WO2021143148A1 - 一种多级复眼透镜的制造方法 - Google Patents
一种多级复眼透镜的制造方法 Download PDFInfo
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- WO2021143148A1 WO2021143148A1 PCT/CN2020/112203 CN2020112203W WO2021143148A1 WO 2021143148 A1 WO2021143148 A1 WO 2021143148A1 CN 2020112203 W CN2020112203 W CN 2020112203W WO 2021143148 A1 WO2021143148 A1 WO 2021143148A1
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 10
- 150000001875 compounds Chemical class 0.000 title claims abstract description 7
- 238000000034 method Methods 0.000 title abstract description 8
- ONDPHDOFVYQSGI-UHFFFAOYSA-N zinc nitrate Chemical compound [Zn+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O ONDPHDOFVYQSGI-UHFFFAOYSA-N 0.000 claims abstract description 16
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 13
- 239000000243 solution Substances 0.000 claims abstract description 9
- 239000008367 deionised water Substances 0.000 claims abstract description 8
- 229910021641 deionized water Inorganic materials 0.000 claims abstract description 8
- 239000011259 mixed solution Substances 0.000 claims abstract description 8
- 238000001035 drying Methods 0.000 claims abstract description 4
- 239000004205 dimethyl polysiloxane Substances 0.000 claims description 6
- 235000013870 dimethyl polysiloxane Nutrition 0.000 claims description 6
- 239000011521 glass Substances 0.000 claims description 6
- 239000003292 glue Substances 0.000 claims description 6
- CXQXSVUQTKDNFP-UHFFFAOYSA-N octamethyltrisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)O[Si](C)(C)C CXQXSVUQTKDNFP-UHFFFAOYSA-N 0.000 claims description 6
- 238000004987 plasma desorption mass spectroscopy Methods 0.000 claims description 6
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 claims description 6
- 238000004528 spin coating Methods 0.000 claims description 6
- 238000003756 stirring Methods 0.000 claims description 6
- 238000003848 UV Light-Curing Methods 0.000 claims description 4
- 238000002360 preparation method Methods 0.000 claims description 4
- 239000000758 substrate Substances 0.000 claims description 4
- 239000000203 mixture Substances 0.000 claims description 3
- 238000000206 photolithography Methods 0.000 claims description 3
- 229920002120 photoresistant polymer Polymers 0.000 claims description 3
- 238000001723 curing Methods 0.000 claims description 2
- 239000007921 spray Substances 0.000 claims description 2
- 239000002086 nanomaterial Substances 0.000 abstract description 8
- 230000003287 optical effect Effects 0.000 abstract description 7
- 238000004132 cross linking Methods 0.000 abstract description 4
- 238000002834 transmittance Methods 0.000 abstract description 4
- AGGKEGLBGGJEBZ-UHFFFAOYSA-N tetramethylenedisulfotetramine Chemical compound C1N(S2(=O)=O)CN3S(=O)(=O)N1CN2C3 AGGKEGLBGGJEBZ-UHFFFAOYSA-N 0.000 abstract 2
- 239000000853 adhesive Substances 0.000 abstract 1
- 230000001070 adhesive effect Effects 0.000 abstract 1
- 238000001259 photo etching Methods 0.000 abstract 1
- 238000004544 sputter deposition Methods 0.000 abstract 1
- 241000238631 Hexapoda Species 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 238000000635 electron micrograph Methods 0.000 description 4
- 238000012876 topography Methods 0.000 description 3
- 241000542420 Sphyrna tudes Species 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 230000003075 superhydrophobic effect Effects 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 238000007641 inkjet printing Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
- G02B3/0012—Arrays characterised by the manufacturing method
- G02B3/0031—Replication or moulding, e.g. hot embossing, UV-casting, injection moulding
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
- G02B3/0012—Arrays characterised by the manufacturing method
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
- G02B3/0037—Arrays characterized by the distribution or form of lenses
- G02B3/0056—Arrays characterized by the distribution or form of lenses arranged along two different directions in a plane, e.g. honeycomb arrangement of lenses
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
- G02B3/0075—Arrays characterized by non-optical structures, e.g. having integrated holding or alignment means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
Definitions
- the invention belongs to the technical field of micro-nano manufacturing and processing, and particularly relates to a manufacturing method of a multi-stage fly-eye lens.
- the compound eyes of insects are composed of numerous small eye structures. There are many hairy structures in the gaps between the small eye structures.
- the advantage of this structure is that the compound eyes of insects have super hydrophobicity, which greatly enhances the insect’s rain and fog. Survivability in harsh environments such as the sky. In the manufacturing process, the surface of a single microlens array has greater adhesion and poor hydrophobicity, which is quite different from the small eyes of natural insects.
- the column array can improve the hydrophobicity of the surface, but the stability of the droplets on the surface of the sample is poor, and slight vibration can make the droplets fill the gaps of the microcolumn array, so that the droplets have greater adhesion.
- the preparation of nanostructures on the surface of the structure can effectively improve the hydrophobicity and the stability of the droplets on the surface, but the presence of nanostructures will affect the light transmittance of the microlens.
- the purpose of the present invention is to provide a method for manufacturing a multi-stage fly eye lens, which can greatly improve the hydrophobicity of the structure surface and the stability of droplets while reducing the cross-linking of optical signals. It is difficult for the droplets to fill the gaps of the micropillar array; the nanostructure of the microlens gaps can reduce the light permeability and reduce the cross-linking between the optical signals.
- a manufacturing method of a multi-stage compound eye lens includes the following steps:
- the present invention can realize the accurate positioning of the microlens array by using the microjet printer, and prepare the microlens array in the gap of the micropillar array; the ZnO seed layer can be covered by the inkjet printing method, except for the position of the microlens. , To achieve full coverage of nanostructures.
- the micropillar array can effectively improve the hydrophobicity of the surface, but the stability is poor.
- a slight vibration can make the droplets fill the gaps of the micropillar array, and the nanostructure on the top of the micropillar array can greatly improve the structural stability.
- the existence of the gap nanostructure of the substrate microlens array can effectively reduce the light transmittance and prevent the mutual influence of the optical signal, especially when the optical signal is strong.
- FIG. 1 is an electron micrograph of the multi-stage fly-eye lens prepared in Example 1.
- FIG. 1 is an electron micrograph of the multi-stage fly-eye lens prepared in Example 1.
- Fig. 2 is a topography diagram of the P1 part in Fig. 1.
- Fig. 3 is a topography diagram of the P2 part in Fig. 1.
- Fig. 4 is a topography diagram of the P3 part in Fig. 1.
- FIG. 5 is an imaging diagram of the multi-stage fly-eye lens prepared in Example 1.
- Example 6 is an electron micrograph of the multi-stage fly-eye lens prepared in Example 2.
- FIG. 7 is an electron micrograph of the multi-stage fly-eye lens prepared in Example 3.
- Example 8 is an electron micrograph of the multi-stage fly-eye lens prepared in Example 4.
- Embodiment 1 a manufacturing method of a multi-stage fly-eye lens, includes the following steps:
- sample four Sputter 30nm ZnO on the three surfaces of the sample to obtain sample four, and use a micro-jet printer to print UV curing glue in the gap of the micro-pillar array of sample four, and use the number of droplets to control the microlens morphology, and the droplets fall The number of times is 12, and the fifth sample with a microlens array is obtained;
- the multi-stage fly eye lens obtained in this embodiment has super hydrophobic characteristics.
- the droplet contacts the multi-stage fly eye lens, it can be quickly separated from the multi-stage fly eye lens; traditional super hydrophobic
- the structure will affect the light transmittance.
- the nano-structure and the micro-pillar array are fabricated in the micro-lens gap, which will not affect the imaging of the fly-eye lens. Refer to FIG. 5. This structure is of great significance to the practical application of the fly-eye lens.
- Embodiment 2 The number of droplets in step 2) of embodiment 1 is changed to 2, and the other steps are the same, and the structure of the obtained multi-stage fly eye lens is similar to that of embodiment 1, as shown in FIG. 6.
- Embodiment 3 The number of droplets in step 2) of embodiment 1 is changed to 4, and the other steps are the same, and the structure of the obtained multi-stage fly eye lens is similar to that of embodiment 1, as shown in FIG. 7.
- Example 4 The number of droplets in step 2) of Example 1 is changed to 8, and the other steps are the same, to obtain a three-level composite structure similar to that of Example 1 as a multi-level fly eye lens, as shown in FIG. 8.
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- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
Abstract
Description
Claims (1)
- 一种多级复眼透镜的制造方法,其特征在于,包括以下步骤:1)利用光刻方法制备微柱阵列:将光刻胶4620旋涂在玻璃片上,旋涂速度为1500r/s,放在烘台上5min,重复旋涂,获得厚度为22μm的微孔阵列,即样片一;利用PDMS对样片一进行两次翻模后,得到微孔阵列模具,即样片二;将NOA61紫外固化胶浇筑在样片二的PDMS曲面上,压上玻璃基底,然后紫外曝光机曝光100s,脱模制得高度为22μm的微柱阵列,即样片三;2)给样片三表面溅射30nm的ZnO得到样片四,利用微喷印机在样片四的微柱阵列间隙喷印紫外固化胶,利用液滴滴落次数控制微透镜形貌,液滴滴落次数为2-12,得到具有微透镜阵列的样片五;3)将7g六甲基四胺和14.87g硝酸锌分别溶于500ml的去离子水中,搅拌20分钟,然后将六甲基四胺溶液倒入硝酸锌溶液中,混合搅拌15分钟得到混合溶液,将样片五放入混合溶液中,放入90℃水浴锅中水浴80分钟,得到样片六;4)将样片六用去离子水清洗2分钟,放在60℃的烘台上50分钟,得到多级复眼透镜。
Priority Applications (1)
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US17/758,304 US12105301B2 (en) | 2020-01-19 | 2020-08-28 | Method for manufacturing multi-stage compound eye lens |
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CN202010058570.1A CN111060997B (zh) | 2020-01-19 | 2020-01-19 | 一种多级复眼透镜的制造方法 |
CN202010058570.1 | 2020-01-19 |
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WO2021143148A1 true WO2021143148A1 (zh) | 2021-07-22 |
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PCT/CN2020/112203 WO2021143148A1 (zh) | 2020-01-19 | 2020-08-28 | 一种多级复眼透镜的制造方法 |
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US (1) | US12105301B2 (zh) |
CN (1) | CN111060997B (zh) |
WO (1) | WO2021143148A1 (zh) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
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CN111060997B (zh) * | 2020-01-19 | 2021-05-07 | 西安交通大学 | 一种多级复眼透镜的制造方法 |
CN113156552A (zh) * | 2021-04-22 | 2021-07-23 | 西北农林科技大学 | 一种大视场双焦点复眼透镜的制造方法 |
CN113514907A (zh) * | 2021-04-22 | 2021-10-19 | 西北农林科技大学 | 一种高透稳定超疏水复眼透镜的制造方法 |
CN113156551B (zh) * | 2021-04-22 | 2022-10-18 | 西北农林科技大学 | 一种稳定自清洁复眼透镜的制造方法 |
KR102576800B1 (ko) * | 2021-07-09 | 2023-09-11 | 한국광기술원 | 선택적 투과도 조정형 마이크로 렌즈 어레이 및 그 제조방법 |
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2020
- 2020-01-19 CN CN202010058570.1A patent/CN111060997B/zh active Active
- 2020-08-28 US US17/758,304 patent/US12105301B2/en active Active
- 2020-08-28 WO PCT/CN2020/112203 patent/WO2021143148A1/zh active Application Filing
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US12105301B2 (en) | 2024-10-01 |
US20230027509A1 (en) | 2023-01-26 |
CN111060997B (zh) | 2021-05-07 |
CN111060997A (zh) | 2020-04-24 |
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