WO2020253320A1 - Panneau d'affichage, dispositif d'affichage et procédé de fabrication de panneau d'affichage - Google Patents

Panneau d'affichage, dispositif d'affichage et procédé de fabrication de panneau d'affichage Download PDF

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Publication number
WO2020253320A1
WO2020253320A1 PCT/CN2020/082797 CN2020082797W WO2020253320A1 WO 2020253320 A1 WO2020253320 A1 WO 2020253320A1 CN 2020082797 W CN2020082797 W CN 2020082797W WO 2020253320 A1 WO2020253320 A1 WO 2020253320A1
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WIPO (PCT)
Prior art keywords
display panel
layer
display
area
substrate
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PCT/CN2020/082797
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English (en)
Chinese (zh)
Inventor
郭晓亮
胡岩
韩明昆
袁洪光
孙加冕
董中飞
肖昂
姜尚勳
郑海
黄建雄
刘国栋
陈远
董一民
Original Assignee
京东方科技集团股份有限公司
成都京东方光电科技有限公司
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Publication of WO2020253320A1 publication Critical patent/WO2020253320A1/fr

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/84—Passivation; Containers; Encapsulations
    • H10K50/842—Containers
    • H10K50/8428—Vertical spacers, e.g. arranged between the sealing arrangement and the OLED
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass

Definitions

  • This application relates to, but is not limited to, the field of display technology, in particular to a display panel, a display device, and a manufacturing method of the display panel.
  • organic electroluminance display devices Organic Electroluminance Display, abbreviated as: OLED
  • OLED Organic Electroluminance Display
  • An embodiment of the present disclosure provides a display panel including: a display area and a non-display area located inside and around the display area;
  • An isolation column is provided on the substrate of the display panel, and the isolation column separates the light-emitting layer between the display area and the non-display area;
  • the isolation column is provided with a protective layer around the other sides.
  • the isolation column has an I-shaped structure.
  • the isolation column includes: a first metal layer, a second metal layer, and a third metal layer arranged in sequence from a position close to the substrate to a position far away from the substrate.
  • the first metal layer and the third metal layer are titanium metal film layers
  • the second metal layer is an aluminum metal film layer
  • the isolation column further includes: a gate insulating layer and an interlayer dielectric layer sequentially disposed between the substrate and the first metal layer.
  • the protective layer is an inorganic layer vapor-deposited using a plasma enhanced chemical vapor deposition process.
  • An embodiment of the present disclosure further provides a display device, including: the display panel as described in any one of the above, wherein the non-display area of the display panel includes one or more of the following: a camera, a sensor of the display device , Physical buttons and the border of the display.
  • the non-display area of the display panel includes one or more of the following: a camera, a sensor, a physical button, and a frame of the display screen of the display device.
  • the embodiment of the present disclosure also provides a manufacturing method of a display panel, including:
  • a protective layer is formed around each side of the isolation column except for the side close to the substrate;
  • a light-emitting layer of the display panel is formed, the light-emitting layer is formed on the display area, the non-display area and the side of the isolation pillar away from the substrate, and the isolation pillar connects the display area and the The light-emitting layer of the non-display area is disconnected.
  • the forming the isolation column on the substrate of the display panel includes:
  • a first metal layer, a second metal layer, and a third metal layer are sequentially formed on the substrate.
  • the area of the first metal layer is greater than the area of the third metal layer, and the area of the third metal layer is greater than the area of the second metal layer , Making the isolation column an I-shaped structure.
  • the forming the protective layer includes:
  • a plasma-enhanced chemical vapor deposition process is used to evaporate an inorganic layer on each exposed surface of the isolation column, and the formed inorganic layer wraps the remaining surfaces of the isolation column except for the side close to the substrate.
  • Figure 1 is a schematic diagram of a structure with holes in the AA area in a related OLED display panel
  • FIG. 2 is a schematic diagram of the structure from the AA area to the opening area in the OLED display panel shown in FIG. 1;
  • FIG. 3 is a schematic diagram of the principle of reliability verification using the OLED display panel shown in FIG. 2;
  • FIG. 4 is a schematic structural diagram of a display panel provided by an embodiment of the disclosure.
  • FIG. 5 is a schematic diagram of the principle of reliability verification using the display panel provided by an embodiment of the present disclosure.
  • FIG. 6 is a schematic structural diagram of another display panel provided by an embodiment of the disclosure.
  • FIG. 7 is a schematic structural diagram of yet another display panel provided by an embodiment of the present disclosure.
  • FIG. 8 is a schematic cross-sectional view of performing product cross-sectional verification on the display panel provided by the embodiment of the present disclosure
  • FIG. 9 is a flowchart of a manufacturing method of a display panel provided by an embodiment of the disclosure.
  • FIG. 10 is a flowchart of another method for manufacturing a display panel according to an embodiment of the disclosure.
  • FIG. 11 is a schematic block diagram of a display device provided by an embodiment of the disclosure.
  • OLED display panels are mainly developing towards full screens and narrower bezels. Therefore, how to realize the opening of the display itself has become a technical difficulty for development.
  • an open mask that is, Open Mask
  • AA area effective display area
  • the EL layer between the AA area and the hole needs to be separated to prevent water vapor and oxygen from being transmitted to the AA area along the EL layer, which may cause display failure of the display panel.
  • the embodiments of the present disclosure provide a display panel, a display device, and a manufacturing method of the display panel to solve the problem that when the OLED display panel is opened in the AA area, the water vapor or oxygen in the opening area is transmitted to the AA area and the display fails. .
  • the display panel, the display device, and the manufacturing method of the display panel provided by the embodiments of the present disclosure are provided by arranging an isolation column on the substrate of the display panel, and the location of the isolation column separates the light-emitting layer between the display area and the non-display area And, except for the side close to the substrate, a protective layer is provided around each surface of the isolation column, that is, each exposed surface of the isolation column is wrapped by the protective layer before the light-emitting layer is formed.
  • the structure in which the isolation column and the protective layer are combined can effectively prevent water vapor and oxygen in the non-display area from passing through the isolation column into the display area, that is, the isolation structure of the isolation column is combined with the protection layer.
  • the barrier effect of water vapor and oxygen can effectively block water vapor and oxygen outside the display area, and solve the problem that when the OLED display panel is opened in the AA area, the water vapor or oxygen in the opening area will be transmitted to the AA area and cause display failure The problem.
  • the display panel is mainly developing towards full screen and narrower frame. How to realize the opening setting of the display screen has become the technical key of the display panel.
  • the EL layer when the EL layer of the OLED display panel is vapor-deposited, the EL layer includes multiple process layers. Among them, a high-precision metal mask (Fine Metal Mask, Abbreviated as: FMM), the other layers all use Open Mask to fully evaporate the AA area of the display panel.
  • FMM Full Metal Mask
  • FIG. 1 it is a schematic structural diagram of a related OLED display panel.
  • FIG. 1 illustrates an implementation manner of openings in the AA area 21a of the OLED display panel 20, and FIG. 1 specifically illustrates the OLED display panel 20.
  • the opening area 22 that is, the non-display area inside the AA area 21a
  • the partition prevents water vapor and oxygen from being transmitted along the EL layer to the AA area 21a, which may cause display failure of the display panel.
  • FIG. 2 it is a schematic diagram of the structure from the AA area to the aperture area in the OLED display panel shown in FIG. 1, and FIG. 2 is a partial cross-section of the OLED display panel shown in FIG. 1 with A-A' as the cutting line
  • the cutting line AA' shows the structure from the AA area 21a to the opening area 22.
  • DAM isolation dam
  • the isolation dam 23 and the isolation column 24 structure with similar functions The non-display area 21b at the edge of the display panel 20 can be transferred to the inside of the display panel 20 to form a hole-like structure inside the display panel 20, that is, the open area 22 in FIG. 1.
  • the formation method of the spacer 24 in FIG. 2 is as follows: before the EL layer 26 is evaporated, the overall structure of the spacer 24 is formed. When the EL layer 26 is evaporated, the formed spacer 24 can be used to separate the EL layer 26.
  • Figure 2 also illustrates some conventional structures in the related OLED display panel 20, such as a rigid substrate 211, a flexible substrate 212, a transistor 220 (the specific structure of each film layer inside the transistor 220 is not shown in Figure 2), a flat layer ( Denoted as: PLN layer) 230, pixel definition layer (Pixel Define Layer, PDL) layer 240, Ink Jet Printing (IJP) layer 250, and CVD layer 260 formed by a CVD process.
  • the SD layer isolation column 24 in FIG. 2 + inorganic layer (the inorganic layer under the isolation column 24 in FIG. 2) formed by the related technology has a reliability risk.
  • FIG 3 it is a schematic diagram of the principle of reliability verification using the OLED display panel shown in Figure 2, and Figure 3 is a partial structural diagram inside the dashed frame in Figure 2, that is, Figure 3 only shows the OLED display panel shown in Figure 2 In the isolation column 24 and the surrounding structure in 20, during the reliability verification stage, water vapor and oxygen pass through the isolation column 24 to reach the AA area 21a, which causes the reliability verification to fail, thereby causing the display failure of the OLED display panel 20.
  • FIG. 4 is a schematic structural diagram of a display panel provided by an embodiment of the disclosure.
  • the display panel 100 provided in this embodiment is, for example, an OLED display panel.
  • the display panel 100 may include a display area 100a and a non-display area 100b located inside and around the display area 100a.
  • isolation pillars 120 are provided on the substrate 110 of the display panel 100, and these isolation pillars 120 separate the light-emitting layer 130 between the display area 100a and the non-display area 100b;
  • a protective layer 140 is provided around each surface.
  • the non-display area 100b of the display panel 100 is, for example, an area to be provided with openings. You can refer to the opening area 22 in FIG. 1.
  • the opening area is applied to the display device to which the display panel 100 belongs.
  • the functions include, for example, one or more of the following: cameras, sensors, physical buttons of the display device, and the frame of the display panel 100. It is understandable that the display panel 100 of the display device is an integral structure during the manufacturing process, and the openings in the display panel 100 may be cut through a laser cutting process after the display device is manufactured to form the internal openings of the display panel 100.
  • these internal opening areas are the non-display area 100b inside the display area 100a; in addition, in the manufacturing process of the display panel, multiple display panels are usually fabricated on a large substrate, and the The display panel is cut, and what is cut is the border of the display panel, that is, the non-display area 100b around the display area 100a.
  • the opening area 22 inside the AA area 21a shown in FIG. 1 is the non-display area 100b inside the display area 100a in the embodiment of the disclosure, and the opening of the display panel 100
  • the hole area is mainly concentrated inside the display area 100a.
  • the periphery of the display panel 20 shown in FIG. 1 is the frame of the display screen, which is the non-display area outside the display area 100a in the embodiment of the present disclosure.
  • the perforated area 22 shown in FIG. 1 is only a schematic representation of the opening arrangement in the display panel provided by the embodiment of the present disclosure, and the perforated area (non-display area 100b) inside the display panel 100 is not only In the perforated area 22 shown in FIG. 1, the position and number of the non-display area 100 b have different setting methods according to the actual product requirements of the display device to which the display panel 100 belongs.
  • a protective layer 140 is provided around each surface.
  • the spacer 120 is formed on the substrate 110.
  • the spacer 120 is close to the side of the substrate 110 (that is, the side without the protective layer 140) and the film layer formed by the previous process (for example, the inorganic layer 150).
  • Closely fitting, that is, the side of the isolation column 120 close to the substrate 110 has no effect on the water vapor and oxygen in the non-display area 100b passing through the isolation column 120 to the display area 100a in the subsequent reliability verification.
  • the isolation column 120 is usually made of metal materials, such as titanium (Ti) and aluminum (Al), except for the other sides of the isolation column 120 close to the substrate 110, water vapor and oxygen can isolate the column during the reliability verification process. 120 passes through the isolation column 120 to reach the display area 100a. As shown in FIG. 3, the reliability verification of the related OLED display panel fails.
  • the light-emitting layer 130 is not directly formed on the spacer 120. Comparing FIG. 3 and FIG. 4, it can be seen that the spacer 120 of the embodiment of the present disclosure is close to the substrate.
  • a protective layer 140 is provided around the remaining surfaces. That is, except for the bonding surface of the spacer 120 and the underlying film layer, the remaining surfaces are tightly wrapped by the protective layer 140.
  • the protective layer 140 can Use materials that block water vapor and oxygen, such as inorganic materials.
  • the display panel 100 between the light emitting layer 130 of the display area 100a and the substrate 110, and the side of the light emitting layer 130 away from the substrate 110, there are other necessary structures of the display panel 100, such as TFT array layer, flat layer, isolation
  • the TFT array layer is used to switch and control the light-emitting pixels in the light-emitting layer 130 of the display area 100a.
  • the spacer 120 used to isolate the light-emitting layer 130 in different regions ie, the display region 100a and the non-display region 100b
  • multiple surfaces thereof that is, the surfaces exposed by the spacer 120 before the light-emitting layer 130 is formed
  • a protective layer 140.
  • the protective layer 140 has good coating characteristics and can be tightly wrapped along the spacer 120. After the subsequent opening treatment, the protective layer 140 can be made of inorganic materials that have a good blocking effect on water vapor and oxygen. Material, the structure of the spacer 120 and the protective layer 140 combined can effectively block the water vapor and oxygen in the non-display area 100b from entering the display area 100a, as shown in FIG. 5, to rely on the display panel provided by the embodiment of the present disclosure. Schematic diagram of the principle of performance verification. In the subsequent reliability verification process, the structure of the spacer 120 and the protective layer 140 can effectively block water vapor and oxygen from the display area 100a, and cut off the light-emitting layer 130 in the display area 100a. At the same time, it can meet the demand for reliability verification of the display panel.
  • the isolation column 120 is arranged on the substrate 110 of the display panel 100, and the position of the isolation column 120 separates the light-emitting layer 130 between the display area 100a and the non-display area 100b. Moreover, except for the side close to the substrate 110, a protective layer 140 is provided around each surface of the isolation column 120, that is, each exposed surface of the isolation column 120 is wrapped by the protective layer 140 before the light-emitting layer 130 is formed.
  • the structure in which the isolation column 120 and the protective layer 140 are combined can effectively prevent water vapor and oxygen in the non-display area 100b from passing through the isolation column 120 into the display area 100a, that is, the isolation column 120
  • the isolation structure combined with the barrier effect of the protective layer 140 on water vapor and oxygen can effectively block water vapor and oxygen outside the display area 100a, and solve the problem of water vapor or oxygen in the opening area when the OLED display panel is opened in the AA area. Will be transferred to the AA area and cause the display to fail.
  • the isolation column 120 is an I-shaped structure, and the I-shaped structure is a structure that protrudes up and down and is concave in the middle, which is also called an Undercut structure. As shown in FIG. Shape, the isolation column 120 of this structure has a better isolation effect.
  • the protective layer 140 is formed on the isolation column 120 of the I-shaped structure, multiple surfaces of the protective layer 140 are wrapped by the protective layer 140.
  • PECVD Plasma Enhanced Chemical Vapor Deposition
  • the protective layer 140 formed by the PECVD process can be tightly wrapped along each surface of the isolation column 120 of the I-shaped structure, thereby The structure in which the isolation column 120 and the protective layer 140 are combined has a good effect of blocking moisture and oxygen.
  • the display panel 100 in the embodiment of the present disclosure may be applied to a flexible display panel.
  • the substrate 110 may be a combination structure of a rigid substrate and a flexible substrate.
  • the spacer 120 in the embodiment of the present disclosure may include: a first metal layer 121 and a second metal layer 122 arranged in sequence from a position close to the substrate 110 to a position far away from the substrate 110 And the third metal layer 123.
  • the first metal layer 121 and the third metal layer 123 can be made of Ti metal material, that is, the first metal layer 121 and the third metal layer 123 are titanium metal film layers, and the second metal layer 123
  • the layer 122 can be made of metal Al material, that is, the second metal layer 122 is an aluminum metal film layer.
  • the isolation column 120 adopts a film structure of "Ti+Al+Ti", and the film structure of "Ti+Al+Ti" can be determined by the source/drain electrode (Source/Drain, referred to as : SD) layer is formed.
  • Source/Drain Source/drain electrode
  • the isolation pillar 120 formed by the SD layer process of the display panel 100 is an I-shaped structure (ie, an Undercut structure).
  • the area of the first metal layer 121 is larger than the area of the third metal layer 123
  • the area of the third metal layer 123 is larger than the area of the second metal layer 122.
  • the cross-sectional structure is shown in Figure 6.
  • the display panel 100 provided by the embodiment of the present disclosure adopts the structure basis of the spacer 120 of the undercut structure that has been formed, and a protective layer 140 made of inorganic material is vapor-deposited by the PECVD process, and the protective layer 140 is used to tightly wrap the undercut structure
  • the isolation column 120 because the protective layer 140 made of inorganic material has better blocking effect on water vapor and oxygen than the metal Ti and Al. Therefore, the isolation column 120 combines the structure of the inorganic protective layer 140 to block the light-emitting layer 130 at the same time. It can meet the requirements of reliability verification, that is, it can effectively block water vapor and oxygen outside the display area 100a, thereby achieving the effect of protecting the light-emitting layer 130 in the display area 100a.
  • FIG. 7 is a schematic structural diagram of another display panel provided by an embodiment of the present disclosure.
  • the isolation pillar 120 in the embodiment of the present disclosure may further include: a gate insulating layer (Gate Insulator, referred to as GI) sequentially disposed between the substrate 110 and the first metal layer 121
  • GI Gate Insulator
  • the other regions of 100 are, for example, formed at the position of the isolation column 120 and located below each metal layer in the isolation column 120, that is, the isolation column may not only include the aforementioned "Ti+Al+Ti" Undercut structure, but also include a bottom structure, That is, the GI layer 151 and the ILD layer 152, where the GI layer may include two layers, such as GI1 and GI2.
  • the two GI layers may use silicon nitride (SiNx) and silicon oxide (SiOx) materials, respectively, and the ILD layer 125 may It is formed using SiNx and SiOx materials.
  • the protective layer 140 when the protective layer 140 is formed in the embodiment of the present disclosure, it can not only wrap the exposed surface of the isolation column 120, but can also be formed in a partial area on both sides of the isolation column 120, because the display area 100a and the non-display area There are isolation pillars 120 and isolation dams between 100b (refer to isolation dam 23 in FIG. 2). Therefore, the protective layer 140 formed in partial areas on both sides of the isolation pillars 120 will not affect the pixels in the display area 100a, and has This helps prevent water vapor and oxygen from entering the display area 100a.
  • FIG. 8 it is a schematic cross-sectional view of performing product cross-sectional verification of the display panel provided by the embodiment of the present disclosure.
  • the verification method in Fig. 8 is for example a focused ion beam (Focused Ion beam, referred to as FIB) process method. From the FIB results, the following points can be seen:
  • FIB focused ion beam
  • the formed inorganic protective layer 140 can effectively cover the third metal layer 123 of the I-shaped structure isolation column 120, such as the top metal Ti layer, and no fracture occurs;
  • the second metal layer 122 such as the middle metal Al layer, has a smaller profile, that is, the middle part of the I-shaped structure. This layer can be closely attached to the inorganic protective layer 140 without fracture and No risk of breakage;
  • the overall inorganic protective layer 140 does not affect the I-shaped structure isolation pillar 120 formed by the SD layer in the manufacturing process of the display panel 100.
  • the light-emitting layer is evaporated, and the structure of the spacer 120 combined with the protective layer 140 can isolate the light-emitting layer between the display area 100a and the non-display area 100b;
  • the reliability verification can ensure that water vapor and oxygen will not pass through the Ti-Al interface of the spacer 120.
  • an embodiment of the present disclosure further provides a display device, which may include: the display panel 100 in any of the foregoing embodiments shown in FIGS. 4 to 8 of the present disclosure
  • the non-display area 100b of the display panel 100 may include one or more of the following: a camera, a sensor, a physical button, a frame of a display screen, etc. of the display device provided in the embodiment of the present disclosure.
  • an opening area can be reserved for its internal hardware structure, that is, the non-display area 100b inside the display area 100a, which includes the aforementioned camera, sensor, and physical buttons, for example;
  • the non-display area 100b inside the display area 100a which includes the aforementioned camera, sensor, and physical buttons, for example;
  • multiple display panels used to form the display device are usually manufactured on a large substrate. After the manufacturing is completed, each display panel is cut and opened. At this time, the cut is the frame of the display panel, namely It is a non-display area 100b around the display area 100a.
  • an embodiment of the present disclosure also provides a manufacturing method of a display panel.
  • the manufacturing method of the display panel is used to manufacture the display panel provided by any of the foregoing embodiments of the present disclosure.
  • FIG. 9 it is a flowchart of a manufacturing method of a display panel provided by an embodiment of the present disclosure.
  • the manufacturing method provided in this embodiment can be applied to the process of manufacturing a display panel.
  • the manufacturing method provided in the embodiments of the present disclosure may include the following steps, namely S310 to S330:
  • the light-emitting layer is formed on the display area, the non-display area, and the side of the isolation column away from the substrate of the display panel, and the isolation column separates the light-emitting layer in the display area and the non-display area.
  • the non-display area of the display panel is, for example, the area to be provided with holes. You can refer to the hole area 22 in FIG. 1.
  • the functions of the hole area applied to the display device of the display panel include, for example, One or more of the following: the camera of the display device, the sensor, the physical buttons and the frame of the display screen, etc.
  • the display panel of the display device is an integral structure during the manufacturing process, and the openings inside the display panel can be cut by a laser cutting process after the production is completed to form the inner opening area of the display panel.
  • the open area is the non-display area inside the display area; in addition, in the manufacturing process of the display panel, multiple display panels are usually manufactured on a large substrate. After the manufacturing is completed, each display panel is cut. What is cut is the border of the display panel, which is the non-display area around the display area.
  • the inner opening area 22 is specifically the non-display area inside the display area.
  • the periphery of the display panel 20 shown in FIG. 1 is the frame of the display panel, that is, the outside of the display area Non-display area.
  • the structures shown in FIGS. 4 to 8 described above in the present disclosure may be combined.
  • the manufacturing method of the display panel provided by the embodiment of the present disclosure before forming the light-emitting layer, firstly form a separate display
  • the isolation pillars in the non-display area and the non-display area can make the isolation pillars, except for the side close to the substrate, are surrounded by protective layers. Based on the manufacturing process of the display panel, the isolation pillars are formed on the substrate.
  • the side of the isolation column close to the substrate (that is, the side where no protective layer is provided) is closely attached to the film layer (for example, an inorganic layer) formed by the previous process, that is, the side of the isolation column close to the substrate is in the follow-up reliability verification.
  • the water vapor and oxygen in the display area that may reach the display area through the isolation column has no effect. Since the isolation column is usually made of metal materials, such as titanium (Ti) and aluminum (Al), except for the other sides of the isolation column close to the substrate side, water vapor and oxygen can pass through the isolation column during the reliability verification process. When the column reaches the display area, as shown in Figure 3, the reliability verification of the related OLED display panel fails.
  • the light-emitting layer is not directly formed on the isolation column. It can be seen from the comparison of FIG. 2 and FIG. Except for the side close to the substrate, a protective layer is provided around the other surfaces, that is, except for the bonding surface of the isolation column and the underlying film layer, the other surfaces are tightly wrapped by the protective layer.
  • the protective layer can be selected to isolate water vapor
  • the oxygen-containing material is, for example, an inorganic material.
  • TFT array layer is used to switch and control the light-emitting pixels in the light-emitting layer of the display area.
  • the spacers for isolating the light-emitting layer in different regions that is, the display area and the non-display area
  • forming a plurality of surfaces for wrapping the spacers that is, the surfaces exposed by the spacers before forming the light-emitting layer
  • the protective layer has good coating characteristics and can be tightly wrapped along the isolation column.
  • the protective layer can be made of inorganic materials with good blocking effect on water vapor and oxygen.
  • the structure of the combination of the pillar and the protective layer can effectively block the water vapor and oxygen in the non-display area from entering the display area. Referring to FIG.
  • the structure of the isolation column and the protective layer can effectively block water vapor and oxygen outside the display area, and while blocking the light-emitting layer in the display area, it can meet the requirements of reliability verification of the display panel.
  • FIG. 10 is a flowchart of another method for manufacturing a display panel according to an embodiment of the disclosure.
  • the realization of forming the isolation column that is, the realization of S310, may include:
  • a first metal layer, a second metal layer, and a third metal layer are sequentially formed on the substrate of the display panel.
  • the first metal layer and the third metal layer can be selected from metal Ti material, that is, the first metal layer and the third metal layer are titanium metal film layers
  • the second metal layer can be selected from metal Al material, that is, the second metal layer is an aluminum metal film layer.
  • the isolation column adopts the "Ti+Al+Ti" film structure, and the "Ti+Al+Ti" film structure can be formed by the SD layer manufacturing method in the display panel manufacturing process, that is, there is no need to add special In the manufacturing steps, the isolation column formed by the SD layer process of the display panel is an I-shaped structure (ie, an Undercut structure).
  • the area of the first metal layer is larger than that of the third metal layer, and the area of the third metal layer is larger than that of the second metal layer
  • the cross-sectional structure of the three metal layers can be referred to as shown in Figure 6.
  • the implementation manner of forming the protective layer may include:
  • the PECVD process is used to evaporate an inorganic layer on each exposed surface of the isolation column, and the formed inorganic layer wraps the remaining surfaces of the isolation column except for the side close to the substrate.
  • the display panel formed by the manufacturing method provided by the embodiments of the present disclosure utilizes the structure basis of the isolation column of the formed Undercut structure, and adopts the PECVD process to vaporize a protective layer of inorganic material, and the protective layer is used to tightly wrap the Undercut structure Since the protective layer of the inorganic material has better blocking effect on water vapor and oxygen than the metal Ti and Al, the separation column formed by the manufacturing method provided by the embodiment of the present disclosure is combined with the structure of the inorganic protective layer. On the basis of the light-emitting layer, it can also meet the requirements of reliability verification, that is, it can effectively block water vapor and oxygen out of the display area, thereby achieving the effect of protecting the light-emitting layer in the display area.
  • the product profile verification of the display panel formed by the manufacturing method provided by the embodiment of the present disclosure can be referred to as shown in FIG. 8, and the FIB result is the same as the display panel provided by the foregoing embodiment of the present disclosure, so it will not be repeated here.
  • FIG. 11 is a schematic block diagram of a display device 1100 provided by an embodiment of the disclosure.
  • the display device 1100 includes a display panel 1200, such as the display panel described above.
  • the display device 1100 includes, but is not limited to, various electronic devices with display functions, such as mobile phones, TVs, notebooks, game consoles, desktop computers, and so on.

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  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

Des modes de réalisation de la présente invention concernent un panneau d'affichage, un dispositif d'affichage et un procédé de fabrication de panneau d'affichage. Le panneau d'affichage comprend : une zone d'affichage et des zones de non-affichage situées à l'intérieur et autour de la zone d'affichage. Des colonnes de séparation sont disposées sur un substrat du panneau d'affichage ; la couche électroluminescente entre la zone d'affichage et les zones de non-affichage ; une couche de protection est disposée autour de chaque côté de la colonne d'isolation à l'exception du côté proche du substrat.
PCT/CN2020/082797 2019-06-21 2020-04-01 Panneau d'affichage, dispositif d'affichage et procédé de fabrication de panneau d'affichage WO2020253320A1 (fr)

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WO2021087803A1 (fr) * 2019-11-06 2021-05-14 京东方科技集团股份有限公司 Substrat d'affichage électroluminescent organique et son procédé de fabrication, et appareil d'affichage électroluminescent organique
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