DK181496B1 - Compositions, kits, methods and uses for cleaning, disinfecting, steriliziing and/or treating - Google Patents

Compositions, kits, methods and uses for cleaning, disinfecting, steriliziing and/or treating Download PDF

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DK181496B1
DK181496B1 DKPA202070529A DKPA202070529A DK181496B1 DK 181496 B1 DK181496 B1 DK 181496B1 DK PA202070529 A DKPA202070529 A DK PA202070529A DK PA202070529 A DKPA202070529 A DK PA202070529A DK 181496 B1 DK181496 B1 DK 181496B1
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ppm
minutes
months
composition disclosed
hypochlorous acid
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DKPA202070529A
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Danish (da)
Inventor
Alimi Hojabr
Govinda Prasad Sridhar
Kanta De Surya
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Collidion Inc
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Priority claimed from PCT/US2019/013542 external-priority patent/WO2019140408A1/en
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Publication of DK202070529A1 publication Critical patent/DK202070529A1/en
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    • AHUMAN NECESSITIES
    • A01AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
    • A01NPRESERVATION OF BODIES OF HUMANS OR ANIMALS OR PLANTS OR PARTS THEREOF; BIOCIDES, e.g. AS DISINFECTANTS, AS PESTICIDES OR AS HERBICIDES; PEST REPELLANTS OR ATTRACTANTS; PLANT GROWTH REGULATORS
    • A01N59/00Biocides, pest repellants or attractants, or plant growth regulators containing elements or inorganic compounds
    • AHUMAN NECESSITIES
    • A01AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
    • A01NPRESERVATION OF BODIES OF HUMANS OR ANIMALS OR PLANTS OR PARTS THEREOF; BIOCIDES, e.g. AS DISINFECTANTS, AS PESTICIDES OR AS HERBICIDES; PEST REPELLANTS OR ATTRACTANTS; PLANT GROWTH REGULATORS
    • A01N59/00Biocides, pest repellants or attractants, or plant growth regulators containing elements or inorganic compounds
    • A01N59/08Alkali metal chlorides; Alkaline earth metal chlorides
    • AHUMAN NECESSITIES
    • A01AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
    • A01NPRESERVATION OF BODIES OF HUMANS OR ANIMALS OR PLANTS OR PARTS THEREOF; BIOCIDES, e.g. AS DISINFECTANTS, AS PESTICIDES OR AS HERBICIDES; PEST REPELLANTS OR ATTRACTANTS; PLANT GROWTH REGULATORS
    • A01N59/00Biocides, pest repellants or attractants, or plant growth regulators containing elements or inorganic compounds
    • A01N59/16Heavy metals; Compounds thereof
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B11/00Oxides or oxyacids of halogens; Salts thereof
    • C01B11/04Hypochlorous acid
    • AHUMAN NECESSITIES
    • A01AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
    • A01NPRESERVATION OF BODIES OF HUMANS OR ANIMALS OR PLANTS OR PARTS THEREOF; BIOCIDES, e.g. AS DISINFECTANTS, AS PESTICIDES OR AS HERBICIDES; PEST REPELLANTS OR ATTRACTANTS; PLANT GROWTH REGULATORS
    • A01N2300/00Combinations or mixtures of active ingredients covered by classes A01N27/00 - A01N65/48 with other active or formulation relevant ingredients, e.g. specific carrier materials or surfactants, covered by classes A01N25/00 - A01N65/48

Abstract

The present specification discloses a composition comprising, consisting essentially of, or consisting of hypochlorous acid or free available chlorine in combination with one or more quaternary compounds or silicon quaternary compounds, one or more guanide-containing compounds, one or more alcohols, one or more metallic particles, one or more metal salts, or any combination thereof. The present specification further discloses a kit comprising, consisting essentially of, or consisting of a one or more containers including a composition disclosed herein or components which make up such compositions as well as methods and uses for such compositions and kits.

Description

DK 181496 B1 1
Compositions, Kits, Methods and Uses for Cleaning, Disinfecting, Sterilizing and/or Treating
[001] In the United States, approximately 46.5 million surgical procedures and even more invasive medical procedures, including approximately 5 million gastrointestinal endoscopies, are performed each year. Each procedure involves contact by a medical device with a patient's sterile tissue or mucous membranes. A major risk of all such procedures is the introduction of pathogens that can lead to infection.
Failure to properly clean, disinfect and/or sterilize a medical device can exposed a patient to body fluids and tissue contaminants from a prior patient can result in person-to-person or environmental transmission of pathogens and infect large numbers of people.
[002] Sterilization of a medical device is preferred because this process destroys or eliminates all forms of microbial life. However, the high temperature and pressures used in sterilization processes are not suitable for heat-sensitive medical device. Such heat-sensitive devices must be cleaned using a disinfection process. However, one problem associated with currently used disinfection processes is that the type and amounts of disinfectants used are destructive to the medical device. This reduces the overall life-time use of a medical device, ultimately resulting in increased medical costs due to the need to replace the medical device sooner with a new one. In addition, given the recent infectious outbreaks due to contaminated medical devices, a better disinfection method better than currently available methods is needed.
[003] WO 2016/040738 A1 describes antimicrobial compositions comprising a hypochlorite salt, a copper (Il) salt, an optional acid and an optional buffering agent having a chlorine concentration of between 0.1 ppm and 300 ppm and a copper (Il) concentration of between 0.1 ppm and 300 ppm.
[004] The present specification discloses disinfection compositions, methods and uses that provide superior cleaning and disinfection of a hard surfaces of contamination/biofilm and/or a medical device including a heat-sensitive medical device and a device classified as a critical, semi-critical or noncritical item. At the same time, the disclosed disinfection compositions, methods and uses are less harsh than conventional compositions, methods and uses resulting in a longer lifetime use of a hard surface and/or medical device.
[005] In addition, whether through surgical procedures or due to injury, there is an urgent need to clean and disinfect wounds. The present specification further discloses disinfection compositions, methods and uses that provide superior cleaning and disinfection of tissue in wound care, pre-operative preparation and surgery, to a skin surface in dermatological applications, and an eye in ophthalmological applications. The present specification also discloses compositions, methods and uses to treat an individual.
SUMMARY
[006] Aspects of the present specification disclose a composition comprising (1) 200 ppm to 1,000 ppm of hypochlorous acid or 200 ppm to 1,000 ppm of free available chlorine and (2) at least three metal salts, each of the at least three metal salts being present in an amount of 50 ppm to 500 ppm, the at least three
DK 181496 B1 2 metal salts being a metal chloride, wherein the at least three metal salts comprise a copper salt, a zinc salt and an iron salt. A composition disclosed herein can further comprise one or more metallic particles.
[007] Other aspects of the present specification disclose a kit comprising a composition disclosed herein.
[008] In other aspects of the present specification disclose a use of a disclosed composition or a disclosed kit in cleaning, disinfecting and/or sterilizing a device.
[009] In other aspects of the present specification disclose a use of a disclosed composition or a disclosed kit for use in cleaning, disinfecting and/or sterilizing a surface area.
[010] In other aspects of the present specification disclose a composition disclosed herein or a kit disclosed herein for use in cleaning, disinfecting and/or sterilizing of a microbial infection in an individual or for use in preventing or treating a condition in an individual. The condition can be a wound, a burn, an infection, an ophthalmic condition, a dermatological condition, an inflammation, an ache, or a pain.
DETAILED DESCRIPTION
[011] A composition disclosed herein has increased stability and efficacy due to the protection of hypochlorous acid. In part, the composition may protect hypochlorous acid from exposure to harmful agents, including, e.g., organic compounds, reactive compounds, positively charged molecules, or other compounds that promote or facilitate degradation of hypochlorous acid. For example, the disclosed compositions are stable in blood serum and in plastic packaging material. In addition, a synergistic effect in efficacy is observed when hypochlorous acid is protected against this exposure. This significantly improved efficacy allows for lower amounts of hypochlorous acid to be used in the disclosed compositions.
As concentrations of hypochlorous acid above 350 ppm, particularly above 500 ppm produces instability, the lower amounts of hypochlorous acid used in the disclosed compositions increases stability of the composition even further. As such, a composition disclosed herein is seen as a replacement to any and all prior hypochlorous acid compositions currently in the market or being developed. Uses include cleaning/disinfecting tissue in wound care and surgery, cleaning/disinfecting skin in dermatological applications, cleaning/disinfecting the eye in ophthalmological applications, cleaning/disinfecting hard surfaces of contamination/biofilm, cleaning/disinfecting medical devices of contamination.
[012] The stability of a composition disclosed herein may be due to the positively charged N atom of a quaternary compound or silicon quaternary compound, a metallic particle, a metal salt and/or a guanide- containing compound disclosed herein. Such compounds appear to form a strong ionic interaction with the negatively charged (OCI-), and the complex thus formed retains its stability over period of time compared to hypochlorous acid alone, which is a weaker complex in solution relative to a composition disclosed herein. Further, the use of 500 ppm or lower, an in particular 350 ppm or lower of hypochlorous acid further increases the stability of a composition disclosed herein.
DK 181496 B1 3
[013] The improved efficacy of a composition disclosed herein may in part be a result of chemical bond formation of a quaternary compound or silicon quaternary compound, a metallic particle, a metal salt and/or a guanide-containing compound disclosed herein with the substrates thereby providing a long-lasting activity combined with the free OCI(-), which has its own antimicrobial activity.
[014] A composition disclosed herein may comprise hypochlorous acid. A weak acid, the chemical formula of hypochlorous acid is HOCI, while its molecular formula is written as HCIO. As shown in formula
I, hypochlorous acid is a simple molecule with the central oxygen connected to chlorine and hydrogen atoms through single bonds and has molar mass is 52.46 g/mol.
O
H Je (1)
[015] Hypochlorous acid is a colorless solution, and its exact physical properties are variable, depending on the concentration of hypochlorous in solution. Hypochlorous acid reacts with bases to form salts called hypochlorites. For example, sodium hypochlorite (NaOCl), the active ingredient in bleach, is formed by reacting hypochlorous acid with sodium hydroxide. Hypochlorous acid also readily reacts with a variety of organic molecules and biomolecules.
[016] The hypochlorous acid solution can be produced, e.g., by dissolving chlorine in water, hydrolysis of chlorine gas, electrolysis of a salt solution or acidification of hypochloride. For example, stable hypochlorous salts, such as, e.g., alkali metal hypochlorites like sodium hypochlorite, calcium hypochlorite, potassium hypochlorite, lithium hypochlorite and magnesium hypochlorite, can be obtained by dissolving chlorine gas into an aqueous alkali metal hydroxide solution, like a sodium hydroxide solution, a calcium hydroxide solution, a potassium hydroxide solution, a lithium hydroxide solution, or a magnesium hydroxide solution. Hypochlorous acid can also be prepared by dissolving dichlorine monoxide in water. As another example, hypochlorous acid can also be produced by electrolytically treating a saline solution. In one method, an electrical current is applied to a one-, two-, or three-compartment cell comprising a cathode chamber, an anode chamber, and a central saline solution chamber interposed between the other two chambers where each chamber is separated by a semi-permeable membrane. During electrolysis, sodium chloride (NaCl) dissociates into negatively charged chloride (CI ) and positively charged sodium (Na'). At the same time, water dissociates into hydroxide (OH-) and hydrogen (H*) ions are formed. The negatively charged chloride (Cl ) and hydroxide (OH ) ions move to the anode to lose electrons and form hypochlorous acid (HOCI) as well as hypochlorite ions (OCI™) and oxygen (Oz) and chlorine (Ch) gases.
The reductive water comprising the hypochlorous acid is then dispensed into a collection chamber for subsequent use. Methods to produce hypochlorous acid are described in, e.g., U.S. Patent Nos 3,914,397, 4,190,638, 4,908,215, 5,322,677, 6,426,066, 7,323,118, 8,062,500, 8,945,630, 9,168,318, and 9,486,479.
[017] In an embodiment, a composition disclosed herein comprises an amount of hypochlorous acid that provides a desired beneficial effect to a composition disclosed herein. In aspects of this embodiment, a composition disclosed herein comprises hypochlorous acid in an amount of, e.g., 200 ppm, 225 ppm, 250 ppm, 275 ppm, 300 ppm, 325 ppm, 350 ppm, 375 ppm, 400 ppm, 425 ppm, 450 ppm, 475 ppm, 500 ppm,
DK 181496 B1 4 525 ppm, 550 ppm, 575 ppm, 600 ppm, 625 ppm, 650 ppm, 675 ppm, 700 ppm, 725 ppm, 750 ppm, 775 ppm, 800 ppm, 825 ppm, 850 ppm, 875 ppm, 900 ppm, 925 ppm, 950 ppm, 975 ppm, or 1,000 ppm,. in other aspects of this embodiment, a composition disclosed herein comprises hypochlorous acid in an amount of, e.g., at least 200 ppm, at least 225 ppm, at least 250 ppm, at least 275 ppm, at least 300 ppm, at least 325 ppm, at least 350 ppm, at least 375 ppm, at least 400 ppm, at least 425 ppm, at least 450 ppm, at least 475 ppm, at least 500 ppm, at least 525 ppm, at least 550 ppm, at least 575 ppm, at least 600 ppm, at least 625 ppm, at least 650 ppm, at least 675 ppm, at least 700 ppm, at least 725 ppm, at least 750 ppm, at least 775 ppm, at least 800 ppm, at least 825 ppm, at least 850 ppm, at least 875 ppm, at least 900 ppm, at least 925 ppm, at least 950 ppm, or at least 975 ppm. In yet other aspects of this embodiment, a composition disclosed herein comprises hypochlorous acid in an amount of, e.g., at most 225 ppm, at most 250 ppm, at most 275 ppm, at most 300 ppm, at most 325 ppm, at most 350 ppm, at most 375 ppm, at most 400 ppm, at most 425 ppm, at most 450 ppm, at most 475 ppm, at most 500 ppm, at most 525 ppm, at most 550 ppm, at most 575 ppm, at most 600 ppm, at most 625 ppm, at most 650 ppm, at most 675 ppm, at most 700 ppm, at most 725 ppm, at most 750 ppm, at most 775 ppm, at most 800 ppm, at most 825 ppm, at most 850 ppm, at most 875 ppm, at most 900 ppm, at most 925 ppm, at most 950 ppm, at most 975 ppm, or at most 1,000 ppm.
[018] In other aspects of this embodiment, a composition disclosed herein comprises hypochlorous acid in an amount of from, e.g., 200 ppm to 225 ppm, 200 ppm to 250 ppm, 200 ppm to 275 ppm, 200 ppm to 300 ppm, 200 ppm to 325 ppm, 200 ppm to 350 ppm, 200 ppm to 375 ppm, 200 ppm to 400 ppm, 250 ppm to 275 ppm, 250 ppm to 300 ppm, 250 ppm to 325 ppm, 250 ppm to 350 ppm, 250 ppm to 375 ppm, 250 ppm to 400 ppm, 300 ppm to 325 ppm, 300 ppm to 350 ppm, 300 ppm to 375 ppm, 300 ppm to 400 ppm, 350 ppm to 375 ppm, 350 ppm to 400 ppm, or 375 ppm to 400 ppm.
[019] In other aspects of this embodiment, a composition disclosed herein comprises hypochlorous acid in an amount of, e.g., 400 ppm to 500 ppm, 400 ppm to 600 ppm, 400 ppm to 700 ppm, 400 ppm to 800 ppm, 400 ppm to 900 ppm, 400 ppm to 1,000 ppm, 500 ppm to 600 ppm, 500 ppm to 700 ppm, 500 ppm to 800 ppm, 500 ppm to 900 ppm, 500 ppm to 1,000 ppm, 600 ppm to 700 ppm, 600 ppm to 800 ppm, 600 ppm to 900 ppm, 600 ppm to 1,000 ppm, 700 ppm to 800 ppm, 700 ppm to 900 ppm, 700 ppm to 1,000 ppm, 800 ppm to 900 ppm, 800 ppm to 1,000 ppm, or 900 ppm to 1,000 ppm.
[020] The concentration of hypochlorous acid in solution may be described as free available chlorine in parts per million. Hypochlorous acid is in equilibrium with hypochlorite ions (1) and dissolved chlorine gas (Ch). The extent of the equilibrium is determined predominately by the salt concentration and pH of the solution. Temperature also impacts the ratio of the free chlorine component. Therefore, both FAC and pH need to be known to understand the amount of chlorine present as hypochlorous acid. In general, when the pH range is about 4.0 to about 5.6, approximately 100% of the available chlorine is present as HOCI.
As the pH is lowered below about 4, there is an increase in dissolved chlorine gas (Cl2). Thus, at a pH of about 3, about 90% of the available chlorine is present as hypochlorous acid, at a pH of about 2, about 75% of the available chlorine is present as hypochlorous acid, at a pH of about 1.5, about 50% of the available chlorine is present as hypochlorous acid, while at a pH of about 1, about 25% of the available
DK 181496 B1 chlorine is present as hypochlorous acid. As the pH is increase above about 5.6, there is an increase in hypochlorite ions (Gi). Thus, at a pH a pH of about 6.5, about 90% of the available chlorine is present as hypochlorous acid, at a pH of about 7, about 75% of the available chlorine is present as hypochlorous acid, at a pH of about 7.5, about 50% of the available chlorine is present as hypochlorous acid, while at a 5 pH of about 8, about 25% of the available chlorine is present as hypochlorous acid.
[021] The chlorine amount may be measured by methods known in the art, such as a DPD colorimeter method (Lamotte Company, Chestertown, Md.), a UV spectrophotometry method, or other known methods established by the Environmental Protection Agency. In the DPD colorimeter method, a yellow color is formed by the reaction of free chlorine With N,N-diethyl-p-phenylenediamine (DPD) and the intensity is measured With a calibrated calorimeter that provides the output in parts per million. Further addition of potassium iodide turns the solution a pink color to provide the total chlorine value.
[022] In an embodiment, a composition disclosed herein comprises an amount of free available chlorine that provides a desired beneficial effect to a composition disclosed herein. In aspects of this embodiment, a composition disclosed herein comprises free available chlorine in an amount of, e.g., 200 ppm, 225 ppm, 250 ppm, 275 ppm, 300 ppm, 325 ppm, 350 ppm, 375 ppm, 400 ppm, 425 ppm, 450 ppm, 475 ppm, 500 ppm, 525 ppm, 550 ppm, 575 ppm, 600 ppm, 625 ppm, 650 ppm, 675 ppm, 700 ppm, 725 ppm, 750 ppm, 775 ppm, 800 ppm, 825 ppm, 850 ppm, 875 ppm, 900 ppm, 925 ppm, 950 ppm, 975 ppm, or 1,000 ppm.
In other aspects of this embodiment, a composition disclosed herein comprises free available chlorine in an amount of, e.g., at least 200 ppm, at least 225 ppm, at least 250 ppm, at least 275 ppm, at least 300 ppm, at least 325 ppm, at least 350 ppm, at least 375 ppm, at least 400 ppm, at least 425 ppm, at least 450 ppm, at least 475 ppm, at least 500 ppm, at least 525 ppm, at least 550 ppm, at least 575 ppm, at least 600 ppm, at least 625 ppm, at least 650 ppm, at least 675 ppm, at least 700 ppm, at least 725 ppm, at least 750 ppm, at least 775 ppm, at least 800 ppm, at least 825 ppm, at least 850 ppm, at least 875 ppm, at least 900 ppm, at least 925 ppm, at least 950 ppm, or at least 975 ppm. In yet other aspects of this embodiment, a composition disclosed herein comprises free available chlorine in an amount of, e.g., at most 225 ppm, at most 250 ppm, at most 275 ppm, at most 300 ppm, at most 325 ppm, at most 350 ppm, at most 375 ppm, at most 400 ppm, at most 425 ppm, at most 450 ppm, at most 475 ppm, at most 500 ppm, at most 525 ppm, at most 550 ppm, at most 575 ppm, at most 600 ppm, at most 625 ppm, at most 650 ppm, at most 675 ppm, at most 700 ppm, at most 725 ppm, at most 750 ppm, at most 775 ppm, at most 800 ppm, at most 825 ppm, at most 850 ppm, at most 875 ppm, at most 900 ppm, at most 925 ppm, at most 950 ppm, at most 975 ppm, or at most 1,000 ppm.
[023] In other aspects of this embodiment, a composition disclosed herein comprises free available chlorine in an amount of from, e.g., 200 ppm to 225 ppm, 200 ppm to 250 ppm, 200 ppm to 275 ppm, 200 ppm to 300 ppm, 200 ppm to 325 ppm, 200 ppm to 350 ppm, 200 ppm to 375 ppm, 200 ppm to 400 ppm, 250 ppm to 275 ppm, 250 ppm to 300 ppm, 250 ppm to 325 ppm, 250 ppm to 350 ppm, 250 ppm to 375 ppm, 250 ppm to 400 ppm, 300 ppm to 325 ppm, 300 ppm to 350 ppm, 300 ppm to 375 ppm, 300 ppm to 400 ppm, 350 ppm to 375 ppm, 350 ppm to 400 ppm, or 375 ppm to 400 ppm.
DK 181496 B1 6
[024] In other aspects of this embodiment, a composition disclosed herein comprises free available chlorine in an amount of, e.g., 400 ppm to 500 ppm, 400 ppm to 600 ppm, 400 ppm to 700 ppm, 400 ppm to 800 ppm, 400 ppm to 900 ppm, 400 ppm to 1,000 ppm, 500 ppm to 600 ppm, 500 ppm to 700 ppm, 500 ppm to 800 ppm, 500 ppm to 900 ppm, 500 ppm to 1,000 ppm, 600 ppm to 700 ppm, 600 ppm to 800 ppm, 600 ppm to 900 ppm, 600 ppm to 1,000 ppm, 700 ppm to 800 ppm, 700 ppm to 900 ppm, 700 ppm to 1,000 ppm, 800 ppm to 900 ppm, 800 ppm to 1,000 ppm, or 900 ppm to 1,000 ppm.
[025] In one embodiment, a composition disclosed herein does not comprise ozone. In another embodiment, a composition disclosed herein can comprise ozone.
[026] In one embodiment, a composition disclosed herein does not comprise hydrogen peroxide. In another embodiment, a composition disclosed herein can comprise hydrogen peroxide.
[027] A composition disclosed herein may comprise a quaternary compound. Non-limiting examples of a quaternary compound includes a dialkyl quaternary compound and a polyether fatty quaternary compound. Examples of a dialkyl quaternary compound includes, didodecyldimethylammonium chloride and di-n-alkyldimethyl ammonium chloride. A quaternary compound includes a silicon quaternary compound. Non-limiting examples of a silicon quaternary compound includes a silicone dialkyl quaternary compound and a silicone polyether fatty quaternary compound. Examples of a silicone dialkyl quaternary compound includes, without limitation, dimethyloctadecyl[3-(trimethoxysilyl)propyllammonium chloride (DTSACI) and tetradecyldimethyl-(3-trimethoxysilyl)propyl ammonium chloride (TTSACI). Examples of other quaternary compounds include, without limitation, a quaternary ammonium salt, such as, e.g,
Quaternium-15 and Quaternium-18 and a polycationic polymer, such as, e.g., cetylpyridinium chloride, and a polyquaternium like Polyquaterniums 1, 2, 3, 4, 5,6, 7, 8, 9,10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, — 22,23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39, 40, 41, 42, 43, 44, 45, 46, and 47.
Other none-limiting examples of a quaternary compound include those with the formula NR4', where R is an alkyl or an aryl group.
[028] In one embodiment, a single quaternary compound or silicon quaternary compound is present in a composition disclosed herein. In another embodiment, a plurality of quaternary compounds or silicon quaternary compounds is present in a composition disclosed herein. In aspects of this embodiment, a composition disclosed herein comprises, e.g., one or more quaternary compounds or silicon quaternary compounds, two or more quaternary compounds or silicon quaternary compounds, three or more quaternary compounds or silicon quaternary compounds, four or more quaternary compounds or silicon quaternary compounds or five or more quaternary compounds or silicon quaternary compounds. In other aspects of this embodiment, a composition disclosed herein comprises, e.g., only one quaternary compound or silicon quaternary compound, at most two quaternary compounds or silicon quaternary compounds, at most three quaternary compounds or silicon quaternary compounds, at most four quaternary compounds or silicon quaternary compounds, or at most five quaternary compounds or silicon quaternary compounds. In yet other aspects ofthis embodiment, a composition disclosed herein comprises from, e.g., 1 to 2 quaternary compounds or silicon quaternary compounds, 1 to 3 quaternary compounds
DK 181496 B1 7 or silicon quaternary compounds, 1 to 4 quaternary compounds or silicon quaternary compounds, 1 to 5 quaternary compounds or silicon quaternary compounds, 2 to 3 quaternary compounds or silicon quaternary compounds, 2 to 4 quaternary compounds or silicon quaternary compounds, 2 to 5 quaternary compounds or silicon quaternary compounds, 3 to 4 quaternary compounds or silicon quaternary compounds, 3 to 5 quaternary compounds or silicon quaternary compounds or 4 to 5 quaternary compounds or silicon quaternary compounds.
[029] In an embodiment, a composition disclosed herein comprises an amount of a quaternary compound or silicon quaternary compound that provides a desired beneficial effect to a composition disclosed herein.
In aspects of this embodiment, a composition disclosed herein comprises a quaternary compound or silicon quaternary compound in an amount of, e.g., 0.05 ppm, 0.10 ppm, 0.15 ppm, 0.20 ppm, 0.25 ppm, 0.30 ppm, 0.35 ppm, 0.40 ppm, 0.45 ppm, 0.50 ppm, 0.55 ppm, 0.60 ppm, 0.65 ppm, 0.70 ppm, 0.75 ppm, 0.80 ppm, 0.85 ppm, 0.90 ppm, 0.95 ppm, 1 ppm, 5 ppm, 10 ppm, 15 ppm, 20 ppm, 25 ppm, 30 ppm, 35 ppm, 40 ppm, 45 ppm, 50 ppm, 55 ppm, 60 ppm, 65 ppm, 70 ppm, 75 ppm, 80 ppm, 85 ppm, 90 ppm, 95 ppm, 100 ppm, 125 ppm, 150 ppm, 175 ppm, 200 ppm, 225 ppm, 250 ppm, 275 ppm, 300 ppm, 325 ppm, 350 ppm, 375 ppm, 400 ppm, 425 ppm, 450 ppm, 475 ppm, 500 ppm, 525 ppm, 550 ppm, 575 ppm, 600 ppm, 625 ppm, 650 ppm, 675 ppm, 700 ppm, 725 ppm, 750 ppm, 775 ppm, 800 ppm, 825 ppm, 850 ppm, 875 ppm, 900 ppm, 925 ppm, 950 ppm, 975 ppm, 1,000 ppm, 1,025 ppm, 1,050 ppm, 1075 ppm, 1,100 ppm, 1,125 ppm, 1,150 ppm, 1,175 ppm, 1,200 ppm, 1,225 ppm, 1,250 ppm, 1,275 ppm, 1,300 ppm, 1,325 ppm, 1,350 ppm, 1,375 ppm, 1,400 ppm, 1,425 ppm, 1,450 ppm, 1,475 ppm, 1,500 ppm, 1,600 ppm, 1,700 ppm, 1,800 ppm, 1,900 ppm, or 2,000 ppm. In other aspects of this embodiment, a composition disclosed herein comprises a quaternary compound or silicon quaternary compound in an amount of, e.g., at least 0.05 ppm, at least 0.10 ppm, at least 0.20 ppm, at least 0.30 ppm, at least 0.40 ppm, at least 0.50 ppm, at least 0.60 ppm, at least 0.70 ppm, at least 0.80 ppm, at least 0.90 ppm, at least 1 ppm, at least 10 ppm, at least 20 ppm, at least 30 ppm, at least 40 ppm, at least 50 ppm, at least 60 ppm, at least 70 ppm, at least 80 ppm, at least 90 ppm, at least 100 ppm, at least 125 ppm, at least 150 ppm, at least 175 ppm, at least 200 ppm, at least 225 ppm, at least 250 ppm, at least 275 ppm, at least 300 ppm, at least 325 ppm, at least 350 ppm, at least 375 ppm, at least 400 ppm, at least 425 ppm, at least 450 ppm, at least 475 ppm, at least 500 ppm, at least 525 ppm, at least 550 ppm, at least 575 ppm, at least 600 ppm, at least 625 ppm, at least 650 ppm, at least 675 ppm, at least 700 ppm, at least 725 ppm, at least 750 ppm, at least 775 ppm, at least 800 ppm, at least 825 ppm, at least 850 ppm, at least 875 ppm, at least 900 ppm, at least 925 ppm, at least 950 ppm, at least 975 ppm, at least 1,000 ppm, at least 1,025 ppm, at least 1,050 ppm, at least 1075 ppm, at least 1,100 ppm, at least 1,125 ppm, at least 1,150 ppm, at least 1,175 ppm, at least 1,200 ppm, at least 1,225 ppm, at least 1,250 ppm, at least 1,275 ppm, at least 1,300 ppm, at least 1,325 ppm, at least 1,350 ppm, at least 1,375 ppm, at least 1,400 ppm, at least 1,425 ppm, at least 1,450 ppm, at least 1,475 ppm, at least 1,500 ppm, at least 1,600 ppm, at least 1,700 ppm, at least 1,800 ppm, at least 1,900 ppm, or at least 2,000 ppm. In yet other aspects of this embodiment, a composition disclosed herein comprises a quaternary compound or silicon quaternary compound in an amount of, e.g., at most 0.05 ppm, at most 0.10 ppm, at most 0.20 ppm, at most 0.30 ppm, at most 0.40 ppm, at most 0.50 ppm, at most 0.60 ppm, at most 0.70 ppm, at most 0.80 ppm, at most 0.90 ppm, at most 1 ppm, at most 10 ppm, at most 20 ppm, at most 30 ppm, at most 40 ppm, at most 50 ppm, at most 60 ppm, at most 70 ppm, at most 80 ppm, at most 90 ppm,
DK 181496 B1 8 at most 100 ppm, at most 125 ppm, at most 150 ppm, at most 175 ppm, at most 200 ppm, at most 225 ppm, at most 250 ppm, at most 275 ppm, at most 300 ppm, at most 325 ppm, at most 350 ppm, at most 375 ppm, at most 400 ppm, at most 425 ppm, at most 450 ppm, at most 475 ppm, at most 500 ppm, at most 525 ppm, at most 550 ppm, at most 575 ppm, at most 600 ppm, at most 625 ppm, at most 650 ppm, at most 675 ppm, at most 700 ppm, at most 725 ppm, at most 750 ppm, at most 775 ppm, at most 800 ppm, at most 825 ppm, at most 850 ppm, at most 875 ppm, at most 900 ppm, at most 925 ppm, at most 950 ppm, at most 975 ppm, at most 1,000 ppm, at most 1,025 ppm, at most 1,050 ppm, at most 1075 ppm, at most 1,100 ppm, at most 1,125 ppm, at most 1,150 ppm, at most 1,175 ppm, at most 1,200 ppm, at most 1,225 ppm, at most 1,250 ppm, at most 1,275 ppm, at most 1,300 ppm, at most 1,325 ppm, at most 1,350 ppm, at most 1,375 ppm, at most 1,400 ppm, at most 1,425 ppm, at most 1,450 ppm, at most 1,475 ppm, at most 1,500 ppm, at most 1,600 ppm, at most 1,700 ppm, at most 1,800 ppm, at most 1,900 ppm, or at most 2,000 ppm.
[030] In still other aspects of this embodiment, a composition disclosed herein comprises a quaternary compound or silicon quaternary compound in an amount of from, e.g., 0.5 ppm to 20 ppm, 0.5 ppm to 25 ppm, 0.5 ppm to 30 ppm, 0.5 ppm to 35 ppm, 0.5 ppm to 40 ppm, 0.5 ppm to 45 ppm, 0.5 ppm to 50 ppm, 0.5 ppm to 55 ppm, 0.5 ppm to 60 ppm, 0.5 ppm to 65 ppm, 0.5 ppm to 70 ppm, 0.5 ppm to 75 ppm, 0.5 ppm to 80 ppm, 0.5 ppm to 85 ppm, 0.5 ppm to 90 ppm, 0.5 ppm to 95 ppm, 0.5 ppm to 100 ppm, 0.75 ppm to 20 ppm, 0.75 ppm to 25 ppm, 0.75 ppm to 30 ppm, 0.75 ppm to 35 ppm, 0.75 ppm to 40 ppm, 0.75 ppm to 45 ppm, 0.75 ppm to 50 ppm, 0.75 ppm to 55 ppm, 0.75 ppm to 60 ppm, 0.75 ppm to 65 ppm, 0.75 ppm to 70 ppm, 0.75 ppm to 75 ppm, 0.75 ppm to 80 ppm, 0.75 ppm to 85 ppm, 0.75 ppm to 90 ppm, 0.75 ppm to 95 ppm, 0.75 ppm to 100 ppm, 1 ppm to 20 ppm, 1 ppm to 25 ppm, 1 ppm to 30 ppm, 1 ppm to 35 ppm, 1 ppm to 40 ppm, 1 ppm to 45 ppm, 1 ppm to 50 ppm, 1 ppm to 55 ppm, 1 ppm to 60 ppm, 1 ppm to 65 ppm, 1 ppm to 70 ppm, 1 ppm to 75 ppm, 1 ppm to 80 ppm, 1 ppm to 85 ppm, 1 ppm to 90 ppm, 1 ppm to 95 ppm, 1 ppm to 100 ppm, 5 ppm to 20 ppm, 5 ppm to 25 ppm, 5 ppm to 30 ppm, 5 ppm to 35 ppm, 5 ppm to 40 ppm, 5 ppm to 45 ppm, 5 ppm to 50 ppm, 5 ppm to 55 ppm, 5 ppm to 60 ppm, 5 ppm to 65 ppm, 5 ppm to 70 ppm, 5 ppm to 75 ppm, 5 ppm to 80 ppm, 5 ppm to 85 ppm, 5 ppm to 90 ppm, 5 ppm to 95 ppm, 5 ppm to 100 ppm, 10 ppm to 20 ppm, 10 ppm to 25 ppm, 10 ppm to 30 ppm, 10 ppm to 35 ppm, 10 ppm to 40 ppm, 10 ppm to 45 ppm, 10 ppm to 50 ppm, 10 ppm to 55 ppm, 10 ppm to 60 ppm, 10 ppm to 65 ppm, 10 ppm to 70 ppm, 10 ppm to 75 ppm, 10 ppm to 80 ppm, 10 ppm to 85 ppm, 10 ppm to 90 ppm, 10 ppm to 95 ppm, or 10 ppm to 100 ppm.
[031] In other aspects of this embodiment, a composition disclosed herein comprises a quaternary compound or silicon quaternary compound in an amount of from, e.g., 1 ppm to 25 ppm, 1 ppm to 50 ppm, 1 ppmto 75 ppm, 1 ppm to 100 ppm, 1 ppm to 125 ppm, 1 ppm to 150 ppm, 1 ppm to 175 ppm, 1 ppm to 200 ppm, 1 ppm to 225 ppm, 1 ppm to 250 ppm, 1 ppm to 275 ppm, 1 ppm to 300 ppm, 1 ppm to 325 ppm, 1 ppm to 350 ppm, 1 ppm to about 375 ppm, 1 ppm to 400 ppm, 10 ppm to 25 ppm, 10 ppm to 50 ppm, 10 ppmto 75 ppm, 10 ppm to 100 ppm, 10 ppm to 125 ppm, 10 ppm to 150 ppm, 10 ppm to 175 ppm, 10 ppm to 200 ppm, 10 ppm to 225 ppm, 10 ppm to 250 ppm, 10 ppm to 275 ppm, 10 ppm to 300 ppm, 10 ppm to 325 ppm, 10 ppm to 350 ppm, 10 ppm to 375 ppm, 10 ppm to 400 ppm, 25 ppm to 50 ppm, 25 ppm to 75 ppm, 25 ppm to 100 ppm, 25 ppm to 125 ppm, 25 ppm to 150 ppm, 25 ppm to 175 ppm, 25 ppm to 200
DK 181496 B1 9 ppm, 25 ppm to 225 ppm, 25 ppm to 250 ppm, 25 ppm to 275 ppm, 25 ppm to 300 ppm, 25 ppm to 325 ppm, 25 ppm to 350 ppm, 25 ppm to 375 ppm, 25 ppm to 400 ppm, 50 ppm to 75 ppm, 50 ppm to 100 ppm, 50 ppm to 125 ppm, 50 ppm to 150 ppm, 50 ppm to 175 ppm, 50 ppm to 200 ppm, 50 ppm to 225 ppm, 50 ppm to 250 ppm, 50 ppm to 275 ppm, 50 ppm to 300 ppm, 50 ppm to 325 ppm, 50 ppm to 350 ppm, 50 ppm to 375 ppm, 50 ppm to 400 ppm, 75 ppm to 100 ppm, 75 ppm to 125 ppm, 75 ppm to 150 ppm, 75 ppm to 175 ppm, 75 ppm to 200 ppm, 75 ppm to 225 ppm, 75 ppm to 250 ppm, 75 to 275 ppm, 75 ppm to 300 ppm, 75 ppm to 325 ppm, 75 ppm to about 350 ppm, 75 ppm to 375 ppm, 75 ppm to 400 ppm, 100 ppm to 125 ppm, 100 ppm to 150 ppm, 100 ppm to 175 ppm, 100 ppm to 200 ppm, 100 ppm to 225 ppm, 100 ppm to 250 ppm, 100 ppm to 275 ppm, 100 ppm to 300 ppm, 100 ppm to 325 ppm, 100 ppm to 350 ppm, 100 ppm to 375 ppm, 100 ppm to 400 ppm, 150 ppm to 175 ppm, 150 ppm to 200 ppm, 150 ppm to 225 ppm, 150 ppm to 250 ppm, 150 ppm to 275 ppm, 150 ppm to 300 ppm, 150 ppm to 325 ppm, 150 ppm to 350 ppm, 150 ppm to 375 ppm, 150 ppm to 400 ppm, 200 ppm to 225 ppm, 200 ppm to 250 ppm, 200 ppm to 275 ppm, 200 ppm to 300 ppm, 200 ppm to 325 ppm, 200 ppm to 350 ppm, 200 ppm to 375 ppm, 200 ppm to 400 ppm, 250 ppm to 275 ppm, 250 ppm to 300 ppm, 250 ppm to 325 ppm, 250 ppm to 350 ppm, 250 ppm to 375 ppm, 250 ppm to 400 ppm, 300 ppm to 325 ppm, 300 ppm to 350 ppm, 300 ppm to 375 ppm, 300 ppm to 400 ppm, 350 ppm to 375 ppm, 350 ppm to 400 ppm, or 375 ppm to 400 ppm.
[032] In other aspects of this embodiment, a composition disclosed herein comprises a quaternary compound or silicon quaternary compound in an amount of, e.g., 400 ppm to 500 ppm, 400 ppm to 600 ppm, 400 ppm to 700 ppm, 400 ppm to 800 ppm, 400 ppm to 900 ppm, 400 ppm to 1,000 ppm, 400 ppm to 1,100 ppm, 400 ppm to 1,200 ppm, 400 ppm to 1,300 ppm, 400 ppm to 1,400 ppm, 400 ppm to 1,500 ppm, 400 ppm to 1,600 ppm, 400 ppm to 1,700 ppm, 400 ppm to 1,800 ppm, 400 ppm to 1,900 ppm, 400 ppm to 2,000 ppm, 500 ppm to 600 ppm, 500 ppm to 700 ppm, 500 ppm to 800 ppm, 500 ppm to 900 ppm, 500 ppm to 1,000 ppm, 500 ppm to 1,100 ppm, 500 ppm to 1,200 ppm, 500 ppm to 1,300 ppm, 500 ppm to 1,400 ppm, 500 ppm to 1,500 ppm, 500 ppm to 1,600 ppm, 500 ppm to 1,700 ppm, 500 ppm to 1,800 ppm, 500 ppm to 1,900 ppm, 500 ppm to 2,000 ppm, 600 ppm to 700 ppm, 600 ppm to 800 ppm, 600 ppm to 900 ppm, 600 ppm to 1,000 ppm, 600 ppm to 1,100 ppm, 600 ppm to 1,200 ppm, 600 ppm to 1,300 ppm, 600 ppm to 1,400 ppm, 600 ppm to 1,500 ppm, 600 ppm to 1,600 ppm, 600 ppm to 1,700 ppm, 600 ppm to 1,800 ppm, 600 ppm to 1,900 ppm, 600 ppm to 2,000 ppm, 700 ppm to 800 ppm, 700 ppm to 900 ppm, 700 ppm to 1,000 ppm, 700 ppm to 1,100 ppm, 700 ppm to 1,200 ppm, 700 ppm to 1,300 ppm, 700 ppm to 1,400 ppm, 700 ppm to 1,500 ppm, 700 ppm to 1,600 ppm, 700 ppm to 1,700 ppm, 700 ppm to 1,800 ppm, 700 ppm to 1,900 ppm, 700 ppm to 2,000 ppm, 800 ppm to 900 ppm, 800 ppm to 1,000 ppm, 800 ppm to 1,100 ppm, 800 ppm to 1,200 ppm, 800 ppm to 1,300 ppm, 800 ppm to 1,400 ppm, 800 ppm to 1,500 ppm, 800 ppm to 1,600 ppm, 800 ppm to 1,700 ppm, 800 ppm to 1,800 ppm, 800 ppm to 1,900 ppm, 800 ppm to 2,000 ppm, 900 ppm to 1,000 ppm, 900 ppm to 1,100 ppm, 900 ppm to 1,200 ppm, 900 ppm to 1,300 ppm, 900 ppm to 1,400 ppm, 900 ppm to 1,500 ppm, 900 ppm to 1,600 ppm, 900 ppm to 1,700 ppm, 900 ppm to 1,800 ppm, 900 ppm to 1,900 ppm, 900 ppm to 2,000 ppm, 1,000 ppm to 1,100 ppm, 1,000 ppm to 1,200 ppm, 1,000 ppm to 1,300 ppm, 1,000 ppm to 1,400 ppm, 1,000 ppm to 1,500 ppm, 1,000 ppm to 1,600 ppm, 1,000 ppm to 1,700 ppm, 1,000 ppm to 1,800 ppm, 1,000 ppm to 1,900 ppm, 1,000 ppm to 2,000 ppm, 1,100 ppm to 1,200 ppm, 1,100 ppm to 1,300 ppm, 1,100 ppm to 1,400 ppm, 1,100 ppm to 1,500 ppm, 1,100 ppm to 1,600 ppm, 1,100 ppm to 1,700 ppm, 1,100 ppm to 1,800 ppm,
DK 181496 B1 10 1,100 ppm to 1,900 ppm, 1,100 ppm to 2,000 ppm, 1,200 ppm to 1,300 ppm, 1,200 ppm to 1,400 ppm, 1,200 ppm to 1,500 ppm, 1,200 ppm to 1,600 ppm, 1,200 ppm to 1,700 ppm, 1,200 ppm to 1,800 ppm, 1,200 ppm to 1,900 ppm, 1,200 ppm to 2,000 ppm, 1,300 ppm to 1,400 ppm, 1,300 ppm to 1,500 ppm, 1,300 ppm to 1,600 ppm, 1,300 ppm to 1,700 ppm, 1,300 ppm to 1,800 ppm, 1,300 ppm to 1,900 ppm, 1,300 ppm to 2,000 ppm, 1,400 ppm to 1,500 ppm, 1,400 ppm to 1,600 ppm, 1,400 ppm to 1,700 ppm, 1,400 ppm to 1,800 ppm, 1,400 ppm to 1,900 ppm, 1,400 ppm to 2,000 ppm, 1,500 ppm to 1,600 ppm, 1,500 ppm to 1,700 ppm, 1,500 ppm to 1,800 ppm, 1,500 ppm to 1,900 ppm, 1,500 ppm to 2,000 ppm, 1,600 ppm to 1,700 ppm, 1,600 ppm to 1,800 ppm, 1,600 ppm to 1,900 ppm, 1,600 ppm to 2,000 ppm, 1,700 ppm to 1,800 ppm, 1,700 ppm to 1,900 ppm, 1,700 ppm to 2,000 ppm, 1,800 ppm to 1,900 ppm, 1,800 ppm to 2,000 ppm, or 1,900 ppm to 2,000 ppm.
[033] In aspects of this embodiment, a composition disclosed herein comprises a quaternary compound or silicon quaternary compound in an amount of, e.g., about 0.10%, about 0.11%, about 0.12%, about 0.13%, about 0.14%, about 0.15%, about 0.16%, about 0.17%, about 0.18%, about 0.19%, about 0.2%, about 0.25%, about 0.3%, about 0.35%, about 0.4%, about 0.45%, or about 0.5% by weight of the composition. In other aspects of this embodiment, a composition disclosed herein comprises a quaternary compound or silicon quaternary compound in an amount of, e.g., at least 0.10%, at least 0.11%, at least 0.12%, at least 0.13%, at least 0.14%, at least 0.15%, at least 0.16%, at least 0.17%, at least 0.18%, at least 0.19%, at least 0.2%, at least 0.25%, at least 0.3%, at least 0.35%, at least 0.4%, at least 0.45%, or at least 0.5% by weight of the composition. In yet other aspects of this embodiment, a composition disclosed herein comprises a quaternary compound or silicon quaternary compound in an amount of, e.g., at most 0.10%, at most 0.11%, at most 0.12%, at most 0.13%, at most 0.14%, at most 0.15%, at most 0.16%, at most 0.17%, at most 0.18%, at most 0.19%, at most 0.2%, at most 0.25%, at most 0.3%, at most 0.35%, at most 0.4%, at most 0.45%, or at most 0.5% by weight of the composition. In still other aspects ofthis embodiment, a composition disclosed herein comprises a quaternary compound or silicon quaternary compound in an amount of, e.g., about 0.10% to about 0.15%, about 0.10% to about 0.20%, about 0.10% to about 0.25%, about 0.10% to about 0.30%, about 0.10% to about 0.35%, about 0.10% to about 0.40%, about 0.10% to about 0.45%, about 0.10% to about 0.50%, about 0.20% to about 0.25%, about 0.20% to about 0.30%, about 0.20% to about 0.35%, about 0.20% to about 0.40%, about 0.20% to about 0.45%, about 0.20% to about 0.50%, about 0.30% to about 0.35%, about 0.30% to about 0.40%, about 0.30% to about 0.45%, about 0.30% to about 0.50%, about 0.40% to about 0.45%, about 0.40% to about 0.50%, or about 0.40% to about 0.50% by weight of the composition.
[034] In aspects of this embodiment, a composition disclosed herein comprises a quaternary compound or silicon quaternary compound in an amount of, e.g., about 1.0%, about 2.0%, about 3.0%, about 4.0%, about 5.0%, about 6.0%, about 7.0%, about 8.0%, about 9.0%, about 10%, about 11%, about 12%, about 13%, about 14%, or about 15% by weight of the composition. In other aspects of this embodiment, a composition disclosed herein comprises a quaternary compound or silicon quaternary compound in an amount of, e.g., at least 1.0%, at least 2.0%, at least 3.0%, at least 4.0%, at least 5.0%, at least 6.0%, at least 7.0%, at least 8.0%, at least 9.0%, at least 10%, at least 11%, at least 12%, at least 13%, at least 14%, or at least 15% by weight of the composition. In yet other aspects of this embodiment, a composition
DK 181496 B1 11 disclosed herein comprises a quaternary compound or silicon quaternary compound in an amount of, e.g., at most 1.0%, at most 2.0%, at most 3.0%, at most 4.0%, at most 5.0%, at most 6.0%, at most 7.0%, at most 8.0%, at most 9.0%, at most 10%, at most 11%, at most 12%, at most 13%, at most 14%, or at most 15% by weight of the composition. In still other aspects of this embodiment, a composition disclosed herein comprises a quaternary compound or silicon quaternary compound in an amount of, e.g., 1.0% to 2.0%, 1.0% to 3.0%, 1.0% to 4.0%, 1.0% to 5.0%, 1.0% to 6.0%, 1.0% to 7.0%, 1.0% to 8.0%, 1.0% to 9.0%, 1.0% to 10%, 1.0% to 11%, 1.0% to 12%, 1.0% to 13%, 1.0% to 14%, 1.0% to 15%, 2.0% to 3.0%, 2.0% to 4.0%, 2.0% to 5.0%, 2.0% to 6.0%, 2.0% to 7.0%, 2.0% to 8.0%, 2.0% to 9.0%, 2.0% to 10%, 2.0% to 11%, 2.0% to 12%, 2.0% to 13%, 2.0% to 14%, 2.0% to 15%, 3.0% to 4.0%, 3.0% to 5.0%, 3.0% to 6.0%, 3.0% to 7.0%, 3.0% to 8.0%, 3.0% to 9.0%, 3.0% to 10%, 3.0% to 11%, 3.0% to 12%, 3.0% to 13%, 3.0% to 14%, 3.0% to 15%, 4.0% to 5.0%, 4.0% to 6.0%, 4.0% to 7.0%, 4.0% to 8.0%, 4.0% to 9.0%, 4.0% to 10%, 4.0% to 11%, 4.0% to 12%, 4.0% to 13%, 4.0% to 14%, 4.0% to 15%, 5.0% to 6.0%, 5.0% to 7.0%, 5.0% to 8.0%, 5.0% to 9.0%, 5.0% to 10%, 5.0% to 11%, 5.0% to 12%, 5.0% to 13%, 5.0% to 14%, 5.0% to 15%, 6.0% to 7.0%, 6.0% to 8.0%, 6.0% to 9.0%, 6.0% to 10%, 6.0% to 11%, 6.0% to 12%, 6.0% to — 13%, 6.0% to 14%, 6.0% to 15%, 7.0% to 8.0%, 7.0% to 9.0%, 7.0% to 10%, 7.0% to 11%, 7.0% to 12%, 7.0% to 13%, 7.0% to 14%, 7.0% to 15%, 8.0% to 9.0%, 8.0% to 10%, 8.0% to 11%, 8.0% to 12%, 8.0% to 13%, 8.0% to 14%, 8.0% to 15%, 9.0% to 10%, 9.0% to 11%, 9.0% to 12%, 9.0% to 13%, 9.0% to 14%, 9.0% to 15%, 10% to 11%, 10% to 12%, 10% to 13%, 10% to 14%, 10% to 15%, 11% to 12%, 11% to 13%, 11% to 14%, 11% to 15%, 12% to 13%, 12% to 14%, 12% to 15%, 13% to 14%, 13% to 15%, or 14% to 15% by weight of the composition.
[035] In an embodiment, a composition disclosed herein does not comprise a quaternary compound. In an embodiment, a composition disclosed herein does not comprise a silicon quaternary compound. In an embodiment, a composition disclosed herein does not comprise a quaternary compound or a silicon quaternary compound.
[036] A composition disclosed herein may comprise a compound containing a guanide moiety and/or functional group. Non-limiting examples of a guanide-containing compound include an organic compound containing a biguanide functional group, a biguanidine functional group or a triguanide functional group. In one embodiment, a guanide-containing compound disclosed herein is a biguanide or a biguanide- containing compound. In an aspect of this embodiment, a biguanide-containing compound comprises one, two, three, four or five biguanide functional groups. In an aspect of this embodiment, a biguanide-containing compound comprises formula Il,
NH NH rl I re
H H H no wherein R? and R? can each independently be a bond, H, C, NH, NH2, a C1-10 alkyl, a C1-10 alkane, a C1-10 alkyne, a 5 or 6 carbon aromatic ring, optionally substituted with a halogen; and n is 1-5. A halogen is F,
Br, CI, I, and At. Non-limiting examples of a biguanide-containing compound include a polyhexamethylene
DK 181496 B1 12 biguanide (PHMB), a polyaminopropyl biguanide (PAPB), a 1,1’-(1,6-Hexanediyl)bis{2-[N’-(2- ethylhexyl)carbamimidoyl]guanidine} (alexidine), a chlorhexidine and a chlorhexidine gluconate.
[037] In one embodiment, a guanide-containing compound disclosed herein is a biguanidine or a biguanidine-containing compound. In an aspect of this embodiment, a biguanidine-containing compound comprises one, two, three, four or five biguanidine functional groups. In an aspect of this embodiment, a biguanidine-containing compound comprises formula Ill,
NH NH
R/. J No oR’
NH "om wherein R7 and Rå can each independently be a bond, H, C, NH, NH2, a C1-10 alkyl, a C1-10 alkane, a C1-10 alkyne, a 5 or 6 carbon aromatic ring, optionally substituted with a halogen; and n is 1-5. A halogen is F,
Br, CI, I, and At.
[038] In one embodiment, a guanide-containing compound disclosed herein is a triguanide or a triguanide-containing compound. In an aspect of this embodiment, a triguanide-containing compound comprises one, two, three, four or five triguanide functional groups. In an aspect of this embodiment, a triguanide-containing compound comprises formula IV,
NH NH NH
9 10
NR nov wherein R? and R'” can each independently be a bond, H, C, NH, NH?, a C1-10 alkyl, a C1-10 alkane, a C1-10 alkyne, a 5 or 6 carbon aromatic ring, optionally substituted with a halogen; and n is 1-5. A halogen is F,
Br, CI, I, and At.
[039] In one embodiment, a single guanide-containing compound is present in a composition disclosed herein. In another embodiment, a plurality of guanide-containing compounds is present in a composition disclosed herein. In aspects of this embodiment, a composition disclosed herein comprises, e.g., one or more guanide-containing compounds, two or more guanide-containing compounds, three or more guanide- containing compounds, four or more guanide-containing compounds or five or more guanide-containing compounds. In other aspects of this embodiment, a composition disclosed herein comprises, e.g., only one guanide-containing compound, at most two guanide-containing compounds, at most three guanide- containing compounds, at most four guanide-containing compounds, or at most five guanide-containing compounds. In yet other aspects of this embodiment, a composition disclosed herein comprises from, e.g., 1 to 2 guanide-containing compounds, 1 to 3 guanide-containing compounds, 1 to 4 guanide-containing compounds, 1 to 5 guanide-containing compounds, 2 to 3 guanide-containing compounds, 2 to 4 guanide- containing compounds, 2 to 5 guanide-containing compounds, 3 to 4 guanide-containing compounds, 3 to 5 guanide-containing compounds or 4 to 5 guanide-containing compounds.
DK 181496 B1 13
[040] Any amount of a guanide-containing compound disclosed herein may be used, with the proviso that the amount is useful to practice the methods disclosed herein. In aspects of this embodiment, a composition disclosed herein comprises a guanide-containing compound in an amount of, e.g9., about 0.01%, about 0.05%, about 0.075%, about 0.1%, about 0.2%, about 0.3%, about 0.4%, about 0.5%, about 0.6%, about 0.7%, about 0.8%, about 0.9%, about 1.0%, about 1.5%, about 2.0%, about 2.5%, about 3.0%, about 4.0%, about 5.0%, about 6.0%, about 7.0%, about 7.5%, about 8.0%, about 9.0%, about 10.0%. about 11%, about 12%, about 13%, about 14%, about 15%, about 20%, about 25%, or about 30% by weight of the composition. In other aspects of this embodiment, a composition disclosed herein comprises a guanide-containing compound in an amount of, e.g., at least 0.01%, at least 0.05%, at least 0.075%, at least 0.1%, at least 0.25%, at least 0.5%, at least 0.75%, at least 1.0%, at least 1.5%, at least 2.0%, at least 2.5%, at least 3.0%, at least 4.0%, at least 5.0%, at least 6.0%, at least 7.0%, at least 7.5%, at least 8.0%, at least 9.0%, at least 10.0%, at least 11%, at least 12%, at least 13%, at least 14%, at least 15%, at least 20%, at least 25%, or at least 30% by weight of the composition. In yet other aspects of this embodiment, a composition disclosed herein comprises a guanide-containing compound in an amount of, e.g., at most 0.01%, at most 0.05%, at most 0.075%, at most 0.1%, at most 0.25%, at most 0.5%, at most 0.75%, at most 1.0%, at most 1.5%, at most 2.0%, at most 2.5%, at most 3.0%, at most 4.0%, at most 5.0%, at most 6.0%, at most 7.5%, at most 8.0%, at most 9.0%, at most 10.0%, at most 11%, at most 12%, at most 13%, at most 14%, at most 15%, at most 20%, at most 25%, or at most 30% by weight of the composition.
[041] In still other aspects of this embodiment, a composition disclosed herein comprises a guanide- containing compound in an amount of, e.g., 0.1% to 0.5%, 0.1% to 0.75%, 0.1% to 1.0%, 0.1% to 1.5%, 0.1% to 2.0%, 0.1% to 2.5%, 0.1% to 3.0%, 0.1% to 3.5%, 0.1% to 4.0%, 0.1% to 4.5%, 0.1% to 5.0%, 0.2% to 0.5%, 0.2% to 0.75%, 0.2% to 1.0%, 0.2% to 1.5%, 0.2% to 2.0%, 0.2% to 2.5%, 0.2% to 3.0%, 0.2% to 3.5%, 0.2% to 4.0%, 0.2% to 4.5%, 0.2% to 5.0%, 0.5% to 1.0%, 0.5% to 1.5%, 0.5% to 2.0%, 0.5% to 2.5%, 0.5% to 3.0%, 0.5% to 4.0%, 0.5% to 5.0%, 0.5% to 6.0%, 0.5% to 7.0%, 0.5% to 8.0%, 0.5% to 9.0%, 0.5% to 10.0%, 1.0% to 2.5%, 1.0% to 3.0%, 1.0% to 4.0%, 1.0% to 5.0%, 1.0% to 6.0%, 1.0% to 7.0%, 1.0% to 7.5%, 1.0% to 8.0%, 1.0% to 9.0%, 1.0% to 10.0%, 1.0% to 15.0%, 1.0% to 20.0%, 1.0% to 25.0%, 1.0% to 30.0%, 2.0% to 2.5%, 2.0% to 3.0%, 2.0% to 4.0%, 2.0% to 5.0%, 2.0% to 6.0%, 2.0% to 7.0%, 2.0% to 7.5%, 2.0% to 8.0%, 2.0% to 9.0%, 2.0% to 10.0%, 2.0% to 15.0%, 2.0% to 20.0%, 2.0% to 25.0%, 2.0% to 30.0%, 5.0% to 6.0%, 5.0% to 7.0%, 5.0% to 7.5%, 5.0% to 8.0%, 5.0% to 9.0%, 5.0% to 10.0%, 5.0% to 11.0%, 5.0% to 12.0%, 5.0% to 13.0%, 5.0% to 14.0%, 5.0% to 15.0%, 5.0% to 20.0%, 5.0% to 25.0%, 5.0% to 30.0%, 10.0% to 15.0%, 10.0% to 20.0%, 10.0% to 25.0%, 10.0% to 30.0%, 15.0% to 20.0%, 15.0% to 25.0%, 15.0% to 30.0%, 20.0% to 25.0%, 20.0% to 30.0%, or 20.0% to 30.0%, by weight of the composition.
[042] In another embodiment, a composition disclosed herein does not comprise a guanide-containing compound. In another embodiment, a composition disclosed herein does not comprise biguanide. In another embodiment, a composition disclosed herein does not comprise a biguanide-containing compound.
In another embodiment, a composition disclosed herein does not comprise biguanidine. In another embodiment, a composition disclosed herein does not comprise a biguanidine-containing compound. In
DK 181496 B1 14 another embodiment, a composition disclosed herein does not comprise triguanide. In another embodiment, a composition disclosed herein does not comprise a triguanide-containing compound.
[043] A composition disclosed herein may comprise an alcohol. An alcohol is an organic molecule comprising a hydroxyl functional group (-OH) bond to a carbon atom, where the carbon atom is saturated.
In aspects of this embodiment, the alcohol may be, e.g., a C24 alcohol, a C1.4 alcohol, a C1.s alcohol, a C1- 7 alcohol, a C1-10 alcohol, a C1-1s alcohol, or a C120 alcohol. In other aspects of this embodiment, an alcohol may be, e.g., a primary alcohol, a secondary alcohol, or a tertiary alcohol. In other aspects of this embodiment, an alcohol may be, e.g., an acyclic alcohol, a monohydric alcohol, a polyhydric alcohol (also known as a polyol or sugar alcohol), an unsaturated aliphatic alcohol, an alicyclic alcohol, or a combination thereof. Examples of a monohydric alcohol include, without limitation, methanol, ethanol, propanol, isopropanol, butanol, pentanol, and 1-hexadecanol. Examples of a polyhydric alcohol include, without limitation, glycol, glycerol, arabitol, erythritol, xylitol, maltitol, sorbitol (gluctiol), mannitol, inositol, lactitol, galactitol (iditol), and isomalt. Examples of an unsaturated aliphatic alcohol include, without limitation, prop- 2-ene-1-ol, 3,7-dimethylocta-2,6-dien-1-ol, and prop-2-in-1-ol. Examples of an alicyclic alcohol include, without limitation, cyclohexane-1,2,3,4,5,6-hexol and 2 - (2-propyl)-5-methyl-cyclohexane-1-ol.
[044] In one embodiment, a single alcohol is present in a composition disclosed herein. In another embodiment, a plurality of alcohols is present in a composition disclosed herein. In aspects of this embodiment, a composition disclosed herein comprises, e.g., one or more alcohols, two or more alcohols, three or more alcohols, four or more alcohols or five or more alcohols. In other aspects of this embodiment, a composition disclosed herein comprises, e.g., only one alcohol, at most two alcohols, at most three alcohols, at most four alcohols, or at most five alcohols. In yet other aspects of this embodiment, a composition disclosed herein comprises from, e.g., 1 to 2 alcohols, 1 to 3 alcohols, 1 to 4 alcohols, 1 to 5 alcohols, 2 to 3 alcohols, 2 to 4 alcohols, 2 to 5 alcohols, 3 to 4 alcohols, 3 to 5 alcohols or 4 to 5 alcohols.
[045] In aspects of this embodiment, a plurality of alcohols is present in a composition disclosed herein may comprise, e.g., about 99% of a first alcohol and about 1% of a second alcohol, about 98% of a first alcohol and about 2% of a second alcohol, about 97% of a first alcohol and about 3% of a second alcohol, about 96% of a first alcohol and about 4% of a second alcohol, about 95% of a first alcohol and about 5% of a second alcohol, about 90% of a first alcohol and about 10% of a second alcohol, about 80% of a first alcohol and about 20% of a second alcohol, about 70% of a first alcohol and about 30% of a second alcohol, about 60% of a first alcohol and about 40% of a second alcohol, about 50% of a first alcohol and about 50% of a second alcohol, about 40% of a first alcohol and about 60% of a second alcohol, about 30% of a first alcohol and about 70% of a second alcohol, about 20% of a first alcohol and about 80% of a second alcohol, about 10% of a first alcohol and about 90% of a second alcohol, about 5% of a first alcohol and about 95% of a second alcohol. In other aspects of this embodiment, the ratio of a first alcohol to a second alcohol is, e.g., 100:1, 90:1, 80:1, 70:1, 60:1, 50:1, 40:1, 30:1, 20:1, 19:1, 18:1, 17:1, 16:1, 15:1, 14:1, 13:1, 12:1, 11:1, 10:1, 9:1, 8:1, 7:1, 6:1, 5:1, 4:1, 3:1, 2:1, 1:1, 1:2, 1:3, 1:4, 1:5, 1:6, 1:7, 1:8, 1:9, 1:10, 1:11, — 1:12, 1:13, 1:14, 1:15, 1:16, 1:17, 1:18, 1:19, 1:20, 1:30, 1:40, 1:50, 1:60, 1:70, 1:80, 1:90, or 1:100. In other aspects, the first alcohol is isopropanol and the second alcohol is ethanol.
DK 181496 B1 15
[046] Any amount of an alcohol disclosed herein may be used, with the proviso that the amount is useful to practice the methods disclosed herein. In aspects of this embodiment, a composition disclosed herein comprises an alcohol in an amount of, e.g., about 0.5%, about 1%, about 2%, about 3%, about 4%, about 5%, about 6%, about 7%, about 8%, about 9%, about 10%, about 11%, about 12%, about 13%, about 14%, about 15%, about 20%, about 25%, about 30%, about 35%, about 40%, about 45%, about 50%, about 55%, about 60%, about 65%, about 70%, about 75%, about 80%, about 85%, about 90%, about 95%, about 96%, about 97%, about 98%, or about 99%, by weight of the composition. In other aspects of this embodiment, a composition disclosed herein comprises an alcohol in an amount of, e.g., at least 0.5%, at least 1%, at least 2%, at least 3%, at least 4%, at least 5%, at least 6%, at least 7%, at least 8%, at least 9%, at least 10%, at least 11%, at least 12%, at least 13%, at least 14%, at least 15%, at least 20%, at least 25%, at least 30%, at least 35%, at least 40%, at least 45%, at least 50%, at least 55%, at least 60%, at least 65%, at least 70%, at least 75%, at least 80%, at least 85%, at least 90%, at least 95%, at least 96%, at least 97%, at least 98%, or at least 99%, by weight of the composition. In yet other aspects of this embodiment, a composition disclosed herein comprises an alcohol in an amount of, e.g., at most 0.5%, at most 1%, at most 2%, at most 3%, at most 4%, at most 5%, at most 6%, at most 7%, at most 8%, at most 9%, at most 10%, at most 11%, at most 12%, at most 13%, at most 14%, at most 15%, at most 20%, at most 25%, at most 30%, at most 35%, at most 40%, at most 45%, at most 50%, at most 55%, at most 60%, at most 65%, at most 70%, at most 75%, at most 80%, at most 85%, at most 90%, at most 95%, at most 96%, at most 97%, at most 98%, or at most 99%, by weight of the composition.
[047] In still other aspects of this embodiment, a composition disclosed herein comprises an alcohol in an amount of, e.g., 0.05% to 0.75%, 0.05% to 1.0%, 0.05% to 1.5%, 0.05% to 2.0%, 0.05% to 2.5%, 0.1% to 0.5%, 0.1% to 0.75%, 0.1% to 1.0%, 0.1% to 1.5%, 0.1% to 2.0%, 0.1% to 2.5%, 0.1% to 3.0%, 0.1% to 4.0%, 0.1% to 5.0%, 0.2% to 0.5%, 0.2% to 0.75%, 0.2% to 1.0%, 0.2% to 1.5%, 0.2% to 2.0%, 0.2% to 2.5%, 0.2% to 3.0%, 0.2% to 4.0%, 0.2% to 5.0%, 0.5% to 1.0%, 0.5% to 1.5%, 0.5% to 2.0%, 0.5% to 2.5%, 0.5% to 3.0%, 0.5% to 4.0%, 0.5% to 5.0%, 0.5% to 6.0%, 0.5% to 7.0%, 0.5% to 8.0%, 0.5% to 9.0%, 0.5% to 10.0%, 1.0% to 2.5%, 1.0% to 3.0%, 1.0% to 4.0%, 1.0% to 5.0%, 1.0% to 6.0%, 1.0% to 7.0%, 1.0% to 7.5%, 1.0% to 8.0%, 1.0% to 9.0%, 1.0% to 10.0%, 2.0% to 2.5%, 2.0% to 3.0%, 2.0% to 4.0%, 2.0% to 5.0%, 2.0% to 6.0%, 2.0% to 7.0%, 2.0% to 7.5%, 2.0% to 8.0%, 2.0% to 9.0%, 2.0% to 10.0%, 5.0% to 6.0%, 5.0% to 7.0%, 5.0% to 7.5%, 5.0% to 8.0%, 5.0% to 9.0%, 5.0% to 10.0%, 5.0% to 11.0%, 5.0% to 12.0%, 5.0% to 13.0%, 5.0% to 14.0% or 5.0% to 15.0% by weight of the composition, or 10% to 20%, 10% to 30%, 10% to 40%, 10% to 50%, 10% to 60%, 10% to 70%, 10% to 80%, 10% to 90%, 10% to 95%, 10% to 97%, 10% to 99%, 20% to 30%, 20% to 40%, 20% to 50%, 20% to 60%, 20% to 70%, — 20% to 80%, 20% to 90%, 20% to 95%, 20% to 97%, 20% to 99%, 30% to 40%, 30% to 50%, 30% to 60%, 30% to 70%, 30% to 80%, 30% to 90%, 30% to 95%, 30% to 97%, 30% to 99%, 40% to 50%, 40% to 60%, 40% to 70%, 40% to 80%, 40% to 90%, 40% to 95%, 40% to 97%, 40% to 99%, 50% to 60%, 50% to 70%, 50% to 80%, 50% to 90%, 50% to 95%, 50% to 97%, 50% to 99%, 60% to 70%, 60% to 80%, 60% to 90%, 60% to 95%, 60% to 97%, 60% to 99%, 70% to 80%, 70% to 90%, 70% to 95%, 70% to 97%, 70% to 99%, 80% to 90%, 80% to 95%, 80% to 97%, 80% to 99%, 90% to 95%, 90% to 97%, 90% to 99%, by weight of the composition.
DK 181496 B1 16
[048] In aspects of this embodiment, a composition disclosed herein comprises a plurality of alcohols in a total amount of, e.g., about 10%, about 15%, about 20%, about 25%, about 30%, about 35%, about 40%, about 45%, about 50%, about 55%, about 60%, about 65%, about 70%, about 75%, about 80%, about 85%, about 90%, about 95%, about 96%, about 97%, about 98%, or about 99%, by weight of the composition. In other aspects of this embodiment, a composition disclosed herein comprises a plurality of alcohols in a total amount of, e.g., at least 10%, at least 15%, at least 20%, at least 25%, at least 30%, at least 35%, at least 40%, at least 45%, at least 50%, at least 55%, at least 60%, at least 65%, at least 70%, at least 75%, at least 80%, at least 85%, at least 90%, at least 95%, at least 96%, at least 97%, at least 98%, or at least 99%, by weight of the composition. In yet other aspects of this embodiment, a composition disclosed herein comprises a plurality of alcohols in a total amount of, e.g., at most 10%, at most 15%, at most 20%, at most 25%, at most 30%, at most 35%, at most 40%, at most 40%, at most 45%, at most 50%, at most 55%, at most 60%, at most 65%, at most 70%, at most 75%, at most 80%, at most 85%, at most 90%, at most 95%, at most 96%, at most 97%, at most 98%, or at most 99%, by weight of the composition.
In still other aspects of this embodiment, a composition disclosed herein comprises a plurality of alcohols in a total amount of, e.g., 10% to 20%, 10% to 30%, 10% to 40%, 10% to 50%, 10% to 60%, 10% to 70%, 10% to 80%, 10% to 90%, 10% to 95%, 10% to 97%, 10% to 99%, 20% to 30%, 20% to 40%, 20% to 50%, 20% to 60%, 20% to 70%, 20% to 80%, 20% to 90%, 20% to 95%, 20% to 97%, 20% to 99%, 30% to 40%, 30% to 50%, 30% to 60%, 30% to 70%, 30% to 80%, 30% to 90%, 30% to 95%, 30% to 97%, 30% to 99%, 40% to 50%, 40% to 60%, 40% to 70%, 40% to 80%, 40% to 90%, 40% to 95%, 40% to 97%, 40% to 99%, 50% to 60%, 50% to 70%, 50% to 80%, 50% to 90%, 50% to 95%, 50% to 97%, 50% to 99%, 60% to 70%, 60% to 80%, 60% to 90%, 60% to 95%, 60% to 97%, 60% to 99%, 70% to 80%, 70% to 90%, 70% to 95%, 70% to 97%, 70% to 99%, 80% to 90%, 80% to 95%, 80% to 97%, 80% to 99%, 90% to 95%, 90% to 97%, 90% to 99%, by weight of the composition.
[049] In another embodiment, a composition disclosed herein does not comprise an alcohol.
[050] A composition disclosed herein may comprise metallic particles. A metallic particle can be composed of a single element, such as, e.g., copper, iron, silver, titanium or zinc or be a mixed metallic particle composed of various combinations of different elements, such as, e.g., various combinations of two or more of the following: copper, iron, silver, titanium or zinc. Non-limiting examples of a metallic particle includes a copper particle, an iron particle, a potassium particle, a silver particle, a titanium particle, and a zinc particle. Other non-limiting examples of a metallic particle include a metal acetate particle, a metal chloride particle, a metal nitrate particle, or a metal oxide particle. A metal acetate particle includes, without limitation, copper acetate, iron acetate, e.g. iron (Il) acetate and iron (lll) acetate, silver acetate, titanium acetate, zinc acetate, or any combination thereof. A metal nitrate particle includes, without limitation, copper nitrate, iron nitrate, e.g., iron (ll) nitrate, iron (lll) nitrate, silver nitrate, titanium nitrate, zinc nitrate, or any combination thereof. A metal chloride particle includes, without limitation, copper chloride, iron chloride, e.g., iron (Il) chloride or iron (lll) chloride, silver chloride, titanium chloride, zinc chloride, or any combination thereof. A metal oxide particle includes, without limitation, copper oxide, iron oxide, e.g., iron
DK 181496 B1 17 (II) oxide, iron (III) oxide, silver oxide, titanium dioxide, zinc oxide, copper zinc iron oxide, or any combination thereof.
[051] A metallic particle includes nanoparticles and microparticles. A nanoparticle has an average diameter of about 1 nm to about 1,000 nm. A microparticle has an average diameter of about 1 um to about 1,000 pm.
[052] In an embodiment, a composition disclosed herein comprises an amount of metallic particles that provides a desired beneficial effect to a composition disclosed herein. In aspects of this embodiment, a composition disclosed herein comprises metallic particles in an amount of, e.g., 0.05 ppm, 0.10 ppm, 0.15 ppm, 0.20 ppm, 0.25 ppm, 0.30 ppm, 0.35 ppm, 0.40 ppm, 0.45 ppm, 0.50 ppm, 0.55 ppm, 0.60 ppm, 0.65 ppm, 0.70 ppm, 0.75 ppm, 0.80 ppm, 0.85 ppm, 0.90 ppm, 0.95 ppm, 1 ppm, 5 ppm, 10 ppm, 15 ppm, 20 ppm, 25 ppm, 30 ppm, 35 ppm, 40 ppm, 45 ppm, 50 ppm, 55 ppm, 60 ppm, 65 ppm, 70 ppm, 75 ppm, 80 ppm, 85 ppm, 90 ppm, 95 ppm, 100 ppm, 125 ppm, 150 ppm, 175 ppm, 200 ppm, 225 ppm, 250 ppm, 275 ppm, 300 ppm, 325 ppm, 350 ppm, 375 ppm, 400 ppm, 425 ppm, 450 ppm, 475 ppm, 500 ppm, 525 ppm, 550 ppm, 575 ppm, 600 ppm, 625 ppm, 650 ppm, 675 ppm, 700 ppm, 725 ppm, 750 ppm, 775 ppm, 800 ppm, 825 ppm, 850 ppm, 875 ppm, 900 ppm, 925 ppm, 950 ppm, 975 ppm, 1,000 ppm, 1,025 ppm, 1,050 ppm, 1075 ppm, 1,100 ppm, 1,125 ppm, 1,150 ppm, 1,175 ppm, 1,200 ppm, 1,225 ppm, 1,250 ppm, 1,275 ppm, 1,300 ppm, 1,325 ppm, 1,350 ppm, 1,375 ppm, 1,400 ppm, 1,425 ppm, 1,450 ppm, 1,475 ppm, 1,500 ppm, 1,600 ppm, 1,700 ppm, 1,800 ppm, 1,900 ppm, or 2,000 ppm. In other aspects of this embodiment, a composition disclosed herein comprises metallic particles in an amount of, e.g., at least 0.05 ppm, at least 0.10 ppm, at least 0.20 ppm, at least 0.30 ppm, at least 0.40 ppm, at least 0.50 ppm, at least 0.60 ppm, at least 0.70 ppm, at least 0.80 ppm, at least 0.90 ppm, at least 1 ppm, at least 10 ppm, at least 20 ppm, at least 30 ppm, at least 40 ppm, at least 50 ppm, at least 60 ppm, at least 70 ppm, at least 80 ppm, at least 90 ppm, at least 100 ppm, at least 125 ppm, at least 150 ppm, at least 175 ppm, at least 200 ppm, at least 225 ppm, at least 250 ppm, at least 275 ppm, at least 300 ppm, at least 325 ppm, at least 350 ppm, at least 375 ppm, at least 400 ppm, at least 425 ppm, at least 450 ppm, at least 475 ppm, at least 500 ppm, at least 525 ppm, at least 550 ppm, at least 575 ppm, at least 600 ppm, at least 625 ppm, at least 650 ppm, at least 675 ppm, at least 700 ppm, at least 725 ppm, at least 750 ppm, at least 775 ppm, at least 800 ppm, at least 825 ppm, at least 850 ppm, at least 875 ppm, at least 900 ppm, at least 925 ppm, at least 950 ppm, at least 975 ppm, at least 1,000 ppm, at least 1,025 ppm, at least 1,050 ppm, at least 1075 ppm, at least 1,100 ppm, at least 1,125 ppm, at least 1,150 ppm, at least 1,175 ppm, at least 1,200 ppm, at least 1,225 ppm, at least 1,250 ppm, at least 1,275 ppm, at least 1,300 ppm, at least 1,325 ppm, at least 1,350 ppm, at least 1,375 ppm, at least 1,400 ppm, at least 1,425 ppm, at least 1,450 ppm, at least 1,475 ppm, at least 1,500 ppm, at least 1,600 ppm, at least 1,700 ppm, at least 1,800 ppm, at least 1,900 ppm, or at least 2,000 ppm.
In yet other aspects of this embodiment, a composition disclosed herein comprises metallic particles in an amount of, e.g., at most 0.05 ppm, at most 0.10 ppm, at most 0.20 ppm, at most 0.30 ppm, at most 0.40 ppm, at most 0.50 ppm, at most 0.60 ppm, at most 0.70 ppm, at most 0.80 ppm, at most 0.90 ppm, at most 1 ppm, at most 10 ppm, at most 20 ppm, at most 30 ppm, at most 40 ppm, at most 50 ppm, at most 60 ppm, at most 70 ppm, at most 80 ppm, at most 90 ppm, at most 100 ppm, at most 125 ppm, at most 150 ppm, at most 175 ppm, at most 200 ppm, at most 225 ppm, at most 250 ppm, at most 275 ppm, at most
DK 181496 B1 18 300 ppm, at most 325 ppm, at most 350 ppm, at most 375 ppm, at most 400 ppm, at most 425 ppm, at most 450 ppm, at most 475 ppm, at most 500 ppm, at most 525 ppm, at most 550 ppm, at most 575 ppm, at most 600 ppm, at most 625 ppm, at most 650 ppm, at most 675 ppm, at most 700 ppm, at most 725 ppm, at most 750 ppm, at most 775 ppm, at most 800 ppm, at most 825 ppm, at most 850 ppm, at most 875 ppm, at most 900 ppm, at most 925 ppm, at most 950 ppm, at most 975 ppm, at most 1,000 ppm, at most 1,025 ppm, at most 1,050 ppm, at most 1075 ppm, at most 1,100 ppm, at most 1,125 ppm, at most 1,150 ppm, at most 1,175 ppm, at most 1,200 ppm, at most 1,225 ppm, at most 1,250 ppm, at most 1,275 ppm, at most 1,300 ppm, at most 1,325 ppm, at most 1,350 ppm, at most 1,375 ppm, at most 1,400 ppm, at most 1,425 ppm, at most 1,450 ppm, at most 1,475 ppm, at most 1,500 ppm, at most 1,600 ppm, at most 1,700 ppm, at most 1,800 ppm, at most 1,900 ppm, or at most 2,000 ppm.
[053] In still other aspects of this embodiment, a composition disclosed herein comprises metallic particles in an amount of from, e.g., 0.5 ppm to 20 ppm, 0.5 ppm to 25 ppm, 0.5 ppm to 30 ppm, 0.5 ppm to 35 ppm, 0.5 ppm to 40 ppm, 0.5 ppm to 45 ppm, 0.5 ppm to 50 ppm, 0.5 ppm to 55 ppm, 0.5 ppm to 60 ppm, 0.5 ppm to 65 ppm, 0.5 ppm to 70 ppm, 0.5 ppm to 75 ppm, 0.5 ppm to 80 ppm, 0.5 ppm to 85 ppm, 0.5 ppm to 90 ppm, 0.5 ppm to 95 ppm, 0.5 ppm to 100 ppm, 0.75 ppm to 20 ppm, 0.75 ppm to 25 ppm, 0.75 ppm to 30 ppm, 0.75 ppm to 35 ppm, 0.75 ppm to 40 ppm, 0.75 ppm to 45 ppm, 0.75 ppm to 50 ppm, 0.75 ppm to 55 ppm, 0.75 ppm to 60 ppm, 0.75 ppm to 65 ppm, 0.75 ppm to 70 ppm, 0.75 ppm to 75 ppm, 0.75 ppm to 80 ppm, 0.75 ppm to 85 ppm, 0.75 ppm to 90 ppm, 0.75 ppm to 95 ppm, 0.75 ppm to 100 ppm, 1 ppm to 20 ppm, 1 ppm to 25 ppm, 1 ppm to 30 ppm, 1 ppm to 35 ppm, 1 ppm to 40 ppm, 1 ppm to 45 ppm, 1 ppm to 50 ppm, 1 ppm to 55 ppm, 1 ppm to 60 ppm, 1 ppm to 65 ppm, 1 ppm to 70 ppm, 1 ppm to 75 ppm, 1 ppm to 80 ppm, 1 ppm to 85 ppm, 1 ppm to 90 ppm, 1 ppm to 95 ppm, 1 ppm to 100 ppm, 5 ppm to 20 ppm, 5 ppm to 25 ppm, 5 ppm to 30 ppm, 5 ppm to 35 ppm, 5 ppm to 40 ppm, 5 ppm to 45 ppm, 5 ppm to 50 ppm, 5 ppm to 55 ppm, 5 ppm to 60 ppm, 5 ppm to 65 ppm, 5 ppm to 70 ppm, 5 ppm to 75 ppm, 5 ppm to 80 ppm, 5 ppm to 85 ppm, 5 ppm to 90 ppm, 5 ppm to 95 ppm, 5 ppm to 100 ppm, 10 ppm to 20 ppm, 10 ppm to 25 ppm, 10 ppm to 30 ppm, 10 ppm to 35 ppm, 10 ppm to 40 ppm, 10 ppm to 45 ppm, 10 ppm to 50 ppm, 10 ppm to 55 ppm, 10 ppm to 60 ppm, 10 ppm to 65 ppm, 10 ppm to 70 ppm, 10 ppm to 75 ppm, 10 ppm to 80 ppm, 10 ppm to 85 ppm, 10 ppm to 90 ppm, 10 ppm to 95 ppm, or 10 ppm to 100 ppm.
[054] In other aspects of this embodiment, a composition disclosed herein comprises metallic particles in an amount of from, e.9., 1 ppm to 25 ppm, 1 ppm to 50 ppm, 1 ppm to 75 ppm, 1 ppm to 100 ppm, 1 ppm to 125 ppm, 1 ppm to 150 ppm, 1 ppm to 175 ppm, 1 ppm to 200 ppm, 1 ppm to 225 ppm, 1 ppm to 250 ppm, 1 ppm to 275 ppm, 1 ppm to 300 ppm, 1 ppm to 325 ppm, 1 ppm to 350 ppm, 1 ppm to 375 ppm, 1 ppm to 400 ppm, 10 ppm to 25 ppm, 10 ppm to 50 ppm, 10 ppm to 75 ppm, 10 ppm to 100 ppm, 10 ppm to 125 ppm, 10 ppm to 150 ppm, 10 ppm to 175 ppm, 10 ppm to 200 ppm, 10 ppm to 225 ppm, 10 ppm to 250 ppm, 10 ppm to 275 ppm, 10 ppm to 300 ppm, 10 ppm to 325 ppm, 10 ppm to 350 ppm, 10 ppm to 375 ppm, 10 ppm to 400 ppm, 25 ppm to 50 ppm, 25 ppm to 75 ppm, 25 ppm to about 100 ppm, 25 ppm to 125 ppm, 25 ppm to 150 ppm, 25 ppm to 175 ppm, 25 ppm to 200 ppm, 25 ppm to 225 ppm, 25 ppm to 250 ppm, 25 ppm to 275 ppm, 25 ppm to 300 ppm, 25 ppm to 325 ppm, 25 ppm to 350 ppm, 25 ppm to 375 ppm, 25 ppm to 400 ppm, 50 ppm to 75 ppm, 50 ppm to 100 ppm, 50 ppm to 125 ppm, 50 ppm to 150
DK 181496 B1 19 ppm, 50 ppm to 175 ppm, 50 ppm to 200 ppm, 50 ppm to 225 ppm, 50 ppm to 250 ppm, 50 ppm to 275 ppm, 50 ppm to 300 ppm, 50 ppm to 325 ppm, 50 ppm to 350 ppm, 50 ppm to 375 ppm, 50 ppm to 400 ppm, 75 ppm to 100 ppm, 75 ppm to 125 ppm, 75 ppm to 150 ppm, 75 ppm to 175 ppm, 75 ppm to 200 ppm, 75 ppm to 225 ppm, 75 ppm to 250 ppm, 75 ppm to 275 ppm, 75 ppm to 300 ppm, 75 ppm to 325 ppm, 75 ppm to 350 ppm, 75 ppm to 375 ppm, 75 ppm to 400 ppm, 100 ppm to 125 ppm, 100 ppm to 150 ppm, 100 ppm to 175 ppm, 100 ppm to 200 ppm, 100 ppm to 225 ppm, 100 ppm to 250 ppm, 100 ppm to 275 ppm, 100 ppm to 300 ppm, 100 ppm to 325 ppm, 100 ppm to 350 ppm, 100 ppm to 375 ppm, 100 ppm to 400 ppm, 150 ppm to 175 ppm, 150 ppm to 200 ppm, 150 ppm to 225 ppm, 150 ppm to 250 ppm, 150 ppm to 275 ppm, 150 ppm to 300 ppm, 150 ppm to 325 ppm, 150 ppm to 350 ppm, 150 ppm to 375 ppm, 150 ppm to 400 ppm, 200 ppm to 225 ppm, 200 ppm to 250 ppm, 200 ppm to 275 ppm, 200 ppm to 300 ppm, 200 ppm to 325 ppm, 200 ppm to 350 ppm, 200 ppm to 375 ppm, 200 ppm to 400 ppm, 250 ppm to 275 ppm, 250 ppm to 300 ppm, 250 ppm to 325 ppm, 250 ppm to 350 ppm, 250 ppm to 375 ppm, 250 ppm to 400 ppm, 300 ppm to 325 ppm, 300 ppm to 350 ppm, 300 ppm to 375 ppm, 300 ppm to 400 ppm, 350 ppm to 375 ppm, 350 ppm to 400 ppm, or 375 ppm to 400 ppm.
[055] In other aspects of this embodiment, a composition disclosed herein comprises metallic particles in an amount of, e.g., 400 ppm to 500 ppm, 400 ppm to 600 ppm, 400 ppm to 700 ppm, 400 ppm to 800 ppm, 400 ppm to 900 ppm, 400 ppm to 1,000 ppm, 400 ppm to 1,100 ppm, 400 ppm to 1,200 ppm, 400 ppm to 1,300 ppm, 400 ppm to 1,400 ppm, 400 ppm to 1,500 ppm, 400 ppm to 1,600 ppm, 400 ppm to 1,700 ppm, 400 ppm to 1,800 ppm, 400 ppm to 1,900 ppm, 400 ppm to 2,000 ppm, 500 ppm to 600 ppm, 500 ppm to 700 ppm, 500 ppm to 800 ppm, 500 ppm to 900 ppm, 500 ppm to 1,000 ppm, 500 ppmto 1,100 ppm, 500 ppm to 1,200 ppm, 500 ppm to 1,300 ppm, 500 ppm to 1,400 ppm, 500 ppm to 1,500 ppm, 500 ppm to 1,600 ppm, 500 ppm to 1,700 ppm, 500 ppm to 1,800 ppm, 500 ppm to 1,900 ppm, 500 ppm to 2,000 ppm, 600 ppm to 700 ppm, 600 ppm to 800 ppm, 600 ppm to 900 ppm, 600 ppm to 1,000 ppm, 600 ppm to 1,100 ppm, 600 ppm to 1,200 ppm, 600 ppm to 1,300 ppm, 600 ppm to 1,400 ppm, 600 ppm to 1,500 ppm, 600 ppm to 1,600 ppm, 600 ppm to 1,700 ppm, 600 ppm to 1,800 ppm, 600 ppm to 1,900 ppm, 600 ppm to 2,000 ppm, 700 ppm to 800 ppm, about 700 ppm to 900 ppm, 700 ppm to 1,000 ppm, 700 ppm to 1,100 ppm, 700 ppm to 1,200 ppm, 700 ppm to 1,300 ppm, 700 ppm to 1,400 ppm, 700 ppm to 1,500 ppm, 700 ppm to 1,600 ppm, 700 ppm to 1,700 ppm, 700 ppm to 1,800 ppm, 700 ppm to 1,900 ppm, 700 ppm to 2,000 ppm, 800 ppm to 900 ppm, 800 ppm to 1,000 ppm, 800 ppm to 1,100 ppm, 800 ppm to 1,200 ppm, 800 ppm to 1,300 ppm, 800 ppm to 1,400 ppm, 800 ppm to 1,500 ppm, 800 ppm to 1,600 ppm, 800 ppm to 1,700 ppm, 800 ppm to 1,800 ppm, 800 ppm to 1,900 ppm, 800 ppm to 2,000 ppm, 900 ppm to 1,000 ppm, 900 ppm to 1,100 ppm, 900 ppm to 1,200 ppm, 900 ppm to 1,300 ppm, 900 ppm to 1,400 ppm, 900 ppm to 1,500 ppm, 900 ppm to 1,600 ppm, 900 ppm to 1,700 ppm, 900 ppm to 1,800 ppm, 900 ppm to 1,900 ppm, 900 ppm to 2,000 ppm, 1,000 ppm to 1,100 ppm, 1,000 ppm to 1,200 ppm, 1,000 ppm to 1,300 ppm, 1,000 ppm to 1,400 ppm, 1,000 ppm to 1,500 ppm, 1,000 ppm to 1,600 ppm, 1,000 ppm to 1,700 ppm, 1,000 ppm to 1,800 ppm, 1,000 ppm to 1,900 ppm, 1,000 ppm to 2,000 ppm, 1,100 ppm to 1,200 ppm, 1,100 ppm to 1,300 ppm, 1,100 ppm to 1,400 ppm, 1,100 ppm to 1,500 ppm, 1,100 ppm to 1,600 ppm, 1,100 ppm to 1,700 ppm, 1,100 ppm to 1,800 ppm, 1,100 ppm to 1,900 ppm, 1,100 ppm to 2,000 ppm, 1,200 ppm to 1,300 ppm, 1,200 ppm to 1,400 ppm, 1,200 ppm to 1,500 ppm, 1,200 ppm to 1,600 ppm, 1,200 ppm to 1,700 ppm, 1,200 ppm to 1,800 ppm, 1,200 ppm to 1,900 ppm, 1,200 ppm to
DK 181496 B1 20 2,000 ppm, 1,300 ppm to 1,400 ppm, 1,300 ppm to 1,500 ppm, 1,300 ppm to 1,600 ppm, 1,300 ppm to 1,700 ppm, 1,300 ppm to 1,800 ppm, 1,300 ppm to 1,900 ppm, 1,300 ppm to 2,000 ppm, 1,400 ppm to 1,500 ppm, 1,400 ppm to 1,600 ppm, 1,400 ppm to 1,700 ppm, 1,400 ppm to 1,800 ppm, 1,400 ppm to 1,900 ppm, 1,400 ppm to 2,000 ppm, 1,500 ppm to 1,600 ppm, 1,500 ppm to 1,700 ppm, 1,500 ppm to 1,800 ppm, 1,500 ppm to 1,900 ppm, 1,500 ppm to 2,000 ppm, 1,600 ppm to 1,700 ppm, 1,600 ppm to 1,800 ppm, 1,600 ppm to 1,900 ppm, 1,600 ppm to 2,000 ppm, 1,700 ppm to 1,800 ppm, 1,700 ppm to 1,900 ppm, 1,700 ppm to 2,000 ppm, 1,800 ppm to 1,900 ppm, 1,800 ppm to 2,000 ppm, or 1,900 ppm to 2,000 ppm.
[056] In aspects of this embodiment, a composition disclosed herein comprises metallic particles in an amount of, e.g., 0.05 mg/L, 0.10 mg/L, 0.15 mg/L, 0.20 mg/L, 0.25 mg/L, 0.30 mg/L, 0.35 mg/L, 0.40 mg/L, 0.45 mg/L, 0.50 mg/L, 0.55 mg/L, 0.60 mg/L, 0.65 mg/L, 0.70 mg/L, 0.75 mg/L, 0.80 mg/L, 0.85 mg/L, 0.90 mg/L, 0.95 mg/L, 1 mg/L, 5 mg/L, 10 mg/L, 15 mg/L, 20 mg/L, 25 mg/L, 30 mg/L, 35 mg/L, 40 mg/L, 45 mg/L, 50 mg/L, 55 mg/L, 60 mg/L, 65 mg/L, 70 mg/L, 75 mg/L, 80 mg/L, 85 mg/L, 90 mg/L, 95 mg/L, 100 mg/L, 125 mg/L, 150 mg/L, 175 mg/L, 200 mg/L, 225 mg/L, 250 mg/L, 275 mg/L, 300 mg/L, 325 mg/L, 350 mg/L, 375 mg/L, 400 mg/L, 425 mg/L, 450 mg/L, 475 mg/L, 500 mg/L, 525 mg/L, 550 mg/L, 575 mg/L, 600 mg/L, 625 mg/L, 650 mg/L, 675 mg/L, 700 mg/L, 725 mg/L, 750 mg/L, 775 mg/L, 800 mg/L, 825 mg/L, 850 mg/L, 875 mg/L, 900 mg/L, 925 mg/L, 950 mg/L, 975 mg/L, 1,000 mg/L, 1,025 mg/L, 1,050 mg/L, 1075 mg/L, 1,100 mg/L, 1,125 mg/L, 1,150 mg/L, 1,175 mg/L, 1,200 mg/L, 1,225 mg/L, 1,250 mg/L, 1,275 mg/L, 1,300 mg/L, 1,325 mg/L, 1,350 mg/L, 1,375 mg/L, 1,400 mg/L, 1,425 mg/L, 1,450 mg/L, 1,475 mg/L, 1,500 mg/L, 1,600 mg/L, 1,700 mg/L, 1,800 mg/L, 1,900 mg/L, or 2,000 mg/L. In other aspects of this embodiment, a composition disclosed herein comprises metallic particles in an amount of, e.qg., at least 0.05 mg/L, at least 0.10 mg/L, at least 0.20 mg/L, at least 0.30 mg/L, at least 0.40 mg/L, at least 0.50 mg/L, at least 0.60 mg/L, at least 0.70 mg/L, at least 0.80 mg/L, at least 0.90 mg/L, at least 1 mg/L, at least 10 mg/L, at least 20 mg/L, at least 30 mg/L, at least 40 mg/L, at least 50 mg/L, at least 60 mg/L, at least 70 mg/L, at least 80 mg/L, at least 90 mg/L, at least 100 mg/L, at least 125 mg/L, at least 150 mg/L, at least 175 mg/L, at least 200 mg/L, at least 225 mg/L, at least 250 mg/L, at least 275 mg/L, at least 300 mg/L, at least 325 mg/L, at least 350 mg/L, at least 375 mg/L, at least 400 mg/L, at least 425 mg/L, at least 450 mg/L, at least 475 mg/L, at least 500 mg/L, at least 525 mg/L, at least 550 mg/L, at least 575 mg/L, at least 600 mg/L, at least 625 mg/L, at least 650 mg/L, at least 675 mg/L, at least 700 mg/L, at least 725 mg/L, at least 750 mg/L, at least 775 mg/L, at least 800 mg/L, at least 825 mg/L, at least 850 mg/L, at least 875 mg/L, at least 900 mg/L, at least 925 mg/L, at least 950 mg/L, at least 975 mg/L, at least 1,000 mg/L, at least 1,025 mg/L, at least 1,050 mg/L, at least 1075 mg/L, at least 1,100 mg/L, at least 1,125 mg/L, at least 1,150 mg/L, at least 1,175 mg/L, at least 1,200 mg/L, at least 1,225 mg/L, at least 1,250 mg/L, at least 1,275 mg/L, at least 1,300 mg/L, at least 1,325 mg/L, at least 1,350 mg/L, at least 1,375 mg/L, at least 1,400 mg/L, at least 1,425 mg/L, at least 1,450 mg/L, at least 1,475 mg/L, at least 1,500 mg/L, at least 1,600 mg/L, at least 1,700 mg/L, at least 1,800 mg/L, at least 1,900 mg/L, or at least 2,000 mg/L. In yet other aspects of this embodiment, a composition disclosed herein comprises metallic particles in an amount of, e.g., at most 0.05 mg/L, at most 0.10 mg/L, at most 0.20 mg/L, at most 0.30 mg/L, at most 0.40 mg/L, at most 0.50 mg/L, at most 0.60 mg/L, at most 0.70 mg/L, at most 0.80 mg/L, at most 0.90 mg/L, at most 1 mg/L, at most 10 mg/L, at most 20 mg/L, at most 30 mg/L, at most 40 mg/L, at most 50 mg/L, at most 60
DK 181496 B1 21 mg/L, at most 70 mg/L, at most 80 mg/L, at most 90 mg/L, at most 100 mg/L, at most 125 mg/L, at most 150 mg/L, at most 175 mg/L, at most 200 mg/L, at most 225 mg/L, at most 250 mg/L, at most 275 mg/L, at most 300 mg/L, at most 325 mg/L, at most 350 mg/L, at most 375 mg/L, at most 400 mg/L, at most 425 mg/L, at most 450 mg/L, at most 475 mg/L, at most 500 mg/L, at most 525 mg/L, at most 550 mg/L, at most 575 mg/L, at most 600 mg/L, at most 625 mg/L, at most 650 mg/L, at most 675 mg/L, at most 700 mg/L, at most 725 mg/L, at most 750 mg/L, at most 775 mg/L, at most 800 mg/L, at most 825 mg/L, at most 850 mg/L, at most 875 mg/L, at most 900 mg/L, at most 925 mg/L, at most 950 mg/L, at most 975 mg/L, at most 1,000 mg/L, at most 1,025 mg/L, at most 1,050 mg/L, at most 1075 mg/L, at most 1,100 mg/L, at most 1,125 mg/L, at most 1,150 mg/L, at most 1,175 mg/L, at most 1,200 mg/L, at most 1,225 mg/L, at most 1,250 mg/L, at most 1,275 mg/L, at most 1,300 mg/L, at most 1,325 mg/L, at most 1,350 mg/L, at most 1,375 mg/L, at most 1,400 mg/L, at most 1,425 mg/L, at most 1,450 mg/L, at most 1,475 mg/L, at most 1,500 mg/L, at most 1,600 mg/L, at most 1,700 mg/L, at most 1,800 mg/L, at most 1,900 mg/L, or at most 2,000 mg/L.
[057] In still other aspects of this embodiment, a composition disclosed herein comprises metallic particles in an amount of from, e.g., 0.5 mg/L to 20 mg/L, 0.5 mg/L to 25 mg/L, 0.5 mg/L to 30 mg/L, 0.5 mg/L to 35 mg/L, 0.5 mg/L to 40 mg/L, 0.5 mg/L to 45 mg/L, 0.5 mg/L to 50 mg/L, 0.5 mg/L to 55 mg/L, 0.5 mg/L to 60 mg/L, 0.5 mg/L to 65 mg/L, 0.5 mg/L to 70 mg/L, 0.5 mg/L to 75 mg/L, 0.5 mg/L to 80 mg/L, 0.5 mg/L to 85 mg/L, 0.5 mg/L to 90 mg/L, 0.5 mg/L to 95 mg/L, 0.5 mg/L to 100 mg/L, 0.75 mg/L to 20 mg/L, 0.75 mg/L to 25 mg/L, 0.75 mg/L to 30 mg/L, 0.75 mg/L to 35 mg/L, 0.75 mg/L to 40 mg/L, 0.75 mg/L to 45 mg/L, 0.75 mg/L to 50 mg/L, 0.75 mg/L to 55 mg/L, 0.75 mg/L to 60 mg/L, 0.75 mg/L to 65 mg/L, 0.75 mg/L to 70 mg/L, 0.75 mg/L to 75 mg/L, 0.75 mg/L to 80 mg/L, 0.75 mg/L to 85 mg/L, 0.75 mg/L to 90 mg/L, 0.75 mg/L to 95 mg/L, 0.75 mg/L to 100 mg/L, 1 mg/L to 20 mg/L, 1 mg/L to 25 mg/L, 1 mg/L to 30 mg/L, 1 mg/L to 35 mg/L, 1 mg/L to 40 mg/L, 1 mg/L to 45 mg/L, 1 mg/L to 50 mg/L, 1 mg/L to 55 mg/L, 1 mg/L to 60 mg/L, 1 mg/L to 65 mg/L, 1 mg/L to 70 mg/L, 1 mg/L to 75 mg/L, 1 mg/L to 80 mg/L, 1 mg/L to 85 mg/L, 1 mg/L to 90 mg/L, 1 mg/L to 95 mg/L, 1 mg/L to 100 mg/L, 5 mg/L to 20 mg/L, 5 mg/L to 25 mg/L, 5 mg/L to mg/L, 5 mg/L to 35 mg/L, 5 mg/L to 40 mg/L, 5 mg/L to 45 mg/L, 5 mg/L to 50 mg/L, 5 mg/L to 55 mg/L, 5 mg/L to 60 mg/L, 5 mg/L to 65 mg/L, 5 mg/L to 70 mg/L, 5 mg/L to 75 mg/L, 5 mg/L to 80 mg/L, 5 mg/L to 85 mg/L, 5 mg/L to 90 mg/L, 5 mg/L to 95 mg/L, 5 mg/L to 100 mg/L, 10 mg/L to 20 mg/L, 10 mg/L to 25 30 mg/L, 10 mg/L to 30 mg/L, 10 mg/L to 35 mg/L, 10 mg/L to 40 mg/L, 10 mg/L to 45 mg/L, 10 mg/L to 50 mg/L, 10 mg/L to 55 mg/L, 10 mg/L to 60 mg/L, 10 mg/L to 65 mg/L, 10 mg/L to 70 mg/L, 10 mg/L to 75 mg/L, 10 mg/L to 80 mg/L, 10 mg/L to 85 mg/L, 10 mg/L to 90 mg/L, 10 mg/L to 95 mg/L, or 10 mg/L to 100 mg/L.
[058] In other aspects of this embodiment, a composition disclosed herein comprises metallic particles in an amount of from, e.g., 1 mg/L to 25 mg/L, 1 mg/L to 50 mg/L, 1 mg/L to 75 mg/L, 1 mg/L to 100 mg/L, 1 mg/L to 125 mg/L, 1 mg/L to 150 mg/L, 1 mg/L to 175 mg/L, 1 mg/L to 200 mg/L, 1 mg/L to about 225 mg/L, 1 mg/L to 250 mg/L, 1 mg/L to 275 mg/L, 1 mg/L to 300 mg/L, 1 mg/L to 325 mg/L, 1 mg/L to 350 mg/L, 1 mg/L to 375 mg/L, 1 mg/L to 400 mg/L, 10 mg/L to 25 mg/L, 10 mg/L to 50 mg/L, 10 mg/L to 75 mg/L, 10 mg/L to 100 mg/L, 10 mg/L to 125 mg/L, 10 mg/L to 150 mg/L, 10 mg/L to 175 mg/L, 10 mg/L to 200 mg/L, 10 mg/L to 225 mg/L, 10 mg/L to 250 mg/L, 10 mg/L to 275 mg/L, 10 mg/L to 300 mg/L, 10 mg/L
DK 181496 B1 22 to 325 mg/L, 10 mg/L to 350 mg/L, 10 mg/L to 375 mg/L, 10 mg/L to 400 mg/L, 25 mg/L to 50 mg/L, 25 mg/L to 75 mg/L, 25 mg/L to 100 mg/L, 25 mg/L to 125 mg/L, 25 mg/L to 150 mg/L, 25 mg/L to 175 mg/L, 25 mg/L to 200 mg/L, 25 mg/L to 225 mg/L, 25 mg/L to 250 mg/L, 25 mg/L to 275 mg/L, 25 mg/L to 300 mg/L, 25 mg/L to 325 mg/L, 25 mg/L to 350 mg/L, 25 mg/L to 375 mg/L, 25 mg/L to 400 mg/L, 50 mg/L to 75 mg/L, 50 mg/L to 100 mg/L, 50 mg/L to 125 mg/L, 50 mg/L to 150 mg/L, 50 mg/L to 175 mg/L, 50 mg/L to 200 mg/L, 50 mg/L to 225 mg/L, 50 mg/L to 250 mg/L, 50 mg/L to 275 mg/L, 50 mg/L to 300 mg/L, 50 mg/L to 325 mg/L, 50 mg/L to 350 mg/L, 50 mg/L to 375 mg/L, 50 mg/L to 400 mg/L, 75 mg/L to 100 mg/L, 75 mg/L to 125 mg/L, 75 mg/L to 150 mg/L, 75 mg/L to 175 mg/L, 75 mg/L to 200 mg/L, 75 mg/L to 225 mg/L, 75 mg/L to 250 mg/L, 75 mg/L to 275 mg/L, 75 mg/L to 300 mg/L, 75 mg/L to 325 mg/L, 75 mg/L to 350 mg/L, 75 mg/L to 375 mg/L, 75 mg/L to 400 mg/L, 100 mg/L to 125 mg/L, 100 mg/L to 150 mg/L, 100 mg/L to 175 mg/L, 100 mg/L to 200 mg/L, 100 mg/L to 225 mg/L, 100 mg/L to 250 mg/L, 100 mg/L to 275 mg/L, 100 mg/L to 300 mg/L, 100 mg/L to 325 mg/L, 100 mg/L to 350 mg/L, 100 mg/L to 375 mg/L, 100 mg/L to 400 mg/L, 150 mg/L to 175 mg/L, 150 mg/L to 200 mg/L, 150 mg/L to 225 mg/L, 150 mg/L to 250 mg/L, 150 mg/L to 275 mg/L, 150 mg/L to 300 mg/L, 150 mg/L to 325 mg/L, 150 mg/L to 350 mg/L, 150 mg/L to 375 mg/L, 150 mg/L to 400 mg/L, 200 mg/L to 225 mg/L, 200 mg/L to 250 mg/L, 200 mg/L to 275 mg/L, 200 mg/L to 300 mg/L, 200 mg/L to 325 mg/L, 200 mg/L to 350 mg/L, 200 mg/L to 375 mg/L, 200 mg/L to 400 mg/L, 250 mg/L to 275 mg/L, 250 mg/L to 300 mg/L, 250 mg/L to 325 mg/L, 250 mg/L to 350 mg/L, 250 mg/L to 375 mg/L, 250 mg/L to 400 mg/L, 300 mg/L to 325 mg/L, 300 mg/L to 350 mg/L, 300 mg/L to 375 mg/L, 300 mg/L to 400 mg/L, 350 mg/L to 375 mg/L, 350 mg/L to 400 mg/L, or 375 mg/L to 400 mg/L.
[059] In other aspects of this embodiment, a composition disclosed herein comprises metallic particles in an amount of, e.g., 400 mg/L to 500 mg/L, 400 mg/L to 600 mg/L, 400 mg/L to 700 mg/L, 400 mg/L to 800 mg/L, 400 mg/L to 900 mg/L, 400 mg/L to 1,000 mg/L, 400 mg/L to 1,100 mg/L, 400 mg/L to 1,200 mg/L, 400 mg/L to 1,300 mg/L, 400 mg/L to 1,400 mg/L, 400 mg/L to 1,500 mg/L, 400 mg/L to 1,600 mg/L, 400 mg/L to 1,700 mg/L, 400 mg/L to 1,800 mg/L, 400 mg/L to 1,900 mg/L, 400 mg/L to 2,000 mg/L, 500 mg/L to 600 mg/L, 500 mg/L to 700 mg/L, 500 mg/L to 800 mg/L, 500 mg/L to 900 mg/L, 500 mg/L to 1,000 mg/L, 500 mg/L to 1,100 mg/L, 500 mg/L to 1,200 mg/L, 500 mg/L to 1,300 mg/L, 500 mg/L to 1,400 mg/L, 500 mg/L to 1,500 mg/L, 500 mg/L to 1,600 mg/L, 500 mg/L to 1,700 mg/L, 500 mg/L to 1,800 mg/L, 500 mg/L to 1,900 mg/L, 500 mg/L to 2,000 mg/L, 600 mg/L to 700 mg/L, 600 mg/L to 800 mg/L, 600 mg/L to 900 mg/L, 600 mg/L to 1,000 mg/L, 600 mg/L to 1,100 mg/L, 600 mg/L to 1,200 mg/L, 600 mg/L to 1,300 mg/L, 600 mg/L to 1,400 mg/L, 600 mg/L to 1,500 mg/L, 600 mg/L to 1,600 mg/L, 600 mg/L to 1,700 mg/L, 600 mg/L to 1,800 mg/L, 600 mg/L to 1,900 mg/L, 600 mg/L to 2,000 mg/L, 700 mg/L to 800 mg/L, 700 mg/L to 900 mg/L, 700 mg/L to 1,000 mg/L, 700 mg/L to 1,100 mg/L, 700 mg/L to 1,200 mg/L, 700 mg/L to 1,300 mg/L, 700 mg/L to 1,400 mg/L, 700 mg/L to 1,500 mg/L, 700 mg/L to 1,600 mg/L, 700 mg/L to 1,700 mg/L, 700 mg/L to 1,800 mg/L, 700 mg/L to 1,900 mg/L, 700 mg/L to 2,000 mg/L, 800 mg/L to 900 mg/L, 800 mg/L to 1,000 mg/L, 800 mg/L to 1,100 mg/L, 800 mg/L to 1,200 mg/L, 800 mg/L to 1,300 mg/L, 800 mg/L to 1,400 mg/L, 800 mg/L to 1,500 mg/L, 800 mg/L to 1,600 mg/L, 800 mg/L to 1,700 mg/L, 800 mg/L to 1,800 mg/L, 800 mg/L to 1,900 mg/L, 800 mg/L to 2,000 mg/L, 900 mg/L to 1,000 mg/L, 900 mg/L to 1,100 mg/L, 900 mg/L to 1,200 mg/L, 900 mg/L to 1,300 mg/L, 900 mg/L to 1,400 mg/L, 900 mg/L to 1,500 mg/L, 900 mg/L to 1,600 mg/L, 900 mg/L to 1,700 mg/L, 900 mg/L to 1,800 mg/L, 900 mg/L to 1,900 mg/L,
DK 181496 B1 23 900 mg/L to 2,000 mg/L, 1,000 mg/L to 1,100 mg/L, 1,000 mg/L to 1,200 mg/L, 1,000 mg/L to 1,300 mg/L, 1,000 mg/L to 1,400 mg/L, 1,000 mg/L to 1,500 mg/L, 1,000 mg/L to 1,600 mg/L, 1,000 mg/L to 1,700 mg/L, 1,000 mg/L to 1,800 mg/L, 1,000 mg/L to 1,900 mg/L, 1,000 mg/L to 2,000 mg/L, 1,100 mg/L to 1,200 mg/L, 1,100 mg/L to 1,300 mg/L, 1,100 mg/L to 1,400 mg/L, 1,100 mg/L to 1,500 mg/L, 1,100 mg/L to 1,600 mg/L, 1,100 mg/L to 1,700 mg/L, 1,100 mg/L to 1,800 mg/L, 1,100 mg/L to 1,900 mg/L, 1,100 mg/L to 2,000 mg/L, 1,200 mg/L to 1,300 mg/L, 1,200 mg/L to 1,400 mg/L, 1,200 mg/L to 1,500 mg/L, 1,200 mg/L to 1,600 mg/L, 1,200 mg/L to 1,700 mg/L, 1,200 mg/L to 1,800 mg/L, 1,200 mg/L to 1,900 mg/L, 1,200 mg/L to 2,000 mg/L, 1,300 mg/L to 1,400 mg/L, 1,300 mg/L to 1,500 mg/L, 1,300 mg/L to 1,600 mg/L, 1,300 mg/L to 1,700 mg/L, 1,300 mg/L to 1,800 mg/L, about 1,300 mg/L to 1,900 mg/L, 1,300 mg/L to 2,000 mg/L, 1,400 mg/L to 1,500 mg/L, 1,400 mg/L to 1,600 mg/L, 1,400 mg/L to 1,700 mg/L, 1,400 mg/L to 1,800 mg/L, 1,400 mg/L to 1,900 mg/L, 1,400 mg/L to 2,000 mg/L, 1,500 mg/L to 1,600 mg/L, 1,500 mg/L to 1,700 mg/L, 1,500 mg/L to 1,800 mg/L, 1,500 mg/L to 1,900 mg/L, 1,500 mg/L to 2,000 mg/L, 1,600 mg/L to 1,700 mg/L, 1,600 mg/L to 1,800 mg/L, 1,600 mg/L to 1,900 mg/L, 1,600 mg/L to 2,000 mg/L, 1,700 mg/L to 1,800 mg/L, 1,700 mg/L to 1,900 mg/L, 1,700 mg/L to 2,000 mg/L, 1,800 mg/L to 1,900 mg/L, 1,800 mg/L to 2,000 mg/L, or 1,900 mg/L to — 2,000 mg/L.
[060] In aspects of this embodiment, a composition disclosed herein comprises metallic particles in an amount of, e.g., about 0.10%, about 0.11%, about 0.12%, about 0.13%, about 0.14%, about 0.15%, about 0.16%, about 0.17%, about 0.18%, about 0.19%, about 0.2%, about 0.25%, about 0.3%, about 0.35%, about 0.4%, about 0.45%, or about 0.5% by weight of the composition. In other aspects of this embodiment, a composition disclosed herein comprises metallic particles in an amount of, e.g., at least 0.10%, at least 0.11%, at least 0.12%, at least 0.13%, at least 0.14%, at least 0.15%, at least 0.16%, at least 0.17%, at least 0.18%, at least 0.19%, at least 0.2%, at least 0.25%, at least 0.3%, at least 0.35%, at least 0.4%, at least 0.45%, or at least 0.5% by weight of the composition. In yet other aspects of this embodiment, a composition disclosed herein comprises metallic particles in an amount of, e.g., at most 0.10%, at most 0.11%, at most 0.12%, at most 0.13%, at most 0.14%, at most 0.15%, at most 0.16%, at most 0.17%, at most 0.18%, at most 0.19%, at most 0.2%, at most 0.25%, at most 0.3%, at most 0.35%, at most 0.4%, at most 0.45%, or at most 0.5% by weight of the composition. In still other aspects of this embodiment, a composition disclosed herein comprises metallic particles in an amount of, e.g., 0.10% to 0.15%, 0.10% to 0.20%, 0.10% to 0.25%, 0.10% to 0.30%, 0.10% to 0.35%, 0.10% to 0.40%, 0.10% to 0.45%, 0.10% to 0.50%, 0.20% to 0.25%, 0.20% to 0.30%, 0.20% to 0.35%, 0.20% to 0.40%, 0.20% to 0.45%, 0.20% to 0.50%, 0.30% to 0.35%, 0.30% to 0.40%, 0.30% to 0.45%, 0.30% to 0.50%, 0.40% to 0.45%, 0.40% to 0.50%, or 0.40% to 0.50% by weight of the composition.
[061] In an embodiment, metallic particles can be of any size that provides a desired beneficial effect to a composition disclosed herein. In aspects of this embodiment, metallic particles disclosed herein have a mean diameter of, e.g., about 10 nm, about 20 nm, about 30 nm, about 40 nm, about 50 nm, about 60 nm, about 70 nm, about 80 nm, about 90 nm, about 100 nm. In other aspects of this embodiment, metallic particles disclosed herein have a mean diameter of, e.g., at least 10 nm, at least 20 nm, at least 30 nm, at least 40 nm, at least 50 nm, at least 60 nm, at least 70 nm, at least 80 nm, at least 90 nm, at least 100 nm.
In yet other aspects of this embodiment, metallic particles disclosed herein have a mean diameter of, e.g.,
DK 181496 B1 24 at most 10 nm, at most 20 nm, at most 30 nm, at most 40 nm, at most 50 nm, at most 60 nm, at most 70 nm, at most 80 nm, at most 90 nm, at most 100 nm. In yet other aspects of this embodiment, metallic particles disclosed herein have a mean diameter of, e.g., 10 nm to 20 nm, 10 nm to 30 nm, 10 nm to 40 nm, 10 nm to 50 nm, 10 nm to 60 nm, 10 nm to 70 nm, 10 nm to 80 nm, 10 nm to 90 nm, 10 nm to 100 nm, 20 nm to 30 nm, 20 nm to 40 nm, 20 nm to 50 nm, 20 nm to 60 nm, 20 nm to 70 nm, 20 nm to 80 nm, 20 nm to 90 nm, 20 nm to 100 nm, 30 nm to 40 nm, 30 nm to 50 nm, 30 nm to 60 nm, 30 nm to 70 nm, 30 nm to 80 nm, 30 nm to 90 nm, 30 nm to 100 nm, 40 nm to 50 nm, 40 nm to 60 nm, 40 nm to 70 nm, 40 nm to 80 nm, 40 nm to 90 nm, 40 nm to 100 nm, 50 nm to 60 nm, 50 nm to 70 nm, 50 nm to 80 nm, 50 nm to 90 nm, 50 nm to 100 nm, 60 nm to 70 nm, 60 nm to 80 nm, 60 nm to 90 nm, 60 nm to 100 nm, 70 nm to 80 nm, 70 nm to 90 nm, 70 nm to 100 nm, 80 nm to 90 nm, 80 nm to 100 nm, or 90 nm to 100 nm.
[062] In an embodiment, a composition disclosed herein does not comprise metallic particles.
[063] A composition as claimed comprises at least three metal salts, being present in an amount of 50 ppm to 500 ppm, the at least three salts being a metal chloride, wherein the at least three metal salts comprise a copper salt, a zinc salt and an iron salt. Non-limiting examples of a metal salt includes a copper salt, iron salt, a potassium salt, silver salt, titanium salt, and zinc salt. Other non-limiting examples of a metal salt includes a metal acetate, a metal chloride, a metal nitrate, and a metal sulfate. A metal acetate includes, without limitation, copper acetate, iron acetate, e.g., iron (Il) acetate and iron (lll) acetate, potassium acetate, silver acetate, titanium acetate, and zinc acetate. A metal chloride includes, without limitation, copper chloride, iron chloride, e.g., iron (Il) chloride or iron (lll) chloride, potassium chloride, silver chloride, titanium chloride, and zinc chloride. A metal nitrate includes, without limitation, copper nitrate, iron nitrate, e.g., iron (II) nitrate, iron (lll) nitrate, potassium nitrate, silver nitrate, titanium nitrate, and zinc nitrate. A metal sulfate includes, without limitation, copper sulfate, iron sulfate, e.g., iron (II) sulfate, iron (Ill) sulfate, potassium sulfate, silver sulfate, titanium sulfate, and zinc sulfate.
[064] In an embodiment, a composition disclosed herein comprises an amount of a metal salt that provides a desired beneficial effect to a composition disclosed herein. In aspects of this embodiment, a composition disclosed herein comprises a metal salt in an amount of, e.g., 50 ppm, 55 ppm, 60 ppm, 65 ppm, 70 ppm, 75 ppm, 80 ppm, 85 ppm, 90 ppm, 95 ppm, 100 ppm, 125 ppm, 150 ppm, 175 ppm, 200 ppm, 225 ppm, 250 ppm, 275 ppm, 300 ppm, 325 ppm, 350 ppm, 375 ppm, 400 ppm, 425 ppm, 450 ppm, 475 ppm, or 500 ppm. In other aspects of this embodiment, a composition disclosed herein comprises a metal salt in an amount of, e.g., at least 50 ppm, at least 60 ppm, at least 70 ppm, at least 80 ppm, at least 90 ppm, at least 100 ppm, at least 125 ppm, at least 150 ppm, at least 175 ppm, at least 200 ppm, at least 225 ppm, at least 250 ppm, at least 275 ppm, at least 300 ppm, at least 325 ppm, at least 350 ppm, at least 375 ppm, at least 400 ppm, at least 425 ppm, at least 450 ppm, at least 475 ppm, or at least 500 ppm. In yet other aspects of this embodiment, a composition disclosed herein comprises a metal salt in an amount of, e.g., at most 0.50 ppm, at most 0.60 ppm, at most 0.70 ppm, at most 0.80 ppm, at most 0.90 ppm, at most 1 ppm, at most 10 ppm, at most 20 ppm, at most 30 ppm, at most 40 ppm, at most 50 ppm, at most 60 ppm, at most 70 ppm, at most 80 ppm, at most 90 ppm, at most 100 ppm, at most 125 ppm, at most 150 ppm, at most 175 ppm, at most 200 ppm, at most 225 ppm, at most 250 ppm, at most 275 ppm, at
DK 181496 B1 25 most 300 ppm, at most 325 ppm, at most 350 ppm, at most 375 ppm, at most 400 ppm, at most 425 ppm, at most 450 ppm, at most 475 ppm, or at most 500 ppm.
[065] In other aspects of this embodiment, a composition disclosed herein comprises a metal salt in an amount of from, e.g., 50 ppm to 75 ppm, 50 ppm to 100 ppm, 50 ppm to 125 ppm, 50 ppm to 150 ppm, 50 ppm to 175 ppm, 50 ppm to 200 ppm, 50 ppm to 225 ppm, 50 ppm to 250 ppm, 50 ppm to 275 ppm, 50 ppm to 300 ppm, 50 ppm to 325 ppm, 50 ppm to 350 ppm, 50 ppm to 375 ppm, 50 ppm to 400 ppm, 75 ppm to 100 ppm, 75 ppm to 125 ppm, 75 ppm to 150 ppm, 75 ppm to 175 ppm, 75 ppm to 200 ppm, 75 ppm to 225 ppm, 75 ppm to 250 ppm, 75 ppm to 275 ppm, 75 ppm to 300 ppm, 75 ppm to 325 ppm, 75 ppm to 350 ppm, 75 ppm to 375 ppm, 75 ppm to 400 ppm, 100 ppm to 125 ppm, 100 ppm to 150 ppm, 100 ppm to 175 ppm, 100 ppm to 200 ppm, 100 ppm to 225 ppm, 100 ppm to 250 ppm, 100 ppm to 275 ppm, 100 ppm to 300 ppm, 100 ppm to 325 ppm, 100 ppm to 350 ppm, 100 ppm to 375 ppm, 100 ppm to 400 ppm, 150 ppm to 175 ppm, 150 ppm to 200 ppm, 150 ppm to 225 ppm, 150 ppm to 250 ppm, 150 ppm to 275 ppm, 150 ppm to 300 ppm, 150 ppm to 325 ppm, 150 ppm to 350 ppm, 150 ppm to 375 ppm, 150 ppm to 400 ppm, 200 ppm to 225 ppm, 200 ppm to 250 ppm, 200 ppm to 275 ppm, 200 ppm to 300 ppm, 200 ppm to 325 ppm, 200 ppm to 350 ppm, 200 ppm to 375 ppm, 200 ppm to 400 ppm, 250 ppm to 275 ppm, 250 ppm to 300 ppm, 250 ppm to 325 ppm, 250 ppm to 350 ppm, 250 ppm to 375 ppm, 250 ppm to 400 ppm, 300 ppm to 325 ppm, 300 ppm to 350 ppm, 300 ppm to 375 ppm, 300 ppm to 400 ppm, 350 ppm to 375 ppm, 350 ppm to 400 ppm, or 375 ppm to 400 ppm.
[066] In other aspects of this embodiment, a composition disclosed herein comprises a metal salt in an amount of, e.g., 400 ppm to 500 ppm.
[067] A composition disclosed herein may comprise a carrier. A carrier, also known as a vehicle, can be any material typically known in the skin care, cosmetic and medical arts that is used as a base to formulate a composition disclosed herein. A carrier may be an aqueous carrier, a semi-solid carrier or a solid carrier.
A carrier can also provide a skin care benefit as disclosed herein. A carrier includes, without limitation, water, a vegetable oil, a mineral oil, an ester oil, an ether, an alcohol, a fatty alcohol, an isoparaffin, a hydrocarbon oil, a polyol, and a wax. Non-limiting examples of an ester oil include octal palmitate, isopropyl myristate and isopropyl palmitate. Non-limiting examples of an ether includes dicapryl ether and dimethyl isosorbide. Non-limiting examples of an alcohol includes ethanol and isopropanol. Non-limiting examples of a fatty alcohol include cetyl alcohol, cetearyl alcohol, stearyl alcohol and behenyl alcohol. Non-limiting examples of an isoparaffin include isooctane, isododecane (IDD) and isohexadecane. Non-limiting examples of a hydrocarbon oil include mineral oil, petrolatum, isoeicosane and a polyolefin, including (hydrogenated) polyisobutene. Non-limiting examples of a polyol include propylene glycol, glycerin, butylene glycol, pentylene glycol, hexylene glycol, caprylyl glycol. Non-limiting examples of a wax include beeswax, carnauba, ozokerite, microcrystalline wax, polyethylene wax, and a botanical wax.
[068] In one embodiment, a single carrier is present in a composition disclosed herein. In another embodiment, a plurality of carriers is present in a composition disclosed herein. In aspects of this embodiment, a composition disclosed herein comprises, e.g., one or more carriers, two or more carriers,
DK 181496 B1 26 three or more carriers, four or more carriers or five or more carriers. In other aspects of this embodiment, a composition disclosed herein comprises, e.g., only one carrier, at most two carriers, at most three carriers, at most four carriers, or at most five carriers. In yet other aspects of this embodiment, a composition disclosed herein comprises from, e.g., 1 to 2 carriers, 1 to 3 carriers, 1 to 4 carriers, 1 to 5 carriers, 2 to 3 carriers, 2 to 4 carriers, 2 to 5 carriers, 3 to 4 carriers, 3 to 5 carriers or 4 to 5 carriers.
[069] In another embodiment, a composition disclosed herein comprises an amount of carrier that provides a desired formulative or beneficial effect to a composition disclosed herein. In aspects of this embodiment, a composition disclosed herein comprises a carrier in an amount of, e.g., at least 5%, at least 10%, at least 15%, at least 20%, at least 25%, at least 30%, at least 35%, at least 40%, at least 45%, at least 50%, at least 55%, at least 60%, at least 65%, at least 70%, at least 75%, at least 80%, at least 85%, at least 90%, at least 95%, at least 96%, at least 97%, at least 98% or at least 99% by weight of the composition. In other aspects of this embodiment, a composition disclosed herein comprises a carrier in an amount of, e.g., at most 5%, at most 10%, at most 15%, at most 20%, at most 25%, at most 30%, at most 35%, at most 40%, at most 45%, at most 50%, at most 55%, at most 60%, at most 65%, at most 70%, at most 75%, at most 80%, at most 85%, at most 90%, at most 95%, at most 96%, at most 97%, at most 98% or at most 99% by weight of the composition. In yet other aspects of this embodiment, a composition disclosed herein comprises a carrier in an amount of from, e.g., 5% to 25%, 5% to 50%, 5% to 75%, 5% to 90%, 5% to 95%, 5% to 96%, 5% to 97%, 5% to 98%, 5% to 99%, 25% to 50%, 25% to 75%, 25% to 90%, 25% to 95%, 25% to 96%, 25% to 97%, 25% to 98%, 25% to 99%, 50% to 75%, 50% to 90%, 50% to 95%, 50% to 96%, 50% to 97%, 50% to 98%, 50% to 99%, 75% to 80%, 75% to 85%, 75% to 90%, 75% to 95%, 75% to 96%, 75% to 97%, 75% to 98%, 75% to 99%, 80% to 85%, 80% to 90%, 80% to 95%, 80% to 96%, 80% to 97%, 80% to 98%, 80% to 99%, 85% to 90%, 85% to 95%, 85% to 96%, 85% to 97%, 85% to 98%, 85% to 99%, 90% to 95%, 90% to 96%, 90% to 97%, 90% to 98%, 90% to 99%, or 95% to 99%, by weight of the composition.
[070] In another embodiment, a composition disclosed herein comprises a carrier which is not an alcohol.
In aspects of this embodiment, when a composition disclosed herein comprises hypochlorous acid or free available chlorine, then the composition may comprise a carrier where the carrier is not an alcohol.
[071] A composition disclosed herein may further optionally include additional ingredients. An additional ingredient is one known to be useful in finishing a composition disclosed herein. An additional ingredient includes, without limitation, a hydrophilic clay, a disinfectant, an antiseptic, a surfactant, a preservative, or a chelating agent. An additional ingredient disclosed herein is known in the art.
[072] A hydrophilic clay is a synthetic or naturally-occurring smectic clay that forms three-dimensional collodal structures when hydrated leading to increased viscosity and improved suspension control components in a composition. A hydrophilic clay includes hydrous phyllosilicate clays. A hydrophilic clay can have thixotrophic properties. Non-limiting examples of a hydrophilic clay include a bentonite clay, a hectorite clay, a kaolinite clay, and a silicate clay. A bentonite clay is a phyllosilicate clay and includes, without limitation, a potassium bentonite clay, a sodium bentonite clay, a calcium bentonite clay, and an
DK 181496 B1 27 aluminum bentonite clay. A hectorite clay is a phyllosilicate clay and includes those commercially sold as the BENTONE® product line, including hectorite clay (BENTONE® EW), hectorite clay (BENTONE® MA), and hectorite clay and hydroxy ethyl cellulose (BENTONE® LT). A kaolinite clay is a phyllosilicate clay. A silicate clay is a synthetic layered silicate clay and includes those commercially sold as the LAPONITE® product line, including lithium magnesium sodium silicate (LAPONITE® XLG), lithium magnesium sodium silicate and tetrasodium pyrophosphate (LAPONITE® XLS), sodium magnesium fluorosilicate (LAPONITE®
XL), and sodium magnesium fluorosilicate (LAPONITE® XL21).
[073] In one embodiment, a single hydrophilic clay is present in a composition disclosed herein. In another embodiment, a plurality of hydrophilic clays is present in a composition disclosed herein. In aspects of this embodiment, a composition disclosed herein comprises, e.g., one or more hydrophilic clays, two or more hydrophilic clays, three or more hydrophilic clays, four or more hydrophilic clays or five or more hydrophilic clays. In other aspects of this embodiment, a composition disclosed herein comprises, e.g., only one hydrophilic clay, at most two hydrophilic clays, at most three hydrophilic clays, at most four hydrophilic clays, or at most five hydrophilic clays. In yet other aspects of this embodiment, a composition disclosed herein comprises from, e.g., 1 to 2 hydrophilic clays, 1 to 3 hydrophilic clays, 1 to 4 hydrophilic clays, 1 to 5 hydrophilic clays, 2 to 3 hydrophilic clays, 2 to 4 hydrophilic clays, 2 to 5 hydrophilic clays, 3 to 4 hydrophilic clays, 3 to 5 hydrophilic clays or 4 to 5 hydrophilic clays.
[074] In another embodiment, a composition disclosed herein comprises an amount of a hydrophilic clay that provides a desired beneficial effect to a composition disclosed herein. In aspects of this embodiment, a composition disclosed herein comprises a hydrophilic clay in an amount of, e.g., 0.01%, 0.025%, 0.05%, 0.075%, 0.1%, 0.2%, 0.25%, 0.3%, 0.4%, 0.5%, 0.6%, 0.7%, 0.75%, 0.8%, 0.9%, 1%, 2%, 3%, 4%, 5%, 6%, 7%, 8%. 9%, or 10% by weight of the composition. In other aspects of this embodiment, a composition disclosed herein comprises a hydrophilic clay in an amount of, e.g., at least 0.01%, at least 0.025%, at least 0.05%, at least 0.075%, at least 0.1%, at least 0.25%, at least 0.5%, at least 0.75%, at least 1%, at least 2%, at least 3%, at least 4%, at least 5%, at least 6%, at least 7%, at least 8%, at least 9%, or at least 10% by weight of the composition. In yet other aspects of this embodiment, a composition disclosed herein comprises a hydrophilic clay in an amount of, e.g., at most 0.01%, at most 0.025%, at most 0.05%, at most 0.075%, at most 0.1%, at most 0.25%, at most 0.5%, at most 0.75%, at most 1%, at most 2%, at most 3%, at most 4%, at most 5%, at most 6%, at most 7%, at most 8%, at most 9%, or at most 10% by weight of the composition.
[075] In still other aspects of this embodiment, a composition disclosed herein comprises a hydrophilic clay in an amount of from, e.qg., 0.01% to 0.05%, 0.01% to 0.075%, 0.01% to 0.1%, 0.1% to 0.5%, 0.1% to 0.75%, 0.1% to 1%, 0.1% to 2%, 0.1% to 3%, 0.1% to 4%, 0.1% to 5%, 0.1% to 6%, 0.1% to 7%, 0.1% to 8%, 0.1% to 9%, 0.1% to 10%, 0.25% to 0.5%, 0.25% to 0.75%, 0.25% to 1%, 0.25% to 2%, 0.25% to 3%, 0.25% to 4%, 0.25% to 5%, 0.25% to 6%, 0.25% to 7%, 0.25% to 8%, 0.25% to 9%, 0.25% to 10%, 0.5% to 0.75%, 0.5% to 1%, 0.5% to 2%, 0.5% to 3%, 0.5% to 4%, 0.5% to 5%, 0.5% to 6%, 0.5% to 7%, 0.5% to 8%, 0.5% to 9%, 0.5% to 10%, 0.75% to 1%, 0.75% to 2%, 0.75% to 3%, 0.75% to 4%, 0.75% to 5%, 0.75% to 6%, 0.75% to 7%, 0.75% to 8%, 0.75% to 9%, 0.75% to 10%, 1% to 2%, 1% to 3%, 1% to 4%,
DK 181496 B1 28 1% to 5%, 1% to 6%, 1% to 7%, 1% to 8%, 1% to 9%, 1% to 10%, 2% to 3%, 2% to 4%, 2% to 5%, 2% to 6%, 2% to 7%, 2% to 8%, 2% to 9%, 2% to 10%, 3% to 4%, 3% to 5%, 3% to 6%, 3% to 7%, 3% to 8%, 3% to 9%, 3% to 10%, 4% to 5%, 4% to 6%, 4% to 7%, 4% to 8%, 4% to 9%, 4% to 10%, 5% to 6%, 5% to 7%, 5% to 8%, 5% to 9%, 5% to 10%, 6% to 7%, 6% to 8%, 6% to 9%, 6% to 10%, 7% to 8%, 7% to 9%, 7% to 10%, 8% to 9%, 8% to 10% or 9% to 10% by weight of the composition.
[076] In another embodiment, a composition disclosed herein comprises an amount of a silicate clay that provides a desired beneficial effect to a composition disclosed herein. In aspects of this embodiment, a composition disclosed herein comprises a silicate clay in an amount of, e.g., 0.001%, 0.0025%, 0.005%, 0.0075%, 0.01%, 0.025%, 0.05%, 0.075%, 0.1%, 0.2%, 0.25%, 0.3%, 0.4%, 0.5%, 0.6%, 0.7%, 0.75%, 0.8%, 0.9%, 1%, 2%, 3%, 4%, 5%, 6%, 7%, 8%. 9%, or 10% by weight of the composition. In other aspects of this embodiment, a composition disclosed herein comprises a silicate clay in an amount of, e.g., at least 0.001%, at least 0.0025%, at least 0.005%, at least 0.0075%, at least 0.01%, at least 0.025%, at least 0.05%, at least 0.075%, at least 0.1%, at least 0.25%, at least 0.5%, at least 0.75%, at least 1%, at least 2%, at least 3%, at least 4%, at least 5%, at least 6%, at least 7%, at least 8%, at least 9%, or at least 10% by weight of the composition. In yet other aspects of this embodiment, a composition disclosed herein comprises a silicate clay in an amount of, e.g., at most 0.001%, at most 0.0025%, at most 0.005%, at most 0.0075%, at most 0.01%, at most 0.025%, at most 0.05%, at most 0.075%, at most 0.1%, at most 0.25%, at most 0.5%, at most 0.75%, at most 1%, at most 2%, at most 3%, at most 4%, at most 5%, at most 6%, at most 7%, at most 8%, at most 9%, or at most 10% by weight of the composition.
[077] In still other aspects of this embodiment, a composition disclosed herein comprises a silicate clay in an amount of from, e.g., 0.001% to 0.005%, 0.001% to 0.0075%, 0.001% to 0.01%, 0.001% to 0.05%, 0.001% to 0.075%, 0.001% to 0.1%, 0.001% to 0.25%, 0.001% to 0.5%, 0.001% to 0.75%, 0.005% to 0.0075%, 0.005% to 0.01%, 0.005% to 0.05%, 0.005% to 0.075%, 0.005% to 0.1%, 0.005% to 0.25%, 0.005% to 0.5%, 0.005% to 0.75%, 0.01% to 0.05%, 0.01% to 0.075%, 0.01% to 0.1%, 0.1% to 0.5%, 0.1% to 0.75%, 0.1% to 1%, 0.1% to 2%, 0.1% to 3%, 0.1% to 4%, 0.1% to 5%, 0.1% to 6%, 0.1% to 7%, 0.1% to 8%, 0.1% to 9%, 0.1% to 10%, 0.25% to 0.5%, 0.25% to 0.75%, 0.25% to 1%, 0.25% to 2%, 0.25% to 3%, 0.25% to 4%, 0.25% to 5%, 0.25% to 6%, 0.25% to 7%, 0.25% to 8%, 0.25% to 9%, 0.25% to 10%, 0.5% to 0.75%, 0.5% to 1%, 0.5% to 2%, 0.5% to 3%, 0.5% to 4%, 0.5% to 5%, 0.5% to 6%, 0.5% to 7%, 0.5% to 8%, 0.5% to 9%, 0.5% to 10%, 0.75% to 1%, 0.75% to 2%, 0.75% to 3%, 0.75% to 4%, 0.75% to 5%, 0.75% to 6%, 0.75% to 7%, 0.75% to 8%, 0.75% to 9%, 0.75% to 10%, 1% to 2%, 1% to 3%, 1% to 4%, 1% to 5%, 1% to 6%, 1% to 7%, 1% to 8%, 1% to 9%, 1% to 10%, 2% to 3%, 2% to 4%, 2% to 5%, 2% to 6%, 2% to 7%, 2% to 8%, 2% to 9%, 2% to 10%, 3% to 4%, 3% to 5%, 3% to 6%, 3% to 7%, 3% to — 8%, 3% to 9%, 3% to 10%, 4% to 5%, 4% to 6%, 4% to 7%, 4% to 8%, 4% to 9%, 4% to 10%, 5% to 6%, 5% to 7%, 5% to 8%, 5% to 9%, 5% to 10%, 6% to 7%, 6% to 8%, 6% to 9%, 6% to 10%, 7% to 8%, 7% to 9%, 7% to 10%, 8% to 9%, 8% to 10% or 9% to 10% by weight of the composition.
[078] A preservative preserves the stability of a composition disclosed herein. A preservative can also prevent the growth of microbial organisms in a composition disclosed herein. Non-limiting examples of a
DK 181496 B1 29 preservative include methylparaben, phenoxyethanol, capryl glycol, glyceryl caprylate, benzoic acid, sorbic acid, gallic acid, and propylparaben.
[079] A composition disclosed herein may be adjusted to any pH that enables a composition disclosed herein to achieve a desired beneficial effect. In aspects of this embodiment, the pH of a composition disclosed herein is, e.g., at least 2, at least 3, at least 4, at least 5, at least 6, at least 7, at least 8, at least 9, at least 10, or atleast 11. In other aspects of this embodiment, the pH of a composition disclosed herein is, e.g., at most 2, at most 3, at most 4, at most 5, at most 6, at most 7, at most 8, at most 9, at most 10, or at most 11.
[080] In yet other aspects of this embodiment, the pH of a composition disclosed herein is between, e.g., 2t05, 2t0 5.5, 2t0 6, 2t0 6.5, 2 to 7, 2 to 7.5, 2t0 8, 2 to 8.5, 2t0 9, 2.5 to 5, 2.5 to 5.5, 2.5 to 6, 2.5 to 6.5, 2.5 to 7, 2.5 to 7.5, 2.510 8, 2.5 to 8.5, 2.5 to 9, 3t0 5, 3t0 5.5, 3t0 6, 3t0 6.5, 3 to 7, 3 to 7.5, 3 to 8, 3to 8.5, 3t0 9, 3.5 t0 5, 3.5t0 5.5, 3.510 6, 3.5 to 6.5, 3.5 to 7, 3.5 to 7.5, 3.5 to 8, 3.5 to 8.5, 3.5 to 9, 4 to —5,4t05.5,4t06, 410 6.5, 4 to 7, 4 to 7.5, 4 to 8, 4 to 8.5, 4 to 9, 4.5 to 5, 4.5 to 5.5, 4.510 6, 4.5 to 6.5, 4.5to 7, 4.5to 7.5, 4.5 to 8, 4.5 t0 8.5, 4.5 to 9, 5 t0 5.5, 5 to 6, 5 to 6.5, 5 to 7, 5 to 7.5, 5 to 8, 5 to 8.5, 5 to 9, 5.5 to 6, 5.5 to 6.5, 5.5 to 7, 5.5 to 7.5, 5.5 to 8, 5.5 to 8.5, 5.5 to 9, 6 t0 6.5, 6 to 7, 6 to 7.5, 6 to 8, 6 to 8.5, 6 to 9, 6.5 to 7, 6.5 to 7.5, 6.5 to 8, 6.5 to 8.5, 6.5 to 9, 7 to 7.5, 7 to 8, 7 to 8.5, 7 to 9, 7.510 8, 7.5 to 8.5, 7.5 to 9, 8 to 8.5, 8 to 9, or 8.5 to 9.
[081] A composition disclosed herein is resistant to inactivation when exposed to a bodily fluid. A bodily fluid is one containing charged molecules and includes, without limitation, blood, and a blood byproduct like plasma and serum. In one embodiment, a composition disclosed herein is resistant to inactivation when it shows, e.g., at most 1% inactivation, at most 2% inactivation, at most 3% inactivation, at most 4% inactivation, at most 5% inactivation, at most 6% inactivation, at most 7% inactivation, at most 8% inactivation, at most 9% inactivation, or at most 10% inactivation upon exposure to a bodily fluid. In another embodiment, a composition disclosed herein is resistant to inactivation when it shows, e.g., at most 10% inactivation, at most 15% inactivation, at most 20% inactivation, at most 25% inactivation, at most 30% inactivation, at most 35% inactivation, at most 40% inactivation, at most 45% inactivation, at most 50% inactivation upon exposure to a bodily fluid. In another embodiment, a composition disclosed herein is resistant to inactivation when it shows, e.g., about 1% to about 10% inactivation, about 1% to about 20% inactivation, about 1% to about 30% inactivation, about 1% to about 40% inactivation, about 1% to about 50% inactivation, about 5% to about 10% inactivation, about 5% to about 20% inactivation, about 5% to about 30% inactivation, about 5% to about 40% inactivation, about 5% to about 50% inactivation, about 10% to about 20% inactivation, about 10% to about 30% inactivation, about 10% to about 40% inactivation, about 10% to about 50% inactivation, 20% to about 30% inactivation, about 20% to about 40% inactivation, about 20% to about 50% inactivation, about 30% to about 40% inactivation, about 30% to about 50% inactivation, or about 40% to about 50% inactivation upon exposure to a bodily fluid.
[082] In one embodiment, a composition disclosed herein is resistant to inactivation when it shows, e.g., at most 1% degradation, at most 2% degradation, at most 3% degradation, at most 4% degradation, at
DK 181496 B1 30 most 5% degradation, at most 6% degradation, at most 7% degradation, at most 8% degradation, at most 9% degradation, or at most 10% degradation of hypochlorous acid upon exposure to a bodily fluid. In another embodiment, a composition disclosed herein is resistant to inactivation when it shows, e.g., at most 10% degradation, at most 15% degradation, at most 20% degradation, at most 25% degradation, at most 30% degradation, at most 35% degradation, at most 40% degradation, at most 45% degradation, at most 50% degradation of hypochlorous acid upon exposure to a bodily fluid. In another embodiment, a composition disclosed herein is resistant to inactivation when it shows, e.g., 1% to 10% degradation, 1% to 20% degradation, 1% to 30% degradation, 1% to 40% degradation, 1% to 50% degradation, 5% to 10% degradation, 5% to 20% degradation, 5% to 30% degradation, 5% to 40% degradation, 5% to 50% degradation, 10% to 20% degradation, 10% to 30% degradation, 10% to 40% degradation, 10% to 50% degradation, 20% to 30% degradation, 20% to 40% degradation, 20% to 50% degradation, 30% to 40% degradation, 30% to 50% degradation, or 40% to 50% degradation of hypochlorous acid upon exposure to a bodily fluid.
[083] A composition disclosed herein is stable. In one embodiment, a composition disclosed herein is stable when it shows, e.g., at most 1% degradation, at most 2% degradation, at most 3% degradation, at most 4% degradation, at most 5% degradation, at most 6% degradation, at most 7% degradation, at most 8% degradation, at most 9% degradation, or at most 10% degradation of hypochlorous acid. In another embodiment, a composition disclosed herein is stable when it shows, e.g., at most 10% degradation, at most 15% degradation, at most 20% degradation, at most 25% degradation, at most 30% degradation, at most 35% degradation, at most 40% degradation, at most 45% degradation, at most 50% degradation, at most 55% degradation, at most 60% degradation, at most 65% degradation, at most 70% degradation, at most 75% degradation, at most 80% degradation, at most 85% degradation, at most 90% degradation, or at most 95% degradation of hypochlorous acid. In another embodiment, a composition disclosed herein is stable when it shows, e.g., 1% to 10% degradation, 1% to 20% degradation, 1% to 30% degradation, 1% to 40% degradation, 1% to 50% degradation, 1% to 60% degradation, 1% to 70% degradation, 1% to 80% degradation, 1% to 90% degradation, 1% to 95% degradation, 5% to 10% degradation, 5% to 20% degradation, 5% to 30% degradation, 5% to 40% degradation, 5% to 50% degradation, 5% to 60% degradation, 5% to 70% degradation, 5% to 80% degradation, 5% to 90% degradation, 5% to 95% degradation, 10% to 20% degradation, 10% to 30% degradation, 10% to 40% degradation, 10% to 50% degradation, 10% to 60% degradation, 10% to 70% degradation, 10% to 80% degradation, 10% to 90% degradation, 10% to 95% degradation, 20% to 30% degradation, 20% to 40% degradation, 20% to 50% degradation, 20% to 60% degradation, 20% to 70% degradation, 20% to 80% degradation, 20% to 90% degradation, 20% to 95% degradation, 30% to 40% degradation, 30% to 50% degradation, 30% to 60% degradation, 30% to 70% degradation, 30% to 80% degradation, 30% to 90% degradation, 30% to 95% degradation, 40% to 50% degradation, 40% to 60% degradation, 40% to 70% degradation, 40% to 80% degradation, 40% to 90% degradation, 40% to 95% degradation, 50% to 60% degradation, 50% to 70% degradation, 50% to 80% degradation, 50% to 90% degradation, 50% to 95% degradation, 60% to 70% degradation, 60% to 80% degradation, 60% to 90% degradation, 60% to 95% degradation, 70% to 80% degradation, 70% to 90% degradation, 70% to 95% degradation, 80% to 90% degradation, 80% to 95% degradation, or 90% to 95% degradation of hypochlorous acid.
DK 181496 B1 31
[084] In one embodiment, a composition disclosed herein is stable when it shows, e.g., at most 1% degradation, at most 2% degradation, at most 3% degradation, at most 4% degradation, at most 5% degradation, at most 6% degradation, at most 7% degradation, at most 8% degradation, at most 9% degradation, or at most 10% degradation of free available chlorine. In another embodiment, a composition disclosed herein is stable when it shows, e.g., at most 10% degradation, at most 15% degradation, at most 20% degradation, at most 25% degradation, at most 30% degradation, at most 35% degradation, at most 40% degradation, at most 45% degradation, at most 50% degradation, at most 55% degradation, at most 60% degradation, at most 65% degradation, at most 70% degradation, at most 75% degradation, at most 80% degradation, at most 85% degradation, at most 90% degradation, or at most 95% degradation of free available chlorine. In another embodiment, a composition disclosed herein is stable when it shows, e.g., 1% to 10% degradation, 1% to 20% degradation, 1% to 30% degradation, 1% to 40% degradation, 1% to 50% degradation, 1% to 60% degradation, 1% to 70% degradation, 1% to 80% degradation, 1% to 90% degradation, 1% to 95% degradation, 5% to 10% degradation, 5% to 20% degradation, 5% to 30% degradation, 5% to 40% degradation, 5% to 50% degradation, 5% to 60% degradation, 5% to 70% degradation, 5% to 80% degradation, 5% to 90% degradation, 5% to 95% degradation, 10% to 20% degradation, 10% to 30% degradation, 10% to 40% degradation, 10% to 50% degradation, 10% to 60% degradation, 10% to 70% degradation, 10% to 80% degradation, 10% to 90% degradation, 10% to 95% degradation, 20% to 30% degradation, 20% to 40% degradation, 20% to 50% degradation, 20% to 60% degradation, 20% to 70% degradation, 20% to 80% degradation, 20% to 90% degradation, 20% to 95% degradation, 30% to 40% degradation, 30% to 50% degradation, 30% to 60% degradation, 30% to 70% degradation, 30% to 80% degradation, 30% to 90% degradation, 30% to 95% degradation, 40% to 50% degradation, 40% to 60% degradation, 40% to 70% degradation, 40% to 80% degradation, 40% to 90% degradation, 40% to 95% degradation, 50% to 60% degradation, 50% to 70% degradation, 50% to 80% degradation, 50% to 90% degradation, 50% to 95% degradation, 60% to 70% degradation, 60% to 80% degradation, 60% to 90% degradation, 60% to 95% degradation, 70% to 80% degradation, 70% to 90% degradation, 70% to 95% degradation, 80% to 90% degradation, 80% to 95% degradation, or 90% to 95% degradation of free available chlorine.
[085] In aspects of this embodiment, a composition disclosed herein is stable for, e.g., about 1 day, about 2 days, 3 days, 4 days, 5 days, 6, days, 7 days, 8 days, 9 days, 10 days, 11 days, 12 days, 13 days, 14 days or 15 days. In other aspects of this embodiment, a composition disclosed herein is stable for, e.g., at least 1 day, at least 2 days, at least 3 days, at least 4 days, at least 5 days, at least 6, days, at least 7 days, at least 8 days, at least 9 days, at least 10 days, at least 11 days, at least 12 days, at least 13 days, at least 14 days or at least 15 days. In yet other aspects of this embodiment, a composition disclosed herein is stable for, e.g., at most 1 day, at most 2 days, at most 3 days, at most 4 days, at most 5 days, at most 6, days, at most 7 days, at most 8 days, at most 9 days, at most 10 days, at most 11 days, at most 12 days, at most 13 days, at most 14 days or at most 15 days.
[086] In still aspects of this embodiment, a composition disclosed herein is stable for, e.g., 1 day to 2 days, 1 day to 3 days, 1 day to 4 days, 1 day to 5 days, 1 day to 6 days, 1 day to 7 days, 1 day to 8 days,
DK 181496 B1 32 1 day to 9 days, 1 day to 10 days, 1 day to 11 days, 1 day to 12 days, 1 day to 13 days, 1 day to 14 days, 1 day to 15 days, 2 days to 3 days, 2 days to 4 days, 2 days to 5 days, 2 days to 6 days, 2 days to 7 days, 2 days to 8 days, 2 days to 9 days, 2 days to 10 days, 2 days to 11 days, 2 days to 12 days, 2 days to 13 days, 2 days to 14 days, 2 days to 15 days, 3 days to 4 days, 3 days to 5 days, 3 days to 6 days, 3 days to 7 days, 3 days to 8 days, 3 days to 9 days, 3 days to 10 days, 3 days to 11 days, 3 days to 12 days, 3 days to 13 days, 3 days to 14 days, 3 days to 15 days, 4 days to 5 days, 4 days to 6 days, 4 days to 7 days, 4 days to 8 days, 4 days to 9 days, 4 days to 10 days, 4 days to 11 days, 4 days to 12 days, 4 days to 13 days, 4 days to 14 days, 4 days to 15 days, 5 days to 6 days, 5 days to 7 days, 5 days to 8 days, 5 days to 9 days, 5 days to 10 days, 5 days to 11 days, 5 days to 12 days, 5 days to 13 days, 5 days to 14 days, 5 days to 15 days, 6 days to 7 days, 6 days to 8 days, 6 days to 9 days, 6 days to 10 days, 6 days to 11 days, 6 days to 12 days, 6 days to 13 days, 6 days to 14 days, 6 days to 15 days, 7 days to 8 days, 7 days to 9 days, 7 days to 10 days, 7 days to 11 days, 7 days to 12 days, 7 days to 13 days, 7 days to 14 days, 7 days to 15 days, 8 days to 9 days, 8 days to 10 days, 8 days to 11 days, 8 days to 12 days, 8 days to 13 days, 8 days to 14 days, 8 days to 15 days, 9 days to 10 days, 9 days to 11 days, 9 days to 12 days, 9 days to 13 days, 9 days to 14 days, 9 days to 15 days, 10 days to 11 days, 10 days to 12 days, 10 days to 13 days, 10 days to 14 days, 10 days to 15 days, 11 days to 12 days, 11 days to 13 days, 11 days to 14 days, 11 days to 15 days, 12 days to 13 days, 12 days to 14 days, 12 days to 15 days, 13 days to 14 days, 13 days to 15 days, or 14 days to 15 days.
[087] In other aspects of this embodiment, a composition disclosed herein is stable for, e.g., about 1 week, about 2 weeks, 3 weeks, 4 weeks, 5 weeks, 6, weeks, 7 weeks, 8 weeks, 9 weeks, 10 weeks, 11 weeks, 12 weeks, 13 weeks, 14 weeks or 15 weeks. In yet other aspects of this embodiment, a composition disclosed herein is stable for, e.g., at least 1 week, at least 2 weeks, at least 3 weeks, at least 4 weeks, at least 5 weeks, at least 6, weeks, at least 7 weeks, at least 8 weeks, at least 9 weeks, at least 10 weeks, at least 11 weeks, at least 12 weeks, at least 13 weeks, at least 14 weeks or at least 15 weeks. In still other aspects of this embodiment, a composition disclosed herein is stable for, e.g., at most 1 week, at most 2 weeks, at most 3 weeks, at most 4 weeks, at most 5 weeks, at most 6, weeks, at most 7 weeks, at most 8 weeks, at most 9 weeks, at most 10 weeks, at most 11 weeks, at most 12 weeks, at most 13 weeks, at most 14 weeks or at most 15 weeks.
[088] In aspects ofthis embodiment, a composition disclosed herein is stable for, e.g., 1 week to 2 weeks, 1 week to 3 weeks, 1 week to 4 weeks, 1 week to 5 weeks, 1 week to 6 weeks, 1 week to 7 weeks, 1 week to 8 weeks, 1 week to 9 weeks, 1 week to 10 weeks, 1 week to 11 weeks, 1 week to 12 weeks, 1 week to 13 weeks, 1 week to 14 weeks, 1 week to 15 weeks, 2 weeks to 3 weeks, 2 weeks to 4 weeks, 2 weeks to 5 weeks, 2 weeks to 6 weeks, 2 weeks to 7 weeks, 2 weeks to 8 weeks, 2 weeks to 9 weeks, 2 weeks to 10 weeks, 2 weeks to 11 weeks, 2 weeks to 12 weeks, 2 weeks to 13 weeks, 2 weeks to 14 weeks, 2 weeks to 15 weeks, 3 weeks to 4 weeks, 3 weeks to 5 weeks, 3 weeks to 6 weeks, 3 weeks to 7 weeks, 3 weeks to 8 weeks, 3 weeks to 9 weeks, 3 weeks to 10 weeks, 3 weeks to 11 weeks, 3 weeks to 12 weeks, 3 weeks to 13 weeks, 3 weeks to 14 weeks, 3 weeks to 15 weeks, 4 weeks to 5 weeks, 4 weeks to 6 weeks, 4 weeks to 7 weeks, 4 weeks to 8 weeks, 4 weeks to 9 weeks, 4 weeks to 10 weeks, 4 weeks to 11 weeks, 4 weeks to 12 weeks, 4 weeks to 13 weeks, 4 weeks to 14 weeks, 4 weeks to 15 weeks, 5 weeks to 6 weeks, 5
DK 181496 B1 33 weeks to 7 weeks, 5 weeks to 8 weeks, 5 weeks to 9 weeks, 5 weeks to 10 weeks, 5 weeks to 11 weeks, weeks to 12 weeks, 5 weeks to 13 weeks, 5 weeks to 14 weeks, 5 weeks to 15 weeks, 6 weeks to 7 weeks, 6 weeks to 8 weeks, 6 weeks to 9 weeks, 6 weeks to 10 weeks, 6 weeks to 11 weeks, 6 weeks to 12 weeks, 6 weeks to 13 weeks, 6 weeks to 14 weeks, 6 weeks to 15 weeks, 7 weeks to 8 weeks, 7 weeks 5 to 9 weeks, 7 weeks to 10 weeks, 7 weeks to 11 weeks, 7 weeks to 12 weeks, 7 weeks to 13 weeks, 7 weeks to 14 weeks, 7 weeks to 15 weeks, 8 weeks to 9 weeks, 8 weeks to 10 weeks, 8 weeks to 11 weeks, 8 weeks to 12 weeks, 8 weeks to 13 weeks, 8 weeks to 14 weeks, 8 weeks to 15 weeks, 9 weeks to 10 weeks, 9 weeks to 11 weeks, 9 weeks to 12 weeks, 9 weeks to 13 weeks, 9 weeks to 14 weeks, 9 weeks to 15 weeks, 10 weeks to 11 weeks, 10 weeks to 12 weeks, 10 weeks to 13 weeks, 10 weeks to 14 weeks, 10 weeks to 15 weeks, 11 weeks to 12 weeks, 11 weeks to 13 weeks, 11 weeks to 14 weeks, 11 weeks to weeks, 12 weeks to 13 weeks, 12 weeks to 14 weeks, 12 weeks to 15 weeks, 13 weeks to 14 weeks, 13 weeks to 15 weeks, or 14 weeks to 15 weeks.
[089] In other aspects of this embodiment, a composition disclosed herein is stable for, e.g., about 1 15 month, about 2 months, 3 months, 4 months, 5 months, 6, months, 7 months, 8 months, 9 months, 10 months, 11 months, 12 months, 13 months, 14 months, 15 months, 16 months, 17 months, or 18 months.
In yet other aspects of this embodiment, a composition disclosed herein is stable for, e.g., at least 1 month, at least 2 months, at least 3 months, at least 4 months, at least 5 months, at least 6, months, at least 7 months, at least 8 months, at least 9 months, at least 10 months, at least 11 months, at least 12 months, at least 13 months, at least 14 months, at least 15 months, at least 16 months, at least 17 months, or at least 18 months. In still other aspects of this embodiment, a composition disclosed herein is stable for, e.g., at most 1 month, at most 2 months, at most 3 months, at most 4 months, at most 5 months, at most 6, months, at most 7 months, at most 8 months, at most 9 months, at most 10 months, at most 11 months, at most 12 months, at most 13 months, at most 14 months, at most 15 months, at most 16 months, at most 17 months, or at most 18 months.
[090] In aspects of this embodiment, a composition disclosed herein is stable for, e.g., 1 month to 2 months, 1 month to 3 months, 1 month to 4 months, 1 month to 5 months, 1 month to 6 months, 1 month to 7 months, 1 month to 8 months, 1 month to 9 months, 1 month to 10 months, 1 month to 11 months, 1 month to 12 months, 1 month to 13 months, 1 month to 14 months, 1 month to 15 months, 1 month to 16 months, 1 month to 17 months, 1 month to 18 months, 2 months to 3 months, 2 months to 4 months, 2 months to 5 months, 2 months to 6 months, 2 months to 7 months, 2 months to 8 months, 2 months to 9 months, 2 months to 10 months, 2 months to 11 months, 2 months to 12 months, 2 months to 13 months, 2 months to 14 months, 2 months to 15 months, 2 months to 16 months, 2 months to 17 months, 2 months to 18 months, 3 months to 4 months, 3 months to 5 months, 3 months to 6 months, 3 months to 7 months, 3 months to 8 months, 3 months to 9 months, 3 months to 10 months, 3 months to 11 months, 3 months to 12 months, 3 months to 13 months, 3 months to 14 months, 3 months to 15 months, 3 months to 16 months, 3 months to 17 months, 3 months to 18 months, 4 months to 5 months, 4 months to 6 months, 4 months to 7 months, 4 months to 8 months, 4 months to 9 months, 4 months to 10 months, 4 months to 11 months, 4 months to 12 months, 4 months to 13 months, 4 months to 14 months, 4 months to 15 months, 4 months to 16 months, 4 months to 17 months, 4 months to 18 months, 5 months to 6 months, 5 months to 7 months,
DK 181496 B1 34 months to 8 months, 5 months to 9 months, 5 months to 10 months, 5 months to 11 months, 5 months to 12 months, 5 months to 13 months, 5 months to 14 months, 5 months to 15 months, 5 months to 16 months, 5 months to 17 months, 5 months to 18 months, 6 months to 7 months, 6 months to 8 months, 6 months to 9 months, 6 months to 10 months, 6 months to 11 months, 6 months to 12 months, 6 months to 13 months, 5 6 months to 14 months, 6 months to 15 months, 6 months to 16 months, 6 months to 17 months, 6 months to 18 months, 7 months to 8 months, 7 months to 9 months, 7 months to 10 months, 7 months to 11 months, 7 months to 12 months, 7 months to 13 months, 7 months to 14 months, 7 months to 15 months, 7 months to 16 months, 7 months to 17 months, 7 months to 18 months, 8 months to 9 months, 8 months to 10 months, 8 months to 11 months, 8 months to 12 months, 8 months to 13 months, 8 months to 14 months, 8 months to 15 months, 8 months to 16 months, 8 months to 17 months, 8 months to 18 months, 9 months to 10 months, 9 months to 11 months, 9 months to 12 months, 9 months to 13 months, 9 months to 14 months, 9 months to 15 months, 9 months to 16 months, 9 months to 17 months, 9 months to 18 months, 10 months to 11 months, 10 months to 12 months, 10 months to 13 months, 10 months to 14 months, 10 months to 15 months, 10 months to 16 months, 10 months to 17 months, 10 months to 18 months, 11 months to 12 months, 11 months to 13 months, 11 months to 14 months, 11 months to 15 months, 11 months to 16 months, 11 months to 17 months, 1 months to 18 months, 12 months to 13 months, 12 months to 14 months, 12 months to 15 months, 12 months to 16 months, 12 months to 17 months, 12 months to 18 months, 13 months to 14 months, 13 months to 15 months, 13 months to 16 months, 13 months to 17 months, 13 months to 18 months, 14 months to 15 months, 14 months to 16 months, 14 months to 17 months, 14 months to 18 months, 15 months to 16 months, 15 months to 17 months, 15 months to 18 months, 16 months to 17 months, 16 months to 18 months, or 17 months to 18 months.
[091] In other aspects of this embodiment, a composition disclosed herein is stable for, e.g., about 1 year, about 2 years, about 3 years, about 4 years, or about 5 years. In yet other aspects of this embodiment, a composition disclosed herein is stable for, e.g., at least 1 year, at least 2 years, at least 3 years, at least 4 years, or at least 5 years. In still other aspects of this embodiment, a composition disclosed herein is stable for, e.g., at most 1 year, at most 2 years, at most 3 years, at most 4 years, or at most 5 years. In other aspects of this embodiment, a composition disclosed herein is stable for, e.g., 1 year to 2 years, 1 year to 3 years, 1 year to 4 years, 1 year to 5 years, 2 years to 3 years, 2 years to 4 years, 2 years to 5 years, 3 years to 4 years, 3 years to 5 years, or 4 years to 5 years.
[092] A composition disclosed herein can be formulated into any form that enables application of a composition disclosed herein in a manner that achieves a desired beneficial effect. In one embodiment, a composition disclosed herein can be formulated into, e.g., a single-phase formulation or a biphasic formulation comprising a medium phase and a dispersed phase. In another embodiment, a composition disclosed herein can be formulated into, e.g., a liquid composition, a colloidal composition, a semi-solid composition, or a solid composition. In another embodiment, a composition disclosed herein can be formulated into, e.g., a liquid aerosol, a foam, an emulsion, a gel, a sol, or a solid sol. In another embodiment, a composition disclosed herein can be formulated into, e.g., a spray, a liquid aerosol, a soap, or a suspension.
DK 181496 B1 35
[093] A composition disclosed herein comprises hypochlorous acid or free available chlorine, and metal particles and/or metal salts. A composition disclosed herein comprises 200 ppm to 1,000 ppm hypochlorous acid or free available chlorine, and 50 ppm to 500 ppm metal particles and/or metal salts.
[094] A composition disclosed herein comprises hypochlorous acid or free available chlorine, and silver nitrate. Optionally, a composition disclosed herein comprises 200 ppm to 1,000 ppm hypochlorous acid or free available chlorine, and 50 ppm to 500 ppm silver nitrate. Optionally, a composition disclosed herein comprises 300 ppm to 900 ppm hypochlorous acid or free available chlorine, and 100 ppm to 400 ppm silver nitrate. Optionally, a composition disclosed herein comprises 400 ppm to 800 ppm hypochlorous acid or free available chlorine, and 150 ppm to 350 ppm silver nitrate.
[095] Optionally, a composition disclosed herein comprises 430 ppm to 630 ppm hypochlorous acid or free available chlorine, and 200 ppm to 400 ppm silver nitrate. Optionally, a composition disclosed herein comprises 450 ppm to 610 ppm hypochlorous acid or free available chlorine and 220 ppm to 380 ppm silver nitrate. Optionally, a composition disclosed herein comprises 470 ppm to 590 ppm hypochlorous acid or free available chlorine and 240 ppm to 360 ppm silver nitrate. Optionally, a composition disclosed herein comprises 490 ppm to 570 ppm hypochlorous acid or free available chlorine and 260 ppm to 340 ppm silver nitrate. Optionally, a composition disclosed herein comprises 510 ppm to 550 ppm hypochlorous acid or free available chlorine and 280 ppm to 320 ppm silver nitrate. Optionally, a composition disclosed herein comprises 530 ppm hypochlorous acid or free available chlorine and 300 ppm silver nitrate.
[096] A composition disclosed herein comprises hypochlorous acid or free available chlorine, silver nitrate and titanium dioxide particles. Optionally, a composition disclosed herein comprises 200 ppm to 1,000 ppm hypochlorous acid or free available chlorine, 50 ppm to 500 ppm silver nitrate and 10 ppm to 400 ppm titanium dioxide particles. Optionally, a composition disclosed herein comprises 300 ppm to 900 ppm hypochlorous acid or free available chlorine, 100 ppm to 400 ppm silver nitrate and 25 ppm to 350 ppm titanium dioxide particles. Optionally, a composition disclosed herein comprises 400 ppm to 800 ppm hypochlorous acid or free available chlorine, 150 ppm to 350 ppm silver nitrate and 50 ppm to 250 ppm titanium dioxide particles.
[097] Optionally, a composition disclosed herein comprises 1 ppm to 200 ppm hypochlorous acid or free available chlorine, 50 ppm to 500 ppm silver nitrate and 10 ppm to 400 ppm titanium dioxide particles.
Optionally, a composition disclosed herein comprises 5 ppm to 175 ppm hypochlorous acid or free available chlorine, 100 ppm to 400 ppm silver nitrate and 25 ppm to 350 ppm titanium dioxide particles. Optionally, a composition disclosed herein comprises 10 ppm to 150 ppm hypochlorous acid or free available chlorine, 150 ppm to 350 ppm silver nitrate and 50 ppm to 250 ppm titanium dioxide particles.
[098] Optionally, a composition disclosed herein comprises 430 ppm to 630 ppm hypochlorous acid or free available chlorine, 100 ppm to 300 ppm silver nitrate and 50 ppm to 150 ppm titanium dioxide particles.
Optionally, a composition disclosed herein comprises 450 ppm to 610 ppm hypochlorous acid or free available chlorine, 120 ppm to 280 ppm silver nitrate and 60 ppm to 140 ppm titanium dioxide particles.
DK 181496 B1 36
Optionally, a composition disclosed herein comprises 470 ppm to 590 ppm hypochlorous acid or free available chlorine, 140 ppm to 260 ppm silver nitrate and 70 ppm to 130 ppm titanium dioxide particles.
Optionally, a composition disclosed herein comprises 490 ppm to 570 ppm hypochlorous acid or free available chlorine, 160 ppm to 240 ppm silver nitrate and 80 ppm to 120 ppm titanium dioxide particles.
Optionally, a composition disclosed herein comprises 510 ppm to 550 ppm hypochlorous acid or free available chlorine, 180 ppm to 220 ppm silver nitrate and 90 ppm to 110 ppm titanium dioxide particles.
Optionally, a composition disclosed herein comprises 530 ppm hypochlorous acid or free available chlorine, 200 ppm silver nitrate and 100 ppm titanium dioxide particles.
[099] A composition disclosed herein comprises hypochlorous acid or free available chlorine, a quaternary compound or silicone quaternary compound, and metal particles and/or metal salts. In
Optionally, a composition disclosed herein comprises hypochlorous acid or free available chlorine, a dialkyl quaternary compound or silicone dialkyl quaternary compound, and metal particles and/or metal salts. In
Optionally, a composition disclosed herein comprises hypochlorous acid or free available chlorine, dimethyloctadecyl[3-(trimethoxysilyl)propyljammonium chloride or tetradecyldimethyl-(3- trimethoxysilyl)propyl ammonium chloride, silver nitrate and titanium dioxide particles
[100] Optionally, a composition disclosed herein comprises 200 ppm to 1,000 ppm hypochlorous acid or free available chlorine, 200 ppm to 1,000 ppm dimethyloctadecyl[3-(trimethoxysilyl)propyljammonium chloride, 50 ppm to 500 ppm silver nitrate and 10 ppm to 400 ppm titanium dioxide particles. Optionally, a composition disclosed herein comprises 300 ppm to 900 ppm hypochlorous acid or free available chlorine, 300 ppm to 900 ppm dimethyloctadecyl[3-(trimethoxysilyl)propyljammonium chloride, 100 ppm to 400 ppm silver nitrate and 25 ppm to 350 ppm titanium dioxide particles. Optionally, a composition disclosed herein comprises 400 ppm to 800 ppm hypochlorous acid or free available chlorine, 400 ppm to 800 ppm dimethyloctadecyl[3-(trimethoxysilyl)propyljammonium chloride, 150 ppm to 350 ppm silver nitrate and 50 ppm to 250 ppm titanium dioxide particles.
[101] Optionally, a composition disclosed herein comprises 180 ppm to 380 ppm hypochlorous acid or free available chlorine, 200 ppm to 400 ppm dimethyloctadecyl[3-(trimethoxysilyl)propyljammonium chloride, 100 ppm to 300 ppm silver nitrate and 50 ppm to 150 ppm titanium dioxide particles. Optionally, a composition disclosed herein comprises 200 ppm to 360 ppm hypochlorous acid or free available chlorine, 220 ppm to 380 ppm dimethyloctadecyl[3-(trimethoxysilyl)propyljammonium chloride, 120 ppm to 280 ppm silver nitrate and 60 ppm to 140 ppm titanium dioxide particles. Optionally, a composition disclosed herein comprises 220 ppm to 340 ppm hypochlorous acid or free available chlorine, 240 ppm to 360 ppm dimethyloctadecyl[3-(trimethoxysilyl)propyljammonium chloride, 140 ppm to 260 ppm silver nitrate and 70 ppm to 130 ppm titanium dioxide particles. Optionally, a composition disclosed herein comprises 240 ppm to 320 ppm hypochlorous acid or free available chlorine, 260 ppm to 340 ppm dimethyloctadecyl[3- (trimethoxysilylpropyljammonium chloride, 160 ppm to 240 ppm silver nitrate and 80 ppm to 120 ppm titanium dioxide particles. Optionally, a composition disclosed herein comprises 260 ppm to 300 ppm hypochlorous acid or free available chlorine, 280 ppm to 320 ppm dimethyloctadecyl[3- (trimethoxysilylpropyljammonium chloride, 180 ppm to 220 ppm silver nitrate and 90 ppm to 110 ppm titanium dioxide particles. Optionally, a composition disclosed herein comprises 281 ppm hypochlorous
DK 181496 B1 37 acid or free available chlorine, 300 ppm dimethyloctadecyl[3-(trimethoxysilyl)propyljammonium chloride, 200 ppm silver nitrate and 100 ppm titanium dioxide particles.
[102] Optionally, a composition disclosed herein comprises 430 ppm to 630 ppm hypochlorous acid or free available chlorine, 400 ppm to 600 ppm dimethyloctadecyl[3-(trimethoxysilyl)propyljammonium chloride, 200 ppm to 400 ppm silver nitrate and 50 ppm to 150 ppm titanium dioxide particles. Optionally, a composition disclosed herein comprises 450 ppm to 610 ppm hypochlorous acid or free available chlorine, 420 ppm to 580 ppm dimethyloctadecyl[3-(trimethoxysilyl)propyljammonium chloride, 220 ppm to 380 ppm silver nitrate and 60 ppm to 140 ppm titanium dioxide particles. Optionally, a composition disclosed herein comprises 470 ppm to 590 ppm hypochlorous acid or free available chlorine, 440 ppm to 560 ppm dimethyloctadecyl[3-(trimethoxysilyl)propyljammonium chloride, 240 ppm to 360 ppm silver nitrate and 70 ppm to 130 ppm titanium dioxide particlesOptionally, a composition disclosed herein comprises 490 ppm to 570 ppm hypochlorous acid or free available chlorine, 460 ppm to 540 ppm dimethyloctadecyl[3- (trimethoxysilylpropyljammonium chloride, 260 ppm to 340 ppm silver nitrate and 80 ppm to 120 ppm titanium dioxide particles. Optionally, a composition disclosed herein comprises 510 ppm to 550 ppm hypochlorous acid or free available chlorine, 480 ppm to 520 ppm dimethyloctadecyl[3- (trimethoxysilylpropyljammonium chloride, 280 ppm to 320 ppm silver nitrate and 90 ppm to 110 ppm titanium dioxide particles. Optionally, a composition disclosed herein comprises 530 ppm hypochlorous acid or free available chlorine, 500 ppm dimethyloctadecyl[3-(trimethoxysilyl)propyljammonium chloride, 300 ppm silver nitrate and 100 ppm titanium dioxide particles.
[103] A composition disclosed herein comprises hypochlorous acid or free available chlorine, and a copper particle, a zinc particle, an iron particle or any combination thereof. Optionally, a composition disclosed herein comprises hypochlorous acid or free available chlorine, and a copper oxide particle, a zinc oxide particle, an iron oxide particle, or any combination thereof. Optionally, a composition disclosed herein comprises hypochlorous acid or free available chlorine, and a copper-zinc-iron oxide particle.
[104] Optionally, a composition disclosed herein comprises 200 ppm to 1,000 ppm hypochlorous acid or free available chlorine, and 50 ppm to 500 ppm of a copper particle, 50 ppm to 500 ppm of a zinc particle, 50 ppm to 500 ppm of an iron particle or any combination thereof. Optionally, a composition disclosed herein comprises 200 ppm to 1,000 ppm hypochlorous acid or free available chlorine, and 50 ppm to 500 ppm of a copper oxide particle, 50 ppm to 500 ppm of a zinc oxide particle, 50 ppm to 500 ppm of an iron oxide particle, or any combination thereof. Optionally, a composition disclosed herein comprises 200 ppm to 1,000 ppm hypochlorous acid or free available chlorine, and 50 ppm to 500 ppm of a copper-zinc-iron oxide particle.
[105] Optionally, a composition disclosed herein comprises 5 ppm to 200 ppm hypochlorous acid or free available chlorine, and 50 ppm to 500 ppm of a copper particle, 50 ppm to 500 ppm of a zinc particle, 50 ppm to 500 ppm of an iron particle or any combination thereof. Optionally, a composition disclosed herein comprises 5 ppm to 200 ppm hypochlorous acid or free available chlorine, and 50 ppm to 500 ppm of a copper oxide particle, 50 ppm to 500 ppm of a zinc oxide particle, 50 ppm to 500 ppm of an iron oxide
DK 181496 B1 38 particle, or any combination thereof. Optionally, a composition disclosed herein comprises 5 ppm to 200 ppm hypochlorous acid or free available chlorine, and 50 ppm to 500 ppm of a copper-zinc-iron oxide particle.
[106] Optionally, a composition disclosed herein comprises 400 ppm to 600 ppm hypochlorous acid or free available chlorine and 1 ppm to 400 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 400 ppm to 600 ppm hypochlorous acid or free available chlorine and 25 ppm to 300 ppm copper zinc iron oxide particles.
[107] Optionally, a composition disclosed herein comprises 400 ppm to 600 ppm hypochlorous acid or free available chlorine, and 1 ppm to 50 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 420 ppm to 580 ppm hypochlorous acid or free available chlorine, and 5 ppm to 45 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 440 ppm to 560 ppm hypochlorous acid or free available chlorine, and 10 ppm to 40 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 460 ppm to 540 ppm hypochlorous acid or free available chlorine, and 15 ppm to 35 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 480 ppm to 520 ppm hypochlorous acid or free available chlorine, and 20 ppm to 30 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 500 ppm hypochlorous acid or free available chlorine, and 25 ppm copper zinc iron oxide particles.
[108] Optionally, a composition disclosed herein comprises 400 ppm to 600 ppm hypochlorous acid or free available chlorine, and 1 ppm to 100 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 420 ppm to 580 ppm hypochlorous acid or free available chlorine, and 10 ppm to 90 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 440 ppm to 560 ppm hypochlorous acid or free available chlorine, and 20 ppm to 80 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 460 ppm to 540 ppm hypochlorous acid or free available chlorine, and 30 ppm to 70 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 480 ppm to 520 ppm hypochlorous acid or free available chlorine, and 40 ppm to 60 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 500 ppm hypochlorous acid or free available chlorine, and 50 ppm copper zinc iron oxide particles.
[109] Optionally, a composition disclosed herein comprises 400 ppm to 600 ppm hypochlorous acid or free available chlorine, and 50 ppm to 150 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 420 ppm to 580 ppm hypochlorous acid or free available chlorine, and 60 ppm to 140 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 440 ppm to 560 ppm hypochlorous acid or free available chlorine, and 70 ppm to 130 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 460 ppm to 540 ppm hypochlorous acid or free available chlorine, and 80 ppm to 120 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 480 ppm to 520 ppm hypochlorous acid or free available chlorine, and 90 ppm to 110 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 500 ppm hypochlorous acid or free available chlorine, and 100 ppm copper zinc iron oxide particles.
DK 181496 B1 39
[110] Optionally, a composition disclosed herein comprises 400 ppm to 600 ppm hypochlorous acid or free available chlorine, and 100 ppm to 200 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 420 ppm to 580 ppm hypochlorous acid or free available chlorine, and 110 ppm to 190 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 440 ppm to 560 ppm hypochlorous acid or free available chlorine, and 120 ppm to 180 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 460 ppm to 540 ppm hypochlorous acid or free available chlorine, and 130 ppm to 170 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 480 ppm to 520 ppm hypochlorous acid or free available chlorine, and 140 ppm to 160 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 500 ppm hypochlorous acid or free available chlorine, and 150 ppm copper zinc iron oxide particles.
[111] Optionally, a composition disclosed herein comprises 400 ppm to 600 ppm hypochlorous acid or free available chlorine, and 150 ppm to 250 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 420 ppm to 580 ppm hypochlorous acid or free available chlorine, and 160 ppm to 240 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 440 ppm to 560 ppm hypochlorous acid or free available chlorine, and 170 ppm to 230 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 460 ppm to 540 ppm hypochlorous acid or free available chlorine, and 180 ppm to 220 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 480 ppm to 520 ppm hypochlorous acid or free available chlorine, and 190 ppm to 210 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 500 ppm hypochlorous acid or free available chlorine, and 200 ppm copper zinc iron oxide particles.
[112] Optionally, a composition disclosed herein comprises 400 ppm to 600 ppm hypochlorous acid or free available chlorine, and 200 ppm to 300 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 420 ppm to 580 ppm hypochlorous acid or free available chlorine, and 210 ppm to 290 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 440 ppm to 560 ppm hypochlorous acid or free available chlorine, and 220 ppm to 280 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 460 ppm to 540 ppm hypochlorous acid or free available chlorine, and 230 ppm to 270 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 480 ppm to 520 ppm hypochlorous acid or free available chlorine, and 240 ppm to 260 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 500 ppm hypochlorous acid or free available chlorine, and 250 ppm copper zinc iron oxide particles.
[113] Optionally, a composition disclosed herein comprises 400 ppm to 600 ppm hypochlorous acid or free available chlorine, and 250 ppm to 350 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 420 ppm to 580 ppm hypochlorous acid or free available chlorine, and 260 ppm to 340 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 440 ppm to 560 ppm hypochlorous acid or free available chlorine, and 270 ppm to 330 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 460 ppm to 540 ppm hypochlorous acid or free available chlorine, and 280 ppm to 320 ppm copper zinc iron oxide particles. Optionally, a composition
DK 181496 B1 40 disclosed herein comprises 480 ppm to 520 ppm hypochlorous acid or free available chlorine, and 290 ppm to 310 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 500 ppm hypochlorous acid or free available chlorine, and 300 ppm copper zinc iron oxide particles.
[114] Optionally, a composition disclosed herein comprises 5 ppm to 200 ppm hypochlorous acid or free available chlorine and 1 ppm to 400 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 5 ppm to 200 ppm hypochlorous acid or free available chlorine and 25 ppm to 300 ppm copper zinc iron oxide particles.
[115] Optionally, a composition disclosed herein comprises 5 ppm to 150 ppm hypochlorous acid or free available chlorine and 1 ppm to 400 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 5 ppm to 150 ppm hypochlorous acid or free available chlorine and 25 ppm to 300 ppm copper zinc iron oxide particles.
[116] Optionally, a composition disclosed herein comprises 5 ppm to 100 ppm hypochlorous acid or free available chlorine and 1 ppm to 400 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 5 ppm to 100 ppm hypochlorous acid or free available chlorine and 25 ppm to 300 ppm copper zinc iron oxide particles.
[117] Optionally, a composition disclosed herein comprises 5 ppm to 75 ppm hypochlorous acid or free available chlorine and 1 ppm to 400 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 5 ppm to 75 ppm hypochlorous acid or free available chlorine and 25 ppm to 300 ppm copper zinc iron oxide particles.
[118] Optionally, a composition disclosed herein comprises 5 ppm to 50 ppm hypochlorous acid or free available chlorine and 1 ppm to 400 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 5 ppm to 50 ppm hypochlorous acid or free available chlorine and 25 ppm to 300 ppm copper zinc iron oxide particles.
[119] Optionally, a composition disclosed herein comprises 1 ppm to 50 ppm hypochlorous acid or free available chlorine, and 1 ppm to 50 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 5 ppm to 45 ppm hypochlorous acid or free available chlorine, and 5 ppm to 45 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 10 ppm to 40 ppm hypochlorous acid or free available chlorine, and 10 ppm to 40 ppm copper zinc iron oxide particles.
Optionally, a composition disclosed herein comprises 15 ppm to 35 ppm hypochlorous acid or free available chlorine, and 15 ppm to 35 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 20 ppm to 30 ppm hypochlorous acid or free available chlorine, and 20 ppm to 30 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 25 ppm hypochlorous acid or free available chlorine, and 25 ppm copper zinc iron oxide particles.
DK 181496 B1 41
[120] Optionally, a composition disclosed herein comprises 1 ppm to 50 ppm hypochlorous acid or free available chlorine, and 1 ppm to 100 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 5 ppm to 45 ppm hypochlorous acid or free available chlorine, and 10 ppm to 90 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 10 ppm to 40 ppm hypochlorous acid or free available chlorine, and 20 ppm to 80 ppm copper zinc iron oxide particles.
Optionally, a composition disclosed herein comprises 15 ppm to 35 ppm hypochlorous acid or free available chlorine, and 30 ppm to 70 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 20 ppm to 30 ppm hypochlorous acid or free available chlorine, and 40 ppm to 60 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 25 ppm hypochlorous acid or free available chlorine, and 50 ppm copper zinc iron oxide particles.
[121] Optionally, a composition disclosed herein comprises 1 ppm to 50 ppm hypochlorous acid or free available chlorine, and 50 ppm to 150 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 5 ppm to 45 ppm hypochlorous acid or free available chlorine, and 60 ppm to 140 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 10 ppm to 40 ppm hypochlorous acid or free available chlorine, and 70 ppm to 130 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 15 ppm to 35 ppm hypochlorous acid or free available chlorine, and 80 ppm to 120 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 20 ppm to 30 ppm hypochlorous acid or free available chlorine, and 90 ppm to 110 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 25 ppm hypochlorous acid or free available chlorine, and 100 ppm copper zinc iron oxide particles.
[122] Optionally, a composition disclosed herein comprises 1 ppm to 50 ppm hypochlorous acid or free available chlorine, and 100 ppm to 200 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 5 ppm to 45 ppm hypochlorous acid or free available chlorine, and 110 ppm to 190 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 10 ppm to 40 ppm hypochlorous acid or free available chlorine, and 120 ppm to 180 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 15 ppm to 35 ppm hypochlorous acid or free available chlorine, and 130 ppm to 170 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 20 ppm to 30 ppm hypochlorous acid or free available chlorine, and 140 ppm to 160 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 25 ppm hypochlorous acid or free available chlorine, and 150 ppm copper zinc iron oxide particles.
[123] Optionally, a composition disclosed herein comprises 1 ppm to 50 ppm hypochlorous acid or free available chlorine, and 150 ppm to 250 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 5 ppm to 45 ppm hypochlorous acid or free available chlorine, and 160 ppm to 240 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 10 ppm to ppm hypochlorous acid or free available chlorine, and 170 ppm to 230 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 15 ppm to 35 ppm hypochlorous acid or free available chlorine, and 180 ppm to 220 ppm copper zinc iron oxide particles. Optionally, a composition 40 disclosed herein comprises 20 ppm to 30 ppm hypochlorous acid or free available chlorine, and 190 ppm
DK 181496 B1 42 to 210 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 25 ppm hypochlorous acid or free available chlorine, and 200 ppm copper zinc iron oxide particles.
[124] Optionally, a composition disclosed herein comprises 1 ppm to 50 ppm hypochlorous acid or free available chlorine, and 200 ppm to 300 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 5 ppm to 45 ppm hypochlorous acid or free available chlorine, and 210 ppm to 290 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 10 ppm to 40 ppm hypochlorous acid or free available chlorine, and 220 ppm to 280 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 15 ppm to 35 ppm hypochlorous acid or free available chlorine, and 230 ppm to 270 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 20 ppm to 30 ppm hypochlorous acid or free available chlorine, and 240 ppm to 260 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 25 ppm hypochlorous acid or free available chlorine, and 250 ppm copper zinc iron oxide particles.
[125] Optionally, a composition disclosed herein comprises 1 ppm to 50 ppm hypochlorous acid or free available chlorine, and 250 ppm to 350 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 5 ppm to 45 ppm hypochlorous acid or free available chlorine, and 260 ppm to 340 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 10 ppm to 40 ppm hypochlorous acid or free available chlorine, and 270 ppm to 330 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 15 ppm to 35 ppm hypochlorous acid or free available chlorine, and 280 ppm to 320 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 20 ppm to 30 ppm hypochlorous acid or free available chlorine, and 290 ppm to 310 ppm copper zinc iron oxide particles. Optionally, a composition disclosed herein comprises 25 ppm hypochlorous acid or free available chlorine, and 300 ppm copper zinc iron oxide particles.
[126] A composition disclosed herein comprises hypochlorous acid or free available chlorine, and one or more metal salts. Optionally, a composition disclosed herein comprises hypochlorous acid or free available chlorine, and a copper salt, a zinc salt, an iron salt or any combination thereof. Optionally, a composition disclosed herein comprises hypochlorous acid or free available chlorine, and a copper salt, a zinc salt and an iron salt. Optionally, a composition disclosed herein comprises hypochlorous acid or free available chlorine, and a copper chloride, a zinc chloride, an iron chloride or any combination thereof. According to the invention, a composition comprises hypochlorous acid or free available chlorine, and a copper chloride, a zinc chloride and an iron chloride. The iron chloride can be iron (II) chloride or iron (lll) chloride.
[127] Aspects of the present specification disclose a kit. In one embodiment, the kit can comprise a container including a composition disclosed herein. In another embodiment, a kit can comprise one or more containers, each container including an individual component or more than one individual component disclosed herein in combination. For example, a kit can comprise one container including hypochlorous acid or free available chlorine and a second container including one or more metallic particles. As another example, a kit can comprise one container including hypochlorous acid or free available chlorine and a second container including copper zinc iron oxide particles. As yet another example, a kit can comprise
DK 181496 B1 43 one container including one or more alcohols and a second container including one or more guanide- containing compounds. As still another example, a kit can comprise one container including isopropanol and a second container including polyhexamethylene biguanide. As a further example, a kit can comprise one container including hypochlorous acid or free available chlorine and a second container including one or more quaternary compounds or silicon quaternary compounds. As another example, a kit can comprise one container including hypochlorous acid or free available chlorine and a second container including dimethyloctadecyl[3-(trimethoxysilyl)propyljammonium chloride. The remainder of the components of a composition disclosed herein may be included in either the first or second container, or may be separately including in at least a third container. For example, a third container including a rinse solution disclosed herein can be included in the kit. Packaging of individual components into separate container can assist in prolonging the stability of the individual components, and thus shelf life of the product.
[128] In another example, a kit can comprise one container including hypochlorous acid and/or free available chlorine, a second container including one or more metallic particles, and a third container including a rinse solution. As another example, a kit can comprise one container including hypochlorous acid and/or free available chlorine, a second container including copper zinc iron oxide particles, and a third container including a rinse solution. As yet another example, a kit can comprise one container including one or more alcohols, a second container including one or more guanide-containing compounds, and a third container including a rinse solution. As still another example, a kit can comprise one container including isopropanol, a second container including polyhexamethylene biguanide, and a third container including a rinse solution. As a further example, a kit can comprise one container including hypochlorous acid or free available chlorine, a second container including one or more quaternary compounds or silicon quaternary compounds, and a third container including a rinse solution. As another example, a kit can comprise one container including hypochlorous acid or free available chlorine, a second container including dimethyloctadecyl[3-(trimethoxysilyl)propyljammonium chloride, and a third container including a rinse solution. As another example, a kit can comprise one container including isopropanol, a second container including polyhexamethylene biguanide, a third container including one or more cationic surfactants, and a fourth container including a rinse solution.
[129] In another embodiment, a kit can comprise one container including a composition disclosed herein and a second container including a rinse solution disclosed herein. For example, a kit can comprise one container including hypochlorous acid and/or free available chlorine and one or more metallic particles and a second container including a rinse solution. As another example, a kit can comprise one container including hypochlorous acid and/or free available chlorine and copper zinc iron oxide particles and a second container including a rinse solution. As yet another example, a kit can comprise one container including one or more alcohols and one or more guanide-containing compounds and a second container including a rinse solution. As still another example, a kit can comprise one container including isopropanol and polyhexamethylene biguanide and a second container including a rinse solution. As a further example, a kit can comprise one container including hypochlorous acid and/or free available chlorine and one or more quaternary compounds or silicon quaternary compounds and a second container including a rinse solution.
As another example, a kit can comprise one container including hypochlorous acid and/or free available
DK 181496 B1 44 chlorine and dimethyloctadecyl[3-(trimethoxysilyl)propyllammonium chloride and a second container including a rinse solution. The remainder of the components of a composition disclosed herein may be included in either the first container or may be separately including in at least a third container. Packaging of individual components into separate container can assist in prolonging the stability of the individual components, and thus shelf life of the product.
[130] A kit disclosed herein can comprise a delivery or application system. The delivery or application system of the kit are useful for applying a composition disclosed herein, and/or individual components disclosed herein to a site of interest, such as, e.g., a surface of a device disclosed herein. A delivery or application system disclosed herein, includes, without limitation, one or more of an applicator brush, porous foam swab or pad, hollow tube, dipstick, or a combination thereof. In an embodiment, a kit comprises a single delivery or application system. In another embodiment, a kit comprises a plurality delivery or application systems. For example, in a 30-day supply kit, there can be 30 delivery or application systems, such that there is one delivery or application system per day for 30 days. Alternately, there can be 2, 10, 20, 30, 40, 50, 60, 90, 120, etc. delivery or application systems per kit. Within the kit, the delivery or application system may be packaged individually, orin sets of 2 or more. The delivery or application system can be packaged such that it remains sterile until use. In certain embodiments, a delivery or application system disclosed herein can be packaged in plastic sheaths. Further, to prevent contamination, delivery or application system disclosed herein is preferably single-use, disposable delivery or application system.
[131] The kit can also comprise a set of instructions. The instructions may include information useful to the end user such as how to use a delivery or application system to apply a composition and/or individual components disclosed herein, and/or how often to apply a composition and/or individual components disclosed herein. In addition, such instructions may include information regarding how to mix the individual components disclosed herein to form a composition disclosed herein. Such instructions can indicate that mixing should be done at a certain time before application, such as, e.qg., just prior to use. Instructions disclosed herein may also include information regarding how to apply the individual components disclosed herein directly to a site of interest, such as, e.qg., a surface of a device disclosed herein, and in what order the individual components should be applied to such sites of interest.
[132] The contents of the kit, including the container including a composition or component disclosed herein, the delivery or application system, and instructions, are enclosed in an outer casing. The outer casing can be a box, a sealed bag, a foil pouch, etc. In certain embodiments, the delivery system, container and instructions are enclosed in a box. In other embodiments of the kit, the container and instructions are contained in a first box, the delivery system is contained in a second box, and the first and second box are contained together in a third box.
[133] The presently disclosed compositions are useful in any application involving the cleansing, disinfecting or sterilizing. In one embodiment, a composition disclosed herein is used to clean, disinfect or sterilize a device. In one embodiment, a composition disclosed herein is used to clean, disinfect or sterilize an endoscope. In one embodiment, a composition disclosed herein is used to clean, disinfect or sterilize a
DK 181496 B1 45 hard surface. In one embodiment, a composition disclosed herein is useful in any application were hypochlorous acid is applied or administered.
[134] Aspects of the present specification disclose a method to clean, disinfect and/or sterilize a device.
In one embodiment, a method disclosed herein comprises applying a composition disclosed herein to a device for a specified amount of time, wherein application results in the cleaning, disinfecting and/or sterilization of the device. In another aspect of this embodiment, a method disclosed herein further comprises rinsing the cleaned, disinfected and/or sterilized device with a rinse solution disclosed herein.
Other aspects of the present specification disclose a composition disclosed herein for use to clean, disinfect and/or sterilize a device, including a medical device. Yet other aspects of the present specification disclose a use of a disclosed composition to clean, disinfect and/or sterilize a device, including a medical device.
[135] Aspects of the present specification disclose a method to clean, disinfect and/or sterilize an endoscope. In an aspect of this embodiment, a method disclosed herein comprises applying a composition disclosed herein to an endoscope for a specified amount of time, wherein application results in the cleaning, disinfecting and/or sterilization of the endoscope. In another aspect of this embodiment, a method disclosed herein further comprises rinsing the cleaned, disinfected and/or sterilized endoscope with a rinse solution disclosed herein. Other aspects of the present specification disclose a composition disclosed herein for use to clean, disinfect and/or sterilize an endoscope. Yet other aspects of the present specification disclose a use of a disclosed composition to clean, disinfect and/or sterilize an endoscope.
[136] A device, including a medical device is cleaned by removal of visible soil, such as, e.g., organic and inorganic material, from objects and surfaces and normally is accomplished manually or mechanically.
Thorough cleaning is essential before disinfection and sterilization because inorganic and organic materials that remain on the surfaces of a medical device interferes with the effectiveness of these processes.
[137] A device, including a medical device is disinfected by eliminating many or all pathogenic microorganisms, except bacterial spores. Disinfection is less lethal than sterilization because it destroys most recognized pathogenic microorganisms but not necessarily all microbial forms (e.g., bacterial spores).
A medical device is sterilized by destroying or eliminating all forms of microorganisms. Decontamination of a medical device removes pathogenic microorganisms from a medical device so that it is safe to handle, use, or discard.
[138] A medical device is an instrument, apparatus, material, or other article, whether used alone or in combination, including software necessary for its application, intended by the manufacturer to be used for human beings for diagnosis, prevention, monitoring treatment, or alleviation of disease; diagnosis, monitoring, treatment, or alleviation of or compensation for an injury or handicap; investigation, replacement, or modification of the anatomy or of a physiologic process; or control of conception, and that does not achieve its primary intended action in or on the human body by pharmacologic, immunologic, or metabolic means but might be assisted in its function by such means. A medical device includes, without limitation, a surgical instrument, a respiratory therapy instrument, an anesthesia instrument, a catheter, an
DK 181496 B1 46 implant, a probe, an endoscope, an arthroscope, a laparoscope, a blade, a cystoscope, a spirometer, a
CPAP mask and tubing, dialysis instrument and accessories, a heart-lung machine and accessories, a heart-lung bypass machine and accessories, and a diaphragm fitting ring. Non-limiting examples of a probe includes an ultrasound probe and an esophageal manometry probe. Non-limiting examples of a catheter includes a cardiac catheter, an urinary catheter, an anorectal manometry catheter. Non-limiting examples of an endoscope includes a gastrointestinal endoscope, a bronchoscope, and a nasopharyngoscope. Non- limiting examples of a blade includes a laryngoscope blade.
[139] Aspects of the present specification disclose a method to clean, disinfect and/or sterilize a hard surface area. In an aspect of this embodiment, a method disclosed herein comprises applying a composition disclosed herein to a hard surface area for a specified amount of time, wherein application results in the cleaning, disinfecting and/or sterilization of the hard surface area. In another aspect of this embodiment, a method disclosed herein further comprises rinsing the cleaned, disinfected and/or sterilized surface with a rinse solution disclosed herein. Other aspects of the present specification disclose a composition disclosed herein for use to clean, disinfect and/or sterilize a hard surface area. Yet other aspects of the present specification disclose a use of a disclosed composition to clean, disinfect and/or sterilize a hard surface area. A hard surface area can be a porous surface area or a non-porous surface area.
[140] In another aspect of this embodiment, a method disclosed herein comprises applying one or more individual components disclosed herein to a hard surface area for a specified amount of time, wherein application results in the cleaning, disinfecting and/or sterilization of the hard surface area. In an aspect of this embodiment, the one or more individual components include a first component including hypochlorous acid or free available chlorine and a second component including one or more disinfectants. In another aspect, application of the one or more individual components occur in a specific order, such as. e.g., first applying a first component including hypochlorous acid or free available chlorine and then applying a second component including one or more disinfectants. A hard surface area can be a porous surface area or a non-porous surface area.
[141] A hard surface area can include any items present in a residence or a commercial, industrial and/or agricultural facility, such as, e.g., a hospital, a laboratory, a restaurant, an educational center, a food- processing facility, a dairy-processing facility, an airport, an oil field system, a sport facility, a shipping dock, a freight transport center, or any other commercial or industrial setting. A surface area can include any type of transportation carrier, such as, e.g., a water vessel like a boat, barge or ship, an aircraft like an airplane or helicopter, a ground vehicle like a motorcycle, car, truck or train, A surface area may be made of any material including brass, copper, aluminum, stainless steel, carbon steel, rubber, plastic, glass, wood, painted surface, or any combination thereof. A surface area includes, without limitation, a table top, counter top, floor, wall, ceiling, window, bed, gurney, door, door handle, shower, bath, sink, faucet, toilet, toilet seat, drain, equipment, machinery, personal protective gear, personal biohazard gear, and the like. A surface area may comprise a medical, dental, pharmaceutical, veterinary or mortuary device. A surface area may comprise human skin.
DK 181496 B1 47
[142] A composition or component disclosed herein can be applied to a hard surface area according to a method disclosed herein as often as needed and/or desired. A composition disclosed herein can be applied to a hard surface area daily, every other day, every third of day, once a week, multiple times per week, once a month, multiple times per month, once a year or multiple times per year, as desired. A composition disclosed herein can be applied to a hard surface area multiple times per day, e.g., twice a day, three times a day, four time a day, five times a day, six times a day or as often as desired.
[143] The presently disclosed compositions are useful in any application involving treating an individual.
The presently disclosed compositions are useful in any application involving medical use, veterinarian use, or both. In one embodiment, a composition disclosed herein is useful in any application were hypochlorous acid is applied or administered.
[144] In one embodiment, the presently disclosed compositions are useful in any application involving treating a tissue in an individual. For example, the compositions disclosed herein can be used to treat a wound by enhancing angiogenesis in an area in and around a wound, or promoting rapid healing of a wound.
[145] In one embodiment, the presently disclosed compositions are useful in any application involving treating a wound in an individual. For example, the compositions disclosed herein can be used to treat a wound by enhancing angiogenesis in an area in and around a wound, or promoting rapid healing of a wound. A wound can be an open wound, a closed wound or a burn. Non-limiting examples, of an open wound include a laceration, an abrasion, an incision, a puncture, an avulsion, an ulcer, and a tear. Non- limiting examples, of a closed wound includes a bruise, a contusion and a hematoma.
[146] Aspects of the present specification disclose a composition disclosed herein for use to clean, disinfect and/or sterilize a wound, for example by applying a composition disclosed herein to a wound for a specified amount of time, or by rinsing the cleaned, disinfected and/or sterilized wound with a rinse solution disclosed herein. Yet other aspects of the present specification disclose a use of a disclosed composition to clean, disinfect and/or sterilize a wound, for example by applying a composition disclosed herein to a wound for a specified amount of time, or by rinsing the cleaned, disinfected and/or sterilized wound with a rinse solution disclosed herein.
[147] Aspects of the present specification disclose a composition disclosed herein for use to treat a wound. Yet other aspects of the present specification disclose a use of a disclosed composition to treat a wound. A wound can be an external wound on, e.g., a surface area of an individual or an internal wound located in the body or body cavity of an individual.
[148] In one embodiment, the presently disclosed compositions are useful in any application involving a microbial infection in an individual. A microbial infection includes a viral infection, a bacterial infection and
DK 181496 B1 48 a fungal infection. A microbial infection can be an external infection on, e.g., a surface area of an individual or an internal infection, e.g., a mercer infection or sepsis, located in the body or body cavity of an individual.
[149] Aspects of the present specification disclose a composition disclosed herein for use to clean, disinfect and/or sterilize a microbial infection, for example by applying a composition disclosed herein to a microbial infection for a specified amount of time, wherein application results in a cleaning, disinfecting and/or sterilization of the microbial infection, or by rinsing the cleaned, disinfected and/or sterilized microbial infection with a rinse solution disclosed herein. Yet other aspects of the present specification disclose a use of a disclosed composition to clean, disinfect and/or sterilize a microbial infection, for example by applying a composition disclosed herein to a microbial infection for a specified amount of time, wherein application results in a cleaning, disinfecting and/or sterilization of the microbial infection, or by rinsing the cleaned, disinfected and/or sterilized microbial infection with a rinse solution disclosed herein.
[150] In one embodiment, a composition disclosed herein is used to clean, disinfect or sterilize a body part of an individual. Non-limiting examples of uses for a composition disclosed herein include cleaning/disinfecting tissue in wound care, pre-operative preparation, and surgery or other invasive procedure, cleaning/disinfecting a skin region in dermatological applications, and cleaning/disinfecting the eye in ophthalmological applications.
[151] Aspects of the present specification disclose a composition disclosed herein for use to treat a microbial infection, for example by applying a composition disclosed herein to a microbial infection for a specified amount of time, wherein application results in a reduction, elimination and/or killing microbes causing the microbial infection, or by rinsing the treated microbial infection with a rinse solution disclosed herein. Yet other aspects of the present specification disclose a use of a disclosed composition to treat a microbial infection, for example by applying a composition disclosed herein to a microbial infection for a specified amount of time, wherein application results in a reduction, elimination and/or killing microbes causing the microbial infection, or by rinsing the treated microbial infection with a rinse solution disclosed herein.
[152] A dermatological application refers to cleaning/disinfecting a skin region of an individual of a microbial infection, such as, e.g., a viral, bacterial or fungal infection. Non-limiting examples of a microbial infection of a skin region include urinary tract infection, eye lid wash, cataract treatment, warts, cutaneous leishmaniasis, candidal vulvovagititis, derrmatophytoses, bromhidrosis, pityriasis versicolor, acne vulgarish, rosasea, hydradenitis suppurativa, psoriasis, eczema, alopecia areata, oral lichen planus, xeroderma pigmentosum, actinic keratoses, melasma, keloids, and anti-aging.
[153] An ophthalmological application refers to cleaning/disinfecting an eye of an individual of a microbial infection, such as, e.g., a viral, bacterial or fungal infection. Non-limiting examples of a microbial infection of an eye include a bacterial conjunctivitis, a viral conjunctivitis, an epidemic keratoconjunctivitis, a pharyngoconjunctival fever, a stye, a blephartis, an episcleritis, a keratitis, a trachoma, and a corneal ulcer.
DK 181496 B1 49
[154] The presently disclosed compositions are useful in any application involving treating and/or providing relief of an inflammation, an ache and/or a pain in an individual.
[155] Aspects of the present specification disclose a composition disclosed herein for use to treat an inflammation, an ache and/or a pain, for example by applying a composition disclosed herein to an area of inflammation, an ache and/or a pain for a specified amount of time, wherein application results in a reduction and/or elimination of the pain, or by rinsing the treated area with a rinse solution disclosed herein. Yet other aspects of the present specification disclose a use of a disclosed composition to treat an inflammation, an ache and/or a pain, for example by applying a composition disclosed herein to an area of inflammation, an ache and/or a pain for a specified amount of time, wherein application results in a reduction and/or elimination of the pain, or by rinsing the treated area with a rinse solution disclosed herein.
[156] The presently disclosed compositions are useful in enteral and parenteral applications, including oral, injectable and topical applications. For example, the compositions disclosed herein can be used to clean, disinfect or sterilize a body region injured by a wound or infected with a microbe.
[157] Aspects of the present specification disclose a composition disclosed herein for use to clean, disinfect and/or sterilize a microbial infection in an individual, for example by applying a composition disclosed herein to an individual for a specified amount of time, wherein application results in the cleaning, disinfecting and/or sterilization of a microbial infection in the individual. Yet other aspects of the present specification disclose a use of a disclosed composition to clean, disinfect and/or sterilize a microbial infection in an individual, for example by applying a composition disclosed herein to an individual for a specified amount of time, wherein application results in the cleaning, disinfecting and/or sterilization of a microbial infection in the individual. Still other aspects of the present specification disclose a composition disclosed herein for the manufacture of a medicament to clean, disinfect and/or sterilize a microbial infection in an individual, for example by applying a composition disclosed herein to an individual for a specified amount of time, wherein application results in the cleaning, disinfecting and/or sterilization of a microbial infection in the individual.
[158] A use disclosed herein applies a composition disclosed herein to an individual. An individual refers to any animal including, without limitation, a fish, an amphibian, a bird and a mammal. A mammal includes a human, a horse, a cow, a sheep, a dog and a cat. As such, a use disclosed herein is for human use as well as veterinarian use.
[159] In applications to an individual, a composition disclosed herein can be applied to a skin surface or can be internally administered. In one embodiment, a composition disclosed herein is applied topically to a skin region of an individual in order to clean, disinfect and/or sterilize the skin region. A skin region, includes, without limitation, the face, forehead, lips, scalp, neck, shoulder, arms, hands, thighs, legs, knees, feet, chest, breast, back, groin, buttocks, and the like.
DK 181496 B1 50
[160] In one embodiment, a composition disclosed herein is internally administered to an individual. Such routes of administration include enteral routes of administration and parenteral routes of administration.
[161] A composition disclosed herein can be applied according to a use disclosed herein to a skin region.
Application of a composition disclosed herein can be by rubbing, pouring, sprinkling, or spraying on, or otherwise applied to the human body. A composition disclosed herein can be applied by introducing the composition into or onto a solid support such as, e.g., a wipe, a towelette, a towel, a mitt, a glove, or a mask and then applying the composition to a skin region. A composition disclosed herein can be applied by using a delivery device, such as, e.g., an aerosol dispenser, a pump spray, a trigger spray, a squeeze bottle, a topical patch, a transdermal patch, or a dermal implant to apply the composition to a skin region.
[162] A composition disclosed herein can be applied to an individual according to a use disclosed herein as often as needed and/or desired. A composition disclosed herein can be applied to an individual daily, every other day, every third of day, once a week, multiple times per week, once a month, multiple times per month, once a year or multiple times per year, as desired. A composition disclosed herein can be applied to an individual multiple times per day, e.g., twice a day, three times a day, four time a day, five times a day, six times a day or as often as desired.
[163] The presently disclosed compositions are useful in food product, poultry, meat, vegetable production. For example, the compositions disclosed herein can be used to clean, disinfect or sterilize machinery, instruments, tables, rooms, including floors, ceilings and walls and any other hard surface from microbial contamination.
[164] The presently disclosed compositions are useful in formulations on plants as a preservative or pesticide. For example, the compositions disclosed herein can be used to clean, disinfect or sterilize a plant injured by a wound or infected with a microbe.
[165] The presently disclosed compositions are useful in formulations on cut flowers to prolong freshness and health. For example, the compositions disclosed herein can be used to clean, disinfect or sterilize a cut flower at a wound or to prevent microbial infection.
[166] A disclosed use applies a composition disclosed herein for specified amount of time. In one embodiment, a specified amount of time is a time sufficient to clean a medical device, a surface, or an individual. In another embodiment, a specified amount of time is a time sufficient to disinfect a medical device, a surface, or an individual. In yet another embodiment, a specified amount of time is a time sufficient to sterilize a medical device, a surface, or an individual.
[167] In aspects of this embodiment, a composition disclosed herein is applied to a device, like a medical device, a surface, or an individual for, e.g., about 1 minute, about 5 minutes, about 10 minutes, about 15 minutes, about 20 minutes, about 25 minutes, about 30 minutes, about 35 minutes, about 40 minutes, about minutes, about 50 minutes, about 55 minutes, about 60 minutes, about 70 minutes, about 80 minutes,
DK 181496 B1 51 about 90 minutes, about 100 minutes, about 110 minutes, or about 120 minutes. In other aspects of this embodiment, a composition disclosed herein is applied to a device, like a medical device, a surface, or an individual for, e.g., at least 1 minute, at least 5 minutes, at least 10 minutes, at least 15 minutes, at least 20 minutes, at least 25 minutes, at least 30 minutes, at least 35 minutes, at least 40 minutes, at least 45 minutes, at least 50 minutes, at least 55 minutes, at least 60 minutes, at least 70 minutes, at least 80 minutes, at least 90 minutes, at least 100 minutes, at least 110 minutes, or at least 120 minutes. In yet other aspects of this embodiment, a composition disclosed herein is applied to device, like a medical device, a surface, or an individual for, e.g., at most 1 minute, at most 5 minutes, at most 10 minutes, at most 15 minutes, at most 20 minutes, at most 25 minutes, at most 30 minutes, at most 35 minutes, at most 40 minutes, at most 45 minutes, at most 50 minutes, at most 55 minutes, at most 60 minutes, at most 70 minutes, at most 80 minutes, at most 90 minutes, at most 100 minutes, at most 110 minutes, or at most 120 minutes.
[168] In still other aspects of this embodiment, a composition disclosed herein is applied to a device, like a medical device, a surface, or an individual for, e.g., 1 minute to 5 minutes, 1 minute to 10 minutes, 1 minute to 15 minutes, 1 minute to 20 minutes, 1 minute to 25 minutes, 1 minute to 30 minutes, 1 minute to 35 minutes, 1 minute to 40 minutes, 1 minute to 45 minutes, 1 minute to 50 minutes, 1 minute to 55 minutes, 1 minute to 60 minutes, 5 minutes to 10 minutes, 5 minutes to 15 minutes, 5 minutes to 20 minutes, 5 minutes to 25 minutes, 5 minutes to 30 minutes, 5 minutes to 35 minutes, 5 minutes to 40 minutes, 5 minutes to 45 minutes, 5 minutes to 50 minutes, 5 minutes to 55 minutes, 5 minutes to 60 minutes, 5 minutes to 70 minutes, 5 minutes to 80 minutes, 5 minutes to 90 minutes, 5 minutes to 100 minutes, 5 minutes to 110 minutes, 5 minutes to 120 minutes, 10 minutes to 15 minutes, 10 minutes to 20 minutes, 10 minutes to 25 minutes, 10 minutes to 30 minutes, 10 minutes to 35 minutes, 10 minutes to 40 minutes, 10 minutes to 45 minutes, 10 minutes to 50 minutes, 10 minutes to 55 minutes, 10 minutes to 60 minutes, 10 minutes to 70 minutes, 10 minutes to 80 minutes, 10 minutes to 90 minutes, 10 minutes to 100 minutes, 10 minutes to 110 minutes, 10 minutes to 120 minutes, 15 minutes to 20 minutes, 15 minutes to 25 minutes, 15 minutes to 30 minutes, 15 minutes to 35 minutes, 15 minutes to 40 minutes, 15 minutes to 45 minutes, 15 minutes to 50 minutes, 15 minutes to 55 minutes, 15 minutes to 60 minutes, 15 minutes to 70 minutes, 15 minutes to 80 minutes, 15 minutes to 90 minutes, 15 minutes to 100 minutes, 15 minutes to 110 minutes, 15 minutes to 120 minutes, 20 minutes to 25 minutes, 20 minutes to 30 minutes, 20 minutes to 35 minutes, 20 minutes to 40 minutes, 20 minutes to 45 minutes, 20 minutes to 50 minutes, 20 minutes to 55 minutes, 20 minutes to 60 minutes, 20 minutes to 70 minutes, 20 minutes to 80 minutes, 20 minutes to 90 minutes, 20 minutes to 100 minutes, 20 minutes to 110 minutes, 20 minutes to 120 minutes, 25 minutes to 30 minutes, 25 minutes to 35 minutes, 25 minutes to 40 minutes, 25 minutes to 45 minutes, 25 minutes to 50 minutes, 25 minutes to 55 minutes, 25 minutes to 60 minutes, 25 minutes to 70 minutes, 25 minutes to 80 minutes, 25 minutes to 90 minutes, 25 minutes to 100 minutes, 25 minutes to 110 minutes, 25 minutes to 120 minutes, 30 minutes to 35 minutes, 30 minutes to 40 minutes, 30 minutes to 45 minutes, 30 minutes to 50 minutes, 30 minutes to 55 minutes, 30 minutes to 60 minutes, 30 minutes to 70 minutes, 30 minutes to 80 minutes, 30 minutes to 90 minutes, 30 minutes to 100 minutes, 30 minutes to 110 minutes, 30 minutes to 120 minutes, 35 minutes to 40 minutes, 35 minutes to 45 minutes, 35 minutes to 50 minutes, 35 minutes to 55 minutes, 35 minutes to 60 minutes, 35 minutes to 70 minutes, 35 minutes to 80 minutes, 35 minutes
DK 181496 B1 52 to 90 minutes, 35 minutes to 100 minutes, 35 minutes to 110 minutes, 35 minutes to 120 minutes, 40 minutes to 45 minutes, 40 minutes to 50 minutes, 40 minutes to 55 minutes, 40 minutes to 60 minutes, 40 minutes to 70 minutes, 40 minutes to 80 minutes, 40 minutes to 90 minutes, 40 minutes to 100 minutes, 40 minutes to 110 minutes, 40 minutes to 120 minutes, 45 minutes to 50 minutes, 45 minutes to 55 minutes, 45 minutes to 60 minutes, 45 minutes to 70 minutes, 45 minutes to 80 minutes, 45 minutes to 90 minutes, 45 minutes to 100 minutes, 45 minutes to 110 minutes, 45 minutes to 120 minutes, 50 minutes to 55 minutes, 50 minutes to 60 minutes, 50 minutes to 70 minutes, 50 minutes to 80 minutes, 50 minutes to 90 minutes, 50 minutes to 100 minutes, 50 minutes to 110 minutes, 50 minutes to 120 minutes, 55 minutes to 60 minutes, 55 minutes to 70 minutes, 55 minutes to 80 minutes, 55 minutes to 90 minutes, 55 minutes to 100 minutes, 55 minutes to 110 minutes, 55 minutes to 120 minutes, 60 minutes to 70 minutes, 60 minutes to 80 minutes, 60 minutes to 90 minutes, 60 minutes to 100 minutes, 60 minutes to 110 minutes, 60 minutes to 120 minutes, 70 minutes to 80 minutes, 70 minutes to 90 minutes, 70 minutes to 100 minutes, 70 minutes to 110 minutes, 70 minutes to 120 minutes, 80 minutes to 90 minutes, 80 minutes to 100 minutes, 80 minutes to 110 minutes, 80 minutes to 120 minutes, 90 minutes to 100 minutes, 90 minutes to 110 minutes, 90 minutes to 120 minutes, 100 minutes to 110 minutes, 100 minutes to 120 minutes, or 110 minutes to 120 minutes.
[169] A disclosed composition and/or use are less harsh on a medical device resulting in a longer lifetime use of a medical device. In aspects of this embodiment, a medical device can be cleaned, disinfected and/or sterilized, e.g., about 50 times, about 60 times, about 70 times, about 80 times, about 90 times, about 100 times, about 110 times, about 120 times, about 130 times, about 140 times, about 150 times, about 160 times, about 170 times, about 180 times, about 190 times, about 200 times, about 210 times, about 220 times, about 230 times, about 240 times, about 250 times, about 260 times, about 270 times, about 280 times, about 290 times, or about 300 times. In other aspects of this embodiment, a medical device can be cleaned, disinfected and/or sterilized, e.g., at least 50 times, at least 60 times, at least 70 times, at least 80 times, at least 90 times, at least 100 times, at least 110 times, at least 120 times, at least 130 times, at least 140 times, at least 150 times, at least 160 times, at least 170 times, at least 180 times, at least 190 times, at least 200 times, at least 210 times, at least 220 times, at least 230 times, at least 240 times, at least 250 times, at least 260 times, at least 270 times, at least 280 times, at least 290 times, or at least 300 times. In yet other aspects of this embodiment, a medical device can be cleaned, disinfected and/or sterilized, e.g., at most 50 times, at most 60 times, at most 70 times, at most 80 times, at most 90 times, at most 100 times, at most 110 times, at most 120 times, at most 130 times, at most 140 times, at most 150 times, at most 160 times, at most 170 times, at most 180 times, at most 190 times, at most 200 times, at most 210 times, at most 220 times, at most 230 times, at most 240 times, at most 250 times, at most 260 times, at most 270 times, at most 280 times, at most 290 times, or at most 300 times.
[170] In still other aspects of this embodiment, a medical device can be cleaned, disinfected and/or sterilized, e.g., 50 times to 60 times, 50 times to 70 times, 50 times to 80 times, 50 times to 90 times, 50 times to 100 times, 50 times to 110 times, 50 times to 120 times, 50 times to 130 times, 50 times to 140 times, 50 times to 150 times, 50 times to 175 times, 50 times to 200 times, 50 times to 225 times, 50 times to 250 times, 50 times to 275 times, 50 times to 300 times, 75 times to 90 times, 75 times to 100 times, 75
DK 181496 B1 53 times to 110 times, 75 times to 120 times, 75 times to 130 times, 75 times to 140 times, 75 times to 150 times, 75 times to 175 times, 75 times to 200 times, 75 times to 225 times, 75 times to 250 times, 75 times to 275 times, 75 times to 300 times, 100 times to 110 times, 100 times to 120 times, 100 times to 130 times, 100 times to 140 times, 100 times to 150 times, 100 times to 175 times, 100 times to 200 times, 100 times to 225 times, 100 times to 250 times, 100 times to 275 times, 100 times to 300 times, 125 times to 150 times, 125 times to 175 times, 125 times to 200 times, 125 times to 225 times, 125 times to 250 times, 125 times to 275 times, 125 times to 300 times, 150 times to 175 times, 150 times to 200 times, 150 times to 225 times, 150 times to 250 times, 150 times to 275 times, 150 times to 300 times, 175 times to 200 times, 175 times to 225 times, 175 times to 250 times, 175 times to 275 times, 175 times to 300 times, 200 times to 225 times, 200 times to 250 times, 200 times to 275 times, 200 times to 300 times, 225 times to 250 times, 225 times to 275 times, 225 times to 300 times, 250 times to 275 times, 250 times to 300 times, or 275 times to 300 times.
[171] A use disclosed herein may further involve a rinsing step using a rinse solution. Typically, the rinse solution is used to rinse a cleaned, disinfected and/or sterilized medical device or surface. The rinse solution is preferably a sterile solution. In one embodiment, a rinse solution disclosed herein comprises water. In another embodiment, a rinse solution disclosed herein comprises hypochlorous acid or free available chlorine and water. In another embodiment, a rinse solution disclosed herein does not comprises hypochlorous acid and/or free available chlorine. When present in a kit disclosed herein, the rinse solution is present in a separate container.
[172] The amount of hypochlorous acid or free available chlorine present in a rinse solution disclosed herein is any amount that provides an antimicrobial effect, with the proviso that the total amount of hypochlorous acid or free available chlorine present is an amount below the threshold level that results in oxidation of a medical device of surface as disclosed herein. In aspects of this embodiment, the amount of hypochlorous acid or free available chlorine present in a rinse solution may be, e.g., about 5 ppm, about 10 ppm, about 20 ppm, about 30 ppm, about 40 ppm, about 50 ppm, about 60 ppm, about 70 ppm, about 80 ppm, about 90 ppm, about 100 ppm, about 110 ppm, or about 120 ppm. In other aspects of this embodiment, the amount of hypochlorous acid or free available chlorine present in a rinse solution may be, e.g., at most 5 ppm, at most 10 ppm, at most 20 ppm, at most 30 ppm, at most 40 ppm, at most 50 ppm, at most 60 ppm, at most 70 ppm, at most 80 ppm, at most 90 ppm, at most 100 ppm, at most 110 ppm, or at most 120 ppm. In yet other aspects of this embodiment, the amount of hypochlorous acid or free available chlorine present in a rinse solution may be, e.9., 5 ppm to 10 ppm, 5 ppm to 20 ppm, 5 ppm to 30 ppm, 5 ppm to 40 ppm, 5 ppm to 50 ppm, 5 ppm to 60 ppm, 5 ppm to 70 ppm, 5 ppm to 80 ppm, 5 ppm to 90 ppm, 5 ppm to 100 ppm, 5 ppm to 110 ppm, 5 ppm to 120 ppm, 10 ppm to 20 ppm, 10 ppm to 30 ppm, 10 ppm to 40 ppm, 10 ppm to 50 ppm, 10 ppm to 60 ppm, 10 ppm to 70 ppm, 10 ppm to 80 ppm, 10 ppm to 90 ppm, 10 ppm to 100 ppm, 10 ppm to 110 ppm, 10 ppm to 120 ppm, 20 ppm to 30 ppm, 20 ppm to 40 ppm, 20 ppm to 50 ppm, 20 ppm to 60 ppm, 20 ppm to 70 ppm, 20 ppm to 80 ppm, 20 ppm to 90 ppm, 20 ppm to 100 ppm, 20 ppm to 110 ppm, 20 ppm to 120 ppm, 30 ppm to 40 ppm, 30 ppm to 50 ppm, 30 ppm to 60 ppm, 30 ppm to 70 ppm, 30 ppm to 80 ppm, 30 ppm to 90 ppm, 30 ppm to 100 ppm, 30 ppm to 110 ppm, 30 ppm to 120 ppm, 40 ppm to 50 ppm, 40 ppm to 60 ppm, 40 ppm to 70 ppm, 40 ppm to 80 ppm,
DK 181496 B1 54 40 ppm to 90 ppm, 40 ppm to 100 ppm, 40 ppm to 110 ppm, 40 ppm to 120 ppm, 50 ppm to 60 ppm, 50 ppm to 70 ppm, 50 ppm to 80 ppm, 50 ppm to 90 ppm, 50 ppm to 100 ppm, 50 ppm to 110 ppm, 50 ppm to 120 ppm, 60 ppm to 70 ppm, 60 ppm to 80 ppm, 60 ppm to 90 ppm, 60 ppm to 100 ppm, 60 ppm to 110 ppm, 60 ppm to 120 ppm, 70 ppm to 80 ppm, 70 ppm to 90 ppm, 70 ppm to 100 ppm, 70 ppm to 110 ppm, 70 ppm to 120 ppm, 80 ppm to 90 ppm, 80 ppm to 100 ppm, 80 ppm to 110 ppm, 80 ppm to 120 ppm, 90 ppm to 100 ppm, 90 ppm to 110 ppm, 90 ppm to 120 ppm, 100 ppm to 110 ppm, 100 ppm to 120 ppm, or 110 ppm to 120 ppm.
EXAMPLES
[173] The following non-limiting examples are provided for illustrative purposes only in order to facilitate a more complete understanding of representative embodiments now contemplated. These examples should not be construed to limit any of the embodiments described in the present specification, including those pertaining to the compositions, kit, methods and uses disclosed herein. To the extent that the examples relate to compositions, kits and methods falling outside the scope of the claims, such examples serve as reference examples.
Example 1
Compositions
[174] This example illustrates how to formulate a composition disclosed herein. The components listed below were mixed at ambient temperature using a high shear mixer until the mixture was uniform. The pH of the mixture was adjusted as shown.
Titanium dioxide particles | — | — | 50ppm [100ppm | — | —
Zinc oxide particles | 50ppm | 100ppm | — | — | — | — prsack | — | — | — [| — [100ppm | 200 pøm = Ten
Component | F78 | Frø | Fa | Far | Fa | F83
Hypochlorous Acid/FAC — | 273 ppm | 273 ppm | 273ppm | — | — | —
Copper oxide particles | 200ppm | 300ppm | — | — | — | — prsack | — | — [300ppm| 1% | 5% | 1% lsopropanol | == | — | — | 50% | 50% | 98%
Methanol | — [== | 2% | 6% | 1% pH | 48 | ss | sa | 55 | s1 | se
DK 181496 B1
Component | Fa4 | Fas | Fee | Far | Fes | Fe
Hypochlorous AciW/FAc | 273 ppm | 273 ppm | 273 ppm | 273ppm | — | 530 ppm
Titanium dioxide particles | — | — | — [æopm] — | — prsær 5.5 1 | = | —- | — | 5s | —
Copper () chloride | — [30pm | — [| — | — | —
Copper (chloride | — | — [som — | — | —
Zinc ehloride ~~ [300ppm| — [| — | — | — | — siver nitrate | — | — | == [| — | — |300ppm isopropanol | — | — 1 — | — fæl —
Methanol | — [| — [| — | — | 66% | —
Component | Fø | Før | Fez | Fes | Fea | FA
Hypochlorous Acid/FAC | 530 ppm | 530 ppm | — | 530 ppm | 530 ppm | 530 ppm
Iron oxide particles | — |300pm| — | — | — | —
Titanium dioxide particles | 100ppm | — | — | — | — | — prsace | — | —= | —- | — | — | 500 pøm gra | | [om Jon [wn —
Silver nitrate [200ppm | — | — [ — | — | — lsopopanol | — | — | s0% | — | — | —
Component | Fes | F100 | For | Fr | F103 | FIG
Hypochlorous Acid/FAC | 107 ppm | 530 ppm | 530 ppm | 530ppm | — | —
Silver oxide particles |] — | — | — [200ppm| — | —
Zincoxideparticles | — | — | — J200ppm| — | — prsack [ftooppm | — | — [ — | — | 5%
Didodecyldimethyl ammonium 0 broen | - | = |= | = [
Copper (1) chloride | — |s00ppm| — | — | — | —
Potassium chloride | — | — [4000ppm|[ — | — | —
Polyhexamethylene biguanide | — | — | — | — | 10% | 10% lsopopanol | — | — | — | — | 45% | 45% pH 0 [ 37 | 34 | 37 | 64 | 83 | es
Component | F105 | F106 | F107 | F108 | F109 | F110
Hypochlrous AGUFAG — | — | — | 530 ppm | 530 ppm | 530 ppm | 530 ppm
DK 181496 B1 56 prsær | ws | — | — | — 1 = [woo
Didodecyldimethyl ammonium 0
ES | = | ee | = | = | = | =
Potassium chloride | — | — |600ppm [600ppm |600ppm | —
Potassium phosphate | — | — | 6000 ppm | 2000 ppm | 2000 ppm | —
Polyhexamethylene biguanide | 6% | 6% | — | — | — | — lsopropanol | 5% | s0% | — [ — | — | — pH [| es | 85 | mø | 77 | 89 | 44
Component | F112 | F115 | F116 | F117 | F118 | F119
Hypochlorous AciFAc | — | — | — [281ppm | 530 ppm |1933 ppm]
Chiomexidne | ooe% | omen | — | — | — | — prsack | — | — | — | — | — [2000 ppm
Zincacetate | — | — | 014% [300ppm |600ppm | —
Polyhexamethylene biguanide | 006% | — | otz% | — | — | —
Ethanol | 15% | 15% | 15% | — | — | — ph | 7s | 73 | ee | sa | 54 | 37
Component | Fæ | F121 | Fizz | Fizs | Fa | Fiz [Titanium dioxide particles | — | — | — [ — | — | —
Copper zinc ron oxide parties | — | — | — [spm] — | — prsack | — | — | — | — |300ppm | 500 ppm
Potassium chloride [600ppm | 120ppm | — | — | — | —
Potassium phosphate | 2000 ppm | 400ppm | — | — | = | — siverntrate | == | == | — | — |300ppm | 500 ppm
ZinoSutate | — | — Jewpm|[ — | — | —
Component | F126 | F127 | F128 | F129 | F130 | F131
Titanium dioxide particles | 100 ppm | 100ppm | — | — | — | — pTsack [300ppm |500ppm | — | — | — | —
Siverntrate | 200ppm | 300pm| — | — | = | —
Polyacrylicacid) | — | — | 45% | 2% | 2% | 2%
DK 181496 B1 57
Component | F132 | F133 | F134 | F135 | F138 | F139 prsack | — | =— Jewoppm| — | 600 ppm [1,200 ppm)
Silver nitrate [eooppm | — | — | — | — | —
Zinosutate | — Jeoopm| — [ — | — | —
Polyhexamethylene biguanide | — | — | — | — | 600 ppm [1,200 ppm
Polyacrylicacid) [| 2% | 2% | 2% | — | — | —
Cetylpyrdinium chloride | — | — | — [eooppm| — | —
Component | F140 | F141 | F142 | F143 | F144 | F145
Copper zinc ron oxide partides | — | — | — | 00ppm | 00ppm | — pTsack | — |600ppm [1,200 ppm] 600ppm | — | — rrskcrm | — | — | = [ — | — | 500 pøm
Polyhexamethylene biguanide | — | — | = | — | — | = ortho-phthalaldehyde | 600 ppm | 600 ppm |1,200ppm| — | — | — b TTSACI: Tetradecyldimethyl-(3-trimethoxysilyl) propyl ammonium chloride in water.
Component | F146 | Fu | Fas | Fæ | FI | FistA
Copper zinc iron oxide particles | 300ppm | — | — | — | — | 250ppm brsack | — | 250 ppm | 125ppm | S0ppm | pm] —
Component | F162 | F153 | FI | FI | FI | FI
Hypochlorous Acid/FAC | 500 ppm | 500 ppm | 500 ppm | 500 ppm | 500 ppm | — [Copper zinc iron oxide particles | 200 ppm | 150 ppm | 100 ppm | 50ppm | 25ppm | — prsær | — | — | — | — | — | iow lsopopanol | — | — | — | — | — | 50%
Component | F158 | F163 | Fries | F169 | F170 | F171
DK 181496 B1 58 prsær | — [øm [øm | — [ — [ —
Didodecyldimethylammonium 0 onde menn | se | = | = | = | = | =
Polyhexamethylene biguanide | 5% | — | — | — | — | — isopropanol | sw | — | sek | — | — | eu
Methanol | — [| 7% | — | 50% | — | —
TRITONCG-110 | 3% | — | — | — | — | —
Pooxsmeræ? | — | — | — | — | am | —
Quatenium18 | — | — | — | 6% | 10% | 10%
Component | Fr | FI | FI | Fr | Firs | Figo
Hypochlorous AciFAC | [| | ~~ | — | — | 540 ppm prsAcr [so0ppm| 20% | — | — | — | — por | - | - een] - |] chloride
Didodecyldimethyl ammonium kende meen | — | = | — |] — | -
CE | — | 7% | — rr | —
Copper (chloride | — [| — | — | — | — | 200 ppm
Iron (Il) chloride or Iron (lll ose nd | — | = | - | = | [mm] siverntrate | — | — | — | — |s00ppm| —
Zincacetate | — | — | — | — [s00ppm| —
Zincchioide | — | — | — | | — |200ppm pH | 54 | 64 | 76 | 62 | 69 | 26
Component | F181 | F182 | F183 | F184 | F185 | F186
DTsack | — | 500 ppm | 500 ppm | 500 ppm | 500 ppm | 500 ppm
Copper (I) chloride | 200ppm | — | — | — | — | — ol om] chloride
Zincchloride ~~ |200ppm | — | — | — | — | — ph | 2a | 59 | 54 | 60 | 51 | 64
Component | F1s7_| Frøs | Fi | Fo | Fier | FR
DK 181496 B1 59
Component | F193 | F194 | F195 | FøsB | F95C | F95D
DTSACR | 300 ppm | 500 ppm | 300 ppm | — | 500 ppm | 300 ppm prsack | == | — | — [s%0pm| — | — b DTSACI: Dimethyloctadecyl[3-(trimethoxysilyl)propyljammonium chloride in water.
Component | FosE | FesF | FesG | FesH | Fes | Fess
Component | F95K | FøsL | F95M | F95N | F950 | Før
Component | F1518 | FIE | FISD | FIE | FIstF | Fi51G
Component | FISH | FIS | FIS1J | FISIK | FISTL | FisoA [Copper zinc iron oxide particles | 250 ppm | 250 ppm | 250 ppm | 250 ppm | 250ppm | —
Copper in choride | — | — | — | — | = |200pm kende rn | - | - | = | =] — [aoe] chloride
Zinc enoride | — | — | — | — | — |200ppm
DK 181496 B1 60
Component | FtaoB | FISGE | FisuD | FINE | FisoF | Frø0G
Copper(ljchioride | — | — |200ppm | 200 ppm | 200 ppm | 200 ppm [2 [| 26 | [ | 0]
Component | F180H | Fisor | F1soJ | Fisk
Hypochlorous AC/FAC | 35ppm | 25ppm | 10ppm | S5ppm
Copper (I) chioride | 200 ppm | 200 ppm | 200 ppm | 200 ppm
CLO smn mn smn [meme]
Zinc chloride | 200 ppm | 200 ppm | 200 ppm | 200 ppm
Water | as. | as | as | as pH 1 26 [| 2 | 26 | 26
Example 2
Spore Viability Assays
[175] This example illustrates how to conduct a spore viability assay using a composition disclosed herein.
[176] To prepare stock cultures of pathogenic spores, 10 mL nutrient broth was inoculated using a stock culture of Bacillus subtilis (ATCC # 19659) and incubated on an orbital shaker for 24+2 hours at approximately 150 rpm at 36+1%C. This culture was used to inoculate Tryptic Soy Agar (TSA) plates. Each plate was inoculated with 500 ul of broth culture and the inoculum spread with a sterile L spreader. In addition, the purity of this culture was verified by streaking on TSA plates and incubating plates at 36+1%C for 24+2 hours. Each plate was wrapped with parafilm. inverted and incubated for 12-14 days at 361°C.
Following incubation, spores were harvested by adding 10 mL cold sterile water to each plate, the growth removed from the plates using a spreader, and the resulting suspensions were transferred into 15 mL sterile conical tubes. The suspensions were centrifuged at 5,000 rpm (4,500 x g) for approximately 10 minutes at room temperature. After removal of the supernatant, the spore pellet was washed by re-suspending pellet with 10 mL cold sterile water and centrifuged at 5,000 rpm (4,500 x g) for approximately 10 minutes. This washing step was repeated two more times. The spore pellet was re-suspended with 10 mL sterile water and the spore suspension was stored at 2-5°C until needed. The spore suspension was stained using stain and the spores examined under the microscope to assess quality of the spores. A minimum of five fields were examined and the ratio of the spores to vegetative cells (or sporangia) was determined. Percentage of spores versus vegetative cells were about 95% spores. Spore titer was determined by preparing serial
DK 181496 B1 61 dilutions, plating the dilutions on TSA plates, incubating plates for 48+2 hours at 36+1%C, and counting the number of colonies formed to determine the titer. The test culture was standardized by using phosphate buffer to achieve a final test culture microbe population of 1.0 x 10% cfu/mL.
[177] Assay samples were set up with or without serum, such as, e.g., Tryptic Soy Broth (TSB) or Bovine
Serum (BS). The purpose of the serum was to better simulate the organic load of blood and other tissue which tends to deactivate an antimicrobial agent. In general, assays were conducted by first incubating a pathogen spore sample with a composition disclosed herein for a specified treatment time period, optionally with serum, and then culturing the sample on growth medium to measure bacterial colony formation, and hence spore viability.
[178] In one series of experiments, samples from Compositions F72-F92 were treated with serum were set up to contain 100 uL of pathogen spore suspension (containing about 1 x 10? cfu/mL), 50 ul of serum, and 850 uL of a composition described in Example 1. For assays where the samples were not treated with serum, samples contained 100 ul of pathogen spore suspension (containing about 1 x 10? cfu/mL) and 900 pL of a composition described in Example 1. All samples were exposed for 15 minutes and then plated on petri dishes containing TSA growth medium. The inoculated plates were then incubated at 30°C to 35°C for 48 hours and the number of colonies, if any, counted. Please note that while specific amounts and volumes are described, different amounts and volumes can be used. For example, a treated sample can contain 100 pL of pathogen spore suspension (containing about 1 x 108 cfu/mL), 500 ul of serum, and 9,400 ul of a composition disclosed herein. An untreated sample can contain 100 pL of pathogen spore suspension (containing about 1 x 10? cfu/mL) and 9,900 ul of a composition disclosed herein. The results of this series of experiments are shown in Table 25.
[179] In another series of experiments, samples from Compositions F103-F106, F112, F115, F116, F138,
F139, and F157 were treated with serum were set up to contain 100 ul. of pathogen spore suspension (containing about 1 x 10% cfu/mL), 50 ul of serum, and 850 ul of a composition described in Example 1.
For assays where the samples were not treated with serum, samples contained 100 ul of pathogen spore suspension (containing about 1 x 10% cfu/mL) and 900 pL of a composition described in Example 1. All samples were exposed for 30 minutes, serially diluted 1 in 10 over a 6-fold range using DE broth, and then plated on petri dishes containing TSA growth medium. The inoculated plates were then incubated at 30°C to 35°C for 48 hours and the number of colonies, if any, counted. Please note that while specific amounts and volumes are described, different amounts and volumes can be used. For example, a treated sample can contain 100 ul of pathogen spore suspension (containing about 1 x 108 cfu/mL), 500 ul of serum, and 9,400 pL of a composition disclosed herein. An untreated sample can contain 100 ul. of pathogen spore suspension (containing about 1 x 108 cfu/mL) and 9,900 ul. of a composition disclosed herein. The results of this series of experiments are shown in Table 26.
[180] The results indicate that at least Composition F81, F82, F83, F88 and F92 show greater potential as a disinfectant for applications disclosed herein.
DK 181496 B1 62
Gørmeten rr em | eam rer 0 [0 [ 0
Fz oo 1 0 re oo oo | oo | 0
CE oo [oo [ 0
Fz oo 1 5 of greater than 500 was assigned. > Positive controls for all assays conducted were >500 bacterial colonies. ¢ ND, Not Determined. omisin sen seis | eam b Positive controls for all assays conducted exhibited 0 log reduction in bacterial growth. ¢ ND, Not Determined.
[181] Similar spore viability assays can be performed as described above, except that the pathogen evaluated will be Escherichia coli and a Pseudomonas species.
Example 3
Bacterial Viability Assays
[182] This example illustrates how to conduct a bacterial viability assay using a composition disclosed herein.
[183] To prepare stock cultures of pathogenic bacteria, 10 mL nutrient broth was inoculated using a stock culture of Staphylococcus epidermidis (ATCC 12228) and incubated on an orbital shaker for 2412 hours at approximately 150 rpm at 36+1%C. This culture was used to inoculate Tryptic Soy Agar (TSA) plates. Each plate was inoculated with the culture. Each plate was incubated for up to 5 days at 30°C to 35°C. Following incubation, suspensions were prepared by adding growth from TSA plates into a tube containing sterile water. Each tube was then vortexed and an aliquot was serially diluted and plated onto TSA plate for further numeration. The final numeration count uses aliquot volume, count obtained on TSA plate and the total original volume of culture. The remaining amount in the tube was used to inoculate actual test samples.
DK 181496 B1 63
[184] Samples from each composition tested were set up with or without serum (TSB or Bovine Serum) as follows: 1) Assays with serum contained 100 ul of pathogenic bacteria suspension, 500 ul. of serum and 9400 uL of a composition formulation disclosed herein; and 2) Assays without serum contained 100 ul of pathogen bacteria suspension and 9900 ul. of a composition described in Example 1. Samples were exposed for 5 minutes at which point a neutralizing agent was used to inhibit the activity of the microbial agent being tested. For Compositions F72-F80, F84-F87, F89-F91, F93, F94, F96, and F100-F102, the treated sample was plated on petri dishes containing TSA growth medium and incubated at 30°C to 35°C for up to 5 days. The presence of viable bacteria was then measured by counting the number of colonies observed on the agar medium. The results of this series of experiments are shown in Table 27.
[185] For Compositions F95, F107-F110, F117-F135, F140- F156, and F163, the treated samples were serially diluted 1 in 10 over a 6-fold range after treatment using a neutralizing agent, and the treated sample was plated on petri dishes containing TSA growth medium and incubated at 30°C to 35°C for up to 5 days.
The presence of viable bacteria was then measured by counting the number of colonies observed on the agar medium. The results of this series of experiments are shown in Table 28.
[186] The results indicate that at least Compositions F80, F81, F82, F83, F88, F89, F90, F92, F93, F94,
F95, F102, F144, F145, F146, F147, F148, F149, F150, F151, F152, F153, F154, F155, and F156 show greater potential as a disinfectant for applications disclosed herein. omisin rr peso | eam
F200 oo [ 205 [| 2
Fs oe | a9
Fra os [a5
FS oo [ 20 [ 190
Feo | | 10
Fz | oo | 70 | 9
FB 10 [ 180 [ 223
Fre Te es | a0 ro | oo | oo | 0 rer 0000000000 oo [0 [ 0
F200 oo [ oo [ 0 re oo oo | oo | 0 ea ; 10 1 232 [| 225
Peso | æ | a8
F860 | oo | 205 | 180
Fer 10 [ 180 [| 165
F800 oo [ oo [ 0
FO | oo | ee | 21
FO 00000000000 oo [3 [ 15
PO oo [ 32 |] 220
DK 181496 B1 64
Fos TT 1 1 9)
Fe | oo 150 [50
F6 10 [ 800 | >500
Foo To [ssw | sew
Flot | oo | >s00 | >500
F020] oo [ 10 [ 100 of greater than 500 was assigned. b Positive controls for all assays conducted were >500 bacterial colonies. ¢ ND, Not Determined. omisin sen seis | erm
FI wo | wp | s…
DK 181496 B1 65 b Positive controls for all assays conducted exhibited 0 log reduction in bacterial growth. ¢ ND, Not Determined.
Example 4
Bacterial Viability Assays
[187] This example illustrates how to conduct a bacterial viability assay using a composition disclosed herein.
[188] Stock cultures of pathogenic bacteria Staphylococcus epidermidis (ATCC 12228) were prepared as described in Example 3. The final numeration count uses aliquot volume, count obtained on TSA plate
DK 181496 B1 66 and the total original volume of culture. The remaining amount in the tube was used to inoculate actual test samples.
[189] Samples from each composition tested were set up with Bovine Serum as follows: 1) Assays with serum contained 100 ul of pathogenic bacteria suspension, 500 ul of Bovine Serum and 9400 ul of one of the composition formulations shown in Table 29; 2) HOCI control assays contained 100 ul. of pathogen bacteria suspension, 500 ul of Bovine Serum and 9400 ul. of 350 ppm, 200 ppm, 100 ppm or 50 ppm
Hypochlorous acid; 3) Salt control assays contained 100 pL of pathogen bacteria suspension, 500 ul. of
Bovine Serum and 9400 pL of 140 ppm, 80 ppm, 40 ppm or 20 ppm each of Copper (II) chloride, Iron (II) chloride and zinc chloride or each of Copper (II) chloride, Iron (lll) chloride and zinc chloride; and 4)
Negative control assays contained 100 pL of pathogen bacteria suspension, 500 ul. of Bovine Serum and 9400 jul of sterile water. Samples were exposed for five (5) minutes at which point a neutralizing agent was used to inhibit the activity of the microbial agent being tested. Compositions were plated on petri dishes containing TSA growth medium and incubated at 30°C to 35°C for 5 days. The presence of viable bacteria was then measured by counting the number of colonies observed on the agar medium. The results of this series of experiments are shown in Table 30.
Component | F196 | F197 | F198 | F199 | F200 | F201 | F202 | F203
Iron (Il) chloride [140 ppm| 80 ppm | 40 ppm [20ppm | — | — | — | — ron (chloride | — | — | — | — [140 ppm| 80 ppm | 40 ppm | 20 porn]
[190] The results show that compositions comprising Iron (lll) chloride demonstrated a synergistic effect on bacterial growth reduction relative to the controls. For example, F200 and F201 show over two times greater reduction in bacterial growth as compared to hypochlorous acid controls for applications disclosed herein. The metal salts mixtures of zinc chloride, Iron (Il) chloride, and copper chloride or zinc chloride, Iron (III) chloride and copper chloride did not show any detectable antimicrobial activity in these assays. Another important finding is that F202 demonstrate an equivalent reduction in bacterial growth relative to the HOCI control comprising 200 ppm hypochlorous acid. F202 contains only 100 ppm hypochlorous acid and this 50% reduction is critical to conferring increased stability of the hypochlorous acid. ormutetion | OR Cr eo
Formulation | HOCIControl® | SaltControl®
Free | ate | an | 0
F7 | 172 800 | 0
Fe | 218 | 224 | 0
Free | ier | tat | 0
F200 | ees | 38 | 0
F201 | ees | 308 | 0
Fr | 2m | 2mm | 0
DK 181496 B1 67 fæ [ee | om 0 a A minimum of 3 log reduction in bacterial growth represents = 99.9% kill of bacteria. b Positive controls for all assays conducted exhibited 0 log reduction in bacterial growth. ¢ HOCI control corresponded to the concentration of hypochlorous acid present in the composition formulation. formulation.
[191] In a different series of experiments, formulations COL1 and COL2 were compared to six commercial products containing HOCI alone (Table 31). In this series of experiments, samples from each composition tested were set up with Bovine Serum as follows: 1) Assays with serum contained 100 ul of pathogenic bacteria suspension, 500 ul. of Bovine Serum and 9400 pL of one of the composition formulations as shown in Table 31; and 2) positive HOCI control assays contained 100 ul. of pathogen bacteria suspension and 9900 ul of sterile water. Samples were exposed for one (1) minute at which point a neutralizing agent was used to inhibit the activity of the microbial agent being tested. Compositions were plated on petri dishes containing TSA growth medium and incubated at 30°C to 35°C for 5 days. The presence of viable bacteria was then measured by counting the number of colonies observed on the agar medium. The results of this series of experiments are shown in Table 31.
[192] The results indicate compositions COL1 and COL2 show equal or greater potential as commercially available cleaners and disinfectants with equal or greater than levels of hypochlorous acid for applications disclosed herein. In particular, COL1, which contained 40 ppm hypochlorous acid and 1,000 ppm DTSACI exhibited over 3 times greater reduction in bacterial growth relative to Commercial Product 6 which solely contains 40 ppm hypochlorous acid. Similarly, COL2, which contained 90 ppm hypochlorous acid and 500 ppm DTSACI exhibited over 2 times greater reduction in bacterial growth relative to Commercial Product 3 which solely contains 104 ppm hypochlorous acid. The synergistic activity observed in COL1 and COL2 is explained by the presence of DTSACI in these formulations.
Formulation |Log Growth Reduction” b Positive controls for all assays conducted exhibited 0 log reduction in bacterial growth.
[193] In closing, it is to be understood that although aspects of the present specification are highlighted by referring to specific embodiments, one skilled in the art will readily appreciate that these disclosed embodiments are only illustrative of the principles of the subject matter disclosed herein. Therefore, it should be understood that the disclosed subject matter is in no way limited to a particular compound, composition, article, apparatus, methodology, protocol, and/or reagent, etc., described herein, unless expressly stated as such. In addition, those of ordinary skill in the art will recognize that certain changes,
DK 181496 B1 68 modifications, permutations, alterations, additions, subtractions and sub-combinations thereof can be made in accordance with the teachings herein without departing from the spirit of the present specification. It is therefore intended that the following appended claims and claims hereafter introduced are interpreted to include all such changes, modifications, permutations, alterations, additions, subtractions and sub- combinations as are within their true spirit and scope.
[194] Certain embodiments of the present invention are described herein, including the best mode known to the inventors for carrying out the invention. Of course, variations on these described embodiments will become apparent to those of ordinary skill in the art upon reading the foregoing description. The inventor expects skilled artisans to employ such variations as appropriate, and the inventors intend for the present invention to be practiced otherwise than specifically described herein. Accordingly, this invention includes all modifications and equivalents of the subject matter recited in the claims appended hereto as permitted by applicable law. Moreover, any combination of the above-described embodiments in all possible variations thereof is encompassed by the invention unless otherwise indicated herein or otherwise clearly contradicted by context.
[195] Groupings of alternative embodiments, elements, or steps of the present invention are not to be construed as limitations. Each group member may be referred to and claimed individually or in any combination with other group members disclosed herein. It is anticipated that one or more members of a group may be included in, or deleted from, a group for reasons of convenience and/or patentability. When any such inclusion or deletion occurs, the specification is deemed to contain the group as modified thus fulfilling the written description of all Markush groups used in the appended claims.
[196] Unless otherwise indicated, all numbers expressing a characteristic, item, quantity, parameter, property, term, and so forth used in the present specification and claims are to be understood as being modified in all instances by the term “about.” As used herein, the term “about” means that the characteristic, item, quantity, parameter, property, or term so qualified encompasses a range of plus or minus ten percent above and below the value of the stated characteristic, item, quantity, parameter, property, or term.
Accordingly, unless indicated to the contrary, the numerical parameters set forth in the specification and attached claims are approximations that may vary. For instance, as mass spectrometry instruments can vary slightly in determining the mass of a given analyte, the term "about" in the context of the mass of an ion or the mass/charge ratio of an ion refers to +/-0.50 atomic mass unit. At the very least, and not as an attempt to limit the application of the doctrine of equivalents to the scope of the claims, each numerical indication should at least be construed in light of the number of reported significant digits and by applying ordinary rounding techniques.
[197] Use of the terms “may” or “can” in reference to an embodiment or aspect of an embodiment also carries with it the alternative meaning of “may not' or “cannot.” As such, if the present specification discloses that an embodiment or an aspect of an embodiment may be or can be included as part of the inventive subject matter, then the negative limitation or exclusionary proviso is also explicitly meant, meaning that an embodiment or an aspect of an embodiment may not be or cannot be included as part of the inventive subject matter. In a similar manner, use of the term “optionally” in reference to an embodiment
DK 181496 B1 69 or aspect of an embodiment means that such embodiment or aspect of the embodiment may be included as part of the inventive subject matter or may not be included as part of the inventive subject matter.
Whether such a negative limitation or exclusionary proviso applies will be based on whether the negative limitation or exclusionary proviso is recited in the claimed subject matter.
[198] Notwithstanding that the numerical ranges and values setting forth the broad scope of the invention are approximations, the numerical ranges and values set forth in the specific examples are reported as precisely as possible. Any numerical range or value, however, inherently contains certain errors necessarily resulting from the standard deviation found in their respective testing measurements. Recitation of numerical ranges of values herein is merely intended to serve as a shorthand method of referring individually to each separate numerical value falling within the range. Unless otherwise indicated herein, each individual value of a numerical range is incorporated into the present specification as if it were individually recited herein.
[199] When used in the claims, whether as filed or added per amendment, the open-ended transitional term “comprising” (and equivalent open-ended transitional phrases thereof like including, containing and having) encompasses all the expressly recited elements, limitations, steps and/or features alone or in combination with unrecited subject matter; the named elements, limitations and/or features are essential, but other unnamed elements, limitations and/or features may be added and still form a construct within the scope of the claim. Specific embodiments disclosed herein may be further limited in the claims using the closed-ended transitional phrases “consisting of” or “consisting essentially of” in lieu of or as an amended for “comprising.” When used in the claims, whether as filed or added per amendment, the closed-ended transitional phrase “consisting of” excludes any element, limitation, step, or feature not expressly recited in the claims. The closed-ended transitional phrase “consisting essentially of” limits the scope of a claim to the expressly recited elements, limitations, steps and/or features and any other elements, limitations, steps and/or features that do not materially affect the basic and novel characteristic(s) of the claimed subject matter. Thus, the meaning of the open-ended transitional phrase “comprising” is being defined as encompassing all the specifically recited elements, limitations, steps and/or features as well as any optional, additional unspecified ones. The meaning of the closed-ended transitional phrase “consisting of” is being defined as only including those elements, limitations, steps and/or features specifically recited in the claim whereas the meaning of the closed-ended transitional phrase “consisting essentially of” is being defined as only including those elements, limitations, steps and/or features specifically recited in the claim and those elements, limitations, steps and/or features that do not materially affect the basic and novel characteristic(s) of the claimed subject matter. Therefore, the open-ended transitional phrase “comprising” (and equivalent open-ended transitional phrases thereof) includes within its meaning, as a limiting case, claimed subject matter specified by the closed-ended transitional phrases “consisting of” or “consisting essentially of.” As such embodiments described herein or so claimed with the phrase “comprising” are expressly or inherently unambiguously described, enabled and supported herein for the phrases “consisting essentially of” and “consisting of.”
DK 181496 B1 70
[200] Lastly, the terminology used herein is for the purpose of describing particular embodiments only, and is not intended to limit the scope of the present invention, which is defined solely by the claims.
Accordingly, the present invention is not limited to that precisely as shown and described.

Claims (15)

DK 181496 B1 71 PatentkravDK 181496 B1 71 Patent claim 1. Sammensætning omfattende 1) 200 ppm til 1000 ppm hypochlorsyre eller 200 ppm til 1000 ppm fri tilgængelig chlor og 2) mindst tre metalsalte hvor hvert af de tre metalsalte er til stede i en mængde af 50 ppm til 500 ppm, og de mindst tre metalsalte er et metalchlorid, hvor de mindst tre metalsalte omfatter et kobbersalt, et zinksalt og et jernsalt.1. Composition comprising 1) 200 ppm to 1000 ppm hypochlorous acid or 200 ppm to 1000 ppm free available chlorine and 2) at least three metal salts wherein each of the three metal salts is present in an amount of 50 ppm to 500 ppm, and the at least three metal salts is a metal chloride, wherein the at least three metal salts include a copper salt, a zinc salt and an iron salt. 2. Sammensætning ifølge krav 1, hvor jernsaltet er et jern(iii)salt.2. Composition according to claim 1, wherein the iron salt is an iron (iii) salt. 3. Sammensætning ifølge krav 1, hvor hypochlorsyren eller det frie tilgængelige chlor er til stede i en mængde af højst 700 ppm.3. Composition according to claim 1, wherein the hypochlorous acid or free available chlorine is present in an amount of no more than 700 ppm. 4. Sammensætning ifølge et hvilket som helst af kravene 1 til 3, hvor hypochlorsyren eller det frie tilgængelige chlor er til stede i en mængde af højst 500 ppm.A composition according to any one of claims 1 to 3, wherein the hypochlorous acid or free available chlorine is present in an amount of no more than 500 ppm. 5. Sammensætning ifølge krav 4, hvor hypochlorsyren eller det frie tilgængelige chlor er til stede i en mængde af højst 400 ppm.5. Composition according to claim 4, wherein the hypochlorous acid or free available chlorine is present in an amount of no more than 400 ppm. 6. Sammensætning ifølge krav 5, hvor hypochlorsyren eller det frie tilgængelige chlor er til stede i en mængde af højst 350 ppm.6. Composition according to claim 5, wherein the hypochlorous acid or free available chlorine is present in an amount of no more than 350 ppm. 7. Sammensætning ifølge et hvilket som helst af kravene 1-6, hvor metalsaltene er til stede i en mængde af højst 400 ppm.7. A composition according to any one of claims 1-6, wherein the metal salts are present in an amount of no more than 400 ppm. 8. Sammensætning ifølge krav 7, hvor metalsaltene er til stede i en mængde af 50 ppm til 350 ppm.8. Composition according to claim 7, wherein the metal salts are present in an amount of 50 ppm to 350 ppm. 9. Sammensætning ifølge krav 8, hvor metalsaltene er til stede i en mængde af 50 ppm til 200 ppm.9. Composition according to claim 8, wherein the metal salts are present in an amount of 50 ppm to 200 ppm. 10. Sammensætning ifølge et hvilket som helst af kravene 1-9, hvor metalsaltene yderligere omfatter et sølvsalt, et titansalt eller enhver blanding deraf.10. A composition according to any one of claims 1-9, wherein the metal salts further comprise a silver salt, a titanium salt or any mixture thereof. 11. Sammensætning ifølge et hvilket som helst af kravene 1-10, hvor metalchloridet omfatter kobberchlorid, jern(iiychlorid, jern(iiiychlorid, kaliumchlorid, sølvchlorid, titanchlorid eller zinkchlorid.11. Composition according to any one of claims 1-10, wherein the metal chloride comprises copper chloride, ferric chloride, ferric chloride, potassium chloride, silver chloride, titanium chloride or zinc chloride. 12. Sæt omfattende en sammensætning som defineret i et hvilket som helst af kravene 1-11.12. Kit comprising a composition as defined in any one of claims 1-11. 13. Anvendelse af en sammensætning som defineret i et hvilket som helst af kravene 1-11 eller et sæt som defineret i krav 12 i rengøring, desinficering og/eller sterilisering af et apparat eller anvendelse i rengøring, desinficering og/eller sterilisering af et overfaldeareal.13. Use of a composition as defined in any of claims 1-11 or a kit as defined in claim 12 in cleaning, disinfecting and/or sterilizing an apparatus or use in cleaning, disinfecting and/or sterilizing an assault area . 14. Sammensætning som defineret i et hvilket som helst af kravene 1-11 eller sæt som defineret i krav 12 til anvendelse i rengøring, desinficering og/eller sterilisering af en mikrobiel infektion i et individ eller til anvendelse i forebyggelse eller behandling af en tilstand i et individ.14. Composition as defined in any of claims 1-11 or kit as defined in claim 12 for use in cleaning, disinfecting and/or sterilizing a microbial infection in an individual or for use in preventing or treating a condition in an individual. 15. Sammensætning til anvendelse ifølge krav 14, hvor tilstanden er et sår, en forbrænding, en infektion, en ophthalmisk tilstand, en dermatologisk tilstand, en inflammation, en ømhed eller en smerte.15. Composition for use according to claim 14, wherein the condition is a wound, a burn, an infection, an ophthalmic condition, a dermatological condition, an inflammation, a soreness or a pain. ADDITIONAL SEARCH REPORT - PATENT Application No. PA 2020 70529ADDITIONAL SEARCH REPORT - PATENT Application No. PA 2020 70529 A. CLASSIFICATION OF SUBJECT MATTER AO0IN 59/00, AOIN 59/08, AOIN 59/16, CO1B 11/04 (all version 2006.01) According to International Patent Classification (IPC)A. CLASSIFICATION OF SUBJECT MATTER AO0IN 59/00, AOIN 59/08, AOIN 59/16, CO1B 11/04 (all version 2006.01) According to International Patent Classification (IPC) B. FIELDS SEARCHED PCT-minimum documentation searched (classification system followed by classification symbols) IPC & CPC: A0IN, CO1B Documentation searched other than PCT-minimum documentation Electronic database consulted during the search (name of database and, where practicable, search terms used) EPODOC, WPI, FULL TEXT: ENGLISHB. FIELDS SEARCHED PCT-minimum documentation searched (classification system followed by classification symbols) IPC & CPC: A0IN, CO1B Documentation searched other than PCT-minimum documentation Electronic database consulted during the search (name of database and, where practicable, search terms used ) EPODOC, WPI, FULL TEXT: ENGLISH C. DOCUMENTS CONSIDERED TO BE RELEVANT Category* Citation of document, with indication, where appropriate, of the relevant passages Relevant for claim No. X WG 2016/440738 Al (CMS TECHNOLOGY, INC.) 2016.03.17 1-13 See paragraphs [0007], [0014]-[0015]; claims 1, 11, 16, 19, 21, 31. X US 2019/0284951 AI (PONGPRAPANSIRI et al.) 2010.11.11 1-15 See claims 1-2, 14. UI Further documents are listed in the continuation of box C. + Special categories of cited documents: "pr Document published prior to the filing date but later than the "A" — Document defining the general state of the art which is not priority date claimed. considered to be of particular relevance. "TT" Document not in conflict with the application but cited to nym Document cited in the application. understand the principle or theory underlying the invention. "E" Earlier application or patent but published on or after the filing date. | x Document of particular relevance; the claimed invention cannot be . . Co considered novel or cannot be considered to involve an inventive "" Document which may throw doubt on priority claim(s) or which is step when the document is taken alone cited to establish the publication date of another citation or other won . Co . . special reason (as specified). Y Document of particular relevance; the claimed invention cannot be . . Lo considered to involve an inventive step when the document is "O" Document referring to an oral disclosure, use, exhibition or other combined with one or more other such documents. such means. combination being obvious to a person skilled in the art. "&" Document member of the same patent family. Danish Patent and Trademark Office Date of completion of the search report Helgeshøj Allé 81 08 June 2022 2630 Taastrup Denmark Authorized officer Tina Dahlerup PoulsenC. DOCUMENTS CONSIDERED TO BE RELEVANT Category* Citation of document, with indication, where appropriate, of the relevant passages Relevant for claim No. X WG 2016/440738 Al (CMS TECHNOLOGY, INC.) 2016.03.17 1-13 See paragraphs [0007], [0014]-[0015]; claims 1, 11, 16, 19, 21, 31. X US 2019/0284951 AI (PONGPRAPANSIRI et al.) 2010.11.11 1-15 See claims 1-2, 14. UI Further documents are listed in the continuation of box C . + Special categories of cited documents: "pr Document published prior to the filing date but later than the "A" — Document defining the general state of the art which is not priority date claimed. considered to be of particular relevance. "TT" Document not in conflict with the application but cited to nym Document cited in the application. understand the principle or theory underlying the invention. "E" Earlier application or patent but published on or after the filing date. | x Document of particular relevance; the claimed invention cannot be .. Co considered novel or cannot be considered to involve an inventive "" Document which may throw doubt on priority claim(s) or which is step when the document is taken alone cited to establish the publication date of another citation or other won . Co .. special reason (as specified). Y Document of particular relevance; the claimed invention cannot be . . Lo considered to involve an inventive step when the document is "O" Document referring to an oral disclosure, use, exhibition or other combined with one or more other such documents. such means. combination being obvious to a person skilled in the art. "&" Document member of the same patent family. Danish Patent and Trademark Office Date of completion of the search report Helgeshøj Allé 81 08 June 2022 2630 Taastrup Denmark Authorized officer Tina Dahlerup Poulsen Tel.: +45 4350 8000Phone: +45 4350 8000 Tel.: +45 43 50 82 88Phone: +45 43 50 82 88 Application No.Application no. ADDITIONAL SEARCH REPORT - PATENT PA 2020 70529 C (Continued). DOCUMENTS CONSIDERED TO BE RELEVANT Citation of document, with indication, where appropriate, of the relevant passages Relevant for claim No. rr 0]ADDITIONAL SEARCH REPORT - PATENT PA 2020 70529 C (Continued). DOCUMENTS CONSIDERED TO BE RELEVANT Citation of document, with indication, where appropriate, of the relevant passages Relevant for claim No. rr 0]
DKPA202070529A 2018-01-14 2020-08-14 Compositions, kits, methods and uses for cleaning, disinfecting, steriliziing and/or treating DK181496B1 (en)

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