 80 ppm calcium salt.
  • a composition disclosed herein comprises 150 ppm to 450 ppm hypochlorous acid or free available chlorine, 20 ppm to 220 ppm copper salt, 10 ppm to 160 ppm zinc salt and 10 ppm to 160 ppm calcium salt.
  • a composition disclosed herein comprises 200 ppm to 400 ppm hypochlorous acid or free available chlorine, 60 ppm to 180 ppm copper salt, 20 ppm to 140 ppm zinc salt, and 20 ppm to 140 ppm calcium salt.
  • a composition disclosed herein comprises 260 ppm to 360 ppm hypochlorous acid or free available chlorine, 80 ppm to 160 ppm copper salt, 40 ppm to 120 ppm zinc salt, and 40 ppm to 120 ppm calcium salt.
  • a composition disclosed herein comprises 280 ppm to 340 ppm hypochlorous acid or free available chlorine, 100 ppm to 140 ppm copper salt, 60 ppm to 100 ppm zinc salt, and 60 ppm to 100 ppm calcium salt.
  • a composition disclosed herein comprises 300 ppm to 320 ppm hypochlorous acid or free available chlorine, 110 ppm to 130 ppm copper salt, 70 ppm to 90 ppm, zinc salt, and 70 ppm to 90 ppm calcium salt.
  • a composition disclosed herein comprises 310 ppm hypochlorous acid or free available chlorine, 120 ppm copper salt, 80 ppm zinc salt, and 80 ppm calcium salt.
  • a composition disclosed herein comprises 150 ppm to 450 ppm hypochlorous acid or free available chlorine, 10 ppm to 160 ppm copper salt, 10 ppm to 160 ppm zinc salt and 10 ppm to 160 ppm calcium salt.
  • a composition disclosed herein comprises 200 ppm to 400 ppm hypochlorous acid or free available chlorine, 20 ppm to 140 ppm copper salt, 20 ppm to 140 ppm zinc salt, and 20 ppm to 140 ppm calcium salt.
  • a composition disclosed herein comprises 260 ppm to 360 ppm hypochlorous acid or free available chlorine, 40 ppm to 120 ppm copper salt, 40 ppm to 120 ppm zinc salt, and 40 ppm to 120 ppm calcium salt.
  • a composition disclosed herein comprises 280 ppm to 340 ppm hypochlorous acid or free available chlorine, 60 ppm to 100 ppm copper salt, 60 ppm to 100 ppm zinc salt, and 60 ppm to 100 ppm calcium salt.
  • a composition disclosed herein comprises 300 ppm to 320 ppm hypochlorous acid or free available chlorine, 70 ppm to 90 ppm copper salt, 70 ppm to 90 ppm, zinc salt, and 70 ppm to 90 ppm calcium salt.
  • a composition disclosed herein comprises 310 ppm hypochlorous acid or free available chlorine, 80 ppm copper salt, 80 ppm zinc salt, and 80 ppm calcium salt.
  • a composition disclosed herein comprises 150 ppm to 450 ppm hypochlorous acid or free available chlorine, 10 ppm to 140 ppm copper salt, 10 ppm to 140 ppm zinc salt and 10 ppm to 160 ppm calcium salt.
  • a composition disclosed herein comprises 200 ppm to 400 ppm hypochlorous acid or free available chlorine, 20 ppm to 120 ppm copper salt, 20 ppm to 120 ppm zinc salt, and 20 ppm to 140 ppm calcium salt.
  • a composition disclosed herein comprises 260 ppm to 360 ppm hypochlorous acid or free available chlorine, 30 ppm to 100 ppm copper salt, 30 ppm to 100 ppm zinc salt, and 40 ppm to 120 ppm calcium salt.
  • a composition disclosed herein comprises 280 ppm to 340 ppm hypochlorous acid or free available chlorine, 40 ppm to 80 ppm copper salt, 40 ppm to 80 ppm zinc salt, and 60 ppm to 100 ppm calcium salt.
  • a composition disclosed herein comprises 300 ppm to 320 ppm hypochlorous acid or free available chlorine, 50 ppm to 70 ppm copper salt, 50 ppm to 70 ppm, zinc salt, and 70 ppm to 90 ppm calcium salt.
  • a composition disclosed herein comprises 310 ppm hypochlorous acid or free available chlorine, 40 ppm copper salt, 40 ppm zinc salt, and 80 ppm calcium salt.
  • a composition disclosed herein comprises 150 ppm to 450 ppm hypochlorous acid or free available chlorine, 20 ppm to 220 ppm copper salt, 20 ppm to 220 ppm zinc salt and 20 ppm to 180 ppm calcium salt.
  • a composition disclosed herein comprises 200 ppm to 400 ppm hypochlorous acid or free available chlorine, 60 ppm to 180 ppm copper salt, 60 ppm to 180 ppm zinc salt, and 40 ppm to 160 ppm calcium salt.
  • a composition disclosed herein comprises 260 ppm to 360 ppm hypochlorous acid or free available chlorine, 80 ppm to 160 ppm copper salt, 80 ppm to 160 ppm zinc salt, and 60 ppm to 140 ppm calcium salt.
  • a composition disclosed herein comprises 280 ppm to 340 ppm hypochlorous acid or free available chlorine, 100 ppm to 140 ppm copper salt, 100 ppm to 140 ppm zinc salt, and 80 ppm to 120 ppm calcium salt.
  • a composition disclosed herein comprises 300 ppm to 320 ppm hypochlorous acid or free available chlorine, 110 ppm to 130 ppm copper salt, 110 ppm to 130 ppm, zinc salt, and 90 ppm to 110 ppm calcium salt.
  • a composition disclosed herein comprises 310 ppm hypochlorous acid or free available chlorine, 120 ppm copper salt, 120 ppm zinc salt, and 100 ppm calcium salt.
  • a composition disclosed herein comprises 150 ppm to 450 ppm hypochlorous acid or free available chlorine, 20 ppm to 220 ppm copper salt, 10 ppm to 160 ppm zinc salt and 20 ppm to 180 ppm calcium salt.
  • a composition disclosed herein comprises 200 ppm to 400 ppm hypochlorous acid or free available chlorine, 60 ppm to 180 ppm copper salt, 20 ppm to 140 ppm zinc salt, and 40 ppm to 160 ppm calcium salt.
  • a composition disclosed herein comprises 260 ppm to 360 ppm hypochlorous acid or free available chlorine, 80 ppm to 160 ppm copper salt, 40 ppm to 120 ppm zinc salt, and 60 ppm to 140 ppm calcium salt.
  • a composition disclosed herein comprises 280 ppm to 340 ppm hypochlorous acid or free available chlorine, 100 ppm to 140 ppm copper salt, 60 ppm to 100 ppm zinc salt, and 80 ppm to 120 ppm calcium salt.
  • a composition disclosed herein comprises 300 ppm to 320 ppm hypochlorous acid or free available chlorine, 110 ppm to 130 ppm copper salt, 70 ppm to 90 ppm, zinc salt, and 90 ppm to 110 ppm calcium salt.
  • a composition disclosed herein comprises 310 ppm hypochlorous acid or free available chlorine, 120 ppm copper salt, 80 ppm zinc salt, and 100 ppm calcium salt.
  • a composition disclosed herein comprises 150 ppm to 450 ppm hypochlorous acid or free available chlorine, 10 ppm to 160 ppm copper salt, 10 ppm to 160 ppm zinc salt and 20 ppm to 180 ppm calcium salt.
  • a composition disclosed herein comprises 200 ppm to 400 ppm hypochlorous acid or free available chlorine, 20 ppm to 140 ppm copper salt, 20 ppm to 140 ppm zinc salt, and 40 ppm to 160 ppm calcium salt.
  • a composition disclosed herein comprises 260 ppm to 360 ppm hypochlorous acid or free available chlorine, 40 ppm to 120 ppm copper salt, 40 ppm to 120 ppm zinc salt, and 60 ppm to 140 ppm calcium salt.
  • a composition disclosed herein comprises 280 ppm to 340 ppm hypochlorous acid or free available chlorine, 60 ppm to 100 ppm copper salt, 60 ppm to 100 ppm zinc salt, and 80 ppm to 120 ppm calcium salt.
  • a composition disclosed herein comprises 300 ppm to 320 ppm hypochlorous acid or free available chlorine, 70 ppm to 90 ppm copper salt, 70 ppm to 90 ppm, zinc salt, and 90 ppm to 110 ppm calcium salt.
  • a composition disclosed herein comprises 310 ppm hypochlorous acid or free available chlorine, 80 ppm copper salt, 80 ppm zinc salt, and 100 ppm calcium salt.
  • a composition disclosed herein comprises 150 ppm to 450 ppm hypochlorous acid or free available chlorine, 20 ppm to 220 ppm copper salt, 20 ppm to 220 ppm zinc salt and 40 ppm to 200 ppm calcium salt.
  • a composition disclosed herein comprises 200 ppm to 400 ppm hypochlorous acid or free available chlorine, 60 ppm to 180 ppm copper salt, 60 ppm to 180 ppm zinc salt, and 60 ppm to 180 ppm calcium salt.
  • a composition disclosed herein comprises 260 ppm to 360 ppm hypochlorous acid or free available chlorine, 80 ppm to 160 ppm copper salt, 80 ppm to 160 ppm zinc salt, and 80 ppm to 160 ppm calcium salt.
  • a composition disclosed herein comprises 280 ppm to 340 ppm hypochlorous acid or free available chlorine, 100 ppm to 140 ppm copper salt, 100 ppm to 140 ppm zinc salt, and 100 ppm to 140 ppm calcium salt.
  • a composition disclosed herein comprises 300 ppm to 320 ppm hypochlorous acid or free available chlorine, 110 ppm to 130 ppm copper salt, 110 ppm to 130 ppm, zinc salt, and 110 ppm to 130 ppm calcium salt.
  • a composition disclosed herein comprises 310 ppm hypochlorous acid or free available chlorine, 120 ppm copper salt, 120 ppm zinc salt, and 120 ppm calcium salt.
  • a composition disclosed herein comprises 150 ppm to 450 ppm hypochlorous acid or free available chlorine, 20 ppm to 220 ppm copper salt, 10 ppm to 160 ppm zinc salt and 40 ppm to 200 ppm calcium salt.
  • a composition disclosed herein comprises 200 ppm to 400 ppm hypochlorous acid or free available chlorine, 60 ppm to 180 ppm copper salt, 20 ppm to 140 ppm zinc salt, and 60 ppm to 180 ppm calcium salt.
  • a composition disclosed herein comprises 260 ppm to 360 ppm hypochlorous acid or free available chlorine, 80 ppm to 160 ppm copper salt, 40 ppm to 120 ppm zinc salt, and 80 ppm to 160 ppm calcium salt.
  • a composition disclosed herein comprises 280 ppm to 340 ppm hypochlorous acid or free available chlorine, 100 ppm to 140 ppm copper salt, 60 ppm to 100 ppm zinc salt, and 100 ppm to 140 ppm calcium salt.
  • a composition disclosed herein comprises 300 ppm to 320 ppm hypochlorous acid or free available chlorine, 110 ppm to 130 ppm copper salt, 70 ppm to 90 ppm, zinc salt, and 110 ppm to 130 ppm calcium salt.
  • a composition disclosed herein comprises 310 ppm hypochlorous acid or free available chlorine, 120 ppm copper salt, 80 ppm zinc salt, and 120 ppm calcium salt.
  • a composition disclosed herein comprises 150 ppm to 450 ppm hypochlorous acid or free available chlorine, 10 ppm to 160 ppm copper salt, 10 ppm to 160 ppm zinc salt and 40 ppm to 200 ppm calcium salt.
  • a composition disclosed herein comprises 200 ppm to 400 ppm hypochlorous acid or free available chlorine, 20 ppm to 140 ppm copper salt, 20 ppm to 140 ppm zinc salt, and 60 ppm to 180 ppm calcium salt.
  • a composition disclosed herein comprises 260 ppm to 360 ppm hypochlorous acid or free available chlorine, 40 ppm to 120 ppm copper salt, 40 ppm to 120 ppm zinc salt, and 80 ppm to 160 ppm calcium salt.
  • a composition disclosed herein comprises 280 ppm to 340 ppm hypochlorous acid or free available chlorine, 60 ppm to 100 ppm copper salt, 60 ppm to 100 ppm zinc salt, and 100 ppm to 140 ppm calcium salt.
  • a composition disclosed herein comprises 300 ppm to 320 ppm hypochlorous acid or free available chlorine, 70 ppm to 90 ppm copper salt, 70 ppm to 90 ppm, zinc salt, and 110 ppm to 130 ppm calcium salt.
  • a composition disclosed herein comprises 310 ppm hypochlorous acid or free available chlorine, 80 ppm copper salt, 80 ppm zinc salt, and 120 ppm calcium salt.
  • a composition disclosed herein comprises 150 ppm to 450 ppm hypochlorous acid or free available chlorine, 10 ppm to 140 ppm copper salt, 10 ppm to 140 ppm zinc salt and 40 ppm to 200 ppm calcium salt.
  • a composition disclosed herein comprises 200 ppm to 400 ppm hypochlorous acid or free available chlorine, 20 ppm to 120 ppm copper salt, 20 ppm to 120 ppm zinc salt, and 60 ppm to 180 ppm calcium salt.
  • a composition disclosed herein comprises 260 ppm to 360 ppm hypochlorous acid or free available chlorine, 30 ppm to 100 ppm copper salt, 30 ppm to 100 ppm zinc salt, and 80 ppm to 160 ppm calcium salt.
  • a composition disclosed herein comprises 280 ppm to 340 ppm hypochlorous acid or free available chlorine, 40 ppm to 80 ppm copper salt, 40 ppm to 80 ppm zinc salt, and 100 ppm to 140 ppm calcium salt.
  • a composition disclosed herein comprises 300 ppm to 320 ppm hypochlorous acid or free available chlorine, 50 ppm to 70 ppm copper salt, 50 ppm to 70 ppm, zinc salt, and 110 ppm to 130 ppm calcium salt.
  • a composition disclosed herein comprises 310 ppm hypochlorous acid or free available chlorine, 40 ppm copper salt, 40 ppm zinc salt, and 120 ppm calcium salt.
  • a composition disclosed herein comprises 150 ppm to 450 ppm hypochlorous acid or free available chlorine, 20 ppm to 220 ppm copper salt, 20 ppm to 220 ppm zinc salt and 60 ppm to 220 ppm calcium salt.
  • a composition disclosed herein comprises 200 ppm to 400 ppm hypochlorous acid or free available chlorine, 60 ppm to 180 ppm copper salt, 60 ppm to 180 ppm zinc salt, and 80 ppm to 200 ppm calcium salt.
  • a composition disclosed herein comprises 260 ppm to 360 ppm hypochlorous acid or free available chlorine, 80 ppm to 160 ppm copper salt, 80 ppm to 160 ppm zinc salt, and 100 ppm to 180 ppm calcium salt.
  • a composition disclosed herein comprises 280 ppm to 340 ppm hypochlorous acid or free available chlorine, 100 ppm to 140 ppm copper salt, 100 ppm to 140 ppm zinc salt, and 120 ppm to 160 ppm calcium salt.
  • a composition disclosed herein comprises 300 ppm to 320 ppm hypochlorous acid or free available chlorine, 110 ppm to 130 ppm copper salt, 110 ppm to 130 ppm, zinc salt, and 130 ppm to 150 ppm calcium salt.
  • a composition disclosed herein comprises 310 ppm hypochlorous acid or free available chlorine, 120 ppm copper salt, 120 ppm zinc salt, and 140 ppm calcium salt.
  • a composition disclosed herein comprises 150 ppm to 450 ppm hypochlorous acid or free available chlorine, 20 ppm to 220 ppm copper salt, 10 ppm to 160 ppm zinc salt and 60 ppm to 220 ppm calcium salt.
  • a composition disclosed herein comprises 200 ppm to 400 ppm hypochlorous acid or free available chlorine, 60 ppm to 180 ppm copper salt, 20 ppm to 140 ppm zinc salt, and 80 ppm to 200 ppm calcium salt.
  • a composition disclosed herein comprises 260 ppm to 360 ppm hypochlorous acid or free available chlorine, 80 ppm to 160 ppm copper salt, 40 ppm to 120 ppm zinc salt, and 100 ppm to 180 ppm calcium salt.
  • a composition disclosed herein comprises 280 ppm to 340 ppm hypochlorous acid or free available chlorine, 100 ppm to 140 ppm copper salt, 60 ppm to 100 ppm zinc salt, and 120 ppm to 160 ppm calcium salt.
  • a composition disclosed herein comprises 300 ppm to 320 ppm hypochlorous acid or free available chlorine, 110 ppm to 130 ppm copper salt, 70 ppm to 90 ppm, zinc salt, and 130 ppm to 150 ppm calcium salt.
  • a composition disclosed herein comprises 310 ppm hypochlorous acid or free available chlorine, 120 ppm copper salt, 80 ppm zinc salt, and 140 ppm calcium salt.
  • a composition disclosed herein comprises 150 ppm to 450 ppm hypochlorous acid or free available chlorine, 10 ppm to 160 ppm copper salt, 10 ppm to 160 ppm zinc salt and 60 ppm to 220 ppm calcium salt.
  • a composition disclosed herein comprises 200 ppm to 400 ppm hypochlorous acid or free available chlorine, 20 ppm to 140 ppm copper salt, 20 ppm to 140 ppm zinc salt, and 80 ppm to 200 ppm calcium salt.
  • a composition disclosed herein comprises 260 ppm to 360 ppm hypochlorous acid or free available chlorine, 40 ppm to 120 ppm copper salt, 40 ppm to 120 ppm zinc salt, and 100 ppm to 180 ppm calcium salt.
  • a composition disclosed herein comprises 280 ppm to 340 ppm hypochlorous acid or free available chlorine, 60 ppm to 100 ppm copper salt, 60 ppm to 100 ppm zinc salt, and 120 ppm to 160 ppm calcium salt.
  • a composition disclosed herein comprises 300 ppm to 320 ppm hypochlorous acid or free available chlorine, 70 ppm to 90 ppm copper salt, 70 ppm to 90 ppm, zinc salt, and 130 ppm to 150 ppm calcium salt.
  • a composition disclosed herein comprises 310 ppm hypochlorous acid or free available chlorine, 80 ppm copper salt, 80 ppm zinc salt, and 140 ppm calcium salt.
  • a composition disclosed herein comprises 150 ppm to 450 ppm hypochlorous acid or free available chlorine, 10 ppm to 140 ppm copper salt, 10 ppm to 140 ppm zinc salt and 60 ppm to 220 ppm calcium salt.
  • a composition disclosed herein comprises 200 ppm to 400 ppm hypochlorous acid or free available chlorine, 20 ppm to 120 ppm copper salt, 20 ppm to 120 ppm zinc salt, and 80 ppm to 200 ppm calcium salt.
  • a composition disclosed herein comprises 260 ppm to 360 ppm hypochlorous acid or free available chlorine, 30 ppm to 100 ppm copper salt, 30 ppm to 100 ppm zinc salt, and 100 ppm to 180 ppm calcium salt.
  • a composition disclosed herein comprises 280 ppm to 340 ppm hypochlorous acid or free available chlorine, 40 ppm to 80 ppm copper salt, 40 ppm to 80 ppm zinc salt, and 120 ppm to 160 ppm calcium salt.
  • a composition disclosed herein comprises 300 ppm to 320 ppm hypochlorous acid or free available chlorine, 50 ppm to 70 ppm copper salt, 50 ppm to 70 ppm, zinc salt, and 130 ppm to 150 ppm calcium salt.
  • a composition disclosed herein comprises 310 ppm hypochlorous acid or free available chlorine, 40 ppm copper salt, 40 ppm zinc salt, and 140 ppm calcium salt.
  • a composition disclosed herein comprises 150 ppm to 450 ppm hypochlorous acid or free available chlorine, 20 ppm to 220 ppm copper salt, 20 ppm to 220 ppm zinc salt and 80 ppm to 240 ppm calcium salt.
  • a composition disclosed herein comprises 200 ppm to 400 ppm hypochlorous acid or free available chlorine, 60 ppm to 180 ppm copper salt, 60 ppm to 180 ppm zinc salt, and 100 ppm to 220 ppm calcium salt.
  • a composition disclosed herein comprises 260 ppm to 360 ppm hypochlorous acid or free available chlorine, 80 ppm to 160 ppm copper salt, 80 ppm to 160 ppm zinc salt, and 120 ppm to 200 ppm calcium salt.
  • a composition disclosed herein comprises 280 ppm to 340 ppm hypochlorous acid or free available chlorine, 100 ppm to 140 ppm copper salt, 100 ppm to 140 ppm zinc salt, and 140 ppm to 180 ppm calcium salt.
  • a composition disclosed herein comprises 300 ppm to 320 ppm hypochlorous acid or free available chlorine, 110 ppm to 130 ppm copper salt, 110 ppm to 130 ppm, zinc salt, and 150 ppm to 170 ppm calcium salt.
  • a composition disclosed herein comprises 310 ppm hypochlorous acid or free available chlorine, 120 ppm copper salt, 120 ppm zinc salt, and 160 ppm calcium salt.
  • a composition disclosed herein comprises 150 ppm to 450 ppm hypochlorous acid or free available chlorine, 20 ppm to 220 ppm copper salt, 10 ppm to 160 ppm zinc salt and 80 ppm to 240 ppm calcium salt.
  • a composition disclosed herein comprises 200 ppm to 400 ppm hypochlorous acid or free available chlorine, 60 ppm to 180 ppm copper salt, 20 ppm to 140 ppm zinc salt, and 100 ppm to 220 ppm calcium salt.
  • a composition disclosed herein comprises 260 ppm to 360 ppm hypochlorous acid or free available chlorine, 80 ppm to 160 ppm copper salt, 40 ppm to 120 ppm zinc salt, and 120 ppm to 200 ppm calcium salt.
  • a composition disclosed herein comprises 280 ppm to 340 ppm hypochlorous acid or free available chlorine, 100 ppm to 140 ppm copper salt, 60 ppm to 100 ppm zinc salt, and 140 ppm to 180 ppm calcium salt.
  • a composition disclosed herein comprises 300 ppm to 320 ppm hypochlorous acid or free available chlorine, 110 ppm to 130 ppm copper salt, 70 ppm to 90 ppm, zinc salt, and 150 ppm to 170 ppm calcium salt.
  • a composition disclosed herein comprises 310 ppm hypochlorous acid or free available chlorine, 120 ppm copper salt, 80 ppm zinc salt, and 160 ppm calcium salt.
  • a composition disclosed herein comprises 150 ppm to 450 ppm hypochlorous acid or free available chlorine, 10 ppm to 160 ppm copper salt, 10 ppm to 160 ppm zinc salt and 80 ppm to 240 ppm calcium salt.
  • a composition disclosed herein comprises 200 ppm to 400 ppm hypochlorous acid or free available chlorine, 20 ppm to 140 ppm copper salt, 20 ppm to 140 ppm zinc salt, and 100 ppm to 220 ppm calcium salt.
  • a composition disclosed herein comprises 260 ppm to 360 ppm hypochlorous acid or free available chlorine, 40 ppm to 120 ppm copper salt, 40 ppm to 120 ppm zinc salt, and 120 ppm to 200 ppm calcium salt.
  • a composition disclosed herein comprises 280 ppm to 340 ppm hypochlorous acid or free available chlorine, 60 ppm to 100 ppm copper salt, 60 ppm to 100 ppm zinc salt, and 140 ppm to 180 ppm calcium salt.
  • a composition disclosed herein comprises 300 ppm to 320 ppm hypochlorous acid or free available chlorine, 70 ppm to 90 ppm copper salt, 70 ppm to 90 ppm, zinc salt, and 150 ppm to 170 ppm calcium salt.
  • a composition disclosed herein comprises 310 ppm hypochlorous acid or free available chlorine, 80 ppm copper salt, 80 ppm zinc salt, and 160 ppm calcium salt.
  • a composition disclosed herein comprises 150 ppm to 450 ppm hypochlorous acid or free available chlorine, 10 ppm to 140 ppm copper salt, 10 ppm to 140 ppm zinc salt and 80 ppm to 240 ppm calcium salt.
  • a composition disclosed herein comprises 200 ppm to 400 ppm hypochlorous acid or free available chlorine, 20 ppm to 120 ppm copper salt, 20 ppm to 120 ppm zinc salt, and 100 ppm to 220 ppm calcium salt.
  • a composition disclosed herein comprises 260 ppm to 360 ppm hypochlorous acid or free available chlorine, 30 ppm to 100 ppm copper salt, 30 ppm to 100 ppm zinc salt, and 120 ppm to 200 ppm calcium salt.
  • a composition disclosed herein comprises 280 ppm to 340 ppm hypochlorous acid or free available chlorine, 40 ppm to 80 ppm copper salt, 40 ppm to 80 ppm zinc salt, and 140 ppm to 180 ppm calcium salt.
  • a composition disclosed herein comprises 300 ppm to 320 ppm hypochlorous acid or free available chlorine, 50 ppm to 70 ppm copper salt, 50 ppm to 70 ppm, zinc salt, and 150 ppm to 170 ppm calcium salt.
  • a composition disclosed herein comprises 310 ppm hypochlorous acid or free available chlorine, 40 ppm copper salt, 40 ppm zinc salt, and 160 ppm calcium salt.
  • a composition disclosed herein comprises 150 ppm to 450 ppm hypochlorous acid or free available chlorine, 20 ppm to 220 ppm copper salt, 20 ppm to 220 ppm zinc salt and 100 ppm to 260 ppm calcium salt.
  • a composition disclosed herein comprises 200 ppm to 400 ppm hypochlorous acid or free available chlorine, 60 ppm to 180 ppm copper salt, 60 ppm to 180 ppm zinc salt, and 120 ppm to 240 ppm calcium salt.
  • a composition disclosed herein comprises 260 ppm to 360 ppm hypochlorous acid or free available chlorine, 80 ppm to 160 ppm copper salt, 80 ppm to 160 ppm zinc salt, and 140 ppm to 220 ppm calcium salt.
  • a composition disclosed herein comprises 280 ppm to 340 ppm hypochlorous acid or free available chlorine, 100 ppm to 140 ppm copper salt, 100 ppm to 140 ppm zinc salt, and 160 ppm to 200 ppm calcium salt.
  • a composition disclosed herein comprises 300 ppm to 320 ppm hypochlorous acid or free available chlorine, 110 ppm to 130 ppm copper salt, 110 ppm to 130 ppm, zinc salt, and 170 ppm to 190 ppm calcium salt.
  • a composition disclosed herein comprises 310 ppm hypochlorous acid or free available chlorine, 120 ppm copper salt, 120 ppm zinc salt, and 180 ppm calcium salt.
  • a composition disclosed herein comprises 150 ppm to 450 ppm hypochlorous acid or free available chlorine, 20 ppm to 220 ppm copper salt, 10 ppm to 160 ppm zinc salt and 100 ppm to 260 ppm calcium salt.
  • a composition disclosed herein comprises 200 ppm to 400 ppm hypochlorous acid or free available chlorine, 60 ppm to 180 ppm copper salt, 20 ppm to 140 ppm zinc salt, and 120 ppm to 240 ppm calcium salt.
  • a composition disclosed herein comprises 260 ppm to 360 ppm hypochlorous acid or free available chlorine, 80 ppm to 160 ppm copper salt, 40 ppm to 120 ppm zinc salt, and 140 ppm to 220 ppm calcium salt.
  • a composition disclosed herein comprises 280 ppm to 340 ppm hypochlorous acid or free available chlorine, 100 ppm to 140 ppm copper salt, 60 ppm to 100 ppm zinc salt, and 160 ppm to 200 ppm calcium salt.
  • a composition disclosed herein comprises 300 ppm to 320 ppm hypochlorous acid or free available chlorine, 110 ppm to 130 ppm copper salt, 70 ppm to 90 ppm, zinc salt, and 170 ppm to 190 ppm calcium salt.
  • a composition disclosed herein comprises 310 ppm hypochlorous acid or free available chlorine, 120 ppm copper salt, 80 ppm zinc salt, and 180 ppm calcium salt.
  • a composition disclosed herein comprises 150 ppm to 450 ppm hypochlorous acid or free available chlorine, 10 ppm to 160 ppm copper salt, 10 ppm to 160 ppm zinc salt and 100 ppm to 260 ppm calcium salt.
  • a composition disclosed herein comprises 200 ppm to 400 ppm hypochlorous acid or free available chlorine, 20 ppm to 140 ppm copper salt, 20 ppm to 140 ppm zinc salt, and 120 ppm to 240 ppm calcium salt.
  • a composition disclosed herein comprises 260 ppm to 360 ppm hypochlorous acid or free available chlorine, 40 ppm to 120 ppm copper salt, 40 ppm to 120 ppm zinc salt, and 140 ppm to 220 ppm calcium salt.
  • a composition disclosed herein comprises 280 ppm to 340 ppm hypochlorous acid or free available chlorine, 60 ppm to 100 ppm copper salt, 60 ppm to 100 ppm zinc salt, and 160 ppm to 200 ppm calcium salt.
  • a composition disclosed herein comprises 300 ppm to 320 ppm hypochlorous acid or free available chlorine, 70 ppm to 90 ppm copper salt, 70 ppm to 90 ppm, zinc salt, and 170 ppm to 190 ppm calcium salt.
  • a composition disclosed herein comprises 310 ppm hypochlorous acid or free available chlorine, 80 ppm copper salt, 80 ppm zinc salt, and 180 ppm calcium salt.
  • a composition disclosed herein comprises 150 ppm to 450 ppm hypochlorous acid or free available chlorine, 10 ppm to 140 ppm copper salt, 10 ppm to 140 ppm zinc salt and 100 ppm to 260 ppm calcium salt.
  • a composition disclosed herein comprises 200 ppm to 400 ppm hypochlorous acid or free available chlorine, 20 ppm to 120 ppm copper salt, 20 ppm to 120 ppm zinc salt, and 120 ppm to 240 ppm calcium salt.
  • a composition disclosed herein comprises 260 ppm to 360 ppm hypochlorous acid or free available chlorine, 30 ppm to 100 ppm copper salt, 30 ppm to 100 ppm zinc salt, and 140 ppm to 220 ppm calcium salt.
  • a composition disclosed herein comprises 280 ppm to 340 ppm hypochlorous acid or free available chlorine, 40 ppm to 80 ppm copper salt, 40 ppm to 80 ppm zinc salt, and 160 ppm to 200 ppm calcium salt.
  • a composition disclosed herein comprises 300 ppm to 320 ppm hypochlorous acid or free available chlorine, 50 ppm to 70 ppm copper salt, 50 ppm to 70 ppm, zinc salt, and 170 ppm to 190 ppm calcium salt.
  • a composition disclosed herein comprises 310 ppm hypochlorous acid or free available chlorine, 40 ppm copper salt, 40 ppm zinc salt, and 180 ppm calcium salt.
  • a composition disclosed herein comprises 150 ppm to 450 ppm hypochlorous acid or free available chlorine, 20 ppm to 220 ppm copper salt, 20 ppm to 220 ppm zinc salt and 120 ppm to 280 ppm calcium salt.
  • a composition disclosed herein comprises 200 ppm to 400 ppm hypochlorous acid or free available chlorine, 60 ppm to 180 ppm copper salt, 60 ppm to 180 ppm zinc salt, and 140 ppm to 260 ppm calcium salt.
  • a composition disclosed herein comprises 260 ppm to 360 ppm hypochlorous acid or free available chlorine, 80 ppm to 160 ppm copper salt, 80 ppm to 160 ppm zinc salt, and 160 ppm to 240 ppm calcium salt.
  • a composition disclosed herein comprises 280 ppm to 340 ppm hypochlorous acid or free available chlorine, 100 ppm to 140 ppm copper salt, 100 ppm to 140 ppm zinc salt, and 180 ppm to 220 ppm calcium salt.
  • a composition disclosed herein comprises 300 ppm to 320 ppm hypochlorous acid or free available chlorine, 110 ppm to 130 ppm copper salt, 110 ppm to 130 ppm, zinc salt, and 190 ppm to 210 ppm calcium salt.
  • a composition disclosed herein comprises 310 ppm hypochlorous acid or free available chlorine, 120 ppm copper salt, 120 ppm zinc salt, and 200 ppm calcium salt.
  • a composition disclosed herein comprises 150 ppm to 450 ppm hypochlorous acid or free available chlorine, 20 ppm to 220 ppm copper salt, 10 ppm to 160 ppm zinc salt and 120 ppm to 280 ppm calcium salt.
  • a composition disclosed herein comprises 200 ppm to 400 ppm hypochlorous acid or free available chlorine, 60 ppm to 180 ppm copper salt, 20 ppm to 140 ppm zinc salt, and 140 ppm to 260 ppm calcium salt.
  • a composition disclosed herein comprises 260 ppm to 360 ppm hypochlorous acid or free available chlorine, 80 ppm to 160 ppm copper salt, 40 ppm to 120 ppm zinc salt, and 160 ppm to 240 ppm calcium salt.
  • a composition disclosed herein comprises 280 ppm to 340 ppm hypochlorous acid or free available chlorine, 100 ppm to 140 ppm copper salt, 60 ppm to 100 ppm zinc salt, and 180 ppm to 220 ppm calcium salt.
  • a composition disclosed herein comprises 300 ppm to 320 ppm hypochlorous acid or free available chlorine, 110 ppm to 130 ppm copper salt, 70 ppm to 90 ppm, zinc salt, and 190 ppm to 210 ppm calcium salt.
  • a composition disclosed herein comprises 310 ppm hypochlorous acid or free available chlorine, 120 ppm copper salt, 80 ppm zinc salt, and 200 ppm calcium salt.
  • a composition disclosed herein comprises 150 ppm to 450 ppm hypochlorous acid or free available chlorine, 10 ppm to 160 ppm copper salt, 10 ppm to 160 ppm zinc salt and 120 ppm to 280 ppm calcium salt.
  • a composition disclosed herein comprises 200 ppm to 400 ppm hypochlorous acid or free available chlorine, 20 ppm to 140 ppm copper salt, 20 ppm to 140 ppm zinc salt, and 140 ppm to 260 ppm calcium salt.
  • a composition disclosed herein comprises 260 ppm to 360 ppm hypochlorous acid or free available chlorine, 40 ppm to 120 ppm copper salt, 40 ppm to 120 ppm zinc salt, and 160 ppm to 240 ppm calcium salt.
  • a composition disclosed herein comprises 280 ppm to 340 ppm hypochlorous acid or free available chlorine, 60 ppm to 100 ppm copper salt, 60 ppm to 100 ppm zinc salt, and 180 ppm to 220 ppm calcium salt.
  • a composition disclosed herein comprises 300 ppm to 320 ppm hypochlorous acid or free available chlorine, 70 ppm to 90 ppm copper salt, 70 ppm to 90 ppm, zinc salt, and 190 ppm to 210 ppm calcium salt.
  • a composition disclosed herein comprises 310 ppm hypochlorous acid or free available chlorine, 80 ppm copper salt, 80 ppm zinc salt, and 200 ppm calcium salt.
  • a composition disclosed herein comprises 150 ppm to 450 ppm hypochlorous acid or free available chlorine, 20 ppm to 220 ppm copper salt, 20 ppm to 220 ppm zinc salt and 140 ppm to 300 ppm calcium salt.
  • a composition disclosed herein comprises 200 ppm to 400 ppm hypochlorous acid or free available chlorine, 60 ppm to 180 ppm copper salt, 60 ppm to 180 ppm zinc salt, and 160 ppm to 280 ppm calcium salt.
  • a composition disclosed herein comprises 260 ppm to 360 ppm hypochlorous acid or free available chlorine, 80 ppm to 160 ppm copper salt, 80 ppm to 160 ppm zinc salt, and 180 ppm to 260 ppm calcium salt.
  • a composition disclosed herein comprises 280 ppm to 340 ppm hypochlorous acid or free available chlorine, 100 ppm to 140 ppm copper salt, 100 ppm to 140 ppm zinc salt, and 200 ppm to 240 ppm calcium salt.
  • a composition disclosed herein comprises 300 ppm to 320 ppm hypochlorous acid or free available chlorine, 110 ppm to 130 ppm copper salt, 110 ppm to 130 ppm, zinc salt, and 210 ppm to 230 ppm calcium salt.
  • a composition disclosed herein comprises 310 ppm hypochlorous acid or free available chlorine, 120 ppm copper salt, 120 ppm zinc salt, and 220 ppm calcium salt.
  • a composition disclosed herein comprises 150 ppm to 450 ppm hypochlorous acid or free available chlorine, 20 ppm to 220 ppm copper salt, 10 ppm to 160 ppm zinc salt and 140 ppm to 300 ppm calcium salt.
  • a composition disclosed herein comprises 200 ppm to 400 ppm hypochlorous acid or free available chlorine, 60 ppm to 180 ppm copper salt, 20 ppm to 140 ppm zinc salt, and 160 ppm to 280 ppm calcium salt.
  • a composition disclosed herein comprises 260 ppm to 360 ppm hypochlorous acid or free available chlorine, 80 ppm to 160 ppm copper salt, 40 ppm to 120 ppm zinc salt, and 180 ppm to 260 ppm calcium salt.
  • a composition disclosed herein comprises 280 ppm to 340 ppm hypochlorous acid or free available chlorine, 100 ppm to 140 ppm copper salt, 60 ppm to 100 ppm zinc salt, and 200 ppm to 240 ppm calcium salt.
  • a composition disclosed herein comprises 300 ppm to 320 ppm hypochlorous acid or free available chlorine, 110 ppm to 130 ppm copper salt, 70 ppm to 90 ppm, zinc salt, and 210 ppm to 230 ppm calcium salt.
  • a composition disclosed herein comprises 310 ppm hypochlorous acid or free available chlorine, 120 ppm copper salt, 80 ppm zinc salt, and 220 ppm calcium salt.
  • a composition disclosed herein comprises 150 ppm to 450 ppm hypochlorous acid or free available chlorine, 10 ppm to 160 ppm copper salt, 10 ppm to 160 ppm zinc salt and 140 ppm to 300 ppm calcium salt.
  • a composition disclosed herein comprises 200 ppm to 400 ppm hypochlorous acid or free available chlorine, 20 ppm to 140 ppm copper salt, 20 ppm to 140 ppm zinc salt, and 160 ppm to 280 ppm calcium salt.
  • a composition disclosed herein comprises 260 ppm to 360 ppm hypochlorous acid or free available chlorine, 40 ppm to 120 ppm copper salt, 40 ppm to 120 ppm zinc salt, and 180 ppm to 260 ppm calcium salt.
  • a composition disclosed herein comprises 280 ppm to 340 ppm hypochlorous acid or free available chlorine, 60 ppm to 100 ppm copper salt, 60 ppm to 100 ppm zinc salt, and 200 ppm to 240 ppm calcium salt.
  • a composition disclosed herein comprises 300 ppm to 320 ppm hypochlorous acid or free available chlorine, 70 ppm to 90 ppm copper salt, 70 ppm to 90 ppm, zinc salt, and 210 ppm to 230 ppm calcium salt.
  • a composition disclosed herein comprises 310 ppm hypochlorous acid or free available chlorine, 80 ppm copper salt, 80 ppm zinc salt, and 220 ppm calcium salt.
  • a composition disclosed herein comprises 150 ppm to 450 ppm hypochlorous acid or free available chlorine, 20 ppm to 220 ppm copper salt, 20 ppm to 220 ppm zinc salt and 160 ppm to 320 ppm calcium salt.
  • a composition disclosed herein comprises 200 ppm to 400 ppm hypochlorous acid or free available chlorine, 60 ppm to 180 ppm copper salt, 60 ppm to 180 ppm zinc salt, and 80 ppm to 300 ppm calcium salt.
  • a composition disclosed herein comprises 260 ppm to 360 ppm hypochlorous acid or free available chlorine, 80 ppm to 160 ppm copper salt, 80 ppm to 160 ppm zinc salt, and 200 ppm to 280 ppm calcium salt.
  • a composition disclosed herein comprises 280 ppm to 340 ppm hypochlorous acid or free available chlorine, 100 ppm to 140 ppm copper salt, 100 ppm to 140 ppm zinc salt, and 200 ppm to 260 ppm calcium salt.
  • a composition disclosed herein comprises 300 ppm to 320 ppm hypochlorous acid or free available chlorine, 110 ppm to 130 ppm copper salt, 110 ppm to 130 ppm, zinc salt, and 230 ppm to 250 ppm calcium salt.
  • a composition disclosed herein comprises 310 ppm hypochlorous acid or free available chlorine, 120 ppm copper salt, 120 ppm zinc salt, and 240 ppm calcium salt.
  • a composition disclosed herein comprises 150 ppm to 450 ppm hypochlorous acid or free available chlorine, 20 ppm to 220 ppm copper salt, 10 ppm to 160 ppm zinc salt and 160 ppm to 320 ppm calcium salt.
  • a composition disclosed herein comprises 200 ppm to 400 ppm hypochlorous acid or free available chlorine, 60 ppm to 180 ppm copper salt, 20 ppm to 140 ppm zinc salt, and 180 ppm to 300 ppm calcium salt.
  • a composition disclosed herein comprises 260 ppm to 360 ppm hypochlorous acid or free available chlorine, 80 ppm to 160 ppm copper salt, 40 ppm to 120 ppm zinc salt, and 200 ppm to 280 ppm calcium salt.
  • a composition disclosed herein comprises 280 ppm to 340 ppm hypochlorous acid or free available chlorine, 100 ppm to 140 ppm copper salt, 60 ppm to 100 ppm zinc salt, and 220 ppm to 260 ppm calcium salt.
  • a composition disclosed herein comprises 300 ppm to 320 ppm hypochlorous acid or free available chlorine, 110 ppm to 130 ppm copper salt, 70 ppm to 90 ppm, zinc salt, and 230 ppm to 250 ppm calcium salt.
  • a composition disclosed herein comprises 310 ppm hypochlorous acid or free available chlorine, 120 ppm copper salt, 80 ppm zinc salt, and 240 ppm calcium salt.
  • a composition disclosed herein comprises 150 ppm to 450 ppm hypochlorous acid or free available chlorine, 10 ppm to 160 ppm copper salt, 10 ppm to 160 ppm zinc salt and 160 ppm to 320 ppm calcium salt.
  • a composition disclosed herein comprises 200 ppm to 400 ppm hypochlorous acid or free available chlorine, 20 ppm to 140 ppm copper salt, 20 ppm to 140 ppm zinc salt, and 80 ppm to 300 ppm calcium salt.
  • a composition disclosed herein comprises 260 ppm to 360 ppm hypochlorous acid or free available chlorine, 40 ppm to 120 ppm copper salt, 40 ppm to 120 ppm zinc salt, and 200 ppm to 280 ppm calcium salt.
  • a composition disclosed herein comprises 280 ppm to 340 ppm hypochlorous acid or free available chlorine, 60 ppm to 100 ppm copper salt, 60 ppm to 100 ppm zinc salt, and 220 ppm to 260 ppm calcium salt.
  • a composition disclosed herein comprises 300 ppm to 320 ppm hypochlorous acid or free available chlorine, 70 ppm to 90 ppm copper salt, 70 ppm to 90 ppm, zinc salt, and 230 ppm to 250 ppm calcium salt.
  • a composition disclosed herein comprises 310 ppm hypochlorous acid or free available chlorine, 80 ppm copper salt, 80 ppm zinc salt, and 240 ppm calcium salt.
  • a composition disclosed herein comprises 170 ppm to 470 ppm hypochlorous acid or free available chlorine, 40 ppm to 240 ppm copper salt, 30 ppm to 180 ppm zinc salt and 100 ppm to 260 ppm calcium salt.
  • a composition disclosed herein comprises 220 ppm to 420 ppm hypochlorous acid or free available chlorine, 80 ppm to 200 ppm copper salt, 40 ppm to 160 ppm zinc salt, and 120 ppm to 240 ppm calcium salt.
  • a composition disclosed herein comprises 280 ppm to 380 ppm hypochlorous acid or free available chlorine, 100 ppm to 180 ppm copper salt, 60 ppm to 140 ppm zinc salt, and 140 ppm to 220 ppm calcium salt.
  • a composition disclosed herein comprises 300 ppm to 360 ppm hypochlorous acid or free available chlorine, 120 ppm to 160 ppm copper salt, 80 ppm to 120 ppm zinc salt, and 160 ppm to 200 ppm calcium salt.
  • a composition disclosed herein comprises 320 ppm to 340 ppm hypochlorous acid or free available chlorine, 130 ppm to 150 ppm copper salt, 90 ppm to 100 ppm, zinc salt, and 170 ppm to 190 ppm calcium salt.
  • a composition disclosed herein comprises 330 ppm hypochlorous acid or free available chlorine, 140 ppm copper salt, 100 ppm zinc salt, and 180 ppm calcium salt.
  • a composition disclosed herein comprises 130 ppm to 430 ppm hypochlorous acid or free available chlorine, 10 ppm to 200 ppm copper salt, 10 ppm to 160 ppm zinc salt and 60 ppm to 220 ppm calcium salt.
  • a composition disclosed herein comprises 180 ppm to 380 ppm hypochlorous acid or free available chlorine, 40 ppm to 160 ppm copper salt, 20 ppm to 140 ppm zinc salt, and 80 ppm to 200 ppm calcium salt.
  • a composition disclosed herein comprises 240 ppm to 340 ppm hypochlorous acid or free available chlorine, 60 ppm to 140 ppm copper salt, 40 ppm to 120 ppm zinc salt, and 100 ppm to 180 ppm calcium salt.
  • a composition disclosed herein comprises 260 ppm to 320 ppm hypochlorous acid or free available chlorine, 80 ppm to 120 ppm copper salt, 60 ppm to 100 ppm zinc salt, and 120 ppm to 160 ppm calcium salt.
  • a composition disclosed herein comprises 280 ppm to 300 ppm hypochlorous acid or free available chlorine, 90 ppm to 110 ppm copper salt, 70 ppm to 90 ppm, zinc salt, and 130 ppm to 150 ppm calcium salt.
  • a composition disclosed herein comprises 290 ppm hypochlorous acid or free available chlorine, 100 ppm copper salt, 80 ppm zinc salt, and 140 ppm calcium salt.
  • a composition disclosed herein comprises 20 ppm to 500 ppm hypochlorous acid or free available chlorine, 2.5 ppm to 240 ppm one or more metal salts, and 5 ppm to 200 ppm of a phosphate buffer.
  • a composition disclosed herein comprises 20 ppm to 500 ppm hypochlorous acid or free available chlorine, 2.5 ppm to 240 ppm of a copper salt, 2.5 ppm to 240 ppm of zinc salt, and 5 ppm to 200 ppm of a phosphate buffer.
  • a composition disclosed herein comprises 20 ppm to 500 ppm hypochlorous acid or free available chlorine, 2.5 ppm to 240 of a copper chloride, 2.5 ppm to 240 of a zinc chloride, and 5 ppm to 200 ppm of a phosphate buffer.
  • a composition disclosed herein comprises 10 ppm to 200 ppm hypochlorous acid or free available chlorine, 10 ppm to 160 ppm copper salt, 10 ppm to 160 ppm zinc salt and 10 ppm to 160 ppm of a calcium phosphate or sodium phosphate.
  • a composition disclosed herein comprises 20 ppm to 180 ppm hypochlorous acid or free available chlorine, 20 ppm to 140 ppm copper salt, 20 ppm to 140 ppm zinc salt, and 20 ppm to 140 ppm of a calcium phosphate or sodium phosphate.
  • a composition disclosed herein comprises 40 ppm to 140 ppm hypochlorous acid or free available chlorine, 40 ppm to 120 ppm copper salt, 40 ppm to 120 ppm zinc salt, and 40 ppm to 120 ppm of a calcium phosphate or sodium phosphate.
  • a composition disclosed herein comprises 60 ppm to 120 ppm hypochlorous acid or free available chlorine, 60 ppm to 100 ppm copper salt, 60 ppm to 100 ppm zinc salt, and 60 ppm to 100 ppm of a calcium phosphate or sodium phosphate.
  • a composition disclosed herein comprises 80 ppm to 100 ppm hypochlorous acid or free available chlorine, 70 ppm to 90 ppm copper salt, 70 ppm to 90 ppm, zinc salt, and 70 ppm to 90 ppm of a calcium phosphate or sodium phosphate.
  • a composition disclosed herein comprises 90 ppm hypochlorous acid or free available chlorine, 80 ppm copper salt, 80 ppm zinc salt, and 80 ppm of a calcium phosphate or sodium phosphate.
  • a composition disclosed herein comprises 10 ppm to 200 ppm hypochlorous acid or free available chlorine, 5 ppm to 120 ppm copper salt, 5 ppm to 120 ppm zinc salt and 10 ppm to 160 ppm of a calcium phosphate or sodium phosphate.
  • a composition disclosed herein comprises 20 ppm to 180 ppm hypochlorous acid or free available chlorine, 10 ppm to 100 ppm copper salt, 10 ppm to 100 ppm zinc salt, and 20 ppm to 140 ppm of a calcium phosphate or sodium phosphate.
  • a composition disclosed herein comprises 40 ppm to 140 ppm hypochlorous acid or free available chlorine, 15 ppm to 80 ppm copper salt, 15 ppm to 80 ppm zinc salt, and 40 ppm to 120 ppm of a calcium phosphate or sodium phosphate.
  • a composition disclosed herein comprises 60 ppm to 120 ppm hypochlorous acid or free available chlorine, 20 ppm to 60 ppm copper salt, 20 ppm to 60 ppm zinc salt, and 60 ppm to 100 ppm of a calcium phosphate or sodium phosphate.
  • a composition disclosed herein comprises 80 ppm to 100 ppm hypochlorous acid or free available chlorine, 30 ppm to 50 ppm copper salt, 30 ppm to 50 ppm, zinc salt, and 70 ppm to 90 ppm of a calcium phosphate or sodium phosphate.
  • a composition disclosed herein comprises 90 ppm hypochlorous acid or free available chlorine, 40 ppm copper salt, 40 ppm zinc salt, and 80 ppm of a calcium phosphate or sodium phosphate.
  • a composition disclosed herein comprises 10 ppm to 200 ppm hypochlorous acid or free available chlorine, 2.5 ppm to 60 ppm copper salt, 2.5 ppm to 60 ppm zinc salt and 10 ppm to 160 ppm of a calcium phosphate or sodium phosphate.
  • a composition disclosed herein comprises 20 ppm to 180 ppm hypochlorous acid or free available chlorine, 5 ppm to 50 ppm copper salt, 5 ppm to 50 ppm zinc salt, and 20 ppm to 140 ppm of a calcium phosphate or sodium phosphate.
  • a composition disclosed herein comprises 40 ppm to 140 ppm hypochlorous acid or free available chlorine, 7.5 ppm to 40 ppm copper salt, 7.5 ppm to 40 ppm zinc salt, and 40 ppm to 120 ppm of a calcium phosphate or sodium phosphate.
  • a composition disclosed herein comprises 60 ppm to 120 ppm hypochlorous acid or free available chlorine, 10 ppm to 30 ppm copper salt, 10 ppm to 30 ppm zinc salt, and 60 ppm to 100 ppm of a calcium phosphate or sodium phosphate.
  • a composition disclosed herein comprises 80 ppm to 100 ppm hypochlorous acid or free available chlorine, 15 ppm to 25 ppm copper salt, 15 ppm to 25 ppm, zinc salt, and 70 ppm to 90 ppm of a calcium phosphate or sodium phosphate.
  • a composition disclosed herein comprises 90 ppm hypochlorous acid or free available chlorine, 20 ppm copper salt, 20 ppm zinc salt, and 80 ppm of a calcium phosphate or sodium phosphate.
  • a composition disclosed herein comprises 10 ppm to 200 ppm hypochlorous acid or free available chlorine, 5 ppm to 120 ppm copper salt, 5 ppm to 120 ppm zinc salt and 5 ppm to 120 ppm of a calcium phosphate or sodium phosphate.
  • a composition disclosed herein comprises 20 ppm to 180 ppm hypochlorous acid or free available chlorine, 10 ppm to 100 ppm copper salt, 10 ppm to 100 ppm zinc salt, and 10 ppm to 100 ppm of a calcium phosphate or sodium phosphate.
  • a composition disclosed herein comprises 40 ppm to 140 ppm hypochlorous acid or free available chlorine, 15 ppm to 80 ppm copper salt, 15 ppm to 80 ppm zinc salt, and 15 ppm to 80 ppm of a calcium phosphate or sodium phosphate.
  • a composition disclosed herein comprises 60 ppm to 120 ppm hypochlorous acid or free available chlorine, 20 ppm to 60 ppm copper salt, 20 ppm to 60 ppm zinc salt, and 20 ppm to 60 ppm of a calcium phosphate or sodium phosphate.
  • a composition disclosed herein comprises 80 ppm to 100 ppm hypochlorous acid or free available chlorine, 30 ppm to 50 ppm copper salt, 30 ppm to 50 ppm, zinc salt, and 30 ppm to 50 ppm of a calcium phosphate or sodium phosphate.
  • a composition disclosed herein comprises 90 ppm hypochlorous acid or free available chlorine, 40 ppm copper salt, 40 ppm zinc salt, and 40 ppm of a calcium phosphate or sodium phosphate.
  • a composition disclosed herein comprises 150 ppm to 450 ppm hypochlorous acid or free available chlorine, 10 ppm to 160 ppm copper salt, 10 ppm to 160 ppm zinc salt and 10 ppm to 160 ppm of a calcium phosphate or sodium phosphate.
  • a composition disclosed herein comprises 200 ppm to 400 ppm hypochlorous acid or free available chlorine, 20 ppm to 140 ppm copper salt, 20 ppm to 140 ppm zinc salt, and 20 ppm to 140 ppm of a calcium phosphate or sodium phosphate.
  • a composition disclosed herein comprises 260 ppm to 360 ppm hypochlorous acid or free available chlorine, 40 ppm to 120 ppm copper salt, 40 ppm to 120 ppm zinc salt, and 40 ppm to 120 ppm of a calcium phosphate or sodium phosphate.
  • a composition disclosed herein comprises 280 ppm to 340 ppm hypochlorous acid or free available chlorine, 60 ppm to 100 ppm copper salt, 60 ppm to 100 ppm zinc salt, and 60 ppm to 100 ppm of a calcium phosphate or sodium phosphate.
  • a composition disclosed herein comprises 300 ppm to 320 ppm hypochlorous acid or free available chlorine, 70 ppm to 90 ppm copper salt, 70 ppm to 90 ppm, zinc salt, and 70 ppm to 90 ppm of a calcium phosphate or sodium phosphate.
  • a composition disclosed herein comprises 310 ppm hypochlorous acid or free available chlorine, 80 ppm copper salt, 80 ppm zinc salt, and 80 ppm of a calcium phosphate or sodium phosphate.
  • a composition disclosed herein comprises 150 ppm to 450 ppm hypochlorous acid or free available chlorine, 10 ppm to 140 ppm copper salt, 10 ppm to 140 ppm zinc salt and 10 ppm to 160 ppm of a calcium phosphate or sodium phosphate.
  • a composition disclosed herein comprises 200 ppm to 400 ppm hypochlorous acid or free available chlorine, 20 ppm to 120 ppm copper salt, 20 ppm to 120 ppm zinc salt, and 20 ppm to 140 ppm of a calcium phosphate or sodium phosphate.
  • a composition disclosed herein comprises 260 ppm to 360 ppm hypochlorous acid or free available chlorine, 30 ppm to 100 ppm copper salt, 30 ppm to 100 ppm zinc salt, and 40 ppm to 120 ppm of a calcium phosphate or sodium phosphate.
  • a composition disclosed herein comprises 280 ppm to 340 ppm hypochlorous acid or free available chlorine, 40 ppm to 80 ppm copper salt, 40 ppm to 80 ppm zinc salt, and 60 ppm to 100 ppm of a calcium phosphate or sodium phosphate.
  • a composition disclosed herein comprises 300 ppm to 320 ppm hypochlorous acid or free available chlorine, 50 ppm to 70 ppm copper salt, 50 ppm to 70 ppm, zinc salt, and 70 ppm to 90 ppm of a calcium phosphate or sodium phosphate.
  • a composition disclosed herein comprises 310 ppm hypochlorous acid or free available chlorine, 40 ppm copper salt, 40 ppm zinc salt, and 80 ppm of a calcium phosphate or sodium phosphate.
  • a composition disclosed herein comprises 150 ppm to 450 ppm hypochlorous acid or free available chlorine, 10 ppm to 140 ppm copper salt, 10 ppm to 140 ppm zinc salt and 10 ppm to 140 ppm of a calcium phosphate or sodium phosphate.
  • a composition disclosed herein comprises 200 ppm to 400 ppm hypochlorous acid or free available chlorine, 20 ppm to 120 ppm copper salt, 20 ppm to 120 ppm zinc salt, and 20 ppm to 120 ppm of a calcium phosphate or sodium phosphate.
  • a composition disclosed herein comprises 260 ppm to 360 ppm hypochlorous acid or free available chlorine, 30 ppm to 100 ppm copper salt, 30 ppm to 100 ppm zinc salt, and 30 ppm to 100 ppm of a calcium phosphate or sodium phosphate.
  • a composition disclosed herein comprises 280 ppm to 340 ppm hypochlorous acid or free available chlorine, 40 ppm to 80 ppm copper salt, 40 ppm to 80 ppm zinc salt, and 40 ppm to 80 ppm of a calcium phosphate or sodium phosphate.
  • a composition disclosed herein comprises 300 ppm to 320 ppm hypochlorous acid or free available chlorine, 50 ppm to 70 ppm copper salt, 50 ppm to 70 ppm, zinc salt, and 50 ppm to 70 ppm of a calcium phosphate or sodium phosphate.
  • a composition disclosed herein comprises 310 ppm hypochlorous acid or free available chlorine, 40 ppm copper salt, 40 ppm zinc salt, and 40 ppm of a calcium phosphate or sodium phosphate.
  • a composition disclosed herein comprises 20 ppm to 500 ppm hypochlorous acid or free available chlorine, 2.5 ppm to 240 ppm one or more metal salts, 5 ppm to 200 ppm of a phosphate buffer, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 20 ppm to 500 ppm hypochlorous acid or free available chlorine, 2.5 ppm to 240 of a copper salt, 2.5 ppm to 240 of zinc salt, 5 ppm to 200 ppm of a phosphate buffer and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 20 ppm to 500 ppm hypochlorous acid or free available chlorine, 2.5 ppm to 240 of a copper chloride, 2.5 ppm to 240 of a zinc chloride, and 5 ppm to 200 ppm of a phosphate buffer and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 10 ppm to 200 ppm hypochlorous acid or free available chlorine, 10 ppm to 160 ppm copper salt, 10 ppm to 160 ppm zinc salt, 10 ppm to 160 ppm of a calcium phosphate or sodium phosphate, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 20 ppm to 180 ppm hypochlorous acid or free available chlorine, 20 ppm to 140 ppm copper salt, 20 ppm to 140 ppm zinc salt, 20 ppm to 140 ppm of a calcium phosphate or sodium phosphate, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 40 ppm to 140 ppm hypochlorous acid or free available chlorine, 40 ppm to 120 ppm copper salt, 40 ppm to 120 ppm zinc salt, 40 ppm to 120 ppm of a calcium phosphate or sodium phosphate, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 60 ppm to 120 ppm hypochlorous acid or free available chlorine, 60 ppm to 100 ppm copper salt, 60 ppm to 100 ppm zinc salt, 60 ppm to 100 ppm of a calcium phosphate or sodium phosphate, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 80 ppm to 100 ppm hypochlorous acid or free available chlorine, 70 ppm to 90 ppm copper salt, 70 ppm to 90 ppm, zinc salt, 70 ppm to 90 ppm of a calcium phosphate or sodium phosphate, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 90 ppm hypochlorous acid or free available chlorine, 80 ppm copper salt, 80 ppm zinc salt, 80 ppm of a calcium phosphate or sodium phosphate, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 10 ppm to 200 ppm hypochlorous acid or free available chlorine, 5 ppm to 120 ppm copper salt, 5 ppm to 120 ppm zinc salt, 10 ppm to 160 ppm of a calcium phosphate or sodium phosphate, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 20 ppm to 180 ppm hypochlorous acid or free available chlorine, 10 ppm to 100 ppm copper salt, 10 ppm to 100 ppm zinc salt, 20 ppm to 140 ppm of a calcium phosphate or sodium phosphate, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 40 ppm to 140 ppm hypochlorous acid or free available chlorine, 15 ppm to 80 ppm copper salt, 15 ppm to 80 ppm zinc salt, 40 ppm to 120 ppm of a calcium phosphate or sodium phosphate, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 60 ppm to 120 ppm hypochlorous acid or free available chlorine, 20 ppm to 60 ppm copper salt, 20 ppm to 60 ppm zinc salt, 60 ppm to 100 ppm of a calcium phosphate or sodium phosphate, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 80 ppm to 100 ppm hypochlorous acid or free available chlorine, 30 ppm to 50 ppm copper salt, 30 ppm to 50 ppm, zinc salt, 70 ppm to 90 ppm of a calcium phosphate or sodium phosphate, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 90 ppm hypochlorous acid or free available chlorine, 40 ppm copper salt, 40 ppm zinc salt, 80 ppm of a calcium phosphate or sodium phosphate, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 10 ppm to 200 ppm hypochlorous acid or free available chlorine, 2.5 ppm to 60 ppm copper salt, 2.5 ppm to 60 ppm zinc salt, 10 ppm to 160 ppm of a calcium phosphate or sodium phosphate, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 20 ppm to 180 ppm hypochlorous acid or free available chlorine, 5 ppm to 50 ppm copper salt, 5 ppm to 50 ppm zinc salt, 20 ppm to 140 ppm of a calcium phosphate or sodium phosphate, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 40 ppm to 140 ppm hypochlorous acid or free available chlorine, 7.5 ppm to 40 ppm copper salt, 7.5 ppm to 40 ppm zinc salt, 40 ppm to 120 ppm of a calcium phosphate or sodium phosphate, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 60 ppm to 120 ppm hypochlorous acid or free available chlorine, 10 ppm to 30 ppm copper salt, 10 ppm to 30 ppm zinc salt, 60 ppm to 100 ppm of a calcium phosphate or sodium phosphate, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 80 ppm to 100 ppm hypochlorous acid or free available chlorine, 15 ppm to 25 ppm copper salt, 15 ppm to 25 ppm, zinc salt, 70 ppm to 90 ppm of a calcium phosphate or sodium phosphate, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 90 ppm hypochlorous acid or free available chlorine, 20 ppm copper salt, 20 ppm zinc salt, 80 ppm of a calcium phosphate or sodium phosphate, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 10 ppm to 200 ppm hypochlorous acid or free available chlorine, 5 ppm to 120 ppm copper salt, 5 ppm to 120 ppm zinc salt, 5 ppm to 120 ppm of a calcium phosphate or sodium phosphate, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 20 ppm to 180 ppm hypochlorous acid or free available chlorine, 10 ppm to 100 ppm copper salt, 10 ppm to 100 ppm zinc salt, 10 ppm to 100 ppm of a calcium phosphate or sodium phosphate, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 40 ppm to 140 ppm hypochlorous acid or free available chlorine, 15 ppm to 80 ppm copper salt, 15 ppm to 80 ppm zinc salt, 15 ppm to 80 ppm of a calcium phosphate or sodium phosphate, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 60 ppm to 120 ppm hypochlorous acid or free available chlorine, 20 ppm to 60 ppm copper salt, 20 ppm to 60 ppm zinc salt, 20 ppm to 60 ppm of a calcium phosphate or sodium phosphate, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 80 ppm to 100 ppm hypochlorous acid or free available chlorine, 30 ppm to 50 ppm copper salt, 30 ppm to 50 ppm, zinc salt, 30 ppm to 50 ppm of a calcium phosphate or sodium phosphate, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 90 ppm hypochlorous acid or free available chlorine, 40 ppm copper salt, 40 ppm zinc salt, 40 ppm of a calcium phosphate or sodium phosphate, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 150 ppm to 450 ppm hypochlorous acid or free available chlorine, 10 ppm to 160 ppm copper salt, 10 ppm to 160 ppm zinc salt, 10 ppm to 160 ppm of a calcium phosphate or sodium phosphate, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 200 ppm to 400 ppm hypochlorous acid or free available chlorine, 20 ppm to 140 ppm copper salt, 20 ppm to 140 ppm zinc salt, 20 ppm to 140 ppm of a calcium phosphate or sodium phosphate, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 260 ppm to 360 ppm hypochlorous acid or free available chlorine, 40 ppm to 120 ppm copper salt, 40 ppm to 120 ppm zinc salt, 40 ppm to 120 ppm of a calcium phosphate or sodium phosphate, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 280 ppm to 340 ppm hypochlorous acid or free available chlorine, 60 ppm to 100 ppm copper salt, 60 ppm to 100 ppm zinc salt, 60 ppm to 100 ppm of a calcium phosphate or sodium phosphate, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 300 ppm to 320 ppm hypochlorous acid or free available chlorine, 70 ppm to 90 ppm copper salt, 70 ppm to 90 ppm, zinc salt, 70 ppm to 90 ppm of a calcium phosphate or sodium phosphate, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 310 ppm hypochlorous acid or free available chlorine, 80 ppm copper salt, 80 ppm zinc salt, 80 ppm of a calcium phosphate or sodium phosphate, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 150 ppm to 450 ppm hypochlorous acid or free available chlorine, 10 ppm to 140 ppm copper salt, 10 ppm to 140 ppm zinc salt, 10 ppm to 160 ppm of a calcium phosphate or sodium phosphate and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 200 ppm to 400 ppm hypochlorous acid or free available chlorine, 20 ppm to 120 ppm copper salt, 20 ppm to 120 ppm zinc salt, 20 ppm to 140 ppm of a calcium phosphate or sodium phosphate and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 260 ppm to 360 ppm hypochlorous acid or free available chlorine, 30 ppm to 100 ppm copper salt, 30 ppm to 100 ppm zinc salt, 40 ppm to 120 ppm of a calcium phosphate or sodium phosphate and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 280 ppm to 340 ppm hypochlorous acid or free available chlorine, 40 ppm to 80 ppm copper salt, 40 ppm to 80 ppm zinc salt, 60 ppm to 100 ppm of a calcium phosphate or sodium phosphate and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 300 ppm to 320 ppm hypochlorous acid or free available chlorine, 50 ppm to 70 ppm copper salt, 50 ppm to 70 ppm, zinc salt, 70 ppm to 90 ppm of a calcium phosphate or sodium phosphate and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 310 ppm hypochlorous acid or free available chlorine, 40 ppm copper salt, 40 ppm zinc salt, 80 ppm of a calcium phosphate or sodium phosphate and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 150 ppm to 450 ppm hypochlorous acid or free available chlorine, 10 ppm to 140 ppm copper salt, 10 ppm to 140 ppm zinc salt, 10 ppm to 140 ppm of a calcium phosphate or sodium phosphate and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 200 ppm to 400 ppm hypochlorous acid or free available chlorine, 20 ppm to 120 ppm copper salt, 20 ppm to 120 ppm zinc salt, 20 ppm to 120 ppm of a calcium phosphate or sodium phosphate and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 260 ppm to 360 ppm hypochlorous acid or free available chlorine, 30 ppm to 100 ppm copper salt, 30 ppm to 100 ppm zinc salt, 30 ppm to 100 ppm of a calcium phosphate or sodium phosphate and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 280 ppm to 340 ppm hypochlorous acid or free available chlorine, 40 ppm to 80 ppm copper salt, 40 ppm to 80 ppm zinc salt, 40 ppm to 80 ppm of a calcium phosphate or sodium phosphate and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 300 ppm to 320 ppm hypochlorous acid or free available chlorine, 50 ppm to 70 ppm copper salt, 50 ppm to 70 ppm, zinc salt, 50 ppm to 70 ppm of a calcium phosphate or sodium phosphate and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 310 ppm hypochlorous acid or free available chlorine, 40 ppm copper salt, 40 ppm zinc salt, 40 ppm of a calcium phosphate or sodium phosphate and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 20 ppm to 500 ppm hypochlorous acid or free available chlorine, 2.5 ppm to 240 ppm one or more metal salts, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 20 ppm to 500 ppm hypochlorous acid or free available chlorine, 2.5 ppm to 240 of a copper salt, 2.5 ppm to 240 of zinc salt, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 20 ppm to 500 ppm hypochlorous acid or free available chlorine, 2.5 ppm to 240 of a copper chloride, 2.5 ppm to 240 of a zinc chloride, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 10 ppm to 200 ppm hypochlorous acid or free available chlorine, 10 ppm to 160 ppm copper salt, 10 ppm to 160 ppm zinc salt and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 20 ppm to 180 ppm hypochlorous acid or free available chlorine, 20 ppm to 140 ppm copper salt, 20 ppm to 140 ppm zinc salt, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 40 ppm to 140 ppm hypochlorous acid or free available chlorine, 40 ppm to 120 ppm copper salt, 40 ppm to 120 ppm zinc salt, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 60 ppm to 120 ppm hypochlorous acid or free available chlorine, 60 ppm to 100 ppm copper salt, 60 ppm to 100 ppm zinc salt, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 80 ppm to 100 ppm hypochlorous acid or free available chlorine, 70 ppm to 90 ppm copper salt, 70 ppm to 90 ppm, zinc salt, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 90 ppm hypochlorous acid or free available chlorine, 80 ppm copper salt, 80 ppm zinc salt, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 10 ppm to 200 ppm hypochlorous acid or free available chlorine, 5 ppm to 120 ppm copper salt, 5 ppm to 120 ppm zinc salt and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 20 ppm to 180 ppm hypochlorous acid or free available chlorine, 10 ppm to 100 ppm copper salt, 10 ppm to 100 ppm zinc salt, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 40 ppm to 140 ppm hypochlorous acid or free available chlorine, 15 ppm to 80 ppm copper salt, 15 ppm to 80 ppm zinc salt, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 60 ppm to 120 ppm hypochlorous acid or free available chlorine, 20 ppm to 60 ppm copper salt, 20 ppm to 60 ppm zinc salt, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 80 ppm to 100 ppm hypochlorous acid or free available chlorine, 30 ppm to 50 ppm copper salt, 30 ppm to 50 ppm, zinc salt, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 90 ppm hypochlorous acid or free available chlorine, 40 ppm copper salt, 40 ppm zinc salt, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 10 ppm to 200 ppm hypochlorous acid or free available chlorine, 2.5 ppm to 60 ppm copper salt, 2.5 ppm to 60 ppm zinc salt and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 20 ppm to 180 ppm hypochlorous acid or free available chlorine, 5 ppm to 50 ppm copper salt, 5 ppm to 50 ppm zinc salt, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 40 ppm to 140 ppm hypochlorous acid or free available chlorine, 7.5 ppm to 40 ppm copper salt, 7.5 ppm to 40 ppm zinc salt, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 60 ppm to 120 ppm hypochlorous acid or free available chlorine, 10 ppm to 30 ppm copper salt, 10 ppm to 30 ppm zinc salt, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 80 ppm to 100 ppm hypochlorous acid or free available chlorine, 15 ppm to 25 ppm copper salt, 15 ppm to 25 ppm, zinc salt, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 90 ppm hypochlorous acid or free available chlorine, 20 ppm copper salt, 20 ppm zinc salt, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 10 ppm to 200 ppm hypochlorous acid or free available chlorine, 5 ppm to 120 ppm copper salt, 5 ppm to 120 ppm zinc salt and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 20 ppm to 180 ppm hypochlorous acid or free available chlorine, 10 ppm to 100 ppm copper salt, 10 ppm to 100 ppm zinc salt, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 40 ppm to 140 ppm hypochlorous acid or free available chlorine, 15 ppm to 80 ppm copper salt, 15 ppm to 80 ppm zinc salt, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 60 ppm to 120 ppm hypochlorous acid or free available chlorine, 20 ppm to 60 ppm copper salt, 20 ppm to 60 ppm zinc salt, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 80 ppm to 100 ppm hypochlorous acid or free available chlorine, 30 ppm to 50 ppm copper salt, 30 ppm to 50 ppm, zinc salt, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 90 ppm hypochlorous acid or free available chlorine, 40 ppm copper salt, 40 ppm zinc salt, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 150 ppm to 450 ppm hypochlorous acid or free available chlorine, 10 ppm to 160 ppm copper salt, 10 ppm to 160 ppm zinc salt, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 200 ppm to 400 ppm hypochlorous acid or free available chlorine, 20 ppm to 140 ppm copper salt, 20 ppm to 140 ppm zinc salt, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 260 ppm to 360 ppm hypochlorous acid or free available chlorine, 40 ppm to 120 ppm copper salt, 40 ppm to 120 ppm zinc salt, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 280 ppm to 340 ppm hypochlorous acid or free available chlorine, 60 ppm to 100 ppm copper salt, 60 ppm to 100 ppm zinc salt, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 300 ppm to 320 ppm hypochlorous acid or free available chlorine, 70 ppm to 90 ppm copper salt, 70 ppm to 90 ppm, zinc salt, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 310 ppm hypochlorous acid or free available chlorine, 80 ppm copper salt, 80 ppm zinc salt, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 150 ppm to 450 ppm hypochlorous acid or free available chlorine, 10 ppm to 140 ppm copper salt, 10 ppm to 140 ppm zinc salt, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 200 ppm to 400 ppm hypochlorous acid or free available chlorine, 20 ppm to 120 ppm copper salt, 20 ppm to 120 ppm zinc salt, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 260 ppm to 360 ppm hypochlorous acid or free available chlorine, 30 ppm to 100 ppm copper salt, 30 ppm to 100 ppm zinc salt, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 280 ppm to 340 ppm hypochlorous acid or free available chlorine, 40 ppm to 80 ppm copper salt, 40 ppm to 80 ppm zinc salt, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 300 ppm to 320 ppm hypochlorous acid or free available chlorine, 50 ppm to 70 ppm copper salt, 50 ppm to 70 ppm, zinc salt, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 310 ppm hypochlorous acid or free available chlorine, 40 ppm copper salt, 40 ppm zinc salt, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 150 ppm to 450 ppm hypochlorous acid or free available chlorine, 10 ppm to 140 ppm copper salt, 10 ppm to 140 ppm zinc salt, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 200 ppm to 400 ppm hypochlorous acid or free available chlorine, 20 ppm to 120 ppm copper salt, 20 ppm to 120 ppm zinc salt, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 260 ppm to 360 ppm hypochlorous acid or free available chlorine, 30 ppm to 100 ppm copper salt, 30 ppm to 100 ppm zinc salt, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 280 ppm to 340 ppm hypochlorous acid or free available chlorine, 40 ppm to 80 ppm copper salt, 40 ppm to 80 ppm zinc salt, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 300 ppm to 320 ppm hypochlorous acid or free available chlorine, 50 ppm to 70 ppm copper salt, 50 ppm to 70 ppm, zinc salt, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • a composition disclosed herein comprises 310 ppm hypochlorous acid or free available chlorine, 40 ppm copper salt, and an amount of calcium oxide needed to adjust the pH to a range of 5.0 to 6.0.
  • kits can comprise a container including a composition disclosed herein.
  • a kit can comprise one or more containers, each container including an individual component or more than one individual component disclosed herein in combination.
  • a kit can comprise one container including hypochlorous acid or free available chlorine and a second container including one or more metallic particles.
  • a kit can comprise one container including hypochlorous acid or free available chlorine and a second container including copper-zinc-calcium oxide particles.
  • a kit can comprise one container including hypochlorous acid or free available chlorine and a second container including metal salts.
  • kits can comprise one container including hypochlorous acid or free available chlorine and a second container including copper chloride salt, zinc chloride salt, and/or calcium oxide salt.
  • the remainder of the components of a composition disclosed herein may be included in either the first or second container, or may be separately including in at least a third container.
  • a third container including a rinse solution disclosed herein can be included in the kit. Packaging of individual components into separate container can assist in prolonging the stability of the individual components, and thus shelf life of the product.
  • a kit can comprise one container including hypochlorous acid and/or free available chlorine, a second container including one or more metallic particles, and a third container including a rinse solution.
  • a kit can comprise one container including hypochlorous acid and/or free available chlorine, a second container including copper-zinc-calcium oxide particles, and a third container including a rinse solution.
  • a kit can comprise one container including hypochlorous acid and/or free available chlorine, a second container including metal salts and a third container including a rinse solution.
  • a kit can comprise one container including hypochlorous acid and/or free available chlorine, a second container including copper chloride salt, zinc chloride salts, and/or calcium oxide salt, and a third container including a rinse solution.
  • a kit can comprise one container including a composition disclosed herein and a second container including a rinse solution disclosed herein.
  • a kit can comprise one container including hypochlorous acid and/or free available chlorine and one or more metallic particles and a second container including a rinse solution.
  • a kit can comprise one container including hypochlorous acid and/or free available chlorine and copper-zinc-calcium oxide particles and a second container including a rinse solution.
  • a kit can comprise one container including hypochlorous acid and/or free available chlorine and metal salts and a second container including a rinse solution.
  • kits can comprise one container including hypochlorous acid and/or free available chlorine, copper chloride salt, zinc chloride salt, and/or calcium oxide salt and a second container including a rinse solution.
  • the remainder of the components of a composition disclosed herein may be included in either the first container or may be separately including in at least a third container. Packaging of individual components into separate container can assist in prolonging the stability of the individual components, and thus shelf life of the product.
  • a kit disclosed herein can comprise a delivery or application system.
  • the delivery or application system of the kit are useful for applying a composition disclosed herein, and/or individual components disclosed herein to a site of interest, such as, e.g., a surface of a device disclosed herein.
  • a delivery or application system disclosed herein includes, without limitation, one or more of an applicator brush, porous foam swab or pad, hollow tube, dipstick, or a combination thereof.
  • a kit comprises a single delivery or application system.
  • a kit comprises a plurality delivery or application systems. For example, in a 30-day supply kit, there can be 30 delivery or application systems, such that there is one delivery or application system per day for 30 days.
  • the delivery or application system may be packaged individually, or in sets of 2 or more.
  • the delivery or application system can be packaged such that it remains sterile until use.
  • a delivery or application system disclosed herein can be packaged in plastic sheaths. Further, to prevent contamination, delivery or application system disclosed herein is preferably single-use, disposable delivery or application system.
  • the kit can also comprise a set of instructions.
  • the instructions may include information useful to the end user such as how to use a delivery or application system to apply a composition and/or individual components disclosed herein, and/or how often to apply a composition and/or individual components disclosed herein.
  • such instructions may include information regarding howto mix the individual components disclosed herein to form a composition disclosed herein.
  • Such instructions can indicate that mixing should be done at a certain time before application, such as, e.g., just prior to use.
  • Instructions disclosed herein may also include information regarding how to apply the individual components disclosed herein directly to a site of interest, such as, e.g., a surface of a device disclosed herein, and in what order the individual components should be applied to such sites of interest.
  • kits including the container including a composition or component disclosed herein, the delivery or application system, and instructions, are enclosed in an outer casing.
  • the outer casing can be a box, a sealed bag, a foil pouch, etc.
  • the delivery system, container and instructions are enclosed in a box.
  • the container and instructions are contained in a first box, the delivery system is contained in a second box, and the first and second box are contained together in a third box.
  • compositions are useful in any application involving the cleansing, disinfecting or sterilizing.
  • a composition disclosed herein is used to clean, disinfect or sterilize a device.
  • a composition disclosed herein is used to clean, disinfect or sterilize an endoscope.
  • a composition disclosed herein is used to clean, disinfect or sterilize a hard surface.
  • a composition disclosed herein is useful in any application were hypochlorous acid is applied or administered.
  • a method disclosed herein comprises applying a composition disclosed herein to a device for a specified amount of time, wherein application results in the cleaning, disinfecting and/or sterilization of the device.
  • a method disclosed herein further comprises rinsing the cleaned, disinfected and/or sterilized device with a rinse solution disclosed herein.
  • Other aspects of the present specification disclose a composition disclosed herein for use to clean, disinfect and/or sterilize a device, including a medical device.
  • Yet other aspects of the present specification disclose a use of a disclosed composition to clean, disinfect and/or sterilize a device, including a medical device.
  • aspects of the present specification disclose a method to clean, disinfect and/or sterilize an endoscope.
  • a method disclosed herein comprises applying a composition disclosed herein to an endoscope fora specified amount of time, wherein application results in the cleaning, disinfecting and/or sterilization of the endoscope.
  • a method disclosed herein further comprises rinsing the cleaned, disinfected and/or sterilized endoscope with a rinse solution disclosed herein.
  • Other aspects of the present specification disclose a composition disclosed herein for use to clean, disinfect and/or sterilize an endoscope.
  • Yet other aspects of the present specification disclose a use of a disclosed composition to clean, disinfect and/or sterilize an endoscope.
  • a device including a medical device is cleaned by removal of visible soil, such as, e.g., organic and inorganic material, from objects and surfaces and normally is accomplished manually or mechanically. Thorough cleaning is essential before disinfection and sterilization because inorganic and organic materials that remain on the surfaces of a medical device interferes with the effectiveness of these processes.
  • visible soil such as, e.g., organic and inorganic material
  • a device including a medical device is disinfected by eliminating many or all pathogenic microorganisms, except bacterial spores. Disinfection is less lethal than sterilization because it destroys most recognized pathogenic microorganisms but not necessarily all microbial forms (e.g., bacterial spores).
  • a medical device is sterilized by destroying or eliminating all forms of microorganisms. Decontamination of a medical device removes pathogenic microorganisms from a medical device so that it is safe to handle, use, or discard.
  • a medical device is an instrument, apparatus, material, or other article, whether used alone or in combination, including software necessary for its application, intended by the manufacturer to be used for human beings for diagnosis, prevention, monitoring treatment, or alleviation of disease; diagnosis, monitoring, treatment, or alleviation of or compensation for an injury or handicap; investigation, replacement, or modification of the anatomy or of a physiologic process; or control of conception, and that does not achieve its primary intended action in or on the human body by pharmacologic, immunologic, or metabolic means but might be assisted in its function by such means.
  • a medical device includes, without limitation, a surgical instrument, a respiratory therapy instrument, an anesthesia instrument, a catheter, an implant, a probe, an endoscope, an arthroscope, a laparoscope, a blade, a cystoscope, a spirometer, a CPAP mask and tubing, dialysis instrument and accessories, a heart-lung machine and accessories, a heart-lung bypass machine and accessories, and a diaphragm fitting ring.
  • Non-limiting examples of a probe includes an ultrasound probe and an esophageal manometry probe.
  • Non-limiting examples of a catheter includes a cardiac catheter, an urinary catheter, an anorectal manometry catheter.
  • Non-limiting examples of an endoscope includes a gastrointestinal endoscope, a bronchoscope, and a nasopharyngoscope.
  • a blade includes a laryngoscope blade.
  • aspects of the present specification disclose a method to clean, disinfect and/or sterilize a hard surface area.
  • a method disclosed herein comprises applying a composition disclosed herein to a hard surface area for a specified amount of time, wherein application results in the cleaning, disinfecting and/or sterilization of the hard surface area.
  • a method disclosed herein further comprises rinsing the cleaned, disinfected and/or sterilized surface with a rinse solution disclosed herein.
  • Other aspects of the present specification disclose a composition disclosed herein for use to clean, disinfect and/or sterilize a hard surface area.
  • Yet other aspects of the present specification disclose a use of a disclosed composition to clean, disinfect and/or sterilize a hard surface area.
  • a hard surface area can be a porous surface area or a non-porous surface area.
  • a method disclosed herein comprises applying one or more individual components disclosed herein to a hard surface area for a specified amount of time, wherein application results in the cleaning, disinfecting and/or sterilization of the hard surface area.
  • the one or more individual components include a first component including hypochlorous acid or free available chlorine and a second component including one or more disinfectants.
  • application of the one or more individual components occur in a specific order, such as. e.g., first applying a first component including hypochlorous acid or free available chlorine and then applying a second component including one or more disinfectants.
  • a hard surface area can be a porous surface area or a non-porous surface area.
  • a hard surface area can include any items present in a residence or a commercial, industrial and/or agricultural facility, such as, e.g., a hospital, a laboratory, a restaurant, an educational center, a foodprocessing facility, a dairy-processing facility, an airport, an oil field system, a sport facility, a shipping dock, a freight transport center, or any other commercial or industrial setting.
  • a hospital e.g., a hospital, a laboratory, a restaurant, an educational center, a foodprocessing facility, a dairy-processing facility, an airport, an oil field system, a sport facility, a shipping dock, a freight transport center, or any other commercial or industrial setting.
  • a surface area can include any type of transportation carrier, such as, e.g., a water vessel like a boat, barge or ship, an aircraft like an airplane or helicopter, a ground vehicle like a motorcycle, car, truck or train,
  • a surface area may be made of any material including brass, copper, aluminum, stainless steel, carbon steel, rubber, plastic, glass, wood, painted surface, or any combination thereof.
  • a surface area includes, without limitation, a table top, counter top, floor, wall, ceiling, window, bed, gurney, door, door handle, shower, bath, sink, faucet, toilet, toilet seat, drain, equipment, machinery, personal protective gear, personal biohazard gear, and the like.
  • a surface area may comprise a medical, dental, pharmaceutical, veterinary or mortuary device.
  • a surface area may comprise human skin.
  • a composition or component disclosed herein can be applied to a hard surface area according to a method disclosed herein as often as needed and/or desired.
  • a composition disclosed herein can be applied to a hard surface area daily, every other day, every third of day, once a week, multiple times per week, once a month, multiple times per month, once a year or multiple times per year, as desired.
  • a composition disclosed herein can be applied to a hard surface area multiple times per day, e.g., twice a day, three times a day, four time a day, five times a day, six times a day or as often as desired.
  • compositions are useful in any application involving treating an individual.
  • the presently disclosed compositions are useful in any application involving medical use, veterinarian use, or both.
  • a composition disclosed herein is useful in any application were hypochlorous acid is applied or administered.
  • compositions are useful in any application involving treating a tissue in an individual.
  • the compositions disclosed herein can be used to treat a wound by enhancing angiogenesis in an area in and around a wound, or promoting rapid healing of a wound.
  • the presently disclosed compositions are useful in any application involving treating a wound in an individual.
  • the compositions disclosed herein can be used to treat a wound by enhancing angiogenesis in an area in and around a wound, or promoting rapid healing of a wound.
  • a wound can be an open wound, a closed wound or a burn.
  • Non-limiting examples, of an open wound include a laceration, an abrasion, an incision, a puncture, an avulsion, an ulcer, and a tear.
  • Nonlimiting examples, of a closed wound includes a bruise, a contusion and a hematoma.
  • aspects of the present specification disclose a method of cleaning, disinfecting and/or sterilizing a wound in an individual.
  • a method disclosed herein comprises applying a composition disclosed herein to a wound for a specified amount of time, wherein application results in the cleaning, disinfecting and/or sterilization of the wound.
  • a method disclosed herein further comprises rinsing the cleaned, disinfected and/or sterilized wound with a rinse solution disclosed herein.
  • Other aspects of the present specification disclose a composition disclosed herein for use to clean, disinfect and/or sterilize a wound.
  • Yet other aspects of the present specification disclose a use of a disclosed composition to clean, disinfect and/or sterilize a wound.
  • aspects of the present specification disclose a method of treating a wound in an individual.
  • a method disclosed herein comprises applying a composition disclosed herein to a wound for a specified amount of time, wherein application promotes healing of the wound.
  • a method disclosed herein further comprises rinsing the treated wound with a rinse solution disclosed herein.
  • Other aspects of the present specification disclose a composition disclosed herein for use to treat a wound.
  • Yet other aspects of the present specification disclose a use of a disclosed composition to treat a wound.
  • a wound can be an external wound on, e.g., a surface area of an individual or an internal wound located in the body or body cavity of an individual.
  • compositions are useful in any application involving a microbial infection in an individual.
  • a microbial infection includes a viral infection, a bacterial infection and a fungal infection.
  • a microbial infection can be an external infection on, e.g., a surface area of an individual or an internal infection, e.g., a mercer infection or sepsis, located in the body or body cavity of an individual.
  • aspects of the present specification disclose a method of cleaning, disinfecting and/or sterilizing a microbial infection in an individual.
  • a method disclosed herein comprises applying a composition disclosed herein to a microbial infection for a specified amount of time, wherein application results in a cleaning, disinfecting and/or sterilization of the microbial infection.
  • a method disclosed herein further comprises rinsing the cleaned, disinfected and/or sterilized microbial infection with a rinse solution disclosed herein.
  • Other aspects of the present specification disclose a composition disclosed herein for use to clean, disinfect and/or sterilize a microbial infection.
  • Yet other aspects of the present specification disclose a use of a disclosed composition to clean, disinfect and/or sterilize a microbial infection.
  • a composition disclosed herein is used to clean, disinfect or sterilize a body part of an individual.
  • uses for a composition disclosed herein include cleaning/disinfecting tissue in wound care, pre-operative preparation, and surgery or other invasive procedure, cleaning/disinfecting a skin region in dermatological applications, and cleaning/disinfecting the eye in ophthalmological applications.
  • aspects of the present specification disclose a method of treating a microbial infection in an individual.
  • a method disclosed herein comprises applying a composition disclosed herein to a microbial infection for a specified amount of time, wherein application results in a reduction, elimination and/or killing microbes causing the microbial infection.
  • a method disclosed herein further comprises rinsing the treated microbial infection with a rinse solution disclosed herein.
  • Other aspects of the present specification disclose a composition disclosed herein for use to treat a microbial infection.
  • Yet other aspects of the present specification disclose a use of a disclosed composition to treat a microbial infection.
  • a dermatological application refers to cleaning/disinfecting a skin region of an individual of a microbial infection, such as, e.g., a viral, bacterial or fungal infection.
  • a microbial infection of a skin region include urinary tract infection, eye lid wash, cataract treatment, warts, cutaneous leishmaniasis, candidal vulvovagititis, derrmatophytoses, bromhidrosis, pityriasis versicolor, acne vulgarish, rosasea, hydradenitis suppurativa, psoriasis, eczema, alopecia areata, oral lichen planus, xeroderma pigmentosum, actinic keratoses, melasma, keloids, and anti-aging.
  • An ophthalmological application refers to cleaning/disinfecting an eye of an individual of a microbial infection, such as, e.g., a viral, bacterial or fungal infection.
  • a microbial infection of an eye include a bacterial conjunctivitis, a viral conjunctivitis, an epidemic keratoconjunctivitis, a pharyngoconjunctival fever, a stye, a blephartis, an episcleritis, a keratitis, a trachoma, and a corneal ulcer.
  • compositions are useful in any application involving treating and/or providing relief of an inflammation, an ache and/or a pain in an individual.
  • aspects of the present specification disclose a method of treating an inflammation, an ache and/or a pain in an individual.
  • a method disclosed herein comprises applying a composition disclosed herein to an area of inflammation, an ache and/or a pain for a specified amount of time, wherein application results in a reduction and/or elimination of the pain.
  • a method disclosed herein further comprises rinsing the treated area with a rinse solution disclosed herein.
  • Other aspects of the present specification disclose a composition disclosed herein for use to treat an inflammation, an ache and/or a pain.
  • Yet other aspects of the present specification disclose a use of a disclosed composition to treat an inflammation, an ache and/or a pain.
  • compositions are useful in enteral and parenteral applications, including oral, injectable and topical applications.
  • the compositions disclosed herein can be used to clean, disinfect or sterilize a body region injured by a wound or infected with a microbe.
  • a method disclosed herein comprises applying a composition disclosed herein to an individual for a specified amount of time, wherein application results in the cleaning, disinfecting and/or sterilization of a microbial infection in the individual.
  • Other aspects of the present specification disclose a composition disclosed herein for use to clean, disinfect and/or sterilize a microbial infection in an individual.
  • Yet other aspects of the present specification disclose a use of a disclosed composition to clean, disinfect and/or sterilize a microbial infection in an individual.
  • Still other aspects of the present specification disclose a composition disclosed herein for the manufacture of a medicament to clean, disinfect and/or sterilize a microbial infection in an individual.
  • a method and/or use disclosed herein applies a composition disclosed herein to an individual.
  • An individual refers to any animal including, without limitation, a fish, an amphibian, a bird and a mammal.
  • a mammal includes a human, a horse, a cow, a sheep, a dog and a cat. As such, a method disclosed herein is for human use as well as veterinarian use.
  • a composition disclosed herein can be applied to a skin surface or can be internally administered.
  • a composition disclosed herein is applied topically to a skin region of an individual in order to clean, disinfect and/or sterilize the skin region.
  • a skin region includes, without limitation, the face, forehead, lips, scalp, neck, shoulder, arms, hands, thighs, legs, knees, feet, chest, breast, back, groin, buttocks, and the like.
  • routes of administration include enteral routes of administration and parenteral routes of administration.
  • a composition disclosed herein can be applied according to a method disclosed herein to a skin region.
  • Application of a composition disclosed herein can be by rubbing, pouring, sprinkling, or spraying on, or otherwise applied to the human body.
  • a composition disclosed herein can be applied by introducing the composition into or onto a solid support such as, e.g., a wipe, a towelette, a towel, a mitt, a glove, or a mask and then applying the composition to a skin region.
  • a composition disclosed herein can be applied by using a delivery device, such as, e.g., an aerosol dispenser, a pump spray, a trigger spray, a squeeze bottle, a topical patch, a transdermal patch, or a dermal implant to apply the composition to a skin region.
  • a delivery device such as, e.g., an aerosol dispenser, a pump spray, a trigger spray, a squeeze bottle, a topical patch, a transdermal patch, or a dermal implant to apply the composition to a skin region.
  • a composition disclosed herein can be applied to an individual according to a method disclosed herein as often as needed and/or desired.
  • a composition disclosed herein can be applied to an individual daily, every other day, every third of day, once a week, multiple times per week, once a month, multiple times per month, once a year or multiple times per year, as desired.
  • a composition disclosed herein can be applied to an individual multiple times per day, e.g., twice a day, three times a day, four time a day, five times a day, six times a day or as often as desired.
  • compositions are useful in food product, poultry, meat, vegetable production.
  • the compositions disclosed herein can be used to clean, disinfect or sterilize machinery, instruments, tables, rooms, including floors, ceilings and walls and any other hard surface from microbial contamination.
  • compositions are useful in formulations on plants as a preservative or pesticide.
  • the compositions disclosed herein can be used to clean, disinfect or sterilize a plant injured by a wound or infected with a microbe.
  • compositions are useful in formulations on cut flowers to prolong freshness and health.
  • the compositions disclosed herein can be used to clean, disinfect or sterilize a cut flower at a wound or to prevent microbial infection.
  • a disclosed method and/or use applies a composition disclosed herein for specified amount of time.
  • a specified amount of time is a time sufficient to clean a medical device, a surface, or an individual.
  • a specified amount of time is a time sufficient to disinfect a medical device, a surface, or an individual.
  • a specified amount of time is a time sufficient to sterilize a medical device, a surface, or an individual.
  • a composition disclosed herein is applied to a device, like a medical device, a surface, or an individual for, e.g., about 1 minute, about 5 minutes, about 10 minutes, about 15 minutes, about 20 minutes, about 25 minutes, about 30 minutes, about 35 minutes, about 40 minutes, about 45 minutes, about 50 minutes, about 55 minutes, about 60 minutes, about 70 minutes, about 80 minutes, about 90 minutes, about 100 minutes, about 110 minutes, or about 120 minutes.
  • a composition disclosed herein is applied to a device, like a medical device, a surface, or an individual for, e.g., at least 1 minute, at least 5 minutes, at least 10 minutes, at least 15 minutes, at least 20 minutes, at least 25 minutes, at least 30 minutes, at least 35 minutes, at least 40 minutes, at least 45 minutes, at least 50 minutes, at least 55 minutes, at least 60 minutes, at least 70 minutes, at least 80 minutes, at least 90 minutes, at least 100 minutes, at least 110 minutes, or at least 120 minutes.
  • a composition disclosed herein is applied to device, like a medical device, a surface, or an individual for, e.g., at most 1 minute, at most 5 minutes, at most 10 minutes, at most 15 minutes, at most 20 minutes, at most 25 minutes, at most 30 minutes, at most 35 minutes, at most 40 minutes, at most 45 minutes, at most 50 minutes, at most 55 minutes, at most 60 minutes, at most 70 minutes, at most 80 minutes, at most 90 minutes, at most 100 minutes, at most 110 minutes, or at most 120 minutes.
  • a composition disclosed herein is applied to a device, like a medical device, a surface, or an individual for, e.g., about 1 minute to about 5 minutes, about 1 minute to about 10 minutes, about 1 minute to about 15 minutes, about 1 minute to about 20 minutes, about 1 minute to about 25 minutes, about 1 minute to about 30 minutes, about 1 minute to about 35 minutes, about 1 minute to about 40 minutes, about 1 minute to about 45 minutes, about 1 minute to about 50 minutes, about 1 minute to about 55 minutes, about 1 minute to about 60 minutes, about 5 minutes to about 10 minutes, about 5 minutes to about 15 minutes, about 5 minutes to about 20 minutes, about 5 minutes to about 25 minutes, about 5 minutes to about 30 minutes, about 5 minutes to about 35 minutes, about 5 minutes to about 40 minutes, about 5 minutes to about 45 minutes, about 5 minutes to about 50 minutes, about 5 minutes to about 55 minutes, about 5 minutes to about 60 minutes, about 5 minutes to about 70 minutes, about 5 minutes to about 80 minutes, about 5 minutes to about 90 minutes, about 5 minutes to about 5 minutes, about 1 minute to
  • a disclosed composition, method and/or use are less harsh on a medical device resulting in a longer lifetime use of a medical device.
  • a medical device can be cleaned, disinfected and/or sterilized, e.g., about 50 times, about 60 times, about 70 times, about 80 times, about 90 times, about 100 times, about 110 times, about 120 times, about 130 times, about 140 times, about 150 times, about 160 times, about 170 times, about 180 times, about 190 times, about 200 times, about 210 times, about 220 times, about 230 times, about 240 times, about 250 times, about 260 times, about 270 times, about 280 times, about 290 times, or about 300 times.
  • a medical device can be cleaned, disinfected and/or sterilized, e.g., at least 50 times, at least 60 times, at least 70 times, at least 80 times, at least 90 times, at least 100 times, at least 110 times, at least 120 times, at least 130 times, at least 140 times, at least 150 times, at least 160 times, at least 170 times, at least 180 times, at least 190 times, at least 200 times, at least 210 times, at least 220 times, at least 230 times, at least 240 times, at least 250 times, at least 260 times, at least 270 times, at least 280 times, at least 290 times, or at least 300 times.
  • a medical device can be cleaned, disinfected and/or sterilized, e.g., at most 50 times, at most 60 times, at most 70 times, at most 80 times, at most 90 times, at most 100 times, at most 110 times, at most 120 times, at most 130 times, at most 140 times, at most 150 times, at most 160 times, at most 170 times, at most 180 times, at most 190 times, at most 200 times, at most 210 times, at most 220 times, at most 230 times, at most 240 times, at most 250 times, at most 260 times, at most 270 times, at most 280 times, at most 290 times, or at most 300 times.
  • a medical device can be cleaned, disinfected and/or sterilized, e.g., about 50 times to about 60 times, about 50 times to about 70 times, about 50 times to about 80 times, about 50 times to about 90 times, about 50 times to about 100 times, about 50 times to about 110 times, about 50 times to about 120 times, about 50 times to about 130 times, about 50 times to about 140 times, about 50 times to about 150 times, about 50 times to about 175 times, about 50 times to about 200 times, about 50 times to about 225 times, about 50 times to about 250 times, about 50 times to about 275 times, about 50 times to about 300 times, about 75 times to about 90 times, about 75 times to about 100 times, about 75 times to about 110 times, about 75 times to about 120 times, about 75 times to about 130 times, about 75 times to about 140 times, about 75 times to about 150 times, about 75 times to about 175 times, about 75 times to about 200 times, about 75 times to about 225 times, about 75 times to about 250 times, about 75 times to about 300 times, about
  • a method disclosed herein may further comprises a rinsing step using a rinse solution.
  • the rinse solution is used to rinse a cleaned, disinfected and/or sterilized medical device or surface.
  • the rinse solution is preferably a sterile solution.
  • a rinse solution disclosed herein comprises water.
  • a rinse solution disclosed herein comprises hypochlorous acid or free available chlorine and water.
  • a rinse solution disclosed herein does not comprises hypochlorous acid and/or free available chlorine.
  • the rinse solution is present in a separate container.
  • the amount of hypochlorous acid or free available chlorine present in a rinse solution disclosed herein is any amount that provides an antimicrobial effect, with the proviso that the total amount of hypochlorous acid or free available chlorine present is an amount below the threshold level that results in oxidation of a medical device of surface as disclosed herein.
  • the amount of hypochlorous acid or free available chlorine present in a rinse solution may be, e.g., about 5 ppm, about 10 ppm, about 20 ppm, about 30 ppm, about 40 ppm, about 50 ppm, about 60 ppm, about 70 ppm, about 80 ppm, about 90 ppm, about 100 ppm, about 110 ppm, or about 120 ppm.
  • the amount of hypochlorous acid or free available chlorine present in a rinse solution may be, e.g., at most 5 ppm, at most 10 ppm, at most 20 ppm, at most 30 ppm, at most 40 ppm, at most 50 ppm, at most 60 ppm, at most 70 ppm, at most 80 ppm, at most 90 ppm, at most 100 ppm, at most 110 ppm, or at most 120 ppm.
  • the amount of hypochlorous acid or free available chlorine present in a rinse solution may be, e.g., about 5 ppm to about 10 ppm, about 5 ppm to about 20 ppm, about 5 ppm to about 30 ppm, about 5 ppm to about 40 ppm, about 5 ppm to about 50 ppm, about 5 ppm to about 60 ppm, about 5 ppm to about 70 ppm, about 5 ppm to about 80 ppm, about 5 ppm to about 90 ppm, about 5 ppm to about 100 ppm, about 5 ppm to about 110 ppm, about 5 ppm to about 120 ppm, about 10 ppm to about 20 ppm, about 10 ppm to about 30 ppm, about 10 ppm to about 40 ppm, about 10 ppm to about 50 ppm, about 10 ppm to about 60 ppm, about 10 ppm to about 70 ppm, about 10 ppm
  • a composition comprising, consisting essentially of, or consisting of hypochlorous acid or free available chlorine and one or more metallic particles.
  • composition comprising, consisting essentially of, or consisting of hypochlorous acid or free available chlorine and one or more metal salts.
  • a composition comprising, consisting essentially of, or consisting of hypochlorous acid or free available chlorine, one or more metallic particles and one or more metal salts.
  • hypochlorous acid or free available chlorine is in an amount of 0.05 ppm, 0.10 ppm, 0.15 ppm, 0.20 ppm, 0.25 ppm, 0.30 ppm, 0.35 ppm, 0.40 ppm, 0.45 ppm, 0.50 ppm, 0.55 ppm, 0.60 ppm, 0.65 ppm, 0.70 ppm, 0.75 ppm, 0.80 ppm, 0.85 ppm, 0.90 ppm, 0.95 ppm, 1 ppm, 5 ppm, 10 ppm, 15 ppm, 20 ppm, 25 ppm, 30 ppm, 35 ppm, 40 ppm, 45 ppm, 50 ppm, 55 ppm, 60 ppm, 65 ppm, 70 ppm, 75 ppm, 80 ppm, 85 ppm, 90 ppm, 95 ppm, 100 ppm, 125 ppm, 150 pp
  • composition according to any one of embodiments 1-4 wherein the hypochlorous acid or free available chlorine is in an amount of about 0.10%, about 0.11%, about 0.12%, about 0.13%, about 0.14%, about 0.15%, about 0.16%, about 0.17%, about 0.18%, about 0.19%, about 0.2%, about 0.25%, about 0.3%, about 0.35%, about 0.4%, about 0.45%, or about 0.5% by weight of the composition, or at least 0.10%, at least 0.11%, at least 0.12%, at least 0.13%, at least 0.14%, at least 0.15%, at least 0.16%, at least 0.17%, at least 0.18%, at least 0.19%, at least 0.2%, at least 0.25%, at least 0.3%, at least 0.35%, at least 0.4%, at least 0.45%, or at least 0.5% by weight of the composition, or at most 0.10%, at most 0.11%, at most 0.12%, at most 0.13%, at most 0.14%, at most 0.15%, at most
  • composition according to any one of embodiments 1 or 3-5 wherein the one or more metallic particles include a metal acetate particle, a metal chloride particle, a metal nitrate particle, or a metal oxide particle, or any combination thereof.
  • composition according to any one of embodiments 1 or 3-5 wherein the one or more metallic particles are in an amount of about 0.10%, about 0.11%, about 0.12%, about 0.13%, about 0.14%, about 0.15%, about 0.16%, about 0.17%, about 0.18%, about 0.19%, about 0.2%, about 0.25%, about 0.3%, about 0.35%, about 0.4%, about 0.45%, or about 0.5% by weight of the composition, or at least 0.10%, at least 0.11%, at least 0.12%, at least 0.13%, at least 0.14%, at least 0.15%, at least 0.16%, at least 0.17%, at least 0.18%, at least 0.19%, at least 0.2%, at least 0.25%, at least 0.3%, at least 0.35%, at least 0.4%, at least 0.45%, or at least 0.5% by weight of the composition, or at most 0.10%, at most 0.11%, at most 0.12%, at most 0.13%, at most 0.14%, at most 0.15%, at most 0.15%
  • composition according to any one of embodiments 2-10 wherein the one or more metal salt are in an amount of about 0.10%, about 0.11%, about 0.12%, about 0.13%, about 0.14%, about 0.15%, about 0.16%, about 0.17%, about 0.18%, about 0.19%, about 0.2%, about 0.25%, about 0.3%, about 0.35%, about 0.4%, about 0.45%, or about 0.5% by weight of the composition, or at least 0.10%, at least 0.11%, at least 0.12%, at least 0.13%, at least 0.14%, at least 0.15%, at least 0.16%, at least 0.17%, at least 0.18%, at least 0.19%, at least 0.2%, at least 0.25%, at least 0.3%, at least 0.35%, at least 0.4%, at least 0.45%, or at least 0.5% by weight of the composition, or at most 0.10%, at most 0.11%, at most 0.12%, at most 0.13%, at most 0.14%, at most 0.15%, at most 0.16%, or
  • composition according to any one of embodiments 1-12, further comprising a phosphate buffer further comprising a phosphate buffer.
  • a phosphate buffer is a calcium phosphate buffer or a sodium phosphate buffer.
  • the phosphate buffer is in an amount of
  • ppm 0.10 ppm, 0.15 ppm, 0.20 ppm, 0.25 ppm, 0.30 ppm, 0.35 ppm, 0.40 ppm, 0.45 ppm, 0.50 ppm, 0.55 ppm, 0.60 ppm, 0.65 ppm, 0.70 ppm, 0.75 ppm, 0.80 ppm, 0.85 ppm, 0.90 ppm, 0.95 ppm, 1 ppm, 5 ppm, 10 ppm, 15 ppm, 20 ppm, 25 ppm, 30 ppm, 35 ppm, 40 ppm, 45 ppm, 50 ppm, 55 ppm, 60 ppm, 65 ppm, 70 ppm, 75 ppm, 80 ppm, 85 ppm, 90 ppm, 95 ppm, 100 ppm, 125 ppm, 150 ppm,
  • composition according to any one of embodiments 1-15 further comprising, consisting essentially of, or consisting of one or more carriers.
  • the one or more carrier includes an aqueous carrier, a semi-solid carrier, a solid carrier, or any combination thereof.
  • the composition according to embodiment 16 or 17, wherein the one or more carrier includes water, a vegetable oil, a mineral oil, an ester oil, an ether, an alcohol, a fatty alcohol, an isoparaffin, a hydrocarbon oil, a polyol, a wax, or any combination thereof.
  • composition according to embodiment 18, wherein the ether includes dicapryl ether or dimethyl isosorbide.
  • the composition according to embodiment 18, wherein the isoparaffin includes isooctane, isododecane (IDD) or isohexadecane.
  • the hydrocarbon oil includes mineral oil, petrolatum, isoeicosane or a polyolefin.
  • composition according to embodiment 18, wherein the polyol includes propylene glycol, glycerin, butylene glycol, pentylene glycol, hexylene glycol, or caprylyl glycol.
  • the composition according to embodiment 18, wherein the wax includes beeswax, carnauba, ozokerite, microcrystalline wax, polyethylene wax, or a botanical wax.
  • composition according to any one of embodiments 16-26, wherein the one or more carriers are in an amount of at least 5%, at least 10%, at least 15%, at least 20%, at least 25%, at least 30%, at least 35%, at least 40%, at least 45%, at least 50%, at least 55%, at least 60%, at least 65%, at least 70%, at least 75%, at least 80%, at least 85%, at least 90%, at least 95%, at least 96%, at least 97%, at least 98% or at least 99% by weight of the composition or at most 5%, at most 10%, at most 15%, at most 20%, at most 25%, at most 30%, at most 35%, at most 40%, at most 45%, at most 50%, at most 55%, at most 60%, at most 65%, at most 70%, at most 75%, at most 80%, at most 85%, at most 90%, at most 95%, at most 96%, at most 97%, at most 98% or at most 99% by weight of the composition or about 5% to about 25%, about 5%
  • composition according to any one of embodiments 1 -29 having a pH of about 2 to about 5, about 2 to about 5.5, about 2 to about 6, about 2 to about 6.5, about 2 to about 7, about 2 to about 7.5, about 2 to about 8, about 2 to about 8.5, about 2 to about 9, about 2.5 to about 5, about 2.5 to about 5.5, about 2.5 to about 6, about 2.5 to about 6.5, about 2.5 to about 7, about 2.5 to about 7.5, about 2.5 to about 8, about 2.5 to about 8.5, about 2.5 to about 9, about 3 to about 5, about 3 to about 5.5, about 3 to about 6, about 3 to about 6.5, about 3 to about 7, about 3 to about 7.5, about 3 to about 8, about 3 to about 8.5, about 3 to about 9, about 3.5 to about 5, about 3.5 to about 5.5, about 3.5 to about 6, about 3.5 to about 6.5, about 3.5 to about 7, about 3.5 to about 7.5, about 3.5 to about 8, about 3.5 to about 8.5, about 3.5 to about 9, about 4 to about 5, about 4 to about 5.5, about 4 to about
  • a kit comprising, consisting essentially of, or consisting of a composition as defined in any one of embodiments 1-31 .
  • the kit according to embodiment 32 further comprising, consisting essentially of, or consisting of one or more delivery or application systems, and/or instructions, and/or a container.
  • a kit comprising, consisting essentially of, or consisting of a first component including hypochlorous acid or free available chlorine and a second component including one or more metallic particles.
  • a kit comprising, consisting essentially of, or consisting of a first component including hypochlorous acid or free available chlorine and a second component including one or more metal salts.
  • a kit comprising, consisting essentially of, or consisting of a first component including hypochlorous acid or free available chlorine, a second component including one or more metallic particles and a third component including one or more metal salts.
  • a kit comprising, consisting essentially of, or consisting of a first component including hypochlorous acid or free available chlorine, a second component including one or more metallic particles and one or more metal salts.
  • kits according to any one of embodiments 32-37, further comprising container comprising a rinse solution and/or one or more delivery or application systems, and/or instructions, and/or a container
  • the hypochlorous acid or free available chlorine is in an amount of 0.05 ppm, 0.10 ppm, 0.15 ppm, 0.20 ppm, 0.25 ppm, 0.30 ppm, 0.35 ppm, 0.40 ppm, 0.45 ppm, 0.50 ppm, 0.55 ppm, 0.60 ppm, 0.65 ppm, 0.70 ppm, 0.75 ppm, 0.80 ppm, 0.85 ppm, 0.90 ppm, 0.95 ppm, 1 ppm, 5 ppm, 10 ppm, 15 ppm, 20 ppm, 25 ppm, 30 ppm, 35 ppm, 40 ppm, 45 ppm, 50 ppm, 55 ppm, 60 ppm, 65 ppm
  • hypochlorous acid or free available chlorine is in an amount of about 0.10%, about 0.11%, about 0.12%, about 0.13%, about 0.14%, about 0.15%, about 0.16%, about 0.17%, about 0.18%, about 0.19%, about 0.2%, about 0.25%, about 0.3%, about 0.35%, about 0.4%, about 0.45%, or about 0.5% by weight of the composition, or at least 0.10%, at least 0.11%, at least 0.12%, at least 0.13%, at least 0.14%, at least 0.15%, at least 0.16%, at least 0.17%, at least 0.18%, at least 0.19%, at least 0.2%, at least 0.25%, at least 0.3%, at least 0.35%, at least 0.4%, at least 0.45%, or at least 0.5% by weight of the composition, or at most 0.10%, at most 0.11%, at most 0.12%, at most 0.13%, at most 0.14%, at most 0.15%, at
  • the one or more metallic particles include a metal acetate particle, a metal chloride particle, a metal nitrate particle, or a metal oxide particle, or any combination thereof.
  • the one or more metallic particles are in an amount of about 0.10%, about 0.11%, about 0.12%, about 0.13%, about 0.14%, about 0.15%, about 0.16%, about 0.17%, about 0.18%, about 0.19%, about 0.2%, about 0.25%, about 0.3%, about 0.35%, about 0.4%, about 0.45%, or about 0.5% by weight of the composition, or at least 0.10%, at least 0.11%, at least 0.12%, at least 0.13%, at least 0.14%, at least 0.15%, at least 0.16%, at least 0.17%, at least 0.18%, at least 0.19%, at least 0.2%, at least 0.25%, at least 0.3%, at least 0.35%, at least 0.4%, at least 0.45%, or at least 0.5% by weight of the composition, or at most 0.10%, at most 0.11%, at most 0.12%, at most 0.13%, at most 0.14%, at most 0.15%, at most
  • the one or more metallic particles have a mean diameter of about 10 nm, about 20 nm, about 30 nm, about 40 nm, about 50 nm, about 60 nm, about 70 nm, about 80 nm, about 90 nm, about 100 nm, or at least 10 nm, at least 20 nm, at least 30 nm, at least 40 nm, at least 50 nm, at least 60 nm, at least 70 nm, at least 80 nm, at least 90 nm, at least 100 nm, or at most 10 nm, at most 20 nm, at most 30 nm, at most 40 nm, at most 50 nm, at most 60 nm, at most 70 nm, at most 80 nm, at most 90 nm, at most 100 nm, or about 10 nm to about 20 nm, about 30 nm, about 40 nm, about 50 nm, at most 60 nm, at most
  • the one or more metal salts include copper chloride, iron chloride, titanium chloride, zinc chloride, calcium oxide, or any combination thereof.
  • the one or more metal salts are in an amount of about 0.10%, about 0.11%, about 0.12%, about 0.13%, about 0.14%, about 0.15%, about 0.16%, about 0.17%, about 0.18%, about 0.19%, about 0.2%, about 0.25%, about 0.3%, about 0.35%, about 0.4%, about 0.45%, or about 0.5% by weight of the composition, or at least 0.10%, at least 0.11%, at least 0.12%, at least 0.13%, at least 0.14%, at least 0.15%, at least 0.16%, at least 0.17%, at least 0.18%, at least 0.19%, at least 0.2%, at least 0.25%, at least 0.3%, at least 0.35%, at least 0.4%, at least 0.45%, or at least 0.5% by weight of the composition, or at most 0.10%, at most 0.11%, at most 0.12%, at most 0.13%, at most 0.14%, at most 0.15%, at most 0.15%, at most 0.10%, at most 0.11%,
  • a phosphate buffer is a calcium phosphate buffer or a sodium phosphate buffer.
  • ppm 1 ,900 ppm, or at most 2,000 ppm or about 0.5 ppm to about 20 ppm, about 0.5 ppm to about 25 ppm, about 0.5 ppm to about 30 ppm, about 0.5 ppm to about 35 ppm, about 0.5 ppm to about 40 ppm, about 0.5 ppm to about 45 ppm, about 0.5 ppm to about 50 ppm, about 0.5 ppm to about 55 ppm, about 0.5 ppm to about 60 ppm, about 0.5 ppm to about 65 ppm, about 0.5 ppm to about 70 ppm, about 0.5 ppm to about 75 ppm, about 0.5 ppm to about 80 ppm, about 0.5 ppm to about 85 ppm, about 0.5 ppm to about 90 ppm, about 0.5 ppm to about 95 ppm, about 0.5 ppm to about 100 ppm, about 0.75 ppm to about 20 ppm,
  • a method to clean, disinfect and/or sterilize a device comprising, consisting essentially of, or consisting of applying a composition as defined in any one of embodiments 1-31 or applying the components of a kit as defined in any one of embodiments 32-50, to a device, wherein application of the composition cleans, disinfects and/or sterilizes the device.
  • a method to clean, disinfect and/or sterilize a surface area comprising, consisting essentially of, or consisting of applying a composition as defined in any one of embodiments 1-31 or applying the components of a kit as defined in any one of embodiments 32-50, to a device, wherein application of the composition cleans, disinfects and/or sterilizes the device.
  • a method to clean, disinfect and/or sterilize a microbial infection in an individual comprising, consisting essentially of, or consisting of applying a composition as defined in any one of embodiments 1-31 or applying the components of a kit as defined in any one of embodiments 32-50 to the individual, wherein application of the composition cleans, disinfects and/or sterilizes the individual.
  • 64 The method of any one of embodiments 54, 57-59, 62 or 63, or the use of any one of embodiments 55-58 or 59-63, wherein the composition is applied multiple times per day.
  • a method to treat an individual comprising, consisting essentially of, or consisting of applying a composition as defined in any one of embodiments 1 -31 or applying the components of a kit as defined in any one of embodiments 32-50 to the individual, wherein application of the composition treats the individual.
  • Example 1 The compositions of Example 1 were prepared and glass storage containers were filled with 250 mL of each composition. These storage containers were then placed in a stability chamber at 25°C. Aliquots of compositions from these storage containers were taken on Day 5, 10, 11 , 15, 18, 29, 30, 31 , 41 , or 66 and the effectiveness of the compositions tested using a bacterial viability assay as described below.
  • Sample aliquots from each composition were tested with or without serum (TSB or Bovine Serum) as follows: 1) assays without serum contained 100 pL of pathogen bacteria suspension and 9900 pL of a composition disclosed herein; 2) assays with 5% serum contained 100 pL of pathogenic bacteria suspension, 500 pL of serum and 9400 pL of a composition disclosed herein; and 3) Assays with 10% serum contained 100 pL of pathogenic bacteria suspension, 1000 pL of serum and 8900 pL of a composition disclosed herein. Samples were exposed for 5 minutes at which point a neutralizing agent was used to inhibit the activity of the microbial agent being tested.
  • the treated samples were serially diluted 1 in 10 over a 6-fold range after treatment using a neutralizing agent, and the treated sample was plated on petri dishes containing TSA growth medium and incubated at 30°C to 35°C for up to 5 days. The presence of viable bacteria was then measured by counting the number of colonies observed on the agar medium for each assay sample. Log reduction is determined by taking the logio of the number calculated by taking the number of viable pathogenic bacteria colonies present in the assay sample without serum divided by the number of viable pathogenic bacteria colonies present in the assay sample with serum. The results of this series of experiments are shown in Tables 7 and 8.
  • compositions of Example 1 will be prepared and glass storage containers will be filled with 250 mL of each composition. These storage containers will then be placed in a stability chamber at 40°C. Aliquots of compositions from these storage containers will be taken on Day 14 and 30 and the effectiveness of the compositions will be tested using a bacterial viability assay as described above. The results will indicate that at least Compositions F465, F466, F467, F468, F469, F470, F471 , F472, F473, F474, and F475 show greater potential as a disinfectant for applications disclosed herein given the significant log reduction in the number of pathogenic bacteria observed.
  • This example illustrates how to conduct a bacterial viability assay using a composition disclosed herein to assess a time course of effectiveness for inhalation administration.
  • Each tube was then vortexed and an aliquot was serially diluted and plated onto TSA plate for further numeration.
  • the final numeration count uses aliquot volume, count obtained on TSA plate and the total original volume of culture. The remaining amount in the tube was used to inoculate actual test samples.
  • Sample aliquots from each composition were tested with or without serum (TSB or Bovine Serum) as follows: 1) assays without serum contained 100 pL of pathogen bacteria suspension and 9900 pL of a composition disclosed herein; and 2) assays with 5% serum contained 100 pL of pathogenic bacteria suspension, 500 pL of serum and 9400 pL of a composition disclosed herein. Samples were exposed for 20, 40 and 60 minutes at which point a neutralizing agent was used to inhibit the activity of the microbial agent being tested.
  • the treated samples were serially diluted 1 in 10 over a 6-fold range after treatment using a neutralizing agent, and the treated sample was plated on petri dishes containing TSA growth medium and incubated at 30°C to 35°C for up to 48 hours. The presence of viable bacteria was then measured by counting the number of colonies observed on the agar medium for each assay sample. Log reduction is determined by taking the logio of the number calculated by taking the number of viable pathogenic bacteria colonies present in the assay sample without serum divided by the number of viable pathogenic bacteria colonies present in the assay sample with serum. The results of this series of experiments are shown in Table 9.
  • compositions F487, F488, F489, F490, F491 , and F492 show greater potential as a disinfectant for applications disclosed herein given the significant log reduction in the number of pathogenic bacteria observed.
  • This example illustrates how to conduct a bacterial viability assay using a composition disclosed herein.
  • 10 mL nutrient broth was inoculated using a stock culture of Staphylococcus aureus (ATCC 29213) and incubated on an orbital shaker for 24 ⁇ 2 hours at approximately 150 rpm at 36 ⁇ 1°C. This culture was used to inoculate Tryptic Soy Agar (TSA) plates. Each plate was inoculated with the culture. Each plate was incubated for up to 48 hours at 30°C to 35°C. Following incubation, suspensions were prepared by adding growth from TSA plates into a tube containing sterile water.
  • TSA Tryptic Soy Agar
  • Each tube was then vortexed and an aliquot was serially diluted and plated onto TSA plate for further numeration.
  • the final numeration count uses aliquot volume, count obtained on TSA plate and the total original volume of culture. The remaining amount in the tube was used to inoculate actual test samples.
  • Sample aliquots from each composition were tested with or without serum (TSB or Bovine Serum) as follows: 1) Assays without serum contained 100 pL of pathogen bacteria suspension and 9900 pL of a composition disclosed herein; and 2) assays with 5% serum contained 100 pL of pathogenic bacteria suspension, 500 pL of serum and 9400 pL of a composition disclosed herein. Samples were exposed for 15 minutes at which point a neutralizing agent was used to inhibit the activity of the microbial agent being tested. The treated samples were serially diluted 1 in 10 over a 6-fold range after treatment using a neutralizing agent, and the treated sample was plated on petri dishes containing TSA growth medium and incubated at 30°C to 35°C for up to 48 hours.
  • compositions F493, F494, and F495 show greater potential as a disinfectant for applications disclosed herein given the significant log reduction in the number of pathogenic bacteria observed.
  • This culture was used to inoculate Tryptic Soy Agar (TSA) plates. Each plate was inoculated with the culture. Each plate was incubated for up to 48 hours at 30°C to 35°C. Following incubation, suspensions were prepared by adding growth from TSA plates into a tube containing sterile water. Each tube was then vortexed and an aliquot was serially diluted and plated onto TSA plate for further numeration. The final numeration count uses aliquot volume, count obtained on TSA plate and the total original volume of culture. The remaining amount in the tube was used to inoculate actual test samples.
  • TSA Tryptic Soy Agar
  • Sample aliquots from each composition were tested with or without serum (TSB or Bovine Serum) as follows: 1) Assays without serum contained 100 pL of pathogen bacteria suspension and 9900 pL of a composition disclosed herein; and 2) assays with 5% serum contained 100 pL of pathogenic bacteria suspension, 500 pL of serum and 9400 pL of a composition disclosed herein. Samples were exposed for 15 minutes at which point a neutralizing agent was used to inhibit the activity of the microbial agent being tested. The treated samples were serially diluted 1 in 10 over a 6-fold range after treatment using a neutralizing agent, and the treated sample was plated on petri dishes containing TSA growth medium and incubated at 30°C to 35°C for up to 48 hours.
  • HIV-1 human immunodeficiency viruses 1
  • NL4.3 human immunodeficiency viruses 1
  • the viral host cells were from a human T cell leukemia C8166 cell line
  • human Coronavirus Strain 229E (ATCC VR-740)
  • the viral host cells were from a human lung fibroblast MRC-5 cell line (ATCC CCL-171)
  • human Adenovirus type 5 Strain Adenoid 75 (ATCC VR- 5)
  • the viral host cells were from a human lung epithelial carcinoma A549 cell line (ATCC CCL-185).
  • Dried viral films were prepared by dispensing a viral suspension comprising 200 pL of pathogenic viral suspension containing a titer of at least 1 x 10 4 infective units onto a sterile plastic petri plate and this suspension was allowed to air dry for no more than 10 minutes within a biological safety cabinet.
  • a dried viral film is overlaid with 2 mL of a composition disclosed herein and incubated for 10 minutes at room temperature.
  • the dried viral film is overlaid with a buffered solution harmless to the virus and incubated for 10 minutes at room temperature. After incubation, an equal volume of a neutralizing agent was added to the overlaid solution to inhibit the activity of the composition being tested and the viral film scraped to resuspend this virus mixture.
  • Serial 10-fold dilutions of the resuspended mixture were prepared and used to inoculate viral host cells by added to petri dishes containing cells from a human T cell leukemia C8166 cell line. The inoculated cultures were then incubated at 37°C for 48 hours. After incubation, 100 pL of supernatant taken from each culture was assayed for the presence of P24 protein by ELISA in order to assess the levels of infectious virus present in each sample.
  • Adenovirus type 5 inactivation assays sample aliquots from each composition were tested for virucidal activity according to protocol ASTM E1053-11 , Standard Test Method to Assess Virucidal Activity of Chemicals Intended for Disinfection of Inanimate, Nonporous Environmental Surfaces.
  • Dried viral films were prepared by dispensing a viral suspension comprising 200 pL of pathogenic viral suspension containing a titer of at least 1 x 10 4 infective units onto a sterile plastic petri plate and this suspension was allowed to air dry for no more than 10 minutes within a biological safety cabinet.
  • a dried viral film is overlaid with 2 mL of a composition disclosed herein and incubated for 15 minutes at room temperature.
  • the dried viral film is overlaid with a buffered solution harmless to the virus and incubated for 15 minutes at room temperature at which point the reaction was stopped by serially diluting each sample 1 in 10 over a 6-fold range.
  • the serially diluted samples were used to inoculate viral host cells by added to petri dishes containing cells from a human lung epithelial carcinoma A549 cell line and incubated at 30°C to 35°C for up to 7 days. After incubation, supernatant taken from each culture was assayed for the presence of viable virus using a Tissue Culture Infectivity Dose (TCIDso).
  • the TCIDso value represents the endpoint dilution where 50% of the cell cultures exhibit cytopathic effects due to infection by the test virus.
  • the TCDso value represents the endpoint dilution where 50% of the host cell monolayers exhibit cytotoxicity due to infection by the test virus.
  • the log reduction in viral titer was calculated as follows: Plate Recovery Control Logio TCIDso - Virus-Test Substance Logio TCIDso.
  • test solution was prepared by mixing 100 pL of serum and 800 pL of a composition disclosed herein.
  • control solution was prepared by mixing 100 pL of serum and 800 pL of a buffered solution harmless to the virus.
  • a 100 pL of aliquot of pathogenic viral suspension containing a titer of at least 1 x 10 4 infective units was then added to each sample and incubated for 15 minutes at which point the reaction was stopped by serially diluting each sample 1 in 10 over a 6- fold range.
  • the serially diluted samples were then used to inoculate viral host cells by added to petri dishes containing cells from a human lung fibroblast MRC-5 cell line and incubated at 30°C to 35°C for up to 7 days. After incubation, supernatant taken from each culture was assayed for the presence of viable virus using a TCIDso assay as described above.
  • the meaning of the open-ended transitional phrase “comprising” is being defined as encompassing all the specifically recited elements, limitations, steps and/or features as well as any optional, additional unspecified ones.
  • the meaning of the closed-ended transitional phrase “consisting of” is being defined as only including those elements, limitations, steps and/or features specifically recited in the claim whereas the meaning of the closed-ended transitional phrase “consisting essentially of is being defined as only including those elements, limitations, steps and/or features specifically recited in the claim and those elements, limitations, steps and/or features that do not materially affect the basic and novel characteristic(s) of the claimed subject matter.
  • the open-ended transitional phrase “comprising” includes within its meaning, as a limiting case, claimed subject matter specified by the closed-ended transitional phrases “consisting of or “consisting essentially of.” As such embodiments described herein or so claimed with the phrase “comprising” are expressly or inherently unambiguously described, enabled and supported herein for the phrases “consisting essentially of and “consisting of.”

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CN202080099686.8A CN115397241B (zh) 2020-02-14 2020-06-14 用于清洁、消毒、灭菌和/或治疗的组合物、试剂盒、方法和用途
KR1020227031498A KR20220154113A (ko) 2020-02-14 2020-06-14 세정, 소독, 살균 및/또는 처리를 위한 조성물, 키트, 방법 및 용도
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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4458343A1 (de) 2023-05-04 2024-11-06 Heraeus Medical GmbH Vorrichtung zur präparation und abgabe von wirkstofflösungen
EP4506000A1 (de) 2023-08-08 2025-02-12 Heraeus Medical GmbH Antiseptisches kit und dessen verwendung
EP4585254A1 (de) 2024-01-09 2025-07-16 Heraeus Medical GmbH Wundspüllösung zur entfernung von biofilmen

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2026013405A1 (en) * 2024-07-11 2026-01-15 Convatec Limited Intermittent catheters

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4105406A (en) * 1976-12-30 1978-08-08 Murray W Bruce Method of inhibiting corrosion using a hexametaphosphate and a phosphate buffer
US5902227A (en) * 1997-07-17 1999-05-11 Intevep, S.A. Multiple emulsion and method for preparing same
US9326995B2 (en) * 2005-04-04 2016-05-03 The Regents Of The University Of California Oxides for wound healing and body repair
US20190216090A1 (en) * 2018-01-14 2019-07-18 Collidion, Inc. Compositions, Kits, Methods and Uses for Cleaning, Disinfecting, Sterilizing and/or Treating

Family Cites Families (187)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2140401A (en) 1935-12-20 1938-12-13 Nat Aluminate Corp Process of treating water
US2810401A (en) 1955-02-17 1957-10-22 Burton J Stansbury Detachable pipe closure
US3914397A (en) 1970-08-05 1975-10-21 Pulp Paper Res Inst Production of chlorine monoxide gas
US4289640A (en) * 1974-01-21 1981-09-15 Colgate-Palmolive Company Cleaning compositions
US4190638A (en) 1978-06-07 1980-02-26 Ppg Industries, Inc. Production of hypochlorous acid
JPS5761099A (en) 1980-09-30 1982-04-13 Lion Corp Liquid sterilizing beaching agent composition
US4561994A (en) 1981-07-17 1985-12-31 Lever Brothers Company Surfactant free stable hypochlorite paste
US4394517A (en) 1982-05-21 1983-07-19 Sws Silicones Corporation Quaternary ammonium functional silicon compounds
GB2122900A (en) 1982-07-01 1984-01-25 Surgikos Inc Disinfectant compositions having residual biocidal activity and wipes and sprays containing them
GB8312663D0 (en) 1983-05-09 1983-06-15 Ici Plc Bisbiguanide compounds
GB8314500D0 (en) 1983-05-25 1983-06-29 Procter & Gamble Ltd Cleaning compositions
FR2552305B1 (fr) 1983-09-22 1985-12-20 Salkin Andre Composition a pouvoir bactericide eleve contenant un biguanide et une pyrimidine
US4744917A (en) * 1985-07-31 1988-05-17 Olin Corporation Toxic chemical agent decontamination emulsions, their preparation and application
JPS6253902A (ja) 1985-09-03 1987-03-09 Nissan Chem Ind Ltd 残留塩素の安定化組成物
US4908215A (en) 1986-03-06 1990-03-13 Brandeis University Hypochlorite compositions containing thiosulfate and use thereof
US5019173A (en) 1988-09-29 1991-05-28 Dow Corning Corporation Cleaning method for water containing vessels and systems
US5098970A (en) 1990-10-31 1992-03-24 Phillips Petroleum Company Superabsorbent crosslinked ampholytic ion pair copolymers
JPH06508835A (ja) 1991-06-24 1994-10-06 キャリングタン、ラバラトーリズ、インコーパレイティド 外傷清浄剤
EP0602081A4 (en) 1991-09-04 1995-03-22 Olin Corp METHOD FOR PRODUCING CONCENTRATED SOLUTIONS OF HYPOCHLORIC ACID.
JP3144499B2 (ja) * 1991-12-25 2001-03-12 北海道共同石灰株式会社 貝殻生石灰を用いた水のｐＨ調整方法
JP2533723B2 (ja) 1992-12-28 1996-09-11 東興薬品工業株式会社 速乾性ゲルタイプ手指消毒剤
US6207201B1 (en) 1993-06-03 2001-03-27 Amuchina International, Inc. Sodium hypochlorite based disinfectant and sterilizer for medical-surgical instruments
US5332511A (en) 1993-06-25 1994-07-26 Olin Corporation Process of sanitizing swimming pools, spas and, hot tubs
US5547662A (en) 1993-08-27 1996-08-20 Becton, Dickinson And Company Preparation of a skin surface for a surgical procedure
GB9322132D0 (en) 1993-10-27 1993-12-15 Zeneca Ltd Antimicrobial treatment of textile materials
US5368749A (en) 1994-05-16 1994-11-29 Nalco Chemical Company Synergistic activity of glutaraldehyde in the presence of oxidants
US5364464A (en) 1994-01-05 1994-11-15 Sereboff Aaron P Moisture absorbing and frictional grip enhancing composition and method of forming same
FR2715590B1 (fr) 1994-02-01 1996-04-12 Rhone Poulenc Chimie Procédé d'épuration d'un milieu contenant des déchets organiques.
GB9506841D0 (en) 1995-04-03 1995-05-24 Unilever Plc Deodorant compositions
DE69602847T2 (de) 1995-08-15 2000-02-17 S.C. Johnson Commercial Markets, Inc. Tuberkilizide synergistische desinfizierende zusammensetzung und verfahren zur desinfektion
US6503952B2 (en) 1995-11-13 2003-01-07 The Trustees Of Columbia University In The City Of New York Triple antimicrobial composition
FR2745497B1 (fr) 1996-02-29 2002-09-06 Anios Lab Sarl Composition anti-microbienne, notamment destinee a l'antiseptie et/ou la desinfection
US6029709A (en) 1996-07-18 2000-02-29 Burgess; James Gordon Lockable enclosure with gripping-toggle device for securing access to the hollow interior of cylindrical pipes
NO311696B1 (no) 1997-01-24 2002-01-07 Norske Stats Oljeselskap Fremgangsmåte og integrert prosessanlegg for fremstilling av synfuel og el-kraft
US20020022660A1 (en) 1998-01-20 2002-02-21 Hanuman B. Jampani Deep penetrating antimicrobial compositions
AUPP216198A0 (en) 1998-03-05 1998-03-26 Rex, Hans Method of sanitizing a body of water
US6132625A (en) 1998-05-28 2000-10-17 E. I. Du Pont De Nemours And Company Method for treatment of aqueous streams comprising biosolids
US5979117A (en) 1998-06-10 1999-11-09 Fuller; Frank Hole locking device
US6455086B1 (en) 1998-06-26 2002-09-24 The Procter & Gamble Company Microorganism reduction methods and compositions for food cleaning
AU6247299A (en) 1998-09-11 2000-04-03 Surfacine Development Company, Llc Topical dermal antimicrobial compositions
EP1119347B1 (en) 1998-10-08 2005-03-02 Hampar L. Karagoezian Synergistic antimicrobial, dermatological and ophthalmic preparations containing chlorite and hydrogen peroxide
US6127591A (en) 1998-11-30 2000-10-03 Battelle Memorial Institute Method of digesting an explosive nitro compound
WO2000066071A1 (en) 1999-04-29 2000-11-09 Henceforth Hibernia, Inc. Biomimetic water solutions and compositions, their use as and in health and beauty care products and the methods to prepare them
US6592907B2 (en) 1999-10-04 2003-07-15 Hampar L. Karagoezian Synergistic antimicrobial ophthalmic and dermatologic preparations containing chlorite and hydrogen peroxide
US20070104798A1 (en) 1999-10-04 2007-05-10 S.K. Pharmaceuticals, Inc. Synergistic antimicrobial preparations containing chlorite and hydrogen peroxide
US6333054B1 (en) 1999-10-21 2001-12-25 Amuchina S.P.A. Topical, non-cytotoxic, antimicrobial hydrogel with thixotropic properties
US20030138498A1 (en) 1999-12-10 2003-07-24 Kiyoaki Yoshikawa Methods of sterilization
US6426066B1 (en) 2000-01-12 2002-07-30 California Pacific Labs, Inc. Use of physiologically balanced, ionized, acidic solution in wound healing
US20030109411A1 (en) 2001-08-24 2003-06-12 The Clorox Company, A Delaware Corporation Bactericidal cleaning wipe
US20020197299A1 (en) 2000-12-21 2002-12-26 Vanderlaan Douglas G. Antimicrobial contact lenses containing activated silver and methods for their production
DE60111430T2 (de) * 2001-10-01 2006-05-11 Aquilabs S.A. Hypochlorige säurezusammensetzung und ihre verwendungen
US6846846B2 (en) 2001-10-23 2005-01-25 The Trustees Of Columbia University In The City Of New York Gentle-acting skin disinfectants
US7238278B2 (en) 2001-10-26 2007-07-03 Zodiac Pool Care, Inc. Apparatus for purifying water
CA2468856C (en) 2001-12-05 2011-07-26 Osao Sumita Method and apparatus for producing negative and positive oxidative reductive potential (orp) water
US7192554B2 (en) 2001-12-31 2007-03-20 3M Innovative Properties Company Hydrogen peroxide and peracetic acid indicators and methods
US6815408B2 (en) 2002-02-11 2004-11-09 Paul C. Wegner Hydrogen peroxide stabilizer and resulting product and applications
US6656257B2 (en) 2002-02-12 2003-12-02 Mighty Grip, Inc. Gripping composition and method of preparing the same
US20050239675A1 (en) 2002-04-01 2005-10-27 Munzer Makansi Carrier foam to enhance liquid functional performance
GB0209134D0 (en) 2002-04-22 2002-05-29 Procter & Gamble Silicones
US6802976B2 (en) 2002-05-13 2004-10-12 E. I. Du Pont De Nemours And Company Organic sulfur reduction in wastewater
US7008545B2 (en) 2002-08-22 2006-03-07 Hercules Incorporated Synergistic biocidal mixtures
US20060231505A1 (en) 2002-08-22 2006-10-19 Mayer Michael J Synergistic biocidal mixtures
US20100210745A1 (en) 2002-09-09 2010-08-19 Reactive Surfaces, Ltd. Molecular Healing of Polymeric Materials, Coatings, Plastics, Elastomers, Composites, Laminates, Adhesives, and Sealants by Active Enzymes
ATE534295T1 (de) 2002-09-11 2011-12-15 Univ Louisiana State Biozide zusammensetzung und ähnliche verfahren
WO2004046214A2 (en) 2002-10-15 2004-06-03 Exxonmobil Chemical Patents Inc. Multiple catalyst system for olefin polymerization and polymers produced therefrom
US20060193789A1 (en) 2002-10-25 2006-08-31 Foamix Ltd. Film forming foamable composition
US7700076B2 (en) 2002-10-25 2010-04-20 Foamix, Ltd. Penetrating pharmaceutical foam
US6939602B2 (en) 2002-12-31 2005-09-06 Exxonmobil Oil Corporation Coating for the adhesive-receiving surface of polymeric labels
EP1603389A1 (en) 2003-03-10 2005-12-14 Xantech Pharmaceuticals, Inc. Surface sanitizing compositions with improved antimicrobial performance
US7429556B2 (en) 2003-10-23 2008-09-30 Applied Research Associates, Inc. Universal halide-enhanced decontaminating formulation
US7344725B2 (en) 2003-11-25 2008-03-18 Alcon, Inc. Use of inorganic nanoparticles to stabilize hydrogen peroxide solutions
US9168318B2 (en) 2003-12-30 2015-10-27 Oculus Innovative Sciences, Inc. Oxidative reductive potential water solution and methods of using the same
AU2004311432A1 (en) 2003-12-30 2005-07-21 Oculus Innovative Sciences, Inc. Oxidative reductive potential water solution, processes for producing same and methods of using the same
US20050139808A1 (en) 2003-12-30 2005-06-30 Oculus Innovative Sciences, Inc. Oxidative reductive potential water solution and process for producing same
CA2560830A1 (en) 2004-03-23 2005-10-13 The Clorox Company Method for diluting hypochlorite
US7718122B2 (en) 2004-04-20 2010-05-18 The Clorox Company Carriers for hypochlorous acid vapor
US20060073212A1 (en) 2004-04-22 2006-04-06 Palmer Craig R Method of treating respiratory disorders and airway inflammation
US7045077B2 (en) * 2004-06-18 2006-05-16 Biolab, Inc. Calcium hypochlorite compositions
GB0414244D0 (en) 2004-06-25 2004-07-28 Ebiox Ltd Composition
US20060003023A1 (en) 2004-07-02 2006-01-05 Williams Terry M Microbicidal composition
JP4526023B2 (ja) 2004-12-24 2010-08-18 信越化学工業株式会社 農業用殺菌剤組成物
WO2006087099A1 (en) 2005-02-16 2006-08-24 Unilever N.V. Aqueous liquid bleach compositions
US8802061B2 (en) 2005-02-25 2014-08-12 Solutions Biomed, Llc Aqueous disinfectants and sterilants for skin and mucosal application
CA2602522C (en) 2005-03-23 2014-09-09 Oculus Innovative Sciences, Inc. Method of treating skin ulcers using oxidative reductive potential water solution
BRPI0610901B1 (pt) 2005-05-02 2019-04-16 Oculus Innovative Sciences, Inc. Uso de uma solução aquosa de potencial oxi-redutivo (orp).
US7651990B2 (en) 2005-06-13 2010-01-26 3M Innovative Properties Company Foamable alcohol compositions comprising alcohol and a silicone surfactant, systems and methods of use
US8343523B2 (en) 2005-08-22 2013-01-01 Quick-Med Technologies, Inc. Disinfectant with durable activity based on alcohol-soluble quaternary ammonium polymers and copolymers
US8088400B2 (en) 2005-08-22 2012-01-03 Quick-Med Technologies, Inc. Disinfectant with quarternary ammonium polymer and copolymers
EP1993571B1 (en) 2006-01-20 2018-07-25 Sonoma Pharmaceuticals, Inc. Methods of treating or preventing inflammation and hypersensitivity with oxidative reductive potential water solution
KR20160023926A (ko) 2006-02-28 2016-03-03 벡톤 디킨슨 앤드 컴퍼니 카테테르 잠금을 위한 항미생물성 조성물 및 방법
US20080014289A1 (en) 2006-07-12 2008-01-17 Jianping Li Vehicle and method for treating and preventing acne vulgaris and exfoliating the skin hypohalous acids
US20080031973A1 (en) 2006-08-05 2008-02-07 Soon Myoung Lee Means of improving hand grip
ZA200709364B (en) 2006-11-14 2008-11-26 Rohm & Haas Microbicide combinations containing silver
US8318654B2 (en) 2006-11-30 2012-11-27 Kimberly-Clark Worldwide, Inc. Cleansing composition incorporating a biocide, heating agent and thermochromic substance
CZ299143B6 (cs) 2007-03-06 2008-04-30 Ecoton S. R. O. Dezinfekcní prostredek
EP2136819A1 (en) 2007-03-13 2009-12-30 Oculus Innovative Sciences, Inc. Antimicrobial solutions containing dichlorine monoxide and methods of making and using the same
CN101310726A (zh) 2007-05-22 2008-11-26 上海利康消毒高科技有限公司 含醇的聚六亚甲基胍碘消毒剂及其制备方法
US8642527B2 (en) 2007-06-18 2014-02-04 The Clorox Company Oxidizing bleach composition
WO2009005936A1 (en) 2007-06-29 2009-01-08 3M Innovative Properties Company Accelerating a ninhydrin reaction
GB0713799D0 (en) 2007-07-17 2007-08-22 Byotrol Llc Anti-microbial compositions
CN100496250C (zh) * 2007-08-17 2009-06-10 王安林 一种农用消毒杀菌组合物、它们的制备方法与用途
US9072717B2 (en) 2007-09-18 2015-07-07 Elc Management Llc Cosmetic compositions containing alpha glucosidase inhibitors and methods of use
TW200946621A (en) 2007-10-29 2009-11-16 Ekc Technology Inc Chemical mechanical polishing and wafer cleaning composition comprising amidoxime compounds and associated method for use
US20090148342A1 (en) 2007-10-29 2009-06-11 Bromberg Steven E Hypochlorite Technology
US7884089B2 (en) 2008-02-08 2011-02-08 Xurex, Inc. Antimicrobial coating
US8840911B2 (en) 2008-03-07 2014-09-23 Kimberly-Clark Worldwide, Inc. Moisturizing hand sanitizer
US8945630B2 (en) 2008-04-11 2015-02-03 Aquilabs S.A. Method of producing and applications of composition of hypochlorous acid
WO2009133616A1 (ja) 2008-05-01 2009-11-05 アンスラックス スポアーズ キラー コーポレーション リミテッド 万能殺菌消毒液
US7700530B2 (en) 2008-06-30 2010-04-20 Kimberly Clark Worldwide, Inc. Polysensorial personal care cleanser comprising a quaternary silicone surfactant
WO2010011856A2 (en) 2008-07-23 2010-01-28 Board Of Regents Of The University Of Nebraska Stereospecificity of methylsulfinyl reduction
IL196375A0 (en) * 2009-01-07 2009-12-24 Israel Inst Biolog Res Compositions for decontaminating hazardous chemical and biological compounds, methods employing same and systems for preparing same
CN101507434B (zh) * 2009-03-27 2012-10-03 武汉柏康科技有限责任公司 一种高效消毒清洁剂组合物
US20100284951A1 (en) * 2009-05-07 2010-11-11 Thavisith Pongprapansiri Novel compositions for the treatment of wounds and skin care
WO2010130048A1 (en) 2009-05-12 2010-11-18 1279881 Alberta Ltd. Locking core plug
KR20120028883A (ko) 2009-05-22 2012-03-23 써번 벤쳐스 피티와이 리미티드 소독 에어로졸, 이의 사용 및 제조 방법
CA2763073C (en) 2009-06-08 2017-10-03 Quick-Med Technologies, Inc. Antimicrobial textiles comprising peroxide
WO2010148004A1 (en) 2009-06-15 2010-12-23 Oculus Innovative Sciences, Inc. Solution containing hypochlorous acid and methods of using same
US20120121679A1 (en) 2009-07-16 2012-05-17 University Of Georgia Research Foundation, Inc. Viricidal and microbicidal compositions and uses thereof
BR112012006891A2 (pt) * 2009-07-30 2019-09-24 Oculus Innovative Sciences Inc formulação de hydrogel compreendendo uma solução aquosa com potencial oxidativo redutivo
WO2011026094A2 (en) 2009-08-31 2011-03-03 Collegium Pharmaceutical, Inc. Stable aerosol topical foams comprising a hypochlorite salt
EP2476314A4 (en) 2009-09-07 2015-04-29 Lion Corp DISINFECTANT COMPOSITION AND DISINFECTION PROCEDURE
CN105664223B (zh) 2009-10-26 2018-12-04 日产化学工业株式会社 化妆料、皮肤外用剂、以及医疗用仪器
US20110135702A1 (en) 2009-12-09 2011-06-09 Hoffman Douglas R Sporicidal composition for clostridium difficile spores
GB201000916D0 (en) 2010-01-21 2010-03-10 Adv Med Solutions Ltd Treatment of biofilms
GB2477717A (en) 2010-02-03 2011-08-17 Mauve Technology Ltd Disinfectant materials and methods
US20110236582A1 (en) 2010-03-29 2011-09-29 Scheuing David R Polyelectrolyte Complexes
WO2012021577A1 (en) 2010-08-10 2012-02-16 L'oreal Usa Silicone based cosmetic compositions and uses thereof
US20120082791A1 (en) 2010-10-04 2012-04-05 Robert Richard Liversage Coating Composition Amenable to Elastomeric Substrates
US20120156307A1 (en) 2010-12-16 2012-06-21 Apr Nanotechnologies S.A. Medical uses of nanoclustered water
US8603392B2 (en) * 2010-12-21 2013-12-10 Ecolab Usa Inc. Electrolyzed water system
US20120223022A1 (en) 2011-03-01 2012-09-06 Molycorp Minerals, Llc Contaminant removal from waters using rare earths
GB2488838A (en) 2011-03-11 2012-09-12 Biomimetics Health Ind Ltd A stable antimicrobial aqueous hypochlorous acid solution
US9381214B2 (en) 2011-03-18 2016-07-05 Puricore, Inc. Methods for treating skin irritation
WO2012156170A1 (en) 2011-05-13 2012-11-22 Unilever N.V. Spraying device
US20120301528A1 (en) 2011-05-24 2012-11-29 Uhlmann Donald R Compositions and methods for antimicrobial metal nanoparticles
CN102265893B (zh) 2011-06-08 2015-06-03 江中药业股份有限公司 一种抗微生物的组合物及其应用
GB201111830D0 (en) 2011-07-11 2011-08-24 Midas Safety Inc Coated fabric
WO2013051013A2 (en) 2011-07-28 2013-04-11 Tata Consultancy Services Limited Water purification device
EP3656217A1 (en) 2011-09-30 2020-05-27 Kemira Oyj Prevention of starch degradation in pulp, paper or board making processes
GB201118673D0 (en) 2011-10-28 2011-12-14 Byotrol Plc Anti-microbial composition
WO2013090873A1 (en) 2011-12-16 2013-06-20 Products Company Haviland A composition and method for reducing cyanuric acid in recreational water
US20130195783A1 (en) 2012-01-19 2013-08-01 The Procter & Gamble Company Methods For Smoothing Wrinkles and Skin Texture Imperfections
JP5864290B2 (ja) * 2012-01-31 2016-02-17 株式会社Ｊ−ケミカル 抗菌性組成物及びその用途
CN102626104B (zh) * 2012-03-22 2014-01-08 广东环凯微生物科技有限公司 一种稳定性二氧化氯消毒液及其制备方法
CN103170004B (zh) 2012-04-23 2016-08-31 佛山市优特医疗科技有限公司 一种制备含银纤维伤口敷料的方法
JP5618218B2 (ja) * 2012-07-11 2014-11-05 国立大学法人東京農工大学 殺菌水、抗ウィルス剤、生鮮食料品処理システムにおける殺菌用洗浄水並びに養鶏用殺虫剤
CA3126679C (en) 2012-07-23 2025-05-13 Innovative Biodefense, Inc. TOPICAL DISINFECTION FORMULATIONS AND ASSOCIATED USES
WO2014036659A1 (en) * 2012-09-07 2014-03-13 Martin Marcus E Disinfectant formulation comprising calcium hydroxide and sodium hypochlorite
US20160024667A1 (en) 2012-10-16 2016-01-28 GenEon Technologies LLC Electrochemical activation of water
CN104994878A (zh) 2012-12-13 2015-10-21 纽约市哥伦比亚大学理事会 植物抗微生物组合物
WO2014147643A2 (en) 2013-03-19 2014-09-25 Tata Consultancy Services Limited Portable apparatus for treatment of water and method thereof
PL2978311T3 (pl) 2013-03-25 2021-01-11 Kemira Oyj Preparat biocydowy i sposób uzdatniania wody
EP2999341B1 (en) 2013-05-22 2018-11-28 Sonoma Pharmaceuticals, Inc. Stabilized hypochlorous acid solution and use thereof
US10687536B2 (en) 2013-06-27 2020-06-23 Microlin, Llc Disposable wipes for energized treatment agent
US20160143944A1 (en) 2013-07-01 2016-05-26 Puricoe, Inc. Antimicrobial compositions comprising hypochlorous acid and silver
US20160330969A1 (en) 2013-10-23 2016-11-17 John F. O'Connell, JR. Antimicrobial compositions and articles
WO2015061753A1 (en) 2013-10-24 2015-04-30 Reoxcyn Discoveries Group, Inc. Redox signaling gel formulation
US20150119245A1 (en) 2013-10-25 2015-04-30 EIJ Industries, Inc. Method for Producing Shelf Stable Hypochlorous Acid Solutions
US20150125543A1 (en) 2013-11-07 2015-05-07 Simple Science Limited Gel disinfecting composition
US11027032B2 (en) 2014-01-08 2021-06-08 Carefusion 2200, Inc. Systems, methods, and devices for sterilizing antiseptic solutions
TW201538181A (zh) 2014-03-19 2015-10-16 Pures Biotech Co Ltd 用於潤滑保濕消毒滅菌之半流體組成物及其使用方法
GB201405660D0 (en) 2014-03-28 2014-05-14 Gama Healthcare Ltd A liquid disinfecting composition
GB2541318B (en) 2014-04-30 2021-05-12 Kimberly Clark Co Non-therapeutic methods for increasing adipogenesis or lipogenesis using an Undaria extract
US9585820B2 (en) 2014-05-20 2017-03-07 Avon Products, Inc. Laponite clay in cosmetic and personal care products
EA201790594A1 (ru) * 2014-09-12 2017-09-29 СиЭмЭс ТЕКНОЛОДЖИ, ИНК. Противомикробные композиции и способы их применения
CN104324047A (zh) 2014-09-22 2015-02-04 天津大学 一种新型复合型医用碘消毒剂及其制备方法
WO2016082897A1 (en) 2014-11-28 2016-06-02 Ecolab Inc. Two components disinfecting composition containing peracetic acid and chelating agent
EP3028568A1 (en) 2014-12-05 2016-06-08 Desinfeccion Profesional, S.L. Biocidal composition with dual inmediate and remnant activity
US9839602B2 (en) 2014-12-16 2017-12-12 Momentive Performance Materials Inc. Personal care compositions containing crosslinked silicone polymer networks and their method of preparation
EP3233091A4 (en) 2014-12-16 2018-07-18 Realm Therapeutics, Inc. Hypochlorous acid formulations and methods for treating skin conditions
US9801805B2 (en) 2014-12-16 2017-10-31 Momentive Performance Materials Inc. Personal care composition comprising silicone network
PL3265053T3 (pl) 2015-03-05 2020-03-31 Avon Products, Inc. Sposoby leczenia skóry
US20160289480A1 (en) 2015-04-03 2016-10-06 Hand Armor Liquid Chalk LLC Antimicrobial chalk compositions
US10064795B2 (en) 2015-05-22 2018-09-04 Grip Tight Sport Llc Atomizing spray for grip enhancement
ES2902475T3 (es) 2015-06-26 2022-03-28 Eikonic R&D Pty Ltd Composición para la prevención de crecimiento microbiano
GB2541407A (en) 2015-08-17 2017-02-22 Xanadox Tech Ltd Improvements relating to disinfectant solutions
WO2017127452A1 (en) 2016-01-19 2017-07-27 Reoxcyn Discoveries Group, Inc. Hypochlorite formulations for wound healing
US20170290789A1 (en) 2016-04-11 2017-10-12 Frank DiCosmo Wound irrigation solutions
US10709137B2 (en) 2016-04-22 2020-07-14 Mark Hennigan Mold remover and sealer with optional tracer and method
US9474768B1 (en) 2016-05-18 2016-10-25 Reoxcyn Discoveries Group, Inc. Lubricant formulations
US9833471B1 (en) 2016-09-15 2017-12-05 Reoxcyn Discoveries Group, Inc. Hypochlorous acid-based hand sanitizer
US20180200165A1 (en) * 2017-01-16 2018-07-19 Reoxcyn Innovation Group, Llc Dentifrice formulations and methods of oral care
CN111032060A (zh) 2017-06-28 2020-04-17 科利迪恩公司 用于清洁、消毒和/或灭菌的组合物、方法和用途
JP2022536927A (ja) * 2019-06-14 2022-08-22 コリディオン，インコーポレイテッド 微生物増殖を防止するための組成物、キット、方法、および使用
WO2022046955A1 (en) 2020-08-25 2022-03-03 Collidion, Inc. Methods and uses of producing compositions stably comprising free available chlorine species and peroxides
US11365524B1 (en) 2021-06-24 2022-06-21 Clover Equipment, LLC Anchored hole cover
JP2024061099A (ja) 2022-10-21 2024-05-07 ヤンマーホールディングス株式会社 作業管理方法、作業管理システム、及び作業管理プログラム

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4105406A (en) * 1976-12-30 1978-08-08 Murray W Bruce Method of inhibiting corrosion using a hexametaphosphate and a phosphate buffer
US5902227A (en) * 1997-07-17 1999-05-11 Intevep, S.A. Multiple emulsion and method for preparing same
US9326995B2 (en) * 2005-04-04 2016-05-03 The Regents Of The University Of California Oxides for wound healing and body repair
US20190216090A1 (en) * 2018-01-14 2019-07-18 Collidion, Inc. Compositions, Kits, Methods and Uses for Cleaning, Disinfecting, Sterilizing and/or Treating

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of EP4102968A4 *

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4458343A1 (de) 2023-05-04 2024-11-06 Heraeus Medical GmbH Vorrichtung zur präparation und abgabe von wirkstofflösungen
EP4506000A1 (de) 2023-08-08 2025-02-12 Heraeus Medical GmbH Antiseptisches kit und dessen verwendung
WO2025032084A1 (de) 2023-08-08 2025-02-13 Heraeus Medical Gmbh Antiseptisches kit enthaltend ein oxidations- und ein reduktionsmittel und dessen verwendung
EP4585254A1 (de) 2024-01-09 2025-07-16 Heraeus Medical GmbH Wundspüllösung zur entfernung von biofilmen
WO2025149449A1 (de) 2024-01-09 2025-07-17 Heraeus Medical Gmbh Wundspüllösung zur entfernung von biofilmen

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US12582123B2 (en) 2026-03-24
MX2022009895A (es) 2022-10-03
BR112022016156A2 (pt) 2022-11-22
CN115397241A (zh) 2022-11-25
EP4102968A1 (en) 2022-12-21
ZA202210154B (en) 2024-02-28
KR20220154113A (ko) 2022-11-21
US20230112165A1 (en) 2023-04-13
IL295553A (en) 2022-10-01
JP2023513757A (ja) 2023-04-03
EP4102968A4 (en) 2024-04-10
AU2020428560A1 (en) 2022-10-06
CA3167941A1 (en) 2021-08-19
JP7676421B2 (ja) 2025-05-14

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