WO2021027168A1 - 基板及其制作方法 - Google Patents

基板及其制作方法 Download PDF

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Publication number
WO2021027168A1
WO2021027168A1 PCT/CN2019/118995 CN2019118995W WO2021027168A1 WO 2021027168 A1 WO2021027168 A1 WO 2021027168A1 CN 2019118995 W CN2019118995 W CN 2019118995W WO 2021027168 A1 WO2021027168 A1 WO 2021027168A1
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WIPO (PCT)
Prior art keywords
shielding layer
pixel
light
substrate
light shielding
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PCT/CN2019/118995
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English (en)
French (fr)
Inventor
俞云
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Tcl华星光电技术有限公司
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Priority to US16/618,992 priority Critical patent/US11081537B2/en
Publication of WO2021027168A1 publication Critical patent/WO2021027168A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/133711—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by organic films, e.g. polymeric films

Definitions

  • This application relates to the field of display, in particular to a substrate and a manufacturing method thereof.
  • inkjet printing is widely used in electronic manufacturing for patterned deposition by virtue of non-contact printing, full digital control, high precision, less waste of raw materials, low cost, flexibility and rapidity, and easy mass production.
  • Crystal Display, LCD Organic Light Emitting Diode (OLED), Polymer Light Emitting Diode (PLED) and other display panels are in the manufacturing process.
  • the inkjet printing film layer liquid is sprayed onto the substrate as spherical cap-shaped droplets, and then diffused, spread, dried and solidified to form a uniform printing film on the surface of the substrate.
  • PI polyimide alignment film
  • the large-generation line of LCD such as G8.5
  • PI polyimide alignment film
  • multi-domain design (8Domain) and high-resolution products require smaller and smaller individual pixel areas.
  • 8-Domain technology is the most common one, that is, a sub-pixel (Pixel) 20 is divided into two areas: Main Pixel and Sub-Pixel , The size of the two areas are different (ratio of size to area, 1:2/2:3, etc.).
  • a row of main pixels ( ⁇ 100*100um)10 with a smaller size is usually designed at the extreme edge.
  • this application proposes a new method.
  • a smaller pixel (Pixel) By connecting a smaller pixel (Pixel) with a larger pixel (Pixel) or a smaller pixel (Pixel) with a smaller pixel (Pixel), the PI of the adjacent pixel (Pixel) can be connected. Drain the flow to the pixels that are more difficult to flow into the PI, and make the PI flow into these smaller pixels (Pixel). It can effectively improve the poor display caused by the failure of the PI of inkjet printing to flow into the smaller pixels (Pixel) and the pixels (Pixel) cannot be properly aligned, which helps to improve the product yield and quality.
  • the purpose of the present application is to provide a substrate, including: a glass substrate; a first base layer disposed on the glass substrate; a light shielding layer disposed on the first base On the bottom layer; a plurality of pixel units, arranged on the first base layer, the pixel units including at least one light-transmitting area; and a photomask for exposing the light-shielding layer; wherein, the photomask will The light-shielding layer on the multiple pixel units that need to be connected is exposed, displayed, and part of it is etched away, and the light-shielding layer groove is formed to connect the multiple pixel units.
  • the first base layer has a whole surface shape.
  • the width of the groove of the light shielding layer is greater than or equal to 1/2 of the side length.
  • the depth of the groove of the light shielding layer is 1/2 of the thickness of the light shielding layer.
  • the shape of the groove of the light shielding layer is square or arc.
  • the photomask is a grayscale photomask or a halftone photomask.
  • Another object of the present application is to provide a method for manufacturing a substrate, including: providing a glass substrate; forming a first base layer, which is disposed on the glass substrate; forming a light-shielding layer, which is disposed on the first Forming a plurality of pixel units, arranged on the first substrate layer, the pixel units including at least one light-transmitting area; and providing a mask for exposing the light-shielding layer; wherein, the The mask exposes the light shielding layer on the multiple pixel units that need to be connected, displays, and etches a part of the light shielding layer grooves to connect the multiple pixel units.
  • the width of the groove of the light shielding layer is greater than or equal to 1/2 of the side length.
  • the depth of the groove of the light shielding layer is 1/2 of the thickness of the light shielding layer.
  • the shape of the groove of the light shielding layer is a square or a circular arc.
  • This application provides that by connecting a smaller pixel (Pixel) with a larger pixel (Pixel) or a smaller pixel (Pixel) with a smaller pixel (Pixel), the PI of the adjacent pixel (Pixel) can be drained to be more difficult to flow into the PI Pixels, so that PI flows into these smaller pixels. It can effectively improve the poor display caused by the inability of the inkjet printing PI to flow into the smaller pixels (Pixel) and the pixels (Pixel) cannot be properly aligned. It can also be used to improve the inkjet printing because the inkjet printing fluid cannot flow into the holes/holes/pixels ( Pixel) and other anomalies help to improve product yield and quality.
  • Figure 1a is a schematic diagram of a local wiring of a substrate in the prior art
  • FIG. 1b is a schematic diagram of the arrangement of edge pixels on a substrate in the prior art
  • FIG. 1c is a schematic cross-sectional view of a polyimide layer coating condition of different pixels on a substrate in the prior art
  • FIG. 2 is a schematic diagram of the force status of the prior art polyimide liquid around the pixels
  • Fig. 3a is a schematic diagram of substrate wiring according to an embodiment of the application.
  • 3b is a schematic cross-sectional view of the light shielding layer of different pixels on the substrate according to an embodiment of the application;
  • FIG. 4 is a schematic diagram of the width of the groove of the light shielding layer on the substrate according to an embodiment of the application;
  • FIG. 5 is a flowchart of a manufacturing method of a substrate according to an embodiment of the application.
  • Figure 2 is a schematic diagram of the force condition of the prior art polyimide liquid around the pixels.
  • the force condition of the imide liquid 30 on the concave liquid surface, the surface tension f of the polyimide liquid 30 is along the tangent direction of the main pixel 10, and it is easy to flow around the edge of the pixel; B , the concave liquid surface is subjected to air pressure P Air .
  • the Yang Laplace formula :
  • the pixel shape is square. The larger the size (smaller than the distance between the polyimide droplets), the smaller the pressure P B generated by the surface tension f, and the more difficult it is for the polyimide liquid 30 to flow into the main pixel 10.
  • FIG. 3a is a schematic diagram of substrate routing according to an embodiment of the application
  • FIG. 3b is a schematic cross-sectional view of a light-shielding layer of different pixels on a substrate of an embodiment of the application
  • FIG. 4 is a grooved light-shielding layer on a substrate of an embodiment of the application Schematic diagram of the width.
  • a substrate 100 includes: a glass substrate 110; a first base layer 120 disposed on the glass substrate 110; A light shielding layer 130 is disposed on the first base layer 120; a plurality of pixel units 10, 20 are disposed on the first base layer 120, and the pixel units 10, 20 include at least one light-transmitting area; and A photomask 150 is used to expose and manufacture the light shielding layer 130; wherein, the photomask 150 exposes the light shielding layer 130 on a plurality of pixel units 10 and 20 that need to be connected to display, and etch a part of it to form The groove of the light shielding layer 130 connects a plurality of pixel units 10 and 20.
  • the first base layer 120 has a whole surface shape.
  • the groove widths d1 and d3 of the light shielding layer 130 are greater than or equal to 1/2 of the side lengths d2 and d4.
  • the groove depth W2 of the light shielding layer 130 is 1/2 of the thickness W1 of the light shielding layer 130.
  • the shape of the groove of the light shielding layer 130 is square or arc, and is not limited to square or arc, including all shapes.
  • the photomask 150 is a grayscale photomask or a halftone photomask.
  • Multi-gray-tone masks can be divided into two types: gray-tone mask and halftone mask.
  • the gray mask is to produce micro slits below the resolution of the exposure machine, and then a part of the light source is covered by the micro slits to achieve a half-exposure effect.
  • a halftone mask uses a "semi-transmissive" film for half exposure. Because the above two methods can show three exposure levels of "exposed part", “half exposed part” and “unexposed part” after one exposure process, it can form two kinds of light thickness after development. Resistance (by using such a difference in photoresist thickness, the graphics can be transferred to the panel substrate with a smaller number of sheets than usual, and the panel production efficiency can be improved).
  • FIG. 5 is a flowchart of a manufacturing method of a substrate according to an embodiment of the application. 3a, 3b, 4, and 5, in an embodiment of the present application, a method for manufacturing a substrate 100 includes: providing a glass substrate 110; forming a first base layer 120, which is disposed On the glass substrate 110; forming a light-shielding layer 130, disposed on the first base layer 120; forming a plurality of pixel units 10, 20, disposed on the first base layer 120, the pixel unit 10 20 includes at least one light-transmitting area; and a mask 150 is provided to expose and manufacture the light-shielding layer 130; wherein, the light-shield 150 will need to be connected to the light-shielding layer on the plurality of pixel units 10, 20 130 exposes, displays, and etches a part of the light shielding layer 130 to form a groove to connect a plurality of pixel units 10 and 20.
  • the groove widths d1 and d3 of the light shielding layer 130 are greater than or equal to 1/2 of the side lengths d2 and d4. .
  • the groove depth W2 of the light shielding layer 130 is 1/2 of the thickness W1 of the light shielding layer 130.
  • the shape of the groove of the light shielding layer 130 is square or arc, and is not limited to square or arc, including All shapes.
  • a glass substrate is provided.
  • a first base layer is formed and disposed on the glass substrate.
  • a light shielding layer is formed and disposed on the first base layer.
  • a plurality of pixel units are formed and disposed on the first base layer, and the pixel units include at least one light-transmitting area.
  • a photomask is provided for exposing and manufacturing the light shielding layer; wherein, the photomask exposes, displays, and etches the light shielding layer on a plurality of pixel units that need to be connected A part of the light shielding layer groove is formed to connect a plurality of pixel units.
  • This application connects the smaller pixel (Pixel) with the larger pixel (Pixel) or the smaller pixel (Pixel) with the smaller pixel (Pixel), so that the PI of the neighboring pixel (Pixel) can be drained to the pixel that is more difficult to flow into the PI. (Pixel), make PI flow into these smaller pixels (Pixel). It can effectively improve the poor display caused by the inability of the inkjet printing PI to flow into the smaller pixels (Pixel) and the pixels (Pixel) cannot be properly aligned. It can also be used to improve the inkjet printing because the inkjet printing fluid cannot flow into the holes/holes/pixels ( Pixel) and other anomalies help to improve product yield and quality.
  • the subject of this application can be manufactured and used in industry, with industrial applicability

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  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
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  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
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Abstract

一种基板(100) 及其制作方法，基板(100)包括：一玻璃衬底(110)；一第一基底层(120)，设置于玻璃衬底(110)上；一遮光层(130)，设置于第一基底层(120)上；多个画素单元(10、20)，设置于第一基底层(120)上，画素单元(10、20)包括至少一透光区；以及一光罩(150)用以使遮光层(130)曝光制造；其中，光罩(150)将需要连通的多个画素单元(10、20)上的遮光层(130)曝光、显示、刻蚀掉一部分，形成遮光层(130)凹槽将多个画素单元(10、20)连通。

Description

基板及其制作方法 技术领域
本申请涉及显示领域，特别涉及一种基板及其制作方法。
背景技术
由于具有轻薄、可饶曲、不易碎裂、廉价等特点，柔性显示技术受到各电子产品的广泛关注，这也使得柔性技术成为显示技术的一个重要发展方向。当前，柔性显示屏的主要技术方向包括柔性OLED、柔性LCD等，而其中柔性基板/盖板所涉及的材料技术和制程技术是其中的关键。现有的技术中聚酰亚胺(Polyimide,PI)材料由于有稳定的耐化学性、耐辐射性、耐热性和良好的介电性能是柔性基板的主要选择。
而喷墨打印凭借非接触式印刷，全数字控制，精度高，原材料浪费少，成本低廉、灵活快速便于大批量生产等优点，被广泛应用于电子制造业图案化沉积，如液晶显示屏(Liquid Crystal Display,LCD)，有机发光二极管/有机发光二极管显示屏(Organic Light Emitting Diode,OLED)，聚合物发光二极管/聚合物发光二极管显示屏(Polymer Light Emitting Diode,PLED)等显示面板制造中。
技术问题
在显示面板中，喷墨打印膜层液体喷涂到基板上是球冠形的液滴，然后经扩散铺展，干燥固化后在基板表面形成一层均匀的打印膜层。在LCD的大世代线(如G8.5)，聚酰亚胺配向膜层(PI)涂布通常采用喷墨打印制作。喷墨打印的PI液滴与液滴间存在一定间距(X/Y方向间距均约100um)，需经扩散铺展，干燥固化等才能在基板表面形成均一的膜层。在PSVA型LCD显示面板中，多畴设计(8Domain)和高分辨率产品需要单个像素区域大小越来越小。为了改善色偏，常采用多畴设计，8畴(Domain)技术为其中最常见的一种，即将一个子画素(Pixel)20分为主画素(Main Pixel)和子画素(Sub Pixel)2个区，2个区大小不同(大小面积比，1:2/2:3等)。为了确保边缘亮度均一性，如图1a，最边缘通常设计有一排尺寸较小的主画素(Main Pixel)(<100*100um)10。由于线路的存在，画素(Pixel)开口区四周地形较高；同时由于画素(Pixel)太小，PI液滴间距较大，喷涂时无法确保均喷涂到这些小的画素(Pixel)里(如图1b)。若未喷涂到边缘主画素(Main Pixel)内，PI流到主画素(Main Pixel)边缘，由于画素(Pixel)边缘存在较高的线路围成的框，PI液由于张力的作用绕流而无法进入画素(Pixel)，导致主画素(Main Pixel)10内无PI(如图1c)，引起无法配相导致的亮点或边缘亮线等不良。
因此本申请提出一种新的方法，通过将较小画素(Pixel)与较大画素(Pixel)或较小画素(Pixel)与较小画素(Pixel)连通，可将临近画素(Pixel)的PI引流到比较难流入PI的画素(Pixel)， 使PI流入这些较小画素(Pixel)。可以有效改善喷墨打印的PI无法流入较小画素(Pixel)导致画素(Pixel)无法正常配向引起的显示不良,有助于提升产品良率和品质。
技术解决方案
为了解决上述技术问题，本申请的目的在于，提供一种基板，包括：一玻璃衬底；一第一基底层，设置于所述玻璃衬底上；一遮光层，设置于所述第一基底层上；多个画素单元，设置于所述第一基底层上，所述画素单元包括至少一透光区；以及一光罩用以使所述遮光层曝光制造；其中,所述光罩将需要连通的多个画素单元上的所述遮光层曝光，显示，刻蚀掉一部分，形成所述遮光层凹槽将多个画素单元连通。
本申请的目的及解决其技术问题是采用以下技术方案来实现的。
在本申请的一实施例中，所述第一基底层为整面状。
在本申请的一实施例中，所述遮光层凹槽宽度大于等于所在边长的1/2。
在本申请的一实施例中，所述遮光层凹槽深度为所述遮光层厚度的1/2。
在本申请的一实施例中，所述遮光层凹槽的形状为方形或圆弧形。
在本申请的一实施例中，所述光罩为灰阶光罩或半色调光罩。
本申请的目的及解决其技术问题还可采用以下技术措施进一步实现。
本申请的另一目的为提供一种基板的制作方法，包括：提供一玻璃衬底；形成一第一基底层，设置于所述玻璃衬底上；形成一遮光层，设置于所述第一基底层上；形成多个画素单元，设置于所述第一基底层上，所述画素单元包括至少一透光区；以及提供一光罩用以使所述遮光层曝光制造；其中,所述光罩将需要连通的多个画素单元上的所述遮光层曝光，显示，刻蚀掉一部分，形成所述遮光层凹槽将多个画素单元连通。
在本申请的一实施例中，所述方法，所述遮光层凹槽宽度大于等于所在边长的1/2。
在本申请的一实施例中，所述方法，所述遮光层凹槽深度为所述遮光层厚度的1/2。
在本申请的一实施例中，所述方法，所述遮光层凹槽的形状为方形或圆弧形。
本申请提供了通过将较小画素(Pixel)与较大画素(Pixel)或较小画素(Pixel)与较小画素(Pixel)连通，可将临近画素(Pixel)的PI引流到比较难流入PI的画素(Pixel)，使PI流入这些较小画素(Pixel)。可以有效改善喷墨打印的PI无法流入较小画素(Pixel)导致画素(Pixel)无法正常配向引起的显示不良,还可用于改善喷墨打印中因喷墨打印液无法流入孔/洞/画素(Pixel)等异常,有助于提升产品良率和品质。
附图说明
为了更清楚地说明本申请实施例或现有技术中的技术方案，下面对实施例中所需要使用的附图作简单的介绍。下面描述中的附图仅为本申请的部分实施例，对于本领域普通技术人员而言，在不付出创造性劳动的前提下，还可以根据这些附图获取其他的附图。
图1a为现有技术的基板局部走线示意图；
图1b为现有技术的基板上的边缘画素排布示意图；
图1c为现有技术的基板上的不同画素的聚酰亚胺层涂布状况截面示意图；
图2为现有技术的聚酰亚胺液在画素周围的受力状况示意图；
图3a为本申请一实施例的基板走线示意图；
图3b为本申请一实施例的基板上的不同画素的遮光层截面示意图；
图4为本申请一实施例的基板上的遮光层挖槽的宽度示意图；
图5为本申请一实施例的基板的制作方法流程图。
本发明的实施方式
请参照附图中的图式，其中相同的组件符号代表相同的组件。以下的说明是基于所例示的本申请具体实施例，其不应被视为限制本申请未在此详述的其它具体实施例。
以下各实施例的说明是参考附加的图式，用以例示本申请可用以实施的特定实施例。本申请所提到的方向用语，例如「上」、「下」、「前」、「后」、「左」、「右」、「内」、「外」、「侧面」等，仅是参考附加图式的方向。因此，使用的方向用语是用以说明及理解本申请，而非用以限制本申请。
在附图中，为了清晰起见，夸大了层、膜、面板、区域等的厚度。在附图中，为了理解和便于描述，夸大了一些层和区域的厚度。将理解的是，当例如层、膜、区域或基底的组件被称作“在”另一组件“上”时，所述组件可以直接在所述另一组件上，或者也可以存在中间组件。
附图和说明被认为在本质上是示出性的，而不是限制性的。在图中，结构相似的单元是以相同标号表示。另外，为了理解和便于描述，附图中示出的每个组件的尺寸和厚度是任意示出的，但是本申请不限于此。
另外，在说明书中，除非明确地描述为相反的，否则词语“包括”将被理解为意指包括所述组件，但是不排除任何其它组件。此外，在说明书中，“在......上”意指位于目标组件上方或者下方，而不意指必须位于基于重力方向的顶部上。
为更进一步阐述本申请为达成预定发明目的所采取的技术手段及功效，以下结合附图及 具体的实施例，对依据本申请提出的一种基板及其制作方法，其具体实施方式、结构、特征及其功效，详细说明如后。
图2为现有技术的聚酰亚胺液在画素周围的受力状况示意图,请参照图2,当聚酰亚胺(Polyimide,PI)30流到主画素(Main Pixel)10周围时的聚酰亚胺液30受力状况：在凹形液面，聚酰亚胺液30表面张力f沿主画素10切线方向，容易绕画素边缘流动；聚酰亚胺液体30表面张力f产生的压力P B,凹形液面受空气压力P Air。根据杨·拉普拉斯公式可知：
P Air>P B,
液体所受压强Ps＝P B-P Air<0，
即空气侧的压力较大，聚酰亚胺液30不易流入孔内。画素形状为方形，尺寸越大(小于聚酰亚胺液滴之间的距离)，表面张力f产生的压力P B越小，聚酰亚胺液30越难流入主画素10内。
图3a为本申请一实施例的基板走线示意图、图3b为本申请一实施例的基板上的不同画素的遮光层截面示意图及图4为本申请一实施例的基板上的遮光层挖槽的宽度示意图。请参照图3a、图3b及图4,在本申请的一实施例中，一种基板100，包括：一玻璃衬底110；一第一基底层120，设置于所述玻璃衬底110上；一遮光层130，设置于所述第一基底层120上；多个画素单元10、20，设置于所述第一基底层120上，所述画素单元10、20包括至少一透光区；以及一光罩150用以使所述遮光层130曝光制造；其中,所述光罩150将需要连通的多个画素单元10、20上的所述遮光层130曝光，显示，刻蚀掉一部分，形成所述遮光层130凹槽将多个画素单元10、20连通。
在本申请的一实施例中，所述第一基底层120为整面状。
在本申请的一实施例中，所述遮光层130凹槽宽度d1、d3大于等于所在边长d2、d4的1/2。
在本申请的一实施例中，所述遮光层130凹槽深度W2为所述遮光层130厚度W1的1/2。
在本申请的一实施例中，所述遮光层130凹槽的形状为方形或圆弧形,且不仅限于方形或圆弧形，包括所有形状。
在本申请的一实施例中，所述光罩150为灰阶光罩或半色调光罩。
多灰阶光罩，可分为灰色光罩(Gray-tone mask)和半色调光罩(Half tone mask)2种。灰色光罩是制作出曝光机分辨率以下的微缝，再藉由此微缝部位遮住一部份的光源，以达成半曝光的效果。另一方面，半色调光罩是利用「半透过」的膜，来进行半曝光。因为以上两种方 式皆是在1次的曝光过程后即可呈现出「曝光部分」「半曝光部分」及「未曝光部分」3种的曝光层次，故在显影后能够形成2种厚度的光阻(藉由利用这样的光阻厚度差异、便可以较一般少的片数下将图形转写至面板基板上，并达成面板生产效率的提升)。
图5为本申请一实施例的基板的制作方法流程图。请参照图3a、图3b、图4及图5,在本申请的一实施例中，一种基板100的制作方法，包括：提供一玻璃衬底110；形成一第一基底层120，设置于所述玻璃衬底110上；形成一遮光层130，设置于所述第一基底层120上；形成多个画素单元10、20，设置于所述第一基底层120上，所述画素单元10、20包括至少一透光区；以及提供一光罩150用以使所述遮光层130曝光制造；其中,所述光罩150将需要连通的多个画素单元10、20上的所述遮光层130曝光，显示，刻蚀掉一部分，形成所述遮光层130凹槽将多个画素单元10、20连通。
请参照图3a、图3b、图4及图5,在本申请的一实施例中，所述方法,所述遮光层130凹槽宽度d1、d3大于等于所在边长d2、d4的1/2。
请参照图3a、图3b及图5,在本申请的一实施例中，所述方法,所述遮光层130凹槽深度W2为所述遮光层130厚度W1的1/2。
请参照图3a、图3b及图5,在本申请的一实施例中，所述方法,所述遮光层130凹槽的形状为方形或圆弧形,且不仅限于方形或圆弧形，包括所有形状。
请参考图5，在流程S510中，提供一玻璃衬底。
请参考图5，在流程S520中，形成一第一基底层，设置于所述玻璃衬底上。
请参考图5，在流程S530中，形成一遮光层，设置于所述第一基底层上。
请参考图5，在流程S540中，形成多个画素单元，设置于所述第一基底层上，所述画素单元包括至少一透光区。
请参考图5，在流程S550中，提供一光罩用以使所述遮光层曝光制造；其中,所述光罩将需要连通的多个画素单元上的所述遮光层曝光，显示，刻蚀掉一部分，形成所述遮光层凹槽将多个画素单元连通。
本申请通过将较小画素(Pixel)与较大画素(Pixel)或较小画素(Pixel)与较小画素(Pixel)连通，可将临近画素(Pixel)的PI引流到比较难流入PI的画素(Pixel)，使PI流入这些较小画素(Pixel)。可以有效改善喷墨打印的PI无法流入较小画素(Pixel)导致画素(Pixel)无法正常配向引起的显示不良,还可用于改善喷墨打印中因喷墨打印液无法流入孔/洞/画素(Pixel)等异常,有助于提升产品良率和品质。
以上所述，对于本领域的普通技术人员来说，可以根据本发明的技术方案和技术构思作 出其他各种相应的改变和变形，而所有这些改变和变形都应属于本发明后附的权利要求的保护范围。
工业实用性
本申请的主题可以在工业中制造和使用，具备工业实用性

Claims (10)

  1. 一种基板，其包括：
    一玻璃衬底；
    一第一基底层，设置于所述玻璃衬底上；
    一遮光层，设置于所述第一基底层上；
    多个画素单元，设置于所述第一基底层上，所述画素单元包括至少一透光区；以及
    一光罩用以使所述遮光层曝光制造；
    其中,所述光罩将需要连通的多个画素单元上的所述遮光层曝光，显示，刻蚀掉一部分，形成所述遮光层凹槽将多个画素单元连通。
  2. 如权利要求1所述基板，其中，所述第一基底层为整面状。
  3. 如权利要求1所述基板，其中，所述遮光层凹槽宽度大于等于所在边长的1/2。
  4. 如权利要求1所述基板，其中，所述遮光层凹槽深度为所述遮光层厚度的1/2。
  5. 如权利要求1所述基板，其中，所述遮光层凹槽的形状为方形或圆弧形。
  6. 如权利要求1所述基板，其中，所述光罩为灰阶光罩或半色调光罩。
  7. 一种基板的制作方法，其包括：
    提供一玻璃衬底；
    形成一第一基底层，设置于所述玻璃衬底上；
    形成一遮光层，设置于所述第一基底层上；
    形成多个画素单元，设置于所述第一基底层上，所述画素单元包括至少一透光区；以及
    提供一光罩用以使所述遮光层曝光制造；
    其中,所述光罩将需要连通的多个画素单元上的所述遮光层曝光，显示，刻蚀掉一部分，形成所述遮光层凹槽将多个画素单元连通。
  8. 如权利要求7所述基板的制作方法，其中，所述遮光层凹槽宽度大于等于所在边长的1/2。
  9. 如权利要求7所述基板的制作方法，其中，所述遮光层凹槽深度为所述遮光层厚度的1/2。
  10. 如权利要求7所述基板的制作方法，其中，所述遮光层凹槽的形状为方形或圆弧形。
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