CN111308766A - 显示面板及其制造方法 - Google Patents
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Abstract
本发明公开一种显示面板及其制造方法,其中所述显示面板的制造方法包含步骤:提供一基板;形成一光转换层于所述基板上,其中所述光转换层的材质包含钙钛矿结构材料,所述钙钛矿结构材料具有一化学式ABX3,其中A代表无机元素、B代表无机元素及X代表卤素;以一反溶剂法对所述光转换层进行一图案化步骤,其中所述光转换层形成多个光转换图案;及形成一像素层于所述光转换层上,其中所述像素层包含多个像素单元,以及所述多个像素单元分别对齐所述多个光转换图案。所述制造方法可减少显示面板的暗态亮度,进而使显示面板的对比度提升。
Description
技术领域
本发明是有关于显示器领域,特别是有关于一种显示面板及其制造方法。
背景技术
钙钛矿材质已被应用在光转换层中,其中所述光转换层是整面式的形成在背光模块内。当位于背光模块下方的光源的照射下时,非像素有效发光区域也将具有一定量的光线,这将导致显示面板的暗态亮度增加,进而使显示面板的对比度下降。
故,有必要提供一种显示面板及其制造方法,以解决现有技术所存在的问题。
发明内容
有鉴于此,本发明提供一种显示面板及其制造方法,以解决现有技术所存在的显示面板的对比度下降的问题。
本发明的一目的在于提供一种显示面板及其制造方法,其可以提升显示面板的对比度。
为达成本发明的前述目的,本发明一实施例提供一种显示面板的制造方法,其中所述显示面板的制造方法包含步骤:提供一基板;形成一光转换层于所述基板上,其中所述光转换层的材质包含钙钛矿结构材料,所述钙钛矿结构材料具有一化学式ABX3,其中A代表无机元素、B代表无机元素及X代表卤素;以一反溶剂法对所述光转换层进行一图案化步骤,其中所述光转换层形成多个光转换图案;及形成一像素层于所述光转换层上,其中所述像素层包含多个像素单元,以及所述多个像素单元分别对齐所述多个光转换图案。
在本发明一实施例中,形成所述光转换层的步骤包含步骤:涂布一钙钛矿前驱液在所述基板上;及对所述钙钛矿前驱液进行一低温真空干燥处理,以形成所述光转换层在所述基板上。
在本发明一实施例中,所述低温真空干燥处理的一处理温度是介于90至130℃之间达5至15分。
在本发明一实施例中,所述反溶剂法的一反溶剂包含氯苯及甲苯中的至少一种。
在本发明一实施例中,所述图案化步骤包含步骤:定义在所述光转换层的所述多个光转换图案的位置;喷墨打印一反溶剂在所述多个光转换图案的位置上;及对所述反溶剂进行一低温真空干燥处理,以形成所述多个光转换图案。
在本发明一实施例中,所述低温真空干燥处理的一处理温度是介于90至130℃之间达5至15分。
在本发明一实施例中,所述A包含钠、钾、铯及钡中的至少一种。
在本发明一实施例中,所述B包括铜、镍、钴、铁、锰、铬、镉、锡及铅中的至少一种。
在本发明一实施例中,所述X包括氯、溴及碘中的至少一种。
再者,本发明另一实施例提供一种显示面板,其中所述显示面板包含:一基板、一光转换层及一像素层。所述光转换层设置在所述基板上,其中所述光转换层包含多个光转换图案,所述多个光转换图案以一反溶剂法形成,其中所述光转换层的材质包含钙钛矿结构材料,所述钙钛矿结构材料具有一化学式ABX3,其中A代表无机元素、B代表无机元素及X代表卤素。所述像素层设置在所述光转换层上,其中所述像素层包含多个像素单元,以及所述多个像素单元分别对齐所述多个光转换图案。
与现有技术相比较,本发明的显示面板及其制造方法,是通过形成对齐多个像素单元的多个光转换图案,以避免或减少光线通过非像素有效发光区域,所以可减少显示面板的暗态亮度,进而使显示面板的对比度提升。
为让本发明的上述内容能更明显易懂,下文特举优选实施例,并配合所附图式,作详细说明如下:
附图说明
图1是本发明实施例的显示面板的制造方法的流程图。
图2是本发明实施例的显示面板的分解示意图。
具体实施方式
以下各实施例的说明是参考附加的图式,用以例示本发明可用以实施的特定实施例。再者,本发明所提到的方向用语,例如上、下、顶、底、前、后、左、右、内、外、侧面、周围、中央、水平、横向、垂直、纵向、轴向、径向、最上层或最下层等,仅是参考附加图式的方向。因此,使用的方向用语是用以说明及理解本发明,而非用以限制本发明。
请参照图1,本发明实施例的显示面板的制造方法10包含步骤11至14:提供一基板(步骤11);形成一光转换层于所述基板上,其中所述光转换层的材质包含钙钛矿结构材料,所述钙钛矿结构材料具有一化学式ABX3,其中A代表无机元素、B代表无机元素及X代表卤素(步骤12);以一反溶剂法对所述光转换层进行一图案化步骤,其中所述光转换层形成多个光转换图案(步骤13);及形成一像素层于所述光转换层上,其中所述像素层包含多个像素单元,以及所述多个像素单元分别对齐所述多个光转换图案(步骤14)。本发明将于下文逐一详细说明一实施例之上述各步骤的实施细节及其原理。
本发明一实施例之显示面板的制造方法10的步骤11包含:提供一基板。在本步骤11中,所述基板可用来承载显示面板中所需要的结构,例如后述的光转换层及像素层。在一实施例中,所述基板亦可用于承载显示面板中的其他构件,例如扩散片、亮度增强片、偏光片或液晶层等。在另一实施例中,所述基板包含柔性基板、透光基板或柔性透光基板。
本发明一实施例之显示面板的制造方法10的步骤12包含:形成一光转换层于所述基板上,其中所述光转换层的材质包含钙钛矿结构材料,所述钙钛矿结构材料具有一化学式ABX3,其中A代表无机元素、B代表无机元素及X代表卤素。在本步骤12中,所述光转换层例如可通过涂布或沉积的方式来形成在所述基板上。在一实施例中,在所述基板上涂布一钙钛矿前驱液,接着对所述钙钛矿前驱液进行一低温真空干燥处理,以形成所述光转换层在所述基板上。在一范例中,所述低温真空干燥处理的一处理温度是介于90至130℃之间(例如100℃、110℃或120℃)达5至15分(例如6、7、8、10、12、13或14分)。在一实施例中,所述A包含钠、钾、铯及钡中的至少一种。在另一实施例中,所述B包括铜、镍、钴、铁、锰、铬、镉、锡及铅中的至少一种。在又一实施例中,所述X包括氯、溴及碘中的至少一种。
本发明一实施例之显示面板的制造方法10的步骤13包含:以一反溶剂法对所述光转换层进行一图案化步骤,其中所述光转换层形成多个光转换图案。在本步骤13中,主要是通过反溶剂法来决定所述多个光转换图案的位置。更具体而言,只有通过反溶剂法处理的光转换层能达到有效的发光,其他未处理部分则可用于吸收光线。在一实施例中,首先定义在所述光转换层的所述多个光转换图案的位置。之后,喷墨打印一反溶剂在所述多个光转换图案的位置上。最后,对所述反溶剂进行一低温真空干燥处理,以形成所述多个光转换图案。在一范例中,所述低温真空干燥处理的一处理温度是介于90至130℃之间(例如100℃、110℃或120℃)达5至15分(例如6、7、8、10、12、13或14分)。
本发明一实施例之显示面板的制造方法10的步骤14包含:形成一像素层于所述光转换层上,其中所述像素层包含多个像素单元,以及所述多个像素单元分别对齐所述多个光转换图案。在本步骤14中,所述像素层例如可以使用已知的像素层的工艺来形成。在一实施例中,所述多个像素单元例如可用于显示红色、绿色或蓝色。
由上可知,由于所述多个像素单元分别对齐所述多个光转换图案,当只有通过光转换图案的光线可到达多个像素单元的位置以显示颜色,而未通过光转换图案的光线会被吸收。因此,本发明实施例的显示面板的制造方法所制得的显示面板可避免或减少光线通过非像素有效发光区域,并且可减少显示面板的暗态亮度,进而使显示面板的对比度提升。
请参照图2,图2是本发明实施例的显示面板的分解示意图。本发明另提出一种显示面板20,包含一基板21、一光转换层22及一像素层23。所述光转换层22设置在所述基板21上,其中所述光转换层22包含多个光转换图案221,所述多个光转换图案221以一反溶剂法形成,其中所述光转换层22的材质包含钙钛矿结构材料,所述钙钛矿结构材料具有一化学式ABX3,其中A代表无机元素、B代表无机元素及X代表卤素。所述像素层23设置在所述光转换层22上,其中所述像素层23包含多个像素单元231,以及所述多个像素单元分别对齐所述多个光转换图案221。
在一实施例中,所述显示面板20还可包含发光层(例如包含蓝色LED及氟硅酸钾萤光粉(KSF萤光粉))24、扩散片25、亮度增强片(BEF)26、双重亮度增强片(DBEF)27、下偏光片28、TFT阵列与彩膜基板29及上偏光片30,其中所述像素层23设于TFT阵列与彩膜基板28内。
在一实施例中,本发明的显示面板20例如可通过本发明的显示面板的制造方法10所制成。
本发明已由上述相关实施例加以描述,然而上述实施例仅为实施本发明的范例。必需指出的是,已公开的实施例并未限制本发明的范围。相反地,包含于权利要求书的精神及范围的修改及均等设置均包括于本发明的范围内。
Claims (10)
1.一种显示面板的制造方法,其特征在于:所述显示面板的制造方法包含步骤:
提供一基板;
形成一光转换层于所述基板上,其中所述光转换层的材质包含钙钛矿结构材料,所述钙钛矿结构材料具有一化学式ABX3,其中A代表无机元素、B代表无机元素及X代表卤素;
以一反溶剂法对所述光转换层进行一图案化步骤,其中所述光转换层形成多个光转换图案;及
形成一像素层于所述光转换层上,其中所述像素层包含多个像素单元,以及所述多个像素单元分别对齐所述多个光转换图案。
2.如权利要求1所述的显示面板的制造方法,其特征在于:形成所述光转换层的步骤包含:
涂布一钙钛矿前驱液在所述基板上;及
对所述钙钛矿前驱液进行一低温真空干燥处理,以形成所述光转换层在所述基板上。
3.如权利要求2所述的显示面板的制造方法,其特征在于:所述低温真空干燥处理的一处理温度是介于90至130℃之间达5至15分。
4.如权利要求1所述的显示面板的制造方法,其特征在于:所述反溶剂法的一反溶剂包含氯苯及甲苯中的至少一种。
5.如权利要求1所述的显示面板的制造方法,其特征在于:所述图案化步骤包含步骤:
定义在所述光转换层的所述多个光转换图案的位置;
喷墨打印一反溶剂在所述多个光转换图案的位置上;及
对所述反溶剂进行一低温真空干燥处理,以形成所述多个光转换图案。
6.如权利要求5所述的显示面板的制造方法,其特征在于:所述低温真空干燥处理的一处理温度是介于90至130℃之间达5至15分。
7.如权利要求1所述的显示面板的制造方法,其特征在于:所述A包含钠、钾、铯及钡中的至少一种。
8.如权利要求1所述的显示面板的制造方法,其特征在于:所述B包括铜、镍、钴、铁、锰、铬、镉、锡及铅中的至少一种。
9.如权利要求1所述的显示面板的制造方法,其特征在于:所述X包括氯、溴及碘中的至少一种。
10.一种显示面板,其特征在于:所述显示面板包括:
一基板;
一光转换层,设置在所述基板上,其中所述光转换层包含多个光转换图案,所述多个光转换图案以一反溶剂法形成,其中所述光转换层的材质包含钙钛矿结构材料,所述钙钛矿结构材料具有一化学式ABX3,其中A代表无机元素、B代表无机元素及X代表卤素;及
一像素层,设置在所述光转换层上,其中所述像素层包含多个像素单元,以及所述多个像素单元分别对齐所述多个光转换图案。
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