WO2021017298A1 - 显示面板及其制备方法 - Google Patents

显示面板及其制备方法 Download PDF

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Publication number
WO2021017298A1
WO2021017298A1 PCT/CN2019/117949 CN2019117949W WO2021017298A1 WO 2021017298 A1 WO2021017298 A1 WO 2021017298A1 CN 2019117949 W CN2019117949 W CN 2019117949W WO 2021017298 A1 WO2021017298 A1 WO 2021017298A1
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WO
WIPO (PCT)
Prior art keywords
layer
substrate
display panel
pfa
color
Prior art date
Application number
PCT/CN2019/117949
Other languages
English (en)
French (fr)
Inventor
朱清永
Original Assignee
Tcl华星光电技术有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Tcl华星光电技术有限公司 filed Critical Tcl华星光电技术有限公司
Priority to US16/619,469 priority Critical patent/US20210302795A1/en
Publication of WO2021017298A1 publication Critical patent/WO2021017298A1/zh

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13396—Spacers having different sizes
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1341—Filling or closing of cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1343—Electrodes
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1343—Electrodes
    • G02F1/134309—Electrodes characterised by their geometrical arrangement
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136222—Colour filters incorporated in the active matrix substrate
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/1368—Active matrix addressed cells in which the switching element is a three-electrode device

Definitions

  • the invention relates to the field of display technology, in particular to a display panel and a preparation method thereof.
  • COA Color Filter on Array
  • the color film is integrated on the array substrate
  • a passivation protective layer is covered on the color resist, but the passivation protective layer needs to be formed through multiple processes such as film formation, exposure, development, etching, and peeling.
  • the PFA Polymer Film on Array
  • it can also flatten the color resist surface and provide a flattened surface. The follow-up process.
  • PS (Photo Spacer) film column is a key material used to fix and support the thickness of liquid crystal in liquid crystal display panels. It also provides uniform cell thickness for color film substrates and array substrates. It has a certain degree of flexibility to avoid thermal expansion of the liquid crystal in the cell. Bubbles or uneven distribution caused by cold shrinkage and avoid bubbles appearing in high altitude and low pressure environments. However, since the PFA film layer is generally an organic polymer material, it will collapse or rebound under pressure, which affects the elasticity of the PS film column above it.
  • the PFA film layer will affect the elasticity of the PS film column and other mechanical properties, thereby affecting the product yield.
  • the present invention provides a display panel and a preparation method thereof, so as to solve the problem that the PFA film layer collapses or rebounds under pressure due to the PS film pillars arranged on the PFA film layer, thereby affecting the upper layer
  • the normal elastic range of the PS membrane column causes the product to have bubbles in the high-altitude and low-pressure environment, thereby affecting the technical problem of product yield.
  • the present invention provides a display panel including: a first substrate, a second substrate disposed opposite to the first substrate, and a second substrate sandwiched between the first substrate and the second substrate;
  • the first substrate is sequentially provided with a thin film transistor layer, a color resist layer, a PFA layer, a first electrode layer, and spacers; the PFA layer and the first electrode layer are provided with grooves, and the spacers Located in the trench, the depth of the trench is greater than the film thickness of the PFA layer, and the opening area of the trench is greater than the cross-sectional area of the spacer.
  • the thickness of the PFA film layer is 1 to 3 microns.
  • the groove is disposed in a non-pixel area on the display panel.
  • a black matrix layer and a second electrode layer are provided on a side surface of the second substrate facing the first substrate, and the black matrix layer includes a plurality of black light-shielding blocks.
  • the color resist layer includes a plurality of adjacently distributed first color resists, second color resists, and third color resists.
  • the orthographic projection of the black shading block on the first substrate is located between two adjacent color resists of the color resist layer.
  • the present invention provides another display panel, including: a first substrate, a second substrate, and a liquid crystal layer.
  • the first substrate is sequentially provided with a thin film transistor layer, a color resist layer, a PFA layer, a first electrode layer, and a spacer
  • the second substrate is arranged opposite to the first substrate, and the liquid crystal layer is sandwiched between the first substrate and the second substrate; wherein, the PFA layer and the first electrode layer A groove is provided on the upper surface, and the spacer is located in the groove.
  • the depth of the trench is greater than the film thickness of the PFA layer.
  • the thickness of the PFA film layer is 1 to 3 microns.
  • the opening area of the groove is larger than the cross-sectional area of the spacer.
  • the groove is disposed in a non-pixel area of the display panel.
  • a black matrix layer and a second electrode layer are provided on a side surface of the second substrate facing the first substrate, and the black matrix layer includes a plurality of black light-shielding blocks.
  • the color resist layer includes a plurality of adjacently distributed first color resists, second color resists, and third color resists.
  • the orthographic projection of the black shading block on the first substrate is located between two adjacent color resists of the color resist layer.
  • the present invention also provides a method for manufacturing a display panel, including the following steps:
  • the depth of the trench is greater than the film thickness of the PFA.
  • the opening area of the groove is larger than the cross-sectional area of the spacer.
  • the grooves expose part of the surface of the color resist layer, and the bottom of the spacer is in contact with the surface of the color resist layer.
  • the color resist layer includes a plurality of adjacently distributed first color resists, second color resists, and third color resists.
  • the black matrix includes black shading blocks distributed in an array, and the orthographic projection of the black shading blocks on the first substrate is located between two adjacent color resists of the color resist layer. between.
  • the beneficial effect of the present invention is that by opening a groove in the PFA layer, the spacer is arranged in the groove, avoiding the spacer being superimposed on the PFA, thereby preventing the PFA layer from affecting the elasticity of the spacer, and thereby Improve the product's problems such as bubbles in high-altitude and low-pressure environments.
  • FIG. 1 is a schematic structural diagram of a display panel according to an embodiment of the present invention.
  • FIGS. 2 to 4 are schematic structural diagrams of the manufacturing process of the display panel according to the embodiment of the present invention.
  • FIG. 5 is a flowchart of steps of a method for manufacturing a display panel according to an embodiment of the present invention.
  • the present invention is aimed at the existing display panel. Because the PS film column is arranged on the PFA film layer, the PFA film layer collapses or rebounds under pressure, which affects the normal elastic range of the PS film column on the upper layer, thereby causing the product to fail.
  • this embodiment can solve this defect.
  • an embodiment of the present invention provides a display panel 100, which includes a first substrate 10 and a second substrate 20 disposed oppositely, and sandwiched between the first substrate 10 and the second substrate 20 The liquid crystal layer 30.
  • the side of the first substrate 10 facing the second substrate 20 is provided with a thin film transistor layer 11, the thin film transistor layer is provided with a color resist layer 12, and the color resist layer 12 is covered with a PFA layer 13.
  • the PFA layer 13 is provided with a first electrode layer 14 and spacers 15.
  • the side of the second substrate 20 facing the first substrate 10 is provided with a black matrix layer 21, the second substrate 20 and the black matrix layer 21 are provided with a second electrode layer 22, the second electrode The layer 22 is disposed opposite to the first electrode layer 14, and the liquid crystal layer 30 is located between the second electrode layer 22 and the first electrode layer 14.
  • the material of the PFA layer 13 is an organic polymer material, which can provide a flat terrain for the subsequent process and improve the coating characteristics of the subsequent process. Because the spacer 15 can support a certain height between the first substrate 10 and the second substrate 20 and maintain a uniform cell gap at each position, and has certain flexibility to avoid thermal expansion of the liquid crystal in the cell Cold shrinkage causes bubbles, or bubbles appear in a high-altitude and low-pressure environment, so the spacer 15 is disposed above the PFA layer 13. However, the PFA layer 13 will collapse or rebound under stress, which will affect the normal elastic range of the spacer 15 on the upper layer, which will cause the product to appear bubbles and other undesirable phenomena in a high-altitude and low-pressure environment. For example, the relative position of the PFA layer 13 and the spacer 15 is improved, so as to avoid the adverse effect of the PFA layer 13 on the spacer 15 due to its own characteristics.
  • a trench 101 is provided on the PFA layer 13 and the first electrode layer 14, and the spacer 15 is located in the trench 101.
  • the groove 101 penetrates through the PFA layer 13 and the first electrode layer 14, so as to prevent the spacer 15 from being superimposed on the PFA layer 13, thereby preventing the PFA layer 13 from interfering with the spacer.
  • the elasticity of 15 has an impact.
  • the groove 101 is arranged to avoid the effective display area of the display panel 100, and is arranged in a non-pixel area, so as not to affect the normal display performance.
  • a trench 101 is formed at the corresponding position, and the trench 101 is in the thickness direction of the PFA layer 13 Through the PFA layer 13, so that the bottom of the spacer 15 prepared in the trench 101 does not contact the PFA layer 13, but is in contact with the color resist layer 12 underneath, so as to avoid the spacer 15 15 standing on the PFA layer affects the elastic restoring force of the spacer 15 and other characteristics.
  • the film thickness of the PFA layer 13 is 1 to 3 microns, and the depth of the groove 101 is greater than the thickness of the PFA layer 13, so that the spacer 15 prepared later can stand more stably on the groove 101 Inside.
  • the depth of the groove 101 can be extended to the color resist of the lower color resist layer 12 according to actual needs, that is, the groove is separated from the upper part of the corresponding color resist layer 12 below. To increase the depth of the above-mentioned trench 101.
  • the first electrode layer 14 Since the first electrode layer 14 is disposed on the PFA layer 13, the first electrode layer 14 also needs to be exposed, developed, and etched, so that the first electrode layer 14 and the PFA layer The trench 101 is formed thereon.
  • the opening area of the groove 101 should be made larger than the cross-sectional area of any part of the spacer 15.
  • the cross section of the spacer 15 may be trapezoidal, square, circular, etc., and the shape of the spacer 15 is not limited here.
  • the first electrode layer 14 may be a pixel electrode layer, and the second electrode layer 22 may be a common electrode layer.
  • the color resist layer includes a plurality of adjacently distributed first color resists 121, second color resists 122, and third color resists 123.
  • the first color resist 121, the second color resist 122, and the third color resist The color resistance 123 is one of R color resistance, G color resistance, and B color resistance.
  • the first color resistance 121 is R color resistance
  • the second color resistance 122 is G color resistance.
  • the third color resist 123 is a B color resist.
  • the black matrix layer 21 includes black shading blocks 211 distributed in an array, and the orthographic projection of the black shading blocks 211 on the first substrate 10 is located between two adjacent color resists of the color resist layer 12,
  • the black light-shielding block 211 is used to block the gap between adjacent color resistors to prevent light leakage or color mixing, thereby improving the contrast of the display.
  • the first substrate 10 and the second substrate 20 are both glass substrates, and may also be other transparent substrates, which are not limited here.
  • the thin film transistor layer 11 includes a plurality of thin film transistors (not shown in the figure) distributed in an array. Since the thin film transistors will block part of the light, the thin film transistors need to be arranged in the light-shielding area on the display panel 100 The orthographic projection of the thin film transistor on the first substrate 10 is located between adjacent color resists on the color resist layer 12.
  • this embodiment also provides a method for manufacturing the above-mentioned display panel 100, including the following steps:
  • a first substrate 10 is provided, and a thin film transistor layer 11, a color resist layer 12, a PFA layer 13, and a first electrode layer 14 are sequentially formed on the first substrate 10.
  • the thin film transistor layer 11 includes a gate electrode, a source and drain electrode, an active layer, a data line, and a scan line.
  • a first color resistor 121 and a second The color resist 122 and the third color resist 123 are then covered with the PFA layer 13 on the color resist layer 12, and finally a first electrode layer 14 is prepared on the PFA layer 13.
  • the PFA layer 13 under the opening is subjected to a photomask process to finally form the trench 101.
  • the trench 101 exposes part of the surface of the color resist layer 12, and the PFA layer 13 can also be masked when the PFA film layer is formed, and then the first electrode layer 14 is formed.
  • the bottom of the spacer 15 is in contact with the surface of the color resist layer 12, which prevents the spacer 15 from being superimposed on the PFA layer 13.
  • a second substrate 20 is provided, and a black matrix layer 21 and a second electrode layer 22 are sequentially formed on the second substrate 20.
  • the black light shielding blocks 211 distributed in an array are formed on the second substrate 20, and then the second electrode layer 22 is formed on the second substrate 20 and the black light shielding blocks 211.
  • the first substrate 10 and the second substrate 20 are aligned and bonded, and liquid crystal is dropped between the first substrate 10 and the second substrate 20.
  • the side of the first substrate 10 with the spacer 15 is bonded to the side of the second substrate 20 with the black matrix layer 21.
  • the spacer By opening a groove in the PFA layer, the spacer is arranged in the groove to prevent the spacer from being superimposed on the PFA, thereby preventing the PFA layer from affecting the elasticity of the spacer, thereby improving the product in high altitude Problems such as bubbles in low pressure environment.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Geometry (AREA)
  • Liquid Crystal (AREA)

Abstract

一种显示面板，包括第一基板、第二基板、以及液晶层，第一基板上依次设置有薄膜晶体管层、色阻层、PFA层、第一电极层以及隔垫物，PFA层和第一电极层上设置有沟槽，隔垫物位于沟槽内。通过在PFA层开设沟槽，避免隔垫物叠加在PFA上方，从而能够避免PFA层对隔垫物的弹性造成影响，进而改善产品在高空低压环境下出现气泡等问题。

Description

显示面板及其制备方法 技术领域
本发明涉及显示技术领域，尤其涉及一种显示面板及其制备方法。
 背景技术
在液晶显示面板中，COA（Color Filter on Array，彩膜集成于阵列基板上）产品中，会在彩色色阻上覆盖一层钝化保护层，但是钝化保护层需要通过成膜、曝光、显影、刻蚀、剥离等多道工艺形成，现有技术中，用PFA（Polymer Film on Array）工艺来替代钝化保护层，除了可节省成膜和剥离制程外，还可使得彩色色阻表面平坦化，提供一平坦化表面，有利于后续制程的进行。
PS（Photo Spacer）膜柱是液晶显示面板中用来固定和支撑液晶厚度的关键材料，同时也为彩膜基板和阵列基板提供均匀的盒厚，其具有一定的弹性，避免盒内液晶热胀冷缩造成的气泡或分布不均和避免在高空低气压环境下出现气泡。但是由于PFA膜层一般为有机高分子材料，在受到压力状态下会发生塌陷或反弹，影响其上层的PS膜柱的弹性。
综上所述，当PS膜柱叠加在PFA膜层上时，PFA膜层会影响PS膜柱的弹性等力学性能，从而影响产品良率。
 技术问题
本发明提供一种显示面板及其制备方法，以解决现有的显示面板中，由于在PFA膜层上设置PS膜柱，PFA膜层在受到压力状态下发生塌陷或反弹，从而影响其上层的PS膜柱的正常弹性范围，从而造成产品在高空低压环境下出现气泡，进而影响产品良率的技术问题。
 技术解决方案
为解决上述问题，本发明提供的技术方案如下：
本发明提供一种显示面板，包括：第一基板、与所述第一基板相对设置的第二基板、以及夹设于所述第一基板与所述第二基板之间的第二基板；所述第一基板上依次设置有薄膜晶体管层、色阻层、PFA层、第一电极层以及隔垫物；所述PFA层和所述第一电极层上设置有沟槽，所述隔垫物位于所述沟槽内，所述沟槽的深度大于所述PFA层的膜层厚度，所述沟槽的开口面积大于所述隔垫物的横截面积。
在本发明的至少一种实施例中，所述PFA膜层的厚度为1~3微米。
在本发明的至少一种实施例中，所述沟槽设置于所述显示面板上的非像素区域。
在本发明的至少一种实施例中，所述第二基板朝向所述第一基板的一侧表面设置有黑色矩阵层和第二电极层，所述黑色矩阵层包括多个黑色遮光块。
在本发明的至少一种实施例中，所述色阻层包括多个相邻分布的第一色阻、第二色阻、以及第三色阻。
在本发明的至少一种实施例中，所述黑色遮光块在所述第一基板上的正投影位于色阻层的两个相邻色阻之间。
本发明提供另外一种显示面板，包括：第一基板、第二基板、以及液晶层，所述第一基板上依次设置有薄膜晶体管层、色阻层、PFA层、第一电极层以及隔垫物，所述第二基板与所述第一基板相对设置，所述液晶层夹设于所述第一基板与所述第二基板之间；其中，所述PFA层和所述第一电极层上设置有沟槽，所述隔垫物位于所述沟槽内。
在本发明的至少一种实施例中，所述沟槽的深度大于所述PFA层的膜层厚度。
在本发明的至少一种实施例中，所述PFA膜层的厚度为1~3微米。
在本发明的至少一种实施例中，所述沟槽的开口面积大于所述隔垫物的横截面积。
在本发明的至少一种实施例中，所述沟槽设置于所述显示面板的非像素区域。
在本发明的至少一种实施例中，所述第二基板朝向所述第一基板的一侧表面设置有黑色矩阵层和第二电极层，所述黑色矩阵层包括多个黑色遮光块。
在本发明的至少一种实施例中，所述色阻层包括多个相邻分布的第一色阻、第二色阻、以及第三色阻。
在本发明的至少一种实施例中，所述黑色遮光块在所述第一基板上的正投影位于色阻层的两个相邻色阻之间。
本发明还提供一种显示面板的制备方法，包括以下步骤：
S10，提供一第一基板，在所述第一基板上依次形成薄膜晶体管层、色阻层、PFA层、第一电极层；
S20，对所述PFA层和所述第一电极层进行曝光、显影、刻蚀，在所述第一基板上形成沟槽；
S30，在所述沟槽内形成图案化的隔垫物；
S40，提供一第二基板，在所述第二基板上依次形成黑色矩阵层和第二电极层；
S50，将所述第一基板和所述第二基板对位贴合，将液晶滴注于所述第一基板和所述第二基板之间。
在本发明的至少一种实施例中，所述沟槽的深度大于所述PFA的膜层厚度。
在本发明的至少一种实施例中，所述沟槽的开口面积大于所述隔垫物的横截面积。
在本发明的至少一种实施例中，所述沟槽露出所述色阻层的部分表面，所述隔垫物的底部与所述色阻层的表面相接触。
在本发明的至少一种实施例中，所述色阻层包括多个相邻分布的第一色阻、第二色阻、以及第三色阻。
在本发明的至少一种实施例中，所述黑色矩阵包括阵列分布的黑色遮光块，所述黑色遮光块在所述第一基板上的正投影位于色阻层的两个相邻色阻之间。
 有益效果
本发明的有益效果为：通过在PFA层开设沟槽，使得隔垫物设置于该沟槽内，避免隔垫物叠加在PFA上方，从而能够避免PFA层对隔垫物的弹性造成影响，进而改善产品在高空低压环境下出现气泡等问题。
 附图说明
为了更清楚地说明实施例或现有技术中的技术方案，下面将对实施例或现有技术描述中所需要使用的附图作简单介绍，显而易见地，下面描述中的附图仅仅是发明的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1为本发明实施例的显示面板的结构示意图；
图2~图4为本发明实施例的显示面板的制备过程的结构示意图；
图5为本发明实施例的显示面板的制备方法的步骤流程图。
 本发明的实施方式
以下各实施例的说明是参考附加的图示，用以例示本发明可用以实施的特定实施例。本发明所提到的方向用语，例如[上]、[下]、[前]、[后]、[左]、[右]、[内]、[外]、[侧面]等，仅是参考附加图式的方向。因此，使用的方向用语是用以说明及理解本发明，而非用以限制本发明。在图中，结构相似的单元是用以相同标号表示。
本发明针对现有的显示面板，由于在PFA膜层上设置PS膜柱，PFA膜层在受到压力状态下发生塌陷或反弹，从而影响其上层的PS膜柱的正常弹性范围，从而造成产品在高空低压环境下出现气泡，进而影响产品良率的技术问题，本实施例能够解决该缺陷。
如图1所示，本发明实施例提供一种显示面板100，包括相对设置的第一基板10和第二基板20、以及夹设于所述第一基板10和所述第二基板20之间的液晶层30。
所述第一基板10朝向所述第二基板20的一侧设置有薄膜晶体管层11，所述薄膜晶体管层上设置有色阻层12，所述色阻层12上覆盖有PFA层13，所述PFA层13上设置有第一电极层14和隔垫物15。
所述第二基板20朝向所述第一基板10的一侧设置有黑色矩阵层21，所述第二基板20和所述黑色矩阵层21上设置有第二电极层22，所述第二电极层22与所述第一电极层14相对设置，所述液晶层30位于所述第二电极层22与所述第一电极层14之间。
所述PFA层13的材料为有机高分子材料，可为后续制程提供一平坦的地形，改善后制程涂布特性。由于所述隔垫物15能够在所述第一基板10和所述第二基板20之间支撑起一定的高度并保持各个位置均匀的cell gap，且具有一定的弹性以避免盒内液晶热胀冷缩造成气泡，或在高空低压环境下出现气泡，因此所述隔垫物15设置于所述PFA层13上方的。但是所述PFA层13在受力情况下，会发生塌陷或反弹现象，导致其上层的隔垫物15的正常弹性范围受到影响，从而造成产品在高空低压环境下出现气泡等不良现象，本实施例针对所述PFA层13和所述隔垫物15的相对位置做出改进，从而避免所述PFA层13由于其自身具有的特性对所述隔垫物15造成的不利影响。
具体地，如图3所示，所述PFA层13和所述第一电极层14上设置有沟槽101，所述隔垫物15位于所述沟槽101内。
所述沟槽101贯穿所述PFA层13和所述第一电极层14，从而避免所述隔垫物15叠加在所述PFA层13上，进而避免所述PFA层13对所述隔垫物15的弹性造成影响。
所述沟槽101避开所述显示面板100的有效显示区域设置，将其设置于非像素区域，从而不影响正常的显示性能。
通过在与所述隔垫物15对应的位置，对所述PFA层进行曝光、显影、刻蚀等工艺，在相应位置形成沟槽101，该沟槽101在所述PFA层13的厚度方向上贯穿所述PFA层13，使得后续在所述沟槽101内制备的所述隔垫物15的底部不与PFA层13接触，与其下层的色阻层12接触，进而避免由于所述隔垫物15站立在所述PFA层上，对所述隔垫物15的弹性恢复力等特性造成影响。
所述PFA层13的膜厚为1~3微米，所述沟槽101的深度大于所述PFA层13的厚度，使得后续制备的所述隔垫物15更稳定地站立在所述沟槽101内。在其他实施例中，可视其实际需要，将所述沟槽101的深度延伸到下层的所述色阻层12的色阻上，即在下方对应的所述色阻层12上部分开槽以增加上述沟槽101的深度。
由于所述第一电极层14设置于所述PFA层13上，因此也需要对所述第一电极层14进行曝光、显影、刻蚀，从而在所述第一电极层14和所述PFA层上形成所述沟槽101。
为了使得所述隔垫物15更易制备在所述沟槽101内，应当使得所述沟槽101的开口面积大于所述隔垫物15的任一部位的横截面积。所述隔垫物15的横截面可为梯形、方形、圆形等，这里对所述隔垫物15的形状不做限制。
所述第一电极层14可为像素电极层，所述第二电极层22可为公共电极层。
所述色阻层包括多个相邻分布的第一色阻121、第二色阻122以及第三色阻123，所述第一色阻121、所述第二色阻122以及所述第三色阻123分别为R色阻、G色阻、B色阻中的一种，本实施中，所述第一色阻121为R色阻，所述第二色阻122为G色阻，所述第三色阻123为B色阻。
所述黑色矩阵层21包括阵列分布的黑色遮光块211，所述黑色遮光块211在所述第一基板10上的正投影位于所述色阻层12的两个相邻的色阻之间，所述黑色遮光块211用以遮挡相邻色阻间的空隙，防止漏光或混色产生，进而提高显示的对比度。
所述第一基板10和第二基板20均为玻璃基板，还可为其他透明基板，这里不做限制。所述薄膜晶体管层11包括多个阵列分布的薄膜晶体管（图中未示出），由于所述薄膜晶体管会遮挡部分光线，因此需将所述薄膜晶体管设置于所述显示面板100上的遮光区域，所述薄膜晶体管在所述第一基板10上的正投影位于所述色阻层12上的相邻色阻之间。
如图5所示，本实施例还提供一种上述显示面板100的制备方法，包括以下步骤：
S10，提供一第一基板10，在所述第一基板10上依次形成薄膜晶体管层11、色阻层12、PFA层13、第一电极层14。
如图2所示，所述薄膜晶体管层11包括栅极、源漏极、有源层、数据线以及扫描线，在所述薄膜晶体管层11上分区域先后形成第一色阻121、第二色阻122、以及第三色阻123，之后在所述色阻层12上覆盖所述PFA层13，最后在所述PFA层13上制备第一电极层14。
S20，对所述PFA层13和所述第一电极层14进行曝光、显影、刻蚀，在所述第一基板10上形成沟槽101。
如图3所示，首先对所述第一电极层14进行光罩制程形成一开口后，再对所述开口下方的所述PFA层13进行光罩制程，最终形成所述沟槽101，所述沟槽101露出所述色阻层12的部分表面，也可在形成所述PFA膜层的时候对所述PFA层13进行光罩制程，之后再形成所述第一电极层14。
S30，在所述沟槽101内形成图案化的隔垫物15。
如图4所示，所述隔垫物15的底部与所述色阻层12的表面相接触，避免了所述隔垫物15叠加在所述PFA层13上。
S40，提供一第二基板20，在所述第二基板20上依次形成黑色矩阵层21和第二电极层22。
首先在所述第二基板20上形成阵列分布的黑色遮光块211，之后在所述第二基板20和所述黑色遮光块211上形成所述第二电极层22。
S50，将所述第一基板10和所述第二基板20对位贴合，将液晶滴注于所述第一基板10和所述第二基板20之间。
将所述第一基板10具有所述隔垫物15的一侧与所述第二基板20具有所述黑色矩阵层21的一侧贴合。
有益效果：通过在PFA层开设沟槽，使得隔垫物设置于该沟槽内，避免隔垫物叠加在PFA上方，从而能够避免PFA层对隔垫物的弹性造成影响，进而改善产品在高空低压环境下出现气泡等问题。
综上所述，虽然本发明已以优选实施例揭露如上，但上述优选实施例并非用以限制本发明，本领域的普通技术人员，在不脱离本发明的精神和范围内，均可作各种更动与润饰，因此本发明的保护范围以权利要求界定的范围为准。

Claims (20)

  1. 一种显示面板，包括：
    第一基板，所述第一基板上依次设置有薄膜晶体管层、色阻层、PFA层、第一电极层以及隔垫物；
    第二基板，与所述第一基板相对设置；
    液晶层，夹设于所述第一基板与所述第二基板之间；其中，
    所述PFA层和所述第一电极层上设置有沟槽，所述隔垫物位于所述沟槽内，所述沟槽的深度大于所述PFA层的膜层厚度，所述沟槽的开口面积大于所述隔垫物的横截面积。
  2. 根据权利要求1所述的显示面板，其中，所述PFA膜层的厚度为1~3微米。
  3. 根据权利要求1所述的显示面板，其中，所述沟槽设置于所述显示面板上的非像素区域。
  4. 根据权利要求1所述的显示面板，其中，所述第二基板朝向所述第一基板的一侧表面设置有黑色矩阵层和第二电极层，所述黑色矩阵层包括多个黑色遮光块。
  5. 根据权利要求4所述的显示面板，其中，所述色阻层包括多个相邻分布的第一色阻、第二色阻、以及第三色阻。
  6. 根据权利要求5所述的显示面板，其中，所述黑色遮光块在所述第一基板上的正投影位于所述色阻层的两个相邻色阻之间。
  7. 一种显示面板，包括：
    第一基板，所述第一基板上依次设置有薄膜晶体管层、色阻层、PFA层、第一电极层以及隔垫物；
    第二基板，与所述第一基板相对设置；
    液晶层，夹设于所述第一基板与所述第二基板之间；其中，
    所述PFA层和所述第一电极层上设置有沟槽，所述隔垫物位于所述沟槽内。
  8. 根据权利要求7所述的显示面板，其中，所述沟槽的深度大于所述PFA层的膜层厚度。
  9. 根据权利要求8所述的显示面板，其中，所述PFA膜层的厚度为1~3微米。
  10. 根据权利要求7所述的显示面板，其中，所述沟槽的开口面积大于所述隔垫物的横截面积。
  11. 根据权利要求7所述的显示面板，其中，所述沟槽设置于所述显示面板上的非像素区域。
  12. 根据权利要求7所述的显示面板，其中，所述第二基板朝向所述第一基板的一侧表面设置有黑色矩阵层和第二电极层，所述黑色矩阵层包括多个黑色遮光块。
  13. 根据权利要求12所述的显示面板，其中，所述色阻层包括多个相邻分布的第一色阻、第二色阻、以及第三色阻。
  14. 根据权利要求13所述的显示面板，其中，所述黑色遮光块在所述第一基板上的正投影位于所述色阻层的两个相邻色阻之间。
  15. 一种显示面板的制备方法，包括以下步骤：
    S10，提供一第一基板，在所述第一基板上依次形成薄膜晶体管层、色阻层、PFA层、第一电极层；
    S20，对所述PFA层和所述第一电极层进行曝光、显影、刻蚀，在所述第一基板上形成沟槽；
    S30，在所述沟槽内形成图案化的隔垫物；
    S40，提供一第二基板，在所述第二基板上依次形成黑色矩阵层和第二电极层；
    S50，将所述第一基板和所述第二基板对位贴合，将液晶滴注于所述第一基板和所述第二基板之间。
  16. 根据权利要求15所述的制备方法，其中，所述沟槽的深度大于所述PFA的膜层厚度。
  17. 根据权利要求15所述的制备方法，其中，所述沟槽的开口面积大于所述隔垫物的横截面积。
  18. 根据权利要求15所述的制备方法，其中，所述沟槽露出所述色阻层的部分表面，所述隔垫物的底部与所述色阻层的表面相接触。
  19. 根据权利要求15所述的制备方法，其中，所述色阻层包括多个相邻分布的第一色阻、第二色阻、以及第三色阻。
  20. 根据权利要求19所述的制备方法，其中，所述黑色矩阵包括阵列分布的黑色遮光块，所述黑色遮光块在所述第一基板上的正投影位于所述色阻层的两个相邻色阻之间。
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