WO2020258641A1 - 人造视网膜神经柔性微电极装置及其制作方法 - Google Patents

人造视网膜神经柔性微电极装置及其制作方法 Download PDF

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Publication number
WO2020258641A1
WO2020258641A1 PCT/CN2019/115845 CN2019115845W WO2020258641A1 WO 2020258641 A1 WO2020258641 A1 WO 2020258641A1 CN 2019115845 W CN2019115845 W CN 2019115845W WO 2020258641 A1 WO2020258641 A1 WO 2020258641A1
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transparent
flexible
layer
substrate
active layer
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English (en)
French (fr)
Inventor
罗成志
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Wuhan China Star Optoelectronics Technology Co Ltd
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Wuhan China Star Optoelectronics Technology Co Ltd
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Priority to US16/625,785 priority Critical patent/US20210290947A1/en
Publication of WO2020258641A1 publication Critical patent/WO2020258641A1/zh
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    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61N—ELECTROTHERAPY; MAGNETOTHERAPY; RADIATION THERAPY; ULTRASOUND THERAPY
    • A61N1/00—Electrotherapy; Circuits therefor
    • A61N1/02—Details
    • A61N1/04—Electrodes
    • A61N1/05—Electrodes for implantation or insertion into the body, e.g. heart electrode
    • A61N1/0526—Head electrodes
    • A61N1/0543—Retinal electrodes
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61F—FILTERS IMPLANTABLE INTO BLOOD VESSELS; PROSTHESES; DEVICES PROVIDING PATENCY TO, OR PREVENTING COLLAPSING OF, TUBULAR STRUCTURES OF THE BODY, e.g. STENTS; ORTHOPAEDIC, NURSING OR CONTRACEPTIVE DEVICES; FOMENTATION; TREATMENT OR PROTECTION OF EYES OR EARS; BANDAGES, DRESSINGS OR ABSORBENT PADS; FIRST-AID KITS
    • A61F9/00—Methods or devices for treatment of the eyes; Devices for putting in contact-lenses; Devices to correct squinting; Apparatus to guide the blind; Protective devices for the eyes, carried on the body or in the hand
    • A61F9/0008—Introducing ophthalmic products into the ocular cavity or retaining products therein
    • A61F9/0017—Introducing ophthalmic products into the ocular cavity or retaining products therein implantable in, or in contact with, the eye, e.g. ocular inserts
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B3/00—Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B3/00—Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
    • B81B3/0097—Devices comprising flexible or deformable elements not provided for in groups B81B3/0002 - B81B3/0094
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00349—Creating layers of material on a substrate
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00349—Creating layers of material on a substrate
    • B81C1/00373—Selective deposition, e.g. printing or microcontact printing
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61N—ELECTROTHERAPY; MAGNETOTHERAPY; RADIATION THERAPY; ULTRASOUND THERAPY
    • A61N1/00—Electrotherapy; Circuits therefor
    • A61N1/18—Applying electric currents by contact electrodes
    • A61N1/32—Applying electric currents by contact electrodes alternating or intermittent currents
    • A61N1/36—Applying electric currents by contact electrodes alternating or intermittent currents for stimulation
    • A61N1/36046—Applying electric currents by contact electrodes alternating or intermittent currents for stimulation of the eye

Definitions

  • This application relates to the technical field of non-screen display, and in particular to an artificial retinal nerve flexible microelectrode device and a manufacturing method thereof.
  • Screenless display technology that is, a method that directly stimulates the viewer's visual nerve without a display screen, so that a specific pattern is formed in the viewer's brain.
  • the existing artificial retinal nerve flexible array microelectrode chip can only be applied to the blind or near-blind patient population , The scope of application is narrow. When applied to the eyes of a user with certain visual ability, when the device is not used for display, the device body will block and interfere with the user’s own vision; and currently, it is also lacking in the market A device that can realize a screenless display function and is widely applicable to people with different vision abilities.
  • the embodiments of the present application provide an artificial retinal nerve flexible microelectrode device and a manufacturing method thereof. By making each part of the device made of transparent materials, the entire device is completely transparent to solve the existing artificial retinal nerve flexibility.
  • the microelectrode device cannot adapt to the problems of users with different visual abilities.
  • an artificial retinal nerve flexible microelectrode device including:
  • the transparent TFT array layer is arranged on the flexible transparent substrate and is used for docking with the optic nerve in the human eye to transmit visual electrical signals to the optic nerve;
  • the bridging section is arranged on the TFT array layer and passes through the through hole to connect with the optic nerve.
  • the transparent TFT array layer includes a transparent grid provided on the flexible transparent substrate, the flexible transparent substrate and the transparent grid A transparent insulating layer on and covering the transparent gate, a transparent active layer arranged on the transparent insulating layer, a transparent source electrode and a transparent drain electrode arranged on the transparent insulating layer and the transparent active layer ;
  • the transparent source and the transparent drain are respectively connected to both ends of the active layer
  • the transparent packaging layer is provided on the transparent insulating layer, the transparent active layer, the transparent source and the transparent drain and covers the transparent active layer and the transparent source;
  • One end of the bridging section is connected to the transparent drain, and the other end of the bridging section passes through the through hole to be connected to the optic nerve.
  • the materials of the flexible transparent substrate and the transparent packaging layer are both polyimide.
  • the materials of the transparent grid, the transparent source, the transparent drain and the bridge section are all indium tin oxide.
  • the material of the transparent insulating layer is silicon oxide.
  • the material of the transparent active layer is indium gallium zinc oxide.
  • the thickness of the flexible transparent substrate is 1um-5um
  • the thickness of the transparent insulating layer is 10nm-500nm
  • the thickness of the transparent active layer is 10nm ⁇ 500nm.
  • an artificial retinal nerve flexible microelectrode device including:
  • a bridging section passing through the through hole and butting with the optic nerve is formed on the transparent TFT array layer.
  • the forming a flexible transparent substrate includes:
  • the flexible transparent substrate is formed on the rigid substrate.
  • the forming a transparent TFT array layer for transmitting visual electrical signals to the optic nerve on the flexible transparent substrate includes:
  • the transparent source and the transparent drain are respectively connected to both ends of the active layer;
  • the transparent packaging layer is provided on the transparent insulating layer, the transparent active layer, the transparent source and the transparent drain On and covering the transparent active layer and the transparent source; one end of the bridge section is connected with the transparent drain, and the other end of the bridge section passes through the through hole to be connected to the optic nerve.
  • the beneficial effect of this application is that all parts of the device are made of transparent materials, so that the device as a whole is completely transparent, so as to ensure that when the device is not in use, it does not affect the normal vision of the user’s eyes and is Users with visual ability have strong applicability, and the use of the device of this application achieves the technical effect of no screen display, which not only saves the manufacturing process of the display screen, but also makes the display more convenient and faster, and saves the manufacturing process Steps, suitable for mass production.
  • FIG. 1 is a schematic structural diagram of an artificial retinal nerve flexible microelectrode device provided by an embodiment of the application;
  • FIG. 2 is a schematic structural diagram of a transparent TFT array layer in an artificial retinal nerve flexible microelectrode device provided by an embodiment of the application;
  • FIG. 3 is a schematic block diagram of a manufacturing method of an artificial retinal nerve flexible microelectrode device according to an embodiment of the application;
  • FIG. 4 is a schematic block diagram of a manufacturing method of another artificial retinal nerve flexible microelectrode device provided by an embodiment of the application.
  • connection should be interpreted broadly unless otherwise clearly specified and limited.
  • it can be a fixed connection or a detachable connection. Connected or integrally connected; it can be a mechanical connection or an electrical connection; it can be directly connected or indirectly connected through an intermediate medium, and it can be the internal communication between two components.
  • connection should be interpreted broadly unless otherwise clearly specified and limited.
  • it can be a fixed connection or a detachable connection. Connected or integrally connected; it can be a mechanical connection or an electrical connection; it can be directly connected or indirectly connected through an intermediate medium, and it can be the internal communication between two components.
  • an embodiment of the present application provides an artificial retinal nerve flexible microelectrode device, including:
  • the transparent TFT array layer 2 is arranged on the flexible transparent substrate 1 and is used for docking with the optic nerve in the human eye to transmit visual electrical signals to the optic nerve.
  • the flexible microelectrode device also includes a transparent encapsulation layer 3 provided on the transparent TFT array layer 2.
  • the transparent encapsulation layer 3 is used to encapsulate the transparent TFT array layer 2, and also serves as an insulating layer. The layer prevents short circuit or crosstalk of the transparent TFT array layer 2 and the optic nerve butt.
  • the transparent encapsulation layer 3 is provided with a through hole 31, and the transparent TFT array layer 2 extends through a bridge section 251 that passes through the through hole 31 and butts with the optic nerve; obviously, the number of the bridge section 251 is equal to
  • the number of TFT thin film transistors arranged in an array in the transparent TFT array layer 2 is the same, and the transparent encapsulation layer 3 is formed with a through hole 31 corresponding to each of the TFT thin film transistors.
  • a bridge section 251 connected to the TFT thin film transistor is provided in 31.
  • the transparent TFT array layer 2 includes a transparent gate 21 provided on the flexible transparent substrate 1, and The flexible transparent substrate 1 and the transparent insulating layer 22 on the transparent gate 21 and covering the transparent gate 21, the transparent active layer 23 disposed on the transparent insulating layer 22, and the transparent insulating layer 22 And the transparent source 24 and the transparent drain 25 on the transparent active layer 23; the transparent source 24 and the transparent drain 25 are connected to both ends of the active layer 23, respectively.
  • the transparent encapsulation layer 3 is provided on the transparent insulating layer 22, the transparent active layer 23, the transparent source 24 and the transparent drain 25 and covers the transparent active layer 23 and the transparent source 24
  • the transparent encapsulation layer 3 is combined with the transparent insulating layer 22 to achieve the encapsulation of the transparent TFT array layer 2.
  • the TFT thin film transistor transmits visual electrical signals to the optic nerve through its transparent drain 25 to complete the alignment. It describes the stimulation of the optic nerve, which is conducted by the optic nerve to the brain to form a visual image; in a way of no screen display, the brain acquires the image.
  • the components of the flexible microelectrode device of the present application are made of transparent materials, so as to realize that the entire flexible microelectrode device is fully transparent, so that the flexible microelectrode device of the present application is embedded in the eyeball when it is not in use. , Will not interfere with the user's sight, and will not affect the user's normal visual ability.
  • the materials of the flexible transparent substrate 1 and the transparent encapsulation layer 3 are both polyimide (PI); the transparent gate 21, the transparent source 24, and the transparent drain
  • the materials of the electrode 25 and the bridge section 251 are both indium tin oxide (ITO, Indium Tin Oxide).
  • the transparent insulating layer 22 is made of silicon oxide (SiOx);
  • the transparent active layer 23 is made of indium gallium zinc oxide (IGZO, indium gallium zinc oxide), wherein the polyimide (PI, Polyimide), indium tin oxide (ITO, Indium Tin Oxides), silicon oxide (SiOx) and indium gallium zinc oxide (IGZO, indium gallium Zinc oxide) has good transparency, especially the transparency of silicon oxide (SiOx) is close to that of glass; and, polyimide (PI, Polyimide) and indium tin oxide (ITO, Indium Tin Oxides) are widely used as transparent films and transparent electrodes in the field of optoelectronics.
  • PI polyimide
  • ITO Indium Tin Oxides
  • the thickness of the flexible transparent substrate 1 is 1um-5um
  • the thickness of the transparent insulating layer 22 is 10nm-500nm
  • the thickness of the transparent active layer 23 is 10nm-500nm; obviously, each function
  • the thinner thickness of the layer makes the whole device more compact and refined, and is more suitable for implanting in the human eye, replacing or completing related imaging steps or functions.
  • each part of the artificial retinal nerve flexible microelectrode device of the present application is made of transparent materials, so that the entire device is fully transparent, so as to ensure that the user’s eyes will not be affected when the device is not in use. It has strong applicability to users with different visual abilities, and the use of the device of the present application achieves the technical effect of non-screen display, which not only saves the manufacturing process of the display screen, but also makes the display more convenient and faster.
  • This application also provides a manufacturing method of an artificial retinal nerve flexible microelectrode device, as shown in FIG. 3, including:
  • step S10 forming a flexible transparent substrate 1, including:
  • the rigid substrate may be a glass substrate or a silicon plate;
  • the material of the flexible transparent substrate 1 is polyimide with a thickness of 1um to 5um; specifically, it can be A uniform layer of polyimide is deposited on the rigid substrate to form the flexible transparent substrate 1.
  • step S20 forming a transparent TFT array layer 2 for transmitting visual electrical signals to the optic nerve on the flexible transparent substrate 1, including:
  • a transparent gate 21 is formed on the flexible transparent substrate 1; in one embodiment, the material of the transparent gate 21 is indium tin oxide, specifically, it may be sequentially through physical vapor deposition (PVD) and exposure , Developing and etching processes to form the transparent gate 21.
  • PVD physical vapor deposition
  • a transparent insulating layer 22 covering the transparent gate 21 on the flexible transparent substrate 1 and the transparent gate 21; in one embodiment, the material of the transparent insulating layer 22 is polyimide
  • the amine has a thickness of 10 nm to 500 nm; specifically, the transparent insulating layer 22 may be formed on the flexible transparent substrate 1 and the transparent gate 21 by means of plasma enhanced chemical vapor deposition (PECVD).
  • PECVD plasma enhanced chemical vapor deposition
  • the material of the transparent active layer 23 is indium gallium zinc oxide with a thickness of 10 nm to 500 nm; specifically, it may be
  • the transparent active layer 23 with a channel pattern is formed sequentially through processes such as plasma enhanced chemical vapor deposition (PECVD), exposure, development, and etching.
  • PECVD plasma enhanced chemical vapor deposition
  • the transparent source 24 and the transparent drain 25 are made of uniform materials Is indium tin oxide; specifically, the transparent source 24 and the transparent drain 25 may be formed sequentially through physical vapor deposition (PVD), exposure, development, and etching processes; wherein, the transparent source 24 and the The transparent drain 25 is connected to both ends of the active layer 23 respectively.
  • PVD physical vapor deposition
  • a transparent encapsulation layer 3 is formed on the transparent TFT array layer 2; a through hole 31 is formed on the transparent encapsulation layer 3, and then a through hole 31 is formed on the transparent TFT array layer 2 A bridging section 251 docked with the optic nerve.
  • the material of the transparent encapsulation layer 3 is polyimide; the material of the bridging section 251 is indium tin oxide; specifically, it may be deposited, exposed, and developed sequentially to form a The transparent encapsulation layer 3 with through holes 31; then the bridging section 251 is formed by processes such as physical vapor deposition (PVD), exposure, development, and etching in sequence; wherein, specifically, one end of the bridging section 251 is connected to the transparent The drain 25 is connected, and the other end of the bridging section 251 passes through the through hole 31 to be connected to the optic nerve.
  • PVD physical vapor deposition
  • the transparent encapsulation layer 3 is provided on the transparent insulating layer 22, the transparent active layer 23, the transparent source 24 and the transparent drain 25 and covers the transparent active layer 23 and the transparent source 24
  • the transparent encapsulation layer 3 is combined with the transparent insulating layer 22 to achieve the encapsulation of the transparent TFT array layer 2.
  • both further include a step of peeling the flexible transparent substrate 1 from the rigid substrate.
  • the present application is a method for manufacturing an artificial retinal nerve flexible microelectrode device.
  • mass production of the fully transparent flexible microelectrode device is realized.
  • manufacturing process of each part All of them are relatively mature processes and have a high yield rate.
  • the structure of the flexible microelectrode device in this application is relatively simplified, and a large amount of manufacturing process steps are also saved.

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Abstract

一种人造视网膜神经柔性微电极装置及其制作方法，所述装置包括柔性透明基板和透明TFT阵列层，所述透明TFT阵列层设于所述柔性透明基板上，用于与人眼中的视神经对接，以向所述视神经传输视觉电信号。

Description

人造视网膜神经柔性微电极装置及其制作方法 技术领域
本申请涉及无屏显示相关技术领域，尤其涉及一种人造视网膜神经柔性微电极装置及其制作方法。
 背景技术
无屏显示技术，即无需显示屏幕直接刺激观看者视觉神经，从而使观看者大脑中形成特定图案的方法，现有的人造视网膜神经柔性阵列微电极芯片只能适用于失明或濒于失明的患者人群，适用范围窄，当应用于具备一定视觉能力的使用者眼中时，在不使用该装置进行显示时，装置本体会对该使用者自身具备的视力造成阻挡和干扰；并且目前，市场上也缺少一种可以实现无屏显示功能并广泛适用不同视力能力人群的装置。
 技术问题
本申请实施例提供一种人造视网膜神经柔性微电极装置及其制作方法，通过将装置中各部分均采用透明材料制作而成，使得装置整体呈全透明状，以解决现有的人造视网膜神经柔性微电极装置不能适应不同视觉能力使用者的问题。
 技术解决方案
为解决上述问题，本申请提供的技术方案如下：
本申请实施例一方面提供了一种人造视网膜神经柔性微电极装置，包括：
柔性透明基板；
透明TFT阵列层，设于所述柔性透明基板上，用于与人眼中的视神经对接，以向所述视神经传输视觉电信号；
透明封装层，设于所述透明TFT阵列层上，所述透明封装层上设有通孔；及
桥接段，设于所述TFT阵列层上并穿过所述通孔与所述视神经对接。
在本申请实施例所提供的人造视网膜神经柔性微电极装置中，所述透明TFT阵列层包括设于所述柔性透明基板上的透明栅极、设于所述柔性透明基板及所述透明栅极上并覆盖所述透明栅极的透明绝缘层、设于所述透明绝缘层上的透明有源层、设于所述透明绝缘层及所述透明有源层上的透明源极和透明漏极；
所述透明源极和所述透明漏极分别与所述有源层两端相连接；
所述透明封装层设于所述透明绝缘层、透明有源层、透明源极及所述透明漏极上并覆盖所述透明有源层和透明源极；
所述桥接段一端与所述透明漏极连接，所述桥接段另一端穿过所述通孔与所述视神经对接。
在本申请实施例所提供的人造视网膜神经柔性微电极装置中，所述柔性透明基板和所述透明封装层的材料均为聚酰亚胺。
在本申请实施例所提供的人造视网膜神经柔性微电极装置中，所述透明栅极、透明源极、透明漏极与所述桥接段的材料均为氧化铟锡。
在本申请实施例所提供的人造视网膜神经柔性微电极装置中，所述透明绝缘层的材料为氧化硅。
在本申请实施例所提供的人造视网膜神经柔性微电极装置中，所述透明有源层的材料为铟镓锌氧化物。
在本申请实施例所提供的人造视网膜神经柔性微电极装置中，所述柔性透明基板的厚度为1um～5um，所述透明绝缘层的厚度为10nm～500nm；所述透明有源层的厚度为10nm～500nm。
根据本申请的上述目的，还提供一种人造视网膜神经柔性微电极装置的制作方法，包括：
形成一柔性透明基板；
在所述柔性透明基板上形成一用于向所述视神经传输视觉电信号的透明TFT阵列层；
在所述透明TFT阵列层上形成一透明封装层；所述透明封装层上形成有通孔；及
在所述透明TFT阵列层上形成一穿过所述通孔并与所述视神经对接的桥接段。
在本申请实施例所提供的人造视网膜神经柔性微电极装置的制作方法中，所述形成一柔性透明基板包括：
提供一刚性衬底；
在所述刚性衬底上形成所述柔性透明基板。
在本申请实施例所提供的人造视网膜神经柔性微电极装置的制作方法中，所述在所述柔性透明基板上形成一用于向所述视神经传输视觉电信号的透明TFT阵列层包括：
在所述柔性透明基板上形成透明栅极；
在所述柔性透明基板及所述透明栅极上形成一覆盖所述透明栅极的透明绝缘层；
在所述透明绝缘层上形成透明有源层；
在所述透明绝缘层及所述透明有源层上形成透明源极和透明漏极；
所述透明源极和所述透明漏极分别与所述有源层两端相连接；所述透明封装层设于所述透明绝缘层、透明有源层、透明源极及所述透明漏极上并覆盖所述透明有源层和透明源极；所述桥接段一端与所述透明漏极连接，所述桥接段另一端穿过所述通孔与所述视神经对接。
 有益效果
本申请的有益效果为：通过将装置中各部分均采用透明材料制作而成，使得装置整体呈全透明状，以保证在不使用该装置时，不影响使用者眼睛自身正常的视觉，对不同视觉能力的使用者具有较强的适用性，并且，本申请装置的使用，实现了无屏显示的技术效果，不仅能够省去显示屏的制造过程，而且能够使显示更加方便快捷，节省制作工艺步骤，适于大批量生产。
 附图说明
为了更清楚地说明实施例或现有技术中的技术方案，下面将对实施例或现有技术描述中所需要使用的附图作简单介绍，显而易见地，下面描述中的附图仅仅是申请的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1为本申请实施例提供的一种人造视网膜神经柔性微电极装置的结构示意图；
图2为本申请实施例提供的一种人造视网膜神经柔性微电极装置中透明TFT阵列层的结构示意图；
图3为本申请实施例提供的一种人造视网膜神经柔性微电极装置的制作方法的流程示意框图；
图4为本申请实施例提供的另一种人造视网膜神经柔性微电极装置的制作方法的流程示意框图。
 本发明的实施方式
这里所公开的具体结构和功能细节仅仅是代表性的，并且是用来描述本申请的示例性实施例的目的。但是本申请可以通过许多替换形式来具体实现，并且不应当被解释成仅仅受限于这里所阐述的实施例。
在本申请的描述中，需要理解的是，术语“中心”、“横向”、“上”、“下”、“左”、“右”、“竖直”、“水平”、“顶”、“底”、“内”、“外”等指示的方位或位置关系为基于附图所示的方位或位置关系，仅是为了便于描述本申请和简化描述，而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作，因此不能理解为对本申请的限制。此外，术语“第一”、“第二”仅用来描述目的，而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量。由此，限定有“第一”、“第二”的特征可以明示或者隐含地包括一个或者更多个该特征。在本申请的描述中，除非另有说明，“多个”的含义是两个或两个以上。另外，术语“包括”及其任何变形，意图在于覆盖不排他的包含。
在本申请的描述中，需要说明的是，除非另有明确的规定和限定，术语“安装”、“相连”、“连接”应做广义理解，例如，可以是固定连接，也可以是可拆卸连接，或一体地连接；可以是机械连接，也可以是电连接；可以是直接相连，也可以通过中间媒介间接相连，可以是两个元件内部的连通。对于本领域的普通技术人员而言，可以具体情况理解上述术语在本申请中的具体含义。
这里所使用的术语仅仅是为了描述具体实施例而不意图限制示例性实施例。除非上下文明确地另有所指，否则这里所使用的单数形式“一个”、“一项”还意图包括复数。还应当理解的是，这里所使用的术语“包括”和/或“包含”规定所陈述的特征、整数、步骤、操作、单元和/或组件的存在，而不排除存在或添加一个或更多其他特征、整数、步骤、操作、单元、组件和/或其组合。
下面结合附图和实施例对本申请作进一步说明。
示意的，如图1所示，本申请实施例提供了一种人造视网膜神经柔性微电极装置，包括：
柔性透明基板1；和
透明TFT阵列层2，设于所述柔性透明基板1上，用于与人眼中的视神经对接，以向所述视神经传输视觉电信号。
可以理解的是，现有的各类视觉假体都包含植入眼内的微电极阵列用于对视皮层、视网膜、视神经提供电刺激；具体的与人眼中的视神经对接的方式和相关技术也已得到较为广泛运用，均为现有技术，并且也不是本申请产生的有益效果所解决的主要问题，在此不再赘述；
所述柔性微电极装置还包括设于所述透明TFT阵列层2上的透明封装层3；显然，所述透明封装层3用于对所述透明TFT阵列层2进行封装，此外，还作为绝缘层防止透明TFT阵列层2与所述视神经对接的短路或串扰。
所述透明封装层3上设有通孔31，所述透明TFT阵列层2上延伸有一穿过所述通孔31与所述视神经对接的桥接段251；显然，所述桥接段251的数量与所述透明TFT阵列层2中呈阵列排布的TFT薄膜晶体管的数量相同，并且，透明封装层3中对应于各所述TFT薄膜晶体管处均形成有一所述通孔31，各所述通孔31中均设有一与TFT薄膜晶体管相连的桥接段251。
在一实施例中，示意的，如图2所示，以单个TFT薄膜晶体管为例，所述透明TFT阵列层2包括设于所述柔性透明基板1上的透明栅极21、设于所述柔性透明基板1及所述透明栅极21上并覆盖所述透明栅极21的透明绝缘层22、设于所述透明绝缘层22上的透明有源层23、设于所述透明绝缘层22及所述透明有源层23上的透明源极24和透明漏极25；所述透明源极24和所述透明漏极25分别与所述有源层23两端相连接。
具体的，所述透明封装层3设于所述透明绝缘层22、透明有源层23、透明源极24及所述透明漏极25上并覆盖所述透明有源层23和透明源极24；所述透明封装层3结合所述透明绝缘层22以实现对所述透明TFT阵列层2的封装。
具体的，所述桥接段251一端与所述透明漏极25连接，所述桥接段251另一端穿过所述通孔31与所述视神经对接；可以理解的是，TFT薄膜晶体管作为在显示领域常用的功能部件，其工作方式和原理是本领域技术人员所熟知的，本申请中，具体的，所述TFT薄膜晶体管通过其透明漏极25向所述视神经传输视觉电信号，以完成对所述视神经的刺激，从而由视神经传导到大脑形成视觉图像；以一种无屏显示的方式，完成大脑对图像的获取。
本申请柔性微电极装置中各部件均采用透明材料制作而成，以实现柔性微电极装置整体呈全透明状，达到嵌入在眼球中的本申请柔性微电极装置在不使用时，以其透明属性，不会对使用者视线造成干扰，不影响使用者正常的视觉能力。在一实施例中，具体的， 所述柔性透明基板1和所述透明封装层3的材料均为聚酰亚胺（PI，Polyimide）；所述透明栅极21、透明源极24、透明漏极25与所述桥接段251的材料均为氧化铟锡（ITO，Indium Tin Oxides）；所述透明绝缘层22的材料为氧化硅（SiOx）；所述透明有源层23的材料为铟镓锌氧化物（IGZO，indium gallium zinc oxide），其中，所述聚酰亚胺（PI，Polyimide）、氧化铟锡（ITO，Indium Tin Oxides）、氧化硅（SiOx）和铟镓锌氧化物（IGZO，indium gallium zinc oxide）都具备较好的透明度，尤其是氧化硅（SiOx）的透明度与玻璃较为接近；并且，聚酰亚胺（PI，Polyimide）和氧化铟锡（ITO，Indium Tin Oxides）分别作为透明薄膜和透明电极在光电领域都有着广泛应用。
在一实施例中，所述柔性透明基板1的厚度为1um～5um，所述透明绝缘层22的厚度为10nm～500nm；所述透明有源层23的厚度为10nm～500nm；显然，各功能层以较薄的厚度使得装置整体更为小巧精细化，更适用于植入人眼，替代或完成相关成像步骤或功能。
综上，本申请人造视网膜神经柔性微电极装置中各部分均采用透明材料制作而成，使得装置整体呈全透明状，以保证在不使用该装置时，不影响使用者眼睛自身正常的视觉，对不同视觉能力的使用者具有较强的适用性，并且，本申请装置的使用，实现了无屏显示的技术效果，不仅能够省去显示屏的制造过程，而且能够使显示更加方便快捷。
本申请还提供一种人造视网膜神经柔性微电极装置的制作方法，如图3所示，包括：
S10：形成一柔性透明基板1；
S20：在所述柔性透明基板1上形成一用于向所述视神经传输视觉电信号的透明TFT阵列层2。
具体的，步骤S10：形成一柔性透明基板1，包括：
S11：提供一刚性衬底；具体的，所述刚性衬底可以是玻璃基板或硅板；
S12：在所述刚性衬底上形成所述柔性透明基板1；在一实施例中，所述柔性透明基板1的材料为聚酰亚胺，厚度为1um～5um；具体的，可以是通过在所述刚性衬底上沉积一层均匀的聚酰亚胺，以形成所述柔性透明基板1。
具体的，步骤S20：在所述柔性透明基板1上形成一用于向所述视神经传输视觉电信号的透明TFT阵列层2，包括：
S21：在所述柔性透明基板1上形成透明栅极21；在一实施例中，所述透明栅极21的材料为氧化铟锡，具体的，可以是依次通过物理气相沉积（PVD）、曝光、显影和刻蚀等工艺形成透明栅极21。
S22：在所述柔性透明基板1及所述透明栅极21上形成一覆盖所述透明栅极21的透明绝缘层22；在一实施例中，所述透明绝缘层22的材料为聚酰亚胺，厚度为10nm～500nm；具体的，可以是通过等离子增强化学气相沉积（PECVD）的方式在所述柔性透明基板1及所述透明栅极21上形成所述透明绝缘层22。
S23：在所述透明绝缘层22上形成透明有源层23；在一实施例中，所述透明有源层23的材料为铟镓锌氧化物，厚度为10nm～500nm；具体的，可以是依次通过等离子增强化学气相沉积（PECVD）、曝光、显影和刻蚀等工艺形成具有沟道图案的透明有源层23。
S24：在所述透明绝缘层22及所述透明有源层23上形成透明源极24和透明漏极25；在一实施例中，所述透明源极24和透明漏极25的材料为均为氧化铟锡；具体的，可以是依次通过物理气相沉积（PVD）、曝光、显影和刻蚀等工艺形成所述透明源极24和透明漏极25；其中，所述透明源极24和所述透明漏极25分别与所述有源层23两端相连接。
示意的，如图4所示，在前述制作方法的基础上，还包括：
S30：在所述透明TFT阵列层2上形成一透明封装层3；所述透明封装层3上形成有通孔31，然后在所述透明TFT阵列层2上形成一穿过所述通孔31与所述视神经对接的桥接段251。
在一实施例中，所述透明封装层3的材料为聚酰亚胺；所述桥接段251的材料为氧化铟锡；具体的，可以是依次通过沉积、曝光和显影等工艺，以形成一具有通孔31的透明封装层3；然后依次通过物理气相沉积（PVD）、曝光、显影和刻蚀等工艺形成所述桥接段251；其中，具体的，所述桥接段251一端与所述透明漏极25连接，所述桥接段251另一端穿过所述通孔31与所述视神经对接。
具体的，所述透明封装层3设于所述透明绝缘层22、透明有源层23、透明源极24及所述透明漏极25上并覆盖所述透明有源层23和透明源极24；所述透明封装层3结合所述透明绝缘层22以实现对所述透明TFT阵列层2的封装。
值得注意的是，如图3和如图4的制作方法在完成之后，均还包括一将所述柔性透明基板1与所述刚性衬底剥离的步骤。
综上，本申请一种人造视网膜神经柔性微电极装置的制作方法，通过在制作过程中以透明材料制备各功能部件，实现了对全透明柔性微电极装置的量产，同时，各部分制作工艺均为较为成熟工艺，良品率高，同时，本申请中柔性微电极装置结构较为精简，也大量的节省制作工艺步骤。
综上所述，虽然本申请已以优选实施例揭露如上，但上述优选实施例并非用以限制本申请，本领域的普通技术人员，在不脱离本申请的精神和范围内，均可作各种更动与润饰，因此本申请的保护范围以权利要求界定的范围为准。

Claims (10)

  1. 一种人造视网膜神经柔性微电极装置，包括：
    柔性透明基板；
    透明TFT阵列层，设于所述柔性透明基板上，用于与人眼中的视神经对接，以向所述视神经传输视觉电信号；
    透明封装层，设于所述透明TFT阵列层上，所述透明封装层上设有通孔；及
    桥接段，设于所述TFT阵列层上并穿过所述通孔与所述视神经对接。
  2. 根据权利要求1所述的人造视网膜神经柔性微电极装置，其中，所述透明TFT阵列层包括设于所述柔性透明基板上的透明栅极、设于所述柔性透明基板及所述透明栅极上并覆盖所述透明栅极的透明绝缘层、设于所述透明绝缘层上的透明有源层、设于所述透明绝缘层及所述透明有源层上的透明源极和透明漏极；
    所述透明源极和所述透明漏极分别与所述有源层两端相连接；
    所述透明封装层设于所述透明绝缘层、透明有源层、透明源极及所述透明漏极上并覆盖所述透明有源层和透明源极；
    所述桥接段一端与所述透明漏极连接，所述桥接段另一端穿过所述通孔与所述视神经对接。
  3. 根据权利要求1所述的人造视网膜神经柔性微电极装置，其中，所述柔性透明基板和所述透明封装层的材料均为聚酰亚胺。
  4. 根据权利要求2所述的人造视网膜神经柔性微电极装置，其中，所述透明栅极、透明源极、透明漏极与所述桥接段的材料均为氧化铟锡。
  5. 根据权利要求2所述的人造视网膜神经柔性微电极装置，其中，所述透明绝缘层的材料为氧化硅。
  6. 根据权利要求2所述的人造视网膜神经柔性微电极装置，其中，所述透明有源层的材料为铟镓锌氧化物。
  7. 根据权利要求2所述的人造视网膜神经柔性微电极装置，其中，所述柔性透明基板的厚度为1um～5um，所述透明绝缘层的厚度为10nm～500nm；所述透明有源层的厚度为10nm～500nm。
  8. 一种人造视网膜神经柔性微电极装置的制作方法，包括：
    形成一柔性透明基板；
    在所述柔性透明基板上形成一用于向所述视神经传输视觉电信号的透明TFT阵列层；
    在所述透明TFT阵列层上形成透明封装层，所述透明封装层上形成有通孔；及
    在所述TFT阵列层上形成一穿过所述通孔并与所述视神经对接的桥接段。
  9. 根据权利要求8所述的人造视网膜神经柔性微电极装置的制作方法，其中，所述形成一柔性透明基板包括：
    提供一刚性衬底；
    在所述刚性衬底上形成所述柔性透明基板。
  10. 根据权利要求9所述的人造视网膜神经柔性微电极装置的制作方法，其中，所述在所述柔性透明基板上形成一用于向所述视神经传输视觉电信号的透明TFT阵列层包括：
    在所述柔性透明基板上形成透明栅极；
    在所述柔性透明基板及所述透明栅极上形成一覆盖所述透明栅极的透明绝缘层；
    在所述透明绝缘层上形成透明有源层；
    在所述透明绝缘层及所述透明有源层上形成透明源极和透明漏极；
    所述透明源极和所述透明漏极分别与所述有源层两端相连接；所述透明封装层设于所述透明绝缘层、透明有源层、透明源极及所述透明漏极上并覆盖所述透明有源层和透明源极；所述桥接段一端与所述透明漏极连接，所述桥接段另一端穿过所述通孔与所述视神经对接。
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