WO2014176904A1 - 显示装置、彩膜基板及其制作方法 - Google Patents

显示装置、彩膜基板及其制作方法 Download PDF

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Publication number
WO2014176904A1
WO2014176904A1 PCT/CN2013/088982 CN2013088982W WO2014176904A1 WO 2014176904 A1 WO2014176904 A1 WO 2014176904A1 CN 2013088982 W CN2013088982 W CN 2013088982W WO 2014176904 A1 WO2014176904 A1 WO 2014176904A1
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Prior art keywords
sub
pixel units
color
pixel
black matrix
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PCT/CN2013/088982
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English (en)
French (fr)
Inventor
张思凯
吴洪江
王耸
张继凯
黎敏
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京东方科技集团股份有限公司
北京京东方显示技术有限公司
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Publication of WO2014176904A1 publication Critical patent/WO2014176904A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography

Definitions

  • Embodiments of the present invention relate to a display device, a color filter substrate, and a method of fabricating the same. Background technique
  • TFT-LCD Thin Film Transistor-Liquid Crystal Display
  • the TFT-LCD is mainly formed by an array substrate and a color filter substrate, and the cavity behind the cartridge is filled with liquid crystal.
  • the existing color film substrate is generally a color film substrate based on three primary colors of red, green and blue.
  • the liquid crystal panel controls the arrangement state of the liquid crystal molecules by changing the voltage of the driving integrated circuit (IC), and whether the light forming the switch-type selective backlight penetrates. The three primary colors are blended to form different colors, so that the liquid crystal display presents a bright and vivid picture.
  • FIG. 1 it is a schematic structural diagram of a conventional color film substrate, which comprises a substrate ⁇ , a black matrix 2 for shielding light disposed on the substrate ,, and a color pixel layer (including a plurality of pixel units, the pixel unit including at least The red sub-pixel unit 31, the blue sub-pixel unit 33, and the green sub-pixel unit 32, may further include a transparent conductive layer and a protective layer on the color pixel region, as needed.
  • the color film substrate of the conventional structure is formed by a slit coating (Slit Coater) or a spin coating (Spin Coater) coating method, and a black matrix 2 is sequentially formed on the substrate by exposure, and the color pixel layer is formed. And other structures.
  • Embodiments of the present invention provide a display device, a color film substrate, and a method of fabricating the same.
  • a color film substrate comprising: Substrate
  • a color pixel area including a plurality of pixel units, the pixel unit including at least a red sub-pixel unit, a blue sub-pixel unit, and a green sub-pixel unit, wherein each of the color sub-pixel units in the pixel unit is spaced apart from the substrate One side;
  • a black matrix is disposed between the color sub-pixel units.
  • the black matrix is filled in a blank gap between adjacent color sub-pixel units, and the height of the black matrix is less than or equal to the height of the pixel unit.
  • a black matrix located between two adjacent sub-pixel units has a trapezoidal cross section along an arrangement direction of the adjacent two sub-pixel units, and the trapezoid is away from an upper bottom side of the substrate.
  • the length is greater than the length of the lower base adjacent the substrate.
  • the material of the black matrix is a resin material that is opaque to light.
  • the present invention also provides a display device comprising the above-described color filter substrate.
  • a method of fabricating a color filter substrate comprising: forming a color pixel region on a substrate by a patterning process, comprising a plurality of pixel units, the pixel unit including at least a red sub-pixel unit, blue a color sub-pixel unit and a green sub-pixel unit; each of the pixel units in the pixel unit is spaced apart from one side of the substrate;
  • a black matrix is formed between the color sub-pixel units using an inkjet process.
  • the black matrix is made of a resin material that is opaque to light.
  • the step of forming a black matrix between the color sub-pixel units by using an inkjet process includes:
  • the opaque resin material is cured by ultraviolet irradiation or heat treatment to form a black matrix.
  • the height of the black matrix is less than or equal to the height of the pixel unit.
  • a black matrix located between two adjacent sub-pixel units has a trapezoidal cross section along an arrangement direction of the adjacent two sub-pixel units, and the trapezoid is away from an upper bottom side of the substrate.
  • the length is greater than the length of the lower base adjacent the substrate.
  • 1 is a schematic structural view of a conventional color filter substrate
  • FIG. 2 is a schematic plan view of a color filter substrate according to an embodiment of the present invention.
  • Figure 3 is a cross-sectional view taken along line A-A of Figure 2;
  • FIG. 4 is a schematic view showing a black matrix formed by an inkjet process according to an embodiment of the present invention.
  • FIG. 5 is a schematic diagram showing an increase in the angle of view of a visible film substrate according to an embodiment of the present invention.
  • FIG. 6 is a process flow diagram of a method for fabricating a color film substrate according to an embodiment of the present invention.
  • the color filter substrate includes: a substrate 1; a color pixel region including a plurality of pixel units, the pixel unit including at least a red sub-pixel unit 31, a blue sub-pixel unit 33, and a green sub-pixel unit 32, wherein the pixel unit Each color sub-pixel unit is disposed at one side of the substrate 1; and a black moment Array 2, which is disposed between the color sub-pixel units.
  • the material of the substrate 1 may be a transparent material such as glass, quartz or resin, and the present invention is not limited thereto.
  • the arrangement of the color sub-pixel units on the substrate 1 is not limited to the arrangement shown in FIG. 2, for example, the sub-pixel units arranged in the same column may be mosaics of different colors (Mosaic type), The different color sub-pixel units constituting the pixel unit exhibit a triangular arrangement (Delta type) or the like, and the present invention is not limited thereto.
  • the black matrix 2 can be filled in a blank gap between adjacent color sub-pixel units.
  • the black matrix 2 may be filled between the red sub-pixel unit 31 and the blue sub-pixel unit 33, and a blank gap filled between the color sub-pixel units, such as between the blue sub-pixel unit 33 and the green sub-pixel unit 32. in.
  • the height of the black matrix 2 is less than or equal to the height of the pixel unit.
  • a cross section of the black matrix 2 located between adjacent two sub-pixel units along the arrangement direction of the adjacent two sub-pixel units is trapezoidal, and the trapezoid is away from the upper bottom side of the substrate 1.
  • the length is greater than the length near the lower base of the substrate 1.
  • the direction of ⁇ - ⁇ ' in the figure is the arrangement direction of two adjacent pixel units.
  • the material of the black matrix 2 may be a resin material that is opaque to light.
  • the opaque resin material can be used to block light and can be used in an inkjet process.
  • the black matrix in this embodiment is set to "inverted trapezoid"
  • the width of the lower bottom side will be The width is designed to be narrower than the upper base and narrower than the width of the conventional black matrix. Therefore, the light of the embodiment of the present invention can be emitted from the solid line position b.
  • the area through which the light can pass is increased, and the angle between the dotted line a and the solid line b is set to ⁇ , so that the viewing angle of the color ink substrate according to the embodiment of the present invention is degraded.
  • the color filter substrate of the present embodiment may further include a protective layer and a transparent conductive layer.
  • a protective layer may be located on the color pixel area for flattening the color pixel area and the black matrix 2.
  • a transparent conductive layer is on the surface of the protective layer for forming a pixel electrode.
  • the transparent conductive layer can be made of a transparent conductive material such as indium tin oxide (ITO) or indium oxide ( ⁇ ).
  • the color filter substrate in this embodiment includes, but is not limited to, a ⁇ mode, which can also be applied to, for example, a vertical alignment (VA) mode, an advanced super-dimensional field conversion (ADvanced Super Dimension Switch, Other modes such as ADS) mode.
  • VA vertical alignment
  • ADvanced Super Dimension Switch Other modes such as ADS
  • the transparent conductive layer may be disposed on the back surface of the substrate 1, that is, the color image disposed on the substrate On the opposite side of the prime region.
  • a multi-dimensional electric field is formed by an electric field generated by the edge of the slit electrode in the same plane and an electric field generated between the slit electrode layer and the plate electrode layer, so that all the orientations between the slit electrodes in the liquid crystal cell and the electrode directly above are formed.
  • Liquid crystal molecules are capable of rotating, thereby improving liquid crystal working efficiency and increasing light transmission efficiency.
  • Advanced super-dimensional field conversion technology can improve the picture quality of TFT-LCD products, with high resolution, high transmittance, low power consumption, wide viewing angle, high aperture ratio, low chromatic aberration, push-free water ripple (push Mura), etc. advantage.
  • an embodiment of the present invention provides a method for fabricating the color film substrate described above, including: Step S10: forming a color pixel region on a substrate 1 by using a patterning process, including a plurality of pixel units, the pixel unit At least the red sub-pixel unit 31, the blue sub-pixel unit 33, and the green sub-pixel unit 32 are included, and each of the color sub-pixel units in the pixel unit is disposed at one side of the substrate 1.
  • sub-pixel units including a red sub-pixel unit 31, a green sub-pixel unit 32, and a blue sub-pixel unit 33 are formed on the substrate 1 by applying a color photoresist, exposure, and development. Since the color sub-pixel units are all fabricated on one side of the substrate 1, the flatness of the side surface is flatter than that of the color sub-pixel units disposed on the black matrix 2, and the "horn" phenomenon existing in the conventional technology can be greatly improved. The angular difference of each sub-pixel unit will also be greatly reduced or even disappeared.
  • the color pixel area includes a plurality of pixel units, and the pixel unit includes a red sub-pixel unit 31, a blue sub-pixel unit 33, and a green sub-pixel unit 32, and may further include a transparent sub-pixel unit according to design requirements.
  • the sub-pixel unit of other colors, such as a yellow sub-pixel unit, is not limited thereto; and, there is no order limitation on forming the sub-pixel units of each color on the substrate 1, and may be determined as needed.
  • the patterning process typically includes processes such as photoresist coating, exposure, development, etching, photoresist stripping, and the like.
  • the patterning process may omit photoresist coating, etching, and light. Engraved stripping process.
  • Step S20 forming a black matrix 2 between the color sub-pixel units by an inkjet process.
  • the material of the black matrix 2 may be a resin material that is opaque to light.
  • the opaque resin material can be used to block light and can be used in an inkjet process.
  • step S20 includes:
  • Step S201 blanking between adjacent color sub-pixel units through the nozzle 35 by an inkjet process An opaque resin material 34 is dropped into the slit, and the opaque resin material is a flexible liquid which is filled flat between the respective color sub-pixel units.
  • Step S202 curing the opaque resin material by ultraviolet irradiation or heat treatment to form a black matrix 2.
  • the opaque resin material that has been filled in the slits of the respective sub-pixel units is cured, and after being cured, a structurally stable black matrix 2 is formed.
  • the height of the black matrix 2 is less than or equal to the height of the pixel unit.
  • a cross section of the black matrix 2 located between adjacent two sub-pixel units along the arrangement direction of the adjacent two sub-pixel units is a trapezoid, and a length of the trapezoid away from the upper bottom side of the substrate 1 is greater than that of the close The length of the lower base of the substrate 1 is described.
  • the film thickness of the conventional color sub-pixel unit is between 2.0 ⁇ m and 3.0 ⁇ m, and the film thickness of the black matrix 2 is between ⁇ . ⁇ ⁇ ⁇ to 1.5 ⁇ m.
  • the present embodiment gives black light.
  • the balance of the film thickness from 0.5 ⁇ m to 2 ⁇ m for the evaporation of the solvent during the heat treatment satisfies the shading requirement of the black matrix 2.
  • the embodiment of the present invention forms the black matrix 2 by using an inkjet process after forming the color pixel region first, thereby minimizing the angular difference of each color sub-pixel, increasing the surface flatness, and effectively reducing the surface roughness.
  • an embodiment of the present invention further provides a display device including the color filter substrate in the above embodiment.
  • the display device can be any product or component having a display function such as a liquid crystal panel, a mobile phone, a tablet computer, a television, a display, a notebook computer, a digital photo frame, a navigator, and the like.
  • the display device adopts the color film substrate in the above embodiment to improve the brightness of the image display of the product, and to meet the customer's demand for high brightness.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Mathematical Physics (AREA)
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Abstract

提供一种显示装置、彩膜基板及其制作方法。彩膜基板包括：基板（1）；彩色像素区域，其包括多个像素单元，像素单元至少包括红色子像素单元（31）、蓝色子像素单元（33）和绿色子像素单元（32）；像素单元中的各色子像素单元间隔设置在基板（1）的一侧；黑矩阵（2），其设置于各色子像素单元之间。彩膜基板的制作方法，先形成彩色像素区域后采用喷墨工艺在各色子像素单元之间形成黑矩阵（2）。因此，可以有效降低生产线不良品的发生率，并降低生产成本。

Description

显示装置、 彩膜基板及其制作方法
技术领域
本发明的实施例涉及一种显示装置、 彩膜基板及其制作方法。 背景技术
近年来， 随着科技的发展， 液晶显示器技术也随之不断完善。 薄膜场效 应晶体管 -液晶显示器（ Thin Film Transistor-Liquid Crystal Display, TFT-LCD ) 以其图像显示品质好、 能耗低、 环保等优势占据着显示器领域的重要位置。 目前 TFT-LCD主要由阵列基板和彩膜基板对盒形成， 对盒后的空腔内填充液 晶。 现有的彩膜基板一般是基于红绿蓝三原色的彩膜基板， 液晶面板通过驱 动集成电路（IC ) 的电压改变来控制液晶分子的排列状态， 而形成开关式选 择背光源的光线是否穿透， 经三原色比例调合形成不同的色彩， 从而使得液 晶显示器呈现出亮丽、 鲜艳的画面。
如图 1所示， 为常规彩膜基板结构示意图， 其包括基板 Γ、 设置在基板 Γ 上的用于遮光的黑矩阵 2，和彩色像素层（包括多个像素单元，所述像素单元至 少包括红色子像素单元 31，、 蓝色子像素单元 33，和绿色子像素单元 32，）， 根据 需要， 还可以包括透明导电层和位于彩色像素区域上的保护层。
常规结构的彩膜基板的制作过程均是采用狭缝涂布（Slit Coater )或者旋 转涂布（ Spin Coater )的涂布方式， 并在基板 Γ上通过曝光依次形成黑矩阵 2，， 彩色像素层等结构。
由于彩色像素层的两侧均搭接在黑矩阵 2，上，致使彩色像素层的上表面出 现不平坦的现象（即在彩色像素层的上表面形成中间低、 两侧高呈 "牛角，， 形状的角段差，如附图 1中圓圏 A处所示）。 而这种彩色像素层上出现的角段差 现象会严重影响彩膜基板中膜面的平整度， 从而引起生产线中不良率的发生， 影响产品品质。 发明内容
本发明实施例提供一种显示装置、 彩膜基板及其制作方法。
根据本发明的一个方面， 提供一种彩膜基板， 其包括： 基板；
彩色像素区域， 其包括多个像素单元， 所述像素单元至少包括红色子像 素单元、 蓝色子像素单元和绿色子像素单元， 所述像素单元中的各色子像素 单元间隔设置在所述基板的一侧； 以及
黑矩阵， 其设置于各色子像素单元之间。
根据本发明的一个实施例， 所述黑矩阵填充于相邻的各色子像素单元之 间的空白缝隙中， 所述黑矩阵的高度小于或等于所述像素单元的高度。
根据本发明的一个实施例， 位于相邻两个子像素单元之间的黑矩阵沿所 述相邻两个子像素单元的排布方向的截面为梯形， 所述梯形远离所述基板的 上底边的长度大于靠近所述基板的下底边的长度。
根据本发明的一个实施例， 所述黑矩阵的材质为不透光的树脂材料。 根据本发明的一个实施例， 本发明还提供一种显示装置， 包括上述的彩 膜基板。
根据本发明的另一方面， 提供一种彩膜基板的制作方法， 包括： 在基板上采用构图工艺形成彩色像素区域， 其包括多个像素单元， 所述 像素单元至少包括红色子像素单元、 蓝色子像素单元和绿色子像素单元； 所 述像素单元中的各色像素单元间隔设置在所述基板的一侧； 以及
采用喷墨工艺在各色子像素单元之间形成黑矩阵。
根据本发明的一个实施例， 所述黑矩阵采用不透光的树脂材料制成。 根据本发明的一个实施例， 所述步采用喷墨工艺在各色子像素单元之间 形成黑矩阵包括：
采用喷墨工艺通过喷嘴在相邻各色子像素单元之间的空白缝隙处滴入不 透光的树脂材料； 以及
通过紫外线照射或者热处理对不透光的树脂材料进行固化形成黑矩阵。 根据本发明的一个实施例， 所述黑矩阵的高度小于或等于所述像素单元 的高度。
根据本发明的一个实施例， 位于相邻两个子像素单元之间的黑矩阵沿所 述相邻两个子像素单元的排布方向的截面为梯形， 所述梯形远离所述基板的 上底边的长度大于靠近所述基板的下底边的长度。 附图说明 以下将结合附图对本发明的实施例进行更详细的说明， 以使本领域普通 技术人员更加清楚地理解本发明， 其中：
图 1为常规彩膜基板的结构示意图；
图 2为本发明实施例的彩膜基板的平面示意图；
图 3为图 2中沿 A- A，的剖视图；
图 4为本发明实施例的采用喷墨工艺形成黑矩阵的示意图；
图 5为本发明实施例的彩膜基板可视范围角度增加示意图；
图 6为本发明实施例的彩膜基板制作方法的工艺流程图。
图中：
1、 基板； 2、 黑矩阵； 31、 红色子像素单元； 32、 绿色子像素单元； 33、 蓝色子像素单元； 34、 不透光材料； 35、 喷嘴； Γ、 基板； 2，、 黑矩阵； 31，、 红色子像素单元； 32，、 绿色子像素单元； 33，、 蓝色子像素单元。 具体实施方式
为了使本发明的实施例的目的、 技术方案和优点更加清楚， 下面将结合 本发明实施例的附图对本发明的实施例的技术方案进行清楚、 完整的描述。 显然， 所描述的实施例仅是本发明的一部分示例性实施例， 而不是全部的实 施例。 基于所描述的本发明的示例性实施例， 本领域普通技术人员在无需创 造性劳动的前提下所获得的所有其它实施例都属于本发明的保护范围。
除非另作定义， 此处使用的技术术语或者科学术语应当为本发明所属领 域内具有一般技能的人士所理解的通常意义。 本发明专利申请说明书以及权 利要求书中使用的 "一个"、 "一"或者 "该"等类似词语也不表示数量限制， 而是表示存在至少一个。 "包括" 或者 "包含" 等类似的词语意指出现该词前 面的元件或者物件涵盖出现在该词后面列举的元件或者物件及其等同， 而不 排除其它元件或者物件。 "上"、 "下"、 "左"、 "右"等仅用于表示相对位置关 系， 当被描述对象的绝对位置改变后， 则该相对位置关系也可能相应地改变。
实施例一
如图 2所示， 本实施例以扭曲向列 （ Twisted Nematic, TN )模式为例进 行说明。 彩膜基板包括： 基板 1 ; 彩色像素区域， 其包括多个像素单元， 所述 像素单元至少包括红色子像素单元 31、蓝色子像素单元 33和绿色子像素单元 32, 所述像素单元中的各色子像素单元间隔设置在基板 1 的一侧； 以及黑矩 阵 2, 其设置于各色子像素单元之间。
基板 1的材质可以采用玻璃、 石英、 树脂等透明材料， 本发明不限于此。 另外， 各色子像素单元在基板 1上的排列方式并不仅仅限于图 2中所示的排 列形式， 例如， 还可以为同列排布的子像素单元为不同颜色交替的马赛克方 式（Mosaic型）、构成像素单元的不同颜色子像素单元呈现三角形排布的方式 ( Delta型）等， 本发明不限于此。
例如， 该黑矩阵 2可填充于相邻的各色子像素单元之间的空白缝隙中。 例如， 黑矩阵 2可填充于红色子像素单元 31和蓝色子像素单元 33之间， 以 及填充于蓝色子像素单元 33和绿色子像素单元 32之间等各色子像素单元之 间的空白缝隙中。
另外， 黑矩阵 2的高度小于或等于像素单元的高度。
如图 3所示， 位于相邻两个子像素单元之间的黑矩阵 2沿所述相邻两个 子像素单元的排布方向的截面为梯形， 所述梯形远离所述基板 1 的上底边的 长度大于靠近所述基板 1的下底边的长度。 图中 Α-Α'的方向为相邻两个像素 单元的排布方向。
例如， 所述黑矩阵 2的材质可以选用不透光的树脂材料。 所述不透光的 树脂材料可用于遮挡光线并且可用于喷墨工艺。
参考图 5, 如图中显示说明的， 对于常规的黑矩阵结构， 光线最多只能从 虚线位置 a射出， 而由于本实施例中的黑矩阵设置成 "倒梯形"， 将下底边的 宽度设计成窄于上底边的宽度， 窄于常规的黑矩阵的宽度， 因此， 本发明实 施例的光线可以从实线位置 b射出。 这样， 使得光线能够透过的区域增大了， 设定虚线 a和实线 b之间的夹角为 θ , 从而根据本发明实施例的彩墨基板的 视角有了 Θ值的提升。
另外， 本实施例中彩膜基板除了包含上述结构外， 还可以包括保护层和 透明导电层。 保护层可以位于彩色像素区域上， 用于平整该彩色像素区域和 黑矩阵 2。 透明导电层位于保护层的表面， 用于形成像素电极。 该透明导电层 可以采用氧化铟锡（ITO )、 氧化铟辞（ΙΖΟ )等透明导电材料制成。
需要说明的是， 本实施例中的彩膜基板包括但并不限于应用于 ΤΝ模式， 其还可以适用于例如垂直取向 （Vertical Alignment, VA )模式、 高级超维场 转换 ( ADvanced Super Dimension Switch, ADS )模式等其它模式。 当采用 ADS模式时， 透明导电层可设于基板 1的背面， 即设置在与基板上的彩色像 素区域相反的一侧上。
例如， 在 ADS模式， 通过同一平面内狭缝电极边缘所产生的电场以及狭 缝电极层与板状电极层间产生的电场形成多维电场， 使液晶盒内狭缝电极间、 电极正上方所有取向液晶分子都能够产生旋转， 从而提高液晶工作效率并增 大透光效率。 高级超维场转换技术可以提高 TFT-LCD产品的画面品质， 具有 高分辨率、 高透过率、 低功耗、 宽视角、 高开口率、 低色差、 无挤压水波纹 ( push Mura )等优点。
实施例二
如图 6所示， 本发明实施例提供一种制作上述彩膜基板的方法， 其包括： 步骤 S10:在基板 1上采用构图工艺形成彩色像素区域，其包括多个像素 单元，所述像素单元至少包括红色子像素单元 31、蓝色子像素单元 33和绿色 子像素单元 32,所述像素单元中的各色子像素单元间隔设置在基板 1的一侧。
在此步骤中， 在基板 1 上通过涂布彩色光阻剂、 曝光、 显影的方式形成 包括红色子像素单元 31 , 绿色子像素单元 32, 蓝色子像素单元 33等子像素 单元。 由于各色子像素单元均制作在基板 1 的一侧， 该侧表面的平坦度比各 色子像素单元设置在黑矩阵 2上更加平坦， 常规技术中存在的 "牛角" 现象 可得到很大的改善， 各子像素单元的角段差也将大幅减小甚至消失。
需要说明的是， 彩色像素区域包括多个像素单元， 所述像素单元包括红 色子像素单元 31、 蓝色子像素单元 33和绿色子像素单元 32, 还可以根据设 计的需要， 包括透明子像素单元、 黄色子像素单元等其它颜色的子像素单元， 本发明不限于此； 并且， 在基板 1上形成各色子像素单元没有顺序上的限制， 可以根据需要自行确定。
另外， 构图工艺通常包括光刻胶涂覆、 曝光、 显影、 刻蚀、 光刻胶剥离 等工艺。 对于需要制作图案的膜层， 如果膜层材料本身具备感光性质， 例如 本实施例中制备彩色像素区域用到的彩色光阻剂材料， 则构图工艺可以省略 光刻胶涂覆、 刻蚀和光刻胶剥离工艺。
步骤 S20: 采用喷墨工艺在各色子像素单元之间形成黑矩阵 2。
例如， 所述黑矩阵 2的材质可以选用不透光的树脂材料。 所述不透光的 树脂材料可用于遮挡光线并且可用于喷墨工艺。
结合参考图 4, 步骤 S20包括：
步骤 S201 :采用喷墨工艺通过喷嘴 35在相邻各色子像素单元之间的空白 缝隙处滴入不透光的树脂材料 34, 该不透光的树脂材料为柔性液体， 其将平 整地填充于各色子像素单元之间。
步骤 S202: 通过紫外线照射或者热处理对不透光的树脂材料进行固化形 成黑矩阵 2。在本步骤中，对已填充于各色子像素单元缝隙中的不透光的树脂 材料进行固化， 待固化后， 则形成结构稳定的黑矩阵 2。
黑矩阵 2的高度小于或等于像素单元的高度。
另外， 位于相邻两个子像素单元之间的黑矩阵 2沿所述相邻两个子像素 单元的排布方向的截面为梯形， 所述梯形远离所述基板 1 的上底边的长度大 于靠近所述基板 1的下底边的长度。
常规的各色子像素单元的膜厚在 2.0 μ m至 3.0 μ m之间， 而黑矩阵 2的膜 厚在 Ι.Ο μ ηι至 1.5 μ m之间 , 这样, 本实施例给出了黑色光刻 度从 0.5 μ m 至 2 μ m的用于在热处理过程中由于溶剂挥发而导致的膜厚下降的余量，满足黑 矩阵 2的遮光需求。
需要说明的是， 在实际生产中发现， 若采用喷墨工艺形成彩色子像素单 元， 则需要在事先制作好的黑矩阵 2的开口区域用喷嘴 35滴入一定量的红色 或绿色或蓝色树脂材料， 待滴入后， 再通过紫外线光照以及热固化最终形成 红、 绿、 蓝各色子像素单元。 但考虑到各色树脂材料在热处理后溶剂会挥发 一部分致使膜厚降低， 所以在热处理前涂布的膜厚会较之后的厚， 这就要求 黑矩阵层的高度需要增高以满足要求； 另外， 各色树脂材料在滴入时也比较 容易发生串色或者混色的现象， 因此会影响到产品的画面显示品质。 因此， 通过大量实验证明， 本发明的实施例通过先形成彩色像素区域之后采用喷墨 工艺形成黑矩阵 2, 最大程度地减小了各色子像素的角段差，增加了表面平坦 性， 可以有效降低生产线不良产品的发生机率； 同时采用喷墨方式制作黑矩 阵 2,—方面大大降 了初期生产线的投入成本， 另一方面可减少制作黑矩阵 2用的材料用量， 提高材料的利用率， 进一步降低生产成本。
另外， 本发明的实施例还提供一种显示装置， 其包括上述实施例中的彩 膜基板。 该显示装置可以为液晶面板、 手机、 平板电脑、 电视机、 显示器、 笔记本电脑、 数码相框、 导航仪等任何具有显示功能的产品或部件。 该显示 装置采用上述实施例中的彩膜基板能够提高产品图像显示的亮度， 满足客户 对高亮度的需求。
以上所述仅是本发明的优选实施方式， 应当指出， 对于本技术领域的普 通技术人员来说， 在不脱离本发明技术原理和精神的前提下， 还可以做出若 干改进和变型， 这些改进和变型也应视为本发明的保护范围。

Claims

权利要求书
1、 一种彩膜基板， 包括：
基板；
彩色像素区域， 其包括多个像素单元， 所述像素单元至少包括红色子像 素单元、 蓝色子像素单元和绿色子像素单元， 所述像素单元中的各色子像素 单元间隔设置在所述基板的一侧； 以及
黑矩阵， 其设置于各色子像素单元之间。
2、 如权利要求 1所述的彩膜基板， 其中所述黑矩阵填充于相邻的各色子 像素单元之间的空白缝隙中， 所述黑矩阵的高度小于或等于所述像素单元的 高度。
3、 如权利要求 1或 2所述的彩膜基板， 其中位于相邻两个子像素单元之 间的黑矩阵沿所述相邻两个子像素单元的排布方向的截面为梯形， 并且所述 梯形远离所述基板的上底边的长度大于靠近所述基板的下底边的长度。
4、 如权利要求 1-3任一项所述的彩膜基板， 其中所述黑矩阵的材质为不 透光的树脂材料。
5、 一种显示装置， 包括权利要求 1-4任一项所述的彩膜基板。
6、 一种彩膜基板的制作方法， 包括：
在基板上采用构图工艺形成彩色像素区域， 其包括多个像素单元， 所述 像素单元至少包括红色子像素单元、 蓝色子像素单元和绿色子像素单元， 所 述像素单元中的各色子像素单元间隔设置在所述基板的一侧； 以及
采用喷墨工艺在各色子像素单元之间形成黑矩阵。
7、 如权利要求 6所述的彩膜基板的制作方法， 其中所述黑矩阵采用不透 光的树脂材料制成。
8、 如权利要求 7所述的彩膜基板的制作方法， 其中所述采用喷墨工艺在 各色子像素单元之间形成黑矩阵包括：
采用喷墨工艺通过喷嘴在相邻各色子像素单元之间的空白缝隙处滴入不 透光的树脂材料； 以及
通过紫外线照射或者热处理对不透光的树脂材料进行固化形成黑矩阵。
9、 如权利要求 6-8任一项所述的彩膜基板的制作方法， 其中所述黑矩阵 的高度小于或等于所述像素单元的高度。
10、 如权利要求 6-9任一项所述的彩膜基板的制作方法， 其中位于相邻 两个子像素单元之间的黑矩阵沿所述相邻两个子像素单元的排布方向的截面 为梯形， 所述梯形远离所述基板的上底边的长度大于靠近所述基板的下底边 的长度。
PCT/CN2013/088982 2013-04-28 2013-12-10 显示装置、彩膜基板及其制作方法 WO2014176904A1 (zh)

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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004177868A (ja) * 2002-11-29 2004-06-24 Toppan Printing Co Ltd カラーフィルタ及びその製造方法
KR20060073738A (ko) * 2004-12-24 2006-06-29 삼성전자주식회사 액정표시패널의 제조방법
TW200837400A (en) * 2007-03-05 2008-09-16 Chi Mei Optoelectronics Corp Color filter fabricated by ink-jet and fabricating method thereof
CN101493600A (zh) * 2009-03-03 2009-07-29 福州华映视讯有限公司 彩色滤光基板及液晶显示面板的制造方法
CN103235444A (zh) * 2013-04-28 2013-08-07 京东方科技集团股份有限公司 一种显示装置、彩膜基板及其制作方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004177868A (ja) * 2002-11-29 2004-06-24 Toppan Printing Co Ltd カラーフィルタ及びその製造方法
KR20060073738A (ko) * 2004-12-24 2006-06-29 삼성전자주식회사 액정표시패널의 제조방법
TW200837400A (en) * 2007-03-05 2008-09-16 Chi Mei Optoelectronics Corp Color filter fabricated by ink-jet and fabricating method thereof
CN101493600A (zh) * 2009-03-03 2009-07-29 福州华映视讯有限公司 彩色滤光基板及液晶显示面板的制造方法
CN103235444A (zh) * 2013-04-28 2013-08-07 京东方科技集团股份有限公司 一种显示装置、彩膜基板及其制作方法

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