WO2020260449A1 - Élément plat utilisable dans un réacteur cvd - Google Patents

Élément plat utilisable dans un réacteur cvd Download PDF

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Publication number
WO2020260449A1
WO2020260449A1 PCT/EP2020/067805 EP2020067805W WO2020260449A1 WO 2020260449 A1 WO2020260449 A1 WO 2020260449A1 EP 2020067805 W EP2020067805 W EP 2020067805W WO 2020260449 A1 WO2020260449 A1 WO 2020260449A1
Authority
WO
WIPO (PCT)
Prior art keywords
fastening
component
shoulder
cvd reactor
broad side
Prior art date
Application number
PCT/EP2020/067805
Other languages
German (de)
English (en)
Inventor
Michael Griebel
Mike PFISTERER
Marcel Kollberg
Original Assignee
Aixtron Se
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Aixtron Se filed Critical Aixtron Se
Publication of WO2020260449A1 publication Critical patent/WO2020260449A1/fr

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45502—Flow conditions in reaction chamber
    • C23C16/45508—Radial flow

Definitions

  • the invention relates to a in a CVD reactor as a cover plate ver usable flat component with a first broad side facing away from the first process chamber and a second broad side pointing away therefrom, the component having an inner region and an outer region spaced therefrom.
  • the second broad side has one or more fastening shoulders which are formed by fastening elements. These can be gripped from below by holding shoulders of holding members in order to fix the cover plate above a susceptor in the process chamber.
  • the invention also relates to one with such
  • the invention also relates to a method for assembling or disassembling a ceiling plate in such a CVD reactor.
  • the invention also relates to a method for manufacturing a flat component that can be used as a cover plate in a CVD reactor and the use of the flat component as a cover plate in a CVD reactor.
  • US Pat. No. 10,418,264 B2 describes a CVD reactor with a cover plate which has two broad side surfaces pointing away from one another. There are openings in the broad side surfaces. In these openings are fastenings elements used as inserts. The fastening elements have undercut areas that can be reached from under by holding members.
  • WO 2014/064179 describes a cover plate of a CVD reactor, which is arranged below a gas outlet surface of a gas inlet element which has the shape of a shower head.
  • the ceiling plate has a central area and an adjoining outdoor area.
  • the central area covers a susceptor on which the thermally treated substrates rest.
  • the outer area projects beyond the radially outer edge of the susceptor in the radially outward direction in relation to the center of the cover plate.
  • fastening elements that have fastening shoulders that are gripped from below by holding shoulders of holding elements.
  • end portions of holding members each of which form a holding shoulder, engage through the window of the outermost edge of the ceiling panel, in order to hold under the ceiling panel.
  • EP 2 741 316 B1 and EP 2 741 371 A1 each describe one
  • CVD reactor with a process chamber ceiling, the floor of which is formed by a susceptor and the ceiling of which is formed by a flat component.
  • the flat component is supported on support shoulders which are arranged in the radially outer area of the interior of the CVD reactor housing.
  • WO 99/43874 A1 describes a CVD reactor in which a circular disk-shaped, flat cover plate of a process chamber, which has a central opening, is carried by a central gas inlet element.
  • the invention is based on the object of further developing the cover plate, the CVD reactor, a production method for producing a cover plate and the method for mounting a cover plate in a CVD reactor in an advantageous manner.
  • the invention relates to a development of a flat component which can or is used as a cover plate in a CVD reactor.
  • the ceiling panel has two broad sides pointing away from each other. These are preferably flat surfaces that run parallel to one another, with one of the broad sides facing the process chamber and a second broad side facing away from the process chamber.
  • the second broad side, pointing away from the process chamber has fastening elements with which the cover plate can be fastened to a reactor housing. According to the invention it is proposed that at least one fastening element is provided. Several fastening elements are preferred intended.
  • fastening elements can be provided, which are arranged on a circular arc line around a center, the center lying in an annular opening of the flat component.
  • the fastening element has a fastening shoulder.
  • the fastening element is accessible only from the second broad side surface of the flat component.
  • the fastening element can be a projection pointing away from the second broad side.
  • the fastening element can, however, also be a recess.
  • the recess has a maximum depth that is less than the material thickness of the flat component, that is, the distance between the two broad sides pointing away from one another, which are preferably formed by planes that run parallel to one another.
  • a continuous, uninterrupted first broad side facing the process chamber is formed.
  • the opposite first broad side surface runs continuously and without interruptions.
  • a bottom of a recess which forms a fastening element is thus spaced apart from the first broad side surface by a volume section of the flat component.
  • the recess thus has a closed bottom surface.
  • the upper surface of the flat component facing the process chamber is preferably structured smoothly or uniformly over its entire surface extension.
  • the surface can have an annular shape with a central opening. Otherwise it preferably has no openings in the broad side facing the process chamber.
  • the fastening elements are arranged vertically above the substrates in a state in which the cover plate is installed in a CVD reactor a process chamber bottom surface are arranged, which is formed in particular by a susceptor.
  • the flat component has an inner area and an outer area, the inner area being closer to a center than the outer area. It can be be seen that the center of the cover plate is formed by a central opening, through which a gas inlet element protrudes when installed in a CVD reactor. It is particularly provided that the fastening elements are closer to the edge of this opening than to the outer edge of the outer area.
  • the fastening elements are directly adjacent to the edge of the opening.
  • the edge of the opening can run on a circular arc line.
  • the center of the circular arc line can be a center of symmetry of the flat component, the outer edge of which can also run on a circular arc line.
  • the fastening shoulder be formed from an undercut section of a bore, an identification or a recess. It can be a blind hole.
  • the fastening shoulder can also be formed from an undercut section of a projection, in particular a rib.
  • the fastening shoulder is preferably formed by an undercut section of a wall extending transversely to the second broad side surface, it being possible for this wall to be formed by a depression and an elevation. Depressions in the Ver may be, to individual bores standet beab- from each other or placing in a uniform circumference V being arranged around a center of the ceiling plate.
  • the bores, in particular blind bores, can have a keyhole-like outline.
  • the blind bores can be produced using a machining process.
  • the broad side which is used to attach the cover plate to a housing of the CVD reactor, has one or more projections. Each of the projections can form a fastening shoulder. However, it is also provided that a fastening projection forms several fastening shoulders.
  • the fastening shoulder is formed by an undercut of a rib extending concentrically around a center of the flat component.
  • a rib-like projection is thus provided which can also extend around a central opening of the flat component, the projection being able to directly adjoin the central opening, in particular being able to form its edge.
  • An annular fastening shoulder can, however, not only be formed by a rib, but also by a recess.
  • the CVD reactor in which a cover plate described in this way is used, has a gas-tight housing which can be evacuated. Inside the housing there is a susceptor for receiving the thermally to be treated and in particular to be coated substrates.
  • the substrates can rest on substrate holders, each of which lies in a pocket of the susceptor and is stored there on a gas cushion.
  • the gas stream generating the gas cushion preferably flows into the pocket in such a direction that the substrate holders are driven to rotate during the thermal treatment of the substrates.
  • the susceptor can rest on a shaft that can be rotated about a shaft axis so that the susceptor can rotate in a plane of rotation.
  • a heating device can be provided below the susceptor, with which the susceptor can be heated to a process temperature.
  • the heating device can be an RF heater or an IR heater.
  • a gas inlet element is provided with which process gases can be fed into the process chamber of the CVD reactor.
  • the process gases are are preferably organometallic compounds of III. Main group and hydrides of main group V.
  • the CVD reactor can thus preferably be an MOCVD reactor.
  • the gas inlet element protrudes into the process chamber through a central opening in the cover plate, so that the process gas can flow into the process chamber from gas outlet zones of the gas inlet element, through which it flows in the vertical direction.
  • the flat member described above is in such
  • the CVD reactor used as a ceiling plate.
  • Retaining members are provided to fasten the cover plate above the susceptor and to align the cover plate in the vertical direction and / or in the direction of inclination so that the broad side facing the process chamber runs parallel to the process chamber floor surface or perpendicular to the axis of rotation of the susceptor.
  • the holding members preferably protrude from a ceiling of the housing of the CVD reactor.
  • Actuators can also be provided there, with each of which a holding element can be displaced in the vertical direction and / or rotated about a vertical axis.
  • the CVD reactor has one or more holding members which have holding shoulders that can undergrow the fastening shoulders.
  • the retaining shoulders can be formed from wings projecting transversely to a shaft of the retaining member or from a plate.
  • the plate can have a circular disk shape.
  • the shaft of the holding member is connected to the plate in the center of the circular disk.
  • the extension surface of the plate or wing preferably runs transversely to the extension direction of the shaft of the holding member.
  • the holding members are preferably designed in such a way that they can be brought from a release position into an under-grip position by rotating around their respective shaft. In the under grip position, the holding shoulder engages the fastening shoulder.
  • the cover plate is brought from a release position into an underhand position by rotating about its axis.
  • the fastening structure the shape of keyhole-like depressions described above.
  • the retaining shoulders i.e. the plates
  • the cover plate is rotated about its figure axis so far that the retaining shoulders enter the narrow sections of the keyhole-like blind bores, with edge sections of the plate engaging under the fastening shoulders.
  • the holding shoulders can also be formed by wings which protrude from the free end of the shaft of the holding member in only one direction.
  • the holding shoulders are not brought from a release position into an under-grip position by rotating the flat component, but rather by rotating the shaft of the holding member.
  • the ceiling panel is rotated slightly back about its axis or the retaining shoulders of the retaining members are individually brought out of the underhand position by rotating the shaft of the retaining member.
  • Fig. 1 is a schematic section through a CVD reactor with a holding arrangement according to the invention for holding a De ckenplatte,
  • FIG. 2 enlarges the detail 2 in FIG. 1,
  • FIG. 3 the view according to arrow III in Figure 2 on the second broad side surface of the ceiling plate 2, 4 is a perspective view of a keyhole-like fastening element according to FIGS. 2 and 3,
  • Fig. 5 is a plan view of the ceiling plate 2 and the more uniform
  • V periphery grant to a central aperture arranged Be fastening members
  • FIG. 6 shows an illustration according to FIG. 2 of a second embodiment
  • Fig. 7 is a representation according to Figure 4 of the second, Fig. 8 is a representation similar to Figure 1 of a thirdstrasbei game, with only the flat component 2, part of the reactor housing 1 and retaining members 25 are shown,
  • FIG. 9 is a plan view of the cover plate of the exemplary embodiment shown in FIG. 8
  • FIG. 10 is a perspective view of a fastening element formed by a rib-like projection according to the exemplary embodiment in FIG. 8,
  • FIG. 11 shows a representation according to FIG. 10, however, in the lower grip position. Description of the embodiments
  • the device divided Darges in the figures is an MOCVD reactor with a reactor housing 1, which is formed by a metal housing, for example stainless steel housing or aluminum housing.
  • the housing can be evacuated.
  • a gas inlet element 22 protrudes from the ceiling of the housing 1 into the interior of the housing 1, in which there is a process chamber 3 which is delimited at the top by a cover plate 2 and at the bottom by a susceptor 20.
  • Process gases can be fed into the process chamber 3 through the gas inlet element 22 in order to deposit a semiconductor layer there on the substrates 10 resting on the process chamber base 11.
  • the process gases which are preferably organometallic compounds of III.
  • Main group and hydrides of main group V which are transported by a carrier gas, through gas outlet zones 23 into the process chamber 3.
  • a heating device 19 with which the susceptor 20 can be heated to a process temperature.
  • a ceiling plate 2 made of graphite extends within the reactor housing 1 at a vertical distance from the process chamber bottom surface 11. It is in particular a cover plate made of coated graphite, which is formed by a flat component 2.
  • the cover plate 2 can have a core made of graphite, the surface of which is coated with, for example, a ceramic material.
  • the flat component 2 has a central opening 12 through which the gas inlet member 22 extends. The edge of the opening 12 is followed by an inner region 6 of the ceiling panel 2, which is adjacent to the edge of the opening 12.
  • the essentially circular disk-shaped cover plate 2 has a radially outer peripheral edge which represents the boundary of an outer region 7.
  • the cover plate 2 has an underside which forms a first broad side 4 which runs in one plane and which should run as parallel as possible to the process chamber bottom surface 11.
  • the first broad side 4 runs, preferably perpendicular to this axis of rotation.
  • the first broad side 4 is a second broad side 5, which does not necessarily have to run parallel to the first broad side 4, but which also does not have to extend in one plane. In the exemplary embodiment, however, the second broad side 5 runs parallel to the first broad side 4.
  • the second broad side 5 has structures, in particular spatial structures, which form fastening elements 8 which, in cooperation with holding members 25, hold the cover plate 2 in a predetermined position.
  • the spatial structures are designed in such a way that they are limited to the second broad side 5 and do not impair the continuous and even surface extension of the first broad side 4.
  • fastening element 8 It can be provided one or more, in particular in a uniform circumferential distribution around a figure axis of the ceiling plate 2 arranged fastening elements 8.
  • a single fastening element 8 can also be provided, which extends over a larger surface area and in particular special extends on a circular arc line on the second broad side 5.
  • the fastening element 8 has a preferably minimal radial distance from the center of the ceiling plate 2.
  • the first broad side has a smooth or uniformly structured, uninterrupted surface.
  • the fastening elements 8 are formed by depressions and in particular by blind bores. These are individual wells, each wells usammen breathe with a holding member 25 Z.
  • the blind bores 14 each have a base 16 which has a closed surface, that is to say has no opening to the opposite first broad side 4.
  • the recess has a keyhole-like floor plan.
  • a retaining shoulder 26 of a retaining member 25 can engage in the recess produced in this way.
  • the retaining shoulder 26 is formed by a circular plate 29, from the center of which a shaft 27 protrudes transversely to the plane of extension of the plate.
  • the plates 29 can also have a polygonal outline.
  • cover plate 2 To assemble the cover plate 2, it is first shifted vertically upwards until the retaining shoulders 26 formed by the plate 29 engage in the blind hole 14. By subsequently rotating the top plate 2 around its axis, which runs through the central opening 12, the top plate 2 is brought into a form-fitting connection with the plate 29 by a rotating fastening movement, the retaining shoulder 26 formed by the broad side surfaces of the plate 29 engaging under the fastening shoulders 9 of the fastening elements 8.
  • the cover plate 2 can preferably be connected to the holding members 25 in the manner of a bayonet.
  • the retaining shoulder 26 is formed by a transverse to the direction of extent of a shaft 27 protruding wing 28.
  • a broad side surface of the wing 28 forms the holding shoulder 26, which rests against the fastening shoulder 9 in the grip position.
  • the cover plate 2 can be attached to the reactor housing 1 by a bayonet-like movement.
  • the fastening can also take place by individually rotating the shaft 27 about its axis. This is done by means of actuators 30, which can move the holding members 25 not only in the vertical direction, but also in a direction of rotation.
  • the inclination position of the ceiling plate 2 can be changed, so that the first broad side 4 can be brought into a parallel position to the process chamber floor surface 11.
  • the embodiment shown in Figures 8 to 11 differs from the embodiments described above in that the fastening element 8 is not formed by a recess, but by a projection.
  • the projection 18 is formed by a rib-like web that extends along the edge of the central opening 12 extends. On its side facing away from the central opening 12, the projection 18 has an incision which forms a fastening shoulder 9.
  • the fastening shoulder 9 can be gripped from below by a holding shoulder 26 of a holding member 25.
  • the holding member 25 also has an elongated, extending in a vertical direction shaft 27, at the free end of a wing 28 is arranged, which protrudes transversely to the direction of extension of the shaft 27 of Letz direct.
  • An upwardly facing surface of the wing 28 forms the holding shoulder 26, which can be brought into an under-grip position for the fastening shoulder 9 by rotating the holding member 25 about the shaft axis.
  • the cover plate 2 is formed by a graphite body coated with silicon carbide (SiC).
  • the cover plate 2 can also consist of another material, for example quartz glass, graphite, a ceramic material or the like. In the gameniessbei the top plate 2 is formed in one piece.
  • the cover plate can also be made in several parts, as US 2004/0003779 A1 describes.
  • the parts of a ceiling plate formed by nested annular bodies can consist of different parts. For example, a part of quartz and another part of silicon carbide coated graphite.
  • a lifting movement with which the ceiling plate can be lowered or raised by a vertical displacement of the holding members 25 can be manually, pneumatically, electrically or hydraulically driven.
  • lifting elements 30 are provided in particular, which are fixedly arranged on the reactor housing 1.
  • the material thickness of the ceiling plate is preferably in the range between 4 mm and 20 mm.
  • fastening elements 8 or retaining members 25 arranged near the center in the exemplary embodiments, further fastening elements 8 or retaining members 25 can be provided, which are arranged near the radially outer edge, in particular also in the outer region 7 of the ceiling plate 2.
  • fastening elements 8 can be arranged on a circular arc line R around a center of symmetry of the flat component 2. The arrangement may be to grant a uniform angle V.
  • the Hu belemente 30 can be operated electrically by a control device, not shown.
  • the rotational movement of the holding members 25 can also take place electromechanically controlled by a control device.
  • the section of the gas inlet element 22 protruding through the central opening 12 can protrude into a depression in the susceptor 20.
  • a gas outlet zone 23 preferably extends over a cylinder jacket surface.
  • the ceiling plate 2 is a flat component.
  • the flat component can also consist of several individual pieces which, when put together, form a flat component.
  • the flat component 2 can be composed of several ring-shaped individual bodies, one ring-shaped individual body, for example the radially outer or the radially inner one, having the fastening elements 8.
  • This ring body can form a supporting flank on which a further ring body can be supported, which either surrounds the ring body having the fastening elements 8 or is surrounded by the fastening elements 8 having the ring body.
  • the fastening elements 8 can have the same function and the same shape as are described in FIGS. 1-11.
  • the fastening element 8 can only be incorporated into an otherwise circular disk-shaped, smooth broadside surfaces having a blank using a cutting process.
  • the fastening elements form a blind hole, the bottom of the blind hole being made of the same material as the component.
  • the broad side surface opposite the drill hole has a uniform, uninterrupted surface.
  • the blind hole, which has a circular outline is followed by a narrow section.
  • the narrow section 15 can have a width W which is smaller than the diameter D of the opening of the blind hole.
  • the narrow section preferably forms two opposing edges 34.
  • the edges 34 of the narrow section 15 each define a fastening shoulder 9.
  • a wider volume extends between two parallel walls 32, the walls 32 being spaced apart A from each other, which corresponds to the diameter D of the circular blind hole.
  • the walls 32 merge into one another to form a rounded wall 33.
  • the opposite end of the blind hole of the Schmalab section 15 has a rounded edge that connects the edges 34 together without kinks.
  • the rounded edge of the narrow section 15 runs coaxially to the wall 33.
  • the component is fastened to the holding members 35 by a relative rotation of the component with respect to the holding members 25.
  • Flat component 2 that can be used in a CVD reactor as a cover plate of a process chamber 3 has a first broad side surface 4 facing the process chamber 3 and a second broad side surface 5 facing away from it, the second broad side surface 5 having one or more fastening shoulder that can be gripped under 9 having fastening elements 8 formed by a recess, the first broadside surface 4 having a closed surface at the points where the second broadside surface has a fastening element 8 on the opposite side, characterized in that the fastening element 8 has a blind hole with a material uniformly formed by the component 2, closed bottom.
  • a component which is characterized in that an inner region 6 of the component 2 adjoins a central opening 12 and the fastening elements 8 are closer to the edge of the opening 12 than the outer edge of an outer region 7.
  • a component which is characterized in that the fastening shoulder 9 by a machining process and / or by means of a side milling cutter is made on the at least one core made of graphite component.
  • a component which is characterized in that a plurality of fastening elements 8 are arranged on a circular arc line R around a center of the component 2 and / or that the first broadside surface 4 pointing away from the at least one fastening element 8 is a closed, over its entire area Has surface extension smooth or uniformly structured surface.
  • a component which is characterized in that two opposite edges 32 of the narrow section 15, each of which is overlapped by a fastening shoulder 9, have a distance A corresponding to the diameter D.
  • a CVD reactor which is characterized in that the fastening shoulder 9 is formed by an undercut of a rib-like projection 18 extending concentrically around the central opening 12 of the component 2.
  • a component which is characterized in that the fastening shoulder 9 is arranged on a radially outwardly facing wall of the rib-like protrusion 18.
  • a CVD reactor which is characterized in that the flat
  • Component 2 is designed according to one of the preceding claims and is held with one or more holding members 25, which holding shoulders 26 have which engage under the fastening shoulders 9.
  • a CVD reactor which is characterized in that the holding members 25 are adjustable in height and / or have an elongated shaft 27 made of a thermally insulating material.
  • a CVD reactor which is characterized in that the holding shoulder (26) is formed by a wing (28) or plate (29) arranged at the free end of the holding member (25) and / or the holding shoulder (26) by rotating the holding member (25) and / or by rotating the flat component from the under-grip position to the fastening shoulder (9) or in the under-grip position.
  • a CVD reactor which is characterized in that the flat member 2 is attached to holding members 25 in a position above a susceptor 20 of the CVD reactor, the holding member 25 or the flat member 2 being rotated.
  • a component, a CVD reactor, a method, a use which are characterized by one of the features of the preceding claims.

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  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

La présente invention concerne une plaque supérieure d'un réacteur CVD ou un réacteur CVD muni d'une telle plaque supérieure (2). La plaque supérieure (2) est un élément plat (2) comprenant une première face large (4) pouvant être tournée vers la chambre de traitement (3) et une seconde face large (5) opposée à celle-ci, l'élément présentant une zone intérieure (6) et une zone extérieure (7) éloignée de celle-ci, la seconde face large (5) comportant un ou plusieurs éléments de fixation (8) présentant respectivement un épaulement de fixation (9) pouvant être saisi par le dessous. Il est essentiel que la première face large (4) possède une surface fermée aux endroits où la seconde face large présente un élément de fixation (8) sur le côté opposé. Il est également essentiel qu'un ou plusieurs éléments de fixation (8) soient éloignés de la zone extérieure (7) en direction d'un centre de manière à ce que les éléments de fixation (8), à l'état installé dans un réacteur CVD, soient disposés verticalement au-dessus d'une surface inférieure (11) de la chambre de traitement formée par un suscepteur (20).
PCT/EP2020/067805 2019-06-28 2020-06-25 Élément plat utilisable dans un réacteur cvd WO2020260449A1 (fr)

Applications Claiming Priority (2)

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DEDE102019117479.1 2019-06-28
DE102019117479.1A DE102019117479A1 (de) 2019-06-28 2019-06-28 In einem CVD-Reaktor verwendbares flaches Bauteil

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DE102020103947A1 (de) 2020-02-14 2021-08-19 AIXTRON Ltd. CVD-Reaktor und Verfahren zum Handhaben einer Prozesskammer-Deckenplatte

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5855679A (en) 1995-03-30 1999-01-05 Nec Corporation Semiconductor manufacturing apparatus
WO1999043874A1 (fr) 1998-02-24 1999-09-02 Northrop Grumman Corporation Systeme de plafond pour reacteur de croissance epitaxiale
US6036782A (en) 1997-10-07 2000-03-14 Tokyo Electron Limited Shower head
US20040003779A1 (en) 2000-09-01 2004-01-08 Holger Jurgensen Device for depositing in particular crystalline layers on one or more, in particular likewise crystalline substrates
US20040005731A1 (en) 2000-09-01 2004-01-08 Holger Jurgensen Device and method for the depostion of, in particular, crystalline layers on, in particular, crystalline substrates
US20090095424A1 (en) * 2007-10-12 2009-04-16 Lam Research Corporation Showerhead electrode assemblies and plasma processing chambers incorporating the same
WO2014064179A2 (fr) 2012-10-24 2014-05-01 Aixtron Se Dispositif de traitement de substrats comprenant une plaque de couverture interchangeable ainsi que procédé pour remplacer une telle plaque de couverture
EP2741371A1 (fr) 2012-12-05 2014-06-11 E.G.O. ELEKTRO-GERÄTEBAU GmbH Connecteur à fiches et dispositif doté d'un tel connecteur à fiches
US20170358473A1 (en) * 2016-06-08 2017-12-14 Hermes-Epitek Corporation Assembling device used for semiconductor equipment
EP2741316B1 (fr) 2011-08-05 2018-04-11 Showa Denko K.K. Dispositif de fabrication de tranche épitaxiale et procédé de fabrication

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6379550B2 (ja) * 2014-03-18 2018-08-29 東京エレクトロン株式会社 成膜装置

Patent Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5855679A (en) 1995-03-30 1999-01-05 Nec Corporation Semiconductor manufacturing apparatus
US6036782A (en) 1997-10-07 2000-03-14 Tokyo Electron Limited Shower head
WO1999043874A1 (fr) 1998-02-24 1999-09-02 Northrop Grumman Corporation Systeme de plafond pour reacteur de croissance epitaxiale
US20040003779A1 (en) 2000-09-01 2004-01-08 Holger Jurgensen Device for depositing in particular crystalline layers on one or more, in particular likewise crystalline substrates
US20040005731A1 (en) 2000-09-01 2004-01-08 Holger Jurgensen Device and method for the depostion of, in particular, crystalline layers on, in particular, crystalline substrates
US20090095424A1 (en) * 2007-10-12 2009-04-16 Lam Research Corporation Showerhead electrode assemblies and plasma processing chambers incorporating the same
EP2741316B1 (fr) 2011-08-05 2018-04-11 Showa Denko K.K. Dispositif de fabrication de tranche épitaxiale et procédé de fabrication
WO2014064179A2 (fr) 2012-10-24 2014-05-01 Aixtron Se Dispositif de traitement de substrats comprenant une plaque de couverture interchangeable ainsi que procédé pour remplacer une telle plaque de couverture
EP2741371A1 (fr) 2012-12-05 2014-06-11 E.G.O. ELEKTRO-GERÄTEBAU GmbH Connecteur à fiches et dispositif doté d'un tel connecteur à fiches
US20170358473A1 (en) * 2016-06-08 2017-12-14 Hermes-Epitek Corporation Assembling device used for semiconductor equipment
US10418264B2 (en) 2016-06-08 2019-09-17 Hermes-Epitek Corporation Assembling device used for semiconductor equipment

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