WO2021031370A1 - 显示面板、显示装置及显示面板的制作方法 - Google Patents

显示面板、显示装置及显示面板的制作方法 Download PDF

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Publication number
WO2021031370A1
WO2021031370A1 PCT/CN2019/115901 CN2019115901W WO2021031370A1 WO 2021031370 A1 WO2021031370 A1 WO 2021031370A1 CN 2019115901 W CN2019115901 W CN 2019115901W WO 2021031370 A1 WO2021031370 A1 WO 2021031370A1
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Prior art keywords
display area
layer
display
signal line
substrate
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PCT/CN2019/115901
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English (en)
French (fr)
Inventor
郭庆勋
朱小光
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武汉华星光电半导体显示技术有限公司
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Application filed by 武汉华星光电半导体显示技术有限公司 filed Critical 武汉华星光电半导体显示技术有限公司
Priority to US16/624,801 priority Critical patent/US11158692B1/en
Publication of WO2021031370A1 publication Critical patent/WO2021031370A1/zh

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/805—Electrodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/122—Pixel-defining structures or layers, e.g. banks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/131—Interconnections, e.g. wiring lines or terminals
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80—Constructional details
    • H10K59/805—Electrodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/84—Passivation; Containers; Encapsulations
    • H10K50/844—Encapsulations
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/1201—Manufacture or treatment
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass

Definitions

  • the present invention relates to the field of display technology, in particular to a display panel, a display device and a manufacturing method of the display panel.
  • AMOLED Active-matrix organic light emitting diode
  • LTPS flexible low temperature poly-silicon
  • OLED organic light emitting diode
  • LCD liquid crystal display
  • AMOLED display devices are self-luminous, do not require a backlight, and have the advantages of fast response, high color gamut, high contrast, and low cost, and are regarded as the most promising One of the products.
  • the existing AMOLED display devices have the problems of wider frame and low screen-to-body ratio. Therefore, it is necessary to provide a display panel, a display device, and a manufacturing method of the display panel to improve this defect.
  • the embodiments of the present disclosure provide a display panel, a display device, and a manufacturing method of the display panel, which are used to solve the problems of a wide frame and low screen-to-body ratio of existing AMOLED display devices.
  • the embodiments of the present disclosure provide a display panel, including:
  • a substrate including a display area and a non-display area located at the periphery of the display area;
  • a display device layer is arranged on the substrate, and the display device layer includes an anode, a pixel definition layer, a common layer, and a cathode that are sequentially stacked and arranged;
  • the anode covers the display area and extends to the non-display area
  • the pixel definition layer and the common layer are both arranged on the display area, and neither extends to at least one side of the display area
  • the cathode covers the common layer and extends until the non-display area is in contact with the anode.
  • the display panel further includes:
  • the driving signal line is arranged on the non-display area on at least one side of the display area of the substrate;
  • pixel definition layer nor the common layer extends to the non-display area where the driving signal line is provided.
  • the material of the pixel definition layer and the common layer are both organic materials, and the pixel definition layer and the common layer extend to the area of the non-display area where the driving signal line is provided. Partially, the etching process is performed by the corresponding organic solvent.
  • the display panel further includes a voltage signal line disposed on the non-display area on at least one side of the display area of the substrate and connected to the anode ,
  • the driving signal line is arranged between the display area and the voltage signal line.
  • At least one first retaining wall is formed on the side of the anode away from the substrate, and the retaining wall is located on the non-display area, and the non-display area not covered by the anode At least one second retaining wall is provided in the area.
  • the display panel further includes an encapsulation layer
  • the encapsulation layer includes a first inorganic layer, a second inorganic layer, and an organic layer disposed between the first inorganic layer and the second inorganic layer.
  • Layer, the first inorganic layer covers the display area and the non-display area
  • the organic layer covers the display area and extends to the side of the first retaining wall away from the second retaining wall
  • the second inorganic layer covers the display area and the non-display area.
  • An embodiment of the present disclosure provides a display device, including a display panel, the display panel including:
  • a substrate including a display area and a non-display area located at the periphery of the display area;
  • a display device layer is arranged on the substrate, and the display device layer includes an anode, a pixel definition layer, a common layer, and a cathode that are sequentially stacked and arranged;
  • the anode covers the display area and extends to the non-display area
  • the pixel definition layer and the common layer are both arranged on the display area, and neither extends to at least one side of the display area
  • the cathode covers the common layer and extends until the non-display area is in contact with the anode.
  • the display panel further includes:
  • the driving signal line is arranged on the non-display area on at least one side of the display area of the substrate;
  • pixel definition layer nor the common layer extends to the non-display area where the driving signal line is provided.
  • the material of the pixel definition layer and the common layer are both organic materials, and the pixel definition layer and the common layer extend to the area of the non-display area where the driving signal line is provided. Partially, the etching process is performed by the corresponding organic solvent.
  • the display panel further includes a voltage signal line disposed on the non-display area on at least one side of the display area of the substrate and connected to the anode ,
  • the driving signal line is arranged between the display area and the voltage signal line.
  • At least one first retaining wall is formed on the side of the anode away from the substrate, and the retaining wall is located on the non-display area, and the non-display area not covered by the anode At least one second retaining wall is provided in the area.
  • the display panel further includes an encapsulation layer
  • the encapsulation layer includes a first inorganic layer, a second inorganic layer, and an organic layer disposed between the first inorganic layer and the second inorganic layer.
  • Layer, the first inorganic layer covers the display area and the non-display area
  • the organic layer covers the display area and extends to the side of the first retaining wall away from the second retaining wall
  • the second inorganic layer covers the display area and the non-display area.
  • the embodiments of the present disclosure also provide a manufacturing method of a display panel, including:
  • Step S10 providing a substrate, the substrate including a display area and a non-display area located at the periphery of the display area;
  • Step S20 sequentially deposit and form a pixel definition layer and a common layer on the substrate, the pixel definition layer and the common layer both cover the display area and both extend to the non-display area;
  • Step S30 Block the display area, and remove the pixel definition layer and the common layer on the non-display area extending to at least one side of the display area.
  • a driving signal line is further formed on the substrate, and the driving signal line is provided on the non-display area on at least one side of the display area of the substrate.
  • the driving signal line is provided on the non-display area on at least one side of the display area of the substrate.
  • materials of the pixel definition layer and the common layer are both organic materials, and the pixel definition layer and the common layer extend to the non-display area where the driving signal line is provided. Part of it is removed by etching with corresponding organic solvent.
  • the beneficial effects of the present disclosure remove the pixel definition layer and the common layer located on the non-display area of the substrate, so that the pixel definition layer and the common layer only exist in the display area, thereby effectively reducing the width of the non-display area of the display panel. Increase the screen-to-body ratio of the display panel and display device.
  • FIG. 1 is a schematic diagram of a cross-sectional structure of a display panel provided in the first embodiment of the disclosure
  • FIG. 2 is a schematic diagram of the planar structure of the display panel provided by the first embodiment of the disclosure.
  • FIG. 3 is a schematic flow chart of a method for manufacturing a display panel provided in the second embodiment of the disclosure
  • FIG. 4A is a schematic diagram of a cross-sectional structure of a display panel provided in a second embodiment of the disclosure.
  • 4B is a schematic diagram of a cross-sectional structure of the display panel provided in the second embodiment of the disclosure.
  • 4C is a schematic cross-sectional structure diagram of the display panel provided in the second embodiment of the disclosure.
  • the embodiments of the present disclosure provide a display panel, which will be described in detail below with reference to FIGS. 1 to 2.
  • FIG. 1 is a schematic cross-sectional structure diagram of a display panel 100 according to an embodiment of the disclosure.
  • the display panel 100 includes a substrate 110, a display device layer 120, a driving signal line 130 and a voltage signal line 140.
  • the substrate 110 includes a display area 111 and a non-display area 112 located at the periphery of the display area 111; the display device layer 120 is disposed on the substrate 110, and the display device layer 120 includes stacked layers in sequence.
  • the anode 121 covers the display area 111 and extends to the non-display area 112
  • the pixel definition layer 122 and the common layer 123 are both disposed on the display area 111, and both
  • the cathode 124 is disposed on the side of the common layer 123 away from the substrate 110, and covers the common layer 123 and extends to
  • the non-display area 112 is in contact with the anode 121
  • the common layer 123 includes a hole injection layer, a hole transport layer, a light emitting layer, an electron transport layer, and an electron injection layer (not shown in the figure).
  • FIG. 2 is a schematic diagram of a plan structure of a display panel 100 provided by an embodiment of the present disclosure.
  • the left side is a prior art display panel
  • the right side is a display panel 100 provided by the embodiment of the present disclosure.
  • the width of the non-display area on the left and right sides of the display panel in the prior art is a
  • the width of the non-display area 112 on the left and right sides of the display panel 100 provided by the embodiment of the present disclosure is b.
  • edge of the pixel definition layer 122 By combining the edge of the pixel definition layer 122 with the common The edge of the layer 123 is flush with the edge of the display area 111 such that b ⁇ a, thereby effectively reducing the width of the non-display area 112 on the left and right sides of the display panel 100 and increasing the screen-to-body ratio of the display panel 100.
  • the above structure can be used not only in the non-display areas 112 on the left and right sides of the display panel 100, but also in the non-display areas on the upper and lower sides of the display panel 100, and can achieve the same technical effect.
  • the driving signal line 130 is disposed on the non-display area 112 on at least one side of the display area 111 of the substrate 110, and the pixel definition layer 122 and the common layer 123 are both It extends to the non-display area 112 where the driving signal line 130 is provided.
  • the material of the pixel definition layer 122 and the common layer 123 are both organic materials, and the anode 121 is a metal material, so that when the pixel definition layer 122 and the common layer 123 are formed ,
  • the display area 111 can be shielded and protected by a photoresist or a mask, and the pixel definition layer 122 and the common layer 123 extend to the non-display area 112 where the drive signal line 130 is provided through the corresponding
  • the organic solvent is removed by etching treatment, thereby achieving the technical effect of reducing the width of the non-display area 112.
  • the voltage signal line 140 is disposed on the non-display area 112 on at least one side of the display area 111 of the substrate 110, and is connected to the anode 121
  • the driving signal line 130 is disposed between the display area 111 and the voltage signal line 140.
  • the display panel 100 further includes a thin film transistor layer 150.
  • the thin film transistor layer 150 is disposed on the display area 111 and is located between the anode 121 and the substrate 110.
  • the gate of the transistor 150 is connected to the driving signal line 130.
  • At least one first retaining wall 170 is formed on the side of the anode 121 away from the substrate 110, and the first retaining wall 170 is located on the non-display area 112, and the anode 121 At least one second retaining wall 180 is also provided at the non-display area 112 to be covered.
  • the display panel 100 further includes an encapsulation layer 160.
  • the encapsulation layer 160 includes a first inorganic layer 161, a second inorganic layer 163, and an encapsulation layer 160 disposed on the first inorganic layer 161 and the second inorganic layer.
  • the organic layer 162 between the layers 163, the first inorganic layer 161 covers the display area 111 and the non-display area 112, and the organic layer 162 covers the display area 111 and extends to the first barrier A side of the wall 170 away from the second retaining wall 180, the second inorganic layer 163 covers the display area 111 and the non-display area 112, the first retaining wall 170 and the second retaining wall 180 It is used to prevent the organic solution in the organic layer 162 from overflowing, thereby avoiding related problems caused by the overflow of the organic solution.
  • the embodiment of the present disclosure provides a display panel 100.
  • the width of the non-display portion 111 around the display panel 100 is reduced, thereby The screen-to-body ratio of the display panel 100 is increased.
  • the embodiments of the present disclosure also provide a display device, which includes the display panel 100 as described in the above-mentioned embodiment, and can achieve the same technical effect as the display panel 100 provided in the above-mentioned embodiment, which will not be repeated here.
  • a method for manufacturing a display panel will be described in detail below with reference to FIGS. 3 to 4C.
  • FIG. 3 is a schematic flowchart of a manufacturing method of a display panel provided by an embodiment of the present disclosure
  • FIGS. 4A to 4C are schematic cross-sectional structural diagrams of a display panel 200 provided by an embodiment of the present disclosure. The method includes:
  • Step S10 a substrate 210 is provided, the substrate 210 includes a display area 211 and a non-display area 212 located at the periphery of the display area 211.
  • a thin film transistor layer 220, a driving signal line 230, a voltage signal line 240, and an anode 250 are further formed on the substrate 210, and the driving signal line 230 is disposed in the display area 211 of the substrate 210.
  • the gate of the thin film transistor layer 220 is connected to the driving signal line 230
  • the voltage signal line 240 is provided on the display area 211 of the substrate 210 at least One side of the non-display area 212 is connected to the anode 221, and the driving signal line 230 is disposed between the display area 211 and the voltage signal line 240.
  • Step S20 sequentially deposit and form a pixel definition layer 260 and a common layer 270 on the substrate 210, the pixel definition layer 260 and the common layer 270 both cover the display area 211 and both extend to the non-display area 212.
  • the pixel defining layer 260 is disposed on the side of the anode 250 away from the substrate 210
  • the common layer 270 is disposed on the side of the pixel defining layer 260 away from the anode 250
  • the pixel defining layer 260 and the common layer 270 both extend to the non-display area 212 provided with the driving signal line 240
  • the common layer 270 further includes a hole injection layer, a hole transport layer, a light emitting layer, Electron transport layer and electron injection layer (not shown in the figure).
  • Step S30 Block the display area 211, and remove the pixel definition layer 260 and the common layer 270 on the non-display area 212 extending to at least one side of the display area 211.
  • a mask may be used to shield the display area 211 and the pixel definition layer 260 and the common layer 270 located on the display area 211.
  • a photoresist coated layer may also be used. The display area 211 and the pixel definition layer 260 and the common layer 270 located on the display area 211 are shielded, so as to prevent the display area 211 from being affected when other parts of the pixel definition layer 260 and the common layer 270 are removed. And the film above it causes damage.
  • the anode, the driving signal line, and the voltage signal line are all metal materials
  • the pixel definition layer 260 and the common layer 270 are all organic materials.
  • the The pixel definition layer 222 and the common layer 223 extend to the non-display area 212 provided with the driving signal line 230 and are removed by etching with a corresponding organic solvent, thereby achieving the technical effect of reducing the width of the non-display area 212.
  • the manufacturing method further includes:
  • Step S40 forming a cathode 280 on the side of the common layer 270 away from the substrate 210, the cathode 280 covers the common layer 270 and extends until the non-display area is in contact with the anode 250;
  • Step S50 forming an encapsulation layer 290 on the side of the cathode 280 away from the substrate 210.
  • At least one first retaining wall 251 is formed on the side of the anode 220 away from the substrate 210, and the first retaining wall 251 is located in the non-display area 212
  • at least one second retaining wall 241 is further provided in the non-display area 212 not covered by the cathode 121.
  • the encapsulation layer 290 includes a first inorganic layer 291, a second inorganic layer 293, and an organic layer 292 disposed between the first inorganic layer 291 and the second inorganic layer 293
  • the first inorganic layer 291 covers the display area 211 and the non-display area 212
  • the organic layer 292 covers the display area 211 and extends to the first barrier 251 away from the second barrier.
  • the second inorganic layer 293 covers the display area 211 and the non-display area 212, and the first retaining wall 251 and the second retaining wall 241 are used to prevent the organic layer 292
  • the organic solution overflows in the medium to avoid related problems caused by the overflow of organic solution.
  • the embodiment of the present disclosure provides a method for manufacturing a display panel.
  • the pixel definition layer 222 and the common layer 223 are extended to the non-display area 212 provided with the driving signal line 230 through an organic solvent through a corresponding organic solvent.
  • the solvent is etched and removed, thereby reducing the width of the non-display area 212 of the display panel 200 and increasing the screen-to-body ratio of the display panel 200.

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Abstract

本揭示提供一种显示面板、显示装置及显示面板的制作方法,所述显示面板包括基板，基板包括显示区域和位于所述显示区域外围的非显示区域；显示器件层，包括依次层叠设置的阳极、像素定义层、公共层和阴极，像素定义层和公共层均设置于显示区域上，且均未延伸至显示区域至少一侧的非显示区域，缩减非显示区域的宽度。

Description

显示面板、显示装置及显示面板的制作方法 技术领域
本发明涉及显示技术领域，尤其涉及一种显示面板、显示装置及显示面板的制作方法。
 背景技术
有源矩阵有机发光二极管（Active-matrix organic light emitting diode, AMOLED）显示装置，具有自发光的特性，采用柔性的基板、柔性低温多晶硅（Low Temperature Poly-silicon, LTPS）制程以及高效率有机发光二极管（organic light emitting diode, OLED）显示技术。与液晶显示装置（Liquid Crystal Display, LCD）显示装置相比，AMOLED显示装置是自发光，不需要背光源，具有响应快、高色域、高对比度以及成本低等优势，被视为最具有前途的产品之一。
 技术问题
目前，窄边框、高屏占比是AMOLED显示装置的主要发展趋势，相应产品在市场竞争中占有明显优势。因而，如何进一步缩小屏幕边框进而提升屏占比，成为面板行业急需攻克的难题。
综上所述，现有AMOLED显示装置存在边框较宽、屏占比不高的问题。故，有必要提供一种显示面板、显示装置及显示面板的制作方法来改善这一缺陷。
 技术解决方案
本揭示实施例提供一种显示面板、显示装置及显示面板的制作方法，用于解决现有AMOLED显示装置存在的边框较宽、屏占比不高的问题。
本揭示实施例提供一种显示面板，包括：
基板，所述基板包括显示区域和位于所述显示区域外围的非显示区域；
显示器件层，所述显示器件层设置于所述基板上，所述显示器件层包括依次层叠设置的阳极、像素定义层、公共层和阴极；
其中，所述阳极覆盖所述显示区域并延伸至所述非显示区域，所述像素定义层和所述公共层均设置于所述显示区域上，且均未延伸至所述显示区域至少一侧的所述非显示区域，所述阴极覆盖所述公共层且延伸至所述非显示区与所述阳极接触。
根据本揭示一实施例，所述显示面板还包括：
驱动信号线，设置于所述基板的所述显示区域至少一侧的所述非显示区域上；
所述像素定义层和所述公共层均未延伸至设置有所述驱动信号线的所述非显示区域。
根据本揭示一实施例，所述像素定义层和所述公共层的材料均为有机材料，所述像素定义层和所述公共层延伸至设置有所述驱动信号线的所述非显示区的部分，通过相应有机溶剂进行刻蚀处理。
根据本揭示一实施例，所述显示面板还包括电压信号线，所述电压信号线设置于所述基板的所述显示区域至少一侧的所述非显示区域上，并与所述阳极相连接，所述驱动信号线设置于所述显示区域与所述电压信号线之间。
根据本揭示一实施例，所述阳极远离所述基板的一侧上形成有至少一个第一挡墙，且所述挡墙位于所述非显示区域上，所述阳极未覆盖的所述非显示区域处设置有至少一个第二挡墙。
根据本揭示一实施例，所述显示面板还包括封装层，所述封装层包括第一无机层、第二无机层以及设置于所述第一无机层和所述第二无机层之间的有机层，所述第一无机层覆盖所述显示区域和所述非显示区域，所述有机层覆盖所述显示区域，并延伸至所述第一挡墙远离所述第二挡墙的一侧，所述第二无机层覆盖所述显示区域和所述非显示区域。
本揭示实施例提供一种显示装置，包括显示面板，所述显示面板包括：
基板，所述基板包括显示区域和位于所述显示区域外围的非显示区域；
显示器件层，所述显示器件层设置于所述基板上，所述显示器件层包括依次层叠设置的阳极、像素定义层、公共层和阴极；
其中，所述阳极覆盖所述显示区域并延伸至所述非显示区域，所述像素定义层和所述公共层均设置于所述显示区域上，且均未延伸至所述显示区域至少一侧的所述非显示区域，所述阴极覆盖所述公共层且延伸至所述非显示区与所述阳极接触。
根据本揭示一实施例，所述显示面板还包括：
驱动信号线，设置于所述基板的所述显示区域至少一侧的所述非显示区域上；
所述像素定义层和所述公共层均未延伸至设置有所述驱动信号线的所述非显示区域。
根据本揭示一实施例，所述像素定义层和所述公共层的材料均为有机材料，所述像素定义层和所述公共层延伸至设置有所述驱动信号线的所述非显示区的部分，通过相应有机溶剂进行刻蚀处理。
根据本揭示一实施例，所述显示面板还包括电压信号线，所述电压信号线设置于所述基板的所述显示区域至少一侧的所述非显示区域上，并与所述阳极相连接，所述驱动信号线设置于所述显示区域与所述电压信号线之间。
根据本揭示一实施例，所述阳极远离所述基板的一侧上形成有至少一个第一挡墙，且所述挡墙位于所述非显示区域上，所述阳极未覆盖的所述非显示区域处设置有至少一个第二挡墙。
根据本揭示一实施例，所述显示面板还包括封装层，所述封装层包括第一无机层、第二无机层以及设置于所述第一无机层和所述第二无机层之间的有机层，所述第一无机层覆盖所述显示区域和所述非显示区域，所述有机层覆盖所述显示区域，并延伸至所述第一挡墙远离所述第二挡墙的一侧，所述第二无机层覆盖所述显示区域和所述非显示区域。
本揭示实施例还提供一种显示面板的制作方法，包括：
步骤S10：提供基板，所述基板包括显示区域和位于所述显示区域外围的非显示区域；
步骤S20：依次在所述基板上沉积形成像素定义层和公共层，所述像素定义层和所述公共层均覆盖所述显示区域，且均延伸至所述非显示区域；
步骤S30：遮挡所述显示区域，去除延伸至所述显示区域至少一侧的所述非显示区域上的所述像素定义层和所述公共层。
根据本揭示一实施例，所述基板上还形成有驱动信号线，所述驱动信号线设置于所述基板的所述显示区域至少一侧的所述非显示区域上，在所述步骤S20中所述像素定义层和所述公共层均延伸至设置有所述驱动信号线的所述非显示区域。
根据本揭示一实施例，所述像素定义层和所述公共层的材料均为有机材料，所述像素定义层和所述公共层延伸至设置有所述驱动信号线的所述非显示区域的部分，通过相应有机溶剂进行刻蚀处理去除。
 有益效果
本揭示的有益效果：本揭示实施例通过去除位于基板非显示区域上的像素定义层和公共层，使得像素定义层和公共层仅存在显示区域内，从而有效缩减显示面板非显示区域的宽度，提高显示面板及显示装置的屏占比。
 附图说明
为了更清楚地说明实施例或现有技术中的技术方案，下面将对实施例或现有技术描述中所需要使用的附图作简单介绍，显而易见地，下面描述中的附图仅仅是揭示的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1为本揭示实施例一提供的显示面板的截面结构示意图；
图2为本揭示实施例一提供的显示面板的平面结构示意图；
图3为本揭示实施例二提供的显示面板制作方法的流程示意图；
图4A为本揭示实施例二提供的显示面板的截面结构示意图；
图4B为本揭示实施例二提供的显示面板的截面结构示意图；
图4C为本揭示实施例二提供的显示面板的截面结构示意图。
 本发明的实施方式
以下各实施例的说明是参考附加的图示，用以例示本申请可用以实施的特定实施例。本申请所提到的方向用语，例如[上]、[下]、[前]、[后]、[左]、[右]、[内]、[外]、[侧面]等，仅是参考附加图式的方向。因此，使用的方向用语是用以说明及理解本申请，而非用以限制本申请。在图中，结构相似的单元是用以相同标号表示。
下面结合附图和具体实施例对本揭示做进一步的说明：
实施例一：
本揭示实施例提供一种显示面板，下面结合图1至图2进行详细说明。
如图1所示，图1为本揭示实施例提供的显示面板100的截面结构示意图，所述显示面板100包括基板110、显示器件层120、驱动信号线130和电压信号线140。
具体地，所述基板110包括显示区域111和位于所述显示区域111外围的非显示区域112；所述显示器件层120设置于所述基板110上，所述显示器件层120包括依次层叠设置的阳极121、像素定义层122、公共层123和阴极124。
在本实施例中，所述阳极121覆盖所述显示区域111并延伸至所述非显示区域112，所述像素定义层122和所述公共层123均设置于所述显示区域111上，且均为延伸至所述显示区域111至少一侧的所述非显示区域112，所述阴极124设置于所述公共层123远离所述基板110的一侧上，且覆盖所述公共层123并延伸至所述非显示区域112与所述阳极121接触，所述公共层123包括空穴注入层、空穴传输层、发光层、电子传输层以及电子注入层（图中未示出）。
如图2所示，图2为本揭示实施例提供的显示面板100的平面结构示意图，其中，左侧为现有技术显示面板，右侧为本揭示实施例所提供的显示面板100。现有技术显示面板左右两侧的非显示区域宽度为a，本揭示实施例所提供的显示面板100左右两侧非显示区域112的宽度为b，通过将像素定义层122的边缘和所述公共层123的边缘与所述显示区域111的边缘齐平，使得b＜a，从而有效缩减显示面板100左右两侧非显示区域112的宽度，提升显示面板100的屏占比。
在一些实施例中，上述结构不仅可用于显示面板100的左右两侧非显示区域112，同样可以用于显示面板100上下两侧非显示区域，并且可以实现相同的技术效果。
在本实施例中，所述驱动信号线130设置于所述基板110的所述显示区域111至少一侧的所述非显示区域112上，所述像素定义层122和所述公共层123均为延伸至设置有所述驱动信号线130的所述非显示区域112。
在本实施例中，所述像素定义层122和所述公共层123的材料均为有机材料，所述阳极121为金属材料，从而在制作形成所述像素定义层122和所述公共层123时，可以通过光阻或者掩膜板对显示区域111进行遮挡保护，对所述像素定义层122和公共层123延伸至设置有所述驱动信号线130的所述非显示区域112的部分通过相应的有机溶剂进行刻蚀处理去除，从而实现缩减非显示区域112宽度的技术效果。
在本实施例中，如图1所示，所述电压信号线140设置于所述基板110的所述显示区域111至少一侧的所述非显示区域112上，并与所述阳极121相连接，所述驱动信号线130设置于所述显示区域111与所述电压信号线140之间。
如图1所示，所述显示面板100还包括薄膜晶体管层150，所述薄膜晶体管层150设置于所述显示区域111上，且位于所述阳极121与所述基板110之间，所述薄膜晶体管150的栅极与所述驱动信号线130相连接。
如图1所示，所述阳极121远离所述基板110的一侧上形成有至少一个第一挡墙170，且所述第一挡墙170位于所述非显示区域112上，所述阳极121为覆盖的所述非显示区域112处还设置有至少一个第二挡墙180。
在本实施例中，所述显示面板100还包括封装层160，所述封装层160包括第一无机层161、第二无机层163以及设置于所述第一无机层161和所述第二无机层163之间的有机层162，所述第一无机层161覆盖所述显示区域111和所述非显示区域112，所述有机层162覆盖所述显示区域111，并延伸至所述第一挡墙170远离所述第二挡墙180的一侧，所述第二无机层163覆盖所述显示区域111和所述非显示区域112，所述第一挡墙170和所述第二挡墙180用于防止所述有机层162中的有机溶液外溢，从而避免有机溶液外溢导致的相关问题。
本揭示实施例提供一种显示面板100，通过将显示器件层120内的公共层123和像素定义层122限制于基板110的显示区域111内，缩减显示面板100周围非显示部分111的宽度，从而提高所述显示面板100的屏占比。
本揭示实施例还提供一种显示装置，包括如上述实施例所述的显示面板100，且能够实现与上述实施例所提供的显示面板100相同的技术效果，此处不再赘述。
实施例二：
一种显示面板的制作方法，下面结合图3至图4C进行详细说明。
如图3所示，图3为本揭示实施例所提供的显示面板的制作方法的流程示意图，图4A至图4C为本揭示实施例提供的显示面板200的截面结构示意图，所述方法包括：
步骤S10：提供基板210，所述基板210包括显示区域211和位于所述显示区域211外围的非显示区域212。
如图4A所示，所述基板210上还形成有薄膜晶体管层220、驱动信号线230、电压信号线240以及阳极250，所述驱动信号线230设置于所述基板210的所述显示区域211至少一侧的所述非显示区域212上，所述薄膜晶体管层220的栅极与所述驱动信号线230相连接，所述电压信号线240设置于所述基板210的所述显示区域211至少一侧的所述非显示区域212上，并与所述阳极221相连接，所述驱动信号线230设置于所述显示区域211与所述电压信号线240之间。步骤S20：依次在所述基板210上沉积形成像素定义层260和公共层270，所述像素定义层260和所述公共层270均覆盖所述显示区域211，且均延伸至所述非显示区域212。
具体地，所述像素定义层260设置于所述阳极250远离所述基板210的一侧上，所述公共层270设置于所述像素定义层260远离所述阳极250的一侧上，且所述像素定义层260和所述公共层270均延伸至设置有所述驱动信号线240的所述非显示区域212，所述公共层270还包括空穴注入层、空穴传输层、发光层、电子传输层以及电子注入层（图中未示出）。
步骤S30：遮挡所述显示区域211，去除延伸至所述显示区域211至少一侧的所述非显示区域212上的所述像素定义层260和所述公共层270。
具体地，可以采用掩膜板对所述显示区域211以及位于所述显示区域211上的像素定义层260和所述公共层270进行遮挡，在一些实施例中，也可以采用涂布光阻的方式对所述显示区域211以及位于所述显示区域211上的像素定义层260和所述公共层270进行遮挡，从而避免在去除其他部分的像素定义层260和公共层270时，对显示区域211及上方的膜层造成破坏。
在本实施例中，所述阳极、驱动信号线和电压信号线均为金属材料，所述像素定义层260和所述公共层270的材料均为有机材料，所述步骤S30中，对所述像素定义层222和公共层223延伸至设置有所述驱动信号线230的所述非显示区域212的部分通过相应的有机溶剂进行刻蚀处理去除，从而实现缩减非显示区域212宽度的技术效果。
在本实施例中，所述制作方法还包括：
步骤S40：在所述公共层270远离所述基板210的一侧上形成阴极280，所述阴极280覆盖所述公共层270，且延伸至所述非显示区域与所述阳极250接触；
步骤S50：在所述阴极280远离所述基板210的一侧上形成封装层290。
在本实施例中，如图4B所示，所述阳极220远离所述基板210的一侧上形成有至少一个第一挡墙251，且所述第一挡墙251位于所述非显示区域212上，所述阴极121未覆盖的所述非显示区域212处还设置有至少一个第二挡墙241。
具体地，如图4C所示，所述封装层290包括第一无机层291、第二无机层293以及设置于所述第一无机层291和所述第二无机层293之间的有机层292，所述第一无机层291覆盖所述显示区域211和所述非显示区域212，所述有机层292覆盖所述显示区域211，并延伸至所述第一挡墙251远离所述第二挡墙241的一侧，所述第二无机层293覆盖所述显示区域211和所述非显示区域212，所述第一挡墙251和所述第二挡墙241用于防止所述有机层292中的有机溶液外溢，从而避免有机溶液外溢导致的相关问题。
本揭示实施例提供一种显示面板的制作方法，通过有机溶剂对所述像素定义层222和公共层223延伸至设置有所述驱动信号线230的所述非显示区域212的部分通过相应的有机溶剂进行刻蚀处理去除，从而缩减所述显示面板200的非显示区域212的宽度，提高显示面板200的屏占比。
综上所述，虽然本揭示以优选实施例揭露如上，但上述优选实施例并非用以限制本揭示，本领域的普通技术人员，在不脱离本揭示的精神和范围内，均可作各种更动与润饰，因此本揭示的保护范围以权利要求界定的范围为基准。

Claims (15)

  1. 一种显示面板，包括：
    基板，所述基板包括显示区域和位于所述显示区域外围的非显示区域；
    显示器件层，所述显示器件层设置于所述基板上，所述显示器件层包括依次层叠设置的阳极、像素定义层、公共层和阴极；
    其中，所述阳极覆盖所述显示区域并延伸至所述非显示区域，所述像素定义层和所述公共层均设置于所述显示区域上，且均未延伸至所述显示区域至少一侧的所述非显示区域，所述阴极覆盖所述公共层且延伸至所述非显示区与所述阳极接触。
  2. 如权利要求1所述的显示面板，其中，所述显示面板还包括：
    驱动信号线，设置于所述基板的所述显示区域至少一侧的所述非显示区域上；
    所述像素定义层和所述公共层均未延伸至设置有所述驱动信号线的所述非显示区域。
  3. 如权利要求2所述的显示面板，其中，所述像素定义层和所述公共层的材料均为有机材料，所述像素定义层和所述公共层延伸至设置有所述驱动信号线的所述非显示区的部分，通过相应有机溶剂进行刻蚀处理。
  4. 如权利要求2所述的显示面板，其中，所述显示面板还包括电压信号线，所述电压信号线设置于所述基板的所述显示区域至少一侧的所述非显示区域上，并与所述阳极相连接，所述驱动信号线设置于所述显示区域与所述电压信号线之间。
  5. 如权利要求1所述的显示面板，其中，所述阳极远离所述基板的一侧上形成有至少一个第一挡墙，且所述挡墙位于所述非显示区域上，所述阳极未覆盖的所述非显示区域处设置有至少一个第二挡墙。
  6. 如权利要求5所述的显示面板，其中，所述显示面板还包括封装层，所述封装层包括第一无机层、第二无机层以及设置于所述第一无机层和所述第二无机层之间的有机层，所述第一无机层覆盖所述显示区域和所述非显示区域，所述有机层覆盖所述显示区域，并延伸至所述第一挡墙远离所述第二挡墙的一侧，所述第二无机层覆盖所述显示区域和所述非显示区域。
  7. 一种显示装置，包括显示面板，所述显示面板包括：
    基板，所述基板包括显示区域和位于所述显示区域外围的非显示区域；
    显示器件层，所述显示器件层设置于所述基板上，所述显示器件层包括依次层叠设置的阳极、像素定义层、公共层和阴极；
    其中，所述阳极覆盖所述显示区域并延伸至所述非显示区域，所述像素定义层和所述公共层均设置于所述显示区域上，且均未延伸至所述显示区域至少一侧的所述非显示区域，所述阴极覆盖所述公共层且延伸至所述非显示区与所述阳极接触。
  8. 如权利要求7所述的显示装置，其中，所述显示面板还包括：
    驱动信号线，设置于所述基板的所述显示区域至少一侧的所述非显示区域上；
    所述像素定义层和所述公共层均未延伸至设置有所述驱动信号线的所述非显示区域。
  9. 如权利要求8所述的显示装置，其中，所述像素定义层和所述公共层的材料均为有机材料，所述像素定义层和所述公共层延伸至设置有所述驱动信号线的所述非显示区的部分，通过相应有机溶剂进行刻蚀处理。
  10. 如权利要求8所述的显示装置，其中，所述显示面板还包括电压信号线，所述电压信号线设置于所述基板的所述显示区域至少一侧的所述非显示区域上，并与所述阳极相连接，所述驱动信号线设置于所述显示区域与所述电压信号线之间。
  11. 如权利要求7所述的显示装置，其中，所述阳极远离所述基板的一侧上形成有至少一个第一挡墙，且所述挡墙位于所述非显示区域上，所述阳极未覆盖的所述非显示区域处设置有至少一个第二挡墙。
  12. 如权利要求11所述的显示装置，其中，所述显示面板还包括封装层，所述封装层包括第一无机层、第二无机层以及设置于所述第一无机层和所述第二无机层之间的有机层，所述第一无机层覆盖所述显示区域和所述非显示区域，所述有机层覆盖所述显示区域，并延伸至所述第一挡墙远离所述第二挡墙的一侧，所述第二无机层覆盖所述显示区域和所述非显示区域。
  13. 一种显示面板的制作方法，包括：
    步骤S10：提供基板，所述基板包括显示区域和位于所述显示区域外围的非显示区域；
    步骤S20：依次在所述基板上沉积形成像素定义层和公共层，所述像素定义层和所述公共层均覆盖所述显示区域，且均延伸至所述非显示区域；
    步骤S30：遮挡所述显示区域，去除延伸至所述显示区域至少一侧的所述非显示区域上的所述像素定义层和所述公共层。
  14. 如权利要求13所述的制作方法，其中，所述基板上还形成有驱动信号线，所述驱动信号线设置于所述基板的所述显示区域至少一侧的所述非显示区域上，在所述步骤S20中所述像素定义层和所述公共层均延伸至设置有所述驱动信号线的所述非显示区域。
  15. 如权利要求14所述的制作方法，其中，所述像素定义层和所述公共层的材料均为有机材料，所述像素定义层和所述公共层延伸至设置有所述驱动信号线的所述非显示区域的部分，通过相应有机溶剂进行刻蚀处理去除。
PCT/CN2019/115901 2019-08-19 2019-11-06 显示面板、显示装置及显示面板的制作方法 WO2021031370A1 (zh)

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