WO2021128544A1 - 柔性基板及其制备方法 - Google Patents

柔性基板及其制备方法 Download PDF

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WO2021128544A1
WO2021128544A1 PCT/CN2020/075830 CN2020075830W WO2021128544A1 WO 2021128544 A1 WO2021128544 A1 WO 2021128544A1 CN 2020075830 W CN2020075830 W CN 2020075830W WO 2021128544 A1 WO2021128544 A1 WO 2021128544A1
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flexible
rigid
area
polyimide film
flexible substrate
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PCT/CN2020/075830
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English (en)
French (fr)
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李林霜
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深圳市华星光电半导体显示技术有限公司
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Priority to US16/645,476 priority Critical patent/US11626038B2/en
Publication of WO2021128544A1 publication Critical patent/WO2021128544A1/zh

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    • G—PHYSICS
    • G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • G09F9/30—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
    • G09F9/301—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements flexible foldable or roll-able electronic displays, e.g. thin LCD, OLED
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1039—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors comprising halogen-containing substituents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1003—Preparatory processes
    • C08G73/1007—Preparatory processes from tetracarboxylic acids or derivatives and diamines
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1042—Copolyimides derived from at least two different tetracarboxylic compounds or two different diamino compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1075—Partially aromatic polyimides
    • C08G73/1082—Partially aromatic polyimides wholly aromatic in the tetracarboxylic moiety
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18—Manufacture of films or sheets
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
    • C08L79/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C08L79/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2379/00—Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen, or carbon only, not provided for in groups C08J2361/00 - C08J2377/00
    • C08J2379/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C08J2379/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/549—Organic PV cells

Definitions

  • the application relates to the field of display panels, in particular to a flexible substrate and a preparation method thereof.
  • the flexible substrate of the flexible display panel is usually made of polyimide material. In the process of repeated bending or folding of the flexible substrate, due to the large stress, the flexible substrate is deformed or even broken.
  • the method used It mainly uses laser to form protrusions or grooves on the flexible substrate to reduce the stress of the flexible substrate, but the formation of grooves or protrusions requires a large amount of laser energy, and the formed protrusions or grooves can cause damage to the flexible substrate , Which in turn affects the performance of the flexible substrate.
  • the present application provides a flexible substrate and a preparation method thereof. There is no need to use a laser to form grooves or protrusions on the flexible substrate to reduce the stress of the flexible substrate, and the stress of the flexible substrate can be directly reduced through the flexible substrate material.
  • the present application provides a flexible substrate and a preparation method thereof to improve the performance of the flexible substrate.
  • the present application provides a flexible substrate, including a flexible substrate, the flexible substrate is a polyimide film, the surface roughness of the polyimide film is less than 1 nanometer, and the polyimide film includes a polyimide film.
  • the polyimide film is divided into a first rigid area, a flexible area, and a second rigid area, and the first rigid area and the second rigid area are located in the flexible area
  • the rigid segment content of the polyimide film in the first rigid area and the second rigid area is 75%-95%
  • the polyamide in the first rigid area and the second rigid area The content of the flexible segment of the imine film is 5%-25%
  • the content of the flexible segment of the polyimide film in the flexible area is 80%-98%
  • the rigid chain of the polyimide film in the flexible area The segment content is 2%-20%.
  • the polyimide film has the same thickness in the first rigid area, the second rigid area, and the flexible area.
  • the polyimide film is divided into a first rigid area, a flexible area, and a second rigid area, and the first rigid area and the second rigid area are located in the flexible area
  • the rigid segment content of the polyimide film in the first rigid area and the second rigid area is 75%-95%
  • the polyamide in the first rigid area and the second rigid area The content of the flexible segment of the imine film is 5%-25%
  • the content of the flexible segment of the polyimide film in the flexible area is 80%-98%
  • the rigid chain of the polyimide film in the flexible area The segment content is 2%-20%.
  • the polyimide film has the same thickness in the first rigid area, the second rigid area, and the flexible area.
  • the present application provides a method for preparing a flexible substrate, including:
  • the first polyamic acid solution and the second polyamic acid solution on the glass substrate are heat-treated to form a flexible substrate.
  • the flexible substrate is a polyimide film, and the polyimide film includes a polyimide film.
  • the first rigid area And the second rigid area are located on both sides of the flexible area, the first rigid area and the second rigid area are formed by the first polyamic acid solution, and the flexible area is formed by the second polyamic acid solution.
  • the amic acid solution is formed, in which, Is the rigid segment of polyimide,
  • Laser processing is performed on the glass substrate and the flexible substrate, and the glass substrate is separated from the flexible substrate.
  • the thickness of the polyimide film in the first rigid area, the flexible substrate, and the second rigid area is the same.
  • the content of the rigid segments of the first rigid region and the second rigid region in the polyimide film is 75%-95%, and the content of the rigid segments of the first rigid region and the second rigid region is 75%-95%.
  • the content of the flexible segments of a rigid area and the second rigid area in the polyimide film is 5%-25%, and the content of the flexible segments of the flexible area in the polyimide film is 80%-98%, the content of the rigid segment of the flexible region in the polyimide film is 2%-20%.
  • the solvent includes one or a combination of acetonitrile, dimethylformamide, dimethyl sulfoxide and hexamethylphosphoric triamide.
  • the flexible substrate includes a flexible substrate, the flexible substrate is a polyimide film, and the polyimide has rigid segments and flexible segments.
  • the polyimide film is divided into a rigid area and a flexible area. The rigid area is dominated by the rigid segment, and the flexible area is dominated by the flexible segment.
  • FIG. 1 is a cross-sectional view of a flexible substrate provided by this application.
  • FIG. 2 is a cross-sectional view of a process for preparing a flexible substrate provided by this application.
  • FIG. 1 is a cross-sectional view of a flexible substrate provided by this application.
  • the flexible substrate 10 includes a flexible substrate.
  • the flexible substrate is a polyimide film.
  • the polyimide film includes polyimide.
  • the structural formula of the polyimide is The R 1 group and the R 3 group are selected from One or more combinations of.
  • the R 2 group is selected from One or more combinations of.
  • the molecular weight of the rigid segment is M 1 .
  • the molecular weight of the flexible segment is M 2 .
  • the polyimide film is divided into a first rigid area, a flexible area, and a second rigid area.
  • the first rigid area and the second rigid area are located on both sides of the flexible area.
  • the specific distribution of the first rigid area, the second rigid area and the flexible area can be adjusted according to the actual folding radius of curvature.
  • the areas of the first rigid area, the second rigid area, and the flexible area may be equal or different. In this embodiment, the areas of the first rigid area, the second rigid area, and the flexible area are equal.
  • the content of the rigid segments of the polyimide film in the first rigid area and the second rigid area in the polyimide is M 1 /(M 1 +M 2 ), which is 75%-95% .
  • the content of the flexible segment of the polyimide film in the first rigid area and the second rigid area is M 2 /(M 1 +M 2 ), which is 5%-25%.
  • the content of the flexible segment of the polyimide film in the flexible region is M 2 /(M 1 +M 2 ), which is 80%-98%.
  • the rigid segment content of the polyimide film in the flexible region is M 1 /(M 1 +M 2 ), which is 2%-20%.
  • the polyimide film has the same thickness in the first rigid area, the second rigid area, and the flexible area.
  • the thickness of the polyimide film is 10 micrometers to 30 micrometers.
  • the surface roughness of the polyimide film is less than 1 nanometer.
  • the optical transmittance of the polyimide film at 308 nm is less than 0.1%.
  • the polyimide is formed by permutation and combination of the R 1 group, the R 2 group, the R 3 group, and the R 4 group.
  • the polyimide The structural formula is Wait.
  • the flexible substrate can be used for a variety of flexible displays, such as flexible LCD, flexible OLED, and flexible Micro-LED.
  • the rigid regions are dominated by rigid segments, the rigid
  • the area is dominated by rigid segments, which improves the heat resistance and dimensional stability of the flexible substrate.
  • the flexible area is dominated by flexible segments, and the flexible area is dominated by flexible segments, which improves the performance of the flexible substrate.
  • Flexible and because the flexible region has high flexibility and the polyimide molecular segment at the interface between the rigid region and the flexible region has an interpenetrating network structure, the folding stability of the flexible substrate is improved, that is, , Improve the performance of the flexible substrate.
  • FIG. 2 is a cross-sectional view of a process for preparing a flexible substrate provided by this application.
  • the present application also provides a method for preparing the flexible substrate 10, including:
  • A. Provide a glass substrate 110.
  • a slit coating method is used to coat the first polyamic acid solution and the second polyamic acid solution on the glass substrate 110 to form a first rigid area 121, a flexible area 122, and a second rigid area.
  • the first rigid area 121 and the second rigid area 123 are located on both sides of the flexible area 122.
  • the areas of the first rigid area 121, the second rigid area 123 and the flexible area 122 may be the same or different. In this embodiment, the areas of the first rigid area 121, the second rigid area 123 and the flexible area 122 are the same.
  • the thickness of the first polyamic acid solution coated on the first rigid region 121 and the second rigid region 123 is the same as the thickness of the second polyamic acid solution coated on the flexible region 122.
  • the first polyamic acid solution includes a first polyamic acid and a solvent.
  • the second polyamic acid solution includes a second polyamic acid and a solvent.
  • the solvent includes one or a combination of acetonitrile, dimethylformamide, dimethylsulfoxide and hexamethylphosphoric triamide.
  • the first polyamic acid solution and the second polyamic acid solution further include a curing agent.
  • the curing agent includes m-phenylenediamine, diaminodiphenylmethane, diaminodiphenylsulfone, maleic anhydride, phthalic anhydride, hexahydrophthalic anhydride, dicyandiamide, acetylhydrazine, One or more combinations of benzenesulfonyl hydrazide, urea-formaldehyde resin, melamine-formaldehyde resin, and polyamide polyamine epichlorohydrin.
  • the step of forming the first polyamic acid solution and the second polyamic acid solution includes: providing a first reactant, a second reactant, and a third reactant.
  • the first reactant, the second reactant, and the third reactant are polymerized to form the first polyamic acid solution or the second polyamic acid solution.
  • the first reactant is The R 5 group is selected from One or more combinations of.
  • the second reactant is H 2 NR 6 -NH 2 , and the R 6 group is selected from One or more combinations of.
  • the structural formula of the first reactant is The structural formula of the second reactant is H 2 NR 6 -NH 2 .
  • the structural formula of the third reactant is H 2 NR 7 -NH 2 .
  • the first reactant The second reactant H 2 NR 6 -NH 2 and the third reactant H 2 NR 7 -NH 2 undergo polymerization reaction to generate the first polyamic acid or the second polyamic acid
  • the general reaction formula can be:
  • the first reactant, the second reactant, and the third reactant are added to the solvent in a molar ratio of 2:1:1.
  • the temperature of the polymerization reaction is -10 degrees Celsius to 10 degrees Celsius.
  • the solvent includes one or a combination of acetonitrile, dimethylformamide, dimethylsulfoxide, and hexamethylphosphoric triamide.
  • a curing agent is added to form the first polyamic acid or the second polyamic acid.
  • the curing agent includes m-phenylenediamine, diaminodiphenylmethane, diaminodiphenylsulfone, maleic anhydride, phthalic anhydride, hexahydrophthalic anhydride, dicyandiamide, acetylhydrazine, One or more combinations of benzenesulfonyl hydrazide, urea-formaldehyde resin, melamine-formaldehyde resin, and polyamide polyamine epichlorohydrin.
  • the first reactant may be The second reactant can be The third reactant may be H 2 N-CH 2 CH 2 -NH 2 .
  • the reaction formula of the first reactant, the second reactant and the third reactant to generate the first polyamic acid or the second polyamic acid may be:
  • the first reactant may be The second reactant can be The third reactant may be H 2 N-CH 2 CH 2 -NH 2 .
  • the reaction formula of the first reactant, the second reactant and the third reactant to generate the first polyamic acid or the second polyamic acid may be:
  • the surface roughness of the formed polyimide film can be controlled by the viscosity, coating speed, surface tension, etc. of the first polyamic acid solution and the second polyamic acid solution.
  • the structural formula of the first polyamic acid or the second polyamic acid may be
  • the reaction formula of the first polyamic acid or the second polyamic acid to form the polyimide may be for:
  • the heat treatment includes a first-stage heat treatment and a second-stage heat treatment.
  • the temperature of the first stage heat treatment is 50 degrees Celsius to 200 degrees Celsius
  • the first stage heat treatment time is 0.5 hours to 3 hours
  • the solvent is removed.
  • the solvent is dimethylformamide to form
  • the imidization degree of the first-stage product is higher than 80%
  • the solvent content of the first-stage product is lower than 5%.
  • the temperature of the second stage heat treatment is 300 degrees Celsius to 800 degrees Celsius, and the time of the second stage heat treatment is 0.5 hours to 3 hours. After the second stage heat treatment, a polyimide film is formed.
  • the solvent content of the polyimide film is less than 0.5%, and the degree of imidization reaches more than 99%.
  • the structural formula of the first polyamic acid or the second polyamic acid may be
  • the reaction formula of the first polyamic acid or the second polyamic acid to form the polyimide may be for:
  • n 1 1-35000
  • m 2 1-35000
  • the heat treatment includes a first-stage heat treatment and a second-stage heat treatment.
  • the temperature of the first stage heat treatment is 50 degrees Celsius to 200 degrees Celsius
  • the time of the first stage heat treatment is 0.5 hours to 3 hours
  • the solvent is removed.
  • the solvent is dimethylformamide to form
  • the imidization degree of the first-stage product is higher than 80%
  • the solvent content of the first-stage product is lower than 5%.
  • the second-stage heat treatment is performed on the first-stage product, and the solvent dimethylformamide is removed again to form the polyimide film
  • the temperature of the second stage heat treatment is 300 degrees Celsius to 800 degrees Celsius, and the time of the second stage heat treatment is 0.5 hours to 3 hours.
  • a polyimide film is formed.
  • the solvent content of the polyimide film is less than 0.5%, and the degree of imidization reaches more than 99%.
  • the flexible substrate 120 is the polyimide film.
  • the formed polyimide film is divided into a first rigid area 121, a flexible area 122 and a second rigid area 123.
  • the first rigid area 121 and the second rigid area 123 are formed by the first polyamic acid solution
  • the flexible area 122 is formed by the second polyamic acid solution.
  • the content of the rigid segments of the polyimide film of the first rigid region 121 and the second rigid region 123 in the polyimide is M 1 /(M 1 +M 2 ), which is 75 %-95%.
  • the content of the flexible segment of the polyimide film in the first rigid area 121 and the second rigid area 123 is M 2 /(M 1 +M 2 ), which is 5%-25%.
  • the content of the flexible segment of the polyimide film in the flexible region 122 is M 2 /(M 1 +M 2 ), which is 80%-98%.
  • the rigid segment content of the polyimide film in the flexible region 122 is M 1 /(M 1 +M 2 ), which is 2%-20%.
  • the thickness of the polyimide film in the first rigid area 121, the second rigid area 123 and the flexible area 122 is the same.
  • the thickness of the polyimide film is 10 micrometers to 30 micrometers.
  • the surface roughness of the polyimide film is less than 1 nanometer.
  • the optical transmittance of the polyimide film at 308 nm is less than 0.1%.
  • the surface roughness of the polyimide film can be controlled by the viscosity, coating speed and surface tension of the first polyamic acid solution or the second polyamic acid solution.
  • the glass substrate 110 and the flexible substrate 120 are processed by a laser lift-off process so that laser light is injected from the back of the glass substrate 110.
  • the wavelength of the laser used can be 308 nanometers, so that the The glass substrate 110 is separated from the flexible substrate 120.
  • the present application provides a flexible substrate and a preparation method thereof.
  • the flexible substrate includes a flexible substrate, the flexible substrate is a polyimide film, and the polyimide has rigid segments and flexible segments.
  • the polyimide film is divided into a rigid area and a flexible area.
  • the rigid area is Rigid segments are the main ones, and the flexible areas are mainly the flexible segments. Because the rigid areas are mainly rigid segments, the heat resistance and dimensional stability of the flexible substrate are improved.
  • the flexible segment is mainly used to improve the flexibility of the flexible substrate, and because the flexible region has high flexibility and the polyimide molecular segments at the interface between the rigid region and the flexible region are interpenetrating
  • the network structure improves the folding stability of the flexible substrate, and therefore, improves the performance of the flexible substrate.

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Abstract

提供一种柔性基板及其制备方法，柔性基板包括柔性衬底，柔性衬底为聚酰亚胺薄膜，聚酰亚胺的结构式为： (I) 聚酰亚胺具有刚性链段和柔性链段；聚酰亚胺薄膜分为刚性区域和柔性区域，刚性区域上以刚性链段为主，柔性区域上以柔性链段为主。因聚酰亚胺具有刚性链段和柔性链段，可将聚酰亚胺应用于柔性基板中。

Description

柔性基板及其制备方法 技术领域
本申请涉及显示面板领域，具体涉及一种柔性基板及其制备方法。
背景技术
柔性显示面板的柔性基板通常采用聚酰亚胺材料制备，柔性基板在反复多次弯曲或折叠的过程中，因存在较大的应力，使得柔性基板发生形变，甚至破裂，目前，所采用的方法主要是通过激光在柔性基板上形成凸起或凹槽来降柔性基板的应力，但凹槽或凸起的形成需要较大的激光能量，且形成的凸起或凹槽会对柔性基板造成损伤，进而影响了柔性基板的性能。
技术问题
本申请提供一种柔性基板及其制备方法，无需用激光在柔性基板上形成凹槽或凸起来降低柔性基板的应力，可直接通过柔性衬底材料进行降低柔性基板的应力。
技术解决方案
本申请提供一种柔性基板及其制备方法，以提高柔性基板的性能。
本申请提供一种柔性基板，包括柔性衬底，所述柔性衬底为聚酰亚胺薄膜，所述聚酰亚胺薄膜的表面粗糙度小于1纳米，所述聚酰亚胺薄膜包括聚酰亚胺，所述聚酰亚胺的结构式为
Figure PCTCN2020075830-appb-000001
所述R 1基团和所述R 3基团选自
Figure PCTCN2020075830-appb-000002
Figure PCTCN2020075830-appb-000003
所述R 2基团选自
Figure PCTCN2020075830-appb-000004
Figure PCTCN2020075830-appb-000005
所述R 4基团可以为-C nH 2n-，其中，n＝1-20，其中，
Figure PCTCN2020075830-appb-000006
为聚酰亚胺的刚性链段，
Figure PCTCN2020075830-appb-000007
为 聚酰亚胺的柔性链段，m 1＝1-35000，m 2＝1-35000。
在本申请所提供的柔性基板中，所述聚酰亚胺薄膜分为第一刚性区域、柔性区域和第二刚性区域，所述第一刚性区域和所述第二刚性区域位于所述柔性区域两侧，所述第一刚性区域和所述第二刚性区域的聚酰亚胺薄膜的刚性链段含量为75％-95％，所述第一刚性区域和所述第二刚性区域的聚酰亚胺薄膜的柔性链段含量为5％-25％，所述柔性区域的聚酰亚胺薄膜的柔性链段含量为80％-98％，所述柔性区域的聚酰亚胺薄膜的刚性链段含量为2％-20％。
在本申请所提供的柔性基板中，所述聚酰亚胺薄膜在所述第一刚性区域、所述第二刚性区域和所述柔性区域的厚度相同。
在本申请所提供的柔性基板中，所述R 1基团、所述R 2基团和所述R 3基团的侧链上还包括一个或多个取代基，所述取代基选自-F、-C 2xH 2x+2和-CF 3，x＝1-20。
本申请提供一种柔性基板，包括柔性衬底，所述柔性衬底为聚酰亚胺薄膜，所述聚酰亚胺薄膜包括聚酰亚胺，所述聚酰亚胺的结构式为
Figure PCTCN2020075830-appb-000008
所述R 1基团和所述R 3基团选自
Figure PCTCN2020075830-appb-000009
所述R 2基团选自
Figure PCTCN2020075830-appb-000010
Figure PCTCN2020075830-appb-000011
所述R 4基团可以为-C nH 2n-，其中，n＝1-20，其中，
Figure PCTCN2020075830-appb-000012
为聚酰亚胺的刚性链段，
Figure PCTCN2020075830-appb-000013
为聚酰亚胺的柔性链段，m 1＝1-35000，m 2＝1-35000。
在本申请所提供的柔性基板中，所述聚酰亚胺薄膜分为第一刚性区域、柔性区域和第二刚性区域，所述第一刚性区域和所述第二刚性区域位于所述柔性区域两侧，所述第一刚性区域和所述第二刚性区域的聚酰亚胺薄膜的刚性链段含量为75％-95％，所述第一刚性区域和所述第二刚性区域的聚酰亚胺薄膜的柔性链段含量为5％-25％，所述柔性区域的聚酰亚胺薄膜的柔性链段含量为80％-98％，所述柔性区域的聚酰亚胺薄膜的刚性链段含量为 2％-20％。
在本申请所提供的柔性基板中，所述聚酰亚胺薄膜在所述第一刚性区域、所述第二刚性区域和所述柔性区域的厚度相同。
在本申请所提供的柔性基板中，所述R 1基团、所述R 2基团和所述R 3基团的侧链上还包括一个或多个取代基，所述取代基选自-F、-C 2xH 2x+2和-CF 3，x＝1-20。
本申请提供一种柔性基板的制备方法，包括：
提供一玻璃基板；
在所述玻璃基板上涂布第一聚酰胺酸溶液及第二聚酰胺酸溶液，所述第一聚酰胺酸和所述第二聚酰胺酸的结构式为
Figure PCTCN2020075830-appb-000014
m 1＝1-35000，m 2＝1-35000；
对所述玻璃基板上的第一聚酰胺酸溶液及第二聚酰胺酸溶液进行热处理形成柔性衬底，所述柔性衬底为聚酰亚胺薄膜，所述聚酰亚胺薄膜包括聚酰亚胺，所述聚酰亚胺的结构式为
Figure PCTCN2020075830-appb-000015
所述R 1基团和所述R 3基团选自
Figure PCTCN2020075830-appb-000016
Figure PCTCN2020075830-appb-000017
所述R 2基团选自
Figure PCTCN2020075830-appb-000018
Figure PCTCN2020075830-appb-000019
所述R 4基团可以为-C nH 2n-，其中n＝1-20，所述聚酰亚胺薄膜分为第一刚性区域、柔性区域和第二刚性区域，所述第一刚性区域和所述第二刚性区域位于所述柔性区域的两侧，所述第一刚性区域和所述第二刚性区域由所述第一聚酰胺酸溶液形成，所述柔性区域由所述第二聚酰胺酸溶液形成，其中，
Figure PCTCN2020075830-appb-000020
为聚酰亚胺的刚 性链段，
Figure PCTCN2020075830-appb-000021
为聚酰亚胺的柔性链段m 1＝1-35000，m 2＝1-35000。
对所述玻璃基板和所述柔性衬底进行激光处理，所述玻璃基板与所述柔性衬底分离。
在本申请所提供的柔性基板的制备方法中，所述聚酰亚胺薄膜在所述第一刚性区域、柔性基板和第二刚性区域的厚度相同。
在本申请所提供的柔性基板的制备方法中，所述第一刚性区域和所述第二刚性区域的刚性链段在所述聚酰亚胺薄膜中含量为75％-95％，所述第一刚性区域和所述第二刚性区域的柔性链段在所述聚酰亚胺薄膜的含量为5％-25％，所述柔性区域的柔性链段在所述聚酰亚胺薄膜的含量为80％-98％，所述柔性区域的刚性链段在所述聚酰亚胺薄膜的含量为2％-20％。
在本申请所提供的柔性基板的制备方法中，所述第一聚酰胺酸溶液和所述第二聚酰胺酸溶液由
Figure PCTCN2020075830-appb-000022
H 2N-R 6-NH 2及H 2N-R 7-NH 2在溶剂中进行反应形成，所述R 5基团选自
Figure PCTCN2020075830-appb-000023
Figure PCTCN2020075830-appb-000024
所述R 6基团选自
Figure PCTCN2020075830-appb-000025
Figure PCTCN2020075830-appb-000026
所述R 7基团可以为-C nH 2n-，其中n＝1-20。
在本申请所提供的柔性基板的制备方法中，所述溶剂包括乙腈、二甲基甲酰胺、二甲基亚砜和六甲基磷酰三胺中的一种或几种组合。
在本申请所提供的柔性基板的制备方法中，所述R 1、所述R 2和所述R 3的侧链上还包括一个或多个取代基，所述取代基选自-F、-C 2xH 2x+2和-CF 3，x＝1-20。
有益效果
本申请提供了一种柔性基板及其制备方法，所述柔性基板包括柔性衬底，所述柔性衬底为聚酰亚胺薄膜，所述聚酰亚胺具有刚性链段和柔性链段，所述聚酰亚胺薄膜分为刚性区域和柔性区域，所述刚性区域上以所述刚性链段为主，所述柔性区域上以所述柔性链段为主，通过控制所述聚酰亚胺的刚性链段和柔性链段在所述刚性区域和所述柔性区域的含量不同，使得所述刚性区域与所述柔性区域的性能不同，将所述聚酰亚胺应用于所述柔性基板中，提高了柔性基板的性能。
附图说明
为了更清楚地说明本申请中的技术方案，下面将对实施方式描述中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本申请的一些实施方式，对于本领域技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1为本申请所提供的柔性基板的剖视图。
图2为本申请所提供的制备柔性基板的流程剖视图。
本发明的实施方式
下面将结合本申请实施方式中的附图，对本申请中的技术方案进行清楚、完整地描述。显然，所描述的实施方式仅仅是本申请一部分实施方式，而不是全部的实施方式。基于本申请中的实施方式，本领域技术人员在没有做出创造性劳动前提下所获得的所有其他实施方式，都属于本申请保护的范围。
本申请提供了一种柔性基板10。请参阅图1，图1为本申请所提供的柔性基板的剖视图。
所述柔性基板10包括柔性衬底。所述柔性衬底为聚酰亚胺薄膜。所述聚酰亚胺薄膜包括聚酰亚胺。所述聚酰亚胺的结构式为
Figure PCTCN2020075830-appb-000027
所述R 1基团和所述R 3基团选自
Figure PCTCN2020075830-appb-000028
中的一种或多种组合。所述R 2基团选自
Figure PCTCN2020075830-appb-000029
中的一种或多种组合。所述R 4基团可以为-C nH 2n-，n＝1-20。其中，
Figure PCTCN2020075830-appb-000030
为聚酰亚胺的刚性链段。所述刚性链段的分子量为M 1。
Figure PCTCN2020075830-appb-000031
为聚酰亚胺的柔性链段。所述柔性链段的分子量为M 2。M 1＝1-35000，M 2＝1-35000。
在另一实施例中，所述R 1基团、所述R 2基团和所述R 3基团的侧链上还包括一个或多 个取代基，所述取代基选自-F、-O-、-C 2xH 2x+2和-CF 3，x＝1-20。
所述聚酰亚胺薄膜分为第一刚性区域、柔性区域和第二刚性区域。所述第一刚性区域和所述第二刚性区域位于所述柔性区域两侧。所述第一刚性区域、所述第二刚性区域和所述柔性区域的具体分布情况可根据实际的折叠曲率半径进行调整。所述第一刚性区域、所述第二刚性区域和所述柔性区域的面积可以相等，也可以不等。在本实施例中，所述第一刚性区域、所述第二刚性区域和所述柔性区域的面积相等。所述第一刚性区域和所述第二刚性区域的聚酰亚胺薄膜的刚性链段在所述聚酰亚胺的含量是M 1/(M 1+M 2)，为75％-95％。所述第一刚性区域和所述第二刚性区域的聚酰亚胺薄膜的柔性链段含量是M 2/(M 1+M 2)，为5％-25％。所述柔性区域的聚酰亚胺薄膜的柔性链段含量是M 2/(M 1+M 2)，为80％-98％。所述柔性区域的聚酰亚胺薄膜的刚性链段含量是M 1/(M 1+M 2)，为2％-20％。
所述聚酰亚胺薄膜在所述第一刚性区域、所述第二刚性区域和所述柔性区域的厚度相同。所述聚酰亚胺薄膜的厚度为10微米-30微米。所述聚酰亚胺薄膜的表面粗糙度小于1纳米。所述聚酰亚胺薄膜在308纳米的光学透过率低于0.1％。
所述聚酰亚胺通过所述R 1基团、所述R 2基团、所述R 3基团和所述R 4基团排列组合形成，在一些实施例中，所述聚酰亚胺的结构式为
Figure PCTCN2020075830-appb-000032
Figure PCTCN2020075830-appb-000033
等。
所述柔性基板可用于多种柔性显示，如柔性LCD、柔性OLED及柔性Micro-LED等。
在本申请中，通过采用聚酰亚胺控制刚性链段的含量和柔性链段的含量不同以形成刚性区域和柔性区域，并交替分布的情况，刚性区域以刚性链段为主，所述刚性区域因以刚性链段为主，提高了柔性基板的耐热性和尺寸稳定性，所述柔性区域以柔性链段为主，所述柔性区域因以柔性链段为主，提高了柔性基板的柔性，且，因所述柔性区域具有较高的柔性以及所述刚性区域和所述柔性区域的界面的聚酰亚胺分子链段存在互穿的网络结构，提高了柔性基板折叠稳定性，即，提高了柔性基板的性能。
请参阅图2，图2为本申请所提供的制备柔性基板的流程剖视图。本申请还提供一种柔性基板10的制备方法，包括：
A、提供一玻璃基板110。
B、在所述玻璃基板110上涂布第一聚酰胺酸溶液及第二聚酰胺酸溶液。
具体地，采用夹缝式涂布方法在所述玻璃基板110上涂布所述第一聚酰胺酸溶液和所述第二聚酰胺酸溶液，形成第一刚性区域121、柔性区域122和第二刚性区域123。所述第一刚性区域121和第二刚性区域123位于所述柔性区域122的两侧。所述第一刚性区域121、第二刚性区域123和所述柔性区域122的面积可以相同，也可以不同。在本实施例中，所述第一刚性区域121、所述第二刚性区域123和所述柔性区域122的面积相同。在所述第一刚性区域121和第二刚性区域123上涂布的所述第一聚酰胺酸溶液与在柔性区域122上 涂布的所述第二聚酰胺酸溶液的薄厚相同。所述第一聚酰胺酸溶液包括第一聚酰胺酸和溶剂。所述第二聚酰胺酸溶液包括第二聚酰胺酸和溶剂。所述第一聚酰胺酸和所述第二聚酰胺酸的结构式为
Figure PCTCN2020075830-appb-000034
m 1＝1-35000，m 2＝1-35000。所述溶剂包括乙腈、二甲基甲酰胺、二甲基亚砜和六甲基磷酰三胺中的一种或几种组合。
在另一实施例中，所述R 1、所述R 2和所述R 3的侧链上还包括一个或多个取代基，所述取代基选自-F、-O-、-C 2xH 2x+2和-CF 3，x＝1-20。
在另一实施例中，所述第一聚酰胺酸溶液和所述第二聚酰胺酸溶液中还包括固化剂。所述固化剂包括间苯二胺、二氨基二苯基甲烷、二氨基二苯基砜、顺丁烯二酸酐、邻苯二甲酸酐、六氢苯二酸酐、二氰二氨、乙酰肼、苯磺酰肼、脲醛树脂、三聚氰胺甲醛树脂和聚酰胺多胺环氧氯丙烷中的一种或多种组合。
进一步的，形成所述第一聚酰胺酸溶液和所述第二聚酰胺酸溶液的步骤包括：提供第一反应物、第二反应物和第三反应物。将所述第一反应物、所述第二反应物和所述第三反应物进行聚合反应，形成所述第一聚酰胺酸溶液或所述第二聚酰胺酸溶液。
所述第一反应物为
Figure PCTCN2020075830-appb-000035
所述R 5基团选自
Figure PCTCN2020075830-appb-000036
Figure PCTCN2020075830-appb-000037
中的一种或多种组合。所述第二反应物为H 2N-R 6-NH 2，所述R 6基团选自
Figure PCTCN2020075830-appb-000038
Figure PCTCN2020075830-appb-000039
中的一种或多种组合。所述第三反应物为H 2N-R 7-NH 2，所述R 7基团可以为-C nH 2n-，其中n＝1-20。所述第一聚酰胺酸和所述第 二聚酰胺酸的结构式为
Figure PCTCN2020075830-appb-000040
m 1＝1-35000，m 2＝1-35000。
所述第一反应物的结构式为
Figure PCTCN2020075830-appb-000041
所述第二反应物的结构式为H 2N-R 6-NH 2。所述第三反应物的结构式为H 2N-R 7-NH 2。
所述第一反应物
Figure PCTCN2020075830-appb-000042
所述第二反应物H 2N-R 6-NH 2和所述第三反应物为H 2N-R 7-NH 2进行聚合反应生成所述第一聚酰胺酸或所述第二聚酰胺酸
Figure PCTCN2020075830-appb-000043
的反应通式可以为：
Figure PCTCN2020075830-appb-000044
在一种实施方式中，所述第一反应物、所述第二反应物和所述第三反应物以摩尔比2:1:1的比例加入所述溶剂中。
在一种实施方式中，所述聚合反应的温度为-10摄氏度～10摄氏度。
在一种实施方式中，所述溶剂包括乙腈、二甲基甲酰胺、二甲基亚砜和六甲基磷酰三胺中的一种或几种组合。
在一种实施方式中，所述第一反应物、所述第二反应物和所述第三反应物的侧链上还包括一个或多个取代基，所述取代基选自-F、-O-、-C 2xH 2x+2和-CF 3，x＝1-20。
在一种实施方式中，所述第一反应物、所述第二反应物和所述第三反应物进行聚合反应后，加入固化剂，形成所述第一聚酰胺酸或所述第二聚酰胺酸溶液。所述固化剂包括间苯二胺、二氨基二苯基甲烷、二氨基二苯基砜、顺丁烯二酸酐、邻苯二甲酸酐、六氢苯二酸酐、二氰二氨、乙酰肼、苯磺酰肼、脲醛树脂、三聚氰胺甲醛树脂和聚酰胺多胺环氧氯丙烷中的一种或多种组合。
在一种实施例中，所述第一反应物可以为
Figure PCTCN2020075830-appb-000045
所述第二反应物可以为
Figure PCTCN2020075830-appb-000046
所述第三反应物可以为H 2N-CH 2CH 2-NH 2。
所述第一反应物、所述第二反应物和所述第三反应物进行反应生成所述第一聚酰胺酸或所述第二聚酰胺酸的反应式可以为：
Figure PCTCN2020075830-appb-000047
在一种实施方式中，向圆底烧瓶中加入2摩尔的所述第一反应物
Figure PCTCN2020075830-appb-000048
1摩尔的所述第二反应物
Figure PCTCN2020075830-appb-000049
和1摩尔的所述第三反应物H 2N-CH 2CH 2-NH 2，加入二甲基甲酰胺，不断搅拌反应12小时-56小时，得到所述第一聚酰胺酸或所述第二聚酰胺酸
Figure PCTCN2020075830-appb-000050
在一种实施方式中，向圆底烧瓶中加入2摩尔的所述第一反应物
Figure PCTCN2020075830-appb-000051
1摩尔的所述第二反应物
Figure PCTCN2020075830-appb-000052
和1摩尔的所述第三反应物H 2N-CH 2CH 2-NH 2，加入二甲基甲酰胺，不断搅拌反应12小时-56小时后，待反应完全后，加入顺丁烯二酸酐，得到所述第一聚酰胺酸或所述第二聚酰胺酸
Figure PCTCN2020075830-appb-000053
在一种实施例中，所述第一反应物可以为
Figure PCTCN2020075830-appb-000054
所述第二反应物可以为
Figure PCTCN2020075830-appb-000055
所述第三反应物可以为H 2N-CH 2CH 2-NH 2。
所述第一反应物、所述第二反应物和所述第三反应物进行反应生成所述第一聚酰胺酸或所述第二聚酰胺酸的反应式可以为：
Figure PCTCN2020075830-appb-000056
在一种实施方式中，向圆底烧瓶中加入2摩尔的所述第一反应物
Figure PCTCN2020075830-appb-000057
1摩 尔的所述第二反应物
Figure PCTCN2020075830-appb-000058
和1摩尔的所述第三反应物H 2N-CH 2CH 2-NH 2，加入二甲基甲酰胺，不断搅拌反应12小时-56小时，得到所述第一聚酰胺酸或所述第二聚酰胺酸
Figure PCTCN2020075830-appb-000059
在一种实施方式中，向圆底烧瓶中加入2摩尔的所述第一反应物
Figure PCTCN2020075830-appb-000060
1摩尔的所述第二反应物
Figure PCTCN2020075830-appb-000061
和1摩尔的所述第三反应物H 2N-CH 2CH 2-NH 2，加入二甲基甲酰胺，不断搅拌反应12小时-56小时后，待反应完全后，加入顺丁烯二酸酐，得到所述第一聚酰胺酸或所述第二聚酰胺酸
Figure PCTCN2020075830-appb-000062
在本申请中，可以通过所述第一聚酰胺酸溶液和所述第二聚酰胺酸溶液的粘度、涂布速度和表面张力等控制形成的聚酰亚胺薄膜的表面粗糙度。
C、对所述玻璃基板110上的第一聚酰胺酸溶液及第二聚酰胺酸溶液进行热处理形成柔性衬底120。
所述第一聚酰胺酸和所述第二聚酰胺酸的结构式可以为
Figure PCTCN2020075830-appb-000063
所述R 1基团和所述R 3基团选自
Figure PCTCN2020075830-appb-000064
所述R 2基团选自
Figure PCTCN2020075830-appb-000065
所述R 4基团可以为-C nH 2n-，n＝1-20。其中，
Figure PCTCN2020075830-appb-000066
为聚酰亚胺的刚性链段。所述刚性链段的分子量为M 1。
Figure PCTCN2020075830-appb-000067
为聚酰亚胺的柔性链段。所述柔性链段的分子量为M 2。M 1＝1-35000，M 2＝1-35000。
在一种实施例中，所述第一聚酰胺酸或所述第二聚酰胺酸的结构式可以为
Figure PCTCN2020075830-appb-000068
所述第一聚酰胺酸或所述第二聚酰胺酸进行聚合反应形成所述聚酰亚胺的反应式可以
Figure PCTCN2020075830-appb-000069
为：
Figure PCTCN2020075830-appb-000070
在一种实施方式中，所述热处理包括第一阶段热处理和第二阶段热处理，对所述第一聚酰胺酸或所述第二聚酰胺酸
Figure PCTCN2020075830-appb-000071
进行第一阶段热处理，所述第一阶段热处理的温度为50摄氏度-200摄氏度，所述第一阶段热处理的时间为0.5小时-3小时，去除溶剂，所述溶剂为二甲基甲酰胺，形成第一阶段产品，所述第一阶段产品的亚胺化程度高于80％，所述第一阶段产品的溶剂含量低于5％。
对所述第一阶段产品进行第二阶段热处理，再次对溶剂二甲基甲酰胺进行去除，形成所述聚酰亚胺薄膜
Figure PCTCN2020075830-appb-000072
所述第二阶段热处理的温度为300摄氏度-800摄氏度，所述第二阶段热处理的时间为0.5小时-3小时。经所述第二阶段热处理后，形成聚酰亚胺薄膜。所述聚酰亚胺薄膜的溶剂含量低于0.5％，亚胺化程度达到99％以上。
在一种实施例中，所述第一聚酰胺酸或所述第二聚酰胺酸的结构式可以为
Figure PCTCN2020075830-appb-000073
所述第一聚酰胺酸或所述第二聚酰胺酸进行聚合反应形成所述聚酰亚胺的反应式可以
Figure PCTCN2020075830-appb-000074
为：
Figure PCTCN2020075830-appb-000075
其中，m 1＝1-35000，m 2＝1-35000。
在一种实施方式中，所述热处理包括第一阶段热处理和第二阶段热处理，对所述第一聚酰胺酸或所述第二聚酰胺酸
Figure PCTCN2020075830-appb-000076
进行第一阶段热处理，所述第一阶段热处理的温度为50摄氏度-200摄氏度，所述第一阶段热处理的时间为0.5小时-3小时，去除溶剂，所述溶剂为二甲基甲酰胺，形成第一阶段产品，所述第一阶段产品的亚胺化程度高于80％，所述第一阶段产品的溶剂含量低于5％。
对所述第一阶段产品进行第二阶段热处理，再次对溶剂二甲基甲酰胺进行去除，形成所述聚酰亚胺薄膜
Figure PCTCN2020075830-appb-000077
所述第二阶段热处理的温度为300摄氏度-800摄氏度，所述第二阶段热处理的时间为0.5小时-3小时。经所述第二阶段热处理后，形成聚酰亚胺薄膜。所述聚酰亚胺薄膜的溶剂含量低于0.5％，亚胺化程度达到99％以上。
柔性衬底120为所述聚酰亚胺薄膜。形成的所述聚酰亚胺薄膜分为第一刚性区域121、柔性区域122和第二刚性区域123。所述第一刚性区域121和所述第二刚性区域123由所述第一聚酰胺酸溶液形成，所述柔性区域122由所述第二聚酰胺酸溶液形成。其中，所述第一刚性区域121和所述第二刚性区域123的聚酰亚胺薄膜的刚性链段在所述聚酰亚胺的含量是M 1/(M 1+M 2)，为75％-95％。所述第一刚性区域121和所述第二刚性区域123的聚酰亚胺薄膜的柔性链段含量是M 2/(M 1+M 2)，为5％-25％。所述柔性区域122的聚酰亚胺薄膜的柔性链段含量是M 2/(M 1+M 2)，为80％-98％。所述柔性区域122的聚酰亚胺薄膜的刚性链段含量是M 1/(M 1+M 2)，为2％-20％。
所述聚酰亚胺薄膜在所述第一刚性区域121、所述第二刚性区域123和所述柔性区域122的厚度相同。所述聚酰亚胺薄膜的厚度为10微米-30微米。所述聚酰亚胺薄膜的表面粗糙度小于1纳米。所述聚酰亚胺薄膜在308纳米的光学透过率低于0.1％。
在本申请中，所述聚酰亚胺薄膜的表面粗糙度可通过所述第一聚酰胺酸溶液或所述第二聚酰胺酸溶液的粘度、涂布速度和表面张力等控制。
D、对所述玻璃基板110和所述柔性衬底120进行激光处理，所述玻璃基板110与所述柔性衬底120分离。
具体地，采用激光剥离工艺对所述玻璃基板110和所述柔性衬底120进行处理，使激光从所述玻璃基板110背面射入，所采用的激光波长可以为308纳米，从而使得的所述玻璃基板110与所述柔性衬底120分离。
本申请提供一种柔性基板及其制备方法，所述柔性基板包括柔性衬底，所述柔性衬底为聚酰亚胺薄膜，所述聚酰亚胺具有刚性链段和柔性链段，所述聚酰亚胺薄膜分为刚性区域和柔性区域，通过控制所述聚酰亚胺的刚性链段和柔性链段在所述刚性区域和所述柔性区域的含量不同，所述刚性区域以所述刚性链段为主，所述柔性区域以所述柔性链段为主，因所述刚性区域以刚性链段为主，提高了柔性基板的耐热性和尺寸稳定性，所述柔性区域因以柔性链段为主，提高了所述柔性基板的柔性，且因所述柔性区域具有很高的柔性及所 述刚性区域和所述柔性区域的界面的聚酰亚胺分子链段存在互穿的网络结构，提高了柔性基板的折叠稳定性，因此，提高了柔性基板的性能。
以上对本申请实施方式提供了详细介绍，本文中应用了具体个例对本申请的原理及实施方式进行了阐述，以上实施方式的说明只是用于帮助理解本申请。同时，对于本领域的技术人员，依据本申请的思想，在具体实施方式及应用范围上均会有改变之处，综上所述，本说明书内容不应理解为对本申请的限制。

Claims (14)

  1. 一种柔性基板，其包括柔性衬底，所述柔性衬底为聚酰亚胺薄膜，所述聚酰亚胺薄膜的表面粗糙度小于1纳米，所述聚酰亚胺薄膜包括聚酰亚胺，所述聚酰亚胺的结构式为
    Figure PCTCN2020075830-appb-100001
    所述R 1基团和所述R 3基团选自
    Figure PCTCN2020075830-appb-100002
    所述R 2基团选自
    Figure PCTCN2020075830-appb-100003
    Figure PCTCN2020075830-appb-100004
    所述R 4基团可以为-C nH 2n-，其中，n＝1-20，其中，
    Figure PCTCN2020075830-appb-100005
    为聚酰亚胺的刚性链段，
    Figure PCTCN2020075830-appb-100006
    为聚酰亚胺的柔性链段，m 1＝1-35000，m 2＝1-35000。
  2. 如权利要求1所述的柔性基板，其中，所述聚酰亚胺薄膜分为第一刚性区域、柔性区域和第二刚性区域，所述第一刚性区域和所述第二刚性区域位于所述柔性区域两侧，所述第一刚性区域和所述第二刚性区域的聚酰亚胺薄膜的刚性链段含量为75％-95％，所述第一刚性区域和所述第二刚性区域的聚酰亚胺薄膜的柔性链段含量为5％-25％，所述柔性区域的聚酰亚胺薄膜的柔性链段含量为80％-98％，所述柔性区域的聚酰亚胺薄膜的刚性链段含量为2％-20％。
  3. 如权利要求2所述的柔性基板，其中，所述聚酰亚胺薄膜在所述第一刚性区域、所述第二刚性区域和所述柔性区域的厚度相同。
  4. 如权利要1所述的柔性基板，其中，所述R 1基团、所述R 2基团和所述R 3基团的侧链上还包括一个或多个取代基，所述取代基选自-F、-C 2xH 2x+2和-CF 3，x＝1-20。
  5. 一种柔性基板，其包括柔性衬底，所述柔性衬底为聚酰亚胺薄膜，所述聚酰亚胺薄膜包括聚酰亚胺，所述聚酰亚胺的结构式为
    Figure PCTCN2020075830-appb-100007
    所述R 1基团和所述R 3基团选自
    Figure PCTCN2020075830-appb-100008
    所述R 2基团选自
    Figure PCTCN2020075830-appb-100009
    Figure PCTCN2020075830-appb-100010
    所述R 4基团可以为-C nH 2n-，其中，n＝1-20，其中，
    Figure PCTCN2020075830-appb-100011
    为聚酰亚胺的刚性链段，
    Figure PCTCN2020075830-appb-100012
    为聚酰亚胺的柔性链段，m 1＝1-35000，m 2＝1-35000。
  6. 如权利要求5所述的柔性基板，其中，所述聚酰亚胺薄膜分为第一刚性区域、柔性区域和第二刚性区域，所述第一刚性区域和所述第二刚性区域位于所述柔性区域两侧，所述第一刚性区域和所述第二刚性区域的聚酰亚胺薄膜的刚性链段含量为75％-95％，所述第一刚性区域和所述第二刚性区域的聚酰亚胺薄膜的柔性链段含量为5％-25％，所述柔性区域的聚酰亚胺薄膜的柔性链段含量为80％-98％，所述柔性区域的聚酰亚胺薄膜的刚性链段含量为2％-20％。
  7. 如权利要求6所述的柔性基板，其中，所述聚酰亚胺薄膜在所述第一刚性区域、所述第二刚性区域和所述柔性区域的厚度相同。
  8. 如权利要5所述的柔性基板，其中，所述R 1基团、所述R 2基团和所述R 3基团的侧链上还包括一个或多个取代基，所述取代基选自-F、-C 2xH 2x+2和-CF 3，x＝1-20。
  9. 一种柔性基板的制备方法，其包括：
    提供一玻璃基板；
    在所述玻璃基板上涂布第一聚酰胺酸溶液及第二聚酰胺酸溶液，所述第一聚酰胺酸和 所述第二聚酰胺酸的结构式为
    Figure PCTCN2020075830-appb-100013
    m 1＝1-35000，m 2＝1-35000；
    对所述玻璃基板上的第一聚酰胺酸溶液及第二聚酰胺酸溶液进行热处理形成柔性衬底，所述柔性衬底为聚酰亚胺薄膜，所述聚酰亚胺薄膜包括聚酰亚胺，所述聚酰亚胺的结构式为
    Figure PCTCN2020075830-appb-100014
    所述R 1基团和所述R 3基团选自
    Figure PCTCN2020075830-appb-100015
    Figure PCTCN2020075830-appb-100016
    所述R 2基团选自
    Figure PCTCN2020075830-appb-100017
    Figure PCTCN2020075830-appb-100018
    所述R 4基团可以为-C nH 2n-，其中n＝1-20，所述聚酰亚胺薄膜分为第一刚性区域、柔性区域和第二刚性区域，所述第一刚性区域和所述第二刚性区域位于所述柔性区域的两侧，所述第一刚性区域和所述第二刚性区域由所述第一聚酰胺酸溶液形成，所述柔性区域由所述第二聚酰胺酸溶液形成，其中，
    Figure PCTCN2020075830-appb-100019
    为聚酰亚胺的刚性链段，
    Figure PCTCN2020075830-appb-100020
    为聚酰亚胺的柔性链段，m 1＝1-35000，m 2＝1-35000。
    对所述玻璃基板和所述柔性衬底进行激光处理，所述玻璃基板与所述柔性衬底分离。
  10. 如权利要求9所述的柔性基板的制备方法，其中，所述聚酰亚胺薄膜在所述第一刚性区域、柔性基板和第二刚性区域的厚度相同。
  11. 如权利要求9所述的柔性基板的制备方法，其中，所述第一刚性区域和所述第二刚性区域的刚性链段在所述聚酰亚胺薄膜中含量为75％-95％，所述第一刚性区域和所述第二刚性区域的柔性链段在所述聚酰亚胺薄膜的含量为5％-25％，所述柔性区域的柔性链段在所述聚酰亚胺薄膜的含量为80％-98％，所述柔性区域的刚性链段在所述聚酰亚胺薄膜的含量为2％-20％。
  12. 如权利要求9所述的柔性基板的制备方法，其中，所述第一聚酰胺酸溶液和所述第二聚酰胺酸溶液由
    Figure PCTCN2020075830-appb-100021
    H 2N——R 6-NH 2及H 2N——R 7-NH 2在溶剂中进行反应形成，所述R 5基团选自
    Figure PCTCN2020075830-appb-100022
    Figure PCTCN2020075830-appb-100023
    所述R 6基团选自
    Figure PCTCN2020075830-appb-100024
    Figure PCTCN2020075830-appb-100025
    所述R 7基团可以为-C nH 2n-，其中n＝1-20。
  13. 如权利要求9所述的柔性基板的制备方法，其中，所述溶剂包括乙腈、二甲基甲酰胺、二甲基亚砜和六甲基磷酰三胺中的一种或几种组合。
  14. 如权利要求9所述的柔性基板的制备方法，其中，所述R 1、所述R 2和所述R 3的侧链上还包括一个或多个取代基，所述取代基选自-F、-C 2xH 2x+2和-CF 3，x＝1-20。
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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050100719A1 (en) * 2003-11-12 2005-05-12 Kuppsuamy Kanakarajan Multilayer substrates having at least two dissimilar polyimide layers, useful for electronics-type applications, and compositions relating thereto
CN104159975A (zh) * 2012-01-13 2014-11-19 宇部兴产株式会社 水性聚酰亚胺前体溶液组合物及制备水性聚酰亚胺前体溶液组合物的方法
CN106085464A (zh) * 2016-06-02 2016-11-09 深圳市华星光电技术有限公司 配向膜材料、液晶显示面板的制作方法及液晶显示面板
CN106478950A (zh) * 2016-09-26 2017-03-08 安徽国风塑业股份有限公司 一种高粘结性聚酰亚胺薄膜的制备方法
CN106893125A (zh) * 2017-03-23 2017-06-27 武汉华星光电技术有限公司 一种改性聚酰亚胺薄膜及其制备方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002206057A (ja) * 2001-01-09 2002-07-26 Hitachi Cable Ltd ポリイミド樹脂組成物およびその製造方法
JP5906574B2 (ja) * 2011-03-29 2016-04-20 大日本印刷株式会社 フレキシブルデバイス用基板及びその製造方法
CN102386329B (zh) * 2011-11-14 2014-04-30 中山大学 一种柔性电子器件的制作方法
JP5365762B1 (ja) 2012-02-08 2013-12-11 三菱瓦斯化学株式会社 結晶性熱可塑ポリイミド樹脂
JP2016218109A (ja) * 2015-05-14 2016-12-22 株式会社ジャパンディスプレイ 表示装置及びその製造方法
CN110218315B (zh) * 2018-03-01 2021-03-12 中天电子材料有限公司 聚酰亚胺薄膜的制备方法和基板
CN109860205A (zh) * 2019-02-01 2019-06-07 云谷（固安）科技有限公司 一种显示背板结构及可拉伸显示装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050100719A1 (en) * 2003-11-12 2005-05-12 Kuppsuamy Kanakarajan Multilayer substrates having at least two dissimilar polyimide layers, useful for electronics-type applications, and compositions relating thereto
CN104159975A (zh) * 2012-01-13 2014-11-19 宇部兴产株式会社 水性聚酰亚胺前体溶液组合物及制备水性聚酰亚胺前体溶液组合物的方法
CN106085464A (zh) * 2016-06-02 2016-11-09 深圳市华星光电技术有限公司 配向膜材料、液晶显示面板的制作方法及液晶显示面板
CN106478950A (zh) * 2016-09-26 2017-03-08 安徽国风塑业股份有限公司 一种高粘结性聚酰亚胺薄膜的制备方法
CN106893125A (zh) * 2017-03-23 2017-06-27 武汉华星光电技术有限公司 一种改性聚酰亚胺薄膜及其制备方法

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