WO2021088149A1 - 显示面板及其制造方法 - Google Patents

显示面板及其制造方法 Download PDF

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Publication number
WO2021088149A1
WO2021088149A1 PCT/CN2019/120658 CN2019120658W WO2021088149A1 WO 2021088149 A1 WO2021088149 A1 WO 2021088149A1 CN 2019120658 W CN2019120658 W CN 2019120658W WO 2021088149 A1 WO2021088149 A1 WO 2021088149A1
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Prior art keywords
light conversion
display panel
conversion layer
manufacturing
substrate
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PCT/CN2019/120658
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English (en)
French (fr)
Inventor
尹勇明
李冬泽
Original Assignee
深圳市华星光电半导体显示技术有限公司
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Application filed by 深圳市华星光电半导体显示技术有限公司 filed Critical 深圳市华星光电半导体显示技术有限公司
Priority to US16/620,942 priority Critical patent/US11762239B2/en
Publication of WO2021088149A1 publication Critical patent/WO2021088149A1/zh

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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
    • C09K11/08—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/03—Printing inks characterised by features other than the chemical nature of the binder
    • C09D11/033—Printing inks characterised by features other than the chemical nature of the binder characterised by the solvent
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/03—Printing inks characterised by features other than the chemical nature of the binder
    • C09D11/037—Printing inks characterised by features other than the chemical nature of the binder characterised by the pigment
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/30—Inkjet printing inks
    • C09D11/32—Inkjet printing inks characterised by colouring agents
    • C09D11/322—Pigment inks
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/30—Inkjet printing inks
    • C09D11/36—Inkjet printing inks based on non-aqueous solvents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/50—Sympathetic, colour changing or similar inks
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/1336—Illuminating devices
    • G02F1/133614—Illuminating devices using photoluminescence, e.g. phosphors illuminated by UV or blue light
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/125—Process of deposition of the inorganic material
    • C23C18/1283—Control of temperature, e.g. gradual temperature increase, modulation of temperature
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/125—Process of deposition of the inorganic material
    • C23C18/1295—Process of deposition of the inorganic material with after-treatment of the deposited inorganic material
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/1368—Active matrix addressed cells in which the switching element is a three-electrode device

Definitions

  • the present invention relates to the field of displays, and particularly relates to a display panel and a manufacturing method thereof.
  • the perovskite material has been applied to the light conversion layer, wherein the light conversion layer is formed on the entire surface in the backlight module.
  • the non-pixel effective light-emitting area When illuminated by the light source under the backlight module, the non-pixel effective light-emitting area will also have a certain amount of light, which will increase the dark state brightness of the display panel, and thereby reduce the contrast of the display panel.
  • the present invention provides a display panel and a manufacturing method thereof, so as to solve the problem of reduced contrast of the display panel in the prior art.
  • An object of the present invention is to provide a display panel and a manufacturing method thereof, which can improve the contrast of the display panel.
  • an embodiment of the present invention provides a method for manufacturing a display panel, wherein the method for manufacturing the display panel includes the steps of: providing a substrate; forming a light conversion layer on the substrate, wherein The material of the light conversion layer includes a perovskite structure material, the perovskite structure material has a chemical formula ABX 3 , where A represents an inorganic element, B represents an inorganic element, and X represents a halogen, wherein the step of forming the light conversion layer
  • the method includes: coating a perovskite precursor solution on the substrate; and performing a low-temperature vacuum drying process on the perovskite precursor solution to form the light conversion layer on the substrate; using an anti-solvent method A patterning step is performed on the light conversion layer, wherein the light conversion layer forms a plurality of light conversion patterns, wherein an anti-solvent of the anti-solvent method includes at least one of chlorobenzene and toluene; and a pixel
  • a treatment temperature of the low-temperature vacuum drying treatment is between 90 and 130° C. for 5 to 15 minutes.
  • the patterning step includes the steps of: defining the positions of the plurality of light conversion patterns on the light conversion layer; inkjet printing an anti-solvent at the positions of the plurality of light conversion patterns On; and performing a low-temperature vacuum drying process on the anti-solvent to form the plurality of light conversion patterns.
  • a treatment temperature of the low-temperature vacuum drying treatment is between 90 and 130° C. for 5 to 15 minutes.
  • the A includes at least one of sodium, potassium, cesium, and barium.
  • the B includes at least one of copper, nickel, cobalt, iron, manganese, chromium, cadmium, tin, and lead.
  • the X includes at least one of chlorine, bromine and iodine.
  • an embodiment of the present invention provides a method for manufacturing a display panel, wherein the method for manufacturing the display panel includes the steps of: providing a substrate; forming a light conversion layer on the substrate, wherein The material of the light conversion layer includes a perovskite structure material, the perovskite structure material has a chemical formula ABX 3 , where A represents an inorganic element, B represents an inorganic element, and X represents a halogen; the light is treated by an anti-solvent method.
  • the conversion layer undergoes a patterning step, wherein the light conversion layer forms a plurality of light conversion patterns; and a pixel layer is formed on the light conversion layer, wherein the pixel layer includes a plurality of pixel units, and the plurality The pixel units are respectively aligned with the plurality of light conversion patterns.
  • the step of forming the light conversion layer includes the steps of: coating a perovskite precursor solution on the substrate; and performing a low-temperature vacuum drying process on the perovskite precursor solution to The light conversion layer is formed on the substrate.
  • a treatment temperature of the low-temperature vacuum drying treatment is between 90 and 130° C. for 5 to 15 minutes.
  • an anti-solvent of the anti-solvent method includes at least one of chlorobenzene and toluene.
  • the patterning step includes the steps of: defining the positions of the plurality of light conversion patterns on the light conversion layer; inkjet printing an anti-solvent at the positions of the plurality of light conversion patterns On; and performing a low-temperature vacuum drying process on the anti-solvent to form the plurality of light conversion patterns.
  • a treatment temperature of the low-temperature vacuum drying treatment is between 90 and 130° C. for 5 to 15 minutes.
  • the A includes at least one of sodium, potassium, cesium, and barium.
  • the B includes at least one of copper, nickel, cobalt, iron, manganese, chromium, cadmium, tin, and lead.
  • the X includes at least one of chlorine, bromine and iodine.
  • another embodiment of the present invention provides a display panel, wherein the display panel includes: a substrate, a light conversion layer, and a pixel layer.
  • the light conversion layer is disposed on the substrate, wherein the light conversion layer includes a plurality of light conversion patterns, the plurality of light conversion patterns are formed by an anti-solvent method, and the material of the light conversion layer includes perovskite Mineral structure material, the perovskite structure material has a chemical formula ABX 3 , where A represents an inorganic element, B represents an inorganic element, and X represents a halogen.
  • the pixel layer is disposed on the light conversion layer, wherein the pixel layer includes a plurality of pixel units, and the plurality of pixel units are respectively aligned with the plurality of light conversion patterns.
  • the display panel and the manufacturing method of the present invention form a plurality of light conversion patterns aligned with a plurality of pixel units to avoid or reduce light passing through the non-pixel effective light-emitting area, so the display panel can be reduced
  • the dark state brightness improves the contrast of the display panel.
  • FIG. 1 is a flowchart of a manufacturing method of a display panel according to an embodiment of the present invention.
  • FIG. 2 is an exploded schematic diagram of a display panel according to an embodiment of the present invention.
  • the manufacturing method 10 of the display panel of the embodiment of the present invention includes steps 11 to 14: providing a substrate (step 11); forming a light conversion layer on the substrate, wherein the material of the light conversion layer includes Perovskite structure material, the perovskite structure material has a chemical formula ABX 3 , where A represents an inorganic element, B represents an inorganic element, and X represents a halogen (step 12); the light conversion layer is processed by an anti-solvent method A patterning step, wherein the light conversion layer forms a plurality of light conversion patterns (step 13); and a pixel layer is formed on the light conversion layer, wherein the pixel layer includes a plurality of pixel units, and the plurality of Each pixel unit is aligned with the plurality of light conversion patterns (step 14).
  • the present invention will describe the implementation details and principles of the above steps of an embodiment one by one below.
  • Step 11 of the method 10 for manufacturing a display panel according to an embodiment of the present invention includes: providing a substrate.
  • the substrate can be used to carry the required structures in the display panel, such as the light conversion layer and the pixel layer described later.
  • the substrate can also be used to carry other components in the display panel, such as a diffuser, a brightness enhancement film, a polarizer, or a liquid crystal layer.
  • the substrate includes a flexible substrate, a light-transmitting substrate, or a flexible light-transmitting substrate.
  • Step 12 of the method 10 for manufacturing a display panel according to an embodiment of the present invention includes: forming a light conversion layer on the substrate, wherein the material of the light conversion layer includes a perovskite structure material, and the perovskite structure material It has a chemical formula ABX 3 , where A represents an inorganic element, B represents an inorganic element, and X represents a halogen.
  • the light conversion layer may be formed on the substrate by coating or deposition, for example.
  • a perovskite precursor is coated on the substrate, and then a low-temperature vacuum drying process is performed on the perovskite precursor to form the light conversion layer on the substrate.
  • a treatment temperature of the low-temperature vacuum drying treatment is between 90 and 130° C. (for example, 100° C., 110° C., or 120° C.) for 5 to 15 minutes (for example, 6, 7, 8, 10, 12, 13, or 14 points).
  • the A includes at least one of sodium, potassium, cesium, and barium.
  • the B includes at least one of copper, nickel, cobalt, iron, manganese, chromium, cadmium, tin, and lead.
  • the X includes at least one of chlorine, bromine and iodine.
  • Step 13 of the manufacturing method 10 of the display panel according to an embodiment of the present invention includes: performing a patterning step on the light conversion layer by an anti-solvent method, wherein the light conversion layer forms a plurality of light conversion patterns.
  • the positions of the multiple light conversion patterns are mainly determined by the anti-solvent method. More specifically, only the light conversion layer treated by the anti-solvent method can achieve effective light emission, and the other untreated parts can be used to absorb light.
  • the positions of the plurality of light conversion patterns on the light conversion layer are first defined. Afterwards, inkjet printing an anti-solvent on the positions of the plurality of light conversion patterns. Finally, a low-temperature vacuum drying process is performed on the anti-solvent to form the plurality of light conversion patterns.
  • a treatment temperature of the low-temperature vacuum drying treatment is between 90 and 130° C. (for example, 100° C., 110° C., or 120° C.) for 5 to 15 minutes (for example, 6, 7, 8, 10, 12, 13, or 14 points).
  • Step 14 of the method 10 for manufacturing a display panel according to an embodiment of the present invention includes: forming a pixel layer on the light conversion layer, wherein the pixel layer includes a plurality of pixel units, and the plurality of pixel units are respectively aligned with each other.
  • the pixel layer can be formed using a known pixel layer process, for example.
  • the plurality of pixel units may be used to display red, green, or blue colors, for example.
  • the display panel manufactured by the manufacturing method of the display panel of the embodiment of the present invention can prevent or reduce the light passing through the non-pixel effective light-emitting area, and can reduce the dark state brightness of the display panel, thereby improving the contrast of the display panel.
  • the present invention further provides a display panel 20 including a substrate 21, a light conversion layer 22 and a pixel layer 23.
  • the light conversion layer 22 is disposed on the substrate 21, wherein the light conversion layer 22 includes a plurality of light conversion patterns 221, and the plurality of light conversion patterns 221 are formed by an anti-solvent method, wherein the light conversion layer
  • the material of 22 includes a perovskite structure material, which has a chemical formula ABX 3 , where A represents an inorganic element, B represents an inorganic element, and X represents a halogen.
  • the pixel layer 23 is disposed on the light conversion layer 22, wherein the pixel layer 23 includes a plurality of pixel units 231, and the plurality of pixel units are respectively aligned with the plurality of light conversion patterns 221.
  • the display panel 20 may further include a light-emitting layer (for example, a blue LED and potassium fluorosilicate phosphor (KSF phosphor)) 24, a diffusion sheet 25, and a brightness enhancement sheet (BEF) 26 , Double brightness enhancement film (DBEF) 27, lower polarizer 28, TFT array and color filter substrate 29, and upper polarizer 30, wherein the pixel layer 23 is provided in the TFT array and color filter substrate 28.
  • a light-emitting layer for example, a blue LED and potassium fluorosilicate phosphor (KSF phosphor)
  • BEF brightness enhancement sheet
  • DBEF Double brightness enhancement film
  • the display panel 20 of the present invention can be manufactured by, for example, the manufacturing method 10 of the display panel of the present invention.

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Abstract

一种显示面板（20）及其制造方法（10），其中显示面板（20）的制造方法（10）包含步骤：提供一基板（11）；形成一光转换层（22）于基板（21）上（12），其中光转换层（22）的材质包含钙钛矿结构材料，钙钛矿结构材料具有一化学式ABX 3，其中A代表无机元素、B代表无机元素及X代表卤素；以一反溶剂法对光转换层（22）进行一图案化步骤（13），其中光转换层（22）形成多个光转换图案（221）；及形成一像素层（23）于光转换层（22）上（14），其中像素层（23）包含多个像素单元（231），以及多个像素单元（231）分别对齐多个光转换图案（221）。制造方法（10）可减少显示面板（20）的暗态亮度，进而使显示面板（20）的对比度提升。

Description

显示面板及其制造方法
本申请要求于2019年11月08日提交中国专利局、申请号为201911084655.0、发明名称为“显示面板及其制造方法”的中国专利申请的优先权，其全部内容通过引用结合在本申请中。
技术领域
本发明是有关于显示器领域，特别是有关于一种显示面板及其制造方法。
 背景技术
钙钛矿材质已被应用在光转换层中，其中所述光转换层是整面式的形成在背光模块内。当位于背光模块下方的光源的照射下时，非像素有效发光区域也将具有一定量的光线，这将导致显示面板的暗态亮度增加，进而使显示面板的对比度下降。
故，有必要提供一种显示面板及其制造方法，以解决现有技术所存在的问题。
 技术问题
有鉴于此，本发明提供一种显示面板及其制造方法，以解决现有技术所存在的显示面板的对比度下降的问题。
 技术解决方案
本发明的一目的在于提供一种显示面板及其制造方法，其可以提升显示面板的对比度。
为达成本发明的前述目的，本发明一实施例提供一种显示面板的制造方法，其中所述显示面板的制造方法包含步骤：提供一基板；形成一光转换层于所述基板上，其中所述光转换层的材质包含钙钛矿结构材料，所述钙钛矿结构材料具有一化学式ABX 3，其中A代表无机元素、B代表无机元素及X代表卤素，其中形成所述光转换层的步骤包含：涂布一钙钛矿前驱液在所述基板上；及对所述钙钛矿前驱液进行一低温真空干燥处理，以形成所述光转换层在所述基板上；以一反溶剂法对所述光转换层进行一图案化步骤，其中所述光转换层形成多个光转换图案，其中所述反溶剂法的一反溶剂包含氯苯及甲苯中的至少一种；及形成一像素层于所述光转换层上，其中所述像素层包含多个像素单元，以及所述多个像素单元分别对齐所述多个光转换图案。
在本发明一实施例中，所述低温真空干燥处理的一处理温度是介于90至130℃之间达5至15分。
在本发明一实施例中，所述图案化步骤包含步骤：定义在所述光转换层的所述多个光转换图案的位置；喷墨打印一反溶剂在所述多个光转换图案的位置上；及对所述反溶剂进行一低温真空干燥处理，以形成所述多个光转换图案。
在本发明一实施例中，所述低温真空干燥处理的一处理温度是介于90至130℃之间达5至15分。
在本发明一实施例中，所述A包含钠、钾、铯及钡中的至少一种。
在本发明一实施例中，所述B包括铜、镍、钴、铁、锰、铬、镉、锡及铅中的至少一种。
在本发明一实施例中，所述X包括氯、溴及碘中的至少一种。
为达成本发明的前述目的，本发明一实施例提供一种显示面板的制造方法，其中所述显示面板的制造方法包含步骤：提供一基板；形成一光转换层于所述基板上，其中所述光转换层的材质包含钙钛矿结构材料，所述钙钛矿结构材料具有一化学式ABX 3，其中A代表无机元素、B代表无机元素及X代表卤素；以一反溶剂法对所述光转换层进行一图案化步骤，其中所述光转换层形成多个光转换图案；及形成一像素层于所述光转换层上，其中所述像素层包含多个像素单元，以及所述多个像素单元分别对齐所述多个光转换图案。
在本发明一实施例中，形成所述光转换层的步骤包含步骤：涂布一钙钛矿前驱液在所述基板上；及对所述钙钛矿前驱液进行一低温真空干燥处理，以形成所述光转换层在所述基板上。
在本发明一实施例中，所述低温真空干燥处理的一处理温度是介于90至130℃之间达5至15分。
在本发明一实施例中，所述反溶剂法的一反溶剂包含氯苯及甲苯中的至少一种。
在本发明一实施例中，所述图案化步骤包含步骤：定义在所述光转换层的所述多个光转换图案的位置；喷墨打印一反溶剂在所述多个光转换图案的位置上；及对所述反溶剂进行一低温真空干燥处理，以形成所述多个光转换图案。
在本发明一实施例中，所述低温真空干燥处理的一处理温度是介于90至130℃之间达5至15分。
在本发明一实施例中，所述A包含钠、钾、铯及钡中的至少一种。
在本发明一实施例中，所述B包括铜、镍、钴、铁、锰、铬、镉、锡及铅中的至少一种。
在本发明一实施例中，所述X包括氯、溴及碘中的至少一种。
再者，本发明另一实施例提供一种显示面板，其中所述显示面板包含：一基板、一光转换层及一像素层。所述光转换层设置在所述基板上，其中所述光转换层包含多个光转换图案，所述多个光转换图案以一反溶剂法形成，其中所述光转换层的材质包含钙钛矿结构材料，所述钙钛矿结构材料具有一化学式ABX 3，其中A代表无机元素、B代表无机元素及X代表卤素。所述像素层设置在所述光转换层上，其中所述像素层包含多个像素单元，以及所述多个像素单元分别对齐所述多个光转换图案。
有益效果
与现有技术相比较，本发明的显示面板及其制造方法，是通过形成对齐多个像素单元的多个光转换图案，以避免或减少光线通过非像素有效发光区域，所以可减少显示面板的暗态亮度，进而使显示面板的对比度提升。
为让本发明的上述内容能更明显易懂，下文特举优选实施例，并配合所附图式，作详细说明如下：
 附图说明
图1是本发明实施例的显示面板的制造方法的流程图。
图2是本发明实施例的显示面板的分解示意图。
 本发明的最佳实施方式
以下各实施例的说明是参考附加的图式，用以例示本发明可用以实施的特定实施例。再者，本发明所提到的方向用语，例如上、下、顶、底、前、后、左、右、内、外、侧面、周围、中央、水平、横向、垂直、纵向、轴向、径向、最上层或最下层等，仅是参考附加图式的方向。因此，使用的方向用语是用以说明及理解本发明，而非用以限制本发明。
请参照图1，本发明实施例的显示面板的制造方法10包含步骤11至14：提供一基板(步骤11)；形成一光转换层于所述基板上，其中所述光转换层的材质包含钙钛矿结构材料，所述钙钛矿结构材料具有一化学式ABX 3，其中A代表无机元素、B代表无机元素及X代表卤素(步骤12)；以一反溶剂法对所述光转换层进行一图案化步骤，其中所述光转换层形成多个光转换图案(步骤13)；及形成一像素层于所述光转换层上，其中所述像素层包含多个像素单元，以及所述多个像素单元分别对齐所述多个光转换图案(步骤14)。本发明将于下文逐一详细说明一实施例之上述各步骤的实施细节及其原理。
本发明一实施例之显示面板的制造方法10的步骤11包含：提供一基板。在本步骤11中，所述基板可用来承载显示面板中所需要的结构，例如后述的光转换层及像素层。在一实施例中，所述基板亦可用于承载显示面板中的其他构件，例如扩散片、亮度增强片、偏光片或液晶层等。在另一实施例中，所述基板包含柔性基板、透光基板或柔性透光基板。
本发明一实施例之显示面板的制造方法10的步骤12包含：形成一光转换层于所述基板上，其中所述光转换层的材质包含钙钛矿结构材料，所述钙钛矿结构材料具有一化学式ABX 3，其中A代表无机元素、B代表无机元素及X代表卤素。在本步骤12中，所述光转换层例如可通过涂布或沉积的方式来形成在所述基板上。在一实施例中，在所述基板上涂布一钙钛矿前驱液，接着对所述钙钛矿前驱液进行一低温真空干燥处理，以形成所述光转换层在所述基板上。在一范例中，所述低温真空干燥处理的一处理温度是介于90至130℃之间(例如100℃、110℃或120℃)达5至15分(例如6、7、8、10、12、13或14分)。在一实施例中，所述A包含钠、钾、铯及钡中的至少一种。在另一实施例中，所述B包括铜、镍、钴、铁、锰、铬、镉、锡及铅中的至少一种。在又一实施例中，所述X包括氯、溴及碘中的至少一种。
本发明一实施例之显示面板的制造方法10的步骤13包含：以一反溶剂法对所述光转换层进行一图案化步骤，其中所述光转换层形成多个光转换图案。在本步骤13中，主要是通过反溶剂法来决定所述多个光转换图案的位置。更具体而言，只有通过反溶剂法处理的光转换层能达到有效的发光，其他未处理部分则可用于吸收光线。在一实施例中，首先定义在所述光转换层的所述多个光转换图案的位置。之后，喷墨打印一反溶剂在所述多个光转换图案的位置上。最后，对所述反溶剂进行一低温真空干燥处理，以形成所述多个光转换图案。在一范例中，所述低温真空干燥处理的一处理温度是介于90至130℃之间(例如100℃、110℃或120℃)达5至15分(例如6、7、8、10、12、13或14分)。
本发明一实施例之显示面板的制造方法10的步骤14包含：形成一像素层于所述光转换层上，其中所述像素层包含多个像素单元，以及所述多个像素单元分别对齐所述多个光转换图案。在本步骤14中，所述像素层例如可以使用已知的像素层的工艺来形成。在一实施例中，所述多个像素单元例如可用于显示红色、绿色或蓝色。
由上可知，由于所述多个像素单元分别对齐所述多个光转换图案，当只有通过光转换图案的光线可到达多个像素单元的位置以显示颜色，而未通过光转换图案的光线会被吸收。因此，本发明实施例的显示面板的制造方法所制得的显示面板可避免或减少光线通过非像素有效发光区域，并且可减少显示面板的暗态亮度，进而使显示面板的对比度提升。
请参照图2，本发明另提出一种显示面板20，包含一基板21、一光转换层22及一像素层23。所述光转换层22设置在所述基板21上，其中所述光转换层22包含多个光转换图案221，所述多个光转换图案221以一反溶剂法形成，其中所述光转换层22的材质包含钙钛矿结构材料，所述钙钛矿结构材料具有一化学式ABX 3，其中A代表无机元素、B代表无机元素及X代表卤素。所述像素层23设置在所述光转换层22上，其中所述像素层23包含多个像素单元231，以及所述多个像素单元分别对齐所述多个光转换图案221。
在一实施例中，所述显示面板20还可包含发光层(例如包含蓝色LED及氟硅酸钾萤光粉(KSF萤光粉))24、扩散片25、亮度增强片(BEF)26、双重亮度增强片(DBEF)27、下偏光片28、TFT阵列与彩膜基板29及上偏光片30，其中所述像素层23设于TFT阵列与彩膜基板28内。
在一实施例中，本发明的显示面板20例如可通过本发明的显示面板的制造方法10所制成。
本发明已由上述相关实施例加以描述，然而上述实施例仅为实施本发明的范例。必需指出的是，已公开的实施例并未限制本发明的范围。相反地，包含于权利要求书的精神及范围的修改及均等设置均包括于本发明的范围内。

Claims (17)

  1. 一种显示面板的制造方法，其包含步骤：
    提供一基板；
    形成一光转换层于所述基板上，其中所述光转换层的材质包含钙钛矿结构材料，所述钙钛矿结构材料具有一化学式ABX 3，其中A代表无机元素、B代表无机元素及X代表卤素，其中形成所述光转换层的步骤包含：
    涂布一钙钛矿前驱液在所述基板上；及
    对所述钙钛矿前驱液进行一低温真空干燥处理，以形成所述光转换层在所述基板上；
    以一反溶剂法对所述光转换层进行一图案化步骤，其中所述光转换层形成多个光转换图案，其中所述反溶剂法的一反溶剂包含氯苯及甲苯中的至少一种；及
    形成一像素层于所述光转换层上，其中所述像素层包含多个像素单元，以及所述多个像素单元分别对齐所述多个光转换图案。
  2. 如权利要求1所述的显示面板的制造方法，其中所述低温真空干燥处理的一处理温度是介于90至130℃之间达5至15分。
  3. 如权利要求1所述的显示面板的制造方法，其中所述图案化步骤包含步骤：
    定义在所述光转换层的所述多个光转换图案的位置；
    喷墨打印一反溶剂在所述多个光转换图案的位置上；及
    对所述反溶剂进行一低温真空干燥处理，以形成所述多个光转换图案。
  4. 如权利要求3所述的显示面板的制造方法，其中所述低温真空干燥处理的一处理温度是介于90至130℃之间达5至15分。
  5. 如权利要求1所述的显示面板的制造方法，其中所述A包含钠、钾、铯及钡中的至少一种。
  6. 如权利要求1所述的显示面板的制造方法，其中所述B包括铜、镍、钴、铁、锰、铬、镉、锡及铅中的至少一种。
  7. 如权利要求1所述的显示面板的制造方法，其中所述X包括氯、溴及碘中的至少一种。
  8. 一种显示面板的制造方法，其包含步骤：
    提供一基板；
    形成一光转换层于所述基板上，其中所述光转换层的材质包含钙钛矿结构材料，所述钙钛矿结构材料具有一化学式ABX 3，其中A代表无机元素、B代表无机元素及X代表卤素；
    以一反溶剂法对所述光转换层进行一图案化步骤，其中所述光转换层形成多个光转换图案；及
    形成一像素层于所述光转换层上，其中所述像素层包含多个像素单元，以及所述多个像素单元分别对齐所述多个光转换图案。
  9. 如权利要求8所述的显示面板的制造方法，其中形成所述光转换层的步骤包含：
    涂布一钙钛矿前驱液在所述基板上；及
    对所述钙钛矿前驱液进行一低温真空干燥处理，以形成所述光转换层在所述基板上。
  10. 如权利要求9所述的显示面板的制造方法，其中所述低温真空干燥处理的一处理温度是介于90至130℃之间达5至15分。
  11. 如权利要求8所述的显示面板的制造方法，其中所述反溶剂法的一反溶剂包含氯苯及甲苯中的至少一种。
  12. 如权利要求8所述的显示面板的制造方法，其中所述图案化步骤包含步骤：
    定义在所述光转换层的所述多个光转换图案的位置；
    喷墨打印一反溶剂在所述多个光转换图案的位置上；及
    对所述反溶剂进行一低温真空干燥处理，以形成所述多个光转换图案。
  13. 如权利要求12所述的显示面板的制造方法，其中所述低温真空干燥处理的一处理温度是介于90至130℃之间达5至15分。
  14. 如权利要求8所述的显示面板的制造方法，其中所述A包含钠、钾、铯及钡中的至少一种。
  15. 如权利要求8所述的显示面板的制造方法，其中所述B包括铜、镍、钴、铁、锰、铬、镉、锡及铅中的至少一种。
  16. 如权利要求8所述的显示面板的制造方法，其中所述X包括氯、溴及碘中的至少一种。
  17. 一种显示面板，其包括：
    一基板；
    一光转换层，设置在所述基板上，其中所述光转换层包含多个光转换图案，所述多个光转换图案以一反溶剂法形成，其中所述光转换层的材质包含钙钛矿结构材料，所述钙钛矿结构材料具有一化学式ABX 3，其中A代表无机元素、B代表无机元素及X代表卤素；及
    一像素层，设置在所述光转换层上，其中所述像素层包含多个像素单元，以及所述多个像素单元分别对齐所述多个光转换图案。
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