WO2020248846A1 - 显示基板及其制备方法、显示面板、显示装置 - Google Patents

显示基板及其制备方法、显示面板、显示装置 Download PDF

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Publication number
WO2020248846A1
WO2020248846A1 PCT/CN2020/093414 CN2020093414W WO2020248846A1 WO 2020248846 A1 WO2020248846 A1 WO 2020248846A1 CN 2020093414 W CN2020093414 W CN 2020093414W WO 2020248846 A1 WO2020248846 A1 WO 2020248846A1
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Prior art keywords
alignment film
row direction
pixel
display substrate
display
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PCT/CN2020/093414
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English (en)
French (fr)
Inventor
岳阳
王洪润
姚琪
杨桐
李翔
于勇
黄海涛
徐传祥
廖峰
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京东方科技集团股份有限公司
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Priority to US17/264,826 priority Critical patent/US11175541B2/en
Publication of WO2020248846A1 publication Critical patent/WO2020248846A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/133711—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by organic films, e.g. polymeric films
    • G02F1/133723—Polyimide, polyamide-imide
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
    • G02F1/133784—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by rubbing
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/133707—Structures for producing distorted electric fields, e.g. bumps, protrusions, recesses, slits in pixel electrodes
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/133776—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers having structures locally influencing the alignment, e.g. unevenness
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13398—Spacer materials; Spacer properties
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136209—Light shielding layers, e.g. black matrix, incorporated in the active matrix substrate, e.g. structurally associated with the switching element
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
    • G02F2201/40—Arrangements for improving the aperture ratio

Definitions

  • the present disclosure relates to the field of display technology, in particular to a display substrate, a preparation method thereof, a display panel, and a display device.
  • the electric field between the data line and the common electrode will cause light leakage on both sides of the data line.
  • a common method is to increase the width of the corresponding black matrix, which will result in a decrease in the aperture ratio of the display panel.
  • the embodiment of the present disclosure provides a display substrate, including:
  • the substrate includes a plurality of pixel areas arranged in an array
  • Pixel electrodes located in each of said pixel areas
  • An isolation column is located between two adjacent pixel regions in the row direction, and the side surface of the isolation column has hydrophobic characteristics;
  • the alignment film is located in each of the pixel regions and on the side of the pixel electrode facing away from the substrate. In the row direction, the edges on opposite sides of the alignment film are in contact with the side surface of the isolation column.
  • the surface of the film on the side facing away from the substrate is gradually convex from both sides toward the middle in the row direction.
  • the thickness of the alignment film gradually increases in the row direction from both sides toward the middle.
  • the isolation column includes a BPS layer on the substrate and a hydrophobic material layer on the outer surface of the BPS layer.
  • the material of the hydrophobic material layer includes Teflon.
  • the display substrate further includes an adjustment layer located in the pixel area and between the pixel electrode and the alignment film, and edges on opposite sides of the adjustment layer in the row direction are all isolated from the The side surface of the column is in contact, and the surface of the adjustment layer in contact with the alignment film has a shape gradually recessed from both sides toward the middle in the row direction.
  • the thickness of the adjustment layer in the row direction shows a tendency to gradually decrease from both sides toward the middle.
  • the material of the adjustment layer includes a hydrophobic material.
  • the pixel electrode includes a plurality of electrode strips arranged at intervals.
  • the embodiment of the present disclosure also provides a method for preparing a display substrate, the method including:
  • An alignment film located on the pixel electrode is formed in each of the pixel regions, and the edges on opposite sides of the alignment film in the row direction are in contact with the side surface of the spacer, and the alignment film is away from the
  • the surface on one side of the substrate is gradually convex from both sides toward the middle in the row direction.
  • forming an isolation column between two adjacent pixel regions in the row direction specifically includes:
  • a hydrophobic material layer is formed on the outer surface of the BPS layer.
  • the material of the hydrophobic material layer includes Teflon.
  • the alignment film is formed by a transfer process.
  • forming an alignment film located on the pixel electrode in each of the pixel regions specifically includes:
  • the first sub-alignment film and the polyimide solution are heated to form the alignment film.
  • the method before forming an alignment film on the pixel electrode in each of the pixel regions, the method further includes:
  • An adjustment layer located on the pixel electrode is formed in each of the pixel regions, and the edges on opposite sides of the adjustment layer in the row direction are in contact with the side surface of the isolation column, and the adjustment layer is in contact with the orientation
  • the surface in contact with the film has a shape gradually recessed from both sides toward the middle in the row direction.
  • the material of the adjustment layer includes a hydrophobic material.
  • a coating process is used to form the adjustment layer.
  • the embodiment of the present disclosure also provides a display panel including the display substrate as described above.
  • the embodiment of the present disclosure also provides a display device including the display panel as described above.
  • Figure 1 is a schematic diagram of the structure of an ADS mode display panel
  • Figure 2 is a cross-sectional view of A-A in Figure 1;
  • FIG. 3 is a schematic diagram of the structure of an ADS mode display panel using BPS technology
  • Figure 4 is a cross-sectional view of B-B in Figure 3;
  • FIG. 5 is a schematic diagram of a spacer column before forming an alignment film on a display substrate in a display panel
  • FIG. 6 is a schematic diagram of a display panel including the display substrate shown in FIG. 5 in a dark state;
  • FIG. 7 is a schematic diagram of a structure of a display substrate using BPS technology
  • FIG. 8 is a schematic diagram of the middle area of the pixel area after the alignment film is formed by the primary transfer on the display substrate shown in FIG. 7;
  • FIG. 9 is a schematic diagram of the side portion of the spacer column after the alignment film is formed by the primary transfer in the display substrate shown in FIG. 7;
  • FIG. 10 is a schematic diagram of the middle area of the pixel area after the alignment film is formed by two transfers in the display substrate shown in FIG. 7;
  • FIG. 11 is a schematic diagram of the side of the spacer column after the alignment film is formed by two transfers in the display substrate shown in FIG. 7;
  • FIG. 12 is a schematic diagram of the display panel in a dark state after the alignment film is formed by the primary transfer
  • FIG. 13 is a schematic diagram of the display panel in a dark state after two transfers to form an alignment film
  • FIG. 14 is a schematic top view of the structure of the display substrate according to the first embodiment of the disclosure.
  • Fig. 15 is a schematic diagram of the C-C cross-sectional structure in Fig. 14;
  • Figure 16 is a schematic diagram of the capillary structure
  • FIG. 17 is a schematic diagram of the working state of the display panel shown in FIG. 2;
  • 18a is a schematic diagram of the working state of the display panel adopting BPS technology
  • 18b is a schematic diagram of the amount of light leakage of the display panel shown in FIG. 18a when the spacer is made of BPS material;
  • FIG. 18c is a schematic diagram of the amount of light leakage of the display panel shown in FIG. 18a when the isolation column according to the embodiment of the present disclosure is adopted;
  • FIG. 19a is a schematic diagram of a structure after forming pixel electrodes in a display substrate
  • FIG. 19b is a schematic diagram showing the structure after the BPS layer is formed in the substrate.
  • 19c is a schematic diagram showing the structure after forming a hydrophobic material layer in the substrate.
  • FIG. 19d is a schematic diagram showing the structure after the adjustment layer is formed in the substrate.
  • FIG. 1 is a schematic diagram of the structure of an ADS mode display panel
  • FIG. 2 is a cross-sectional view of A-A in FIG. 1.
  • the ADS mode display panel includes a display substrate and a color filter substrate that are arranged oppositely.
  • a pixel electrode 11, a data line 12 and a common electrode 13 are provided on the display substrate, and the pixel electrode 11, the data line 12 and the common electrode 13 are respectively located in different layers.
  • a black matrix 21 is provided on the color filter substrate, and the black matrix 21 is used to block light leakage. There is a voltage difference between the data line 12 and the pixel electrode 11 and the data line 13 and the common electrode 13.
  • the usual method is to increase the width of the corresponding black matrix 21, which makes the width of the black matrix more than 31 ⁇ m. A black matrix of this width will cause the aperture ratio of the display panel to decrease.
  • FIG. 3 is a schematic structural diagram of an ADS mode display panel adopting BPS technology
  • FIG. 4 is a cross-sectional view of B-B in FIG. 3.
  • the isolation pillars 14 made of BPS material are fabricated on the display substrate.
  • the isolation pillars 14 are located between adjacent pixel regions, and the isolation pillars 14 can function as spacers.
  • the BPS material is a black resin material, for example, a black negative photoresist.
  • the thickness of the spacer is about 2 ⁇ m.
  • the pixel electrode 11, the data line 12 and the common electrode 13 are provided on the display substrate, and the pixel electrode 11, the data line 12 and the common electrode 13 are respectively located in different layers.
  • the display substrate is also provided with an isolation pillar 14 above the data line 12 and the common electrode 13. Under the action of the isolation column 14, the light leakage on both sides of the data line 12 is about 0. Therefore, compared with the width of the black matrix 21 in FIG. 1 and FIG. 2 of 31 ⁇ m, the display panel shown in FIG. 3 and FIG.
  • the width of the black matrix 21 can be reduced to 22 ⁇ m, which greatly increases the aperture ratio of the display panel.
  • the liquid crystal in the space above the data line 12 in the liquid crystal layer is replaced by a BPS material (a black resin material), which results in a decrease in the amount of liquid crystal due to electric field disturbances, and thus weakened light leakage in the dark state.
  • a BPS material a black resin material
  • the BPS material can shield the electric field around the data line 12, thereby reducing or even disappearing the turbulent electric field.
  • the disordered liquid crystal caused by the electric field weakens or disappears.
  • Simulation results show that for 75 8K panels, the transmittance can be increased to 60% after using BPS On Array technology.
  • FIG. 5 is a schematic diagram of the spacers 14 before the alignment film 15 is formed on the display substrate in a display panel
  • FIG. 6 is a schematic diagram of the display panel including the display substrate shown in FIG. 5 in a dark state.
  • the display panel has a problem of light leakage in the pixel area in the dark state. Specifically, in the dark state, the pixel area is densely dotted with light leakage, which seriously affects the contrast and normal display of the display panel.
  • FIG. 7 is a schematic diagram of a structure of a display substrate using BPS technology.
  • the display substrate includes a plurality of pixel regions arranged in an array.
  • the display substrate includes a base 10 and a pixel electrode 11 disposed on the base 10 and located in the pixel area.
  • the display substrate further includes isolation pillars 14 made of BPS material disposed on the base 10 on both sides of the pixel electrode 11.
  • An alignment film 15 is provided on the pixel electrode 11. Generally, the alignment film 15 is formed on the pixel electrode 11 by a transfer process.
  • FIG. 8 is an SEM photograph of the middle area of the pixel area after the alignment film is formed by the primary transfer on the display substrate shown in FIG. 7, and FIG. 9 is the SEM photograph of the side of the spacer column after the alignment film is formed by the primary transfer on the display substrate shown in FIG. 7;
  • FIG. 10 is an SEM photograph of the middle area of the pixel area after the alignment film is formed by two transfers in the display substrate shown in FIG. 7, and
  • FIG. 11 is an SEM of the side of the spacer column after the alignment film is formed in the display substrate in FIG. photo.
  • the thickness of the alignment film 15 in the general display substrate is greater than 600 angstroms, the contrast and normal display of the display panel can be ensured.
  • the thickness of the alignment film 15 is expected to reach 900 angstroms.
  • the alignment film 15 located in the middle area of the pixel has a thickness of about 100 angstroms, and is located on the side of the spacer 14 (ie The thickness of the alignment film 15 at the position where the alignment film 15 is close to the spacer 14) is about 2000 angstroms.
  • the thickness of the alignment film 15 can only be adjusted by increasing the number of transfer processes.
  • the thickness of the alignment film 15 located in the middle area of the pixel is about 120 angstroms, and the thickness of the alignment film 15 located at the side of the spacer 14 (that is, the alignment film 15 is close to the spacer 14
  • the thickness of the alignment film 15 is about 3000 angstroms. Therefore, the method of increasing the number of transfer processes cannot effectively increase the thickness of the alignment film 15 in the middle region of the pixel, but instead causes the alignment film 15 on both sides of the spacer 14 to accumulate.
  • FIG. 12 is a schematic diagram of the display panel in a dark state after the alignment film 15 is formed by the first transfer
  • FIG. 13 is a schematic diagram of the display panel in the dark state after the alignment film 15 is formed by two transfers.
  • the thickness of the alignment film 15 in the middle area of the pixel is about 100 angstroms, and the thickness of the alignment film 15 near the spacer 14 is about 2000 angstroms, which is about 20 times different in thickness.
  • the inventor found that with the display substrate structure as shown in FIG. 7, when the alignment film 15 is formed in the pixel area, the thickness of the alignment film 15 is difficult to reach more than 600 angstroms, so that grooves are formed by rubbing the alignment film 15 After that, the riveting force of the alignment film 15 in the pixel area is insufficient, which causes the liquid crystal in the pixel area to be disordered, and the dot-like light leakage problem in the pixel area occurs, resulting in abnormal display.
  • the display substrate includes a plurality of pixel areas arranged in an array.
  • the display substrate includes: a base; pixel electrodes arranged on the base and located in the pixel area; isolation pillars arranged on the base and located between two adjacent pixel areas in the row direction Meanwhile, the side surface of the spacer has hydrophobic characteristics; and, the alignment film is disposed on the pixel electrode and is located in the pixel area, and the edges of the opposite sides of the alignment film in the row direction are in contact with the side surface of the spacer, and the alignment film is away from the substrate
  • the surface of one side is gradually convex from both sides toward the middle in the row direction.
  • the upper surface of the formed alignment film is gradually convex from both sides toward the middle. This makes the thickness of the middle position of the alignment film greater than the thickness of the two sides, that is, the thickness of the alignment film in the middle position of the pixel area is greater than the thickness of the two sides, so that it is easier to form a higher thickness alignment film in the pixel area.
  • the thickness of the alignment film in the pixel area is more than 600 angstroms.
  • the grooves are formed by rubbing, a good rubbing effect can be formed in the pixel area, improving the riveting force of the alignment film in the pixel area, avoiding the disorder of the liquid crystal in the pixel area, thereby avoiding light leakage problems and display abnormalities, and improving the contrast and display of the display. Display quality.
  • the display substrate includes a plurality of pixel regions 100 arranged in an array.
  • the display substrate includes a base 10 and a pixel electrode 11 disposed on the base 10 and located in the pixel area 100.
  • the display substrate adopts the BPS technology. Therefore, the display substrate further includes an isolation column 14 disposed on the base 10 between two adjacent pixel regions 100 in the row direction, and the side surface of the isolation column 14 has hydrophobic characteristics.
  • the display substrate further includes an alignment film 15 disposed on the pixel electrode 11, and the alignment film 15 is located in the pixel area. The edges on the opposite sides of the alignment film 15 in the row direction are in contact with the side surfaces of the spacers 14, and the surface of the alignment film 15 facing away from the substrate 10 has a gradually convex shape from both sides toward the middle in the row direction.
  • the material of the alignment film 15 is usually a polyimide solution with hydrophilic properties.
  • the side surface of the spacer 14 is set to have hydrophobic characteristics, so that when the polyimide solution is formed in the pixel area between the spacers 14, the upper surface of the polyimide solution is in line.
  • the direction will show a gradually convex shape from both sides to the middle, and thus, the upper surface of the obtained alignment film 15 will also show a gradually convex shape from both sides to the middle in the row direction.
  • the thickness of the middle position of the alignment film 15 greater than the thickness of the two sides, and the thickness of the alignment film 15 in the row direction gradually increases from both sides to the middle, that is, the thickness of the alignment film 15 in the middle of the pixel area is greater than the thickness of the two sides.
  • the thickness of the location Compared with the structure shown in FIG. 7, it is easier to form an alignment film with a larger thickness in the pixel area, and it is easy to make the thickness of the alignment film 15 in the pixel area reach more than 600 angstroms.
  • the grooves are formed by rubbing, a good rubbing effect can be formed in the pixel area, improving the riveting force of the alignment film in the pixel area, avoiding the disorder of the liquid crystal in the pixel area, thereby avoiding light leakage problems and display abnormalities, and improving the contrast and display of the display. Display quality.
  • the display substrate may also include a thin film transistor and a passivation layer disposed between the substrate 10 and the pixel electrode 11.
  • the pixel electrode 11 is located on the passivation layer and passes through the passivation layer through the via hole and the thin film transistor.
  • the source electrode or the drain electrode is electrically connected.
  • the isolation column 14 may include a BPS layer 141 disposed on the substrate 10 and a hydrophobic material layer 142 disposed on the outer surface of the BPS layer 141.
  • the hydrophobic material layer 142 makes the side surface of the spacer 14 have hydrophobic characteristics.
  • the outer surface of the isolation column can be subjected to hydrophobic treatment.
  • Figure 16 is a schematic diagram of the capillary structure. As shown in Figure 16, in some capillaries whose linearity is small enough to be compared with the radius of curvature of the liquid meniscus, the entire liquid surface in the capillary will become curved, and the interaction between liquid and solid molecules can expand. To the whole liquid. Common capillary phenomena in daily life, for example, water rises in the thin glass tube because it can wet the glass; conversely, mercury drops in it because it can't wet the glass. The reason lies in the liquid surface tension and the pressure difference between the inside and outside of the curved surface.
  • the BPS material is an acrylic resin material containing a large amount of propylene glycol, which is a hydrophilic material, and the contact angle between the BPS material and water is about 60°-70°.
  • the BPS material can be a black resin material, such as a black negative photoresist.
  • the polyimide (PI) solution is a typical hydrophilic material, and the contact angle of the PI solution is about 80°.
  • the side surface of the spacer 14 has hydrophobic characteristics, so that when the PI solution is formed in the pixel area, the interface between the PI solution and the spacer 14 is a non-wetting interface, so that the upper surface of the formed alignment film 15
  • the surface has a gradually convex shape from both sides toward the middle, so that the thickness of the alignment film 15 at the middle position of the pixel area is greater than the thickness at both sides.
  • the material of the hydrophobic material layer 142 may include Teflon.
  • the Teflon material has strong hydrophobic properties, and can form a strong hydrophobic interface on the outer surface of the BPS layer 141, so that the hydrophilic PI solution can form a thick and thin interface on both sides due to capillary action, which is conducive to the formation of Figure 15
  • the alignment film 15 with the shown structure can easily form a good rubbing effect in the pixel area when rubbing to form grooves.
  • FIG. 17 is a schematic diagram of the working state of the display panel shown in FIG. 2. As shown in FIG. 17, there is a voltage difference between the data line 12 and the common electrode 13. Therefore, an electric field is formed between the data line 12 and the common electrode 13, causing light leakage on both sides of the data line 12.
  • FIG. 18a is a schematic diagram of the working state of the display panel using BPS technology
  • FIG. 18b is a schematic diagram of the light leakage of the display panel when the spacer 14 is made of BPS material
  • FIG. 18c is a schematic diagram of the light leakage of the display panel when the spacer provided by an embodiment of the present disclosure is used .
  • the isolation column 14 contains BPS material, and the isolation column can function as a black matrix. Therefore, in the display panel shown in FIG. 18a, the color filter substrate may not be provided with a black matrix.
  • the spacer 14 includes a BPS layer 141 and a hydrophobic material layer 142 disposed on the outer surface of the BPS layer 141.
  • the BPS layer 141 can block light so that the spacer 14 Can play the role of black matrix.
  • the material of the hydrophobic material layer 142 includes Teflon material.
  • the dielectric constant of Teflon material is less than 2.1, and the dielectric constant of BPS material is about 3.5. Compared with BPS material, the dielectric constant of Teflon material is smaller.
  • the hydrophobic material layer 142 including Teflon material can be more
  • the BPS layer is well shielded, so that the dielectric constant of the isolation column 14 is reduced to about 2.5, which avoids poor display caused by the orientation of the electric field at the bottom corner of the isolation column 14, and further reduces light leakage on both sides of the isolation column compared to FIG. 18b. As shown in FIG. 18c, the amount of light leakage on both sides of the isolation column 14 shown in FIG. 18c is greatly reduced compared to the amount of light leakage on both sides of the isolation column 14 shown in FIG. 18b.
  • the display substrate may further include an adjustment layer 17 located in the pixel area, and the adjustment layer 17 is disposed between the pixel electrode 11 and the alignment film 15. , The edges on the opposite sides of the row direction adjustment layer 17 are in contact with the side surfaces of the isolation column 14. The surface of the adjustment layer 17 in contact with the alignment film 15 has a shape gradually recessed from both sides toward the middle in the row direction.
  • the surface of the adjustment layer 17 facing the alignment film is gradually recessed from both sides toward the middle, that is, the upper surface of the adjustment layer 17 is concave, as shown in FIG. 15, and the thickness of the adjustment layer 17 is in line.
  • the direction is gradually narrowing from both sides to the middle. Therefore, when the alignment film 15 is formed on the adjustment layer 17, the thickness of the alignment film 15 at the middle position can be further increased, which is more conducive to the formation of the alignment film 15 with a thickness greater than 600 angstroms in the pixel area, and is more conducive to the formation of the alignment film 15 in the pixel area.
  • the good rubbing effect further improves the rivet force of the alignment film 15 in the pixel area and avoids the disorder of the liquid crystal in the pixel area.
  • the arrangement of the adjustment layer 17 can also flatten the poor liquid crystal orientation caused by the surface burrs of the pixel electrode 11, and improve the display effect.
  • the material of the adjustment layer 17 may be a hydrophobic material
  • the material of the adjustment layer 17 is a long-chain molecule
  • the material of the adjustment layer 17 is a material containing a large amount of lipid groups. Therefore, the adjustment layer 17 and the Teflon-containing hydrophobic material layer 16 have good wettability, so that the surface of the adjustment layer 17 facing the alignment film 15 has a shape gradually recessed from both sides toward the middle.
  • the display panel using the display substrate provided by the embodiments of the present disclosure is an ADS mode display panel.
  • embodiments of the present disclosure also provide a method for manufacturing a display substrate as shown in FIG. 15, the display substrate includes a plurality of pixel regions 100 arranged in an array, and the manufacturing method includes:
  • S2 An alignment film located in the pixel area is formed on the pixel electrode, and the edges on opposite sides of the alignment film in the row direction are in contact with the side surface of the spacer.
  • the surface of the alignment film facing away from the substrate faces from both sides in the row direction A gradually convex shape in the middle.
  • an isolation column located between two adjacent pixel regions in the row direction is formed on the substrate, and the side surface of the isolation column has hydrophobic characteristics, which specifically includes:
  • a hydrophobic material layer is formed on the outer surface of the BPS layer.
  • the material of the hydrophobic material layer may include Teflon.
  • step S2 before the above step S2, it may further include:
  • An adjustment layer located in the pixel area is formed on the pixel electrode, and the edges on the opposite sides of the adjustment layer in the row direction are in contact with the side surface of the spacer.
  • the contact surface of the adjustment layer and the alignment film is gradually recessed from both sides toward the middle in the row direction shape.
  • the material of the adjustment layer may include a hydrophobic material.
  • the alignment film may be formed by a transfer process.
  • the above step S1 may specifically include:
  • the BPS layer, the hydrophobic material layer, and the pixel electrode may be sequentially formed, or the BPS layer, the pixel electrode, and the hydrophobic material layer may be sequentially formed. Therefore, in specific implementation, the order of forming the BPS layer, the hydrophobic material layer and the pixel electrode is not limited, as long as the structure shown in FIG. 15 can be formed.
  • forming an alignment film on the adjustment layer may include:
  • the temperature at which the first sub-alignment film and the polyimide solution are heated can be selected according to actual needs, and is usually 180°C to 250°C.
  • the method for preparing the above-mentioned display substrate provided by the embodiments of the present disclosure will be described in detail below with the specific process of preparing the display substrate.
  • the "patterning process" mentioned in the embodiment includes treatments such as photoresist coating, mask exposure, development, etching, and photoresist stripping, and is an existing mature preparation process.
  • the coating can use a known coating process, which is not specifically limited here.
  • Figure 19a is a schematic diagram of the structure after forming a pixel electrode in the display substrate
  • Figure 19b is a schematic diagram of the structure after forming a BPS layer in the display substrate
  • Figure 19c is a schematic diagram of the structure after forming a hydrophobic material layer in the display substrate
  • Figure 19d is a schematic diagram of the structure formed in the display substrate Schematic diagram of the structure after the adjustment layer.
  • the pixel electrode 11 located in the pixel area 100 is formed on the substrate 10, specifically, a pixel electrode film is formed on the substrate 10, and the pixel electrode 11 located in the pixel area is formed by a patterning process, as shown in FIG. 19a.
  • the material of the pixel electrode 11 may include indium tin oxide.
  • a BPS layer 141 located between two adjacent pixel regions in the row direction is formed on the substrate 10. Specifically, a BPS film is formed on the substrate 10 on which the pixel electrodes 11 are formed, and a layer of photoresist is coated on the BPS film; Use a single-tone mask to expose and develop the photoresist, form an unexposed area at the BPS layer pattern position, retain the photoresist, and form a fully exposed area at other positions without photoresist and BPS film; strip off the remaining light Resist to form the BPS layer, as shown in Figure 19b.
  • the material of the BPS layer 141 is BPS material.
  • a hydrophobic material layer 142 covering the outer surface of the BPS layer 141 is formed on the BPS layer 141.
  • a hydrophobic material film is formed on the substrate 10 on which the BPS layer 141 is formed, and a layer of photoresist is coated on the hydrophobic material film;
  • the single-tone mask exposes and develops the photoresist and peels off the remaining photoresist to form a hydrophobic material layer 142 covering the outer surface of the BPS layer 14, as shown in FIG. 19c.
  • the material of the hydrophobic material film includes Teflon.
  • the adjustment layer 17 located in the pixel area is formed on the substrate 10, specifically, the adjustment layer 17 located on the pixel electrode 11 is formed in the pixel area through a coating process, as shown in FIG. 19d.
  • the material of the adjustment layer is a hydrophobic material
  • the material of the adjustment layer 17 is a long-chain molecule
  • the material of the adjustment layer 17 is a material containing a large amount of lipid groups.
  • the material of the adjustment layer 17 may include polyacrylonitrile or polycarbonate, etc. .
  • a polyacrylonitrile solution or a polycarbonate solution or the like can be coated on the pixel area to evaporate the solvent component to form the adjustment layer 17.
  • the material of the adjustment layer 17 has hydrophobic properties.
  • the hydrophobic material solution forming the adjustment layer 17 and the hydrophobic material layer 142 containing Teflon have good wettability. Therefore, when the adjustment layer 17 is coated and formed in the pixel area, both sides of the adjustment layer 17 are in contact with the hydrophobic material layer 142, and the upper surface of the adjustment layer 17 will be concave, that is, the upper surface of the adjustment layer 17 is self-aligning. The shape is gradually concave toward the center.
  • the first sub-alignment film located in the pixel area is formed on the adjustment layer 17 by an imprinting process, specifically, the first sub-alignment film is formed on the adjustment layer 17 by an imprinting process.
  • the polyimide solution is formed on the first sub-alignment film through the transfer process, and the first sub-alignment film and the polyimide solution are heated to evaporate the solvent component to form the alignment film 15, as shown in FIG. 15.
  • the material of the alignment film is polyimide
  • both sides of the alignment film are in contact with the hydrophobic material layer
  • the surface of the alignment film facing away from the pixel electrode 11 that is, the upper surface of the alignment film 15
  • the embodiments of the present disclosure also provide a display panel.
  • the display panel includes the display substrate provided in the foregoing embodiments, and a box-matching substrate disposed opposite to the display substrate.
  • the display substrate may be an array substrate
  • the matching substrate may be a color filter substrate.
  • the color filter substrate includes a second substrate and a color filter layer disposed on the second substrate and corresponding to the pixel area.
  • the color filter layer may include a blue color film, a green color film, and a red color film.
  • the color filter substrate also includes a protective layer and the like arranged on the color filter layer.
  • the embodiments of the present disclosure also provide a display device.
  • the display device includes the display panel provided in the foregoing embodiments, and the display device can be any product or component with display function, such as a mobile phone, a tablet computer, a television, a monitor, a notebook computer, a digital photo frame, a navigator, and the like.
  • connection should be construed broadly, for example, they may be fixed connections or Removable connection or integral connection; it can be mechanical connection or electrical connection; it can be directly connected or indirectly connected through an intermediate medium, and it can be the internal communication between two components.
  • installation should be construed broadly, for example, they may be fixed connections or Removable connection or integral connection; it can be mechanical connection or electrical connection; it can be directly connected or indirectly connected through an intermediate medium, and it can be the internal communication between two components.
  • connection should be construed broadly, for example, they may be fixed connections or Removable connection or integral connection; it can be mechanical connection or electrical connection; it can be directly connected or indirectly connected through an intermediate medium, and it can be the internal communication between two components.

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Abstract

一种显示基板及制备方法、显示面板、显示装置。显示基板包括多个呈阵列排布的像素区，显示基板包括：基底（10）；像素电极（11），设置在基底（10）上且位于像素区；隔离柱（14），设置在基底（10）上且位于行方向相邻两个像素区之间，隔离柱（14）的侧表面具有疏水特性；取向膜（15），设置在像素电极（11）上且位于像素区，在行方向取向膜（15）相对两侧的边缘均与隔离柱（14）的侧表面接触，取向膜（15）的背离基底（10）一侧的表面在行方向呈自两侧朝向中间逐渐凸起的形状。显示基板更容易在像素区形成更高厚度的取向膜（15），从而提高像素区取向膜（15）的铆定力，避免像素区液晶紊乱，进而避免了漏光问题和显示异常，提高了显示的对比度和显示品质。

Description

显示基板及其制备方法、显示面板、显示装置
相关申请的交叉引用
本公开要求在2019年06月14日提交中国专利局、申请号为201910516305.0、申请名称为“一种阵列基板及其制备方法、显示面板”的中国专利申请的优先权，其全部内容通过引用结合在本公开中。
技术领域
本公开涉及显示技术领域，具体涉及一种显示基板及其制备方法、显示面板、显示装置。
背景技术
在ADS模式的显示面板中，数据线与公共电极之间的电场会导致在数据线两侧漏光。为了降低数据线两侧漏光，通常的方法为增加对应的黑矩阵的宽度，会导致显示面板开口率下降。
发明内容
本公开实施例提供了一种显示基板，包括：
基底，包括多个呈阵列排布的像素区；
像素电极，位于各所述像素区内；
隔离柱，位于行方向相邻的两个所述像素区之间，所述隔离柱的侧表面具有疏水特性；以及，
取向膜，位于各所述像素区内且在所述像素电极背离所述基底的一侧，在行方向所述取向膜相对两侧的边缘均与所述隔离柱的侧表面接触，所述取向膜的背离所述基底一侧的表面在行方向呈自两侧朝向中间逐渐凸起的形状。可选地，所述取向膜的厚度在行方向呈自两侧朝向中间逐渐增加的趋势。
可选地，所述隔离柱包括位于所述基底上的BPS层以及位于所述BPS层外 表面的疏水材料层。
可选地，所述疏水材料层的材质包括特氟龙。
可选地，所述显示基板还包括位于所述像素区内且在所述像素电极和所述取向膜之间的调节层，在行方向所述调节层相对两侧的边缘均与所述隔离柱的侧表面接触，所述调节层与所述取向膜接触的表面在行方向呈自两侧朝向中间逐渐凹陷的形状。
可选地，所述调节层的厚度在行方向呈自两侧朝向中间逐渐缩小的趋势。
可选地，所述调节层的材质包括疏水材料。
可选地，所述像素电极包括多个间隔设置的电极条。
本公开实施例还提供了一种显示基板的制备方法，所述制备方法包括：
在基底的像素区内形成像素电极，在行方向相邻的两个所述像素区之间形成隔离柱，所述隔离柱的侧表面具有疏水特性；
在各所述像素区内形成位于所述像素电极之上的取向膜，在行方向所述取向膜相对两侧的边缘均与所述隔离柱的侧表面接触，所述取向膜的背离所述基底一侧的表面在行方向呈自两侧朝向中间逐渐凸起的形状。
可选地，在行方向相邻的两个所述像素区之间形成隔离柱，具体包括：
在行方向相邻的两个所述像素区之间形成BPS层；
在所述BPS层的外表面形成疏水材料层。
可选地，所述疏水材料层的材质包括特氟龙。
可选地，通过转印工艺形成所述取向膜。
可选地，在各所述像素区内形成位于所述像素电极之上的取向膜，具体包括：
通过压印工艺在所述像素电极上形成位于像素区的第一子取向膜；
通过转印工艺在所述第一子取向膜上形成聚酰亚胺溶液；
对所述第一子取向膜和所述聚酰亚胺溶液进行加热处理，形成所述取向膜。
可选地，在各所述像素区内形成位于所述像素电极之上的取向膜之前， 还包括：
在各所述像素区内形成位于所述像素电极之上的调节层，在行方向所述调节层相对两侧的边缘均与所述隔离柱的侧表面接触，所述调节层与所述取向膜接触的表面在行方向呈自两侧朝向中间逐渐凹陷的形状。
可选地，所述调节层的材质包括疏水材料。
可选地，采用涂覆工艺形成所述调节层。
本公开实施例还提供了一种显示面板，包括如上所述的显示基板。
本公开实施例还提供了一种显示装置，包括如上所述的显示面板。
附图说明
图1为一种ADS模式显示面板的结构示意图；
图2为图1中的A-A截面视图；
图3为一种采用BPS技术的ADS模式显示面板的结构示意图；
图4为图3中的B-B截面视图；
图5为一种显示面板中显示基板在形成取向膜前隔离柱的示意图；
图6为包含图5所示显示基板的显示面板在暗态下的示意图；
图7为一种采用BPS技术显示基板的结构示意图；
图8为图7所示显示基板中一次转印形成取向膜后像素区中间区域的示意图；
图9为图7所示显示基板中一次转印形成取向膜后隔离柱侧部的示意图；
图10为图7所示显示基板中两次转印形成取向膜后像素区中间区域的示意图；
图11为图7所示显示基板中两次转印形成取向膜后隔离柱侧部的示意图；
图12为一次转印形成取向膜后显示面板在暗态下的示意图；
图13为两次转印形成取向膜后显示面板在暗态下的示意图；
图14为本公开第一实施例显示基板的俯视结构示意图；
图15为图14中的C-C截面结构示意图；
图16为毛细现象结构示意图；
图17为图2所示显示面板工作状态示意图；
图18a为采用BPS技术的显示面板的工作状态示意图；
图18b为隔离柱为BPS材料时图18a所示显示面板的漏光量示意图；
图18c为采用本公开实施例隔离柱时图18a所示显示面板的漏光量示意图；
图19a为显示基板中形成像素电极后的结构示意图；
图19b为显示基板中形成BPS层后的结构示意图；
图19c为显示基板中形成疏水材料层后的结构示意图；
图19d为显示基板中形成调节层后的结构示意图。
具体实施方式
为使本公开的目的、技术方案和优点更加清楚明白，下文中将结合附图对本公开的实施例进行详细说明。需要说明的是，在不冲突的情况下，本公开中的实施例及实施例中的特征可以相互任意组合。
图1为一种ADS模式显示面板的结构示意图，图2为图1中的A-A截面视图。如图1和图2所示，ADS模式显示面板包括相对设置的显示基板和彩膜基板。显示基板上设置有像素电极11、数据线12和公共电极13，像素电极11、数据线12和公共电极13分别位于不同层。彩膜基板上设置有黑矩阵21，黑矩阵21用于遮挡漏光。数据线12与像素电极11、数据线13与公共电极13之间均存在电压差，因此，数据线12与像素电极11之间、数据线12与公共电极13之间均存在电场。数据线12与公共电极13之间的电场会导致在数据线12两侧漏光。为了降低数据线两侧漏光，通常的方法为增加对应的黑矩阵21的宽度，这就使得黑矩阵的宽度需要达到31μm以上。这个宽度的黑矩阵，会导致显示面板开口率下降。
为了降低数据线两侧漏光，同时提高显示面板的开口率，显示面板采用BPS On Array技术，即在显示基板上采用BPS(Black Photo Spacer，黑色间隙控制材料)技术。图3为一种采用BPS技术的ADS模式显示面板的结构示意图， 图4为图3中的B-B截面视图。如图3和图4所示，在显示基板上制作BPS材料的隔离柱14，隔离柱14位于相邻像素区之间，隔离柱14可以起到隔离子的作用。BPS材料为黑色树脂材料，例如，黑色负性光刻胶等。隔离柱的厚度约为2μm。如图3和图4所示，显示基板上设置有像素电极11、数据线12和公共电极13，像素电极11、数据线12和公共电极13分别位于不同层。显示基板上还设置有位于数据线12和公共电极13上方的隔离柱14。在隔离柱14的作用下，数据线12两侧的漏光约为0，从而，相比于图1和图2中的黑矩阵21的宽度31μm，图3和图4所示的显示面板中的黑矩阵21的宽度可以降低到22μm，大幅度提高了显示面板的开口率。
采用BPS ON Array技术提高显示面板开口率的原理简述如下：
1、液晶层中位于数据线12上方空间里的液晶被BPS材料(一种黑色树脂材料)替代，从而，导致因电场紊乱的液晶量减少，所以暗态漏光减弱。
2、因BPS材料的介电常数(ε＝3.5)低于液晶的介电常数(ε＝6.5)，因此BPS材料可以起到屏蔽数据线12周边电场的作用，从而使得紊乱电场减弱甚至消失，因电场引起的紊乱液晶减弱或消失。
模拟结果：由模拟结果可知对于75 8K面板，采用BPS On Array技术后，其透过率可以提高到60％。
图5为一种显示面板中显示基板在形成取向膜15前隔离柱14的示意图，图6为包含图5所示显示基板的显示面板在暗态下的示意图。如图6所示，该显示面板在暗态下出现像素区漏光问题。具体表现为，在暗态下，像素区密布点状漏光，该漏光严重影响了显示面板的对比度和正常显示。经发明人研究发现，在形成取向膜前，显示基板上未出现BPS材料残留问题，因此，发明人提出该漏光问题出现在对盒工艺阶段。
图7为一种采用BPS技术显示基板的结构示意图。如图7所示，显示基板包括多个呈阵列排布的像素区。显示基板包括基底10以及设置在基底10上且位于像素区的像素电极11。显示基板还包括设置在基底10上位于像素电极11两侧的BPS材料的隔离柱14。像素电极11上设置有取向膜15。通常，采用转印工 艺在像素电极11上形成取向膜15。
图8为图7所示显示基板中一次转印形成取向膜后像素区中间区域的SEM照片，图9为图7所示显示基板中一次转印形成取向膜后隔离柱侧部的SEM照片；图10为图7所示显示基板中两次转印形成取向膜后像素区中间区域的SEM照片，图11为图7所示显示基板中两次转印形成取向膜后隔离柱侧部的SEM照片。
如图7所示，一般显示基板中取向膜15的厚度大于600埃时可以保证显示面板的对比度和正常显示，实际中，期望取向膜15的厚度可以达到900埃。经发明人研究发现，如图8～图11所示，采用一次转印工艺形成取向膜15时，位于像素中间区域的取向膜15的厚度约为100埃，而位于隔离柱14侧部(即取向膜15靠近隔离柱14的位置)的取向膜15的厚度约为2000埃。由于转印工艺中取向膜15厚度调节空间有限，因此，只能通过增加转印工艺次数来调整取向膜15厚度。然而，发明人研究发现，采用两次转印工艺形成取向膜15时，位于像素中间区域的取向膜15的厚度约为120埃，而位于隔离柱14侧部(即取向膜15靠近隔离柱14的位置)的取向膜15的厚度约为3000埃。因此，通过增加转印工艺次数的方法并不能有效增加像素中间区域取向膜15的厚度，反而造成隔离柱14两侧的取向膜15堆积。
图12为一次转印形成取向膜15后显示面板在暗态下的示意图，图13为两次转印形成取向膜15后显示面板在暗态下的示意图。通过对比图12和图13，两次转印形成取向膜15与一次转印形成取向膜15相比，漏光问题并没有得到改善。
如图8和图9所示，取向膜15在像素中间区域厚度约为100埃，而取向膜15在靠近隔离柱14位置的厚度约为2000埃，厚度相差约20倍。经过发明人进一步研究发现，采用如图7所示的显示基板结构，当在像素区形成取向膜15后，取向膜15的厚度很难达到大于600埃，从而在对取向膜15摩擦形成沟槽后，像素区取向膜15的铆定力不足，导致像素区液晶紊乱，从而出现像素区点状漏光问题，导致显示异常。
为了解决上述技术问题，本公开实施例提出了一种显示基板。该显示基板包括多个呈阵列排布的像素区，显示基板包括：基底；像素电极，设置在基底上且位于像素区；隔离柱，设置在基底上且位于行方向相邻两个像素区之间，隔离柱的侧表面具有疏水特性；以及，取向膜，设置在像素电极上且位于像素区，在行方向取向膜相对两侧的边缘均与隔离柱的侧表面接触，取向膜的背离基底一侧的表面在行方向呈自两侧朝向中间逐渐凸起的形状。
本公开实施例提供的上述显示基板，形成的取向膜的上表面呈自两侧朝向中间逐渐凸起的形状。这就使得取向膜中间位置的厚度大于两侧位置的厚度，即取向膜在像素区中间位置的厚度大于两侧位置的厚度，从而，更容易在像素区形成更高厚度的取向膜，很容易使像素区取向膜的厚度达到600埃以上。进而，在摩擦形成沟槽时便可以在像素区形成良好的摩擦效果，提高像素区取向膜的铆定力，避免像素区液晶紊乱，进而避免了漏光问题和显示异常，提高了显示的对比度和显示品质。
图14为本公开实施例提供的显示基板的俯视结构示意图，图15为图14中的C-C截面结构示意图。如图14和图15所示，该显示基板包括多个阵列排布的像素区100。显示基板包括基底10以及设置在基底10上位于像素区100的像素电极11。该显示基板采用BPS技术，因此，显示基板还包括设置在基底10上位于行方向相邻两个像素区100之间的隔离柱14，隔离柱14的侧表面具有疏水特性。显示基板还包括设置在像素电极11上的取向膜15，取向膜15位于像素区。在行方向取向膜15相对两侧的边缘均与隔离柱14的侧表面接触，取向膜15的背离基底10一侧的表面在行方向呈自两侧朝向中间逐渐凸起的形状。
容易理解的是，取向膜15的材质通常为具有亲水性质的聚酰亚胺溶液。本公开实施例的显示基板，将隔离柱14的侧表面设置为具有疏水特性，从而当在隔离柱14之间的像素区形成聚酰亚胺溶液时，聚酰亚胺溶液的上表面在行方向会呈现自两侧朝向中间逐渐凸起的形状，从而，得到的取向膜15的上表面在行方向也会呈现自两侧朝向中间逐渐凸起的形状。这就使得取向膜15中间位置的厚度大于两侧位置的厚度，取向膜15的厚度在行方向呈自两侧朝 向中间逐渐增加的趋势，即取向膜15在像素区中间位置的厚度大于两侧位置的厚度。相比于图7所示的结构，更容易在像素区形成更大厚度的取向膜，很容易使像素区取向膜15的厚度达到600埃以上。进而，在摩擦形成沟槽时便可以在像素区形成良好的摩擦效果，提高像素区取向膜的铆定力，避免像素区液晶紊乱，进而避免了漏光问题和显示异常，提高了显示的对比度和显示品质。
容易理解的是，显示基板还可以包括设置在基底10与像素电极11之间的薄膜晶体管和钝化层，像素电极11位于钝化层上，并通过穿过钝化层的过孔与薄膜晶体管的源电极或漏电极电连接。
如图15所示，为了使得隔离柱的侧表面具有疏水特性，隔离柱14可以包括设置在基底10上的BPS层141以及设置在BPS层141外表面上的疏水材料层142。疏水材料层142使得隔离柱14的侧表面具有疏水特性。
当然，也可以通过其它方式使得隔离柱的侧表面具有疏水特性，例如，可以对隔离柱的外表面进行疏水处理等。
图16为毛细现象结构示意图。如图16所示，在一些线度小到足以与液体弯月面的曲率半径相比较的毛细管中发生的现象，毛细管中整个液体表面都将变得弯曲，液固分子间的相互作用可扩展到整个液体。日常生活中常见的毛细现象，例如水因能润湿玻璃而会在细玻璃管中升高；反之，水银却因不能润湿玻璃而在其中下降。究其原因，全在于液体表面张力和曲面内外压强差的作用。如图7所示，BPS材料为含有大量丙二醇类的亚克力类树脂材料，属于亲水材料，且BPS材料与水的接触角约为60°～70°。BPS材料可以为黑色树脂材料，例如黑色负性光刻胶等。聚酰亚胺(PI)溶液为典型的亲水材料，PI溶液的接触角约为80°，因此，在图7中，当在两个由BPS材料形成的隔离柱之间涂覆PI溶液时，PI溶液与BPS材料隔离柱的界面属于浸润界面，类似与水的界面，使得PI溶液的上表面呈自两侧朝向中间逐渐凹陷的形状，从而，取向膜15在靠近隔离柱14的位置的厚度大于取向膜15中间位置的厚度。
在本公开实施例中，在隔离柱14的侧表面具有疏水特性，从而，当在像 素区形成PI溶液时，PI溶液与隔离柱14的界面属于非浸润界面，使得形成的取向膜15的上表面呈自两侧朝向中间逐渐凸起的形状，从而，取向膜15在像素区中间位置的厚度大于两侧位置的厚度。
在一些实施例中，疏水材料层142的材质可以包括特氟龙。特氟龙材质具有较强的疏水特性，可以在BPS层141外表面形成强疏水界面，使得具有亲水性的PI溶液可以因毛细作用而形成中间厚两边薄的界面，有利于形成图15所示结构的取向膜15，从而在摩擦形成沟槽时更容易在像素区形成良好的摩擦效果。
图17为图2所示显示面板的工作状态示意图。如图17所示，数据线12与公共电极13之间存在电压差，因此，数据线12与公共电极13之间形成电场，导致数据线12两侧漏光。
图18a为采用BPS技术的显示面板的工作状态示意图，图18b为隔离柱14为BPS材料时显示面板的漏光量示意图，图18c为采用本公开实施例提供的隔离柱时显示面板的漏光量示意图。如图18a所示，隔离柱14中包含有BPS材料，隔离柱可以起到黑矩阵的作用，因此，在图18a所示的显示面板中，彩膜基板上可以不设置黑矩阵。虽然相比于图17，显示面板的漏光量大大减小，但是当隔离柱为BPS材料时，BPS材料的介电常数约为3.5，使得隔离柱14两侧仍有轻微漏光，如图18b所示。当显示面板采用本公开实施例显示基板中的隔离柱14时，隔离柱14包括BPS层141以及设置在BPS层141外表面上的疏水材料层142，BPS层141可以遮挡光线，使得隔离柱14可以起到黑矩阵的作用。疏水材料层142的材质包括特氟龙材料。特氟龙材料的介电常数小于2.1，BPS材料的介电常数约为3.5，相比于BPS材料，特氟龙材料的介电常数更小，包括特氟龙材质的疏水材料层142可以更好地屏蔽BPS层，使得隔离柱14的介电常数下降为约2.5，避免了隔离柱14底角位置因电场取向引起的显示不良，相比于图18b，进一步降低了隔离柱两侧漏光，如图18c所示，图18c所示隔离柱14两侧的漏光量相比于图18b所示隔离柱14两侧的漏光量大大降低。
为了进一步增加取向膜15在像素区中间位置的厚度，如图15所示，显示 基板还可以包括调节层17，调节层17位于像素区，调节层17设置在像素电极11与取向膜15之间，在行方向调节层17相对两侧的边缘与隔离柱14的侧表面均接触。调节层17与取向膜15接触的表面在行方向呈自两侧朝向中间逐渐凹陷的形状。
具体地，调节层17的朝向取向膜一侧的表面自两侧朝向中间逐渐凹陷，也就是说，调节层17的上表面呈凹面形，如图15所示，并且调节层17的厚度在行方向呈自两侧朝向中间逐渐缩小的趋势。从而，当在调节层17上形成取向膜15时，可以进一步增大取向膜15中间位置的厚度，从而更有利于在像素区形成厚度大于600埃的取向膜15，更有利于在像素区形成良好的摩擦效果，进一步提高像素区取向膜15的铆钉力，避免像素区液晶紊乱。另外，调节层17的设置还可以平坦像素电极11表面毛刺造成的液晶取向不良，提高显示效果。
在一些实施例中，调节层17的材质可以为疏水材料，调节层17的材质为长链分子，调节层17的材质为包含大量脂基的材料。因此，调节层17与包含特氟龙的疏水材料层16具有良好的浸润性，从而，调节层17的朝向取向膜15一侧的表面呈自两侧朝向中间逐渐凹陷的形状。
在一些实施例中，采用本公开实施例提供的显示基板的显示面板为ADS模式显示面板。
基于同一发明构思，本公开实施例还提供了一种如图15所示显示基板的制备方法，该显示基板包括多个阵列排布的像素区100，该制备方法包括：
S1：在基底上形成位于像素区的像素电极以及位于行方向相邻的两个像素区之间的隔离柱，隔离柱的侧表面具有疏水特性；
S2：在像素电极上形成位于像素区的取向膜，在行方向取向膜相对两侧的边缘均与隔离柱的侧表面接触，取向膜的背离基底一侧的表面在行方向呈自两侧朝向中间逐渐凸起的形状。
在一些实施例中，在基底上形成位于行方向相邻的两个像素区之间的隔离柱，隔离柱的侧表面具有疏水特性，具体包括：
在基底上形成位于行方向相邻两个像素区之间的BPS层；
在BPS层的外表面形成疏水材料层。
其中，疏水材料层的材质可以包括特氟龙。
在一些实施例中，在上述步骤S2之前还可以包括：
在像素电极上形成位于像素区的调节层，在行方向调节层相对两侧的边缘均与隔离柱的侧表面接触，调节层与取向膜接触的表面在行方向呈自两侧朝向中间逐渐凹陷的形状。
其中，调节层的材质可以包括疏水材料。
在一些实施例中，可以通过转印工艺形成取向膜。
在一些实施例中，上述步骤S1具体可以包括：
S11:在基底上形成位于像素区的像素电极；
S12：在基底上形成位于行方向相邻的两个像素区之间的BPS层；
S13：在BPS层上形成覆盖BPS层外表面的疏水材料层。
容易理解的是，在另一些实施例中，在S1中，可以依次形成BPS层、疏水材料层和像素电极，或者，依次形成BPS层、像素电极和疏水材料层。因此，在具体实施中，并不限定BPS层、疏水材料层和像素电极的形成顺序，只要可以形成如图15所示的结构即可。
在一些实施例中，在调节层上形成取向膜，可以包括：
S21：通过压印工艺在调节层上形成位于像素区的第一子取向膜；
S22：通过转印工艺在第一子取向膜上形成聚酰亚胺溶液；
S23：对第一子取向膜和聚酰亚胺溶液进行加热处理，形成取向膜。
其中，对第一子取向膜和聚酰亚胺溶液进行加热的温度可以根据实际需要选择，通常为180℃～250℃。
下面以制备显示基板的具体过程详细说明本公开实施例提供的上述显示基板的制备方法。实施例中所说的“构图工艺”包括涂覆光刻胶、掩模曝光、显影、刻蚀、剥离光刻胶等处理，是现有成熟的制备工艺。涂覆可采用已知的涂覆工艺，在此不做具体的限定。
图19a为显示基板中形成像素电极后的结构示意图，图19b为显示基板中形成BPS层后的结构示意图，图19c为显示基板中形成疏水材料层后的结构示意图，图19d为显示基板中形成调节层后的结构示意图。
在基底10上形成位于像素区100的像素电极11，具体地，在基底10上形成像素电极薄膜，通过构图工艺形成位于像素区的像素电极11，如图19a所示。其中，像素电极11的材质可以包括铟锡氧化物。
在基底10上形成位于行方向相邻两个像素区之间的BPS层141，具体地，在形成有像素电极11的基底10上形成BPS薄膜，在BPS薄膜上涂覆一层光刻胶；采用单色调掩膜板对光刻胶进行曝光并显影，在BPS层图案位置形成未曝光区域，保留光刻胶，在其它位置形成完全曝光区域，无光刻胶和BPS薄膜；剥离剩余的光刻胶，形成BPS层，如图19b所示。其中，BPS层141的材质为BPS材料。
在BPS层141上形成覆盖BPS层141外表面的疏水材料层142，具体地，在形成有BPS层141的基底10上形成疏水材料薄膜，在疏水材料薄膜上涂覆一层光刻胶；采用单色调掩膜板对光刻胶进行曝光、显影并剥离剩余的光刻胶，形成覆盖BPS层14外表面的疏水材料层142，如图19c所示。其中，疏水材料薄膜的材质包括特氟龙。
在基底10上形成位于像素区的调节层17，具体地，通过涂覆工艺在像素区形成位于像素电极11上的调节层17，如图19d所示。其中，调节层的材质为疏水材料，调节层17的材质为长链分子，调节层17的材质为包含大量脂基的材料，例如，调节层17的材质可以包括聚丙烯腈或聚碳酸酯等。可以在像素区涂覆聚丙烯腈溶液或聚碳酸酯溶液等，使溶剂成分蒸发后，形成调节层17。调节层17的材质具有疏水特性，因此，形成调节层17的疏水材料溶液与包含特氟龙的疏水材料层142具有良好的浸润性。从而，当在像素区涂覆形成调节层17时，调节层17的两侧均与疏水材料层142接触，并且调节层17的上表面会呈现凹面状，即调节层17的上表面呈自两侧朝向中间逐渐凹陷的形状。
通过压印工艺在调节层17上形成位于像素区的第一子取向膜，具体地， 通过压印工艺在调节层17上形成第一子取向膜。
通过转印工艺在第一子取向膜上形成聚酰亚胺溶液，对第一子取向膜和聚酰亚胺溶液进行加热处理，使溶剂成分蒸发，形成取向膜15，如图15所示。其中，取向膜的材质为聚酰亚胺，取向膜的两侧均与疏水材料层接触，取向膜的背离像素电极11的表面(即取向膜15的上表面)呈自两侧朝向中间逐渐凸起的形状。
基于同一发明构思，本公开实施例还提供了一种显示面板。该显示面板包括前述实施例提供的显示基板，以及与该显示基板相对设置的对盒基板。具体地，显示基板可以为阵列基板，对盒基板可以为彩膜基板。彩膜基板包括第二基底以及设置在第二基底上且与像素区对应的彩膜层，彩膜层可以包括蓝色彩膜、绿色彩膜和红色彩膜。彩膜基板还包括设置在彩膜层上的保护层等。
基于同一发明构思，本公开实施例还提供了一种显示装置。该显示装置包括前述实施例提供的显示面板，显示装置可以为：手机、平板电脑、电视机、显示器、笔记本电脑、数码相框、导航仪等任何具有显示功能的产品或部件。
在本公开实施例的描述中，需要理解的是，术语“中间”、“上”、“下”、“前”、“后”、“竖直”、“水平”、“顶”、“底”、“内”、“外”等指示的方位或位置关系为基于附图所示的方位或位置关系，仅是为了便于描述本公开和简化描述，而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作，因此不能理解为对本公开的限制。
在本公开实施例的描述中，需要说明的是，除非另有明确的规定和限定，术语“安装”、“相连”、“连接”应做广义理解，例如，可以是固定连接，也可以是可拆卸连接，或一体地连接；可以是机械连接，也可以是电连接；可以是直接相连，也可以通过中间媒介间接相连，可以是两个元件内部的连通。对于本领域的普通技术人员而言，可以具体情况理解上述术语在本公开中的具体含义。
虽然本公开所揭露的实施方式如上，但的内容仅为便于理解本公开而采用的实施方式，并非用以限定本公开。任何本公开所属领域内的技术人员，在不脱离本公开所揭露的精神和范围的前提下，可以在实施的形式及细节上进行任何的修改与变化，但本公开的专利保护范围，仍须以所附的权利要求书所界定的范围为准。

Claims (18)

  1. 一种显示基板，其中，包括：
    基底，包括多个呈阵列排布的像素区；
    像素电极，位于各所述像素区内；
    隔离柱，位于行方向相邻的两个所述像素区之间，所述隔离柱的侧表面具有疏水特性；以及，
    取向膜，位于各所述像素区内且在所述像素电极背离所述基底的一侧，在行方向所述取向膜相对两侧的边缘均与所述隔离柱的侧表面接触，所述取向膜的背离所述基底一侧的表面在行方向呈自两侧朝向中间逐渐凸起的形状。
  2. 根据权利要求1所述的显示基板，其中，所述取向膜的厚度在行方向呈自两侧朝向中间逐渐增加的趋势。
  3. 根据权利要求1所述的显示基板，其中，所述隔离柱包括位于所述基底上的BPS层以及位于所述BPS层外表面的疏水材料层。
  4. 根据权利要求3所述的显示基板，其中，所述疏水材料层的材质包括特氟龙。
  5. 根据权利要求1～4中任意一项所述的显示基板，其中，所述显示基板还包括位于所述像素区内且在所述像素电极和所述取向膜之间的调节层，在行方向所述调节层相对两侧的边缘均与所述隔离柱的侧表面接触，所述调节层与所述取向膜接触的表面在行方向呈自两侧朝向中间逐渐凹陷的形状。
  6. 根据权利要求5所述的显示基板，其中，所述调节层的厚度在行方向呈自两侧朝向中间逐渐缩小的趋势。
  7. 根据权利要求5所述的显示基板，其中，所述调节层的材质包括疏水材料。
  8. 根据权利要求1～4中任意一项所述的显示基板，其中，所述像素电极包括多个间隔设置的电极条。
  9. 一种显示基板的制备方法，其中，所述制备方法包括：
    在基底的像素区内形成像素电极，在行方向相邻的两个所述像素区之间形成隔离柱，所述隔离柱的侧表面具有疏水特性；
    在各所述像素区内形成位于所述像素电极之上的取向膜，在行方向所述取向膜相对两侧的边缘均与所述隔离柱的侧表面接触，所述取向膜的背离所述基底一侧的表面在行方向呈自两侧朝向中间逐渐凸起的形状。
  10. 根据权利要求9所述的制备方法，其中，在行方向相邻的两个所述像素区之间形成隔离柱，具体包括：
    在行方向相邻的两个所述像素区之间形成BPS层；
    在所述BPS层的外表面形成疏水材料层。
  11. 根据权利要求10所述的制备方法，其中，所述疏水材料层的材质包括特氟龙。
  12. 根据权利要求9所述的制备方法，其中，通过转印工艺形成所述取向膜。
  13. 根据权利要求9所述的制备方法，其中，在各所述像素区内形成位于所述像素电极之上的取向膜，具体包括：
    通过压印工艺在所述像素电极上形成位于像素区的第一子取向膜；
    通过转印工艺在所述第一子取向膜上形成聚酰亚胺溶液；
    对所述第一子取向膜和所述聚酰亚胺溶液进行加热处理，形成所述取向膜。
  14. 根据权利要求9～13中任意一项所述的制备方法，其中，在各所述像素区内形成位于所述像素电极之上的取向膜之前，还包括：
    在各所述像素区内形成位于所述像素电极之上的调节层，在行方向所述调节层相对两侧的边缘均与所述隔离柱的侧表面接触，所述调节层与所述取向膜接触的表面在行方向呈自两侧朝向中间逐渐凹陷的形状。
  15. 根据权利要求14所述的制备方法，其中，所述调节层的材质包括疏水材料。
  16. 根据权利要求14所述的制备方法，其中，采用涂覆工艺形成所述调 节层。
  17. 一种显示面板，其中，包括权利要求1～8中任意一项所述的显示基板。
  18. 一种显示装置，其中，包括权利要求17所述的显示面板。
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