WO2021132272A1 - 合金 - Google Patents
合金 Download PDFInfo
- Publication number
- WO2021132272A1 WO2021132272A1 PCT/JP2020/048020 JP2020048020W WO2021132272A1 WO 2021132272 A1 WO2021132272 A1 WO 2021132272A1 JP 2020048020 W JP2020048020 W JP 2020048020W WO 2021132272 A1 WO2021132272 A1 WO 2021132272A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- atomic
- concentration
- less
- average
- alloy
- Prior art date
Links
- 229910045601 alloy Inorganic materials 0.000 title claims abstract description 99
- 239000000956 alloy Substances 0.000 title claims abstract description 99
- 239000012535 impurity Substances 0.000 claims abstract description 33
- 229910052742 iron Inorganic materials 0.000 claims abstract description 20
- 229910052802 copper Inorganic materials 0.000 claims abstract description 16
- 229910052796 boron Inorganic materials 0.000 claims abstract description 12
- 229910052698 phosphorus Inorganic materials 0.000 claims abstract description 11
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 10
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 8
- 239000013078 crystal Substances 0.000 claims description 52
- 239000012071 phase Substances 0.000 description 97
- 239000013256 coordination polymer Substances 0.000 description 45
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 39
- 239000010949 copper Substances 0.000 description 37
- 238000010438 heat treatment Methods 0.000 description 29
- 229910000808 amorphous metal alloy Inorganic materials 0.000 description 24
- 238000004519 manufacturing process Methods 0.000 description 21
- 238000001816 cooling Methods 0.000 description 17
- 238000002425 crystallisation Methods 0.000 description 17
- 230000008025 crystallization Effects 0.000 description 17
- 239000002159 nanocrystal Substances 0.000 description 17
- 230000004907 flux Effects 0.000 description 12
- 239000000203 mixture Substances 0.000 description 10
- 238000000034 method Methods 0.000 description 7
- 230000003247 decreasing effect Effects 0.000 description 6
- 230000014759 maintenance of location Effects 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 5
- 238000005096 rolling process Methods 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- 230000008859 change Effects 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 238000000113 differential scanning calorimetry Methods 0.000 description 4
- 229910001338 liquidmetal Inorganic materials 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 230000009471 action Effects 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 3
- 238000001938 differential scanning calorimetry curve Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 230000006911 nucleation Effects 0.000 description 3
- 238000010899 nucleation Methods 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 229910000640 Fe alloy Inorganic materials 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 229910052729 chemical element Inorganic materials 0.000 description 2
- 239000003153 chemical reaction reagent Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000004455 differential thermal analysis Methods 0.000 description 2
- 239000007791 liquid phase Substances 0.000 description 2
- 230000005415 magnetization Effects 0.000 description 2
- 229910052752 metalloid Inorganic materials 0.000 description 2
- 150000002738 metalloids Chemical class 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000002086 nanomaterial Substances 0.000 description 2
- 239000002243 precursor Substances 0.000 description 2
- 238000010791 quenching Methods 0.000 description 2
- 230000000171 quenching effect Effects 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 238000004566 IR spectroscopy Methods 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- 229910000676 Si alloy Inorganic materials 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 239000012300 argon atmosphere Substances 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 238000012790 confirmation Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000004993 emission spectroscopy Methods 0.000 description 1
- -1 for example Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 238000009616 inductively coupled plasma Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 238000001330 spinodal decomposition reaction Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 238000009692 water atomization Methods 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C45/00—Amorphous alloys
- C22C45/02—Amorphous alloys with iron as the major constituent
-
- C—CHEMISTRY; METALLURGY
- C21—METALLURGY OF IRON
- C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
- C21D6/00—Heat treatment of ferrous alloys
- C21D6/008—Heat treatment of ferrous alloys containing Si
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
- C22C38/002—Ferrous alloys, e.g. steel alloys containing In, Mg, or other elements not provided for in one single group C22C38/001 - C22C38/60
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
- C22C38/02—Ferrous alloys, e.g. steel alloys containing silicon
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
- C22C38/16—Ferrous alloys, e.g. steel alloys containing copper
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F1/00—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties
- H01F1/01—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials
- H01F1/03—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity
- H01F1/12—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials
- H01F1/14—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials metals or alloys
- H01F1/147—Alloys characterised by their composition
- H01F1/153—Amorphous metallic alloys, e.g. glassy metals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F1/00—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties
- H01F1/01—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials
- H01F1/03—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity
- H01F1/12—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials
- H01F1/14—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials metals or alloys
- H01F1/147—Alloys characterised by their composition
- H01F1/153—Amorphous metallic alloys, e.g. glassy metals
- H01F1/15308—Amorphous metallic alloys, e.g. glassy metals based on Fe/Ni
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F1/00—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties
- H01F1/01—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials
- H01F1/03—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity
- H01F1/12—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials
- H01F1/14—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials metals or alloys
- H01F1/147—Alloys characterised by their composition
- H01F1/153—Amorphous metallic alloys, e.g. glassy metals
- H01F1/15333—Amorphous metallic alloys, e.g. glassy metals containing nanocrystallites, e.g. obtained by annealing
-
- C—CHEMISTRY; METALLURGY
- C21—METALLURGY OF IRON
- C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
- C21D1/00—General methods or devices for heat treatment, e.g. annealing, hardening, quenching or tempering
- C21D1/26—Methods of annealing
-
- C—CHEMISTRY; METALLURGY
- C21—METALLURGY OF IRON
- C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
- C21D2201/00—Treatment for obtaining particular effects
- C21D2201/03—Amorphous or microcrystalline structure
-
- C—CHEMISTRY; METALLURGY
- C21—METALLURGY OF IRON
- C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
- C21D6/00—Heat treatment of ferrous alloys
-
- C—CHEMISTRY; METALLURGY
- C21—METALLURGY OF IRON
- C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
- C21D9/00—Heat treatment, e.g. annealing, hardening, quenching or tempering, adapted for particular articles; Furnaces therefor
- C21D9/52—Heat treatment, e.g. annealing, hardening, quenching or tempering, adapted for particular articles; Furnaces therefor for wires; for strips ; for rods of unlimited length
Definitions
- the present invention relates to alloys, for example, alloys containing Fe.
- the nanocrystal alloy has a plurality of nano-sized crystal phases formed in the amorphous phase, and as such a nanocrystal alloy, Fe-Cu-PB- has a high saturation magnetic flux density and a low coercive force.
- Si alloys are known (eg, Patent Documents 1 to 5). Such nanocrystal alloys are used as soft magnetic materials having a high saturation magnetic flux density and a low coercive force.
- the crystal phase is mainly an iron alloy with a BCC (body-centered cubic) structure, and if the particle size of the crystal phase is small, soft magnetic properties such as coercive force are improved. However, it is required to further improve the soft magnetic properties of the nanocrystal alloy. Even if the soft magnetic properties are improved, if manufacturing is difficult, the manufacturing cost will increase.
- BCC body-centered cubic
- the present invention has been made in view of the above problems, and an object of the present invention is to provide an alloy in which an amorphous alloy and a nanocrystalline alloy can be easily produced.
- the present invention has an amorphous phase, the average Fe concentration of the entire alloy is 82.0 atomic% or more and 88.0 atomic% or less, and the average Cu concentration of the entire alloy is 0.4 atomic% or more and 1. It is 0 atomic% or less, the average P concentration of the entire alloy is 5.0 atomic% or more and 9.0 atomic% or less, and the average B concentration of the entire alloy is 6.0 atomic% or more and 10.0 atomic% or less.
- the average Si concentration of the entire alloy is 0.4 atomic% or more and 1.9 atomic% or less, the average C concentration of the entire alloy is 0 atomic% or more and 2.0 atomic% or less, and Fe, Cu.
- the average impurity concentration of the entire alloy in impurities other than P, B, Si and C is 0 atomic% or more and 0.3 atomic% or less, and the average Fe concentration, the average Cu concentration, the average P concentration, and the average.
- the total of the B concentration, the average Si concentration, the average C concentration, and the average impurity concentration is 100.0 atomic%.
- the average Fe concentration is 83.0 atomic% or more and 88.0 atomic% or less
- the average Cu concentration is 0.4 atomic% or more and 0.9 atomic% or less
- the average P concentration Is 5.0 atomic% or more and 8.0 atomic% or less
- the average Si concentration is 0.9 atomic% or more and 1.4 atomic% or less
- the average C concentration is 0 atomic% or more and 0.
- the composition may be 1 atomic% or less
- the average impurity concentration may be 0 atomic% or more and 0.1 atomic% or less.
- the present invention has an amorphous phase, the average Fe concentration of the entire alloy is 82.0 atomic% or more and 88.0 atomic% or less, and the average Cu concentration of the entire alloy is 0.4 atomic% or more and 0. 9 atomic% or less, the average P concentration of the entire alloy is 3.0 atomic% or more and 9.0 atomic% or less, and the average B concentration of the entire alloy is 9.0 atomic% or more and 12.0 atomic% or less.
- the average Si concentration of the entire alloy is 1.1 atomic% or more and 4.0 atomic% or less, the average C concentration of the entire alloy is 0 atomic% or more and 2.0 atomic% or less, and Fe, Cu.
- the average impurity concentration of the entire alloy in impurities other than P, B, Si and C is 0 atomic% or more and 0.3 atomic% or less, and the average Fe concentration, the average Cu concentration, the average P concentration, and the average.
- the total of the B concentration, the average Si concentration, the average C concentration, and the average impurity concentration is 100.0 atomic%.
- the average Fe concentration is 83.0 atomic% or more and 88.0 atomic% or less
- the average Cu concentration is 0.4 atomic% or more and 0.8 atomic% or less
- the average P concentration Is 3.0 atomic% or more and 5.0 atomic% or less
- the average Si concentration is 1.5 atomic% or more and 4.0 atomic% or less
- the average C concentration is 0 atomic% or more and 0.
- the composition may be 1 atomic% or less
- the average impurity concentration may be 0 atomic% or more and 0.1 atomic% or less.
- the amorphous phase and a plurality of crystal phases formed in the amorphous phase can be provided.
- the configuration may be composed of only the amorphous phase.
- FIG. 1 is a schematic view showing a change in temperature with time in a heat treatment for forming a nanocrystal alloy.
- FIG. 2 is a schematic cross-sectional view of the nanocrystal alloy.
- an amorphous alloy (precursor alloy) is formed by rapidly cooling a liquid metal obtained by melting a mixture of materials.
- Amorphous alloys are almost amorphous phases and contain almost no crystalline phase. That is, the amorphous alloy consists of only the amorphous phase. Depending on the conditions of quenching of the liquid metal, the amorphous alloy may contain a trace amount of crystalline phase.
- the temperature at which a liquid phase begins to be formed from the molten metal (liquid phase temperature) is defined as TL.
- the amorphous alloy is heat-treated.
- FIG. 1 is a schematic diagram (schematic diagram of the temperature history of the heat treatment) showing the change in temperature with time in the heat treatment for forming the nanocrystal alloy.
- the material is an amorphous alloy
- the temperature T1 is, for example, 200 ° C.
- the temperature of the alloy rises from T1 to T2, for example, at an average heating rate of 45.
- the temperature T2 is higher than the temperature at which the crystal phase (metal iron crystal phase), which is iron having a BCC structure, begins to form (a temperature slightly lower than the first crystallization start temperature Tx1), and the crystal phase of the compound (compound crystal phase) is formed.
- the holding period 42 from the time t2 to t3 is the temperature T2 at which the temperature of the alloy is substantially constant.
- the temperature of the alloy drops from T2 to T1 at an average cooling rate of 46, for example.
- the heating rate 45 and the cooling rate 46 are constant, but the heating rate 45 and the cooling rate 46 may change with time.
- FIG. 2 is a schematic cross-sectional view of the nanocrystal alloy.
- the alloy 10 includes an amorphous phase 16 and a plurality of crystal phases 14 formed in the amorphous phase 16.
- the crystalline phase 14 is surrounded by the amorphous phase 16.
- the crystal phase 14 is mainly an iron alloy having a BCC structure.
- Alloy 10 contains Fe, Cu, P, B and Si. C may be included intentionally or unintentionally. Impurity elements other than Fe, Cu, P, B, Si and C may be unintentionally included.
- the impurities include, for example, Ti, Al, Zr, Hf, Nb, Ta, Mo, W, Cr, V, Co, Ni, Mn, Ag, Zn, Sn, Pb, As, Sb, Bi, S, N, O and It is at least one of the rare earth elements.
- CFe, CCu, CP, CB, CSi, CC and CI Let the average Fe concentration, Cu concentration, P concentration, B concentration, Si concentration, C concentration and impurity concentration in the entire alloy be CFe, CCu, CP, CB, CSi, CC and CI.
- the total of CFe, CCu, CP, CB, CSi, CC and CI is 100.0 atomic%.
- CFe, CCu, CP, CB, CSi, CC and CI correspond to the chemical composition of amorphous alloys and nanocrystalline alloys.
- the size (particle size) of the crystal phase in the nanocrystal alloy affects the soft magnetic properties such as coercive force.
- the average value of the equivalent sphere diameter of the crystal phase 14 is, for example, preferably 50 nm or less, more preferably 30 nm or less, and even more preferably 20 nm or less.
- the average value of the equivalent sphere diameter of the crystal phase 14 is, for example, 5 nm or more.
- Cu serves as a nucleation site for the formation of the crystal phase 14. Therefore, the nanocrystalline alloy contains Cu.
- P contributes to make the crystal phase 14 smaller.
- B and Si contribute to the formation of the amorphous phase 16. In order to reduce the crystal phase 14, it is preferable that the amount of P is large.
- the size of the crystal phase 14 can be reduced, the coercive force can be lowered, and the soft magnetic characteristics can be improved. If manufacturing is difficult even if the soft magnetic characteristics are improved, problems such as high manufacturing cost occur.
- Tx2 When the second crystallization start temperature Tx2 is low, it is required to control the temperature T2 during the holding period after heating, and a compound crystal phase may be unintentionally formed, which makes production difficult.
- Tx1 / TL is small, the crystal phase is formed at a lower temperature and in a shorter time when the liquid metal is rapidly cooled, and the temperature at which a healthy amorphous phase is formed becomes lower.
- the more preferable range of each element concentration has not been examined in relation to the coercive force and Tx2 and Tx1 / TL.
- the coercive force can be lowered and Tx2 and Tx1 / TL can be made appropriate by making the ranges of CSi and CP appropriate.
- each element concentration is limited mainly in relation to the coercive force and Tx2 and Tx1 / TL.
- CFe is 82.0 atomic% or more and 88.0 atomic% or less
- CCu is 0.4 atomic% or more and 1.0 atomic% or less
- CP is 5.0 atomic% or more and 9.0 atomic% or less.
- CB is 6.0 atomic% or more and 10.0 atomic% or less
- CSi is 0.4 atomic% or more and 1.9 atomic% or less
- CC is 0 atomic% or more and 2.0 atomic% or less. It is atomic% or less
- CI total amount of impurities
- CFe By setting CFe to 82.0 atomic% or more, the saturation magnetic flux density can be increased.
- the CFe is more preferably 83.0 atomic% or more.
- the concentration of metalloids (B, P, C and Si) By increasing the concentration of metalloids (B, P, C and Si), the amorphous phase 16 can be more stably provided between the crystal phases 14. Therefore, CFe is preferably 88.0 atomic% or less, more preferably 86.0 atomic% or less, and further preferably 85.0 atomic% or less.
- CCu is preferably 0.4 atomic% or more, more preferably 0.5 atomic% or more, and further preferably 0.6 atomic% or more.
- the presence of Cu clusters in the crystalline phase 14 and the amorphous phase 16 hinders the movement of the domain wall.
- the quantum mechanical action between the Fe atom and the Cu atom becomes large. As a result, the saturation magnetic flux density decreases.
- CCu is preferably 1.0 atomic% or less, more preferably 0.9 atomic% or less, and further preferably 0.8 atomic% or less.
- CP is preferably 5.0 atomic% or more, more preferably 5.5 atomic% or more, and further preferably 6.0 atomic% or more.
- CB and CSi must be decreased. If the CB and CSi are too low, it becomes difficult to stably form the amorphous phase 16. Therefore, CP is preferably 9.0 atomic% or less, more preferably 8.5 atomic% or less, and even more preferably 8.0 atomic% or less.
- CB is high, the amorphous phase 16 can be stably formed. Further, as will be understood from the examples described later, if CSi is increased when CB is low, Tx1 / TL becomes small and manufacturing becomes difficult. Therefore, CB is preferably 6.0 atomic% or more, more preferably 6.5 atomic% or more, and even more preferably 7.0 atomic% or more. In order to increase the CB and increase the CFe to 83.0 atomic% or more, the CP must be decreased. If the CP becomes too low, the coercive force becomes high. Therefore, the CB is preferably 10.0 atomic% or less, more preferably 9.5 atomic% or less, and further preferably 9.0 atomic% or less.
- CSi is preferably 0.4 atomic% or more, more preferably 0.6 atomic% or more, and further preferably 0.9 atomic% or more.
- CSi is preferably 1.9 atomic% or less, more preferably 1.6 atomic% or less, and even more preferably 1.4 atomic% or less.
- CB-CSi is 6.5 atomic% or more and 9.5 atomic% or less.
- CC is 0 atomic% or more, preferably 2.0 atomic% or less, more preferably 1.0 atomic% or less, and further preferably 0.1 atomic% or less.
- the CI is 0 atomic% or more, preferably 0.3 atomic% or less, more preferably 0.2 atomic% or less, still more preferably 0.1 atomic% or less.
- 0 atomic% or more and 0.10 atomic% or less are preferable, and 0 atomic% or more and 0.02 atomic% or less are more preferable.
- each element concentration is limited mainly in relation to the coercive force, Tx2, and Tx1 / TL.
- CFe is 82.0 atomic% or more and 88.0 atomic% or less
- CCu is 0.4 atomic% or more and 0.9 atomic% or less
- CP is 3.0 atomic% or more and 9.0 atomic% or less.
- CB is 9.0 atomic% or more and 12.0 atomic% or less
- CSi is 1.1 atomic% or more and 4.0 atomic% or less
- CC is 0 atomic% or more and 2.0 atomic% or less. It is atomic% or less
- CI total amount of impurities
- CFe By setting CFe to 82.0 atomic% or more, the saturation magnetic flux density can be increased.
- the CFe is more preferably 83.0 atomic% or more.
- the concentration of metalloids (B, P, C and Si) By increasing the concentration of metalloids (B, P, C and Si), the amorphous phase 16 can be more stably provided between the crystal phases 14. Therefore, CFe is preferably 88.0 atomic% or less, more preferably 86.0 atomic% or less, and further preferably 85.0 atomic% or less.
- CCu is preferably 0.4 atomic% or more, more preferably 0.5 atomic% or more, and further preferably 0.6 atomic% or more.
- the presence of Cu clusters in the crystalline phase 14 and the amorphous phase 16 hinders the movement of the domain wall.
- the CCu is preferably 0.9 atomic% or less, more preferably 0.8 atomic% or less.
- CP is preferably 3.0 atomic% or more, more preferably 3.8 atomic% or more, and even more preferably 4.0 atomic% or more.
- CB and CSi must be decreased. If the CB and CSi are too low, it becomes difficult to stably form the amorphous phase 16. Therefore, CP is preferably 9.0 atomic% or less, more preferably 7.0 atomic% or less, and even more preferably 5.0 atomic% or less.
- the CB is high, the amorphous phase 16 can be stably formed. Further, as will be understood from the examples described later, when CSi is increased, if CB is low, Tx1 / TL becomes small, which makes manufacturing difficult. Therefore, the CB is preferably 9.0 atomic% or more, more preferably 9.5 atomic% or more, and further preferably 10.0 atomic% or more. In order to increase the CB and increase the CFe to 83.0 atomic% or more, the CP must be decreased. If the CP becomes too low, the coercive force becomes high. Therefore, the CB is preferably 12.0 atomic% or less, more preferably 11.5 atomic% or less, and further preferably 11.0 atomic% or less.
- CSi is preferably 1.1 atomic% or more, more preferably 1.3 atomic% or more, and even more preferably 1.5 atomic% or more.
- CSi is preferably 4.0 atomic% or less, more preferably 3.5 atomic% or less, and even more preferably 3.0 atomic% or less.
- CB-CSi is most preferably 6.5 atomic% or more and 9.5 atomic% or less.
- CC is 0 atomic% or more, preferably 2.0 atomic% or less, more preferably 1.0 atomic% or less, and further preferably 0.1 atomic% or less.
- the CI is 0 atomic% or more, preferably 0.3 atomic% or less, more preferably 0.2 atomic% or less, still more preferably 0.1 atomic% or less.
- 0 atomic% or more and 0.10 atomic% or less are preferable, and 0 atomic% or more and 0.02 atomic% or less are more preferable.
- the single roll method is used to produce the amorphous alloy.
- the roll diameter and rotation speed conditions of the single roll method are arbitrary.
- the single roll method is suitable for producing amorphous alloys because rapid cooling is easy.
- the cooling rate of the molten alloy for the production of amorphous alloys for example, preferably 10 4 ° C. / sec or more, preferably more than 10 6 ° C. / sec.
- the cooling rate may be used a method other than a single roll method, including the duration of 10 4 ° C. / sec.
- the water atomizing method or the atomizing method described in Japanese Patent No. 65333352 may be used.
- the nanocrystalline alloy is obtained by heat treatment of an amorphous alloy.
- the temperature history during heat treatment affects the nanostructure of the nanocrystalline alloy.
- the heating rate 45, the holding temperature T2, the length of the holding period 42, and the cooling rate 46 mainly affect the nanostructure of the nanocrystal alloy.
- Heating rate 45 When the heating rate 45 is high, the temperature range in which small Cu clusters are formed can be avoided, so that many large Cu clusters are likely to be formed in the initial stage of crystallization. Therefore, the size of each crystal phase 14 becomes smaller, the non-equilibrium reaction becomes easier to proceed, and the concentrations of P, B, Cu, etc. in the crystal phase 14 increase. Therefore, the total amount of the crystal phases 14 increases, and the saturation magnetic flux density increases. Further, P and Cu are concentrated in the region near the crystal phase 14, and as a result, the growth of the crystal phase 14 is suppressed and the size of the crystal phase 14 is reduced. Therefore, the coercive force is reduced. In the temperature range from 200 ° C.
- the average heating rate ⁇ T is preferably 360 ° C./min or more, and more preferably 400 ° C./min or more. It is more preferable that the average heating rate calculated in increments of 10 ° C. in this temperature range also satisfies the same conditions. However, when it is necessary to release the heat associated with crystallization as in the heat treatment after lamination, it is preferable to reduce the average heating rate. For example, such an average heating rate may be 5 ° C./min or less.
- the P concentration CP / B concentration CB is large. It is considered that this is because small Cu clusters are likely to be generated as the B concentration increases. Therefore, in order to offset the miniaturization of Cu clusters due to the increase in B concentration, it is preferable that CP / CB and ⁇ T are used (CP / CB ⁇ ( ⁇ T + 20)) at 40 ° C./min or more. It is preferably 50 ° C./min or higher, and more preferably 100 ° C./min or higher. In this temperature range, (CP / CB ⁇ ( ⁇ T + 20)) calculated in increments of 10 ° C. is also more preferable if the same conditions are satisfied.
- the length of the retention period 42 is preferably a time during which it can be determined that crystallization has progressed sufficiently.
- DSC curve the first peak corresponding to the first crystallization start temperature Tx1 cannot be observed or becomes very small (for example, the total heat generation of the first peak in the DSC curve of an amorphous alloy having the same chemical composition). Confirm that the calorific value is 1/100 or less of the amount).
- the length of the retention period is preferably longer than expected from the DSC results.
- the length of the retention period is preferably 0.5 minutes or more, more preferably 5 minutes or more. Sufficient crystallization can increase the saturation magnetic flux density. If the retention period is too long, the concentration distribution of solute elements in the amorphous phase may change due to the diffusion of atoms. Therefore, the length of the retention period is preferably 60 minutes or less, more preferably 30 minutes or less.
- the maximum temperature Tmax of the holding temperature T2 is preferably the first crystallization start temperature Tx1-20 ° C. or higher and the second crystallization start temperature Tx2-20 ° C. or lower. If Tmax is less than Tx1-20 ° C., crystallization does not proceed sufficiently. When Tmax exceeds Tx2-20 ° C., a compound crystal phase is formed and the coercive force is greatly increased.
- the recommended temperature of Tmax is Tx1 + (CB / CP) ⁇ 5 ° C. or higher and Tx2-20 ° C. or lower in order to offset the miniaturization of Cu clusters due to the increase in B concentration.
- Tmax is more preferably Tx1 + (CB / CP) ⁇ 5 + 20 ° C. or higher. Further, Tmax is preferably equal to or higher than the Curie temperature of the amorphous phase 16. By increasing Tmax, the temperature at which spinodal decomposition is started increases and ⁇ m increases. Therefore, the total number of Cu clusters at the initial stage of crystallization can be reduced and the number of large Cu clusters can be increased.
- the average cooling rate may be, for example, 100 ° C./min or more.
- the amorphous alloy as the precursor alloy of the nanocrystalline alloy in Embodiments 1 and 2 comprises only an amorphous phase.
- the term "consisting of only an amorphous phase” may include a trace amount of a crystalline phase within the range in which the effects of the first and second embodiments can be obtained.
- Diffraction pattern eg, X-ray source: Cu-K ⁇ ray; 1 step 0.02 °; 1) of an X-ray diffractometer (for example, Rigaku Smartlab (registered trademark) -9 kW equipped with a counter monochromator): 45 kV, 200 mA) Judgment is made using the measurement time per step: 10 seconds).
- X-ray source Cu-K ⁇ ray; 1 step 0.02 °; 1
- an X-ray diffractometer for example, Rigaku Smartlab (registered trademark) -9 kW equipped with a counter monochromator
- the amorphous alloy consists only of the amorphous phase.
- the surface of the sample is pickled in an inert gas atmosphere until the mass is reduced by at least about 0.1% by mass of the total mass of the weighed sample, and then the dried sample is X-ray diffractometer.
- the iron peak of the BCC structure is not confirmed in the diffraction pattern of, it is judged that the amorphous alloy consists only of the amorphous phase.
- the peak in the diffraction pattern (the peak near the (110) diffraction line of the BCC structure) is waveform-separated into the amorphous phase and the crystal phase (iron of the BCC structure), and the peak height of the crystal phase is non-existent.
- it is 1/20 or less of the peak height of the crystalline phase, it is judged that the iron peak of the BCC structure is not confirmed in the diffraction pattern of the X-ray diffractometer.
- the iron peak of the BCC structure confirms both the (110) and (200) diffraction lines. Even if the iron peak of the BCC structure is not confirmed in the diffraction pattern, a trace amount of crystal phase may be confirmed in the transmission electron microscope.
- amorphous alloys are used. Is considered to consist only of the amorphous phase.
- the nanocrystal alloy 10 according to the first and second embodiments, the amorphous phase 16 and a plurality of crystal phases 14 formed in the amorphous phase 16 are provided.
- the ratio of the crystal phase 14 in the alloy 10 may be such that the effects of the first and second embodiments can be obtained.
- the alloy 10 contains a crystal phase 14 to such an extent that an iron peak having a BCC structure is confirmed in the diffraction pattern of the above-mentioned X-ray diffractometer.
- the position is centered in the width direction of the sample and at a distance of about 1/8 of the total thickness from the surface of the sample, and for a powder-shaped sample, the surface of the sample is close to the average particle size.
- the alloy 10 contains 10 area% or more and 70 area% or less of the crystal phase 14. It may be. If the number of crystal phases 14 is large, the alloy tends to be brittle, so that it is likely to break during winding. Therefore, the amount of the crystal phase 14 can be appropriately adjusted according to the usage pattern.
- a sample was prepared as follows.
- the B concentration is determined by absorptiometry
- the C concentration is determined by infrared spectroscopy
- the P concentration and Si concentration are determined by high frequency inductively coupled plasma. Determined by emission spectroscopy.
- the Fe concentration was determined as the balance by subtracting the total concentration of chemical elements other than Fe from 100%.
- a 200 gram mixture was prepared to have the desired chemical composition.
- the mixture was heated in a crucible in an argon atmosphere to form a homogeneous molten metal.
- the molten metal was solidified in a copper mold to produce an ingot.
- Amorphous alloy was manufactured from the ingot using the single roll method.
- a 30 gram ingot was melted in a quartz crucible and discharged from a nozzle having an opening of 10 mm ⁇ 0.3 mm onto a rotating roll of pure copper.
- An amorphous ribbon having a width of 10 mm and a thickness of 20 ⁇ m was formed as an amorphous alloy on the rotating roll.
- the amorphous ribbon was peeled from the rotating roll by an argon gas jet. Using an X-ray diffractometer, it was confirmed by the above method that the amorphous ribbon was an amorphous alloy consisting only of amorphous material.
- Heat treatment was performed in an argon stream using an infrared gold image furnace to produce a ribbon, which is a nanocrystalline alloy, from an amorphous alloy.
- the heat treatment conditions are a heating rate of 400 ° C./min, a holding temperature (heat treatment temperature) of Tx1 + 20 ° C., a holding period of 1 minute, and a cooling rate of 0.2 to 0.5 ° C./sec.
- Tx1 and Tx2 were determined from the DSC curves obtained by heating the amorphous alloy to about 650 ° C. at a constant heating rate of 40 ° C./min by DSC.
- the ingot was heated to 1350 ° C. at a constant heating rate of 10 ° C./min by differential thermal analysis (DTA), then cooled at a constant heating rate of 10 ° C./min, and the rise of the first peak during cooling. Determined from temperature.
- DTA differential thermal analysis
- Table 1 is a table showing the chemical composition (concentration) in Examples and Comparative Examples.
- Table 2 is a table showing Tx1, Tx2, maximum temperature Tmax, Tx1 / TL ⁇ 100 (value obtained by multiplying Tx1 / TL by 100), saturation magnetic flux density Bs, and coercive force Hc in Examples and Comparative Examples.
- the coercive force and the saturation magnetic flux density of the nanocrystal alloy were measured using a DC magnetization characteristic measuring device model BHS-40 and a vibrating sample magnetometer PV-M10-5, respectively.
- the Fe concentration CFe is constant at 83.3 atomic%, and the Cu concentration CCu is constant at 0.7 atomic%.
- Sample No. No. 8 to No. In No. 13 the B concentration CB is constant at 10.0 atomic%, the total of the P concentration CP and the Si concentration CSi is 6.0 atomic%, and the CP and CSi are changed.
- the B concentration CB is set to 12.0 atomic%
- the total of the P concentration CP and the Si concentration CSi is set to 4.0 atomic%
- the CP and CSi are set to 4.0 atomic% and 0.0 atomic%, respectively. ..
- Sample No. 1 corresponds to Example 1 and sample No. 2 to No. 8 correspond to Comparative Examples 1 to 7, respectively, and sample No. No. 9 to No. No. 11 corresponds to Examples 2 to 4, respectively, and sample No. No. 12 to No. No. 14 is No. 14 from Comparative Example 8 respectively.
- Examples 1 and 2 correspond to the examples of the first embodiment, and the third and fourth embodiments correspond to the examples of the second embodiment.
- the coercive force Hc is lower than 14.
- Tx2 is about 520 ° C.
- Tx2 can be increased by adding Si. If CSi becomes too high, Hc becomes high.
- the CP is preferably 5.0 atomic% or more. 0 atomic% or more is more preferable.
- CSi is preferably 0.4 atomic% or more, more preferably 0.5 atomic% or more, and even more preferably 0.7 atomic% or more.
- the CSi is preferably 1.9 atomic% or less, more preferably 1.4 atomic% or less, and even more preferably 1.0 atomic% or less.
- CP is preferably 3.0 atomic% or more. 6 atomic% or more is preferable.
- CSi is preferably 1.1 atomic% or more, more preferably 1.5 atomic% or more, and even more preferably 2.0 atomic% or more.
- CSi is preferably 4.0 atomic% or less, more preferably 3.5 atomic% or less.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Electromagnetism (AREA)
- Dispersion Chemistry (AREA)
- Power Engineering (AREA)
- Thermal Sciences (AREA)
- Inorganic Chemistry (AREA)
- Soft Magnetic Materials (AREA)
Abstract
Description
実施形態1では、主に保磁力とTx2およびTx1/TLとの関係において各元素濃度の範囲を限定する。CFeは82.0原子%以上かつ88.0原子%以下であり、CCuは0.4原子%以上かつ1.0原子%以下であり、CPは5.0原子%以上かつ9.0原子%以下であり、CBは6.0原子%以上かつ10.0原子%以下であり、CSiは0.4原子%以上かつ1.9原子%以下であり、CCは0原子%以上かつ2.0原子%以下であり、CI(不純物の総量)は0原子%以上かつ0.3原子%以下である。
実施形態2では、主に保磁力、Tx2、およびTx1/TLの関係において各元素濃度の範囲を限定する。CFeは82.0原子%以上かつ88.0原子%以下であり、CCuは0.4原子%以上かつ0.9原子%以下であり、CPは3.0原子%以上かつ9.0原子%以下であり、CBは9.0原子%以上かつ12.0原子%以下であり、CSiは1.1原子%以上かつ4.0原子%以下であり、CCは0原子%以上かつ2.0原子%以下であり、CI(不純物の総量)は0原子%以上かつ0.3原子%以下である。
以下にナノ結晶合金の製造方法について説明する。実施形態に係る合金の製造方法は下記の方法には限定されない。
非晶質合金の製造には、単ロール法を用いる。単ロール法のロール径および回転数の条件は任意である。単ロール法は急速冷却が容易なため非晶質合金の製造に適している。非晶質合金の製造のため溶融した合金の冷却速度は、例えば104℃/秒以上が好ましく、106℃/秒以上が好ましい。冷却速度が104℃/秒の期間を含む単ロール法以外の方法を用いてもよい。非晶質合金の製造には、例えば水アトマイズ法または特許第6533352号記載のアトマイズ法を用いてもよい。
ナノ結晶合金は、非晶質合金の熱処理によって得られる。ナノ結晶合金の製造では、熱処理における温度履歴がナノ結晶合金のナノ構造に影響する。例えば、図1に示すような熱処理では、主に、加熱速度45、保持温度T2、保持期間42の長さ、冷却速度46がナノ結晶合金のナノ構造に影響する。
加熱速度45が速い場合には、小さなCuクラスタが生成する温度域を避けることができるため、結晶化初期において、多数の大きなCuクラスタが生成されやすい。よって、各結晶相14のサイズが小さくなる、また、非平衡的な反応がより進みやすくなり結晶相14内のP、BおよびCu等の濃度が増える。このため、結晶相14の合計量が多くなり、飽和磁束密度が増加する。さらに、結晶相14近傍の領域にPおよびCuが濃縮し、その結果、結晶相14の成長が抑制され、結晶相14のサイズが小さくなる。よって、保磁力が低下する。200℃から保持温度T2までの温度範囲において平均加熱速度ΔTは、360℃/分以上が好ましく、400℃/分以上がより好ましい。この温度範囲にて、10℃刻みで算出した平均加熱速度も、同じ条件を満たすとより好ましい。ただし、積層後の熱処理のように結晶化に伴う熱を逃がす必要がある場合には、平均加熱速度を小さくすると好ましい。例えば、このような平均加熱速度として、5℃/分以下であってもよい。
保持期間42の長さは、結晶化が十分に進行したと判断できる時間であることが好ましい。結晶化が十分に進行したと判断するには、示差走査熱量測定(DSC:Differential Scanning Calorimetry)により40℃/分の一定の加熱速度で650℃程度までナノ結晶合金を加熱して得られた曲線(DSC曲線)において、第1結晶化開始温度Tx1に相当する第1ピークが観測できない、または非常に小さくなった(例えば同一の化学組成の非晶質合金のDSC曲線における第1ピークの総発熱量の1/100以下の発熱量になった)ことを確認する。
保持温度T2の最高温度Tmaxは、第1結晶化開始温度Tx1-20℃以上かつ第2結晶化開始温度Tx2-20℃以下であることが好ましい。TmaxがTx1-20℃未満では、結晶化が十分に進行しない。TmaxがTx2-20℃を超えると、化合物結晶相が生成し、保磁力が大きく増加する。Tmaxの推奨温度は、B濃度の増加に伴うCuクラスタの微細化を相殺するために、Tx1+(CB/CP)×5℃以上かつTx2-20℃以下である。TmaxはTx1+(CB/CP)×5+20℃以上がより好ましい。また、Tmaxは、非晶質相16のキュリー温度以上であることが好ましい。Tmaxを高くすることで、スピノーダル分解が開始される温度が高くなりλmが大きくなる。よって、結晶化初期におけるCuクラスタの総数を減らしかつ大きいCuクラスタを増やすことができる。
冷却が開始されると、非晶質相16に固溶するCuが析出する。非晶質相16に固溶するCu原子とFe原子とは量子力学的作用によりFeの磁化を低下させる。これにより、飽和磁束密度が低下する。よって、飽和磁束密度を高めるためには、冷却速度46は遅い方が好ましい。一方、冷却速度46が遅すぎると、ナノ結晶合金の製造に時間がかかる。以上より、合金の温度がTmaxまたはTx1+(CB/CP)×5に達してから200℃までの平均の冷却速度は0.2℃/秒以上かつ0.5℃/秒以下が好ましい。保持によって得られた組織をできる限り維持する観点や生産効率を高める観点からは、平均冷却速度が例えば100℃/分以上であってもよい。
実施形態1および2におけるナノ結晶合金の前駆体合金としての非晶質合金は、非晶質相のみからなる。ここで非晶質相のみからなるとは、実施形態1および2の効果が得られる範囲において微量の結晶相を含んでいてもよい。
実施形態1および2におけるナノ結晶合金10、非晶質相16と非晶質相16内に形成された複数の結晶相14とを備える。合金10内の結晶相14の割合は、実施形態1および2の効果が得られる程度であればよい。例えば、合金10は、上述のX線回折装置の回折パターンにBCC構造の鉄のピークが確認される程度の結晶相14を含む。例えば、板状の試料については、試料の幅方向中心でかつ試料の表面から全厚の約1/8の距離だけ離れた位置を、粉状の試料については、平均粒径に近い試料の表面から直径の約1/8の距離だけ離れた位置を、透過型電子顕微鏡で30万倍の倍率で観察した場合に、合金10は、10面積%以上かつ70面積%以下の結晶相14を含んでもよい。結晶相14が多いと、合金が脆くなりやすいので、巻取時に破断しやすくなる。そのため、利用形態に応じて結晶相14の量を適宜調整することができる。
合金の出発材料として、鉄(0.01重量%以下の不純物)、ボロン(0.5重量%未満の不純物)、燐化三鉄(1重量%未満の不純物)、銅(0.01重量%未満の不純物)といった試薬を準備した。これら試薬の混合物からナノ結晶合金を製造する過程では、元素の損失や混入が生じないことを予め確認した。この確認では、非晶質合金およびナノ結晶合金中の化学元素のうち、B濃度を吸光光度法により決定し、C濃度を赤外分光法により決定し、P濃度及びSi濃度を高周波誘導結合プラズマ発光分光分析法により決定した。Fe濃度は、100%からFe以外の化学元素の合計濃度を差し引き、残部として決定した。
14 結晶相
16 非晶質相
Claims (6)
- 非晶質相を備え、
合金全体の平均Fe濃度は82.0原子%以上かつ88.0原子%以下であり、
合金全体の平均Cu濃度は0.4原子%以上かつ1.0原子%以下であり、
合金全体の平均P濃度は5.0原子%以上かつ9.0原子%以下であり、
合金全体の平均B濃度は6.0原子%以上かつ10.0原子%以下であり、
合金全体の平均Si濃度は0.4原子%以上かつ1.9原子%以下であり、
合金全体の平均C濃度は0原子%以上かつ2.0原子%以下であり、
Fe、Cu、P、B、SiおよびC以外の不純物における合金全体の平均不純物濃度は0原子%以上かつ0.3原子%以下であり、
前記平均Fe濃度、前記平均Cu濃度、前記平均P濃度、前記平均B濃度、前記平均Si濃度、前記平均C濃度および前記平均不純物濃度の合計は100.0原子%である合金。 - 前記平均Fe濃度は83.0原子%以上かつ88.0原子%以下であり、
前記平均Cu濃度は0.4原子%以上かつ0.9原子%以下であり、
前記平均P濃度は5.0原子%以上かつ8.0原子%以下であり、
前記平均Si濃度は0.9原子%以上かつ1.4原子%以下であり、
前記平均C濃度は0原子%以上かつ0.1原子%以下であり、
前記平均不純物濃度は0原子%以上かつ0.1原子%以下である請求項1に記載の合金。 - 非晶質相を備え、
合金全体の平均Fe濃度は82.0原子%以上かつ88.0原子%以下であり、
合金全体の平均Cu濃度は0.4原子%以上かつ0.9原子%以下であり、
合金全体の平均P濃度は3.0原子%以上かつ9.0原子%以下であり、
合金全体の平均B濃度は9.0原子%以上かつ12.0原子%以下であり、
合金全体の平均Si濃度は1.1原子%以上かつ4.0原子%以下であり、
合金全体の平均C濃度は0原子%以上かつ2.0原子%以下であり、
Fe、Cu、P、B、SiおよびC以外の不純物における合金全体の平均不純物濃度は0原子%以上かつ0.3原子%以下であり、
前記平均Fe濃度、前記平均Cu濃度、前記平均P濃度、前記平均B濃度、前記平均Si濃度、前記平均C濃度および前記平均不純物濃度の合計は100.0原子%である合金。 - 前記平均Fe濃度は83.0原子%以上かつ88.0原子%以下であり、
前記平均Cu濃度は0.4原子%以上かつ0.8原子%以下であり、
前記平均P濃度は3.0原子%以上かつ5.0原子%以下であり、
前記平均Si濃度は1.5原子%以上かつ4.0原子%以下であり、
前記平均C濃度は0原子%以上かつ0.1原子%以下であり、
前記平均不純物濃度は0原子%以上かつ0.1原子%以下である請求項3に記載の合金。 - 前記非晶質相と前記非晶質相内に形成された複数の結晶相とを備える請求項1から4のいずれか一項に記載の合金。
- 前記非晶質相のみからなる請求項1から4のいずれか一項に記載の合金。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2021567496A JPWO2021132272A1 (ja) | 2019-12-25 | 2020-12-22 | |
CN202080089749.1A CN114846164A (zh) | 2019-12-25 | 2020-12-22 | 合金 |
US17/789,061 US20230038669A1 (en) | 2019-12-25 | 2020-12-22 | Alloy |
KR1020227021508A KR20220115577A (ko) | 2019-12-25 | 2020-12-22 | 합금 |
EP20905592.0A EP4083238A4 (en) | 2019-12-25 | 2020-12-22 | ALLOY |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019234391 | 2019-12-25 | ||
JP2019-234391 | 2019-12-25 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2021132272A1 true WO2021132272A1 (ja) | 2021-07-01 |
Family
ID=76575937
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2020/048020 WO2021132272A1 (ja) | 2019-12-25 | 2020-12-22 | 合金 |
Country Status (6)
Country | Link |
---|---|
US (1) | US20230038669A1 (ja) |
EP (1) | EP4083238A4 (ja) |
JP (1) | JPWO2021132272A1 (ja) |
KR (1) | KR20220115577A (ja) |
CN (1) | CN114846164A (ja) |
WO (1) | WO2021132272A1 (ja) |
Citations (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0233352B2 (ja) | 1978-10-25 | 1990-07-26 | Nrii Sakai Inc | |
WO2010021130A1 (ja) | 2008-08-22 | 2010-02-25 | Makino Akihiro | 合金組成物、Fe基ナノ結晶合金及びその製造方法、並びに磁性部品 |
WO2011122589A1 (ja) | 2010-03-29 | 2011-10-06 | 日立金属株式会社 | 初期超微結晶合金、ナノ結晶軟磁性合金及びその製造方法、並びにナノ結晶軟磁性合金からなる磁性部品 |
JP2011256453A (ja) | 2010-06-11 | 2011-12-22 | Nec Tokin Corp | Fe基ナノ結晶合金の製造方法、Fe基ナノ結晶合金、磁性部品、Fe基ナノ結晶合金の製造装置 |
JP2013055182A (ja) * | 2011-09-02 | 2013-03-21 | Nec Tokin Corp | 軟磁性合金粉末、ナノ結晶軟磁性合金粉末、その製造方法、および圧粉磁心 |
JP2013185162A (ja) | 2012-03-06 | 2013-09-19 | Nec Tokin Corp | 合金組成物、Fe基ナノ結晶合金及びその製造方法、並びに磁性部品 |
JP2016145373A (ja) * | 2015-02-06 | 2016-08-12 | Necトーキン株式会社 | Fe基ナノ結晶合金の製造方法 |
WO2017006868A1 (ja) | 2015-07-03 | 2017-01-12 | 国立大学法人東北大学 | 積層磁芯及びその製造方法 |
CN107393673A (zh) * | 2017-07-31 | 2017-11-24 | 东莞美壹磁电科技有限公司 | 一种铁基非晶纳米晶软磁合金及其制备方法 |
WO2018139563A1 (ja) * | 2017-01-27 | 2018-08-02 | 株式会社トーキン | 軟磁性粉末、Fe基ナノ結晶合金粉末、磁性部品及び圧粉磁芯 |
JP2018137306A (ja) * | 2017-02-21 | 2018-08-30 | 株式会社トーキン | 軟磁性粉末、磁性部品及び圧粉磁芯 |
JP2021017614A (ja) * | 2019-07-18 | 2021-02-15 | 株式会社村田製作所 | ナノ結晶軟磁性合金材および磁性部品 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5537534B2 (ja) * | 2010-12-10 | 2014-07-02 | Necトーキン株式会社 | Fe基ナノ結晶合金粉末及びその製造方法、並びに、圧粉磁心及びその製造方法 |
-
2020
- 2020-12-22 EP EP20905592.0A patent/EP4083238A4/en active Pending
- 2020-12-22 KR KR1020227021508A patent/KR20220115577A/ko active Search and Examination
- 2020-12-22 CN CN202080089749.1A patent/CN114846164A/zh active Pending
- 2020-12-22 WO PCT/JP2020/048020 patent/WO2021132272A1/ja unknown
- 2020-12-22 JP JP2021567496A patent/JPWO2021132272A1/ja active Pending
- 2020-12-22 US US17/789,061 patent/US20230038669A1/en active Pending
Patent Citations (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0233352B2 (ja) | 1978-10-25 | 1990-07-26 | Nrii Sakai Inc | |
WO2010021130A1 (ja) | 2008-08-22 | 2010-02-25 | Makino Akihiro | 合金組成物、Fe基ナノ結晶合金及びその製造方法、並びに磁性部品 |
WO2011122589A1 (ja) | 2010-03-29 | 2011-10-06 | 日立金属株式会社 | 初期超微結晶合金、ナノ結晶軟磁性合金及びその製造方法、並びにナノ結晶軟磁性合金からなる磁性部品 |
JP2011256453A (ja) | 2010-06-11 | 2011-12-22 | Nec Tokin Corp | Fe基ナノ結晶合金の製造方法、Fe基ナノ結晶合金、磁性部品、Fe基ナノ結晶合金の製造装置 |
JP2013055182A (ja) * | 2011-09-02 | 2013-03-21 | Nec Tokin Corp | 軟磁性合金粉末、ナノ結晶軟磁性合金粉末、その製造方法、および圧粉磁心 |
JP2013185162A (ja) | 2012-03-06 | 2013-09-19 | Nec Tokin Corp | 合金組成物、Fe基ナノ結晶合金及びその製造方法、並びに磁性部品 |
JP2016145373A (ja) * | 2015-02-06 | 2016-08-12 | Necトーキン株式会社 | Fe基ナノ結晶合金の製造方法 |
WO2017006868A1 (ja) | 2015-07-03 | 2017-01-12 | 国立大学法人東北大学 | 積層磁芯及びその製造方法 |
WO2018139563A1 (ja) * | 2017-01-27 | 2018-08-02 | 株式会社トーキン | 軟磁性粉末、Fe基ナノ結晶合金粉末、磁性部品及び圧粉磁芯 |
JP2018137306A (ja) * | 2017-02-21 | 2018-08-30 | 株式会社トーキン | 軟磁性粉末、磁性部品及び圧粉磁芯 |
CN107393673A (zh) * | 2017-07-31 | 2017-11-24 | 东莞美壹磁电科技有限公司 | 一种铁基非晶纳米晶软磁合金及其制备方法 |
JP2021017614A (ja) * | 2019-07-18 | 2021-02-15 | 株式会社村田製作所 | ナノ結晶軟磁性合金材および磁性部品 |
Non-Patent Citations (1)
Title |
---|
See also references of EP4083238A4 |
Also Published As
Publication number | Publication date |
---|---|
EP4083238A4 (en) | 2024-01-10 |
JPWO2021132272A1 (ja) | 2021-07-01 |
US20230038669A1 (en) | 2023-02-09 |
CN114846164A (zh) | 2022-08-02 |
KR20220115577A (ko) | 2022-08-17 |
EP4083238A1 (en) | 2022-11-02 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US8007600B2 (en) | Soft magnetic thin strip, process for production of the same, magnetic parts, and amorphous thin strip | |
TW226034B (ja) | ||
JPS6356297B2 (ja) | ||
JP2018123424A (ja) | 軟磁気特性に優れたFe系非晶質合金及びFe系非晶質合金薄帯 | |
JP2010018869A (ja) | 垂直磁気記録媒体における軟磁性膜層用合金およびスパッタリングターゲット材並びにその製造方法 | |
WO2004028724A1 (en) | Method and apparatus for producing amorphous alloy sheet, and amorphous alloy sheet produced using the same | |
JP6648856B2 (ja) | Fe基合金、結晶質Fe基合金アトマイズ粉末、及び磁心 | |
WO2021149590A1 (ja) | 合金および成形体 | |
CN113388766B (zh) | 一种锰基纳米晶/非晶复合结构合金及其制备方法 | |
WO2021132272A1 (ja) | 合金 | |
US11078561B2 (en) | Soft magnetic material and method for producing the same | |
CN109880985B (zh) | 软磁材料的制造方法 | |
Shen et al. | Soft magnetic properties of bulk nanocrystalline Fe–Co–B–Si–Nb–Cu alloy with high saturated magnetization of 1.35 T | |
JP2020020023A (ja) | 合金組成物、Fe基ナノ結晶合金およびその製造方法、ならびに、磁性部品 | |
JPH0768604B2 (ja) | Fe基磁性合金 | |
JP4529198B2 (ja) | 微量の希土類金属を含む鉄基永久磁石およびその製造方法 | |
WO2024122412A1 (ja) | 合金 | |
JP3744713B2 (ja) | 高強度アルミニウム合金固化材 | |
JP3744729B2 (ja) | 高強度アルミニウム合金固化材 | |
JP2002057021A (ja) | 軟磁性材料及び磁心 | |
JP2892270B2 (ja) | 微細結晶組織を有する合金の製造方法及び微細結晶質合金 | |
JPH01142049A (ja) | Fe基磁性合金 | |
JP2010028037A (ja) | 軟磁性薄帯及びその製造方法、これを用いた磁心、コイル | |
Nomuraa et al. | Heating rate dependence of coercivity and microstructure of Fe-BP-Cu nanocrystalline soft magnetic materials | |
US20090260720A1 (en) | Nd-based two-phase separation amorphous alloy |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 20905592 Country of ref document: EP Kind code of ref document: A1 |
|
ENP | Entry into the national phase |
Ref document number: 20227021508 Country of ref document: KR Kind code of ref document: A |
|
ENP | Entry into the national phase |
Ref document number: 2021567496 Country of ref document: JP Kind code of ref document: A |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
ENP | Entry into the national phase |
Ref document number: 2020905592 Country of ref document: EP Effective date: 20220725 |